WO2020051978A1 - 一种曝光方法及其曝光装置 - Google Patents

一种曝光方法及其曝光装置 Download PDF

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Publication number
WO2020051978A1
WO2020051978A1 PCT/CN2018/111191 CN2018111191W WO2020051978A1 WO 2020051978 A1 WO2020051978 A1 WO 2020051978A1 CN 2018111191 W CN2018111191 W CN 2018111191W WO 2020051978 A1 WO2020051978 A1 WO 2020051978A1
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WO
WIPO (PCT)
Prior art keywords
exposed
exposure
light source
point
area
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PCT/CN2018/111191
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English (en)
French (fr)
Inventor
倪伟
Original Assignee
重庆惠科金渝光电科技有限公司
惠科股份有限公司
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Application filed by 重庆惠科金渝光电科技有限公司, 惠科股份有限公司 filed Critical 重庆惠科金渝光电科技有限公司
Priority to US16/311,666 priority Critical patent/US11187996B2/en
Publication of WO2020051978A1 publication Critical patent/WO2020051978A1/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70641—Focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Definitions

  • the present disclosure relates to the field of display technology, and in particular, to an exposure method and an exposure device thereof.
  • liquid crystal displays have become mainstream products due to their thin body, power saving and low radiation, which have been widely used.
  • Most of the liquid crystal displays on the existing market are backlit liquid crystal displays, which include a liquid crystal panel and a backlight module.
  • the working principle of a liquid crystal panel is to place liquid crystal molecules in two parallel glass substrates, and apply a driving voltage to the two glass substrates to control the rotation direction of the liquid crystal molecules so as to refract the light of the backlight module to generate a picture.
  • a thin film transistor liquid crystal display includes a liquid crystal panel and a backlight module.
  • the liquid crystal panel includes a color filter substrate (Color Substrate, CF Substrate, also called a color filter substrate), a thin film transistor array substrate (Thin Film Transistor Substrate, TFT Substrate), and light.
  • a mask has a transparent electrode on the opposite side of the substrate.
  • a layer of liquid crystal (LC) is sandwiched between the two substrates.
  • the technical problem to be solved by the present disclosure is to provide a method capable of reducing the tact time of the operation of the exposure machine and improving the alignment accuracy of the output product.
  • an exposure method including steps:
  • the exposure machine completes the exposure operation.
  • the step of confirming the position of the spot to be exposed in the area to be exposed includes:
  • this solution uses the first confirmation and adjustment of the point to be exposed so that the point to be exposed is located in the capture field.
  • the operation of the center can increase the capture success rate of the spot to be exposed to advance the production process, reduce the capture time, thereby reducing the production time of a single product and improving production efficiency.
  • the step of confirming the position of the point to be exposed in the area to be exposed further includes: after confirming that the point to be exposed is located at the center of the capture field of view, when the point to be exposed is blurred, adjusting the lens focus until The point to be exposed is displayed in the best clear state.
  • the point to be exposed will be confirmed and adjusted first. After the point to be exposed is located in the center of the capture field of view, adjust the lens to focus and confirm that the point to be exposed is in the best clear state.
  • This operation not only speeds up the success rate of focusing, saves focusing time, but also increases the success of the capture Rate to advance the production process, which not only reduces the time to grab, thereby reducing the production time of a single product, and improves production efficiency; moreover, it is beneficial to ensure the alignment accuracy of the output product and improve the yield of the product.
  • the step of capturing the to-be-exposed points and confirming the successful capture of the to-be-exposed points further includes: the lens attempts to automatically capture the to-be-exposed points and confirms that the capturing is successful; Describe the exposure points and confirm the number of grabs.
  • the exposure point is captured using the automatic capture function of the exposure machine; although the capture is not performed under the optimal capture conditions, it is still possible to capture
  • the fetch is successful, and this operation can avoid wasting the chance of grabbing when other steps are performed, which is beneficial to speeding up the fetching process.
  • confirming the number of fetching is helpful to provide experience, so that subsequent fetching operations can increase Fewer operations to learn will help improve the success rate and efficiency of the crawl.
  • the step of adjusting the light source to the adapted position corresponding to the successfully captured point to be exposed further includes: independently configuring a group of light sources for each area to be exposed, and sequentially adjusting the light source for each area to be exposed; repeat Adjust to find the best light source, and calculate the standard deviation of three times the measured value under the best light source; when the triple standard deviation is less than 2, the exposure machine uses an exposure mask to complete the exposure operation.
  • the area to be exposed belongs to an area corresponding to the size of an exposure mask on a substrate; the substrate is divided into at least two areas to be exposed.
  • the area to be exposed belongs to an area corresponding to the size of the exposure mask on a substrate.
  • the substrate is divided into at least two areas to be exposed. All the areas to be exposed constitute the entire substrate.
  • the light source is adjusted to improve the part of the substrate, so that after the exposure operation ends, the entire substrate is exposed with better results.
  • the substrate is divided into six areas to be exposed.
  • the substrate is divided into six areas to be exposed, and all the six areas to be exposed constitute the entire substrate.
  • the division into six areas to be exposed can make the adjustment of the light source more fine and the concentration of the light source irradiation. After the exposure operation is completed, the entire The substrate gets better exposure results.
  • the disclosure also provides an exposure method including:
  • the lens attempts to automatically capture the points to be exposed, and confirms that the capture is successful
  • this solution uses the first confirmation and adjustment of the point to be exposed so that the point to be exposed is located in the capture field.
  • the operation of the center can increase the capture success rate of the spot to be exposed to advance the production process, reduce the capture time, thereby reducing the production time of a single product and improving production efficiency.
  • the point to be exposed is blurred, the center point will be shifted during grasping, which will result in poor alignment accuracy of the output product.
  • the point to be exposed will be confirmed and adjusted first.
  • the exposure point is captured using the automatic capture function of the exposure machine; although the capture is not performed under the optimal capture conditions, it is still possible to capture Successfully fetching and confirming the number of grabs can avoid wasting the chance of grabbing during other steps, which is beneficial to speeding up the crawling process.
  • confirming the number of grabs is helpful to provide experience so that subsequent crawling operations can Operations with fewer fetches will help improve the success rate and efficiency of the fetch.
  • the present disclosure also provides an exposure device for a display panel process, including:
  • the light source adjustment component adjusts the light source to the adapted position corresponding to the successfully captured spot to be exposed
  • the exposure machine completes the exposure operation after the light source to be exposed is adjusted to the adapted position.
  • the confirmation part confirms the position of the point to be exposed in the area to be exposed, and then grabs the point to be exposed. If the position of the point to be exposed is not confirmed and adjusted, it is very difficult to grasp the point to be exposed. It is easy to cause grab failure and even increase the exposure time of the exposure, so that the number of products that the exposure machine can process per unit time is reduced, which affects the production efficiency of the exposure machine.
  • the grasping point is first used to grasp the point to be exposed, and after confirming that the to-be-exposed point is successfully grasped, the light source is adjusted to the adaptive position by the light source adjusting component. In this way, the exposure machine can perform the exposure operation only after the step of adjusting the light source. This operation can reduce the exposure time of a single product, avoid underexposure or overexposure, and help improve the alignment of the output product. Accuracy, and is conducive to improving product output per unit time and improving production efficiency.
  • the confirmation component is used to confirm that the point to be exposed is located at the center position of the grasping field, and after the point to be exposed is located at the center position of the grasping field, when the point to be exposed is blurred, adjust the lens focus until the point to be exposed
  • the display is in the best clear state; the grasping component is used by the lens to try to automatically grab the to-be-exposed point and confirm the successful capture; to grasp the to-be-exposed point multiple times and confirm the number of times of grasping.
  • this solution uses the confirmation part to confirm and adjust the point to be exposed first so that the point to be exposed is located in the capture.
  • the operation in the center of the field of vision can increase the success rate of grabbing the points to be exposed to advance the production process, reduce the grabbing time, thereby reducing the production time of a single product and improving production efficiency.
  • the point to be exposed is blurred, the center point will be shifted during grasping, which will result in poor positioning accuracy of the output product.
  • the part to be exposed is confirmed and adjusted by the confirmation component.
  • the lens to focus after the point to be exposed is located in the center of the capture field of view, adjust the lens to focus and confirm that the point to be exposed is in the best clear state.
  • This operation not only accelerates the success rate of focusing, saves focusing time, but also increases the capture
  • the success rate promotes the production process, which not only reduces the time for grasping, thereby reducing the production time of a single product, and improves production efficiency; moreover, it helps to ensure the alignment accuracy of the output product and improve the yield of the product.
  • the exposure point After the light source position of the exposure machine has been adjusted, the exposure point is captured using the automatic capture function of the exposure machine; although it is not grasped by the grasping component under the optimal grasping conditions, the grasping component is still It is possible to grab successfully.
  • This operation can avoid wasting the chance of grabbing during other steps, which is beneficial to speeding up the process of grabbing parts.
  • confirming the number of grabbing parts is helpful to provide experience, so that Subsequent crawling operations can learn from operations with a small number of crawls, which is conducive to improving the success rate and efficiency of crawling.
  • the light source adjusting component is configured to independently configure a group of light sources for each area to be exposed, adjust the light source sequentially for each area to be exposed, repeatedly adjust to find the best light source, and calculate the measurement value under the best light source The standard deviation of three times; the exposure machine is used to complete the exposure operation when it is detected that the standard deviation of three times the measured value is less than 2.
  • the light source can be adjusted for each area to be exposed in turn.
  • the best light source for each area to be exposed is found. Calculate three times the standard deviation of the measured value under the optimal light source. When the three times the standard deviation is less than 2, the requirements are met and the exposure machine completes the exposure operation.
  • the point to be exposed and the degree of blurring are easier to adjust under the best light source, while increasing the clarity of the product and further improving the tact time of the exposure machine. Alignment accuracy with the product improves the yield of the product.
  • the beneficial effect of the present disclosure is: after confirming the position of the point to be exposed in the area to be exposed, and then grasping the point to be exposed, if the position of the point to be exposed is not confirmed and adjusted, and the position of the point to be exposed is directly grasped, then It is easy to cause the failure of grabbing and even increase the exposure time of the exposure, so that the number of products that the exposure machine can process per unit time is reduced, which affects the production efficiency of the exposure machine.
  • This solution first captures the points to be exposed and after confirming that the points to be exposed are successfully captured, then adjusts the light source to the adapted position. In this way, the exposure machine can perform the exposure operation only after the step of adjusting the light source. This operation can reduce the exposure time of a single product, avoid underexposure or overexposure, and help improve the alignment of the output product. Accuracy, and is conducive to improving product output per unit time and improving production efficiency.
  • FIG. 1 is an application flowchart of an exposure method according to an embodiment of the present disclosure
  • FIG. 2 is an optimal application flowchart of an exposure method according to an embodiment of the present disclosure
  • FIG. 3 is a schematic diagram of an exposure apparatus for a display panel manufacturing process according to an embodiment of the present disclosure
  • FIG. 4 is a schematic diagram of a point to be exposed in a display area before adjustment according to an embodiment of the present disclosure
  • FIG. 5 is a schematic diagram of a spot to be exposed with good sharpness before grasping before adjustment according to an embodiment of the present disclosure
  • FIG. 6 is a schematic diagram of a spot to be exposed with good sharpness before grasping after adjustment according to an embodiment of the present disclosure.
  • an embodiment of the present disclosure discloses an exposure method, including steps:
  • This solution first captures the points to be exposed and after confirming that the points to be exposed are successfully captured, then adjusts the light source to the adapted position. In this way, the exposure machine can perform the exposure operation only after the step of adjusting the light source. This operation can reduce the exposure time of a single product, avoid underexposure or overexposure, and help improve the alignment of the output product. Accuracy, and is conducive to improving product output per unit time and improving production efficiency.
  • Step S11 of confirming the position of the spot to be exposed in the area to be exposed includes:
  • this solution uses the first confirmation and adjustment of the point to be exposed so that the point to be exposed is located in the capture field.
  • the operation of the center can increase the capture success rate of the spot to be exposed to advance the production process, reduce the capture time, thereby reducing the production time of a single product and improving production efficiency.
  • Step S11 of confirming the position of the spot to be exposed in the area to be exposed further includes:
  • the point to be exposed will be confirmed and adjusted first. After the point to be exposed is located in the center of the capture field of view, adjust the lens to focus and confirm that the point to be exposed is in the best clear state.
  • This operation not only speeds up the success rate of focusing, saves focusing time, but also increases the success of the capture Rate to advance the production process, which not only reduces the time to grab, thereby reducing the production time of a single product, and improves production efficiency; moreover, it is beneficial to ensure the alignment accuracy of the output product and improve the yield of the product.
  • Step S11 of capturing the points to be exposed and confirming that the points to be exposed are successfully captured includes:
  • S23 The lens attempts to automatically capture the points to be exposed, and confirms that the capture is successful
  • the exposure point is captured using the automatic capture function of the exposure machine; although the capture is not performed under the optimal capture conditions, it is still possible to capture
  • the fetch is successful, and this operation can avoid wasting the chance of grabbing when other steps are performed, which is beneficial to speeding up the fetching process.
  • confirming the number of fetching is helpful to provide experience, so that subsequent fetching operations can increase Fewer operations to learn will help improve the success rate and efficiency of the crawl.
  • step S13 of adjusting the light source to the adaptive position corresponding to the successfully captured spot to be exposed further includes:
  • S24 Independently configure a group of light sources for each area to be exposed, adjust the light source in turn for each area to be exposed, and repeatedly adjust to find the best light source;
  • the area to be exposed belongs to an area corresponding to the size of the exposure mask on a substrate; the substrate is divided into at least two areas to be exposed.
  • the area to be exposed belongs to an area corresponding to the size of the exposure mask on a substrate.
  • the substrate is divided into at least two areas to be exposed. All the areas to be exposed constitute the entire substrate.
  • the light source is adjusted to improve the part of the substrate, so that after the exposure operation ends, the entire substrate is exposed with better results.
  • the substrate is divided into six areas to be exposed.
  • the substrate is divided into six areas to be exposed, and all the six areas to be exposed constitute the entire substrate.
  • the division into six areas to be exposed can make the adjustment of the light source more fine and the concentration of the light source. After the exposure operation is completed, the entire The substrate gets better exposure results.
  • FIG. 2 another exposure method is disclosed, including:
  • S23 The lens attempts to automatically capture the points to be exposed, and confirms that the capture is successful
  • S24 Independently configure a group of light sources for each area to be exposed, and adjust the light source in turn for each area to be exposed.
  • this solution uses the first confirmation and adjustment of the point to be exposed so that the point to be exposed is located in the capture field.
  • the operation of the center can increase the capture success rate of the spot to be exposed to advance the production process, reduce the capture time, thereby reducing the production time of a single product and improving production efficiency.
  • the point to be exposed is blurred, the center point will be shifted during grasping, which will result in poor alignment accuracy of the output product.
  • the point to be exposed will be confirmed and adjusted first.
  • the exposure point is captured using the automatic capture function of the exposure machine; although the capture is not performed under the optimal capture conditions, it is still possible to capture Successfully fetching and confirming the number of grabs can avoid wasting the chance of grabbing during other steps, which is beneficial to speeding up the crawling process.
  • confirming the number of grabs is helpful to provide experience so that subsequent crawling operations can Operations with fewer fetches will help improve the success rate and efficiency of the fetch.
  • the exposure machine uses a group of light sources for each area to be exposed, this will lead to poor light sources to be exposed, which is not conducive to grasping the points to be exposed, and prolongs the exposure time.
  • the point to be exposed and the degree of blurring are easier to adjust under the best light source, while increasing the clarity of the product and further improving the tact time of the exposure machine. Alignment accuracy with the product improves the yield of the product.
  • an exposure apparatus 10 including:
  • the light source adjusting component 40 is configured to adjust the light source to the adapted position corresponding to the successfully captured spot to be exposed;
  • the exposure machine 50 is configured to complete an exposure operation after adjusting a light source to be exposed to an adapted position.
  • the confirmation part confirms the position of the point to be exposed in the area to be exposed, and then grabs the point to be exposed. If the position of the point to be exposed is not confirmed and adjusted, it is very difficult to grasp the point to be exposed. It is easy to cause grab failure and even increase the exposure time of the exposure, so that the number of products that the exposure machine can process per unit time is reduced, which affects the production efficiency of the exposure machine.
  • the grasping point is first used to grasp the point to be exposed, and after confirming that the to-be-exposed point is successfully grasped, the light source is adjusted to the adaptive position by the light source adjusting component. In this way, the exposure machine can perform the exposure operation only after the step of adjusting the light source. This operation can reduce the exposure time of a single product, avoid underexposure or overexposure, and help improve the alignment of the output product. Accuracy, and is conducive to improving product output per unit time and improving production efficiency.
  • the confirming component 20 is used to confirm that the point to be exposed is located at the center of the capture field of view, and after the point to be exposed is located at the center of the field of view, when the point to be exposed is blurred, adjust the lens focus until The point to be exposed is displayed in the best clear state; the gripping component 30 is used by the lens to try to automatically capture the point to be exposed and confirm that the capture is successful; the point to be exposed is captured multiple times and the number of captures is confirmed.
  • this solution uses the confirmation part 20 to confirm and adjust the point to be exposed first so that the point to be exposed is in the grasp.
  • the operation of taking the center of the field of vision can increase the capture success rate of the points to be exposed to advance the production process, reduce the capture time, thereby reducing the production time of a single product and improving production efficiency.
  • the point to be exposed is blurred, the center point will be shifted during grasping, which will result in poor alignment accuracy of the output product.
  • the confirmation component 20 will confirm and adjust the For the exposure point, after the point to be exposed is located in the center of the capture field of view, adjust the lens to focus and confirm that the point to be exposed is in the best clear state.
  • This operation not only accelerates the success rate of focusing, saves focusing time, but also increases the focus
  • the success rate is taken to promote the production process, which not only reduces the time for grasping, thereby reducing the production time of a single product, and improves production efficiency; moreover, it helps to ensure the alignment accuracy of the output product and improve the yield of the product;
  • After adjusting the position of the light source of the exposure machine use the automatic grabbing function of the exposure machine to grab the exposure points; although it is not grasped by the grasping member 30 under the optimal grasping conditions, the grasping member 30 still has It may be successful in grasping, and this operation can avoid wasting the opportunity of grasping when other steps are performed, which is beneficial to speeding up the grasping progress of the grasping member 30 ; Further, to confirm the number of grip
  • the light source adjusting component 40 is configured to independently configure a group of light sources for each area to be exposed, adjust the light source sequentially for each area to be exposed, repeatedly adjust to find the best light source, and calculate the amount under the best light source. Three times the standard deviation of the measured value; the exposure machine 50 is used to complete the exposure operation when it is detected that the three times the standard deviation of the measured value is less than 2.
  • the component 40 independently configures a group of light sources for each area to be exposed, so that each group of light to be exposed can independently use a group of light sources, and the light source environment of each area to be exposed can be optimized.
  • the light source can be adjusted for each area to be exposed in turn.
  • the best light source for each area to be exposed is found. Calculate the standard deviation of three times the measured value under the optimal light source. When the standard deviation of three times is less than 2, it meets the requirements and the exposure machine 50 completes the exposure operation.
  • the point to be exposed and the degree of blurring are easier to adjust under the best light source, while increasing the clarity of the product and further improving the tact time of the exposure machine. Alignment accuracy with the product improves the yield of the product.
  • the panel of the present disclosure may be a TN panel (full name is Twisted Nematic, that is, twisted nematic panel), IPS panel (In-Plane Switching, plane conversion), VA panel (Multi-domain Vertica Aignment, multi-quadrant vertical alignment technology)
  • TN panel full name is Twisted Nematic, that is, twisted nematic panel
  • IPS panel In-Plane Switching, plane conversion
  • VA panel Multi-domain Vertica Aignment, multi-quadrant vertical alignment technology

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

一种曝光方法及其曝光装置（10），包括步骤：确认待曝光点的位置（S11）；抓取并确认待曝光点抓取成功（S12）；对应抓取成功的待曝光点调整光源至适配位置（S13）；曝光机完成曝光操作（S14）。

Description

一种曝光方法及其曝光装置
本申请要求于2018年9月14日提交中国专利局、申请号为CN201811071348.4、发明名称为“一种曝光方法及其曝光装置”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本公开涉及显示技术领域，尤其涉及一种曝光方法及其曝光装置。
背景技术
应当理解的是，这里的陈述仅提供与本申请有关的背景信息，而不必然地构成现有技术。
随着科技的发展和进步，液晶显示器由于具备机身薄、省电和辐射低等热点而成为显示器的主流产品，得到了广泛应用。现有市场上的液晶显示器大部分为背光型液晶显示器，其包括液晶面板及背光模组(backlight module)。液晶面板的工作原理是在两片平行的玻璃基板当中放置液晶分子，并在两片玻璃基板上施加驱动电压来控制液晶分子的旋转方向，以将背光模组的光线折射出来产生画面。
其中，薄膜晶体管液晶显示器(Thin Film Transistor-Liquid Crystal Display，TFT-LCD)由于具有低的功耗、优异的画面品质以及较高的生产良率等性能，目前已经逐渐占据了显示领域的主导地位。同样，薄膜晶体管液晶显示器包含液晶面板和背光模组，液晶面板包括彩膜基板(Color Filter Substrate，CF Substrate，也称彩色滤光片基板)、薄膜晶体管阵列基板(Thin Film Transistor Substrate，TFTSubstrate)和光罩(Mask)，上述基板的相对内侧存在透明电极。两片基板之间夹一层液晶分子(Liquid Crystal，LC)。
在显示面板的制造过程中，有很多的制程需要经过曝光，发明人知道的一种方法是采用曝光机，但曝光机存在曝光的节拍时间较长，且产出的产品对位精度不佳的情况。
技术解决方案
本公开所要解决的技术问题是提供一种能够减少曝光机的工作的节拍时间和提升产出产品的对位精度的方法。
为实现上述目的，本公开提供了一种曝光方法，包括步骤：
确认待曝光点在待曝光区域中的位置；
进行待曝光点抓取，并确认待曝光点抓取成功；
对应抓取成功的待曝光点调整光源至适配位置；
曝光机完成曝光操作。
可选的，所述确认待曝光点在待曝光区域中的位置的步骤，其中包括：
确认待曝光点位于抓取视野的中心位置。
本方案中，如果待曝光点不位于抓取视野的中心位置，那么会延长抓取待曝光点的时间；因而本方案采用通过先确认并调整待曝光点，使待曝光点位于抓取视野的中心的操作，可以增加待曝光点抓取成功率以推进制作流程，减少抓取的时间，从而减少单个产品的生产时间，提高生产效率。
可选的，所述确认待曝光点在待曝光区域中的位置的步骤，其中还包括：确认待曝光点位于抓取视野的中心位置后，当待曝光点显示模糊时，调整镜头对焦，直至待曝光点显示为最佳清晰状态。
本方案中，如果待曝光点是模糊的，那么在抓取时，会导致中心点的偏移，进而导致产出的产品对位精度不佳；而本方案则通过先确认并调整待曝光点，在待曝光点位于抓取视野的中心位置后，调整镜头进行对焦，并确认待曝光点处于最佳清晰状态，如此操作，不仅加快对焦的成功率，节省对焦时间，而且可以增加抓取成功率以推进制作流程，既减少抓取的时间，从而减少单个产品的生产时间，提高生产效率；而且，有利于保证产出的产品的对位精度，提高产品的良率。
可选的，所述待曝光点抓取，并确认待曝光点抓取成功的步骤，其中还包括：镜头尝试进行自动抓取所述待曝光点，并确认抓取成功；多次抓取所述待曝光点，并确认抓取次数。
本方案中，在已经将曝光机的光源位置调整好后，利用曝光机的自动抓取功能对待曝光点进行抓取；虽然不是在最佳的抓取条件下进行抓取，但是仍然有可能抓取成功，如此操作，可以避免在其他步骤进行时，浪费抓取的机会，有利于加快抓取的进程；另外，确认抓取次数有利于提供经验，使得后续的抓取操作可以向抓取次数少的操作进行学习，有利于提高抓取的成功率和效率。
可选的，所述对应抓取成功的待曝光点调整光源至适配位置的步骤，其中还包括：为每个待曝光区域独立配置一组光源，针对每个待曝光区域依次调整光源；重复调整找到最佳光源，计算最佳光源下的量测值的三倍标准差；当三倍标准差小于2时，所述曝光机使用曝光光罩完成曝光操作。
本方案中，鉴于市场上已有时曝光机采用每个待曝光区域共用一组光源的模式，这样会导致待曝光点的光源不佳，不利于待曝光点的抓取，延长曝光的节拍时间；使用同一组光源，会导致其中一个待曝光区域的光亮程度较好，而其他待曝光区域的光效果不好，进而对产品造成影响，甚至导致产品的品质下降；而本方案，采用每个待曝光区域独立使用一组光源的模式，则能够使每个待曝光区域的光 源环境达到最佳化。这样就可以针对每个待曝光区域依次调整光源，不断重复调整后，找到每个待曝光区域的最佳光源。计算在最佳光源下的量测值的三倍标准差，当三倍标准差小于2时，符合要求，曝光机完成曝光操作。针对每个待曝光区域，找到每个待曝光区域所需要的最佳光源后，待曝光点和模糊程度在最佳光源下更加容易调节，同时增加产品的清晰度，进一步改善曝光机的节拍时间和产品对位精度，提升了产品的良率。
可选的，所述待曝光区域属于一块基板上对应曝光光罩大小的一块区域；所述基板划分为至少两块待曝光区域。
本方案中，待曝光区域属于一块基板上对应曝光光罩大小的一块区域，根据光罩的设计会有不同尺寸的基板，基板划分为至少两块待曝光区域，全部的待曝光区域构成整个基板，针对每个待曝光区域去调整光源，使得基板的局部得以完善，如此才能在曝光操作结束后，整个基板曝光出来的结果更好。
可选的，所述基板划分为六块待曝光区域。
本方案中，基板划分为六块待曝光区域，全部六块待曝光区域构成整个基板，划分为六块待曝光区域，可以使调整光源更加精细，光源照射的集中，在曝光操作结束后，整个基板得到较好的曝光结果。
本公开还提供了一种曝光方法，包括：
确认待曝光点位于抓取视野的中心位置；
确认待曝光点位于抓取视野的中心位置后，当待曝光点显示模糊时，调整镜头对焦，直至待曝光点显示为最佳清晰状态；
镜头尝试进行自动抓取所述待曝光点，并确认抓取成功；
多次抓取所述待曝光点，并确认抓取次数；
为每个待曝光区域独立配置一组光源，针对每个待曝光区域依次调整光源，重复调整找到最佳光源；
计算最佳光源下的量测值的三倍标准差；当三倍标准差小于2时，所述曝光机使用曝光光罩完成曝光操作。
本方案中，如果待曝光点不位于抓取视野的中心位置，那么会延长抓取待曝光点的时间；因而本方案采用通过先确认并调整待曝光点，使待曝光点位于抓取视野的中心的操作，可以增加待曝光点抓取成功率以推进制作流程，减少抓取的时间，从而减少单个产品的生产时间，提高生产效率。本方案中，如果待曝光点是模糊的，那么在抓取时，会导致中心点的偏移，进而导致产出的产品对位精度不佳；而本方案则通过先确认并调整待曝光点，在待曝光点位于抓取视野的中心位置后， 再调整镜头进行对焦，并确认待曝光点处于最佳清晰状态，如此操作，不仅加快对焦的成功率，节省对焦时间，而且可以增加抓取成功率以推进制作流程，既减少抓取的时间，从而减少单个产品的生产时间，提高生产效率；而且，有利于保证产出的产品的对位精度，提高产品的良率。本方案中，在已经将曝光机的光源位置调整好后，利用曝光机的自动抓取功能对待曝光点进行抓取；虽然不是在最佳的抓取条件下进行抓取，但是仍然有可能抓取成功，确认抓取次数，可以避免在其他步骤进行时，浪费抓取的机会，有利于加快抓取的进程；另外，确认抓取次数有利于提供经验，使得后续的抓取操作可以向抓取次数少的操作进行学习，有利于提高抓取的成功率和效率。本方案中，鉴于市场上已有时曝光机采用每个待曝光区域共用一组光源的模式，这样会导致待曝光点的光源不佳，不利于待曝光点的抓取，延长曝光的节拍时间；使用同一组光源，会导致其中一个待曝光区域的光亮程度较好，而其他待曝光区域的光效果不好，进而对产品造成影响，甚至导致产品的品质下降；而本方案，采用每个待曝光区域独立使用一组光源的模式，则能够使每个待曝光区域的光源环境达到最佳化。这样就可以针对每个待曝光区域依次调整光源，不断重复调整后，找到每个待曝光区域的最佳光源。计算在最佳光源下的量测值的三倍标准差，当三倍标准差小于2时，符合要求，曝光机完成曝光操作。针对每个待曝光区域，找到每个待曝光区域所需要的最佳光源后，待曝光点和模糊程度在最佳光源下更加容易调节，同时增加产品的清晰度，进一步改善曝光机的节拍时间和产品对位精度，提升了产品的良率。
本公开还提供了一种用于显示面板制程的曝光装置，包括：
确认部件，确认待曝光点在待曝光区域中的位置；
抓取部件，进行待曝光点抓取，并确认待曝光点抓取成功；
光源调整部件，对应抓取成功的待曝光点调整光源至适配位置；
曝光机，在将待曝光点调整光源至适配位置后完成曝光操作。
本方案中，确认部件确认待曝光点在待曝光区域中的位置后，再进行待曝光点的抓取，如果不确认和调整待曝光点的位置而直接进行待曝光点的抓取，则很容易造成抓取失败，甚至增加曝光的节拍时间，使得曝光机单位时间可处理的产品的数量变少，影响曝光机的生产效率。本方案先通过抓取部件进行待曝光点的抓取并且在确认待曝光点抓取成功之后，再通过光源调整部件调整光源至适配位置。如此，曝光机可以在调整光源的步骤之后，才进行曝光操作，如此操作可以减少单个产品的曝光的节拍时间，避免曝光不足或者曝光过度的情况发生，而且有利于提高产出的产品的对位精度，并且有利于提高单位时间的产品产出，提高生产效率。
可选的，所述确认部件用于确认待曝光点位于抓取视野的中心位置，待曝光点位于抓取视野的中心位置后，当待曝光点显示模糊时，调整镜头对焦，直至待曝光点显示为最佳清晰状态；所述抓取部件，用于镜头尝试进行自动抓取所述待曝光点，并确认抓取成功；多次抓取所述待曝光点，并确认抓取次数。
本方案中，如果待曝光点不位于抓取视野的中心位置，那么会延长抓取待曝光点的时间；因而本方案采用先通过确认部件确认并调整待曝光点，使待曝光点位于抓取视野的中心的操作，可以增加待曝光点抓取成功率以推进制作流程，减少抓取的时间，从而减少单个产品的生产时间，提高生产效率。本方案中，如果待曝光点是模糊的，那么在抓取时，会导致中心点的偏移，进而导致产出的产品对位精度不佳；而本方案则通过确认部件确认并调整待曝光点，在待曝光点位于抓取视野的中心位置后，调整镜头进行对焦，并确认待曝光点处于最佳清晰状态，如此操作，不仅加快对焦的成功率，节省对焦时间，而且可以增加抓取成功率以推进制作流程，既减少抓取的时间，从而减少单个产品的生产时间，提高生产效率；而且，有利于保证产出的产品的对位精度，提高产品的良率。在已经将曝光机的光源位置调整好后，利用曝光机的自动抓取功能对待曝光点进行抓取；虽然不是在最佳的抓取条件下通过抓取部件进行抓取，但是抓取部件仍然有可能抓取成功，如此操作，可以避免在其他步骤进行时，浪费抓取的机会，有利于加快抓取部件的抓取进程；另外，确认抓取部件的抓取次数有利于提供经验，使得后续的抓取操作可以向抓取次数少的操作进行学习，有利于提高抓取的成功率和效率。
可选的，所述光源调整部件，用于为每个待曝光区域独立配置一组光源，针对每个待曝光区域依次调整光源，重复调整找到最佳光源，计算最佳光源下的量测值的三倍标准差；所述曝光机用于在检测到量测值的三倍标准差小于2时，完成曝光操作。
本方案中，鉴于市场上已有时曝光机采用每个待曝光区域共用一组光源的模式，这样会导致待曝光点的光源不佳，不利于待曝光点的抓取，延长曝光的节拍时间；使用同一组光源，会导致其中一个待曝光区域的光亮程度较好，而其他待曝光区域的光效果不好，进而对产品造成影响，甚至导致产品的品质下降；而本方案，同过光源调整部件，为每个待曝光区域独立配置一组光源，使每个待曝光区域能够独立使用一组光源，则能够使每个待曝光区域的光源环境达到最佳化。这样就可以针对每个待曝光区域依次调整光源，不断重复调整后，找到每个待曝光区域的最佳光源。计算在最佳光源下的量测值的三倍标准差，当三倍标准差小于2时，符合要求，曝光机完成曝光操作。针对每个待曝光区域，找到每个待曝光区域所需要 的最佳光源后，待曝光点和模糊程度在最佳光源下更加容易调节，同时增加产品的清晰度，进一步改善曝光机的节拍时间和产品对位精度，提升了产品的良率。
本公开的有益效果是：确认待曝光点在待曝光区域中的位置后，再进行待曝光点的抓取，如果不确认和调整待曝光点的位置而直接进行待曝光点的抓取，则很容易造成抓取失败，甚至增加曝光的节拍时间，使得曝光机单位时间可处理的产品的数量变少，影响曝光机的生产效率。本方案先进行待曝光点的抓取并且在确认待曝光点抓取成功之后，再调整光源至适配位置。如此，曝光机可以在调整光源的步骤之后，才进行曝光操作，如此操作可以减少单个产品的曝光的节拍时间，避免曝光不足或者曝光过度的情况发生，而且有利于提高产出的产品的对位精度，并且有利于提高单位时间的产品产出，提高生产效率。
附图说明
所包括的附图用来提供对本申请实施例的进一步的理解，其构成了说明书的一部分，用于例示本申请的实施方式，并与文字描述一起来阐释本申请的原理。显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动性的前提下，还可以根据这些附图获得其他的附图。在附图中：
图1是本公开实施例一种曝光方法的应用流程图；
图2是本公开实施例一种曝光方法的应用最佳流程图；
图3是本公开实施例一种用于显示面板制程的曝光装置的示意图；
图4是本公开实施例调整前显示区待曝光点的示意图；
图5是本公开实施例调整前抓取前清晰度佳的待曝光点的示意图；
图6是本公开实施例调整后抓取前清晰度佳的待曝光点的示意图。
本发明的实施方式
这里所公开的具体结构和功能细节仅仅是代表性的，并且是用于描述本公开的示例性实施例的目的。但是本公开可以通过许多替换形式来具体实现，并且不应当被解释成仅仅受限于这里所阐述的实施例。
在本公开的描述中，需要理解的是，术语“中心”、“横向”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本公开和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本公开的限制。此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此， 限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本公开的描述中，除非另有说明，“多个”的含义是两个或两个以上。另外，术语“包括”及其任何变形，意图在于覆盖不排他的包含。
在本公开的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本公开中的具体含义。
这里所使用的术语仅仅是为了描述具体实施例而不意图限制示例性实施例。除非上下文明确地另有所指，否则这里所使用的单数形式“一个”、“一项”还意图包括复数。还应当理解的是，这里所使用的术语“包括”和/或“包含”规定所陈述的特征、整数、步骤、操作、单元和/或组件的存在，而不排除存在或添加一个或更多其他特征、整数、步骤、操作、单元、组件和/或其组合。
下面结合附图和较佳的实施例对本公开作进一步说明。
如图1至图2所示，本公开实施例公开了一种曝光方法，包括步骤：
S11:确认待曝光点在待曝光区域中的位置；
S12:进行待曝光点抓取，并确认待曝光点抓取成功；
S13:对应抓取成功的待曝光点调整光源至适配位置；
S14:曝光机完成曝光操作。
确认待曝光点在待曝光区域中的位置后，再进行待曝光点的抓取，如果不确认和调整待曝光点的位置而直接进行待曝光点的抓取，则很容易造成抓取失败，甚至增加曝光的节拍时间，使得曝光机单位时间可处理的产品的数量变少，影响曝光机的生产效率。本方案先进行待曝光点的抓取并且在确认待曝光点抓取成功之后，再调整光源至适配位置。如此，曝光机可以在调整光源的步骤之后，才进行曝光操作，如此操作可以减少单个产品的曝光的节拍时间，避免曝光不足或者曝光过度的情况发生，而且有利于提高产出的产品的对位精度，并且有利于提高单位时间的产品产出，提高生产效率。
本实施例可选的，确认待曝光点在待曝光区域中的位置的步骤S11，其中包括：
S21:确认待曝光点位于抓取视野的中心位置。
本方案中，如果待曝光点不位于抓取视野的中心位置，那么会延长抓取待曝光点的时间；因而本方案采用通过先确认并调整待曝光点，使待曝光点位于抓 取视野的中心的操作，可以增加待曝光点抓取成功率以推进制作流程，减少抓取的时间，从而减少单个产品的生产时间，提高生产效率。
本实施例可选的，确认待曝光点在待曝光区域中的位置的步骤S11，其中还包括：
S22:确认待曝光点位于抓取视野的中心位置后，当待曝光点显示模糊时，调整镜头对焦，直至待曝光点显示为最佳清晰状态。
本方案中，如果待曝光点是模糊的，那么在抓取时，会导致中心点的偏移，进而导致产出的产品对位精度不佳；而本方案则通过先确认并调整待曝光点，在待曝光点位于抓取视野的中心位置后，调整镜头进行对焦，并确认待曝光点处于最佳清晰状态，如此操作，不仅加快对焦的成功率，节省对焦时间，而且可以增加抓取成功率以推进制作流程，既减少抓取的时间，从而减少单个产品的生产时间，提高生产效率；而且，有利于保证产出的产品的对位精度，提高产品的良率。
本实施例可选的，待曝光点抓取，并确认待曝光点抓取成功的步骤S11，其中还包括：
S23:镜头尝试进行自动抓取待曝光点，并确认抓取成功；
多次抓取待曝光点，并确认抓取次数。
本方案中，在已经将曝光机的光源位置调整好后，利用曝光机的自动抓取功能对待曝光点进行抓取；虽然不是在最佳的抓取条件下进行抓取，但是仍然有可能抓取成功，如此操作，可以避免在其他步骤进行时，浪费抓取的机会，有利于加快抓取的进程；另外，确认抓取次数有利于提供经验，使得后续的抓取操作可以向抓取次数少的操作进行学习，有利于提高抓取的成功率和效率。
本实施例可选的，对应抓取成功的待曝光点调整光源至适配位置的步骤S13，其中还包括：
S24:为每个待曝光区域独立配置一组光源，针对每个待曝光区域依次调整光源,重复调整找到最佳光源；
S25:计算最佳光源下的量测值的三倍标准差；
S26:当三倍标准差小于2时，曝光机完成曝光操作。
本方案中，鉴于市场上已有时曝光机采用每个待曝光区域共用一组光源的模式，这样会导致待曝光点的光源不佳，不利于待曝光点的抓取，延长曝光的节拍时间；使用同一组光源，会导致其中一个待曝光区域的光亮程度较好，而其他待曝光区域的光效果不好，进而对产品造成影响，甚至导致产品的品质下降；而本方案，采用每个待曝光区域独立使用一组光源的模式，则能够使每个待曝光区域的光 源环境达到最佳化。这样就可以针对每个待曝光区域依次调整光源，不断重复调整后，找到每个待曝光区域的最佳光源。计算在最佳光源下的量测值的三倍标准差，当三倍标准差小于2时，符合要求，曝光机完成曝光操作。针对每个待曝光区域，找到每个待曝光区域所需要的最佳光源后，待曝光点和模糊程度在最佳光源下更加容易调节，同时增加产品的清晰度，进一步改善曝光机的节拍时间和产品对位精度，提升了产品的良率。
本实施例可选的，所述待曝光区域属于一块基板上对应曝光光罩大小的一块区域；所述基板划分为至少两块待曝光区域。
本方案中，待曝光区域属于一块基板上对应曝光光罩大小的一块区域，根据光罩的设计会有不同尺寸的基板，基板划分为至少两块待曝光区域，全部的待曝光区域构成整个基板，针对每个待曝光区域去调整光源，使得基板的局部得以完善，如此才能在曝光操作结束后，整个基板曝光出来的结果更好。
本实施例可选的，所述基板划分为六块待曝光区域。
本方案中，基板划分为六块待曝光区域，全部六块待曝光区域构成整个基板，划分为六块待曝光区域，可以使调整光源更加精细，光源照射的集中，在曝光操作结束后，整个基板得到较好的曝光结果。
作为本公开的另一实施例，参考图2所示，公开了另一种曝光方法，包括：
S21:确认待曝光点位于抓取视野的中心位置；
S22:确认待曝光点位于抓取视野的中心位置后，当待曝光点显示模糊时，调整镜头对焦，直至待曝光点显示为最佳清晰状态；
S23:镜头尝试进行自动抓取待曝光点，并确认抓取成功；
多次抓取待曝光点，并确认抓取次数；
S24:为每个待曝光区域独立配置一组光源，针对每个待曝光区域依次调整光源,
重复调整找到最佳光源；
S25:计算最佳光源下的量测值的三倍标准差；
S26:当三倍标准差小于2时，曝光机完成曝光操作。
本方案中，如果待曝光点不位于抓取视野的中心位置，那么会延长抓取待曝光点的时间；因而本方案采用通过先确认并调整待曝光点，使待曝光点位于抓取视野的中心的操作，可以增加待曝光点抓取成功率以推进制作流程，减少抓取的时间，从而减少单个产品的生产时间，提高生产效率。本方案中，如果待曝光点是 模糊的，那么在抓取时，会导致中心点的偏移，进而导致产出的产品对位精度不佳；而本方案则通过先确认并调整待曝光点，在待曝光点位于抓取视野的中心位置后，再调整镜头进行对焦，并确认待曝光点处于最佳清晰状态，如此操作，不仅加快对焦的成功率，节省对焦时间，而且可以增加抓取成功率以推进制作流程，既减少抓取的时间，从而减少单个产品的生产时间，提高生产效率；而且，有利于保证产出的产品的对位精度，提高产品的良率。本方案中，在已经将曝光机的光源位置调整好后，利用曝光机的自动抓取功能对待曝光点进行抓取；虽然不是在最佳的抓取条件下进行抓取，但是仍然有可能抓取成功，确认抓取次数，可以避免在其他步骤进行时，浪费抓取的机会，有利于加快抓取的进程；另外，确认抓取次数有利于提供经验，使得后续的抓取操作可以向抓取次数少的操作进行学习，有利于提高抓取的成功率和效率。本方案中，鉴于市场上已有使曝光机采用每个待曝光区域共用一组光源的模式，这样会导致待曝光点的光源不佳，不利于待曝光点的抓取，延长曝光的节拍时间；使用同一组光源，会导致其中一个待曝光区域的光亮程度较好，而其他待曝光区域的光效果不好，进而对产品造成影响，甚至导致产品的品质下降；而本方案，采用每个待曝光区域独立使用一组光源的模式，则能够使每个待曝光区域的光源环境达到最佳化。这样就可以针对每个待曝光区域依次调整光源，不断重复调整后，找到每个待曝光区域的最佳光源。计算在最佳光源下的量测值的三倍标准差，当三倍标准差小于2时，符合要求，曝光机完成曝光操作。针对每个待曝光区域，找到每个待曝光区域所需要的最佳光源后，待曝光点和模糊程度在最佳光源下更加容易调节，同时增加产品的清晰度，进一步改善曝光机的节拍时间和产品对位精度，提升了产品的良率。
作为本公开的另一实施例，参考图3所示，公开了一种曝光装置10，包括：
确认部件20，用于确认待曝光点在待曝光区域中的位置；
抓取部件30，用于进行待曝光点抓取，并确认待曝光点抓取成功；
光源调整部件40，用于对应抓取成功的待曝光点调整光源至适配位置；
曝光机50，用于在将待曝光点调整光源至适配位置后完成曝光操作。
本方案中，确认部件确认待曝光点在待曝光区域中的位置后，再进行待曝光点的抓取，如果不确认和调整待曝光点的位置而直接进行待曝光点的抓取，则很容易造成抓取失败，甚至增加曝光的节拍时间，使得曝光机单位时间可处理的产品的数量变少，影响曝光机的生产效率。本方案先通过抓取部件进行待曝光点的抓取并且在确认待曝光点抓取成功之后，再通过光源调整部件调整光源至适配位置。 如此，曝光机可以在调整光源的步骤之后，才进行曝光操作，如此操作可以减少单个产品的曝光的节拍时间，避免曝光不足或者曝光过度的情况发生，而且有利于提高产出的产品的对位精度，并且有利于提高单位时间的产品产出，提高生产效率。
本实施例可选的，确认部件20，用于确认待曝光点位于抓取视野的中心位置，待曝光点位于抓取视野的中心位置后，当待曝光点显示模糊时，调整镜头对焦，直至待曝光点显示为最佳清晰状态；抓取部件30，用于镜头尝试进行自动抓取待曝光点，并确认抓取成功；多次抓取待曝光点，并确认抓取次数。
本方案中，如果待曝光点不位于抓取视野的中心位置，那么会延长抓取待曝光点的时间；因而本方案采用先通过确认部件20确认并调整待曝光点，使待曝光点位于抓取视野的中心的操作，可以增加待曝光点抓取成功率以推进制作流程，减少抓取的时间，从而减少单个产品的生产时间，提高生产效率。本方案中，如果待曝光点是模糊的，那么在抓取时，会导致中心点的偏移，进而导致产出的产品对位精度不佳；而本方案则通过确认部件20确认并调整待曝光点，在待曝光点位于抓取视野的中心位置后，调整镜头进行对焦，并确认待曝光点处于最佳清晰状态，如此操作，不仅加快对焦的成功率，节省对焦时间，而且可以增加抓取成功率以推进制作流程，既减少抓取的时间，从而减少单个产品的生产时间，提高生产效率；而且，有利于保证产出的产品的对位精度，提高产品的良率；在已经将曝光机的光源位置调整好后，利用曝光机的自动抓取功能对待曝光点进行抓取；虽然不是在最佳的抓取条件下通过抓取部件30进行抓取，但是抓取部件30仍然有可能抓取成功，如此操作，可以避免在其他步骤进行时，浪费抓取的机会，有利于加快抓取部件30的抓取进程；另外，确认抓取部件30的抓取次数有利于提供经验，使得后续的抓取操作可以向抓取次数少的操作进行学习，有利于提高抓取的成功率和效率。
本实施例可选的，光源调整部件40，用于为每个待曝光区域独立配置一组光源，针对每个待曝光区域依次调整光源，重复调整找到最佳光源，计算最佳光源下的量测值的三倍标准差；曝光机50用于在检测到量测值的三倍标准差小于2时，完成曝光操作。
本方案中，鉴于市场上已有时曝光机采用每个待曝光区域共用一组光源的模式，这样会导致待曝光点的光源不佳，不利于待曝光点的抓取，延长曝光的节拍时间；使用同一组光源，会导致其中一个待曝光区域的光亮程度较好，而其他待曝光区域的光效果不好，进而对产品造成影响，甚至导致产品的品质下降；而本方案，同过光源调整部件40，为每个待曝光区域独立配置一组光源，使每个待曝光区域能够独立使用一组光源，则能够使每个待曝光区域的光源环境达到最佳化。这样 就可以针对每个待曝光区域依次调整光源，不断重复调整后，找到每个待曝光区域的最佳光源。计算在最佳光源下的量测值的三倍标准差，当三倍标准差小于2时，符合要求，曝光机50完成曝光操作。针对每个待曝光区域，找到每个待曝光区域所需要的最佳光源后，待曝光点和模糊程度在最佳光源下更加容易调节，同时增加产品的清晰度，进一步改善曝光机的节拍时间和产品对位精度，提升了产品的良率。
本公开的面板可以是TN面板(全称为Twisted Nematic，即扭曲向列型面板)、IPS面板(In-Plane Switching，平面转换)、VA面板(Multi-domain Vertica Aignment，多象限垂直配向技术)，当然，也可以是其他类型的面板，适用即可。
以上内容是结合具体的优选实施方式对本公开所作的进一步详细说明，不能认定本公开的具体实施只局限于这些说明。对于本公开所属技术领域的普通技术人员来说，在不脱离本公开构思的前提下，还可以做出若干简单推演或替换，都应当视为属于本公开的保护范围。

Claims (17)

  1. 一种曝光方法，包括步骤：
    确认待曝光点在待曝光区域中的位置；
    进行待曝光点抓取，并确认待曝光点抓取成功；
    对应抓取成功的待曝光点调整光源至适配位置；
    曝光机使用曝光光罩完成曝光操作。
  2. 如权利要求1所述的一种曝光方法，其中，所述确认待曝光点在待曝光区域中的位置的步骤包括：确认待曝光点位于抓取视野的中心位置。
  3. 如权利要求2所述的一种曝光方法，其中，所述确认待曝光点在待曝光区域中的位置的步骤还包括：确认待曝光点位于抓取视野的中心位置后，当待曝光点显示模糊时，调整镜头对焦，直至待曝光点显示为最佳清晰状态。
  4. 如权利要求1所述的一种曝光方法，其中，所述待曝光点抓取，并确认待曝光点抓取成功的步骤还包括：镜头尝试进行自动抓取所述待曝光点，并确认抓取成功；多次抓取所述待曝光点，并确认抓取次数。
  5. 如权利要求1所述的一种曝光方法，其中，所述对应抓取成功的待曝光点调整光源至适配位置的步骤还包括：为每个待曝光区域独立配置一组光源，针对每个待曝光区域依次调整光源，重复调整找到最佳光源。
  6. 如权利要求5所述的一种曝光方法，其中，所述对应抓取成功的待曝光点调整光源至适配位置的步骤中还包括：当找到最佳光源后，计算最佳光源下的量测值的三倍标准差。
  7. 如权利要求6所述的一种曝光方法，其中，所述对应抓取成功的待曝光点调整光源至适配位置的步骤还包括：当三倍标准差小于2时，所述曝光机使用曝光光罩完成曝光操作。
  8. 如权利要求1所述的一种曝光方法，其中，所述待曝光区域属于一块基板上对应曝光光罩大小的一块区域。
  9. 如权利要求8所述的一种曝光方法，其中，所述基板划分为至少两块待曝光区域。
  10. 一种曝光方法，包括：
    确认待曝光点位于抓取视野的中心位置；
    确认待曝光点位于抓取视野的中心位置后，当待曝光点显示模糊时，调整镜头对焦，直至待曝光点显示为最佳清晰状态；
    镜头尝试进行自动抓取所述待曝光点，并确认抓取成功；
    多次抓取所述待曝光点，并确认抓取次数；
    为每个待曝光区域独立配置一组光源，针对每个待曝光区域依次调整光源，重复调整找到最佳光源；
    计算最佳光源下的量测值的三倍标准差；
    当三倍标准差小于2时，所述曝光机使用曝光光罩完成曝光操作。
  11. 一种曝光装置，包括：
    确认部件，用于确认待曝光点在待曝光区域中的位置；
    抓取部件，用于进行待曝光点抓取，并确认待曝光点抓取成功；
    光源调整部件，用于对应抓取成功的待曝光点调整光源至适配位置；
    曝光机，用于在将待曝光点调整光源至适配位置后完成曝光操作。
  12. 如权利要求10所述的一种曝光装置，其中，所述确认部件，确认待曝光点位于抓取视野的中心位置。
  13. 如权利要求12所述的一种曝光装置，其中，所述确认部件在待曝光点位于抓取视野的中心位置后，当待曝光点显示模糊时，调整镜头对焦，直至待曝光点显示为最佳清晰状态。
  14. 如权利要求11所述的一种曝光装置，其中，所述抓取部件，控制镜头尝试进行自动抓取所述待曝光点，并确认抓取成功。
  15. 如权利要求14所述的一种曝光装置，所述抓取部件确认抓取成功；多次抓取所述待曝光点，确认抓取次数。
  16. 如权利要求11所述的一种曝光装置，其中，所述光源调整部件为每个待曝光区域独立配置一组光源，针对每个待曝光区域依次调整光源，重复调整找到最佳光源，计算最佳光源下的量测值的三倍标准差。
  17. 如权利要求11所述的一种曝光装置，其中，所述曝光机在检测到量测值的三倍标准差小于2时，完成曝光操作。
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