WO2015147039A1 - 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法 - Google Patents
移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法 Download PDFInfo
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- WO2015147039A1 WO2015147039A1 PCT/JP2015/059090 JP2015059090W WO2015147039A1 WO 2015147039 A1 WO2015147039 A1 WO 2015147039A1 JP 2015059090 W JP2015059090 W JP 2015059090W WO 2015147039 A1 WO2015147039 A1 WO 2015147039A1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70816—Bearings
Definitions
- the present invention relates to a moving body apparatus, an exposure apparatus, a flat panel display manufacturing method, and a device manufacturing method, and more specifically, a moving body apparatus including a moving body movable along a predetermined two-dimensional plane,
- the present invention relates to an exposure apparatus including a moving body apparatus, a flat panel display manufacturing method using the exposure apparatus, and a device manufacturing method using the exposure apparatus.
- a lithography process for manufacturing an electronic device such as a liquid crystal display element, a semiconductor element (such as an integrated circuit), a mask or reticle (hereinafter collectively referred to as “mask”), a glass plate or a wafer (hereinafter referred to as “mask”).
- a step-and-scan exposure apparatus that transfers a pattern formed on a mask onto a substrate using an energy beam while moving the substrate in a synchronized manner along a predetermined scanning direction.
- -Steppers also called scanners
- a table member holding a substrate is supported from below by using a weight canceling device (also referred to as a center column) that is a single columnar member, thereby positioning the table member.
- a weight canceling device also referred to as a center column
- a center column that is a single columnar member
- the table members that hold the substrates also tend to increase in size, and the weight cancellation devices and the guide members that guide the weight cancellation devices have also increased in size accordingly.
- the present invention has been made under the above circumstances, and from a first viewpoint, the movable body movable along a predetermined two-dimensional plane including first and second axes orthogonal to each other, and the movement A guiding device for guiding a body in a direction parallel to the first and second axes, and a movable device that can move in a direction parallel to the two-dimensional plane in synchronization with the moving body, and cooperate to reduce the weight of the moving body.
- a plurality of self-weight support devices to be supported and a part of the plurality of self-weight support devices that are provided on one side of the guidance device with respect to a direction parallel to the second axis and move in a direction parallel to the first axis A first guide member that is provided on the other side of the guide device with respect to a direction parallel to the second axis, and guides the other portions of the plurality of self-weight support devices that move in a direction parallel to the first axis. And a two guide member.
- a plurality of dead weight support devices cooperate to support the dead weight of the moving body. That is, each individual weight support device supports a part of the weight of the moving body. Therefore, compared to a case where one self-weight support device supports the entire weight of the moving body, the load acting on the guide member for guiding the self-weight support device can be dispersed, and the guide member can be made thinner and lighter. Can be realized. In addition, since the moving body is supported at a plurality of locations, the moving body can be made thinner and lighter, and position control and posture control are facilitated.
- a moving body device in which a predetermined object is held on the moving body, and a pattern forming apparatus that forms a predetermined pattern on the object using an energy beam.
- An exposure apparatus provided.
- the present invention is a flat panel display manufacturing method including exposing the object using the exposure apparatus of the present invention and developing the exposed object.
- the present invention is a device manufacturing method including exposing the object using the exposure apparatus of the present invention and developing the exposed object.
- FIG. 2 is a plan view (partially omitted) of a substrate stage apparatus included in the liquid crystal exposure apparatus of FIG. 1.
- FIG. 3 is a sectional view taken along line AA in FIG. 2. It is a figure which shows the 1st modification of a substrate stage apparatus. It is a figure which shows the 2nd modification of a substrate stage apparatus. It is a figure which shows the 3rd modification of a substrate stage apparatus.
- FIG. 7 is a plan view of the substrate stage apparatus of FIG. 6 (some elements are omitted). It is a figure which shows the 4th modification of a substrate stage apparatus. It is a figure which shows the 5th modification of a substrate stage apparatus. It is a figure which shows the 6th modification of a substrate stage apparatus.
- FIG. 1 schematically shows a configuration of a liquid crystal exposure apparatus 10 according to an embodiment.
- the liquid crystal exposure apparatus 10 employs a step-and-scan method in which a rectangular (square) glass substrate P (hereinafter simply referred to as a substrate P) used in, for example, a liquid crystal display device (flat panel display) is an exposure object.
- a projection exposure apparatus a so-called scanner.
- the liquid crystal exposure apparatus 10 includes an illumination system 12, a mask stage 14 that holds a mask M on which a circuit pattern and the like are formed, a projection optical system 16, a pair of stage mounts 18, and a surface (a surface facing the + Z side in FIG. 1). It has a substrate stage device 20 that holds a substrate P coated with a resist (sensitive agent), a control system for these, and the like.
- the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system 16 at the time of exposure is defined as the X-axis direction
- the direction orthogonal to the X-axis in the horizontal plane is defined as the Y-axis direction, the X-axis, and the Y-axis.
- the orthogonal direction is the Z-axis direction
- the rotation directions around the X-axis, Y-axis, and Z-axis are the ⁇ x, ⁇ y, and ⁇ z directions, respectively.
- the positions in the X-axis, Y-axis, and Z-axis directions are the X position, the Y position, and the Z position, respectively.
- the illumination system 12 is configured similarly to the illumination system disclosed in, for example, US Pat. No. 5,729,331.
- the illumination system 12 irradiates light emitted from a light source (not shown) (for example, a mercury lamp) through exposure mirrors (not shown), dichroic mirrors, shutters, wavelength selection filters, various lenses, and the like. ) Irradiate the mask M as IL.
- a light source for example, a mercury lamp
- the illumination light IL for example, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), h-line (wavelength 405 nm), or the combined light of the i-line, g-line, and h-line is used.
- the mask stage 14 holds a light transmission type mask M.
- a predetermined circuit pattern (mask pattern) is formed on the lower surface of the mask M (the surface facing the ⁇ Z side).
- the mask stage 14 drives the mask M with a predetermined long stroke in the X-axis direction (scan direction) with respect to the illumination system 12 (illumination light IL) via, for example, a linear motor (not shown), and in the Y-axis direction, And slightly driven in the ⁇ z direction.
- the position information of the mask M in the horizontal plane is obtained by a mask stage position measurement system (not shown) including a laser interferometer, for example.
- the projection optical system 16 is disposed below the mask stage 14.
- the projection optical system 16 is a so-called multi-lens projection optical system having the same configuration as the projection optical system disclosed in, for example, US Pat. No. 6,552,775, and is a double-sided telecentric equal magnification system.
- a plurality of optical systems for forming a vertical image are provided.
- the illumination light that has passed through the mask M causes the mask M in the illumination area to pass through the projection optical system 16.
- a projection image (partial upright image) of the circuit pattern is formed in an irradiation region (exposure region) of illumination light conjugate to the illumination region on the substrate P. Then, the mask M moves relative to the illumination area (illumination light IL) in the scanning direction, and the substrate P moves relative to the exposure area (illumination light IL) in the scanning direction. Scanning exposure of one shot area is performed, and the pattern formed on the mask M is transferred to the shot area.
- the pair of stage bases 18 are each made of a plate-like member extending in the Y-axis direction and are spaced apart in the X-axis direction.
- the stage base 18 is installed on the floor 11 of the clean room via a plurality of vibration isolation devices 17. As shown in FIG. 2, for example, three Y linear guides 19a extending in the Y-axis direction are fixed to the upper surface of the stage base 18 at predetermined intervals in the X-axis direction.
- the pair of stage bases 18 are members constituting an apparatus main body (body) of the liquid crystal exposure apparatus 10, and the mask stage 14 and the projection optical system 16 described above are supported by the apparatus main body.
- the substrate stage apparatus 20 includes a plurality of (in this embodiment, for example, three) base frames 22, an X beam 30, an X carriage 40, a pair of Y step guides 50, a fine movement stage 60 (a substrate table 62, and a substrate holder 64 ( 2 (not shown in FIG. 2, refer to FIG. 1)) and a plurality (for example, four in this embodiment) of weight cancellation devices 70.
- FIG. 2 is a plan view of the substrate stage apparatus 20 shown in FIG. 1, but the substrate holder 64 (see FIG. 1) is removed and the substrate table 62 is indicated by a broken line for easy understanding. ing.
- the three base frames 22 are each composed of a member extending in the Y-axis direction, and are arranged in parallel with each other at a predetermined interval in the X-axis direction.
- the first base frame 22 is on the + X side of the + X side stage base 18, and the second base frame 22 is on the ⁇ X side of the ⁇ X side stage base 18.
- the three base frames 22 are installed on the floor 11 (see FIG. 1) between the pair of stage bases 18 with a predetermined clearance from the stage bases 18 respectively.
- the three base frames 22 have substantially the same structure.
- a Y linear guide 21a extending in the Y-axis direction is fixed to the upper end surface (the + Z side end) of the base frame 22 as shown in FIG.
- a Y linear motor stator 23 a including a plurality of magnet units arranged at predetermined intervals in the Y-axis direction is fixed to both side surfaces of the base frame 22.
- the X beam 30 is made of a rectangular member having a YZ cross section extending in the X-axis direction, and is mounted on, for example, the three base frames 22 described above.
- the Z position of the lower surface of the X beam 30 is set to the + Z side with respect to the upper surface of the stage base 18, and the X beam 30 is vibrationally separated from the stage base 18.
- the X beam 30 is formed in a hollow shape, and the height (Z-axis) direction dimension is set larger than the width (Y-axis) direction dimension.
- members called Y carriages 32 are fixed to the lower surfaces of the X beam 30 in the vicinity of both ends in the longitudinal direction and in the vicinity of the center in the longitudinal direction, for example, corresponding to the three base frames 22.
- the Y carriage 32 is made of a member having an inverted U-shaped XZ cross section, and the corresponding base frame 22 is inserted between a pair of opposing surfaces.
- an XZ cross section is formed in an inverted U shape, and slides on a Y linear guide 21a fixed to the corresponding base frame 22 via a rolling element (not shown) (for example, a plurality of balls).
- a plurality of Y slide members 21b that are freely engaged (overlapping in the depth direction in FIG. 1) are fixed.
- the Y linear guide 21a corresponding to the Y slide member 21b is a mechanical Y linear guide that linearly guides the X beam 30 (and, for example, three Y carriages 32), for example, along the three base frames 22 in the Y axis direction.
- a guide device 21 is configured.
- a Y linear motor movable element 23b is fixed to each of the pair of opposing surfaces of the Y carriage 32 so as to oppose the Y linear motor stator 23a fixed to the corresponding base frame 22.
- the Y linear motor mover 23b has a coil unit (not shown), and the electric power supplied to the coil unit is controlled by a main controller (not shown).
- the Y linear motor stator 23a corresponding to the Y linear motor movable element 23b constitutes the Y linear motor 23 that drives the X beam 30 (and, for example, three Y carriages 32) in the Y axis direction with a predetermined stroke. Yes.
- the central portion of the X beam 30 is driven by the Y linear motor 23 together with the vicinity of both end portions, bending of the central portion in the Y-axis direction is suppressed.
- at least one of the three base frames 22 is fixed with a Y scale having a Y axis direction as a periodic direction, and the Y carriage 32 corresponding to the base frame 22 has a Y scale.
- an encoder head constituting a Y linear encoder system for obtaining position information of the Y carriage 32 in the Y-axis direction is fixed.
- the position of the X beam 30 in the Y-axis direction is controlled by a main controller (not shown) based on the output of the encoder head.
- a pair of X linear guides 34a are fixed on the upper surface of the X beam 30.
- the pair of X linear guides 34a are each made of a member extending in the X axis direction, and are arranged in parallel to each other at a predetermined interval in the Y axis direction.
- X linear motor stators 35 a including a plurality of magnet units arranged at predetermined intervals in the X-axis direction are fixed to both side surfaces of the X beam 30.
- the X carriage 40 is made of a member having an inverted U-shaped YZ section, and the X beam 30 is inserted between a pair of opposing surfaces.
- a YZ cross-section is formed in an inverted U shape, and slides on a pair of X linear guides 34a fixed to the X beam 30 via rolling elements (not shown) (for example, a plurality of balls).
- a plurality of X slide members 34b that are freely engaged (overlapping in the depth direction in FIG. 3) are fixed.
- the X linear guide 34 a corresponding to the X slide member 34 b constitutes a mechanical X linear guide device 34 that guides the X carriage 40 linearly along the X beam 30 in the X axis direction.
- an X linear motor movable element 35 b is fixed to each of the pair of opposed surfaces of the X carriage 40 so as to face the X linear motor stator 35 a fixed to the X beam 30.
- the X linear motor movable element 35b has a coil unit (not shown), and electric power supplied to the coil unit is controlled by a main controller (not shown).
- the X linear motor movable element 35b and the corresponding X linear motor stator 35a constitute an X linear motor 35 that drives the X carriage 40 with a predetermined stroke in the X-axis direction.
- the X carriage 40 is restricted from moving relative to the X beam 30 in the Y-axis direction by the action of the X linear guide device 35. Therefore, in the substrate stage apparatus 20, when the X beam 30 moves with a predetermined stroke in the Y axis direction, the X beam 30 and the X carriage 40 move together in the Y axis direction. That is, the X beam 30 and the X carriage 40 constitute a so-called gantry type two-dimensional stage apparatus.
- the X beam 30 is fixed with an X scale having the X axis direction as a periodic direction, and the X carriage 40 obtains positional information about the X carriage 40 along with the X scale in the X axis direction.
- the encoder head constituting the X linear encoder system is fixed. The position of the X carriage 40 in the X axis direction is controlled by a main controller (not shown) based on the output of the encoder head.
- the pair of Y step guides 50 are arranged on the pair of stage mounts 18 as shown in FIG. Of the pair of Y step guides 50, the first Y step guide 50 is on the + Y side of the X carriage 40, and the second Y step guide 50 is on the ⁇ Y side of the X carriage 40, respectively. Are arranged in parallel with each other through the clearance.
- the Y step guide 50 is made of a rectangular member having a YZ cross section extending in the X-axis direction. The longitudinal dimension of the Y step guide 50 is set longer than the movement stroke of the fine movement stage 60 in the X-axis direction.
- the width direction dimension of the Y step guide 50 is set to be substantially the same as the width direction dimension of the X beam 30, but the height direction dimension (thickness) of the Y step guide 50 is smaller than that of the X beam 30. Specifically, as shown in FIG. 3, the thickness is set to about half that of the X beam 30.
- the upper surface of the Y step guide 50 is finished with high flatness.
- the bottom surface of the Y step guide 50 is formed in an inverted U-shaped XZ cross section, and is slidable on a Y linear guide 19a fixed to the stage base 18 via a rolling element (not shown) (for example, a plurality of balls). A plurality of Y slide members 19b to be engaged (in FIG.
- the Y linear guide 19a corresponding to the Y slide member 19b constitutes a mechanical Y linear guide device 19 that guides the Y step guide 50 linearly on the pair of stage bases 18 in the Y axis direction.
- each of the pair of Y step guides 50 is connected to the X beam 30 via a plurality of (for example, two in this embodiment) coupling devices 52.
- the connecting device 52 includes a rod-like member extending in the Y-axis direction and a smoothing device (for example, a ball joint) provided at each of both ends in the longitudinal direction of the rod-like member, and the rod-like member is interposed via the smoothing device. It is installed between the Y step guide 50 and the X beam 30. Therefore, the Y step guide 50 and the X beam 30 are vibrationally separated with respect to the Z-axis direction, the ⁇ x direction, and the ⁇ y direction (hereinafter referred to as the Z / tilt direction).
- the Y step guide 50 on the other side moves, for example, two coupling devices 52.
- the X beam 30 moves integrally to one side (for example, + Y direction), and the Y step guide 50 on one side (for example, + Y side) moves to the Y of the rod-shaped member. Due to the rigidity in the axial direction, for example, when the X beam 30 is pressed via the two coupling devices 52, the X beam 30 moves integrally to one side (for example, + Y direction).
- the height position (Z position) of the plurality of coupling devices 52 is substantially coincident with the center of gravity height position of the Y step guide 50. For this reason, when the Y step guide 50 is pulled or pressed by the X beam 30 and moves in the Y axis direction, a moment around the X axis (pitching moment) does not act on the Y step guide 50, so the stage base 18 ( There is no risk of vibration of the device body.
- the pair of Y step guides 50 may be connected to each other by a member having high rigidity. In this case, the Y step guide 50 is only pulled by the connecting device 52 on one side (+ Y side or ⁇ Y side). And can be moved in the Y-axis direction.
- the coupling device 52 a rope having a low rigidity in the Y-axis direction or a thin plate-like member can be used instead of the rod-like member.
- the Y step guide 50 and the X beam 30 are connected by the connecting device 52 in the vicinity of the end in the longitudinal direction of the Y step guide 50, but the number and positions of the connecting devices 52 are particularly It is not limited.
- cables for supplying power and the like to the X carriage 40 are guided between the X beam 30 and each of the pair of Y step guides 50 according to the operation of the X carriage 40.
- the cable guide device is arranged.
- the fine movement stage 60 has a substrate table 62 and a substrate holder 64 as shown in FIG.
- the substrate table 62 is made of a box-shaped member having a rectangular shape in plan view. In the present embodiment, the substrate table 62 is formed hollow, but may be formed solid.
- the substrate holder 64 is made of a plate-like member having a rectangular shape in plan view, and is fixed to the upper surface of the substrate table 62 via, for example, a bolt (not shown).
- a substrate P is placed on the upper surface of the substrate holder 64.
- the substrate holder 64 sucks and holds the substrate P using a vacuum suction force supplied from a vacuum device (not shown) installed outside the substrate stage device 20.
- the fine movement stage 60 is slightly driven in the three-degree-of-freedom direction (X axis, Y axis, ⁇ z direction) on the horizontal plane on the X carriage 40 by a fine movement stage drive system including a plurality of voice coil motors.
- the plurality of voice coil motors include, for example, two X voice coil motors 66x and, for example, two Y voice coil motors 66y, as shown in FIG.
- one of the two X voice coil motors 66x and one of the two Y voice coil motors 66y are arranged on the + X side of the substrate table 62, for example.
- one X voice coil motor 66x is on the ⁇ Y side from the Y position of the center (center of gravity) of the substrate table 62
- one Y voice coil motor 66y is the Y position of the center (center of gravity) of the substrate table 62.
- the other of the two X voice coil motors 66x is on the ⁇ X side of the substrate table 62, and is diagonally opposite to the one X voice coil motor 66x with respect to the center (center of gravity) of the substrate table 62.
- the other of the two Y voice coil motors 66 y is on the ⁇ X side of the substrate table 62, and the diagonal of the one Y voice coil motor 66 y with respect to the center (center of gravity) of the substrate table 62. Is arranged.
- the X voice coil motor 66x (on the + X side of the substrate table 62) includes a stator 68a having a T-shaped cross section fixed to the upper surface of the X carriage 40 via a support column 67, And a mover 68b having a U-shaped cross section fixed to the side surface of the substrate table 62 on the + X side.
- the X voice coil motor 66x is a moving magnet type linear motor in which the stator 68a has a coil unit (not shown) and the mover 68b has a magnet unit (not shown), and generates thrust in a direction parallel to the X axis.
- the configuration of the other X voice coil motor 66x (not shown in FIG. 3; see FIG.
- the two Y voice coil motors 66y are moving magnet type linear motors having substantially the same configuration as the X voice coil motor 66x except that they generate thrust parallel to the Y axis. Since there is, description is abbreviate
- the X voice coil motor 66x and the Y voice coil motor 66y may be a moving coil type.
- the substrate table 62 may be finely driven in the three-degree-of-freedom direction in the horizontal plane using a two-degree-of-freedom voice coil motor capable of generating thrust in the X-axis and Y-axis directions.
- the height positions (Z positions) of the two X voice coil motors 66x and the two Y voice coil motors 66y substantially coincide with the height position of the center of gravity of the fine movement stage 60, for example.
- the fine movement stage 60 rotates in the ⁇ x and ⁇ y directions due to thrust applied from the two X voice coil motors 66x and the two Y voice coil motors 66y (generation of pitching moment). It is suppressed.
- the main controller moves the X carriage 40 with a predetermined stroke in the X-axis and / or Y-axis direction
- the plurality of voice coil motors X voice coil motors 66x, Y A thrust in the X-axis and / or Y-axis direction is applied (accelerated) to the substrate table 62 via the voice coil motor 66y).
- the fine movement stage 60 including the substrate holder 64 holding the substrate P moves (integrally) with a predetermined stroke in the X-axis direction and / or the Y-axis direction in synchronization with the X carriage 40.
- the main controller (not shown), for example, makes the fine movement stage 60 relative to the X carriage 40 by making the outputs (thrust) of the two X voice coil motors 66x (or the two Y voice coil motors 66y) different. Slightly drives in the ⁇ z direction.
- the above-described X carriage 40 has a stopper member that mechanically defines the movement range of the fine movement stage 60 relative to the X carriage 40 or the fine movement stage 60 with respect to the X-axis and Y-axis directions. A gap sensor or the like for measuring a relative movement amount with respect to the X carriage 40 is attached.
- the fine movement stage drive system has a plurality of Z voice coil motors 66z for finely driving the fine movement stage 60 in the Z / tilt direction with respect to the X carriage 40.
- a total of four Z voice coil motors 66 z are arranged corresponding to the four corners of the substrate table 62.
- the Z voice coil motor 66z includes a stator 68a having a coil unit (not shown) and a movable element 68b having a magnet unit (not shown), as with the X voice coil motor 66x described above. Including a moving magnet type linear motor that generates thrust parallel to the Z-axis.
- the stator 68a is fixed to the side surface of the X carriage 40 so that the mover 68b is disposed in the space between the substrate table 62 and the Y step guide 50. It is fixed to the lower surface of the substrate table 62 via a bracket 69.
- the position information of the three-degree-of-freedom direction (X-axis, Y-axis, ⁇ z direction) in the horizontal plane of fine movement stage 60 is not shown, which is fixed to the apparatus body using a mirror (not shown) provided on substrate table 62, for example. Of the laser interferometer. Further, the position information of the fine movement stage 60 in the Z / tilt direction is fixed to the upper surface of the Y step guide 50 (or to the weight canceling device 70) by a plurality of laser displacement meters (not shown) fixed to the substrate table 62, for example. Target).
- the configuration of the position measurement system of the fine movement stage 60 in the direction of 6 degrees of freedom is disclosed in, for example, US Patent Application Publication No. 2010/0018950. The configuration of the position measurement system of fine movement stage 60 is not limited to this, and an encoder system, for example, may be used.
- weight cancellation devices 70 are provided, and the substrate table 62 is supported by the four weight cancellation devices 70 from below, for example.
- two of the four weight cancellation devices 70 are placed on the Y step guide 50 on the + Y side so as to be separated from each other in the X-axis direction, and the other two are on the Y step guide 50 on the -Y side. Are spaced apart from each other in the X-axis direction.
- the two weight cancellation devices 70 on the + Y side are arranged in the space between the + Y side, for example, two Z voice coil motors 66z, and the two weight cancellation devices 70 on the -Y side, for example, it is disposed in the space between the two Z voice coil motors 66z.
- the four weight cancellation apparatuses 70 since the four weight cancellation apparatuses 70 have substantially the same structure, one of them will be described below.
- the weight canceling device 70 includes a casing 72 made of a bottomed cylindrical member opened to the + Z side, an air bearing 73 attached to the lower surface of the casing 72, and a bottom surface of the casing 72.
- An air spring 74 mounted on the air spring 74, a Z slide member 76 mounted on the air spring 74, and an air bearing 77 attached to the Z slide member 76.
- a plurality of cases 72 are provided for the X carriage 40 or for the X carriage 40 via a bracket 78 having a T-shape in plan view fixed to the X carriage 40 (in this embodiment).
- the coupling device 79 includes a rod-shaped member (or a thin plate, a rope, etc.) extending in a direction parallel to the XY plane, and a smoothing device (for example, a ball joint) provided at each longitudinal end of the rod-shaped member.
- the rod-like member is installed between the weight canceling device 70 and the X carriage 40 (or the bracket 78) via a smoothing device.
- the three connecting devices 79 are arranged radially at substantially equal intervals around the Z axis.
- two of the three connecting devices 79 are installed between the housing 72 and the X carriage 40, and the remaining one connecting device 79 is installed between the housing 72 and the bracket 78.
- the housing 72 is restrained by the X carriage 40 in the three-degree-of-freedom direction (X-axis, Y-axis, and ⁇ z directions) in the horizontal plane by the action of, for example, three coupling devices 79, while the Z / tilt In terms of direction, they are separated vibrationally.
- the air bearing 73 is attached to the bottom surface of the casing 72 with the bearing surface (gas ejection surface) facing the ⁇ Z side.
- the bearing surface of the air bearing 73 is opposed to the upper surface of the Y step guide 50, and the weight canceling device 70 uses the static pressure of the pressurized gas ejected from the air bearing 73 to the upper surface of the Y step guide 50. It is placed on the guide 50 in a non-contact state.
- the number of air bearings 73 is one in the present embodiment, but is not limited to this and may be plural.
- Compressed gas is supplied to the air spring 74 from the outside of the weight cancellation device 70.
- the air spring 74 applies an upward force in the gravity direction to the Z slide member 76.
- the pressure of the pressurized gas supplied to the air spring 74 is appropriately controlled by the main controller.
- the Z slide member 76 is formed of a cylindrical (or plate) member extending in the Z-axis direction, and is inserted on the inner diameter side of the housing 72.
- the Z slide member 76 is guided to the casing 72 with low friction via, for example, an air bearing (not shown), and has five degrees of freedom with respect to the casing 72 (X-axis, Y-axis, ⁇ z, ⁇ x, ⁇ y directions). Relative movement is restricted.
- the air bearing 77 is attached to the upper end surface of the Z slide member 76 so as to be swingable with respect to a horizontal plane via, for example, a hinge device or the like with the bearing surface (gas ejection surface) facing the + Z side.
- the bearing surface of the air bearing 77 faces the lower surface of the substrate table 62.
- the portion facing the bearing surface of the air bearing 77 is finished with high flatness.
- the weight canceling device 70 supports the substrate table 62 from below in a non-contact state by the static pressure of pressurized gas ejected from the air bearing 77 to the lower surface of the substrate table 62.
- one weight canceling device 70 applies a force in the gravity direction that is 1/4 of the weight of the fine movement stage 60 to the fine movement stage 60.
- the four weight cancellation devices 70 cooperate to cancel the dead weight of the fine movement stage 60, and, for example, reduce the load on the four Z voice coil motors 66z.
- the Z / tilt position control of the substrate P is appropriately performed. Done.
- the substrate table 62 is driven in at least one of the Z-axis, ⁇ x, and ⁇ y directions by a plurality of Z voice coil motors 66z.
- the Z slide member 76 is caused by the elasticity of the air spring 74 in accordance with the change in the posture of the substrate table 62 (the amount of movement in the direction orthogonal to the horizontal plane and the change in the inclination with respect to the horizontal plane).
- the air bearing 77 tilts (swings) in accordance with the tilt amount of the lower surface of the substrate table 62.
- the operations of the four weight cancellation devices 70 are independent.
- the weight of fine movement stage 60 is always supported by, for example, four weight cancellation devices 70.
- each of the four weight cancellation devices 70 includes a plurality of connecting devices 79.
- the X carriage 40 moves integrally with the X carriage 40 in the Y-axis direction with a predetermined stroke.
- the weight canceling device 70 is not dropped from the corresponding Y step guide 50.
- each of the four weight cancellation devices 70 is provided. Are pulled (or pressed) by the X carriage 40 via a plurality of connecting devices 79 (and brackets 78), so that the X carriage 40 is integrated with the X carriage 40 in the X-axis direction. Move with a predetermined stroke.
- the Z position of the three connecting devices 79 described above is set to be substantially the same as the height position of the center of gravity of the weight canceling device 70, and when the X carriage 40 moves, the weight canceling device 70 is orthogonal to the traveling direction. Rotation in the direction around the axis ( ⁇ x, ⁇ y) is prevented.
- the mask M is loaded onto the mask stage 14 by a mask loader (not shown) under the control of the main controller (not shown), and
- the substrate P is loaded onto the substrate stage device 20 by a substrate loader (not shown).
- the main controller performs alignment measurement using an alignment detection system (not shown), and after the alignment measurement is completed, a step-and-scan exposure operation is performed. Since this exposure operation is the same as the conventional step-and-scan method, its detailed description is omitted.
- the main controller uses the plurality of Z voice coil motors 66z so that the surface of the substrate P is located within the focal depth of the projection optical system 16 (see FIG. 1), for example.
- Control autofocus control
- the substrate table 62 is finely driven in the Z / tilt direction by a plurality of Z voice coil motors 66z.
- the main control device individually controls each of the plurality of weight cancellation devices 70, specifically, for example, with respect to the air spring 74 so as to always generate a predetermined upward force regardless of the Z position of the substrate table 62, for example.
- the weight of the fine movement stage 60 is supported by, for example, the four weight cancellation apparatuses 70 (that is, each weight cancellation apparatus 70 has its own weight of the fine movement stage 60. Therefore, for example, the load acting on the Y step guide 50 that guides (supports) each of the four weight canceling devices 70 is assumed to be the total weight of the fine movement stage 60 by one weight canceling device.
- a substrate stage apparatus hereinafter referred to as a comparative substrate stage apparatus (not shown)
- the Y step guide 50 and the stage base 18 that supports the Y step guide 50
- the individual weight cancellation device 70 can be reduced in size and weight as compared with the comparative example, the air bearing 73 and the substrate table 62 for floating the weight cancellation device 70 on the Y step guide 50 are not provided.
- the air bearing 77 for supporting the contact can be reduced in size. Further, the height of the entire substrate stage device 20 is reduced by making the Y step guide 50 thinner and the weight canceling device 70 smaller.
- the substrate table 62 is configured to support, for example, four locations from below, deformation due to the weight of the substrate table 62 can be suppressed as compared with the substrate stage apparatus of the comparative example. Therefore, the substrate table 62 itself can be reduced in thickness and weight, and the position controllability of the fine movement stage 60 is improved.
- the weight reduction of the substrate table 62 reduces the size and power consumption of voice coil motors (X voice coil motor 66x, Y voice coil motor 66y, Z voice coil motor 66z) for minutely driving the substrate table 62. It becomes possible.
- the substrate table 62 is supported by, for example, four weight canceling devices 70, the substrate table 62 has high rigidity against the pitching moment.
- the attitude of the fine movement stage 60 is more stable than the substrate stage apparatus of the comparative example. Therefore, for example, when the maintenance of the substrate stage apparatus 20 is performed, an auxiliary device for preventing the substrate table 62 from being tilted (turned down) becomes unnecessary. Further, a bearing device (for example, a spherical bearing device or a pseudo-spherical bearing device as disclosed in US Patent Application Publication No. 2010/0018950) that makes the fine movement stage 60 swingable is unnecessary, and the substrate stage. The configuration of the device 20 is simplified.
- the configuration of the substrate stage apparatus 20 according to the embodiment described above can be changed as appropriate.
- the lower surface of the substrate table 62 is opposed to the upper end surface (the end surface on the + Z side) of the Z slide member 76 of the weight cancellation device 70A.
- the air bearing 77 may be attached to be tiltable.
- the bearing surface of the air bearing 77 is always parallel to the upper end surface (XY plane) of the Z slide member 76 regardless of the attitude of the fine movement stage 60 (inclination angle with respect to the horizontal plane). Maintained. Therefore, the substrate table 62 does not move carelessly along the guide surface formed by the plurality of air bearings 77 due to its own weight.
- the fine movement stage 60B is mounted on the Y step guide 50 on the + Y side, for example, two (in FIG. 5, the first substrate table 62B 1 that is supported by the weight cancellation device 70 of the overlap in the direction of depth of the page), placed on the Y step guide 50 on the -Y side, for example, two (in FIG. 5, the paper a second substrate table 62B 2 which is supported on the weight cancellation device 70 of the overlapping are) in the depth direction may have a.
- the first substrate table 62B 1 and the second substrate table 62B 2 is constituted by a separate member, it is disposed at a distance from each other in the Y-axis direction.
- the substrate holder 64 is fixed on the first and second substrate tables 62B 1 and 62B 2 .
- the fine movement stage 60B can be reduced in weight as compared with the substrate stage apparatus 20 according to the above embodiment. Also, since the first and second substrate tables 62B 1 and 62B 2 are separated, even if the substrate holder 64 and the first and second substrate tables 62B 1 and 62B 2 are thermally expanded or contracted, Distortion of the substrate holder 64 (a phenomenon similar to the so-called bimetal phenomenon) due to the difference between the expansion amount and contraction amount of each other hardly occurs, and the flatness of the upper surface of the substrate holder 64 is kept good.
- the substrate stage device 20B, the first substrate table 62B 1 is the + Y side, for example, while being supported by the two weight cancellation device 70
- the second substrate table 62B 2 is -Y side, for example, two weight
- the configuration supported by the cancel device 70 (that is, the substrate table 62 (see FIG. 3) of the first embodiment is divided into two members (substrate tables 62B 1 and 62B 2 ) corresponding to the two Y step guides 50.
- the present invention is not limited to this.
- the substrate corresponds to two weight canceling devices 70 on the + X side and two weight canceling devices 70 on the ⁇ X side (see FIG. 2 respectively).
- the table 62 (see FIG. 3) may be divided into two members, or, for example, a base corresponding to each of the four weight cancellation devices 70 may be used.
- Table 62 may be configured as divided into four members (see Figure 3).
- each of the spheroids 80a to 80d is rotated around an axis parallel to the Z axis by, for example, an angle of 90 ° by a rotary motor 82 disposed on the X carriage 40 or the bracket 78. It is provided as possible.
- the spheroid 80a arranged on the + X side of the substrate table 62 has a long axis as shown in FIG. It is rotationally driven to a position parallel to the X axis. Then, the X carriage 40 is moved in the ⁇ X direction in a state where the outer peripheral surface of the spheroid 80a and the side surface of the substrate table 62 are in contact with each other, so that the X is not applied to the substrate table 62 without using the X voice coil motor 66x. Thrust can be applied (accelerated) from the carriage 40.
- the spheroid 80a is, for example, the spheroids 80b to 80d on the ⁇ X, + Y, and ⁇ Y sides in FIG.
- the long axis is rotationally driven to a position parallel to the side surface of the opposing substrate table 62.
- the substrate table 62 can be finely driven.
- the fine movement stage 60 can be accelerated and decelerated without using the X voice coil motor 66x and the Y voice coil motor 66y, so that energy efficiency is good.
- the spheroids 80a to 80d are arranged outside the substrate table 62.
- the present invention is not limited to this.
- the substrate stage apparatus 20D according to the fourth modification shown in FIG. the spheroids 80e and 80f may be accommodated in the openings 86a and 86b formed in the substrate table 62.
- the interval in the X-axis direction between the wall surfaces defining the opening 86a and the interval in the Y-axis direction between the wall surfaces defining the opening 86b are substantially the same as the lengths of the major axes of the spheroids 80e and 80f (actually Is set somewhat longer).
- the major axis of the spheroid 80e is parallel to the X-axis
- the major axis of the spheroid 80f is parallel to the Y axis.
- the X beam 30 is driven by the Y linear motor 23 (see FIG. 1), and the X carriage 40 is driven by the X linear motor 35 (see FIG. 3).
- the types of actuators for driving the X beam 30 and the X carriage 40 are not limited thereto, and for example, a feed screw device, a belt driving device, a wire driving device, or the like may be used.
- the X position of the substrate table 62 is controlled with high precision by the fine movement stage drive system including the X voice coil motor 66x (the fine movement stage 60 is finely driven). The positioning accuracy of the X position may be lower than that of the substrate table 62.
- the X carriage 40E may be driven by, for example, four X actuators 90 including a rotary motor that drives the mechanism.
- two X actuators 90 disposed on the + X side of the X carriage 40E and, for example, two X actuators 90 disposed on the ⁇ X side of the X carriage 40E cooperate with each other in the X stage.
- the carriage 40E is driven with a predetermined stroke in the X-axis direction.
- the X actuator 90 in the fifth modified example has a configuration in which the link mechanism itself has an actuator.
- the present invention is not limited to this.
- the link mechanism may be driven by the feed screw device 92 placed on the X beam 30F.
- the plurality of weight cancellation devices 70 are pulled by the X carriage 40.
- the X carriage 40 may be configured to press the weight cancellation device 70 (for example, in a non-contact manner via an air bearing). good.
- a plurality of weight cancellation devices 70 may be connected to each other by a predetermined connecting member, and the connecting member may be pulled (or pressed) by the X carriage 40.
- the plurality of weight cancellation devices 70 are driven in a non-contact manner with respect to the X carriage 40 by actuators (for example, a voice coil motor having a stator fixed to the X carriage 40 and a mover fixed to the weight cancellation device 70, respectively). It may be configured.
- two weight cancellation devices 70 support the fine movement stage 60 on the + Y side Y step guide 50 and, for example, two weight cancellation devices on the ⁇ Y side Y step guide 50.
- 70 is the structure which supports the fine movement stage 60
- positioning of the weight cancellation apparatus 70 can be changed suitably. That is, one weight canceling device 70 may be provided on each of the Y step guides 50 on the + Y side and the ⁇ Y side. Further, the number of weight cancellation devices 70 placed on the pair of Y step guides 50 may be different. For example, one weight cancellation device 70 is placed on one Y step guide 50 and the other Y step guide 50 is placed on the other Y step guide 50.
- a configuration in which two weight cancellation devices 70 are placed on the step guide 50 may be adopted.
- the number of weight cancellation devices 70 placed on one Y step guide 50 is not particularly limited as long as it is one or more, and for example, three or more weight cancellation devices 70 may be placed.
- the X-axis direction drive mechanism including the X beam 30, the X linear guide device 34, the X linear motor 35, and the X carriage 40 is provided between the pair of Y step guides 50 in the Y axis direction.
- a plurality of sets of drive mechanisms in the X-axis direction may be arranged so as to sandwich the pair of Y step guides 50 with respect to the Y-axis direction.
- a connecting device for connecting the pair of Y step guides 50 with respect to the Y-axis direction may be provided instead of the connecting device 52.
- each X carriage 40 with a fine movement stage drive system for minutely driving the fine movement stage 60 in the direction of three degrees of freedom.
- one weight canceling device 70 may be provided for the pair of Y step guides 50.
- the air bearing for supporting one weight cancellation apparatus (in other words, one set of housings and air springs) is disposed across, for example, a pair of Y step guides 50 instead of the air bearing 73. It is preferable to provide a plurality of air bearings corresponding to each Y step guide 50 with respect to one air bearing or one housing.
- three sets of Y-axis direction drive mechanisms including the base frame 22 and the Y linear guide device 21, the Y linear motor 23, and the Y carriage 32 provided on the base frame 22 are arranged in the X axis direction.
- four or more sets may be arranged.
- the stage base 18 and the Y linear guide device 19 are preferably arranged between each of a plurality of drive mechanisms in the Y axis direction with respect to the X axis direction, for example.
- a sensor (referred to as a Z sensor) capable of measuring the height position of the fine movement stage 60 driven in the Z-axis direction by the Z voice coil motor 66z with respect to a predetermined reference plane is appropriately disposed. Also good.
- the Z sensor irradiates a beam onto the upper surface of the Y step guide 50 or the surface of a predetermined reference member provided in the weight canceling device 70, and detects the reflected beam, thereby reflecting the reflecting surface. It can be set as the sensor which measures the height position (distance in a Z-axis direction) with respect to.
- the number and position of the Z sensors can be set as appropriate.
- a plurality of Z sensors may be provided corresponding to each of the pair of Y step guides 50, and each of the plurality of weight cancellation devices 70 may be provided.
- a plurality of Z sensors may be provided.
- one Z sensor that refers to a representative reference plane may be provided instead of providing a plurality of Z sensors.
- the illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F 2 laser light (wavelength 157 nm).
- a single wavelength laser beam oscillated from a DFB semiconductor laser or a fiber laser is amplified by a fiber amplifier doped with, for example, erbium (or both erbium and ytterbium).
- harmonics converted into ultraviolet light using a nonlinear optical crystal may be used.
- a solid laser (wavelength: 355 nm, 266 nm) or the like may be used.
- the projection optical system 16 is a multi-lens projection optical system including a plurality of optical systems has been described, but the number of projection optical systems is not limited to this, and one or more projection optical systems may be used.
- the projection optical system is not limited to a multi-lens projection optical system, and may be a projection optical system using an Offner type large mirror. Further, the projection optical system 16 may be an enlargement system or a reduction system.
- the use of the exposure apparatus is not limited to the exposure apparatus for liquid crystal that transfers the liquid crystal display element pattern onto the square glass plate.
- the exposure apparatus for manufacturing an organic EL (Electro-Luminescence) panel the semiconductor manufacture
- the present invention can also be widely applied to an exposure apparatus for manufacturing an exposure apparatus, a thin film magnetic head, a micromachine, a DNA chip, and the like.
- microdevices such as semiconductor elements but also masks or reticles used in light exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, electron beam exposure apparatuses, etc., glass substrates, silicon wafers, etc.
- the present invention can also be applied to an exposure apparatus that transfers a circuit pattern.
- the object to be exposed is not limited to the glass plate, but may be another object such as a wafer, a ceramic substrate, a film member, or a mask blank. Further, when the exposure object is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and includes, for example, a film-like (flexible sheet-like member).
- the exposure apparatus of the present embodiment is particularly effective when a substrate having a side length or diagonal length of 500 mm or more is an exposure target.
- the step of designing the function and performance of the device the step of producing a mask (or reticle) based on this design step, and the step of producing a glass substrate (or wafer)
- the above-described exposure method is executed using the exposure apparatus of the above embodiment, and a device pattern is formed on the glass substrate. Therefore, a highly integrated device can be manufactured with high productivity. .
- the moving body device of the present invention is suitable for driving the moving body along a predetermined two-dimensional plane.
- the exposure apparatus of the present invention is suitable for forming a predetermined pattern on an object.
- the manufacturing method of the flat panel display of this invention is suitable for production of a flat panel display.
- the device manufacturing method of the present invention is suitable for the production of micro devices.
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Abstract
Description
Claims (20)
- 互いに直交する第1及び第2軸を含む所定の2次元平面に沿って移動可能な移動体と、
前記移動体を前記第1及び第2軸に平行な方向に誘導する誘導装置と、
前記移動体と同期して前記2次元平面に平行な方向に移動可能、且つ協働して前記移動体の自重を支持する複数の自重支持装置と、
前記第2軸に平行な方向に関して前記誘導装置の一側に設けられ、前記第1軸に平行な方向に移動する前記複数の自重支持装置の一部をガイドする第1ガイド部材と、
前記第2軸に平行な方向に関して前記誘導装置の他側に設けられ、前記第1軸に平行な方向に移動する前記複数の自重支持装置の他部をガイドする第2ガイド部材と、を備える移動体装置。 - 前記第1及び第2ガイド部材は、前記第1軸に平行な方向に延び、前記移動体に同期して前記第2軸に平行な方向に沿って移動する請求項1に記載の移動体装置。
- 前記自重支持装置は、少なくとも前記2次元平面内で同一直線上にない3箇所に対応する位置に配置される請求項1又は2に記載の移動体装置。
- 前記自重支持装置は、前記第1及び第2ガイド部材上に非接触状態で載置される請求項1~3のいずれか一項に記載の移動体装置。
- 前記自重支持装置は、前記移動体を非接触支持する請求項1~4のいずれか一項に記載の移動体装置。
- 前記自重支持装置は、前記自重支持装置及び前記移動体の一方に設けられたエアベアリングを介して前記移動体を非接触支持する請求項5に記載の移動体装置。
- 前記エアベアリングは、前記2次元平面に対して傾動可能な状態で前記自重支持装置及び前記移動体の一方に設けられる請求項6に記載の移動体装置。
- 前記複数の自重支持装置は、前記誘導装置により前記2次元平面に平行な方向に誘導される請求項1~7のいずれか一項に記載の移動体装置。
- 前記第1及び第2ガイド部材上には、少なくとも2つの前記自重支持装置が載置され、該少なくとも2つの前記自重支持装置の前記第2軸に平行な方向に関する位置が同じである請求項1~8のいずれか一項に記載の移動体装置。
- 前記誘導装置は、前記移動体と分離して設けられ、非接触で前記移動体を前記2次元平面に平行な方向に誘導する請求項1~9のいずれか一項に記載の移動体装置。
- 前記移動体は、前記2次元平面内に対して傾斜する方向に更に移動可能であり、
前記複数の自重支持装置は、前記移動体の前記傾斜する方向の姿勢に応じて独立して動作する請求項1~10のいずれか一項に記載の移動体装置。 - 前記誘導装置は、前記第1軸に平行な方向に延び、前記第2軸に平行な方向に移動可能な第1移動部と、前記第1移動部に設けられ、前記第1移動部に沿って前記第1軸に平行な方向に移動可能、且つ前記第1移動部と共に前記第2軸に平行な方向に移動可能な第2移動部とを含む請求項1~11のいずれか一項に記載の移動体装置。
- 前記誘導装置は、第1ベース部材上に設けられ、
前記第1及び第2ガイド部材は、前記第1ベース部材とは振動的に分離された第2ベース部材上に設けられる請求項1~12のいずれか一項に記載の移動体装置。 - 前記移動体に所定の物体が保持される請求項1~13のいずれか一項に記載の移動体装置と、
エネルギビームを用いて前記物体に所定のパターンを形成するパターン形成装置と、を備える露光装置。 - 前記物体に前記所定のパターンが形成される際に、前記物体を保持した前記移動体が前記エネルギビームに対して前記第1軸に平行な方向に相対移動する請求項14に記載の露光装置。
- 前記移動体は、前記複数の自重支持装置に支持される本体部と、前記本体部上に固定され、前記物体が載置される物体載置部とを有し、
前記本体部は、前記2次元平面に平行な方向に関して互いに分離して設けられた複数の部材を含み、該複数の部材は、互いに異なる前記自重支持装置に支持される請求項14又は15に記載の露光装置。 - 前記物体は、フラットパネルディスプレイに用いられる基板である請求項14~16のいずれか一項に記載の露光装置。
- 前記基板は、少なくとも一辺の長さ又は対角長が500mm以上である請求項17に記載の露光装置。
- 請求項17又は18に記載の露光装置を用いて前記物体を露光することと、
露光された前記物体を現像することと、を含むフラットパネルディスプレイの製造方法。 - 請求項14~16のいずれか一項に記載の露光装置を用いて前記物体を露光することと、
露光された前記物体を現像することと、を含むデバイス製造方法。
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JP2020190740A (ja) * | 2015-03-31 | 2020-11-26 | 株式会社ニコン | 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法 |
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JPWO2021255807A1 (ja) * | 2020-06-15 | 2021-12-23 | ||
WO2021255807A1 (ja) * | 2020-06-15 | 2021-12-23 | 株式会社ニコン | ステージ装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法 |
JP7452649B2 (ja) | 2020-06-15 | 2024-03-19 | 株式会社ニコン | ステージ装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法 |
Also Published As
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TW201944459A (zh) | 2019-11-16 |
JPWO2015147039A1 (ja) | 2017-04-13 |
TW201539542A (zh) | 2015-10-16 |
JP6551762B2 (ja) | 2019-07-31 |
TWI728425B (zh) | 2021-05-21 |
US20200124988A1 (en) | 2020-04-23 |
US20170108785A1 (en) | 2017-04-20 |
JP2019185056A (ja) | 2019-10-24 |
US10534277B2 (en) | 2020-01-14 |
TWI671794B (zh) | 2019-09-11 |
JP2018142022A (ja) | 2018-09-13 |
JP6835155B2 (ja) | 2021-02-24 |
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