WO2019223296A1 - 一种显示面板的制作方法和显示面板 - Google Patents

一种显示面板的制作方法和显示面板 Download PDF

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Publication number
WO2019223296A1
WO2019223296A1 PCT/CN2018/121461 CN2018121461W WO2019223296A1 WO 2019223296 A1 WO2019223296 A1 WO 2019223296A1 CN 2018121461 W CN2018121461 W CN 2018121461W WO 2019223296 A1 WO2019223296 A1 WO 2019223296A1
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WIPO (PCT)
Prior art keywords
layer
color filter
filter layer
logo
identification
Prior art date
Application number
PCT/CN2018/121461
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English (en)
French (fr)
Inventor
黄北洲
Original Assignee
惠科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 惠科股份有限公司 filed Critical 惠科股份有限公司
Priority to US16/981,408 priority Critical patent/US20210011333A1/en
Publication of WO2019223296A1 publication Critical patent/WO2019223296A1/zh

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • G02F1/133516Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133354Arrangements for aligning or assembling substrates

Definitions

  • the embodiments of the present application relate to display technology, and in particular, to a method for manufacturing a display panel and a display panel.
  • the black matrix is usually integrated on the array substrate, namely BOA (Black Matrix on Array) technology.
  • BOA Black Matrix on Array
  • the black light-shielding layer material forming the black matrix has a higher optical density value (optical density, OD), after the black light-shielding material is applied, the recognition of the mask exposure registration mark will be disturbed, which will cause the exposure machine to be unable to accurately align. Reducing the difficulty of identifying mark marks, but it will seriously affect the shading effect of the black matrix.
  • the embodiment of the present application provides a method for manufacturing a display panel, so as to realize accurate identification of an exposure registration mark without affecting the light shielding effect of the black matrix.
  • An embodiment of the present application provides a method for manufacturing a display panel.
  • the method includes:
  • the substrate is provided with at least one exposure registration mark
  • a color filter layer is formed on a side of the exposure registration mark far from the substrate, and the color filter layer includes a logo thickening layer covering the exposure registration mark, and the logo thickening layer and the exposure
  • the registration marks have the same shape and the same size
  • the exposure alignment mark and the logo thickened layer are subjected to exposure alignment to expose the black photoresist layer to form a black light-shielding layer.
  • An embodiment of the present application further provides a method for manufacturing a display panel, and the method includes:
  • the substrate is provided with at least one exposure registration mark
  • a second color resist layer is formed on a side of the first color filter layer remote from the substrate, and the second color resist layer is patterned to form a second color filter layer and a second color filter layer covering the first identification layer.
  • a third color resist layer is formed on a side of the second color filter layer remote from the substrate, and the third color resist layer is patterned to form a third color filter layer and a third color filter layer covering the second identification layer.
  • An identification layer wherein the first identification layer, the second identification layer, and the third identification layer constitute an identification thickening layer covering the exposure alignment mark, and the identification thickening layer and the exposure pair
  • the bit identifiers are the same shape and the same size
  • a black light-shielding layer is formed.
  • a color filter layer is formed on a side of the exposure registration mark away from the substrate.
  • the color filter layer includes a logo thickening layer covering the exposure registration mark.
  • the shape of the exposure registration mark is the same and the same size, so as to increase the thickness of the location of the exposure registration mark; a black photoresist layer is formed on the side of the color filter layer away from the substrate. Accurate identification of exposure registration marks can be achieved.
  • An embodiment of the present application further provides a display panel.
  • the display panel includes:
  • An array substrate provided with the color film substrate object
  • a liquid crystal layer is filled between the color filter substrate and the array substrate.
  • the manufacturing steps of the color filter substrate include:
  • the substrate is provided with at least one exposure registration mark
  • a color filter layer is formed on a side of the exposure registration mark far from the substrate, and the color filter layer includes a logo thickening layer covering the exposure registration mark, and the logo thickening layer and the exposure
  • the registration marks have the same shape and the same size
  • the exposure alignment mark and the logo thickened layer are subjected to exposure alignment to expose the black photoresist layer to form a black light-shielding layer.
  • FIG. 1 is a schematic flowchart of a method for manufacturing a display panel according to an embodiment of the present application
  • FIG. 2 is a schematic structural diagram of a substrate provided by an embodiment of the present application.
  • FIG. 3 is a schematic structural diagram of a display panel after forming a color filter layer
  • FIG. 4 is a schematic structural diagram of a display panel after forming a black photoresist layer
  • FIG. 5 is a schematic plan view of a display panel after a black photoresist layer is formed
  • FIG. 6 is a schematic structural diagram of a display panel after forming a black light-shielding layer
  • FIG. 7 is a schematic structural diagram of a display panel with a single-layer thickening layer provided in an embodiment of the present application.
  • FIG. 8 is a schematic structural diagram of a display panel with two layers of identification thickening layers according to an embodiment of the present application.
  • FIG. 9 is a schematic flowchart of forming a color filter layer according to an embodiment of the present application.
  • FIG. 10 is a schematic structural diagram of a display panel after a first color resist layer is formed
  • FIG. 11 is a schematic structural diagram of a display panel after patterning a first color resist layer
  • FIG. 12 is a schematic structural diagram of a display panel after forming a second color resist layer
  • FIG. 13 is a schematic structural diagram of a display panel after patterning a second color resist layer
  • FIG. 14 is a schematic structural diagram of a display panel after forming a third color resist layer
  • 15 is a schematic structural diagram of a display panel after patterning a third color resist layer
  • 16 is another schematic structural diagram of a display panel after forming a black photoresist layer
  • FIG. 17 is another schematic structural diagram of a display panel after patterning a black photoresist layer.
  • FIG. 1 is a schematic flowchart of a method for manufacturing a display panel according to an embodiment of the present application. Referring to FIG. 1, the method includes:
  • a substrate is provided, and the substrate is provided with at least one exposure registration mark.
  • the substrate includes a display area and a non-display area located on at least one side of the display area, and at least one exposure registration mark is located in the non-display area of the substrate.
  • FIG. 2 is a schematic structural diagram of a substrate provided by an embodiment of the present application.
  • FIG. 2 only shows an exposure alignment mark 12 provided on the substrate 11, but it is not a limitation on the manufacturing method of the display panel provided in this embodiment. In other embodiments, the number of the exposure registration marks 12 can also be set according to actual needs.
  • a color filter layer is formed on a side of the exposure registration mark far from the substrate.
  • the color filter layer includes a logo thickening layer covering the exposure registration mark.
  • the logo thickening layer has the same shape and the same size as the exposure registration mark.
  • the color filter layer may be a color filter unit of multiple colors.
  • the thickness of the color filter layer can be set according to requirements, which is not specifically limited in this embodiment.
  • FIG. 3 is a schematic structural diagram of a display panel after forming a color filter layer.
  • the color filter layer 13 includes a logo thickening layer 131 covering the exposure registration mark 12 and a plurality of color filter units 132.
  • the logo thickening layer 131 and the exposure registration mark 12 have the same shape and the same size.
  • the thickness of the position of the exposure registration mark 12 is increased from the thickness of the single exposure registration mark 12 to the sum of the thicknesses of the exposure registration mark 12 and the logo thickening layer 131, that is, the height of the position of the exposure registration mark 12 increases. , Thereby improving the recognizability of the exposure registration mark 12.
  • the exposure registration mark 12 is square and the side length is 300um; then the shape of the identification thickened layer 131 is square and the side length is 300um, the vertical projection of the identification thickened layer 131 on the substrate 11 and the exposure alignment The vertical projection of the mark 12 on the substrate 11 coincides.
  • the thickness of the exposure registration mark 12 is 0.5um, and the thickness of the logo thickening layer 131 is 2.0um. Then, the height of the position of the exposure registration mark 12 is increased from 0.5um to 2.5um, so that the height can be increased. Improved recognition.
  • a black photoresist layer is formed on a side of the color filter layer away from the substrate.
  • FIG. 4 is a schematic structural diagram of a display panel after forming a black photoresist layer
  • FIG. 5 is a schematic plan view of a display panel after forming a black photoresist layer. 4 and 5, the black photoresist layer 140 covers the identification thickening layer 131 and the color filter unit 132.
  • FIG. 5 only shows the color filter units 132 of 4 rows and 6 columns, which is not limited to the present application. In other embodiments, the number of rows and columns of the color filter unit 132 can be set according to the actual needs of the display panel.
  • the height difference between the position of the exposure registration mark and the surrounding area is the sum of the thickness of the exposure registration mark and the thickness of the thickened layer of the mark.
  • the thickness of the black photoresist layer or the height of the surface of the black photoresist layer away from the substrate determines the position of the exposure registration mark. Precision.
  • FIG. 6 is a schematic structural diagram of a display panel after forming a black light-shielding layer.
  • accurate identification of the exposure registration mark 12 can realize accurate exposure of the black photoresist layer, thereby making the position distribution of the black light-shielding layer 14 and the color filter unit 132 on the substrate more accurate, thereby improving the display panel's Picture display quality.
  • a color filter layer is formed on a side of the exposure registration mark away from the substrate.
  • the color filter layer includes a logo thickening layer covering the exposure registration mark.
  • the shape of the exposure registration mark is the same and the same size to increase the thickness of the location of the exposure registration mark.
  • a black photoresist layer is formed on the side of the color filter layer away from the substrate. As the thickness of the location of the exposure registration mark increases, It can realize the accurate identification of the exposure registration mark, thereby improving the production accuracy of the black shading layer.
  • FIG. 7 is a schematic structural diagram of a display panel with a single-layer thickening layer provided in an embodiment of the present application.
  • the color filter layer further includes a first color filter layer 132R, a second color filter layer 132G, and a third color filter layer 132B; the first color filter layer 132R and the second color filter
  • the vertical projections of the light layer 132G and the third color filter layer 132B on the substrate 11 do not overlap.
  • the vertical projections of the first color filter layer 132R, the second color filter layer 132G, and the third color filter layer 132B on the substrate 11 do not overlap.
  • the first color filter layer 132R includes a plurality of first color filter units
  • the second color filter layer 132G includes a plurality of second color filter units
  • the third color filter layer 132B includes a plurality of third color filter units.
  • the identification thickening layer 131 and any one of the first color filter layer 132R, the second color filter layer 132G, and the third color filter layer 132B are formed in the same process.
  • the mark thickening layer 131R and the first color filter layer 132R are formed in the same process.
  • the height difference increased at the position of the exposure registration mark 12 is the same as the thickness of the first color filter layer 132R. This improves the recognition accuracy of the exposure registration mark, thereby improving the manufacturing accuracy of the black light-shielding layer.
  • FIG. 7 only shows the structure of the display panel formed by the identification thickening layer and the first color filter layer in the same process, but it is not limited to this embodiment.
  • the identification thickened layer may be formed in the same process as the second color filter layer, or the identification thickened layer and the third color filter layer are formed in the same process.
  • the logo thickening layer includes a first logo layer and a second logo layer, and the second logo layer is located on a side of the first logo layer away from the exposure registration mark; the first logo layer and the second logo layer are respectively separated from the first logo layer
  • the color filter layer and the second color filter layer are formed in the same process, or the first identification layer and the second identification layer are formed in the same process with the second color filter layer and the third color filter layer, respectively, Or, the first identification layer and the second identification layer are formed in the same process with the first color filter layer and the third color filter layer, respectively.
  • FIG. 8 is a schematic structural diagram of a display panel with two layers of identification thickening layers provided in the embodiment of the present application.
  • the logo thickening layer includes a first logo layer 131R and a second logo layer 131G.
  • the first logo layer 131R and the first color filter layer 132R are formed in the same process, and the second logo layer 131G and the second color filter are formed.
  • the light layer 132G is formed in the same process.
  • the increased height difference at the position of the exposure registration mark 12 is equal to the sum of the thicknesses of the first color filter layer 132R and the second color filter layer 132G, so that the exposure registration mark 12
  • the height difference between the 12 position and the surrounding position is further increased, thereby further improving the recognition accuracy of the exposure registration mark, thereby further improving the production accuracy of the black light-shielding layer.
  • FIG. 8 only shows the structure of the display panel formed by the identification thickening layer, the first color filter layer, and the second color filter layer in the same process, but it is not limited to this embodiment.
  • the logo thickening layer may be formed in the same process as any two of the three color filter layers.
  • the logo thickening layer includes a first logo layer, a second logo layer, and a third logo layer that are stacked, and the second logo layer is located on a side of the first logo layer away from the exposure registration mark, and the first logo layer,
  • the second identification layer and the third identification layer are formed in the same process with the first color filter layer, the second color filter layer, and the third color filter layer, respectively.
  • the logo thickening layer can be formed in the same process as any one of the first color filter layer, the second color filter layer, and the third color filter layer, any two layers, or three layers, that is, the logo thickening layer
  • the formation of thick layers does not need to introduce new process steps, which can simplify the process flow and save process costs.
  • FIG. 9 is a schematic flow chart of forming a color filter layer according to an embodiment of the present application. Referring to FIG. 9, this step includes:
  • a first color resist layer is formed on a side of the exposure registration mark far from the substrate, and the first color resistance layer is patterned to form a first color filter layer and a first identification layer covering the exposure registration mark.
  • the thickness of the first identification layer can be controlled by adjusting the exposure conditions.
  • the larger the light intensity during exposure the longer the exposure time, and the thinner the thickness of the first identification layer; otherwise, the smaller the light intensity during exposure, the exposure The shorter the time, the thicker the first identification layer is.
  • FIG. 10 is a schematic structural diagram of a display panel after the first color resist layer is formed.
  • the first color resist layer 13R covers the exposure registration mark 12 and the substrate 11.
  • FIG. 11 is a schematic structural diagram of a display panel after patterning the first color resist layer. 10 and 11, after patterning the first color resist layer 13R, a first color filter layer 132R and a first logo layer 131R are formed.
  • the first logo thickening layer 131R and the exposure registration logo 12 have the same shape and The same size.
  • a second color resist layer is formed on a side of the first color filter layer away from the substrate, and the second color resist layer is patterned to form a second color filter layer and a second identification layer covering the first identification layer.
  • the thickness of the second identification layer can also be controlled by adjusting the exposure conditions.
  • the thickness of the second identification layer can also be controlled by adjusting the exposure conditions.
  • FIG. 12 is a schematic structural diagram of a display panel after forming a second color resist layer. 12, the second color resist layer 13G covers the first color filter layer 132R, the first logo layer 131R, and the substrate 11.
  • FIG. 13 is a schematic structural diagram of a display panel after patterning the second color resist layer. 12 and 13, after patterning the second color resist layer 13G, a second color filter layer 132G and a second identification layer 131G are formed, where the second identification thickened layer 131G and the first identification thickened layer 131R and The exposure registration marks 12 have the same shape and the same size.
  • a third color resist layer is formed on a side of the second color filter layer away from the first color filter layer, and the third color resist layer is patterned to form a third color filter layer and a third logo covering the second logo layer.
  • Floor is formed on a side of the second color filter layer away from the first color filter layer, and the third color resist layer is patterned to form a third color filter layer and a third logo covering the second logo layer.
  • the thickness of the third identification layer can also be controlled by adjusting the exposure conditions.
  • the thickness of the third identification layer can also be controlled by adjusting the exposure conditions.
  • FIG. 14 is a schematic structural diagram of a display panel after a third color resist layer is formed.
  • the third color resist layer 13B covers the first color filter layer 132R, the second color filter layer 132G, the second identification layer 131G, and the substrate 11.
  • FIG. 15 is a schematic structural diagram of a display panel after patterning the third color resist layer. 14 and 15, after patterning the third color resist layer 13B, a third color filter layer 132B and a third identification layer 131B are formed, where the third identification thickened layer 131B and the first identification thickened layer 131R, The second logo thickening layer 131G and the exposure registration mark 12 have the same shape and the same size.
  • FIG. 16 is another schematic structural diagram of a display panel after forming a black photoresist layer.
  • the black photoresist layer 140 covers the first color filter layer 132R, the second color filter layer 132G, the third color filter layer 132B, the third identification layer 131B, and the substrate 11.
  • the difference between the height of the black photoresist layer 140 at the position of the exposure registration mark 12 and the height of the surrounding area is four layers of the exposure registration mark 12, the first identification layer 131R, the second identification layer 131G, and the third identification layer 131B.
  • the sum of the thicknesses of the film layers is significantly increased compared to the thickness of the exposure registration mark 12 itself, which facilitates the accurate identification of the exposure registration mark, thereby making the exposure registration of the black photoresist layer more accurate.
  • the vertical projections of the first color filter layer 132R, the second color filter layer 132G, and the third color filter layer 132B on the substrate 11 do not overlap, and a color filter layer in a display panel can be formed.
  • FIG. 17 is another schematic structural diagram of a display panel after patterning a black photoresist layer.
  • a black light-shielding layer 14 is formed.
  • the shape of the exposure registration mark is a rectangle, a cross, a diamond, or a circle.
  • the comparison of the embodiments of the present application is not limited, and precise alignment before exposure can be achieved.
  • the logo thickening layer is rectangular; when the exposure registration mark is cross-shaped, the logo thickening layer is cross-shaped. It should be noted that FIG. 5 only shows the case where the exposure registration mark is circular, which is only for the description of the present application and is not limited.
  • step S40 in FIG. 1 includes: detecting the outline of the exposure registration mark and the thickened layer of the mark to determine the position of the exposure registration mark, and performing exposure registration according to the position of the exposure registration mark.
  • the black photoresist layer is covered on the entire surface of the substrate and the structure formed by the aforementioned process. Because the black photoresist layer has a high optical density value and a strong ability to absorb light, if an optical identification method is used, The identification of the exposure registration mark may easily cause the recognition of the exposure registration mark to be inaccurate, which may cause the exposure machine to fail to accurately register. Therefore, in the embodiment of the present application, the exposure registration mark and the outline of the thickened layer of the mark overlaid on the exposure registration mark are detected by the difference between the height of the position of the exposure registration mark and the height of the surrounding area to determine the exposure registration. The position of the mark, so as to realize the accurate identification of the exposure registration mark, and then realize the precise exposure of the black photoresist layer.
  • the substrate is an array substrate.
  • the array substrate may include a plurality of pixel units arranged in an array, a plurality of scan lines, and a data line.
  • the display panel provided in the embodiment of the present application integrates a color filter layer and a black light-shielding layer on the array substrate.
  • the color filter layer increases the distance between the pixel electrode and the metal trace, which can reduce the capacitive coupling between the two. Effect, which can improve the signal delay effect on the metal traces, thereby improving the screen display quality of the display panel.
  • the black light-shielding layer and the color filter layer are integrated on the array substrate, which can solve the problem of incomplete light-shielding caused by the black light-shielding layer formed on the opposite substrate, thereby improving the screen display quality of the display panel.
  • the first color filter layer, the second color filter layer, and the third color filter layer are a red filter layer, a green filter layer, and a blue filter layer, respectively.
  • different color filter layers can be set to realize that the pixel unit emits red, green, or blue light, thereby achieving normal display of the color screen of the display panel.
  • the black light-shielding layer is a black matrix or a black spacer.
  • the black matrix is mainly used to prevent light leakage between pixels and increase the contrast of colors to ensure the screen display effect of the display panel.
  • the black spacer is a support provided between the array substrate and the counter substrate, and is used for supporting the counter substrate and the array substrate, and has a certain light shielding effect.
  • a color filter layer is formed on a side of the exposure registration mark away from the substrate.
  • the color filter layer includes a logo thickening layer covering the exposure registration mark.
  • the shape of the exposure registration mark is the same and the same size to increase the thickness of the location of the exposure registration mark.
  • a black photoresist layer is formed on the side of the color filter layer away from the substrate. As the thickness of the location of the exposure registration mark increases, Accurate identification of exposure registration marks can be achieved.
  • the color filter layer and the black light-shielding layer are integrated on the array substrate, which can solve the problem of incomplete light-shielding caused by the black light-shielding layer formed on the opposite substrate, and can improve the signal delay effect on the metal traces.
  • the screen display quality of the display panel is integrated on the array substrate, which can solve the problem of incomplete light-shielding caused by the black light-shielding layer formed on the opposite substrate, and can improve the signal delay effect on the metal traces.
  • the present application also provides a display panel, wherein the display panel includes:
  • An array substrate provided with the color film substrate object
  • a liquid crystal layer is filled between the color filter substrate and the array substrate.
  • the manufacturing steps of the color filter substrate include:
  • the substrate is provided with at least one exposure registration mark
  • a color filter layer is formed on a side of the exposure registration mark far from the substrate, and the color filter layer includes a logo thickening layer covering the exposure registration mark, and the logo thickening layer and the exposure
  • the registration marks have the same shape and the same size
  • the exposure alignment mark and the logo thickened layer are subjected to exposure alignment to expose the black photoresist layer to form a black light-shielding layer.
  • the manufacturing method of the color filter substrate is an embodiment of the manufacturing method of the display panel in the above embodiment.
  • the height difference between the position of the exposure registration mark and its surrounding area is the sum of the thickness of the exposure registration mark and the thickness of the thickened layer of the mark. Detecting the thickness of the display panel, or detecting the height of the surface of the black photoresist layer away from the substrate, determines the position of the exposure registration mark, improves the position recognition accuracy of the exposure registration mark, improves the accuracy of the exposure registration, and thereby improves black shading Production accuracy of layers.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
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Abstract

提供一种显示面板的制作方法和显示面板。制作方法包括:(S10)提供一基板(11),基板(11)上设置有至少一个曝光对位标识(12);(S20)在曝光对位标识(12)远离基板(11)的一侧形成彩色滤光层(13),彩色滤光层(13)包括覆盖曝光对位标识(12)的标识增厚层(131),标识增厚层(131)与曝光对位标识(12)的形状相同且大小相同;(S30)在彩色滤光层(13)远离基板(11)的一侧形成黑色光阻层(140);(S40)通过曝光对位标识(12)和标识增厚层(131)进行曝光对位。

Description

一种显示面板的制作方法和显示面板
相关申请:
本申请要求2018年5月22日申请的,申请号为201810495790.3,名称为“一种显示面板的制作方法”的中国专利申请的优先权,在此将其全文引入作为参考。
技术领域
本申请实施例涉及显示技术,尤其涉及一种显示面板的制作方法和显示面板。
背景技术
随着显示技术的发展,为避免上下基板错位导致的遮光区域不匹配的问题,通常将黑矩阵整合到阵列基板上,即BOA(Black Matrix on Array)技术。同时,在显示装置的制备过程中,为了提高制程中的对位精度,通常设置有曝光对位标识。
但是,由于形成黑矩阵的黑色遮光层材料具有较高的光密度值(optical density,OD),导致在涂布黑色遮光材料后,对光罩曝光对位标识的识别造成干扰,从而导致曝光机无法精准对位;若使用光密度值较低的黑色遮光层材料,虽然可以减小对标记标识的识别难度,但是会导致黑矩阵的遮光效果受到严重影响。
发明内容
本申请实施例提供一种显示面板的制作方法,以在不影响黑矩阵的遮光效果的同时实现曝光对位标识的精准识别。
本申请实施例提供了一种显示面板的制作方法,该方法包括:
提供一基板,所述基板上设置有至少一个曝光对位标识;
在所述曝光对位标识远离所述基板的一侧形成彩色滤光层,所述彩色滤光层包括覆盖所述曝光对位标识的标识增厚层,所述标识增厚层与所述曝光对位标识的形状相同且大小相同;
在所述彩色滤光层远离所述基板的一侧形成黑色光阻层;
通过所述曝光对位标识和所述标识增厚层进行曝光对位,以对所述黑色光阻层进行曝光,形成黑色遮光层。
本申请实施例还提供了一种显示面板的制作方法,该方法包括:
提供一基板,所述基板上设置有至少一个曝光对位标识;
在所述曝光对位标识远离所述基板的一侧形成第一色阻层,图案化所述第一色阻层形成第一彩色滤光层和覆盖所述曝光对位标识的第一标识层;
在所述第一彩色滤光层远离所述基板的一侧形成第二色阻层,图案化所述第二色阻层形成第二彩色滤光层和覆盖所述第一标识层的第二标识层;
在所述第二彩色滤光层远离所述基板的一侧形成第三色阻层,图案化所述第三色阻层形成第三彩色滤光层和覆盖所述第二标识层的第三标识层;其中,所述第一标识层、所述第二标识层和所述第三标识层构成覆盖所述曝光对位标识的标识增厚层,所述标识增厚层与所述曝光对位标识的形状相同且大小相同;
在所述第三彩色滤光层远离所述基板的一侧形成黑色光阻层;
检测所述曝光对位标识和标识增厚层的轮廓确定所述曝光对位标识的位置,并根据所述曝光对位标识的位置进行曝光对位,以对所述黑色光阻层进行曝光,形成黑色遮光层。
本申请实施例提供的显示面板的制作方法,通过在曝光对位标识远离基板的一侧形成彩色滤光层,彩色滤光层包括覆盖曝光对位标识的标识增厚层,标识增厚层与曝光对位标识的形状相同且大小相同,以此来增加曝光对位标识所在位置的厚度;在彩色滤光层远离基板的一侧形成黑色光阻层,由于曝光对位标识所在位置厚度增加,可实现曝光对位标识的精准识别。
本申请实施例还提供了一种显示面板,所述显示面板包括:
彩膜基板;
阵列基板,与所述彩膜基板对象设置;
液晶层,填充于所述彩膜基板和所述阵列基板之间;其中,所述彩膜基板的制作步骤包括:
提供一基板,所述基板上设置有至少一个曝光对位标识;
在所述曝光对位标识远离所述基板的一侧形成彩色滤光层,所述彩色滤光层包括覆盖所述曝光对位标识的标识增厚层,所述标识增厚层与所述曝光对位标识的形状相同且大小相同;
在所述彩色滤光层远离所述基板的一侧形成黑色光阻层;以及,
通过所述曝光对位标识和所述标识增厚层进行曝光对位,以对所述黑色光阻层进行曝光,形成黑色遮光层。
附图说明
为了更清楚地说明本申请实施例的技术方案,下面将对实施例描述中所需要使用的附图做一简单地介绍,显而易见地,下面描述中的附图是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。
图1是本申请实施例提供的一种显示面板的制作方法的流程示意图;
图2是本申请实施例提供的一种基板的结构示意图;
图3是形成彩色滤光层后显示面板的结构示意图;
图4是形成黑色光阻层后显示面板的结构示意图;
图5是形成黑色光阻层后显示面板的平面示意图;
图6是形成黑色遮光层后显示面板的结构示意图;
图7是本申请实施例提供的标识增厚层为单层的显示面板的结构示意图;
图8是本申请实施例提供的标识增厚层为两层的显示面板的结构示意图;
图9是本申请实施例提供的形成彩色滤光层的流程示意图;
图10是形成第一色阻层后的显示面板的结构示意图;
图11是图案化第一色阻层后的显示面板的结构示意图;
图12是形成第二色阻层后的显示面板的结构示意图;
图13是图案化第二色阻层后的显示面板的结构示意图;
图14是形成第三色阻层后的显示面板的结构示意图;
图15是图案化第三色阻层后的显示面板的结构示意图;
图16是形成黑色光阻层后的显示面板的又一结构示意图;
图17是图案化黑色光阻层后的显示面板的又一结构示意图。
具体实施方式
为使本申请的目的、技术方案和优点更加清楚,以下将参照本申请实施例中的附图,通过实施方式清楚、完整地描述本申请的技术方案,显然,所描述的实施例是本申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。
图1是本申请实施例提供的一种显示面板的制作方法的流程示意图。参照图1,该方法包括:
S10、提供一基板,基板上设置有至少一个曝光对位标识。
其中,基板包括显示区和位于显示区至少一侧的非显示区,至少一个曝光对位标识位于基板的非显示区。
可选的,图2是本申请实施例提供的一种基板的结构示意图。图2中仅可选的示出了设置在基板11上的一个曝光对位标识12,但并非对本实施例提供的显示面板的制作方法的限定。在其他实施方式中,曝光对位标识12的个数还可以根据实际需求设置为多个。
S20、在曝光对位标识远离基板的一侧形成彩色滤光层,彩色滤光层包括覆盖曝光对位标识的标识增厚层,标识增厚层与曝光对位标识的形状相同且大小相同。
其中,彩色滤光层可为多个颜色的彩色滤光单元。彩色滤光层的厚度可根据需求设置,本实施例对此不做具体限定。
可选的,图3是形成彩色滤光层后显示面板的结构示意图。参照图3,彩色滤光层13包括覆盖曝光对位标识12的标识增厚层131和多个彩色滤光单元132,标识增厚层131与曝光对位标识12的形状相同且大小相同。由此,曝光对位标识12所在位置的厚度由单个曝光对位标识12的厚度增加为曝光对位标识12与标识增厚层131的厚度之和,即曝光对位标识12所在位置的高度增加,从而提高曝光对位标识12的可识别性。
可选的,曝光对位标识12为方形,边长为300um;则标识增厚层131的形状为方形,且边长为300um,标识增厚层131在基板11上的垂直投影与曝光对位标识12在基板11上的垂直投影重合。可选的,曝光对位标识12的厚度为0.5um,标识增厚层131的厚度为2.0um,则曝光对位标识12所在位置的高度由0.5um增加为2.5um,其高度增加,从而可识别性提高。
S30、在彩色滤光层远离基板的一侧形成黑色光阻层。
可选的,图4是形成黑色光阻层后显示面板的结构示意图;图5是形成黑色光阻层后显示面板的平面示意图。参考图4和图5,黑色光阻层140覆盖标识增厚层131和彩色滤光单元132。
需要说明的是,图5中仅可选的示出了4行6列的彩色滤光单元132,并非对本申请的限定。在其他实施方式中,彩色滤光单元132的行数和列数可根据显示面板的实际需求设定。
S40、通过曝光对位标识和标识增厚层进行曝光对位,以对黑色光阻层进行曝光,形成黑色遮光层。
其中,对位过程中,曝光对位标识所在位置与其周边区域的高度差为曝光对位标识的厚度与标识增厚层的厚度之和,与周边区域的高度差较大,可以通过检测显示面板的厚度,或者检测黑色光阻层远离基板一侧的表面的高度确定曝光对位标识的位置,提高了曝光对位标识的位置识别精度,提高了曝光对位精度,从而提高黑色遮光层的制作精度。
可选的,图6是形成黑色遮光层后显示面板的结构示意图。参考图6,通过曝光对位标识12的精准识别,可实现黑色光阻层的精准曝光,从而使黑色遮光层14与彩色滤光单元132在基板上的位置分布更精准,从而提高显示面板的画面显示质量。
需要说明的是,图6中仅可选的示出了彩色滤光层与黑色遮光层的相对位置关系,对彩色滤光层和黑色遮光层的相对大小并不做具体限定。
本申请实施例提供的显示面板的制作方法,通过在曝光对位标识远离基板的一侧形成彩色滤光层,彩色滤光层包括覆盖曝光对位标识的标识增厚层,标识增厚层与曝光对位标识的形状相同且大小相同,以此来增加曝光对位标识所在位置的厚度;在彩色滤光层远离基板的一侧形成黑色光阻层,由于曝光对位标识所在位置厚度增加,可实现曝光对位标识的精准识别,从而提高黑色遮光层的制作精度。
图7是本申请实施例提供的标识增厚层为单层的显示面板的结构示意图。参照图7,可选的,彩色滤光层还包括第一彩色滤光层132R、第二彩色滤光层132G和第三彩色滤光层132B;第一彩色滤光层132R、第二彩色滤光层132G和第三彩色滤光层132B在基板11上的垂直投影不交叠。
其中,第一彩色滤光层132R、第二彩色滤光层132G和第三彩色滤光层132B在基板11上的垂直投影不交叠。
第一彩色滤光层132R包括多个第一彩色滤光单元,第二彩色滤光层132G包括多个第二彩色滤光单元,第三彩色滤光层132B包括多个第三彩色滤光单元。
可选的,标识增厚层131与第一彩色滤光层132R、第二彩色滤光层132G和第三彩色滤光层132B中的任一层在同一工艺中形成。
参考图7,标识增厚层131R与第一彩色滤光层132R在同一工艺中形成,此时,曝光对位标识12所在位置增加的高度差与第一彩色滤光层132R的厚度相同,由此提高了曝光对位标识的识别精准度,从而提高了黑色遮光层的制作精度。
需要说明的是,图7仅可选的示出了标识增厚层与第一彩色滤光层在同一工艺中形成的显示面板的结构,但并非对本实施例的限定。在其他实施方式中,标识增厚层还可与第二彩色滤光层在同一工艺中形成,或者,标识增厚层与第三彩色滤光层在同一工艺中形成。
可选的,标识增厚层包括第一标识层和第二标识层,第二标识层位于第一标识层远离曝光对位标识的一侧;第一标识层和第二标识层分别与第一彩色滤光层和第二彩色滤光层在同一工艺中形成,或,第一标识层和第二标识层分别与第二彩色滤光层和第三彩色滤光层中在同一工艺中形成,或,第一标识层和第二标识层分别与第一彩色滤光层和第三彩色滤光层在同一工艺中形成。
可选的,图8是本申请实施例提供的标识增厚层为两层的显示面板的结构示意图。参照图8,标识增厚层包括第一标识层131R和第二标识层131G,第一标识层131R与第一彩色滤光层132R在同一工艺中形成,第二标识层131G与第二彩色滤光层132G在同一工艺中形成,此时,曝光对位标识12所在位置增加的高度差等于第一彩色滤光层132R和第二彩色滤光层132G的厚度之和,从而使曝光对位标识12所在位置与周边位置的高度差进一步增大,从而进一步提高了曝光对位标识的识别精准度,从而进一步提高黑色遮光层的制作精度。
需要说明的是,图8仅可选的示出了标识增厚层与第一彩色滤光层以及第二彩色滤光层在同一工艺中形成的显示面板的结构,但并非对本实施例的限定。在其他实施方式中,标识增厚层还可与三层彩色滤光层中的任两层在同一工艺中形成。
可选的,标识增厚层包括层叠设置的第一标识层、第二标识层和第三标识层,第二标识层位于第一标识层远离曝光对位标识的一侧,第一标识层、第二标识层和第三标识层分别与第一彩色滤光层、第二彩色滤光层和第三彩色滤光层在同一工艺中形成。
由此,标识增厚层可与第一彩色滤光层、第二彩色滤光层和第三彩色滤光层中的任一层、任两层或者三层在同一工艺中形成,即标识增厚层的形成无需引入新的工艺步骤,从而可简化工艺流程,节省工艺成本。
可选的,以标识增厚层为三层膜结构为例,对彩色滤光层的形成步骤进行可选说明,图9是本申请实施例提供的形成彩色滤光层的流程示意图。参照图9,该步骤包括:
S201、在曝光对位标识远离基板的一侧形成第一色阻层,图案化第一色阻层形成第一彩色滤光层和覆盖曝光对位标识的第一标识层。
其中,第一标识层的厚度可通过曝光条件的调节进行控制,可选的,曝光时光强越大,曝光时间越长,第一标识层的厚度越薄;反之,曝光时光强越小,曝光时间越短,第一标识层的厚度越厚。
可选的,图10是形成第一色阻层后的显示面板的结构示意图。参照图10,第一色阻层13R覆盖曝光对位标识12和基板11。
可选的,图11是图案化第一色阻层后的显示面板的结构示意图。结合图10和图11,图案化第一色阻层13R后,形成第一彩色滤光层132R和第一标识层131R,其中,第一标识增厚层131R与曝光对位标识12形状相同且大小相同。
S202、在第一彩色滤光层远离基板的一侧形成第二色阻层,图案化第二色阻层形成第二彩色滤光层和覆盖第一标识层的第二标识层。
其中,第二标识层的厚度也可通过曝光条件的调节进行控制,可参见第一标识层,在此不再赘述。
可选的,图12是形成第二色阻层后的显示面板的结构示意图。参照图12,第二色阻层13G覆盖第一彩色滤光层132R、第一标志层131R和基板11。
可选的,图13是图案化第二色阻层后的显示面板的结构示意图。结合图12和图13,图案化第二色阻层13G后,形成第二彩色滤光层132G和第二标识层131G,其中,第二标识增厚层131G与第一标识增厚层131R以及曝光对位标识12的形状相同且大小相同。
S203、在第二彩色滤光层远离第一彩色滤光层的一侧形成第三色阻层,图案化第三色阻层形成第三彩色滤光层和覆盖第二标识层的第三标识层。
其中,第三标识层的厚度同样可通过曝光条件的调节进行控制,可参见第一标识层,在此不再赘述。
可选的,图14是形成第三色阻层后的显示面板的结构示意图。参照图14,第三色阻层13B覆盖第一彩色滤光层132R、第二彩色滤光层132G、第二标识层131G和基板11。
可选的,图15是图案化第三色阻层后的显示面板的结构示意图。结合图14和图15,图案化第三色阻层13B后,形成第三彩色滤光层132B和第三标识层131B,其中,第三标识增厚层131B与第一标识增厚层131R、第二标识增厚层131G以及曝光对位标识12的形状相同且大小相同。
可选的,图16是形成黑色光阻层后的显示面板的又一结构示意图。参照图16,黑色光阻层140覆盖第一彩色滤光层132R、第二彩色滤光层132G、第三彩色滤光层132B、第三标识层131B和基板11。此时,黑色光阻层140在曝光对位标识12所在位置的高度与周边区域的高度差为曝光对位标识12、第一标识层131R、第二标识层131G和第三标识层131B四层膜层的厚度之和,相对于曝光对位标识12本身的厚度而言,厚度显著增加,利于实现曝光对位标识的精准识别,从而使黑色光阻层的曝光对位更精准。
同时,第一彩色滤光层132R、第二彩色滤光层132G和第三彩色滤光层132B在基板11上的垂直投影不交叠,可形成显示面板中的彩色滤光层。
可选的,图17是图案化黑色光阻层后的显示面板的又一结构示意图。结合图16和图17,图案化黑色光阻层140后,形成黑色遮光层14。
可选的,曝光对位标识的形状为矩形、十字型、菱形或者圆形。本申请实施例对比不限定,可实现曝光前精准对位即可。
可选的,曝光对位标识为矩形时,标识增厚层为矩形;曝光对位标识为十字型时,标识增厚层为十字型。需要说明的是,图5中仅可选的示出了曝光对位标识为圆形的情况,仅为对本申请的说明,并非限定。
可选的,图1中步骤S40包括:检测曝光对位标识和标识增厚层的轮廓确定曝光对位标识的位置,并根据曝光对位标识的位置进行曝光对位。
其中,曝光对位前,黑色光阻层在基板及前述工艺形成的结构上整面覆盖,由于黑色光阻层的光密度值较高,对光线吸收能力较强,因此,若采用光学识别方式对曝光对位标识进行识别,容易造成曝光对位标识识别不准确,从而导致曝光机无法精确对位。由此,本申请实施例通过曝光对位标识所在位置的高度与周边区域的高度差值,来检测曝光对位标识以及覆盖在曝光对位标识上的标识增厚层的轮廓来确定曝光对位标识的位置,从而实现曝光对位标识的精准识别,进而实现黑色光阻层的精准曝光。
可选的,基板为阵列基板。其中,阵列基板上可包括多个阵列排布的像素单元、多条扫描线和数据线。
本申请实施例提供的显示面板将彩色滤光层和黑色遮光层集成到阵列基板上,通过彩色滤光层增加像素电极与金属走线之间的距离,可减小二者之间的电容耦合效应,从而可以改善金属走线上的信号延时效应,进而提高显示面板的画面显示质量。并且将黑色遮光层与彩色滤光层集成到阵列基板上,可解决黑色遮光层形成在对置基板上导致的遮光不完全的问题,从而可提高显示面板的画面显示质量。
可选的,第一彩色滤光层、第二彩色滤光层和第三彩色滤光层分别为红色滤光层、绿色滤光层和蓝色滤光层。
可选的,对于液晶显示面板而言,可通过设置不同颜色的滤光层实现像素单元发出红色、绿色或蓝色的光,从而实现显示面板的彩色画面正常显示。
可选的,黑色遮光层为黑矩阵或黑色间隔物。
其中,黑矩阵主要用来防止画素间的漏光,以及增加色彩的对比性,以保证显示面板的画面显示效果。黑色间隔物为设置于阵列基板与对置基板之间的支撑物,用于支撑对置基板和阵列基板,并且具有一定的遮光作用。
本申请实施例提供的显示面板的制作方法,通过在曝光对位标识远离基板的一侧形成彩色滤光层,彩色滤光层包括覆盖曝光对位标识的标识增厚层,标识增厚层与曝光对位标识的形状相同且大小相同,以此来增加曝光对位标识所在位置的厚度;在彩色滤光层远离基板的一侧形成黑色光阻层,由于曝光对位标识所在位置厚度增加,可实现曝光对位标识的精准识别。此外,将彩色滤光层和黑色遮光层集成到阵列基板上,可解决黑色遮光层形成在对置基板上导致的遮光不完全的问题,同时可改善金属走线上的信号延时效应,提高显示面板的画面显示质量。
本申请还提供一种显示面板,其中,所述显示面板包括:
彩膜基板;
阵列基板,与所述彩膜基板对象设置;
液晶层,填充于所述彩膜基板和所述阵列基板之间;其中,所述彩膜基板的制作步骤包括:
提供一基板,所述基板上设置有至少一个曝光对位标识;
在所述曝光对位标识远离所述基板的一侧形成彩色滤光层,所述彩色滤光层包括覆盖所述曝光对位标识的标识增厚层,所述标识增厚层与所述曝光对位标识的形状相同且大小相同;
在所述彩色滤光层远离所述基板的一侧形成黑色光阻层;以及,
通过所述曝光对位标识和所述标识增厚层进行曝光对位,以对所述黑色光阻层进行曝光,形成黑色遮光层。
所述的彩膜基板的制作方式为上述实施例中的显示面板的制作方法的实施方式。本申请的显示面板对位过程中,曝光对位标识所在位置与其周边区域的高度差为曝光对位标识的厚度与标识增厚层的厚度之和,与周边区域的高度差较大,可以通过检测显示面板的厚度,或者检测黑色光阻层远离基板一侧的表面的高度确定曝光对位标识的位置,提高了曝光对位标识的位置识别精度,提高了曝光对位精度,从而提高黑色遮光层的制作精度。
注意,上述仅为本申请的可选实施例及所运用技术原理。本领域技术人员会理解,本申请不限于这里所述的特定实施例,对本领域技术人员来说能够进行各种明显的变化、重新调整、相互结合和替代而不会脱离本申请的保护范围。因此,虽然通过以上实施例对本申请进行了较为详细的说明,但是本申请不仅仅限于以上实施例,在不脱离本申请构思的情况下,还可以包括更多其他等效实施例,而本申请的范围由所附的权利要求范围决定。

Claims (20)

  1. 一种显示面板的制作方法,其中,包括:
    提供一基板,所述基板上设置有至少一个曝光对位标识;
    在所述曝光对位标识远离所述基板的一侧形成彩色滤光层,所述彩色滤光层包括覆盖所述曝光对位标识的标识增厚层,所述标识增厚层与所述曝光对位标识的形状相同且大小相同;
    在所述彩色滤光层远离所述基板的一侧形成黑色光阻层;以及,
    通过所述曝光对位标识和所述标识增厚层进行曝光对位,以对所述黑色光阻层进行曝光,形成黑色遮光层。
  2. 根据权利要求1所述的方法,其中,
    所述彩色滤光层还包括第一彩色滤光层、第二彩色滤光层和第三彩色滤光层;所述第一彩色滤光层、所述第二彩色滤光层和所述第三彩色滤光层在所述基板的垂直投影不交叠。
  3. 根据权利要求2所述的方法,其中,
    所述标识增厚层与所述第一彩色滤光层、所述第二彩色滤光层和所述第三彩色滤光层中的任一层在同一工艺中形成;或者,
    所述标识增厚层包括第一标识层和第二标识层,所述第二标识层位于所述第一标识层远离所述曝光对位标识的一侧;所述第一标识层和所述第二标识层分别与所述第一彩色滤光层和所述第二彩色滤光层在同一工艺中形成,或,所述第一标识层和所述第二标识层分别与所述第二彩色滤光层和所述第三彩色滤光层中在同一工艺中形成,或,所述第一标识层和所述第二标识层分别与所述第一彩色滤光层和所述第三彩色滤光层在同一工艺中形成;或者,
    所述标识增厚层包括层叠设置的第一标识层、第二标识层和第三标识层,所述第二标识层位于所述第一标识层远离所述曝光对位标识的一侧,所述第一标识层、所述第二标识层和所述第三标识层分别与所述第一彩色滤光层、所述第二彩色滤光层和所述第三彩色滤光层在同一工艺中形成。
  4. 根据权利要求3所述的方法,其中,在所述曝光对位标识远离所述基板的一侧形成彩色滤光层,包括:
    在所述曝光对位标识远离所述基板的一侧形成第一色阻层,图案化所述第一色阻层形成所述第一彩色滤光层和覆盖所述曝光对位标识的第一标识层;
    在所述第一彩色滤光层远离所述基板的一侧形成第二色阻层,图案化所述第二色阻层形成所述第二彩色滤光层和覆盖所述第一标识层的第二标识层;以及,
    在所述第二彩色滤光层远离所述第一彩色滤光层的一侧形成第三色阻层,图案化所述第三色阻层形成所述第三彩色滤光层和覆盖所述第二标识层的第三标识层。
  5. 根据权利要求2所述的方法,其中,通过所述曝光对位标识和所述标识增厚层进行曝光对位包括:
    检测所述曝光对位标识和所述标识增厚层的轮廓确定所述曝光对位标识的位置,并根据所述曝光对位标识的位置进行曝光对位。
  6. 根据权利要求1所述的方法,其中,所述曝光对位标识的形状为矩形、十字型、菱形或者圆形。
  7. 根据权利要求1所述的方法,其中,通过所述曝光对位标识和所述标识增厚层进行曝光对位包括:
    检测所述曝光对位标识和所述标识增厚层的轮廓确定所述曝光对位标识的位置,并根据所述曝光对位标识的位置进行曝光对位。
  8. 根据权利要求1所述的方法,其中,
    所述基板为阵列基板。
  9. 根据权利要求2所述的方法,其中,
    所述第一彩色滤光层、所述第二彩色滤光层和所述第三彩色滤光层分别为红色滤光层、绿色滤光层和蓝色滤光层。
  10. 根据权利要求1所述的方法,其中,
    所述黑色遮光层为黑矩阵或黑色间隔物。
  11. 一种显示面板的制作方法,其中,包括:
    提供一基板,所述基板上设置有至少一个曝光对位标识;
    在所述曝光对位标识远离所述基板的一侧形成第一色阻层,图案化所述第一色阻层形成第一彩色滤光层和覆盖所述曝光对位标识的第一标识层;
    在所述第一彩色滤光层远离所述基板的一侧形成第二色阻层,图案化所述第二色阻层形成第二彩色滤光层和覆盖所述第一标识层的第二标识层;
    在所述第二彩色滤光层远离所述基板的一侧形成第三色阻层,图案化所述第三色阻层形成第三彩色滤光层和覆盖所述第二标识层的第三标识层;其中,所述第一标识层、所述第二标识层和所述第三标识层构成覆盖所述曝光对位标识的标识增厚层,所述标识增厚层与所述曝光对位标识的形状相同且大小相同;
    在所述第三彩色滤光层远离所述基板的一侧形成黑色光阻层;以及,
    检测所述曝光对位标识和标识增厚层的轮廓确定所述曝光对位标识的位置,并根据所述曝光对位标识的位置进行曝光对位,以对所述黑色光阻层进行曝光,形成黑色遮光层。
  12. 根据权利要求11所述的方法,其中,所述曝光对位标识的形状为矩形、十字型、菱形或者圆形。
  13. 根据权利要求11所述的方法,其中,
    所述基板为阵列基板。
  14. 根据权利要求11所述的方法,其中,所述第一彩色滤光层、所述第二彩色滤光层和所述第三彩色滤光层分别为红色滤光层、绿色滤光层和蓝色滤光层。
  15. 根据权利要求11所述的方法,其中,
    所述黑色遮光层为黑矩阵或黑色间隔物。
  16. 根据权利要求11所述的方法,其中,所述标识增厚层与所述第一彩色滤光层、所述第二彩色滤光层和所述第三彩色滤光层中的任一层在同一工艺中形成;或者,
    所述标识增厚层包括第一标识层和第二标识层,所述第二标识层位于所述第一标识层远离所述曝光对位标识的一侧;所述第一标识层和所述第二标识层分别与所述第一彩色滤光层和所述第二彩色滤光层在同一工艺中形成,或,所述第一标识层和所述第二标识层分别与所述第二彩色滤光层和所述第三彩色滤光层中在同一工艺中形成,或,所述第一标识层和所述第二标识层分别与所述第一彩色滤光层和所述第三彩色滤光层在同一工艺中形成;或者,
    所述标识增厚层包括层叠设置的第一标识层、第二标识层和第三标识层,所述第二标识层位于所述第一标识层远离所述曝光对位标识的一侧,所述第一标识层、所述第二标识层和所述第三标识层分别与所述第一彩色滤光层、所述第二彩色滤光层和所述第三彩色滤光层在同一工艺中形成。
  17. 一种显示面板,其中,所述显示面板包括:
    彩膜基板;
    阵列基板,与所述彩膜基板对象设置;
    液晶层,填充于所述彩膜基板和所述阵列基板之间;其中,所述彩膜基板的制作步骤包括:
    提供一基板,所述基板上设置有至少一个曝光对位标识;
    在所述曝光对位标识远离所述基板的一侧形成彩色滤光层,所述彩色滤光层包括覆盖所述曝光对位标识的标识增厚层,所述标识增厚层与所述曝光对位标识的形状相同且大小相同;
    在所述彩色滤光层远离所述基板的一侧形成黑色光阻层;以及,
    通过所述曝光对位标识和所述标识增厚层进行曝光对位,以对所述黑色光阻层进行曝光,形成黑色遮光层。
  18. 如权利要求17所述的显示面板,其中,所述彩色滤光层还包括第一彩色滤光层、第二彩色滤光层和第三彩色滤光层;所述第一彩色滤光层、所述第二彩色滤光层和所述第三彩色滤光层在所述基板的垂直投影不交叠。
  19. 如权利要求18所述的显示面板,其特征在于,所述标识增厚层与所述第一彩色滤光层、所述第二彩色滤光层和所述第三彩色滤光层中的任一层在同一工艺中形成;或者,
    所述标识增厚层包括第一标识层和第二标识层,所述第二标识层位于所述第一标识层远离所述曝光对位标识的一侧;所述第一标识层和所述第二标识层分别与所述第一彩色滤光层和所述第二彩色滤光层在同一工艺中形成,或,所述第一标识层和所述第二标识层分别与所述第二彩色滤光层和所述第三彩色滤光层中在同一工艺中形成,或,所述第一标识层和所述第二标识层分别与所述第一彩色滤光层和所述第三彩色滤光层在同一工艺中形成;或者,
    所述标识增厚层包括层叠设置的第一标识层、第二标识层和第三标识层,所述第二标识层位于所述第一标识层远离所述曝光对位标识的一侧,所述第一标识层、所述第二标识层和所述第三标识层分别与所述第一彩色滤光层、所述第二彩色滤光层和所述第三彩色滤光层在同一工艺中形成。
  20. 根据权利要求19所述的显示面板,其中,在所述曝光对位标识远离所述基板的一侧形成彩色滤光层,包括:
    在所述曝光对位标识远离所述基板的一侧形成第一色阻层,图案化所述第一色阻层形成所述第一彩色滤光层和覆盖所述曝光对位标识的第一标识层;
    在所述第一彩色滤光层远离所述基板的一侧形成第二色阻层,图案化所述第二色阻层形成所述第二彩色滤光层和覆盖所述第一标识层的第二标识层;以及,
    在所述第二彩色滤光层远离所述第一彩色滤光层的一侧形成第三色阻层,图案化所述第三色阻层形成所述第三彩色滤光层和覆盖所述第二标识层的第三标识层。
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