WO2016071140A1 - Composés phénacène pour l'électronique organique - Google Patents
Composés phénacène pour l'électronique organique Download PDFInfo
- Publication number
- WO2016071140A1 WO2016071140A1 PCT/EP2015/074756 EP2015074756W WO2016071140A1 WO 2016071140 A1 WO2016071140 A1 WO 2016071140A1 EP 2015074756 W EP2015074756 W EP 2015074756W WO 2016071140 A1 WO2016071140 A1 WO 2016071140A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- mmol
- compounds
- organic
- solution
- printing
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 title claims abstract description 46
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims abstract description 7
- -1 n-hexadecyl Chemical group 0.000 claims description 34
- 239000004065 semiconductor Substances 0.000 claims description 30
- 239000010409 thin film Substances 0.000 claims description 12
- 230000005669 field effect Effects 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 230000000295 complement effect Effects 0.000 claims description 4
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 claims description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 48
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 46
- 239000000243 solution Substances 0.000 description 40
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical class CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 31
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 26
- 239000011541 reaction mixture Substances 0.000 description 26
- 238000005481 NMR spectroscopy Methods 0.000 description 23
- 238000000034 method Methods 0.000 description 21
- 239000000203 mixture Substances 0.000 description 21
- 230000015572 biosynthetic process Effects 0.000 description 19
- 238000003786 synthesis reaction Methods 0.000 description 19
- 239000003921 oil Substances 0.000 description 18
- 239000007787 solid Substances 0.000 description 18
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 238000007639 printing Methods 0.000 description 14
- 238000004440 column chromatography Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 239000012074 organic phase Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 8
- 239000000741 silica gel Substances 0.000 description 8
- 229910002027 silica gel Inorganic materials 0.000 description 8
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical class [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- 239000012043 crude product Substances 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 7
- 239000011369 resultant mixture Substances 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 239000003990 capacitor Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 238000005266 casting Methods 0.000 description 5
- 239000002131 composite material Substances 0.000 description 5
- 239000000284 extract Substances 0.000 description 5
- 229910001867 inorganic solvent Inorganic materials 0.000 description 5
- 239000003049 inorganic solvent Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000012044 organic layer Substances 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 239000002518 antifoaming agent Substances 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 239000012267 brine Substances 0.000 description 4
- MSEICUXSETXIDF-UHFFFAOYSA-N carbon monoxide;oxolane;tungsten Chemical compound [W].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].C1CCOC1 MSEICUXSETXIDF-UHFFFAOYSA-N 0.000 description 4
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 4
- 238000002508 contact lithography Methods 0.000 description 4
- 239000002270 dispersing agent Substances 0.000 description 4
- 238000007641 inkjet printing Methods 0.000 description 4
- 230000037230 mobility Effects 0.000 description 4
- 238000013086 organic photovoltaic Methods 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 4
- 239000000725 suspension Substances 0.000 description 4
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- PPTWRWSDISZQCG-UHFFFAOYSA-N 2-[2,3-dibromo-4-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)phenyl]-4,4,5,5-tetramethyl-1,3,2-dioxaborolane Chemical compound O1C(C)(C)C(C)(C)OB1C(C(=C1Br)Br)=CC=C1B1OC(C)(C)C(C)(C)O1 PPTWRWSDISZQCG-UHFFFAOYSA-N 0.000 description 3
- XUOLIUGOZWJYMQ-UHFFFAOYSA-N 2-thiophen-2-ylhexan-2-ol Chemical compound CCCCC(C)(O)C1=CC=CS1 XUOLIUGOZWJYMQ-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000002800 charge carrier Substances 0.000 description 3
- 239000003989 dielectric material Substances 0.000 description 3
- 238000007646 gravure printing Methods 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- DLEDOFVPSDKWEF-UHFFFAOYSA-N lithium butane Chemical compound [Li+].CCC[CH2-] DLEDOFVPSDKWEF-UHFFFAOYSA-N 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000000813 microcontact printing Methods 0.000 description 3
- MZRVEZGGRBJDDB-UHFFFAOYSA-N n-Butyllithium Substances [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 3
- 238000007645 offset printing Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000007649 pad printing Methods 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- JGOIIPRSFZFFHG-UHFFFAOYSA-N trimethyl(2-tributylstannylethynyl)silane Chemical compound CCCC[Sn](CCCC)(CCCC)C#C[Si](C)(C)C JGOIIPRSFZFFHG-UHFFFAOYSA-N 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- LUFMTCSTBXPABI-UHFFFAOYSA-N (2,3-dibromo-4-trimethylsilylphenyl)-trimethylsilane Chemical compound C[Si](C)(C)C1=CC=C([Si](C)(C)C)C(Br)=C1Br LUFMTCSTBXPABI-UHFFFAOYSA-N 0.000 description 2
- PRSIEYLGCNAOAK-UHFFFAOYSA-N 2,3-dibromo-1,4-diiodobenzene Chemical compound BrC1=C(Br)C(I)=CC=C1I PRSIEYLGCNAOAK-UHFFFAOYSA-N 0.000 description 2
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 2
- XUJCRPHQKFYGIW-UHFFFAOYSA-N 2-[2,3-dibromo-4-(5-tetradecylthiophen-2-yl)phenyl]-5-tetradecylthiophene Chemical compound S1C(CCCCCCCCCCCCCC)=CC=C1C(C(=C1Br)Br)=CC=C1C1=CC=C(CCCCCCCCCCCCCC)S1 XUJCRPHQKFYGIW-UHFFFAOYSA-N 0.000 description 2
- ARPSAWZIBUACGM-UHFFFAOYSA-N 2-[2,3-diethynyl-4-(5-tetradecylthiophen-2-yl)phenyl]-5-tetradecylthiophene Chemical compound S1C(CCCCCCCCCCCCCC)=CC=C1C(C(=C1C#C)C#C)=CC=C1C1=CC=C(CCCCCCCCCCCCCC)S1 ARPSAWZIBUACGM-UHFFFAOYSA-N 0.000 description 2
- RMIJYTKXAYCWEE-UHFFFAOYSA-N 2-bromo-5-tetradecylthiophene Chemical compound CCCCCCCCCCCCCCC1=CC=C(Br)S1 RMIJYTKXAYCWEE-UHFFFAOYSA-N 0.000 description 2
- TUCRZHGAIRVWTI-UHFFFAOYSA-N 2-bromothiophene Chemical compound BrC1=CC=CS1 TUCRZHGAIRVWTI-UHFFFAOYSA-N 0.000 description 2
- VETAUUSMDAPODD-UHFFFAOYSA-N 2-hexan-2-ylthiophene Chemical compound CCCCC(C)C1=CC=CS1 VETAUUSMDAPODD-UHFFFAOYSA-N 0.000 description 2
- HZZUFNXZYKMRBE-UHFFFAOYSA-N 2-tetradecylthiophene Chemical compound CCCCCCCCCCCCCCC1=CC=CS1 HZZUFNXZYKMRBE-UHFFFAOYSA-N 0.000 description 2
- 125000000175 2-thienyl group Chemical group S1C([*])=C([H])C([H])=C1[H] 0.000 description 2
- PLKFOBAANFCQKJ-UHFFFAOYSA-N 4-bromo-2-tetradecylthiophene Chemical compound CCCCCCCCCCCCCCC1=CC(Br)=CS1 PLKFOBAANFCQKJ-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KZMGYPLQYOPHEL-UHFFFAOYSA-N Boron trifluoride etherate Chemical compound FB(F)F.CCOCC KZMGYPLQYOPHEL-UHFFFAOYSA-N 0.000 description 2
- QUBUHMYVCRGYJY-UHFFFAOYSA-N BrC1=C(C=CC(=C1Br)C=1SC(=CC=1)C(CCCC)C)C=1SC(=CC=1)C(CCCC)C Chemical compound BrC1=C(C=CC(=C1Br)C=1SC(=CC=1)C(CCCC)C)C=1SC(=CC=1)C(CCCC)C QUBUHMYVCRGYJY-UHFFFAOYSA-N 0.000 description 2
- XDPHXNDBENFUOW-UHFFFAOYSA-N BrC=1C=C(SC=1)C(CCCC)C Chemical compound BrC=1C=C(SC=1)C(CCCC)C XDPHXNDBENFUOW-UHFFFAOYSA-N 0.000 description 2
- SRICNKYPPQQCBL-UHFFFAOYSA-N BrC=1SC(=CC=1)C(CCCC)C Chemical compound BrC=1SC(=CC=1)C(CCCC)C SRICNKYPPQQCBL-UHFFFAOYSA-N 0.000 description 2
- RCIUMPPGDGOJRH-UHFFFAOYSA-N C(#C)C1=C(C=CC(=C1C#C)C=1SC(=CC=1)C(CCCC)C)C=1SC(=CC=1)C(CCCC)C Chemical compound C(#C)C1=C(C=CC(=C1C#C)C=1SC(=CC=1)C(CCCC)C)C=1SC(=CC=1)C(CCCC)C RCIUMPPGDGOJRH-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- QZRGKCOWNLSUDK-UHFFFAOYSA-N Iodochlorine Chemical compound ICl QZRGKCOWNLSUDK-UHFFFAOYSA-N 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 229910008940 W(CO)6 Inorganic materials 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000003139 biocide Substances 0.000 description 2
- RBHJBMIOOPYDBQ-UHFFFAOYSA-N carbon dioxide;propan-2-one Chemical compound O=C=O.CC(C)=O RBHJBMIOOPYDBQ-UHFFFAOYSA-N 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 239000002322 conducting polymer Substances 0.000 description 2
- 229920001940 conductive polymer Polymers 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 2
- TZIHFWKZFHZASV-UHFFFAOYSA-N methyl formate Chemical compound COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 description 2
- 230000005693 optoelectronics Effects 0.000 description 2
- 239000003002 pH adjusting agent Substances 0.000 description 2
- GBROPGWFBFCKAG-UHFFFAOYSA-N picene Chemical compound C1=CC2=C3C=CC=CC3=CC=C2C2=C1C1=CC=CC=C1C=C2 GBROPGWFBFCKAG-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000767 polyaniline Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920000128 polypyrrole Polymers 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 238000010129 solution processing Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- AQRLNPVMDITEJU-UHFFFAOYSA-N triethylsilane Chemical compound CC[SiH](CC)CC AQRLNPVMDITEJU-UHFFFAOYSA-N 0.000 description 2
- 239000000080 wetting agent Substances 0.000 description 2
- 125000000923 (C1-C30) alkyl group Chemical group 0.000 description 1
- RELMFMZEBKVZJC-UHFFFAOYSA-N 1,2,3-trichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1Cl RELMFMZEBKVZJC-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- WQONPSCCEXUXTQ-UHFFFAOYSA-N 1,2-dibromobenzene Chemical compound BrC1=CC=CC=C1Br WQONPSCCEXUXTQ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- KOFZTCSTGIWCQG-UHFFFAOYSA-N 1-bromotetradecane Chemical compound CCCCCCCCCCCCCCBr KOFZTCSTGIWCQG-UHFFFAOYSA-N 0.000 description 1
- 125000003229 2-methylhexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 125000000739 C2-C30 alkenyl group Chemical group 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229920000144 PEDOT:PSS Polymers 0.000 description 1
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920002367 Polyisobutene Polymers 0.000 description 1
- GCTFWCDSFPMHHS-UHFFFAOYSA-M Tributyltin chloride Chemical compound CCCC[Sn](Cl)(CCCC)CCCC GCTFWCDSFPMHHS-UHFFFAOYSA-M 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 125000001204 arachidyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000012230 colorless oil Substances 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229920006037 cross link polymer Polymers 0.000 description 1
- 239000013058 crude material Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- DZQISOJKASMITI-UHFFFAOYSA-N decyl-dioxido-oxo-$l^{5}-phosphane;hydron Chemical group CCCCCCCCCCP(O)(O)=O DZQISOJKASMITI-UHFFFAOYSA-N 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000013213 extrapolation Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000003818 flash chromatography Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- 125000000262 haloalkenyl group Chemical group 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 125000000232 haloalkynyl group Chemical group 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 239000003906 humectant Substances 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000002608 ionic liquid Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- FTMKAMVLFVRZQX-UHFFFAOYSA-N octadecylphosphonic acid Chemical compound CCCCCCCCCCCCCCCCCCP(O)(O)=O FTMKAMVLFVRZQX-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 229940070721 polyacrylate Drugs 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical class [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- CWMFRHBXRUITQE-UHFFFAOYSA-N trimethylsilylacetylene Chemical compound C[Si](C)(C)C#C CWMFRHBXRUITQE-UHFFFAOYSA-N 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
- C07D495/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
- C07D495/04—Ortho-condensed systems
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6576—Polycyclic condensed heteroaromatic hydrocarbons comprising only sulfur in the heteroaromatic polycondensed ring system, e.g. benzothiophene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/484—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Definitions
- the invention relates to phenacene compounds and their use.
- Organic semiconducting materials can be used in electronic devices such as organic photovoltaic (OPV) cells, organic field-effect transistors (OFETs) and organic light emitting diodes (OLEDs).
- OCV organic photovoltaic
- OFETs organic field-effect transistors
- OLEDs organic light emitting diodes
- organic semiconducting materials are compatible with liquid processing techniques such as spin coating, solution casting or printing.
- Liquid processing techniques are convenient from the point of processability, and can also be applied to plastic substrates.
- organic semiconducting materials which are compatible with liquid processing techniques allow the production of low cost, light weight and, optionally also flexible, electronic devices, which is a clear advantage of these organic semiconducting materials compared to inorganic semiconducting materials.
- the organic semiconducting materials are stable, in particular towards oxidation.
- the organic semiconducting materials When used in organic field-effect transistors (OFETs), the organic semiconducting materials should show a high charge carrier mobility and a high on/off ratio.
- OFETs organic field effect transistors
- JP2009/063846 discloses alkylated picene for solution-based OFETs with a charge carrier mobility of up to 2 cm 2 V- 1 S "1 .
- R is H, n-C8Hi 7 or phenyl
- OFETs organic field effect transistors
- OFETs show the following charge carrier mobilities: 1 .2 (compound 1 ), 1 .8 (compound 2), 2.0 (compound 3), 1 .7 (compound 4) cm 2 V -1 s _1 , and the following on-off ratios: 2 x 10 6 (compound 1 ), 3 x 10 6 (compound 2), 4 x 10 6 (compound 3) and 3 x 10 6 (compound 4).
- One of the OFETs shows a charge carrier mobility of 3.1 cm V -1 s _1 and an on/off ratio of 10 5 .
- WO 2013/168048 A1 discloses phenacene compounds of the general formula
- one of groups a, b and c is X and the other two groups are C-R 1 and C-R 2 , respectively, one of groups d, e and f is X and the other two groups are C-R 5 and C-R 6 , respectively, wherein X are, independently of each other, selected from the group consisting of NH, O, S and Se, preferably selected from the group consisting of O, S and Se, more preferably selected from the group consisting of O and S, and particular preferably are S,
- R 1 - R 10 are independently of each other H, halogene, -CN, -NO2 or a linear or branched, saturated or unsaturated C1-C40 hydrocarbon residue, which can be substituted 1 - to 5-fold with halogene (F, CI, Br, I), -OR a , -NR a 2, -CN and/or -NO2, and wherein one or more Chb-groups can be replaced by -0-, -S-, -NR b -, -OC(O)- or -C(O)-, and wherein R a and R b are independently of each other H, C1-C30 alkyl, C2-C30 alkenyl, C2-C30 alkynyl, C1-C30 haloalkyl, C2-C30 haloalkenyl, C2-C30 haloalkynyl or C2-C30 acyl.
- R 1 , R 2 , R 5 and R 6 are selected from the group consisting of H, halogen (F, CI, Br, I), and a C1-20 alkyl group.
- R 3 , R 4 are selected from the group consisting of H, halogen (F, CI, Br, I), and a C1-20 alkyl group.
- R 7 , R 8 , R 9 , R 10 are selected from the group consisting of H, halogen atom and C1-20 alkyl groups.
- R 1 , R 5 are alkyl, in particular n-tetradecyl.
- R 1 and R 2 are independently of each other a linear or branched C1-20 alkyl group.
- the phenacene compounds of the present invention have particular good semiconducting activity. Materials prepared from these compounds have demonstrated unexpected properties. It has been discovered that compounds of the present invention have exceptionally high carrier mobility and/or good current modulation characteristics in field-effect devic- es (e.g., thin-film transistors). In addition, it has been discovered that compounds of the present invention possess certain processing advantages compared to related representative compounds such as better solubility to permit solution-processability and/or good stability at ambient conditions, for example, air stability. Further, the compounds can be embedded with other components for utilization in a variety of semiconductor-based devices.
- R 1 and R 2 can be linear or branched C1-C20 alkyl.
- Examples are methyl, ethyl, n-propyl, isopropyl, n-butyl, sec. -butyl, isobutyl, tert. -butyl, n-pentyl, 2-pentyl, 3-pentyl, 2,2-dimethylpropyl, 1 ,1 ,3,3-tetramethylpentyl, n-hexyl, 1 -methylhexyl, 1 ,1 ,3,3,5,5-hexamethylhexyl, n-heptyl, isoheptyl, 1 ,1 ,3,3-tetramethylbutyl, 1 -methylheptyl, 3- methylheptyl, n-octyl, 1 ,1 ,3,3-tetramethylbutyl and 2-ethylhexyl, n-nonyl, decyl, undecyl, do- decyl, tridecyl
- R 1 and R 2 are independently of each other a linear or branched C6- CM alkyl group.
- R 1 and R 2 are selected from the group consisting of n-hexadecyl, n-tetradecyl, n-dodecyl, n-decyl, n-octyl, n-hexyl and 1 -methylpentyl.
- R 1 and R 2 are the same alkyl group. However, R 1 and R 2 can be different alkyl groups.
- R alkyl
- the present invention can offer processing advantages in fabricating electrical devices such as thin film semiconductors, field-effect devices, organic light emitting diodes (OLEDs), organic photovoltaics, photodetec- tors, capacitors, and sensors.
- electrical devices such as thin film semiconductors, field-effect devices, organic light emitting diodes (OLEDs), organic photovoltaics, photodetec- tors, capacitors, and sensors.
- OLEDs organic light emitting diodes
- a compound can be considered soluble in a sol- vent when at least 1 mg of the compound can be dissolved in 1 ml. of the solvent.
- Examples of common organic solvents include petroleum ethers; acetonitrile; aromatic hydrocarbons such as benzene, toluene, xylene, and mesitylene; ketones such as acetone and methyl ethyl ketone; ethers such as tetrahydrofuran, dioxane, bis(2-methoxyethyl) ether, diethyl ether, di-/sopropyl ether, and f-butyl methyl ether; alcohols such as methanol, ethanol, butanol, and /sopropyl alco- hoi; aliphatic hydrocarbons such as hexanes; acetates such as methyl acetate, ethyl acetate, methyl formate, ethyl formate, isopropyl acetate, and butyl acetate; amides such as dimethyl- formamide and dimethylacetamide; sulfoxides such as dimethylsul
- the present invention further provides compositions that include one or more compounds of formula (I) disclosed herein dissolved or dispersed in a liquid medium, for example, an organic solvent, an inorganic solvent, or combinations thereof (e.g., a mixture of organic solvents, inorganic solvents, or organic and inorganic solvents).
- the composition can further include one or more additives independently selected from detergents, dis- persants, binding agents, compatibilizing agents, curing agents, initiators, humectants, anti- foaming agents, wetting agents, pH modifiers, biocides, and bactereriostats.
- sur- factants and/or other polymers can be included as a disper- sant, a binding agent, a compatibilizing agent, and/or an antifoaming agent.
- such compositions can include one or more compounds disclosed herein, for example, two or more different compounds of the present invention can be dissolved in an organic solvent to prepare a composition for deposition.
- the composition can include two or more regioisomers.
- the devices described herein also can comprise one or more compounds of the present invention, for example, two or more regioisomers as described herein.
- Various deposition techniques including various solution-processing techniques, have been used in preparing organic electronics. For example, much of the printed electronics technology has focused on inkjet printing, primarily because this technique offers greater control over feature position and multilayer registration. Inkjet printing is a noncontact process, which offers the benefits of not requiring a preformed master (compared to contact printing techniques), as well as digital control of ink ejection, thereby providing drop-on-demand printing. Micro dispensing is another non-contact method of printing. However, contact printing techniques have the key advantage of being well-suited for very fast roll-to-roll processing.
- Exemplary contact printing techniques include, but are not limited to, screen-printing, gravure printing, offset printing, flexo- graphic printing, lithographic printing, pad printing, and microcontact printing.
- printing includes a noncontact process, for example, inkjet printing, micro dispensing, and the like, and a contact process, for example, screen-printing, gravure printing, offset printing, flexo- graphic printing, lithographic printing, pad printing, microcontact printing, and the like.
- Other solution processing techniques include, for example, spin coating, drop-casting, zone casting, dip coating, blade coating, or spraying.
- the deposition step can be carried out by vacuum vapor-deposition.
- the present invention therefore, further provide methods of preparing a semiconductor material.
- the methods can include preparing a composition that includes one or more compounds of formula (I) disclosed herein dissolved or dispersed in a liquid medium such as a solvent or a mixture of solvents, and depositing the composition on a substrate to provide a semiconductor material (e.g., a thin film semiconductor) that includes one or more compounds of formula (I) disclosed herein.
- the liquid medium can be an organic solvent, an inorganic solvent such as water, or combinations thereof.
- the composition can further include one or more additives independently selected from viscosity modulators, detergents, dispersants, binding agents, compatibilizing agents, curing agents, initiators, hu- mectants, antifoaming agents, wetting agents, pH modifiers, biocides, and bactereriostats.
- additives independently selected from viscosity modulators, detergents, dispersants, binding agents, compatibilizing agents, curing agents, initiators, hu- mectants, antifoaming agents, wetting agents, pH modifiers, biocides, and bactereriostats.
- surfactants and/or polymers e.g., polystyrene, polyethylene, poly-alpha-methyl- styrene, polyisobutene, polypropylene, polymethylmethacrylate, and the like
- dispersant e.g., polystyrene, polyethylene, poly-alpha-methyl- styrene, polyisobutene,
- the depositing step can be carried out by printing, including inkjet printing and various contact printing techniques (e.g., screen-printing, gravure printing, offset printing, pad printing, lithographic printing, flexographic printing, and microcontact printing).
- the depositing step can be carried out by spin coating, drop-casting, zone casting, dip coating, blade coating, or spraying.
- Various articles of manufacture including electronic devices, optical devices, and optoelectronic devices such as field effect transistors (e.g., thin film transistors), photovoltaics, organic light emitting diodes (OLEDs), complementary metal oxide semiconductors (CMOSs), complemen- tary inverters, D flip-flops, rectifiers, and ring oscillators, that make use of the compounds and the semiconductor materials disclosed herein also as well as methods of making the same are within the scope of the present invention.
- field effect transistors e.g., thin film transistors
- OLEDs organic light emitting diodes
- CMOSs complementary metal oxide semiconductors
- complemen- tary inverters e.g., D flip-flops, rectifiers, and ring oscillators
- the present invention provides articles of manufacture such as the various devices described herein that include a composite having a semiconductor material of the present invention comprising compound of formula (I), a substrate component, and/or a dielectric component.
- the substrate component can be selected from materials including doped silicon, an indium tin oxide (ITO), ITO-coated glass, ITO-coated polyimide or other plastics, aluminum or other metals alone or coated on a polymer or other substrate, a doped polythiophene or other poly- mers, and the like.
- the dielectric component can be prepared from inorganic dielectric materials such as various oxides (e.g., S1O2, AI2O3, Hf02), organic dielectric materials such as various polymeric materials (e.g., polycarbonate, polyester, polystyrene, polyhaloethylene, polyacry- late), self-assembled superlattice/self-assembled nanodielectric (SAS/SAND) materials (e.g., described in Yoon, M-H. et al., PNAS, 102 (13): 4678-4682 (2005), the entire disclosure of which is incorporated by reference herein), and hybrid organic/inorganic dielectric materials (e.g., described in U.S. Patent Application Serial No. 1 1/642,504, the entire disclosure of which is incorporated by reference herein).
- the dielectric component can include the crosslinked polymer blends described in U.S. Patent Application Serial Nos.
- the composite also can include one or more electrical contacts.
- Suitable materials for the source, drain, and gate electrodes include metals (e.g., Au, Al, Ni, Cu), transparent conducting oxides (e.g., ITO, IZO, ZITO, GZO, GIO, GITO), and conducting polymers (e.g., poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) (PEDOT:PSS), polyaniline (PANI), polypyrrole (PPy)).
- One or more of the composites described herein can be incorporated within various organic electronic, optical, and optoelectronic devices such as organic thin film transistors (OTFTs), specifically, organic field effect transistors (OFETs), as well as sensors, capacitors, unipolar circuits, complementary circuits (e.g., inverter circuits), and the like.
- OFTs organic thin film transistors
- OFETs organic field effect transistors
- sensors capacitors, unipolar circuits, complementary circuits (e.g., inverter circuits), and the like.
- An aspect of the present invention therefore, relates to methods of fabricating an organic field effect transistor that incorporates a semiconductor material of the present invention comprising compounds of formula (I).
- the semiconductor materials of the present invention can be used to fabricate various types of organic field effect transistors including top-gate top-contact capacitor structures, top-gate bottom-contact capacitor structures, bottom-gate top-contact capacitor structures, and bottom-gate bottom-contact capacitor structures.
- OTFT devices can be fabricated with the present compounds of formula (I) on doped silicon substrates, using S1O2 as the dielectric, in top-contact geometries.
- the active semiconducting layer which incorporates at least a compound of the present invention can be deposited by vacuum vapor deposition at room temperature or at an elevated temperature.
- the active semiconducting layer which incorporates at least a compound of the present invention can be applied by solution-based process, for example, spin-coating or jet printing.
- metallic contacts can be patterned on top of the films using shadow masks.
- OTFT devices can be fabricated with the present compounds of formula (I) on plastic foils, using polymers as the dielectric, in top-gate bottom-contact geometries.
- the active semiconducting layer which incorporates at least a compound of the present invention can be deposited at room temperature or at an elevated temperature.
- the active semiconducting layer which incorporates at least a compound of the present invention can be applied by spin-coating or printing as described herein.
- Gate and source/drain contacts can be made of Au, other metals, or conducting polymers and deposited by vapor-deposition and/or printing. Other articles of manufacture in which compounds of formula (I) of the present invention are useful as photovoltaics or solar cells.
- the compounds of formula (I) described herein can be used as a p-type semiconductor in a photovoltaic design, which includes an adjacent n-type semiconduct- ing material that forms a p-n junction.
- the compounds can be in the form of a thin film semiconductor, which can be a composite of the thin film semiconductor deposited on a substrate. Exploitation of compounds of the present invention in such devices is within the knowledge of the skilled artisan.
- another aspect of the present invention relates to methods of fabricating an organic light-emitting transistor, an organic light-emitting diode (OLED), or an organic photovoltaic device that incorporates one or more semiconductor materials of the present invention.
- OLED organic light-emitting diode
- OLED organic photovoltaic device
- iPrMgCI (2M, 77 mL, 153 mmol) was added drop wise to a solution of 2,3-dibromo-1 ,4-diiodo- benzene at -78 °C over 45 min and the resultant mixture stirred at -78 °C for 3 h.
- 2-lsopropoxy- 4,4, 5, 5-tetramethyl-1 ,3,2-dioxaborolane 38 g, 42 mL, 205 mmol was added drop wise to the stirring mixture at -78 °C over 30 minutes the resultant reaction mixture was stirred at room temperature for 16 h.
- a commercial LDA solution (2 M, 24 ml, 47 mmol) was diluted in THF (65 ml) solution at 0 °C.
- a solution of 2-bromo-5-tetradecylthiophene (14 g, 39 mmol) in THF (65 ml) was added drop wise to the dilute LDA solution at 0 °C over 60 mins using a dropping funnel.
- the resultant mixture was gradually warmed to room temperature and stirred for 3 hrs.
- the reaction mixture was quenched with water (150 ml) and extracted with Et.20 (2 x 100 ml).
- n-BuLi (1.6 M, 24.4 mL, 39 mmol) was added dropwise to a solution of ethynyltrimethylsilane (4.0 g, 41 mmol) in THF (40 mL) at -78 °C and gradually warmed to 0 °C over 30 min.
- the reaction mixture was cooled to -78 °C again and tributyltin chloride (1 1.4 mL, 39 mmol) in THF (30 mL) was added dropwise to the resultant mixture.
- the reaction mixture was stirred for 18 h at room temperature and quenched with water (20 mL).
- Tetrakis(triphenylphosphine)palladium(0) (1.8 g, 1.47 mmol) was added to a solution of 2-[2,3- dibromo-4-(4,4,5,5-tetramethyl-1 ,3,2-dioxaborolan-2-yl)phenyl]-4,4,5,5-tetramethyl-1 ,3,2- dioxaborolane (7.2 g, 14.76 mmol), 3-bromo-5-tetradecylthiophene (16.53 g, 46 mmol) and aqueous sodium carbonate solution (2M, 32 mL, 65 mmol) in DME (64 mL) and stirred at 100 °C for 6 h.
- Tetrakis(triphenylphosphine)palladium(0) (1 .3 g, 0.95 mmol) was added to a solution of trime- thyl-tributylstannanylethynyl-silane (1 1 .1 g, 28.5 mmol) and 2,3-dibromo-1 ,4-bis(5-tetradecyl- thiophen-2-yl) benzene (7.5 g, 9.5 mmol) in toluene (100 mL) and stirred at 100 °C for 3 h. The reaction mixture was cooled to room temperature and diluted with aqueous saturated ammonium chloride solution (100 mL).
- Tetrabutylammonium fluoride (1 M, 23 ml_, 22.8 mmol) was added to a solution of 2,3- bis(ethynyltrimethylsilane)-1 ,4-bis(5-tetradecyl-thiophen-2-yl)benzene (7.86 g, 9.5 mmol) at room temperature and the reaction was stirred for 1 h.
- the reaction mixture was diluted with aqueous saturated ammonium chloride solution (100 ml_).
- the mixture was extracted with diethyl ether (3 x 50 ml_).
- the combined organic phases were dried and concentrated to give brown solids, which were purified by column chromatography to yield brown solids (3.6 g, 55%).
- W(CO) 5 (THF) (3.0 g, 8.5 mmol) was formed by irradiating W(CO) 6 in THF (75ml_) under UVA lamp at 60 °C for 2 h where the colorless reaction mixture turns to yellow-green after 2 h.
- the solution of W(CO)5(THF) in THF was transferred quickly into a flask of stirring 2,3-diethynyl-1 ,4- bis(5-tetradecyl-thiophen-2-yl)benzene in THF (50ml_) at room temperature and the reaction mixture stirred for 48 h in the dark.
- Examples 12-16 Compounds 2, 3, 4, 5 and 6 were synthesized in the same way as described above.
- n-BuLi 1.6 M, 96 mL, 154 mmol
- 2-bromothiophene 25.0 g, 154 mmol
- 2-Hexanone 17 mL, 139 mmol
- THF 50 mL
- the reaction mixture was warmed to room temperature and quenched with saturated aqueous ammonium chloride solution (200 mL) and extracted with diethyl ether (3 x 100 mL).
- N-Bromosuccinimide (16 g, 82 mmol) was added portion wise (4 x 4 g portions) to a stirring solution of 2-(1 -methylpentyl)thiophene (13.6 g, 81 mmol) at 0 °C over 40 min at 10-minute inter- vals and stirred for 90 min at room temperature.
- the reaction was completed by 1 H NMR analysis and water (100 mL) was added.
- the resultant mixture was extracted with methylene chloride (3 x 75 mL).
- the combined organic phases were dried over MgSC , filtered and concentrated to give the crude product.
- the crude product was purified by column chromatography on silica gel using 100% hexanes to yield red oil (14.0 g, 70%).
- LDA solution (2 M, 57 ml, 1 14 mmol) was diluted in THF (90 ml) solution at 0 °C.
- the resultant mixture was gradually warmed to room temperature and stirred for 3 hrs.
- the reaction mixture was quenched with water (100 ml) and extracted with Et.20 (3 x 75 ml).
- Tetrakis(triphenylphosphine)palladium(0) (2.8 g, 2.5 mmol) was added to a solution of 2-[2,3- dibromo-4-(4,4,5,5-tetramethyl-1 ,3,2-dioxaborolan-2-yl)phenyl]-4,4,5,5-tetramethyl-1 ,3,2- dioxaborolane (12 g, 25.0 mmol), 4-bromo-2-(1 -methylpentyl)thiophene (14.8 g, 60 mmol) and aqueous sodium carbonate solution (2M, 50 mL, 1 10 mmol) in DME (100 mL) and stirred at 100 °C for 6 h.
- 2-[2,3- dibromo-4-(4,4,5,5-tetramethyl-1 ,3,2-dioxaborolan-2-yl)phenyl]-4,4,5,5-tetramethyl-1 ,3,2- dioxaborolane (12 g, 25.0
- Tetrakis(triphenylphosphine)palladium(0) (1 .9 g, 1.7 mmol) was added to a solution of 2,3- dibromo-1 ,4-bis[5-(1 -methylpentyl)thiophen-2-yl]benzene (9.7 g, 17 mmol)and trimethyl- tributylstannanylethynyl-silane (15.8 g, 40.8 mmol) in toluene (90 mL) and stirred at 100 °C for 3 h. The reaction mixture was cooled to room temperature and diluted with aqueous saturated ammonium chloride solution (90 mL).
- Tetrabutylammonium fluoride solution in THF (1 M, 45 ml_, 47.6 mmol) was added to a solution of 2,3-bis(ethynyltrimethylsilane)-1 ,4-bis[5-(1 -methylpentyl)thiophen-2-yl]benzene (10.25 g, 9.5 mmol) in THF (50 ml.) at room temperature and the reaction was stirred for 3 h. The reaction mixture was diluted with aqueous saturated ammonium chloride solution (50 ml_). The mixture was extracted with diethyl ether (3 x 50 ml_).
- W(CO) 5 (THF) was formed by irradiating W(CO) 6 (1 .8 g, 2.6 mmol) in THF (75ml_) under UVA lamp at 60 °C for 2 h where the colorless reaction mixture turns to yellow-green after 2 h.
- the solution of W(CO)5(THF) in THF was transferred quickly into a flask of stirring 2,3-diethynyl-1 ,4- bis[5-(1 -methylpentyl)thiophen-2-yl]benzene (3.0 g, 12.9 mmol) in THF (50ml_) at room temperature and the reaction mixture stirred for 48 h in the dark.
- reaction mixture was concentrated in vacuo and the resultant residue redissolved in warm hexanes (30 °C) and wet loaded onto silica gel column. Column chromatography using 100% hexanes gave a crude product. The crude product was recrystallized from ethanol and then subjected to sublimation to give pale yellow solids (380 mg, 12%).
- Figures 1A, 2A and 3A show the respective output characteristics of vacuum deposited OFETs for compounds 1 , 2, and 7. In these figures, the drain current is plotted against the drain-source voltage.
- Figures 1 B, 2B and 3B show the transfer characteristics for these compounds, respectively. In these figures, the drain current is plotted against the gate-source voltage.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Thin Film Transistor (AREA)
Abstract
La présente invention concerne des composés phénancène de formule (I) dans laquelle R1 et R2 sont indépendamment l'un de l'autre un groupe alkyle en C1-20 linéaire ou ramifié.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP14191669 | 2014-11-04 | ||
EP14191669.2 | 2014-11-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2016071140A1 true WO2016071140A1 (fr) | 2016-05-12 |
Family
ID=51844627
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2015/074756 WO2016071140A1 (fr) | 2014-11-04 | 2015-10-26 | Composés phénacène pour l'électronique organique |
Country Status (2)
Country | Link |
---|---|
TW (1) | TW201623311A (fr) |
WO (1) | WO2016071140A1 (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109791983A (zh) * | 2016-09-29 | 2019-05-21 | 富士胶片株式会社 | 微晶有机半导体膜、有机半导体晶体管及有机半导体晶体管的制造方法 |
CN111892696A (zh) * | 2020-07-23 | 2020-11-06 | 华南理工大学 | 一种二噻吩并苯稠环喹喔啉共轭聚合物及其制备方法和应用 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013168048A1 (fr) * | 2012-05-07 | 2013-11-14 | Basf Se | Composés de phénacène pour composants électroniques organiques |
JP2014139143A (ja) * | 2013-01-21 | 2014-07-31 | Idemitsu Kosan Co Ltd | ジチエノフェナントレン化合物、当該化合物を含む有機薄膜トランジスタ用組成物、及び有機薄膜トランジスタ |
WO2014148614A1 (fr) * | 2013-03-22 | 2014-09-25 | 富士フイルム株式会社 | Transistor à couches minces organiques |
-
2015
- 2015-10-26 WO PCT/EP2015/074756 patent/WO2016071140A1/fr active Application Filing
- 2015-11-04 TW TW104136378A patent/TW201623311A/zh unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013168048A1 (fr) * | 2012-05-07 | 2013-11-14 | Basf Se | Composés de phénacène pour composants électroniques organiques |
JP2014139143A (ja) * | 2013-01-21 | 2014-07-31 | Idemitsu Kosan Co Ltd | ジチエノフェナントレン化合物、当該化合物を含む有機薄膜トランジスタ用組成物、及び有機薄膜トランジスタ |
WO2014148614A1 (fr) * | 2013-03-22 | 2014-09-25 | 富士フイルム株式会社 | Transistor à couches minces organiques |
Non-Patent Citations (3)
Title |
---|
DATABASE WPI Week 201457, Derwent World Patents Index; AN 2014-N95229, XP002735248 * |
DATABASE WPI Week 201470, Derwent World Patents Index; AN 2014-R60475, XP002735247 * |
Y. NISHIHARA ET AL.: "Phenanthro[1,2-b:8,7-b']dithiophene: a new picene-type molecule for transistor applications", RSC ADVANCES, vol. 3, no. 42, 12 August 2013 (2013-08-12), pages 19341 - 19347, XP002735249, ISSN: 2046-2069, Retrieved from the Internet <URL:http://pubs.rsc.org/en/Content/ArticleLanding/2013/RA/c3ra44050h#!divAbstract> [retrieved on 20150128], DOI: 10.1039/c3ra44050h * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109791983A (zh) * | 2016-09-29 | 2019-05-21 | 富士胶片株式会社 | 微晶有机半导体膜、有机半导体晶体管及有机半导体晶体管的制造方法 |
CN109791983B (zh) * | 2016-09-29 | 2023-06-16 | 富士胶片株式会社 | 微晶有机半导体膜、有机半导体晶体管及其制造方法 |
CN111892696A (zh) * | 2020-07-23 | 2020-11-06 | 华南理工大学 | 一种二噻吩并苯稠环喹喔啉共轭聚合物及其制备方法和应用 |
Also Published As
Publication number | Publication date |
---|---|
TW201623311A (zh) | 2016-07-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9911927B2 (en) | Compounds having semiconducting properties and related compositions and devices | |
KR102072538B1 (ko) | 유기 전자장치를 위한 페나센 화합물 | |
JP5562652B2 (ja) | シリルエチニル化されたヘテロアセン類およびそれで作製された電子装置 | |
US7355199B2 (en) | Substituted anthracenes and electronic devices containing the substituted anthracenes | |
US20060186401A1 (en) | Carbonyl-functionalized thiophene compounds and related device structures | |
TWI534173B (zh) | 稠合無規雙噻吩-乙烯共聚物 | |
WO2011025454A1 (fr) | Matériaux semi-conducteurs polymères ambipolaires et dispositifs électroniques organiques | |
KR20130021439A (ko) | 치환기 이탈 화합물, 이로부터 형성되는 유기 반도체 재료, 이 유기 반도체 재료를 이용한 유기 전자 장치, 유기 박막 트랜지스터 및 표시 장치, 막형 제품의 제조 방법, pi-전자 공액 화합물 및 pi-전자 공액 화합물의 제조 방법 | |
TWI410443B (zh) | 聚(炔基噻吩)及由它形成之電子裝置 | |
KR20170016862A (ko) | N-플루오로알킬-치환된 디브로모나프탈렌 디이미드 및 반도체로서의 그의 용도 | |
US8598575B2 (en) | Semiconducting compounds and related compositions and devices | |
WO2016071140A1 (fr) | Composés phénacène pour l'électronique organique | |
Park et al. | A new class of organic semiconductors for solution processed OTFTs: Synthesis and characterization of pyrrolo–perylene derivatives with different end groups | |
Jang et al. | A small molecule composed of anthracene and thienothiophene devised for high-performance optoelectronic applications | |
WO2017046554A1 (fr) | Dérivés d'anthrathiophène présentant des motifs de solubilisation transversaux et leurs applications en tant que semi-conducteurs organiques | |
Zhang et al. | Synthesis and characterization of novel push-pull oligomer based on naphthodithiophene-benzothiodiazole for OFETs application | |
JP2015141912A (ja) | 有機薄膜トランジスタ、有機半導体薄膜および有機半導体材料 | |
KR101736920B1 (ko) | 아릴기가 치환된 안트라센 화합물, 그 제조 방법 및 이를 이용한 유기 박막 트랜지스터 | |
JP2013026448A (ja) | 薄膜トランジスタ及びそれを用いた電子デバイス | |
Subramanian | Synthesis and Device Characterization of Functionalized Pentacenes and Anthradithiophenes | |
TW201333156A (zh) | 用於製備有機半導體裝置之方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 15784953 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 15784953 Country of ref document: EP Kind code of ref document: A1 |