CN102779570A - Shadow-eliminating and anti-reflection electric conduction film coating layer - Google Patents
Shadow-eliminating and anti-reflection electric conduction film coating layer Download PDFInfo
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- CN102779570A CN102779570A CN2012102096230A CN201210209623A CN102779570A CN 102779570 A CN102779570 A CN 102779570A CN 2012102096230 A CN2012102096230 A CN 2012102096230A CN 201210209623 A CN201210209623 A CN 201210209623A CN 102779570 A CN102779570 A CN 102779570A
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Abstract
The invention discloses a shadow-eliminating and anti-reflection electric conduction film coating layer. The electric conduction film coating layer comprises a substrate layer and an electrode layer, wherein the substrate layer is composed of ordinary glass or transparent plastics, and the electrode layer is composed of an indium tin oxide (ITO) layer or a zinc aluminum oxide (ZAO) layer. The electric conduction film coating layer is characterized in that a plurality of SiO2 layers and TiO2 or Nb2O5 layers are added between the substrate layer and the electrode layer in a composite mode. The electric conduction film coating layer has the advantages that a good electric conduction performance of a conducting layer is guaranteed, simultaneously, shadow of a conducting electrode is eliminated, so that the electrode can not be observed through the ordinary glass or the transparent plastics, the visible light penetration rate is increased, and the penetration rate of the visible light through the conducting layer is increased by 20%-50%.
Description
Technical field
the present invention relates to the coatings on a kind of glass or the transparent plastic surface, especially a kind of shadow and anti-reflection conduction coatings of disappearing.
Background technology
are a kind of N type oxide semiconductor-tin indium oxides, and ito thin film is an indium tin oxide transparent conductive semiconductor film, two performance index are arranged usually: resistivity and light transmittance.
are in oxide conductive film, and are the highest best with electric conductivity with the transmitance of In2O3 (ITO) film of mixing Sn, and in acid solution, etch trickle figure easily, and wherein light transmittance reaches more than 90%.Its light transmittance and resistance are controlled by the ratio of In2O3 and SnO2 respectively among the ITO, usually SnO2:In2O3=1:9.
doped with Al obtains the ZnO:Al transparent conductive film in the ZnO system, i.e. AZO film, and assorted disastrously rear film electric conductivity increases substantially; Resistivity can be reduced to 10-4 ohmcm; And transparent conductive film AZO film stability in hydrogen plasma is better than ITO, have the photoelectric characteristic that can compare mutually with ITO simultaneously, and the preparation of AZO film is convenient; Element resource is abundanter than In element; And nontoxic, become the best replacer of ito thin film gradually, the AZO film has obtained certain applications at present in flat-panel monitor and thin-film solar cells.
capacitive touch screen will be used electrically conducting transparent membrane electrode (like ITO or AZO), and this electrode is applied to the viewing area, because the difference of the refractive index of the refractive index of conducting film and substrate (glass or transparent plastic); (refractive index like ITO and AZO is about 2.0; Glass is about 1.5, and plastics such as PET about 1.5), make that reflection and transmitance have bigger difference between electrode and the electrode slit in the viewing area; Like accompanying drawing Fig. 3 is the electrically conducting transparent membrane electrode (ITO or AZO) of conventional way; The electrode sketch map that Fig. 4 processes for conventional way (ITO thickness is 40NM), the reflectivity of electrode pair visible light are the reflectivity of layer electrodes (ITO or AZO), and the reflectivity in electrode slit is the reflectivity of glass or transparent plastic; The average reflectance of layer electrodes (ITO or AZO) is 16.5%; The average reflectance of glass or transparent plastic is 4.2%, and the greatest differences of reflectivity can make electrode and slit high-visible, effect and outward appearance that influence shows; Particularly on mobile phone, panel computer, notebook and common computer, electrode and slit are visible can to have a strong impact on visual effect.
adopt the method that reduces the slit to reduce the visibility in electrode and slit at present on the small screen touch-screen; But receive the restriction of lithographic equipment etc.; If adopt the method for micro gap at large-screen touch-screen more than 20 inches; Equipment investment and manufacturing cost can be very high, and the product fraction defective also can raise.Like square resistance is the ITO in 60 Europe or the average reflectance about 16.5% of AZO conduction coatings; Seriously reduced the percent of pass of visible light; In the brighter environment of light, particularly have behind like this in the environment of window, light, screen can answer reverberation can't see clearly too by force.
Summary of the invention
the present invention seeks to: the anti-reflection conduction coatings of the shadow that disappears that a kind of glass or transparent plastic surface are provided; Make from glass or transparent plastic surface and cannot see conducting layer electrode and slit; And can conductive layer be reduced to 10% to the average reflectance of visible light from 16.5%, and the average reflectance that the slit is a base material adds underlying membrane is 10%, (etching of electrode is a conductive layer; The underlying membrane of the conductive layer part that etches away keeps) can make visible light pass through the amount increase by 39% of conductive layer; Improve the clear contrast of display screen, when guaranteeing the conductive layer function, reach disappear shadow and anti-reflection function.
Technical scheme of the present invention is:
a kind of shadow and anti-reflection conduction coatings of disappearing; Comprise the substrate layer of simple glass or transparent plastic formation and the electrode layer of ITO or ZAO layer formation; It is characterized in that several SiO2 layers of compound increase and TiO2 or Nb2O5 layer between substrate layer and electrode layer.。
are preferred, and the anti-reflection conduction coatings of the said shadow that disappears from the substrate layer surface up is successively: a SiO2 layer; The one TiO2 or Nb2O5 layer; The 2nd SiO2 layer; The 2nd TiO2 or Nb2O5 layer; Three S's iO2 layer; Electrode layer.
are preferred, and the thickness of a said SiO2 layer is not limit; The thickness of the one TiO2 or Nb2O5 layer is 2-50nm; The thickness of the 2nd SiO2 layer is 10-80nm; The thickness of the 2nd TiO2 or Nb2O5 layer is 2-50nm; The thickness of Three S's iO2 layer is 20-80nm; The thickness of electrode layer is 10-150nm.
The anti-reflection conduction coatings of
the said shadow that disappears utilizes the method for vacuum sputtering to be plated on glass or transparent plastic surface; Every layer of coating uses different materials and thickness difference; Make visible light produce the interference of light, play the effect that reduces visible reflectance, improves its transmitance to the conduction coatings through the reverberation of different coating.In the scope of visible light (400 ~ 700nm), the reflectivity of conduction coatings is reduced, improved the whole transmitance of touch-screen.
are further; Set and accurately control the thickness of each rete; Under the effect of the rete (2,3,4,5,6 retes of Fig. 1) of conduction coatings front, make it consistent with the reflectivity that the conduction coatings is arranged, play the function of elimination electrode and electrode slit shadow.
Purposes more of the present invention:
1, touch screen computer, notebook computer.
, panel computer.
, touch-screen mobile phone.
, touch-screen automatic navigator.
Advantage of the present invention is:
1. the present invention have the function of eliminating touch screen electrode and electrode slit shadow.
. the present invention has increases the effect of touch-screen to visible light transmissivity, can promote the amount of visible light through touch-screen, makes that screen displaying equipment (like computer, panel computer, mobile phone etc.) is more clear.
Description of drawings
Below in conjunction with accompanying drawing and embodiment the present invention is further described:
Fig. 1 is the disappear structural representation of the anti-reflection conduction coatings of shadow of the present invention;
Fig. 2 is the present invention's structural representation of the anti-reflection conduction coatings of shadow after conductive layer is processed electrode that disappear.
ITO or AZO coating sketch map that
Fig. 3 makes for conventional method.
The electrode sketch map that
Fig. 4 processes for conventional way.
The reflectance test datagram of the touch-screen that
Fig. 5 processes for the present invention.
The reflectance test datagram of the touch-screen that
Fig. 6 processes for conventional method.
wherein: 1, simple glass or transparent plastic, the 2, the one SiO2 layer, the 3, the one TiO2 or Nb2O5 layer; 4, the 2nd SiO2 layer; 5, the 2nd TiO2 or Nb2O5 layer; 6, Three S's iO2 layer; 7, ITO or AZO layer.
Embodiment
Embodiment: as shown in Figure 1,
The anti-reflection conduction coatings of a kind of shadow that disappears, can be on simple glass or transparent plastic 1 six layers of anti-reflection conduction coatings of the compound shadow that disappears of coating, the anti-reflection conduction coatings of the said shadow that disappears from simple glass or transparent plastic surface up is successively: a SiO2 layer 2; The one TiO2 or Nb2O5 layer 3; The 2nd SiO2 layer 4; The 2nd TiO2 or Nb2O5 layer 5; Three S's iO2 layer 6; ITO or AZO layer 7.
The thickness of
said SiO2 layer 2 is not limit; The thickness of the one TiO2 or Nb2O5 layer 3 is 2-50nm; The thickness of the 2nd SiO2 layer 4 is 10-80nm; The thickness of the 2nd TiO2 or Nb2O5 layer 5 is 2-50nm; The thickness of Three S's iO2 layer 6 is 20-80nm; The thickness of ITO or AZO layer 7 is 10-150nm.
Manufacturing process: each coating is all accomplished with sputter plating method in vacuum chamber
simple glass or transparent plastic → cleaning → vacuum coating ground floor; (silicon dioxide SiO2 coating) → vacuum coating second layer; The 3rd layer of (titanium oxide TiO2 or niobium oxide Nb2O5 coating) → vacuum coating; The 4th layer of (silicon dioxide SiO2 coating) → vacuum coating; (titanium oxide TiO2 or niobium oxide Nb2O5 coating) → vacuum coating layer 5; (silicon dioxide SiO2 coating) → vacuum coating layer 6; (ITO or AZO coating) → pasting protective film → packing warehouse-in.
The reflectance test data of the touch-screen that
Fig. 5 processes for the present invention, the same basically to the reflectivity of visible light by the visible layer electrodes of datagram with the slit, can effectively eliminate electrode slit shade like this.
The reflectance test data of the touch-screen that
Fig. 6 processes for conventional method are differed greatly by visible electrode of data and the reflectivity of slit to visible light, and it is thus clear that this can cause can be the shade in electrode slit from screen.
?
More than
only is concrete exemplary applications of the present invention, and protection scope of the present invention is not constituted any limitation.Except that the foregoing description, the present invention can also have other execution mode.All employings are equal to the technical scheme of replacement or equivalent transformation formation, all drop within the present invention's scope required for protection.
Claims (3)
1. disappear shadow and anti-reflection conduction coatings comprise the substrate layer of simple glass or transparent plastic formation and the electrode layer of ITO or ZAO layer formation, it is characterized in that several SiO2 layers of compound increase and TiO2 or Nb2O5 layer between substrate layer and electrode layer.
2. shadow and the anti-reflection conduction coatings of disappearing according to claim 1 is characterized in that the anti-reflection conduction coatings of the said shadow that disappears from the substrate layer surface up is successively: a SiO2 layer; The one TiO2 or Nb2O5 layer; The 2nd SiO2 layer; The 2nd TiO2 or Nb2O5 layer; Three S's iO2 layer; Electrode layer.
3. shadow and the anti-reflection conduction coatings of disappearing according to claim 2 is characterized in that the thickness of a said SiO2 layer is not limit; The thickness of the one TiO2 or Nb2O5 layer is 2-50nm; The thickness of the 2nd SiO2 layer is 10-80nm; The thickness of the 2nd TiO2 or Nb2O5 layer is 2-50nm; The thickness of Three S's iO2 layer is 20-80nm; The thickness of electrode layer is 10-150nm.
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CN103102084A (en) * | 2013-01-21 | 2013-05-15 | 深圳市正星光电技术有限公司 | Glass for broadband high transmittance OGS (one glass solution) and preparation method thereof |
CN103258596A (en) * | 2013-04-27 | 2013-08-21 | 苏州诺菲纳米科技有限公司 | Shadow removing method of conductive thin film |
CN103472955A (en) * | 2013-09-27 | 2013-12-25 | 苏州胜利光学玻璃有限公司 | Anti-reflection touch screen |
CN103488346A (en) * | 2013-10-10 | 2014-01-01 | 珠海市魅族科技有限公司 | Protective layer for a touch display screen and mobile terminal |
CN104049825A (en) * | 2014-06-25 | 2014-09-17 | 向火平 | Bridging-free projection type capacitive screen and manufacturing method thereof |
CN104049823A (en) * | 2014-06-25 | 2014-09-17 | 向火平 | High-strength projection-type capacitive screen and manufacturing method thereof |
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CN104635991A (en) * | 2015-03-11 | 2015-05-20 | 合肥鑫晟光电科技有限公司 | Shadow elimination structure, touch screen and preparation method of touch screen |
CN105084773A (en) * | 2015-05-13 | 2015-11-25 | 信义光伏产业(安徽)控股有限公司 | Anti-reflection vanishing AZO conductive glass, and manufacture method and touch control apparatus thereof |
US9368248B2 (en) | 2013-04-05 | 2016-06-14 | Nuovo Film, Inc. | Transparent conductive electrodes comprising metal nanowires, their structure design, and method of making such structures |
CN106042531A (en) * | 2016-07-24 | 2016-10-26 | 东莞汇海光电科技实业有限公司 | Single-face shadow eliminating conductive glass and processing method thereof |
CN106502473A (en) * | 2017-01-04 | 2017-03-15 | 京东方科技集团股份有限公司 | Touch base plate and preparation method thereof, touch screen |
CN106843607A (en) * | 2016-11-15 | 2017-06-13 | 惠州市宝明精工有限公司 | A kind of capacitance touch screen of OnCell of high transmittance and preparation method thereof |
CN107123467A (en) * | 2017-04-27 | 2017-09-01 | 张家港康得新光电材料有限公司 | A kind of flexible conductive film and its application |
CN108109716A (en) * | 2017-12-13 | 2018-06-01 | 天津宝兴威科技股份有限公司 | A kind of nano silver coating fluid formula |
CN114242338A (en) * | 2021-12-16 | 2022-03-25 | 长春博信光电子有限公司 | Method for improving resistance value of ITO film |
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CN101276005A (en) * | 2007-03-29 | 2008-10-01 | 郭爱军 | Novel anti-reflection conductive film |
CN101857377A (en) * | 2009-04-03 | 2010-10-13 | 西山不锈化学股份有限公司 | Glass substrate for an electronic device and method for manufacturing an electronic device |
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US9368248B2 (en) | 2013-04-05 | 2016-06-14 | Nuovo Film, Inc. | Transparent conductive electrodes comprising metal nanowires, their structure design, and method of making such structures |
CN103258596A (en) * | 2013-04-27 | 2013-08-21 | 苏州诺菲纳米科技有限公司 | Shadow removing method of conductive thin film |
CN103258596B (en) * | 2013-04-27 | 2016-12-28 | 苏州诺菲纳米科技有限公司 | The image method that disappears of conductive film |
CN103472955A (en) * | 2013-09-27 | 2013-12-25 | 苏州胜利光学玻璃有限公司 | Anti-reflection touch screen |
CN103488346A (en) * | 2013-10-10 | 2014-01-01 | 珠海市魅族科技有限公司 | Protective layer for a touch display screen and mobile terminal |
CN104049823A (en) * | 2014-06-25 | 2014-09-17 | 向火平 | High-strength projection-type capacitive screen and manufacturing method thereof |
CN104049825A (en) * | 2014-06-25 | 2014-09-17 | 向火平 | Bridging-free projection type capacitive screen and manufacturing method thereof |
CN104535597A (en) * | 2014-12-15 | 2015-04-22 | 惠州Tcl移动通信有限公司 | Touch screen coating detection method and device |
CN104635991A (en) * | 2015-03-11 | 2015-05-20 | 合肥鑫晟光电科技有限公司 | Shadow elimination structure, touch screen and preparation method of touch screen |
CN104635991B (en) * | 2015-03-11 | 2019-01-11 | 合肥鑫晟光电科技有限公司 | A kind of shadow eliminating structure, touch screen and preparation method thereof |
US10198134B2 (en) | 2015-03-11 | 2019-02-05 | Boe Technology Group Co., Ltd. | Shadow elimination arrangement, touch screen and method for producing the same |
CN105084773A (en) * | 2015-05-13 | 2015-11-25 | 信义光伏产业(安徽)控股有限公司 | Anti-reflection vanishing AZO conductive glass, and manufacture method and touch control apparatus thereof |
CN106042531A (en) * | 2016-07-24 | 2016-10-26 | 东莞汇海光电科技实业有限公司 | Single-face shadow eliminating conductive glass and processing method thereof |
CN106843607A (en) * | 2016-11-15 | 2017-06-13 | 惠州市宝明精工有限公司 | A kind of capacitance touch screen of OnCell of high transmittance and preparation method thereof |
CN106502473A (en) * | 2017-01-04 | 2017-03-15 | 京东方科技集团股份有限公司 | Touch base plate and preparation method thereof, touch screen |
CN106502473B (en) * | 2017-01-04 | 2019-04-26 | 京东方科技集团股份有限公司 | Touch base plate and preparation method thereof, touch screen |
CN107123467A (en) * | 2017-04-27 | 2017-09-01 | 张家港康得新光电材料有限公司 | A kind of flexible conductive film and its application |
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CN108109716A (en) * | 2017-12-13 | 2018-06-01 | 天津宝兴威科技股份有限公司 | A kind of nano silver coating fluid formula |
CN114242338A (en) * | 2021-12-16 | 2022-03-25 | 长春博信光电子有限公司 | Method for improving resistance value of ITO film |
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Application publication date: 20121114 |