WO2016167015A1 - 半導体装置および複合型半導体装置 - Google Patents
半導体装置および複合型半導体装置 Download PDFInfo
- Publication number
- WO2016167015A1 WO2016167015A1 PCT/JP2016/054482 JP2016054482W WO2016167015A1 WO 2016167015 A1 WO2016167015 A1 WO 2016167015A1 JP 2016054482 W JP2016054482 W JP 2016054482W WO 2016167015 A1 WO2016167015 A1 WO 2016167015A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- field effect
- effect transistor
- normally
- terminal
- semiconductor device
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims description 93
- 239000002131 composite material Substances 0.000 title claims description 42
- 230000005669 field effect Effects 0.000 claims abstract description 207
- 230000004044 response Effects 0.000 abstract description 8
- 238000010586 diagram Methods 0.000 description 13
- 230000008859 change Effects 0.000 description 10
- 239000000758 substrate Substances 0.000 description 7
- 230000015556 catabolic process Effects 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 4
- 230000003111 delayed effect Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0207—Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/18—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/30—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having three or more electrodes, e.g. transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
- H01L2224/0601—Structure
- H01L2224/0603—Bonding areas having different sizes, e.g. different heights or widths
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48257—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a die pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/4901—Structure
- H01L2224/4903—Connectors having different sizes, e.g. different diameters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
- H01L27/0617—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
- H01L27/0629—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with diodes, or resistors, or capacitors
Definitions
- the present invention includes a semiconductor device including a plurality of normally-off field effect transistors or a plurality of normally-on field effect transistors, and a normally-on field effect transistor and a plurality of normally-off field effect transistors.
- the present invention relates to a composite semiconductor device.
- Si (silicon) -based field effect transistors mainly used in current semiconductor devices are normally-off type.
- the normally-off type field effect transistor conducts when a positive voltage is applied between the gate electrode (G) and the source electrode (S), and is positive between the gate electrode (G) and the source electrode (S). It is a transistor that becomes non-conductive when no voltage is applied.
- As one method for realizing this normally-off type field effect transistor there is a lateral double-diffused MOS field effect transistor (LDMOSFET: The Lateral Double-Diffused MOS field effect transistor).
- LDMOSFET The Lateral Double-Diffused MOS field effect transistor.
- This laterally double diffusion MOS field effect transistor has a feature that the source electrode (S) and the drain electrode (D) are formed on the same surface of the semiconductor substrate, and further penetrates the semiconductor from the source electrode (S). The trench is characterized in that it can be connected to an electrode on the back surface of the semiconductor.
- III-N field effect transistors such as GaN, which have been studied for practical use due to their characteristics such as high breakdown voltage, low loss, high-speed switching, and high-temperature operation, are normally-on type.
- a normally-on field effect transistor has a negative threshold voltage and becomes non-conductive when the voltage between the gate electrode (G) and the source electrode (S) is lower than the threshold voltage, Conduction occurs when the voltage between the gate electrode (G) and the source electrode (S) is higher than the threshold voltage.
- various problems such as the inability to use a conventional gate drive circuit occur.
- Patent Document 1 proposes that a normally-off type compound semiconductor device is configured by connecting a normally-on type field-effect transistor and a normally-off type field-effect transistor in series.
- Patent Document 2 proposes that the voltage between the drain electrode (D) and the source electrode (S) of a normally-off type field effect transistor is increased and the normally-off type field effect transistor is destroyed.
- a Zener diode is connected between the drain electrode (D) and the source electrode (S) of the normally-off field effect transistor, and the voltage between the drain electrode (D) and the source electrode (S) is There has been proposed a method of limiting to the withstand voltage or less of normally-off type field effect transistors.
- Japanese Patent Publication Japanese Patent Laid-Open No. 2006-158185 (published on June 15, 2006)” Japanese Patent Publication “Japanese Patent Laid-Open No. 2006-324839 (published on November 30, 2006)”
- normally-off type field effect transistors semiconductor devices
- semiconductor devices provided in the above-described conventional normally-off type composite semiconductor devices are often composed of a collection of small field-effect transistors called fingers.
- the gate electrode (G) of each finger is connected by metal wiring from the gate terminal of the normally-off type field effect transistor. Therefore, compared with the gate signal transmitted to the gate electrode of the finger arranged near the gate terminal of the normally-off type field effect transistor, it is opposite to the side where the gate terminal of the normally-off type field effect transistor is located.
- the gate signal transmitted to the gate electrode of the finger arranged on the side is greatly delayed. As a result, the response performance of the composite semiconductor device has been degraded.
- a normally-on type field effect transistor may be composed of a collection of small field effect transistors called fingers, and in this case, the above-described problems may occur.
- normally-on field effect transistors such as III-N and SiC such as GaN have higher withstand voltage and lower on-resistance and operate at higher speed than Si-based normally-off field effect transistors.
- the response performance of a normally-on type field effect transistor is inferior, the high-speed response performance is limited.
- An object of the present invention is to provide a semiconductor device with improved response performance.
- a semiconductor device of the present invention is a semiconductor device including a plurality of normally-off or normally-on type field effect transistors, and having a gate terminal, a drain terminal, and a source terminal.
- the gate electrode is connected to the gate terminal
- the drain electrode is connected to the drain terminal
- the source electrode is connected to the source terminal
- the anode electrode is connected to the source terminal
- the cathode electrode is connected to the drain terminal.
- Each of the field effect transistors is arranged so as to be sequentially away from the gate terminal to form a block, and the block is arranged closer to the gate terminal than the Zener diode. It is characterized by.
- the plurality of field effect transistors that are more affected by the wiring resistance than the Zener diode are arranged near the gate terminal. Therefore, a transmission delay of the signal supplied from the gate terminal to each gate electrode of the field effect transistor can be suppressed, and a semiconductor device with improved response performance can be realized.
- a semiconductor device with improved response performance can be realized.
- FIG. 1 is a circuit diagram illustrating a schematic configuration of a normally-off lateral field effect transistor according to an embodiment of the present invention.
- FIG. 2 is a circuit diagram showing a schematic configuration of an evaluation circuit for evaluating the operation of the lateral field effect transistor shown in FIG. 1.
- FIG. 2 is a diagram illustrating operation timings of the lateral field effect transistor illustrated in FIG. 1. It is the figure which looked at the horizontal type field effect transistor shown in FIG. 1 from the surface direction in which the gate terminal is formed. It is a circuit diagram which shows schematic structure of the normally on type
- FIG. 6 is a diagram illustrating operation timings of the lateral field effect transistor illustrated in FIG. 5.
- FIG. 5 is a diagram illustrating operation timings of the lateral field effect transistor illustrated in FIG. 5.
- FIG. 3 is a circuit diagram showing a schematic configuration of a composite semiconductor device according to still another embodiment of the present invention including the normally-off lateral field effect transistor shown in FIG. 1 and a normally-on field effect transistor. is there. It is a figure which shows schematic structure of the composite type semiconductor device which package-processed the composite type semiconductor device shown in FIG.
- FIGS. 1 to 8 Embodiments of the present invention will be described with reference to FIGS. 1 to 8 as follows.
- FIG. 1 is a circuit diagram showing a schematic configuration of a normally-off lateral field effect transistor 20.
- the normally-off lateral field effect transistor 20 (semiconductor device) includes n (n is an integer of 2 or more) small field effect transistors, the first to nth fingers 1. 2... 4, Zener diode 5, drain terminal 6, gate terminal 7, source terminal 8, wiring resistance (first wiring resistance 9, second wiring resistance 10, third wiring resistance 11 ... n-th wiring resistance 12).
- Each of the first to nth fingers 1, 2, 3,... 4 is a normally-off type small field-effect transistor because the lateral field-effect transistor 20 is normally-off type, and the gate electrode (G ), A drain electrode (D), and a source electrode (S).
- the horizontal field effect transistor 20 includes an assembly (block) of small field effect transistors called fingers. Note that the number n of fingers is several thousand to several tens of thousands depending on the current capacity, and it is common to form an aggregate (block) of several thousand to several tens of thousands of fingers.
- the source electrodes (S) of the first to nth fingers 1, 2, 3,... 4 need to be connected to the source terminal 8 arranged on the back surface as described later. Therefore, the first to nth fingers 1, 2, 3,... 4 preferably have a laterally double diffused MOS field effect transistor structure.
- a laterally double diffused MOS field effect transistor is characterized in that the source electrode and the drain electrode are formed on the same surface of the semiconductor substrate, but is further connected to the electrode on the back surface of the semiconductor by a trench penetrating the semiconductor from the source electrode. It is because it is possible to make it.
- the gate terminal 7 of the normally-off lateral field effect transistor 20 is connected to the gate electrodes (G) of the 1st to nth fingers 1, 2, 3,.
- a first wiring resistance 9 exists in the wiring between the gate terminal 7 and the gate electrode (G) of the first finger 1, and the wiring between the gate terminal 7 and the gate electrode (G) of the second finger 2 has a first wiring resistance 9.
- a first wiring resistor 9 and a second wiring resistor 10 exist in series, and the wiring between the gate terminal 7 and the gate electrode (G) of the third finger 3 includes a first wiring resistor 9, a second wiring resistor 10, and a second wiring resistor 10.
- n first to n-th wiring resistors (first wiring resistors 9 and 2) are connected to the gate terminal 7 and the gate electrode (G) of the n-th finger 4.
- the drain electrodes (D) of the first to nth fingers 1, 2, 3,... 4 are connected to the drain terminal 6 of the normally-off lateral field effect transistor 20.
- the source electrodes (S) of the first to nth fingers 1, 2, 3,... 4 are connected to the source terminal 8 of the normally-off lateral field effect transistor 20.
- the normally-off lateral field effect transistor 20 may be applied with a voltage higher than its breakdown voltage.
- the normally-off lateral field effect transistor 20 is a Zener diode. 5 is provided.
- the anode electrode (A) of the Zener diode 5 is connected to the source terminal 8, and the cathode electrode (C) is connected to the drain terminal 6.
- the Zener diode 5 is arranged farther from the gate terminal 7 than the first to nth fingers 1, 2, 3,. That is, the 1st to nth fingers 1, 2, 3... 4 than the Zener diode 5 are arranged near the gate terminal 7.
- FIG. 2 is a circuit diagram showing a schematic configuration of an evaluation circuit for evaluating the operation of the normally-off lateral field effect transistor 20 shown in FIG.
- the evaluation circuit includes a lateral field effect transistor 20, a pulse generator 13, a termination resistor 14, a load resistor 15, and a power supply 16.
- One end of the pulse generator 13 is grounded, the other end of the pulse generator 13 is connected to the other end of the termination resistor 14 whose one end is grounded, and the lateral field effect transistor 20 gate terminal 7. It is connected to the.
- the drain terminal 6 of the lateral field effect transistor 20 is connected to one end of the load resistor 15, and the other end of the load resistor 15 is connected to the + terminal of the power supply 16 whose ground is negative.
- the source terminal 8 of the lateral field effect transistor 20 is grounded. (Operation of normally-off lateral field effect transistors)
- FIG. 3 is a diagram showing the operation timing of the lateral field effect transistor 20 shown in FIG.
- Each voltage shown in FIG. 3 shows a voltage change of each part of the lateral field effect transistor 20 shown in FIG.
- V (gate terminal) is the voltage at the gate terminal 7 of the lateral field effect transistor 20
- V (point A) is the voltage at point A in FIG. 1
- V (point B) is the voltage at point B in FIG.
- V (point C) is the voltage at point C in FIG. 1
- V (point D) is the voltage at point D in FIG. 1
- V (drain terminal) is the voltage at the drain terminal 6 of the lateral field effect transistor 20.
- V (gate terminal) is the voltage at the gate terminal 7 of the lateral field effect transistor 20
- V (point A) is the voltage at point A in FIG. 1
- V (point B) is the voltage at point B in FIG.
- V (point C) is the voltage at point C in FIG. 1
- V (point D) is the voltage at point D in FIG. 1
- V (drain terminal) is the voltage at the drain terminal 6 of the lateral field effect
- V gate terminal
- V (gate terminal) when a voltage (high level) equal to or higher than the gate voltage at which the lateral field effect transistor 20 is turned on is input to the gate terminal 7, first, the voltage is shown at V (point A).
- the gate electrode (G) of the finger 1 has a voltage (high level) equal to or higher than the gate voltage at which the first finger 1 closest to the gate terminal 7 is turned on, delayed by the influence of the first wiring resistance 9. Will be input.
- V drain terminal
- V (drain terminal) is at a high level at the timing when the first finger 1 is turned on. Changes from low to low.
- V (point B) a voltage (high level) equal to or higher than the gate voltage at which the second finger 2 is turned on with a delay due to the addition of the second wiring resistance 10 is second. Is input to the gate electrode (G) of the finger 2.
- G gate electrode
- V (point C) a voltage (a voltage equal to or higher than the gate voltage at which the third finger 3 is turned on after a further delay due to the addition of the second wiring resistor 10 and the third wiring resistor 11 ( High level) is input to the gate electrode (G) of the third finger 3.
- a voltage a voltage equal to or higher than the gate voltage at which the third finger 3 is turned on after a further delay due to the addition of the second wiring resistor 10 and the third wiring resistor 11 ( High level) is input to the gate electrode (G) of the third finger 3.
- the third finger 3 is turned on, a current flows through the lateral field effect transistor 20, but since the V (drain terminal) has already changed from the high level to the low level, the third finger 3 is turned on. At the timing to become, no voltage change appears at V (drain terminal), and the low level is maintained.
- the n-th finger 4 is turned on with a further delay due to the addition of the second to n-th wiring resistances (10, 11,..., 12).
- a voltage higher than the gate voltage (high level) is input to the gate electrode (G) of the nth finger 4.
- the nth finger 4 is turned on, a current flows through the lateral field effect transistor 20, but since the V (drain terminal) has already changed from the high level to the low level, the nth finger 4 is turned on. At the timing to become, no voltage change appears at V (drain terminal), and the low level is maintained.
- V gate terminal
- a voltage (high level) equal to or higher than the gate voltage at which the lateral field effect transistor 20 is turned on is input to the gate terminal 7 for a certain period and then returns to the low level
- the first finger 1 is turned off due to the influence of the first wiring resistance 9, but the current change is still other fingers 2, 3... Does not appear at V (drain terminal) because is turned on.
- the second finger 2 and the third finger 3 are sequentially turned off with the influence of the wiring resistance as time passes, but V (drain terminal) remains at a low level until the nth finger 4 is turned off. And at the timing when the nth finger 4 is turned off, V (drain terminal) becomes high level.
- the delay time of OFF (the time from the timing when V (gate terminal) becomes low level to the timing when V (drain terminal) becomes high level) tends to be longer than the time period of time.
- FIG. 4 is a view of the lateral field effect transistor 20 shown in FIG. 1 as seen from the plane direction on which the gate terminal 7 is formed.
- the lateral field effect transistor 20 includes an assembly of the first to nth fingers 1, 2, 3,..., That is, the first to nth fingers 1, 2, 3,.
- a block 17 in which 4 is arranged, a Zener diode 5, a drain terminal 6, a gate terminal 7, and a source terminal (not shown) arranged on the back surface are provided.
- the first to nth fingers 1, 2, 3... 4 are arranged so as to be sequentially away from the gate terminal 7.
- the zener diode 5 is arranged farthest from the gate terminal 7 because the influence of the wiring resistance is small. With this arrangement, the first to nth fingers 1, 2, 3,... 4 that are greatly affected by the wiring resistance can be arranged as close to the gate terminal 7 as possible. It is possible to reduce the delay time.
- the lateral field effect transistor 20 of the present embodiment is normally-off type, it often follows the pin arrangement of a general Si field effect transistor package.
- the terminals are arranged in the order of the gate terminal, the drain terminal, and the source terminal, and the gate terminal on the lateral field-effect transistor chip is also wired at the end of the short side of the chip. Often done. Also in this case, it is possible to reduce the OFF delay time by disposing a Zener diode at the end opposite to the short side of the chip having the gate terminal (see FIG. 8 described later).
- the present invention can be applied not only to the lateral field effect transistor but also to all field effect transistors.
- a field effect transistor which is a power device has a finger structure for both a normally-off type and a normally-on type. Therefore, the present invention is not only a normally-off type but also a normally-on type.
- the present invention can also be applied to horizontal field effect transistors.
- Embodiment 2 Next, a second embodiment of the present invention will be described with reference to FIGS.
- the present embodiment is different from the first embodiment in that the lateral field effect transistor 30 is a normally-on type, and the others are as described in the first embodiment.
- members having the same functions as those shown in the drawings of Embodiment 1 are given the same reference numerals, and descriptions thereof are omitted.
- FIG. 5 is a circuit diagram showing a schematic configuration of a normally-on lateral field effect transistor 30.
- the normally-on lateral field effect transistor 30 (semiconductor device) includes n (n is an integer of 2 or more) small field effect transistors, the first to nth fingers 21. 22, 23... 24, Zener diode 5, drain terminal 6, gate terminal 7, source terminal 8, wiring resistance (first wiring resistance 9, second wiring resistance 10, third wiring resistance 11. .. nth wiring resistance 12).
- n is an integer of 2 or more
- Zener diode 5 drain terminal 6, gate terminal 7, source terminal 8
- wiring resistance first wiring resistance 9, second wiring resistance 10, third wiring resistance 11. .. nth wiring resistance 12.
- Each of the first to n-th fingers 21, 22, 23,... 24 is a normally-on type small field effect transistor because the lateral field-effect transistor 30 is normally-on type, and the gate electrode (G ), A drain electrode (D), and a source electrode (S).
- the gate terminal 7 of the normally-on lateral field effect transistor 30 is connected to the gate electrodes (G) of the first to nth fingers 21, 22, 23.
- the first wiring resistance 9 exists in the wiring between the gate terminal 7 and the gate electrode (G) of the first finger 21, and the wiring between the gate terminal 7 and the gate electrode (G) of the second finger 22 has the first wiring resistance 9.
- the first wiring resistance 9 and the second wiring resistance 10 exist in series, and the wiring between the gate terminal 7 and the gate electrode (G) of the third finger 23 includes the first wiring resistance 9, the second wiring resistance 10, and the second wiring resistance 10.
- FIG. 6 is a diagram showing the operation timing of the lateral field effect transistor 30 shown in FIG.
- Each voltage shown in FIG. 6 shows a voltage change of each part of the lateral field effect transistor 30 shown in FIG.
- V (gate terminal) is the voltage at the gate terminal 7 of the lateral field effect transistor 30
- V (point E) is the voltage at point E in FIG. 5
- V (point F) is the voltage at point F in FIG.
- V (point G) is the voltage at point G in FIG. 5
- V (point H) is the voltage at point H in FIG. 5
- V (drain terminal) is the voltage at the drain terminal 6 of the lateral field effect transistor 30.
- V (gate terminal) is the voltage at the gate terminal 7 of the lateral field effect transistor 30
- V (point E) is the voltage at point E in FIG. 5
- V (point F) is the voltage at point F in FIG.
- V (point G) is the voltage at point G in FIG. 5
- V (point H) is the voltage at point H in FIG. 5
- V (drain terminal) is the voltage at the drain terminal 6 of the lateral field effect
- the lateral field effect transistor 30 Since the lateral field effect transistor 30 is normally on, the lateral field effect transistor 30 is turned on even when V (gate terminal) is at the ground potential (0 V), and V (gate terminal) is set to turn off. It needs to be a negative potential (negative voltage).
- V gate terminal
- V (gate terminal) when a voltage (ground potential) equal to or higher than the gate voltage at which the lateral field effect transistor 30 is turned on is input to the gate terminal 7, first, the voltage is shown at V (point E). As shown, the voltage (ground potential) equal to or higher than the gate voltage at which the first finger 21 closest to the gate terminal 7 is turned on is delayed by the influence of the first wiring resistance 9, and the gate electrode (G) of the finger 21. Will be input.
- the first finger 21 is turned on, a current flows through the lateral field effect transistor 30 and thus appears at V (drain terminal). At the timing when the first finger 21 is turned on, V (drain terminal) is at a high level. Changes from low to low.
- V point F
- a voltage (ground potential) equal to or higher than the gate voltage at which the second finger 22 is turned on with a delay due to the addition of the second wiring resistance 10 is second.
- G gate electrode
- V (point G) a voltage (a voltage equal to or higher than the gate voltage at which the third finger 23 is turned on with a delay due to the addition of the second wiring resistance 10 and the third wiring resistance 11 ( Ground potential) is input to the gate electrode (G) of the third finger 23.
- G gate electrode
- the n-th finger 24 is turned on with a further delay due to the addition of the second to n-th wiring resistances (10, 11,..., 12).
- a voltage (ground potential) equal to or higher than the gate voltage is input to the gate electrode (G) of the nth finger 24.
- V (gate terminal) As shown in V (gate terminal), after a voltage (ground potential) equal to or higher than the gate voltage at which the lateral field effect transistor 30 is turned on is input to the gate terminal 7 for a certain period, a negative potential (low level) ( Returning to the negative voltage), as shown in V (point E), the first finger 21 is turned off due to the influence of the first wiring resistance 9, but the current change is still other than Since the fingers 22, 23,... 24 are on, they do not appear at V (drain terminal). The second finger 22 and the third finger 23 are sequentially turned off with the influence of the wiring resistance over time, but V (drain terminal) remains at a low level until the nth finger 24 is turned off. And at the timing when the nth finger 24 is turned off, V (drain terminal) becomes high level.
- the OFF delay time is longer than the ON delay time due to the influence of the wiring resistance. Tend to be larger.
- the lateral field effect transistor 30 of the present embodiment uses a configuration in which the first to nth fingers 21, 22, 23... 24 are arranged near the gate terminal 7 than the Zener diode 5. According to the above configuration, an increase in the wiring resistance existing in series with the wiring between the gate terminal 7 and the gate electrode (G) of the nth finger 24 farthest from the gate terminal 7 can be suppressed, and the first to nth Because of the arrangement of the second fingers 21, 22, 23,... 24, fingers having a remarkably high wiring resistance are not generated. Therefore, in the lateral field effect transistor 30, it is possible to reduce the OFF delay time as compared with the conventional case, and it is difficult for a specific finger to be broken.
- the composite semiconductor device 40 differs from the first embodiment in that it includes a normally-off lateral field effect transistor 20 and a normally-on field effect transistor 31. Is as described in the first embodiment.
- members having the same functions as those shown in the drawings of Embodiment 1 are given the same reference numerals, and descriptions thereof are omitted.
- FIG. 7 is a circuit diagram showing a schematic configuration of the composite semiconductor device 40.
- the composite semiconductor device 40 includes a normally-off lateral field effect transistor 20, a normally-on field effect transistor 31, a drain terminal 32, a gate terminal 33, and a source terminal 34. It has.
- the drain electrode (D) of the normally-on field effect transistor 31 is connected to the drain terminal 32 of the composite semiconductor device 40, and the gate electrode (G) of the normally-on field effect transistor 31 is the source terminal 34 of the composite semiconductor device 40.
- the source electrode (S) of the normally-on field effect transistor 31 is connected to the drain terminal 6 of the lateral field effect transistor 20.
- the gate terminal 7 of the lateral field effect transistor 20 is connected to the gate terminal 33 of the composite semiconductor device 40, and the source terminal 8 of the lateral field effect transistor 20 is connected to the source terminal 34 of the composite semiconductor device 40.
- the withstand voltage control is performed by the normally-on type field effect transistor 31, and the current control is performed by the normally-off type field effect transistor, specifically, the normally-off type lateral field effect transistor 20. Therefore, the OFF delay time of the lateral field effect transistor 20 is the largest factor that determines the OFF delay time in the composite semiconductor device 40.
- the lateral field effect transistor 20 uses a configuration in which the first to nth fingers 1, 2, 3,... 4 are arranged closer to the gate terminal 7 than the Zener diode 5. An increase in wiring resistance existing in series with the wiring with the gate electrode (G) of the nth finger 4 farthest from the gate terminal 7 can be suppressed. Therefore, since the lateral field effect transistor 20 capable of reducing the OFF delay time is used as compared with the conventional case, the OFF delay time of the composite semiconductor device 40 can be reduced.
- FIG. 4 a fourth embodiment of the present invention will be described based on FIG.
- the present embodiment is different from the third embodiment in that the composite semiconductor device 50 is a packaged composite semiconductor device, and the others are as described in the third embodiment.
- members having the same functions as those shown in the drawings of Embodiment 3 are given the same reference numerals, and descriptions thereof are omitted.
- FIG. 8 is a diagram showing a schematic configuration of the composite semiconductor device 50.
- a normally-off lateral field effect transistor 20 formed on a Si-based substrate and a III-N-based material such as GaN are formed on a die pad 41 provided in the composite semiconductor device 50.
- a normally-on field effect transistor 31 formed on the substrate is die-bonded.
- the gate electrode (G) of the normally-on type field effect transistor 31 and one end of the gate electrode (G) are connected to the die pad 41 which is the source terminal 34 of the composite semiconductor device 50 by the first wire 45, and the gate terminal 7 of the lateral type field effect transistor 20.
- the gate terminal 33 of the composite semiconductor device 50 are connected by a second wire 46, and the drain terminal 6 of the lateral field effect transistor 20 and the source electrode (S) of the normally on field effect transistor 31 are connected by a third wire 47.
- the drain electrode (D) of the normally-on field effect transistor 31 and the drain terminal 32 of the composite semiconductor device 50 are connected by a fourth wire 48, and the source terminal of the lateral field effect transistor 20 (not shown). 6 is a die pad 4 connected to the electrode on the back surface of the chip by a trench. And it is connected to the.
- the composite semiconductor device 50 is configured by sealing a part of three terminals of the drain terminal 32, the gate terminal 33 and the source terminal 34 with a package 49.
- the die pad 41 is fixed with a conductive material, but may be fixed with the die pad 41 with an insulator.
- the normally-on field effect transistor 31 formed on a III-N substrate such as GaN has a larger area per area than the normally-off lateral field effect transistor 20 formed on a Si substrate. Therefore, when the two field effect transistors have the same size, it is possible to pass a larger current than that of the normally-off lateral field effect transistor 20.
- Both the normally-on type field effect transistor 31 and the normally-off type lateral field effect transistor 20 are die-bonded to the die pad 41, and a normally-off field formed on the Si-based substrate while securing a wire forming space.
- a normally-off field formed on the Si-based substrate while securing a wire forming space.
- the composite semiconductor device 50 includes the rectangular-shaped normally-on field effect transistor 31 and the normally-off lateral field effect transistor 20, a large current flows through the normally-off lateral field effect transistor 20. And an area-efficient arrangement can be realized. Further, since the composite semiconductor device 50 has the Zener diode 5 built in the normally-off lateral field effect transistor 20, a voltage higher than the withstand voltage is applied to the normally-off lateral field effect transistor 20. In some cases, breakdown can be prevented. Further, in the lateral field effect transistor 20, the Zener diode 5 is arranged farthest from the gate terminal 7 because the influence of the wiring resistance is small. With such an arrangement, the first to nth fingers 1, 2, 3,... 4 that are greatly affected by the wiring resistance can be arranged as close to the gate terminal 7 as possible. Since the composite semiconductor device 50 includes such a lateral field effect transistor 20, it is possible to reduce the OFF delay time.
- the gate electrode (G), the drain electrode (D), and the source electrode (S) of the normally-on type field effect transistor 31 are formed on the same plane.
- the present invention is not limited to this.
- the gate electrode (G) and the drain electrode (D) of the normally-on field effect transistor 31 are formed on the same surface (upper surface), and the normally-on field effect transistor
- the 31 source electrodes (S) may be formed on the back surface (lower surface) of the same surface.
- the gate terminal 7 and the source terminal 8 of the normally-off lateral field effect transistor 20 are formed on the same surface (upper surface), and the drain terminal 6 is formed on the back surface (lower surface) of the same surface. It is preferable.
- the normally-on field effect transistor 31 provided in the composite semiconductor device 40 requires a high breakdown voltage and a low on-resistance.
- the size of the field effect transistor 31 tends to increase.
- the normally-off lateral field effect transistor 20 requires a drain electrode (D) having a large area for connection with the source electrode (S) of the normally-on field effect transistor 31, and prevents malfunction. Therefore, a high threshold voltage and a low on-resistance are required.
- the semiconductor device is a semiconductor device including a plurality of normally-off or normally-on type field effect transistors and including a gate terminal, a drain terminal, and a source terminal.
- a zener diode having a gate electrode connected to the gate terminal, a drain electrode connected to the drain terminal, a source electrode connected to the source terminal, an anode electrode connected to the source terminal, and a cathode electrode connected to the drain terminal.
- Each of the field effect transistors is arranged so as to be sequentially away from the gate terminal to form a block, and the block is arranged closer to the gate terminal than the Zener diode.
- the plurality of field effect transistors that are more affected by the wiring resistance than the Zener diode are arranged near the gate terminal. Therefore, a transmission delay of the signal supplied from the gate terminal to each gate electrode of the field effect transistor can be suppressed, and a semiconductor device with improved response performance can be realized.
- the Zener diode is provided at one end, and the gate terminal is provided at the other end opposite to the one end.
- the length in the first direction between the diode and the gate terminal is preferably longer than the length in the second direction orthogonal to the first direction.
- a horizontal semiconductor device in which the first direction is longer than the second direction that is, a rectangular semiconductor device can be realized, and a large current can be passed through the semiconductor device.
- each of the field effect transistors is a normally-off field effect transistor, and the gate terminal and any one of the drain terminal and the source terminal are first identical.
- the other of the drain terminal and the source terminal is formed on the back surface of the first same surface.
- the drain terminal and the source terminal are formed on the back surface of the surface on which the gate terminal is formed, the drain terminal (drain electrode) and the source terminal (source electrode) Either one can be easily combined with a field effect transistor provided on the back side.
- a composite semiconductor device is the semiconductor device according to aspect 3 above, a normally-on field effect transistor having a gate electrode, a drain electrode, and a source electrode, a second gate terminal, and a second drain terminal. And a second source terminal, wherein the second drain terminal is a drain electrode of the normally-on type field effect transistor, and the second source terminal is a gate electrode of the normally-on type field effect transistor and the above-mentioned
- the source terminal of the semiconductor device, the second gate terminal is connected to the gate terminal of the semiconductor device, and the source electrode of the normally-on field effect transistor is connected to the drain terminal of the semiconductor device.
- the semiconductor device capable of reducing the OFF delay time is used as compared with the conventional case, the OFF delay time of the composite semiconductor device can be reduced.
- the normally-on field effect transistor may include a semiconductor layer made of GaN or SiC.
- a normally-on type field effect transistor having a low on-resistance per area can be realized, so that a larger current can flow.
- the gate electrode, the drain electrode, and the source electrode of the normally-on field effect transistor may be formed on the second same surface.
- the back surface of the second same surface of the normally-on field effect transistor can be used for fixing.
- the gate electrode and the drain electrode of the normally-on field effect transistor are formed on the second same surface, and the source electrode of the normally-on field effect transistor is The gate terminal and the source terminal of the semiconductor device are formed on the first same surface, and the drain terminal of the semiconductor device is the back surface of the first same surface.
- the first identical surface and the second identical surface are upper surfaces, and the back surface of the first identical surface and the rear surface of the second identical surface are lower surfaces.
- the normally-on field effect transistor having the source electrode formed on the lower surface and the semiconductor device having the drain terminal formed on the lower surface can be easily combined.
- the normally-on field effect transistor is preferably rectangular.
- a part other than the part of the second gate terminal, the part of the second drain terminal, and the part of the second source terminal is sealed. Is preferred.
- a sealed composite semiconductor device can be realized.
- the present invention can be suitably used for a semiconductor device or a composite semiconductor device.
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- General Engineering & Computer Science (AREA)
- Junction Field-Effect Transistors (AREA)
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Abstract
Description
以下、本発明の一実施形態について、図1~図4に基づいて説明する。
(フィンガー)
1番目~n番目のフィンガー1・2・3・・・4の各々は、横型電界効果トランジスタ20がノーマリーオフ型であるため、ノーマリーオフ型の小さな電界効果トランジスタであり、ゲート電極(G)と、ドレイン電極(D)と、ソース電極(S)とを備えている。横型電界効果トランジスタ20は、このフィンガーと呼ばれる小さな電界効果トランジスタの集合体(ブロック)を備えている。なお、フィンガーの個数nは、電流容量によって数千~数万であり、数千~数万個のフィンガーの集合体(ブロック)を構成するのが一般的である。
(ノーマリーオフ型の横型電界効果トランジスタのゲート端子)
ノーマリーオフ型の横型電界効果トランジスタ20のゲート端子7は、1番目~n番目のフィンガー1・2・3・・・4のゲート電極(G)に接続される。ゲート端子7と1番目のフィンガー1のゲート電極(G)との配線には第1配線抵抗9が存在し、ゲート端子7と2番目のフィンガー2のゲート電極(G)との配線には第1配線抵抗9と第2配線抵抗10とが直列に存在し、ゲート端子7と3番目のフィンガー3のゲート電極(G)との配線には第1配線抵抗9と第2配線抵抗10と第3配線抵抗11とが直列に存在し、ゲート端子7とn番目のフィンガー4のゲート電極(G)との配線にはn個の第1~第n配線抵抗(第1配線抵抗9・第2配線抵抗10・第3配線抵抗11・・・第n配線抵抗12)が直列に存在する。
(ノーマリーオフ型の横型電界効果トランジスタのドレイン端子およびソース端子)
1番目~n番目のフィンガー1・2・3・・・4のドレイン電極(D)は、ノーマリーオフ型の横型電界効果トランジスタ20のドレイン端子6に接続される。一方、1番目~n番目のフィンガー1・2・3・・・4のソース電極(S)は、ノーマリーオフ型の横型電界効果トランジスタ20のソース端子8に接続される。
(ツェナーダイオード)
ノーマリーオフ型の横型電界効果トランジスタ20には、その耐圧以上の電圧が印加される場合があり、このような場合においてブレイクダウンを防ぐために、ノーマリーオフ型の横型電界効果トランジスタ20はツェナーダイオード5を備えている。ツェナーダイオード5のアノード電極(A)はソース端子8に接続されており、カソード電極(C)はドレイン端子6に接続されている。ツェナーダイオード5は、上述した配線抵抗の影響が小さいため、ゲート端子7から1番目~n番目のフィンガー1・2・3・・・4よりも遠くに配置されている。すなわち、ツェナーダイオード5よりも1番目~n番目のフィンガー1・2・3・・・4がゲート端子7の近くに配置されている。
(評価回路)
図2は、図1に図示したノーマリーオフ型の横型電界効果トランジスタ20の動作を評価する評価回路の概略構成を示す回路図である。
(ノーマリーオフ型の横型電界効果トランジスタの動作について)
図3は、図1に図示した横型電界効果トランジスタ20の動作タイミングを示す図である。
(横型電界効果トランジスタの配置)
図4は、図1に図示した横型電界効果トランジスタ20をゲート端子7が形成されている面方向から見た図である。
次に、図5および図6に基づいて、本発明の実施の形態2について説明する。本実施の形態においては、横型電界効果トランジスタ30がノーマリーオン型である点において実施の形態1とは異なり、その他については実施の形態1において説明したとおりである。説明の便宜上、実施の形態1の図面に示した部材と同じ機能を有する部材については、同じ符号を付し、その説明を省略する。
(フィンガー)
1番目~n番目のフィンガー21・22・23・・・24の各々は、横型電界効果トランジスタ30がノーマリーオン型であるため、ノーマリーオン型の小さな電界効果トランジスタであり、ゲート電極(G)と、ドレイン電極(D)と、ソース電極(S)とを備えている。
(ノーマリーオン型の横型電界効果トランジスタのゲート端子)
ノーマリーオン型の横型電界効果トランジスタ30のゲート端子7は、1番目~n番目のフィンガー21・22・23・・・24のゲート電極(G)に接続される。ゲート端子7と1番目のフィンガー21のゲート電極(G)との配線には第1配線抵抗9が存在し、ゲート端子7と2番目のフィンガー22のゲート電極(G)との配線には第1配線抵抗9と第2配線抵抗10とが直列に存在し、ゲート端子7と3番目のフィンガー23のゲート電極(G)との配線には第1配線抵抗9と第2配線抵抗10と第3配線抵抗11とが直列に存在し、ゲート端子7とn番目のフィンガー24のゲート電極(G)との配線にはn個の第1~第n配線抵抗(第1配線抵抗9・第2配線抵抗10・第3配線抵抗11・・・第n配線抵抗12)が直列に存在する。
(ノーマリーオン型の横型電界効果トランジスタのドレイン端子およびソース端子)
1番目~n番目のフィンガー21・22・23・・・24のドレイン電極(D)は、ノーマリーオン型の横型電界効果トランジスタ30のドレイン端子6に接続される。一方、1番目~n番目のフィンガー21・22・23・・・24のソース電極(S)は、ノーマリーオン型の横型電界効果トランジスタ30のソース端子8に接続される。
(ノーマリーオン型の横型電界効果トランジスタの動作について)
図6は、図5に図示した横型電界効果トランジスタ30の動作タイミングを示す図である。
次に、図7に基づいて、本発明の実施の形態3について説明する。本実施の形態においては、複合型半導体装置40は、ノーマリーオフ型の横型電界効果トランジスタ20と、ノーマリーオン型電界効果トランジスタ31とを備えている点において実施の形態1とは異なり、その他については実施の形態1において説明したとおりである。説明の便宜上、実施の形態1の図面に示した部材と同じ機能を有する部材については、同じ符号を付し、その説明を省略する。
次に、図8に基づいて、本発明の実施の形態4について説明する。本実施の形態においては、複合型半導体装置50がパッケージ化された複合型半導体装置である点において実施の形態3とは異なり、その他については実施の形態3において説明したとおりである。説明の便宜上、実施の形態3の図面に示した部材と同じ機能を有する部材については、同じ符号を付し、その説明を省略する。
本発明の態様1における半導体装置は、ノーマリーオフまたは、ノーマリーオン型電界効果トランジスタを複数含み、ゲート端子、ドレイン端子およびソース端子を備えた半導体装置であって、上記電界効果トランジスタの各々における、ゲート電極は上記ゲート端子に、ドレイン電極は上記ドレイン端子に、ソース電極は上記ソース端子にそれぞれ接続され、アノード電極が上記ソース端子に、カソード電極が上記ドレイン端子にそれぞれ接続されたツェナーダイオードを備え、上記電界効果トランジスタの各々は、上記ゲート端子から順に遠くなるように配置されブロックを形成し、上記ツェナーダイオードよりも上記ブロックが上記ゲート端子の近くに配置されていることを特徴としている。
2 2番目のフィンガー(電界効果トランジスタ)
3 3番目のフィンガー(電界効果トランジスタ)
4 n番目のフィンガー(電界効果トランジスタ)
5 ツェナーダイオード
6 ドレイン端子
7 ゲート端子
8 ソース端子
9 第1配線抵抗
10 第2配線抵抗
11 第3配線抵抗
12 第n配線抵抗
13 パルスジェネレータ
14 終端抵抗
15 負荷抵抗
16 電源
17 ブロック
20 横型電界効果トランジスタ(半導体装置)
21 1番目のフィンガー(電界効果トランジスタ)
22 2番目のフィンガー(電界効果トランジスタ)
23 3番目のフィンガー(電界効果トランジスタ)
24 n番目のフィンガー(電界効果トランジスタ)
30 横型電界効果トランジスタ(半導体装置)
31 ノーマリーオン型電界効果トランジスタ
32 ドレイン端子
33 ゲート端子
34 ソース端子
40 複合型半導体装置
41 ダイパッド
45 第1ワイヤー
46 第2ワイヤー
47 第3ワイヤー
48 第4ワイヤー
49 パッケージ
50 複合型半導体装置
A アノード電極
C カソード電極
Claims (5)
- ノーマリーオフまたは、ノーマリーオン型電界効果トランジスタを複数含み、ゲート端子、ドレイン端子およびソース端子を備えた半導体装置であって、
上記電界効果トランジスタの各々における、ゲート電極は上記ゲート端子に、ドレイン電極は上記ドレイン端子に、ソース電極は上記ソース端子にそれぞれ接続され、
アノード電極が上記ソース端子に、カソード電極が上記ドレイン端子にそれぞれ接続されたツェナーダイオードを備え、
上記電界効果トランジスタの各々は、上記ゲート端子から順に遠くなるように配置されブロックを形成し、
上記ツェナーダイオードよりも上記ブロックが上記ゲート端子の近くに配置されていることを特徴とする半導体装置。 - 上記ツェナーダイオードは一方の端部に備えられており、
上記ゲート端子は、上記一方の端部と反対側の他方の端部に備えられており
上記ツェナーダイオードと上記ゲート端子との間の第1方向の長さが、上記第1方向と直交する第2方向の長さよりも長いことを特徴とする請求項1に記載の半導体装置。 - 上記電界効果トランジスタの各々はノーマリーオフ型電界効果トランジスタであり、
上記ゲート端子と、上記ドレイン端子および上記ソース端子の何れか一方とは、第1同一面に形成されており、
上記ドレイン端子および上記ソース端子の他方は、上記第1同一面の裏面に形成されていることを特徴とする請求項1または2に記載の半導体装置。 - 請求項3に記載の半導体装置と、
ゲート電極、ドレイン電極およびソース電極を有するノーマリーオン型電界効果トランジスタと、
第2ゲート端子、第2ドレイン端子および第2ソース端子と、を備えており、
上記第2ドレイン端子は上記ノーマリーオン型電界効果トランジスタのドレイン電極に、上記第2ソース端子は上記ノーマリーオン型電界効果トランジスタのゲート電極および上記半導体装置のソース端子に、上記第2ゲート端子は上記半導体装置のゲート端子に、上記ノーマリーオン型電界効果トランジスタのソース電極は上記半導体装置のドレイン端子に、それぞれ接続されていることを特徴とする複合型半導体装置。 - 上記ノーマリーオン型電界効果トランジスタは、GaNまたはSiCからなる半導体層を備えていることを特徴とする請求項4に記載の複合型半導体装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/555,334 US20180040601A1 (en) | 2015-04-15 | 2016-02-16 | Semiconductor device and composite semiconductor device |
CN201680021582.9A CN107636824A (zh) | 2015-04-15 | 2016-02-16 | 半导体装置及复合型半导体装置 |
JP2017512213A JP6356337B2 (ja) | 2015-04-15 | 2016-02-16 | 半導体装置および複合型半導体装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015083753 | 2015-04-15 | ||
JP2015-083753 | 2015-04-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2016167015A1 true WO2016167015A1 (ja) | 2016-10-20 |
Family
ID=57125771
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2016/054482 WO2016167015A1 (ja) | 2015-04-15 | 2016-02-16 | 半導体装置および複合型半導体装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20180040601A1 (ja) |
JP (1) | JP6356337B2 (ja) |
CN (1) | CN107636824A (ja) |
WO (1) | WO2016167015A1 (ja) |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01276673A (ja) * | 1988-04-27 | 1989-11-07 | Fujitsu Ltd | 絶縁ゲート型半導体装置 |
JPH1154747A (ja) * | 1997-07-31 | 1999-02-26 | Toshiba Corp | 半導体装置と半導体モジュール |
JP2011067051A (ja) * | 2009-09-18 | 2011-03-31 | Sharp Corp | インバータと、それを用いた電気機器および太陽光発電装置 |
JP2013211548A (ja) * | 2012-03-15 | 2013-10-10 | Internatl Rectifier Corp | Iii−v族及びiv族複合スイッチ |
WO2014196223A1 (ja) * | 2013-06-03 | 2014-12-11 | シャープ株式会社 | 半導体チップおよび半導体装置 |
WO2015033631A1 (ja) * | 2013-09-06 | 2015-03-12 | シャープ株式会社 | トランジスタ回路 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4990976A (en) * | 1987-11-24 | 1991-02-05 | Nec Corporation | Semiconductor device including a field effect transistor having a protective diode between source and drain thereof |
JP4901445B2 (ja) * | 2006-12-06 | 2012-03-21 | ローム株式会社 | 駆動回路及びこれを用いた半導体装置 |
JP6223729B2 (ja) * | 2013-06-25 | 2017-11-01 | 株式会社東芝 | 半導体装置 |
JP6211829B2 (ja) * | 2013-06-25 | 2017-10-11 | 株式会社東芝 | 半導体装置 |
US9843181B2 (en) * | 2013-07-25 | 2017-12-12 | Infineon Technologies Austria Ag | Semiconductor device including a control circuit |
-
2016
- 2016-02-16 JP JP2017512213A patent/JP6356337B2/ja active Active
- 2016-02-16 WO PCT/JP2016/054482 patent/WO2016167015A1/ja active Application Filing
- 2016-02-16 CN CN201680021582.9A patent/CN107636824A/zh active Pending
- 2016-02-16 US US15/555,334 patent/US20180040601A1/en not_active Abandoned
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01276673A (ja) * | 1988-04-27 | 1989-11-07 | Fujitsu Ltd | 絶縁ゲート型半導体装置 |
JPH1154747A (ja) * | 1997-07-31 | 1999-02-26 | Toshiba Corp | 半導体装置と半導体モジュール |
JP2011067051A (ja) * | 2009-09-18 | 2011-03-31 | Sharp Corp | インバータと、それを用いた電気機器および太陽光発電装置 |
JP2013211548A (ja) * | 2012-03-15 | 2013-10-10 | Internatl Rectifier Corp | Iii−v族及びiv族複合スイッチ |
WO2014196223A1 (ja) * | 2013-06-03 | 2014-12-11 | シャープ株式会社 | 半導体チップおよび半導体装置 |
WO2015033631A1 (ja) * | 2013-09-06 | 2015-03-12 | シャープ株式会社 | トランジスタ回路 |
Also Published As
Publication number | Publication date |
---|---|
JPWO2016167015A1 (ja) | 2017-10-05 |
US20180040601A1 (en) | 2018-02-08 |
CN107636824A (zh) | 2018-01-26 |
JP6356337B2 (ja) | 2018-07-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9293458B2 (en) | Semiconductor electronic components and circuits | |
US9654001B2 (en) | Semiconductor device | |
JP7224918B2 (ja) | 半導体装置及び半導体パッケージ | |
US9966945B2 (en) | Semiconductor device | |
JP2006158185A (ja) | 電力用半導体装置 | |
CN103545352B (zh) | 半导体器件 | |
WO2016098391A1 (ja) | 電界効果トランジスタ | |
TWI737084B (zh) | 半導體裝置 | |
WO2014155959A1 (ja) | パワー半導体素子 | |
CN208189596U (zh) | 高电子迁移率二极管和半导体器件 | |
JP2019169766A (ja) | 半導体装置及び半導体パッケージ | |
TW201620110A (zh) | 具有分布閘極之功率電晶體 | |
JP6356337B2 (ja) | 半導体装置および複合型半導体装置 | |
US11398473B2 (en) | Semiconductor device | |
JP6374115B2 (ja) | 複合型半導体装置 | |
CN108735730B (zh) | 电力开关及其半导体装置 | |
JP2016197808A (ja) | 負荷駆動装置 | |
CN109244057B (zh) | 一种共源共栅级联结构的氮化镓器件 | |
CN112420681B (zh) | 一种芯片封装结构 | |
CN109643711B (zh) | 具有改进的钳位布置的igbt | |
JP2017139291A (ja) | 半導体装置 | |
WO2015079875A1 (ja) | 半導体装置 | |
JP2016213327A (ja) | 半導体装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 16779807 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2017512213 Country of ref document: JP Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 15555334 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 16779807 Country of ref document: EP Kind code of ref document: A1 |