WO2014161382A1 - Transparent conductive electrodes comprising merged metal nanowires, their structure design,and methodof making such structures - Google Patents
Transparent conductive electrodes comprising merged metal nanowires, their structure design,and methodof making such structures Download PDFInfo
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- WO2014161382A1 WO2014161382A1 PCT/CN2014/071155 CN2014071155W WO2014161382A1 WO 2014161382 A1 WO2014161382 A1 WO 2014161382A1 CN 2014071155 W CN2014071155 W CN 2014071155W WO 2014161382 A1 WO2014161382 A1 WO 2014161382A1
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/054—Nanosized particles
- B22F1/0547—Nanofibres or nanotubes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/16—Metallic particles coated with a non-metal
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/002—Manufacture of articles essentially made from metallic fibres
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
- B22F7/002—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of porous nature
- B22F7/004—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of porous nature comprising at least one non-porous part
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- This disclosure is related to a patterned transparent conductive film having homogeneous optical properties but heterogeneous electrical properties, and method of making the same.
- Optically clear and electrically conductive films made from metal nanowires are promising replacement for ITO films, which are used in various electronics devices such as LCDs, OLEDs and Solar cells.
- Transparent conductive films in the display and touch screen devices requiring the films to be patterned to have conductive regions and non-conductive regions, while maintaining the optical transparency.
- a transparent conductive filmconsisting of a mesh of silver nanowires embedded into a film of substrate or bound on the substrate surface by an adhesive layer is patterned, the difference between the optical properties of the conductive regions (containing silver nanowire) and the non-conductive regions of the film become visible to the human eye.
- a method to patterning a film having invisible edges between conductive and non-conductive areas is needed.
- One solution is to make a conductive film having identical optical properties in both conductive and non-conductive regions.
- the process of making such a patterned film should be easy to operate, scalable, and robust.
- conductive film compositions having homogenous optical properties and heterogeneous electrical properties.
- the present invention is directed to a conductive film composition having homogenous optical property and heterogeneous electrical property.
- Said film comprises a first region comprising a first material;
- a second region comprising a second material
- the refractive index difference between first material and the second material is less than 0.2, and the haze difference is less than 0.2, the second material is an oxidation form of the first material and the second region is less conductive than the first region.
- a patterned transparent conductive film comprising a substrate
- a first region comprising a network of metal nanowires
- a second region comprising a metal/metal oxide nanowire in a core shell structure, wherein the core of the nanowire comprise element metal and the shell of the nanowire comprise metal oxide.
- a patterned transparent conductive film comprising
- a first region comprising a network of metal nanowires
- a second region comprising at least one nanowire having a junction connected to another nanowire but electrically non-conductive
- junction comprises metal oxides
- the total thickness of the single layer is about 150 nm or less and the second region has one dimension is 5-200um.
- a conductive electrode composition having homogenous optical property and heterogeneous electrical property comprising
- a first region comprising a first material
- a second region comprising a second material
- the refractive index differences between the first and second material is less than 0.2, and a haze difference no more than 0.2%
- one dimension of the first region is at least 10 um
- the first material is converted to the second material by UV light and photo acid generator and the first region is more conductive than the second region.
- a patterned transparent conductive film comprising
- a first region comprising a network of silver nanowires and surface functionalization means for protecting the nanowire from surface oxidation;
- a second region comprising a plurality of silver nanowires.
- the present invention provides a method for making a nanowire-based film having homogenous optical property and heterogeneous electrical property.
- the method to making a nanowire based conductive film comprises
- first material and second material has a refractive index difference less than 0.05 and second material is less conductive than the first material.
- the method step converting the first material into a second material by the chemical reagent further comprises radiating UV light without using a patterned mask.
- the method step converting the first material into a second material by the chemical reagent further comprises applying heat to the area where the second solution is deposited.
- the present invention is directed to a novel method to pattern a transparent conductive film.
- the method of patterning the conductive film comprising
- first material and second material has a refractive index difference less than 0.2 and a haze difference less than 0.2% second material is less conductive than the first material
- a film comprising a first region having metal nanowires, wherein at least some of metal nanowires are surface functionalized and are inert to oxidation or acid reaction;
- first and second region have different electrical properties, but having substantially same or similar optical properties, with difference in refractive indexes less than 0.2, and difference in haze no more than 0.2%.
- FIG. 1 is an exemplary nanowire, having a diameter of d and length L;
- FIGs 2a-e are schematic illustrations of cross section views of different nanowires in accordance with the aspects of the present invention.
- Fig. 3 is a schematic diagram of a single layer conductive film, in accordance with the aspects in the present invention.
- Fig. 4a is a cross-section diagram of an exemplary metal nanowire network on the substrate
- Fig. 4b and c are illustrations of the cross sections of the films when a second solution is printed onto the substrate and nanowire network;
- Fig. 4d is an illustration of the cross section of the film after the second solution reacted into the nanowire network.
- Fig. 5a is a cross-section diagram of an exemplary metal nanowire network on the substrate
- Fig. 5b is an illustration of the cross section of the film when a mask is positioned above the substrate and nanowire network
- Fig. 5c-d are illustrations of the cross section of the film after the UV radiation.
- Fig. 6a is an illustration of an exemplary metal nanowire
- Fig. 6b is an illustration of an exemplary metal nanowireafter acid or oxidant exposure
- Fig. 6c is an illustration of the composition of another exemplary metal nanowire in the conductive film.
- Fig. 6d is an illustration of the composition of another exemplary metal nanowire in the conductive film after the reaction with acid or oxidation.
- Fig. 7a is an illustration of an exemplary metal nanowire having self assembly monolayer for protecting metal nanowire from surface oxidization
- Fig. 7b is an illustration of an exemplary metal nanowireafter acid or oxidant exposure
- Fig. 8a is an illustration of the composition of another exemplary metal nanowire having self assembly monolayer in the conductive filmfilm
- Fig. 8b is an illustration of the composition of another exemplary metal nanowire in the conductive film after the reaction with acid or oxidation;
- FIGs. 9a-b are cross sectional SEM images of a transparent conductive electrode comprising surface functionalized metal nanowires
- FIG. 10 illustrates an exemplary patterns for inkjet printing, wherein the white lines represent where the printing lines of the etchant
- FIG. 11 shows an SEM image of a comparative example, wherein the second regions were all etched away
- FIG. 12 shows an SEM image wherein the second region is oxidized instead of all etched way
- FIG.13a is an SEM image showing the conductive film comprising surface functionalize metal nanowires after being patterned.
- FIG. 13b is a zoomed-in image of part of FIG. 13a.
- printing, wet coating and alike are all referred to the general category of a wet coating method, including inkjet printing, spray printing, nozzle printing, gravure printing, screening printing, etc. Printing and coating can be used interchangeably.
- nanowire 100 have a cylindrical shape, having a diameter d and length L as shown in Figure 1.
- the aspect ratios of nanowires are L/d. Suitable aspect ratios of the nanowires are between 100 to 100,000. In one preferred example, the aspect ratios of the nanowires are more than 1000, in order to provide a transparent conductive film, because longer and thinner nanowires may enable more efficient conductive networks while permitting lower overall density of wires for achieving a higher transparency.
- conductive nanowires include metal nanowires and non-metallic nanowires.
- 'metal nanowire' refers to a metallic wire comprising element metal and metal alloys.
- Non-metallic nanowires include, for example, carbon nanotubes (CNTs), conductive polymer fibers and the like.
- metal nanowires refers to substantially elemental metal and metal alloys.
- the metal nanowires may have less than 5-10% (by moles) of metal oxides.
- Metal oxides may exist in the metal nanowire shell or core as an impurity or defect in the nanowire synthesis.
- FIGs 2a-e are schematic illustrations of cross section views of different nanowires in accordance with the aspects of the present invention, wherein element 200 is an elemental silver and element 202 is an oxidative state of silver.
- metal oxide nanowires refers to the nanowires are substantially metal oxides.
- metal oxide nanowires may haveless than 5-10% (by moles) of elemental metal, due to incomplete oxidation or any other reasons.
- hybrid nanowires are metal/metal oxide nanowires, whereinthe nanowires, having both elemental metal and metal oxides as major components.
- Metal/metal oxide hybrid nanowires may comprise 40% (mole%) metal oxide and 60% (mole%) elemental metal.
- Metal/metal oxide hybrid nanowires may comprise 60% (mole%) metal oxide and 40% (mole%) elemental metal.
- the diameters of the metal nanowires, metal oxide nanowires, or hybrid nanowires are less than 200 nm, and less than 100 nm, and more preferably less than 50 nm.
- Suitable elemental metal employed in nanowires can be based on any metal, including without limitation, silver, gold, copper, nickel, and gold-plated silver.
- silver nanowires are used to make the conductive electrode film because of the small refractive index difference between elemental silver and silver oxide.
- the metal nanowires, metal oxide nanowires and hybrid nanowires further comprises other minor component, for example, but not limited to, seeding element from the nanowire synthesis.
- FIGs. 2a-e are schematic illustrations of the cross section views of different nanowires.
- FIG. 2a is an exemplar metal nanowire, wherein element 200 is a cross section of silver nanowire.
- FIG. 2b is an exemplar metal/metal oxide hybrid nanowire, wherein the metal oxide and metal are arranged in a core shell structure, having metal nanowire form the core and metal oxide become the shell wrapping around the core.
- FIG. 2c is an exemplar metal/metal oxide hybrid nanowire, wherein the metal oxide and metal are arranged in a pseudo core shell structure, wherein the 'core' has more elemental metal than the metal oxide and the 'shell' has more metal oxide than elemental metal.
- FIG. 2a is an exemplar metal nanowire, wherein element 200 is a cross section of silver nanowire.
- FIG. 2b is an exemplar metal/metal oxide hybrid nanowire, wherein the metal oxide and metal are arranged in a core shell structure, having metal nanowire form the core and metal oxide become the shell wrapping around the core.
- FIG. 2c occurs as the result of an oxidation reaction on a metal nanowire, wherein only the exposed elemental are oxidized and the surface of the metal nanowire does not get exposed equally to the oxidative reagent or condition.
- FIG. 2d is an exemplar metal/metal oxide hybrid nanowire, wherein the metal oxide and metal are arranged randomly, but still having a pattern that there are more metal oxide on the surface of the nanowire, and there is less metal inside the nanowire.
- FIG. 2e is an exemplar metal oxide hybrid nanowire, wherein both the core and shell of the nanowire are predominantly metal oxide.
- FIGs.2a-e are exemplar illustrations and should not be construed as limitations.
- the interfaces and boundaries between different chemical components are either visible or not visible. It is depends on the refractive index of the metal and metal oxide.
- itsresistivity is based on its diameter.
- the single metal nanowire in order for a metal nanowire to be conductive across a substrate either laterally or horizontally, the single metal nanowire (s) needs to 1) extends through a region or to 2) be connected to a number of other nanowires. Therefore the longer the single nanowire length, in principle the longer the conductive pathway. In typical examples of the present invention, an aspect ratio above 1000 is desired.
- the film formed is substantially a single layer.
- the nanowires are arranged at least above a minimal concentration, so called percolation threshold, so that the nanowires are not spaced too far apart from each other to form a conductive pathway.
- nanowire clusters When a plurality of single nanowires is networked together to form a multiple interconnected conductive pathways, said plurality of the nanowires is referred to as clusters. When two or more nanowire clusters are networked together, a conductive layer or film is formed. In accordance with the aspect of the present invention, nanowire clusters has size of less than 200 nm in one dimension, more typically less than 100 or 50 nm in one dimension.
- 'a single layer' or 'a substantial single layer' is generally less than 150 nm, which is about three-nanowire thickness. More typically, 'a single layer' or 'a substantial single layer' is generally less than 100 nm, two-nanowire thickness. Preferably,'a single layer' or 'a substantial single layer' is generally 50 nm or less, one nanowire thickness. In various embodiments, the thickness of the nano-clusters are in the range of 10 to 40 nm, 20 to 40 nm, 5 to 20 nm, 10 to 30 nm, 40 to 60 nm, 50 to 70 nm.
- the clusters are formed by nanowires isotropically or anisotropically.
- the nanoclusters can also have a pseudo diameter, pseudo length and pseudo aspect ratio.Lengthwise, anisotropic nanoclusters (e.g., a plurality networked nanowires, pseudo aspect ratio does not equal to one) are more than 500 nm, or more than 1 ⁇ m, or more than 10 ⁇ m in length.
- the lengths of the nanoclusters are in the range of 5 to 30 ⁇ m, or in the range of 15 to 50 ⁇ m, 25 to 75 ⁇ m, 30 to 60 ⁇ m, 40 to 80 ⁇ m, or 50 to 100 ⁇ m.
- conductive regions comprise interconnected or networked nanoclusters
- non-conductive region comprise segregated or isolate nanoclusters
- the metal nanowire is silver nanowire
- one silver nanowire is present in a nanocluster.
- said silver within the nanocluster is oxidized into a silver oxide nanowire.
- the interruption in the conductive pathway turned connected nanoclusters into isolated nanolusters, which further turning a region from conductive region into a nonconductive region.
- the conductive films described herein are having conductive regions andnon conductive regions. Conductive regions and nonconductive regions are together referred as patterns in the conductive film.
- the nonconductive regions are formed from the conductive regions through oxidation, photo oxidation reaction or even fragmentation reactions.
- the nonconductive regions comprise nanowires having metals in the oxidative states and metal nanowires are shorter in length than that of conductive regions (parent).
- the conductive regions typically comprise metal nanowires having high aspect ratios.
- the conductive region may further comprise metal nanowires having surface functionalization means, protecting the metal nanowires from undergo undesired oxidation, photo-oxidation or fragmentation.
- the present invention discloses patterned conductive films with excellent optical properties, electrical properties and mechanical properties.
- the patterned transparent conductive films disclosed herein have an optical transmittance higher than 90%, a haze value less than 2%, and typically less than 1%, while maintaining the sheet resistance lower than 100 Ohms/sq and typically less than 50 Ohms/sq.
- the patterned conductive film in the present invention comprises a substrate, and a substantially single layer of conductive materials deposited on top of the substrate.
- the single layer conductive material comprises one or more metal nanowires. Longer and thinner than conventional metal nanowires are employed in the film to achieve high transparency, low haze and high conductivity in the conductive region and high resolution in the patterned conductive film.
- the patterned transparent conductive film comprises nanowires having a longer than usual length and thinner than usual diameters.
- the usual length is defined as about 10-20 micrometers in length and the usual diameters are defined as about 50-100 nm in diameters in the scope of the present invention.
- Transparent conductive films in the art typically employing metal nanowires having diameters around 50-100 nm, with 10-20 micrometers in length.
- the patterned transparent conductive films disclosed in the present invention comprises metal nanowires are less than 50 nm in diameters and longer than about 20-100 micrometers.
- the patterned transparent conductive film comprises nanowires having less than 30 nm in diameters.
- the longer and thinner metal nanowires significantly reduces the amount of light scattering and the contrast between the areas having nanowires and the areas without, leading to a conductive film with lower haze.
- the longer than usual nanowires further facilitates the electron transport within the conductive region of thefilm, leading to improved electrical conductivity and reduced sheet resistance.
- the patterned transparent film comprises metal nanowires having less than 50 nm in diameters and 20-100 micrometers in length, have an optical transmittance higher than 90%, a haze value less than 0.6%, while maintaining the sheet resistance lower than 50 Ohms/sq.
- the unusual long and unusual thin metal nanowires can be made by a two-step synthesis method.
- the method disclosed in the present invention comprises a two-step process.
- a first step is a proceeding step, forming most of the nanowire nucleation seeds.
- a second step is a growing step, where the nucleation seeds grow preferentially in one dimension in a controlled manner. Further, the nucleation seeds can be purified before being used in the growing step. Subsequently, the metal nanowires collected after the growing step can be further purified to have nanowires with even narrower distribution in length and diameters.
- the two-step process has two advantages.
- the proceeding step incubates the formation of the nucleation seed, which significantly reduces the concentration of the nanowire 'growing centers'.
- the growing step is conditioned that the precursors are continuously growing in one predetermined direction in length, thus reducing the formation of junctions and branches in the metal nanowire network.
- substrate refers to a material onto which the conductive layer is coated on top of.
- the substrate can be either rigid or flexible.
- the substrate is preferred to be highly transparent in the visible wavelength.
- Exemplar rigid substrates include, glass, polycarbonates, particularly high refractive index polycarbonates, acrylics, and the like.
- Exemplar flexible substrates include, but are not limited to: polyesters (e.g., polyethylene terephthalate (PET), polyesternaphthalate (PEN), and polycarbonate, polyolefins (e.g., linear, branched, and cyclic polyolefins), and other conventional polymeric films.
- the optical transparence or clarity of the conductive film can be quantitatively defined by parameters including light transmission and haze.
- 'Light transmission' refers to the percentage of an incident light transmitted through a medium.
- the light transmission of the conductive layer is at least 90% and can be as high as 98%.
- Haze is an index of light diffusion. It refers to the percentage of the quantity of light separated from the incident light and scattered during transmission. Unlike light transmission, which is largely a property of the medium, haze is often a production concern and is typically caused by surface roughness and embedded particles or compositional heterogeneities in the medium. In various embodiments, the haze of the patterned transparent conductive film is no more than 5% and may be as low as no more than 2% to 0.5%.
- the transparent conductive film can be fabricated by any feasible wet coating method, including sheet coating, web-coating, printing, spraying, gravure printing, and slot die coating, transfer printing or lamination. If the substrate is a flexible substrate, roll to roll coating is preferred for large area and high throughput. Sheet Coating or lamination is more suitable when the conductive film is formed on top of rigid substrate, for example glass. Both roll-to-roll or sheet coating can be fully automated to dramatically reduces the cost of fabricating transparent conductive films. All the patterning methods described herein, can be run on a fully integrated line, or serially in parallel processes.
- FIG. 3 shows a patterned transparent conductive film comprising a substrate and a substantial single layer coated on the substrate.
- the single layer comprises a plurality of metal nanowires.
- the metal nanowires form a conductive network.
- the film comprises a first region and second region, which is not shown from this cross sectional view.
- the present invention is directed to a composition and method of manufacturing nanowire based conductive film.
- Said nanowire based film has a pattern invisible to the human eye. Invisible to the human eye means the interface between the regions in the patterned conductive film is not visible when observing under the visible light.
- the present invention is directed to a composition and method of manufacturing a nanowire based conductive film.
- the film comprises a first region comprising a first material and a second region comprising a second material, wherein the difference of refractive index between the first and second region is less than 0.05.
- the present invention is directed to a composition and method of manufacturing a nanowire based conductive film.
- the film comprises a first region comprising a first material and a second region comprising a second material, wherein at least one dimension of the second region is less than 10 um.
- one dimension of the second region is longer than 50 um.
- one dimension of the second region less than 5-10 um.
- the present invention is directed to a composition and method of manufacturing a nanowire based conductive film.
- the film comprises a first region comprising a first material and a second region comprising a second material, wherein the distance between one first region to another first region is longer than 5 um.
- the distance between one first region to another first region is longer than 10 um.
- the pattern comprises electrical conductive regions and electrical non-conductive regions.
- the refractive index difference between the electrical conductive region and electrical non-conductive regions is less than 0.2.
- the transmittance difference between the electrical conductive region and electrical non-conductive regions is less than 0.2.
- the hazedifferences between the electrical conductive region and electrical non-conductive regions is less than 0.3-0.5.
- the sheet resistance of electrical conductive regions are less than 300 ⁇ /sq.
- the sheet resistance of electrical non-conductive regions are more than 1000 ⁇ /sq.
- the pattern comprises electrical conductive regions and electrical non-conductive regions.
- the conductive region is converted into the non-conductive regions by an oxidation reaction.
- the first region of the film comprises silver nanowire.
- silver Upon reaction with a chemical solution, silver is converted into silver oxide, which forms the second region.
- the refractive index of the film containing silver metal is 1.6 and the refractive index of the film containing silver oxide is 1.59.
- the refractive index difference between the film containing silver metal and the film containing silver oxide is 0.01.
- the chemical solution is anything capable of oxidizing silver into silver metal, for example an oxidizing agentsolution.
- the silver is the sole or primary conductive material for the conductive region and silver oxide is the sole or primary converted material for the non-conductive region.
- the silver nanowire when it is oxidized to form the second region, it forms a silver oxide/silver hybrid nanowire ( Figure 2a-e).
- the silver oxide/silver is arranged in a core shell structure, wherein silver nanowire is the core, and the silver oxide forms the shell coating over the silver nanowire core.
- the silver oxide/silver is arranged in a pseudo core shell structure, wherein the surface of the hybrid nanowire has more silver oxide than silver, and the core of the hybrid nanowire has more elemental silver than silver oxide.
- the silver oxide is formed randomly in the silver nanowire.
- when silver is oxidized into silver oxide to form the second region, it oxidation undergo to the completion and yield silver oxide nanowire.
- the first region of the film comprises silver nanowire.
- silver Upon reaction with a chemical solution, silver is converted into a silver salt.
- the silver salt includes silver halides, silver nitrate and silver sulfate, and the like.
- the refractive index of the film containing silver metal is 1.6 and the refractive index of the film containing silver oxide is 1.59.
- the refractive index difference between the film containing silver metal and the film containing silver oxide is 0.01.
- the chemical solution is anything capable of oxidizing silver into silver metal, for example an acid solution.
- the silver is the sole or primary conductive material for the conductive region and silver oxide is the sole or primary converted material for the non-conductive region.
- the first region, an electrical conductive region, and the second region, a non-electrical conductive region, as formed based on the disclosure herein, has a conductivityratio of the conductive region over non conductive region more than 1000, and wherein the conductive region and the non conductive region are optically uniform.
- a patterned conductive film can be formed by selectively oxidizing the nanowire region.
- the oxidizing agent can be placed onto the conductive film after the film of metal nanowire is formed.
- the oxidizing agent can be mixed into the nanowire ink and made into the nanowire film.
- FIGs.4a-d illustrates an embodiment in which a conductive layer is thermally-patterned.
- FIGs. 5a-d and 6a-d illustrates an embodiment in which a conductive layer is photolytically patterned.
- thermal-patterning can be carried out using an insulating thermal mask (e.g., an aperture mask), which only exposes regions to be converted to a heat source.
- an insulating thermal mask e.g., an aperture mask
- photolytically patterning can be achieved by using a mask.
- the mask provides areas of openings and areas of shadows, wherein the openings permits the UV through to convert the metal nanowires to metal oxides while the shadows protecting the metal nanowire in the conductive region to be oxidized.
- both thermal-patterning or photolytically patterning can be achieve using a mask-less approach.
- the oxidizing agent is directly-written onto the layer or film of metal nanowire in a predetermined pattern. Applying heat or UV radiation throughout the film can only create oxidation reaction in the areas where the oxidizing chemicals are deposited, thus leading to the predetermined patterns.
- Both the photo-patterning method and thermal-patterning method are compatible with wet coating process described, which are easily scalable to large areas of substrates and offers low cost high throughput manufacturing.
- the present invention provides a method to make patterned transparent conductive film.
- the patterned transparent film comprises two regions, a first region, a conductive region and a second region, non-conductive region, wherein the first region is converted to a second region by an oxidation reaction.
- a substrate is cleaned and a first solution comprising metal nanowires, preferably silver nanowires are coated onto the substrate. After drying to remove the solvent, a film of metal nanowire network 102 is formed.
- a second solution 104 is printed onto surface of the nanowire film 102 in designated areas.
- various printing method can be used to deliver the second solution to the surface of the nanowire film.
- ink jet printing is used and distance between one conductive region to another conductive region is at least 5 um.
- screen printing is used and distance between one conductive region to another conductive region is at least 50 um.
- gravure printing is used and distance between one conductive region to another is at least 1um.
- the substrate can first be masked with photoresist patterns and then immersed into a bath of the second solution. The distance between one conductive region to another conductive region is defined by the photoresist pattern and can be at least 0.5um.
- heating is employed is facilitate the chemical oxidation from 102 to 106.
- 102 is converted into 106.
- 102 is a conductive region and 106 is non conductive region.
- 102 is a film containing silver nanowire network and 106 is the film containing metal oxides of the silver metal, or partially oxidized silver nanowires, or shorter nanowires not overlapping with each other, a less conductive or non-conductive region.
- the present invention provides a method to make patterned transparent conductive film.
- the patterned transparent film comprises two regions, a first region, a conductive region and a second region, non-conductive region, wherein the first region is converted to a second region by a reduction reaction.
- a substrate is cleaned and a first solution comprising metal oxide nanowires, preferably silver oxide nanowires or composite fibers with silver oxide are coated onto the substrate. After drying to remove the solvent, a film of metal oxide nanowire network 102 is formed.
- a second solution 104 is printed onto surface of the nanowire film 102 in designated areas.
- various printing method can be used to deliver the second solution to the surface of the nanowire film.
- ink jet printing is used and distance between one conductive region to another conductive region is at least 10 um.
- screen printing is used and distance between one conductive region to another conductive region is at least 50 um.
- gravure printing is used and distance between one conductive region to another is at least 1um.
- the substrate can first be masked with photoresist patterns and then immersed into a bath of the second solution. The distance between one conductive region to another conductive region is defined by the photoresist pattern and can be at least 0.5um.
- 102 is the oxide(s) or oxidation state of 106.
- heating is employed is facilitate the chemical reduction conversion from 102 to 106.
- 102 is converted into 106.
- 102 is a less conductive region and 106 is a more conductive region.
- the 102 is silver oxide and 106 is silver metal.
- Oxidizing agents can be anything as long as the chemical agent is strong enough to convert elemental metal to metal oxide, particularly converting silver into silver oxide.
- the oxidizing agent is a photo-acid generator.
- the advantage of using photo-acid generator over other oxidizing agent is it can be removed relatively easily after the pattern is made.
- the photo-acid generator can be directed printed onto the nanowire surface as in FIG. 4b, and the followed the process illustrated in FIGs 4a-d to create patterns.
- the photo-acid generator can be mixed with the nanowires solution and printed onto the substrate together as in FIG. 5a, and the followed the process illustrated in FIGs 5a-d to create patterns.
- the photo-acid generator can be printed as a separate player (107) onto the nanowire surface as in FIG. 6b, and the followed the process illustrated in FIGs 6a-d to create patterns.
- the present invention is directed to a composition and method of manufacturing a nanowire based conductive film.
- the film comprises a first region comprising a first material and a second region comprising a second material.
- the second material is generated from the first material by a combination of UV light and photo acid generator.
- the first region of the film comprises silver nanowire and at least one photosensitive compound.
- the photosensitive compound Upon irradiationwith UV light, the photosensitive compound degrades to generate acid, which converts silverinto silver oxide.
- the refractive index of first region containing silver metal is 1.6 and the refractive index of the silver oxide is 1.59.
- the refractive index difference between the silver metal and silver oxide is 0.01.
- the present invention provides a method to make patterned transparent conductive film.
- the patterned transparent film comprises two regions, a first region, a conductive region and a second region, less-conductive or non-conductive region, wherein the first region is converted to a second region by a photo oxidation reaction.
- a substrate is cleaned and a first solution comprising metal nanowires, preferably silver nanowires, together with at least one photo acid generator, are coated onto the substrate. After drying to remove the solvent, a film of metal nanowire network 103 comprising photo acid generator is formed.
- a mask 105 is then positioned above the surface of the nanowire film 103.
- the mask has designated openings, allowing UV light to pass through.
- the photo acid generator in the area exposed to the UV light, is activated, converting the metal nanowire into the corresponding metal oxide.
- the present invention provides a method to make patterned transparent conductive film.
- the patterned transparent film comprises two regions, a first region, a conductive region and a second region, less-conductive or non-conductive region, wherein the first region is converted to a second region by UV radiation.
- a substrate is cleaned and a first solution comprising metal nanowires, preferably silver nanowires, are coated onto the substrate. After drying to remove the solvent, a film of metal nanowire network 102 is formed.
- photo acid generator is deposited directly on top of the film 102.
- photo acid generator is homogenously spread throughout the film.
- a mask 105 is then positioned above the surface of the layer 107.
- the mask has designated openings, allowing UV light to pass through.
- the photo acid generator in the area exposed to the UV light is activated, converting the metal nanowire 102 into the corresponding metal oxide 106, as illustrated in Figure 6d.
- the final product comprises a silver nanowire region and an oxidative product of silver nanowire region.
- photo acid generator can be deposited onto the substrate by any wet coating method.
- the printing, wet coating and alike are all referred to the general category of a wet coating method, including inkjet printing, spray printing, nozzle printing, gravure printing, screening printing, etc. Printing and coating can be used interchangeably.
- photo acid generators examples include, but are not limited to,
- non-ionic and ionic photoacid generators from BASF, such as Irgacure PAG 103, Irgacure PAG 121, Irgacure PAG 203, CGI 725, CGI 1907, Irgacure 250, Irgacure PAG 290, and GSID26-1.
- the film of nanowires is first prepared on top of a substrate.
- IR laser is shined onto the film of nanowire through a photo mask while heating.
- the substrate and the nanowire film are heated at 250C for 10 min.
- the substrate and the nanowire film are heated at 300 C for 1 min. The heating temperature and time is optimized according the size of the substrate, and other process parameters and economics.
- the film of nanowire are first prepared on the top of the substrate.
- a solvent is introduced into the nanowire network.
- the solvent can be introduced by ink jet printing or spray coating through a mask, or a gravure printing.
- the solvent swells the nanowire network, changes the arrangement of the metal nanowire network by dissolving or partially dissolving the binder or other organic modifier in the film.
- the rearrangement of the metal nanowires can cause isolate nanowire clusters which makes the film less or not conductive.
- Exemplar solvent includes alcohol-based solvents, such as isopropanol.
- the present invention is directed to another method of manufacturing patterned nanowire based conductive film, wherein the patterned conductive film comprise conductive regions and non conductive regions, and the conductive regions comprise nanowires protected by surface functionalization means.
- Exemplar surface functionalization means are self assembly monolayers on the metal nanowire.
- Figures 9a and 9b are cross sectional SEM images of the transparent conductive electrodes comprising surface functionalized metal nanowires.
- the conductive film comprises a substrate;a substantially single layer on top of the substrate, wherein the single layer comprise surface functionalized metal nanowires and non-surface functionalized metal nanowires.
- the surface functionalized metal nanowires are chemically inert to the subsequent reaction with acid or other oxidation reagent.
- the non-surface functionalized metal nanowires are capable of undergoing chemical conversion when exposed to acid or other oxidative reagent.
- the surface functionalized metal nanowires form a first region of the film. After the non-surface functionalized metal nanowires are converted to the corresponding oxidative state to form a second region of the film.
- the first region is a conductive region and second region is a less conductive or non-conductive region.
- the first region comprises silver metal.
- the second region comprises silver salt.
- the second region comprises silver oxide.
- the first region contains conductive network with surface functionalized metal nanowires and non-surface functionalized metal nanowires.
- the second region comprises surface functionalized metal nanowires and converted silver salts and silver oxide.
- the first region and second region of the present embodiment have substantially same optical properties.
- the self assembly monolayers as surface functionalization means for the metal nanowires in the first region does not offer significant refractive index change.
- the patterned conductive film the difference in refractive index between the first and second region is less than 0.2, and the difference in haze is no more than 0.2%.
- first region contains silver, having a refractive index of 1.61.
- the second region contains silver oxide, having a refractive index of 1.59.
- the single layer in the patterned conductive film has surface functionalized nanowires and non-surface functionalized nanowires.
- the surface functionalized nanowire and non-surface functionalized nanowire are the different portions of the same nanowire, as shown in Figure 7a.
- the nanowire in Figure 7a can first be oxidized and then be fragment into two parts, having the surface functionalized portions de-attached from each other. This reduces the original length of the nanowire, making the converted region less conductive. If the all the nanowires in the converted region is fragmented, the average length of the nanowires in the fragmented region is less than half of the original length, which is the same average length of the first region comprising nanowires which are self assembly monolayer protected.
- the surface functionalized nanowire and non-surface functionalized nanowire are different nanowires, as shown in Figure 8a.
- the nanowire without the surface functionalization disintegrates, leaving the surface functionalized nanowires maintaining its length.
- the surface functionalized nanowire is a completely functionalized nanowire, synthesized, characterized and purified before use.
- a mixture of completely functionalized nanowire and non-surface functionalized metal nanowire in a controlled ratio is used to prepare the nanowire film in the patterned conductive film.
- the surface functionalized nanowire and non-surface functionalized nanowire are both different portions of the same nanowire as in Figure 7a and different nanowires, as shown in Figure 8a.
- some nanowires Upon oxidation or acid exposure, some nanowires disintegrates, reducing in length but some keeping its original length.
- the mixture of the nanowire can be an average or statistical mixture of the functionalized nanowire and non-surface functionalized metal nanowires.
- the present invention is directed to a method of manufacturing a patterned nanowire based conductive film.
- the film comprises a first region comprising functionalized metal nanowires and a second region comprising the oxidative state or salt of the same metal in the first region.
- the method of patterning the conductive film comprises
- a film comprising a first region having metal nanowires, wherein at least some of metal nanowires are surface functionalized and inert to oxidation or acid reactions;
- first and second region have different electrical properties, but having substantially same or similar optical properties, with difference in refractive indexes are less than 0.2, and the difference in haze is no more than 0.2%.
- the method of patterning the conductive film comprises
- a film comprising a surface functionalized silver nanowire wherein some portion of the nanowire is surface functionalized and inert to oxidation or etching,
- the randomly pitched non-surface functionalized area can occur as coverage defects or insufficient coverage of surface molecule assembly on nanowires.
- the application of heat may also be used at this point as a post-treatment.
- the patterned transparent conductive film exposed to anywhere from 80° C. to 250° C. for up to 10 min, and more preferably is exposed to anywhere from 100° C. to 160° C. for anywhere from about 10 seconds to 2 minutes.
- the transparent conductive film can also be exposed to temperatures higher than 250° C. and can be even higher, depending on the type of substrate.
- glass substrate can be heat-treated at a temperature range of about 350° C. to 400° C.
- post treatments at higher temperatures require the presence of a non-oxidative atmosphere, such as nitrogen.
- an infrared lamp could be used as either independently or together with the heating method to anneal the patterned transparent film. Again, the post anneal is recommended to perform in an inert atmosphere.
- the patterned conductive film can further comprise other functional layers, in order to meet end use applications.
- Other functional layers include an adhesive layer, anti-reflective layer, anti-glare layer, barrier layers, hard coats, and protective films. These other functional layers are employed sometimes to enhance the overall optical performance and improve the mechanical properties of the transparent conductive film.
- These additional layers also referred to as 'performance-enhancing layers', can be one or more anti-reflective layers, anti-glare layers, adhesive layers, barrier layers, and hard coats.
- one performance-enhancing layer provides multiple benefits.
- an anti-reflective layer can also function as a hard coat and/or a barrier layer.
- the performance-enhancing layers are optically clear.
- Anti-reflective layer' refers to a layer that can reduce reflection loss at a reflective surface of the transparent conductive film.
- the anti-reflective layer can therefore be positioned on the outer surfaces of the transparent conductive film.
- Materials suitable as anti-reflective layers are well known in the art, including without limitation: fluoropolymers, fluoropolymer blends or copolymers, at about 100 nm thick or 200 nm in thickness.
- Anti-glare layer' refers to a layer that reduces unwanted reflection at an outer surface of the transparent conductive film by providing fine roughness on the surface to scatter the reflection.
- Suitable anti-glare materials are well known in the art, including without limitation, siloxanes, polystyrene/PMMA blend, lacquer (e.g., butyl acetate/nitrocellulose/wax/alkyd resin), polythiophenes, polypyrroles, polyurethane, nitrocellulose, and acrylates, all of which may comprise a light diffusing material such as colloidal or fumed silica. Blends and copolymers of these materials can have microscale compositional heterogeneities, which can also exhibit light diffusion behavior to reduce glare.
- 'Hard coat', or 'anti-abrasion layer' refers to a coating that provides additional surface protection against scratches and abrasion.
- suitable hard coats include synthetic polymers such as polyacrylics, epoxy, polyurethanes, polysilanes, silicones, poly(silico-acrylic) and so on.
- the hard coat also comprises colloidal silica.
- the thickness of the hard coat is typically from about 1 to 50 ⁇ m.
- 'Adhesive layer' refers to any optically clear material that bonds two adjacent layers (e.g., conductive layer and substrate) together without affecting the physical, electrical or optical properties of either layer.
- Optically clear adhesive material are well known in the art, including without limitation: acrylic resins, chlorinated olefin resins, resins of vinyl chloride-vinyl acetate copolymer, maleic acid resins, chlorinated rubber resins, cyclorubber resins, polyamide resins, cumarone indene resins, resins of ethylene-vinyl acetate copolymer, polyester resins, urethane resins, styrene resins, polysiloxanes and the like.
- Barrier layer' refers to a layer that reduces or prevents gas or fluid permeation into the transparent conductive film. It has been shown that corroded metal nanowires can cause a significant decrease in the electrical conductivity as well as the light transmission of the conductive layer.
- the barrier layer can effectively inhibit atmospheric corrosive gas from entering the conductive layer and contacting the metal nanowires in the matrix.
- the barrier layers are well known in the art, including without limitation: see, e.g. U.S. Patent Application No. 2004/0253463, U.S. Pat. Nos. 5,560,998 and 4,927,689, EP Patent No. 132,565, and JP Patent No. 57,061,025.
- any of the anti-reflective layer, anti-glare layer and the hard coat can also act as a barrier layer.
- the patterned transparent conductive film may further comprise a protective film above the conductive layer (the layer comprise metal nanowires).
- the protective film is typically flexible and can be made of the same material as the flexible substrate. Examples of protective film include, but are not limited to: polyester, polyethylene terephthalate (PET), polybutylene terephthalate, polymethyl methacrylate (PMMA), acrylic resin, polycarbonate (PC), polystyrene, or the like; particularly preferable is PET, PC, PMMA, or TAC because of their high strength.
- the patterned transparent conductive films as described herein can be used as films in a wide variety of devices, including any device that currently makes use of transparent conductive films such as metal oxide films.
- suitable devices include flat panel displays, LCDs, touch screens, electomagneticshieldings, functional glasses (e.g., for electrochromic windows), optoelectronic devices, and the like.
- the transparent conductive films herein can be used in flexible devices, such as flexible displays and touch screens.
- 51g of PVP is first dissolved in 500 mL of glycerol solvent and heated to 150C.
- 51g of silver nitrate is dissolved in 300ml of glycerol separately to form silver nitrate solution.
- the silver nitrate solution is added to the PVP solution at a constant rate of 20ml/min for 9 minutes; this is then followed by adding the remaining portion of silver nitrate solution at 4ml/min for another 30 minutes.
- the reaction is allowed to proceed for another 3 hours before it is quenched by mixing equal volume of cold water (20C).
- the reaction mixture was then solvent exchanged by repeated centrifuge and re-dispersion in desired solvents.
- Choices of solvent for the centrifuge/re-dispersion processes is determined by the desired dispersing medium for nanowire in ink formulation, e.g. water or ethanol. Typical amount of solvent used in re-dispersion is about 50X or more of the remaining solid collected by centrifuged. The whole process is repeated at least 3 times.
- Silver nanowires (25um, 60nm) were first prepared by polyol process and followed by purification. Then 0.15g of purified nanowires was dispersed in a 50ml of binder free solvent such as ethanol or methanol or IPA to prepare a 0.3% w/v of silver nanowire dispersion.
- binder free solvent such as ethanol or methanol or IPA
- a thin layer of SNW dispersion is spun coated at 1500rpm spin speed for 30s.
- the coated substrate was baked at 100C for 1 minute.
- a layer of 1.8 %wt silica sol-gel solution was applied on top of baked sample by spin coating at 2500rpm for 10s.
- the resulted sample was further baked at 100C for 1 minute.
- the final sample comprises a PET substrate with a connected silver nanowire network buried or embedded in closely packed silica particles.
- FIG. 10 illustrates an exemplary patterns, wherein the white lines represent where the printing lines of the etchant. Appropriate heat is applied when necessary.
- FIG. 11 shows a SEM image where the second regions were all etched away.
- FIG. 12 shows a SEM image wherein the second region is oxidized instead of all etched way. Comparing FIG. 12 with FIG. 11, FIG. 12 shows clearly that patterned film is more optically uniform.
- FIG.13a is an SEM image showing the conductive film comprising surface functionalize metal nanowires after being patterned, wherein the area 102 is the first area, not being etched, and area 106 is the second area, being etched. The first area 102 is the conductive area and the second area 106is the non-conductive area.
- FIG. 13b is a zoom in image of part of FIG. 13a.FIG. 13b demonstrated that the non-conductive regions comprise shorter metal nanowires, or less metal nanowires, or more isolated nanowire clusters.
- the terms 'coupled' and 'connect' are used to connote both direct and indirect connections /couplings.
- 'having' and 'including', derivatives thereof and similar transitional terms or phrases are used synonymously with 'comprising' (i.e., all are considered 'open ended' terms)---only the phrases 'consisting of' and 'consisting
Abstract
A method for making a nanowire-based electrode having homogenous optical property and heterogeneous electrical property is disclosed. The method comprises: providing a substrate, coating a solution (103) comprising silver nanowires on to the substrate to form a layer of nanowire film; positioning a mask (105) above the nanowire film, shining UV light above the mask (105); converting the silver nanowires to silver oxides (106) by photo acid generator and UV light; annealing the film.
Description
Cross-Reference to Related Application
This application claims the benefit of U.S.
Provisional Patent Applications 61809224, 61809353 , and 61809354, US utility
application 13906330, and Chinese patent application 201310152173.0 . The
subject matter as set forth in each one of the following US utility patent
applications and Chinese patent application are incorporated herein by
reference in its entirety:
serial number 61809224, filed April 5, 2013;
serial number 61809353, filed April 6, 2013;
serial number 61809354, filed April 6, 2013;
serial number 13906330, filed may 30, 2013 and
Chinese application in 201310152173.0,file April 27,
2013.
Technical Field
This disclosure is related to a patterned transparent
conductive film having homogeneous optical properties but heterogeneous
electrical properties, and method of making the same.
Description of the Related Art
Optically clear and electrically conductive films
made from metal nanowires are promising replacement for ITO films, which are
used in various electronics devices such as LCDs, OLEDs and Solar cells.
Transparent conductive films in the display and touch
screen devices, requiring the films to be patterned to have conductive regions
and non-conductive regions, while maintaining the optical transparency.
Previously, when a transparent conductive filmconsisting of a mesh of silver
nanowires embedded into a film of substrate or bound on the substrate surface
by an adhesive layer is patterned, the difference between the optical
properties of the conductive regions (containing silver nanowire) and the
non-conductive regions of the film become visible to the human eye.
A method to patterning a film having invisible edges
between conductive and non-conductive areas is needed. One solution is to make
a conductive film having identical optical properties in both conductive and
non-conductive regions.In addition, the process of making such a patterned film
should be easy to operate, scalable, and robust.
Summary of the Invention
It is the object of the present invention, to
provide transparent conductive film having desirable electrical and optical
properties, adaptable to any substrates, and can be manufactured and patterned
in a low-cost, high-throughput process.
In one aspect of the present invention, it discloses
conductive film compositions having homogenous optical properties and
heterogeneous electrical properties.
In one embodiment, the present invention is directed
to a conductive film composition having homogenous optical property and
heterogeneous electrical property. Said film comprises a first region
comprising a first material;
a second region, comprising a second material;
wherein the refractive index difference between first
material and the second material is less than 0.2, and the haze difference is
less than 0.2, the second material is an oxidation form of the first material
and the second region is less conductive than the first region.
In another embodiment, it is described herein a
patterned transparent conductive film, comprising a substrate;
a substantial single layer on top of the substrate,
comprising
a first region comprising a network of metal
nanowires; and
a second region, comprising a metal/metal oxide
nanowire in a core shell structure, wherein the core of the nanowire comprise
element metal and the shell of the nanowire comprise metal oxide.
In a further embodiment, it is described herein a
patterned transparent conductive film, comprising
a substrate;
a substantial single layer on top of the substrate,
comprising
a first region comprising a network of metal
nanowires; and
a second region, comprising at least one nanowire
having a junction connected to another nanowire but electrically
non-conductive,
wherein the junction comprises metal oxides and
wherein the total thickness of the single layer is
about 150 nm or less and the second region has one dimension is 5-200um.
In still a further embodiment,a conductive electrode
composition having homogenous optical property and heterogeneous electrical
property, comprising
a first region, comprising a first material;
a second region, comprising a second material;
wherein the refractive index differences between the
first and second material is less than 0.2, and a haze difference no more than
0.2%, one dimension of the first region is at least 10 um, the first material
is converted to the second material by UV light and photo acid generator and
the first region is more conductive than the second region.
In yet another embodiment, it is described herein a
patterned transparent conductive film, comprising
a substrate;
a substantial single layer on top of the substrate,
comprising
a first region comprising a network of silver
nanowires and surface functionalization means for protecting the nanowire from
surface oxidation; and
a second region, comprising a plurality of silver
nanowires.
In another aspect of the present invention, it
discloses several different methodsto make conductive film compositions having
homogenous optical properties and heterogeneous electrical properties.
In one embodiment, the present invention provides a
method for making a nanowire-based film having homogenous optical property and
heterogeneous electrical property. The method to making a nanowire based
conductive film comprises
providing a substrate,
coating a first solution comprising a first material
on to the substrate to form a layer of nanowire network;
evaporating to remove the solvent in the metal
nanowire film;
printing a second solution comprising a
chemicalreagent on top of the formed metal nanowire network layer, in a
pre-determined pattern;
heating and drying to remove the solvent in the
second solution; and
converting the first material into a second material
by the chemical reagent,
wherein the first material and second material has a
refractive index difference less than 0.05 and second material is less
conductive than the first material.
The method step converting the first material into a
second material by the chemical reagent, further comprises radiating UV light
without using a patterned mask.
The method step converting the first material into a
second material by the chemical reagent, further comprises applying heat to the
area where the second solution is deposited.
In a further embodiment,the present invention is
directed to a novel method to pattern a transparent conductive film. The method
of patterning the conductive film comprising
providing a substrate,
coating a first solution comprising a first material
and a photo acid generator or photosensitive materials on to the substrate to
form a layer of nanowire film;
evaporating away the solvent in the metal nanowire
film;
positioning a mask above the metal nanowire film,
wherein the mask has some areas permitting UV light to pass through and some
areas shielding UV light away from the nanowire film;
shining UV light above the mask;
converting the first material into a second material
by the photo acid generator and UV light, wherein the first material and second
material has a refractive index difference less than 0.2 and a haze difference
less than 0.2% second material is less conductive than the first material;
and
annealing the film and removing the unreacted photo
acid generator in the area shielded by the mask.
The method to patterning an conductive film
comprising
providing a substrate,
forming a film comprising a first region having metal
nanowires, wherein at least some of metal nanowires are surface functionalized
and are inert to oxidation or acid reaction;
evaporating away the solvent in the metal nanowire
film;
exposing the nanowire film to a chemical reagent;
converting the metal in the metal nanowire network to
its oxidative state and forming a second region,
wherein the first and second region have different
electrical properties, but having substantially same or similar optical
properties, with difference in refractive indexes less than 0.2, and difference
in haze no more than 0.2%.
Brief Description of the Figures
The invention and the detailed description thereof
may be understood by reference to the following figures:
FIG. 1 is an exemplary nanowire, having a diameter
of d and length L;
FIGs 2a-e are schematic illustrations of cross
section views of different nanowires in accordance with the aspects of the
present invention;
Fig. 3 is a schematic diagram of a single layer
conductive film, in accordance with the aspects in the present invention;
Fig. 4a is a cross-section diagram of an exemplary
metal nanowire network on the substrate;
Fig. 4b and c are illustrations of the cross
sections of the films when a second solution is printed onto the substrate and
nanowire network;
Fig. 4d is an illustration of the cross section of
the film after the second solution reacted into the nanowire network.
Fig. 5a is a cross-section diagram of an exemplary
metal nanowire network on the substrate;
Fig. 5b is an illustration of the cross section of
the film when a mask is positioned above the substrate and nanowire
network;
Fig. 5c-d are illustrations of the cross section of
the film after the UV radiation.
Fig. 6a is an illustration of an exemplary metal
nanowire;
Fig. 6b is an illustration of an exemplary metal
nanowireafter acid or oxidant exposure;
Fig. 6c is an illustration of the composition of
another exemplary metal nanowire in the conductive film; and
Fig. 6d is an illustration of the composition of
another exemplary metal nanowire in the conductive film after the reaction with
acid or oxidation.
Fig. 7a is an illustration of an exemplary metal
nanowire having self assembly monolayer for protecting metal nanowire from
surface oxidization;
Fig. 7b is an illustration of an exemplary metal
nanowireafter acid or oxidant exposure;
Fig. 8a is an illustration of the composition of
another exemplary metal nanowire having self assembly monolayer in the
conductive filmfilm;
Fig. 8b is an illustration of the composition of
another exemplary metal nanowire in the conductive film after the reaction with
acid or oxidation;
FIGs. 9a-b are cross sectional SEM images of a
transparent conductive electrode comprising surface functionalized metal
nanowires;
FIG. 10 illustrates an exemplary patterns for inkjet
printing, wherein the white lines represent where the printing lines of the
etchant;
FIG. 11 shows an SEM image of a comparative example,
wherein the second regions were all etched away;
FIG. 12 shows an SEM image wherein the second region
is oxidized instead of all etched way;
FIG.13a is an SEM image showing the conductive film
comprising surface functionalize metal nanowires after being patterned; and
FIG. 13b is a zoomed-in image of part of FIG.
13a.
Detailed Description of Selected Examples
Hereinafter, selected examples of methods for making
a transparent conductive films will be discussed in the following with
reference to the accompanying drawings. It will be appreciated by those skilled
in the art that the following discussion is for illustration purposes, and
should not be interpreted as a limitation. Other variances within the scope of
this disclosure are also applicable.
General Description
'Optional' or 'optionally' means that the
subsequently described circumstance may or may not occur, so that the
description includes instances where the circumstance occurs and instances
where it does not.
In the scope of the present invention, printing, wet
coating and alike are all referred to the general category of a wet coating
method, including inkjet printing, spray printing, nozzle printing, gravure
printing, screening printing, etc. Printing and coating can be used
interchangeably.
Nanowires
In accordance with the aspects with the present
invention, nanowire 100 have a cylindrical shape, having a diameter d and
length L as shown in Figure 1. The aspect ratios of nanowires are L/d. Suitable
aspect ratios of the nanowires are between 100 to 100,000. In one preferred
example, the aspect ratios of the nanowires are more than 1000, in order to
provide a transparent conductive film, because longer and thinner nanowires may
enable more efficient conductive networks while permitting lower overall
density of wires for achieving a higher transparency.
Metal nanowires
As known in the art, conductive nanowires include
metal nanowires and non-metallic nanowires. In general, 'metal nanowire' refers
to a metallic wire comprising element metal and metal alloys. Non-metallic
nanowires include, for example, carbon nanotubes (CNTs), conductive polymer
fibers and the like.
In accordance with the aspects of the present
invention, metal nanowires refers to substantially elemental metal and metal
alloys. Optionally, the metal nanowires may have less than 5-10% (by moles) of
metal oxides. Metal oxides may exist in the metal nanowire shell or core as an
impurity or defect in the nanowire synthesis. FIGs 2a-e are schematic
illustrations of cross section views of different nanowires in accordance with
the aspects of the present invention, wherein element 200 is an elemental
silver and element 202 is an oxidative state of silver.
In accordance with the aspects of the present
invention, metal oxide nanowires refers to the nanowires are substantially
metal oxides. Optionally, metal oxide nanowires may haveless than 5-10% (by
moles) of elemental metal, due to incomplete oxidation or any other
reasons.
In accordance with the aspects of the present
invention, hybrid nanowires are metal/metal oxide nanowires, whereinthe
nanowires, having both elemental metal and metal oxides as major components.
Metal/metal oxide hybrid nanowires may comprise 40% (mole%) metal oxide and 60%
(mole%) elemental metal. Metal/metal oxide hybrid nanowires may comprise 60%
(mole%) metal oxide and 40% (mole%) elemental metal.
The diameters of the metal nanowires, metal oxide
nanowires, or hybrid nanowires are less than 200 nm, and less than 100 nm, and
more preferably less than 50 nm.
Suitable elemental metal employed in nanowires can
be based on any metal, including without limitation, silver, gold, copper,
nickel, and gold-plated silver. In one example, silver nanowires are used to
make the conductive electrode film because of the small refractive index
difference between elemental silver and silver oxide.
Optionally, the metal nanowires, metal oxide
nanowires and hybrid nanowires, further comprises other minor component, for
example, but not limited to, seeding element from the nanowire synthesis.
FIGs. 2a-e are schematic illustrations of the cross
section views of different nanowires. FIG. 2a is an exemplar metal nanowire,
wherein element 200 is a cross section of silver nanowire. FIG. 2b is an
exemplar metal/metal oxide hybrid nanowire, wherein the metal oxide and metal
are arranged in a core shell structure, having metal nanowire form the core and
metal oxide become the shell wrapping around the core. FIG. 2c is an exemplar
metal/metal oxide hybrid nanowire, wherein the metal oxide and metal are
arranged in a pseudo core shell structure, wherein the 'core' has more
elemental metal than the metal oxide and the 'shell' has more metal oxide than
elemental metal. In one example, FIG. 2c occurs as the result of an oxidation
reaction on a metal nanowire, wherein only the exposed elemental are oxidized
and the surface of the metal nanowire does not get exposed equally to the
oxidative reagent or condition. FIG. 2d is an exemplar metal/metal oxide hybrid
nanowire, wherein the metal oxide and metal are arranged randomly, but still
having a pattern that there are more metal oxide on the surface of the
nanowire, and there is less metal inside the nanowire. FIG. 2e is an exemplar
metal oxide hybrid nanowire, wherein both the core and shell of the nanowire
are predominantly metal oxide.
FIGs.2a-e are exemplar illustrations and should not
be construed as limitations. The contours of the nanowires, if are marked, it
is only intended for clarity purposes. The interfaces and boundaries between
different chemical components are either visible or not visible. It is depends
on the refractive index of the metal and metal oxide.
Optical and electrical characteristics of the
nanowires
Generally for a single nanowire, itsresistivity is
based on its diameter. The larger the diameter of the nanowire, the smaller the
resistivity or it is more conductive. However, the larger the diameter of the
nanowire, it blocks more light andbecome less transparent.Therefore an optimal
diameter range is desired in order to achieve both highly conductive and highly
transparent metal nanowires.
In addition, in order for a metal nanowire to be
conductive across a substrate either laterally or horizontally, the single
metal nanowire (s) needs to 1) extends through a region or to 2) be connected
to a number of other nanowires. Therefore the longer the single nanowire
length, in principle the longer the conductive pathway. In typical examples of
the present invention, an aspect ratio above 1000 is desired.
Conductive film
In accordance with the aspects of the present
invention, when a plurality of nanowires is deposited onto a substrate to make
a conductive film, the film formed is substantially a single layer. In the
conductive film, the nanowires are arranged at least above a minimal
concentration, so called percolation threshold, so that the nanowires are not
spaced too far apart from each other to form a conductive pathway.
When a plurality of single nanowires is networked
together to form a multiple interconnected conductive pathways, said plurality
of the nanowires is referred to as clusters. When two or more nanowire clusters
are networked together, a conductive layer or film is formed. In accordance
with the aspect of the present invention, nanowire clusters has size of less
than 200 nm in one dimension, more typically less than 100 or 50 nm in one
dimension.
As used herein, 'a single layer' or 'a substantial
single layer' is generally less than 150 nm, which is about three-nanowire
thickness. More typically, 'a single layer' or 'a substantial single layer' is
generally less than 100 nm, two-nanowire thickness. Preferably,'a single layer'
or 'a substantial single layer' is generally 50 nm or less, one nanowire
thickness. In various embodiments, the thickness of the nano-clusters are in
the range of 10 to 40 nm, 20 to 40 nm, 5 to 20 nm, 10 to 30 nm, 40 to 60 nm, 50
to 70 nm.
The clusters are formed by nanowires isotropically
or anisotropically. The nanoclusters can also have a pseudo diameter, pseudo
length and pseudo aspect ratio.Lengthwise, anisotropic nanoclusters (e.g., a
plurality networked nanowires, pseudo aspect ratio does not equal to one) are
more than 500 nm, or more than 1 μm, or more than 10 μm in length. In various
embodiments, the lengths of the nanoclusters are in the range of 5 to 30 μm, or
in the range of 15 to 50 μm, 25 to 75 μm, 30 to 60 μm, 40 to 80 μm, or 50 to
100 μm.
In accordance with the aspects of the present
invention, when the conductive film is patterned into conductive regions and
non-conductive regions, conductive regions comprise interconnected or networked
nanoclusters, whereas the non-conductive region comprise segregated or isolate
nanoclusters.
In accordance with the aspects of the present
invention, when the metal nanowire is silver nanowire, one silver nanowire is
present in a nanocluster. In one example, said silver within the nanocluster is
oxidized into a silver oxide nanowire. The interruption in the conductive
pathway turned connected nanoclusters into isolated nanolusters, which further
turning a region from conductive region into a nonconductive region.
The conductive films described herein, are having
conductive regions andnon conductive regions. Conductive regions and
nonconductive regions are together referred as patterns in the conductive film.
In accordance with aspects of the present invention, in one embodiment, the
nonconductive regions are formed from the conductive regions through oxidation,
photo oxidation reaction or even fragmentation reactions. As a result, the
nonconductive regions comprise nanowires having metals in the oxidative states
and metal nanowires are shorter in length than that of conductive regions
(parent). The conductive regions typically comprise metal nanowires having high
aspect ratios. Optionally, the conductive region may further comprise metal
nanowires having surface functionalization means, protecting the metal
nanowires from undergo undesired oxidation, photo-oxidation or
fragmentation.
In view of the foregoing discussion, the present
invention discloses patterned conductive films with excellent optical
properties, electrical properties and mechanical properties. The patterned
transparent conductive films disclosed herein have an optical transmittance
higher than 90%, a haze value less than 2%, and typically less than 1%, while
maintaining the sheet resistance lower than 100 Ohms/sq and typically less than
50 Ohms/sq.
Super long and thin nanowires
The patterned conductive film in the present
invention comprises a substrate, and a substantially single layer of conductive
materials deposited on top of the substrate. The single layer conductive
material comprises one or more metal nanowires. Longer and thinner than
conventional metal nanowires are employed in the film to achieve high
transparency, low haze and high conductivity in the conductive region and high
resolution in the patterned conductive film.
In one embodiment of the present invention, the
patterned transparent conductive film comprises nanowires having a longer than
usual length and thinner than usual diameters. The usual length is defined as
about 10-20 micrometers in length and the usual diameters are defined as about
50-100 nm in diameters in the scope of the present invention.
Transparent conductive films in the art typically
employing metal nanowires having diameters around 50-100 nm, with 10-20
micrometers in length. The patterned transparent conductive films disclosed in
the present invention, comprises metal nanowires are less than 50 nm in
diameters and longer than about 20-100 micrometers. In one preferred example of
the present invention, the patterned transparent conductive film comprises
nanowires having less than 30 nm in diameters. The longer and thinner metal
nanowires significantly reduces the amount of light scattering and the contrast
between the areas having nanowires and the areas without, leading to a
conductive film with lower haze. In addition, the longer than usual nanowires
further facilitates the electron transport within the conductive region of
thefilm, leading to improved electrical conductivity and reduced sheet
resistance. In the examples of the present invention, the patterned transparent
film comprises metal nanowires having less than 50 nm in diameters and 20-100
micrometers in length, have an optical transmittance higher than 90%, a haze
value less than 0.6%, while maintaining the sheet resistance lower than 50
Ohms/sq.
The unusual long and unusual thin metal nanowires
can be made by a two-step synthesis method. Apart from the conventional one
step process of making metal nanowires in the art, which typically lead to
metal nanowires 80-100 nm in diameters and 20-30 micrometers in length, the
method disclosed in the present invention comprises a two-step process. A first
step is a proceeding step, forming most of the nanowire nucleation seeds. A
second step is a growing step, where the nucleation seeds grow preferentially
in one dimension in a controlled manner. Further, the nucleation seeds can be
purified before being used in the growing step. Subsequently, the metal
nanowires collected after the growing step can be further purified to have
nanowires with even narrower distribution in length and diameters. Comparing
the conventional one step method, the two-step process has two advantages.
First, the proceeding step incubates the formation of the nucleation seed,
which significantly reduces the concentration of the nanowire 'growing
centers'. Second, the growing step is conditioned that the precursors are
continuously growing in one predetermined direction in length, thus reducing
the formation of junctions and branches in the metal nanowire network.
Substrate
In accordance with the aspects of the present
invention, substrate refers to a material onto which the conductive layer is
coated on top of. The substrate can be either rigid or flexible. The substrate
is preferred to be highly transparent in the visible wavelength. Exemplar rigid
substrates include, glass, polycarbonates, particularly high refractive index
polycarbonates, acrylics, and the like. Exemplar flexible substrates include,
but are not limited to: polyesters (e.g., polyethylene terephthalate (PET),
polyesternaphthalate (PEN), and polycarbonate, polyolefins (e.g., linear,
branched, and cyclic polyolefins), and other conventional polymeric films.
Properties of a the patterned film
Typically, the optical transparence or clarity of
the conductive film can be quantitatively defined by parameters including light
transmission and haze. 'Light transmission' refers to the percentage of an
incident light transmitted through a medium. In various embodiments, the light
transmission of the conductive layer is at least 90% and can be as high as
98%.
Haze is an index of light diffusion. It refers to
the percentage of the quantity of light separated from the incident light and
scattered during transmission. Unlike light transmission, which is largely a
property of the medium, haze is often a production concern and is typically
caused by surface roughness and embedded particles or compositional
heterogeneities in the medium. In various embodiments, the haze of the
patterned transparent conductive film is no more than 5% and may be as low as
no more than 2% to 0.5%.
Wet coating process
The transparent conductive film can be fabricated
by any feasible wet coating method, including sheet coating, web-coating,
printing, spraying, gravure printing, and slot die coating, transfer printing
or lamination. If the substrate is a flexible substrate, roll to roll coating
is preferred for large area and high throughput. Sheet Coating or lamination is
more suitable when the conductive film is formed on top of rigid substrate, for
example glass. Both roll-to-roll or sheet coating can be fully automated to
dramatically reduces the cost of fabricating transparent conductive films. All
the patterning methods described herein, can be run on a fully integrated line,
or serially in parallel processes.
As an illustrative example, FIG. 3 shows a
patterned transparent conductive film comprising a substrate and a substantial
single layer coated on the substrate. The single layer comprises a plurality of
metal nanowires. The metal nanowires form a conductive network. The film
comprises a first region and second region, which is not shown from this cross
sectional view.
The present invention is directed to a composition
and method of manufacturing nanowire based conductive film. Said nanowire based
film has a pattern invisible to the human eye. Invisible to the human eye means
the interface between the regions in the patterned conductive film is not
visible when observing under the visible light.
The present invention is directed to a composition
and method of manufacturing a nanowire based conductive film. The film
comprises a first region comprising a first material and a second region
comprising a second material, wherein the difference of refractive index
between the first and second region is less than 0.05.
The present invention is directed to a composition
and method of manufacturing a nanowire based conductive film. The film
comprises a first region comprising a first material and a second region
comprising a second material, wherein at least one dimension of the second
region is less than 10 um. Optionally, one dimension of the second region is
longer than 50 um. Optionally, one dimension of the second region less than
5-10 um.
The present invention is directed to a composition
and method of manufacturing a nanowire based conductive film. The film
comprises a first region comprising a first material and a second region
comprising a second material, wherein the distance between one first region to
another first region is longer than 5 um. Optionally, the distance between one
first region to another first region is longer than 10 um.
The pattern comprises electrical conductive regions
and electrical non-conductive regions. The refractive index difference between
the electrical conductive region and electrical non-conductive regions is less
than 0.2. The transmittance difference between the electrical conductive region
and electrical non-conductive regions is less than 0.2. The hazedifferences
between the electrical conductive region and electrical non-conductive regions
is less than 0.3-0.5.The sheet resistance of electrical conductive regions are
less than 300 Ω /sq. The sheet resistance of electrical non-conductive regions
are more than 1000 Ω /sq.
The pattern comprises electrical conductive regions
and electrical non-conductive regions. The conductive region is converted into
the non-conductive regions by an oxidation reaction.
In one example of the present invention, the first
region of the film comprises silver nanowire. Upon reaction with a chemical
solution, silver is converted into silver oxide, which forms the second region.
The refractive index of the film containing silver metal is 1.6 and the
refractive index of the film containing silver oxide is 1.59. The refractive
index difference between the film containing silver metal and the film
containing silver oxide is 0.01. The chemical solution is anything capable of
oxidizing silver into silver metal, for example an oxidizing agentsolution. The
silver is the sole or primary conductive material for the conductive region and
silver oxide is the sole or primary converted material for the non-conductive
region.
In a further example, when the silver nanowire is
oxidized to form the second region, it forms a silver oxide/silver hybrid
nanowire (Figure 2a-e). In one instance of the present example, the silver
oxide/silver is arranged in a core shell structure, wherein silver nanowire is
the core, and the silver oxide forms the shell coating over the silver nanowire
core. In another instance of the present invention, the silver oxide/silver is
arranged in a pseudo core shell structure, wherein the surface of the hybrid
nanowire has more silver oxide than silver, and the core of the hybrid nanowire
has more elemental silver than silver oxide. In still another instance of the
present invention, the silver oxide is formed randomly in the silver nanowire.
In yet another instance, when silver is oxidized into silver oxide to form the
second region, it oxidation undergo to the completion and yield silver oxide
nanowire.
In one example of the present invention, the first
region of the film comprises silver nanowire. Upon reaction with a chemical
solution, silver is converted into a silver salt. Examples of the silver salt
includes silver halides, silver nitrate and silver sulfate, and the like. The
refractive index of the film containing silver metal is 1.6 and the refractive
index of the film containing silver oxide is 1.59. The refractive index
difference between the film containing silver metal and the film containing
silver oxide is 0.01. The chemical solution is anything capable of oxidizing
silver into silver metal, for example an acid solution. The silver is the sole
or primary conductive material for the conductive region and silver oxide is
the sole or primary converted material for the non-conductive region.
The first region, an electrical conductive region,
and the second region, a non-electrical conductive region, as formed based on
the disclosure herein, has a conductivityratio of the conductive region over
non conductive region more than 1000, and wherein the conductive region and the
non conductive region are optically uniform.
Methods 1-3
A patterned conductive film can be formed by
selectively oxidizing the nanowire region. The oxidizing agent can be placed
onto the conductive film after the film of metal nanowire is formed.
Alternative, the oxidizing agent can be mixed into the nanowire ink and made
into the nanowire film.
The curing process can be carried out
photolytically or thermally. FIGs.4a-d illustrates an embodiment in which a
conductive layer is thermally-patterned. FIGs. 5a-d and 6a-d illustrates an
embodiment in which a conductive layer is photolytically patterned.
In some embodiments, thermal-patterning can be
carried out using an insulating thermal mask (e.g., an aperture mask), which
only exposes regions to be converted to a heat source.
In other embodiments, photolytically patterning can
be achieved by using a mask. In such a process, the mask provides areas of
openings and areas of shadows, wherein the openings permits the UV through to
convert the metal nanowires to metal oxides while the shadows protecting the
metal nanowire in the conductive region to be oxidized.
Alternatively, both thermal-patterning or
photolytically patterning can be achieve using a mask-less approach. In a
mask-less approach, the oxidizing agentis directly-written onto the layer or
film of metal nanowire in a predetermined pattern. Applying heat or UV
radiation throughout the film can only create oxidation reaction in the areas
where the oxidizing chemicals are deposited, thus leading to the predetermined
patterns.
Both the photo-patterning method and
thermal-patterning method are compatible with wet coating process described,
which are easily scalable to large areas of substrates and offers low cost high
throughput manufacturing.
The present invention provides a method to make
patterned transparent conductive film. The patterned transparent film comprises
two regions, a first region, a conductive region and a second region,
non-conductive region, wherein the first region is converted to a second region
by an oxidation reaction.
First, a substrate is cleaned and a first solution
comprising metal nanowires, preferably silver nanowires are coated onto the
substrate. After drying to remove the solvent, a film of metal nanowire network
102 is formed.
Referring to Figure 4b, then a second solution 104
is printed onto surface of the nanowire film 102 in designated areas. Depends
on the resolution and throughput requirement, various printing method can be
used to deliver the second solution to the surface of the nanowire film. In one
example, ink jet printing is used and distance between one conductive region to
another conductive region is at least 5 um. In another example, screen printing
is used and distance between one conductive region to another conductive region
is at least 50 um. In another example, gravure printing is used and distance
between one conductive region to another is at least 1um. In another example,
the substrate can first be masked with photoresist patterns and then immersed
into a bath of the second solution. The distance between one conductive region
to another conductive region is defined by the photoresist pattern and can be
at least 0.5um.
Upon drying, the solvent in the second solution is
evaporated and the area contacted with solution 104 is converted to 106,
wherein 102 and 106 has different chemical composition.
Optionally, refer to Figure 3, before the solvent
of the second solution 104 is evaporated, heating is employed is facilitate the
chemical oxidation from 102 to 106.
After the removal of solution 104, 102 is converted
into 106. In one example, 102 is a conductive region and 106 is non conductive
region. 102 is a film containing silver nanowire network and 106 is the film
containing metal oxides of the silver metal, or partially oxidized silver
nanowires, or shorter nanowires not overlapping with each other, a less
conductive or non-conductive region.
The present invention provides a method to make
patterned transparent conductive film. The patterned transparent film comprises
two regions, a first region, a conductive region and a second region,
non-conductive region, wherein the first region is converted to a second region
by a reduction reaction.
First, a substrate is cleaned and a first solution
comprising metal oxide nanowires, preferably silver oxide nanowires or
composite fibers with silver oxide are coated onto the substrate. After drying
to remove the solvent, a film of metal oxide nanowire network 102 is
formed.
Referring to Figure 4b, then a second solution 104
is printed onto surface of the nanowire film 102 in designated areas. Depends
on the resolution and throughput requirement, various printing method can be
used to deliver the second solution to the surface of the nanowire film. In one
example, ink jet printing is used and distance between one conductive region to
another conductive region is at least 10 um. In another example, screen
printing is used and distance between one conductive region to another
conductive region is at least 50 um. . In another example, gravure printing is
used and distance between one conductive region to another is at least 1um. In
another example, the substrate can first be masked with photoresist patterns
and then immersed into a bath of the second solution. The distance between one
conductive region to another conductive region is defined by the photoresist
pattern and can be at least 0.5um.
Upon drying, the solvent in the second solution is
evaporated and the area contacted with solution 104 is converted to 106,
wherein 102 and 106 has different chemical composition, 102 is the oxide(s) or
oxidation state of 106.
Optionally, refer to Figure 4c, before the solvent
of the second solution 104 is evaporated, heating is employed is facilitate the
chemical reduction conversion from 102 to 106.
After the removal of solution 104, 102 is converted
into 106. In one example, 102 is a less conductive region and 106 is a more
conductive region. In one preferred example, the 102 is silver oxide and 106 is
silver metal.
Oxidizing agents
Oxidizing agents can be anything as long as the
chemical agent is strong enough to convert elemental metal to metal oxide,
particularly converting silver into silver oxide. In one preferred example, the
oxidizing agent is a photo-acid generator. The advantage of using photo-acid
generator over other oxidizing agent is it can be removed relatively easily
after the pattern is made. The photo-acid generator can be directed printed
onto the nanowire surface as in FIG. 4b, and the followed the process
illustrated in FIGs 4a-d to create patterns. Or the photo-acid generator can be
mixed with the nanowires solution and printed onto the substrate together as in
FIG. 5a, and the followed the process illustrated in FIGs 5a-d to create
patterns. Or the photo-acid generator can be printed as a separate player (107)
onto the nanowire surface as in FIG. 6b, and the followed the process
illustrated in FIGs 6a-d to create patterns.
Example 1 of using a photo acid generator
In some embodiments, the present invention is
directed to a composition and method of manufacturing a nanowire based
conductive film. The film comprises a first region comprising a first material
and a second region comprising a second material. In some examples, the second
material is generated from the first material by a combination of UV light and
photo acid generator.
In one example of the present invention, the first
region of the film comprises silver nanowire and at least one photosensitive
compound. Upon irradiationwith UV light, the photosensitive compound degrades
to generate acid, which converts silverinto silver oxide. The refractive index
of first region containing silver metal is 1.6 and the refractive index of the
silver oxide is 1.59. The refractive index difference between the silver metal
and silver oxide is 0.01.
The present invention provides a method to make
patterned transparent conductive film. The patterned transparent film comprises
two regions, a first region, a conductive region and a second region,
less-conductive or non-conductive region, wherein the first region is converted
to a second region by a photo oxidation reaction.
First, a substrate is cleaned and a first solution
comprising metal nanowires, preferably silver nanowires, together with at least
one photo acid generator, are coated onto the substrate. After drying to remove
the solvent, a film of metal nanowire network 103 comprising photo acid
generator is formed.
Referring to Figure 5b, then a mask 105 is then
positioned above the surface of the nanowire film 103. The mask has designated
openings, allowing UV light to pass through.
Upon UV radiation, referring to Figure 5c, the
photo acid generator, in the area exposed to the UV light, is activated,
converting the metal nanowire into the corresponding metal oxide.
After the oxidation reaction, heating the film
decompose unreacted photo acid generator as shown in Figure 5d. 103 is
converted into a metal nanowire network 102. The film is absent from photo acid
generator.
Example 2 of using a photo acid generator
The present invention provides a method to make
patterned transparent conductive film. The patterned transparent film comprises
two regions, a first region, a conductive region and a second region,
less-conductive or non-conductive region, wherein the first region is converted
to a second region by UV radiation.
First, as shown in Figure 6a, a substrate is
cleaned and a first solution comprising metal nanowires, preferably silver
nanowires, are coated onto the substrate. After drying to remove the solvent, a
film of metal nanowire network 102 is formed.
Referring to Figure 6b, subsequently, another layer
107 comprising photo acid generator is deposited directly on top of the film
102. In the film 107, photo acid generator is homogenously spread throughout
the film.
Then, a mask 105 is then positioned above the
surface of the layer 107. The mask has designated openings, allowing UV light
to pass through. The photo acid generator in the area exposed to the UV light
is activated, converting the metal nanowire 102 into the corresponding metal
oxide 106, as illustrated in Figure 6d.
After the oxidation reaction, unreacted photo acid
generator 107 as shown in Figure 8, is washed away or decomposed by heating.
The final product comprises a silver nanowire region and an oxidative product
of silver nanowire region.
In accordance with the present invention, photo
acid generator can be deposited onto the substrate by any wet coating method.
The printing, wet coating and alike are all referred to the general category of
a wet coating method, including inkjet printing, spray printing, nozzle
printing, gravure printing, screening printing, etc. Printing and coating can
be used interchangeably.
Examples of photo acid generators include, but are
not limited to,
the non-ionic and ionic photoacid generators from
BASF, such as Irgacure PAG 103, Irgacure PAG 121, Irgacure PAG 203, CGI 725,
CGI 1907, Irgacure 250, Irgacure PAG 290, and GSID26-1.
In one embodiment of the present invention, the
film of nanowires is first prepared on top of a substrate. IR laser is shined
onto the film of nanowire through a photo mask while heating. In one example,
the substrate and the nanowire film are heated at 250C for 10 min. In another
example, the substrate and the nanowire film are heated at 300 C for 1 min. The
heating temperature and time is optimized according the size of the substrate,
and other process parameters and economics.
In another embodiment of the present invention, the
film of nanowire are first prepared on the top of the substrate. After drying,
a solvent is introduced into the nanowire network. The solvent can be
introduced by ink jet printing or spray coating through a mask, or a gravure
printing.The solvent swells the nanowire network, changes the arrangement of
the metal nanowire network by dissolving or partially dissolving the binder or
other organic modifier in the film. As a result the rearrangement of the metal
nanowires can cause isolate nanowire clusters which makes the film less or not
conductive. Exemplar solvent includes alcohol-based solvents, such as
isopropanol.
Method 5-Surface functionalization
To provide further resolution into patterning, the
present invention is directed to another method of manufacturing patterned
nanowire based conductive film, wherein the patterned conductive film comprise
conductive regions and non conductive regions, and the conductive regions
comprise nanowires protected by surface functionalization means. Exemplar
surface functionalization means are self assembly monolayers on the metal
nanowire. Figures 9a and 9b are cross sectional SEM images of the transparent
conductive electrodes comprising surface functionalized metal nanowires.
In one embodiment of the present invention, it is
directed to a material composition of the conductive film. The conductive film
comprises a substrate;a substantially single layer on top of the substrate,
wherein the single layer comprise surface functionalized metal nanowires and
non-surface functionalized metal nanowires. The surface functionalized metal
nanowires are chemically inert to the subsequent reaction with acid or other
oxidation reagent. The non-surface functionalized metal nanowires are capable
of undergoing chemical conversion when exposed to acid or other oxidative
reagent.
The surface functionalized metal nanowires form a
first region of the film. After the non-surface functionalized metal nanowires
are converted to the corresponding oxidative state to form a second region of
the film. The first region is a conductive region and second region is a less
conductive or non-conductive region. In one example, the first region comprises
silver metal. In another example, the second region comprises silver salt. In
still another example, the second region comprises silver oxide. The first
region contains conductive network with surface functionalized metal nanowires
and non-surface functionalized metal nanowires. The second region comprises
surface functionalized metal nanowires and converted silver salts and silver
oxide.
The first region and second region of the present
embodiment have substantially same optical properties. In another words the
self assembly monolayers as surface functionalization means for the metal
nanowires in the first region does not offer significant refractive index
change. The patterned conductive film the difference in refractive index
between the first and second region is less than 0.2, and the difference in
haze is no more than 0.2%. In one example first region contains silver, having
a refractive index of 1.61. In another example, the second region contains
silver oxide, having a refractive index of 1.59.
The single layer in the patterned conductive film
has surface functionalized nanowires and non-surface functionalized
nanowires.
In one example, the surface functionalized nanowire
and non-surface functionalized nanowire are the different portions of the same
nanowire, as shown in Figure 7a. Upon oxidation or acid exposure, referring to
Figure 7b, the nanowire in Figure 7a can first be oxidized and then be fragment
into two parts, having the surface functionalized portions de-attached from
each other. This reduces the original length of the nanowire, making the
converted region less conductive. If the all the nanowires in the converted
region is fragmented, the average length of the nanowires in the fragmented
region is less than half of the original length, which is the same average
length of the first region comprising nanowires which are self assembly
monolayer protected.
In another example, the surface functionalized
nanowire and non-surface functionalized nanowire are different nanowires, as
shown in Figure 8a. Upon oxidation or acid exposure, referring to Figure 8b,
the nanowire without the surface functionalization disintegrates, leaving the
surface functionalized nanowires maintaining its length. The surface
functionalized nanowire is a completely functionalized nanowire, synthesized,
characterized and purified before use. A mixture of completely functionalized
nanowire and non-surface functionalized metal nanowire in a controlled ratio is
used to prepare the nanowire film in the patterned conductive film.
In still another example, the surface
functionalized nanowire and non-surface functionalized nanowire are both
different portions of the same nanowire as in Figure 7a and different
nanowires, as shown in Figure 8a. Upon oxidation or acid exposure, some
nanowires disintegrates, reducing in length but some keeping its original
length. The mixture of the nanowire can be an average or statistical mixture of
the functionalized nanowire and non-surface functionalized metal nanowires.
The present invention is directed to a method of
manufacturing a patterned nanowire based conductive film. The film comprises a
first region comprising functionalized metal nanowires and a second region
comprising the oxidative state or salt of the same metal in the first
region.
In one embodiment of the present invention, the
method of patterning the conductive film comprises
providing a substrate,
forming a film comprising a first region having
metal nanowires, wherein at least some of metal nanowires are surface
functionalized and inert to oxidation or acid reactions;
evaporating away the solvent in the metal nanowire
film;
exposing the nanowire film to a chemical
reagent;
converting the metal in the metal nanowire network
to its oxidative state and forming a second region,
wherein the first and second region have different
electrical properties, but having substantially same or similar optical
properties, with difference in refractive indexes are less than 0.2, and the
difference in haze is no more than 0.2%.
In one embodiment of the present invention, the
method of patterning the conductive film comprises
providing a substrate,
forming a film comprising a surface functionalized
silver nanowire wherein some portion of the nanowire is surface functionalized
and inert to oxidation or etching,
exposing the film to etchants or oxidants and
reacting the nanowire with oxidants/acids,
disintegrating the unprotected non-surface
functionalized nanowire into segments; wherein the arrangement of surface
functionalized portions and non-surface functionalized portions on a nanowire
can be regularly or randomly pitched.
The randomly pitched non-surface functionalized
area can occur as coverage defects or insufficient coverage of surface molecule
assembly on nanowires.
Post treatment of the patterned transparent
conductive film
After the transparent conductive film is patterned
into desired conductive regions and non conductive regions, the application of
heat may also be used at this point as a post-treatment. Typically, the
patterned transparent conductive film exposed to anywhere from 80° C. to 250°
C. for up to 10 min, and more preferably is exposed to anywhere from 100° C. to
160° C. for anywhere from about 10 seconds to 2 minutes. The transparent
conductive film can also be exposed to temperatures higher than 250° C. and can
be even higher, depending on the type of substrate. For example, glass
substrate can be heat-treated at a temperature range of about 350° C. to 400°
C. However, post treatments at higher temperatures (e.g., higher than 250° C.)
require the presence of a non-oxidative atmosphere, such as nitrogen.
In another examples, an infrared lamp could be used
as either independently or together with the heating method to anneal the
patterned transparent film. Again, the post anneal is recommended to perform in
an inert atmosphere.
Other functional layers
The patterned conductive film can further comprise
other functional layers, in order to meet end use applications. Other
functional layers include an adhesive layer, anti-reflective layer, anti-glare
layer, barrier layers, hard coats, and protective films. These other functional
layers are employed sometimes to enhance the overall optical performance and
improve the mechanical properties of the transparent conductive film. These
additional layers, also referred to as 'performance-enhancing layers', can be
one or more anti-reflective layers, anti-glare layers, adhesive layers, barrier
layers, and hard coats. In certain embodiments, one performance-enhancing layer
provides multiple benefits. For example, an anti-reflective layer can also
function as a hard coat and/or a barrier layer. In addition to their specific
properties, the performance-enhancing layers are optically clear.
'Anti-reflective layer' refers to a layer that can
reduce reflection loss at a reflective surface of the transparent conductive
film. The anti-reflective layer can therefore be positioned on the outer
surfaces of the transparent conductive film. Materials suitable as
anti-reflective layers are well known in the art, including without limitation:
fluoropolymers, fluoropolymer blends or copolymers, at about 100 nm thick or
200 nm in thickness.
'Anti-glare layer' refers to a layer that reduces
unwanted reflection at an outer surface of the transparent conductive film by
providing fine roughness on the surface to scatter the reflection. Suitable
anti-glare materials are well known in the art, including without limitation,
siloxanes, polystyrene/PMMA blend, lacquer (e.g., butyl
acetate/nitrocellulose/wax/alkyd resin), polythiophenes, polypyrroles,
polyurethane, nitrocellulose, and acrylates, all of which may comprise a light
diffusing material such as colloidal or fumed silica. Blends and copolymers of
these materials can have microscale compositional heterogeneities, which can
also exhibit light diffusion behavior to reduce glare.
'Hard coat', or 'anti-abrasion layer' refers to a
coating that provides additional surface protection against scratches and
abrasion. Examples of suitable hard coats include synthetic polymers such as
polyacrylics, epoxy, polyurethanes, polysilanes, silicones,
poly(silico-acrylic) and so on. Typically, the hard coat also comprises
colloidal silica. The thickness of the hard coat is typically from about 1 to
50 μm.
'Adhesive layer' refers to any optically clear
material that bonds two adjacent layers (e.g., conductive layer and substrate)
together without affecting the physical, electrical or optical properties of
either layer. Optically clear adhesive material are well known in the art,
including without limitation: acrylic resins, chlorinated olefin resins, resins
of vinyl chloride-vinyl acetate copolymer, maleic acid resins, chlorinated
rubber resins, cyclorubber resins, polyamide resins, cumarone indene resins,
resins of ethylene-vinyl acetate copolymer, polyester resins, urethane resins,
styrene resins, polysiloxanes and the like.
'Barrier layer' refers to a layer that reduces or
prevents gas or fluid permeation into the transparent conductive film. It has
been shown that corroded metal nanowires can cause a significant decrease in
the electrical conductivity as well as the light transmission of the conductive
layer. The barrier layer can effectively inhibit atmospheric corrosive gas from
entering the conductive layer and contacting the metal nanowires in the matrix.
The barrier layers are well known in the art, including without limitation:
see, e.g. U.S. Patent Application No. 2004/0253463, U.S. Pat. Nos. 5,560,998
and 4,927,689, EP Patent No. 132,565, and JP Patent No. 57,061,025. Moreover,
any of the anti-reflective layer, anti-glare layer and the hard coat can also
act as a barrier layer.
In certain embodiments, the patterned transparent
conductive film may further comprise a protective film above the conductive
layer (the layer comprise metal nanowires). The protective film is typically
flexible and can be made of the same material as the flexible substrate.
Examples of protective film include, but are not limited to: polyester,
polyethylene terephthalate (PET), polybutylene terephthalate, polymethyl
methacrylate (PMMA), acrylic resin, polycarbonate (PC), polystyrene, or the
like; particularly preferable is PET, PC, PMMA, or TAC because of their high
strength.
In devices
The patterned transparent conductive films as
described herein can be used as films in a wide variety of devices, including
any device that currently makes use of transparent conductive films such as
metal oxide films. Examples of suitable devices include flat panel displays,
LCDs, touch screens, electomagneticshieldings, functional glasses (e.g., for
electrochromic windows), optoelectronic devices, and the like. In addition, the
transparent conductive films herein can be used in flexible devices, such as
flexible displays and touch screens.
Example 1 Synthesis of Silver Nanowires
51g of PVP is first dissolved in 500 mL of glycerol
solvent and heated to 150C. In the meantime, 51g of silver nitrate is dissolved
in 300ml of glycerol separately to form silver nitrate solution. Then, the
silver nitrate solution is added to the PVP solution at a constant rate of
20ml/min for 9 minutes; this is then followed by adding the remaining portion
of silver nitrate solution at 4ml/min for another 30 minutes. The reaction is
allowed to proceed for another 3 hours before it is quenched by mixing equal
volume of cold water (20C). The reaction mixture was then solvent exchanged by
repeated centrifuge and re-dispersion in desired solvents. Choices of solvent
for the centrifuge/re-dispersion processes is determined by the desired
dispersing medium for nanowire in ink formulation, e.g. water or ethanol.
Typical amount of solvent used in re-dispersion is about 50X or more of the
remaining solid collected by centrifuged. The whole process is repeated at
least 3 times.
Example 2 Preparation of a Transparent Conductive
film
Silver nanowires (25um, 60nm) were first prepared
by polyol process and followed by purification. Then 0.15g of purified
nanowires was dispersed in a 50ml of binder free solvent such as ethanol or
methanol or IPA to prepare a 0.3% w/v of silver nanowire dispersion.
On a PET substrate, a thin layer of SNW dispersion
is spun coated at 1500rpm spin speed for 30s. The coated substrate was baked at
100C for 1 minute. A layer of 1.8 %wt silica sol-gel solution was applied on
top of baked sample by spin coating at 2500rpm for 10s. The resulted sample was
further baked at 100C for 1 minute.
The final sample comprises a PET substrate with a
connected silver nanowire network buried or embedded in closely packed silica
particles.
Examplesof Patterning of Conductive Layers by
inkjet printing
Prepare etching solution and place the solution
into ink containers of the inkjet printing cartridges. Adjust the inkjet
printer to appropriate values, select a desired pattern to be printed and lay
different patterns on top of each other if necessary to achieve accurate
patterns. FIG. 10 illustrates an exemplary patterns, wherein the white lines
represent where the printing lines of the etchant. Appropriate heat is applied
when necessary.
FIG. 11shows a SEM image where the second regions
were all etched away. FIG. 12 shows a SEM image wherein the second region is
oxidized instead of all etched way. Comparing FIG. 12 with FIG. 11, FIG. 12
shows clearly that patterned film is more optically uniform.
FIG.13a is an SEM image showing the conductive film
comprising surface functionalize metal nanowires after being patterned, wherein
the area 102 is the first area, not being etched, and area 106 is the second
area, being etched. The first area 102 is the conductive area and the second
area 106is the non-conductive area. FIG. 13b is a zoom in image of part of FIG.
13a.FIG. 13b demonstrated that the non-conductive regions comprise shorter
metal nanowires, or less metal nanowires, or more isolated nanowire
clusters.
It will be appreciated by those skilled in the art
that the above discussion is for demonstration purpose; and the examples
discussed above are some of many possible
examples. Other variations are also applicable. Any
reference in this specification to 'one embodiment,' 'an embodiment,' 'example
embodiment,' etc., means that a particular feature, structure, or
characteristic described in connection with the embodiment is included in at
least one embodiment of the invention. The appearances of
such phrases in various places in the specification
are not necessarily all referring to the same embodiment. Further, when a
particular feature, structure, or characteristic is described in connection
with any embodiment, it is submitted that it is within the purview of one
skilled in the art to affect such feature, structure, or characteristic in
connection with other ones of the embodiments. Furthermore, for ease of
understanding, certain method procedures may have been delineated as separate
procedures; however, these separately delineated procedures should not be
construed as necessarily order dependent in their performance. That is, some
procedures may be able to be performed in an alternative ordering,
simultaneously, etc. In addition, exemplary diagrams illustrate various methods
in accordance with embodiments of the present disclosure. Such exemplary method
embodiments are described herein using and can be applied to corresponding
apparatus embodiments, however, the method embodiments are not intended to be
limited thereby. Although few embodiments of the present invention
have been illustrated and described, it would be
appreciated by those skilled in the art that changes may be made in these
embodiments without departing from the principles and spirit of the invention.
The foregoing embodiments are therefore to be considered in all respects
illustrative rather than limiting on the invention described herein. Scope of
the invention is thus indicated by the appended claims rather than by the
foregoing description, and all changes, which come within the meaning and range
of equivalency of the claims, are intended to be embraced therein. As used in
this disclosure, the term 'preferably' is non-exclusive and means 'preferably,
but not limited to.' Terms in the claims should be given their broadest
interpretation consistent with the general inventive concept as set forth in
this description. For example, the terms 'coupled' and 'connect' (and
derivations thereof) are used to connote both direct and indirect connections
/couplings. As another example, 'having' and 'including', derivatives thereof
and similar transitional terms or phrases are used synonymously with
'comprising' (i.e., all are considered 'open ended' terms)---only the phrases
'consisting of' and 'consisting
essentially of' should be considered as 'close
ended'. Claims are not intended to be interpreted under 112 sixth paragraph
unless the phrase 'means for' and an associated function appear in a claim and
the claim fails to recite sufficient structure to perform such function.
Claims (17)
- A method to patterning a conductive electrode comprisingproviding a substrate,coating a first solution comprising a first material on to the substrate to form a first layer of nanowire film;evaporating away the solvent in the metal nanowire film;positioning a mask above the metal nanowire film, wherein the mask has a repeated open space permitting UV light to pass through and some areas shielding UV light away from the nanowire film;shining UV light above the mask;converting the first material into a second material by the photo acid generator and UV light, wherein the first material and second material has a refractive index difference less than 0.2and a haze difference of no more than 0.2%, and second material is less conductive than the first material; andannealing the film removing the unreacted photo acid generator in the area shielded by the mask,wherein the first material forms the first region in the patterned electrode and the second material forms the second region in the patterned electrode.
- The method of claim 1, further comprisingforming a second layer on top the nanowire layer, said layer comprising a photo acid generator homogenously distributed throughout the horizontal direction of the film.
- The method of claim 1, wherein the first solution further comprises a photo acid generator.
- The method of claim 1, wherein the first material is silver nanowire.
- The method of claim 1, wherein the second material is silver oxide nanowire.
- The method of claim 2, wherein the metal nanowire of the first material has a diameter of 50 nm or less.
- The method of claim 1, wherein the second layer has a thickness about 100 nm or less.
- The method of claim 1, wherein the refractive index difference between first region and the second region is less than 0.05.
- The method of claim 1, wherein the open space in the mask has a dimension between 5-10nm.
- The method of claim 1, wherein the first layer of nanowires has a thickness between 50-150 nm.
- The method of claim 1, wherein the second material has no metal nanowires.
- The method of claim 1, wherein the single layer does not comprise a polymer matrix.
- The method of claim 1, further comprisingone or more anti-reflective layers, anti-glare layers, adhesivelayers, barriers, hard coat, or a protective film.
- A conductive electrode composition having homogenous optical property and heterogeneous electrical property, comprisinga first region, comprising a first material;a second region, comprising a second material;wherein the refractive index differences between the first and second material is less than 0.2, and a haze difference no more than 0.2%, one dimension of the first region is at least 10 um, the first material is converted to the second material by UV light and photo acid generator and the first region is more conductive than the second region.
- The electrode of claim 14, wherein the first material comprise silver nanowires.
- The electrode of claim 14, wherein the second material comprise silver oxide nanowires.
- The electrode of claim 14, wherein the average length of the nanowire in the second region is shorter than the average length of the first region.
Priority Applications (2)
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US14/360,891 US9368248B2 (en) | 2013-04-05 | 2014-01-22 | Transparent conductive electrodes comprising metal nanowires, their structure design, and method of making such structures |
CN201480000276.8A CN104521005B (en) | 2013-04-05 | 2014-01-22 | Transparency conductive electrode, their structure with fused metal nano wire design and manufacture method |
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US201361809224P | 2013-04-05 | 2013-04-05 | |
US61/809,224 | 2013-04-05 | ||
US201361809353P | 2013-04-06 | 2013-04-06 | |
US201361809354P | 2013-04-06 | 2013-04-06 | |
US61/809,354 | 2013-04-06 | ||
US61/809,353 | 2013-04-06 | ||
CN201310152173.0 | 2013-04-27 | ||
CN201310152173.0A CN103258596B (en) | 2013-04-27 | 2013-04-27 | The image method that disappears of conductive film |
US13/906,330 US20130323411A1 (en) | 2012-06-01 | 2013-05-30 | Low Haze Transparent Conductive Electrodes and Method of Making the Same |
US13/906,330 | 2013-05-30 |
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PCT/CN2014/071155 WO2014161382A1 (en) | 2013-04-05 | 2014-01-22 | Transparent conductive electrodes comprising merged metal nanowires, their structure design,and methodof making such structures |
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CN103258596B (en) | 2016-12-28 |
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