WO2022004415A1 - 光ファイバ母材の製造方法及び光ファイバ母材 - Google Patents
光ファイバ母材の製造方法及び光ファイバ母材 Download PDFInfo
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- WO2022004415A1 WO2022004415A1 PCT/JP2021/023094 JP2021023094W WO2022004415A1 WO 2022004415 A1 WO2022004415 A1 WO 2022004415A1 JP 2021023094 W JP2021023094 W JP 2021023094W WO 2022004415 A1 WO2022004415 A1 WO 2022004415A1
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- Prior art keywords
- optical fiber
- etching
- base material
- fiber base
- glass pipe
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- 239000013307 optical fiber Substances 0.000 title claims abstract description 67
- 239000000463 material Substances 0.000 title claims abstract description 55
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 27
- 239000011521 glass Substances 0.000 claims abstract description 144
- 238000005530 etching Methods 0.000 claims abstract description 129
- 239000002585 base Substances 0.000 claims abstract description 53
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 48
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 41
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 25
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims abstract description 22
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 22
- 150000001342 alkaline earth metals Chemical class 0.000 claims abstract description 19
- 230000002159 abnormal effect Effects 0.000 claims description 40
- 238000000034 method Methods 0.000 claims description 35
- 239000000460 chlorine Substances 0.000 claims description 25
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 23
- 229910052801 chlorine Inorganic materials 0.000 claims description 23
- 239000011737 fluorine Substances 0.000 claims description 19
- 229910052731 fluorine Inorganic materials 0.000 claims description 19
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 14
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 14
- 229910052794 bromium Inorganic materials 0.000 claims description 14
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 6
- 229910052700 potassium Inorganic materials 0.000 claims description 6
- 239000011591 potassium Substances 0.000 claims description 6
- 229910052701 rubidium Inorganic materials 0.000 claims description 6
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 3
- 239000007789 gas Substances 0.000 description 19
- 230000002950 deficient Effects 0.000 description 17
- 239000002994 raw material Substances 0.000 description 17
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 16
- 230000005540 biological transmission Effects 0.000 description 16
- 239000013078 crystal Substances 0.000 description 14
- 238000011156 evaluation Methods 0.000 description 12
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 12
- JAAGVIUFBAHDMA-UHFFFAOYSA-M rubidium bromide Chemical compound [Br-].[Rb+] JAAGVIUFBAHDMA-UHFFFAOYSA-M 0.000 description 8
- 238000002425 crystallisation Methods 0.000 description 7
- 230000008025 crystallization Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 239000010419 fine particle Substances 0.000 description 6
- 239000002019 doping agent Substances 0.000 description 5
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 5
- 238000000227 grinding Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- WFUBYPSJBBQSOU-UHFFFAOYSA-M rubidium iodide Chemical compound [Rb+].[I-] WFUBYPSJBBQSOU-UHFFFAOYSA-M 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000012159 carrier gas Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000012792 core layer Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01861—Means for changing or stabilising the diameter or form of tubes or rods
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/01205—Manufacture of preforms for drawing fibres or filaments starting from tubes, rods, fibres or filaments
- C03B37/01225—Means for changing or stabilising the shape, e.g. diameter, of tubes or rods in general, e.g. collapsing
- C03B37/01228—Removal of preform material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/01205—Manufacture of preforms for drawing fibres or filaments starting from tubes, rods, fibres or filaments
- C03B37/01225—Means for changing or stabilising the shape, e.g. diameter, of tubes or rods in general, e.g. collapsing
- C03B37/01248—Means for changing or stabilising the shape, e.g. diameter, of tubes or rods in general, e.g. collapsing by collapsing without drawing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01466—Means for changing or stabilising the diameter or form of tubes or rods
- C03B37/01473—Collapsing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01861—Means for changing or stabilising the diameter or form of tubes or rods
- C03B37/01869—Collapsing
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/66—Chemical treatment, e.g. leaching, acid or alkali treatment
- C03C25/68—Chemical treatment, e.g. leaching, acid or alkali treatment by etching
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/50—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with alkali metals
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/54—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with beryllium, magnesium or alkaline earth metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/11—Doped silica-based glasses containing boron or halide containing chlorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/50—Doped silica-based glasses containing metals containing alkali metals
Definitions
- This disclosure relates to a method for manufacturing an optical fiber base material and an optical fiber base material.
- This application claims priority based on Japanese Application No. 2020-115688 filed on July 3, 2020, and incorporates all the contents described in the Japanese application.
- the core made of silica-based glass contains an alkali metal element or an alkaline earth metal element, the viscosity of the core is reduced when the optical fiber base material is drawn to manufacture the optical fiber, and the glass is regenerated. The sequence is promoted. Therefore, the transmission loss due to the ray scattering of the optical fiber is reduced. As a result, the transmission loss can be reduced.
- Patent Document 1 Patent Document 2, and Patent Document 3 describe a method of adding a metal element or an alkaline earth metal element to the core portion of an optical fiber base material by a diffusion method.
- the method for producing the optical fiber base material of the present disclosure is to add an alkali metal element or an alkaline earth metal element to the inner surface of a glass pipe made of silica-based glass, and to reduce the diameter of the glass pipe after the addition. It includes etching the inner surface of a series of longitudinal sections of the glass pipe after diameter and collapsing the glass pipe after etching. At least one of adding, reducing the diameter, etching, and collapsing involves locally etching the inner surface of a section of the glass pipe that is shorter than a series of sections.
- the method for producing the optical fiber base material of the present disclosure is to add an alkali metal element or an alkaline earth metal element to the inner surface of a glass pipe made of silica-based glass, and to reduce the diameter of the glass pipe after the addition. Etching and etching the inner surface of a series of longitudinal sections of the glass pipe after diameter, and collapsing the glass pipe after etching, and between adding and reducing the diameter. This includes locally etching a section of the inner surface of the glass pipe that is shorter than a series of sections, and at least one of between etching and collapsing.
- the optical fiber base material of the present disclosure is made of silica-based glass and includes a core portion containing an alkali metal element or an alkaline earth metal element, and the concentration of the alkali metal element or the alkaline earth metal element in the core portion is in the longitudinal direction. It is different for some parts and other parts.
- the optical fiber base material of the present disclosure is made of silica-based glass and has a core portion containing an alkali metal element or an alkaline earth metal element, and the core portion contains bromine in a part or all in the longitudinal direction.
- an alkali metal element or an alkaline earth metal element is added to the inner surface of a glass pipe made of silica-based glass, and the diameter of the glass pipe is reduced after the addition.
- At least one of adding, reducing the diameter, etching, and collapsing involves locally etching the inner surface of a section of the glass pipe that is shorter than a series of sections.
- local etching is shorter than the fixed length range within or outside the fixed length range in which the heat source moves during addition, reduction, etching, and collapse. It means etching limited to one or more sections. Even in a non-local etching process, the amount of glass to be scraped is not constant due to fluctuations in the moving speed of the heat source and changes in the flow of the etching gas, and there are minute fluctuations in the amount of glass to be scraped.
- local etching is performed by intentionally changing conditions such as heat source temperature, etching gas flow rate, and heat source transfer speed during addition, diameter reduction, etching, and collapse, or addition, diameter reduction. , Etching, added separately during the collapse process.
- an alkali metal element or an alkaline earth metal element is added to the inner surface of a glass pipe made of silica-based glass, and the glass pipe is shrunk after the addition.
- any of the methods for manufacturing an optical fiber base material can be removed. Therefore, it is possible to prevent the defective portion from expanding due to the enlargement of the generated crystal and the fine particles scattered from the crystal causing crystals to be generated at other locations and the number of defective portions to increase. As a result, productivity can be improved while suppressing transmission loss by adding an alkali metal element or an alkaline earth metal element.
- Local etching may be performed on one or more points in a series of sections. In this case, defective parts such as crystallization generated in the part to be a product can be removed.
- Local etching may be performed on one or more locations other than a series of sections. In this case, defective parts such as crystallization generated in parts other than the parts to be made into products can be removed.
- the optical fiber base material according to the embodiment of the present disclosure is made of silica-based glass, includes a core portion containing an alkali metal element or an alkaline earth metal element, and the concentration of the alkali metal element or the alkaline earth metal element in the core portion. Is different for a part in the longitudinal direction and a part other than a part.
- the concentration of alkali metal element or alkaline earth metal element is locally low due to the effect of local etching.
- the difference in transmission loss at a wavelength of 1550 nm is small between the optical fiber derived from the locally etched portion and the optical fiber derived from the locally etched portion.
- the optical fiber base material according to the embodiment of the present disclosure is made of silica-based glass, includes a core portion containing an alkali metal element or an alkaline earth metal element, and the core portion contains bromine in a part or all in the longitudinal direction. Includes.
- the glass viscosity can be lowered due to the effect of the addition of bromine, and the transmission loss becomes lower than that in the case where the bromine is not added.
- FIG. 1 is a flowchart illustrating a method for manufacturing an optical fiber according to the present embodiment.
- the optical fiber includes a preparation process S1, an addition process S2, a diameter reduction process S3, an etching process S4, a collapse process S5, a drawing grinding process S6, a rod-in collapse process S7, an OVD (Outside Vapor Deposition) process S8, and a drawing process S9. Manufactured in order.
- the optical fiber base material 10 (see FIG. 3) is manufactured through a preparation step S1, an addition step S2, a diameter reduction step S3, an etching step S4, a collapse step S5, a draw grinding step S6, a rod in collapse step S7, and an OVD step S8.
- the method for manufacturing the optical fiber base material according to the present embodiment includes the preparation step S1, the addition step S2, the diameter reduction step S3, the etching step S4, the collapse step S5, the draw grinding step S6, the rod in collapse step S7, and the OVD step. Including S8.
- the preparation step S1 is a step of preparing a glass pipe to diffuse the alkali metal group as a dopant.
- the alkali metal group is a general term for alkali metal elements and alkaline earth metal elements.
- the glass pipe is made of silica (quartz) glass.
- the silica-based glass rod that is the basis of this glass pipe is manufactured by, for example, the VAD (Vapor phase axial depression) method.
- a pipe is manufactured by making a hole in the cylinder and then stretching it.
- the silica-based glass rod that forms the basis of the glass pipe contains a certain concentration of chlorine and fluorine.
- the mass fraction of other dopants and impurities is 10 ppm or less.
- the mass fraction is the ratio of the mass of the element of interest to the total mass, and is expressed as (mass of the element of interest) / (total mass).
- the mass fraction is referred to as "concentration".
- the outer diameter (2d) of the glass pipe is 30 mm or more and 50 mm or less.
- the inner diameter (2i) of the glass pipe is 10 mm or more and 30 mm or less.
- the glass pipe contains chlorine having an average concentration of 0 or more and 2500 ppm or less, and fluorine having an average concentration of 1000 ppm or more and 5000 ppm or less.
- the concentration of dopants and impurities other than chlorine and fluorine in the glass pipe is 10 ppm or less.
- the average concentration is, for example, the concentration represented by the following formula in the case of the average chlorine concentration.
- Cl (r) represents the local chlorine concentration at the position of the radius r.
- i represents the inner radius of the glass pipe.
- d represents the outer radius of the glass pipe.
- the local concentration is measured by an electron probe microanalyzer (EPMA) as a concentration at each position along a straight line passing through a central position on an end face of a glass pipe and a glass rod.
- EPMA electron probe microanalyzer
- the conditions for measurement by EPMA are, for example, an acceleration voltage of 20 kV, a probe beam diameter of 1 ⁇ m or less, and a measurement interval of 100 nm or less.
- the addition step S2 is a step of adding an alkali metal group to the inner surface of a glass pipe made of silica-based glass.
- potassium (K) element for example, potassium bromide (KBr) of 6 g or more and 20 g or less is used as a raw material.
- KBr potassium bromide
- one or more of KBr, potassium iodide (KI), rubidium bromide (RbBr), rubidium iodide (RbI) and the like may be used as a raw material.
- FIG. 2 is a diagram illustrating an addition process.
- a handling glass pipe 5 arranged in the electric furnace 2 is connected to one end of the glass pipe 1.
- a part of the handling glass pipe 5 is used as a raw material reservoir, and the raw material 3 is installed.
- a part of the glass pipe 1 may be used as a raw material reservoir.
- An oxyhydrogen burner 4 is arranged outside the glass pipe 1.
- the electric furnace 2 is an external heat source for heating the raw material 3
- the oxyhydrogen burner 4 is an external heat source for heating the glass pipe 1.
- an induction furnace, a resistance furnace, or the like may be used.
- the raw material 3 is heated to a temperature of 700 ° C. or higher and 850 ° C. or lower by the electric furnace 2 to generate raw material steam.
- the glass pipe 1 is heated from the outside by the oxyhydrogen burner 4 while introducing the generated raw material vapor into the inside of the glass pipe 1 together with the carrier gas composed of oxygen.
- the flow rate of the carrier gas is 1 SLM (volume in the standard state (25 ° C., 100 kPa) of the gas flowing per minute) or more and 3 SLM or less.
- the glass pipe 1 is heated by moving the oxyhydrogen burner 4 (external heat source) along the longitudinal direction of the glass pipe 1.
- the heating of the glass pipe 1 is performed by traversing the oxyhydrogen burner 4 at a speed of 30 mm / min or more and 60 mm / min or less so that the temperature of the outer surface of the glass pipe 1 becomes 1400 ° C. or higher and 2000 ° C. or lower for a total of 8 turns. It will be done in 15 turns or less. As a result, the alkali metal group is diffusely added to the inner surface of the glass pipe 1.
- the diameter reduction step S3 is a step of reducing the diameter of the glass pipe to which the alkali metal group is added after the addition step S2.
- the glass pipe is heated from the outside by an external heat source while oxygen is flowing inside the glass pipe at 0.5 SLM or more and 1.0 SLM or less.
- the glass pipe is heated by moving the external heat source along the longitudinal direction of the glass pipe.
- the heating of the glass pipe is performed in a total of 6 turns or more and 10 turns or less by traversing an external heat source so that the outer surface of the glass pipe becomes 1300 ° C. or higher and 2000 ° C. or lower.
- the glass pipe is reduced in diameter until the inner diameter is 3 mm or more and 5 mm or less.
- the etching step S4 is a step of etching the inner surface of a series of longitudinal sections of the glass pipe after the diameter reduction step S3.
- the glass pipe is heated from the outside by an external heat source. Gas phase etching is performed. By doing so, it is possible to scrape the inner surface of the pipe containing impurities added together with the target dopant at a high concentration, and it is possible to remove these impurities.
- the glass pipe is heated by moving the external heat source along the longitudinal direction of the glass pipe. The heating of the glass pipe is performed in a total of 1 turn or more and 5 turns or less by traversing an external heat source so that the outer surface of the glass pipe becomes 1300 ° C. or higher and 2000 ° C. or lower.
- the collapse step S5 is a step of collapsing the glass pipe after the etching step S4.
- a mixed gas of oxygen (0.1 SLM or more and 0.5 SLM or less) and He (0.5 SLM or more and 1.0 SLM or less) is introduced into the glass pipe, and the absolute pressure in the glass pipe is reduced to 97 kPa or less while reducing the surface surface.
- the temperature is set to 2000 or more and 2300 ° C. or less, and the glass pipe is closed. As a result, the glass pipe is solidified, and a glass rod (medium substance) having a diameter (outer diameter) of 20 mm or more and 40 mm or less can be obtained.
- the glass rod is stretched to have a diameter of 20 mm or more and 25 mm or less, and the outer peripheral portion of the glass rod is further ground to have a diameter of 15 mm or more and 20 mm or less.
- the glass rod (core rod) thus obtained becomes the core portion 11 (see FIG. 3) of the optical fiber base material 10.
- a core layer containing no alkali metal group may be provided around the core portion 11 by a known method such as an OVD method or a collapse method.
- the first clad portion 12 (see FIG. 3) is provided on the outside of the core portion 11.
- a rod-in-collapsing method is used in which the core portion 11 is inserted inside a glass pipe of silica-based glass containing fluorine, and both are heated and integrated by an external heat source.
- the water content of the core portion 11 and the first clad portion 12 in the vicinity thereof can be suppressed to be sufficiently low.
- a rod in which the core portion 11 and the first clad portion 12 are integrated is stretched to have a predetermined diameter, and then a second clad portion 13 (see FIG. 3) containing fluorine is attached to the outside of the rod.
- the optical fiber base material 10 is manufactured by synthesizing by the OVD method.
- an optical fiber can be obtained by drawing the optical fiber base material 10.
- the drawing speed is 800 m / min or more and 2300 m / min or less, and the drawing tension is, for example, 0.5 N.
- the alkali metal group is added to the inner surface of the glass pipe.
- the glass pipe contains chlorine and fluorine for the suppression of glass defects and the adjustment of the refractive index. Therefore, chlorides and fluorides of the alkali metal group may be generated, and the surrounding silica glass may crystallize with them as nuclei. If the crystallization of silica glass is left unattended and the addition step S2 is advanced, the size of the defective portion increases due to the increase in size of the crystals, and the yield decreases. In addition, the defective portion (crystal portion) may generate crystals having fine particles as nuclei in other portions by scattering fine particles such as glass. As the process of forming the defective portion, there are various cases where not only the case caused by chloride and fluoride but also the case where a minute foreign substance flowing from the upstream of the glass pipe becomes a nucleus.
- the above-mentioned crystallization may occur in any step from the addition step S2 to the collapse step S5.
- the problem is that the defective part expands due to the enlargement of the generated crystal, and the fine particles scattered from the crystal cause crystals to be generated at other parts and the number of defective parts increases.
- the section of the glass pipe shorter than a series of sections is included. Additional local etching is performed only on the surface. The local etching is performed in at least one of the addition step S2, the diameter reduction step S3, the etching step S4, and the collapse step S5. Local etching is performed in at least one of the addition step S2 and the diameter reduction step S3, the diameter reduction step S3 and the etching step S4, and the etching step S4 and the collapse step S5. You may.
- the defective part which is an abnormal part
- the defective part By performing additional local etching, it is possible to prevent the defective part, which is an abnormal part, from expanding, and the defective part from being generated at other parts to increase the number of defective parts.
- Most of the abnormal parts scatter light unlike the normal parts. Therefore, the abnormal portion can be identified by irradiating the light and detecting the scattered light. Local etching may be performed until no light scattering due to the abnormal portion is observed. However, even if the abnormal part is not completely removed, it may be possible to suppress the scattering to other parts by reducing the size of the abnormal part.
- the alkali metal group added in the addition step S2 may be removed by etching, and the concentration of the alkali metal group may change locally.
- the concentration of the alkali metal group may change locally.
- the optical fiber after drawing only the portion having different characteristics becomes a defective portion, so that the reduction in yield can be minimized. Therefore, it is possible to improve the productivity while suppressing the transmission loss by adding the alkali metal group.
- Local etching is performed on one or more locations within the moving range of an external heat source such as an oxyhydrogen burner in the addition step S2, the diameter reduction step S3, and the etching step S4.
- Local etching is effective not only for the moving range of the external heat source but also for the abnormal part such as a crystal generated outside the moving range of the external heat source. This is because the fine particles may be scattered from the abnormal portion generated outside the moving range of the external heat source, causing crystals to be generated in other places. Therefore, the local etching may be performed on one or more locations outside the moving range of the external heat source such as the oxyhydrogen burner in the addition step S2, the diameter reduction step S3, and the etching step S4.
- the local etching is a gas phase etching, in which a mixed gas of SF 6 (0.1 SLM or more and 0.4 SLM or less) and chlorine (0.5 SLM or more and 1.0 SLM or less) is introduced into the glass pipe while being introduced to the outside. This is done by heating the glass pipe with a heat source.
- the local etching may be performed with the external heat source fixed at the location of the abnormal portion, or may be performed while moving the external heat source.
- a mixed gas of SF 6 and bromine may be used instead of the mixed gas of SF 6 and chlorine.
- the gas flowing in the step is temporarily stopped and the above-mentioned flow rate of SF 6 and chlorine is flowed.
- Local etching may be performed. Local etching is performed with the surface temperature of the pipe set to 1000 ° C. or higher and 1500 ° C. or lower by an external heat source.
- FIG. 3 is a cross-sectional view of the optical fiber base material according to the present embodiment.
- the optical fiber base material 10 includes a core portion 11, a first clad portion 12, and a second clad portion 13.
- the core portion 11 is made of silica-based glass.
- the core portion 11 contains an alkali metal group, chlorine, and fluorine.
- the average concentration of the alkali metal group in the core portion 11 is 10 ppm or more and 100 ppm or less.
- the average concentration of chlorine in the core portion 11 is 50 ppm or more and 2000 ppm or less.
- the average concentration of fluorine in the core portion 11 is 2000 ppm or more and 3500 ppm or less.
- the concentration of the alkali metal group in the core portion 11 is different from the portion other than the portion in the longitudinal direction.
- the concentration of the alkali metal group in the portion where the local etching is performed is lower than the concentration of the alkali metal group in the other portion.
- the core portion 11 contains bromine in part or all of the longitudinal direction. Bromine is contained in the center of the core portion 11.
- the first clad portion 12 is provided on the outside of the core portion 11 and surrounds the core portion 11.
- the first clad portion 12 is made of silica-based glass.
- the first clad portion 12 contains fluorine.
- the difference in the refractive index standardized by the refractive index of the pure silica glass between the core portion 11 and the first clad portion 12 is about 0.34% at the maximum.
- the second clad portion 13 is provided on the outside of the first clad portion 12 and surrounds the first clad portion 12.
- the second clad portion 13 is made of silica-based glass.
- the second clad portion 13 contains fluorine.
- Table 1 is a table summarizing the specifications and evaluation results of Prototype Example 1 to Prototype Example 6.
- “Cl concentration [ppm]” in Table 1 indicates the average chlorine concentration contained in the glass rod after the collapse step S5 is completed.
- “F concentration [ppm]” indicates the average fluorine concentration contained in the glass rod after the collapse step S5 is completed.
- K concentration [ppm]” indicates the average potassium concentration contained in the glass rod after the collapse step S5 is completed.
- the “abnormal number of parts” indicates the number of abnormal parts such as crystals remaining on the glass rod after the collapse step S5 is completed.
- “Local etching” indicates the presence or absence of local etching and the etching gas used when there is.
- “Raw material” indicates a raw material used in the addition step S2.
- Prototype 1 to Prototype 6 15 g of KBr was used as a raw material in the addition step S2. In Prototype 1 to Prototype 4, local etching was not performed. From the evaluation results of Prototype Example 1 to Prototype Example 4, it was found that the higher the total value of the average chlorine concentration and the average fluorine concentration in the glass pipe, the larger the number of abnormal parts when local etching was not performed. ..
- Prototype 5 and Prototype 6 local etching was performed using the etching gas as a mixed gas of SF 6 and chlorine. Local etching may be performed immediately when an abnormality occurs, or it may be performed after one or more steps.
- local etching was performed on the abnormal portion within the moving range of the external heat source in the addition step S2, the diameter reduction step S3, and the etching step S4.
- the number of abnormal copies could be reduced to 3.
- local etching was performed not only within the moving range of the external heat source in the addition step S2, the diameter reducing step S3, and the etching step S4, but also on the abnormal portion generated outside the moving range. In Prototype Example 6, the number of abnormal copies could be reduced to zero.
- An optical fiber was obtained by drawing an optical fiber base material manufactured using the glass rods of Prototype Example 5 and Prototype Example 6. Also in Prototype 5 and Prototype 6 in which local etching was performed, an optical fiber having a transmission loss at a wavelength of 1550 nm of 0.148 dB / km or more and 0.150 dB / km or less was obtained over the entire length of the optical fiber base material. rice field. From this, it was found that there was no significant difference in transmission loss between the portion where the local etching was performed and the portion where the local etching was not performed. This is presumed to be due to the following reasons. That is, in the portion where the local etching is performed, the potassium concentration is reduced, so that the Rayri scattering loss is increased. However, since the inner surface of the glass pipe is smoothed by the extra heating, the loss due to the structural irregularity in the subsequent collapse step S5 is reduced.
- Table 2 is a table summarizing the specifications and evaluation results of Prototype Example 7 to Prototype Example 12.
- “Rb concentration [ppm]” in Table 2 indicates the average rubidium concentration contained in the glass rod after the collapse step S5 is completed. The other items are the same as those in Table 1.
- the average rubidium concentration is obtained by the above formula after measuring the local concentration using the above-mentioned EPMA, similarly to the average chlorine concentration and the average fluorine concentration.
- Prototype 7 to 12 15 g of RbBr was used as a raw material in the addition step S2. In Prototype Example 7 to Prototype Example 10, local etching was not performed. From the evaluation results of Prototype Example 7 to Prototype Example 10, it was found that the higher the total value of the average chlorine concentration and the average fluorine concentration in the glass pipe, the larger the number of abnormal parts when local etching was not performed. ..
- Prototype 11 and Prototype 12 local etching was performed in the same manner as in Prototype 5 and Prototype 6.
- Prototype Example 11 local etching was performed on the abnormal portion within the moving range of the external heat source in the addition step S2 and the diameter reduction step S3.
- the number of abnormal copies could be reduced to 2.
- Prototype Example 12 local etching was performed not only within the moving range of the external heat source in the addition step S2, the diameter reducing step S3, and the etching step S4, but also on the abnormal portion generated outside the moving range. In Prototype Example 12, the number of abnormal copies could be reduced to 1.
- Table 3 is a table summarizing the specifications and evaluation results of Prototype Example 13 to Prototype Example 18. Each item in Table 3 is the same as in Table 1.
- Prototype 13 to 18 15 g of KI was used as a raw material in the addition step S2. In Prototype 13 to 16, local etching was not performed. From the evaluation results of Prototype Example 13 to Prototype Example 16, it was found that the higher the total value of the average chlorine concentration and the average fluorine concentration in the glass pipe, the larger the number of abnormal parts when local etching was not performed. ..
- Prototype 17 and Prototype 18 local etching was performed in the same manner as in Prototype 5 and Prototype 6.
- Prototype Example 17 local etching was performed on the abnormal portion within the moving range of the external heat source in the addition step S2 and the diameter reduction step S3.
- the number of abnormal copies could be reduced to 3.
- Prototype Example 18 local etching was performed not only within the moving range of the external heat source in the addition step S2, the diameter reducing step S3, and the etching step S4, but also on the abnormal portion generated outside the moving range. In Prototype Example 18, the number of abnormal copies could be reduced to 1.
- Table 4 is a table summarizing the specifications and evaluation results of Prototype Example 19 to Prototype Example 24. “Rb concentration [ppm]” in Table 4 indicates the average rubidium concentration contained in the glass rod after the collapse step S5 is completed. The other items are the same as those in Table 1.
- Prototype 19 to 24 two types of KBr and RbBr were used as raw materials in the addition step S2, and the total mass was unified to 15 g. In Prototype 19 to 22, no local etching was performed. From the evaluation results of Prototype Example 19 to Prototype Example 22, it was found that the higher the total value of the average chlorine concentration and the average fluorine concentration in the glass pipe, the larger the number of abnormal parts when local etching was not performed. ..
- Prototype 23 and Prototype 24 local etching was performed in the same manner as in Prototype 5 and Prototype 6. In Prototype Example 23, local etching was performed on the abnormal portion within the moving range of the external heat source in the addition step S2 and the diameter reduction step S3. In Prototype Example 23, the number of abnormal copies could be reduced to 2. In Prototype Example 24, local etching was performed not only within the moving range of the external heat source in the addition step S2, the diameter reducing step S3, and the etching step S4, but also on the abnormal portion generated outside the moving range. In Prototype Example 24, the number of abnormal copies could be reduced to 1.
- Table 5 is a table summarizing the specifications and evaluation results of the prototype 25 to the prototype 30.
- “Br concentration [ppm]” in Table 5 indicates the bromine concentration detected from the center of the glass rod (medium substance) after the collapse step S5 is completed. The other items are the same as those in Table 1.
- the bromine concentration can be determined using the above-mentioned EPMA.
- Prototype Example 25 to Prototype 28 15 g of KBr was used as a raw material in the addition step S2. In Prototype Example 25 to Prototype 28, local etching was not performed. In Prototype 29 and Prototype 30, local etching was performed in the same manner as in Prototype 5 and Prototype 6 except that the etching gas was a mixed gas of SF 6 and bromine. In Prototype Example 29, local etching was performed on the abnormal portion within the moving range of the external heat source in the addition step S2 and the diameter reduction step S3. In Prototype Example 29, the number of abnormal copies could be reduced to 1.
- Prototype Example 30 local etching was performed not only within the moving range of the external heat source in the addition step S2, the diameter reducing step S3, and the etching step S4, but also on the abnormal portion generated outside the moving range. In Prototype Example 30, the number of abnormal copies could be reduced to zero.
- An optical fiber was obtained by drawing an optical fiber base material manufactured using the glass rods of Prototype Example 29 and Prototype Example 30.
- the transmission loss at a wavelength of 1550 nm was 0.148 dB / km or more and 0.149 dB / km or less.
- the transmission loss at a wavelength of 1550 nm was 0.147 dB / km.
- bromine is added because the result is that the transmission loss of the locally etched part is lower than the transmission loss of the locally etched part. It is considered that this is because the glass viscosity is lowered and the ray scattering loss is lowered.
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Abstract
Description
特許文献1、特許文献2、及び特許文献3に記載の方法では、ガラスパイプの内表面にアルカリ金属元素又はアルカリ土類金属元素を添加し始めた後、ガラスの結晶化が発生し、その部分が不良部になる場合がある。加えて、その結晶から微粒子が飛散し、他の部分にも不良部が広がる場合がある。
本開示によれば、伝送損失を抑制しながら、生産性を向上可能な光ファイバ母材の製造方法及び光ファイバ母材を提供することができる。
最初に本開示の実施態様を列記して説明する。本開示の一実施形態に係る光ファイバ母材の製造方法は、シリカ系ガラスからなるガラスパイプの内表面にアルカリ金属元素又はアルカリ土類金属元素を添加することと、添加後にガラスパイプを縮径することと、縮径後にガラスパイプのうち長手方向の一連の区間の内表面をエッチングすることと、エッチング後にガラスパイプをコラプスすることと、を含む。添加すること、縮径すること、エッチングすること、及び、コラプスすることのうち少なくとも1つは、ガラスパイプのうち一連の区間よりも短い区間の内表面を局所的にエッチングすることを含む。ここで、「局所的なエッチング」とは、添加、縮径、エッチング、コラプスを行う際に熱源が移動する一定の長さの範囲の中又は外での、当該一定長さの範囲よりも短い一あるいは複数区間に限定したエッチングを意味する。局所的でないエッチング工程においても、熱源の移動速度の変動やエッチング用ガスの流れの変化により削られるガラスの量は一定とはならず、削られるガラスの量には微小な変動が存在する。しかし、局所的なエッチングは、添加、縮径、エッチング、コラプスを実施中に、意図的に熱源温度、エッチング用ガス流量、熱源移動速度などの条件を変えて行われる、あるいは、添加、縮径、エッチング、コラプス工程の間に別途追加して実施される。
本開示の光ファイバ母材の製造方法及び光ファイバ母材の具体例を、以下に図面を参照しつつ説明する。なお、本開示はこれらの例示に限定されるものではなく、請求の範囲によって示され、請求の範囲と均等の意味及び範囲内でのすべての変更が含まれることが意図される。図面の説明において同一の要素には同一の符号を付し、重複する説明を省略する。
2…電気炉
3…原料
4…酸水素バーナ(外部熱源)
5…ハンドリングガラスパイプ
10…光ファイバ母材
11…コア部
12…第1クラッド部
13…第2クラッド部
Claims (18)
- シリカ系ガラスからなるガラスパイプの内表面にアルカリ金属元素又はアルカリ土類金属元素を添加することと、
前記添加後に前記ガラスパイプを縮径することと、
前記縮径後に前記ガラスパイプのうち長手方向の一連の区間の内表面をエッチングすることと、
前記エッチング後に前記ガラスパイプをコラプスすることと、を含み、
前記添加すること、前記縮径すること、前記エッチングすること、及び、前記コラプスすることのうち少なくとも1つは、前記ガラスパイプのうち前記一連の区間よりも短い区間の内表面を局所的にエッチングすることを含む、
光ファイバ母材の製造方法。 - シリカ系ガラスからなるガラスパイプの内表面にアルカリ金属元素又はアルカリ土類金属元素を添加することと、
前記添加後に前記ガラスパイプを縮径することと、
前記縮径後に前記ガラスパイプのうち長手方向の一連の区間の内表面をエッチングすることと、
前記エッチング後に前記ガラスパイプをコラプスすることと、
前記添加することと前記縮径することとの間、前記縮径することと前記エッチングすることの間、及び、前記エッチングすることと前記コラプスすることとの間のうち少なくとも1つにおいて、前記ガラスパイプのうち前記一連の区間よりも短い区間の内表面を局所的にエッチングすることと、を含む、
光ファイバ母材の製造方法。 - 前記局所的にエッチングすることは、前記一連の区間内の1箇所以上に対して行われる、
請求項1または請求項2に記載の光ファイバ母材の製造方法。 - 前記局所的にエッチングすることは、前記一連の区間以外の1箇所以上に対して行われる、
請求項1から請求項3のいずれか一項に記載の光ファイバ母材の製造方法。 - 前記ガラスパイプは、塩素及びフッ素を含んでいる、
請求項1から請求項4のいずれか一項に記載の光ファイバ母材の製造方法。 - 前記局所的にエッチングすることでは、SF6及び塩素の混合ガスの混合ガスを用いた気相エッチングが行われる、
請求項1から請求項5のいずれか一項に記載の光ファイバ母材の製造方法。 - 前記局所的にエッチングすることでは、SF6及び臭素の混合ガスを用いた気相エッチングが行われる、
請求項1から請求項6のいずれか一項に記載の光ファイバ母材の製造方法。 - 前記局所的にエッチングすることは、前記ガラスパイプに光を照射して散乱光を検出することにより、異常箇所を特定することを含む、
請求項1から請求項7のいずれか一項に記載の光ファイバ母材の製造方法。 - 前記添加することでは、アルカリ金属元素としてカリウムが添加される、
請求項1から請求項8のいずれか一項に記載の光ファイバ母材の製造方法。 - 前記添加することでは、アルカリ金属元素としてルビジウムが添加される、
請求項1から請求項8のいずれか一項に記載の光ファイバ母材の製造方法。 - シリカ系ガラスからなり、アルカリ金属元素又はアルカリ土類金属元素を含むコア部を備え、
前記コア部における前記アルカリ金属元素又は前記アルカリ土類金属元素の濃度は、長手方向の一部で前記一部以外の箇所に対して異なっている、
光ファイバ母材。 - シリカ系ガラスからなり、アルカリ金属元素又はアルカリ土類金属元素を含むコア部を備え、
前記コア部は、長手方向の一部又は全部において臭素を含んでいる、
光ファイバ母材。 - 前記コア部は、塩素及びフッ素を含んでいる、
請求項11または請求項12に記載の光ファイバ母材。 - 前記コア部における塩素の平均濃度は、50ppm以上2000ppm以下である、
請求項13に記載の光ファイバ母材。 - 前記コア部におけるフッ素の平均濃度は、2000ppm以上3500ppm以下である、
請求項13または請求項14に記載の光ファイバ母材。 - 前記コア部におけるアルカリ金属群の平均濃度は、10ppm以上100ppm以下である、
請求項11から請求項15のいずれか一項に記載の光ファイバ母材。 - 前記コア部は、アルカリ金属元素としてカリウムを含んでいる、
請求項11から請求項16のいずれか一項に記載の光ファイバ母材。 - 前記コア部は、アルカリ金属元素としてルビジウムを含んでいる、
請求項11から請求項16のいずれか一項に記載の光ファイバ母材。
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US (1) | US20230202904A1 (ja) |
JP (1) | JPWO2022004415A1 (ja) |
DK (1) | DK202270544A1 (ja) |
WO (1) | WO2022004415A1 (ja) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2010520140A (ja) * | 2007-02-28 | 2010-06-10 | コーニング インコーポレイテッド | 圧密中の光ファイバケーン/プレフォーム変形の削減 |
WO2013105459A1 (ja) * | 2012-01-11 | 2013-07-18 | 住友電気工業株式会社 | 光ファイバ母材製造方法及び光ファイバ |
WO2016114313A1 (ja) * | 2015-01-14 | 2016-07-21 | 住友電気工業株式会社 | 光ファイバ |
WO2019044833A1 (ja) * | 2017-08-31 | 2019-03-07 | 住友電気工業株式会社 | 光ファイバ母材の製造方法、及び、光ファイバの製造方法 |
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2021
- 2021-06-17 JP JP2022533852A patent/JPWO2022004415A1/ja active Pending
- 2021-06-17 WO PCT/JP2021/023094 patent/WO2022004415A1/ja active Application Filing
- 2021-06-17 US US18/008,471 patent/US20230202904A1/en active Pending
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2022
- 2022-11-09 DK DKPA202270544A patent/DK202270544A1/en unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010520140A (ja) * | 2007-02-28 | 2010-06-10 | コーニング インコーポレイテッド | 圧密中の光ファイバケーン/プレフォーム変形の削減 |
WO2013105459A1 (ja) * | 2012-01-11 | 2013-07-18 | 住友電気工業株式会社 | 光ファイバ母材製造方法及び光ファイバ |
WO2016114313A1 (ja) * | 2015-01-14 | 2016-07-21 | 住友電気工業株式会社 | 光ファイバ |
WO2019044833A1 (ja) * | 2017-08-31 | 2019-03-07 | 住友電気工業株式会社 | 光ファイバ母材の製造方法、及び、光ファイバの製造方法 |
Also Published As
Publication number | Publication date |
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DK202270544A1 (en) | 2022-11-21 |
CN115667162A (zh) | 2023-01-31 |
JPWO2022004415A1 (ja) | 2022-01-06 |
US20230202904A1 (en) | 2023-06-29 |
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