WO2018174071A1 - Electroconductive film, touch panel, and image display device - Google Patents
Electroconductive film, touch panel, and image display device Download PDFInfo
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- WO2018174071A1 WO2018174071A1 PCT/JP2018/011111 JP2018011111W WO2018174071A1 WO 2018174071 A1 WO2018174071 A1 WO 2018174071A1 JP 2018011111 W JP2018011111 W JP 2018011111W WO 2018174071 A1 WO2018174071 A1 WO 2018174071A1
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- conductive
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- fiber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
Definitions
- the present invention relates to a conductive film, a touch panel, and an image display device.
- the conductive film includes a light-transmitting conductive layer made of indium tin oxide (ITO) provided on a light-transmitting substrate (see, for example, JP-A-2015-95070).
- ITO indium tin oxide
- metal nanowires such as silver nanowires instead of ITO for the conductive film is now being studied.
- Patterning of the conductive layer containing metal nanowires can also be performed by wet etching, but since wet etching is affected by chemicals, laser etching that is not affected by chemicals and that can selectively remove metal nanowires is performed. preferable.
- the inventors of the present invention when patterning the conductive layer by laser etching, there is a possibility that the metal nanowire remains in the non-conductive portion, and when the metal nanowire remains in the non-conductive portion, the remaining metal nanowire, It has been discovered that an electrical short circuit between the conductive portions is likely to occur due to the migration of metal ions from the conductive portions.
- the present invention has been made to solve the above problems. That is, an object is to provide a conductive film, a touch panel, and an image display device that can suppress an electrical short circuit between conductive portions.
- a light transmissive substrate a plurality of light transmissive conductive portions provided on one surface side of the light transmissive substrate, and light positioned between the conductive portions.
- a conductive film comprising a transparent non-conductive portion, wherein each conductive portion includes a light-transmitting resin and conductive fibers disposed in the light-transmitting resin, and the non-conductive portion is A conductive film comprising a light-transmitting resin and having a three-dimensional arithmetic average roughness on the surface of the non-conductive portion of 3 nm or more is provided.
- the three-dimensional arithmetic average roughness may be 80 nm or less.
- a fiber length of the conductive fiber may be 1 ⁇ m or more.
- a fiber diameter of the conductive fiber may be 200 nm or less.
- the haze value of the conductive film may be 5% or less.
- the total light transmittance of the conductive film may be 80% or more.
- a touch panel provided with the above conductive film is provided.
- an image display device including the conductive film or the touch panel.
- the arithmetic average roughness on the surface of the non-conductive portion is 3 nm or more, it is possible to provide a conductive film that can suppress an electrical short circuit between the conductive portions. Moreover, according to the other aspect of this invention, a touch panel and an image display apparatus provided with such an electroconductive film can be provided.
- FIG. 1 is a schematic configuration diagram of a conductive film according to an embodiment.
- FIG. 2 is a schematic plan view of the conductive film according to the embodiment.
- FIG. 3 is an enlarged view of a part of the conductive film shown in FIG.
- FIG. 4 is a plan view of a sample when measuring the electric resistance value.
- FIG. 5A to FIG. 5C are diagrams schematically showing the state of the folding test.
- FIG. 6A and FIG. 6B are diagrams schematically showing a manufacturing process of the conductive film according to the embodiment.
- FIG. 7 (A) and FIG. 7 (B) are diagrams schematically showing a manufacturing process of the conductive film according to the embodiment.
- FIG. 8 (A) and FIG. 8 (B) are diagrams schematically showing a manufacturing process of the conductive film according to the embodiment.
- FIG. 9 is a schematic configuration diagram of an image display apparatus according to the embodiment.
- FIG. 10 is a schematic plan view of the touch panel according to the embodiment.
- FIG. 1 is a schematic configuration diagram of the conductive film according to the present embodiment
- FIG. 2 is a schematic plan view of the conductive film according to the present embodiment
- FIG. 3 is a diagram of the conductive film shown in FIG. It is a partial enlarged view.
- FIG. 4 is a plan view of a sample when measuring an electric resistance value
- FIG. 5 is a diagram schematically showing a state of a folding test.
- 6 to 8 are diagrams schematically showing the manufacturing process of the conductive film according to this embodiment.
- a conductive film 10 shown in FIG. 1 includes a light-transmitting substrate 11, a plurality of light-transmitting conductive portions 12 provided on one surface 11A side of the light-transmitting substrate 11, and a light-transmitting group.
- the light transmissive non-conductive portion 13 provided on the one surface 11A side of the material 11 and located between the conductive portions 12, and the surfaces of the light transmissive substrate 11 on the conductive portion 12 and non-conductive portion 13 side are And a light-transmitting functional layer 14 provided on the other surface 11B side which is the opposite surface.
- the conductive film 10 only needs to include the light transmissive substrate 11, the conductive portion 12, and the nonconductive portion 13, and may not include the light transmissive functional layer 14.
- the light transmissive functional layer 14 is provided on the other surface 11B side, but the light transmissive functional layer is provided between the light transmissive base material 11, the conductive portion 12, and the non-conductive portion 13.
- the light-transmitting functional layer may be provided not only on the other surface 11B side of the light-transmitting substrate 11, but also between the conductive portion 12 and the non-conductive portion 13.
- the conductive portion 12 and the non-conductive portion 13 are provided only on one side, but the conductive portion may be provided on both sides of the conductive film.
- the surface 10 ⁇ / b> A of the conductive film 10 is composed of a surface 12 ⁇ / b> A of the conductive part 12 and a surface 13 ⁇ / b> A of the nonconductive part 13.
- the conductive film 10 preferably has a haze value (total haze value) of 5% or less. If the haze value of the conductive film 10 exceeds 5%, the optical performance may be insufficient.
- the haze value can be determined using a haze meter (product name “HM-150”, manufactured by Murakami Color Research Laboratory) in accordance with JIS K7136: 2000.
- the haze value is a value when measured for the entire conductive film, and after cutting out to a size of 50 mm ⁇ 100 mm, the conductive part side is the non-light source side without curling or wrinkling and without fingerprints or dust (This is not the case when conductive portions are formed on both surfaces), and the arithmetic average value of the values obtained by measuring three times for one conductive film is used. In this specification, “measuring three times” means not measuring the same place three times, but measuring three different places.
- the conductive film 10 has a flat surface 10A as viewed, flat layers such as the conductive portion 12, and a variation in film thickness within a range of ⁇ 10%.
- the average value of the haze value of the whole whole surface of an electroconductive film is obtained by measuring a haze value in three different places of the cut-out electroconductive film.
- the conductive film cannot be cut to the above size, for example, the HM-150 has an inlet opening for measurement of 20 mm ⁇ , so a sample having a diameter of 21 mm or more is required. For this reason, you may cut out an electroconductive film suitably for the magnitude
- the measurement points are set to three positions by gradually shifting within a range where the light source spot is not removed or changing the angle.
- the haze value of the conductive film 10 is preferable in the order of 3% or less, 2% or less, 1.5% or less, 1.2% or less, 1.1% or less (the smaller the value, the better).
- the variation in the obtained haze value is within ⁇ 10% regardless of whether the object to be measured is as long as 1 m ⁇ 3000 m or the size of a 5-inch smartphone. , Low haze and low resistance value are more easily obtained.
- the conductive film 10 preferably has a total light transmittance of 80% or more. If the total light transmittance of the conductive film is less than 80%, the optical performance may be insufficient.
- the total light transmittance can be determined using a haze meter (product name “HM-150”, manufactured by Murakami Color Research Laboratory) in accordance with JIS K7361-1: 1997.
- the total light transmittance is a value obtained by measuring the entire conductive film, and after cutting out to a size of 50 mm ⁇ 100 mm, the conductive part side is non-curled with no curls or wrinkles and no fingerprints or dust.
- the conductive film 10 has a flat surface 10A as viewed, flat layers such as the conductive portion 12, and a variation in film thickness within a range of ⁇ 10%. Therefore, it is considered that an average value of the total light transmittance of the entire surface of the conductive film can be obtained by measuring the total light transmittance at three different positions of the cut conductive film. If the conductive film cannot be cut to the above size, for example, the HM-150 has an inlet opening for measurement of 20 mm ⁇ , so a sample having a diameter of 21 mm or more is required.
- an electroconductive film suitably for the magnitude
- the measurement points are set to three positions by gradually shifting within a range where the light source spot is not removed or changing the angle.
- the total light transmittance of the conductive film 10 is more preferable in the order of 85% or more, 88% or more, and 89% or more (the larger the value, the more preferable).
- the variation in the total light transmittance obtained is within ⁇ 10% regardless of whether the object to be measured is as long as 1 m ⁇ 3000 m or the size of a 5-inch smartphone. It is easier to obtain a low haze and a low resistance value.
- the conductive film 10 preferably has flexibility. Specifically, even when the test (folding test) is repeated 20,000 times so that the distance between the opposing sides of the conductive film 10 is 6 mm with respect to the conductive film 10, folding is performed. It is preferable that the electrical resistance value ratio described later on the surface 12A of the conductive portion 12 of the conductive film 10 before and after the test is 3 or less. When the folding test is repeated 20,000 times on the conductive film, if the electrical resistance value ratio on the surface of the conductive part of the conductive film before and after the folding test exceeds 3, the conductive film is cracked. Therefore, the flexibility of the conductive film becomes insufficient. Here, when a crack or the like occurs in the conductive film by the folding test, the conductivity is lowered.
- the electrical resistance value on the surface of the conductive portion of the conductive film after the folding test is the conductive film before the folding test.
- the electrical resistance value on the surface of the conductive portion increases. For this reason, it can be judged whether a crack etc. have arisen in a conductive film by calculating
- the electrical resistance value ratio on the surface 12A of the conductive portion 12 of the conductive film 10 before and after the folding test is more preferably 1.5 or less.
- the folding test may be performed so that the conductive film 10 is folded so that the conductive portion 12 is inside, or may be performed so that the conductive film 10 is folded so that the conductive portion 12 is outside.
- the electrical resistance value ratio on the surface 12A of the conductive portion 12 of the conductive film 10 before and after the folding test is 3 or less.
- a sample S having a predetermined size (for example, a rectangular shape of 125 mm in length and 50 mm in width) is included from any portion of the conductive film 10 before the folding test so as to include the conductive portion 12. (See FIG. 4). If the sample cannot be cut out to a size of 125 mm ⁇ 50 mm, the sample may be cut out to a size of 110 mm ⁇ 50 mm, for example.
- the electrical resistance value of the surface 12A of the conductive portion 12 is measured in each sample S before the folding test. Specifically, as shown in FIG.
- silver A paste (product name “DW-520H-14”, manufactured by Toyobo Co., Ltd.) was applied, heated at 130 ° C. for 30 minutes, and cured silver paste 20 was provided on both ends of each sample. Is measured using a tester (product name “Digital M ⁇ Hitester 3454-11”, manufactured by Hioki Electric Co., Ltd.). The distance between the silver pastes 20 (distance where the silver paste 20 is not provided) is the measurement distance (for example, 100 mm) of the electrical resistance value in the sample S.
- the probe terminals of the tester When measuring the electrical resistance value, the probe terminals of the tester are brought into contact with the hardened silver paste 20 provided at both ends. In the sample S before the folding test, the electrical resistance value of the surface 12A of the conductive portion 12 is measured, and then the folding test is performed on the sample S.
- the folding test is performed as follows. As shown in FIG. 5A, in the folding test, first, the side S1 of the selected sample S and the side S2 opposite to the side S1 are respectively fixed by the fixing parts 25 arranged in parallel. To do. Further, as shown in FIG. 5A, the fixed portion 25 is slidable in the horizontal direction.
- the fixing portion 25 is moved so as to be close to each other, thereby deforming the central portion S3 of the sample S so as to be folded, and further as shown in FIG. 5 (C). Then, after moving the fixing portion 25 to a position where the distance between the two opposing side portions S1 and S2 fixed by the fixing portion 25 of the sample S is 6 mm, the fixing portion 25 is moved in the reverse direction to move the sample S Eliminates deformation.
- the sample S can be folded by 180 ° at the central portion S3 by moving the fixing portion 25.
- a folding test is performed so that the bent portion S4 of the sample S does not protrude from the lower end of the fixed portion 25, and the interval when the fixed portion 25 is closest is controlled to 6 mm, so that the sample S faces 2
- the distance between the two sides S1 and S2 can be 6 mm.
- the outer diameter of the bent portion S4 is regarded as 6 mm.
- the thickness of the sample S is a sufficiently small value as compared with the interval (6 mm) of the fixed portion 25, the result of the folding test of the sample S is not affected by the difference in the thickness of the sample S. be able to.
- the electrical resistance value of the surface of the conductive portion is measured in the same manner as the sample S before the folding test.
- the ratio of the electrical resistance value of the sample S after the folding test to the electrical resistance value of the sample S before the selected folding test (the electrical resistance value of the sample after the selected folding test / the electrical resistance of the sample before the folding test) Value).
- an electrical resistance value ratio be the arithmetic mean value of the value obtained by measuring 3 times.
- the use of the conductive film of the present invention including the conductive film 10 is not particularly limited, and for example, it may be used in various uses where a transparent conductive film is used.
- the conductive film of the present invention is not limited to image display devices (including smartphones, tablet terminals, wearable terminals, personal computers, televisions, digital signage, public information displays (PID), in-vehicle displays, etc.) related products, It may also be used for electric appliances and windows used in cars and cars (including all cars such as trains and vehicle construction machines).
- the conductive film of the present invention can be suitably used for portions where transparency is important.
- the electroconductive film of this invention can be used suitably not only for technical viewpoints, such as transparency, but the electrical appliance in which design property and design property are calculated
- Specific applications of the conductive film of the present invention include, for example, a defroster, an antenna, a solar cell, an audio system, a speaker, a fan, an electronic blackboard, and a semiconductor carrier film.
- the conductive film of the present invention may be cut into a desired size, but may be in a roll shape.
- the size of the conductive film is not particularly limited, and is appropriately determined according to the size of the display surface of the image display device.
- the size of the conductive film may be, for example, 5 inches or more and 500 inches or less.
- “inch” means the length of a diagonal line when the conductive film is square, means the diameter when it is circular, and short when it is elliptical. It shall mean the average value of the sum of diameter and major axis.
- the aspect ratio of the conductive film when obtaining the inch is not particularly limited as long as there is no problem as a display screen of the image display device.
- length: width 1: 1, 4: 3, 16:10, 16: 9, 2: 1, and the like.
- the aspect ratio is not particularly limited in in-vehicle applications and digital signage that are rich in design.
- the size of the conductive film 10 is large, the size of each measurement item is cut out from an arbitrary position into an easily manageable size such as A4 size (210 mm ⁇ 297 mm) or A5 size (148 mm ⁇ 210 mm). It shall be cut out.
- the light transmissive substrate 11 examples include a substrate made of a resin having light transmittance.
- a resin is not particularly limited as long as it has optical transparency.
- the resin constituting the light-transmitting base material has good foldability, so that the polyimide resin, the polyamideimide resin, the polyamide resin It is preferable to use a polyester resin or a mixture thereof. Among these, not only has excellent foldability, but also has excellent hardness and transparency, and also has excellent heat resistance, and imparts further excellent hardness and transparency by firing. In view of this, a polyimide resin, a polyamide resin, or a mixture thereof is preferable.
- polyolefin resins include polyethylene, polypropylene, and cyclic polyolefin substrates.
- examples of the cyclic polyolefin-based resin include those having a norbornene skeleton.
- polycarbonate-based resin examples include aromatic polycarbonates based on bisphenols (such as bisphenol A) and aliphatic polycarbonates such as diethylene glycol bisallyl carbonate.
- polyacrylate resin examples include poly (meth) acrylate methyl, poly (meth) ethyl acrylate, methyl (meth) acrylate-butyl (meth) acrylate, and the like.
- polyester-based resin examples include at least one of polyethylene terephthalate (PET), polypropylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate (PEN).
- PET polyethylene terephthalate
- PEN polyethylene naphthalate
- aromatic polyetherketone resin examples include polyetheretherketone (PEEK).
- acetyl cellulose-based resin examples include triacetyl cellulose (TAC) and diacetyl cellulose.
- TAC triacetyl cellulose
- diacetyl cellulose examples include triacetyl cellulose (TAC) and diacetyl cellulose.
- Triacetylcellulose is a resin that can have an average light transmittance of 50% or more in the visible light region of 380 to 780 nm.
- the average light transmittance of triacetyl cellulose is preferably 70% or more, and more preferably 85% or more.
- triacetyl cellulose in addition to pure triacetyl cellulose, cellulose acetate propionate and cellulose acetate butyrate may be used in combination with components other than acetic acid as a fatty acid forming an ester with cellulose. Further, these triacetyl cellulose resins may be added with other cellulose lower fatty acid esters such as diacetyl cellulose, or various additives such as plasticizers, ultraviolet absorbers, and lubricants as necessary.
- the polyimide resin is obtained by reacting a tetracarboxylic acid component and a diamine component.
- a tetracarboxylic acid component and a diamine component.
- polyimide-type resin selects from the group which consists of a structure represented by following General formula (1) and following General formula (3) from the point which has the outstanding light transmittance and the outstanding rigidity. It is preferable to have at least one kind of structure.
- R 1 is a tetravalent group which is a tetracarboxylic acid residue
- R 2 is a trans-cyclohexanediamine residue, a trans-1,4-bismethylenecyclohexanediamine residue
- 4,4 It represents at least one divalent group selected from the group consisting of a '-diaminodiphenylsulfone residue, a 3,4'-diaminodiphenylsulfone residue, and a divalent group represented by the following general formula (2).
- n represents the number of repeating units and is 1 or more.
- tetracarboxylic acid residue means a residue obtained by removing four carboxyl groups from tetracarboxylic acid, and a residue obtained by removing an acid dianhydride structure from tetracarboxylic dianhydride; Represents the same structure.
- diamine residue refers to a residue obtained by removing two amino groups from a diamine.
- R 3 and R 4 each independently represent a hydrogen atom, an alkyl group, or a perfluoroalkyl group.
- R 5 represents a cyclohexanetetracarboxylic acid residue, a cyclopentanetetracarboxylic acid residue, a dicyclohexane-3,4,3 ′, 4′-tetracarboxylic acid residue, and 4,4 ′.
- At least one tetravalent group selected from the group consisting of-(hexafluoroisopropylidene) diphthalic acid residues R 6 represents a divalent group that is a diamine residue.
- n ′ represents the number of repeating units and is 1 or more.
- R 1 is a tetracarboxylic acid residue, and can be a residue obtained by removing the acid dianhydride structure from the tetracarboxylic dianhydride as exemplified above.
- R 1 in the general formula (1) is, among others, 4,4 ′-(hexafluoroisopropylidene) diphthalic acid residue, 3,3 ′, from the viewpoint of improving light transmittance and improving rigidity.
- these suitable residues are preferably contained in a total amount of 50 mol% or more, more preferably 70 mol% or more, and still more preferably 90 mol% or more.
- R 1 is selected from the group consisting of 3,3 ′, 4,4′-biphenyltetracarboxylic acid residue, 3,3 ′, 4,4′-benzophenonetetracarboxylic acid residue, and pyromellitic acid residue.
- a group of tetracarboxylic acid residues (group A) suitable for improving rigidity such as at least one selected from 4,4 ′-(hexafluoroisopropylidene) diphthalic acid residues, 2,3 ′ , 3,4′-biphenyltetracarboxylic acid residue, 3,3 ′, 4,4′-diphenylsulfonetetracarboxylic acid residue, 4,4′-oxydiphthalic acid residue, cyclohexanetetracarboxylic acid residue, and cyclohexane
- group B suitable for improving transparency, such as at least one selected from the group consisting of pentanetetracarboxylic acid residues.
- the content ratio of the tetracarboxylic acid residue group (group A) suitable for improving the rigidity and the tetracarboxylic acid residue group (group B) suitable for improving transparency is, 0.05 mol of the tetracarboxylic acid residue group (group A) suitable for improving the rigidity is 1 mol per 1 mol of the tetracarboxylic acid residue group (group B) suitable for improving the transparency. It is preferably 9 mol or less, more preferably 0.1 mol or more and 5 mol or less, still more preferably 0.3 mol or more and 4 mol or less.
- R 2 in the general formula (1) is, among others, 4,4′-diaminodiphenylsulfone residue, 3,4′-diaminodiphenylsulfone residue from the viewpoint of improving light transmittance and improving rigidity.
- at least one divalent group selected from the group consisting of a divalent group represented by the general formula (2) and is preferably a 4,4′-diaminodiphenylsulfone residue, 3 , 4′-diaminodiphenylsulfone residue, and at least one divalent group selected from the group consisting of a divalent group represented by the general formula (2) wherein R 3 and R 4 are perfluoroalkyl groups
- the group is preferably.
- R 5 in the general formula (3) is, among others, 4,4 ′-(hexafluoroisopropylidene) diphthalic acid residue, 3,3 ′, from the viewpoint of improving light transmittance and improving rigidity. It preferably contains a 4,4′-diphenylsulfone tetracarboxylic acid residue and an oxydiphthalic acid residue.
- these suitable residues are preferably contained in an amount of 50 mol% or more, more preferably 70 mol% or more, and even more preferably 90 mol% or more.
- R 6 in the general formula (3) is a diamine residue, and can be a residue obtained by removing two amino groups from the diamine as exemplified above.
- R6 in the general formula (3) is, among others, a 2,2′-bis (trifluoromethyl) benzidine residue, bis [4- (4- Aminophenoxy) phenyl] sulfone residue, 4,4′-diaminodiphenylsulfone residue, 2,2-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane residue, bis [4- (3-amino Phenoxy) phenyl] sulfone residue, 4,4′-diamino-2,2′-bis (trifluoromethyl) diphenyl ether residue, 1,4-bis [4-amino-2- (trifluoromethyl) phenoxy] benzene Residue, 2,2-bis [4- (4-amino-2-trifluoromethylphenoxy)
- these suitable residues are preferably contained in a total amount of 50 mol% or more, more preferably 70 mol% or more, and still more preferably 90 mol% or more.
- R 6 is a bis [4- (4-aminophenoxy) phenyl] sulfone residue, 4,4′-diaminobenzanilide residue, N, N′-bis (4-aminophenyl) terephthalamide residue, A group of diamine residues suitable for improving the rigidity such as at least one selected from the group consisting of a paraphenylenediamine residue, a metaphenylenediamine residue, and a 4,4′-diaminodiphenylmethane residue (group) C), 2,2′-bis (trifluoromethyl) benzidine residue, 4,4′-diaminodiphenylsulfone residue, 2,2-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane residue Group, bis [4- (3-aminophenoxy) phenyl] sulfone residue, 4,4′-diamino-2,2′-bis (trifluoromethyl) diphen
- the content ratio of the diamine residue group (group C) suitable for improving the rigidity and the diamine residue group (group D) suitable for improving transparency improves transparency.
- the diamine residue group (group C) suitable for improving the rigidity is 0.05 mol or more and 9 mol or less with respect to 1 mol of the diamine residue group (group D) suitable for the treatment. More preferably, it is preferably 0.1 mol or more and 5 mol or less, and more preferably 0.3 mol or more and 4 mol or less.
- the number of repeating units n in the polyimide is not particularly limited as long as it is appropriately selected depending on the structure so as to exhibit a preferable glass transition temperature described later.
- the average number of repeating units is usually 10 to 2000, and more preferably 15 to 1000.
- the polyimide resin may contain a polyamide structure in a part thereof.
- the polyamide structure examples include a polyamideimide structure containing a tricarboxylic acid residue such as trimellitic anhydride and a polyamide structure containing a dicarboxylic acid residue such as terephthalic acid.
- the polyimide resin preferably has a glass transition temperature of 250 ° C. or higher, and more preferably 270 ° C. or higher, from the viewpoint of heat resistance.
- the glass transition temperature is preferably 400 ° C. or lower, and more preferably 380 ° C. or lower, from the viewpoint of easy stretching and reduction of the baking temperature.
- Polyamide resin is a concept including not only aliphatic polyamide but also aromatic polyamide (aramid).
- the weight average molecular weight of the polyimide resin or polyamide resin is preferably in the range of 3,000 to 500,000, more preferably in the range of 5,000 to 300,000, and in the range of 10,000 to 200,000. Is more preferable. When the weight average molecular weight is less than 3000, sufficient strength may not be obtained. When the weight average molecular weight exceeds 500,000, the viscosity increases and the solubility decreases, so that a substrate having a smooth surface and a uniform film thickness can be obtained. It may not be obtained.
- the “weight average molecular weight” in the present specification is a value obtained by dissolving in a solvent such as tetrahydrofuran (THF) and converting to polystyrene by a conventionally known gel permeation chromatography (GPC) method.
- a solvent such as tetrahydrofuran (THF)
- GPC gel permeation chromatography
- a polyimide resin or polyamide resin having a structure in which charge transfer within a molecule or between molecules is unlikely to occur is preferable because it has excellent transparency.
- a polyimide resin having a cycloaliphatic structure, a polyimide resin having an alicyclic structure, and a polyamide resin having a halogen group is preferable because it has excellent transparency.
- the fluorinated polyimide resin since the fluorinated polyimide resin has a fluorinated structure, it has high heat resistance and is not colored by heat during the production of a base material made of polyimide resin. It has transparency.
- the substrate made of polyimide resin and the substrate made of polyamide resin may be used for the substrate made of polyimide resin and the substrate made of polyamide resin.
- Examples of the commercially available base material made of polyimide resin include Neoprim manufactured by Mitsubishi Gas Chemical Co., Ltd., and examples of the commercially available base material made of polyamide resin include Mikutron manufactured by Toray Industries, Inc. It is done.
- the thickness of the light-transmitting substrate 11 is not particularly limited, but can be 3 ⁇ m or more and 500 ⁇ m or less.
- the lower limit of the thickness of the light-transmitting substrate 11 is 10 ⁇ m or more and 20 ⁇ m or more from the viewpoint of handling properties. It is preferable in order (the higher the numerical value, the better).
- the upper limit of the thickness of the light transmissive substrate 11 is preferably 250 ⁇ m or less, 100 ⁇ m or less, 80 ⁇ m or less, 60 ⁇ m or less, or 40 ⁇ m or less in order from the viewpoint of thinning (the smaller the value, the better).
- the thickness of the light-transmitting substrate can be measured by a method similar to the method for measuring the thickness of the conductive portion described later.
- the surface of the light transmissive substrate 11 may be subjected to physical treatment such as corona discharge treatment or oxidation treatment to improve adhesion.
- the light-transmitting substrate 11 is applied on at least one surface side in order to improve adhesion to other layers, to prevent sticking during winding, and / or to form other layers.
- You may have a base layer for suppressing the repelling of a liquid.
- the base layer that is present on at least one surface side of the light-transmitting substrate and is in contact with the light-transmitting substrate is a part of the light-transmitting substrate, and is light-transmitting. It is not included in the sexual function layer.
- the underlayer includes, for example, an anchor agent and a primer agent.
- the anchor agent and primer agent include polyurethane resin, polyester resin, polyvinyl chloride resin, polyvinyl acetate resin, vinyl chloride-vinyl acetate copolymer, acrylic resin, polyvinyl alcohol resin, polyvinyl acetal resin, ethylene A copolymer of ethylene and vinyl acetate or acrylic acid, a copolymer of ethylene and styrene and / or butadiene, a thermoplastic resin such as an olefin resin and / or a modified resin thereof, a polymer of an ionizing radiation polymerizable compound, And / or a polymer of a thermopolymerizable compound can be used.
- the undercoat layer may contain particles such as a lubricant to prevent sticking during winding.
- the particles include silica particles.
- the light transmissive functional layer 14 is disposed on the other surface 11 ⁇ / b> B side of the light transmissive substrate 11.
- the “light-transmitting functional layer” in the present specification is a layer having a light-transmitting property and intended to exhibit some function in the conductive film.
- examples of the light-transmitting functional layer include a layer for exhibiting a hard coat function, a refractive index adjusting function, an elution suppressing function, and / or a color adjusting function.
- the light transmissive functional layer may be not only a single layer but also a laminate of two or more layers. When two or more light-transmitting functional layers are laminated, the functions of each layer may be the same or different. In the present embodiment, a case where the light transmissive functional layer 14 is a layer that exhibits a hard coat function, that is, a hard coat layer will be described.
- the light transmissive functional layer 14 functions as a hard coat layer as described above, the light transmissive functional layer 14 is subjected to a pencil hardness test (4.9 N load) defined by JIS K5600-5-4: 1999.
- the layer has a hardness of “H” or higher.
- the pencil hardness By setting the pencil hardness to “H” or higher, the conductive film 10 becomes harder and durability can be improved.
- the upper limit of the pencil hardness on the surface of the light transmissive functional layer 14 is preferably about 4H.
- the film thickness of the light transmissive functional layer 14 is preferably 0.5 ⁇ m or more and 15 ⁇ m or less. If the film thickness of the light-transmitting functional layer 14 is within this range, a desired hardness can be obtained.
- the film thickness of the light-transmitting functional layer can be measured by the same method as the method for measuring the film thickness of the conductive part described later.
- the lower limit of the film thickness of the light-transmitting functional layer 14 is more preferable in the order of 1 ⁇ m or more, 1.5 ⁇ m or more, and 2 ⁇ m or more from the viewpoint of suppressing the occurrence of curling (the larger the value, the more preferable).
- the upper limit of the film thickness of the light-transmitting functional layer 14 is more preferable in the order of 12 ⁇ m or less, 10 ⁇ m or less, 7 ⁇ m or less, and 5 ⁇ m or less from the viewpoint of suppressing cracking of the light-transmitting functional layer (the smaller the value, the more preferable).
- the thickness of the light transmissive functional layer 14 is more preferably not less than 0.5 ⁇ m and not more than 10 ⁇ m from the viewpoint of suppressing curling while reducing the thickness of the light transmissive functional layer.
- the film thickness of the light-transmitting functional layer 14 is preferably in the above range, but the light-transmitting functional layer is an oligomer from a light-transmitting substrate.
- the thickness of the light-transmitting functional layer is preferably 10 nm or more and 400 nm or less, and more preferably 50 nm or more and 150 nm or less.
- the light transmissive functional layer 14 can be composed of at least a light transmissive resin.
- the light transmissive functional layer 14 may contain inorganic particles, organic particles, and a leveling agent in addition to the resin.
- Examples of the light transmissive resin in the light transmissive functional layer 14 include those containing a polymer of a polymerizable compound (cured product, cross-linked product).
- the light transmissive resin may contain a solvent dry resin in addition to the polymer of the polymerizable compound.
- Examples of the polymerizable compound include an ionizing radiation polymerizable compound and / or a thermally polymerizable compound.
- the ionizing radiation polymerizable compound is a compound having at least one ionizing radiation polymerizable functional group in one molecule.
- the “ionizing radiation polymerizable functional group” in the present specification is a functional group capable of undergoing a polymerization reaction upon irradiation with ionizing radiation.
- Examples of the ionizing radiation polymerizable functional group include ethylenically unsaturated groups such as a (meth) acryloyl group, a vinyl group, and an allyl group.
- the “(meth) acryloyl group” means to include both “acryloyl group” and “methacryloyl group”.
- Examples of the ionizing radiation irradiated when polymerizing the ionizing radiation polymerizable compound include visible light, ultraviolet rays, X-rays, electron beams, ⁇ rays, ⁇ rays, and ⁇ rays.
- the ionizing radiation polymerizable compound examples include an ionizing radiation polymerizable monomer, an ionizing radiation polymerizable oligomer, and an ionizing radiation polymerizable prepolymer, which can be appropriately adjusted and used.
- the ionizing radiation polymerizable compound a combination of an ionizing radiation polymerizable monomer and an ionizing radiation polymerizable oligomer or an ionizing radiation polymerizable prepolymer is preferable.
- Examples of the ionizing radiation polymerizable monomer include monomers containing a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, and ethylene glycol di (meth) acrylate.
- a polyfunctional oligomer having two or more functional groups is preferable, and a polyfunctional oligomer having three (trifunctional) or more ionizing radiation polymerizable functional groups is preferable.
- the polyfunctional oligomer include polyester (meth) acrylate, urethane (meth) acrylate, polyester-urethane (meth) acrylate, polyether (meth) acrylate, polyol (meth) acrylate, melamine (meth) acrylate, and isocyanurate. (Meth) acrylate, epoxy (meth) acrylate, etc. are mentioned.
- the ionizing radiation polymerizable prepolymer may have a weight average molecular weight of 10,000, for example.
- the weight average molecular weight of the ionizing radiation polymerizable prepolymer is preferably from 10,000 to 80,000, and more preferably from 10,000 to 40,000. When the weight average molecular weight exceeds 80,000, the viscosity is high, so that the coating suitability is lowered, and the appearance of the obtained light-transmitting functional layer may be deteriorated.
- the polyfunctional prepolymer include urethane (meth) acrylate, isocyanurate (meth) acrylate, polyester-urethane (meth) acrylate, and epoxy (meth) acrylate.
- thermopolymerizable compound has at least one thermopolymerizable functional group in one molecule.
- the “thermally polymerizable functional group” in the present specification is a functional group capable of undergoing a polymerization reaction between the same functional groups or other functional groups by heating. Examples of the thermally polymerizable functional group include a hydroxyl group, a carboxyl group, an isocyanate group, an amino group, a cyclic ether group, and a mercapto group.
- thermopolymerizable compound is not particularly limited, and examples thereof include an epoxy compound, a polyol compound, an isocyanate compound, a melamine compound, a urea compound, and a phenol compound.
- the solvent-drying resin is a resin that forms a film only by drying a solvent added to adjust the solid content during coating, such as a thermoplastic resin.
- a solvent added to adjust the solid content during coating such as a thermoplastic resin.
- the solvent-drying type resin is added, film defects on the coating surface of the coating liquid can be effectively prevented when the light transmissive functional layer 14 is formed. It does not specifically limit as solvent dry type resin, Generally, a thermoplastic resin can be used.
- thermoplastic resins examples include styrene resins, (meth) acrylic resins, vinyl acetate resins, vinyl ether resins, halogen-containing resins, alicyclic olefin resins, polycarbonate resins, polyester resins, polyamide resins. , Cellulose derivatives, silicone resins and rubbers or elastomers.
- the thermoplastic resin is preferably amorphous and soluble in an organic solvent (particularly a common solvent capable of dissolving a plurality of polymers and curable compounds).
- an organic solvent particularly a common solvent capable of dissolving a plurality of polymers and curable compounds.
- styrene resins from the viewpoint of transparency and weather resistance, styrene resins, (meth) acrylic resins, alicyclic olefin resins, polyester resins, cellulose derivatives (cellulose esters, etc.) and the like are preferable.
- the inorganic particles are components for improving the mechanical strength and pencil strength of the light-transmitting functional layer 14, and examples of the inorganic particles include silica (SiO 2 ) particles, alumina particles, titania particles, tin oxide particles, Inorganic oxide particles such as antimony-doped tin oxide (abbreviation: ATO) particles and zinc oxide particles can be given.
- silica particles are preferable from the viewpoint of further increasing the hardness.
- examples of the silica particles include spherical silica particles and irregular silica particles. Among these, irregular silica particles are preferable.
- spherical particles mean, for example, particles such as true spheres and ellipsoids
- regular particles mean particles having potato-like random irregularities on the surface. Since the irregular shaped particles have a surface area larger than that of the spherical particles, the inclusion of such irregular shaped particles increases the contact area with the polymerizable compound and the like, and the pencil hardness of the light-transmitting functional layer 14 Can be made more excellent. Whether the silica particles contained in the light-transmitting functional layer 14 are irregular-shaped silica particles is determined by observing the cross section of the light-transmitting functional layer 14 with a transmission electron microscope (TEM) or a scanning transmission electron microscope (STEM). This can be confirmed by observation.
- TEM transmission electron microscope
- STEM scanning transmission electron microscope
- the deformed silica particles can achieve the same hardness as that of spherical silica particles, even if they are not as small as the commercially available spherical silica particles having the smallest particle diameter.
- the average primary particle diameter of the irregular shaped silica particles is preferably 1 nm or more and 100 nm or less. Even if the average primary particle diameter of the irregular shaped silica particles is within this range, the hardness equivalent to that of spherical silica having an average primary particle diameter of 1 nm or more and 45 nm or less can be achieved.
- the average primary particle diameter of the irregular-shaped silica particles is determined from the image of the cross section of the light transmissive functional layer obtained by photographing the cross section of the light transmissive functional layer using a transmission electron microscope (TEM) or a scanning transmission electron microscope (STEM).
- the maximum value (major axis) and the minimum value (minor axis) of the distance between two points on the outer circumference of the particle are measured and averaged to obtain the particle diameter, which is the arithmetic average value of the particle diameters of 20 particles.
- the average particle diameter of the spherical silica particles is determined by measuring the particle diameters of 20 particles from a cross-sectional image of the particles taken using a transmission electron microscope (TEM) or a scanning transmission electron microscope (STEM). The arithmetic average value of the particle diameter of each particle is used.
- the content of inorganic particles in the light transmissive functional layer 14 is preferably 20% by mass or more and 70% by mass or less.
- the content of the inorganic particles is less than 20% by mass, it becomes difficult to ensure sufficient hardness, and when the content of the inorganic particles exceeds 70% by mass, the filling rate increases too much, and the inorganic particles Adhesiveness with the resin component is deteriorated, and rather the hardness of the light-transmitting functional layer is lowered.
- inorganic particles it is preferable to use inorganic particles (reactive inorganic particles) having ionizing radiation polymerizable functional groups on the surface.
- inorganic particles having an ionizing radiation polymerizable functional group on the surface can be prepared by surface-treating the inorganic particles with a silane coupling agent or the like.
- a method of treating the surface of the inorganic particles with a silane coupling agent a dry method in which the silane coupling agent is sprayed on the inorganic particles, or a wet method in which the inorganic particles are dispersed in a solvent and then the silane coupling agent is added and reacted. Etc.
- the organic particles are also components for improving the mechanical strength and pencil strength of the light-transmitting functional layer 14, and examples of the organic particles include plastic beads.
- specific examples of the plastic beads include polystyrene beads, melamine resin beads, acrylic beads, acrylic-styrene beads, silicone beads, benzoguanamine beads, benzoguanamine / formaldehyde condensation beads, polycarbonate beads, polyethylene beads, and the like.
- the conductive part 12 includes a light transmissive resin 15 and conductive fibers 16 disposed in the light transmissive resin 15.
- the “conductive portion” in this specification means a layer containing conductive fibers when a cross section is observed using a scanning transmission electron microscope (STEM) or a transmission electron microscope (TEM).
- STEM scanning transmission electron microscope
- TEM transmission electron microscope
- a pretreatment generally used in electron microscope observation such as forming a metal layer such as Pt—Pd or Au on the surface of the conductive part by sputtering is preferably performed.
- conductive part means a part that includes a light-transmitting resin and conductive fibers arranged in the light-transmitting resin and that can conduct from the surface. It is a concept that includes
- the “conductive fiber” in the present specification has conductivity and has a shape that is sufficiently longer than the thickness (for example, diameter), for example, the length is generally thick. The thing of 5 times or more shall be contained in a conductive fiber.
- the light transmissive resin 15 of the conductive portion 12 may be connected to the light transmissive resin 15 of the non-conductive portion 13.
- the conductive portion 12 preferably further includes a reaction inhibitor present in the light transmissive resin 15.
- the conductive portion 12 can be electrically connected from the surface 12A of the conductive portion 12. Whether or not the conductive part is electrically conductive from the surface of the conductive part can be determined by measuring the surface resistance value of the conductive part. Since the method for measuring the surface resistance value of the conductive portion will be described later, the description thereof will be omitted here. If the arithmetic average value of the surface resistance value of the conductive portion is less than 1 ⁇ 10 6 ⁇ / ⁇ , it can be determined that electrical conduction is obtained from the surface of the conductive portion.
- the conductive fibers 16 are present on the light transmissive substrate 11 side from the position HL that is half the film thickness of the conductive portion 12, but the other conductive fibers 16 are light transmissive.
- the conductive portion 12 can be electrically conducted from the surface 12A.
- the conductive fibers 16 are unevenly distributed on the light transmissive substrate 11 side from the position HL which is half the film thickness of the conductive part 12 (light transmissive resin 15). Is preferred. Whether or not the conductive fibers 16 are unevenly distributed on the light transmissive substrate 11 side from the position HL that is half the film thickness of the conductive portion 12 can be determined as follows. First, a sample for cross-sectional observation is prepared from a conductive film. Specifically, the conductive film cut out to 2 mm ⁇ 5 mm is put into a silicone-based embedding plate, an epoxy resin is poured, and the entire conductive film is embedded with the resin. Thereafter, the embedding resin is left at 65 ° C.
- the delivery thickness is set to 100 nm, and an ultrathin section is prepared.
- the prepared ultrathin section is collected with a mesh (150) with a collodion membrane and used as a sample for STEM. Note that it is difficult to see an observation image by STEM unless conduction is obtained in this sample. Therefore, it is preferable to sputter Pt—Pd for about 20 seconds. Sputtering time can be adjusted as appropriate, but care must be taken because the sputtered metal becomes a particle-like foreign substance image because it is short in 10 seconds and too long in 100 seconds.
- STEM scanning transmission electron microscope
- S-4800 product name “S-4800 (TYPE 2)”, manufactured by Hitachi High-Technologies Corporation
- a cross-sectional photograph of the conductive portion of the STEM sample is taken.
- the detector selection signal
- acceleration voltage set to 30 kV
- emission set to “10 ⁇ A”
- the contrast and brightness are adjusted as appropriate so that each layer can be distinguished.
- a preferred magnification is 10,000 to 100,000 times, a more preferred magnification is 10,000 to 50,000 times, and a most preferred magnification is 25,000 to 50,000 times.
- the aperture is set to the beam monitor aperture 3 and the objective lens aperture is set to 3. D. May be 8 mm. Then, the ten cross-sectional photographs taken in this way are prepared. After taking a cross-sectional photograph of the conductive part, the position of half the film thickness of the conductive part is obtained in each cross-sectional photograph. And it is judged whether the electroconductive fiber which has appeared in the cross-sectional photograph exists in the light transmissive base material side rather than this half position. Specifically, first, in the cross-sectional photograph of the conductive part in the electron microscope, the conductive fiber appears darker (for example, black) than the light-transmitting resin. Fibers can be confirmed.
- pixels appear. Since the pixels have the same size and are in the form of a grid (lattice shape), in each cross-sectional photograph, the pixels in which the conductive fibers positioned on the light-transmitting substrate side from the half position are displayed. Count the number of pixels displaying conductive fibers located on the surface side of the conductive part from the number and the half position, and light transmittance from the half position with respect to the total number of pixels displaying conductive fibers The ratio of the number of pixels on which conductive fibers located on the substrate side are displayed is obtained.
- the pixel on which the conductive fiber is displayed straddles the half position
- the portion existing on the light-transmitting substrate side from the half position, and this position To a portion existing on the surface side of the conductive portion, and one pixel is divided based on the area ratio of the divided portion.
- required from this cross-sectional photograph is made into the presence rate of the electroconductive fiber located in the light transmissive base material side from the position of the film thickness of a conductive part, and the case where this presence rate is 55% or more. Then, it is determined that the conductive fibers are unevenly distributed on the light-transmitting base material side from the half of the film thickness of the conductive part.
- This abundance ratio is the arithmetic average value of the abundance ratios obtained from each cross-sectional photograph.
- the conductive fibers are uniformly present in the conductive part. Therefore, even if the ratio of the conductive fibers is obtained using a cross-sectional photograph of a part of the conductive part, It is thought that it represents the abundance ratio of conductive fibers in the entire part.
- the ratio of the conductive fibers located on the light-transmitting substrate side from the half of the film thickness of the conductive part determined from the cross-sectional photograph is more preferably 70% or more, and further preferably 80% or more.
- Whether or not the conductive fibers 16 are unevenly distributed on the light transmissive substrate 11 side from the position HL that is half the film thickness of the conductive portion 12 can also be determined as follows. First, a first sample in which a metal layer such as Pt—Pd, Pt, or Au is formed on the surface of the conductive portion of the conductive film by sputtering, and a second sample in which the metal layer is not formed on the surface of the conductive film. Prepare a sample. And the film thickness of the electroconductive part 12 is measured with the measuring method mentioned later using a 1st sample.
- a metal layer such as Pt—Pd, Pt, or Au
- a cross-sectional photograph of the conductive portion is taken by the above-described method, and the cross-sectional photograph data is obtained by image analysis / measurement software (product name “WinROOF Version7.4”, manufactured by Mitani Corporation). Read and binarize. STEM observation provides contrast due to the difference in electron beam transmission, so high-density metal is difficult to transmit electron beam, so black color, and organic material with lower density than metal is white color. A white to gray portion that is not a black portion can be determined as a light-transmitting resin.
- the proportion of the black portion in the light-transmitting substrate side region from the half position of the conductive portion film thickness is higher than the proportion of the black portion in the conductive portion surface side region from the half position
- the black portion can be extracted based on the luminance.
- the area can be measured only by automatic area measurement since the contrast between the metal and the organic material is clearly different.
- the area measurement by the above binarization process is performed according to the following procedure. First, an image of a cross-sectional photograph is read with the above software and called into the image window of the software. Then, in the image window, a region ROI (processing range) to be image processed is selected from half to below and above the film thickness, respectively, and binarized to calculate the total area of the conductive fiber portion. .
- the processing range is set by selecting a rectangular ROI button to be drawn from the image toolbar and setting a rectangular ROI in the image window.
- the measurement value is output in units of pixels, but the measurement value can be converted into an actual length by calibration and output.
- the ROI region can be calibrated using the scale display. Specifically, from the image toolbar, use the line ROI button, draw a line for the length of the STEM image scale, display the calibration dialog, check the set line, and correspond to the scale of the STEM image Set the length and unit.
- the region of the conductive fiber to be measured is separated from the other regions. Specifically, binarization with two threshold values is selected from the binarization processing menu.
- the two density (brightness) threshold values are appropriately input (for example, 0 and 80), and the two threshold values are 2 Execute value processing. If the conductive fibers in the actual STEM image do not match the conductive fibers in the binarized image that is displayed in two colors (e.g., the conductive fibers turn green) by the threshold, the threshold value Is appropriately changed and corrected until it is closest to the STEM image. For example, the difference between the STEM image and the binarized image is corrected as appropriate by selecting filling or deleting from the binarization menu.
- the hole filling and deletion can be performed by filling an extraction region with an area threshold setting or can be deleted. Clicking on the part you want to delete will give you a threshold to delete it.
- the STEM image and the binarized image are corrected and matched as much as possible in items in the binarized menu as necessary. It is also possible to manually delete unnecessary portions of the binarized image using the eraser tool button. It is also possible to manually paint the window and correct the color using the pen tool button. When this operation is completed, the shape feature of the measurement menu is selected, and the area of the item to be measured is selected.
- the area for each conductive fiber is measured, and the total value can also be measured.
- the total area below and above the half of the conductive layer film thickness are measured, respectively, and the area of the lower region ROI and the upper region ROI are manually measured from half the film thickness. , Calculate the percentage.
- Manual measurement is enabled by selecting line length measurement from manual measurement and selecting all measurement items for line length from the measurement menu. By using the tools in the line length tool palette as appropriate and dragging the start point and end point with the mouse, the line can be measured and the ROI area can be calculated.
- the said work content shall follow a WinROOF
- the resistance value (surface resistance value) on the surface 12A of the conductive portion 12 is preferably 1000 ⁇ / ⁇ or less.
- the surface resistance value on the surface 12A of the conductive portion 12 exceeds 1000 ⁇ / ⁇ , there is a possibility that problems such as a slow response speed may occur particularly in touch panel applications.
- the surface resistance value is a contact-type resistivity meter (product name “Loresta AX MCP-T370”) according to JIS K7194: 1994 (Resistivity test method using conductive plastic 4-probe method), Mitsubishi Chemical Analytech Manufactured, terminal shape: ASP probe) and non-destructive (eddy current method) resistivity meter (product name "EC-80P", manufactured by Napson, ⁇ URL: https: //www.napson.co.jp/wp /wp-content/uploads/2017/08/Napson_EC80P_Leaflet_160614.pdf>), but it can be measured accurately regardless of the film thickness of the conductive part. It is preferable to measure using a resistivity meter.
- the probe of the nondestructive resistivity meter can be measured simply by touching the sample, and can be measured at any place without damaging the sample. In that sense, it may be called a non-contact type. Measurement of the surface resistance value of the conductive part with a non-destructive resistivity meter is performed by placing a conductive film cut into a size of 80 mm ⁇ 50 mm on a flat glass plate so that the conductive part side is the upper surface. Is performed in contact with the conductive part. When measuring the surface resistance value using EC-80P, SW2 is selected and the sheet resistance measurement ⁇ / ⁇ of mode MH is selected. In addition, the probe type can be easily changed depending on the measurement range.
- a probe with a measurement range of 10 to 1000 ⁇ / ⁇ and a probe with a range of 0.5 to 10 ⁇ / ⁇ are used.
- EC-80P-PN manufactured by Napson
- P may be selected as P / N.
- the measurement of the surface resistance value of the conductive portion by a contact type resistivity meter is performed by placing a conductive film cut out in a size of 80 mm ⁇ 50 mm on a flat glass plate so that the conductive portion side is the upper surface, The ASP probe is arranged at the center of the conductive portion, and all electrode pins are pressed uniformly against the conductive portion.
- ⁇ / ⁇ which is a mode for measuring sheet resistance
- the measurement result is displayed.
- the surface resistance value is measured under an environment of 23 ° C. and 55% relative humidity regardless of the type of resistivity meter.
- a conductive film is placed on a horizontal desk and measured in a uniform flat state, but the conductive film curls. If the equiplanar state cannot be maintained, the conductive film is attached to the glass plate with a tape or the like.
- the measurement locations are three locations in the center of the conductive film, and the surface resistance value is the arithmetic average value of the three surface resistance values.
- the measurement points are one point, five points, or nine points.
- the conductive film was actually cut out to a size of 80 mm ⁇ 50 mm, and FIG. 5 of JIS K7194: 1994. If measured as follows, the measured value may become unstable. For this reason, unlike JIS K7194: 1994, the measurement points shall be measured at three central portions of the conductive portion. For example, JIS K7194: 1994 No. 1 position in FIG. 5, a position between No. 1 and No. 7 (preferably a position close to No. 1), and a position between No. 1 and No.
- the lower limit of the surface resistance value of the conductive film 10 is preferably 1 ⁇ / ⁇ or more, 5 ⁇ / ⁇ or more, and 10 ⁇ / ⁇ or more in order (higher values are preferable), and the upper limit of the surface resistance value of the conductive film 10 is More preferable in the order of 200 ⁇ / ⁇ or less, 100 ⁇ / ⁇ or less, 70 ⁇ / ⁇ or less, 60 ⁇ / ⁇ or less, and 50 ⁇ / ⁇ or less (the smaller the value, the better).
- the film thickness of the conductive part 12 is preferably less than 300 nm. If the film thickness of the conductive part is 300 nm or more, the film thickness of the light transmissive resin is too thick, so that all the conductive fibers are buried in the light transmissive resin. There is a possibility that the conductive fiber is not exposed on the surface of the conductive part and electrical conduction cannot be obtained from the surface of the conductive part. As the thickness of the conductive portion increases, the number of overlapping portions of the conductive fibers increases, so that a low surface resistance value of 1 ⁇ / ⁇ or more and 10 ⁇ / ⁇ or less can be achieved. If they overlap too much, it may be difficult to maintain a low haze value.
- the film thickness is preferably 300 nm or less.
- the conductive portion is preferably a thin film from the viewpoint of optical characteristics and thinning.
- the upper limit of the film thickness of the conductive portion 12 is more preferable in the order of 145 nm, 140 nm or less, 120 nm or less, 110 nm or less, 80 nm or less, 50 nm or less from the viewpoint of achieving thinness and obtaining good optical characteristics such as a low haze value ( Smaller values are preferable).
- the minimum of the film thickness of the electroconductive part 12 is 10 nm or more.
- the film thickness of the conductive part is less than 10 nm, the film thickness of the light transmissive resin 15 is too thin, so that the conductive fibers are detached from the conductive part, the durability of the conductive part is deteriorated, There is a risk that the scratch resistance may be lowered.
- the diameter of the conductive fibers is large to some extent. It is considered that the diameter of the fiber that can stably maintain the shape of the conductive fiber is 10 nm or more or 15 nm or more.
- the lower limit of the film thickness of the conductive portion 12 is 20 nm or more or 30 nm or more. Is more preferable.
- the film thickness of the conductive part 12 was measured by measuring the thickness at 10 locations randomly from a cross-sectional photograph of the conductive part taken using a scanning transmission electron microscope (STEM) or a transmission electron microscope (TEM). It is set as the arithmetic average value of the thickness of a location.
- STEM scanning transmission electron microscope
- TEM transmission electron microscope
- a specific method for taking a cross-sectional photograph is described below. First, a sample for cross-sectional observation is prepared from a conductive film by the same method as described above. Note that it is difficult to see an observation image by STEM unless conduction is obtained in this sample. Therefore, it is preferable to sputter Pt—Pd for about 20 seconds.
- Sputtering time can be adjusted as appropriate, but care must be taken because the sputtered metal becomes a particle-like foreign substance image because it is short in 10 seconds and too long in 100 seconds.
- a cross-sectional photograph of the STEM sample is taken using a scanning transmission electron microscope (STEM) (product name “S-4800 (TYPE 2)”, manufactured by Hitachi High-Technologies Corporation).
- STEM observation is performed with the detector (selection signal) set to “TE”, the acceleration voltage set to “30 kV”, and the emission set to “10 ⁇ A”.
- the magnification is appropriately adjusted from 5000 to 200,000 times while adjusting the focus and observing whether each layer can be distinguished.
- a preferred magnification is 10,000 to 100,000 times, a more preferred magnification is 10,000 to 50,000 times, and a most preferred magnification is 25,000 to 50,000 times.
- the aperture is set to the beam monitor aperture 3 and the objective lens aperture is set to 3. D. May be 8 mm.
- D. May be 8 mm.
- a pretreatment generally used in electron microscope observation such as forming a metal layer of Pt—Pd, Pt, Au or the like on the surface of the conductive portion by sputtering is performed. You may go. Further, when a dyeing process such as osmium tetroxide, ruthenium tetroxide, or phosphotungstic acid is performed, the interface between the organic layers becomes easy to see. Also, the interface contrast may be difficult to understand when the magnification is high. In that case, the low magnification is also observed at the same time.
- magnifications of high and low such as 25,000 times and 50,000 times, and 50,000 times and 100,000 times, and the above-mentioned arithmetic average value is obtained at both magnifications.
- the value is the film thickness.
- the conductive portion 12 does not include particles such as inorganic particles having a particle size exceeding the film thickness of the light transmissive resin 15.
- the conductive part contains such particles, the particles protrude from the surface of the light-transmitting resin, and the film thickness of the conductive part increases.
- grains protrude from the surface of light transmissive resin, let the film thickness of an electroconductive part be the distance from the surface by the side of the light transmissive base material of an electroconductive part to the vertex of particle
- the electroconductive part 12 does not contain particle
- the conductive portion 12 may include an inorganic fiber made of a material different from that of the conductive fiber 14.
- the conductive performance is uniform in any part, and the surface resistance value can be regarded as the same at the center and the end of the product.
- the measurement point of the value is not limited to the center part of the product, but may be an end part.
- pretreatment it is preferable to perform pretreatment to make it as thin as possible.
- a cover film or glass is present on the conductive film via an adhesive layer.
- the blade of a cutter is put in an end and a cover film or a cover glass is peeled off. If not easily peeled off, the process proceeds to the next step without forcibly peeling off.
- the immersion in 10 seconds of warm water at 40 ° C. for 10 seconds is repeated three times. After that, the degree of peeling of the adhesive layer is confirmed with a cutter or the like, and depending on the case, it is immersed in warm water of 40 ° C. for 10 seconds and taken out three more times.
- the adhesive layer is peeled off with a tool (thin flat but without a blade) that does not slowly damage the conductive part. Even if the entire surface cannot be peeled off, it may be peeled off at the site to be measured. This pretreatment can also be used for measurements other than the surface resistance value.
- the conductive portion 12 functions as an electrode in the X direction in, for example, a projected capacitive touch panel, and includes a plurality of sensor portions 12B extending in the X direction and each sensor portion 12B as shown in FIG. And a terminal part (not shown) connected to the terminal.
- Each sensor unit 12B is provided in a rectangular active area that is a region where the touch position can be detected, and the terminal unit is a region that is adjacent to the active area and surrounds the active area from the four sides. It is provided in the active area.
- Each sensor part 12B has a line part 12C extending linearly and a bulging part 12D bulging from the line part 12C.
- the line portion 12 ⁇ / b> C extends linearly along a direction that intersects the arrangement direction of the sensor portions 12 ⁇ / b> B.
- the bulging portion 12 ⁇ / b> D is a portion that bulges from the line portion 12 ⁇ / b> C along the surface of the light transmissive substrate 11. Therefore, the width of each sensor portion 12B is thicker at the portion where the bulging portion 12D is provided.
- the bulging portion 12D has an outer contour that is substantially square in plan view.
- the bulging portion 12D is not limited to a substantially square shape in plan view, and may be a rhombus shape or a stripe shape.
- the light transmissive resin 15 covers the conductive fibers 16 in order to prevent the conductive fibers 16 from being detached from the conductive portions 12 and to improve durability and scratch resistance of the conductive portions 12.
- the conductive fibers 16 are covered to such an extent that electrical conduction is obtained from the surface 12A of the conductive portion 12. Specifically, as described above, if some of the conductive fibers are not exposed on the surface of the conductive part, there is a possibility that electrical conduction cannot be obtained from the surface of the conductive part. 15 preferably covers the conductive fibers 16 so that some of the conductive fibers 16 are exposed from the surface 12A of the conductive portion 12.
- the film thickness of the light-transmitting resin 15 may be adjusted. . That is, if the thickness of the light-transmitting resin is too thick, all the conductive fibers are buried in the light-transmitting resin, so that some of the conductive fibers are not exposed on the surface of the conductive portion, and the conductive There is a possibility that electrical conduction cannot be obtained from the surface of the part.
- the film thickness of the light-transmitting resin is too thin, there is a risk of detachment of the conductive fiber from the conductive part, deterioration of the durability of the conductive part, and a decrease in scratch resistance. As a whole, there is a possibility that the conductive portion is not unevenly distributed on the light-transmitting substrate side from a position that is half the thickness of the conductive portion. For this reason, it is necessary to adjust the film thickness of the light transmissive resin to an appropriate thickness.
- the thickness of the light transmissive resin 15 is preferably less than 300 nm.
- the film thickness of the light transmissive resin 15 can be measured by the same method as the method for measuring the film thickness of the conductive portion 12.
- the upper limit of the film thickness of the light-transmitting resin 15 is more preferable in the order of 145 nm or less, 140 nm or less, 120 nm, 110 nm or less, 80 nm or less, 50 nm or less (the smaller the value, the better).
- the minimum of the film thickness of the light transmissive resin 15 is 10 nm or more.
- the light transmissive resin 15 is not particularly limited as long as it is a light transmissive resin, and examples of the light transmissive resin include a polymer of a polymerizable compound and a thermoplastic resin.
- the polymerizable compound include those similar to the polymerizable compound described in the column of the light-transmitting functional layer 14, and therefore description thereof is omitted here.
- a reaction inhibitor is for suppressing the electrical conductivity fall by reaction with the conductive fiber 16 and the substance of atmosphere after application
- the reaction inhibitor include nitrogen-containing compounds such as benzoazole compounds, triazole compounds, tetrazole compounds, isocyanuric compounds, and aniline compounds.
- nitrogen-containing compounds used as reaction inhibitors include 1-aminobenzoazole, 5-methylbenzotriazole, 1,2,3-benzotriazole, 1-methyl-1H-tetrazol-5-amine, DL- ⁇ -Tocopherol, 1-octadecanethiol, 2-mercapto-5- (trifluoromethyl) pyridine, diallyl isocyanurate, diallyl isocyanurate, 6-anilino-1,3,5-triazine-2,4-dithiol, thiocyanuric acid 3,5-dimethyl-1H-1,2,4-triazole, 4- (1,2,4-triazol-1-ylmethyl) aniline, 6- (dibutylamino) -1,3,5-triazine-2 , 4-dithiol, 4- (1,2,4-triazol-1-yl) aniline, 2-methylthio-benzothiazole, 1 Phenyl-5-mercapto-1H-tetrazole, 5-mercapto
- the content of the reaction inhibitor in the conductive part 12 is preferably 0.01% by mass or more and 10% by mass or less. If the content of the reaction inhibitor is less than 0.01% by mass, the conductive fibers may react with substances in the atmosphere, and the conductivity may be reduced. The reaction inhibitor reacts with the surface of the conductive fiber to deactivate the surface of the conductive fiber and creates a state in which the conductive fiber hardly reacts with the substance in the atmosphere. When the content of exceeds 10% by mass, the reaction with the reaction inhibitor in the conductive fiber proceeds not only to the surface of the conductive fiber but also to the inside, and the conductivity may be lowered.
- ⁇ Conductive fiber> It is preferable that a plurality of conductive fibers 16 exist in the conductive portion 12. Since the conductive fibers 16 can be electrically connected from the surface 12 ⁇ / b> A of the conductive portion 12, the conductive fibers 16 are in contact with each other in the thickness direction of the conductive portion 12.
- the conductive fibers 16 come into contact with each other, so that the network structure (mesh structure) is formed in the plane direction (two-dimensional direction) of the conductive portion 12. Is preferably formed.
- the conductive fibers 16 form a network structure, a conductive path can be efficiently formed even with a small amount of the conductive fibers 16.
- a part of the conductive fibers are exposed on the surface of the conductive portion means that a portion of the conductive fibers are exposed to the extent that the conductive fibers are fixed to the conductive portion. What is necessary is just to include the case where the conductive fiber protrudes from the surface of the conductive part. If some of the conductive fibers are not exposed on the surface of the conductive part, there is a risk that electrical continuity may not be obtained from the surface of the conductive part. If electrical continuity is obtained, it can be determined that some of the conductive fibers 16 are exposed on the surface 12A of the conductive portion 12.
- the fiber diameter of the conductive fiber 16 is preferably 200 nm or less. When the fiber diameter of the conductive fiber exceeds 200 nm, the haze value of the conductive film may increase or the light transmission performance may be insufficient.
- the more preferable lower limit of the fiber diameter of the conductive fiber 16 is 10 nm or more from the viewpoint of the conductivity of the conductive portion 12, and the more preferable range of the fiber diameter of the conductive fiber 16 is 15 nm or more and 50 nm or less.
- the fiber diameter of the conductive fiber 16 is most preferably 30 nm or less.
- the fiber diameter of the conductive fiber 16 for example, using a transmission electron microscope (TEM) (product name “H-7650”, manufactured by Hitachi High-Technologies Corporation), 50 images are taken at 100,000 to 200,000 times. It is assumed that the fiber diameters of 100 conductive fibers are measured on the imaging screen by software attached to the TEM, and obtained as an arithmetic average value.
- the acceleration voltage is “100 kV”
- the emission current is “10 ⁇ A”
- the focusing lens aperture is “1”
- the objective lens aperture is “0”
- the observation mode is Set “HC” and Spot to “2”.
- the fiber diameter of the conductive fibers can also be measured by a scanning transmission electron microscope (STEM) (product name “S-4800 (TYPE 2)”, manufactured by Hitachi High-Technologies Corporation).
- STEM scanning transmission electron microscope
- 50 images are taken at 100,000 to 200,000 times, the fiber diameter of 100 conductive fibers is measured on the imaging screen by the software attached to STEM, and the conductive average is calculated as the arithmetic average value.
- the fiber diameter of the reactive fiber shall be determined.
- the signal selection is “TE”
- the acceleration voltage is “30 kV”
- the emission current is “10 ⁇ A”
- the probe current is “Norm”
- condenser lens 1 "5.0
- the conductive fiber-containing composition is diluted with water or alcohol to a concentration of the conductive fiber of 0.05% by mass or less according to the dispersion medium of the composition, or the solid content is 0.2% by mass. It is preferable to dilute to: Furthermore, one drop of this diluted conductive fiber-containing composition is dropped on a grid mesh with a carbon support film for TEM or STEM observation, dried at room temperature, observed under the above conditions, and used as observation image data.
- the arithmetic average value is obtained.
- the grid mesh with carbon support film Cu grid model number “# 10-1012 Elastic carbon ELS-C10 STEM Cu100P grid specification” is preferable, and it is strong against electron beam irradiation and has higher electron beam transmittance than plastic support film. Those suitable for the magnification and strong against organic solvents are preferred. Moreover, since it is hard to dripping too much if it is only a grid mesh in the case of dripping, it is good to mount and drop a grid mesh on a slide glass.
- the fiber diameter can be obtained by actual measurement based on a photograph, or may be calculated by binarization processing based on image data. When actually measuring, a photograph may be printed and enlarged as appropriate. At that time, the conductive fiber appears darker than the other components. Measurement points are measured with the outside of the contour as the starting point and the ending point.
- concentration of a conductive fiber shall be calculated
- the fiber length of the conductive fiber 16 is preferably 1 ⁇ m or more. When the fiber length of the conductive fiber 16 is less than 1 ⁇ m, a conductive part having sufficient conductive performance may not be formed, and aggregation may occur, leading to an increase in haze value and a decrease in light transmission performance.
- the upper limit of the fiber length of the conductive fiber 16 may be 500 ⁇ m or less, 300 ⁇ m or less, 30 ⁇ m or less, or 20 ⁇ m or less, and the lower limit of the fiber length of the conductive fiber 16 may be 3 ⁇ m or more, or 10 ⁇ m or more.
- the fiber length of the conductive fiber 16 is, for example, 10 to 500 to 20 million times using the SEM function of a scanning electron microscope (SEM) (product name “S-4800 (TYPE 2)”, manufactured by Hitachi High-Technologies Corporation).
- SEM scanning electron microscope
- One sheet is imaged, and the fiber length of 100 conductive fibers is measured on the imaging screen by the attached software, and is obtained as an arithmetic average value of the fiber lengths of the 100 conductive fibers.
- SEM scanning electron microscope
- the conductive fiber-containing composition was applied to an untreated surface of a B5 size polyethylene terephthalate (PET) film having a thickness of 50 ⁇ m so that the coating amount was 10 mg / m 2, the dispersion medium was dried, and the PET film surface was electrically conductive.
- Conductive film is prepared by arranging conductive fibers. It cuts out to the magnitude
- the cut conductive film is placed on a SEM sample table (model number “728-45”, manufactured by Nissin EM Co., Ltd., tilted sample table 45 °, ⁇ 15 mm ⁇ 10 mm ⁇ ⁇ ⁇ ⁇ ⁇ M4 aluminum) with a 45 ° inclination silver paste. Affix to the surface of the table using Further, Pt—Pd is sputtered for 20 to 30 seconds to obtain conduction. If there is no appropriate sputtered film, the image may be difficult to see.
- the fiber length can be obtained by actual measurement based on a photograph, or may be calculated by binarization processing based on image data. When actually measuring based on a photograph, it shall be performed by the method similar to the above.
- the conductive fiber 16 is preferably at least one fiber selected from the group consisting of conductive carbon fibers, metal fibers such as metal nanowires, metal-coated organic fibers, metal-coated inorganic fibers, and carbon nanotubes.
- Examples of the conductive carbon fiber include vapor grown carbon fiber (VGCF), carbon nanotube, wire cup, and wire wall. These conductive carbon fibers can use 1 type (s) or 2 or more types.
- the metal fiber for example, a fiber produced by a wire drawing method or a cutting method in which stainless steel, iron, gold, silver, copper, aluminum, cobalt, nickel, titanium, or an alloy thereof is thinly elongated for a long time is used. it can.
- Such metal fiber can use 1 type (s) or 2 or more types.
- the metal fiber is preferably a metal nanowire having a fiber diameter of 200 nm or less, preferably 50 nm or less, more preferably 30 nm or less and a fiber length of 1 ⁇ m or more, preferably 15 ⁇ m or more, more preferably 20 ⁇ m or more.
- Examples of the metal-coated organic fibers include fibers obtained by coating acrylic fibers with gold, silver, aluminum, nickel, titanium, and the like. One or more kinds of such metal-coated synthetic fibers can be used.
- the non-conductive portion 13 is a portion that is located between the conductive portions 12 and does not exhibit conductivity. In this specification, if the resistance value (surface resistance value) on the surface of the non-conductive portion is 1500 ⁇ / ⁇ or more, it is determined that the non-conductive portion does not exhibit conductivity. As shown in FIG. 3, the non-conductive portion 13 includes a light-transmitting resin and does not substantially include the conductive fiber 16.
- the non-conductive portion does not substantially contain conductive fibers
- the non-conductive portion 13 does not include the conductive fiber 16 at all.
- the conductive fiber 16 is removed from the non-conductive part 13 by sublimating the conductive fiber 16 with laser light as described later, there is a possibility that the conductive material constituting the conductive fiber 16 remains. However, since this conductive material is not fibrous, it is not regarded as a conductive fiber. In this specification, etching using laser light is referred to as dry etching.
- the three-dimensional arithmetic average roughness SRa on the surface 13A of the non-conductive portion 13 is 3 nm or more. If SRa on the surface 13A of the non-conductive part 13 is 3 nm or more, the conductive fiber 16 does not remain in the non-conductive part 13 or even if the conductive fiber 16 remains in the non-conductive part 13 Therefore, when metal ions are deposited on the non-conductive part 13 side due to migration of metal ions from the conductive part 12, it is possible to suppress an electrical short circuit between the conductive parts 12.
- the three-dimensional arithmetic average roughness SRa is obtained by extending the arithmetic average roughness Ra, which is a two-dimensional roughness parameter described in JIS B0601: 1994, to three dimensions.
- the SRa can be calculated from a three-dimensional roughness curved surface obtained by measurement with a contact-type surface roughness meter or a non-contact-type surface roughness meter (for example, an interference microscope, a confocal microscope, an atomic force microscope, etc.).
- the data of the three-dimensional roughness curved surface is represented by points arranged in a grid pattern at intervals d on the reference plane (the horizontal direction is the x-axis and the vertical direction is the y-axis) and the height at the position of the point.
- the SRa is calculated by the following equation.
- N is the total number of points.
- the above three-dimensional roughness curved surface is preferably measured using an interference microscope for simplicity.
- an interference microscope include a white interference microscope such as “New View” series manufactured by Zygo.
- SRa is also calculated by the following equation where the orthogonal coordinate axes X and Y axes are placed on the reference surface, the roughness curved surface is Z (x, y), and the reference surface sizes are Lx and Ly.
- A Lx ⁇ Ly.
- the size including the non-conductive part is 218 ⁇ m square or more from the conductive film. Obtain one or more samples. The size of each sample is sufficient if it is about 1 cm square in consideration of handling properties, and each sample is cut out from an arbitrary portion where no dirt or fingerprints are attached to the conductive film. Then, under the following measurement conditions and analysis conditions, five SRa are measured for each sample on the surface of the non-conductive part, and the arithmetic average value of SRa at five or more points is defined as SRa.
- SRa is displayed as “Ra”, but Ra measured by the New View 7300 is a three-dimensional arithmetic average roughness, and a two-dimensional arithmetic average roughness Ra defined by JIS B0601: 2013. Is different.
- the measurement / analysis software uses Microscope Application 9.0.10 Microscope Application. The following low wavelength corresponds to the cut-off value ⁇ c in the roughness parameter.
- the width of the non-conductive portion is 30 ⁇ m, and the width of the two conductive portions adjacent to the non-conductive portion is 3 mm or more, respectively.
- the conductive film is cut out so that the width of the conductive part is 3 mm and the length of the conductive part and the non-conductive part is 45 mm.
- One to three samples having a non-conductive part with a width of 30 ⁇ m sandwiched between the parts are obtained.
- SRa is measured at five locations for each sample on the surface of the non-conductive portion, and the arithmetic average value of SRa at a total of 5 to 15 points is defined as SRa.
- Measurement condition ⁇ Objective lens: 50 times ⁇ Zoom: 1 time ⁇ Measurement area: 218 ⁇ m ⁇ 218 ⁇ m ⁇ Resolution (interval per point): 0.22 ⁇ m ⁇ Scan Length: 5 ⁇ m ⁇ Min mod: 0.001%
- Plane -Filter High Pass -FilterType: GaussSpline ⁇ Low wavelength: 250 ⁇ m ⁇ High wavelength: 3 ⁇ m ⁇ Remove spikes: on Spike Height (xRMS): 2.5 ⁇ Analysis range: 30 ⁇ m ⁇ 218 ⁇ m
- the lower limit of SRa on the surface 13A of the non-conductive portion 13 is preferably 4 nm or more, and more preferably 5 nm or more.
- the upper limit of SRa on the surface 13A of the non-conductive portion 13 is preferably higher to some extent from the viewpoint of suppressing the visibility of the pattern shape of the conductive portion and the non-conductive portion (so-called bone appearance phenomenon). If SRa is too large, white turbidity may be caused. Therefore, the thickness is preferably 80 nm or less.
- the upper limit of SRa is more preferably 50 nm or less, and further preferably 35 nm or less.
- the film thickness of the non-conductive part 13 is preferably less than 300 nm because it is formed integrally with the conductive part 12.
- the upper limit of the film thickness of the non-conductive portion 13 is more preferable in the order of 145 nm or less, 140 nm or less, 120 nm or less, 110 nm or less, 80 nm or less, 50 nm or less, 30 nm or less, 10 nm or less (the smaller the value, the better).
- the minimum of the film thickness of the nonelectroconductive part 13 is 10 nm or more.
- the film thickness of the non-conductive part 13 shall be measured by the same method as the film thickness of the conductive part 12.
- the non-conductive portion 13 is composed of a light transmissive resin 15.
- the nonconductive portion 13 may have a hollow portion 13B that is formed by dry etching and in which the conductive fiber 16 does not exist. In this case, when the nonconductive portion 13 is formed, the conductive fiber 16 breaks through the region that should be the nonconductive portion 13 by sublimation and is released to the outside, so that the surface 13A of the nonconductive portion 13 is roughened.
- the Since the light transmissive resin 15 of the non-conductive portion 13 is the same as the light transmissive resin 15 of the conductive portion 12, the description thereof will be omitted here.
- the conductive film 10 can be produced as follows, for example. First, as shown in FIG. 6 (A), the light-transmitting functional layer composition is applied to the other surface 11B of the light-transmitting substrate 11 and dried, so that the light-transmitting functional layer composition A coating film 31 is formed.
- the composition for a light-transmitting functional layer contains a polymerizable compound, but in addition, the inorganic particles, the leveling agent, a solvent, and a polymerization initiator may be added as necessary. Furthermore, the composition for a light-transmitting functional layer includes a conventionally known dispersant, surface active agent, depending on purposes such as increasing the hardness of the light-transmitting functional layer, suppressing curing shrinkage, or controlling the refractive index. Agent, silane coupling agent, thickener, coloring agent, coloring agent (pigment, dye), antifoaming agent, flame retardant, UV absorber, adhesion promoter, polymerization inhibitor, antioxidant, surface modifier Further, an easy lubricant or the like may be added.
- solvent examples include alcohols (methanol, ethanol, propanol, isopropanol, n-butanol, s-butanol, t-butanol, benzyl alcohol, PGME, ethylene glycol, etc.), ketones (acetone, methyl ethyl ketone (MEK), cyclohexanone, etc.
- alcohols methanol, ethanol, propanol, isopropanol, n-butanol, s-butanol, t-butanol, benzyl alcohol, PGME, ethylene glycol, etc.
- ketones acetone, methyl ethyl ketone (MEK), cyclohexanone, etc.
- the polymerization initiator is a component that is decomposed by light or heat to generate radicals or ionic species to initiate or advance polymerization (crosslinking) of the polymerizable compound.
- the polymerization initiator used in the composition for a light-transmitting functional layer is a photopolymerization initiator (for example, a photo radical polymerization initiator, a photo cationic polymerization initiator, a photo anion polymerization initiator) or a thermal polymerization initiator (for example, a heat A radical polymerization initiator, a thermal cationic polymerization initiator, a thermal anionic polymerization initiator), or a mixture thereof.
- photo radical polymerization initiator examples include benzophenone compounds, acetophenone compounds, acylphosphine oxide compounds, titanocene compounds, oxime ester compounds, benzoin ether compounds, thioxanthones, and the like.
- photo radical polymerization initiators examples include IRGACURE 184, IRGACURE 369, IRGACURE 379, IRGACURE 651, IRGACURE 819, IRGACURE 907, IRGACURE 2959, IRGACURE OXE01, Lucirin TPO 9 (all manufactured by BASF Japan 30) ADEKA), SPEEDCURE EMK (made by Nippon Sebel Hegner), benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether (all manufactured by Tokyo Chemical Industry Co., Ltd.) and the like.
- photocationic polymerization initiator examples include aromatic diazonium salts, aromatic iodonium salts, aromatic sulfonium salts, and the like.
- examples of commercially available photocationic polymerization initiators include Adekaoptomer SP-150 and Adekaoptomer SP-170 (both manufactured by ADEKA).
- thermal radical polymerization initiator examples include peroxides and azo compounds. Among these, a polymer azo initiator composed of a polymer azo compound is preferable. Examples of the polymer azo initiator include those having a structure in which a plurality of units such as polyalkylene oxide and polydimethylsiloxane are bonded via an azo group.
- Examples of the polymer azo initiator having a structure in which a plurality of units such as polyalkylene oxide are bonded via the azo group include, for example, a polycondensate of 4,4′-azobis (4-cyanopentanoic acid) and polyalkylene glycol. And polycondensate of 4,4′-azobis (4-cyanopentanoic acid) and polydimethylsiloxane having a terminal amino group.
- peroxide examples include ketone peroxide, peroxyketal, hydroperoxide, dialkyl peroxide, peroxy ester, diacyl peroxide, and peroxydicarbonate.
- thermal radical polymerization initiators examples include perbutyl O, perhexyl O, perbutyl PV (all manufactured by NOF Corporation), V-30, V-501, V-601, VPE-0201. VPE-0401, VPE-0601 (both manufactured by Wako Pure Chemical Industries, Ltd.) and the like.
- thermal cationic polymerization initiator examples include various onium salts such as a quaternary ammonium salt, a phosphonium salt, and a sulfonium salt.
- thermal cationic polymerization initiators include, for example, Adeka Opton CP-66, Adeka Opton CP-77 (all manufactured by ADEKA), Sun-Aid SI-60L, Sun-Aid SI-80L, Sun-Aid SI-100L ( All of them are manufactured by Sanshin Chemical Industry Co., Ltd.) and CI series (manufactured by Nippon Soda Co., Ltd.).
- the content of the polymerization initiator in the composition for a light transmissive functional layer is preferably 0.5 parts by mass or more and 10.0 parts by mass or less with respect to 100 parts by mass of the polymerizable compound.
- Examples of the method for applying the light transmissive functional layer composition include known coating methods such as spin coating, dipping, spraying, slide coating, bar coating, roll coating, gravure coating, and die coating. It is done.
- the coating film 31 is irradiated with ionizing radiation such as ultraviolet rays or heated to polymerize (crosslink) the polymerizable compound, thereby curing the coating film 31, and light.
- ionizing radiation such as ultraviolet rays or heated to polymerize (crosslink) the polymerizable compound, thereby curing the coating film 31, and light.
- the transparent functional layer 14 is formed.
- ultraviolet rays When ultraviolet rays are used as the ionizing radiation for curing the composition for the light transmissive functional layer, ultraviolet rays emitted from ultra-high pressure mercury lamp, high pressure mercury lamp, low pressure mercury lamp, carbon arc, xenon arc, metal halide lamp, etc. are used. it can. Further, as the wavelength of ultraviolet rays, a wavelength range of 190 to 380 nm can be used. Specific examples of the electron beam source include various electron beam accelerators such as a cockcroft-wald type, a bandegraft type, a resonant transformer type, an insulated core transformer type, a linear type, a dynamitron type, and a high frequency type.
- the conductive fiber 16 and the conductive dispersion medium including the organic dispersion medium are formed on one surface 11A of the light transmissive substrate 11.
- the fiber-containing composition is applied and dried, and a plurality of conductive fibers 16 are arranged on one surface 11A as shown in FIG.
- the organic dispersion medium may contain less than 10% by mass of water.
- An aqueous dispersion medium may be used instead of the organic dispersion medium.
- the aqueous dispersion medium contains 10% by mass or more of water.
- the conductive fiber-containing composition may contain a resin component made of a thermoplastic resin or a polymerizable compound in addition to the conductive fiber 16 and the organic dispersion medium.
- a resin component made of a thermoplastic resin or a polymerizable compound in addition to the conductive fiber 16 and the organic dispersion medium.
- resin means resin (however, it is conductive during the synthesis of conductive fibers such as to prevent self-welding of conductive fibers covering conductive fibers and reaction with substances in the atmosphere.
- the organic protective layer formed around the fiber In addition to a resin (for example, polyvinyl pyrrolidone etc.) constituting the organic protective layer formed around the fiber, it is a concept that includes a component that can be polymerized to become a resin such as a polymerizable compound.
- the resin content in the conductive fiber-containing composition constitutes a part of the light-transmitting resin 15 after the conductive portion 12 is formed.
- the organic dispersion medium is not particularly limited, but is preferably a hydrophilic organic dispersion medium.
- the organic dispersion medium include saturated hydrocarbons such as hexane; aromatic hydrocarbons such as toluene and xylene; alcohols such as methanol, ethanol, propanol, and butanol; acetone, methyl ethyl ketone (MEK), and methyl isobutyl ketone.
- Ketones such as ethyl acetate and butyl acetate; ethers such as tetrahydrofuran, dioxane and diethyl ether; N, N-dimethylformamide, N-methylpyrrolidone (NMP), N, N-dimethylacetamide Amides such as: Halogenated hydrocarbons such as ethylene chloride and chlorobenzene. Among these, alcohols are preferable from the viewpoint of the stability of the conductive fiber-containing composition.
- thermoplastic resin examples include acrylic resins, polyester resins such as polyethylene terephthalate, and aromatic resins such as polystyrene, polyvinyl toluene, polyvinyl xylene, polyimide, polyamide, and polyamideimide.
- Resin Polyurethane resin; Epoxy resin; Polyolefin resin; Acrylonitrile-butadiene-styrene copolymer (ABS); Cellulose resin; Polyvinyl chloride resin; Polyacetate resin; Polynorbornene resin; Synthetic rubber; Based resins and the like.
- Examples of the polymerizable compound that may be contained in the conductive fiber-containing composition include those similar to the polymerizable compound described in the column of the light-transmitting functional layer 14, and the description thereof is omitted here. To do.
- a composition for a light transmissive resin containing a polymerizable compound and a solvent is applied and dried, as shown in FIG. 7B.
- the coating film 32 of the composition for light transmissive resin is formed.
- the composition for light transmissive resin contains a polymeric compound and a solvent, you may add a polymerization initiator and the said reaction inhibitor as needed.
- the conductive fiber is conductive before forming the network structure. Since the surface of the reactive fiber is coated with the reaction inhibitor and the conductivity may be deteriorated, it is preferable to add the reactivity inhibitor to the light-transmitting resin composition.
- the coating film 32 is cured by irradiating the coating film 32 with ionizing radiation such as ultraviolet rays to polymerize (crosslink) the polymerizable compound. 15 is formed, and the conductive layer 33 is formed.
- ionizing radiation such as ultraviolet rays
- the conductive layer 33 is formed by dry etching (for example, irradiation with laser light such as an infrared laser) in a region to be a non-conductive portion in the conductive layer 33. Pattern.
- laser light such as an infrared laser
- the conductive fibers 16 included in this region are sublimated by the heat of the laser light.
- the sublimated conductive fiber 16 breaks through the light transmissive resin 15 and is released to the outside of the light transmissive resin 15.
- the surface 13A of the non-conductive portion 13 is Roughened. Further, when the output of the laser beam is increased, not only the conductive fibers 16 but also the light transmissive resin 15 is sublimated, so that the surface 13A of the non-conductive portion 13 is further roughened. Thereby, the electroconductive film 10 which has the electroconductive part 12 and the nonelectroconductive part 13 which are shown by FIG. 1 can be obtained.
- the three-dimensional arithmetic average roughness SRa on the surface 13A of the non-conductive portion 13 is 3 nm or more, an electrical short circuit between the conductive portions 12 can be suppressed. That is, when the conductive fiber 16 is sublimated as described above, the surface 13A of the non-conductive portion 13 is roughened, so that the three-dimensional arithmetic average roughness on the surface 13A of the non-conductive portion 13 increases.
- the non-conductive portion 13 does not substantially contain the conductive fiber 16, and therefore the arithmetic average roughness on the surface 13A of the non-conductive portion 13
- the thickness is set to 3 nm or more, even when the conductive material is deposited on the non-conductive portion 13 side due to migration of the conductive material from the conductive portion 12, an electrical short circuit between the conductive portions 12 can be suppressed.
- the pattern shape of the conductive part or the non-conductive part may be visually recognized (so-called bone-visible phenomenon). Since the three-dimensional arithmetic average roughness SRa on the surface 13A of the portion 13 is 3 nm or more, it can be suppressed that the pattern shape of the conductive portion and the non-conductive portion is visually recognized.
- the conductive fiber 16 when the conductive fiber 16 is unevenly distributed in the conductive part 12 on the light transmissive substrate 11 side from the position HL that is half the film thickness of the conductive part 12 as a whole, the conductive fiber 16 is conductive. It is possible to increase the number of contacts between the conductive fibers 16. Thereby, even when the content of the conductive fiber 16 is small, electrical conduction from the surface 12A of the conductive portion 12 can be secured, so that a lower surface resistance value can be realized. is there. Moreover, since content of the conductive fiber 16 can be decreased, a lower haze value can be realized.
- the conductive fibers 16 are unevenly distributed in the conductive portion 12 toward the light transmissive substrate 11 from the position HL that is half the film thickness of the conductive portions 12, most of the conductive fibers 16 are light transmissive. It is covered with a conductive resin 15. Thereby, the electrical conductivity fall by reaction with sulfur, oxygen, and / or halogen in the air which is atmosphere can be suppressed.
- the width of the laser beam is the narrowest at the focal point. For this reason, when the focus of the laser beam is adjusted to the vicinity of the interface between the conductive layer and the light-transmitting substrate, the width of the laser beam irradiated to the vicinity of the surface of the conductive layer becomes wider than the focus. Therefore, when the conductive fibers are uniformly present in the conductive layer, when the laser beam is irradiated, even if an attempt is made to form a non-conductive portion at a fine pitch, the conductive portion and the light-transmitting substrate are located near the surface of the conductive layer. The width of the non-conductive portion becomes larger than the vicinity of the interface.
- the conductive fibers 16 are unevenly distributed in the conductive layer 33 toward the light transmissive substrate 11 from the position HL that is half the film thickness of the conductive layer 33 as a whole.
- the conductive fiber 16 is less in the vicinity of the surface of the conductive layer 33, so that the width of the non-conductive portion 13 becomes larger than the vicinity of the interface between the conductive layer 33 and the light transmissive substrate 11.
- the non-conductive portion 13 can be formed with a fine pitch.
- the conductive portion is composed of a light-transmitting resin and conductive fibers arranged in the light-transmitting resin.
- the electroconductive part is formed using the electroconductive fiber containing composition containing electroconductive fiber and a resin part.
- the aqueous dispersion medium is mainly used as a dispersion medium.
- the resin content in the conductive fiber-containing composition may be increased from the viewpoint of storage stability and uniformity of the coating film when applied.
- the conductive fiber is less likely to be unevenly distributed on the light transmissive substrate side as a whole of the conductive fiber from a position that is half the film thickness of the conductive part. For this reason, by controlling the resin content so that the resin content is reduced, the conductive fiber 16 in the conductive portion 12 is placed from the position HL half the film thickness of the conductive portion 12 to the light transmissive substrate 11. Can be unevenly distributed to the side.
- the light-transmitting resin 15 of the conductive portion 12 contains a reaction inhibitor, the conductivity of the conductive fiber 16 due to the reaction with sulfur, oxygen, and / or halogen in the air that is the atmosphere. Can be further suppressed.
- the conductive part comes into contact with the light-transmitting adhesive layer, but the conductive part is in contact with the light-transmitting adhesive layer, for example, at 60 ° C. and relative humidity.
- a moisture and heat resistance test is performed for 240 hours in an environment of 90%, 85 ° C., 85% relative humidity, or higher temperature and humidity, depending on the type of light-transmitting adhesive layer,
- the fiber may react with components in the light-transmitting adhesive layer (for example, an acid component constituting the adhesive layer itself or an additive added to the adhesive layer), and the surface resistance value of the conductive portion may increase.
- the reaction inhibitor is included in the conductive portion 13
- the moisture and heat resistance test is performed in a state where the light transmissive adhesive layer is in contact with the conductive portion 12.
- the reaction between the conductive fibers 16 and the components in the light-transmitting adhesive layer can be suppressed.
- the choice of a light transmissive adhesion layer can be expanded.
- the conductive fiber 16 is used, unlike the ITO, it is possible to provide the conductive film 10 that is difficult to break even when bent. For this reason, it is also possible to incorporate the conductive film 10 in a foldable image display device.
- FIG. 9 is a schematic configuration diagram of the image display apparatus according to the present embodiment
- FIG. 10 is a schematic plan view of the touch panel according to the present embodiment. 9 and 10, members denoted by the same reference numerals as those in FIG. 1 are the same as the members illustrated in FIG. 1, and thus description thereof is omitted.
- the image display device 40 mainly observes the display panel 50 for displaying an image, the backlight device 60 arranged on the back side of the display panel 50, and the display panel 50.
- a touch panel 70 disposed on the person side, and a light transmissive adhesive layer 90 interposed between the display panel 50 and the touch panel 70.
- the image display device 40 since the display panel 50 is a liquid crystal display panel, the image display device 40 includes the backlight device 60. However, depending on the type of the display panel (display element), the backlight device 60 is not included. Also good.
- the display panel 50 has a protective film 51 such as a triacetyl cellulose film (TAC film) or a cycloolefin polymer film, a polarizer 52, and a protective film from the backlight device 60 side toward the viewer side.
- the film 53, the light transmissive adhesive layer 54, the display element 55, the light transmissive adhesive layer 56, the protective film 57, the polarizer 58, and the protective film 59 are laminated in this order.
- the display panel 50 only needs to include the display element 55 and may not include the protective film 51 and the like.
- the display element 55 is a liquid crystal display element.
- the display element 55 is not limited to a liquid crystal display element, and may be, for example, a display element using an organic light emitting diode (OLED), an inorganic light emitting diode, and / or a quantum dot light emitting diode (QLED).
- OLED organic light emitting diode
- QLED quantum dot light emitting diode
- a liquid crystal layer, an alignment film, an electrode layer, a color filter, and the like are disposed between two glass substrates.
- the backlight device 60 illuminates the display panel 50 from the back side of the display panel 50.
- the backlight device 60 a known backlight device can be used, and the backlight device 60 may be either an edge light type or a direct type backlight device.
- the touch panel 70 includes a conductive film 80, a conductive film 10 disposed on the viewer side from the conductive film 80, and a light-transmitting cover member 71 such as a cover glass disposed on the viewer side from the conductive film 10.
- the conductive film 80 has the same structure as the conductive film 10. That is, as shown in FIG. 10, the conductive film 80 includes a light transmissive substrate 81, a plurality of light transmissive conductive portions 82 provided on one surface side of the light transmissive substrate 81, and A light transmissive non-conductive portion 83 provided on one surface side of the light transmissive substrate 81 and located between the conductive portions 82, and the conductive portion 82 and the non-conductive portion 83 side of the light transmissive substrate 81. A light-transmitting functional layer 84 provided on the surface opposite to the surface.
- the light-transmitting substrate 81 is the same as the light-transmitting substrate 11, and the light-transmitting functional layer 84 is the same as the light-transmitting functional layer 14. Therefore, the description thereof is omitted here. .
- the conductive portion 82 has the same structure as the conductive portion 12. That is, the conductive part 82 is composed of a light transmissive resin and conductive fibers disposed in the light transmissive resin.
- the non-conductive portion 83 is made of a light transmissive resin and does not substantially contain conductive fibers.
- the conductive portion 82 functions as an electrode in the Y direction in the projected capacitive touch panel, and as shown in FIG. 10, a plurality of sensor portions 82B and terminal portions connected to the sensor portions 82B ( (Not shown).
- the sensor unit 82B has the same structure as the sensor unit 12B, but extends in the Y direction. Since the conductive portion 82 has the same structure as the conductive portion 12, detailed description thereof will be omitted here.
- the non-conductive portion 83 is a portion that is located between the conductive portions 82 and does not exhibit conductivity. As with the nonconductive portion 13, the nonconductive portion 83 has an arithmetic average roughness on the surface of the nonconductive portion 83 of 3 nm or more. Since the non-conductive portion 83 has the same structure as the non-conductive portion 13, detailed description thereof will be omitted here.
- Light transmissive adhesive layer examples include an adhesive sheet such as OCA (Optical Clear Adhesive). Instead of the light transmissive adhesive layers 72 and 73, a light transmissive adhesive layer may be used.
- OCA Optical Clear Adhesive
- the light transmissive adhesive layer 90 is interposed between the display panel 50 and the touch panel 70 and bonded to both the display panel 50 and the touch panel 70. Thereby, the display panel 50 and the touch panel 70 are fixed.
- the light transmissive adhesive layer 90 is composed of a cured product of a liquid curable adhesive layer composition containing a polymerizable compound such as OCR (Optically Clear Resin), for example.
- the film thickness of the light transmissive adhesive layer 90 is preferably 10 ⁇ m or more and 50 ⁇ m or less. If the thickness of the light-transmitting adhesive layer is less than 10 ⁇ m, it is easy to cause problems such as insufficient foreign matter biting and insufficient step following, and the thickness of the light-transmitting adhesive layer is 150 ⁇ m. If it exceeds, production costs will be excessive.
- the film thickness of the light-transmitting adhesive layer 10 film thicknesses were randomly measured from a cross-sectional photograph of the light-transmitting adhesive layer taken using an optical microscope, and the arithmetic average value of the film thicknesses measured at 10 positions was measured. Ask.
- a light transmissive adhesive layer may be used.
- composition 1 for hard coat layer A mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate (product name "KAYARAD-PET-30", manufactured by Nippon Kayaku Co., Ltd.): 30 parts by mass-polymerization initiator (product name "Irgacure 184", manufactured by BASF Japan) : 1.5 parts by mass-Methyl ethyl ketone (MEK): 50 parts by mass-Cyclohexanone: 18.5 parts by mass
- Silver nanowire-containing composition 1 Using ethylene glycol (EG) as the reducing agent and polyvinylpyrrolidone (PVP: average molecular weight 1.3 million, manufactured by Aldrich) as the organic protective agent, the nucleation step and the particle growth step shown below are separated to form particles.
- the silver nanowire containing composition was prepared.
- the reaction liquid containing the nuclei particles after the nucleation step is held at 160 ° C. with stirring, and 100 mL of an EG solution of silver nitrate (silver nitrate concentration: 1.0 ⁇ 10 ⁇ 1 mol / L) 100 mL of an EG solution of PVP (PVP concentration: 3.0 ⁇ 10 ⁇ 1 mol / L) was added over 120 minutes at a constant flow rate using the double jet method.
- the reaction solution was sampled every 30 minutes and confirmed with an electron microscope. As a result, the core particles formed in the nucleation process grew into a wire-like form over time. Formation of new fine particles in the process was not observed.
- the fiber diameter of the silver nanowire was 30 nm and the fiber length was 15 ⁇ m.
- the fiber diameter of the silver nanowire was measured by measuring the fiber diameter of 50 conductive fibers at 1000 to 500,000 times using a transmission electron microscope (TEM), and the arithmetic average of the fiber diameters of the 50 conductive fibers Obtained as a value. Further, the fiber length of the silver nanowires was determined by measuring the fiber length of 50 conductive fibers at 1000 to 500,000 times using a scanning electron microscope (SEM) and measuring the fiber length of the 50 conductive fibers. The arithmetic average value was obtained. In addition, the fiber diameter and fiber length of the following silver nanowire were calculated
- composition 1 for light transmissive resin Each component was mix
- Light-transmissive resin composition 1 A mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate (product name "KAYARAD-PET-30", manufactured by Nippon Kayaku Co., Ltd.): 5 parts by mass-polymerization initiator (product name "Irgacure 184", manufactured by BASF Japan) : 0.25 parts by mass-Methyl ethyl ketone (MEK): 70 parts by mass-Cyclohexanone: 24.75 parts by mass
- Example 1 First, a 50 ⁇ m-thick polyethylene terephthalate film (product name “Cosmo Shine A4100”, manufactured by Toyobo Co., Ltd.) having a base layer on one side as a light-transmitting substrate is prepared. The product was applied to form a coating film. Next, 50 ° C. dry air was passed through the formed coating film at a flow rate of 0.5 m / s for 15 seconds, and then 70 ° C. dry air was passed through for 30 seconds at a flow rate of 10 m / s.
- a 50 ⁇ m-thick polyethylene terephthalate film product name “Cosmo Shine A4100”, manufactured by Toyobo Co., Ltd.
- the silver nanowire-containing composition 1 was applied to 10 mg / m 2 on the untreated surface of the polyethylene terephthalate film opposite to the surface on which the hard coat layer was formed.
- 50 ° C. dry air was passed through the coated silver nanowire-containing composition 1 at a flow rate of 0.5 m / s for 15 seconds, and then 70 ° C. dry air at a flow rate of 10 m / s for 30 seconds.
- a plurality of silver nanowires were arranged on the surface of the hard coat layer by allowing the dispersion medium in the silver nanowire-containing composition 1 to evaporate and evaporate.
- the said composition 1 for light transmissive resins was apply
- 50 ° C. dry air was passed through the formed coating film at a flow rate of 0.5 m / s for 15 seconds, and then 70 ° C. dry air was passed through for 30 seconds at a flow rate of 10 m / s.
- the coating film is cured by irradiating ultraviolet rays so that the integrated light amount becomes 100 mJ / cm 2 , thereby forming a light-transmitting resin having a film thickness of 100 nm, A conductive layer made of silver nanowires arranged in a transmissive resin and a light transmissive resin was obtained.
- the region that becomes the non-conductive portion was irradiated with laser light under the following conditions, and the silver nanowires existing in this region were sublimated and removed, thereby patterning the conductive layer.
- the electroconductive film which has a 30-micrometer-wide linear nonelectroconductive part located between an electroconductive part and an electroconductive part was obtained.
- Laser irradiation conditions ⁇ Type: YVO4 ⁇ Wavelength: 1064nm ⁇ Pulse width: 8-10ns ⁇ Frequency: 100 kHz ⁇ Spot diameter: 30 ⁇ m ⁇ Pulse energy: 16 ⁇ J ⁇ Processing speed: 1200mm / s
- Example 2 a conductive film was obtained in the same manner as in Example 1 except that the pulse energy of the laser beam was 10 ⁇ J.
- Example 3 a conductive film was obtained in the same manner as in Example 1 except that the pulse energy of the laser beam was 24 ⁇ J and the processing speed was 800 mm / s.
- Example 4 a conductive film was obtained in the same manner as in Example 1 except that the pulse energy of the laser light was 24 ⁇ J and 400 mm / s.
- Comparative Example 1 a conductive film was obtained in the same manner as in Example 1 except that the pulse energy of the laser beam was 10 ⁇ J and the processing speed was 1500 mm / s.
- the Mask data button on the screen was pressed to display the Mask Editor screen. It was confirmed that the Auto Incl button was displayed on the Mask Editor screen, and when it was not displayed, the Auto Excl button was clicked and displayed.
- the Rectance button on the same screen was clicked, and the mask size (width 0.03 mm, height 0.218 mm) of the area to be analyzed was input to width and height, and the Apply button displayed on the left side was clicked.
- the Apply button was clicked, a white frame of a specified size was displayed on the observation image displayed on the same screen. When the white frame is dragged after pressing the Move button, it can be moved to an arbitrary position on the observation image, and thus moved to the non-conductive portion.
- the electrical short circuit of the conductive film which concerns on an Example and a comparative example was evaluated. Specifically, first, the conductive film was cut out so that the width of the two conductive portions adjacent to the non-conductive portion having a width of 30 ⁇ m was 3 mm and the length was 45 mm, and the conductive portion having a width of 3 mm was obtained. A sample having a non-conductive portion with a width of 30 ⁇ m sandwiched between the layers was obtained. Next, using a tester (product name “Digital M ⁇ Hitester 3454-11”, manufactured by Hioki Electric Co., Ltd.), it was evaluated whether or not a current flows between one conductive part and the other conductive part.
- a tester product name “Digital M ⁇ Hitester 3454-11”, manufactured by Hioki Electric Co., Ltd.
- a durability test was performed in which a voltage of 32 V was applied to one conductive part of the sample for 100 hours in an environment of 65 ° C. and a relative humidity of 95%.
- a tester product name “Digital M ⁇ Hitester 3454-11”, manufactured by Hioki Electric Co., Ltd.
- the evaluation criteria were as follows. ⁇ : Current did not flow between the conductive parts not only before the durability test but also after the durability test.
- X Current did not flow between the conductive parts before the durability test, but current flowed between the conductive parts after the durability test.
- the four corners of the conductive film were further fixed with a tape (product name “Cello Tape (registered trademark)”, manufactured by Nichiban Co., Ltd.).
- the surface of the conductive film is illuminated with light from a three-wavelength fluorescent lamp (product name “Akarin stick”, manufactured by Hitachi Appliances) so that the illuminance on the surface of the conductive film becomes 1000 lux. It was visually observed from all angles at a distance of 30 cm (viewing distance) to evaluate whether the pattern shapes of the conductive part and the non-conductive part were visually recognized.
- the surface of the conductive film is illuminated with light from an LED light source (product name “MG-286R”, manufactured by GENTOS) so that the illuminance on the surface of the conductive film is 10,000 lux. It was visually observed from every angle at a distance of 30 cm (viewing distance) from the surface, and it was evaluated whether the pattern shapes of the conductive part and the non-conductive part were visually recognized.
- the evaluation criteria were as follows. A: The pattern shape of the conductive part and the non-conductive part was not visually recognized by observation at an illuminance of 10,000 lux.
- the surface of the conductive film is illuminated with light from a three-wavelength fluorescent lamp (product name “Akarin stick”, manufactured by Hitachi Appliances) so that the illuminance on the surface of the conductive film becomes 1000 lux. From 30 ° to 30 cm (viewing distance), it was visually observed from all angles to evaluate whether cloudiness was observed in the non-conductive portion.
- the surface of the conductive film is illuminated with light from an LED light source (product name “MG-286R”, manufactured by GENTOS) so that the illuminance on the surface of the conductive film is 10,000 lux. It was visually observed from every angle at a distance of 30 cm (viewing distance) from the surface, and it was evaluated whether a cloudiness was observed in the non-conductive portion.
- the evaluation criteria were as follows. ⁇ : No cloudiness was observed in the non-conductive part when observed at an illuminance of 10,000 lux. ⁇ : No white turbidity was observed in the non-conductive portion when observed at an illuminance of 1000 lux, but white turbidity was observed at the non-conductive portion when observed at an illuminance of 10,000 lux. X: A cloudiness sensation was observed in the non-conductive portion by observation at an illuminance of 1000 lux.
- the conductive films according to Examples 1 to 3 since the three-dimensional arithmetic average roughness SRa of the surface of the nonconductive portion was 80 nm or less, the pattern shapes of the conductive portion and the nonconductive portion were not visually recognized and There was no cloudiness in the conductive part. This is because the silver nanowires are slightly whitened, so the surface of the non-conductive part is slightly roughened, and the non-conductive part is also slightly whitened. This is probably because he was not born. On the other hand, in the conductive film according to Example 4, since the three-dimensional arithmetic average roughness SRa of the surface of the non-conductive portion exceeded 80 nm, the pattern shapes of the conductive portion and the non-conductive portion were not visually recognized.
- the surface of the non-conductive portion was excessively roughened, a cloudiness was generated in the non-conductive portion.
- the conductive film which concerns on the comparative example 1 since the silver nanowire remained in the nonelectroconductive part and there was not much difference in the color of an electroconductive part and a nonconductive part, a conductive part and a nonconductive part It is thought that the pattern shape was not visually recognized. Further, the pattern shape and the cloudiness are correlated with the three-dimensional arithmetic average roughness SRa, and thus are evaluated using the three-dimensional arithmetic average roughness SRa. Among the parameters of the surface roughness, SRa is evaluated. Since there was no correlation with other parameters such as two-dimensional arithmetic average roughness Ra, it was not possible to evaluate using parameters other than SRa.
- a contact type resistivity meter product name “Loresta AX MCP-T370 type”, manufactured by Mitsubishi Chemical Analytech Inc., terminal shape: ASP probe
- K7194: 1994 resistivity test method of conductive plastic by 4-deep needle method
- the measurement of the surface resistance value with a contact-type resistivity meter is as follows. A conductive film cut out to a size of 80 mm ⁇ 50 mm is placed on a flat glass plate with the conductive part side as the upper surface and the conductive film is in a uniform flat state.
- the ASP probe was placed in the center of the conductive part, and all the electrode pins were pressed uniformly against the conductive part.
- ⁇ / ⁇ which is a mode for measuring sheet resistance
- the start button was pressed and held to obtain the measurement result.
- the surface resistance value was measured at three locations in the center of the conductive film, and the surface resistance value was an arithmetic average value of the surface resistance values at three locations.
- the surface resistance value was measured in an environment of 23 ° C. and a relative humidity of 55%.
- the total light transmittance is a value obtained by measuring the entire conductive film, and after cutting out to a size of 50 mm ⁇ 100 mm, the conductive part side is non-curled with no curls or wrinkles and no fingerprints or dust. It installed so that it might become the light source side, and it was set as the arithmetic average value of the value obtained by measuring 3 times with respect to 1 electroconductive film.
- the haze value (total haze value) of the conductive film was measured according to JIS K7136 using a haze meter (product name “HM-150”, manufactured by Murakami Color Research Laboratory). ) Were measured and found to be 1.0%.
- the haze value is a value when measured for the entire conductive film, and after cutting out to a size of 50 mm ⁇ 100 mm, the conductive part side is the non-light source side without curling or wrinkling and without fingerprints or dust The arithmetic average value of the values obtained by measuring three times for one conductive film was set.
- the silver nanowires were unevenly distributed on the polyethylene terephthalate film side from the half of the film thickness of the conductive part in the conductive part as a whole.
- the silver nanowires were unevenly distributed in the conductive film.
- the determination as to whether or not the silver nanowires were unevenly distributed on the polyethylene terephthalate film side from the half of the film thickness of the conductive part in the conductive part as a whole was performed as follows. Specifically, first, a sample for cross-sectional observation was prepared from a conductive film.
- the conductive film cut into 2 mm ⁇ 5 mm was placed in a silicone-based embedding plate, an epoxy resin was poured, and the entire conductive film was embedded with the resin. Thereafter, the embedding resin was allowed to stand at 65 ° C. for 12 hours or more to be cured. Thereafter, using an ultramicrotome (product name “Ultramicrotome EM UC7”, manufactured by Leica Microsystems), the delivery thickness was set to 100 nm, and ultrathin sections were prepared. The prepared ultrathin slice was collected with a mesh with a collodion membrane (150 mesh), and used as a sample for STEM.
- an ultramicrotome product name “Ultramicrotome EM UC7”, manufactured by Leica Microsystems
- each cross-sectional photograph is enlarged to the pixel level, and in each cross-sectional photograph, the number of pixels on which silver nanowires located on the polyethylene terephthalate film side from the half of the film thickness of the conductive part are displayed and the film of the conductive part Count the number of pixels on which silver nanowires located on the surface side of the conductive part are displayed from the half position of the thickness, and on the polyethylene terephthalate film side from the above half positions relative to the total number of pixels on which silver nanowires are displayed. The ratio of the number of pixels on which the silver nanowires located were displayed was determined.
- the pixel on which the silver nanowire is displayed straddles the half position, in each pixel, a portion existing on the polyethylene terephthalate film side from the half position and a conductive portion from the position. It is assumed that one pixel is divided based on the area ratio of the divided portion.
- the above-mentioned ratio obtained from each cross-sectional photograph is the abundance ratio of conductive fibers located on the polyethylene terephthalate film side from the position of half the film thickness of the conductive part, and the arithmetic average value of the existence ratio obtained from each cross-sectional photograph When the arithmetic average value was 55% or more, it was assumed to be unevenly distributed on the polyethylene terephthalate film side.
- the electric resistance value ratio was 1.5 or less in any of the folding tests described later. Specifically, first, one rectangular sample having a length of 125 mm and a width of 50 mm was cut out from the conductive film so as to include the conductive portion. After cutting the sample from the conductive film, a silver paste (trade name “DW-520H-14”, manufactured by Toyobo Co., Ltd.) is applied to a portion of 10 mm length ⁇ 50 mm width on both ends of the surface in the longitudinal direction of the sample. The sample was heated for 30 minutes at a temperature to obtain a hardened silver paste on both ends.
- DW-520H-14 manufactured by Toyobo Co., Ltd.
- the electrical resistance value of a sample provided with a hardened silver paste at both ends was measured using a tester (product name “Digital M ⁇ Hitester 3454-11”, manufactured by Hioki Electric Co., Ltd.).
- the Digital M ⁇ Hitester 3454-11 has two probe terminals (a red probe terminal and a black probe terminal, both of which are pin-shaped), so the red probe terminal is provided at one end.
- the electrical resistance was measured by contacting the cured silver paste and bringing the black probe terminal into contact with the cured silver paste provided at the other end.
- the short side (50 mm) side of the selected sample was fixed to a durability tester (product name “DLDMMLH-FS”, manufactured by Yuasa System Equipment Co., Ltd.) with a fixing portion, as shown in FIG.
- a durability tester product name “DLDMMLH-FS”, manufactured by Yuasa System Equipment Co., Ltd.
- the surface of the conductive part side of this sample is folded 180 ° (the conductive part is on the inside, the base part is mounted so that the minimum distance between the two opposing side parts is 6 mm (outer diameter of the bent part is 6 mm).
- the test of folding the material so that it is on the outside was performed 20,000 times. After the folding test, the electrical resistance value of the surface of the conductive portion was measured in the same manner as the sample before the folding test in the sample after the folding test.
- the ratio of the electrical resistance value of the sample after the folding test to the electrical resistance value of the sample before the selected folding test (the electrical resistance value of the sample after the selected folding test / the electrical resistance value before the folding test)
- the electrical resistance value of the sample was determined.
- a new sample selected by measuring the electrical resistance value in the same manner as described above was cut from the conductive film according to Examples 1 to 4, and attached to the durability tester in the same manner as described above.
- the electrical resistance value was measured to determine the electrical resistance value ratio.
- the electrical resistance value ratio was an arithmetic average value of values obtained by measuring three times.
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Abstract
Description
図1に示される導電性フィルム10は、光透過性基材11と、光透過性基材11の一方の面11A側に設けられた複数の光透過性の導電部12と、光透過性基材11の一方の面11A側に設けられ、かつ導電部12間に位置する光透過性の非導電部13と、光透過性基材11における導電部12および非導電部13側の面とは反対側の面である他方の面11B側に設けられた光透過性機能層14とを備えている。ただし、導電性フィルム10は、光透過性基材11と、導電部12と、非導電部13とを備えていればよく、光透過性機能層14を備えていなくともよい。光透過性機能層14は、他方の面11B側に設けられているが、光透過性機能層は、光透過性基材11と導電部12および非導電部13との間に設けられていてもよく、また光透過性機能層は、光透過性基材11における他方の面11B側のみならず、導電部12および非導電部13との間にも設けられていてもよい。また、図1に示される導電性フィルム10においては、片面側のみに導電部12および非導電部13が設けられているが、導電性フィルムの両面側に導電部が設けられていてもよい。導電性フィルム10の表面10Aは、導電部12の表面12Aおよび非導電部13の表面13Aから構成されている。 <<< Conductive film >>>
A
光透過性基材11としては、光透過性を有する樹脂からなる基材が挙げられる。このような樹脂としては、光透過性を有すれば特に限定されないが、例えば、ポリオレフィン系樹脂、ポリカーボネート系樹脂、ポリアクリレート系樹脂、ポリエステル系樹脂、芳香族ポリエーテルケトン系樹脂、ポリエーテルサルフォン系樹脂、アセチルセルロース系樹脂、ポリイミド系樹脂、ポリアミドイミド系樹脂、ポリアミド系樹脂、またはこれらの樹脂を2種以上混合した混合物等が挙げられる。 << light transmissive substrate >>
Examples of the
光透過性機能層14は、光透過性基材11における他方の面11B側に配置されている。本明細書における「光透過性機能層」とは、光透過性を有し、かつ導電性フィルムにおいて、何らかの機能を発揮することを意図された層である。具体的には、光透過性機能層としては、例えば、ハードコート機能、屈折率調整機能、溶出抑制機能および/または色味調整機能を発揮するための層が挙げられる。光透過性機能層は、単層のみならず、2層以上積層されたものであってもよい。光透過性機能層が2層以上積層されたものである場合、それぞれの層が有する機能は同じであってもよいが、異なっていてもよい。本実施形態においては、光透過性機能層14が、ハードコート機能を発揮する層、すなわちハードコート層である場合について説明する。 << Light-transmissive functional layer >>
The light transmissive
光透過性機能層14における光透過性樹脂としては、重合性化合物の重合体(硬化物、架橋物)を含むものが挙げられる。光透過性樹脂は、重合性化合物の重合体の他、溶剤乾燥型樹脂を含んでいてもよい。重合性化合物としては、電離放射線重合性化合物および/または熱重合性化合物が挙げられる。 <Light transmissive resin>
Examples of the light transmissive resin in the light transmissive
無機粒子は、光透過性機能層14の機械的強度や鉛筆強度を向上させるための成分であり、無機粒子としては、例えば、シリカ(SiO2)粒子、アルミナ粒子、チタニア粒子、酸化スズ粒子、アンチモンドープ酸化スズ(略称:ATO)粒子、酸化亜鉛粒子等の無機酸化物粒子が挙げられる。これらの中でも、硬度をより高める観点からシリカ粒子が好ましい。シリカ粒子としては、球形シリカ粒子や異形シリカ粒子が挙げられるが、これらの中でも、異形シリカ粒子が好ましい。本明細書における「球形粒子」とは、例えば、真球状、楕円球状等の粒子を意味し、「異形粒子」とは、ジャガイモ状のランダムな凹凸を表面に有する形状の粒子を意味する。上記異形粒子は、その表面積が球状粒子と比較して大きいため、このような異形粒子を含有することで、上記重合性化合物等との接触面積が大きくなり、光透過性機能層14の鉛筆硬度をより優れたものとすることができる。光透過性機能層14に含まれているシリカ粒子が異形シリカ粒子であるか否かは、光透過性機能層14の断面を透過型電子顕微鏡(TEM)または走査透過型電子顕微鏡(STEM)で観察することによって確認することができる。球形シリカ粒子を用いる場合、球形シリカ粒子の粒子径が小さいほど、光透過性機能層の硬度が高くなる。これに対し、異形シリカ粒子は、市販されている最も小さい粒子径の球形シリカ粒子ほど小さくなくとも、この球形シリカと同等の硬度を達成することができる。 <Inorganic particles>
The inorganic particles are components for improving the mechanical strength and pencil strength of the light-transmitting
有機粒子も、光透過性機能層14の機械的強度や鉛筆強度を向上させるための成分であり、有機粒子としては、例えば、プラスチックビーズを挙げることができる。プラスチックビーズとしては、具体例としては、ポリスチレンビーズ、メラミン樹脂ビーズ、アクリルビーズ、アクリル-スチレンビーズ、シリコーンビーズ、ベンゾグアナミンビーズ、ベンゾグアナミン・ホルムアルデヒド縮合ビーズ、ポリカーボネートビーズ、ポリエチレンビーズ等が挙げられる。 <Organic particles>
The organic particles are also components for improving the mechanical strength and pencil strength of the light-transmitting
導電部12は、図3に示されるように、光透過性樹脂15と、光透過性樹脂15中に配置された導電性繊維16とを含んでいる。本明細書における「導電部」とは、走査透過型電子顕微鏡(STEM)または透過型電子顕微鏡(TEM)を用い、断面を観察したときに、導電性繊維を含む層を意味する。導電部の界面が確認しにくい場合には、導電部の表面にスパッタ法によりPt-PdやAu等の金属層を形成する等の電子顕微鏡観察で一般的に用いられる前処理を行うとよい。また、四酸化オスミウム、四酸化ルテニウム、リンタングステン酸など染色処理を施すと、有機層間の界面が見やすくなるので、導電性フィルム全体を樹脂にて包埋した後、染色処理を行ってもよい。また、「導電部」とは、光透過性樹脂と、光透過性樹脂中に配置された導電性繊維を含み、かつ表面から導通可能な部分を意味し、層状のものおよび層状以外のものの両方を含む概念である。また、本明細書における「導電性繊維」とは、導電性を有し、かつ長さが太さ(例えば直径)に比べて十分に長い形状を持つものであり、例えば、概ね長さが太さの5倍以上のものは導電性繊維に含まれるものとする。また、図3に示されるように、導電部12の光透過性樹脂15は、非導電部13の光透過性樹脂15と繋がっていてもよい。導電部12は、光透過性樹脂15中に存在する反応抑制剤をさらに含むことが好ましい。 << Conductive part >>
As shown in FIG. 3, the
光透過性樹脂15は、導電部12からの導電性繊維16の脱離を防ぎ、かつ導電部12の耐久性や耐擦傷性を向上させるために、導電性繊維16を覆うものであるが、導電部12の表面12Aから電気的な導通が得られる程度に導電性繊維16を覆うものである。具体的には、上記したように一部の導電性繊維が、導電部の表面に露出していないと、導電部の表面から電気的な導通が得られないおそれがあるので、光透過性樹脂15は、一部の導電性繊維16が導電部12の表面12Aから露出するように導電性繊維16を覆っていることが好ましい。一部の導電性繊維16が導電部12の表面12Aに露出するように導電性繊維16を光透過性樹脂15で覆うためには、例えば、光透過性樹脂15の膜厚を調整すればよい。すなわち、光透過性樹脂の膜厚が厚すぎると、全ての導電性繊維が光透過性樹脂に埋もれてしまうことによって、一部の導電性繊維が導電部の表面に露出しなくなってしまい、導電部の表面から電気的な導通が得られないおそれがある。また、光透過性樹脂の膜厚が薄すぎると、導電部からの導電性繊維の脱離、導電部の耐久性の悪化、耐擦傷性の低下が生ずるおそれがあり、さらに導電性繊維が、全体として、導電部中において導電部の膜厚の半分の位置より光透過性基材側に偏在しなくなるおそれがある。このため、光透過性樹脂の膜厚を適度な厚みに調節する必要がある。 <Light transmissive resin>
The
反応抑制剤は、光透過性樹脂用組成物の塗布後に、導電性繊維16と雰囲気下の物質との反応による導電性低下を抑制するためのものである。反応抑制剤としては、例えば、ベンゾアゾール系化合物、トリアゾール系化合物、テトラゾール系化合物、イソシアヌル酸系化合物、アニリン系化合物等の窒素含有化合物等が挙げられる。反応抑制剤として用いられる窒素含有化合物としては、例えば、1-アミノベンゾアゾール、5-メチルベンゾトリアゾール、1,2,3-ベンゾトリアゾール、1-メチル-1H-テトラゾール-5-アミン、DL-α-トコフェロール、1-オクタデカンチオール、2-メルカプト-5-(トリフルオロメチル)ピリジン、イソシアヌル酸ジアリル、イソシアヌル酸ジアリルプロピル、6-アニリノ-1,3,5-トリアジン-2,4-ジチオール、チオシアヌル酸、3,5-ジメチル-1H-1,2,4-トリアゾール、4-(1,2,4-トリアゾール-1-イルメチル)アニリン、6-(ジブチルアミノ)-1,3,5-トリアジン-2,4-ジチオール、4-(1,2,4-トリアゾール-1-イル)アニリン、2-メチルチオ-ベンゾチアゾール、1-フェニル-5-メルカプト-1H-テトラゾール、5-メルカプト-1-メチルテトラゾール、5-(メチルチオ)-1H-テトラゾール、5-アミノ-1H-テトラゾール、1-(2-ジメチルアミノエチル)-5-メルカプトテトラゾール、1-(2-ジメチルアミノエチル)-5-メルカプトテトラゾール、1-(4-ヒドロキシフェニル)-5-メルカプト-1H-テトラゾール、3-アミノ-5-メルカプト-1,2,4-トリアゾール、3,5-ジアミノ-1,2,4-トリアゾールが挙げられる。 <Reaction inhibitor>
A reaction inhibitor is for suppressing the electrical conductivity fall by reaction with the
導電性繊維16は導電部12中に複数本存在していることが好ましい。導電性繊維16は、導電部12の表面12Aから電気的に導通可能となっているので、導電部12の厚み方向において導電性繊維16同士が接触している。 <Conductive fiber>
It is preferable that a plurality of
非導電部13は、導電部12間に位置し、かつ導電性を示さない部分である。本明細書においては、非導電部の表面における抵抗値(表面抵抗値)が、1500Ω/□以上であれば、非導電部は導電性を示さないと判断する。図3に示されるように、非導電部13は、光透過性樹脂を含み、実質的に導電性繊維16を含んでいない。本明細書における「非導電部が、実質的に導電性繊維を含んでいない」とは、導電部からの金属イオンのマイグレーションによって金属イオンが非導電部側に析出した場合であっても、導電部間の電気的な短絡が生じない程度であれば導電性繊維を若干含んでいてもよいことを意味する。非導電部13は、導電性繊維16を全く含んでいないことが好ましい。なお、後述するようにレーザー光で導電性繊維16を昇華させることによって、非導電部13から導電性繊維16を除去する際に、導電性繊維16を構成する導電性材料が残存するおそれがあるが、この導電性材料は繊維状ではないので、導電性繊維とはみなさない。本明細書においては、レーザー光によるエッチングを、ドライエッチングと称する。 << Non-conductive part >>
The
(測定条件)
・対物レンズ:50倍
・Zoom:1倍
・測定領域:218μm×218μm
・解像度(1点当たりの間隔):0.22μm
・scan Length:5μm
・min mod:0.001%
(解析条件)
・Removed:Plane
・Filter:High Pass
・FilterType:GaussSpline
・Low wavelength:250μm
・High wavelength:3μm
・Remove spikes: on
・Spike Height(xRMS):2.5
・解析範囲:非導電部幅(μm)×218μm When obtaining the SRa on the surface of the non-conductive part using a white interference microscope (product name “New View 7300”, manufactured by Zygo), first, the size including the non-conductive part is 218 μm square or more from the conductive film. Obtain one or more samples. The size of each sample is sufficient if it is about 1 cm square in consideration of handling properties, and each sample is cut out from an arbitrary portion where no dirt or fingerprints are attached to the conductive film. Then, under the following measurement conditions and analysis conditions, five SRa are measured for each sample on the surface of the non-conductive part, and the arithmetic average value of SRa at five or more points is defined as SRa. In the New View 7300, SRa is displayed as “Ra”, but Ra measured by the New View 7300 is a three-dimensional arithmetic average roughness, and a two-dimensional arithmetic average roughness Ra defined by JIS B0601: 2013. Is different. Note that the measurement / analysis software uses Microscope Application 9.0.10 Microscope Application. The following low wavelength corresponds to the cut-off value λc in the roughness parameter.
(Measurement condition)
・ Objective lens: 50 times ・ Zoom: 1 time ・ Measurement area: 218 μm × 218 μm
・ Resolution (interval per point): 0.22 μm
・ Scan Length: 5μm
・ Min mod: 0.001%
(Analysis conditions)
-Removed: Plane
-Filter: High Pass
-FilterType: GaussSpline
・ Low wavelength: 250 μm
・ High wavelength: 3 μm
・ Remove spikes: on
Spike Height (xRMS): 2.5
・ Analysis range: Non-conductive part width (μm) × 218 μm
(測定条件)
・対物レンズ:50倍
・Zoom:1倍
・測定領域:218μm×218μm
・解像度(1点当たりの間隔):0.22μm
・scan Length:5μm
・min mod:0.001%
(解析条件)
・Removed:Plane
・Filter:High Pass
・FilterType:GaussSpline
・Low wavelength:250μm
・High wavelength:3μm
・Remove spikes: on
・Spike Height(xRMS):2.5
・解析範囲:30μm×218μm Specifically, using the above New View 7300, for example, the width of the non-conductive portion is 30 μm, and the width of the two conductive portions adjacent to the non-conductive portion is 3 mm or more, respectively. When obtaining the SRa on the surface of the conductive part, first, the conductive film is cut out so that the width of the conductive part is 3 mm and the length of the conductive part and the non-conductive part is 45 mm. One to three samples having a non-conductive part with a width of 30 μm sandwiched between the parts are obtained. Then, under the following measurement conditions and analysis conditions, SRa is measured at five locations for each sample on the surface of the non-conductive portion, and the arithmetic average value of SRa at a total of 5 to 15 points is defined as SRa.
(Measurement condition)
・ Objective lens: 50 times ・ Zoom: 1 time ・ Measurement area: 218 μm × 218 μm
・ Resolution (interval per point): 0.22 μm
・ Scan Length: 5μm
・ Min mod: 0.001%
(Analysis conditions)
-Removed: Plane
-Filter: High Pass
-FilterType: GaussSpline
・ Low wavelength: 250 μm
・ High wavelength: 3 μm
・ Remove spikes: on
Spike Height (xRMS): 2.5
・ Analysis range: 30 μm × 218 μm
導電性フィルム10は、例えば、以下のようにして作製することができる。まず、図6(A)に示されるように、光透過性基材11の他方の面11Bに光透過性機能層用組成物を塗布し、乾燥させて、光透過性機能層用組成物の塗膜31を形成する。 << Method for producing conductive film >>
The
溶剤としては、例えば、アルコール類(メタノール、エタノール、プロパノール、イソプロパノール、n-ブタノール、s-ブタノール、t-ブタノール、ベンジルアルコール、PGME、エチレングリコール等)、ケトン類(アセトン、メチルエチルケトン(MEK)、シクロヘキサノン、メチルイソブチルケトン、ジアセトンアルコール、シクロヘプタノン、ジエチルケトン等)、エーテル類(1,4-ジオキサン、ジオキソラン、ジイソプロピルエーテルジオキサン、テトラヒドロフラン等)、脂肪族炭化水素類(ヘキサン等)、脂環式炭化水素類(シクロヘキサン等)、芳香族炭化水素類(トルエン、キシレン等)、ハロゲン化炭素類(ジクロロメタン、ジクロロエタン等)、エステル類(蟻酸メチル、酢酸メチル、酢酸エチル、酢酸プロピル、酢酸ブチル、乳酸エチル等)、セロソルブ類(メチルセロソルブ、エチルセロソルブ、ブチルセロソルブ等)、セロソルブアセテート類、スルホキシド類(ジメチルスルホキシド等)、アミド類(ジメチルホルムアミド、ジメチルアセトアミド等)、またはこれらの混合物が挙げられる。 <Solvent>
Examples of the solvent include alcohols (methanol, ethanol, propanol, isopropanol, n-butanol, s-butanol, t-butanol, benzyl alcohol, PGME, ethylene glycol, etc.), ketones (acetone, methyl ethyl ketone (MEK), cyclohexanone, etc. , Methyl isobutyl ketone, diacetone alcohol, cycloheptanone, diethyl ketone, etc.), ethers (1,4-dioxane, dioxolane, diisopropyl ether dioxane, tetrahydrofuran, etc.), aliphatic hydrocarbons (hexane, etc.), alicyclic Hydrocarbons (cyclohexane, etc.), aromatic hydrocarbons (toluene, xylene, etc.), halogenated carbons (dichloromethane, dichloroethane, etc.), esters (methyl formate, methyl acetate, ethyl acetate, vinegar) Propyl, butyl acetate, ethyl lactate, etc.), cellosolves (methyl cellosolve, ethyl cellosolve, butyl cellosolve, etc.), cellosolve acetates, sulfoxides (dimethylsulfoxide, etc.), amides (dimethylformamide, dimethylacetamide, etc.), or a mixture thereof Is mentioned.
重合開始剤は、光または熱により分解されて、ラジカルやイオン種を発生させて重合性化合物の重合(架橋)を開始または進行させる成分である。光透過性機能層用組成物に用いられる重合開始剤は、光重合開始剤(例えば、光ラジカル重合開始剤、光カチオン重合開始剤、光アニオン重合開始剤)や熱重合開始剤(例えば、熱ラジカル重合開始剤、熱カチオン重合開始剤、熱アニオン重合開始剤)、またはこれらの混合物が挙げられる。 <Polymerization initiator>
The polymerization initiator is a component that is decomposed by light or heat to generate radicals or ionic species to initiate or advance polymerization (crosslinking) of the polymerizable compound. The polymerization initiator used in the composition for a light-transmitting functional layer is a photopolymerization initiator (for example, a photo radical polymerization initiator, a photo cationic polymerization initiator, a photo anion polymerization initiator) or a thermal polymerization initiator (for example, a heat A radical polymerization initiator, a thermal cationic polymerization initiator, a thermal anionic polymerization initiator), or a mixture thereof.
図9に示されるように、画像表示装置40は、主に、画像を表示するための表示パネル50と、表示パネル50の背面側に配置されたバックライト装置60と、表示パネル50よりも観察者側に配置されたタッチパネル70と、表示パネル50とタッチパネル70との間に介在した光透過性接着層90とを備えている。本実施形態においては、表示パネル50が液晶表示パネルであるので、画像表示装置40がバックライト装置60を備えているが、表示パネル(表示素子)の種類によってはバックライト装置60を備えていなくともよい。 <<< Image display device >>>
As shown in FIG. 9, the
表示パネル50は、図9に示されるように、バックライト装置60側から観察者側に向けて、トリアセチルセルロースフィルム(TACフィルム)やシクロオレフィンポリマーフィルム等の保護フィルム51、偏光子52、保護フィルム53、光透過性粘着層54、表示素子55、光透過性粘着層56、保護フィルム57、偏光子58、保護フィルム59の順に積層された構造を有している。表示パネル50は、表示素子55を備えていればよく、保護フィルム51等は備えていなくともよい。 << Display panel >>
As shown in FIG. 9, the
バックライト装置60は、表示パネル50の背面側から表示パネル50を照明するものである。バックライト装置60としては、公知のバックライト装置を用いることができ、またバックライト装置60はエッジライト型や直下型のバックライト装置のいずれであってもよい。 << Backlight device >>
The
タッチパネル70は、導電性フィルム80と、導電性フィルム80より観察者側に配置された導電性フィルム10と、導電性フィルム10より観察者側に配置されたカバーガラス等の光透過性カバー部材71と、導電性フィルム10と導電性フィルム80との間に介在した光透過性粘着層72と、導電性フィルム10と光透過性カバー部材71との間に介在した光透過性粘着層73とを備えている。 << Touch panel >>
The
導電性フィルム80は、導電性フィルム10と同様の構造となっている。すなわち、導電性フィルム80は、図10に示されるように、光透過性基材81と、光透過性基材81の一方の面側に設けられた複数の光透過性の導電部82と、光透過性基材81の一方の面側に設けられ、かつ導電部82間に位置する光透過性の非導電部83と、光透過性基材81における導電部82および非導電部83側の面とは反対側の面側に設けられた光透過性機能層84とを備えている。光透過性基材81は光透過性基材11と同様のものであり、光透過性機能層84は光透過性機能層14と同様のものであるので、ここでは説明を省略するものとする。 <Conductive film>
The
導電部82は、導電部12と同様の構造になっている。すなわち、導電部82は光透過性樹脂と、光透過性樹脂中に配置された導電性繊維とから構成されている。非導電部83は光透過性樹脂から構成されており、実質的に導電性繊維を含んでいない。 (Conductive and non-conductive parts)
The
光透過性粘着層72、73は、例えば、OCA(Optical Clear Adhesive)のような粘着シートが挙げられる。光透過性粘着層72、73の代わりに、光透過性接着層を用いてもよい。 <Light transmissive adhesive layer>
Examples of the light transmissive
光透過性接着層90は、表示パネル50とタッチパネル70との間に介在し、かつ表示パネル50とタッチパネル70の両方に接着されている。これにより、表示パネル50とタッチパネル70とが固定されている。光透過性接着層90は、例えば、OCR(Optically Clear Resin)のような重合性化合物を含む液状の硬化性接着層用組成物の硬化物から構成されている。 << light transmissive adhesive layer >>
The light transmissive
まず、下記に示す組成となるように各成分を配合して、ハードコート層用組成物1を得た。
(ハードコート層用組成物1)
・ペンタエリスリトールトリアクリレートとペンタエリスリトールテトラアクリレートの混合物(製品名「KAYARAD-PET-30」、日本化薬社製):30質量部
・重合開始剤(製品名「イルガキュア184」、BASFジャパン社製):1.5質量部
・メチルエチルケトン(MEK):50質量部
・シクロヘキサノン:18.5質量部 <Adjustment of composition for hard coat layer>
First, each component was mix | blended so that it might become a composition shown below, and the composition 1 for hard-coat layers was obtained.
(Composition 1 for hard coat layer)
-A mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate (product name "KAYARAD-PET-30", manufactured by Nippon Kayaku Co., Ltd.): 30 parts by mass-polymerization initiator (product name "Irgacure 184", manufactured by BASF Japan) : 1.5 parts by mass-Methyl ethyl ketone (MEK): 50 parts by mass-Cyclohexanone: 18.5 parts by mass
(銀ナノワイヤ含有組成物1)
還元剤としてエチレングリコール(EG)を、有機保護剤としてポリビニルピロリドン(PVP:平均分子量130万、アルドリッチ社製)を使用し、下記に示した核形成工程と粒子成長工程とを分離して粒子形成を行い、銀ナノワイヤ含有組成物を調製した。 <Preparation of silver nanowire-containing composition>
(Silver nanowire-containing composition 1)
Using ethylene glycol (EG) as the reducing agent and polyvinylpyrrolidone (PVP: average molecular weight 1.3 million, manufactured by Aldrich) as the organic protective agent, the nucleation step and the particle growth step shown below are separated to form particles. The silver nanowire containing composition was prepared.
反応容器内で160℃に保持したEG液100mLを攪拌しながら、硝酸銀のEG溶液(硝酸銀濃度:1.0モル/L)2.0mLを、一定の流量で1分間かけて添加した。その後、160℃で10分間保持しながら銀イオンを還元して銀の核粒子を形成した。反応液は、ナノサイズの銀微粒子の表面プラズモン吸収に由来する黄色を呈しており、銀イオンが還元されて銀の微粒子(核粒子)が形成されたことを確認した。続いて、PVPのEG溶液(PVP濃度:3.0×10-1モル/L)10.0mLを一定の流量で10分間かけて添加した。 1. Nucleation step While stirring 100 mL of EG solution maintained at 160 ° C. in a reaction vessel, 2.0 mL of an EG solution of silver nitrate (silver nitrate concentration: 1.0 mol / L) was added at a constant flow rate over 1 minute. . Thereafter, the silver ions were reduced while being held at 160 ° C. for 10 minutes to form silver core particles. The reaction solution exhibited a yellow color derived from surface plasmon absorption of nano-sized silver fine particles, and it was confirmed that silver ions were reduced to form silver fine particles (nuclear particles). Subsequently, 10.0 mL of an EG solution of PVP (PVP concentration: 3.0 × 10 −1 mol / L) was added at a constant flow rate over 10 minutes.
上記核形成工程を終了した後の核粒子を含む反応液を、攪拌しながら160℃に保持し、硝酸銀のEG溶液(硝酸銀濃度:1.0×10-1モル/L)100mLと、PVPのEG溶液(PVP濃度:3.0×10-1モル/L)100mLを、ダブルジェット法を用いて一定の流量で120分間かけて添加した。この粒子成長工程において、30分毎に反応液を採取して電子顕微鏡で確認したところ、核形成工程で形成された核粒子が時間経過に伴ってワイヤ状の形態に成長しており、粒子成長工程における新たな微粒子の生成は認められなかった。最終的に得られた銀ナノワイヤの繊維径および繊維長を測定したところ、銀ナノワイヤの繊維径は30nmであり、繊維長は15μmであった。銀ナノワイヤの繊維径は、透過型電子顕微鏡(TEM)を用い、1000~50万倍にて50本の導電性繊維の繊維径を測定し、その50本の導電性繊維の繊維径の算術平均値として求めた。また、銀ナノワイヤの繊維長は、走査型電子顕微鏡(SEM)を用い、1000~50万倍にて50本の導電性繊維の繊維長を測定し、その50本の導電性繊維の繊維長の算術平均値として求めた。なお、以下の銀ナノワイヤの繊維径および繊維長も同様にして求めた。 2. Grain growth step The reaction liquid containing the nuclei particles after the nucleation step is held at 160 ° C. with stirring, and 100 mL of an EG solution of silver nitrate (silver nitrate concentration: 1.0 × 10 −1 mol / L) 100 mL of an EG solution of PVP (PVP concentration: 3.0 × 10 −1 mol / L) was added over 120 minutes at a constant flow rate using the double jet method. In this particle growth process, the reaction solution was sampled every 30 minutes and confirmed with an electron microscope. As a result, the core particles formed in the nucleation process grew into a wire-like form over time. Formation of new fine particles in the process was not observed. When the fiber diameter and fiber length of the finally obtained silver nanowire were measured, the fiber diameter of the silver nanowire was 30 nm and the fiber length was 15 μm. The fiber diameter of the silver nanowire was measured by measuring the fiber diameter of 50 conductive fibers at 1000 to 500,000 times using a transmission electron microscope (TEM), and the arithmetic average of the fiber diameters of the 50 conductive fibers Obtained as a value. Further, the fiber length of the silver nanowires was determined by measuring the fiber length of 50 conductive fibers at 1000 to 500,000 times using a scanning electron microscope (SEM) and measuring the fiber length of the 50 conductive fibers. The arithmetic average value was obtained. In addition, the fiber diameter and fiber length of the following silver nanowire were calculated | required similarly.
粒子成長工程を終了した反応液を室温まで冷却した後、分画分子量0.2μmの限外濾過膜を用いて脱塩水洗処理を施すとともに、溶媒をエタノールに置換した。最後に液量を100mLまで濃縮して、銀ナノワイヤ分散液を調製した。最後に、銀ナノワイヤ濃度が0.1質量%となるようにエタノールで希釈し、銀ナノワイヤ含有組成物1を得た。 3. Desalted water washing step After the reaction solution having finished the particle growth step was cooled to room temperature, it was subjected to a desalted water washing process using an ultrafiltration membrane having a fractional molecular weight of 0.2 μm, and the solvent was replaced with ethanol. Finally, the liquid volume was concentrated to 100 mL to prepare a silver nanowire dispersion. Finally, it diluted with ethanol so that silver nanowire density | concentration might be 0.1 mass%, and the silver nanowire containing composition 1 was obtained.
下記に示す組成となるように各成分を配合して、光透過性樹脂用組成物1を得た。
(光透過性樹脂用組成物1)
・ペンタエリスリトールトリアクリレートとペンタエリスリトールテトラアクリレートの混合物(製品名「KAYARAD-PET-30」、日本化薬社製):5質量部
・重合開始剤(製品名「イルガキュア184」、BASFジャパン社製):0.25質量部
・メチルエチルケトン(MEK):70質量部
・シクロヘキサノン:24.75質量部 <Preparation of composition for light transmissive resin>
Each component was mix | blended so that it might become the composition shown below, and the composition 1 for light transmissive resin was obtained.
(Light-transmissive resin composition 1)
-A mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate (product name "KAYARAD-PET-30", manufactured by Nippon Kayaku Co., Ltd.): 5 parts by mass-polymerization initiator (product name "Irgacure 184", manufactured by BASF Japan) : 0.25 parts by mass-Methyl ethyl ketone (MEK): 70 parts by mass-Cyclohexanone: 24.75 parts by mass
まず、光透過性基材としての片面に下地層を有する厚さ50μmのポリエチレンテレフタレートフィルム(製品名「コスモシャインA4100」、東洋紡社製)を準備し、ポリエチレンテレフタレートフィルムの片面に、ハードコート層組成物を塗布し、塗膜を形成した。次いで、形成した塗膜に対して、0.5m/sの流速で50℃の乾燥空気を15秒間流通させた後、さらに10m/sの流速で70℃の乾燥空気を30秒間流通させて乾燥させることにより塗膜中の溶剤を蒸発させ、紫外線を積算光量が100mJ/cm2になるように照射して塗膜を硬化させることにより、光透過性機能層としての膜厚が2μmのハードコート層を形成した。 <Example 1>
First, a 50 μm-thick polyethylene terephthalate film (product name “Cosmo Shine A4100”, manufactured by Toyobo Co., Ltd.) having a base layer on one side as a light-transmitting substrate is prepared. The product was applied to form a coating film. Next, 50 ° C. dry air was passed through the formed coating film at a flow rate of 0.5 m / s for 15 seconds, and then 70 ° C. dry air was passed through for 30 seconds at a flow rate of 10 m / s. By evaporating the solvent in the coating film and irradiating it with ultraviolet rays so that the integrated light quantity becomes 100 mJ / cm 2 to cure the coating film, thereby forming a hard coat with a film thickness of 2 μm as a light-transmitting functional layer A layer was formed.
(レーザー光照射条件)
・種類:YVO4
・波長:1064nm
・パルス幅:8~10ns
・周波数:100kHz
・スポット径:30μm
・パルスエネルギー:16μJ
・加工速度:1200mm/s After forming the conductive layer, the region that becomes the non-conductive portion was irradiated with laser light under the following conditions, and the silver nanowires existing in this region were sublimated and removed, thereby patterning the conductive layer. Thereby, the electroconductive film which has a 30-micrometer-wide linear nonelectroconductive part located between an electroconductive part and an electroconductive part was obtained.
(Laser irradiation conditions)
・ Type: YVO4
・ Wavelength: 1064nm
・ Pulse width: 8-10ns
・ Frequency: 100 kHz
・ Spot diameter: 30μm
・ Pulse energy: 16μJ
・ Processing speed: 1200mm / s
実施例3においては、レーザー光のパルスエネルギーを10μJとしたこと以外は、実施例1と同様にして、導電性フィルムを得た。 <Example 2>
In Example 3, a conductive film was obtained in the same manner as in Example 1 except that the pulse energy of the laser beam was 10 μJ.
実施例3においては、レーザー光のパルスエネルギーを24μJとし、かつ加工速度を800mm/sとしたこと以外は、実施例1と同様にして、導電性フィルムを得た。 <Example 3>
In Example 3, a conductive film was obtained in the same manner as in Example 1 except that the pulse energy of the laser beam was 24 μJ and the processing speed was 800 mm / s.
実施例4においては、レーザー光のパルスエネルギーを24μJとし、かつ400mm/sとしたこと以外は、実施例1と同様にして、導電性フィルムを得た。 <Example 4>
In Example 4, a conductive film was obtained in the same manner as in Example 1 except that the pulse energy of the laser light was 24 μJ and 400 mm / s.
比較例1においては、レーザー光のパルスエネルギーを10μJとし、かつ加工速度を1500mm/sとしたこと以外は、実施例1と同様にして、導電性フィルムを得た。 <Comparative Example 1>
In Comparative Example 1, a conductive film was obtained in the same manner as in Example 1 except that the pulse energy of the laser beam was 10 μJ and the processing speed was 1500 mm / s.
実施例および比較例に係る導電性フィルムの非導電部の表面における三次元算術平均粗さSRaを、白色干渉顕微鏡(製品名「New View7300」、Zygo社製)を用いて、非導電部の表面における上記三次元算術平均粗さSRaを求めた。具体的には、まず、幅30μmの非導電部に隣接している2つ導電部の幅がそれぞれ3mmとなり、かつ長さが45mmとなるように、導電性フィルムを切り出し、幅3mmの導電部によって挟まれた幅30μmの非導電部を有する3つのサンプルを得た。各サンプルは、汚れや指紋等が付着していない任意の箇所から切り出した。そして、以下の測定条件および解析条件で、各サンプルの非導電部の表面においてSRaを5箇所において測定し、計15点のSRaの算術平均値をSRaとした。測定・解析ソフトにはMetroPro ver9.0.10のMicroscope Applicationを用いた。また、下記のLow wavelengthは、粗さパラメータにおけるカットオフ値λcに相当するものである。また、解析を行う際には、観察領域から非導電部のみのSRaを算出するために以下の手順に沿って非導電部にマスクをかけた状態で、非導電のみ解析を行った。
(測定条件)
・対物レンズ:50倍
・Zoom:1倍
・測定領域:218μm×218μm
・解像度(1点当たりの間隔):0.22μm
・scan Length:5μm
・min mod:0.001%
(解析条件)
・Removed:Plane
・Filter:High Pass
・FilterType:GaussSpline
・Low wavelength:250μm
・High wavelength:3μm
・Remove spikes: on
・Spike Height(xRMS):2.5
・解析範囲:30μm×218μm
(非導電のみ解析を行う手順)
まず、Microscope Applocation上のLoad Dataからマスクをかけたいサンプルのデータ(datファイル)を読み込んだ。次に、上記画面上のMask dataボタンを押し、Mask Editor画面を表示させた。Mask Editor画面上にAuto Inclボタンが表示されていることを確認し、表示されていない場合は、Auto Exclボタンをクリックし表示させた。同画面上のRectanceボタンをクリックし、width、heightに解析する領域のマスクサイズ(width 0.03mm、height 0.218mm)を入力しその左に表示されているApplyボタンをクリックした。Applyボタンをクリックすると、同画面上に表示されている観察画像上に指定したサイズの白い枠が表示された。Moveボタンを押してから、白い枠をドラックすると観察画像上の任意の位置に移動させることができるので非導電部上に移動させた。その後同画面上のBG Inclボタンを押し、Microscope Applocation画面上のAnalyzeボタンを押し、導電部を解析範囲から除外した。その状態で同画面上に「Ra」を表示させ、非導電部の表面における三次元算術平均粗さSRaとした。 <Three-dimensional arithmetic average roughness SRa measurement of non-conductive part surface>
Using the white interference microscope (product name “New View 7300”, manufactured by Zygo), the surface of the non-conductive part is measured using the white interference microscope (product name “New View 7300”) on the surface of the non-conductive part of the conductive film according to Example and Comparative Example The three-dimensional arithmetic average roughness SRa was determined. Specifically, first, the conductive film was cut out so that the width of the two conductive portions adjacent to the non-conductive portion having a width of 30 μm was 3 mm and the length was 45 mm, and the conductive portion having a width of 3 mm was obtained. Three samples having a non-conductive part with a width of 30 μm sandwiched between the two were obtained. Each sample was cut out from an arbitrary portion where no dirt or fingerprints were attached. And SRa was measured in five places on the surface of the non-conductive part of each sample on the following measurement conditions and analysis conditions, and the arithmetic average value of 15 SRa in total was set to SRa. As a measurement / analysis software, Microscope Application 9.0.10 Microscope Application was used. The following low wavelength corresponds to the cut-off value λc in the roughness parameter. Further, when performing the analysis, only the non-conductive portion was analyzed in a state where the non-conductive portion was masked according to the following procedure in order to calculate the SRa of only the non-conductive portion from the observation region.
(Measurement condition)
・ Objective lens: 50 times ・ Zoom: 1 time ・ Measurement area: 218 μm × 218 μm
・ Resolution (interval per point): 0.22 μm
・ Scan Length: 5μm
・ Min mod: 0.001%
(Analysis conditions)
-Removed: Plane
-Filter: High Pass
-FilterType: GaussSpline
・ Low wavelength: 250 μm
・ High wavelength: 3 μm
・ Remove spikes: on
Spike Height (xRMS): 2.5
・ Analysis range: 30 μm × 218 μm
(Procedure for analyzing non-conductive only)
First, sample data (dat file) to be masked was loaded from the Load Data on the Microscope Application. Next, the Mask data button on the screen was pressed to display the Mask Editor screen. It was confirmed that the Auto Incl button was displayed on the Mask Editor screen, and when it was not displayed, the Auto Excl button was clicked and displayed. The Rectance button on the same screen was clicked, and the mask size (width 0.03 mm, height 0.218 mm) of the area to be analyzed was input to width and height, and the Apply button displayed on the left side was clicked. When the Apply button was clicked, a white frame of a specified size was displayed on the observation image displayed on the same screen. When the white frame is dragged after pressing the Move button, it can be moved to an arbitrary position on the observation image, and thus moved to the non-conductive portion. Thereafter, a BG Inc1 button on the same screen was pressed, an Analyze button on the Microscope Application screen was pressed, and the conductive portion was excluded from the analysis range. In this state, “Ra” was displayed on the screen, and the three-dimensional arithmetic average roughness SRa on the surface of the non-conductive portion was obtained.
実施例および比較例に係る導電性フィルムの電気的短絡を評価した。具体的には、まず、幅30μmの非導電部に隣接している2つ導電部の幅がそれぞれ3mmとなり、かつ長さが45mmとなるように、導電性フィルムを切り出し、幅3mmの導電部によって挟まれた幅30μmの非導電部を有するサンプルを得た。次いで、テスター(製品名「Digital MΩ Hitester 3454-11」、日置電機社製)を用いて、一方の導電部と他方の導電部との間に電流が流れるか否か評価した。その後、65℃および相対湿度95%の環境下で、サンプルの一方の導電部に32Vの電圧を100時間印加する耐久性試験を行った。耐久性試験後、テスター(製品名「Digital MΩ Hitester 3454-11」、日置電機社製)を用いて、一方の導電部と他方の導電部との間に電流が流れるか否かを評価することによって電気的に短絡しているか否かを評価した。評価基準は以下の通りとした。
○:耐久性試験前のみならず、耐久性試験後も導電部間に電流が流れなかった。
×:耐久性試験前においては導電部間に電流が流れなかったが、耐久性試験後においては導電部間に電流が流れた。 <Electrical short-circuit evaluation>
The electrical short circuit of the conductive film which concerns on an Example and a comparative example was evaluated. Specifically, first, the conductive film was cut out so that the width of the two conductive portions adjacent to the non-conductive portion having a width of 30 μm was 3 mm and the length was 45 mm, and the conductive portion having a width of 3 mm was obtained. A sample having a non-conductive portion with a width of 30 μm sandwiched between the layers was obtained. Next, using a tester (product name “Digital MΩ Hitester 3454-11”, manufactured by Hioki Electric Co., Ltd.), it was evaluated whether or not a current flows between one conductive part and the other conductive part. Thereafter, a durability test was performed in which a voltage of 32 V was applied to one conductive part of the sample for 100 hours in an environment of 65 ° C. and a relative humidity of 95%. After the durability test, use a tester (product name “Digital MΩ Hitester 3454-11”, manufactured by Hioki Electric Co., Ltd.) to evaluate whether current flows between one conductive part and the other. It was evaluated whether it was electrically short-circuited by. The evaluation criteria were as follows.
○: Current did not flow between the conductive parts not only before the durability test but also after the durability test.
X: Current did not flow between the conductive parts before the durability test, but current flowed between the conductive parts after the durability test.
実施例および比較例に係る導電性フィルムにおいて、導電性フィルムの表面を光で照らしたときに、導電部または非導電部のパターン形状が視認されるか否か評価を行った。具体的には、まず、水平な台の上に、黒色アクリル板を置き、その上に導電部側が上側となるように導電性フィルムを置いた。導電性フィルムは50mm×100mmの大きさに切り出したものであり、カールや皺がなく、かつ指紋や埃等がない状態で黒色アクリル板上に配置された。その後、導電性フィルムの4隅を、さらにテープ(製品名「セロテープ(登録商標)」、ニチバン社製)で固定した。そして、導電性フィルムの表面の照度が1000ルクスとなるように導電性フィルムの表面を3波長蛍光ランプ(製品名「あかりん棒」、日立アプライアンス社製)からの光で照らし、導電性フィルムの表面から30cmの距離(視認距離)においてあらゆる角度からも目視して、導電部および非導電部のパターン形状が視認されるか評価した。また、同様に、導電性フィルムの表面の照度が10000ルクスとなるように導電性フィルムの表面をLED光源(製品名「MG-286R」、GENTOS社製)からの光で照らし、導電性フィルムの表面から30cmの距離(視認距離)においてあらゆる角度からも目視して、導電部および非導電部のパターン形状が視認されるか評価した。評価基準は以下の通りとした。
○:照度10000ルクスでの観察で導電部および非導電部のパターン形状が視認されなかった。
△:照度1000ルクスでの観察で導電部および非導電部のパターン形状が視認されなかったが、照度10000ルクスでの観察で導電部または非導電部のパターン形状が視認されなかった。
×:照度1000ルクスでの観察で導電部および非導電部のパターン形状が視認された。 <Evaluation of visual recognition of pattern shape>
In the electroconductive film which concerns on an Example and a comparative example, when the surface of the electroconductive film was illuminated with light, it was evaluated whether the pattern shape of an electroconductive part or a nonelectroconductive part was visually recognized. Specifically, first, a black acrylic plate was placed on a horizontal base, and a conductive film was placed thereon so that the conductive portion side was on the upper side. The conductive film was cut to a size of 50 mm × 100 mm, and was placed on a black acrylic plate without curling or wrinkling and without fingerprints or dust. Thereafter, the four corners of the conductive film were further fixed with a tape (product name “Cello Tape (registered trademark)”, manufactured by Nichiban Co., Ltd.). The surface of the conductive film is illuminated with light from a three-wavelength fluorescent lamp (product name “Akarin stick”, manufactured by Hitachi Appliances) so that the illuminance on the surface of the conductive film becomes 1000 lux. It was visually observed from all angles at a distance of 30 cm (viewing distance) to evaluate whether the pattern shapes of the conductive part and the non-conductive part were visually recognized. Similarly, the surface of the conductive film is illuminated with light from an LED light source (product name “MG-286R”, manufactured by GENTOS) so that the illuminance on the surface of the conductive film is 10,000 lux. It was visually observed from every angle at a distance of 30 cm (viewing distance) from the surface, and it was evaluated whether the pattern shapes of the conductive part and the non-conductive part were visually recognized. The evaluation criteria were as follows.
A: The pattern shape of the conductive part and the non-conductive part was not visually recognized by observation at an illuminance of 10,000 lux.
(Triangle | delta): Although the pattern shape of the electroconductive part and the non-conductive part was not visually recognized by observation by illumination intensity 1000 lux, the pattern shape of the conductive part or non-conductive part was not visually recognized by observation by illumination intensity 10000 lux.
X: The pattern shape of the electroconductive part and the non-conductive part was visually recognized by observation at the illumination intensity of 1000 lux.
実施例および比較例に係る導電性フィルムにおいて、導電性フィルムの表面を光で照らしたときに、非導電部に白濁感が観察されるか否か評価を行った。具体的には、まず、水平な台の上に、黒色アクリル板を置き、その上に導電部側が上側となるように導電性フィルムを置いた。導電性フィルムは50mm×100mmの大きさに切り出したものであり、カールや皺がなく、かつ指紋や埃等がない状態で黒色アクリル板上に配置された。その後、導電性フィルムの4隅を、さらにテープ(製品名「セロテープ(登録商標)」、ニチバン社製)で固定した。そして、導電性フィルムの表面の照度が1000ルクスとなるように導電性フィルムの表面を3波長蛍光ランプ(製品名「あかりん棒」、日立アプライアンス社製)からの光で照らし、導電性フィルムの表面から30cmの距離(視認距離)においてあらゆる角度からも目視して、非導電部に白濁感が観察されるか評価した。また、同様に、導電性フィルムの表面の照度が10000ルクスとなるように導電性フィルムの表面をLED光源(製品名「MG-286R」、GENTOS社製)からの光で照らし、導電性フィルムの表面から30cmの距離(視認距離)においてあらゆる角度からも目視して、非導電部に白濁感が観察されるか評価した。評価基準は以下の通りとした。
○:照度10000ルクスでの観察で非導電部に白濁感が観察されなかった。
△:照度1000ルクスでの観察で非導電部に白濁感が観察されなかったが、照度10000ルクスでの観察で非導電部に白濁感が観察された。
×:照度1000ルクスでの観察で非導電部に白濁感が観察された。 <Evaluation of cloudiness>
In the electroconductive film which concerns on an Example and a comparative example, when the surface of the electroconductive film was illuminated with light, it was evaluated whether a cloudiness feeling was observed in a nonelectroconductive part. Specifically, first, a black acrylic plate was placed on a horizontal base, and a conductive film was placed thereon so that the conductive portion side was on the upper side. The conductive film was cut to a size of 50 mm × 100 mm, and was placed on a black acrylic plate without curling or wrinkling and without fingerprints or dust. Thereafter, the four corners of the conductive film were further fixed with a tape (product name “Cello Tape (registered trademark)”, manufactured by Nichiban Co., Ltd.). The surface of the conductive film is illuminated with light from a three-wavelength fluorescent lamp (product name “Akarin stick”, manufactured by Hitachi Appliances) so that the illuminance on the surface of the conductive film becomes 1000 lux. From 30 ° to 30 cm (viewing distance), it was visually observed from all angles to evaluate whether cloudiness was observed in the non-conductive portion. Similarly, the surface of the conductive film is illuminated with light from an LED light source (product name “MG-286R”, manufactured by GENTOS) so that the illuminance on the surface of the conductive film is 10,000 lux. It was visually observed from every angle at a distance of 30 cm (viewing distance) from the surface, and it was evaluated whether a cloudiness was observed in the non-conductive portion. The evaluation criteria were as follows.
◯: No cloudiness was observed in the non-conductive part when observed at an illuminance of 10,000 lux.
Δ: No white turbidity was observed in the non-conductive portion when observed at an illuminance of 1000 lux, but white turbidity was observed at the non-conductive portion when observed at an illuminance of 10,000 lux.
X: A cloudiness sensation was observed in the non-conductive portion by observation at an illuminance of 1000 lux.
銀ナノワイヤが、全体として、導電部中において導電部の膜厚の半分の位置よりポリエチレンタレフタレートフィルム側に偏在しているか否かの判断は以下のようにして行った。具体的には、まず、導電性フィルムから断面観察用のサンプルを作製した。詳細には、2mm×5mmに切り出した導電性フィルムをシリコーン系の包埋板に入れ、エポキシ系樹脂を流し込み、導電性フィルム全体を樹脂にて包埋した。その後、包埋樹脂を65℃で12時間以上放置して、硬化させた。その後、ウルトラミクロトーム(製品名「ウルトラミクロトーム EM UC7」、ライカ マイクロシステムズ社製)を用いて、送り出し厚み100nmに設定し、超薄切片を作製した。作製した超薄切片をコロジオン膜付メッシュ(150メッシュ)にて採取し、STEM用サンプルとした。その後、走査透過型電子顕微鏡(STEM)(製品名「S-4800(TYPE2)」、日立ハイテクノロジーズ社製)を用いて、STEM用サンプルの断面写真を撮影した。この断面写真の撮影の際には、検出器(選択信号)を「TE」、加速電圧を「30kV」、エミッション電流を「10μA」にしてSTEM観察を行う倍率については倍率2.5万倍~5万倍でフォーカスを調節し、コントラストおよび明るさを各層が見分けられるよう適宜調節した。また、断面写真の撮影の際には、さらに、アパーチャーを「ビームモニタ絞り3」、対物レンズ絞りを「3」にし、またW.D.を「8mm」にした。そして、このように撮影した10箇所の上記断面写真を用意した。次いで、各断面写真を画素レベルまで拡大し、各断面写真において、導電部の膜厚の半分の位置よりポリエチレンタレフタレートフィルム側に位置する銀ナノワイヤが表示されている画素の個数および導電部の膜厚の半分の位置より導電部の表面側に位置する銀ナノワイヤが表示されている画素の個数を数え、銀ナノワイヤが表示されている画素の全個数に対する上記半分の位置よりポリエチレンタレフタレートフィルム側に位置する銀ナノワイヤが表示されている画素の個数の割合を求めた。なお、銀ナノワイヤが表示されている画素が上記半分の位置に跨っている場合には、各画素において、上記半分の位置からポリエチレンタレフタレートフィルム側に存在している部分と、この位置から導電部の表面側に存在している部分とに分けて、分けた部分の面積比に基づいて1画素を分けるものとした。そして、各断面写真から求めた上記割合を、導電部の膜厚の半分の位置よりポリエチレンタレフタレートフィルム側に位置する導電性繊維の存在割合とし、各断面写真から求めた存在割合の算術平均値を求め、この算術平均値が55%以上のときをポリエチレンテレフタレートフィルム側に偏在しているとした。 In the conductive films according to Examples 1 to 4, it was examined whether the silver nanowires were unevenly distributed on the polyethylene terephthalate film side from the half of the film thickness of the conductive part in the conductive part as a whole. The silver nanowires were unevenly distributed in the conductive film.
The determination as to whether or not the silver nanowires were unevenly distributed on the polyethylene terephthalate film side from the half of the film thickness of the conductive part in the conductive part as a whole was performed as follows. Specifically, first, a sample for cross-sectional observation was prepared from a conductive film. Specifically, the conductive film cut into 2 mm × 5 mm was placed in a silicone-based embedding plate, an epoxy resin was poured, and the entire conductive film was embedded with the resin. Thereafter, the embedding resin was allowed to stand at 65 ° C. for 12 hours or more to be cured. Thereafter, using an ultramicrotome (product name “Ultramicrotome EM UC7”, manufactured by Leica Microsystems), the delivery thickness was set to 100 nm, and ultrathin sections were prepared. The prepared ultrathin slice was collected with a mesh with a collodion membrane (150 mesh), and used as a sample for STEM. Thereafter, a cross-sectional photograph of the STEM sample was taken using a scanning transmission electron microscope (STEM) (product name “S-4800 (TYPE 2)”, manufactured by Hitachi High-Technologies Corporation). When taking this cross-sectional photograph, the magnification for performing STEM observation with the detector (selection signal) set to “TE”, the acceleration voltage set to “30 kV”, and the emission current set to “10 μA” is set to a magnification of 25,000 × The focus was adjusted at 50,000 times, and the contrast and brightness were adjusted appropriately so that each layer could be distinguished. When taking a cross-sectional photograph, the aperture is set to “beam monitor aperture 3”, the objective lens aperture is set to “3”, and D. Was set to “8 mm”. And the said cross-sectional photograph of 10 places image | photographed in this way was prepared. Next, each cross-sectional photograph is enlarged to the pixel level, and in each cross-sectional photograph, the number of pixels on which silver nanowires located on the polyethylene terephthalate film side from the half of the film thickness of the conductive part are displayed and the film of the conductive part Count the number of pixels on which silver nanowires located on the surface side of the conductive part are displayed from the half position of the thickness, and on the polyethylene terephthalate film side from the above half positions relative to the total number of pixels on which silver nanowires are displayed. The ratio of the number of pixels on which the silver nanowires located were displayed was determined. In addition, when the pixel on which the silver nanowire is displayed straddles the half position, in each pixel, a portion existing on the polyethylene terephthalate film side from the half position and a conductive portion from the position. It is assumed that one pixel is divided based on the area ratio of the divided portion. And, the above-mentioned ratio obtained from each cross-sectional photograph is the abundance ratio of conductive fibers located on the polyethylene terephthalate film side from the position of half the film thickness of the conductive part, and the arithmetic average value of the existence ratio obtained from each cross-sectional photograph When the arithmetic average value was 55% or more, it was assumed to be unevenly distributed on the polyethylene terephthalate film side.
10A…表面
11…光透過性基材
12…導電部
12A…表面
13…非導電部
13A…表面
14…光透過性機能層
15…光透過性樹脂
16…導電性繊維
40…画像表示装置
50…表示パネル
65…表示素子
70…タッチパネル
DESCRIPTION OF
Claims (8)
- 光透過性基材と、前記光透過性基材の一方の面側に設けられた複数の光透過性の導電部と、前記導電部間に位置する光透過性の非導電部とを備える導電性フィルムであって、
前記各導電部が、光透過性樹脂と、前記光透過性樹脂中に配置された導電性繊維とを含み、
前記非導電部が、光透過性樹脂を含み、
前記非導電部の表面における三次元算術平均粗さが、3nm以上であることを特徴とする、導電性フィルム。 A conductive material comprising a light transmissive substrate, a plurality of light transmissive conductive portions provided on one surface side of the light transmissive substrate, and a light transmissive non-conductive portion positioned between the conductive portions. A sex film,
Each of the conductive parts includes a light transmissive resin, and conductive fibers disposed in the light transmissive resin,
The non-conductive portion includes a light-transmitting resin;
A conductive film having a three-dimensional arithmetic average roughness on the surface of the non-conductive portion of 3 nm or more. - 前記三次元算術平均粗さが、80nm以下である、請求項1に記載の導電性フィルム。 The conductive film according to claim 1, wherein the three-dimensional arithmetic average roughness is 80 nm or less.
- 前記導電性繊維の繊維長が、1μm以上である、請求項1に記載の導電性フィルム。 The conductive film according to claim 1, wherein the conductive fiber has a fiber length of 1 μm or more.
- 前記導電性繊維の繊維径が、200nm以下である、請求項1に記載の導電性フィルム。 The conductive film according to claim 1, wherein a fiber diameter of the conductive fiber is 200 nm or less.
- 前記導電性フィルムのヘイズ値が、5%以下である、請求項1に記載の導電性フィルム。 The conductive film according to claim 1, wherein the haze value of the conductive film is 5% or less.
- 前記導電性フィルムの全光線透過率が、80%以上である、請求項1に記載の導電性フィルム。 The conductive film according to claim 1, wherein the total light transmittance of the conductive film is 80% or more.
- 請求項1に記載の導電性フィルムを備える、タッチパネル。 A touch panel comprising the conductive film according to claim 1.
- 請求項1に記載の導電性フィルムまたは請求項7に記載のタッチパネルを備える、画像表示装置。 An image display device comprising the conductive film according to claim 1 or the touch panel according to claim 7.
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