WO2022036789A1 - 彩色滤光片基板及其制作方法与液晶显示面板 - Google Patents

彩色滤光片基板及其制作方法与液晶显示面板 Download PDF

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Publication number
WO2022036789A1
WO2022036789A1 PCT/CN2020/115636 CN2020115636W WO2022036789A1 WO 2022036789 A1 WO2022036789 A1 WO 2022036789A1 CN 2020115636 W CN2020115636 W CN 2020115636W WO 2022036789 A1 WO2022036789 A1 WO 2022036789A1
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Prior art keywords
layer
color filter
filter substrate
photoresist
display area
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PCT/CN2020/115636
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English (en)
French (fr)
Inventor
黄建龙
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武汉华星光电技术有限公司
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Priority to US17/046,805 priority Critical patent/US20230123033A1/en
Publication of WO2022036789A1 publication Critical patent/WO2022036789A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133388—Constructional arrangements; Manufacturing methods with constructional differences between the display region and the peripheral region
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133519—Overcoatings
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars

Definitions

  • the present invention relates to the technical field of liquid crystal display, and in particular, to a color filter substrate and a manufacturing method thereof, and a liquid crystal display panel.
  • An existing liquid crystal display (Liquid Crystal Display, LCD) display panel generally includes a thin film transistor (Thin Film Transistor, TFT) substrate and a color filter (Color Filter, CF) substrate.
  • Figure 1 illustrates the cause of the yellowing phenomenon around the existing panel.
  • the TFT substrate includes a base substrate 1 and a TFT film layer 8
  • the CF substrate includes a base substrate 2, a black matrix (Black Matrix, BM) light-shielding layer 5 and a color photoresist 9, and the TFT substrate and the CF substrate are paired
  • the liquid crystal layer 6 is filled in the middle, and the area with the liquid crystal layer 6 is the display area, which includes the abnormal display area C and the normal display area D.
  • the other area is a non-display area, wherein the non-display area includes a peripheral area A (Dummy area, also known as a transition area) of the display area and an outer pin bonding area B (OLB).
  • the TFT substrate and the CF substrate are combined by the sealing sealant 4, and spacers 3 and 7 are respectively provided in the display area and the peripheral area for support, so as to keep the panel structure flat and keep the cell gap consistent.
  • the present invention provides a color filter substrate, a method for making the same, and a liquid crystal display panel.
  • the color filter substrate improves the film layer structure in the peripheral area, improves the supportability of the film layer, avoids the concave of the peripheral area, and improves the The perimeter of the liquid crystal display panel turns yellow.
  • the present invention first provides a color filter substrate, comprising a display area and a peripheral area, the peripheral area is provided with a light shielding layer and a photoresist layer, and the photoresist layer in the peripheral area includes a plurality of color photoresists, the plurality of The plurality of color photoresists are stacked, and the projections in the direction perpendicular to the color filter substrate overlap each other.
  • the photoresist layer in the peripheral region includes at least two of blue photoresist, green photoresist, and red photoresist.
  • the peripheral area is further provided with a protective layer and a spacer layer, and a light shielding layer, a photoresist layer, a protective layer (Over Coat, OC layer) and a spacer layer are stacked in the peripheral area, The projections of the light shielding layer, the photoresist layer, the protective layer and the spacer layer in the direction perpendicular to the color filter substrate overlap each other.
  • the display area of the color filter substrate is provided with a light shielding layer and a photoresist layer
  • the light shielding layer of the display area is a black matrix structure
  • the substrate is divided into a plurality of pixel areas
  • the light shielding layer is The resist layer is distributed in the pixel area.
  • the display area of the color filter substrate is further provided with a protective layer, a common electrode layer and a first alignment film layer.
  • the light shielding layer in the peripheral region is continuously distributed, and the thickness of the light shielding layer in the peripheral region is equal to the thickness of the black matrix in the display area.
  • the present invention also provides a liquid crystal display panel, comprising a thin film transistor substrate arranged relatively parallel, a color filter substrate as described above, and a liquid crystal layer distributed between the two substrates, the liquid crystal layer is distributed on the color filter The position corresponding to the display area of the substrate.
  • the spacer layer is provided with a plurality of spacers, and in the peripheral region, the gap distances between the plurality of spacers and the thin film transistor substrate are the same as each other.
  • the present invention further provides a display device comprising the above-mentioned liquid crystal panel.
  • the present invention also provides a method for manufacturing a color filter substrate, comprising the following steps:
  • a light-shielding layer is formed in the display area and the peripheral area of the base substrate, the light-shielding layer in the display area is etched into a matrix distribution pattern, and the substrate in the display area is divided into a plurality of pixel areas;
  • a photoresist layer is formed on the light shielding layer, different color photoresists of the photoresist layer in the display area are distributed in the pixel area, and different color photoresists in the peripheral area are stacked and arranged;
  • the light shielding layer, the photoresist layer, the protective layer and the spacer layer in the peripheral region are all stacked.
  • the spacer layer in the peripheral region is provided with a plurality of spacers, and the patterns of the plurality of spacers are formed by a semi-permeable mask process.
  • the present invention optimizes the film layer structure of the color filter substrate by adding a photoresist layer in the color filter substrate in the peripheral area, and stacking multiple photoresist layers on each other, enhances the supportability of the film layer, and reduces the damage of the peripheral area in the ODF process.
  • the degree of depression improves the peripheral Mura (peripheral unevenness) of the liquid crystal display panel.
  • the color filter substrate with optimized film layer structure has a simple manufacturing process, does not change the original film layer display area design, and has wide application prospects.
  • FIG. 1 is a schematic diagram illustrating the causes of yellowing around a display panel in the prior art.
  • Example 2 is a schematic diagram of the structure of the peripheral area of the CF film layer provided in Example 1 of the present invention, wherein A is a cross-sectional view of the peripheral area of the CF film layer, and B is a top view of the structure of the peripheral area of the CF film layer; quadrilateral, hexagonal and Shapes such as a circle do not represent the actual cross-sectional shape of the film layer, but are only used to distinguish each film layer schematically.
  • FIG. 3 is a schematic diagram of the overall structure of the CF film layer provided in Embodiment 2 of the present invention.
  • FIG. 4 is a schematic structural diagram of a display panel according to Embodiment 3 of the present invention.
  • FIG. 5 is a schematic state diagram of a display panel ODF process according to Embodiment 3 of the present invention.
  • Embodiment 1 provides a color filter substrate, including a display area 10 and a peripheral area 20 , a light shielding layer 22 and a photoresist layer are provided on the surface of the peripheral area 20 of the base substrate 11 , and the photoresist layer includes The first photoresist 23 and the second photoresist 24, the first photoresist 23 and the second photoresist 24 are stacked, and the projections in the direction perpendicular to the color filter substrate (liquid crystal display panel) overlap each other, for example, the The second photoresist 24 covers the surface of the first photoresist 23 .
  • the photoresist layer of the peripheral region 20 includes at least two kinds of blue photoresist, green photoresist, and red photoresist.
  • the first photoresist 23 and the second photoresist 24 are photoresists of different colors.
  • the first photoresist 23 is a green photoresist
  • the second photoresist 24 is a blue photoresist; or, the first photoresist 23 and the second photoresist 24 are other two color photoresists The combination.
  • the photoresist type of the photoresist layer can be determined according to the photoresist layer manufacturing process of the color filter substrate, especially the photoresist layer 13 in the display area 10. For example, according to the photoresist layer 13 in the display area 10 In the manufacturing process, the green photoresist is fabricated first, and then the blue photoresist is fabricated. Then, the first photoresist 23 in the corresponding peripheral area 20 is a green photoresist, and the second photoresist 24 is a blue photoresist, and the two are stacked.
  • the peripheral region 20 is also provided with a protective layer 25 and a spacer layer 26 .
  • the protective layer 25 is a planarization layer
  • the spacer layer 26 is a sub-spacer.
  • the light shielding layer 22, the photoresist layer 23, the photoresist layer 24, the protective layer 25, and the spacer layer 26 are stacked in the peripheral region 20.
  • These film layers are perpendicular to the color filter substrate (liquid crystal display panel). ) directions overlap each other.
  • shapes such as quadrangle, hexagon, and circle in FIG. 2B do not represent the actual cross-sectional shape of the film layer, but are merely to distinguish each film layer schematically.
  • the difference between the sum of the thicknesses of all the film layers of the color filter substrate in the peripheral area and the sum of the thicknesses of the film layers of the color filter substrate in the display area is less than a predetermined threshold, so that the Both are roughly equal in thickness.
  • the preset threshold can be determined according to the designed cell thickness and the display effect of the liquid crystal display panel.
  • the thicknesses of the first photoresist layer 23 and the second photoresist layer 24 can be adjusted to adjust the overall film thickness of the peripheral area 20 and the display area 10 , thereby reducing the thickness of the peripheral area 20 and the display area 10 . Segment difference.
  • the individual film thicknesses of the first photoresist 23 and the second photoresist 24 are respectively 2.0-3.0 ⁇ m (micrometers), and the thickness of the first photoresist 23 and the second photoresist 24 after stacking The thickness is about 3.5-5.0 ⁇ m.
  • the spacer layer 26 is stacked on the surface of the protective layer 25 .
  • Embodiment 2 of the present invention provides a color filter substrate, which includes a display area 10 and a peripheral area 20 , wherein the peripheral area 20 is the same as Embodiment 1. Further, a light shielding layer 12 and a photoresist layer 13 are provided in the display area 10 , the light shielding layer 12 of the display area 10 is a black matrix structure, and the base substrate 11 is divided into a plurality of pixel regions.
  • the photoresist layer 13 includes red photoresist (R), green photoresist (G) and blue photoresist (B), and the photoresist is distributed in the pixel area.
  • the display area 10 of the color filter substrate is further provided with a protective layer 14 , a common electrode layer 15 and a first alignment film layer 16 .
  • the light-shielding layers in the peripheral region 20 are continuously distributed, and the thickness of the light-shielding layer 22 in the peripheral region 20 is equal to the thickness of the black matrix (light-shielding layer 12 ) in the display area 10 .
  • the light shielding layer and the protective layer of the display area 10 and the peripheral area 20 are completed in the same process step.
  • a light-shielding layer is formed on the base substrate 11 to cover the display area 10 and the peripheral area 20 , and then the light-shielding layer of the display area 10 is formed into a black matrix pattern to form the light-shielding layer 12 and the light-shielding layer of the peripheral area 20 Continuously distributed, the light shielding layer 22 is formed.
  • a protective layer is formed to cover the display area 10 and the peripheral area 20, and the protective layer 14 and the protective layer 25 are formed respectively.
  • the light-shielding layer and the protective layer in this embodiment can be implemented according to the manufacturing process known in the art.
  • Embodiment 3 provides a liquid crystal display panel.
  • the liquid crystal display panel includes a thin film transistor substrate, a color filter substrate, and a liquid crystal layer distributed between the two substrates.
  • the color filter substrate of the liquid crystal display panel has the same structure as Example 2, the thin film transistor substrate has a base substrate 21, and a TFT film layer 17 is provided on the base substrate 21, and the TFT film layer 17 corresponding to the display area 10 is provided.
  • a second alignment film 18 is disposed thereon, the second alignment film 18 is opposite to the first alignment film 16 of the color filter substrate, and a liquid crystal layer 19 is disposed therebetween.
  • a spacer (Spacer) 20 may be provided in the gap of the liquid crystal layer 19 .
  • the spacers 26 in the color filter substrate are provided with opening areas on the mask plate in the photoresist exposure and development process, so that the spacer pattern can be formed after the photoresist exposure and development process,
  • a plurality of the spacers 26 and the thin film transistor substrate have more than one contact point.
  • the setting of the contact points and the spacer pattern are determined according to the topography of the thin film transistor substrate and the designed cell thickness, so that the color filter substrate and the thin film transistor substrate can be accurately aligned, and the film thickness of the display area 10 and the surrounding area 20 are consistent; In 20, the gap distances between the plurality of spacers 26 and the thin film transistor substrate are the same as each other.
  • the patterns of the plurality of spacers 26 may be formed using a semi-permeable mask process.
  • the liquid crystal display panel provided by the embodiment of the present invention does not change other film layer structures, and still retains the TFT substrate (including the base substrate 1 and the TFT film layer 8 ) ), CF substrate (including base substrate 2 and black matrix (Black Matrix, BM) light-shielding layer 5 and color photoresist 9), TFT substrate and CF substrate are assembled in alignment, with liquid crystal layer 6, TFT substrate and CF substrate in the middle Through the combination of the sealant 4, spacers 3 and 7 are respectively provided in the display area and the peripheral area for support.
  • the use of photoresist layer 9a such as two-color photoresist or multi-color photoresist layer stacking improves the support of the film layer.
  • photoresist layer 9a such as two-color photoresist or multi-color photoresist layer stacking improves the support of the film layer.
  • the cavity and the color filter substrate film layer can also effectively support the substrate, thereby reducing the cell thickness difference between the peripheral area and the display area, effectively avoiding the yellow light phenomenon caused by the depression in the peripheral area, and improving the display quality of the panel.
  • An embodiment of the present invention also provides a method for manufacturing a color filter substrate, comprising the following steps:
  • a light-shielding layer is formed on the display area 10 and the peripheral area 20 of the base substrate 11, the light-shielding layer 12 of the display area 10 is etched into a matrix distribution pattern, and the substrate of the display area 10 is divided into a plurality of pixel areas; the light-shielding layer of the peripheral area 20 22 maintain a continuous distribution or etching pattern;
  • a photoresist layer is formed on the light-shielding layer in all regions of the base substrate 11 , the photoresist of different colors (RGB) of the photoresist layer of the display area 10 is distributed in the pixel area, and the photoresists of different colors in the peripheral area 20 are stacked and arranged;
  • a protective layer is formed on the photoresist layer in all areas of the base substrate 11, covering the display area 10 and the peripheral area 20, and a protective layer 14 and a protective layer 25 are formed respectively;
  • the light shielding layer 22 , the photoresist layers 23 and 24 , the protective layer 25 and the spacer layer 26 in the peripheral region 20 are all stacked and arranged, and their projections in the direction perpendicular to the panel overlap each other.
  • the photoresist stacking sequence in the peripheral area 20 is consistent with the coating sequence in the photoresist layer manufacturing process in the display area 10 , and the photoresist fabrication in the peripheral area 20 and the photoresist fabrication in the display area 10 are preferably in the same process.
  • the G photoresist is first fabricated in the display area 10, and then the B photoresist is fabricated.
  • the G photoresist layer is also formed in the peripheral area 20, and then When the B photoresist is formed in the display area 10 , the B photoresist layer is also formed in the peripheral area 20 , and the B photoresist layer in the peripheral area 20 is stacked on the surface of the G photoresist layer.
  • the manufacturing method of the color filter substrate further includes sequentially disposing a common electrode layer 15 and a first alignment film layer 16 on the surface of the protective layer 16 of the display area 10 , for example, the common electrode layer 15 is an ITO metal layer.
  • the embodiment of the present invention further includes fabricating a liquid crystal display panel, preparing a color filter substrate and a thin film transistor substrate respectively, and then aligning the two substrates to perform an ODF process.
  • each film layer of the color filter substrate and the thin film transistor substrate are not particularly limited, and can be fabricated by using materials and processes known in the art to form the film layer structure of the embodiment of the present invention, namely The object of the present invention can be achieved.

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Abstract

一种彩色滤光片基板，在彩色滤光片基板的周边区域20设置有光阻层，多个光阻层相互堆叠，优化彩色滤光片基板的膜层结构，增强膜层支撑性，减轻在ODF工艺中周边区域的下凹程度。膜层结构优化的彩色滤光片基板制程简单，在不改变原有膜层的显示区域的结构设计下，改善显示面板的品质。还提供一种彩色滤光片基板的制作方法，以及包括彩色滤光片基板的液晶显示面板。

Description

彩色滤光片基板及其制作方法与液晶显示面板 技术领域
本发明涉及液晶显示技术领域，特别涉及一种彩色滤光片基板及其制作方法与液晶显示面板。
 背景技术
现有的液晶显示器（Liquid Crystal Display，LCD）显示面板通常包括薄膜晶体管（Thin Film Transistor，TFT）基板和彩色滤光片（Color Filter，CF）基板。图1示意了现有面板周边发黄现象产生的原因。如图1所示，TFT基板包括衬底基板1和TFT膜层8，CF基板包括衬底基板2和黑色矩阵（Black Matrix，BM）遮光层5和彩色光阻9，TFT基板和CF基板对位组装，中间注有液晶层6，有液晶层6的区域为显示区，其中包括显示异常区C和正常显示区D。其他区域为非显示区，其中非显示区包括显示区的周边区域A（Dummy区，也可称为过渡区）和外引脚贴合区B（OLB）。TFT基板和CF基板通过密封框胶4组合，在显示区和周边区域分别设置隔垫物3和隔垫物7进行支撑，保持面板结构平整，维持盒厚（Cell Gap）一致。
 技术问题
在液晶面板制造过程当中，实施ODF（One Drop Filling，液晶滴下制程）时，经过真空组立工艺抽真空，此时，两侧基板之间的周边区域内会出现真空腔体。现有周边区域CF膜层架构支撑度不够，在基板外侧大气压的作用下周边区域基板容易发生凹陷，使紧邻Panel周边翘起，发生“跷跷板”效应，面板的平整度不佳，LCD显示的画面边缘出现发黄现象。
 技术解决方案
本发明提供一种彩色滤光片基板及其制作方法与液晶显示面板，所述彩色滤光片基板改善周边区域的膜层结构，提高了膜层的支撑性，避免周边区域下凹，改善了液晶显示面板的周边发黄现象。
本发明首先提供一种彩色滤光片基板，包括显示区和周边区域，所述周边区域设置有遮光层和光阻层，并且所述周边区域的光阻层包括多个彩色光阻，所述多个彩色光阻堆叠设置，在垂直于彩色滤光片基板方向的投影相互重叠。
在一些实施方案中，所述周边区域的光阻层包括蓝色光阻、绿色光阻、红色光阻中的至少两种。
在一些实施方案中，所述周边区域还设置有保护层和隔垫物层，所述周边区域内遮光层、光阻层、保护层（Over Coat，OC层）和隔垫物层堆叠设置，所述遮光层、光阻层、保护层和隔垫物层在垂直于彩色滤光片基板方向上的投影相互重叠。
在一些实施方案中，所述彩色滤光片基板的显示区设有遮光层和光阻层，所述显示区的遮光层为黑色矩阵结构，将所述基板划分为多个像素区域，所述光阻层分布在所述像素区域内。
在一些实施方案中，所述彩色滤光片基板的显示区还设有保护层、公共电极层和第一配向膜层。
在一些实施方案中，所述周边区域的遮光层连续分布，所述周边区域的遮光层厚度等于所述显示区内的黑色矩阵厚度。
本发明还提供一种液晶显示面板，包括相对平行设置的薄膜晶体管基板、如上所述的彩色滤光片基板，以及分布在两基板之间的液晶层，所述液晶层分布于彩色滤光片基板显示区所对应的位置。
在一些实施方案中，所述隔垫物层设有多个隔垫物，且在周边区域中，所述多个隔垫物与薄膜晶体管基板之间的间隙距离彼此相同。
本发明进一步提供一种显示装置，包括如上所述的液晶面板。
本发明还提供一种彩色滤光片基板的制作方法，包括如下步骤：
在衬底基板的显示区和周边区域形成遮光层，将显示区的遮光层蚀刻为矩阵分布图案，将显示区的基板划分为多个像素区域；
在所述遮光层上形成光阻层，所述显示区光阻层的不同颜色光阻分布在所述像素区域，所述周边区域的不同颜色光阻堆叠设置；
在所述光阻层上形成保护层；
在所述周边区域的保护层上形成隔垫物层；及
所述周边区域的遮光层、光阻层、保护层和隔垫物层均堆叠设置。
在一些实施方案中，在所述周边区域的所述隔垫物层设有多个隔垫物，所述多个隔垫物的图案是采用半透膜掩膜板工艺形成的。
 有益效果
本发明通过在周边区域的彩色滤光片基板中增加光阻层，多个光阻层相互堆叠，优化彩色滤光片基板膜层结构，增强膜层支撑性，减轻在ODF工艺中周边区域的下凹程度，改善了液晶显示面板的周边Mura（周边不均）。膜层结构优化的彩色滤光片基板制程简单，不改变原有膜层显示区域设计，具有广泛的应用前景。
 附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其它有益效果显而易见。
图1为现有技术的显示面板周边发黄成因的示意图。
图2为本发明实施例1提供的CF膜层周边区域结构示意图，其中A为CF膜层周边区域结构剖面图，B为CF膜层周边区域结构俯视图；图2B中的四边形、六边形和圆形等形状不代表所述膜层的实际截面形状，仅作为示意性区分各个膜层。
图3为本发明实施例2提供的CF膜层总体结构示意图。
图4为本发明实施例3提供的显示面板结构示意图。
图5为本发明实施例3提供的显示面板ODF制程的状态示意图。
 本发明的实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述。显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
在本发明的描述中，需要理解的是，术语 “长度”、“宽度”、“厚度”、“上”、“下”、等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的结构必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个所述特征。在本申请的描述中，“多个”的含义是两个或大于两个，除非另有明确具体的限定。
下文的公开提供了不同的实施方式或例子用来实现本申请。为了简化本申请的公开，下文中对特定例子进行描述。当然，它们仅仅为示例，并且目的不在于限制本申请。此外，本申请可以在不同例子中重复参考数字和/或参考字母，这种重复是为了简化和清楚的目的，其本身不指示所讨论各种实施方式和/或设置之间的关系。此外，本申请提供了的各种特定的工艺和材料的例子，但是本领域普通技术人员可以意识到其他工艺的应用和/或其他材料的使用。
实施例1
参照图2，实施例1提供一种彩色滤光片基板，包括显示区10和周边区域20，在衬底基板11的周边区域20表面设置有遮光层22和光阻层，所述光阻层包括第一光阻23和第二光阻24，所述第一光阻23和第二光阻24堆叠设置，在垂直于彩色滤光片基板(液晶显示面板)方向的投影相互重叠，例如所述第二光阻24覆盖于第一光阻23的表面。
所述周边区域20的光阻层包括蓝色光阻、绿色光阻、红色光阻中的至少两种。具体来说，所述第一光阻23和第二光阻24为不同颜色的光阻。在一些实施例中，所述第一光阻23为绿色光阻，第二光阻24为蓝色光阻；或者，所述第一光阻23和第二光阻24为其他两种彩色光阻的组合。
所述光阻层的光阻种类可以根据彩色滤光片基板的光阻层制程来决定，尤其是根据显示区10中光阻层13的制程来确定，例如根据显示区10中光阻层13的制程中先制作绿色光阻，再制作蓝色光阻，那么相应的周边区域20中第一光阻23为绿色光阻，第二光阻24为蓝色光阻，二者堆叠设置。
在一些实施方案当中，所述周边区域20还设置有保护层25和隔垫物层26。所述保护层25为平坦化层，所述隔垫物层26作为副隔垫物。参阅图2B，所述周边区域20内遮光层22、光阻层23和光阻层24、保护层25、隔垫物层26堆叠设置，这些膜层在垂直于彩色滤光片基板(液晶显示面板)方向上的投影相互重叠。其中，图2B中的四边形、六边形和圆形等形状不代表所述膜层的实际截面形状，仅为示意性区分各个膜层。
在一些实施方案中，所述周边区域彩色滤光片基板的所有膜层厚度之和与所述显示区内彩色滤光片基板的膜层厚度之和的差值小于一预设阈值，以使两者的厚度大致相等。所述预设阈值可以根据设计盒厚和液晶显示面板的显示效果来确定。
在所述彩色滤光片基板中，可以调整第一光阻23和第二光阻层24的厚度来调节周边区域20与显示区10的总体膜层厚度，减少周边区域20与显示区10的段差。
在一些实施方案当中，所述第一光阻23和第二光阻24单独的膜层厚度分别为2.0-3.0μm(微米)，所述第一光阻23和第二光阻24堆叠后的厚度约为3.5-5.0μm。
在一些实施方案中，所述隔垫物层26堆叠于所述保护层25的表面。
实施例2
参照图2和图3，本发明实施例2提供一种彩色滤光片基板，其包括显示区10和周边区域20，其中周边区域20与实施例1相同。进一步地，在显示区10设置遮光层12和光阻层13，所述显示区10的遮光层12为黑色矩阵结构，将所述衬底基板11划分为多个像素区域。所述光阻层13包括红色光阻（R）、绿色光阻（G）和蓝色光阻（B），所述光阻分布在所述像素区域内。
所述彩色滤光片基板的显示区10还设有保护层14、公共电极层15和第一配向膜层16。
所述周边区域20的遮光层连续分布，所述周边区域20的遮光层22厚度等于所述显示区10内的黑色矩阵（遮光层12）厚度。
在一些实施方案中，所述显示区10和周边区域20的遮光层和保护层在同一个制程步骤中完成。例如在CF基板制程中，在衬底基板11上形成遮光层，覆盖显示区10和周边区域20，再将显示区10的遮光层形成黑色矩阵图案，形成遮光层12，周边区域20的遮光层连续分布，形成遮光层22。例如，在CF基板制程中，在彩色光阻膜层完成后，形成保护层，覆盖显示区10和周边区域20，分别形成保护层14和保护层25。本实施例中遮光层和保护层可以根据本领域已知的制程工艺实现。
实施例3
实施例3提供一种液晶显示面板，参照图3和图4，液晶显示面板包括相对平行设置的薄膜晶体管基板、彩色滤光片基板、以及分布在两基板之间的液晶层。液晶显示面板的彩色滤光片基板具有如实施例2相同的结构，薄膜晶体管基板具有衬底基板21，并在衬底基板21上设置TFT膜层17，在显示区10对应的TFT膜层17上设置有第二配向膜18，所述第二配向膜18与彩色滤光片基板的第一配向膜16相对，二者之间设置有液晶层19。液晶层19的间隙可以设置有间隙子（Spacer）20。
在一些实施方案中，所述彩色滤光片基板中隔垫物26在光阻曝光显影工艺中的掩膜板上设置有开口区，故可在光阻曝光显影工艺后形成隔垫物图案，使得多个所述隔垫物26与薄膜晶体管基板具有一个以上的接触点。接触点的设置和隔垫物图案根据薄膜晶体管基板的地形和设计盒厚确定，实现彩色滤光片基板和薄膜晶体管基板对位准确，显示区10与周边区域20膜层厚度一致；在周边区域20中，所述多个隔垫物26与薄膜晶体管基板之间的间隙距离彼此相同。所述多个隔垫物26的图案可以采用半透膜掩膜板工艺形成。
参照图5，在与图1所示的现有技术的面板相比，本发明实施例提供的液晶显示面板不改变其他膜层结构，仍保留TFT基板（包括衬底基板1和TFT膜层8），CF基板（包括衬底基板2和黑色矩阵（Black Matrix，BM）遮光层5和彩色光阻9），TFT基板和CF基板对位组装，中间注有液晶层6，TFT基板和CF基板通过密封框胶4组合，在显示区和周边区域分别设置隔垫物3和隔垫物7进行支撑。在此基础上通过对周边区域彩色滤光片基板膜层架构进行优化，采用光阻层9a例如双色光阻或多色光阻层堆叠提高了膜层的支撑性，在ODF制程中，即使出现真空腔体，彩色滤光片基板膜层也可以对基板实现有效支撑，从而减小了周边区域与显示区的盒厚差异，有效避免了周边区域凹陷导致的黄光现象，改善面板显示品质。
本发明实施例还提供一种彩色滤光片基板的制作方法，包括如下步骤：
在衬底基板11的显示区10和周边区域20形成遮光层，将显示区10的遮光层12蚀刻为矩阵分布图案，将显示区10的基板划分为多个像素区域；周边区域20的遮光层22保持连续分布或者蚀刻图案；
在衬底基板11所有区域的遮光层上形成光阻层，所述显示区10光阻层的不同颜色光阻（RGB）分布在所述像素区域，周边区域20不同颜色的光阻堆叠设置；
在衬底基板11所有区域的光阻层上形成保护层，覆盖显示区10和周边区域20，分别形成保护层14和保护层25；
在周边区域20的保护层14上形成隔垫物层26；及
所述周边区域20的遮光层22、光阻层23和24、保护层25和隔垫物层26均堆叠设置，在垂直面板方向上的投影相互重叠。
在一些实施方案中，所述周边区域20的光阻堆叠顺序与显示区10光阻层制程中的涂布顺序保持一致，周边区域20的光阻制作与显示区10光阻制作优选在同一个制程中完成；例如，显示区10先进行G光阻的制作，再进行B光阻的制作，相应地，在显示区10形成G光阻时，在周边区域20也形成G光阻层，随后在显示区10形成B光阻时，在周边区域20也形成B光阻层，周边区域20的B光阻层堆叠于G光阻层表面。
在一些实施方案中，彩色滤光片基板的制作方法还包括在显示区10的保护层16表面依次设置公共电极层15和第一配向膜层16，例如公共电极层15为ITO金属层。
本发明实施例还包括制作一种液晶显示面板，分别制备彩色滤光片基板和薄膜晶体管基板，然后将两基板对位，实施ODF制程。
本发明实施例中彩色滤光片基板和薄膜晶体管基板的各个膜层的材料和制备工艺没有特殊的限定，可以采用本领域已知的材料和工艺制作，形成本发明实施例的膜层结构即可实现本发明的目的。
以上对本发明实施方案所提供的彩色滤光片基板、液晶显示面板进行了详细介绍，本文中应用了具体个例对本发明的原理及实施方式进行了阐述，以上实施方案的说明只是用于帮助理解本发明的技术方案及其核心思想；本领域的普通技术人员应当理解：其依然可以对前述各实施方案所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本申请各实施方案的技术方案的范围。

Claims (15)

  1. 一种彩色滤光片基板，包括显示区和周边区域，其中所述周边区域设置有遮光层和光阻层，并且所述周边区域的光阻层包括多个彩色光阻，所述多个彩色光阻堆叠设置，且在垂直于彩色滤光片基板方向的投影相互重叠。
  2. 根据权利要求1所述的彩色滤光片基板，其中所述周边区域的光阻层包括蓝色光阻、绿色光阻、红色光阻中的至少两种。
  3. 根据权利要求1所述的彩色滤光片基板，其中所述周边区域还设置有保护层和隔垫物层。
  4. 根据权利要求1所述的彩色滤光片基板，其中所述周边区域内遮光层、光阻层、保护层和隔垫物层堆叠设置，所述遮光层、光阻层、保护层和隔垫物层在垂直于彩色滤光片基板方向上的投影相互重叠。
  5. 根据权利要求1所述的彩色滤光片基板，其中所述彩色滤光片基板的显示区设有遮光层和光阻层。
  6. 根据权利要求1所述的彩色滤光片基板，其中所述显示区的遮光层为黑色矩阵结构，所述黑色矩阵结构将所述基板划分为多个像素区域，所述显示区的光阻层分布在所述像素区域内。
  7. 根据权利要求6所述的彩色滤光片基板，其中所述周边区域的遮光层连续分布，所述周边区域的遮光层厚度等于所述显示区内的黑色矩阵厚度。
  8. 根据权利要求6所述的彩色滤光片基板，其中所述彩色滤光片基板的显示区还设有保护层、公共电极层和第一配向膜层。
  9. 一种液晶显示面板，包括相对平行设置的薄膜晶体管基板、彩色滤光片基板，和两基板之间的液晶层，其中所述彩色滤光片基板为权利要求1-8任一项所述的彩色滤光片基板。
  10. 根据权利要求9所述的液晶显示面板，其中所述周边区域还设置有保护层和隔垫物层，所述周边区域内遮光层、光阻层、保护层和隔垫物层堆叠设置，所述遮光层、光阻层、保护层和隔垫物层在垂直于彩色滤光片基板方向上的投影相互重叠，所述隔垫物层设有多个隔垫物，且在周边区域中，所述多个隔垫物与薄膜晶体管基板之间的间隙距离彼此相同。
  11. 一种彩色滤光片基板的制作方法，其包括如下步骤：
    在衬底基板的显示区和周边区域形成遮光层，将显示区的遮光层蚀刻为矩阵分布图案，形成黑色矩阵结构，将显示区的基板划分为多个像素区域；
    在所述显示区和周边区域的遮光层上形成光阻层，所述显示区光阻层的不同颜色光阻分布在所述像素区域内，所述周边区域的不同颜色光阻堆叠设置；
    在所述显示区和周边区域的光阻层上形成保护层；
    在所述周边区域的保护层上形成隔垫物层；及
    所述周边区域的遮光层、光阻层、保护层和隔垫物层均堆叠设置。
  12. 根据权利要求11所述的彩色滤光片基板的制作方法，其中所述显示区和周边区域形成遮光层在同一个制程中完成，所述显示区的遮光层蚀刻为矩阵分布图案，所述周边区域的遮光层连续分布。
  13. 根据权利要求11所述的彩色滤光片基板的制作方法，其中所述周边区域的遮光层厚度等于所述显示区内的黑色矩阵厚度。
  14. 根据权利要求11所述的彩色滤光片基板的制作方法，其中所述显示区和周边区域的光阻层在同一个制程中完成。
  15. 根据权利要求11所述的彩色滤光片基板的制作方法，其中在所述周边区域的所述隔垫物层设有多个隔垫物，所述多个隔垫物的图案是采用半透膜掩膜板工艺形成的。
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