WO2020162463A1 - Élément optique et procédé de fabrication d'élément optique - Google Patents

Élément optique et procédé de fabrication d'élément optique Download PDF

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Publication number
WO2020162463A1
WO2020162463A1 PCT/JP2020/004180 JP2020004180W WO2020162463A1 WO 2020162463 A1 WO2020162463 A1 WO 2020162463A1 JP 2020004180 W JP2020004180 W JP 2020004180W WO 2020162463 A1 WO2020162463 A1 WO 2020162463A1
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Prior art keywords
coating
optical element
center
central portion
distance
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PCT/JP2020/004180
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English (en)
Japanese (ja)
Inventor
哲 日下
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日本板硝子株式会社
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Publication of WO2020162463A1 publication Critical patent/WO2020162463A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers

Definitions

  • the present invention relates to an optical element and a method for manufacturing an optical element.
  • optical elements such as lenses
  • an antireflection film or the like can reduce the occurrence of flare and ghost.
  • Patent Document 1 describes an optical product in which an optical multilayer film for antireflection is formed on one side or both sides of a substrate.
  • the optical multilayer film has a seven-layer structure in which low refractive index layers and high refractive index layers are alternately laminated.
  • Patent Document 2 describes a lens with an antireflection film having a convex or concave surface portion and an antireflection film formed on the surface portion.
  • the film thickness of the antireflection film in the central part of the surface part is different from the film thickness of the antireflection film in the peripheral part.
  • the film thickness of the antireflection film becomes thicker in a region where the incident angle is larger.
  • Patent Document 3 describes an optical lens provided in an optical information recording/reproducing apparatus.
  • An antireflection film is provided on at least one lens surface of the optical lens.
  • the film thickness of the antireflection film in the peripheral portion of the lens surface is equal to or larger than the film thickness of the antireflection film in the central portion of the lens surface.
  • Patent Document 4 describes an optical element for an optical pickup device.
  • an antireflection film is formed on the surface of the lens.
  • the antireflection film is formed to have an optical film thickness that has the lowest reflectance with respect to an incident/emitted light beam at an arbitrary position on the surface of the optical element.
  • the optical film thickness of the antireflection film is large in the peripheral portion of the lens where the lens curvature is large.
  • Patent Document 5 describes an optical member in which a plurality of fine concavo-convex structures having antireflection properties are provided on the surface of the lens surface.
  • an intermediate layer is formed between the fine concavo-convex structure and the lens surface. The film thickness of the intermediate layer is continuously increased from the lens central portion to the lens peripheral portion.
  • Patent Document 1 Japanese Unexamined Patent Publication No. JP, 10-160906, A JP, 2003-215310, A JP 2004-333908 A JP, 2009-139775, A
  • Patent Document 1 the spatial variation of the thickness of the optical multilayer film in the optical product is not clear.
  • the thickness of the coating such as the antireflection film on the peripheral portion of the lens surface is larger than the thickness of the coating on the central portion of the lens surface. This cannot be said to be advantageous from the viewpoint of preventing the occurrence of cracks in the coating such as the antireflection film due to the temperature change.
  • the present invention provides an optical element advantageous from the viewpoint of preventing the occurrence of cracks in the coating such as the antireflection film due to the temperature change.
  • the present invention also provides a manufacturing method suitable for manufacturing such an optical element.
  • the present invention is A main body having a main surface including a central portion forming a convex surface or a concave surface and a peripheral portion formed around the central portion; A coating formed on the main surface, Provided is an optical element satisfying the conditions of (i) d 1 ⁇ d 0 and d 1 ⁇ d 2 or (ii) d 2 ⁇ d 1 ⁇ d 0 .
  • d 0 is the thickness of the coating at the center of the center.
  • d 1 is the thickness of the coating at a position where the distance from the center in the direction perpendicular to the optical axis is 90% of the distance between the center and the peripheral edge and the center.
  • d 2 is the thickness of the coating at a position where the distance from the center in the direction perpendicular to the optical axis is 110% of the distance between the boundary and the center.
  • the present invention is In the main surface of the main body having a main surface including a central portion forming a convex surface or a concave surface and a peripheral portion formed around the central portion, the distance from the center of the central portion in the direction perpendicular to the optical axis is defined as follows: Also increase, Applying the coating liquid to the main surface to form a coating, A method for manufacturing an optical element is provided.
  • the present invention is A coating is formed by vapor deposition on the main surface of the main body having a main surface including a central portion forming a convex surface or a concave surface and a peripheral portion formed around the central portion, In the vapor deposition, the coating is applied to a first region including a position in which a distance from a center of the central portion in a direction perpendicular to an optical axis is 90% of a distance between a boundary between the central portion and the peripheral portion and the center. The probability of the substance for depositing is lower than the probability of depositing the substance for the coating in the second region including the center, A method for manufacturing an optical element is provided.
  • the above optical element is advantageous from the viewpoint of preventing cracks in the coating due to temperature changes.
  • the above manufacturing method is suitable for manufacturing such an optical element.
  • FIG. 1A is a sectional view showing an example of an optical element according to the present invention.
  • FIG. 1B is a sectional view showing another example of the optical element according to the present invention.
  • FIG. 1C is a sectional view showing still another example of the optical element according to the present invention.
  • FIG. 1D is a sectional view showing still another example of the optical element according to the present invention.
  • FIG. 2 is a sectional view showing an optical element according to a comparative example.
  • FIG. 3A is a diagram conceptually showing an example of the method for manufacturing an optical element according to the present invention.
  • 3B is a plan view of the mask shown in FIG. 3A.
  • FIG. 4A is a diagram conceptually showing another example of the method for manufacturing an optical element according to the present invention.
  • FIG. 4B is a plan view of the mask shown in FIG. 4A.
  • FIG. 5A is a photograph showing the appearance of the optical element according to the comparative example before the temperature cycle test.
  • FIG. 5B is a photograph showing the appearance of the optical element according to the comparative example after the temperature cycle test.
  • the present inventor has devised the optical element according to the present invention based on the following new findings regarding the optical element.
  • cracks may occur on the surface or inside of the coating during or after the temperature cycle test.
  • the term “crack” means a crack or crack that occurs in a layer or film such as a coating.
  • An example of the conditions of the temperature cycle test is that the cycle of changing the environmental temperature of the optical element in the temperature range of ⁇ 40° C. to 85° C. over 15 minutes is repeated 500 times. It is considered that due to the difference between the coefficient of thermal expansion of the material forming the coating and the coefficient of thermal expansion of the material of the main body of the optical element, thermal stress is generated due to the temperature change and a crack is generated.
  • the main body of the optical element is made of resin and the coating is a layer of an inorganic material such as a metal oxide, it is considered that cracks are more likely to occur.
  • the optical performance may be deteriorated at that portion, or moisture or the like may act on the material of the optical element body through the crack to deteriorate the property of the material.
  • the thermal stress ⁇ t generated when the environmental temperature of the optical element changes from the temperature Tb to the temperature Ta is represented by the following formula (1).
  • E f is the Young's modulus [N/m 2 ] of the coating
  • ⁇ s is the thermal expansion coefficient of the optical element body [1/° C.]
  • ⁇ f is the thermal expansion coefficient of the coating [1/° C.]
  • ⁇ f is the Poisson's ratio of the coating.
  • ⁇ t E f ⁇ ( ⁇ s ⁇ f ) ⁇ (Ta ⁇ Tb)/(1- ⁇ f )(1)
  • the thermal stress ⁇ t causes compressive or tensile stress in the coating. As a result, the optical element is bent.
  • the stress ⁇ f generated by the deflection is expressed by the equation (2) called the Stoney equation.
  • E s is the Young's modulus [N/m 2 ] of the optical element body
  • D is the thickness [m] of the optical element body
  • ⁇ s is the Poisson's ratio of the optical element body
  • R is deformed by thermal stress. It is the radius of curvature [m] of the optical element body
  • d is the thickness [m] of the coating.
  • ⁇ f E s ⁇ D 2 / ⁇ 6 ⁇ (1- ⁇ s ) ⁇ R ⁇ d ⁇ (2)
  • S corresponds to the force per unit width of the coating.
  • ⁇ t depends on the temperature change and the coefficient of thermal expansion of the material
  • the force per unit width in the coating depends on the product of the stress ⁇ f and the coating thickness d. Since the larger the value of S, the larger the force applied to the coating, it is understood that when d is large, peeling and cracking of the coating are likely to occur.
  • the thickness of the coating in the peripheral portion of the optical element is made larger than the thickness of the coating in the central portion of the optical element for the purpose of reducing the amount of reflection of light rays and the like, as in the techniques described in Patent Documents 2 to 5. ..
  • the thickness of the coating in the peripheral portion of the optical element is large, and it is considered that the coating is likely to crack due to temperature changes in the peripheral portion of the optical element. Therefore, the yield in manufacturing the optical element may be low, and thus the productivity in manufacturing the optical element may be low.
  • the formation of the coating on the optical element can be performed at a temperature higher than room temperature from the viewpoint of improving the adhesion of the coating to the optical element body. Therefore, thereafter, due to the difference between the coefficient of thermal expansion of the material forming the coating and the coefficient of thermal expansion of the optical element body in the optical element returned to room temperature, thermal stress is likely to occur and cracks are likely to occur.
  • the present inventor newly found a spatial variation in the thickness of the coating, which is advantageous from the viewpoint of preventing the coating from being cracked due to a change in temperature.
  • An optical element according to the invention has been devised.
  • each of the optical elements 1a, 1b, 1c, and 1d includes a body 10 and a coating 20.
  • the main body 10 has a main surface 15.
  • the main surface 15 includes a central portion 11 and a peripheral portion 12.
  • the central portion 11 has a convex surface or a concave surface.
  • the central portion 11 has a convex surface in the optical element 1a and the optical element 1b.
  • the central portion 11 has a convex surface.
  • the central portion 11 has a concave surface.
  • the peripheral portion 12 is formed around the central portion 11.
  • the coating 20 is formed on the main surface 15.
  • the optical elements 1a to 1d satisfy the conditions (i) d 1 ⁇ d 0 and d 1 ⁇ d 2 or (ii) d 2 ⁇ d 1 ⁇ d 0 .
  • the optical elements 1a and 1c satisfy the conditions of (i) d 1 ⁇ d 0 and d 1 ⁇ d 2 .
  • the optical elements 1b and 1d satisfy the condition (ii) d 2 ⁇ d 1 ⁇ d 0 .
  • d 0 is the thickness of the coating 20 at the center P C of the central portion 11.
  • d 1 is the thickness of the coating 20 at the position P 90 where the distance from the center P C in the direction perpendicular to the optical axis A is 90% of the distance between the boundary B and the center P C.
  • the boundary B is a boundary between the central portion 11 and the peripheral portion 12.
  • d 2 is the thickness of the coating 20 at the position P 110 where the distance from the center P C in the direction perpendicular to the optical axis A is 110% of the distance between the boundary B and the center P C.
  • the thicknesses d 0 , d 1 and d 2 mean the thickness of the principal surface 15 in the normal direction.
  • FIG. 2 shows an optical element 2 according to a comparative example.
  • the optical element 2 is configured in the same manner as the optical element 1a, except for the part particularly described.
  • the constituent elements of the optical element 2 corresponding to the constituent elements of the optical element 1a are designated by the same reference numerals, and detailed description thereof will be omitted.
  • the condition of d 2 >d 1 >d 0 is satisfied.
  • d 2 and d 1 are larger than d 0 , and the stress generated near the position P 90 of the coating 20 and the stress generated near the position P 110 of the coating 20 are likely to be large. Further, since the directions of these stresses are different, a force that tears the coating 20 near the boundary B easily works. Therefore, in the optical element 2, it is considered that cracks are likely to occur in the coating 20 due to the temperature change.
  • Each of the optical element 1a and the optical element 1c may further satisfy the condition of 1 ⁇ d 0 /d 1 ⁇ 2 and the condition of 1 ⁇ d 2 /d 1 ⁇ 2. As a result, cracks are less likely to occur in the coating 20 with changes in temperature.
  • the value of d 0 /d 1 may be 1.05 to 1.5 or 1.1 to 1.3.
  • the value of d 2 /d 1 may be 1.05 to 1.5, or 1.1 to 1.2.
  • Each of the optical element 1b and the optical element 1d may further satisfy the condition of 1 ⁇ d 0 /d 1 ⁇ 2 and the condition of 0 ⁇ d 2 /d 1 ⁇ 1. As a result, cracks are less likely to occur in the coating 20 with changes in temperature.
  • the value of d 0 /d 1 may be 1.05 to 1.5 or 1.1 to 1.3.
  • the value of d 2 /d 1 may be 0.01 to 0.9 or 0.1 to 0.7.
  • Each of the optical elements 1a to 1d is typically a lens.
  • Each of the optical elements 1a and 1b is, for example, a plano-convex lens.
  • Each of the optical elements 1c and 1d is, for example, a plano-concave lens.
  • the central portion 11 may be, for example, a spherical surface or an aspherical surface.
  • the peripheral portion 12 has, for example, a flat surface. This flat surface is parallel to the plane perpendicular to the optical axis A. In this case, the direction of the stress generated near the position P 90 of the coating 20 is different from the direction of the stress generated near the position P 110 of the coating 20, and the force to tear the coating 20 near the boundary B is appear. However, in each of the optical elements 1a to 1d, since the above condition (i) or condition (ii) is satisfied, cracks are less likely to occur in the coating 20 due to temperature changes.
  • the main body 10 is formed of, for example, a translucent resin.
  • the absolute value of the difference between the coefficient of thermal expansion of the material forming the coating 20 and the coefficient of thermal expansion of the main body 10 tends to be large.
  • the translucent resin is not particularly limited. Examples of the translucent resin include acrylic resin, polycarbonate resin, and polyolefin resin.
  • the main body 10 may be formed of translucent glass.
  • the coating 20 is not particularly limited as long as it is a film formed on the main surface.
  • the coating 20 is, for example, an antireflection film.
  • the antireflection film prevents reflection in a specific wavelength range.
  • the antireflection film may be a single layer film or a multilayer film.
  • the antireflection film may be, for example, a single-layer film formed of a material having a refractive index lower than that of the main body 10.
  • the coating 10 functioning as an antireflection film may be a laminated multilayer film in which a high refractive index layer and a low refractive index layer are alternately stacked.
  • the material forming the high refractive index layer is, for example, cerium oxide, titanium oxide, tantalum oxide, zirconium oxide, or silicon nitride.
  • the material forming the low refractive index layer is, for example, silicon oxide or magnesium fluoride.
  • the wettability of the first region R1 including the position P 90 with the coating liquid is higher than the wettability of the second region R2 including the center P C with the coating liquid.
  • the coating liquid is applied to the main surface 15 to form the coating 20.
  • the thickness of the coating 20 is likely to be smaller than in the second region R2 having low wettability with the coating liquid. Therefore, this method is suitable for manufacturing the optical elements 1a to 1d.
  • the coating liquid is applied by, for example, spin coating.
  • the position P 110 may be included in the first region R1.
  • the method of increasing the wettability of the first region R1 with the coating liquid more than the wettability of the second region R2 with the coating liquid is not limited to a particular method.
  • the wettability of the first region R1 with respect to the coating liquid is improved.
  • the wettability of the second region R2 with respect to the coating liquid can be improved.
  • the mask 50 is a plate-shaped member having an annular through hole.
  • the mask 50 has a central portion 51, an outer peripheral portion 52, and a support portion 53.
  • the central portion 51 has a disc shape.
  • the outer peripheral portion 52 is an annular member that surrounds the central portion 51 and has a circular through hole.
  • the axis of the central portion 51 and the axis of the circular through hole coincide with each other.
  • the radius of the central portion 51 is such that the distance from the center P C in the direction perpendicular to the optical axis A is smaller than 90% of the distance between the boundary B and the center P C.
  • the radius of the circular through hole of the outer peripheral portion 52 is such that the distance from the center P C in the direction perpendicular to the optical axis A is larger than 90% of the distance between the boundary B and the center P C. Therefore, by disposing the mask 50 so that the center of the central portion 51 is located on the optical axis A, the plasma that has passed through the annular through hole is selectively applied to the first region R1. As a result, the wettability of the first region R1 with the coating liquid can be made higher than the wettability of the second region R2 with the coating liquid.
  • the wettability of the first region R1 with the coating liquid can be improved. It may be higher than sex.
  • the coating 20 is formed on the main surface 15 of the main body 10 by vapor deposition.
  • the probability that the substance for the coating 20 adheres to the first region R1 including the position P 90 on the main surface 15 is the probability that the substance for the coating 20 adheres to the second region R2 including the center P C. Lower than.
  • the thickness of the coating 20 in the first region R1 tends to be smaller than that in the second region R2. Therefore, this method is suitable for manufacturing the optical elements 1a to 1d.
  • the position P 110 may be included in the first region R1.
  • the vapor deposition may be physical vapor deposition or chemical vapor deposition.
  • the method of reducing the probability that the substance for the coating 20 adheres to the first region R1 is lower than the probability that the substance for the coating 20 adheres to the second region R2 is not particularly limited.
  • the vapor deposition apparatus 70 shown in FIG. 4A can be used to manufacture the optical elements 1a to 1d.
  • the vapor deposition device 70 is a device for vacuum vapor deposition, and includes a vacuum chamber 72, a holder 74, a mask 75, and a vapor deposition source 76.
  • the holder 74, the mask 75, and the vapor deposition source 76 are arranged inside the vacuum chamber 72.
  • the main body 10 is arranged so that the main surface 15 of the main body 10 faces the vapor deposition source 76.
  • the holder 74 is configured to be rotatable. The holder 74 rotates while the main body 10 is fixed to the holder 74.
  • a known method can be used as a method for fixing the main body 10 to the holder 74.
  • a method of gripping the edge surface of the main body 10 with a V groove or a U groove can be used.
  • the mask 75 is arranged between the holder 74 and the vapor deposition source 76. As shown in FIG. 4B, the mask 75 has a notch narrowed from the center of the mask 75 toward the peripheral edge of the mask 75.
  • a plano-convex lens made of polymethylmethacrylate was prepared.
  • the main surface having the convex surface of this plano-convex lens has a central portion forming a convex surface and a peripheral portion formed around the central portion.
  • the convex surface at the center was a spherical surface having a radius of curvature of 4 mm.
  • the peripheral portion had a flat surface parallel to the surface perpendicular to the optical axis.
  • the diameter of the plano-convex lens was 7 mm, and the effective diameter of the convex surface was 5 mm.
  • a mask having the same mode as the mask 50 shown in FIG. 3 was prepared.
  • This mask was manufactured such that the directional plasma was applied to a region corresponding to 80% to 120% of the effective diameter of the convex surface of the plano-convex lens.
  • This mask was placed above the plano-convex lens, and the surface modification treatment of the main surface having the convex surface of the plano-convex lens was performed using an atmospheric pressure plasma device (Well, product name: WADP-200A). ..
  • Ar (argon) gas is supplied at a flow rate of 15 slm (standard liter per minute)
  • O 2 (oxygen) is supplied at a flow rate of 15 sccm (standard cubic centimeter per minute)
  • RF discharge power is supplied.
  • plano-convex lens and the mask were arranged so that their central axes coincided with each other, and the distance between the plano-convex lens and the mask was adjusted to about 1 mm using a spacer.
  • the plano-convex lens and the mask were conveyed in one direction by a belt conveyor made of wire, and plasma was irradiated from above. Further, since the shadow of the supporting portion of the mask is generated on the surface of the plano-convex lens, the plasma irradiation was performed twice by changing the phase about 5° around the central axis of the plano-convex lens and the mask.
  • TEOS tetraethoxysilane
  • MTES methyltriethoxysilane
  • 3 g of hollow silica sol manufactured by JGC Catalysts & Chemicals, product name: Thruria 4110, silica solid content: about 25 wt%
  • 22.4 g of ethanol manufactured by Kishida Chemical Co., Ltd.
  • the coating liquid was applied to the plano-convex lens to form a coating film.
  • the flat surface opposite to the convex surface of the plano-convex lens was fixed on the spin axis of the spin coater by vacuum adsorption.
  • the rotation speed of the spin coater was gradually increased with the convex surface of the plano-convex lens facing upward, and the rotation speed was kept at 500 rpm (revolutions per minute). After that, an appropriate amount of the coating liquid was dropped toward the plano-convex lens with a syringe.
  • the rotation speed of the spin coater was raised to 4000 rpm and kept for 25 seconds, and the excess coating liquid was skipped.
  • the plano-convex lens was taken out, and the plano-convex lens was placed in a heating oven to gradually raise the temperature around the plano-convex lens.
  • the temperature was kept at 200° C. for 10 minutes, and the coating film was dried to form a single-layer antireflection film. In this way, the optical element according to Example 1 was manufactured.
  • the thickness of the antireflection film in the optical element according to Example 1 was measured using a microspectrophotometer (manufactured by JASCO Corporation, product name: MSV-5000). In this measurement, the thickness d 0 of the antireflection film at the center of the convex surface of the plano-convex lens, the thickness d 1 of the antireflection film on the convex surface at the position corresponding to 90% of the diameter of the convex surface, and the thickness of the convex surface The thickness d 2 of the antireflection film on the flat peripheral portion outside the convex surface at the position corresponding to the diameter corresponding to 110% of the diameter was measured.
  • Example 2 An optical element according to Example 2 was made in the same manner as Example 1 except for the following points.
  • a spin coater manufactured by Mikasa, product name: MS-B100
  • the rotation speed of the spin coater was gradually increased and kept at 1500 rpm while the plano-convex lens was fixed. Then, an appropriate amount of the coating liquid was dripped toward the plano-convex lens. Then, the spin coater was further rotated at 4000 rpm for 25 seconds.
  • the plano-convex lens was taken out, and the plano-convex lens was placed in a heating oven to gradually raise the temperature around the plano-convex lens.
  • the temperature was kept at 200° C. for 10 minutes, and the coating film was dried to form a single-layer antireflection film.
  • the optical element according to Example 2 was obtained.
  • Example 3 For the same plano-convex lens as that used in Example 1, a vapor deposition apparatus configured in the same manner as the vapor deposition apparatus 70 shown in FIGS. 4A and 4B was used to perform vacuum vapor deposition on the main surface including the convex surface of the plano-convex lens. Then, an antireflection film was formed. In vacuum deposition, the pressure inside the vacuum chamber was reduced to about 10 ⁇ 3 Pa using a vacuum pump, and magnesium fluoride (MgF 2 ) was heated and evaporated from the deposition source. The holder was rotated for a predetermined time in vacuum deposition. The vacuum deposition time was adjusted so that the antireflection film on the plano-convex lens had a predetermined thickness. Thus, the optical element according to Example 3 was obtained.
  • MgF 2 magnesium fluoride
  • the plano-convex lens was taken out, and the plano-convex lens was placed in a heating oven to gradually raise the temperature around the plano-convex lens.
  • the temperature was kept at 200° C. for 10 minutes, and the coating film was dried to form a single-layer antireflection film. In this way, the optical element according to Comparative Example 1 was obtained.
  • ⁇ Temperature cycle test> A temperature cycle test was performed on the optical element according to each example and the optical element according to Comparative Example 1. In the temperature cycle test, a cycle in which the temperature around the optical element was changed in the temperature range of ⁇ 40° C. to 85° C. over 15 minutes was repeated 500 times. In the optical element according to each example, no crack was generated on the surface of the antireflection film after the temperature cycle test.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

L'invention concerne un élément optique (1a) qui est pourvu d'un corps (10) et d'un revêtement (20). Le corps (10) a une surface principale (15). La surface principale (15) comprend une section centrale (11) et une section périphérique (12). La section centrale (11) forme une surface en saillie. La section périphérique (12) est formée au niveau du périmètre de la section centrale (11). Le revêtement (20) est disposé sur le côté de la seconde surface (15). L'élément optique (1a) satisfait la condition (i) : d1<d0 et d1<d2.
PCT/JP2020/004180 2019-02-06 2020-02-04 Élément optique et procédé de fabrication d'élément optique WO2020162463A1 (fr)

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WO2024095908A1 (fr) * 2022-10-31 2024-05-10 キヤノン株式会社 Élément ayant une couche d'interférence optique, et dispositif optique

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