WO2015118799A1 - 有機エレクトロルミネッセンス素子及び照明装置 - Google Patents
有機エレクトロルミネッセンス素子及び照明装置 Download PDFInfo
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- WO2015118799A1 WO2015118799A1 PCT/JP2015/000066 JP2015000066W WO2015118799A1 WO 2015118799 A1 WO2015118799 A1 WO 2015118799A1 JP 2015000066 W JP2015000066 W JP 2015000066W WO 2015118799 A1 WO2015118799 A1 WO 2015118799A1
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- resin layer
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Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/854—Arrangements for extracting light from the devices comprising scattering means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/821—Patterning of a layer by embossing, e.g. stamping to form trenches in an insulating layer
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
- F21Y2105/00—Planar light sources
- F21Y2105/10—Planar light sources comprising a two-dimensional array of point-like light-generating elements
- F21Y2105/14—Planar light sources comprising a two-dimensional array of point-like light-generating elements characterised by the overall shape of the two-dimensional array
- F21Y2105/16—Planar light sources comprising a two-dimensional array of point-like light-generating elements characterised by the overall shape of the two-dimensional array square or rectangular, e.g. for light panels
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
- F21Y2115/00—Light-generating elements of semiconductor light sources
- F21Y2115/10—Light-emitting diodes [LED]
- F21Y2115/15—Organic light-emitting diodes [OLED]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Definitions
- a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, between an anode and a cathode provided on a light transmitting substrate as an organic electroluminescent element hereinafter also referred to as “organic EL element”.
- organic EL element a structure in which functional layers such as an electron injection layer are stacked is known.
- light is generated in the light emitting layer by applying a voltage between the anode and the cathode. Then, the light emitted from the light emitting layer is extracted to the outside through the light transmitting electrode and the substrate.
- Japanese Patent Laid-Open Publication No. 2007-242286 discloses an organic EL element in which a scattering layer having surface roughness and a low resistance layer are provided on a substrate. However, even if the method of this document is used, it can not be said that the light from the light emitting layer is sufficiently extracted to the outside, and further improvement of the light extraction property is required.
- An object of the present disclosure is to provide an organic electroluminescent device and a lighting device with high light extraction efficiency.
- An organic electroluminescent device is provided between a light-transmissive substrate, an organic light-emitting body having a first electrode, an organic light-emitting layer and a second electrode, the substrate and the organic light-emitting body And a resin portion having a first resin layer and a second resin layer.
- the resin portion has an uneven interface between the first resin layer and the second resin layer.
- the uneven interface has a first uneven structure and a second uneven structure with smaller unevenness than the first uneven structure.
- the second uneven structure has a random unevenness.
- a lighting device includes the above-described organic electroluminescent device.
- the organic electroluminescent element of the present disclosure has a high light extraction efficiency because the concavo-convex interface has a relatively large first concavo-convex structure and a fine second concavo-convex structure.
- FIG. 1 is composed of FIG. 1A and FIG. 1B.
- FIG. 1A is a schematic cross-sectional view showing the layer structure of the organic electroluminescent element.
- FIG. 1B is a schematic cross-sectional view showing an example of the concavo-convex interface.
- FIG. 2 is composed of FIG. 2A and FIG. 2B.
- FIG. 2A is a schematic plan view of the first uneven structure.
- FIG. 2B is a schematic cross-sectional view of the first uneven structure.
- FIG. 3 is composed of FIG. 3A and FIG. 3B.
- FIG. 3A is a plan view showing an example of a pattern example of the first concavo-convex structure.
- FIG. 3B is a plan view showing an example of a pattern example of the first uneven structure.
- FIG. 3A is a plan view showing an example of a pattern example of the first uneven structure.
- FIG. 3B is a plan view showing an example of a pattern example of the first uneven structure.
- FIG. 4 is composed of FIGS. 4A and 4B.
- FIG. 4A is an analysis view of the uneven interface.
- FIG. 4B is an analysis view of the uneven interface. It is a graph which shows the relationship between the ten-point average roughness (Rz) of a 2nd uneven
- An organic electroluminescent device (organic EL device) according to the present disclosure includes a light transmitting substrate 1 and an organic light emitting body 10.
- the organic light emitting body 10 has a first electrode 3, an organic light emitting layer 4 and a second electrode 5.
- the organic EL element is provided with a resin portion 2 having a first resin layer 21 and a second resin layer 22 between the substrate 1 and the organic light emitting body 10.
- the resin portion 2 has an uneven interface 20 between the first resin layer 21 and the second resin layer 22.
- the uneven interface 20 has a first uneven structure 2A and a second uneven structure 2B.
- the second uneven structure 2B has smaller unevenness than the first uneven structure 2A. In the second uneven structure 2B, the unevenness is random.
- FIG. 1 is an example of the organic EL element.
- FIG. 1 is composed of FIG. 1A and FIG. 1B.
- FIG. 1A shows the layer structure of the organic EL element
- FIG. 2B shows a part of the layer structure in an enlarged manner.
- FIGS. 1A and 1B schematically show the layer configuration of the organic EL element, and the thickness of the actual layer, the size and shape of the unevenness, and the like may be different from those in this figure.
- the substrate 1 is light transmissive.
- the substrate 1 may be any as long as it transmits light, and may be transparent or semitransparent. More preferably, the substrate 1 is transparent.
- the substrate 1 can be configured of a glass substrate, a resin substrate, or the like. When the substrate 1 is made of glass, since the glass has low moisture permeability, the penetration of moisture from the substrate 1 side can be suppressed. On the other hand, when the substrate 1 is made of resin, scattering at the time of breakage can be suppressed, and safety and handleability can be enhanced.
- the organic EL element can be structured to extract light from the surface on the substrate 1 side.
- This structure is called a so-called bottom emission structure.
- it may be a double-sided taking out structure which can take out light from both sides.
- a layer having light diffusivity may be provided on the surface (light extraction surface) of the substrate 1 opposite to the organic light emitting body 10.
- the light diffusive layer can be formed, for example, by applying an optical film. When the light diffusive layer is provided, more light can be extracted from the substrate 1. Also, by diffusing the light, it is possible to reduce the change in color depending on the viewing angle.
- the organic light emitting body 10 is formed of a laminate of the first electrode 3, the organic light emitting layer 4 and the second electrode 5.
- the organic light emitting body 10 can be defined as a structure in which the first electrode 3, the organic light emitting layer 4 and the second electrode 5 are stacked in the thickness direction.
- the organic light emitting body 10 is supported by the substrate 1.
- the organic light emitting body 10 may be formed with the substrate 1 as a base substrate.
- the first electrode 3 is an electrode having light transparency.
- the second electrode 5 is an electrode that forms a pair with the first electrode 3.
- the first electrode 3 can constitute an anode
- the second electrode 5 can constitute a cathode.
- the first electrode 3 can constitute a cathode and the second electrode 5 can constitute an anode.
- one of the two electrodes is an anode and the other is a cathode, it is possible to flow electricity between the two electrodes.
- the first electrode 3 has light transparency, it can constitute an electrode on the light extraction side.
- the second electrode 5 may have light reflectivity. In that case, light from the light emitting layer emitted toward the second electrode 5 can be reflected by the second electrode 5 and extracted from the substrate 1 side.
- the second electrode 5 may be a light transmitting electrode.
- the second electrode 5 is light transmissive, it is possible to have a structure in which light is extracted from the surface (rear surface) opposite to the substrate 1.
- a light reflective layer is provided on the back surface (the surface opposite to the organic light emitting layer 4) of the second electrode 5 to move in the direction of the second electrode 5 It is possible to reflect the emitted light and extract the light from the substrate 1 side. At that time, the light reflective layer may be diffuse reflective or specular reflective.
- the first electrode 3 can be configured using a transparent electrode material.
- a conductive metal oxide can be preferably used.
- ITO, IZO, AZO etc. are illustrated.
- the first electrode 3 can be formed by a sputtering method, a vapor deposition method, a coating method, or the like.
- the thickness of the first electrode 3 is not particularly limited, but can be, for example, in the range of 10 nm to 1000 nm.
- the second electrode 5 can be configured using an appropriate electrode material.
- the second electrode 5 can be formed of Al, Ag, or the like.
- the second electrode 5 can be formed by a vapor deposition method, a sputtering method, or the like.
- the thickness of the second electrode 5 is not particularly limited, but can be, for example, in the range of 10 nm to 1000 nm.
- the organic light emitting layer 4 is a layer having a function of causing light emission, and usually, from a hole injection layer, a hole transport layer, a light emitting layer (a layer containing a light emitting dopant), an electron transport layer, an electron injection layer, an intermediate layer, etc. It is composed of a plurality of layers to be selected.
- the thickness of the organic light emitting layer 4 is not particularly limited, but can be, for example, about 60 to 300 nm.
- the organic light emitting layer 4 has a hole injection layer, a hole transport layer, a light emitting layer, an electron transport in this order from the first electrode 3 side.
- the layer can be an electron injection layer.
- the laminated structure is not limited to this, and for example, a single layer of the light emitting layer, a laminated structure of the hole transporting layer, the light emitting layer, and the electron transporting layer, or the hole transporting layer and the light emitting layer A stacked structure can be used, or a stacked structure of a light emitting layer and an electron transporting layer can be used.
- the light emitting layer may have a single layer structure or a multilayer structure.
- the light emitting layer may be stacked.
- the light emitting units have a light transmitting property and conductivity. It may be a multi-unit structure stacked via layers.
- the multi-unit structure is a structure provided with a plurality of light emitting units overlapping in the thickness direction between paired electrodes (anode and cathode).
- the organic EL element has a resin part 2.
- the resin part 2 is comprised by resin.
- the resin part 2 may be a layer.
- the resin portion 2 is disposed between the substrate 1 and the organic light emitting body 10. In the present embodiment, the resin portion 2 is in contact with the substrate 1. Further, the resin portion 2 is in contact with the first electrode 3.
- the resin portion 2 has a first resin layer 21 and a second resin layer 22.
- the resin part 2 has a so-called multilayer structure.
- the resin portion 2 has a first resin layer 21 and a second resin layer 22 in this order from the substrate 1 side.
- the first resin layer 21 is disposed on the substrate 1 side.
- the second resin layer 22 is disposed on the first electrode 3 side.
- the resin part 2 has light transparency. Therefore, the light from the organic light emitting body 10 can be extracted to the substrate 1.
- the first resin layer 21 may be in contact with the substrate 1.
- the second resin layer 22 may be in contact with the first electrode 3.
- the second resin layer 22 preferably has a refractive index different from that of the first resin layer. That is, it is preferable that the first resin layer 21 and the second resin layer 22 have different refractive indexes.
- the refractive index means a refractive index at a visible light wavelength. 550 nm is illustrated as a representative wavelength of visible light wavelength.
- the resin portion 2 has an uneven interface 20.
- the uneven interface 20 is provided between the first resin layer 21 and the second resin layer 22. By providing the uneven interface 20, total reflection of light traveling from the organic light emitter 10 toward the substrate 1 is suppressed.
- the uneven interface 20 is an interface between the first resin layer 21 and the second resin layer 22.
- the organic EL element normally, there is a difference (refractive index difference) between the refractive index of the organic layer constituting the organic light emitting body 10 and the refractive index of the substrate 1, and the total reflection due to the refractive index difference is It can occur.
- the organic layer is a layer containing an organic substance in the organic light emitting body 10.
- the refractive index of the organic layer tends to be higher than that of glass, and the refractive index of the organic layer is often higher than the refractive index of the substrate 1. Then, among the light traveling from the organic layer to the substrate 1, the light entering the substrate 1 at a high angle with respect to the direction perpendicular to the surface of the substrate 1 (the light entering from the oblique direction) has a refractive index Due to the difference, the light is totally reflected on the surface of the substrate 1 and hardly enters the substrate 1.
- the concavo-convex interface 20 when the concavo-convex interface 20 is formed, light can be scattered by the concavo-convex interface 20, and more light of a totally reflected angle can be extracted to the substrate 1 side. Therefore, the light extraction property can be effectively enhanced.
- the uneven interface 20 can be easily formed at the interface between the two resin layers.
- the resin portion 2 is formed of two layers, since the concavo-convex interface 20 is formed inside the resin portion 2, it is possible to planarize both surfaces of the resin portion 2.
- the second resin layer 22 functions as a coating layer of the first resin layer 21 and the unevenness is flattened, the organic light emitting body 10 can be provided stably. Therefore, the disconnection defect and the short defect resulting from the unevenness can be suppressed.
- the covering layer even when the uneven interface 20 having a large height (depth) is provided, the organic light emitting body 10 can be favorably laminated.
- the second resin layer 22 can function as a planarization layer.
- the two resin layers are transparent and light transmissive, light can be effectively extracted.
- Either of the refractive indices of the first resin layer 21 and the second resin layer 22 may be large. Since the concavo-convex interface 20 is provided between the first resin layer 21 and the second resin layer 22, the light extraction property can be enhanced regardless of which of the two resin layers has a high refractive index.
- the refractive index of the second resin layer 22 is preferably larger than the refractive index of the first resin layer 21. In this case, since a resin layer having a high refractive index can be disposed on the organic layer side to reduce the difference in refractive index with the organic layer to allow light to penetrate into the concavo-convex interface 20, there is a possibility that more light can be extracted. There is.
- the first resin layer 21 is a low refractive index layer
- the second resin layer 22 is a high refractive index layer.
- the level of the refractive index in this case may be relative to each other of the resin layers.
- the refractive index of the first resin layer 21 may be larger than the refractive index of the second resin layer 22. In that case, it is possible to arrange a resin layer having a high refractive index on the substrate 1 side to adjust the refractive index difference between the substrate 1 and the organic layer.
- the second resin layer 22 is an aspect preferably having a refractive index larger than that of the substrate 1. Thereby, the refractive index difference can be reduced to further enhance the light extraction efficiency.
- the second resin layer 22 preferably has a refractive index of 1.75 or more in the visible light wavelength region. Thereby, the refractive index difference can be further reduced, the total reflection loss can be suppressed at a wide angle, and more light can be extracted.
- the refractive index of the substrate 1 is, for example, in the range of 1.3 to 1.55.
- the upper limit of the refractive index of the second resin layer 22 is not particularly limited, and may be, for example, 2.2 or 2.0. Further, it is preferable to reduce the difference in refractive index between the first electrode 3 which is an adjacent layer. For example, this refractive index difference can be made 1.0 or less.
- the first resin layer 21 preferably has a refractive index in the range of 1.3 to 1.52. Thereby, more light can be extracted.
- the difference in refractive index between the first resin layer 21 and the substrate 1 should be small. For example, this refractive index difference can be made 1.0 or less. It is also preferable that the refractive index of the first resin layer 21 be smaller than the refractive index of the substrate 1. In that case, total reflection at the interface between the first resin layer 21 and the substrate 1 can be suppressed.
- the first resin layer 21 may have a refractive index higher than that of the substrate 1.
- the refractive index of the first resin layer 21 may be smaller than 1.5.
- the refractive index of the first resin layer 21 As a means to make the refractive index of the first resin layer 21 lower than 1.5, hollow nanoparticles are added, fluorine is added to the molecular skeleton, and the like.
- the lower limit of the refractive index of the substrate 1 and the first resin layer 21 is ideally 1 but may be larger than that.
- the resin portion 2, that is, the first resin layer 21 and the second resin layer 22 are formed of a resin.
- the refractive index can be easily adjusted, and the formation of the asperities and the flattening of the asperities can be easily performed.
- a resin material is used, one having a relatively high refractive index can be easily obtained.
- the resin can form a layer by coating, a layer having a flat surface can be formed more easily.
- Examples of materials used for the first resin layer 21 and the second resin layer 22 include organic resins such as acrylic resins and epoxy resins.
- a resin an ultraviolet curable resin, a thermosetting resin, etc. are illustrated.
- the resin is preferably an ultraviolet curable resin.
- the ultraviolet curing resin can cure the resin without heating or by heating at a relatively low temperature, so that the heat history can be suppressed.
- additives for curing the resin may be added to the resin.
- the resin can be made to have a high refractive index or a low refractive index by containing particles that adjust the refractive index.
- a resin layer of high refractive index can be formed.
- a resin layer having a low refractive index can be formed.
- the two resin layers preferably have low light absorption. As a result, more light can be extracted to the substrate 1 side.
- the interface between the second resin layer 22 and the first electrode 3 is preferably a flat surface. This interface is formed by the surface of the second resin layer 22.
- the surface of the second resin layer 22 may be flat. By making this surface flat, the organic light emitting body 10 can be formed more stably, and short failure and stacking failure can be suppressed.
- the uneven interface 20 has at least two types of uneven structures of different sizes.
- the two types of uneven structures included in the uneven interface 20 are defined as a first uneven structure 2A and a second uneven structure 2B. By having two types of uneven structure, more light can be extracted.
- the first uneven structure 2A has relatively large-sized unevenness.
- the second uneven structure 2B has fine unevenness.
- the second uneven structure 2B has smaller unevenness than the first uneven structure 2A.
- the first uneven structure 2A has larger unevenness than the second uneven structure 2B.
- the size of the unevenness may be the size of the unevenness.
- the second uneven structure 2B can be referred to as a fine uneven structure.
- the first uneven structure 2A can also be referred to as a large uneven structure, and the second uneven structure 2B can be referred to as a small uneven structure.
- the magnitudes in this case are relative magnitudes.
- the first uneven structure 2 ⁇ / b> A has a convex portion 11 and a concave portion 12.
- the convex portion 11 in the first concavo-convex structure 2A is a portion where the first resin layer 21 protrudes to the organic light emitting body 10 side.
- the concave portion 12 in the first concavo-convex structure 2A is a portion where the first resin layer 21 is recessed toward the substrate 1 side.
- the size of the unevenness of the first uneven structure 2A is preferably 0.4 to 10 ⁇ m.
- the size of the unevenness may be the height of the unevenness.
- the height of the unevenness may be the length in the thickness direction from the bottom (the most recessed portion) of the recess 12 to the top (the most projecting portion) of the protrusion 11.
- the thickness direction is a direction perpendicular to the surface of the substrate 1.
- the positions of the bottom of the concave portion 12 and the top of the convex portion 11 serving as the height reference can be specified by averaging the positions in the thickness direction when the positions are not aligned in the thickness direction.
- FIG. 2B the width w of the convex portion 11 is shown. The width w will be described in detail in the description of FIGS. 2 and 3.
- the unevenness of the second uneven structure 2B is a fine unevenness.
- the second concavo-convex structure 2B has a smaller size of concavities and convexities than the first concavo-convex structure 2A.
- the second uneven structure 2 ⁇ / b> B has a protrusion 13 and a recess 14.
- the convex part 13 in the 2nd uneven structure 2B is the part which the 1st resin layer 21 protruded on the organic light-emitting body 10 side.
- the concave portion 14 in the second concavo-convex structure 2B is a portion where the first resin layer 21 is recessed toward the substrate 1 side.
- the asperity height of the second asperity structure 2B is indicated by a height 2h in FIG. 1B.
- the positions of the bottom of the recess 14 and the top of the protrusion 13 can be specified by averaging the positions in the thickness direction when the positions are not aligned in the thickness direction.
- the height 2h is smaller than the height 2H.
- the height 2h may be, for example, one fifth or less of the height 2H.
- the height 2h may be equal to or less than one tenth of the height 2H.
- the height 2h may be one hundredth or more of the height 2H.
- the second uneven structure 2B may be a moth-eye structure.
- the unevenness is random. Thereby, more light can be extracted. That the unevenness is random means that the convex portions 13 and the concave portions 14 of the second uneven structure 2B are arranged irregularly.
- the second concavo-convex structure 2B is provided on the surface of the first concavo-convex structure 2A as a fine concavo-convex structure.
- corrugation in the 2nd uneven structure 2B is random.
- the light extraction property is enhanced by the uneven interface 20 having the relatively large first uneven structure 2A and the fine second uneven structure 2B.
- the resin portion 2 the light from the organic light emitting body 10 is taken out to the substrate 1 side by the uneven interface 20.
- the first concavo-convex structure 2A exerts the scattering property by having a concavo-convex having a relatively large size.
- the concavo-convex interface 20 has the second concavo-convex structure 2B as a fine concavo-convex structure, light can be further extracted to the substrate 1 side.
- the fine concavo-convex structure is formed at the interface between the first resin layer 21 and the second resin layer 22, the convex portion 11 in the concavo-convex interface 20 is compared with the case where the fine concavo-convex structure is not formed.
- the electric field at the boundary between the and the recess 12 is disturbed, and the imbalance of the circulation integral of the electric field vector increases.
- the electric field near the edge is disturbed, and the imbalance of the circulation integral of the electric field vector is further increased.
- light extraction by the concavo-convex interface 20 can be performed more efficiently, so that the light entering the first resin layer 21 is converted to light entering the substrate 1 side.
- the reflected light on the surface of the first resin layer 21 can be extracted to the substrate 1 side without being reflected, and the traveling direction of the light traveling toward the substrate 1 side is converted to light of an angle not totally reflected by the substrate 1 Because it is possible.
- the second concavo-convex structure 2B having a small size is formed on the surface of the first concavo-convex structure 2A having a large size, the light whose traveling direction is changed by the scattering by the first concavo-convex structure 2A is The uneven structure 2B can be efficiently taken out. Even if the traveling direction of light becomes an angle that does not penetrate into the first resin layer 21 or the substrate 1 due to light scattering, the evanescent is disturbed by the fine concavo-convex structure to be light toward the substrate 1 side. Because it is possible. For this reason, compared with the case where it has only the 1st uneven structure 2A, and the case where it has only the 2nd uneven structure 2B, light extraction property can be improved effectively.
- the unevenness is random. It may be said that the convex portions 13 and the concave portions 14 constituting the second concavo-convex structure 2B are randomly arranged. In the second concavo-convex structure 2B, the arrangement of the convex portion 13 and the concave portion 14 does not have periodicity. The randomness of the asperities enhances the effect of disturbing the evanescent. In addition, when the unevenness has periodicity, there is a possibility that light of a specific wavelength or direction is excessively extracted or not extracted. Therefore, it is preferable that the second concavo-convex structure 2B be randomly formed with concavities and convexities. The randomness of the second relief structure 2B may be completely random.
- the second concavo-convex structure 2B is disposed on the surface of the convex portion 11 of the first concavo-convex structure 2A.
- the second uneven structure 2B is disposed on the surface of the recess 12 of the first uneven structure 2A.
- the second concavo-convex structure 2B may be disposed in one of the convex portion 11 and the concave portion 12 of the first concavo-convex structure 2A, but is preferably disposed in both. Thereby, the effect of disturbing the evanescent can be further enhanced.
- the second uneven structure 2 ⁇ / b> B may be disposed on the side surface 11 s of the convex portion 11.
- the first uneven structure 2A preferably has an edge 2E at the boundary of the unevenness.
- the boundary of the unevenness is a boundary between the convex portion 11 and the concave portion 12.
- the edge may be a bent portion of the surface.
- the scattering property is enhanced. Therefore, light can be extracted more to the substrate 1 side.
- an imbalance occurs in the circumferential integral of the electric field vector at the edge 2E. This imbalance also occurs with light exceeding the critical angle, so that it is possible to transmit a part of the energy of the totally reflected light from the second resin layer 22 to the first resin layer 21.
- the concavo-convex interface 20 has the second concavo-convex structure 2B as a fine concavo-convex structure, the evanescent generated at the edge 2E can be disturbed, and energy to be totally reflected can be reduced. Therefore, the light can be made to enter the first resin layer 21 without reflecting the light that can be the reflected light, and the light can be advanced to the substrate 1 side. Further, in the edge 2E, more evanescent tends to occur, so that the second uneven structure 2B can extract more components (evanescent components) generated by the evanescent. Therefore, the light extraction property can be further enhanced.
- the convex part 11 in the 1st uneven structure 2A is plateau shape. It may be said that the recess 12 has a basin shape.
- the side surface 11s of the convex portion 11 is parallel to the thickness direction. It may be said that the side surface of the recess 12 is parallel to the thickness direction. Alternatively, it may be said that the boundary between the convex portion 11 and the concave portion 12 is parallel to the thickness direction.
- the edge 2E is formed on the top of the side surface 11s.
- the edge 2E is formed below the side surface 11s.
- the first uneven structure 2A is a step-shaped unevenness. Therefore, the edge 2E is formed at the boundary of the unevenness.
- the edge 2E of the first uneven structure 2A may be an angular portion. However, although the tip of the edge 2E may be pointed, the tip of the edge 2E may not be pointed, and the corner may be rounded.
- the edge 2E may be a portion where the interface bends at an angle of, for example, 120 degrees or less. Edge 2E may be configured as a bend.
- the second concavo-convex structure 2B preferably has a ten-point average roughness Rz of more than 100 nm and less than 200 nm. Thereby, the effect of disturbing the evanescent and extracting the light to the substrate 1 side can be further enhanced.
- the ten-point average roughness Rz is in the above range, light having a wavelength in the visible light range is generally less susceptible to scattering. Therefore, it is difficult to obtain improvement in light extraction by scattering.
- the ten-point average roughness Rz of the second concavo-convex structure 2B falls within the above range, the evanescent tends to be disturbed by the concavities and convexities smaller than the wavelength of the visible light region. Therefore, by providing a plurality of unevenness with different sizes, it is possible to extract more light.
- the ten-point average roughness Rz may be the unevenness height 2h of the second uneven structure 2B.
- the first resin layer 21 and the second resin layer 22 contains particles.
- the fine irregularities can be formed by the particles, and the second uneven structure 2B can be more easily formed.
- the particles may be particles for forming fine asperities.
- the particles preferably have an average particle size smaller than the height 2H of the first concavo-convex structure 2A. More preferably, the particles have an average particle size equal to or less than half the height 2H of the first concavo-convex structure 2A.
- the size of the unevenness of the second uneven structure 2B is preferably larger than the particle size of the particles.
- the second uneven structure 2B can be formed by particles smaller than the unevenness of the second uneven structure 2B, the fine uneven structure can be efficiently formed. If the particles are too large, the shape of the overall asperities or the shape of the asperities may be adversely affected.
- the particle diameter of the particles for forming the asperities is smaller than the asperities of the second asperity structure 2B, the asperities can be formed without adversely affecting both the overall asperity shape and the fine asperity shape. It becomes possible to form. Therefore, the light extraction property can be effectively enhanced.
- the first resin layer 21 contains particles.
- the first resin layer 21 contains particles, fine particles can be easily formed by the particles.
- the particles contained in the first resin layer 21 may have a function for adjusting the refractive index. As a result, it becomes easy to form the first resin layer 21 whose refractive index is adjusted, and the light extraction property can be further enhanced.
- particles may be contained in both of the first resin layer 21 and the second resin layer 22.
- particles for forming fine asperities in the first resin layer 21 can be included, and particles for adjusting the refractive index can be included in the second resin layer 22.
- the second resin layer 22 may contain particles for forming fine asperities.
- the second resin layer 22 may contain particles for forming fine asperities.
- Fine unevenness can be formed by the particles in the second resin layer 22 in and the like.
- the first resin layer 21 include particles for forming fine irregularities in terms of easiness of production.
- the resin layer containing particles of the first resin layer 21 and the second resin layer 22 preferably has a particle content of 20% by volume or more and 60% by volume or less.
- the particles contained at this volume ratio may be particles for forming fine asperities. By containing the particles in the resin layer at this volume ratio, fine irregularities can be easily formed.
- the content of particles in the first resin layer 21 is preferably 20% by volume or more and 60% by volume or less. In the resin layer, the content of particles is more preferably 30% by volume or more and 50% by volume or less.
- the particles contained in the resin layer are preferably substantially spherical hollow particles. Thereby, the adjustment of the refractive index and the formation of the unevenness can be efficiently performed.
- the hollow particles are preferably used particularly in a resin layer to be a low refractive index layer.
- the hollow can make it easy to lower the refractive index. For example, when making the first resin layer 21 a low refractive index layer, when hollow particles are used, the refractive index of the first resin layer 21 is lowered while forming fine irregularities on the surface of the first resin layer 21. be able to.
- Hollow particles may be particles having pores.
- the hollow particles may be hollow beads.
- the hollow particles may have a shape other than a spherical shape, but it is more preferable that the hollow particles have a substantially spherical shape.
- shapes other than the spherical shape include a rugby ball shape, an ellipsoidal shape, and an irregular rock shape.
- the hollow particles are approximately spherical, it is easier to form asperities larger than the size of the particles. The reason is presumed to be particle aggregation. Therefore, when approximately spherical particles are used, it is possible to efficiently form a fine uneven structure with high light extraction.
- Hollow silica particles can be suitably used as particles that are substantially spherical hollow beads.
- the particles contained in the resin layer preferably have an average particle size of less than 100 nm. Thereby, the fine uneven structure can be formed efficiently.
- the particle size of the particles can be measured, for example, by a laser diffraction particle size distribution analyzer.
- the lower limit of the average particle diameter of the particles is not particularly limited.
- the average particle diameter of the particles may be larger than 1 nm.
- the particles with a particle size of 1 to 100 nm may be nanoparticles. With nanoparticles, it is easy to form the fine second uneven structure 2B. Nanoparticles may be referred to as nanoparticulates.
- the resin material in which the nanoparticles are dispersed is suitably used for the formation of a resin layer containing particles. As the particles, nanoparticles composed of hollow silica are preferable.
- the 1st uneven structure 2A has a structure where the convex part 11 or the recessed part 12 is allocated and arrange
- FIG. 2 is an explanatory view for explaining an example of the first uneven structure 2A.
- FIG. 2 is composed of FIG. 2A and FIG. 2B.
- FIG. 2 schematically shows the assignment of the convex portion 11 and the concave portion 12 in the first concavo-convex structure 2A.
- the second uneven structure 2B is omitted.
- the first concavo-convex structure 2A has a structure in which a plurality of convex portions 11 or concave portions 12 are arranged in a plane.
- the surface on which the plurality of protrusions 11 or the recesses 12 are disposed may be a surface parallel to the surface of the substrate 1.
- the first concavo-convex structure 2A may have a structure in which the plurality of convex portions 11 and the concave portions 12 are arranged in a plane.
- the plurality of convex portions 11 or concave portions 12 are arranged such that the convex portions 11 or concave portions 12 for one section are allocated to the grid-like sections. Is preferred. As a result, asperities are formed by the convex portions 11 and the concave portions 12 having the same size, light can be efficiently scattered over the entire surface.
- the plurality of convex portions 11 or concave portions 12 are preferably arranged such that the convex portions 11 or concave portions 12 for one section are randomly allocated to the grid-like sections. The random assignment allows the light scattering effect to be enhanced independently of the angle dependency, and more light can be extracted to the outside.
- a grid-like section is one in which one section is a square. More preferably, the square is a square. In this case, it becomes a matrix grid (square grid) in which a plurality of quadrilaterals are spread in all directions.
- Another example of grid-like compartments is one in which one compartment is hexagonal (see FIG. 3B).
- the hexagon is more preferably a regular hexagon. In this case, it becomes a honeycomb lattice (hexagonal lattice) in which a plurality of hexagons are laid out in a filling structure.
- the lattice may be a triangular lattice in which triangles are spread, but the square lattice or the hexagonal lattice facilitates control of the unevenness.
- the first concavo-convex structure 2A in FIG. 2 is formed by allocating a plurality of convex portions 11 having substantially the same height to each section (lattice-like section) of the concavo-convex in the matrix shape and arranging them in a plane. It is a thing. And 1st uneven structure 2A is formed so that the area ratio of the convex part 11 in the unit area
- FIG. 2A shows a state as viewed from a direction perpendicular to the surface of the substrate 1 and FIG. 2B shows a state as viewed from a direction parallel to the surface of the substrate 1.
- FIG. 2A sections in which the convex portions 11 are provided are indicated by oblique lines.
- Lines L1, L2 and L3 in FIG. 2A correspond to lines L1, L2 and L3 in FIG. 2B, respectively.
- the width of one section of the asperity is indicated by the width w.
- the first concavo-convex structure 2A is formed by arranging the convex portions 11 in a matrix-like concavo-convex section in which a plurality of squares are vertically and horizontally arranged in a grid (matrix type). It is done. Each uneven area is equally formed in area.
- One of the convex portion 11 and the concave portion 12 is assigned to one section (one uneven section) of the uneven portion.
- the assignment of the projections 11 may be regular or irregular.
- FIG. 2 the form to which the convex part 11 is allocated at random is shown. As shown in FIG.
- the convex portion 11 is formed by the material constituting the first concavo-convex structure 2A protruding to the first electrode 3 side. Further, the plurality of convex portions 11 are provided with substantially the same height.
- the heights of the convex portions 11 are substantially equal means, for example, the convex portions within ⁇ 10% of the average height, or preferably within ⁇ 5%, when the heights of the convex portions 11 are averaged. 11 heights may fit and be aligned.
- the cross-sectional shape of the convex part 11 is a rectangular shape in FIG. 2B, it may be an appropriate shape such as a pleated shape, an inverted triangular shape, or a trapezoidal shape. As mentioned above, it is preferable that the convex part 11 protrudes in step shape.
- the convex portion 11 preferably has an edge.
- the recess 12 preferably has an edge. In a portion where one convex portion 11 and another convex portion 11 are adjacent to each other, the convex portions 11 are connected to form a large convex portion 11. Further, in the portion where one concave portion 12 and the other concave portion 12 are adjacent to each other, the concave portion 12 is connected to form a large concave portion 12.
- the number of connected convex portions 11 and the number of concave portions 12 is not particularly limited, but the scattering property of the first concavo-convex structure 2A may decrease if the number of connected portions increases.
- the number may be appropriately set to 10 or less.
- a design rule may be provided to invert the next region (convex in the case of concave, concave in the case of convex) in the case where three or more or two or more of the recesses 12 or the projections 11 continue. By this rule, it is expected that the light scattering effect is enhanced and the light extraction performance is further enhanced.
- the area ratio of the convex portion 11 in the unit area is formed to be substantially the same in each area.
- a total of 100 uneven sections of 10 in length and 10 in width are illustrated, and such an area of 100 sections can be used as a unit area.
- the area ratio at which the convex portion 11 is formed is substantially equal for each unit region. That is, as shown in FIG. 2A, if 50 convex portions 11 are provided in the unit area, about 50 (about 45, for example) are formed in other areas having the same number of uneven sections and the same area. There may be provided up to 55 or 48 to 52 convex portions 11.
- the unit area is not limited to 100 divisions, and can be sized as appropriate for the number of divisions.
- the number of sections may be 1000, 10000, 100000, or more.
- the area ratio of the convex portion 11 may be slightly different depending on how the region is taken, in this example, the area ratio is made to be substantially the same.
- the upper and lower limits of the area ratio are preferably 10% or less of the average, more preferably 5% or less, still more preferably 3% or less, and still more preferably 1% or less. More preferable. By equalizing the area ratio, it is possible to improve the light extraction more uniformly in the plane.
- the area ratio of the projections 11 in the unit area is not particularly limited, but is, for example, in the range of 20 to 80%, preferably in the range of 30 to 70%, and more preferably 40 to 60%. It can be set within the range.
- the convex portions 11 and the concave portions 12 are one form that is preferably randomly allocated and disposed in the unit area. As a result, more light can be extracted without angular dependence. For example, in a white organic EL element, it is possible to obtain more white with less change in color depending on the angle.
- the size of the concavities and convexities in plan view is preferably about the same as the size of the height of the concavities and convexities. Thereby, light extraction can be further enhanced.
- the size of the unevenness in plan view may be the width w of the convex portion 11 and the concave portion 12.
- the height of the convex portion 11 is preferably in the range of 0.4 to 10 ⁇ m as described above. Therefore, for example, by setting one section of the unevenness to be in the range of a square having a side of 0.1 to 100 ⁇ m, it is possible to form the first unevenness structure 2A having high scattering property. It can be said that the length of this side is the width w.
- the length of the section is shown as width w. Further, it is more preferable that one side (width w) of a square forming one section of the unevenness be 0.4 to 10 ⁇ m. As a result, the height and width of the asperities in the first concavo-convex structure 2A become close to each other, and thus the scattering property can be further increased. For example, when one side of one section of the unevenness is 1 ⁇ m, the first uneven structure 2A can be formed with high accuracy. Also, the unit area can be a square area of 1 mm long ⁇ 1 mm wide, or a square area of 10 mm long ⁇ 10 mm wide.
- the size of one section can be defined as the distance between two opposing sides of the hexagon.
- the length of the section is shown as width w.
- the asperities of the first asperity structure 2A are arranged in a hexagonal lattice.
- the length (width w) of one section of the unevenness formed by the hexagonal lattice is preferably 0.1 to 100 ⁇ m, and more preferably 0.4 to 10 ⁇ m.
- the first resin layer 21 may be divided in the recess 12 in the first uneven structure 2A.
- the first resin layer 21 may be a layer in which a large number of convex portions 11 are dispersed in an island shape over the entire surface.
- the second resin layer 22 may be in direct contact with the substrate 1 in the portion of the recess 12.
- the plurality of convex portions 11 constituting the first concavo-convex structure 2A may have the same shape.
- the convex part 11 is provided in the whole of one uneven
- the planar shape of the convex portion 11 may be another shape. For example, it may be circular or polygonal (triangular, pentagonal, hexagonal, octagonal, etc.).
- the three-dimensional shape of the convex portion 11 may be an appropriate shape such as a cylindrical shape, a prismatic shape (triangular prism, a quadrangular prism, etc.) or a pyramid shape (triangular pyramid, a quadrangular pyramid, etc). As shown to FIG. 2B, it is more advantageous that the convex part 11 and the recessed part 12 have the edge 2E.
- the first uneven structure 2A may be formed as a diffractive optical structure.
- the convex portions 11 can be provided with a certain regularity so as to be a diffractive optical structure.
- the diffractive optical structure it is more preferable that the convex portions 11 be formed with periodicity.
- the period P of the two-dimensional unevenness is defined by dividing the wavelength in the medium by ⁇ (the wavelength in vacuum by the refractive index of the medium). It is preferable to appropriately set the value of ⁇ ) within a range of 1 ⁇ 4 to 100 times the wavelength ⁇ . This range may be set when the wavelength of light emitted from the light emitting layer is in the range of 300 to 800 nm.
- the geometrical optical effect that is, by increasing the area of the surface where the incident angle is less than the total reflection angle, the light extraction efficiency is improved or the light having the total reflection angle or more by the diffracted light is extracted. Light extraction efficiency can be improved.
- the effective refractive index in the vicinity of the concavo-convex structure gradually decreases as the distance from the surface of the substrate increases. Therefore, the refractive index of the medium of the layer forming the concavo-convex structure between the substrate and the concavo-convex covering layer (the second resin layer 22) or the electrode (first electrode 3), and the refraction of the covering layer or the electrode It is equivalent to interposing a thin film layer having a refractive index intermediate to that of the index. This makes it possible to reduce Fresnel reflection.
- the period P in the range of ⁇ / 4 to 100 ⁇ , reflection (total reflection or Fresnel reflection) can be suppressed, and light extraction efficiency can be improved.
- the period P is smaller than ⁇ , only the Fresnel loss suppression effect can be exhibited and the light extraction effect may be reduced.
- it exceeds 20 ⁇ it is required to increase the height of the unevenness correspondingly (to obtain a phase difference), and there is a possibility that the flattening of the covering layer (second resin layer 22) is not easy.
- the method to make the coating thick is disadvantageous because it has many negative effects such as a decrease in transmittance and material cost, and an increase in outgassing in the case of resin material. There is also. Therefore, it is preferable to set the period P to, for example, ⁇ to 20 ⁇ .
- the first uneven structure 2A may be a boundary diffraction structure.
- the boundary diffraction structure a structure in which the convex portions 11 are randomly arranged is exemplified.
- the boundary diffraction structure it is possible to use a structure in which a diffraction structure partially formed in a minute region in a plane is disposed on one side.
- the structure may be a structure in which a plurality of independent diffraction structures are formed in the plane.
- the boundary diffractive structure due to the fine diffractive structure, it is possible to take out light utilizing diffraction, and to suppress the intensification of the diffractive action of the entire surface to reduce the angular dependence of the light. Therefore, the light extraction effect can be enhanced while suppressing the angular dependence.
- the convex portions 11 and the concave portions 12 are completely randomly disposed, if the convex portions 11 or the concave portions 12 are too continuous, there is a possibility that the light extraction property can not be sufficiently improved. Therefore, it is preferable to provide a rule that the same block (one of the convex portion 11 and the concave portion 12) is not continuously arranged in a predetermined number or more. That is, the convex portions 11 are arranged so as not to be continuously arranged in the same direction in the grid direction in the same direction, and the concave portions 12 are not continuously arranged in the same direction in the same direction in the same direction. It is preferable that it is arrange
- the angular dependence of the luminescent color can be reduced. Ten or less are preferable, as for the predetermined number which the convex part 11 and the recessed part 12 do not line up continuously, eight or less are more preferable, five or less are more preferable, and four or less are still more preferable.
- Such an arrangement can be called a random control structure because randomness is controlled while assuming randomness.
- Boundary diffractive structures may be formed by random control.
- FIG. 3 is composed of FIG. 3A and FIG. 3B.
- FIG. 3A is an example in which the section of the unevenness is a square.
- FIG. 3B is an example in which the uneven sections are hexagonal.
- the same blocks protrusions 11 and recesses 12
- the same blocks do not line up in the same direction while the arrangement of the protrusions 11 and the recesses 12 has randomness. It is controlled.
- three or more blocks are not aligned in the same direction.
- FIG. 3B four or more blocks are not aligned in the same direction.
- the average of the number of arranged blocks can be represented by an average pitch.
- the block is the convex portion 11 or the concave portion 12 assigned to one section.
- the average pitch can be expressed using the width w of one block.
- the first concavo-convex structure 2A in FIG. 3A has a square lattice structure and an average pitch of 3 w.
- the first concavo-convex structure 2A in FIG. 3B has a hexagonal grid structure and an average pitch of 3 w.
- the plurality of convex portions 11 or concave portions 12 preferably have an axis length of an inscribed ellipse or a diameter of an inscribed circle of 0.4 to 4 ⁇ m when viewed from a direction perpendicular to the surface of the substrate 1. Range.
- the concavo-convex structure shown in FIG. 3 can be said to be a boundary diffraction structure.
- the resin portion 2 is formed on the substrate 1. At this time, the first resin layer 21 and the second resin layer 22 may be laminated in order.
- the first resin layer 21 and the second resin layer 22 can be provided on the surface of the substrate 1 by applying the materials.
- An appropriate coating method can be adopted as the method of applying the material, and spin coating may be used, or methods such as screen printing, slit coating, bar coating, spray coating, ink jet, etc. for applications and substrate sizes, etc. It can be adopted accordingly.
- a solid resin layer can be formed.
- an ultraviolet curable resin the resin can be cured by irradiation of ultraviolet light.
- a thermosetting resin the resin can be cured by heating.
- the uneven interface 20 of the resin part 2 can be formed by an appropriate method.
- the first concavo-convex structure 2A is preferably formed with concavities and convexities by an imprint method. According to the imprint method, it is possible to efficiently and accurately form the concavities and convexities of the size of the first concavo-convex structure 2A. Further, in the case of forming the asperities by assigning the convex portions 11 or the concave portions 12 to each of the asperity sections as described above, it is possible to form asperities with high accuracy by using the imprint method. In the imprint method, the edge 2E of the first concavo-convex structure 2A can be easily formed.
- one uneven area may be constituted by one dot for printing.
- a plurality of dots may constitute one uneven section.
- the imprinting method is preferably one that can form asperities of the first concavo-convex structure 2A, and for example, a method called nanoimprinting can be used.
- the imprint method is roughly divided into a UV imprint method (also referred to as an ultraviolet imprint method) and a thermal imprint method, and either of them may be used.
- a UV imprint method can be preferably used.
- the unevenness can be printed (transferred) easily by the UV imprint method to form the unevenness of the first uneven structure 2A.
- a mold for transfer is used.
- a film mold molded from a Ni master mold in which a rectangular (pillar) structure having a period of 2 ⁇ m and a height of 1 ⁇ m is patterned is used.
- a UV curable transparent resin for imprint material of the first resin layer 21
- a UV curable transparent resin for imprint material of the first resin layer 21
- the mold is peeled off after curing of the resin.
- the mold is preferably subjected to release treatment (fluorine-based coating agent or the like) in advance, whereby the mold can be easily peeled off from the substrate. Thereby, the uneven shape of the mold can be transferred to the resin layer.
- the mold is provided with the concavities and convexities corresponding to the shape of the first concavo-convex structure 2A. Therefore, when the unevenness of the mold is transferred, the desired unevenness is formed on the surface of the resin layer. For example, by using a mold in which concave portions are randomly assigned to each section and formed, it is possible to obtain the unevenness to which the convex portions 11 are randomly assigned.
- the surface of the first resin layer 21 is an uneven surface.
- particles are preferably contained in the material of the first resin layer 21.
- the first concavo-convex structure 2A is formed on the first resin layer 21 by the concavo-convex shape of the mold, and at the same time, fine particles are contained by the particles contained in the first resin layer 21.
- the second uneven structure 2 B is formed on the surface of the first resin layer 21.
- the concavo-convex interface 20 having two types of concavo-convex structure can be formed efficiently.
- the preferred average particle diameter of the particles for forming the second concavo-convex structure 2B is 1 to 100 nm as described above.
- the second resin layer 22 is applied.
- the application of the second resin layer 22 places the uneven surface inside the resin portion 2.
- the surface of the second resin layer 22 is preferably flat. In the application of the second resin layer 22, since the uneven surface can be covered, the surface of the resin portion 2 can be easily flattened.
- grains contain in the 2nd resin layer 22.
- the second uneven structure 2B can be formed by pressing the material of the second resin layer 22 containing particles before the first resin layer 21 is completely cured.
- the second concavo-convex structure 2B with the fine concavities and convexities corresponding to the second concavo-convex structure 2B on the mold surface of imprint, and transfer and form the shape of the fine concavities and convexities.
- the first uneven structure 2A and the second uneven structure 2B are formed by imprint, there is a possibility that the control of the unevenness becomes difficult.
- the second uneven structure 2B be formed of particles.
- the first electrode 3, the organic light emitting layer 4 and the second electrode 5 are stacked on the resin portion 2.
- the lamination is performed by appropriately selecting a method selected from coating, vapor deposition, sputtering and the like.
- the organic light emitting body 10 is formed by laminating the first electrode 3, the organic light emitting layer 4 and the second electrode 5.
- the organic light emitter 10 is preferably sealed off from the external air. Sealing may be performed by bonding a sealing plate to the substrate 1.
- the resin portion 2 can be preferably formed as follows. First, the material of the first resin layer 21 is coated on the substrate 1 with a resin containing particles, and then an unevenness is formed by imprinting. At this time, the first resin layer 21 may be uncured or semi-cured, or may be in a shape transferable by imprint. Thereby, the first uneven structure 2A is formed by the unevenness of the imprint. In addition, the second uneven structure 2B is formed due to the particles. In the case of uncured or semi-cured, preferably, the first resin layer 21 solidified by curing the resin is formed. You may make it harden
- the material of the second resin layer 22 is applied on the uneven surface of the first resin layer 21 and cured.
- the second resin layer 22 solidified by curing the resin is obtained.
- the curing of the first resin layer 21 and the curing of the second resin layer 22 may be performed simultaneously.
- the resin portion 2 having the uneven interface 20 is obtained.
- FIG. 4 The analysis figure (photograph) of uneven structure is shown in FIG. FIG. 4 is composed of FIGS. 4A and 4B. The effect of providing the uneven interface 20 in the resin portion 2 will be described with reference to FIG.
- FIG. 4A is a view showing an aspect in which a resin layer containing particles is formed, and the uneven structure on the surface of the resin layer is analyzed.
- FIG. 4: B is a figure which shows a mode that the resin layer was formed without containing particle
- the material of the resin layer was applied onto the substrate, and the uneven surface was formed by the UV nanoimprinting method. The analysis was performed by an electron microscope.
- the boundary 11B between the convex portion 11 and the concave portion 12 in the first concavo-convex structure 2A is confirmed as a dark color. Therefore, the first concavo-convex structure 2A is considered to have an edge.
- the first uneven structure 2A is formed in a hexagonal lattice shape. One section of the unevenness is a hexagon.
- a shadow is observed in the area of the convex portion 11 and the concave portion 12. Shadows are represented by shades of color.
- FIG. 4B such a shadow is not often seen. This shadow is due to the unevenness of the second uneven structure 2B.
- the concavo-convex pattern of the first concavo-convex structure 2A is the concavo-convex pattern of the hexagonal lattice shown in FIG. 3B.
- the first concavo-convex structure 2A has randomness, and a random control structure (boundary diffraction structure) arranged so that the number of blocks of the convex portion 11 and the concave portion 12 is not continuous four or more. It is understood that it has.
- the ten-point average roughness Rz of the measurement area S is measured.
- the ten-point average roughness Rz of the second concavo-convex structure 2B is determined by this method.
- the concentration of particles and the average particle diameter were changed to form a resin layer in which the ten-point average roughness Rz of the second uneven structure 2B was changed. Furthermore, another resin layer (second resin layer 22) was formed on the resin layer (first resin layer 21) to form the resin portion 2. And the organic EL element was produced using this resin part 2, and the relationship between the ten-point average roughness Rz of 2nd uneven structure 2B and the total luminous transmittance was investigated.
- the total luminous transmittance is defined as the sum of the amount of transmitted light to the total of the amount of irradiated light when light is irradiated from any angle with respect to an interface.
- FIG. 5 is a graph showing the relationship between the ten-point average roughness (Rz) of the second concavo-convex structure 2B and the total luminous transmittance. Light is visible light. As can be seen from the graph of FIG. 5, when the ten-point average roughness Rz is 100 nm or more, the total luminous transmittance becomes high. That is, when the ten-point average roughness Rz of the second concavo-convex structure 2B is 100 nm or more, in addition to the light scattering effect of the first concavo-convex structure 2A, the effect of taking out the evanescent component is easily obtained. Can be made easier.
- the ten-point average roughness Rz of the second concavo-convex structure 2B is preferably 130 nm or more, more preferably 140 nm or more, and still more preferably 150 nm or more.
- the total luminous transmittance is increased.
- the ten-point average roughness Rz is larger than 200 nm, the sizes of the concavities and convexities of the first concavo-convex structure 2A and the second concavo-convex structure 2B become close, which may make it difficult to obtain the desired light extraction effect. Therefore, the ten-point average roughness Rz is preferably smaller than 200 nm.
- FIG. 6 is a graph showing the relationship between the ten-point average roughness (Rz) of the second concavo-convex structure 2B and the total luminous transmittance measured in the same manner as the method of FIG.
- FIG. 6 shows the relationship between the ten-point average roughness (Rz) and the total luminous flux transmittance for light of wavelength 450 nm, light of wavelength 550 nm, and light of wavelength 650 nm.
- the light of wavelength 450 nm may be blue light.
- the light of wavelength 550 nm may be green light.
- the light of wavelength 650 nm may be red light.
- Various colors can be created by mixing three colors of blue, green and red. In particular, white can be obtained.
- the unevenness of the second uneven structure 2B can be made random or periodic depending on the arrangement of the particles or the shape of the fine unevenness of the mold.
- the presence or absence of the periodicity of the second concavo-convex structure 2B is almost the same for light of wavelength 550 nm and light of wavelength 650 nm. unrelated.
- the total luminous transmittance is higher in the random case than in the case of having the periodicity. Therefore, in the second uneven structure 2B, it is advantageous that the unevenness is random.
- blue light is likely to affect the luminance, and when a large amount of blue light is extracted, it can be felt that more light emission is obtained. Therefore, in addition to the ability to improve the light extraction performance, it is possible to increase the perceived luminance by randomizing the unevenness of the second uneven structure 2B.
- FIG. 7 is an example of the illuminating device 100 provided with the organic electroluminescent element (organic EL element 101).
- the organic EL element 101 has a substrate 1, a resin portion 2, a first electrode 3, an organic light emitting layer 4, a second electrode 5 and a sealing plate 6.
- the resin portion 2 has a first resin layer 21 and a second resin layer 22.
- a housing space 7 for housing the organic light emitting body 10 is provided between the substrate 1 and the sealing plate 6.
- the housing space 7 may be hollow or may be filled with a filler.
- the outgoing direction of light is indicated by an open arrow.
- the lighting device 100 includes an organic EL element 101 and an electrode pad 8 formed outside the organic EL element 101 in a sealed state.
- the electrode pad 8 and the electrode of the organic EL element 101 are electrically connected by an appropriate wiring structure.
- Wiring 41 is connected to the electrode pad 8.
- the lighting device 100 may include the wiring 41.
- the lighting device may include a plug in which the wires 41 are integrated.
- the wiring 41 can be connected to the external power supply 40 through an external wiring. By being connected to the external power supply 40, electricity flows between the electrodes, and the organic light emitter 10 emits light. Thus, light can be emitted from the lighting device 100.
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- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (10)
- 光透過性を有する基板と、
第1電極、有機発光層及び第2電極を有する有機発光体と、
前記基板と前記有機発光体との間にあり、第1樹脂層と第2樹脂層とを有する樹脂部と、
を備え、
前記樹脂部は、前記第1樹脂層と前記第2樹脂層との間に、凹凸界面を有し、
前記凹凸界面は、第1の凹凸構造と、前記第1の凹凸構造よりも凹凸が小さい第2の凹凸構造とを有し、
前記第2の凹凸構造は、凹凸がランダムである、
有機エレクトロルミネッセンス素子。 - 前記第1の凹凸構造は、凹凸の境界にエッジを有する、
請求項1に記載の有機エレクトロルミネッセンス素子。 - 前記第2の凹凸構造は、十点平均粗さRzが100nmより大きく200nmより小さい、
請求項1又は2に記載の有機エレクトロルミネッセンス素子。 - 前記第1樹脂層及び前記第2樹脂層の少なくとも一方は粒子を含み、
前記第2の凹凸構造の凹凸の大きさは、前記粒子の粒径よりも大きい、
請求項1~3のいずれか1項に記載の有機エレクトロルミネッセンス素子。 - 前記第1樹脂層及び前記第2樹脂層のうちの前記粒子を含む樹脂層は、前記粒子の含有率が20体積%以上60体積%以下である、
請求項4に記載の有機エレクトロルミネッセンス素子。 - 前記粒子は、略球形状の中空粒子である、
請求項4又は5に記載の有機エレクトロルミネッセンス素子。 - 前記粒子は平均粒径が100nmより小さい、
請求項4~6のいずれか1項に記載の有機エレクトロルミネッセンス素子。 - 前記第1の凹凸構造は、凸部又は凹部が区画ごとに割り当てられて配置された構造を有する、
請求項1~7のいずれか1項に記載の有機エレクトロルミネッセンス素子。 - 前記凸部又は前記凹部の割り当てはランダムである、
請求項8に記載の有機エレクトロルミネッセンス素子。 - 請求項1~9のいずれか1項に記載の有機エレクトロルミネッセンス素子と、配線とを備えた照明装置。
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KR1020167012743A KR20160070831A (ko) | 2014-02-10 | 2015-01-08 | 유기 전계 발광 소자 및 조명 장치 |
JP2015561192A JP6315389B2 (ja) | 2014-02-10 | 2015-01-08 | 有機エレクトロルミネッセンス素子及び照明装置 |
US15/115,093 US20170012244A1 (en) | 2014-02-10 | 2015-01-08 | Organic electroluminescent element and illumination device |
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US (1) | US20170012244A1 (ja) |
JP (1) | JP6315389B2 (ja) |
KR (1) | KR20160070831A (ja) |
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KR102360089B1 (ko) | 2014-08-05 | 2022-02-09 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 그 제조방법 |
CN104966789A (zh) * | 2015-06-30 | 2015-10-07 | 深圳市华星光电技术有限公司 | 一种电荷连接层及其制造方法、叠层oled器件 |
KR102640404B1 (ko) * | 2018-10-18 | 2024-02-26 | 삼성디스플레이 주식회사 | 표시장치 및 그 표시장치의 제조방법 |
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KR20160070831A (ko) | 2016-06-20 |
TW201543952A (zh) | 2015-11-16 |
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