WO2017114405A1 - 一种棱镜旋转调节机构和光刻机曝光***及光刻机 - Google Patents

一种棱镜旋转调节机构和光刻机曝光***及光刻机 Download PDF

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Publication number
WO2017114405A1
WO2017114405A1 PCT/CN2016/112572 CN2016112572W WO2017114405A1 WO 2017114405 A1 WO2017114405 A1 WO 2017114405A1 CN 2016112572 W CN2016112572 W CN 2016112572W WO 2017114405 A1 WO2017114405 A1 WO 2017114405A1
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WIPO (PCT)
Prior art keywords
prism
driving
adjusting mechanism
rotation
fixed
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PCT/CN2016/112572
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English (en)
French (fr)
Inventor
苏同克
Original Assignee
上海微电子装备（集团）股份有限公司
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Application filed by 上海微电子装备（集团）股份有限公司 filed Critical 上海微电子装备（集团）股份有限公司
Priority to US16/067,375 priority Critical patent/US11106005B2/en
Priority to KR1020187021549A priority patent/KR102039285B1/ko
Priority to JP2018533832A priority patent/JP6719564B2/ja
Publication of WO2017114405A1 publication Critical patent/WO2017114405A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/1805—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/04—Prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G02B7/005—Motorised alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Definitions

  • the present invention relates to a lithographic apparatus, and more particularly to a prism rotation adjustment mechanism and a lithography machine exposure system and a lithography machine.
  • Photolithography is a process technique that exposes a mask pattern to a substrate.
  • the substrate is placed on the workpiece stage and the mask pattern is projected onto the surface of the substrate by an exposure device located within the lithographic apparatus.
  • Exposure is an important part of the lithography process.
  • the exposure modes are divided into contact, proximity, projection and direct writing.
  • Projection exposure is achieved by using an optical system to collect light between the mask and the photoresist.
  • Projection lithography is of great significance for the manufacture of large-scale integrated circuits.
  • the projection objective determines the image transfer capability of the projection lithography machine and is the core of the lithography machine.
  • Projection objectives typically use prisms to process the light path.
  • the image surface deviates from the ideal imaging position due to the different degrees of deformation (including machining errors and gravity clamping deformation) and environmental changes on the surface of the mask.
  • an adjustment mechanism is required to adjust the position of the right-angle prism to adjust the position of the image plane to ensure image quality.
  • the objective lens adjusting mechanism of the prior art directly connects the piezoelectric ceramic motor on the prism of the objective lens, and directly drives the translation and rotation of the prism by the piezoelectric ceramic motor.
  • the precision of the objective lens adjusting mechanism for the prism depends on the piezoelectric ceramic.
  • the control precision of the motor is limited in control accuracy, and two piezoelectric ceramic motors are required to be adjusted simultaneously during the prism rotation adjustment process to ensure that the prism has no disturbance during the adjustment process.
  • the technical problem to be solved by the present invention is to provide an improved adjustment of the rotation of the prism and to adjust The prism rotation adjustment mechanism and the lithography machine exposure system and the lithography machine without nuisance during the knuckle process.
  • a prism rotation adjusting mechanism comprising a frame, a flexible mechanism and a driving mechanism, the flexible mechanism comprising a fixing member, a driving member, a connecting member and a rocking member which are sequentially flexibly hinged
  • the fixing member is fixed on the frame
  • the driving mechanism is fixed to the frame, and is connected to the driving member
  • the shaking member is used for fixing the prism
  • the hinge shaft of the rocking member and the fixing member Corresponding to the center of rotation of the prism.
  • one end of the fixing member is flexibly hinged with a middle portion of the driving member
  • one end of the driving member is flexibly hinged with one end of the connecting member
  • the other end is a free end
  • the other end of the connecting member is rocked
  • the piece is flexibly hinged, and the middle portion of the rocking member is flexibly hinged with the fixing member.
  • the driving mechanism is connected to the free end.
  • a pretensioning unit is further included, the pretensioning unit is in one end resisting the fixing member, and the other end is fixed on the free end.
  • the pretensioning unit adopts a spring, and one end of the spring abuts against the fixing member, and the other end is fixed on the free end.
  • the method further includes a detecting unit and a detecting bracket corresponding to the detecting unit, wherein the detecting bracket vertically connects the rocking member, and the detecting unit is fixed on the frame and forms a closed loop control system with the driving mechanism.
  • the detecting bracket is aligned with the detecting unit after passing through the fixing member.
  • the drive mechanism includes a driver bracket and a drive unit mounted on the driver bracket, the driver bracket is fixed to the frame, and the drive unit is coupled to the drive member.
  • the driving unit uses a piezoelectric ceramic motor.
  • the fixing member, the driving member, the connecting member and the rocking member all adopt a block structure.
  • the fixing member, the driving member, the connecting member and the rocking member are of a unitary structure.
  • the prism rotation adjusting mechanism of the present invention adopts a flexible mechanism to form a quadrilateral flexible hinge structure, and the driving member is linearly driven by the driving mechanism, and is driven to the rocking member through the connecting member and the fixing member, thereby driving the linear motion of the driving mechanism. Converted into a rotary motion of the rocker to make the prism With the rotating motion of the rocking member, the control of the rotating motion is more precise, and the rotation control precision of the prism is improved.
  • the rotation center of the prism is the hinge axis of the rocking member and the fixing member, which ensures the stability of the rotation center position and avoids The turbulence occurs during the rotation adjustment process, which further improves the accuracy of the rotation control of the prism.
  • the present invention also provides a lithography machine exposure system comprising a projection objective lens and the prism rotation adjustment mechanism, the projection objective lens comprising a plurality of prisms, the prism being fixed on the prism rotation adjustment mechanism.
  • the lithography machine exposure system of the present invention converts the linear drive into a rotary motion through the prism rotation adjustment mechanism, so that the rotation motion control is more precise, and the rotation control precision of the prism is improved, and at the same time, the prism
  • the rotation center is the hinge axis of the rocking member and the fixing member, which ensures the stability of the rotation center position, avoids the occurrence of disturbance during the rotation adjustment process, and further improves the rotation control precision of the prism.
  • the present invention also provides a lithography machine comprising the lithography machine exposure system.
  • the lithography machine of the present invention converts the linear drive into a rotary motion by the prism rotation adjusting mechanism, so that the control of the rotational motion is more precise, the rotation control precision of the prism is improved, and the rotation of the prism is simultaneously
  • the center is the hinge shaft of the rocking member and the fixing member, which ensures the stability of the center position of the rotation, avoids the occurrence of disturbance during the rotation adjustment process, and further improves the rotation control precision of the prism.
  • FIG. 1 is a schematic structural view of a prism rotation adjusting mechanism according to an embodiment of the present invention
  • FIG. 2 is a schematic structural view of a flexible mechanism according to an embodiment of the present invention.
  • FIG. 3 is a schematic structural view of a hinge mechanism of a flexible mechanism according to an embodiment of the present invention.
  • Figure 4 is a schematic view showing the principle of the prism rotation adjusting mechanism of the present invention.
  • Figure 5 is a diagram showing the detection data of the control accuracy of the prism rotation adjusting mechanism of the present invention.
  • Fig. 6 is a graph showing the test results of the modal test of the prism rotation adjusting mechanism of the present invention.
  • the figure shows: 100, flexible mechanism; 110, fixing member; 111, fixing member through hole; 120, driving member; 121, driving member through hole; 130, connecting member; 140, shaking member; 200, frame; Driver bracket; 400, driving unit; 500, pre-tightening unit; 600, detecting unit; 700, detecting bracket; K1, first hinge shaft; K2, second hinge shaft; K3, third hinge shaft; K4, fourth hinge Axis; ⁇ , drive member deflection angle; ⁇ , rocker deflection angle.
  • the prism rotation adjusting mechanism of the present invention comprises a frame 200, a flexible mechanism 100 and a driving mechanism
  • the flexible mechanism 100 includes a fixing member 110, a driving member 120, a connecting member 130 and a flexible hinged structure.
  • the rocking member 140, the fixing member 110, the driving member 120, the connecting member 130 and the rocking member 140 all adopt a block structure.
  • the fixing member 110 is fixed to the frame 200.
  • the drive mechanism includes a driver bracket 300 and a drive unit 400 mounted on the driver bracket 300, the driver bracket 300 being fixed to the frame 200, and the drive unit 400 being coupled to the drive member 120.
  • the drive unit 400 employs a piezoelectric ceramic motor.
  • One end of the fixing member 110 is flexibly hinged with a middle portion of the driving member 120.
  • One end of the driving member 120 is flexibly hinged with one end of the connecting member 130, and the other end is a free end.
  • the other end of the connecting member 130 is flexibly hinged with the rocking member 140.
  • the middle portion of the rocking member 140 is flexibly hinged with the fixing member 110.
  • a prism is fixed on the rocking member 140, and the hinge axis of the rocking member 140 and the fixing member 110 is a center of rotation of the prism.
  • the prism rotation adjusting mechanism of the present invention adopts the flexible mechanism 100 to form a quadrilateral flexible hinge structure, and the driving member 120 is linearly driven by the driving mechanism, and is transmitted to the rocking member 140 through the connecting member 130 and the fixing member 110, thereby converting the linear motion transmission of the driving mechanism into
  • the rotating motion of the rocking member 140 causes the prism on the rocking member 140 to rotate along with the rocking member 140, so that the control of the rotating motion is more precise, and the rotation control precision of the prism is improved, and at the same time, the rotating center of the prism is the rocking member 140 and
  • the hinge shaft of the fixing member 110 ensures the stability of the center of rotation and avoids the rotation adjustment process.
  • the turbulence of the prism further improves the accuracy of the rotation control of the prism.
  • the flexible mechanism 100 is connected by a flexible hinge, which can realize the quadrilateral hinged rotation transmission, and avoids the disadvantages of the mechanical hinge structure generating a gap, inconvenient installation, and the like, and the rotation control is more accurate.
  • the driving unit 400 of the driving mechanism and the driving member 120 can be connected by a contact connection or by a reversing structure to convert the linear motion of the driving unit 400 into the rotational motion of the driving member 120. If a contact connection is employed, different rotational angles of the drive member 120 are controlled by different processes of the drive unit 400 to accommodate the rotational control of the prisms on the wobble member 140.
  • the hinge axis of the fixing member 110 and the driving member 120 is the first hinge axis K1
  • the hinge axis of the driving member 120 and the connecting member 130 is the second hinge axis K2
  • the hinge of the connecting member 130 and the rocking member 140 is hinged.
  • the shaft is a third hinge axis K3, and the hinge axis of the rocker 140 and the fixing member 110 is a fourth hinge axis K4, and the first, second, third, and fourth hinge axes K1, K2, K3, K4 can be opened.
  • the groove is formed in a manner.
  • the remaining portions are grooved, so that the fixing member 110 and the driving member 120 form a flexible hinge, the second, the third, and the The four hinge axes K2, K3, and K4 are formed in the same manner.
  • the fixing member 110, the driving member 120, the connecting member 130 and the rocking member 140 are of an integral structure, and the positions of the first, second, third and fourth hinge axes K1, K2, K3 and K4 are preset by After that, the integrated structure can be grooved.
  • the driving member 120 and the hinge end of the connecting member 130 are deflected, and the driving member is deflected by the angle ⁇ , and the connecting member 130 transmits the motion to the swinging member 140, and shakes.
  • the member 140 is deflected and the whip is deflected by an angle ⁇ .
  • the prism is fixed on the rocking member 140, and the center of rotation of the prism is the hinge axis of the rocking member 140 and the fixing member 110. Therefore, the prism is deflected with the rocking member 140, and the deflection angle is the same as the value of the rocking member deflection angle ⁇ . In the process of adjusting the rotation of the prism, it is only necessary to control the value of the deflection angle ⁇ of the rocker to achieve precise control of the rotation of the prism.
  • the prism rotation adjustment mechanism further includes a detection unit 600 and a detection bracket 700 corresponding to the detection unit 600.
  • the detection bracket 700 is vertically connected to the rocking member 140.
  • the detecting bracket 700 is aligned with the detecting unit 600 through the fixing member through hole 111 located on the fixing member 110.
  • the detection unit 600 is fixed to the frame 200 and constitutes a closed loop control system with the drive mechanism.
  • the detection unit 600 and the driving mechanism form a closed-loop control system, forming a feedback control on the rotational displacement of the prism, monitoring the rotation state from time to time, transmitting the rotational displacement to the driving mechanism, making the driving control of the driving mechanism more precise, and improving the prism The control accuracy of the rotation adjustment mechanism.
  • the prism rotation adjusting mechanism further includes a pretensioning unit 500, wherein the pretensioning unit 500 adopts a spring, one end of the spring abuts the fixing member 110, and the other end passes through a driving member through hole located on the driving member 120. 121 is then fixed on the free end.
  • the pretensioning unit 500 adopts a spring, one end of the spring abuts the fixing member 110, and the other end passes through a driving member through hole located on the driving member 120. 121 is then fixed on the free end.
  • the pre-tightening force of the driving member 120 and the rocking member 140 can be reversed in the initial position by the pre-tightening unit 500, the adjustment range of the prism rotation can be improved, and the rigidity of the prism rotation adjusting mechanism can be improved, and the prism can be improved.
  • the modality of the rotation adjustment mechanism is increased to reach a high-order state.
  • FIG. 5 is a diagram showing the detection data of the control precision of the prism rotation adjusting mechanism of the present invention.
  • the detection instrument used is a laser interferometer, wherein the abscissa indicates the deflection position of the sensor, and the ordinate indicates the control precision error of the rotation motion.
  • the precision error of the prism rotation adjusting mechanism of the present invention can be controlled to be less than 0.34 ⁇ rad, which greatly improves the control precision of the rotational motion with respect to the existing objective lens adjusting mechanism, which is due to the driving unit 400.
  • the longer the force arm can improve the proportional relationship between the driving arm and the force arm of the driving member 120, further refine the motion process, and significantly improve the control precision.
  • FIG. 6 is a test result diagram of a modal test of the prism rotation adjusting mechanism of the present invention
  • the detecting instrument used is a modal test instrument, wherein the abscissa represents frequency and the ordinate represents response amplitude.
  • the first-order mode is 655 Hz
  • the structural mode is a high-order mode. Therefore, the prism rotation adjusting mechanism of the present invention is a high-order modal mechanism, which improves the vibration response characteristic and further improves the rotation control precision of the prism.
  • the present invention also provides a lithography machine exposure system comprising a projection objective (not shown) and the prism rotation adjustment mechanism, the projection objective comprising a plurality of prisms,
  • the prism is fixed to the prism rotation adjustment mechanism.
  • the linear rotation drive is converted into a rotary motion by the prism rotation adjustment mechanism, the rotation motion control is more precise, and the rotation control precision of the prism is improved.
  • the rotation center of the prism is the hinge axis of the rocking member 140 and the fixing member 110. The position of the rotation center is ensured to be stable, and the disturbance during the rotation adjustment process is avoided, and the rotation control precision of the prism is further improved.
  • the present invention also provides a lithography machine comprising the lithography machine exposure system.
  • the linear rotation drive is converted into a rotary motion by the prism rotation adjustment mechanism, the rotation motion control is more precise, and the rotation control precision of the prism is improved.
  • the rotation center of the prism is the hinge axis of the rocking member 140 and the fixing member 110. The position of the rotation center is ensured to be stable, and the disturbance during the rotation adjustment process is avoided, and the rotation control precision of the prism is further improved.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)

Abstract

一种棱镜旋转调节机构和光刻机曝光***及光刻机，其中，棱镜旋转调节机构包括框架（200）、柔性机构（100）及驱动机构，柔性机构（100）包括依次柔性铰接的固定件（110）、驱动件（120）、连接件（130）及摇动件（140），固定件（110）固定在框架（200）上，驱动机构与框架（200）固接，并与驱动件（120）连接，摇动件（140）上固定有棱镜，摇动件（140）与固定件（110）的铰接轴为棱镜的旋转中心。这种棱镜旋转调节机构采用柔性机构构成四边形柔性铰链结构，通过驱动机构直线驱动驱动件，将直线运动转化为旋转运动，使旋转运动的控制更精确，提高了棱镜的旋转控制精度，同时，棱镜的旋转中心为摇动件与固定件的铰接轴，保证了旋转中心位置的稳定，避免在旋转调节过程中发生窜扰，进一步提高棱镜的旋转控制精度。

Description

一种棱镜旋转调节机构和光刻机曝光***及光刻机 技术领域
本发明涉及一种光刻设备，特别是涉及一种棱镜旋转调节机构和光刻机曝光***及光刻机。
背景技术
光刻技术是一种将掩模图案曝光成像到基底上的工艺技术。在光刻过程中，基底放在工件台上，通过位于光刻设备内的曝光装置，将掩模图案投射到基底表面。曝光是光刻工艺的一个重要环节，曝光方式分为接触式、接近式、投影式和直写式。投影式曝光是在掩模板与光刻胶之间使用光学***聚集光实现曝光。投影光刻对大规模集成电路的制造来说具有重要意义，投影物镜决定了投影光刻机的图像传递能力，是光刻机的核心。投影物镜通常采用棱镜对光路进行处理。
在曝光***曝光过程中，由于掩模板表面存在不同程度的变形(包括加工误差及重力夹持变形等)和环境变化的影响，会使像面偏离理想成像位置。在带有直角棱镜的折反射式物镜中，需要使用调整机构调整直角棱镜的位置，从而调整像面的位置，保证成像质量。
现有技术的物镜调节机构在物镜的棱镜上直接连接压电陶瓷电机，通过压电陶瓷电机直接驱动棱镜的平移和旋转，采用这种技术，物镜调节机构对棱镜的控制精度取决于压电陶瓷电机的控制精度，在控制精度上受到限制，且在棱镜旋转调节过程中需要两个压电陶瓷电机同时调整，才能保证棱镜在调整过程中无窜扰。
发明内容
本发明所要解决的技术问题是提供一种提高棱镜旋转调节精度、且在调 节过程中无窜扰的棱镜旋转调节机构和光刻机曝光***及光刻机。
为了实现上述目的，本发明采用如下技术方案予以实现：一种棱镜旋转调节机构，包括框架、柔性机构及驱动机构，所述柔性机构包括依次柔性铰接的固定件、驱动件、连接件及摇动件，所述固定件固定在框架上，所述驱动机构与所述框架固接，并与所述驱动件连接，所述摇动件用于固定棱镜，所述摇动件与所述固定件的铰接轴对应于所述棱镜的旋转中心。
优选的，所述固定件一端与所述驱动件的中部柔性铰接，所述驱动件一端与所述连接件的一端柔性铰接、另一端为自由端，所述连接件的另一端与所述摇动件柔性铰接，所述摇动件的中部与所述固定件柔性铰接。
进一步的，所述驱动机构连接所述自由端。
进一步的，还包括预紧单元，所述预紧单元一端抵触所述固定件，另一端固定在所述自由端上。
进一步的，所述预紧单元采用弹簧，所述弹簧一端抵触所述固定件，另一端固定在所述自由端上。
优选的，还包括检测单元及与检测单元对应的检测支架，所述检测支架垂直连接所述摇动件，所述检测单元固定在所述框架上且与所述驱动机构构成闭环控制***。
进一步的，所述检测支架贯穿所述固定件后对准所述检测单元。
优选的，所述驱动机构包括驱动器支架和安装在驱动器支架上的驱动单元，所述驱动器支架与所述框架固接，所述驱动单元连接至所述驱动件。
进一步的，所述驱动单元采用压电陶瓷电机。
优选的，所述固定件、驱动件、连接件及摇动件均采用块状结构。
优选的，所述固定件、驱动件、连接件及摇动件为一体式结构。
与现有技术相比，本发明的棱镜旋转调节机构采用柔性机构构成四边形柔性铰链结构，通过驱动机构直线驱动驱动件，通过连接件和固定件传动至摇动件，进而将驱动机构的直线运动传动转换为摇动件的旋转运动，使棱镜 随着摇动件发生旋转运动，使旋转运动的控制更精确，提高了棱镜的旋转控制精度，同时，棱镜的旋转中心为摇动件与固定件的铰接轴，保证了旋转中心位置的稳定，避免在旋转调节过程中发生窜扰，进一步提高了棱镜的旋转控制精度。
为了实现上述目的，本发明还提供一种光刻机曝光***，包括投影物镜和所述棱镜旋转调节机构，所述投影物镜包括若干个棱镜，所述棱镜固定在所述棱镜旋转调节机构上。
与现有技术相比，本发明的光刻机曝光***通过所述棱镜旋转调节机构，将直线驱动转化为旋转运动，使旋转运动的控制更精确，提高了棱镜的旋转控制精度，同时，棱镜的旋转中心为摇动件与固定件的铰接轴，保证了旋转中心位置的稳定，避免在旋转调节过程中发生窜扰，进一步提高了棱镜的旋转控制精度。
为了实现上述目的，本发明还提供一种光刻机，所述光刻机包括所述光刻机曝光***。
与现有技术相比，本发明的光刻机通过所述棱镜旋转调节机构，将直线驱动转化为旋转运动，使旋转运动的控制更精确，提高了棱镜的旋转控制精度，同时，棱镜的旋转中心为摇动件与固定件的铰接轴，保证了旋转中心位置的稳定，避免在旋转调节过程中发生窜扰，进一步提高了棱镜的旋转控制精度。
附图说明
图1是本发明一实施例中棱镜旋转调节机构的结构示意图；
图2是本发明一实施例中柔性机构的结构示意图；
图3是本发明一实施例中柔性机构铰接轴的结构示意图；
图4是本发明的棱镜旋转调节机构的原理示意图；
图5是本发明的棱镜旋转调节机构控制精度的检测数据图；
图6是本发明的棱镜旋转调节机构模态测试的测试结果图。
图中所示：100、柔性机构；110、固定件；111、固定件贯穿孔；120、驱动件；121、驱动件贯穿孔；130、连接件；140、摇动件；200、框架；300、驱动器支架；400、驱动单元；500、预紧单元；600、检测单元；700、检测支架；K1、第一铰接轴；K2、第二铰接轴；K3、第三铰接轴；K4、第四铰接轴；α、驱动件偏转角；β、摇动件偏转角。
具体实施方式
下面结合附图对本发明作详细描述：
如图1至图3所示，本发明的棱镜旋转调节机构，包括框架200、柔性机构100及驱动机构，所述柔性机构100包括依次柔性铰接的固定件110、驱动件120、连接件130及摇动件140，所述固定件110、驱动件120、连接件130及摇动件140均采用块状结构。所述固定件110固定在框架200上。所述驱动机构包括驱动器支架300和安装在驱动器支架300上的驱动单元400，所述驱动器支架300与框架200固接，所述驱动单元400连接至所述驱动件120。所述驱动单元400采用压电陶瓷电机。所述固定件110一端与驱动件120中部柔性铰接，所述驱动件120一端与连接件130的一端柔性铰接、另一端为自由端，所述连接件130的另一端与摇动件140柔性铰接，所述摇动件140中部与固定件110柔性铰接。所述摇动件140上固定有棱镜，所述摇动件140与固定件110的铰接轴为棱镜的旋转中心。
本发明的棱镜旋转调节机构采用柔性机构100构成四边形柔性铰链结构，通过驱动机构直线驱动驱动件120，通过连接件130和固定件110传动至摇动件140，进而将驱动机构的直线运动传动转换为摇动件140的旋转运动，使得摇动件140上的棱镜随着摇动件140发生旋转运动，使旋转运动的控制更精确，提高了棱镜的旋转控制精度，同时，棱镜的旋转中心为摇动件140与固定件110的铰接轴，保证了旋转中心位置的稳定，避免在旋转调节过程中发 生窜扰，进一步提高了棱镜的旋转控制精度。所述柔性机构100采用柔性铰接的方式连接，能够实现四边形铰接的旋转传动，同时避免了机械铰链结构产生缝隙、安装不便等缺点，使旋转的控制更加精确。
所述驱动机构的驱动单元400与驱动件120的连接方式可以采用接触式连接或者通过换向结构连接，使驱动单元400的直线运动转换成驱动件120的旋转运动。如果采用接触式连接，通过驱动单元400的不同进程控制驱动件120的不同旋转角度，以适用摇动件140上棱镜的旋转控制。
重点参照图4所示，固定件110与驱动件120的铰接轴为第一铰接轴K1，驱动件120与连接件130的铰接轴为第二铰接轴K2，连接件130与摇动件140的铰接轴为第三铰接轴K3，摇动件140与固定件110的铰接轴为第四铰接轴K4，所述第一、第二、第三、第四铰接轴K1、K2、K3、K4可以通过开槽的方式制作形成。具体地，所述固定件110与驱动件120之间除了所述第一铰接轴K1，其余部分均进行开槽处理，使固定件110和驱动件120形成柔性铰接，第二、第三、第四铰接轴K2、K3、K4采用同样方法形成。
进一步的，所述固定件110、驱动件120、连接件130及摇动件140为一体式结构，通过预设上述第一、第二、第三、第四铰接轴K1、K2、K3、K4位置后，对该一体式结构进行开槽处理即可。
当驱动件120的自由端受到驱动单元400的驱动力F作用时，驱动件120与连接件130的铰接端发生偏转，设驱动件偏转角α，连接件130将运动传动到摇动件140，摇动件140发生偏转，摇动件偏转角β。棱镜固定在摇动件140上，且棱镜的旋转中心为摇动件140与固定件110的铰接轴，因此，棱镜随着摇动件140发生偏转，偏转角度与摇动件偏转角β的值相同。在棱镜的旋转调节过程中，只需要控制摇动件偏转角β的值，即可实现对棱镜旋转的精确控制。
较佳的，请参照图1，所述棱镜旋转调节机构还包括检测单元600及与检测单元600对应的检测支架700，所述检测支架700垂直连接所述摇动件140， 所述检测支架700通过位于固定件110上的固定件贯穿孔111后对准所述检测单元600。所述检测单元600固定在框架200上且与所述驱动机构构成闭环控制***。
采用上述技术，通过检测单元600与驱动机构构成闭环控制***，对棱镜的旋转位移形成反馈控制，时时监控旋转状态，将旋转位移传送到驱动机构，使驱动机构的驱动控制更加精确，提高本棱镜旋转调节机构的控制精度。
较佳的，所述棱镜旋转调节机构还包括预紧单元500，所述预紧单元500采用弹簧，所述弹簧一端抵触所述固定件110，另一端通过位于驱动件120上的驱动件贯穿孔121后固定在所述自由端上。
采用上述技术，通过预紧单元500，既可以使驱动件120和摇动件140在初始位置受到反方向的预紧力，提高棱镜旋转的调节范围，又可以提高棱镜旋转调节机构的刚度，使棱镜旋转调节机构的模态提高，达到高阶状态。
图5所示为本发明的棱镜旋转调节机构控制精度的检测数据图，采用的检测仪器为激光干涉仪，其中，横坐标表示传感器偏转位置，纵坐标表示旋转运动的控制精度误差。由图5可以看出，本发明的棱镜旋转调节机构的精度误差可控制在0.34μrad以下，相对于现有的物镜调节机构，很大的提高了旋转运动的控制精度，这是由于驱动单元400的作用力臂较长，可提高驱动件120驱动力臂和作用力臂的比例关系，将运动过程进一步细化，显著的提高了控制精度。
图6所示为本发明的棱镜旋转调节机构模态测试的测试结果图，采用的检测仪器为模态测试仪器，其中，横坐标表示频率，纵坐标表示响应幅值。从图6中可以看出，通过对本棱镜旋转调节机构进行振动测试，测得其一阶模态为655Hz，结构模态为高阶模态。因此，本发明的棱镜旋转调节机构为高阶模态机构，提高了振动响应特性，进一步提高了棱镜的旋转控制精度。
参照图1至图3所示，本发明还提供一种光刻机曝光***，包括投影物镜(未图示)和所述的棱镜旋转调节机构，所述投影物镜包括若干个棱镜， 所述棱镜固定在所述棱镜旋转调节机构上。通过所述棱镜旋转调节机构，将直线驱动转化为旋转运动，使旋转运动的控制更精确，提高了棱镜的旋转控制精度，同时，棱镜的旋转中心为摇动件140与固定件110的铰接轴，保证了旋转中心位置的稳定，避免在旋转调节过程中发生窜扰，进一步提高了棱镜的旋转控制精度。
参照图1至图3所示，本发明还提供一种光刻机包括所述的光刻机曝光***。通过所述棱镜旋转调节机构，将直线驱动转化为旋转运动，使旋转运动的控制更精确，提高了棱镜的旋转控制精度，同时，棱镜的旋转中心为摇动件140与固定件110的铰接轴，保证了旋转中心位置的稳定，避免在旋转调节过程中发生窜扰，进一步提高了棱镜的旋转控制精度。

Claims (13)

  1. 一种棱镜旋转调节机构，其特征在于，包括框架、柔性机构及驱动机构，所述柔性机构包括依次柔性铰接的固定件、驱动件、连接件及摇动件，所述固定件固定在框架上，所述驱动机构与所述框架固接，并与所述驱动件连接，所述摇动件用于固定棱镜，所述摇动件与所述固定件的铰接轴对应于所述棱镜的旋转中心。
  2. 根据权利要求1所述的棱镜旋转调节机构，其特征在于，所述固定件一端与所述驱动件的中部柔性铰接，所述驱动件一端与所述连接件的一端柔性铰接、另一端为自由端，所述连接件的另一端与所述摇动件柔性铰接，所述摇动件的中部与所述固定件柔性铰接。
  3. 根据权利要求2所述的棱镜旋转调节机构，其特征在于，所述驱动机构连接所述自由端。
  4. 根据权利要求2所述的棱镜旋转调节机构，其特征在于，还包括预紧单元，所述预紧单元一端抵触所述固定件，另一端固定在所述自由端上。
  5. 根据权利要求4所述的棱镜旋转调节机构，其特征在于，所述预紧单元采用弹簧，所述弹簧一端抵触所述固定件，另一端固定在所述自由端上。
  6. 根据权利要求1所述的棱镜旋转调节机构，其特征在于，还包括检测单元及与检测单元对应的检测支架，所述检测支架垂直连接所述摇动件，所述检测单元固定在所述框架上且与所述驱动机构构成闭环控制***。
  7. 根据权利要求6所述的棱镜旋转调节机构，其特征在于，所述检测支架贯穿所述固定件后对准所述检测单元。
  8. 根据权利要求1所述的棱镜旋转调节机构，其特征在于，所述驱动机构包括驱动器支架和安装在驱动器支架上的驱动单元，所述驱动器支架与所述框架固接，所述驱动单元连接至所述驱动件。
  9. 根据权利要求8所述的棱镜旋转调节机构，其特征在于，所述驱动单元 采用压电陶瓷电机。
  10. 根据权利要求1所述的棱镜旋转调节机构，其特征在于，所述固定件、驱动件、连接件及摇动件均采用块状结构。
  11. 根据权利要求1或10所述的棱镜旋转调节机构，其特征在于，所述固定件、驱动件、连接件及摇动件为一体式结构。
  12. 一种光刻机曝光***，其特征在于，包括投影物镜和权利要求1至11中任何一项所述的棱镜旋转调节机构，所述投影物镜包括若干个棱镜，所述棱镜固定在所述棱镜旋转调节机构上。
  13. 一种光刻机，其特征在于，所述光刻机包括权利要求12所述的光刻机曝光***。
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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1317725A (zh) * 2000-03-31 2001-10-17 株式会社尼康 曝光设备的光学元件保持装置
CN201611424U (zh) * 2010-02-05 2010-10-20 上海微电子装备有限公司 一种偏置平板的调整装置
CN202533713U (zh) * 2012-03-09 2012-11-14 上海微电子装备有限公司 一种偏置平板调整装置
CN103901576A (zh) * 2012-12-28 2014-07-02 上海微电子装备有限公司 可动镜片微调机构
CN104391367A (zh) * 2014-10-15 2015-03-04 中国科学院光电研究院 一种极紫外反射镜片的四维装调装置
CN104407428A (zh) * 2014-11-26 2015-03-11 徐可欣 一种可围绕虚拟轴旋转的电动镜片
CN204269905U (zh) * 2014-11-26 2015-04-15 上海微电子装备有限公司 棱镜调整机构
CN105403977A (zh) * 2014-08-28 2016-03-16 上海微电子装备有限公司 一种用于棱镜定心调整机构

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0583714U (ja) * 1992-04-07 1993-11-12 日本板硝子株式会社 ２軸あおり台
JP3666606B2 (ja) 1993-12-06 2005-06-29 株式会社ニコン 投影露光装置
JPH09310U (ja) * 1996-11-11 1997-05-27 ソニー株式会社 分光プリズムブロック
JP2000338430A (ja) 1999-05-28 2000-12-08 Mitsubishi Electric Corp ミラー傾動機構
AU2002258356A1 (en) * 2000-11-03 2002-09-12 Herzel Laor Piezoelectric optical cross connect switching
US6873479B2 (en) * 2003-04-30 2005-03-29 Eastman Kodak Company Mounting bracket for a clear aperture of the base face of a prism
JP4665759B2 (ja) * 2003-06-06 2011-04-06 株式会社ニコン 光学素子保持装置、鏡筒、露光装置、及びデバイスの製造方法
DE10344178B4 (de) * 2003-09-24 2006-08-10 Carl Zeiss Smt Ag Halte- und Positioniervorrichtung für ein optisches Element
CN1249478C (zh) * 2004-02-16 2006-04-05 中国科学院上海光学精密机械研究所 大口径标准平板精密调整架
KR20060030371A (ko) * 2004-10-05 2006-04-10 삼성전자주식회사 광주사장치
KR101025632B1 (ko) * 2004-11-30 2011-03-30 가부시키가이샤 야스카와덴키 얼라인먼트 장치
JP5173382B2 (ja) * 2007-12-03 2013-04-03 キヤノン株式会社 プリズムユニット
US8395758B2 (en) 2009-05-15 2013-03-12 Nikon Corporation Exposure apparatus and device manufacturing method
US8085482B2 (en) * 2010-05-27 2011-12-27 Corning Incorporated X-Y adjustable optical mount with Z rotation
CN101976021B (zh) * 2010-10-12 2012-11-14 上海微电子装备有限公司 对准***参考板和探测光纤的安装、调整装置及装调方法
EP2768380B1 (en) * 2011-10-21 2018-08-08 Novartis Ag Gonio lens system with stabilization mechanism
CN104220931B (zh) * 2012-03-29 2016-10-12 卡尔蔡司Smt有限责任公司 补偿微光刻投射曝光***的通道缺陷的设备及方法
US9354422B1 (en) * 2013-07-01 2016-05-31 Ball Aerospace & Technologies Corp. High acceleration actuator
CN104280858B (zh) * 2014-10-23 2016-08-17 中国工程物理研究院总体工程研究所 一种大口径反射镜用背部柔性支撑装置
US10379314B2 (en) * 2015-03-19 2019-08-13 Panasonic Intellectual Property Management Co., Ltd. Multi-degree-of-freedom support mechanism, lens barrel, and optical device

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1317725A (zh) * 2000-03-31 2001-10-17 株式会社尼康 曝光设备的光学元件保持装置
CN201611424U (zh) * 2010-02-05 2010-10-20 上海微电子装备有限公司 一种偏置平板的调整装置
CN202533713U (zh) * 2012-03-09 2012-11-14 上海微电子装备有限公司 一种偏置平板调整装置
CN103901576A (zh) * 2012-12-28 2014-07-02 上海微电子装备有限公司 可动镜片微调机构
CN105403977A (zh) * 2014-08-28 2016-03-16 上海微电子装备有限公司 一种用于棱镜定心调整机构
CN104391367A (zh) * 2014-10-15 2015-03-04 中国科学院光电研究院 一种极紫外反射镜片的四维装调装置
CN104407428A (zh) * 2014-11-26 2015-03-11 徐可欣 一种可围绕虚拟轴旋转的电动镜片
CN204269905U (zh) * 2014-11-26 2015-04-15 上海微电子装备有限公司 棱镜调整机构

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