WO2020043157A1 - Quantum dot mesh dot light guide plate and preparation method therefor - Google Patents

Abstract

Disclosed is a method for preparing a quantum dot mesh dot light guide plate, comprising the following steps: providing a light guide plate (1), and preparing an Si-R group-containing polymer material layer (2) on the light guide plate (1), wherein R is an alkyl group; providing a mask plate provided with an open window, placing the mask plate above the polymer material layer (2), subjecting the polymer material below the area of the open window to a surface activation treatment, converting the Si-R group on the surface of the polymer material below the area of the open window into an Si-O-Si group and/or an Si-OH group, and forming a hydrophilic pattern (21), having the same shape as that of the open window, on the surface of the polymer material layer (2); and depositing a quantum dot ink in the area where the open window shape is located, subjecting the quantum dot ink to a curing treatment so as to form a micro structure of a quantum dot mesh dot (3), thereby obtaining the quantum dot mesh dot light guide plate. A printed quantum dot ink is limited within a fixed area by a selectively hydrophilically or hydrophobically treated polymer material layer so as to form a quantum dot mesh dot (3) having a fixed size, thereby precisely controlling the forming size of quantum dots on the surface of the light guide plate.

Description

量子点网点导光板及其制备方法  Quantum dot dot light guide plate and preparation method thereof

[0001] 本申请要求于 2018年 8月 29日在中国专利局提交的、 申请号为 201810992794.2、 发明名称为“量子点网点导光板及其制备方法”的中国专利申请， 以及于 2018年 8 月 29日在中国专利局提交的、 申请号为 201810992797.6、 发明名称为“量子点网 点导光板及其制备方法”的中国专利申请的优先权， 其全部内容通过引用结合在 本申请中。 [0001] This application requires a Chinese patent application filed in the Chinese Patent Office on August 29, 2018, with an application number of 201810992794.2, and an invention name of "Quantum Dot Dot Light Guide Plate and Method of Making", and in August 2018 The priority of a Chinese patent application filed at the Chinese Patent Office on the 29th with an application number of 201810992797.6 and an invention name of "Quantum Dot Dot Light Guide Plate and Preparation Method" is incorporated herein by reference in its entirety.

技术领域  Technical field

[0002] 本申请涉及光学领域， 具体涉及一种量子点网点导光板及其制备方法。  [0002] The present application relates to the field of optics, and in particular, to a quantum dot mesh dot light guide plate and a preparation method thereof.

背景技术  Background technique

[0003] 随着显示技术的发展， 液晶显示 (Liquid Crystal Display， LCD) 由于其功耗低 、 体积小、 重量轻等优点， 正越来越广泛的应用于各个领域， 是当今社会主流 的显示技术。 但由于 LCD本身并不发光， 因此需要依靠外界的背光源。 目前 LC D的背光源主要是利用蓝光 LED (Light Emitting Diode) 激发黄色変光粉形成白 光背光源， 但是由于荧光粉效率低、 光谱宽等缺点， 获得的白光亮度低、 色域 窄。 量子点材料作为一种新型的半导体纳米荧光材料， 具有发射光谱窄、 发光 颜色可调以及荧光量子产率高等特点， 已成为显示领域中的明星材料， 在提升 显示器件的色域方面具有巨大的潜力。 目前量子点背光技术已成为研究的热点  [0003] With the development of display technology, liquid crystal displays (Liquid Crystal Display, LCD) are more and more widely used in various fields due to their low power consumption, small size, light weight and other advantages, and they are the mainstream display in today's society. technology. However, since the LCD itself does not emit light, it needs to rely on external backlight sources. At present, the backlight of the LC D mainly uses a blue LED (Light Emitting Diode) to excite yellow phosphors to form a white backlight. However, due to the disadvantages of low phosphor efficiency and wide spectrum, the obtained white light has low brightness and narrow color gamut. Quantum dot material, as a new type of semiconductor nano fluorescent material, has the characteristics of narrow emission spectrum, adjustable luminous color, and high fluorescence quantum yield. It has become a star material in the display field, and has a huge advantage in improving the color gamut of display devices. potential. At present, quantum dot backlight technology has become a research hotspot

[0004] 量子点背光技术的主流发展方向是 3M公司和 Nanosys公司联合开发的应用于光 学膜集成型结构中的量子点增强膜技术 (Quantum Dot Enhancement Film, QDEF[0004] The mainstream development direction of quantum dot backlight technology is the quantum dot enhancement film technology (Quantum Dot Enhancement Film, QDEF) jointly developed by 3M and Nanosys for use in optical film integrated structures.

) ， 即将由红绿量子点材料制成的光学膜置于背光模组中导光板的正上方， 置 于背光模组侧边的蓝光 LED灯条发出的蓝光经过导光板和反射膜的协同作用形成 了均匀的蓝光面光源， 蓝光面光源再激发光学膜中的量子点材料发出红光和绿 光， 进而组合形成白光背光源。 但在这种方式中， 量子点材料的用量大， 成本 高。 ), That is, the optical film made of red-green quantum dot material is placed directly above the light guide plate in the backlight module, and the blue light emitted by the blue LED strip placed on the side of the backlight module passes through the synergy between the light guide plate and the reflective film A uniform blue surface light source is formed. The blue surface light source then excites the quantum dot material in the optical film to emit red light and green light, and then combines to form a white light backlight source. However, in this way, the amount of quantum dot material is large and the cost is high.

[0005] 由于以上问题， 目前基于量子点网点微结构的背光源新方案也正在广泛的研究 中， 即将红绿量子点进行合适的配比， 然后与专用油墨进行均匀调配以形成量 子点浆料， 再通过丝网印刷或喷墨打印工艺将量子点浆料转移到导光板的下表 面， 固化后形成量子点网点微结构。 置于背光模组侧边的蓝光 LED发出的蓝光进 入导光板， 在导光板下表面发生全反射， 但是由于量子点网点微结构的存在， 破坏了光的全反射， 使得部分蓝光散射进入量子点网点， 并激发量子点发出相 应的红光与绿光， 激发出的红绿光与其余的蓝光在导光机构内混合形成所需的 白光背光源。 显然这种方式不需将量子点材料制备成薄膜， 而只要在导光板下 表面分布一定密度的网点即可， 大大降低了量子点材料的用量。 其中喷墨打印 技术由于具有工艺简单， 材料利用率高， 精度高， 适合大面积制备等优点， 在 量子点网点的制备上有巨大的优势。 但是， 由于量子点墨水直接打印在导光板 表面， 易发生扩散或收缩， 其网点尺寸无法受到精确控制， 进而影响最终的出 光均匀性。 [0005] Due to the above problems, new backlight schemes based on the quantum dot mesh dot microstructure are currently being extensively studied. In other words, the red and green quantum dots are appropriately mixed, and then uniformly mixed with a special ink to form a quantum dot paste, and then the quantum dot paste is transferred to the lower surface of the light guide plate through a screen printing or inkjet printing process. Microstructures of quantum dot dots are formed after curing. The blue light emitted by the blue LED placed on the side of the backlight module enters the light guide plate, and total reflection occurs on the lower surface of the light guide plate. However, due to the existence of the microstructure of the dot network dots, the total reflection of the light is destroyed, and part of the blue light is scattered into the quantum dot The dots are excited, and the quantum dots are excited to emit corresponding red and green light. The excited red and green light and the remaining blue light are mixed in the light guide mechanism to form a required white light backlight source. Obviously, this method does not need to prepare the quantum dot material into a thin film, but only a certain density of dots can be distributed on the lower surface of the light guide plate, which greatly reduces the amount of quantum dot material. The inkjet printing technology has the advantages of simple process, high material utilization rate, high precision, and suitability for large-area preparation. It has huge advantages in the preparation of quantum dot dots. However, since the quantum dot ink is directly printed on the surface of the light guide plate, diffusion or shrinkage easily occurs, and the dot size cannot be accurately controlled, which further affects the final light uniformity.

[0006] 申请内容  [0006] Application Contents

[0007] 本申请实施例的目的之一在于： 提供一种量子点网点导光板及其制备方法， 旨 在解决采用喷墨打印防止制备基于量子点网点微结构的背光源时， 量子点墨水 打印在导光板表面发生扩散或收缩， 导致其网点尺寸无法受到精确控制， 进而 影响最终的出光均匀性的问题。  [0007] One of the objectives of the embodiments of the present application is to provide a quantum dot dot light guide plate and a preparation method thereof, which aim to solve the problem of quantum dot ink printing when using inkjet printing to prevent the preparation of a backlight based on the quantum dot dot microstructure. Diffusion or shrinkage occurs on the surface of the light guide plate, resulting in that the dot size cannot be accurately controlled, which further affects the final uniformity of light output.

[0008] 本申请实施例采用的技术方案是：  [0008] The technical solutions used in the embodiments of the present application are:

[0009] 第一方面， 提供了一种量子点网点导光板的制备方法， 包括以下步骤：  [0009] In a first aspect, a method for preparing a quantum dot mesh dot light guide plate is provided, including the following steps:

[0010] 提供导光板， 在所述导光板上制备含有 Si-R基团的聚合物材料层， 其中 R为烷 基；  [0010] providing a light guide plate on which a polymer material layer containing Si-R groups is prepared, wherein R is an alkyl group;

[0011] 提供设置有开窗的掩膜板， 将所述掩膜版置于在所述聚合物材料层上方， 对开 窗区域下方的聚合物材料进行表面活化处理， 使开窗区域下方的聚合物材料表 面的 Si-R基团转变为 Si-0-Si基团和 /或 Si-OH基团， 在所述聚合物材料层表面形成 与开窗形状相同的亲水图案；  [0011] A mask plate provided with a window is provided, the mask plate is placed above the polymer material layer, and a surface activation treatment is performed on the polymer material below the window region to make the The Si-R group on the surface of the polymer material is converted into Si-0-Si group and / or Si-OH group, and a hydrophilic pattern with the same shape as the window opening is formed on the surface of the polymer material layer;

[0012] 在所述开窗形状所在区域沉积量子点墨水， 对所述量子点墨水进行固化处理， 形成量子点网点的微结构， 得到量子点网点导光板。  [0012] A quantum dot ink is deposited in a region where the window shape is located, and the quantum dot ink is cured to form a microstructure of the quantum dot dots to obtain a quantum dot dot light guide plate.

[0013] 在一个实施例中， 所述开窗为圆形开窗， 所述亲水图案为亲水圆， 所述量子点 墨水为亲水性量子点墨水。 [0013] In one embodiment, the window opening is a circular window opening, the hydrophilic pattern is a hydrophilic circle, and the quantum dots The ink is a hydrophilic quantum dot ink.

[0014] 在一个实施例中， 所述圆形开窗的直径为 0.1mm-0.5mm。  [0014] In an embodiment, the diameter of the circular window is 0.1 mm-0.5 mm.

[0015] 在一个实施例中， 所述开窗为圆环状开窗， 所述亲水图案为亲水环， 所述量子 点墨水为疏水性量子点墨水。  [0015] In one embodiment, the window opening is a ring-shaped window opening, the hydrophilic pattern is a hydrophilic ring, and the quantum dot ink is a hydrophobic quantum dot ink.

[0016] 在一个实施例中， 所述圆环状开窗的直径为 0.1mm-0.5mm。  [0016] In one embodiment, the diameter of the annular window is 0.1 mm-0.5 mm.

[0017] 在一个实施例中， 所述含有 Si-R的聚合物材料层的厚度为 0.001mm-lmm。  [0017] In one embodiment, the thickness of the Si-R-containing polymer material layer is 0.001 mm to 1 mm.

[0018] 在一个实施例中， 所述量子点网点中含有量子点、 第二固化剂和添加剂。  [0018] In one embodiment, the quantum dot network dots contain quantum dots, a second curing agent and additives.

[0019] 在一个实施例中， 所述添加剂包括散射粒子、 分散剂、 粘度调节剂和表面张力 调节剂中的一种或多种。  [0019] In one embodiment, the additive includes one or more of a scattering particle, a dispersant, a viscosity modifier, and a surface tension modifier.

[0020] 在一个实施例中， 所述散射粒子选自 SiC颗粒、 Si ₃N ₄颗粒、 Zr0 ₂颗粒、 HfO ₂ 颗粒、 Si0 ₂颗粒、 Ti0 ₂颗粒、 ZnO颗粒、 A1 ₂0 ₃颗粒、 Sn0 ₂颗粒、 CaCO ₃颗粒 和 BaSO ₄颗粒中的至少一种； [0020] In one embodiment, the scattering particles are selected from SiC particles, Si ₃ N ₄ particles, Zr0 ₂ particles, HfO ₂ particles, Si0 ₂ particles, Ti0 ₂ particles, ZnO particles, A1 ₂ 0 ₃ particles, Sn0 At least one of ₂ particles, CaCO ₃ particles, and BaSO ₄ particles;

[0021] 和 /或， 所述第二固化剂选自聚丙烯酸酯、 聚氨酯丙烯酸酯、 环氧丙烯酸酯、 聚酯丙烯酸酯、 聚醚丙烯酸酯、 丙烯酸酯、 环氧树脂和有机硅氧烷树脂中的一 种或多种。  [0021] and / or, the second curing agent is selected from the group consisting of polyacrylate, urethane acrylate, epoxy acrylate, polyester acrylate, polyether acrylate, acrylate, epoxy resin, and organosiloxane resin One or more of them.

[0022] 在一个实施例中， 所述表面活化处理为紫外臭氧处理或等离子体处理。  [0022] In one embodiment, the surface activation treatment is an ultraviolet ozone treatment or a plasma treatment.

[0023] 在一个实施例中， 所述含有 Si-R的聚合物材料层为聚二甲基硅氧烷层。  [0023] In one embodiment, the Si-R-containing polymer material layer is a polydimethylsiloxane layer.

[0024] 在一个实施例中， 在所述导光板上制备含有 Si-R的聚合物材料层的方法， 包括 以下步骤：  [0024] In one embodiment, a method for preparing a polymer material layer containing Si-R on the light guide plate includes the following steps:

[0025] 提供聚二甲基硅氧烷预聚体和第一固化剂的混合溶液；  [0025] providing a mixed solution of a polydimethylsiloxane prepolymer and a first curing agent;

[0026] 在所述导光板沉积表面沉积所述混合溶液后， 进行加热处理， 制备得到表面粘 合有聚二甲基硅氧烷层的导光板。  [0026] After the mixed solution is deposited on the light guide plate deposition surface, heat treatment is performed to prepare a light guide plate with a polydimethylsiloxane layer adhered on the surface.

[0027] 在一个实施例中， 所述加热处理的温度为 30-80°C， 加热时间为 l-10h。  [0027] In one embodiment, the temperature of the heat treatment is 30-80 ° C, and the heating time is 1-10h.

[0028] 在一个实施例中， 所述混合溶液中， 所述聚二甲基硅氧烷预聚体和所述第一固 化剂的体积比为 5: 1-20: 1。  [0028] In one embodiment, in the mixed solution, a volume ratio of the polydimethylsiloxane prepolymer to the first curing agent is 5: 1-20: 1.

[0029] 在一个实施例中， 所述表面活化处理为紫外臭氧处理， 所述紫外臭氧处理的紫 外光波长为 185和 254nm， 功率密度为 10-100 mW/cm ²， 照射时间为 l-60min; [0029] In one embodiment, the surface activation treatment is ultraviolet ozone treatment, the ultraviolet light wavelength of the ultraviolet ozone treatment is 185 and 254 nm, the power density is 10-100 mW / cm ² , and the irradiation time is 1-60 min ;

[0030] 或者， 所述表面活化处理为等离子体处理， 所述等离子处理的功率为 100-1000 W, 处理时间为 l-60min， 气体流量为 10-200sccm。 [0030] Alternatively, the surface activation treatment is a plasma treatment, and the power of the plasma treatment is 100-1000 W, processing time is 1-60min, and gas flow is 10-200sccm.

[0031] 第二方面， 提供了一种量子点网点导光板， 包括导光板， 设置在所述导光板至 少一表面的含有 Si-R的聚合物材料层， 所述聚合物材料层表面设置有亲水环或亲 水圆， 所述亲水环或所述亲水圆表面结合 Si-0-Si和 /或 Si-OH， 且所述亲水圆所在 区域或所述亲水环围合形成的区域设置有量子点网点。  [0031] In a second aspect, a quantum dot dot light guide plate is provided, including a light guide plate, a polymer material layer containing Si-R disposed on at least one surface of the light guide plate, and the surface of the polymer material layer is provided with A hydrophilic ring or a hydrophilic circle, wherein the surface of the hydrophilic ring or the hydrophilic circle is combined with Si-0-Si and / or Si-OH, and the area where the hydrophilic circle is located or the hydrophilic ring is surrounded to form The area is set with quantum dot dots.

[0032] 在一个实施例中， 所述聚合物材料层为聚二甲基硅氧烷层。  [0032] In one embodiment, the polymer material layer is a polydimethylsiloxane layer.

[0033] 在一个实施例中， 所述量子点网点中含有量子点、 第二固化剂和添加剂。  [0033] In one embodiment, the quantum dot dots contain quantum dots, a second curing agent and additives.

[0034] 在一个实施例中， 所述添加剂包括散射粒子、 分散剂、 粘度调节剂和表面张力 调节剂中的一种或多种。  [0034] In one embodiment, the additive includes one or more of a scattering particle, a dispersant, a viscosity modifier, and a surface tension modifier.

[0035] 在一个实施例中， 所述散射粒子选自 SiC颗粒、 Si ₃N ₄颗粒、 Zr0 ₂颗粒、 HfO ₂ 颗粒、 Si0 ₂颗粒、 Ti0 ₂颗粒、 ZnO颗粒、 A1 ₂0 ₃颗粒、 Sn0 ₂颗粒、 CaCO ₃颗粒 和 BaSO ₄颗粒中的至少一种； [0035] In one embodiment, the scattering particles are selected from SiC particles, Si ₃ N ₄ particles, Zr0 ₂ particles, HfO ₂ particles, Si0 ₂ particles, Ti0 ₂ particles, ZnO particles, A1 ₂ 0 ₃ particles, Sn0 At least one of ₂ particles, CaCO ₃ particles, and BaSO ₄ particles;

[0036] 和 /或， 所述第二固化剂选自聚丙烯酸酯、 聚氨酯丙烯酸酯、 环氧丙烯酸酯、 聚酯丙烯酸酯、 聚醚丙烯酸酯、 丙烯酸酯、 环氧树脂和有机硅氧烷树脂中的一 种或多种。  [0036] and / or, the second curing agent is selected from the group consisting of polyacrylate, urethane acrylate, epoxy acrylate, polyester acrylate, polyether acrylate, acrylate, epoxy resin, and organosiloxane resin One or more of them.

[0037] 在一个实施例中， 所述量子点网点的直径为 0.1-0.5mm。  [0037] In one embodiment, the diameter of the quantum dot mesh is 0.1-0.5 mm.

[0038] 本申请实施例提供的量子点网点导光板的制备方法的有益效果在于： 在导光板 上制备含有 Si-R的聚合物材料层， 形成疏水表面， 进而对含有 Si-R的聚合物材料 层表面进行选择性亲疏水性处理 （形成亲水区域， 如亲水环或亲水圆） ， 将打 印的量子点墨水限定在固定区域， 形成具有固定尺寸的量子点网点， 从而精确 控制量子点在导光板表面的成型尺寸。  [0038] The method for preparing the quantum dot mesh dot light guide plate provided in the embodiment of the present application has the beneficial effect that: a polymer material layer containing Si-R is prepared on the light guide plate to form a hydrophobic surface, and then a polymer containing Si-R is formed; The surface of the material layer is selectively hydrophilized (formed with a hydrophilic region, such as a hydrophilic ring or a hydrophilic circle), and the printed quantum dot ink is limited to a fixed area to form a quantum dot network dot with a fixed size, so as to precisely control the quantum dots. Forming size on the surface of the light guide plate.

[0039] 本申请实施例提供的量子点网点导光板的有益效果在于： 设置有疏水聚合物层 ， 且所述疏水聚合物层表面设置含有 Si-0-Si和 /或 Si-OH的亲水环或亲水圆， 由此 形成亲疏水性区域， 进而可以很好的通过调控量子点的极性实现其在导光板表 面的尺寸定型。  [0039] The beneficial effects of the quantum dot mesh dot light guide plate provided in the embodiments of the present application are as follows: a hydrophobic polymer layer is provided, and the surface of the hydrophobic polymer layer is provided with a hydrophilic material containing Si-0-Si and / or Si-OH A ring or a hydrophilic circle forms a hydrophilic region and a hydrophobic region, so that the size of the quantum dot on the surface of the light guide plate can be well controlled by adjusting the polarity of the quantum dot.

发明概述  Summary of invention

技术问题  technical problem

问题的解决方案 发明的有益效果 Problem solution The beneficial effects of the invention

对附图的简要说明  Brief description of the drawings

附图说明  BRIEF DESCRIPTION OF THE DRAWINGS

[0040] 为了更清楚地说明本申请实施例中的技术方案， 下面将对实施例或示范性技术 描述中所需要使用的附图作简单地介绍， 显而易见地， 下面描述中的附图仅仅 是本申请的一些实施例， 对于本领域普通技术人员来讲， 在不付出创造性劳动 的前提下， 还可以根据这些附图获得其它的附图。  [0040] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings used in the embodiments or exemplary technical descriptions will be briefly introduced below. Obviously, the drawings in the following description are merely Some embodiments of the present application, for a person of ordinary skill in the art, can obtain other drawings according to the drawings without paying creative labor.

[0041] 图 1是本申请一实施例提供的量子点网点导光板的制备方法的流程示意图； [0041] FIG. 1 is a schematic flowchart of a method for preparing a quantum dot mesh dot light guide plate according to an embodiment of the present application;

[0042] 图 2是本申请一实施例提供的在导光板上制备含有 Si-R的聚合物材料层的示意 图； [0042] FIG. 2 is a schematic diagram of preparing a polymer material layer containing Si-R on a light guide plate according to an embodiment of the present application;

[0043] 图 3是本申请另一实施例提供的对含有 Si-R的聚合物材料层表面进行选择性亲 疏水性处理的示意图；  [0043] FIG. 3 is a schematic diagram of performing selective hydrophilic and hydrophobic treatment on a surface of a polymer material layer containing Si-R according to another embodiment of the present application;

[0044] 图 4是本申请另一实施例提供的对含有 Si-R的聚合物材料层表面进行选择性亲 疏水性处理后形成亲水环或亲水圆的结构示意图；  [0044] FIG. 4 is a schematic diagram of a structure for forming a hydrophilic ring or a hydrophilic circle on a surface of a polymer material layer containing Si-R after selective hydrophilic treatment according to another embodiment of the present application;

[0045] 图 5是本申请另一实施例提供的量子点网点导光板的结构示意图。  5 is a schematic structural diagram of a quantum dot mesh dot light guide plate according to another embodiment of the present application.

[0046] 具体实施方式  DETAILED DESCRIPTION

[0047] 为了使本申请的目的、 技术方案及优点更加清楚明白， 以下结合附图及实施例 ， 对本申请进行进一步详细说明。 应当理解， 此处所描述的具体实施例仅用以 解释本发明， 并不用于限定本申请。  [0047] In order to make the purpose, technical solution, and advantages of the present application clearer, the present application is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention, and are not intended to limit the present application.

[0048] 需说明的是， 术语“上”、 “下”、 “左”、 “右”等指示的方位或位置关系为基于附 图所示的方位或位置关系， 仅是为了便于描述， 而不是指示或暗示所指的装置 或元件必须具有特定的方位、 以特定的方位构造和操作， 因此不能理解为对本 申请的限制， 对于本领域的普通技术人员而言， 可以根据具体情况理解上述术 语的具体含义。 术语“第一”、 “第二”仅用于描述目的， 而不能理解为指示或暗示 相对重要性或者隐含指明所指示的技术特征的数量。 由此， 限定有“第一”、 “第 二”的特征可以明示或者隐含地包括一个或者更多个该特征。 在本发明的描述中 ， “多个”的含义是两个或两个以上， 除非另有明确具体的限定。  [0048] It should be noted that the orientations or position relationships indicated by the terms “up”, “down”, “left”, “right” and the like are based on the orientations or position relationships shown in the drawings, and are merely for convenience of description, and It does not indicate or imply that the device or element referred to must have a specific orientation, structure and operation in a specific orientation, so it cannot be understood as a limitation on this application. For those of ordinary skill in the art, the above terms can be understood according to specific circumstances. Specific meaning. The terms “first” and “second” are used for descriptive purposes only, and should not be interpreted as indicating or suggesting relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, the meaning of "a plurality" is two or more, unless it is specifically and specifically defined otherwise.

[0049] 为了说明本申请所述的技术方案， 以下结合具体附图及实施例进行详细说明。 [0050] 结合图 1-4， 本申请一些实施例提供一种量子点网点导光板的制备方法， 包括 以下步骤， 流程示意图如图 1所示： [0049] In order to explain the technical solution described in this application, detailed descriptions are given below with reference to specific drawings and embodiments. [0050] With reference to FIGS. 1-4, some embodiments of the present application provide a method for preparing a quantum dot mesh dot light guide plate, which includes the following steps, and a schematic flowchart is shown in FIG. 1:

[0051] S01.提供导光板 1， 在导光板 1上制备含有 Si-R的聚合物材料层 2, 其中 R为烷基  [0051] S01. A light guide plate 1 is provided, and a polymer material layer 2 containing Si-R is prepared on the light guide plate 1, wherein R is an alkyl group.

[0052] S02.提供设置有开窗的掩膜板， 将所述掩膜版置于在所述聚合物材料层上方， 对开窗区域下方的聚合物材料进行表面活化处理， 使开窗区域下方的聚合物材 料表面的 Si-R基团转变为 Si-0-Si基团和 /或 Si-OH基团， 在所述聚合物材料层表面 形成与开窗形状相同的亲水图案 21 ; [0052] S02. Provide a mask plate provided with a window, the mask plate is placed above the polymer material layer, and a surface activation treatment is performed on the polymer material below the window region to make the window region The lower Si-R group on the surface of the polymer material is transformed into Si-0-Si groups and / or Si-OH groups, and a hydrophilic pattern 21 having the same shape as the window opening is formed on the surface of the polymer material layer;

[0053] S03.在所述开窗形状所在区域沉积量子点墨水， 对所述量子点墨水进行固化处 理， 形成量子点网点的微结构， 得到量子点网点导光板。  [0053] S03. Depositing a quantum dot ink in a region where the window shape is located, curing the quantum dot ink to form a microstructure of a quantum dot dot, and obtaining a quantum dot dot light guide plate.

[0054] 本发明实施例提供的量子点网点导光板的制备方法， 在导光板 1上制备含有 Si- R的聚合物材料层 2， 形成疏水表面， 进而对含有 Si-R的聚合物材料层 2表面进行 选择性亲疏水性处理 （形成亲水图案， 如亲水环或亲水圆） ， 将打印的量子点 墨水限定在固定区域， 形成具有固定尺寸的量子点网点， 从而精确控制量子点 在导光板 1表面的成型尺寸。  [0054] A method for preparing a quantum dot mesh dot light guide plate provided in the embodiment of the present invention, a polymer material layer 2 containing Si-R is prepared on the light guide plate 1 to form a hydrophobic surface, and then a polymer material layer containing Si-R is prepared. 2 The surface is selectively hydrophilized (formed with a hydrophilic pattern, such as a hydrophilic ring or a hydrophilic circle), and the printed quantum dot ink is limited to a fixed area to form a quantum dot network dot with a fixed size, so that the quantum dots are accurately controlled. The molding size of the surface of the light guide plate 1.

[0055] 具体的， 上述步骤 S01中， 导光板 1可以采用本领域常见材质的导光板， 导光板 1的材质包括但不限于聚乙烯、 聚丙烯、 聚苯乙烯、 聚碳酸酯、 聚丙烯酸甲酯、 聚甲基丙烯酸甲酯、 聚二甲基硅氧烷中的至少一种。 导光板 1的厚度为

[0055] Specifically, in the above step S01, the light guide plate 1 may be a light guide plate commonly used in the art. The material of the light guide plate 1 includes, but is not limited to, polyethylene, polypropylene, polystyrene, polycarbonate, and polyacrylic acid. At least one of an ester, polymethyl methacrylate, and polydimethylsiloxane. The thickness of the light guide plate 1 is

[0056] 在导光板 1上制备含有 Si-R基团的聚合物材料层 2， 所述含有 Si-R基团的聚合物 材料层 2为疏水层， 同时含有 Si-R基团， 所述 Si-R基团经过表面活性改性转变为 亲水基团， 如 Si-0-Si基团、 Si-OH基团， 从而可以通过掩膜版形成亲水区域和疏 水区域， 进而精准控制网点导光板的形成。 [0056] A polymer material layer 2 containing a Si-R group is prepared on the light guide plate 1. The polymer material layer 2 containing a Si-R group is a hydrophobic layer and also contains a Si-R group. The Si-R group is converted into a hydrophilic group, such as a Si-0-Si group and a Si-OH group, through surface active modification, so that a hydrophilic region and a hydrophobic region can be formed through a mask plate, and the dots can be precisely controlled. Formation of the light guide plate.

[0057] 在本申请的一些实施例中， 所述含有 Si-R基团的聚合物材料层 2的厚度为 0.001- lmm。 若所述含有 Si-R基团的聚合物材料层 2的厚度过薄， 则不足以形成修饰层 ， 进而通过选择性亲疏水性处理， 达到精确控制量子点在导光板 1表面的成型尺 寸的目的。 若所述含有 Si-R基团的聚合物材料层 2的厚度过厚， 则会增加光的传 播行程， 使光能量损失； 此外， 所述含有 Si-R基团的聚合物材料层 2的厚度过厚 也会增加导光板的整体厚度， 使最终的显示器厚度增加。 [0057] In some embodiments of the present application, the thickness of the polymer material layer 2 containing the Si—R group is 0.001-1 mm. If the thickness of the polymer material layer 2 containing the Si-R group is too thin, it is not sufficient to form a modified layer, and then the selective hydrophilicity treatment is used to precisely control the forming size of the quantum dot on the surface of the light guide plate 1 . If the thickness of the Si-R group-containing polymer material layer 2 is too thick, the propagation path of light is increased and light energy is lost. In addition, the polymer material layer 2 of the Si-R group-containing polymer material layer 2 Too thick It will also increase the overall thickness of the light guide plate, which will increase the final display thickness.

[0058] 在本申请的一些实施例中， 采用溶液加工法制备含有 Si-R基团的聚合物材料层 2, 从而得到厚度均匀、 表面光滑的膜层。 在本申请的一些实施例中， 通过旋涂 或刮涂或浸渍提拉工艺将含有 Si-R基团的聚合物材料涂布在导光板 1表面。  [0058] In some embodiments of the present application, a solution processing method is used to prepare a polymer material layer 2 containing Si-R groups, so as to obtain a film layer with a uniform thickness and a smooth surface. In some embodiments of the present application, a polymer material containing a Si-R group is coated on the surface of the light guide plate 1 by a spin coating, a knife coating, or a dipping and pulling process.

[0059] 在本申请的一些实施例中， 所述含有 Si-R基团的聚合物材料层 2为聚二甲基硅 氧烷 （PDMS） 层， 即导光板 1表面设置有聚二甲基硅氧烷层， 如图 2所示。 所述 聚二甲基硅氧烷不仅能够将疏水基团 Si-R基团很好的转变为亲水基团 Si-0-Si基团 和 /或 Si-OH基团， 且其固化后具有很好的粘结性能， 能够牢固地附着在导光板 1 表面， 从而有利于量子点网点的精准控制。  [0059] In some embodiments of the present application, the polymer material layer 2 containing a Si-R group is a polydimethylsiloxane (PDMS) layer, that is, a polydimethylsiloxane is disposed on a surface of the light guide plate 1. The siloxane layer is shown in FIG. 2. The polydimethylsiloxane can not only convert a hydrophobic group Si-R group into a hydrophilic group Si-0-Si group and / or Si-OH group, but also has Very good adhesion, can be firmly attached to the surface of the light guide plate 1, which is conducive to the precise control of the dots of the quantum dots.

[0060] 在本申请的一些实施例中， 在导光板 1上制备含有 Si-R基团的聚合物材料层 2的 方法， 包括以下步骤：  [0060] In some embodiments of the present application, a method for preparing a polymer material layer 2 containing a Si-R group on the light guide plate 1 includes the following steps:

[0061] S011.提供聚二甲基硅氧烷预聚体和第一固化剂的混合溶液。  [0061] S011. Provide a mixed solution of a polydimethylsiloxane prepolymer and a first curing agent.

[0062] 该步骤中， 所述第一固化剂在加热条件下将所述聚二甲基硅氧烷预聚体固化交 联成聚二甲基硅氧烷， 同时牢固地粘合在导光板 1表面。 在本申请的一些实施例 中， 所述聚二甲基硅氧烷预聚体为乙烯基甲基聚硅氧烷， 所述第一固化剂为含 氢聚硅氧烷 （含氢硅油） 。 预聚体的乙烯基与固化剂的硅氢基团进行氢化硅烷 化反应， 交联形成聚二甲基硅氧烷。  [0062] In this step, the first curing agent cures and crosslinks the polydimethylsiloxane prepolymer to polydimethylsiloxane under heating conditions, and at the same time firmly adheres to the light guide plate. 1 surface. In some embodiments of the present application, the polydimethylsiloxane prepolymer is vinyl methyl polysiloxane, and the first curing agent is hydrogen-containing polysiloxane (hydrogen-containing silicone oil). The vinyl group of the prepolymer undergoes a hydrosilylation reaction with the hydrosilylation group of the curing agent, and is crosslinked to form polydimethylsiloxane.

[0063] 按照所述聚二甲基硅氧烷预聚体和所述第一固化剂的体积比为 5: 1-20: 1配置所 述混合溶液， 得到的膜层在力学性能和柔性上有较好的平衡。 若所述聚二甲基 硅氧烷预聚体的含量过高， 则固化难度提高， 且固化后形成的膜硬度过高； 若 所述聚二甲基硅氧烷预聚体的含量过低， 固化后形成的膜硬度过软， 力学性能 不佳。 具体在本申请的一些实施例中， 所述混合溶液中， 所述聚二甲基硅氧烷 预聚体和所述第一固化剂的体积比为 10: 1。  [0063] The mixed solution is configured according to a volume ratio of the polydimethylsiloxane prepolymer and the first curing agent of 5: 1-20: 1, and the obtained film layer has mechanical properties and flexibility. There is better balance. If the content of the polydimethylsiloxane prepolymer is too high, the curing difficulty is increased, and the hardness of the film formed after curing is too high; if the content of the polydimethylsiloxane prepolymer is too low The hardness of the film formed after curing is too soft and the mechanical properties are not good. Specifically, in some embodiments of the present application, in the mixed solution, a volume ratio of the polydimethylsiloxane prepolymer to the first curing agent is 10: 1.

[0064] 在本申请的一些实施例中， 将所述聚二甲基硅氧烷预聚体和所述第一固化剂混 合搅拌； 然后置于真空箱中脱气处理， 去除气泡， 形成透明状混合溶液， 避免 气泡的存在在膜层表面形成孔洞， 影响量子点网点的形成效果。 具体的， 若存 在气泡， 一方面， 则在加热的过程中气泡可能破裂， 造成膜层有孔洞， 那么原 本要处理成亲水的区域由于存在孔洞而无法得到有效处理； 另一方面， 若气泡 没有破裂而是残留在膜层中， 则会造成光的散射， 从而影响最终的出光均匀性 [0064] In some embodiments of the present application, the polydimethylsiloxane prepolymer and the first curing agent are mixed and stirred; then placed in a vacuum box for degassing treatment to remove air bubbles and form a transparent The mixed solution prevents the formation of holes on the surface of the film layer due to the presence of air bubbles, which affects the formation effect of the dots of the quantum dots. Specifically, if there are air bubbles, on the one hand, the air bubbles may rupture during the heating process, causing holes in the film layer, and the areas that were originally treated to be hydrophilic cannot be effectively treated because of the existence of holes; on the other hand, if air bubbles Without cracking, it remains in the film layer, which will cause light scattering and affect the final light uniformity.

[0065] S012.在导光板 1沉积表面沉积所述混合溶液后， 进行加热处理， 制备得到表面 粘合有聚二甲基硅氧烷层的导光板 1。 [0065] S012. After the mixed solution is deposited on the light guide plate 1 deposition surface, heat treatment is performed to prepare a light guide plate 1 with a polydimethylsiloxane layer adhered on the surface.

[0066] 在本申请的一些实施例中， 在本申请的一些实施例中， 该步骤采用溶液加工法 沉积所述混合溶液， 具体方式如前所述。 在本申请的一些实施例中， 进行加热 处理， 将所述聚二甲基硅氧烷预聚体固化交联成聚二甲基硅氧烷， 同时牢固地 粘合在导光板 1表面。 在本申请的一些实施例中， 所述加热处理的温度为 30-80°C ， 加热时间为 l-10h。 若温度过高或时间过长， 容易破坏聚合物的属性如分解等 ; 若温度过低或时间过短， 则不能有效地将所述聚二甲基硅氧烷预聚体充分固 化交联成聚二甲基硅氧烷， 或者不能牢固地粘合在导光板 1表面。 具体在本申请 的一些实施例中， 所述加热处理的温度为 80°C， 加热时间为 lh。 所述加热处理具 体可采用烘烤方式。 在本申请的一些实施例中， 沉积形成的所述聚二甲基硅氧 焼层的厚度为 0.001nm-lmm。  [0066] In some embodiments of the present application, in some embodiments of the present application, this step uses a solution processing method to deposit the mixed solution, and the specific manner is as described above. In some embodiments of the present application, heat treatment is performed to cure and cross-link the polydimethylsiloxane prepolymer into polydimethylsiloxane, and at the same time, firmly adhere to the surface of the light guide plate 1. In some embodiments of the present application, the temperature of the heat treatment is 30-80 ° C, and the heating time is 1-10h. If the temperature is too high or the time is too long, it is easy to destroy the properties of the polymer such as decomposition; if the temperature is too low or the time is too short, the polydimethylsiloxane prepolymer cannot be effectively cured and crosslinked into Polydimethylsiloxane may not be firmly adhered to the surface of the light guide plate 1. Specifically, in some embodiments of the present application, the temperature of the heat treatment is 80 ° C, and the heating time is lh. The heat treatment body may adopt a baking method. In some embodiments of the present application, the thickness of the polydimethylsiloxane layer formed by deposition is 0.001 nm to 1 mm.

[0067] 上述步骤 S02中， 提供设置有开窗的掩膜板， 所述开窗的形状， 根据在聚合物 材料层表面形成的、 与开窗形状相同的亲水图案所在区域对应沉积的量子点类 型而异。  [0067] In the above step S02, a mask plate provided with a window is provided, and the shape of the window is corresponding to the deposited quantum according to the area where the hydrophilic pattern having the same shape as the window is formed on the surface of the polymer material layer. Point types vary.

[0068] 为了最终形成球冠状的量子点网点， 从而保证量子点网点导光板的出光均匀性 ， 在聚合物材料层 2沉积量子点材料的区域应设置为圆形区域。 鉴于此， 本发明 实施例提供设置有圆形开窗或圆环状开窗的掩膜板， 所述圆形开窗或圆环状开 窗的尺寸应与对应的量子点网点的尺寸一致。  [0068] In order to finally form a spherical crown-shaped quantum dot network dot, so as to ensure the uniformity of light output of the quantum dot network dot light guide plate, the area where the quantum dot material is deposited on the polymer material layer 2 should be set as a circular area. In view of this, an embodiment of the present invention provides a mask plate provided with a circular window or a circular window, and the size of the circular window or a circular window should be consistent with the size of the corresponding quantum dot dots.

[0069] 在一种实施方式中， 所述开窗为圆形开窗， 所述亲水图案为亲水圆， 所述量子 点墨水为亲水性量子点墨水。 具体的， 所述掩膜板上， 开窗的设置密度和阵列 排布以要实现的量子点网点微结构为模板。 所述掩膜板的开窗区域可以为一系 列直径大小不一， 分布密度不等的圆形。 在本申请的一些实施例中， 所述圆形 开窗的直径为 0. lnm-0.5mm, 分布密度为 10%-78.5%。  [0069] In one embodiment, the window opening is a circular window opening, the hydrophilic pattern is a hydrophilic circle, and the quantum dot ink is a hydrophilic quantum dot ink. Specifically, the setting density and the array arrangement of the windows on the mask plate use the quantum dot mesh microstructure to be realized as a template. The window opening area of the mask plate may be a series of circles with different diameters and different distribution densities. In some embodiments of the present application, the diameter of the circular window is 0.1 nm-0.5 mm, and the distribution density is 10% -78.5%.

[0070] 在另一种实施方式中， 所述开窗为圆环状开窗， 所述亲水图案为亲水环， 所述 量子点墨水为疏水性量子点墨水。 具体的， 所述掩膜板上， 开窗的设置密度和 阵列排布以要实现的量子点网点微结构为模板。 所述掩膜板的开窗区域可以为 一系列直径大小不一， 分布密度不等的圆环形。 在本申请的一些实施例中， 所 述圆环状开窗的直径为 0.1-0.5mm， 分布密度为 10%-78.5%。 [0070] In another embodiment, the window opening is a ring-shaped window opening, the hydrophilic pattern is a hydrophilic ring, and the quantum dot ink is a hydrophobic quantum dot ink. Specifically, the setting density of the windows on the mask plate and The array is arranged with the microstructure of the quantum dot network to be realized as a template. The window area of the mask plate may be a series of circular rings with different diameters and different distribution densities. In some embodiments of the present application, the diameter of the annular window is 0.1-0.5 mm, and the distribution density is 10% -78.5%.

[0071] 如图 3所示， 将所述掩膜版固定在聚合物材料层 2上方， 对开窗区域下方的聚合 物材料进行表面活化处理。 所述表面活化处理为紫外臭氧处理或等离子体处理 。 以所述聚二甲基硅氧烷为例， 在本申请的一些实施例中， 所述表面活化处理 为紫外臭氧处理， 且所述紫外臭氧处理的紫外光波长为 185nm和 254nm， 功率密 度为 10-100 mW/cm ²， 照射时间为 l-60min。 在本申请的另一些实施例中， 所述 表面活化处理为等离子体处理， 且所述等离子处理的功率为 HXM000W， 处理时 间为 l-60min， 气体流量为 10-200sccm。 其中， 等离子处理方式选用的气体可以 是空气、 氧气、 氮气、 氮氧混合气、 氩氧混合气。 [0071] As shown in FIG. 3, the mask plate is fixed above the polymer material layer 2, and a surface activation treatment is performed on the polymer material below the window region. The surface activation treatment is ultraviolet ozone treatment or plasma treatment. Taking the polydimethylsiloxane as an example, in some embodiments of the present application, the surface activation treatment is ultraviolet ozone treatment, and the ultraviolet light wavelength of the ultraviolet ozone treatment is 185 nm and 254 nm, and the power density is 10-100 mW / cm ² , irradiation time is 1-60min. In other embodiments of the present application, the surface activation treatment is plasma treatment, and the power of the plasma treatment is HXM000W, the treatment time is 1-60 min, and the gas flow rate is 10-200 sccm. The gas selected for the plasma processing method may be air, oxygen, nitrogen, a nitrogen-oxygen mixed gas, or an argon-oxygen mixed gas.

[0072] 所述表面活化处理， 可通过活化装置 4提供活化条件。 如当采用紫外臭氧处理 进行表面活化处理时， 活化装置 4为紫外光源； 采用等离子体处理进行表面活化 处理时， 活化装置 4为等离子体装置。 活化装置 4发出的 UV光或等离子体 （图中 箭头表示） 能够通过掩膜板 3上的开窗区域 31直接作用在聚合物材料层 2表面， 将开窗区域下方 （即未被掩膜板遮蔽区域） 聚合物材料层 2表面的疏水基团 Si-R 基团转变为亲水基团 Si-0-Si基团和 /或 Si-OH基团而表现为亲水性， 形成亲水区域 ; 而聚合物材料层 2被掩膜板 3遮蔽区域未发生反应仍表现为疏水性， 形成疏水 区域。 最终， 如图 4所示， 作为一种情形， 在聚合物材料层 2表面形成亲水环或 亲水圆 21， 亲水性量子点墨水打印在亲水区域 21 （亲水圆） 能够很好的铺展， 而在亲水区域 21 （亲水圆） 以外区域表现为疏水性， 量子点墨水在其上不浸润 。 作为一种情形， 疏水性量子点墨水在亲水环围合形成的区域（即亲水环中间的 疏水圆形区域）能够很好的铺展， 而在亲水环区域表现为亲水性， 量子点墨水在 其上不浸润， 由此， 所打印的量子点墨水被限定在亲水区域 （即亲水环区域） [0072] In the surface activation treatment, activation conditions can be provided by the activation device 4. For example, when surface activation treatment is performed by ultraviolet ozone treatment, the activation device 4 is an ultraviolet light source; when surface activation treatment is performed by plasma treatment, the activation device 4 is a plasma device. The UV light or plasma (indicated by the arrow in the figure) emitted by the activation device 4 can directly act on the surface of the polymer material layer 2 through the window opening area 31 on the mask plate 3, and will be below the window opening area (that is, without the mask plate) The masked area) The hydrophobic group Si-R group on the surface of the polymer material layer 2 is converted into a hydrophilic group Si-0-Si group and / or a Si-OH group and appears to be hydrophilic, forming a hydrophilic region The polymer material layer 2 and the masked area of the masking plate 3 do not react and still appear hydrophobic, forming a hydrophobic region. Finally, as shown in FIG. 4, as a case, a hydrophilic ring or a hydrophilic circle 21 is formed on the surface of the polymer material layer 2, and a hydrophilic quantum dot ink can be printed on the hydrophilic region 21 (hydrophilic circle). However, the area outside the hydrophilic area 21 (hydrophilic circle) appears hydrophobic, and the quantum dot ink does not wet thereon. As a case, the hydrophobic quantum dot ink can spread well in the area surrounded by the hydrophilic ring (that is, the hydrophobic circular area in the middle of the hydrophilic ring), and it appears hydrophilic in the area of the hydrophilic ring. The dot ink does not wet thereon, so that the printed quantum dot ink is limited to the hydrophilic region (ie, the hydrophilic ring region).

， 固化以后的量子点墨水就形成了固定尺寸的量子点网点。 由于亲水区域的形 状及尺寸大小由掩膜板开窗区域所决定， 因此可以通过设计不同的掩膜板开窗 区域来控制亲水区域的形状及尺寸， 从而最终控制量子点网点的尺寸， 精准控 制量子点在导光板 1表面的成型尺寸。 [0073] 上述步骤 S03中， 在所述亲水圆所在区域沉积亲水性量子点墨水， 在本申请的 一些实施例中采用通过喷墨打印方式实现， 具体通过喷墨打印机点对点打印至 聚合物材料层 2被活化处理区域， 即亲水区域。 亲水性量子点墨水打印在亲水区 域 （亲水圆） 能够很好的铺展， 而在亲水区域 （亲水圆） 以外区域表现为疏水 性， 量子点墨水在其上不浸润。 由此， 所打印的量子点墨水被限定在亲水区域 ， 固化以后的量子点墨水就形成了固定尺寸的量子点网点。 After the solidified quantum dot ink, a fixed size quantum dot dot is formed. Because the shape and size of the hydrophilic area are determined by the window opening area of the mask, the shape and size of the hydrophilic area can be controlled by designing different window opening areas of the mask, so as to finally control the size of the quantum dot dots The shape of the quantum dots on the surface of the light guide plate 1 is precisely controlled. [0073] In the above step S03, a hydrophilic quantum dot ink is deposited in a region where the hydrophilic circle is located. In some embodiments of the present application, inkjet printing is adopted, and the inkjet printer is used to print dot-to-point to the polymer. The material layer 2 is activated in a region, that is, a hydrophilic region. The hydrophilic quantum dot ink printed on the hydrophilic area (hydrophilic circle) can spread well, but the areas outside the hydrophilic area (hydrophilic circle) are hydrophobic, and the quantum dot ink does not wet thereon. As a result, the printed quantum dot ink is confined to the hydrophilic region, and the quantum dot ink after curing forms a fixed dot of quantum dots.

[0074] 在所述亲水环围合形成的区域沉积疏水性量子点墨水的方式没有严格限定。 通 过该方式， 疏水性量子点墨水在亲水环围合形成的区域能够很好的铺展， 而在 亲水环区域表现为亲水性， 量子点墨水在其上不浸润， 因此所打印的量子点墨 水被限定在亲水环围合形成的区域而不会任意扩展或收缩。 由此， 所打印的量 子点墨水被限定在亲水区域， 固化以后的量子点墨水就形成了固定尺寸的量子 点网点。  [0074] The manner of depositing the hydrophobic quantum dot ink in the area surrounded by the hydrophilic ring is not strictly limited. In this way, the hydrophobic quantum dot ink can spread well in the area surrounded by the hydrophilic ring, and it appears hydrophilic in the hydrophilic ring area. The quantum dot ink does not wet thereon, so the printed quantum The dot ink is confined to the area surrounded by the hydrophilic ring and does not arbitrarily expand or contract. As a result, the printed quantum dot ink is confined to the hydrophilic region, and the quantum dot ink after curing forms a fixed size quantum dot dot.

[0075] 具体的， 所述亲水性量子点墨水包括亲水性量子点、 亲水性有机溶剂以及第二 固化剂。 所述亲水性量子点为表面结合亲水性配体的量子点。 具体的， 亲亲水 性配体包括但不限于疏基羧酸、 巯基乙酸、 半胱氨酸、 羧基、 氨基， 所述亲水 性有机溶剂包括但不限于硼酸盐缓冲液、 磷酸盐缓冲液、 水。  [0075] Specifically, the hydrophilic quantum dot ink includes a hydrophilic quantum dot, a hydrophilic organic solvent, and a second curing agent. The hydrophilic quantum dot is a quantum dot whose surface is bound with a hydrophilic ligand. Specifically, the hydrophilic-philic ligand includes, but is not limited to, sulfocarboxylic acid, thioglycolic acid, cysteine, carboxyl group, and amino group, and the hydrophilic organic solvent includes, but is not limited to, borate buffer solution and phosphate buffer solution. Liquid and water.

[0076] 所述疏水性量子点墨水包括疏水性量子点、 疏水性有机溶剂以及第二固化剂。  [0076] The hydrophobic quantum dot ink includes a hydrophobic quantum dot, a hydrophobic organic solvent, and a second curing agent.

所述疏水性量子点为表面结合疏水性配体的量子点。 具体的， 疏水性配体点包 括但不限于三辛基膦、 三辛基氧膦、 十八胺、 油胺、 十二烷基硫醇、 十八烷基 硫醇、 油酸、 硬脂酸十一烯酸， 所述疏水性有机溶剂包括己烷、 庚烷、 辛烷、 壬烷、 癸烷、 甲苯、 对二甲苯、 环己基苯、 联环己烷中的一种或多种。  The hydrophobic quantum dot is a quantum dot whose surface is bound with a hydrophobic ligand. Specifically, the hydrophobic ligand points include, but are not limited to, trioctylphosphine, trioctylphosphine, octadecylamine, oleylamine, dodecylmercaptan, octadecylmercaptan, oleic acid, and stearic acid. Undecylenic acid, the hydrophobic organic solvent includes one or more of hexane, heptane, octane, nonane, decane, toluene, p-xylene, cyclohexylbenzene, and bicyclohexane.

[0077] 所述亲水性量子点墨水和所述疏水性量子点墨水中， 还可以包括添加剂， 所述 添加剂包括散射粒子、 分散剂、 粘度调节剂和表面张力调节剂中的一种或多种  [0077] The hydrophilic quantum dot ink and the hydrophobic quantum dot ink may further include an additive, and the additive includes one or more of a scattering particle, a dispersant, a viscosity modifier, and a surface tension modifier. Species

[0078] 所述第二固化剂为第二 UV固化剂或第二热固化剂。 在本申请的一些实施例中 ， 所述第二固化剂选自聚丙烯酸酯、 聚氨酯丙烯酸酯、 环氧丙烯酸酯、 聚酯丙 烯酸酯、 聚醚丙烯酸酯、 丙烯酸酯、 环氧树脂、 有机硅氧烷树脂中的至少一种 [0079] 所述量子点包括红色量子点与绿色量子点， 平均尺寸为 2-20nm。 具体的， 所述 量子点为 II-IV族化合物半导体、 III- V族或 IV- VI族化合物半导体、 I-III-VI2族半 导体纳米晶中的一种。 所述量子点为均一混合类型、 梯度混合类型、 核-壳类型 或联合类型量子点。 [0078] The second curing agent is a second UV curing agent or a second thermal curing agent. In some embodiments of the present application, the second curing agent is selected from the group consisting of polyacrylate, polyurethane acrylate, epoxy acrylate, polyester acrylate, polyether acrylate, acrylate, epoxy resin, and silicone oxide. At least one of alkanes [0079] The quantum dots include red quantum dots and green quantum dots, and the average size is 2-20 nm. Specifically, the quantum dot is one of a group II-IV compound semiconductor, a group III-V or group IV-VI compound semiconductor, and a group I-III-VI2 semiconductor nanocrystal. The quantum dot is a homogeneous hybrid type, a gradient hybrid type, a core-shell type, or a joint type quantum dot.

[0080] 在上述实施例的基础上， 量子点墨水的粘度为 3-20 mPas， 表面张力为 30-60 mN/m。  [0080] Based on the above embodiments, the viscosity of the quantum dot ink is 3-20 mPas, and the surface tension is 30-60 mN / m.

[0081] 打印结束后， 通过固化处理， 形成量子点网点的微结构。  [0081] After the printing is completed, a microstructure of the quantum dot dots is formed by a curing process.

[0082] 在本申请的一些实施例中， 所述量子点网点中含有量子点、 第二固化剂和添加 齐 1J。 所述添加剂包括散射粒子、 分散剂、 粘度调节剂和表面张力调节剂中的一 种或多种。  [0082] In some embodiments of the present application, the quantum dot network dots include a quantum dot, a second curing agent, and an additive QI. The additive includes one or more of a scattering particle, a dispersant, a viscosity modifier, and a surface tension modifier.

[0083] 所述量子点网点中， 所述第二固化剂用于在固化处理后， 形成支撑骨架， 将量 子点网点固定为球冠状， 从而保证其出光均匀性。 在本申请的一些实施例中， 第二固化剂选自聚丙烯酸酯、 聚氨酯丙烯酸酯、 环氧丙烯酸酯、 聚酯丙烯酸酯 、 聚醚丙烯酸酯、 丙烯酸酯、 环氧树脂和有机硅氧烷树脂中的一种或多种。  [0083] In the quantum dot network dots, the second curing agent is used to form a supporting skeleton after the curing process, and fix the quantum dot network dots into a spherical crown shape, thereby ensuring the uniformity of light output. In some embodiments of the present application, the second curing agent is selected from the group consisting of polyacrylate, urethane acrylate, epoxy acrylate, polyester acrylate, polyether acrylate, acrylate, epoxy resin, and organosiloxane resin. One or more of them.

[0084] 在本申请的一些实施例中， 所述量子点网点由量子点、 第二固化剂和散射粒子 组成。 所述散射粒子的作用是增强蓝色激发光的散射， 使得蓝色激发光有更多 的几率与红绿量子点碰撞， 从而激发出更多红绿光， 增加网点发光强度。 在本 申请的一些实施例中， 所述散射粒子选自 SiC颗粒、 Si ₃N ₄颗粒、 Zr0 ₂ 颗粒、 Hf0 ₂颗粒、 Si0 ₂颗粒、 Ti0 ₂颗粒、 ZnO颗粒、 A1 ₂0 ₃颗粒、 SnO ₂ 颗粒、 CaC0 ₃颗粒和 BaS0 ₄颗粒中的至少一种， 更在本申请的一些实施例中， 所述散射粒子选自粒径为 10-45nm的 SiC颗粒、 Si ₃N ₄颗粒、 Zr0 ₂颗粒、 HfO ₂颗 粒、 SiO jI粒、 110 ₂颗粒、 ZnO颗粒、 1 ₂0 ₃颗粒、 SnO jI粒、 CaCO ₃ 颗粒和 BaS0 ₄颗粒中的至少一种。 以及， 如图 5所示， 本发明实施例另一方面提 供一种量子点网点导光板， 包括导光板 1， 设置在导光板 1至少一表面的含有 Si-R 基团的聚合物材料层 2, 聚合物材料层 2表面设置有亲水环或亲水圆， 所述亲水 环或所述亲水圆表面结合 Si-0-Si基团和 /或 Si-OH基团， 且所述亲水圆所在区域或 所述亲水环围合形成的区域设置有量子点网点 3。 [0084] In some embodiments of the present application, the quantum dot dots are composed of quantum dots, a second curing agent, and scattering particles. The role of the scattering particles is to enhance the scattering of the blue excitation light, so that the blue excitation light has a greater chance of colliding with the red and green quantum dots, thereby exciting more red and green light, and increasing the luminous intensity of the dots. In some embodiments of the present application, the scattering particles are selected from SiC particles, Si ₃ N ₄ particles, Zr0 ₂ particles, Hf0 ₂ particles, Si0 ₂ particles, Ti0 ₂ particles, ZnO particles, A1 ₂ 0 ₃ particles, SnO At least one of ₂ particles, CaC0 ₃ particles, and BaS0 ₄ particles, and in some embodiments of the present application, the scattering particles are selected from SiC particles with a particle size of 10-45 nm, Si ₃ N ₄ particles, and Zr0 ₂ At least one of particles, HfO ₂ particles, SiO jI particles, 110 ₂ particles, ZnO particles, 1 ₂ 0 ₃ particles, SnO jI particles, CaCO ₃ particles, and BaS 0 ₄ particles. And, as shown in FIG. 5, another embodiment of the present invention provides a quantum dot dot light guide plate, which includes a light guide plate 1 and a polymer material layer 2 containing Si-R groups, which is disposed on at least one surface of the light guide plate 1. A surface of the polymer material layer 2 is provided with a hydrophilic ring or a hydrophilic circle, and the hydrophilic ring or the surface of the hydrophilic circle is bound with a Si-0-Si group and / or a Si-OH group, and the hydrophilic Quantum dot dots 3 are set in the area where the water circle is located or the area surrounded by the hydrophilic ring.

[0085] 本发明实施例提供的量子点网点导光板， 设置有疏水聚合物层， 且所述疏水聚 合物层表面设置含有 Si-O-Si基团和 /或 Si-OH基团的亲水环或亲水圆， 由此形成亲 疏水性区域， 进而可以很好的通过调控量子点的极性实现其在导光板表面的尺 寸定型。 本发明实施例提供的量子点网点导光板， 可以通过上述方法制备获得 [0085] The quantum dot mesh dot light guide plate provided in the embodiment of the present invention is provided with a hydrophobic polymer layer, and the hydrophobic polymer A hydrophilic ring or a hydrophilic circle containing a Si-O-Si group and / or a Si-OH group is set on the surface of the composite layer, thereby forming a hydrophilic region, which can be achieved by regulating the polarity of the quantum dots. Its size is fixed on the surface of the light guide plate. The quantum dot mesh dot light guide plate provided in the embodiment of the present invention can be obtained by the above method.

[0086] 在本申请的一些实施例中， 聚合物材料层 2为聚二甲基硅氧烷层。 所述聚二甲 基硅氧烷不仅能够将疏水基团 Si-R基团很好的转变为亲水基团 Si-0-Si基团和 /或 S i-OH基团， 且其固化后具有很好的粘结性能， 能够牢固地附着在所述导光板表 面， 从而有利于量子点网点的精准控制。 [0086] In some embodiments of the present application, the polymer material layer 2 is a polydimethylsiloxane layer. The polydimethylsiloxane can not only convert the hydrophobic group Si-R group into a hydrophilic group Si-0-Si group and / or a Si-OH group, but also after curing, It has good adhesive properties and can be firmly attached to the surface of the light guide plate, thereby facilitating accurate control of the dots of the quantum dots.

[0087] 在本申请的一些实施例中， 所述量子点网点 4中包括量子点、 第二固化剂 33和 添加剂 （图中未标出） 。 所述添加剂包括散射粒子、 分散剂、 粘度调节剂和表 面张力调节剂中的一种或多种。  [0087] In some embodiments of the present application, the quantum dot network dot 4 includes a quantum dot, a second curing agent 33, and an additive (not shown in the figure). The additive includes one or more of a scattering particle, a dispersant, a viscosity modifier, and a surface tension modifier.

[0088] 所述量子点网点 4中， 所述第二固化剂 33用于在固化处理后， 形成支撑骨架， 将量子点网点固定为球冠状， 从而保证其出光均匀性。 在本申请的一些实施例 中， 第二固化剂 33选自聚丙烯酸酯、 聚氨酯丙烯酸酯、 环氧丙烯酸酯、 聚酯丙 烯酸酯、 聚醚丙烯酸酯、 丙烯酸酯、 环氧树脂和有机硅氧烷树脂中的一种或多 种。  [0088] In the quantum dot dots 4, the second curing agent 33 is used to form a supporting skeleton after the curing process, and fix the quantum dot dots in a spherical crown shape, thereby ensuring the uniformity of light output. In some embodiments of the present application, the second curing agent 33 is selected from the group consisting of polyacrylate, urethane acrylate, epoxy acrylate, polyester acrylate, polyether acrylate, acrylate, epoxy resin, and organosiloxane One or more of the resins.

[0089] 在本申请的一些实施例中， 所述量子点网点由量子点、 第二固化剂和散射粒子 组成。 作为一个具体实施例， 所述量子点包括红色量子点 31和绿色量子点 32。 所述散射粒子的作用是增强蓝色激发光的散射， 使得蓝色激发光有更多的几率 与红绿量子点碰撞， 从而激发出更多红绿光， 增加网点发光强度。 在本申请的 一些实施例中， 所述散射粒子选自 SiC颗粒、 Si ₃N ₄颗粒、 Zr0 ₂颗粒、 Hf0 ₂颗粒 、 SiO jI粒、 110 ₂颗粒、 ZnO颗粒、 A1 ₂0 ₃颗粒、 SnO jI粒、 CaCO ₃ 颗粒和 BaS0 ₄颗粒中的至少一种， 更在本申请的一些实施例中， 所述散射粒子选 自粒径为 10-45nm的 SiC颗粒、 Si ₃N j|粒、 ZrO jl粒、 0 ₂颗粒、 SiO ₂ 颗粒、 Ti0 ₂颗粒、 ZnO颗粒、 A1 ₂0 ₃颗粒、 Sn0 ₂颗粒、 CaCO ₃颗粒和 BaSO ₄颗 粒中的至少一种。 [0089] In some embodiments of the present application, the quantum dot network dots are composed of quantum dots, a second curing agent, and scattering particles. As a specific embodiment, the quantum dot includes a red quantum dot 31 and a green quantum dot 32. The role of the scattering particles is to enhance the scattering of the blue excitation light, so that the blue excitation light has a greater chance of colliding with the red and green quantum dots, thereby exciting more red and green light, and increasing the luminous intensity of the dots. In some embodiments of the present application, the scattering particles are selected from particles of SiC, Si ₃ N ₄ particles, ZrO ₂ particles, HfO ₂ particles, SiO jI tablets, _1,102 particles, ZnO particles, A1 ₂ 0 ₃ particles, SnO At least one of jI particles, CaCO ₃ particles, and BaS0 ₄ particles, and in some embodiments of the present application, the scattering particles are selected from SiC particles with a particle size of 10-45 nm, Si ₃ N j | particles, ZrO At least one of jl particles, 0 ₂ particles, SiO ₂ particles, Ti0 ₂ particles, ZnO particles, A1 ₂ 0 ₃ particles, Sn0 ₂ particles, CaCO ₃ particles, and BaSO ₄ particles.

[0090] 在本申请的一些实施例中， 所述量子点与所述第二固化剂的质量比为 4-8: 15-5 0。 若所述量子点含量过高， 一方面， 导光板出光颜色偏黄， 另一方面， 所述第 二固化剂含量相对过低， 影响网点的成型固化。 若所述量子点含量过低， 会导 致导光板出光颜色偏蓝； 同时， 由于所述第二固化剂含量过高， 使得墨水粘度 太高， 出墨困难。 [0090] In some embodiments of the present application, the mass ratio of the quantum dots to the second curing agent is 4-8: 15-50. If the quantum dot content is too high, on the one hand, the light output color of the light guide plate is yellowish; on the other hand, the first The content of the second curing agent is relatively low, which affects the forming and curing of the dots. If the content of the quantum dots is too low, the light-emitting color of the light guide plate may become bluish; at the same time, because the content of the second curing agent is too high, the viscosity of the ink is too high, and the ink is difficult to be discharged.

[0091] 在本申请的一些实施例中， 所述量子点网点 3的直径为 0.1-0.5mm。  [0091] In some embodiments of the present application, the diameter of the quantum dot mesh 3 is 0.1-0.5 mm.

[0092] 下面结合具体实施例进行说明。  [0092] Description will be given below with reference to specific embodiments.

[0093] 实施例 1  Example 1

[0094] 一种基于喷墨打印制备的量子点网点导光板， 通过以下方法制备得到：  [0094] A quantum dot dot light guide plate prepared based on inkjet printing is prepared by the following method:

[0095] ( 1) PDMS材料配制：  (1) PDMS material formulation:

[0096] 将 PDMS预聚体和对应的固化剂按体积比为 10: 1充分混合搅拌； 然后将混合均 匀的 PDMS液体放入真空箱中脱气 30min， 脱气完成后 PDMS溶液呈透明状， 不 存在气泡。  [0096] The PDMS prepolymer and the corresponding curing agent are thoroughly mixed and stirred at a volume ratio of 10: 1; then the PDMS liquid that is evenly mixed is put into a vacuum box for deaeration for 30min. After the deaeration is completed, the PDMS solution is transparent. There are no air bubbles.

[0097] (2) PDMS材料涂布：  (2) PDMS material coating:

[0098] 对导光板基板进行清洗并干燥， 再采用刮涂工艺将配制好的 PDMS材料涂布在 导光板基板的下表面， 其中 PDMS层的膜厚为 0.1mm; 然后将涂布有 PDMS材料 的导光板基板放入烘箱 80°C烘烤固化 lh。  [0098] The light guide plate substrate is cleaned and dried, and then the prepared PDMS material is coated on the lower surface of the light guide plate substrate by a doctor blade coating process, wherein the film thickness of the PDMS layer is 0.1 mm; and then the PDMS material is coated The light guide plate substrate was baked in an oven at 80 ° C for 1 h.

[0099] (3) PDMS材料选择性活化处理：  (3) PDMS material selective activation treatment:

[0100] 将设置有圆形开窗的掩膜板覆盖于上述固化的 PDMS膜层上， 采用紫外臭氧处 理方式进行选择性活化处理， 其中紫外光波长为 185nm和 254nm， 功率密度为 10 0 mW/cm ² [0100] A mask provided with a circular window is covered on the cured PDMS film layer, and a selective activation treatment is performed by using an ultraviolet ozone treatment method, wherein the ultraviolet light wavelength is 185 nm and 254 nm, and the power density is 100 mW / cm ²

， 照射时间为 40min; 所述紫外光通过所述掩膜板上开窗直接照射至 PDMS膜层 上， 该部分经过活化处理后表现为亲水性， 形成亲水圆， 而被掩膜板遮蔽区域 未经活化处理仍表现为疏水性。  The irradiation time is 40 minutes; the ultraviolet light is directly irradiated onto the PDMS film layer through opening a window on the mask plate, and the part is hydrophilic after forming an activation treatment, forming a hydrophilic circle, and is masked by the mask plate The area remains hydrophobic without activation.

[0101] (4) 量子点网点制备  (4) Preparation of Quantum Dot Dots

[0102] 将配制好的含有 UV固化剂的量子点墨水通过喷墨打印机点对点打印至 PDMS层 被活化处理区域； 由于该被活化处理区域表现为亲水性， 量子点墨水能很好的 在该区域铺展， 而该区域以外未经活化处理表现为疏水性， 量子点墨水在其上 不浸润， 因此所打印的量子点墨水被限定在该活化区域而不会任意扩展或收缩 。 打印结束后， 将导光板置于紫外灯下固化 lmin， 得到量子点网点导光板。 所 述量子点网点的成型尺寸就是所述掩膜板开窗区域的尺寸， 通过调整掩膜板开 窗区域的大小就可精确控制最终量子点墨水在导光板表面的成型尺寸。 [0102] The prepared quantum dot ink containing the UV curing agent is printed point-to-point to the PDMS layer activated processing area by an inkjet printer; since the activated processing area appears to be hydrophilic, the quantum dot ink can perform well in the area. The area is spread, and the area outside the area is hydrophobic without being activated, and the quantum dot ink does not wet thereon, so the printed quantum dot ink is confined to the activated area without arbitrarily expanding or contracting. After printing, the light guide plate was cured under an ultraviolet lamp for 1 min to obtain a quantum dot screen light guide plate. All The forming size of the quantum dot dots is the size of the window opening area of the mask. By adjusting the size of the window opening area of the mask, the forming size of the final quantum dot ink on the surface of the light guide plate can be accurately controlled.

[0103] 实施例 2  Example 2

[0104] 一种基于喷墨打印制备的量子点网点导光板， 通过以下方法制备得到：  [0104] A quantum dot mesh dot light guide plate prepared based on inkjet printing is prepared by the following method:

[0105] ( 1) PDMS材料配制：  (1) PDMS material formulation:

[0106] 将 PDMS预聚体和对应的固化剂按体积比为 10: 1充分混合搅拌； 然后将混合均 匀的 PDMS液体放入真空箱中脱气 30min， 脱气完成后 PDMS溶液呈透明状， 不 存在气泡。  [0106] The PDMS prepolymer and the corresponding curing agent are thoroughly mixed and stirred at a volume ratio of 10: 1; and then the PDMS liquid that is uniformly mixed is placed in a vacuum box for deaeration for 30min. After the deaeration is completed, the PDMS solution is transparent. There are no air bubbles.

[0107] (2) PDMS材料涂布：  (2) PDMS material coating:

[0108] 对导光板基板进行清洗并干燥， 再采用浸渍提拉工艺将配制好的 PDMS材料涂 布在导光板基板的下表面， 其中 PDMS层的膜厚为 1mm; 然后将涂布有 PDMS材 料的导光板基板放入烘箱 80°C烘烤固化 lh。  [0108] The light guide plate substrate is cleaned and dried, and then the prepared PDMS material is coated on the lower surface of the light guide plate substrate by a dipping and pulling process, wherein the film thickness of the PDMS layer is 1 mm; and then the PDMS material is coated The light guide plate substrate was baked in an oven at 80 ° C for 1 h.

[0109] (3) PDMS材料选择性活化处理：  (3) Selective activation treatment of PDMS material:

[0110] 将设置有圆环形开窗的掩膜板覆盖于上述固化的 PDMS膜层上， 采用氧气等离 子体处理方式进行选择性活化处理， 其中氧气流量 20sccm， 处理功率为 100W， 处理时间为 30min; 所述氧气等离子体通过所述掩膜板上开窗部分直接喷射至 PD MS膜层上， 该部分经过活化处理后表现为亲水性， 而被掩膜板遮蔽区域未经活 化处理仍表现为疏水性， 形成亲水环。  [0110] The mask plate provided with a circular opening window is covered on the cured PDMS film layer, and selective activation treatment is performed by using an oxygen plasma treatment method, wherein the oxygen flow rate is 20 sccm, the processing power is 100 W, and the processing time is 30min; the oxygen plasma is directly sprayed onto the PD MS film layer through the window opening portion of the mask plate, and this portion is hydrophilic after being treated, while the area covered by the mask plate remains unactivated It is hydrophobic and forms a hydrophilic ring.

[0111] (4) 量子点网点制备  (4) Preparation of Quantum Dot Dots

[0112] 将配制好的含有 UV固化剂的量子点墨水通过喷墨打印机点对点打印至 PDMS层 被活化处理区域； 由于该被活化处理区域表现为亲水性， 疏水性量子点墨水在 亲水环围合的区域能很好的在该区域铺展， 而在亲水环区域不浸润， 因此所打 印的量子点墨水被限定在该活化区域而不会任意扩展或收缩。 打印结束后， 将 导光板置于紫外灯下固化 lmin， 得到量子点网点导光板。 所述量子点网点的成 型尺寸就是所述掩膜板开窗区域的尺寸， 通过调整掩膜板开窗区域的大小就可 精确控制最终量子点墨水在导光板表面的成型尺寸。  [0112] The prepared quantum dot ink containing UV curing agent is printed point-to-point to the PDMS layer activated treatment area by an inkjet printer; since the activated treatment area is hydrophilic, the hydrophobic quantum dot ink is in a hydrophilic ring. The enclosed area can spread well in this area, but does not wet in the hydrophilic ring area, so the printed quantum dot ink is confined to the activated area without arbitrarily expanding or contracting. After printing, the light guide plate was cured under an ultraviolet lamp for 1 minute to obtain a quantum dot screen light guide plate. The forming size of the quantum dot dots is the size of the window opening area of the mask. By adjusting the size of the window opening area of the mask, the forming size of the final quantum dot ink on the surface of the light guide plate can be accurately controlled.

[0113] 以上仅为本申请的可选实施例而已， 并不用于限制本申请。 对于本领域的技术 人员来说， 本申请可以有各种更改和变化。 凡在本申请的精神和原则之内， 所 作的任何修改、 等同替换、 改进等， 均应包含在本申请的权利要求范围之内。 [0113] The above are only optional embodiments of the present application, and are not used to limit the present application. For those skilled in the art, this application may have various modifications and changes. All within the spirit and principles of this application Any modification, equivalent replacement, improvement, etc. shall be included in the scope of the claims of this application.

Claims

权利要求书 Claim

[权利要求 1] 量子点网点导光板的制备方法， 其特征在于， 包括以下步骤：  [Claim 1] A method for preparing a quantum dot mesh dot light guide plate, comprising the following steps:

提供导光板， 在所述导光板上制备含有 Si-R基团的聚合物材料层， 其 中 R为焼基；  Providing a light guide plate on which a polymer material layer containing Si-R groups is prepared, wherein R is a fluorenyl group;

提供设置有开窗的掩膜板， 将所述掩膜版置于在所述聚合物材料层上 方， 对开窗区域下方的聚合物材料进行表面活化处理， 使开窗区域下 方的聚合物材料表面的 Si-R基团转变为 Si-0-Si基团和 /或 Si-OH基团， 在所述聚合物材料层表面形成与开窗形状相同的亲水图案； 在所述开窗形状所在区域沉积量子点墨水， 对所述量子点墨水进行固 化处理， 形成量子点网点的微结构， 得到量子点网点导光板。  A mask plate provided with a window is provided, the mask plate is placed above the polymer material layer, and a surface activation treatment is performed on the polymer material below the window region to make the polymer material below the window region The surface of the Si-R group is converted into a Si-0-Si group and / or a Si-OH group, and a hydrophilic pattern with the same shape as the window opening is formed on the surface of the polymer material layer; A quantum dot ink is deposited in the area where the quantum dot ink is cured to form a microstructure of the quantum dot network dots to obtain a quantum dot network dot light guide plate.

[权利要求 2] 根据权利要求 1所述的量子点网点导光板的制备方法， 其特征在于， 所述开窗为圆形开窗， 所述亲水图案为亲水圆， 所述量子点墨水为亲 水性量子点墨水。  [Claim 2] The method for preparing a quantum dot dot light guide plate according to claim 1, wherein the window is a circular window, the hydrophilic pattern is a hydrophilic circle, and the quantum dot ink It is a hydrophilic quantum dot ink.

[权利要求 3] 根据权利要求 2所述的量子点网点导光板的制备方法， 其特征在于， 所述圆形开窗的直径为 0.1mm-0.5mm  [Claim 3] The method for preparing a quantum dot mesh dot light guide plate according to claim 2, wherein the diameter of the circular window is 0.1mm-0.5mm

[权利要求 4] 根据权利要求 1所述的量子点网点导光板的制备方法， 其特征在于， 所述开窗为圆环状开窗， 所述亲水图案为亲水环， 所述量子点墨水为 疏水性量子点墨水。 [Claim 4] The method for preparing a quantum dot mesh dot light guide plate according to claim 1, wherein the window is a circular window, the hydrophilic pattern is a hydrophilic ring, and the quantum dot The ink is a hydrophobic quantum dot ink.

[权利要求 5] 根据权利要求 4所述的量子点网点导光板的制备方法， 其特征在于， 所述圆环状开窗的直径为 0.1mm-0.5mm  [Claim 5] The method for preparing a quantum dot mesh dot light guide plate according to claim 4, wherein the diameter of the circular window is 0.1mm-0.5mm

[权利要求 6] 根据权利要求 1至 5任一项所述的量子点网点导光板的制备方法， 其特 征在于， 所述含有 Si-R的聚合物材料层的厚度为 0.001mm-lmm [Claim 6] The method for preparing a quantum dot mesh dot light guide plate according to any one of claims 1 to 5, wherein the thickness of the Si-R-containing polymer material layer is 0.001 mm to 1 mm

[权利要求 7] 根据权利要求 1至 5任一项所述的量子点网点导光板的制备方法， 其特 征在于， 所述量子点网点中含有量子点、 第二固化剂和添加剂。 [Claim 7] The method for preparing a quantum dot dot light guide plate according to any one of claims 1 to 5, wherein the quantum dot dots include quantum dots, a second curing agent, and an additive.

[权利要求 8] 根据权利要求 7所述的量子点网点导光板的制备方法， 其特征在于， 所述添加剂包括散射粒子、 分散剂、 粘度调节剂和表面张力调节剂中 的一种或多种。 [Claim 8] The method for preparing a quantum dot mesh dot light guide plate according to claim 7, wherein the additive comprises one or more of a scattering particle, a dispersant, a viscosity modifier, and a surface tension modifier. .

[权利要求 9] 根据权利要求 8所述的量子点网点导光板的制备方法， 其特征在于， 所述散射粒子选自 SiC颗粒、 Si ₃N ₄颗粒、 ZrO jI粒、 Hf0 ₂ 颗粒、 Si0 ₂颗粒、 Ti0 ₂颗粒、 ZnO颗粒、 A1 ₂0 ₃颗粒、 SnO ₂ 颗粒、 CaCO ₃颗粒和 BaSO ₄颗粒中的至少一种； 和 /或， 所述第二固化剂选自聚丙烯酸酯、 聚氨酯丙烯酸酯、 环氧丙 烯酸酯、 聚酯丙烯酸酯、 聚醚丙烯酸酯、 丙烯酸酯、 环氧树脂和有机 硅氧烷树脂中的一种或多种。 [Claim 9] The method for preparing a quantum dot mesh dot light guide plate according to claim 8, characterized in that: The scattering particles are selected from the group consisting of SiC particles, Si ₃ N ₄ particles, ZrO jI particles, Hf0 ₂ particles, Si0 ₂ particles, Ti0 ₂ particles, ZnO particles, A1 ₂ 0 ₃ particles, SnO ₂ particles, CaCO ₃ particles, and BaSO ₄ At least one of particles; and / or, the second curing agent is selected from the group consisting of polyacrylate, urethane acrylate, epoxy acrylate, polyester acrylate, polyether acrylate, acrylate, epoxy resin, and organic One or more of silicone resins.

[权利要求 10] 根据权利要求 1至 5任一项所述的量子点网点导光板的制备方法， 其特 征在于， 所述表面活化处理为紫外臭氧处理或等离子体处理。  [Claim 10] The method for preparing a quantum dot mesh dot light guide plate according to any one of claims 1 to 5, wherein the surface activation treatment is ultraviolet ozone treatment or plasma treatment.

[权利要求 11] 根据权利要求 1至 5任一项所述的量子点网点导光板的制备方法， 其特 征在于， 所述含有 Si-R的聚合物材料层为聚二甲基硅氧烷层。  [Claim 11] The method for preparing a quantum dot mesh dot light guide plate according to any one of claims 1 to 5, wherein the polymer material layer containing Si-R is a polydimethylsiloxane layer .

[权利要求 12] 根据权利要求 11所述的量子点网点导光板的制备方法， 其特征在于， 在所述导光板上制备含有 Si-R的聚合物材料层的方法， 包括以下步骤 提供聚二甲基硅氧烷预聚体和第一固化剂的混合溶液；  [Claim 12] The method for preparing a quantum dot mesh dot light guide plate according to claim 11, wherein the method for preparing a polymer material layer containing Si-R on the light guide plate includes the following steps: A mixed solution of a methylsiloxane prepolymer and a first curing agent;

在所述导光板沉积表面沉积所述混合溶液后， 进行加热处理， 制备得 到表面粘合有聚二甲基硅氧烷层的导光板。  After the mixed solution is deposited on the light guide plate deposition surface, heat treatment is performed to prepare a light guide plate with a polydimethylsiloxane layer adhered on the surface.

[权利要求 13] 根据权利要求 12所述的量子点网点导光板的制备方法， 其特征在于， 所述加热处理的温度为 30-80°C， 加热时间为 l-10h。  [Claim 13] The method for preparing a quantum dot mesh dot light guide plate according to claim 12, wherein the temperature of the heat treatment is 30-80 ° C, and the heating time is 1-10h.

[权利要求 14] 根据权利要求 12所述的量子点网点导光板的制备方法， 其特征在于， 所述混合溶液中， 所述聚二甲基硅氧烷预聚体和所述第一固化剂的体 积比为 5: 1-20:1。  [Claim 14] The method for preparing a quantum dot mesh dot light guide plate according to claim 12, wherein in the mixed solution, the polydimethylsiloxane prepolymer and the first curing agent The volume ratio is 5: 1-20: 1.

[权利要求 15] 根据权利要求 10所述的量子点网点导光板的制备方法， 其特征在于， 所述表面活化处理为紫外臭氧处理， 所述紫外臭氧处理的紫外光波长 为 185和 254nm， 功率密度为10-100 111\¥/011 ²， 照射时间为 l-60min; 或者， 所述表面活化处理为等离子体处理， 所述等离子处理的功率为 100-1000W, 处理时间为 l-60min， 气体流量为 10-200sccm。 [Claim 15] The method for preparing a quantum dot dot light guide plate according to claim 10, wherein the surface activation treatment is ultraviolet ozone treatment, and the ultraviolet light wavelength of the ultraviolet ozone treatment is 185 and 254 nm, and the power The density is 10-100 111 \ ¥ / 011 ² , the irradiation time is 1-60min; or, the surface activation treatment is plasma treatment, the power of the plasma treatment is 100-1000W, the treatment time is 1-60min, and the gas The flow is 10-200sccm.

[权利要求 16] 一种量子点网点导光板， 其特征在于， 包括导光板， 设置在所述导光 板至少一表面的含有 Si-R的聚合物材料层， 所述聚合物材料层表面设 置有亲水环或亲水圆， 所述亲水环或所述亲水圆表面结合 Si-0-Si和 / 或 Si-OH， 且所述亲水圆所在区域或所述亲水环围合形成的区域设置 有量子点网点。 [Claim 16] A quantum dot mesh dot light guide plate, comprising a light guide plate, a polymer material layer containing Si-R disposed on at least one surface of the light guide plate, and a surface of the polymer material layer is provided. A hydrophilic ring or a hydrophilic circle is placed, and the surface of the hydrophilic ring or the hydrophilic circle binds Si-0-Si and / or Si-OH, and the area where the hydrophilic circle is located or the hydrophilic ring is surrounded The combined area is provided with quantum dot dots.

[权利要求 17] 根据权利要求 16所述的量子点网点导光板， 其特征在于， 所述聚合物 材料层为聚二甲基硅氧烷层。  [Claim 17] The quantum dot mesh dot light guide plate according to claim 16, wherein the polymer material layer is a polydimethylsiloxane layer.

[权利要求 18] 根据权利要求 16或 17所述的量子点网点导光板， 其特征在于， 所述量 子点网点中含有量子点、 第二固化剂和添加剂。 [Claim 18] The quantum dot mesh dot light guide plate according to claim 16 or 17, wherein the quantum dot mesh dots include a quantum dot, a second curing agent, and an additive.

[权利要求 19] 根据权利要求 18所述的量子点网点导光板的制备方法， 其特征在于， 所述添加剂包括散射粒子、 分散剂、 粘度调节剂和表面张力调节剂中 的一种或多种。 [Claim 19] The method for preparing a quantum dot dot light guide plate according to claim 18, wherein the additive comprises one or more of a scattering particle, a dispersant, a viscosity modifier, and a surface tension modifier. .

[权利要求 20] 根据权利要求 19所述的量子点网点导光板的制备方法， 其特征在于， 所述散射粒子选自 SiC颗粒、 Si ₃N ₄颗粒、 ZrO jI粒、 Hf0 ₂ 颗粒、 Si0 ₂颗粒、 Ti0 ₂颗粒、 ZnO颗粒、 A1 ₂0 ₃颗粒、 SnO ₂ 颗粒、 CaCO ₃颗粒和 BaSO ₄颗粒中的至少一种； 和 /或， 所述第二固化剂选自聚丙烯酸酯、 聚氨酯丙烯酸酯、 环氧丙 烯酸酯、 聚酯丙烯酸酯、 聚醚丙烯酸酯、 丙烯酸酯、 环氧树脂和有机 硅氧烷树脂中的一种或多种。 [Claim 20] The method for preparing a quantum dot dot light guide plate according to claim 19, wherein the scattering particles are selected from the group consisting of SiC particles, Si ₃ N ₄ particles, ZrO jI particles, Hf0 ₂ particles, and Si0 ₂ At least one of particles, Ti0 ₂ particles, ZnO particles, A1 ₂ 0 ₃ particles, SnO ₂ particles, CaCO ₃ particles, and BaSO ₄ particles; and / or, the second curing agent is selected from the group consisting of polyacrylate, polyurethane acrylic One or more of an ester, an epoxy acrylate, a polyester acrylate, a polyether acrylate, an acrylate, an epoxy resin, and an organosiloxane resin.

[权利要求 21] 根据权利要求 16或 17所述的量子点网点导光板， 其特征在于， 所述量 子点网点的直径为 0.1-0.5mm。  [Claim 21] The quantum dot mesh dot light guide plate according to claim 16 or 17, wherein a diameter of the quantum dot mesh dot is 0.1-0.5 mm.