WO2017166821A1 - 配向膜的制作方法及配向膜制作设备 - Google Patents

配向膜的制作方法及配向膜制作设备 Download PDF

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WO2017166821A1
WO2017166821A1 PCT/CN2016/105211 CN2016105211W WO2017166821A1 WO 2017166821 A1 WO2017166821 A1 WO 2017166821A1 CN 2016105211 W CN2016105211 W CN 2016105211W WO 2017166821 A1 WO2017166821 A1 WO 2017166821A1
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Prior art keywords
substrate
alignment film
illumination
cleaning
alignment
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PCT/CN2016/105211
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English (en)
French (fr)
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林海云
李京鹏
高悦凯
谢振宇
闵泰烨
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京东方科技集团股份有限公司
北京京东方光电科技有限公司
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Priority to US15/535,218 priority Critical patent/US20180046037A1/en
Publication of WO2017166821A1 publication Critical patent/WO2017166821A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G02F1/133723—Polyimide, polyamide-imide
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor

Definitions

  • Embodiments of the present invention relate to a method of fabricating an alignment film and an apparatus for fabricating an alignment film.
  • liquid crystal display devices have occupied the leading position in the field of flat display because of their low power consumption and no radiation.
  • a liquid crystal display panel in a liquid crystal display device mainly includes an array substrate and a color filter substrate disposed opposite to each other, and a liquid crystal layer filled between the array substrate and the color filter substrate, and an alignment film and an alignment film are disposed on both sides of the liquid crystal layer.
  • the function is to orient the liquid crystal molecules in the liquid crystal layer to realize a display function.
  • Embodiments of the present invention provide a method for fabricating an alignment film and an apparatus for fabricating an alignment film, which can reduce coating defects caused by coating of an alignment liquid and improve the quality of the alignment film.
  • At least one embodiment of the present invention provides a method of fabricating an alignment film, comprising: performing EUV illumination on a substrate; performing a cleaning process on the substrate subjected to the EUV illumination; and on the substrate passing through the cleaning process An alignment film is formed.
  • the cleaning process includes at least one cleaning process, and each of the cleaning processes includes: cleaning the substrate with a roller brush; using a gas-liquid mixture Flushing the substrate; and drying the substrate.
  • At least three of the cleaning processes are performed in the cleaning process.
  • the drying process includes: performing air blowing treatment on the substrate with an air knife; and irradiating the substrate with far infrared light.
  • the method before the performing the EUV illumination on the substrate, the method further includes: detecting a placement time of the substrate, if the placement time of the substrate is greater than or Equal to the preset time, the EUV illumination is performed on the substrate.
  • the preset time includes six months.
  • the amount of illumination of the EUV illumination is 8000 mj/cm 2 to 9000 mj/cm 2 .
  • the method for fabricating an alignment film according to an embodiment of the present invention further includes: coating an alignment liquid on the substrate subjected to the cleaning process; and curing the alignment liquid coated on the substrate To form the alignment film.
  • the material of the alignment liquid includes polyimide.
  • the substrate comprises a color film substrate or an array substrate.
  • At least one embodiment of the present invention provides an alignment film fabrication apparatus including: an illumination device configured to perform EUV illumination on a substrate on which an alignment film is to be formed; a cleaning device configured to perform a cleaning process on the substrate; and an alignment film A forming device configured to form an alignment film on the substrate.
  • an alignment film forming apparatus includes: a coating device configured to apply an alignment liquid on the substrate subjected to the cleaning process; and curing And a device for performing a curing process on the alignment liquid coated on the substrate to form the alignment film.
  • an alignment film manufacturing apparatus includes at least one cleaning process, and each of the cleaning processes includes: cleaning the substrate with a roller brush, and then using gas-liquid mixing.
  • the substrate is rinsed, and the substrate after the rinsing is dried.
  • an embodiment of the present invention provides an alignment film manufacturing apparatus further comprising: a detecting device configured to detect a time of placing the substrate; and a control device configured to when the placing time is greater than or equal to The illumination device is controlled to perform the EUV illumination on the substrate at a preset time.
  • an embodiment of the present invention provides an alignment film forming apparatus further comprising: a transfer device configured to sequentially transfer the substrate to an illumination area corresponding to the illumination device, a cleaning area corresponding to the cleaning device, and the The coating zone corresponding to the coating device and the curing zone corresponding to the curing device.
  • an alignment film forming apparatus is provided, the control device and the detecting device, the conveying device, the lighting device, the cleaning device, the coating device, and the The curing devices are respectively communicatively coupled, the control device being configured to control the transmitting device to transfer the substrate when the placement time detected by the detecting device is greater than or equal to the preset time Passing to the illumination zone and controlling the illumination device to perform the EUV illumination on the substrate, and when the transfer device transfers the substrate to the cleaning zone, controlling the cleaning device to perform the substrate at least once The cleaning process, when the transfer device transfers the substrate to the coating zone, controlling the coating device to apply the alignment liquid on the substrate, when the transfer device is to be the substrate When the curing zone is transferred to the curing zone, the curing device is controlled to perform a curing process on the alignment liquid on the substrate.
  • an alignment film manufacturing apparatus wherein the illumination device performs the EUV illumination on the substrate by an amount of light of 8000 mj/cm 2 to 9000 mj/cm 2 .
  • an alignment film manufacturing apparatus wherein an illumination power of the illumination device to the substrate is greater than 400 mW/cm 2 .
  • an alignment film forming apparatus wherein the illumination device forms a rectangular illumination pattern on the transfer device, and the rectangular illumination pattern transmits the The length in the direction of the substrate is 1200 mm to 1400 mm, and the speed at which the transfer device transports the substrate in the illumination region is 2200 mm/min to 4000 mm/min.
  • an alignment film forming apparatus wherein the cleaning apparatus performs at least three cleaning steps on the substrate.
  • FIG. 1 is a flow chart of a method for fabricating an alignment film according to an embodiment of the present invention
  • FIG. 2 is a flow chart of another method for fabricating an alignment film according to an embodiment of the present invention.
  • FIG. 3 is a schematic diagram of an alignment film manufacturing apparatus according to an embodiment of the present invention.
  • FIG. 4 is a schematic diagram of another alignment film manufacturing apparatus according to an embodiment of the present invention.
  • a conventional alignment film manufacturing method includes: applying an alignment liquid (PI liquid) on a substrate (array substrate or color film substrate) using an ARP Plate, and then passing an alignment process (such as a rubbing alignment process/light) Orientation) and other processes to form the desired alignment film on the substrate.
  • an alignment liquid such as a rubbing alignment process/light
  • the inventors of the present application have a lot of dirt on the surface which is difficult to be cleaned (such as organic impurities) in the substrate for a long time in the study, and the alignment is applied to the substrate after the cleaning process.
  • it is easy to cause coating failure for a color filter substrate, adhesion of the OC protective layer on the surface of the color filter substrate to the alignment liquid is likely to be poor, especially when a highly viscous alignment liquid is used. It is more likely to cause poor coating.
  • Embodiments of the present invention provide a method for fabricating an alignment film and an apparatus for fabricating an alignment film.
  • the alignment film manufacturing method comprises: performing EUV illumination on a substrate; performing a cleaning process on the substrate subjected to the EUV illumination; and forming an alignment film on the substrate subjected to the cleaning process.
  • the method for producing the alignment film can reduce the coating failure occurring during the application of the alignment liquid and improve the quality of the alignment film.
  • This embodiment provides a method of fabricating an alignment film.
  • 1 is a flow chart of a method of fabricating an alignment film.
  • the method of fabricating the alignment film may include steps S11-S13.
  • Step S11 performing a cleaning process on the substrate.
  • Step S12 forming an alignment film on the substrate subjected to the cleaning process.
  • Step S13 Before performing the cleaning process on the substrate, the method further comprises: performing EUV (Excimer UV) illumination on the substrate.
  • EUV Excimer UV
  • the substrate is subjected to EUV illumination before the substrate is cleaned, and the organic impurities which are not easily washed away on the surface of the substrate can be decomposed by EUV illumination, and the decomposition remains on the surface of the substrate.
  • the object and other easily cleaned impurities on the surface of the substrate can be removed by a subsequent cleaning process, thereby effectively reducing the contact angle between the alignment liquid and the surface of the substrate during the coating of the alignment liquid, thereby effectively improving the adhesion of the alignment liquid to the surface of the substrate, thereby further improving the adhesion of the alignment liquid to the surface of the substrate. Effectively reduce coating defects.
  • the method for fabricating the alignment film further includes: coating the alignment liquid on the substrate subjected to the cleaning process; and performing a curing process on the alignment liquid coated on the substrate to form an alignment film.
  • the substrate may be a color filter substrate or an array substrate
  • the alignment liquid may be a rubbing alignment alignment liquid (for example, polyimide) or an optical alignment alignment liquid.
  • Figure 2 is a flow chart of another method of making an alignment film. As shown in FIG. 2, the method of fabricating the alignment film may include steps S21-S24.
  • EUV illumination is performed on the substrate; for example, the substrate may be a color filter substrate, and the amount of illumination of the substrate by EUV illumination may be 8000 mj/cm 2 - 9000 mj/cm 2 , for example, 8500 mj/cm 2 or the like.
  • the cleaning process includes at least one cleaning process, wherein each cleaning process comprises: cleaning the substrate with a roller brush, and then rinsing the substrate with a gas-liquid mixture,
  • the immersed substrate is subjected to a drying process, wherein the drying process may be: first, blowing the surface of the substrate with an air knife, and then irradiating the substrate with far infrared light;
  • the alignment liquid may be a rubbing alignment alignment liquid (such as polyimide), or may be a light alignment alignment liquid;
  • the alignment film by performing EUV illumination on the substrate in step S1, And the decomposition product remaining on the surface of the substrate and other easily cleaned impurities on the surface of the substrate can be removed by the cleaning process in step S2, thereby effectively reducing the contact angle of the alignment liquid with the surface of the substrate during the coating of the alignment liquid in step S3. Effectively improving the adhesion of the alignment liquid to the surface of the substrate, thereby effectively reducing coating defects.
  • at least three cleaning steps can be performed in the cleaning process in step S2, by the above-mentioned manner, the alignment film
  • the defect rate of the coating process can be reduced to 0% - 0.5%.
  • the method before the EUV illumination of the substrate, the method further includes: detecting the placement time of the substrate, and if the placement time of the substrate is greater than or equal to the preset time, performing EUV on the substrate. illumination.
  • the method further includes: obtaining a placement time of the substrate; wherein, if the placement time of the substrate is greater than or equal to the preset time, performing EUV illumination on the substrate; the placement time of the substrate is the production date of the substrate to the current production on the substrate.
  • the time interval when the alignment film is formed that is, during the fabrication of the alignment film, whether the substrate is subjected to EUV illumination according to the placement time of the substrate, for example, if the substrate is placed for a period of time greater than or equal to 6 months, the substrate is firstly subjected to the substrate.
  • EUV illumination then the substrate is cleaned, and then the alignment liquid is coated on the substrate after the cleaning process, and then the coated alignment liquid is subjected to a curing process. If the substrate is placed for less than 6 months, the substrate may not be used. EUV illumination is performed to directly clean the substrate, and then the coating process and curing process of the alignment liquid are sequentially performed.
  • a high exposure amount of APR Plate and a low viscosity APR Plate may be employed in the coating process of the alignment liquid.
  • the embodiment provides an alignment film manufacturing apparatus.
  • the alignment film manufacturing apparatus may include: an illumination device 1 for EUV illumination of a substrate 10 to be formed with an alignment film; and a cleaning device 2 for a substrate 10 performing a cleaning process; and an alignment film forming device 34 for forming an alignment film on the substrate 10.
  • the substrate can be EUV-illuminated before the substrate is cleaned, and the organic surface of the substrate can be easily washed away by EUV illumination.
  • the impurities are decomposed, and the decomposition products remaining on the surface of the substrate and other easily cleaned impurities on the surface of the substrate can be removed by a subsequent cleaning process, thereby effectively reducing the contact angle of the alignment liquid with the surface of the substrate during the coating of the alignment liquid, effectively Improve the adhesion of the alignment liquid to the surface of the substrate, thereby effectively reducing coating defects.
  • the alignment film manufacturing apparatus includes a cleaning device 2 for performing a cleaning process on the substrate 10, and a coating device 3 for passing through The alignment liquid is coated on the substrate 10 of the cleaning process; the curing device 4 is used for curing the alignment liquid coated on the substrate 10; and the illumination device 1 is used for EUV illumination of the substrate 10 before the cleaning process. That is, the alignment film forming device 34 includes the coating device 3 and the curing device 4 to form an alignment film.
  • the cleaning process may include at least one cleaning process, each cleaning process includes: cleaning the substrate with a roller brush, then rinsing the substrate with a gas-liquid mixture, and drying the washed substrate, wherein, the drying process
  • the treatment may be: first blowing the surface of the substrate with an air knife, and then irradiating the substrate with far infrared light.
  • the alignment film producing apparatus further includes the detecting device 5, the control device 6, and the conveying device 7.
  • the detecting device 5 is configured to detect the placement time of the substrate. If the placement time of the substrate is greater than or equal to the preset time, the control device 6 controls the illumination device 1 to perform EUV illumination on the substrate; and the transmission device 7 is configured to sequentially transfer the substrate to the illumination region. , cleaning zone, coating zone and curing zone.
  • the illumination area is the area corresponding to the illumination device
  • the cleaning area is the area corresponding to the cleaning device
  • the coating area is the area corresponding to the coating device
  • the curing area is the area corresponding to the curing device.
  • the area corresponding to each device described above refers to an area in which the device can be operated.
  • the area corresponding to the illumination device refers to an area in which the illumination device can perform EUV illumination.
  • the transport device may be a conveyor belt.
  • other transport devices may be used.
  • the embodiments of the present invention are not limited herein.
  • the control device 6 is communicably connected to the detecting device 5, the conveying device 7, the illumination device 1, the cleaning device 2, the coating device 3, and the curing device 4, respectively. Therefore, when the alignment film is formed on the substrate 10 by using the above-described apparatus, the detecting device 5 first detects the placement time of the substrate 10, and if the placement time of the substrate 10 is greater than or equal to the preset time, when the transfer device 7 transfers the substrate 10 to In the illumination zone, the control device 6 controls the illumination device 1 to perform EUV illumination on the substrate 10. When the transfer device 7 transfers the substrate 10 to the cleaning zone, the control device 6 controls The cleaning device 2 performs at least one cleaning process on the substrate 10.
  • the control device 7 controls the coating device 3 to apply the alignment liquid on the substrate 10, and when the transfer device 7 passes the substrate 10
  • the control device 7 controls the curing device 4 to perform a curing process on the alignment liquid on the substrate 10; if the placement time of the substrate 10 is less than the preset time, when the transfer device 7 transfers the substrate 10 to the illumination zone, the control device 6 controlling the illumination device 1 does not perform EUV illumination on the substrate 10, after which the substrate 10 is sequentially transferred to the cleaning area, the coating area and the curing area via the conveying device 7, and the cleaning device 2, the coating device 3 is controlled in the corresponding area control device 6,
  • the curing device 4 performs a cleaning process, an alignment liquid coating process, and a curing process on the substrate, respectively.
  • the amount of illumination of the substrate by EUV illumination may be 8000 mj/cm 2 - 9000 mj/cm 2 , for example, 8500 mj/cm 2 or the like.
  • the illumination power of the illumination device to the substrate may be greater than 400 mW/cm 2 ; the illumination device forms a rectangular illumination pattern on the transfer device, and the length of the rectangular illumination pattern in the direction of the transfer device transfer substrate may be It is 1200mm-1400mm; the speed at which the transfer device transports the substrate in the illumination zone can be 2200mm/min-4000mm/min.
  • the cleaning device may perform at least three cleaning processes on the substrate.

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Abstract

一种配向膜的制作方法及配向膜制作设备，该配向膜的制作方法包括：对基板（10）进行EUV光照（S11）；对经过EUV光照的基板（10）进行清洗工艺（S12）；以及在经过清洗工艺的基板(10)上形成配向膜（S13）。该配向膜的制作方法通过在对基板（10）进行清洗工艺之前对该基板（10）进行EUV光照，通过EUV光照可以将基板（10）表面上不易被清洗掉的有机物杂质分解，从而可有效降低涂布不良。

Description

配向膜的制作方法及配向膜制作设备 技术领域
本发明实施例涉及一种配向膜的制作方法以及配向膜制作设备。
背景技术
随着显示技术的不断发展，液晶显示装置因具有功耗低、无辐射等优点，现已占据了平面显示领域的主导地位。
目前，液晶显示装置中液晶显示面板主要包括相对设置的阵列基板和彩膜基板，以及填充在阵列基板和彩膜基板之间的液晶层，在液晶层的两侧设置有配向膜，配向膜的作用是使液晶层中液晶分子产生取向，实现显示功能。
发明内容
本发明实施例提供一种配向膜的制作方法以及配向膜制作设备，可降低配向液涂布时产生的涂布不良，并提高配向膜的质量。
本发明至少一个实施例提供一种配向膜的制作方法，其包括：对基板进行EUV光照；对经过所述EUV光照的所述基板进行清洗工艺；以及在经过所述清洗工艺的所述基板上形成配向膜。
例如，在本发明一实施例提供的配向膜的制作方法中，所述清洗工艺包括至少一次清洗工序，每一次所述清洗工序包括：采用滚刷对所述基板进行清洗；采用气液混合体对所述基板进行冲洗；以及对所述基板进行干燥处理。
例如，在本发明一实施例提供的配向膜的制作方法中，在所述清洗工艺中执行至少三次所述清洗工序。
例如，在本发明一实施例提供的配向膜的制作方法中，所述干燥处理包括：采用气刀对所述基板进行吹气处理；以及采用远红外光对所述基板进行照射。
例如，在本发明一实施例提供的配向膜的制作方法中，在所述对所述基板进行所述EUV光照之前还包括：检测所述基板的放置时间，若所述基板的放置时间大于或等于预设时间，则对所述基板进行所述EUV光照。
例如，在本发明一实施例提供的配向膜的制作方法中，所述预设时间包括六个月。
例如，在本发明一实施例提供的配向膜的制作方法中，所述EUV光照的光照量为8000mj/cm2-9000mj/cm2。
例如，本发明一实施例提供的配向膜的制作方法还包括：在经过所述清洗工艺的所述基板上涂布配向液；以及对涂布在所述基板上的所述配向液进行固化工艺以形成所述配向膜。
例如，在本发明一实施例提供的配向膜的制作方法中，所述配向液的材料包括聚酰亚胺。
例如，在本发明一实施例提供的配向膜的制作方法中，所述基板包括彩膜基板或阵列基板。
本发明至少一个实施例提供一种配向膜制作设备，其包括：光照装置，被配置为对待形成配向膜的基板进行EUV光照；清洗装置，被配置为对所述基板进行清洗工艺；以及配向膜形成装置，被配置为在所述基板上形成配向膜。
例如，在本发明一实施例提供一种配向膜制作设备中，所述配向膜形成装置包括：涂布装置，被配置为在经过所述清洗工艺的所述基板上涂布配向液；以及固化装置，用于对涂布在所述基板上的所述配向液进行固化工艺以形成所述配向膜。
例如，在本发明一实施例提供一种配向膜制作设备中，所述清洗工艺包括至少一次清洗工序，每一次所述清洗工序包括：采用滚刷对所述基板进行清洗，然后采用气液混合体对所述基板进行冲洗，对经过所述冲洗后的所述基板进行干燥处理。
例如，本发明一实施例提供一种配向膜制作设备还包括：检测装置，被配置为检测所述基板的放置时间；以及控制装置，所述控制装置被配置为当所述放置时间大于或等于预设时间时控制所述光照装置对所述基板进行所述EUV光照。
例如，本发明一实施例提供一种配向膜制作设备还包括：传送装置，被配置为将所述基板依次传送至所述光照装置对应的光照区、所述清洗装置对应的清洗区、所述涂布装置对应的涂布区以及所述固化装置对应的固化区。
例如，在本发明一实施例提供一种配向膜制作设备中，所述控制装置与所述检测装置、所述传送装置、所述光照装置、所述清洗装置、所述涂布装置以及所述固化装置分别通信连接，所述控制装置被配置为当所述检测装置检测的所述放置时间大于或等于所述预设时间时控制所述传送装置将所述基板传送 至所述光照区并控制所述光照装置对所述基板进行所述EUV光照，当所述传送装置将所述基板传送至所述清洗区时，控制所述清洗装置对所述基板进行至少一次所述清洗工序，当所述传送装置将所述基板传送至所述涂布区时，控制所述涂布装置在所述基板上涂布所述配向液，当所述传送装置将所述基板传送至所述固化区时，控制所述固化装置对所述基板上的所述配向液进行固化工艺。
例如，在本发明一实施例提供一种配向膜制作设备中，所述光照设备对所述基板进行所述EUV光照的光照量为8000mj/cm2-9000mj/cm2。
例如，在本发明一实施例提供一种配向膜制作设备中，所述光照装置对所述基板的照射功率大于400mw/cm2。
例如，在本发明一实施例提供一种配向膜制作设备中，所述光照装置在所述传送装置上形成矩形状的光照图案，且所述矩形状的光照图案在所述传送装置传送所述基板方向上的长度为1200mm-1400mm，所述传送装置在所述光照区传送所述基板的速度为2200mm/min-4000mm/min。
例如，在本发明一实施例提供一种配向膜制作设备中，所述清洗装置对所述基板进行至少三次所述清洗工序。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。
图1是本发明实施例提供的一种配向膜的制作方法的流程图；
图2是本发明实施例提供的另一种配向膜的制作方法的流程图；
图3是本发明实施例提供的一种配向膜制作设备的示意图；以及
图4是本发明实施例提供的另一种配向膜制作设备的示意图。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合本发明实施例的附图，对本发明实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描述的 本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
除非另作定义，此处使用的技术术语或者科学术语应当为本发明所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。同样，“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同，而不排除其他元件或者物件。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接，而是可以包括电性的连接，不管是直接的还是间接的。“上”、“下”、“左”、“右”等仅用于表示相对位置关系，当被描述对象的绝对位置改变后，则该相对位置关系也可能相应地改变。
目前，通常的配向膜制作方法包括：采用转印版(ARP Plate)在基板(阵列基板或彩膜基板)上涂布配向液(PI液)，然后再通过配向工艺(如摩擦配向工艺/光配向)以及其他工艺从而在基板上形成所需的配向膜。然而，本申请的发明人在研究中对于放置时间较长的基板，其表面会有较多不易被清洗掉的脏污(如有机物杂质)，当对基板进行清洗工艺后在其上涂布配向液时，容易造成涂布不良(Coating Defect)，例如，对于彩膜基板，容易造成彩膜基板表面的OC保护层与配向液的粘附性不好，特别是当使用高粘度的配向液时，更容易产生涂布不良。
本发明实施例提供一种配向膜的制作方法以及配向膜制作设备。该配向膜制作方法包括：对基板进行EUV光照；对经过所述EUV光照的基板进行清洗工艺；以及在经过清洗工艺的基板上形成配向膜。由此，该配向膜的制作方法可降低配向液涂布时产生的涂布不良，并提高配向膜的质量。
下面结合附图对本发明实施例提供的配向膜的制作方法以及配向膜制作设备进行说明。
实施例一
本实施例提供了一种配向膜的制作方法。图1是一种配向膜的制作方法的流程图。该配向膜的制作方法可包括步骤S11-S13。
步骤S11：对基板进行清洗工艺。
步骤S12：在经过清洗工艺的基板上形成配向膜。
步骤S13：在对基板进行清洗工艺之前还包括：对基板进行EUV(Excimer UV，准分子紫外光)光照。
本实施例提供的配向膜的制作方法，通过在对基板进行清洗工艺之前对该基板进行EUV光照，通过EUV光照可以将基板表面上不易被清洗掉的有机物杂质分解，并且残留在基板表面的分解物以及基板表面上其他易清洗掉的杂质可通过后续的清洗工艺去除，从而在配向液涂布时有效减小配向液与基板表面的接触角，有效提高配向液与基板表面的黏附性，进而有效降低涂布不良。
例如，本实施例一示例提供的配向膜的制作方法还包括：在经过清洗工艺的基板上涂布配向液；以及对涂布在基板上的配向液进行固化工艺以形成配向膜。
例如，上述的基板可以彩膜基板，也可以为阵列基板，上述的配向液可以为摩擦配向的配向液(如聚酰亚胺)，也可以为光配向的配向液。
例如，图2为另一种配向膜的制作方法的流程图。如图2所示，该配向膜的制作方法可包括步骤S21-S24。
S21：对基板进行EUV光照；例如，该基板可以为彩膜基板，对基板进行EUV光照的光照量可以为8000mj/cm2-9000mj/cm2，例如，可以为8500mj/cm2等。
S22:对经过EUV光照的基板进行清洗工艺；例如，清洗工艺包括至少一次清洗工序，其中，每一次清洗工序包括：采用滚刷对基板进行清洗，然后采用气液混合体对基板进行冲洗，对经过冲洗后的基板进行干燥处理，其中，干燥处理可以为：先采用气刀对基板的表面进行吹气处理，然后采用远红外光对基板进行照射；
S23:在经过清洗工艺的基板上涂布配向液；其中，配向液可以为摩擦配向的配向液(如聚酰亚胺)，也可以为光配向的配向液；
S24:对涂布在基板上的配向液进行固化工艺，从而得到配向膜，然后通过对所形成的配向膜进行配向工艺，从而使得该配向膜对液晶分子具有配向控制力。
在上述的配向膜的制作方法中，通过在步骤S1中对基板进行EUV光照， 并且残留在基板表面的分解物以及基板表面上其他易清洗掉的杂质可通过步骤S2中的清洗工艺去除，从而在步骤S3中配向液涂布时有效减小配向液与基板表面的接触角，有效提高配向液与基板表面的黏附性，进而有效降低涂布不良，例如，为进一步提高涂布良率，可以在步骤S2中的清洗工艺中进行至少三次清洗工序，通过上述方式，配向膜的涂布工艺的不良率可以降至0％-0.5％。
例如，在本实施例一示例提供的配向膜的制作方法中，在对基板进行EUV光照之前还包括：检测基板的放置时间，若基板的放置时间大于或等于预设时间，则对基板进行EUV光照。由于基板表面上不易被清洗掉的脏污(如有机物杂质)一般与基板的放置时间相关，基板放置时间越长，其表面产生的脏污越多，例如，为了提高生产效率，在对基板进行EUV光照之前还包括：获取基板的放置时间；其中，若基板的放置时间大于或等于预设时间，则对基板进行EUV光照；基板的放置时间为该基板的生产日期至当前在该基板上制作配向膜时的时间间隔；即在配向膜的制作过程中，可以根据基板的放置时间确定是否对基板进行EUV光照，例如，若基板的放置时间大于或等于6个月，则首先对该基板进行EUV光照，然后对基板进行清洗工艺，再在经过清洗工艺后的基板上涂布配向液，之后对涂布的配向液进行固化工艺，若基板的放置时间小于6个月，则可不对该基板进行EUV光照，直接对基板进行清洗工艺，之后依次进行配向液的涂布工艺和固化工艺。
例如，在本实施例一示例提供的一种配向膜制作方法中，为了进一步地降低涂布不良，在配向液的涂布工艺中，可以采用高曝光量的APR Plate和低粘度的APR Plate。
实施例二
本实施例提供一种配向膜制作设备，如图3所示，该配向膜制作设备可包括：光照装置1，用于对待形成配向膜的基板10进行EUV光照；清洗装置2，用于对基板10进行清洗工艺；以及配向膜形成装置34，用于在基板10上形成配向膜。
在本实施例提供的配向膜制作设备可通过在对基板进行清洗工艺之前对该基板进行EUV光照，通过EUV光照可以将基板表面上不易被清洗掉的有机 物杂质分解，并且残留在基板表面的分解物以及基板表面上其他易清洗掉的杂质可通过后续的清洗工艺去除，从而在配向液涂布时有效减小配向液与基板表面的接触角，有效提高配向液与基板表面的黏附性，进而有效降低涂布不良。
例如，在本实施例一示例提供的配向膜制作设备中，如图4所示，该配向膜制作设备包括清洗装置2，用于对基板10进行清洗工艺；涂布装置3，用于在经过清洗工艺的基板10上涂布配向液；固化装置4，用于对涂布在基板10上的配向液进行固化工艺；光照装置1，用于在清洗工艺之前对基板10进行EUV光照。也就是说，配向膜形成装置34包括涂布装置3和固化装置4以形成配向膜。
例如，该清洗工艺可以包括至少一次清洗工序，每一次清洗工序包括：采用滚刷对基板进行清洗，然后采用气液混合体对基板进行冲洗，对经过冲洗后的基板进行干燥处理，其中，干燥处理可以为：先采用气刀对基板的表面进行吹气处理，然后采用远红外光对基板进行照射。
例如，在本实施例一示例提供的配向膜制作设备中，该配向膜制作设备还包括检测装置5、控制装置6及传送装置7。检测装置5用于检测基板的放置时间，若基板的放置时间大于或等于预设时间，则控制装置6控制光照装置1对该基板进行EUV光照；传送装置7用于将基板依次传送至光照区、清洗区、涂布区和固化区。需要说明的是，光照区为光照装置对应的区域、清洗区为清洗装置对应的区域、涂布区为涂布装置对应的区域，固化区为固化装置对应的区域。上述的各装置对应的区域是指该装置可以进行操作的区域，例如，光照装置对应的区域是指该光照装置可以进行EUV光照的区域。
例如，传送装置可为传送带，当然，还可采用其他传送装置，本发明实施例在此不作限制。
例如，在本实施例一示例提供的配向膜制作设备中，控制装置6与检测装置5、传送装置7、光照装置1、清洗装置2、涂布装置3以及固化装置4分别通信连接。由此，在采用上述的设备在基板10上制作配向膜时，检测装置5首先检测基板10的放置时间，若基板10的放置时间大于或等于预设时间，当传送装置7将基板10传送至光照区时，则控制装置6控制光照装置1对基板10进行EUV光照，当传送装置7将基板10传送至清洗区时，控制装置6控制 清洗装置2对基板10进行至少一次清洗工序，当传送装置7将基板10传送至涂布区时，控制装置7控制涂布装置3在基板10上涂布配向液，当传送装置7将基板10传送至固化区时，控制装置7控制固化装置4对基板10上的配向液进行固化工艺；若基板10的放置时间小于预设时间，当传送装置7将基板10传送至光照区时，控制装置6控制光照装置1不对基板10进行EUV光照，之后基板10经过传送装置7依次传送至清洗区、涂布区和固化区，并在相应的区域控制装置6控制清洗装置2、涂布装置3、固化装置4分别对基板进行清洗工艺、配向液涂布工艺、固化工艺。
例如，若基板10为彩膜基板，若其放置时间大于或等于预设时间，对该基板进行EUV光照的光照量可以为8000mj/cm2-9000mj/cm2，例如，可以为8500mj/cm2等。例如，为实现上述光照量，光照装置对基板的照射功率可以大于400mw/cm2；光照装置在传送装置上形成矩形状的光照图案，且矩形状的光照图案在传送装置传送基板方向上的长度可以为1200mm-1400mm；传送装置在光照区传送基板的速度可以为2200mm/min-4000mm/min。
例如，为进一步去除基板表面上的脏污，提高涂布良率，在清洗区，清洗装置可以对基板进行至少三次清洗工艺。
以上所述仅是本发明的示范性实施方式，而非用于限制本发明的保护范围，本发明的保护范围由所附的权利要求确定。
本申请要求于2016年03月29日递交的中国专利申请第201610188179.7号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (20)

  1. 一种配向膜的制作方法，包括：
    对基板进行EUV光照；
    对经过所述EUV光照的所述基板进行清洗工艺；以及
    在经过所述清洗工艺的所述基板上形成配向膜。
  2. 根据权利要求1所述的配向膜的制作方法，其中，所述清洗工艺包括至少一次清洗工序，每一次所述清洗工序包括：
    采用滚刷对所述基板进行清洗；
    采用气液混合体对所述基板进行冲洗；以及
    对所述基板进行干燥处理。
  3. 根据权利要求2所述的配向膜的制作方法，其中，在所述清洗工艺中执行至少三次所述清洗工序。
  4. 根据权利要求2所述的配向膜的制作方法，其中，所述干燥处理包括：
    采用气刀对所述基板进行吹气处理；以及
    采用远红外光对所述基板进行照射。
  5. 根据权利要求1所述的配向膜的制作方法，其中，在所述对所述基板进行所述EUV光照之前还包括：检测所述基板的放置时间，若所述基板的放置时间大于或等于预设时间，则对所述基板进行所述EUV光照。
  6. 根据权利要求4所述的配向膜的制作方法，其中，所述预设时间包括六个月。
  7. 根据权利要求1-6中任一项所述的配向膜的制作方法，其中，所述EUV光照的光照量为8000mj/cm2-9000mj/cm2。
  8. 根据权利要求1-6中任一项所述的配向膜的制作方法，还包括：
    在经过所述清洗工艺的所述基板上涂布配向液；以及
    对涂布在所述基板上的所述配向液进行固化工艺以形成所述配向膜。
  9. 根据权利要求8所述的配向膜的制作方法，其中，所述配向液的材料包括聚酰亚胺。
  10. 根据权利要求1-9所述的配向膜的制作方法，其中，所述基板包括彩 膜基板或阵列基板。
  11. 一种配向膜制作设备，包括：
    光照装置，被配置为对待形成配向膜的基板进行EUV光照；
    清洗装置，被配置为对所述基板进行清洗工艺；以及
    配向膜形成装置，被配置为在所述基板上形成配向膜。
  12. 根据权利要求11所述的配向膜制作设备，其中，所述配向膜形成装置包括：
    涂布装置，被配置为在经过所述清洗工艺的所述基板上涂布配向液；以及
    固化装置，用于对涂布在所述基板上的所述配向液进行固化工艺以形成所述配向膜。
  13. 根据权利要求12所述的配向膜制作设备，其中，所述清洗工艺包括至少一次清洗工序，每一次所述清洗工序包括：采用滚刷对所述基板进行清洗，然后采用气液混合体对所述基板进行冲洗，对经过所述冲洗后的所述基板进行干燥处理。
  14. 根据权利要求12或13所述的配向膜制作设备，还包括：
    检测装置，被配置为检测所述基板的放置时间；以及
    控制装置，
    其中，所述控制装置被配置为当所述放置时间大于或等于预设时间时控制所述光照装置对所述基板进行所述EUV光照。
  15. 根据权利要求14所述的配向膜制作设备，还包括：
    传送装置，被配置为将所述基板依次传送至所述光照装置对应的光照区、所述清洗装置对应的清洗区、所述涂布装置对应的涂布区以及所述固化装置对应的固化区。
  16. 根据权利要求15所述的配向膜制作设备，其中，所述控制装置与所述传送装置、所述光照装置、所述清洗装置、所述涂布装置以及所述固化装置分别通信连接，当所述放置时间大于或等于所述预设时间，所述控制装置被配置为当所述传送装置将所述基板传送至所述光照区时，控制所述光照装置对所述基板进行所述EUV光照，当所述传送装置将所述基板传送至所述清洗区时，控制所述清洗装置对所述基板进行至少一次所述清洗工序，当所述传送装置将所 述基板传送至所述涂布区时，控制所述涂布装置在所述基板上涂布所述配向液，当所述传送装置将所述基板传送至所述固化区时，控制所述固化装置对所述基板上的所述配向液进行固化工艺。
  17. 根据权利要求11-16中任一项所述的配向膜制作设备，其中，所述光照设备对所述基板进行所述EUV光照的光照量为8000mj/cm2-9000mj/cm2。
  18. 根据权利要求11-16中任一项所述的配向膜制作设备，其中，所述光照装置对所述基板的照射功率大于400mw/cm2。
  19. 根据权利要求15或16中任一项所述的配向膜制作设备，其中，所述光照装置在所述传送装置上形成矩形状的光照图案，且所述矩形状的光照图案在所述传送装置传送所述基板方向上的长度为1200mm-1400mm，所述传送装置在所述光照区传送所述基板的速度为2200mm/min-4000mm/min。
  20. 根据权利要求11-16中任一项所述的配向膜制作设备，其中，所述清洗装置对所述基板进行至少三次所述清洗工序。
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