WO2015081732A1 - 彩膜基板及其制作方法、显示装置 - Google Patents

彩膜基板及其制作方法、显示装置 Download PDF

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Publication number
WO2015081732A1
WO2015081732A1 PCT/CN2014/084910 CN2014084910W WO2015081732A1 WO 2015081732 A1 WO2015081732 A1 WO 2015081732A1 CN 2014084910 W CN2014084910 W CN 2014084910W WO 2015081732 A1 WO2015081732 A1 WO 2015081732A1
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WO
WIPO (PCT)
Prior art keywords
spacer
black matrix
matrix pattern
area
color filter
Prior art date
Application number
PCT/CN2014/084910
Other languages
English (en)
French (fr)
Inventor
查长军
黎敏
姜晶晶
吴洪江
Original Assignee
京东方科技集团股份有限公司
北京京东方显示技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
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Application filed by 京东方科技集团股份有限公司, 北京京东方显示技术有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US14/436,388 priority Critical patent/US10295713B2/en
Publication of WO2015081732A1 publication Critical patent/WO2015081732A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes

Definitions

  • Color film substrate manufacturing method thereof, and display device
  • At least one embodiment of the present invention is directed to a color filter substrate, a method of fabricating the same, and a display device. Background technique
  • a liquid crystal display may include an array substrate, a color filter substrate, and a liquid crystal layer disposed therebetween.
  • the color filter substrate is an optical filter structure for displaying color in an LCD.
  • the spacer is located on the color filter substrate to determine a cell gap between the color filter substrate and the array substrate to maintain an optimum liquid crystal layer thickness. In order to obtain a liquid crystal panel with high contrast, wide viewing angle, and fast response, it is possible to select a spacer that is close in size and evenly distributed.
  • the spacers can be divided into spherical spacers, rod spacers, column spacers and the like according to the shape.
  • the column spacer has the advantages of easy size control, high contrast, good hooking property, high durability, and the LCD using the column spacer is less prone to tailing than the LCD using the ball spacer or the rod spacer. effect.
  • column spacers are widely used.
  • the column spacers can be further divided into primary column spacers and secondary column spacers with a suitable height difference therebetween.
  • column spacers are mainly produced by using a common mask and using a semipermeable membrane mask. Summary of the invention
  • At least one embodiment of the present invention provides a color filter substrate and a manufacturing method thereof, so as to reduce the manufacturing cost of the color filter substrate, and at the same time, it is easy to form a main spacer and a secondary spacer having a height difference and a close size on the color filter substrate.
  • the mat, and the two spacers have a more uniform shape, which can better support the display and improve the display quality.
  • At least one embodiment of the present invention provides a method of fabricating a color filter substrate, comprising: fabricating a black matrix pattern and a color photoresist pattern on a substrate; and forming a flat on the color photoresist pattern and the black matrix pattern a layer; and forming a spacer on the flat layer.
  • the black matrix pattern includes a main area and a sub-area, a width of the main area along a column direction of the black matrix pattern is larger than a width of the auxiliary area along a column direction of the black matrix pattern;
  • the spacer includes Primary septum and secondary a spacer; the primary spacer is located on a main area of the black matrix pattern, and the secondary spacer is located on a secondary area of the black matrix pattern, the height of the main spacer being greater than The height of the secondary spacer.
  • At least one embodiment of the present invention also provides a color filter substrate, the color film substrate comprising: a black matrix pattern including a main area and a sub-area, the main area along a column direction of the black matrix pattern a width greater than a width of the auxiliary region along a column direction of the black matrix pattern; a color photoresist pattern; a flat layer on the black matrix pattern and the color photoresist pattern; and a main spacer and a secondary spacer A mat formed on the flat layer.
  • the primary spacer is located on a main area of the black matrix pattern
  • the secondary spacer is located on a secondary area of the black matrix pattern, the height of the main spacer being greater than the secondary spacer The height of the object.
  • At least one embodiment of the present invention also provides a display device comprising the above-described color filter substrate.
  • FIG. 1 is a flow chart of a method for fabricating a color filter substrate according to an embodiment of the present invention
  • FIG. 2 is a schematic plan view of a first color film substrate according to an embodiment of the present invention.
  • FIG. 3 is a schematic plan view of a second color filter substrate according to an embodiment of the present invention.
  • FIG. 4 is a schematic plan view of a third color filter substrate according to an embodiment of the present invention.
  • FIG. 5 is a detailed flow chart of a method for fabricating the color filter substrate shown in FIG. 1 according to an embodiment of the present invention
  • FIG. 6 is a cross-sectional view of the color filter substrate shown in FIG. 3 taken along line A-A' of the embodiment of the present invention
  • 7 is a cross-sectional view of the color filter substrate shown in FIG. 3 in the direction of BB' in the embodiment of the present invention
  • FIG. 8 is a schematic view showing an exposure process of forming a spacer in the embodiment of the present invention
  • Figure 9 is a view showing the relationship between the height of the spacer and the width of the black matrix pattern along the column direction of the black matrix pattern in the embodiment of the present invention.
  • FIG. 10 is a schematic structural diagram of a display device according to an embodiment of the present invention.
  • the inventors of the present application have noted that when a conventional mask is used to prepare a column spacer, the column spacers are designed to have different sizes, the size of the main column spacers is larger, and the size of the secondary column spacers is larger. Smaller.
  • the size of the exposure can be controlled by controlling the size of the opening of the mask, thereby realizing the height difference between the main column spacer and the secondary column spacer, but the height difference between the two is only in the main column spacer This can only be achieved if the dimensions of the material and the secondary column spacers differ greatly. Under such conditions, since the sizes of the primary spacer and the secondary spacer are largely different, the upper surface topography of the primary spacer and the secondary spacer are also greatly different.
  • the surface of the main spacer is flatter, and the secondary spacer has a rough surface and a rough surface due to its small size. This inhomogeneity of the topography has a direct adverse effect on the support effect of the spacer.
  • a semi-permeable membrane mask is used to prepare a columnar spacer, although the size of the primary columnar spacer and the secondary columnar spacer can be relatively close, the preparation cost is high.
  • a liquid crystal display includes an array substrate, a color filter substrate, and a liquid crystal layer therebetween.
  • the spacer is located on the color filter substrate to determine the cell gap between the color filter substrate and the array substrate.
  • At least one embodiment of the present invention provides a method of fabricating a color filter substrate. As shown in FIG. 1, the method includes the following steps.
  • Step S101 forming a black matrix pattern and a color photoresist on the substrate by, for example, a patterning process
  • the black matrix pattern includes a main area and a sub-area, the width of the main area along the column direction of the black matrix pattern being greater than the width of the sub-area along the column direction of the black matrix pattern.
  • Step S103 forming a spacer on the flat layer, the spacer comprising a primary spacer and a secondary spacer.
  • the primary spacer is on the main area of the black matrix pattern and the secondary spacer is on the secondary area of the black matrix pattern, the height of the primary spacer being greater than the height of the secondary spacer.
  • the black matrix pattern includes a main area and a secondary area.
  • any one line of the black matrix pattern includes a main area and/or a sub area.
  • this setup can be extended to the following scenarios.
  • At least one row of the black matrix pattern 2 includes only the main area 3, and the other lines of the black matrix pattern 2 include only the auxiliary area 4.
  • each row of the black matrix pattern 2 includes both the main area 3 and the auxiliary area 4.
  • At least one row of the black matrix pattern 2 includes only the main area 3, and the other lines of the black matrix pattern 2 include the main area 3 and the auxiliary area 4.
  • At least one row of black matrix patterns 2 includes only the auxiliary area 4, and the other lines of the black matrix pattern 2 include the main area 3 and the auxiliary area 4.
  • At least one line of the black matrix pattern 2 includes only the main area 3
  • at least one line of the black matrix pattern 2 includes only the auxiliary area 4
  • the other lines of the black matrix pattern 2 include the main area 3 and the auxiliary area 4.
  • any one row of the black matrix pattern 2 including the main area 3 and/or the auxiliary area 4 includes the above five cases, but is not limited to the above five cases.
  • the black matrix pattern 2 on the substrate may further include a plurality of black matrix patterns including neither the main area nor the auxiliary area on the basis of the black matrix pattern described in the first case.
  • the expansion may be performed on the basis of the case 1 to the case 5 according to the actual situation, and the embodiment of the present invention does not perform the enumeration here.
  • the larger circle corresponds to the primary column spacer and the smaller circle corresponds to the secondary column spacer;
  • the row direction of the black matrix corresponds to the horizontal direction (the direction of the arrow in the figure),
  • the column direction of the black matrix corresponds to a direction perpendicular to the horizontal direction.
  • the length of the main region 3 in the row direction of the black matrix pattern 2 may be greater than or equal to the width of the main spacer 7, and the length of the auxiliary region 4 in the row direction of the black matrix pattern 2 may be greater than or equal to the minor spacer.
  • the width of the object 8. For example, as shown in FIGS. 2 and 3, the length of the main region 3 in the row direction of the black matrix pattern 2 is larger than the width of the main spacer 7, and the length of the auxiliary region 4 in the row direction of the black matrix pattern 2 is larger than the secondary.
  • the width of the spacer 8; as shown in FIG. 4, the length 1' of the main region 3 in the row direction of the black matrix pattern 2 is equal to the width of the main spacer 7, and the auxiliary region 4 is black.
  • the length of the matrix pattern 2 in the row direction is equal to the width of the secondary spacer 8.
  • other cases may also be included, and the embodiments of the present invention are not - enumerated.
  • the spacers produced in the embodiments of the present invention may be columnar spacers or spacers of other shapes, which are not limited in the embodiment of the present invention.
  • the method for fabricating the color filter substrate shown in FIG. 1 can be specifically extended to the manufacturing method shown in FIG. 5, and the color filter substrate produced is as shown in FIG. 6.
  • the manufacturing method includes the following steps:
  • Step S501 a black matrix pattern is formed on the substrate.
  • a black matrix pattern 2 may be disposed on the color filter substrate to mask structures such as data lines, gate lines, and thin film transistors, and to avoid occurrence of sub-pixels when the display is displayed. Light leakage. Therefore, the material of the black matrix pattern 2 can have a strong light-shielding property and a low reflectance such as carbon black or black resin.
  • a material for the black matrix pattern 2 is first coated on the substrate 1, and then covered with a black matrix mask having a desired pattern, for example, by ultraviolet exposure. After the development step, a black matrix pattern 2 having a desired pattern shape is obtained on the substrate 1.
  • the black matrix pattern 2 includes a main area 3 and a sub-area 4, and the width L of the main area 3 in the column direction of the black matrix pattern 2 is larger than the width of the sub-area 4 in the column direction of the black matrix pattern 2 / .
  • the different widths and lengths of the main area 3 and the auxiliary area 4 are controlled by the size of the black matrix mask used.
  • Step S502 forming a color resist pattern on the substrate on which the black matrix pattern is formed.
  • the main function of the color resist pattern 5 is to realize color display by selective transmission and absorption of white light, so that the color resist pattern 5 can have high transmittance.
  • the color resist pattern 5 includes a red area, a green area, and a blue area, each of which is an organic pigment-colored resin material of a corresponding color.
  • the color resist pattern 5 can be formed on the substrate 1 by a method such as inkjet printing, pigment dispersion, or printing.
  • the three color regions of red, green, and blue included in the color resist pattern 5 may be separately formed in three times.
  • a red resin material is applied on the entire substrate, covered with a corresponding color photoresist mask, exposed, and developed to obtain a red region in the color resist pattern 5; then, coated on the entire substrate.
  • a blue resin material is coated on the entire substrate, covered with a corresponding color photoresist mask, exposed, developed, and finally a blue region in the color resist pattern 5 is obtained.
  • a color resist pattern 5 including a red region, a green region, and a blue region is formed on the entire substrate.
  • the embodiment of the present invention is not limited to the above materials, the order, and the like.
  • the order in which the black matrix pattern 2 and the color resist pattern 5 are formed may be different from the above-described fabrication order.
  • the color resist pattern 5 can also be formed first, and then the black matrix pattern 2 can be produced. If the color resist pattern 5 is formed first, the main regions 3 and the auxiliary regions 4 of the subsequently produced black matrix pattern 2 have different widths and widths by making the different regions of the color resist pattern 5 have different widths and lengths. / or length.
  • the black matrix pattern 2 and the color resist pattern 5 are formed on the substrate 1 by, for example, a patterning process
  • the black matrix pattern 2 may be first formed, and then the color resist pattern 5 may be formed;
  • the color resist pattern 5 is formed, and the black matrix pattern 2 is formed; or, according to the actual situation, the black matrix 2 and the color resist pattern 5 can be simultaneously formed by, for example, one patterning process.
  • Step S503 forming a flat layer on the black matrix pattern and the color photoresist pattern.
  • the flat layer 6 may include different structures depending on the situation.
  • the flat layer 6 may include a transparent protective layer which functions to better protect the color resist pattern 5, improve the surface flatness thereof, and prevent it from contaminating the liquid crystal after the package.
  • the material selected for the transparent protective layer is, for example, an epoxy resin or an acrylic resin polymer material.
  • the flat layer 6 may also include a transparent conductive layer depending on the needs of different display modes.
  • the transparent conductive layer may be a transparent conductive material such as indium tin oxide or indium oxide.
  • Step S504 forming a spacer on the flat layer, the spacer comprising a primary spacer and a secondary spacer.
  • the primary spacer is on the main area of the black matrix pattern and the secondary spacer is on the secondary area of the black matrix pattern, the height of the primary spacer being greater than the height of the secondary spacer.
  • a liquid crystal panel having high contrast, wide viewing angle, and fast response is obtained, and a spacer having uniform distribution can be disposed on the color filter substrate.
  • the spacer can be divided into a main spacer 7 and a secondary spacer 8.
  • the secondary spacer 8 functions to make the color filter substrate and the array substrate when the color filter substrate and the array substrate are subjected to an external force to change the thickness. Quick recovery. If only the main spacer 7 is present, and there is no secondary spacer 8, when a large pressure is applied to make the color filter substrate and the array substrate face each other, vacuum bubbles are easily generated, which is easy to use during use. Poor gravity.
  • a suitable height difference between the primary spacer 7 and the secondary spacer 8 can be achieved to achieve an optimum support effect, typically a height difference of 0.3 to 0.5 ⁇ m.
  • the main spacer 7 is located on the main area 3 of the black matrix pattern 2; the secondary spacer 8 is located on the auxiliary area 4 of the black matrix pattern 2.
  • the process of making the primary spacer 7 and the secondary spacer 8 on the flat layer 6 can be as follows.
  • coating a photoresist such as a photoresist on the flat layer 6 can be carried out, for example, by spin coating or slit coating, so that the entire flat layer 6 is covered with a layer of photoresist.
  • first opening 10 corresponding to the main spacer 7 and the second opening 11 corresponding to the secondary spacer 8 are evenly distributed on the spacer mask 9. Due to the larger opening size, the more sufficient the exposure during the subsequent exposure, the higher the resulting spacer, and therefore, the size of the first opening 10 is larger than the size of the second opening 11. In the embodiment of the present invention, the first opening 10 and the second opening 11 are relatively close in size, that is, the sizes of the first opening 10 and the second opening 11 are small.
  • the photoresist is exposed and developed using the spacer mask 9 to form the primary spacer 7 and the secondary spacer 8, due to the first opening 10 and the second on the spacer mask 9.
  • the opening 11 has a different size, so that after a certain period of exposure and development, the main spacer 7 and the secondary spacer 8 can be obtained on the flat layer 6.
  • the height difference between the main spacer 7 and the secondary spacer 8 is 0.3 to 0.5 ⁇ m.
  • the main spacer 7 and the secondary spacer 8 are formed. Have a suitable height difference. The reason is as follows.
  • the main spacer 7 and the secondary spacer 8 are respectively located on the main area 3 and the auxiliary area 4 of the black matrix pattern 2, and the main area 3 and the auxiliary area 4 of the black matrix pattern 2 have different patterns along the black matrix.
  • the width of the column direction Since the widths of the main region 3 and the auxiliary region 4 on the black matrix pattern 2 are different along the column direction of the black matrix pattern, when the flat layer 6 is formed on the black matrix pattern 2 and the color resist pattern 5, the main spacer is made
  • the height of the flat layer 6 formed at the object 7 is higher than the height of the flat layer 6 at the secondary spacer 8, and is more flat.
  • the flat layer 6 at the position thereof has a height difference, and based on this height difference, the main spacer 7 having a specific height difference is formed and the second.
  • the opening of the spacer 8 corresponding to the mask may be small. Therefore, the size of the opening of the main spacer 7 and the secondary spacer 8 on the mask In the case where the difference is small, by performing exposure, it is possible to easily form the main spacer 7 and the secondary spacer 8 having a height difference and a close size on the color filter substrate. And because the two spacers are relatively close in size, the two spacers are more uniform in appearance, and the uniformity of the shape improves the support effect of the spacer and improves the display quality.
  • the experimental results between the height of the spacer in the experiment and the width of the black matrix pattern 2 of the position along the column direction of the black matrix pattern are shown in Fig. 9 under the condition that other conditions are fixed.
  • the results show that the larger the width of the black matrix pattern 2 along the column direction of the black matrix pattern, the higher the spacer formed at the position.
  • the liquid crystal display is prone to generate static electricity during use, thereby affecting the internal electric field of the liquid crystal display, resulting in distortion of the liquid crystal display screen.
  • a transparent conductive film can be formed on one side of the substrate on which the black matrix pattern and the color resist pattern are not provided.
  • the transparent conductive film may be made of a transparent conductive material such as indium tin oxide or indium oxide, or a transparent conductive film may be deposited by sputtering, evaporation or plasma enhanced chemical vapor deposition.
  • the color film substrate is produced by the method as described above, and a common mask can be used in the manufacturing process, so that the manufacturing cost is low; and at the same time, since the width L of the main region of the black matrix pattern along the column direction of the black matrix pattern is larger than The width of the auxiliary region of the black matrix pattern along the column direction of the black matrix pattern/, such that the position of the main spacer and the secondary spacer are flat, and the black matrix pattern due to the position of the main spacer The width of the flat layer formed at the primary spacer is also higher than the height of the flat layer at the secondary spacer.
  • the main spacer and the secondary spacer opening on the mask are small, exposure can be performed, and the main spacer having a height difference and a close size can be easily formed on the color filter substrate.
  • the secondary spacers, and the two spacers have a more uniform shape, which can better support the display and improve the display quality.
  • the column direction of the black matrix pattern on the color filter substrate corresponds to the same extending direction of the data lines on the array substrate disposed opposite to the color filter substrate, and the row direction of the black matrix pattern on the color filter substrate Then, the direction of extension of the gate lines on the array substrate is the same.
  • the row direction and the column direction of the black matrix pattern are perpendicular to each other.
  • the color film substrate includes a substrate 1 , and the substrate 1 can be a glass substrate with good light transmittance or A quartz substrate or the like, and the color film substrate further includes a black matrix pattern 2.
  • the black matrix pattern includes a main area and a sub-area, a width L of the main area along a column direction of the black matrix pattern being greater than a width / of the sub-area along a column direction of the black matrix pattern.
  • the material of the black matrix pattern 2 may be carbon black or black resin.
  • the black matrix pattern includes a main area and a sub area.
  • any one line of the black matrix pattern 2 includes the main area 3 and/or the auxiliary area 4, for example, this can be expanded into the following cases.
  • At least one row of the black matrix pattern 2 includes only the main area 3, and the other lines of the black matrix pattern 2 include only the auxiliary area 4.
  • each row of the black matrix pattern 2 includes a main area 3 and a sub-area 4.
  • Case 3 At least one row of the black matrix pattern 2 includes only the main area 3, and the other lines of the black matrix pattern 2 include the main area 3 and the auxiliary area 4.
  • At least one row of black matrix patterns 2 includes only the auxiliary area 4, and the other lines of the black matrix pattern 2 include the main area 3 and the auxiliary area 4.
  • At least one line of the black matrix pattern 2 includes only the main area 3
  • at least one line of the black matrix pattern 2 includes only the auxiliary area 4
  • the other lines of the black matrix pattern 2 include the main area 3 and the auxiliary area 4.
  • any one row of the black matrix pattern 2 including the main area 3 and/or the auxiliary area 4 includes the above five cases, but is not limited to the above five cases.
  • the black matrix pattern 2 on the substrate may further include a plurality of black matrix patterns including neither the main area nor the auxiliary area on the basis of the black matrix pattern described in the first case.
  • the expansion may be performed on the basis of the case 1 to the case 5 according to the actual situation, and the embodiment of the present invention does not perform the enumeration here.
  • the length of the main region 3 in the row direction of the black matrix pattern 2 may be greater than or equal to the width of the main spacer 7, and the length of the auxiliary region 4 in the row direction of the black matrix pattern 2 may be greater than or equal to the secondary spacer 8
  • the width For example, as shown in FIGS. 2 and 3, the length of the main region 3 in the row direction of the black matrix pattern 2 is larger than the width of the main spacer 7, and the length of the auxiliary region 4 in the row direction of the black matrix pattern 2 is larger than the minor interval.
  • the width of the pad 8 as shown in FIG.
  • the length of the main region 3 in the row direction of the black matrix pattern 2 is equal to the width of the main spacer 7
  • the length of the auxiliary region 4 in the row direction of the black matrix pattern 2 is equal to the minor The width of the spacer 8.
  • other cases may be included, and the embodiments of the present invention are not - enumerated.
  • the color filter substrate may further include a color resist pattern 5, and the color resist pattern 5 may include a red region, a green region, and a blue region, each of which has a corresponding color A resin material that has been colored with organic pigments.
  • the color filter substrate may further include a flat layer 6 on the black matrix pattern 2 and the color resist pattern 5 on the black matrix pattern 2 and the color photoresist pattern 5.
  • the flat layer 6 may include a transparent protective layer, and may further include a transparent conductive layer.
  • a main spacer 7 and a secondary spacer 8 on the flat layer 6 are formed on the flat layer 6.
  • the primary spacer 7 is located on the main area 3 of the black matrix pattern 2
  • the secondary spacer 8 is located on the auxiliary area 4 of the black matrix pattern 2
  • the height of the primary spacer 7 is greater than the secondary spacer
  • the height of the object 8 for example, the height difference between the primary spacer 7 and the secondary spacer 8 is 0.3 to 0.5 ⁇ m.
  • a transparent conductive film may be disposed on one side of the substrate 1 on which the black matrix pattern 2 and the color resist pattern 5 are not disposed, and the function is to effectively reduce static electricity without reducing the light transmittance of the color filter substrate.
  • the effect on the LCD screen can be made of a transparent conductive material such as indium tin oxide or indium oxide.
  • the color film substrate provided by the embodiment of the present invention includes the structure as described above, and the black matrix pattern disposed thereon includes a main area and a auxiliary area, and a main spacer and a secondary spacer located on the main area and the auxiliary area, The difference in size between the main spacer and the secondary spacer is smaller, and the shape is more uniform, so that the liquid crystal cell formed by the color film substrate and the array substrate is more stable, and the liquid crystal display using the color film substrate is better. The display effect.
  • an embodiment of the present invention further provides a display device, where the display device includes the color filter substrate.
  • the display device of the embodiment of the present invention may include an array substrate 20 and a color filter substrate 30.
  • the array substrate 20 and the color filter substrate 30 are opposed to each other and pass through the sealant 35 to form a liquid crystal cell in the liquid crystal cell.
  • the liquid crystal material 40 is filled.
  • the pixel electrode of each pixel unit of the array substrate 20 is used to apply an electric field to control the degree of rotation of the liquid crystal material to perform a display operation.
  • the display device further includes a backlight 50 that provides backlighting for the array substrate 20.
  • the display device may be: a liquid crystal panel, an electronic paper, an organic light emitting diode panel, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like, or any display product or component.

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Abstract

一种彩膜基板及其制作方法、显示装置，该方法包括：在基板（1）上制作黑矩阵图形（2）和彩色光阻图形（5）；制作平坦层（6）和隔垫物，隔垫物包括主要隔垫物（7）和次要隔垫物（8）。所述黑矩阵图形（2）包括主区域（3）和辅区域（4），主区域（3）沿所述黑矩阵图形（2）的列方向的宽度大于辅区域（4）沿所述黑矩阵图形（2）的列方向的宽度；主要隔垫物（7）位于黑矩阵图形（2）的主区域（3）上，次要隔垫物（8）位于黑矩阵图形（2）的辅区域（4）上，主要隔垫物（7）的高度大于次要隔垫物（8）的高度。该方法能够降低彩膜基板的制作成本，同时易形成具有高度差异而尺寸接近的主要隔垫物和次要隔垫物，且两种隔垫物的形貌更加均匀，能起到更好的支撑效果，提高显示品质。

Description

彩膜基板及其制作方法、 显示装置 技术领域
本发明的至少一个实施例涉及一种彩膜基板及其制作方法、 显示装置。 背景技术
液晶显示器（ LCD )可以包括阵列基板、 彩膜基板 ( color filter substrate ) 和设置在二者之间的液晶层。 彩膜基板是 LCD 中用以显示颜色的光学滤光 结构。隔垫物位于彩膜基板上，用来决定彩膜基板和阵列基板之间的盒厚（ cell gap )， 以保持最佳液晶层厚度。 为了得到对比度高、 视角宽、 响应快的液晶 面板， 可以选择尺寸接近、 分布均匀的隔垫物。
隔垫物按形貌可分为球状隔垫物、 棒状隔垫物、 柱状隔垫物等。 柱状隔 垫物具有尺寸易于控制、 对比度高、 均勾性佳、 高耐久度等优点， 并且使用 柱状隔垫物的 LCD与使用球状隔垫物或棒状隔垫物的 LCD相比较不易出现 拖尾效应。 因而， 柱状隔垫物得到广泛使用。 为了起到最佳的支撑作用， 柱 状隔垫物可进一步分为主要柱状隔垫物和次要柱状隔垫物， 二者之间具有合 适的高度差。 目前， 柱状隔垫物的制作主要有使用普通掩膜板和使用半透膜 掩膜板两种方法。 发明内容
本发明至少一个实施例提供一种彩膜基板及其制作方法， 以降低彩膜基 板的制作成本， 同时使彩膜基板上较容易形成具有高度差异而尺寸接近的主 要隔垫物和次要隔垫物， 且两种隔垫物的形貌更加均匀， 能起到更好的支撑 效果， 提高了显示品质。
本发明的至少一个实施例提供了一种彩膜基板的制作方法， 其包括： 在 基板上制作黑矩阵图形和彩色光阻图形； 在所述彩色光阻图形和所述黑矩阵 图形上制作平坦层； 以及在所述平坦层上制作隔垫物。 所述黑矩阵图形包括 主区域和辅区域， 所述主区域沿所述黑矩阵图形的列方向的宽度大于所述辅 区域沿所述黑矩阵图形的列方向的宽度； 所述隔垫物包括主要隔垫物和次要 隔垫物； 所述主要隔垫物位于所述黑矩阵图形的主区域上， 所述次要隔垫物 位于所述黑矩阵图形的辅区域上， 所述主要隔垫物的高度大于所述次要隔垫 物的高度。
本发明的至少一个实施例还提供了一种彩膜基板， 该彩膜基板包括： 黑 矩阵图形， 黑矩阵图形包括主区域和辅区域， 所述主区域沿所述黑矩阵图形 的列方向的宽度大于所述辅区域沿所述黑矩阵图形的列方向的宽度； 彩色光 阻图形； 平坦层， 位于所述黑矩阵图形和所述彩色光阻图形上； 以及主要隔 垫物和次要隔垫物， 形成于所述平坦层之上。 所述主要隔垫物位于所述黑矩 阵图形的主区域上， 所述次要隔垫物位于所述黑矩阵图形的辅区域上， 所述 主要隔垫物的高度大于所述次要隔垫物的高度。
本发明的至少一个实施例还提供一种显示装置，其包括上述的彩膜基板。 附图说明
为了更清楚地说明本发明实施例的技术方案， 下面将对实施例的附图作 简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例， 而非对本发明的限制。
图 1为本发明实施例中的彩膜基板的一种制作方法流程图；
图 2为本发明实施例中的第一种彩膜基板的平面示意图；
图 3为本发明实施例中的第二种彩膜基板的平面示意图；
图 4为本发明实施例中的第三种彩膜基板的平面示意图；
图 5为本发明实施例中图 1所示的彩膜基板的制作方法的具体流程图； 图 6为本发明实施例中图 3所示的彩膜基板沿 A-A'方向的截面示意图； 图 7为本发明实施例中图 3所示的彩膜基板沿 B-B'方向的截面示意图； 图 8为本发明实施例中的形成隔垫物的曝光过程示意图；
图 9为本发明实施例中的隔垫物的高度与黑矩阵图形的沿所述黑矩阵图 形的列方向的宽度的关系示意图；
图 10为本发明实施例中的显示装置的结构示意图。
附图标记：
1-基板； 2-黑矩阵图形； 3-主区域；
4-辅区域； 5-彩色光阻图形; 6-平坦层；
7-主要隔垫物; 8-次要隔垫物； 9-隔垫物掩膜板; 10-第一开口; 11-第二开口； 20-阵列基板;
30-彩膜基板; 35-封框胶； 40-液晶材料;
50-背光源。 具体实施方式
为使本发明实施例的目的、 技术方案和优点更加清楚， 下面将结合本发 明实施例的附图， 对本发明实施例的技术方案进行清楚、 完整地描述。显然， 所描述的实施例是本发明一部分实施例， 而不是全部的实施例。 基于本发明 的实施例， 本领域普通技术人员在无需创造性劳动前提下所获得的所有其他 实施例， 都属于本发明保护的范围。
本申请的发明人注意到， 使用普通掩膜板来制备柱状隔垫物时， 将柱状 隔垫物设计成不同尺寸， 主要柱状隔垫物的尺寸较大， 而次要柱状隔垫物的 尺寸较小。 在制备过程中， 通过控制掩膜板的开口的大小可以控制曝光量的 大小， 从而实现主要柱状隔垫物和次要柱状隔垫物的高度差， 但是二者高度 差只有在主要柱状隔垫物和次要柱状隔垫物的尺寸相差较大时才能实现。 在 这样的条件下， 由于主要隔垫物和次要隔垫物的尺寸相差较大， 使得形成的 主要隔垫物和次要隔垫物的上表面形貌也有较大差异。 主要隔垫物表面形貌 较平整， 而次要隔垫物由于尺寸较小， 表面比较粗糙， 有凹凸不平的现象出 现。 这种形貌的不均匀性会对隔垫物的支撑效果产生直接的不利影响。 另一 方面， 使用半透膜掩膜板来制备柱状隔垫物时， 虽然主要柱状隔垫物和次要 柱状隔垫物的尺寸可以比较接近， 但是制备成本较高。
在本发明的至少一个实施例中， 液晶显示器（LCD ) 包括阵列基板、 彩 膜基板（color filter substrate )和二者之间的液晶层。 例如， 隔垫物位于彩膜 基板上， 用来决定彩膜基板和阵列基板之间的盒厚 ( cell gap ) 。
实施例一
本发明的至少实施例提供了一种彩膜基板的制作方法， 如图 1所示， 该 方法包括如下步骤。
步骤 S101、 通过例如构图工艺在基板上制作黑矩阵图形和彩色光阻
( color filter )图形。 在一个示例中， 黑矩阵图形包括主区域和辅区域， 主区 域沿所述黑矩阵图形的列方向的宽度大于辅区域沿所述黑矩阵图形的列方向 的宽度。 步骤 S102、 在黑矩阵图形和彩色光阻图形上制作平坦层。
步骤 S103、在平坦层上制作隔垫物， 隔垫物包括主要隔垫物和次要隔垫 物。 在一个示例中， 主要隔垫物位于黑矩阵图形的主区域上， 次要隔垫物位 于黑矩阵图形的辅区域上， 主要隔垫物的高度大于次要隔垫物的高度。
需要说明的是， 黑矩阵图形包括主区域和辅区域， 例如， 任意一行黑矩 阵图形包括主区域和 /或辅区域。 例如， 这种设置可以扩展为以下几种情形。
情形一、 如图 2所示， 至少一行黑矩阵图形 2只包括主区域 3， 其他行 黑矩阵图形 2只包括辅区域 4。
情形二、 如图 3所示， 每一行黑矩阵图形 2同时包括主区域 3和辅区域 4。
情形三、 至少一行黑矩阵图形 2只包括主区域 3， 其他行黑矩阵图形 2 包括主区域 3和辅区域 4。
情形四、 至少一行黑矩阵图形 2只包括辅区域 4， 其他行黑矩阵图形 2 包括主区域 3和辅区域 4。
情形五、至少一行黑矩阵图形 2只包括主区域 3，至少一行黑矩阵图形 2 只包括辅区域 4， 其他行黑矩阵图形 2包括主区域 3和辅区域 4。
需要注意的是，任意一行黑矩阵图形 2包括主区域 3和 /或辅区域 4包括 以上五种情形， 但不局限于以上五种情形。 在本发明的实施例中， 基板上的 黑矩阵图形 2在包括情形一描述的黑矩阵图形的基础上， 还可以包括几行既 不包括主区域也不包括辅区域的黑矩阵图形。 类似地， 还可以根据实际情况 在情形一至情形五的基础上进行扩展， 本发明实施例在此不进行——列举。 在图 2-4中， 较大的圓圈对应于主要柱状隔垫物， 而较小的圓圈对应于次要 柱状隔垫物； 黑矩阵的行方向对应于水平方向 （图中的箭头方向） ， 而黑矩 阵的列方向对应于垂直于水平方向的方向。
此外， 例如， 主区域 3沿黑矩阵图形 2的行方向的长度可以大于或等于 主要隔垫物 7的宽度， 辅区域 4沿黑矩阵图形 2的行方向的长度可以大于或 等于次要隔垫物 8的宽度。 例如， 可以如图 2和图 3所示， 主区域 3沿黑矩 阵图形 2的行方向的长度大于主要隔垫物 7的宽度， 辅区域 4沿黑矩阵图形 2的行方向的长度大于次要隔垫物 8的宽度； 也可以如图 4所示， 主区域 3 沿黑矩阵图形 2的行方向的长度 1'等于主要隔垫物 7的宽度， 辅区域 4沿黑 矩阵图形 2的行方向的长度等于次要隔垫物 8的宽度。 此外， 还可以包括其 他情况， 本发明实施例不——列举。 本发明实施例制作的隔垫物可以为柱状 隔垫物， 也可以为其他形状的隔垫物， 本发明实施例对此不进行限定。
为了更加清楚地描述本发明实施例提供的彩膜基板的制作方法， 可以将 图 1所示的彩膜基板的制作方法具体扩展为图 5所示的制作方法， 制作的彩 膜基板如图 6和图 7所示， 该制作方法包括如下步骤：
步骤 S501、 在基板上制作黑矩阵图形。
例如， 在液晶显示器中， 为了提升液晶显示器的对比度， 可以在彩膜基 板上设置黑矩阵图形 2， 以遮掩数据线、 栅线和薄膜晶体管等结构， 以及避 免在显示器显示时子像素之间出现漏光现象。 因此， 黑矩阵图形 2的材料可 以具有很强的遮光性和低的反射率， 例如碳黑或黑色树脂等。
如图 6和图 7所示， 在一个示例中， 首先在基板 1上涂覆一层黑矩阵图 形 2所用材料， 然后使用带有所需图案的黑矩阵掩膜板进行遮盖， 经过例如 紫外曝光、 显影步骤后， 在基板 1上便得到具有所需图案形状的黑矩阵图形 2。
在本发明的实施例中，黑矩阵图形 2包括主区域 3和辅区域 4，主区域 3 沿黑矩阵图形 2的列方向的宽度 L大于辅区域 4沿黑矩阵图形 2的列方向的 宽度 /。 在黑矩阵图形 2的制作过程中， 通过使用的黑矩阵掩膜板的尺寸控 制主区域 3和辅区域 4的不同宽度和长度。
步骤 S502、 在形成了黑矩阵图形的基板上制作彩色光阻图形。
彩色光阻图形 5的主要作用在于通过对白光的选择性透过和吸收， 从而 实现彩色显示， 因此彩色光阻图形 5可以具有高透过率。 在一个示例中， 彩 色光阻图形 5包括红色区域、 绿色区域和蓝色区域， 每个区域均为对应颜色 的经过有机颜料上色的树脂材料。
可以使用喷墨打印、 颜料分散法或印刷等方法在基板 1上制作彩色光阻 图形 5。 在一个示例中， 彩色光阻图形 5包括的红、 绿、 蓝三种颜色区域可 以分三次依次分别制作。 例如， 先在整个基板上涂布一层红色树脂材料， 使 用相应的彩色光阻掩膜板遮盖， 进行曝光、 显影， 得到彩色光阻图形 5中的 红色区域； 然后， 在整个基板上涂布绿色树脂材料， 使用相应的彩色光阻掩 膜板遮盖， 进行曝光、 显影， 得到彩色光阻图形 5中的绿色区域； 最后， 在 整个基板上涂布蓝色树脂材料，使用相应的彩色光阻掩膜板遮盖，进行曝光、 显影， 最后得到彩色光阻图形 5中的蓝色区域。 经过上述过程后， 在整个基 板上形成一层包括红色区域、 绿色区域和蓝色区域的彩色光阻图形 5。
需要说明的是， 本发明的实施例不限于上述材料、 顺序等， 例如， 黑矩 阵图形 2和彩色光阻图形 5的制作顺序可以与上述制作顺序不同。 在彩膜基 板的制作过程中， 也可以先制作彩色光阻图形 5， 再制作黑矩阵图形 2。若先 制作彩色光阻图形 5， 则可以通过使彩色光阻图形 5的不同区域具有不同的 宽度和长度， 从而使得随后制作的黑矩阵图形 2的主区域 3和辅区域 4具有 不同的宽度和 /或长度。 本发明的实施例的步骤 S101 中， 通过例如构图工艺 在基板 1上制作黑矩阵图形 2和彩色光阻图形 5时， 可以先制作黑矩阵图形 2, 再制作彩色光阻图形 5; 也可以先制作彩色光阻图形 5， 再制作黑矩阵图 形 2; 或者， 根据实际情况还可以包括通过例如一次构图工艺同时制作黑矩 阵 2和彩色光阻图形 5。
步骤 S503、 在黑矩阵图形和彩色光阻图形上制作平坦层。
通过在黑矩阵图形 2和彩色光阻图形 5上制作平坦层 6， 可以在一定程 度上使黑矩阵图形 2和彩色光阻图形 5的表面更平坦。 平坦层 6根据不同情 况可以包括不同的结构。 例如， 平坦层 6可以包括透明保护层， 该透明保护 层的作用在于更好地保护彩色光阻图形 5、 改善其表面平坦程度以及防止其 污染成盒后的液晶。 透明保护层选用的材料例如为环氧树脂系或亚克力树脂 系高分子材料。根据不同显示模式的需要，平坦层 6还可以包括透明导电层。 例如， 透明导电层可以选用氧化铟锡或氧化铟辞等透明导电材料。
步骤 S504、在平坦层上制作隔垫物， 隔垫物包括主要隔垫物和次要隔垫 物。 在一个示例中， 主要隔垫物位于黑矩阵图形的主区域上， 次要隔垫物位 于黑矩阵图形的辅区域上， 主要隔垫物的高度大于次要隔垫物的高度。
在本发明的实施例中， 为了维持液晶盒的厚度，得到对比度高、视角宽、 响应快的液晶面板， 可以在彩膜基板上设置分布均匀的隔垫物。
隔垫物可以分为主要隔垫物 7和次要隔垫物 8， 次要隔垫物 8的作用在 于当彩膜基板和阵列基板受到外力作用而改变厚度时， 使彩膜基板和阵列基 板快速恢复。 若只存在主要隔垫物 7， 而无次要隔垫物 8时， 当施加较大压 力使彩膜基板和阵列基板对盒时， 容易产生真空气泡， 在使用过程中还容易 产生重力不良。 主要隔垫物 7和次要隔垫物 8之间可以具有合适的高度差， 以达到最佳的支撑效果， 通常这一高度差为 0.3~0.5 μπι。
如图 6和图 7所示， 主要隔垫物 7位于黑矩阵图形 2的主区域 3上； 次 要隔垫物 8位于黑矩阵图形 2的辅区域 4上。
在本发明的实施例中， 在平坦层 6上制作主要隔垫物 7和次要隔垫物 8 的过程可以如下。
首先， 在平坦层 6上涂布例如光刻胶， 可以通过例如旋涂或狭缝涂布等 方式实现， 使整个平坦层 6上均勾覆盖一层光刻胶。
其次， 如图 8所示， 使用具有相应图案的隔垫物掩膜板 9进行覆盖。 隔 垫物掩膜板 9上均匀分布有对应于主要隔垫物 7的第一开口 10和对应于次要 隔垫物 8的第二开口 11。 由于开口尺寸越大， 在之后的曝光过程中， 曝光越 充分， 所得的隔垫物越高， 因此， 第一开口 10的尺寸大于第二开口 11的尺 寸。 同时， 在本发明实施例中， 第一开口 10和第二开口 11尺寸较为接近， 即第一开口 10与第二开口 11的尺寸相差较小。
再次， 利用隔垫物掩膜板 9对光刻胶进行曝光显影处理， 以形成主要隔 垫物 7和次要隔垫物 8， 由于隔垫物掩膜板 9上第一开口 10和第二开口 11 尺寸不同， 故经一定时间的曝光、 显影后， 即可在平坦层 6上获得主要隔垫 物 7和次要隔垫物 8。 主要隔垫物 7与次要隔垫物 8的高度差为 0.3~0.5μπι。
在本发明实施例中， 由于形成隔垫物时所用的掩膜板 9 上第一开口 10 尺寸和第二开口 11尺寸相差较小，使得形成的主要隔垫物 7和次要隔垫物 8 具有合适的高度差。 其原因如下所述。
主要隔垫物 7和次要隔垫物 8分别处于黑矩阵图形 2的主区域 3和辅区 域 4上， 而黑矩阵图形 2的主区域 3和辅区域 4具有不同的沿所述黑矩阵图 形的列方向的宽度。 由于黑矩阵图形 2上的主区域 3和辅区域 4沿所述黑矩 阵图形的列方向的宽度不同， 当在黑矩阵图形 2和彩色光阻图形 5上形成平 坦层 6时， 使得主要隔垫物 7处形成的平坦层 6的高度比次要隔垫物 8处平 坦层 6的高度高， 且更为平坦。 这样， 主要隔垫物 7与次要隔垫物 8在形成 之前， 其所在位置的平坦层 6已具有了高度差别， 基于此高度差别， 则形成 具有特定高度差异的主要隔垫物 7和次要隔垫物 8对应掩膜板的开口可以相 差较小。 因此， 在掩膜板上主要隔垫物 7和次要隔垫物 8掩膜板开口尺寸相 差较小的情况下， 进行曝光， 便能在彩膜基板上较容易形成具有高度差异而 尺寸接近的主要隔垫物 7和次要隔垫物 8。 并且由于两种隔垫物尺寸较为接 近， 制得的两种隔垫物的形貌更加均匀， 形貌均匀性的提升也提高了隔垫物 的支撑效果， 提高了显示品质。
例如， 在其他条件固定的前提下， 实验中的隔垫物的高度与所在位置的 黑矩阵图形 2的沿所述黑矩阵图形的列方向的宽度之间的实验结果如图 9所 示。 结果表明， 黑矩阵图形 2的沿所述黑矩阵图形的列方向的宽度越大， 在 该位置处形成的隔垫物越高。
此外， 液晶显示器在使用过程中容易产生静电， 从而影响液晶显示器的 内部电场， 导致液晶显示器画面失真。 通常， 可以在基板上未设置有黑矩阵 图形和彩色光阻图形的一面形成透明导电薄膜。 这样， 在不降低彩膜基板透 光性的前提下， 有效降低静电对液晶显示器画面的影响。 透明导电薄膜可釆 用氧化铟锡或者氧化铟辞等透明的导电物制成， 也可选用溅射、 蒸镀或等离 子体增强化学气相沉积等多种方式沉积透明导电薄膜。
利用如上所述的方法制作彩膜基板，在制作过程中使用普通掩膜板即可， 因而制作成本低； 同时由于黑矩阵图形的主区域的沿所述黑矩阵图形的列方 向的宽度 L大于黑矩阵图形的辅区域的沿所述黑矩阵图形的列方向的宽度 /， 使得主要隔垫物和次要隔垫物所在位置的平坦程度不同， 且由于主要隔垫物 所在位置的黑矩阵图形的宽度大， 进而， 主要隔垫物处形成的平坦层的高度 也比次要隔垫物处平坦层的高度高。 因此， 在掩膜板上主要隔垫物和次要隔 垫物开口尺寸相差较小的情况下， 进行曝光， 便能在彩膜基板上较容易形成 具有高度差异而尺寸接近的主要隔垫物和次要隔垫物， 且两种隔垫物的形貌 更加均匀， 能起到更好的支撑效果， 提高了显示品质。
在上述描述中， 例如， 彩膜基板上的黑矩阵图形的列方向对应于与彩膜 基板相对设置的阵列基板上的数据线的延伸方向相同， 而彩膜基板上的黑矩 阵图形的行方向则与阵列基板上的栅线的延伸方向相同。 例如， 黑矩阵图形 的行方向与列方向彼此垂直。
实施例二
基于图 1所提供的彩膜基板的制作方法， 本发明实施例还提供了一种彩 膜基板， 该彩膜基板包括基板 1， 基板 1可以为透光性良好的玻璃基板或者 石英基板等， 此外该彩膜基板还包括黑矩阵图形 2。 在一个示例中， 黑矩阵 图形包括主区域和辅区域， 所述主区域沿所述黑矩阵图形的列方向的宽度 L 大于所述辅区域沿所述黑矩阵图形的列方向的宽度 /。 黑矩阵图形 2的材料 可以为碳黑或黑色树脂。
需要说明的是， 黑矩阵图形包括主区域和辅区域， 例如， 任意一行黑矩 阵图形 2包括主区域 3和 /或辅区域 4， 例如， 这可以扩展为以下几种情形。
情形一、 如图 2所示， 至少一行黑矩阵图形 2只包括主区域 3， 其他行 黑矩阵图形 2只包括辅区域 4。
情形二、 如图 3所示， 每一行黑矩阵图形 2包括主区域 3和辅区域 4。 情形三、 至少一行黑矩阵图形 2只包括主区域 3， 其他行黑矩阵图形 2 包括主区域 3和辅区域 4。
情形四、 至少一行黑矩阵图形 2只包括辅区域 4， 其他行黑矩阵图形 2 包括主区域 3和辅区域 4。
情形五、至少一行黑矩阵图形 2只包括主区域 3，至少一行黑矩阵图形 2 只包括辅区域 4， 其他行黑矩阵图形 2包括主区域 3和辅区域 4。
需要说明的是，任意一行黑矩阵图形 2包括主区域 3和 /或辅区域 4包括 以上五种情形， 但不局限于以上五种情形。 在本发明的实施例中， 基板上的 黑矩阵图形 2在包括情形一描述的黑矩阵图形的基础上， 还可以包括几行既 不包括主区域也不包括辅区域的黑矩阵图形。 类似地， 还可以根据实际情况 在情形一至情形五的基础上进行扩展， 本发明实施例在此不进行——列举。
此外， 主区域 3沿黑矩阵图形 2的行方向的长度可以大于或等于主要隔 垫物 7的宽度， 辅区域 4沿黑矩阵图形 2的行方向的长度可以大于或等于次 要隔垫物 8的宽度。 例如， 如图 2和图 3所示， 主区域 3沿黑矩阵图形 2的 行方向的长度大于主要隔垫物 7的宽度， 辅区域 4沿黑矩阵图形 2的行方向 的长度大于次要隔垫物 8的宽度； 如图 4所示， 主区域 3沿黑矩阵图形 2的 行方向的长度等于主要隔垫物 7的宽度， 辅区域 4沿黑矩阵图形 2的行方向 的长度等于次要隔垫物 8的宽度。 此外， 还可以包括其他情况， 本发明实施 例不——列举。
在至少一个实施例中， 彩膜基板还可以包括彩色光阻图形 5， 彩色光阻 图形 5可以包括红色区域、 绿色区域和蓝色区域， 每个区域均为对应颜色的 经过有机颜料上色的树脂材料。
在至少一个实施例中， 彩膜基板还可以包括位于黑矩阵图形 2和彩色光 阻图形 5上的平坦层 6， 位于黑矩阵图形 2和彩色光阻图形 5上。 平坦层 6 可以包括透明保护层， 还可以包括透明导电层。
位于平坦层 6上的主要隔垫物 7和次要隔垫物 8，形成于平坦层 6之上。 在一个示例中， 主要隔垫物 7位于黑矩阵图形 2的主区域 3上， 次要隔垫物 8位于黑矩阵图形 2的辅区域 4上； 主要隔垫物 7的高度大于次要隔垫物 8 的高度， 例如主要隔垫物 7和次要隔垫物 8之间高度差为 0.3~0.5 μπι。
在一个示例中， 还可以在基板 1上未设置有黑矩阵图形 2和彩色光阻图 形 5的一面设置透明导电薄膜，其作用是在不降低彩膜基板透光性的前提下， 有效降低静电对液晶显示器画面的影响。 透明导电薄膜可釆用氧化铟锡或者 氧化铟辞等透明的导电物制成。
本发明实施例提供的彩膜基板包括如上所述的结构， 其上设置的黑矩阵 图形包括主区域和辅区域， 和位于主区域和辅区域上的主要隔垫物和次要隔 垫物， 主要隔垫物和次要隔垫物的尺寸差异较小， 形貌更加均匀， 使得所述 彩膜基板与阵列基板形成的液晶盒更加稳定， 使应用所述彩膜基板的液晶显 示器具有较好的显示效果。
实施例三
此外， 本发明实施例还提供了一种显示装置， 所述显示装置包括所述彩 膜基板。 如图 10所示， 本发明实施例的显示装置可以包括阵列基板 20与彩 膜基板 30， 阵列基板 20与彩膜基板 30彼此对置且通过封框胶 35以形成液 晶盒， 在液晶盒中填充有液晶材料 40。 阵列基板 20的每个像素单元的像素 电极用于施加电场以对液晶材料的旋转程度进行控制从而进行显示操作。 在 一些实施例中， 该显示装置还包括为阵列基板 20提供背光的背光源 50。 所 述显示装置可以为： 液晶面板、 电子纸、 有机发光二极管面板、 手机、 平板 电脑、 电视机、 显示器、 笔记本电脑、 数码相框、 导航仪等任何具有显示功 能的产品或部件。
以上所述， 仅为本发明的部分实施方式， 但本发明的保护范围并不局限 于此， 任何熟悉本技术领域的技术人员在本发明揭露的技术范围内， 可轻易 想到的变化或替换， 都应涵盖在本发明的保护范围之内。 因此， 本发明的保 护范围应以所述权利要求的保护范围为准。
本申请要求于 2013年 12月 2日递交的中国专利申请第 201310632632.5 号的优先权， 在此全文引用上述中国专利申请公开的内容以作为本申请的一 部分。

Claims

权利要求书
1、 一种彩膜基板的制作方法， 包括：
在基板上制作黑矩阵图形和彩色光阻图形， 其中， 所述黑矩阵图形包括 主区域和辅区域， 所述主区域沿所述黑矩阵图形的列方向的宽度大于所述辅 区域沿所述黑矩阵图形的列方向的宽度；
在所述彩色光阻图形和所述黑矩阵图形上制作平坦层； 以及
在所述平坦层上制作隔垫物，所述隔垫物包括主要隔垫物和次要隔垫物， 其中， 所述主要隔垫物位于所述黑矩阵图形的主区域上， 所述次要隔垫物位 于所述黑矩阵图形的辅区域上， 所述主要隔垫物的高度大于所述次要隔垫物 的高度。
2、根据权利要求 1所述的彩膜基板的制作方法， 其中，任意一行所述黑 矩阵图形包括所述主区域和 /或所述辅区域。
3、根据权利要求 1或 2所述的彩膜基板的制作方法， 其中， 所述主区域 沿所述黑矩阵图形的行方向的长度大于或等于所述主要隔垫物的宽度， 所述 辅区域沿所述黑矩阵图形的行方向的长度大于或等于所述次要隔垫物的宽 度。
4、 根据权利要求 1-3任一所述的彩膜基板的制作方法， 其中， 在所述平 坦层上制作隔垫物包括：
利用隔垫物掩膜板形成所述主要隔垫物和所述次要隔垫物， 其中， 所述 隔垫物掩膜板包括对应所述主要隔垫物的第一开口和对应所述次要隔垫物的 第二开口， 所述第一开口的尺寸大于所述第二开口的尺寸。
5、根据权利要求 4所述的彩膜基板的制作方法， 其中， 所述在所述平坦 层上制作隔垫物包括：
在所述平坦层上涂布光刻胶；
利用隔垫物掩膜板， 对所述光刻胶进行处理， 以形成所述主要隔垫物和 所述次要隔垫物。
6、 根据权利要求 1-5任一所述的彩膜基板的制作方法， 还包括： 在所述 基板上未设置有所述黑矩阵图形和所述彩色光阻图形的一面形成透明导电薄 膜。
7、 一种彩膜基板， 包括：
黑矩阵图形， 其中， 所述黑矩阵图形包括主区域和辅区域， 所述主区域 沿所述黑矩阵图形的列方向的宽度大于所述辅区域沿所述黑矩阵图形的列方 向的宽度；
彩色光阻图形；
平坦层， 位于所述黑矩阵图形和所述彩色光阻图形上； 以及
主要隔垫物和次要隔垫物， 形成于所述平坦层之上， 其中， 所述主要隔 垫物位于所述黑矩阵图形的主区域上， 所述次要隔垫物位于所述黑矩阵图形 的辅区域上， 所述主要隔垫物的高度大于所述次要隔垫物的高度。
8、根据权利要求 7所述的彩膜基板， 其中，任意一行所述黑矩阵图形包 括所述主区域和 /或所述辅区域。
9、根据权利要求 7或 8所述的彩膜基板， 其中， 所述主区域沿所述黑矩 阵图形的行方向的长度大于或等于所述主要隔垫物的宽度， 所述辅区域沿所 述黑矩阵图形的行方向的长度大于或等于所述次要隔垫物的宽度。
10、 根据权利要求 7-9任一所述的彩膜基板， 还包括： 所述基板上未设 置有所述黑矩阵图形和所述彩色光阻图形的一面设置的透明导电薄膜。
11、 一种显示装置， 包括如权利要求 7-10任一项所述的彩膜基板。
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