WO2013152694A1 - Metal mesh fabric - Google Patents

Metal mesh fabric Download PDF

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Publication number
WO2013152694A1
WO2013152694A1 PCT/CN2013/073773 CN2013073773W WO2013152694A1 WO 2013152694 A1 WO2013152694 A1 WO 2013152694A1 CN 2013073773 W CN2013073773 W CN 2013073773W WO 2013152694 A1 WO2013152694 A1 WO 2013152694A1
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WO
WIPO (PCT)
Prior art keywords
mesh
metal mesh
area
wire
metal
Prior art date
Application number
PCT/CN2013/073773
Other languages
French (fr)
Chinese (zh)
Inventor
魏志凌
高小平
潘世珎
Original Assignee
昆山允升吉光电科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 昆山允升吉光电科技有限公司 filed Critical 昆山允升吉光电科技有限公司
Priority to JP2015504852A priority Critical patent/JP5933813B2/en
Priority to KR20147031428A priority patent/KR20150020267A/en
Publication of WO2013152694A1 publication Critical patent/WO2013152694A1/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F15/00Screen printers
    • B41F15/14Details
    • B41F15/34Screens, Frames; Holders therefor
    • B41F15/36Screens, Frames; Holders therefor flat
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/24Stencils; Stencil materials; Carriers therefor

Definitions

  • the present invention relates to a metal mesh.
  • Increasing the conversion efficiency of solar cells is a major goal of solar cell research.
  • selecting a suitable printing stencil can also improve the conversion efficiency of the battery.
  • the traditional masks include metal masks. Template, composite mask.
  • the material of the metal type mask is generally a nickel-based alloy; and the composite type mask is relatively complicated, and includes a screen and a photosensitive material applied to the surface of the screen.
  • Chinese patent CN101241956 reports a method for manufacturing a large-area nano-thin film solar cell, which is characterized in that: the single DSSC is made into strips, and the strip-shaped single DSSCs are connected in series to form a large-area solar cell by using corrosion-resistant interconnect strips.
  • a protective barrier layer is disposed on both sides of the corrosion interconnecting strip, or a low-resistance grid electrode prepared by a mesh printing method, and a protective film is covered on the surface of the low-resistance grid electrode, and then a low-resistance grid covered with a protective film is used.
  • the electrode connects a plurality of strip-shaped single-cell DSSCs into a large-area solar cell, a large-area solar cell side glass and a TC0 contact surface are provided with a filling tank, and a large-area solar cell end-injection tank, from the perfusion tank pump After the electrolyte and dye are added, the infusion tank is broken and then sealed.
  • Cigar patent CN102336051A discloses a solar cell mesh printing device, which comprises a printing blade, an auxiliary blade, a returning knife and a printing screen, which are characterized in that two baffle structures are mounted on the printing screen on both sides of the edge of the printing blade.
  • the baffle structure is mainly composed of a baffle surface, a baffle frame and a mounting frame; the bottom of the baffle surface can be separated from the mesh surface or bonded by a flexible material; the edge of the returning knife and the printing blade and the auxiliary blade are The baffle surface is in seamless contact; the printing head drives the scraper and the returning knife to slide in contact with the baffle surface, so that the slurry moves in the range surrounded by the baffle surfaces, the scraper and the returning knife, so that the slurry is not oriented Flowing on both sides.
  • Chinese Patent CN202058761U discloses a screen printing crystalline silicon solar cell positive silver screen, comprising: a silicon wafer, a main gate line, a chamfering, a sub-gate line, and a main gate line and a sub-gate line on the silicon wafer.
  • the main gate line and the sub-gate line Straight setting, chamfering on the silicon wafer, can effectively spread the front electrode grid line on the surface of the silicon wafer, increase the coverage area, and effectively collect the photocurrent, thereby improving the efficiency of the cell.
  • Chinese patent CN101969082A discloses a solar cell manufacturing process combining two mesh printing and engraving, which is used for manufacturing a solar cell with two printing electrodes, which comprises a groove process and two printing processes, and the groove process is :
  • the groove is formed in the electrode grid line area on the surface of the silicon wafer to form an etching groove in the electrode grid line region;
  • the two printing processes are: a.
  • the first printing electrode the printed electrode slurry is filled into the etching groove and dried. Forming a first layer of electrodes in the etching groove;
  • printing the second time electrode printing the electrode on the outer surface of the first layer electrode to form a second layer electrode on the surface of the surface electrode of the silicon wafer.
  • the screen constituting the conventional composite type reticle is a woven type wire mesh or a polyester net or the like, and such a screen may cause a sizing effect of the final formed reticle due to the characteristics of the woven type warp and weft joints, such as: uneven sizing;
  • a sizing effect of the final formed reticle due to the characteristics of the woven type warp and weft joints, such as: uneven sizing;
  • this operation does not completely avoid the adverse effects of the warp and weft nodes.
  • the present invention mainly proposes a screen for this problem, which better solves the above problems.
  • One of the technical problems to be solved by the present invention is that in the existing precision printing technology, since the screen used has a woven type warp and weft node, resulting in uneven printing of the forming mask, the present invention provides a new metal mesh, the net The cloth does not have a braided node, the surface is smooth, and has the advantage of high printing uniformity.
  • a second technical problem to be solved by the present invention is to provide a mask plate made of the above-mentioned metal mesh cloth, which has the advantage of uniform printing.
  • the intermediate portion of the mesh region of the metal mesh is provided with a pattern region, wherein the pattern is formed by the absence of the wire mesh in the lateral or longitudinal direction of the metal mesh; the mesh mesh number is 100 to 600 mesh, and the wire diameter is It is 10 ⁇ 100um and has a thickness of 10 ⁇ 45um.
  • a preferred technical solution is that the grid lines of the metal mesh grid area are uniform in diameter; and the force buffer strip and the side hole strip connected to the buffer strip are disposed on the periphery of the non-mesh area;
  • the mesh size of the metal mesh is 200 to 450 mesh, the wire diameter is 15 to 30 um, and the thickness is 15 to 30 um; the remaining wire diameter of the wire in the pattern area on the metal mesh is not larger than the wire diameter of the non-graphic area;
  • the remaining wire mesh lines in the pattern area on the metal mesh are uniform in diameter or thin in both ends.
  • the metal mesh wire mesh is a continuous non-woven type; the metal mesh structure is integrally formed, the surface is smooth, and there is no woven type warp and weft node.
  • the metal mesh is produced by an electroforming process and is made of a pure nickel material or a nickel-based alloy material.
  • the technical solution adopted by the present invention is as follows: A method made by using the above metal mesh cloth
  • the reticle is characterized in that the opening size of the pattern area of the reticle is not larger than the size of the missing area of the screen line of the corresponding pattern on the metal mesh.
  • a preferred technical solution is that the pattern formed by the missing grid lines of the metal mesh is a set of mutually parallel lines corresponding to the fine grid lines of the mask.
  • the metal mesh provided by the invention has the following advantages: 1.
  • the metal mesh cloth is obtained by an electroforming process, and has the characteristics of smooth surface and no warp and weft joints, and the solar cell electrode printing network produced thereby The plate is evenly smeared during printing; 2.
  • the metal mesh is in a grid line corresponding to the direction of the fine grid line of the corresponding solar cell electrode printing screen, and the metal mesh is reduced to the printing paste. The hindrance of the material.
  • Non-woven type wire mesh the surface of the wire mesh is smooth, and the mask plate made thereof does not cause damage to the mask plate due to unevenness of the surface during the cleaning and wiping process.
  • the screen can be designed according to the needs of different opening ratio, wire mesh diameter and wire mesh shape to ensure the good sizing effect of the wire mesh while ensuring the life of the wire mesh.
  • the solar cell electrode printing screen plate further prepared by the metal mesh cloth can print the silicon solar cell electrode grid line structure with superior "aspect ratio", which is beneficial to the collection and transmission of current by the solar cell sheet. Therefore, the conversion efficiency of the solar cell sheet is correspondingly improved.
  • Figure 1 is a schematic view of the structure of a metal mesh.
  • Fig. 2 is a partially enlarged schematic view showing the wire mesh of the embodiment 1.
  • Figure 3 is a partially enlarged schematic view of the metal mesh cloth buffer zone.
  • Figure 4 is a schematic view of a metal mesh having a pattern of missing screen wires.
  • Figure 5 is an enlarged schematic view of a portion III of Figure 4.
  • Figure 6 is an enlarged schematic view of a portion IV of Figure 5.
  • Figure 7 shows the remaining wire diameter of the wire in the graphics area where the grid lines are missing.
  • Figure 8 is a partial schematic view of a mask after coating a masking material on a metal mesh.
  • l a is a grid line.
  • rl, r2, and r3 are the grid line diameters of different grid regions.
  • the diameter of the wire from the middle to the edge of the metal mesh is gradually increased, that is, rl ⁇ r2 ⁇ r3.
  • III is a mesh area; 4a is an area lacking horizontal grid lines.
  • IV is a mesh region lacking lateral grid lines
  • 5a is a region lacking lateral grid lines
  • R1 is an opening size of a metal mesh wire missing region
  • rl is the wire diameter of the metal mesh body
  • r4 is the wire diameter of the two ends of the wire mesh in the pattern area
  • r5 is the wire diameter of the middle portion of the wire mesh inside the pattern area
  • the wire diameter of both ends of the wire is r4> The wire diameter r5 of the middle of the wire mesh inside the graphics area.
  • rl is the wire diameter of the metal mesh body; r6 is the wire diameter of the wire mesh inside the pattern area; the wire diameter of the wire mesh inside the pattern area is uniform, and the wire diameter of the main body of the metal mesh is rl. Wire diameter r6.
  • 8a is the screen bridge at the opening of the mask;
  • R2 is the opening size of the corresponding area of the mask pattern;
  • the opening size of the missing area of the metal mesh line is Rl The opening size of the corresponding area of the mask pattern.
  • a metal mesh as shown in FIG. 1, is provided with a mesh area, wherein the mesh area is composed of two sets of mutually orthogonal grid lines, and the middle area of the mesh area of the metal mesh is provided a pattern region, wherein the pattern is composed of a metal mesh cloth having a missing line in a horizontal or vertical direction; the metal mesh cloth has a weft-free warp and weft node, and the structure is integrally formed, and the surface is smooth, that is, the metal mesh is formed.
  • the wire mesh is continuous and non-woven.
  • FIG. 2 is a partially enlarged schematic view of the wire mesh, which is composed of mutually interlaced wire lines la, in which the mesh size of the metal mesh is 330 mesh, the mesh wire diameter is 20 um, and the thickness of the wire mesh is It is 25um.
  • FIG. 3 is a partially enlarged schematic view showing the stress buffering strip of the metal mesh cloth.
  • the diameter of the buffering strip varies according to a certain variation rule. The law described in this embodiment is shown in FIG.
  • the outer edge of the wire diameter of 40um is connected to the edge area of the mesh. This design allows the mesh to withstand the tension provided by the outside when it is tight.
  • a metal mesh has the same basic structure as that of Embodiment 1, and the transformed parts are as follows:
  • the mesh has a mesh size of 400 mesh, the mesh wiring diameter is 25 ⁇ m, and the mesh cloth has a thickness of 20 ⁇ m.
  • the metal mesh has the following structural changes:
  • the metal mesh is provided with a pattern, and the pattern described in this embodiment is a set of mutually parallel lines 4a, as shown in FIG. Fig. 5 is an enlarged view showing a portion I I I in Fig. 4, and 5a in Fig. 5 is a line 4a shown in Fig. 4, and a lateral grid line is absent at 5a.
  • Figure 6 is an enlarged schematic view of the portion IV of Figure 5, the remaining wire mesh diameter in the pattern area where the grid lines are missing There are the following rules: Metal mesh body diameter rl> Graphic area Internal wire line wire diameter r4> Graphic area Internal wire line intermediate area wire diameter r5, which is a rounded structure; The missing grid line graphic area The remaining wire diameter of the wire mesh may also be as follows: As shown in Fig. 7, the wire diameter of the wire mesh inside the pattern area is uniform, and the wire diameter r6 of the wire mesh inside the wire mesh main body RL pattern area is uniform.
  • Figure 8 is a partial schematic view of a mask after coating a masking material on the metal mesh (corresponding to the portion shown in Figure 5), as shown in the figure, there is only one opening in the mask.
  • the direction of the wire mesh 8a serves as a bridge. Comparing Figs. 5 and 8, there are: the opening size R1 of the missing area of the metal mesh wire and the opening size R2 of the corresponding area of the mask pattern.
  • Such a design can reduce the coating difficulty factor of the mask material of the mask, and since the screen line has only one direction at the opening, relatively less bridging reduces the influence on the printing paste, and the blanking of the mask can be ensured. The effect is good.
  • a metal mesh the basic structure of which is similar to that of the first embodiment and the second embodiment, and the transformed portion thereof is as follows: the mesh size of the metal mesh is between 200 and 450 mesh, and the wire diameter is between 15 and 30 um, and the thickness is Between 15 ⁇ 30um.
  • a metal mesh the basic structure of which is similar to that of the first embodiment and the second embodiment, and the transformed portion thereof is as follows: the metal mesh number, the wire diameter size, and the thickness may be any value of the numerical interval value described in the third embodiment. combination. While the embodiments of the present invention have been shown and described, the embodiments of the invention may The scope of the invention is defined by the claims and their equivalents.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Screen Printers (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Photovoltaic Devices (AREA)

Abstract

A metal mesh fabric is provided with a grid area formed by two sets of perpendicular grid lines; a pattern area is arranged in the middle of the grid area of the metal mesh fabric, and the pattern is formed by the absence of grid lines of the metal wire fabric along the lateral or longitudinal direction. The metal mesh fabric has a mesh number of 100 to 600, a wire diameter size of 10 to 100 um, and a thickness of 10 to 45 um. The metal mesh fabric mainly solves the problem of non-uniform printing on a molded mask plate caused by weaving nodes of the wire mesh used in the existing precision printing technology, and the metal mesh fabric applies to industrial production of precision printing.

Description

金属网布 技术领域  Metal mesh technology
本发明涉及本发明具体涉及一种金属网布。  The present invention relates to a metal mesh.
背景技术 Background technique
随着经济的快速发展, 能源的消耗量越来越大, 煤和石油等不可再生资源的储存量日益 减少, 这促使人们对新能源 (如核能、 太阳能、 风能、 生物质能、 地热能、 海洋能、 氢能 等) 的不断探索。 其中, 作为地球上许多能量的来源, 太阳能在新能源的研究中占据了重要 的地位, 太阳能电池就是太阳能应用的一个核心代表。  With the rapid development of the economy, energy consumption is increasing, and the storage of non-renewable resources such as coal and oil is decreasing, which encourages new energy sources (such as nuclear energy, solar energy, wind energy, biomass energy, geothermal energy, Continuous exploration of ocean energy, hydrogen energy, etc.) Among them, as a source of many energy on the earth, solar energy plays an important role in the research of new energy. Solar cells are a core representative of solar energy applications.
提高太阳能电池的转化效率是目前太阳能电池研究的一个主要目标, 除了对电池基片材 料的选择、 基片制作工艺的改善外, 选择合适的印刷网板也能提高电池的转化效率。  Increasing the conversion efficiency of solar cells is a major goal of solar cell research. In addition to the selection of battery substrate materials and the improvement of substrate fabrication process, selecting a suitable printing stencil can also improve the conversion efficiency of the battery.
随着电子行业及各相关行业的崛起, 精密印刷及小尺寸封装的应用也日益广泛, 在精密 印刷及小尺寸封装的环节中一般会涉及到掩模板的应用, 传统的掩模板包括金属型掩模板、 复合型掩模板。 目前金属型掩模板的材质一般为镍基合金; 而复合型掩模板构成相对较为复 杂, 其包括丝网以及涂覆于丝网表面的感光物质。  With the rise of the electronics industry and related industries, the application of precision printing and small-size packaging is becoming more and more extensive. In the process of precision printing and small-size packaging, the application of masks is generally involved. The traditional masks include metal masks. Template, composite mask. At present, the material of the metal type mask is generally a nickel-based alloy; and the composite type mask is relatively complicated, and includes a screen and a photosensitive material applied to the surface of the screen.
中国专利 CN101241956报道了一种大面积纳米薄膜太阳能电池的制造方法, 其特征在 于: 单体 DSSC制成条状, 采用耐腐蚀互连条将条状的单体 DSSC串联成大面积太阳能电池, 耐腐蚀互连条两侧分别设一保护隔层, 或采用网布印刷法制备的低电阻栅网电极, 并在低电 阻栅网电极表面覆盖保护膜, 然后采用覆盖有保护膜的低电阻栅网电极将多个条状的单体 DSSC并联成大面积的太阳能电池, 大面积太阳能电池一侧玻璃与 TC0的接触面设一灌注 槽, 并在大面积太阳能电池一端的灌注槽, 从灌注槽泵入电解质和染料后, 折断灌注槽, 然 后进行密封。  Chinese patent CN101241956 reports a method for manufacturing a large-area nano-thin film solar cell, which is characterized in that: the single DSSC is made into strips, and the strip-shaped single DSSCs are connected in series to form a large-area solar cell by using corrosion-resistant interconnect strips. A protective barrier layer is disposed on both sides of the corrosion interconnecting strip, or a low-resistance grid electrode prepared by a mesh printing method, and a protective film is covered on the surface of the low-resistance grid electrode, and then a low-resistance grid covered with a protective film is used. The electrode connects a plurality of strip-shaped single-cell DSSCs into a large-area solar cell, a large-area solar cell side glass and a TC0 contact surface are provided with a filling tank, and a large-area solar cell end-injection tank, from the perfusion tank pump After the electrolyte and dye are added, the infusion tank is broken and then sealed.
中国专利 CN102336051A公开了一种太阳能电池网布印刷装置, 包括印刷刮刀、 辅助刮 刀、 回料刀、 印刷网版, 其特征是在印刷网版上紧靠印刷刮刀边缘两侧安装两个挡板结构, 其中挡板结构主要由挡板面、 挡板框架和安装架组成; 挡板面的底部与网布面可分体式接触 或者通过柔性材料黏结; 回料刀和印刷刮刀及辅助刮刀的边缘与挡板面无缝接触; 印刷机头 带动刮刀和回料刀与挡板面接触滑动, 使浆料在两侧挡板面、 刮刀和回料刀围成的范围内运 动, 实现浆料不向两侧流动。  Chinese patent CN102336051A discloses a solar cell mesh printing device, which comprises a printing blade, an auxiliary blade, a returning knife and a printing screen, which are characterized in that two baffle structures are mounted on the printing screen on both sides of the edge of the printing blade. The baffle structure is mainly composed of a baffle surface, a baffle frame and a mounting frame; the bottom of the baffle surface can be separated from the mesh surface or bonded by a flexible material; the edge of the returning knife and the printing blade and the auxiliary blade are The baffle surface is in seamless contact; the printing head drives the scraper and the returning knife to slide in contact with the baffle surface, so that the slurry moves in the range surrounded by the baffle surfaces, the scraper and the returning knife, so that the slurry is not oriented Flowing on both sides.
中国专利 CN202058761U 公开了一种网布印刷晶体硅太阳能电池正银网版, 包括: 硅 片、 主栅线、 倒角、 副栅线、 所述的硅片上设有主栅线和副栅线, 所述的主栅线和副栅线垂 直设置, 在所述的硅片上设有倒角, 可以将正面电极栅线在硅片表面进行有效的扩展, 增加 覆盖面积, 将光电流进行有效的收集, 从而改善了电池片的效率。 Chinese Patent CN202058761U discloses a screen printing crystalline silicon solar cell positive silver screen, comprising: a silicon wafer, a main gate line, a chamfering, a sub-gate line, and a main gate line and a sub-gate line on the silicon wafer. , the main gate line and the sub-gate line Straight setting, chamfering on the silicon wafer, can effectively spread the front electrode grid line on the surface of the silicon wafer, increase the coverage area, and effectively collect the photocurrent, thereby improving the efficiency of the cell.
中国专利 CN101969082A公开了一种两次网布印刷与刻槽结合的太阳能电池制造工艺, 用于制造一种两次印刷电极的太阳能电池, 包含有刻槽工艺和两次印刷工艺, 刻槽工艺为: 在硅片表面的电极栅线区域刻槽, 使电极栅线区域形成蚀槽; 两次印刷工艺为: a、 第一次 印刷电极: 将印刷的电极浆料填入蚀槽并进行烘干, 在蚀槽中形成第一层电极; b、 第二次 印刷电极: 在第一层电极外表面印刷电极, 使硅片表面电极栅线区域形成第二层电极。  Chinese patent CN101969082A discloses a solar cell manufacturing process combining two mesh printing and engraving, which is used for manufacturing a solar cell with two printing electrodes, which comprises a groove process and two printing processes, and the groove process is : The groove is formed in the electrode grid line area on the surface of the silicon wafer to form an etching groove in the electrode grid line region; the two printing processes are: a. The first printing electrode: the printed electrode slurry is filled into the etching groove and dried. Forming a first layer of electrodes in the etching groove; b. printing the second time electrode: printing the electrode on the outer surface of the first layer electrode to form a second layer electrode on the surface of the surface electrode of the silicon wafer.
构成传统复合型掩模板的丝网为编织型金属丝网或聚酯网等, 此类丝网由于编织型经 纬节点的特性会导致最终成型掩模板的下浆效果, 如: 下浆不均; 在实际掩模板的制作过程 中, 往往需要先对丝网进行压挤, 从而尽量减少编织型丝网的这种效应。 但既如此操作并无 法完全避免经纬节点带来的不良效果。  The screen constituting the conventional composite type reticle is a woven type wire mesh or a polyester net or the like, and such a screen may cause a sizing effect of the final formed reticle due to the characteristics of the woven type warp and weft joints, such as: uneven sizing; In the actual mask manufacturing process, it is often necessary to first press the screen to minimize the effect of the braided screen. However, this operation does not completely avoid the adverse effects of the warp and weft nodes.
本发明主要是针对此问题提出一种丝网, 较好的解决以上所述问题。  The present invention mainly proposes a screen for this problem, which better solves the above problems.
发明内容 Summary of the invention
本发明所要解决的技术问题之一是现有精密印刷技术中, 由于所用丝网具有编织型经纬 节点, 导致成型掩模板印刷不均匀的问题, 本发明提供一种新的金属网布, 该网布不具有编 织型节点, 表面光滑, 具有印刷均匀性高的优点。  One of the technical problems to be solved by the present invention is that in the existing precision printing technology, since the screen used has a woven type warp and weft node, resulting in uneven printing of the forming mask, the present invention provides a new metal mesh, the net The cloth does not have a braided node, the surface is smooth, and has the advantage of high printing uniformity.
本发明所要解决的技术问题之二是提供一种采用上述金属网布制成的掩模板, 该掩模板 具有印刷均匀的优点。  A second technical problem to be solved by the present invention is to provide a mask plate made of the above-mentioned metal mesh cloth, which has the advantage of uniform printing.
为解决上述技术问题之一, 本发明采用的技术方案如下: 一种金属网布, 其上设置有网 格区, 其特征在于所述网格区由两组相互垂直的网格线组构成, 所述金属网布的网格区中间 区域设置有图案区域, 所述图案是由金属网布沿横向或纵向上丝网线的缺失构成; 所述金属 网布目数为 100〜600目, 线径尺寸为 10〜100um, 厚度为 10〜45um。  In order to solve one of the above technical problems, the technical solution adopted by the present invention is as follows: A metal mesh having a mesh area disposed thereon, wherein the mesh area is composed of two sets of mutually orthogonal grid lines. The intermediate portion of the mesh region of the metal mesh is provided with a pattern region, wherein the pattern is formed by the absence of the wire mesh in the lateral or longitudinal direction of the metal mesh; the mesh mesh number is 100 to 600 mesh, and the wire diameter is It is 10~100um and has a thickness of 10~45um.
上述技术方案中, 优选的技术方案为, 构成所述金属网布网格区的网格线线径均匀; 在非网格区的***设有受力缓冲带及与缓冲带相连的边孔带; 所述金属网布目数为 200〜 450目, 线径尺寸为 15〜30um, 厚度为 15〜30um; 金属网布上图形区域剩余的丝网线线径 不大于非图形区域的丝网线线径; 所述金属网布上图形区域剩余的丝网线线径均匀或两头大 粗中间细。 优选的技术方案为, 所述金属网布丝网线为连贯无编织型; 所述金属网布的结构 为一体成型, 表面光滑, 无编织型的经纬节点。 所述金属网布是通过电铸工艺制得, 其材质 为纯镍材料或镍基合金材料。  In the above technical solution, a preferred technical solution is that the grid lines of the metal mesh grid area are uniform in diameter; and the force buffer strip and the side hole strip connected to the buffer strip are disposed on the periphery of the non-mesh area; The mesh size of the metal mesh is 200 to 450 mesh, the wire diameter is 15 to 30 um, and the thickness is 15 to 30 um; the remaining wire diameter of the wire in the pattern area on the metal mesh is not larger than the wire diameter of the non-graphic area; The remaining wire mesh lines in the pattern area on the metal mesh are uniform in diameter or thin in both ends. In a preferred technical solution, the metal mesh wire mesh is a continuous non-woven type; the metal mesh structure is integrally formed, the surface is smooth, and there is no woven type warp and weft node. The metal mesh is produced by an electroforming process and is made of a pure nickel material or a nickel-based alloy material.
为解决上述技术问题之二, 本发明采用的技术方案如下: 一种采用上述金属网布制得的 掩模板, 其特征在于所述掩模板图形区域的开口尺寸不大于所述金属网布上对应图形的丝网 线缺失区域的尺寸。 In order to solve the above technical problem two, the technical solution adopted by the present invention is as follows: A method made by using the above metal mesh cloth The reticle is characterized in that the opening size of the pattern area of the reticle is not larger than the size of the missing area of the screen line of the corresponding pattern on the metal mesh.
上述技术方案中, 优选的技术方案为, 金属网布所述缺失网格线构成的图形为一组相互 平行的线条, 其与掩模板的细栅线相对应。  In the above technical solution, a preferred technical solution is that the pattern formed by the missing grid lines of the metal mesh is a set of mutually parallel lines corresponding to the fine grid lines of the mask.
本发明提供的金属网布, 其具有以下优点: 1、 所述金属网布是通过电铸工艺制得, 其 具有表面平整、 无编制型经纬节点的特性, 通过其制作的太阳能电池电极印刷网板在印刷时 下浆均匀; 2、 所述金属网布在相应的太阳能电池电极印刷网板的细栅线对应的区域无细栅 线所在方向上的网格线, 减少了金属网布对印刷浆料的阻碍作用。  The metal mesh provided by the invention has the following advantages: 1. The metal mesh cloth is obtained by an electroforming process, and has the characteristics of smooth surface and no warp and weft joints, and the solar cell electrode printing network produced thereby The plate is evenly smeared during printing; 2. The metal mesh is in a grid line corresponding to the direction of the fine grid line of the corresponding solar cell electrode printing screen, and the metal mesh is reduced to the printing paste. The hindrance of the material.
非编织型的金属丝网, 丝网表面光滑, 其制成的掩模板在清洗擦拭过程中不会由于表面 的凹凸不平造成掩模板的损伤。 丝网可以根据需要设计不同的开孔率、 丝网线径尺寸及丝网 线形状, 在保证丝网有较好的下浆效果的同时亦可保证丝网的寿命。  Non-woven type wire mesh, the surface of the wire mesh is smooth, and the mask plate made thereof does not cause damage to the mask plate due to unevenness of the surface during the cleaning and wiping process. The screen can be designed according to the needs of different opening ratio, wire mesh diameter and wire mesh shape to ensure the good sizing effect of the wire mesh while ensuring the life of the wire mesh.
基于以上的优点, 所述金属网布进一步制得的太阳能电池电极印刷网板可以印刷 "高宽 比"较优的硅太阳能电池电极栅线结构, 其有利于太阳能电池片对电流的收集及传输, 从而 相应的提高了太阳能电池片的转化效率。  Based on the above advantages, the solar cell electrode printing screen plate further prepared by the metal mesh cloth can print the silicon solar cell electrode grid line structure with superior "aspect ratio", which is beneficial to the collection and transmission of current by the solar cell sheet. Therefore, the conversion efficiency of the solar cell sheet is correspondingly improved.
附图说明 DRAWINGS
图 1为金属网布结构示意图。  Figure 1 is a schematic view of the structure of a metal mesh.
图 2为实施例 1中金属丝网的局部放大示意图。  Fig. 2 is a partially enlarged schematic view showing the wire mesh of the embodiment 1.
图 3为金属网布受力缓冲带的局部放大示意图。  Figure 3 is a partially enlarged schematic view of the metal mesh cloth buffer zone.
图 4为有缺失丝网线构成图案的金属网布示意图。  Figure 4 is a schematic view of a metal mesh having a pattern of missing screen wires.
图 5为图 4中 III部分的放大示意图。  Figure 5 is an enlarged schematic view of a portion III of Figure 4.
图 6为图 5中 IV部分的放大示意图。  Figure 6 is an enlarged schematic view of a portion IV of Figure 5.
图 7为缺失网格线的图形区域剩余的丝网线线径。  Figure 7 shows the remaining wire diameter of the wire in the graphics area where the grid lines are missing.
图 8为金属网布上涂布一层掩模物质后的掩模板局部示意图。  Figure 8 is a partial schematic view of a mask after coating a masking material on a metal mesh.
图 1中, I为网格区; II为受力缓冲带区。  In Fig. 1, I is a grid area; II is a force buffer zone.
图 2中, l a为网格线。  In Figure 2, l a is a grid line.
图 3中, rl、 r2、 r3为不同网格区域的网格线线径尺寸。 由金属网布中间至边缘的线 径尺寸逐步增大, 即 rl〈r2〈r3。  In Figure 3, rl, r2, and r3 are the grid line diameters of different grid regions. The diameter of the wire from the middle to the edge of the metal mesh is gradually increased, that is, rl < r2 < r3.
图 4中, III为网格区域; 4a为缺少横向的网格线的区域。  In Fig. 4, III is a mesh area; 4a is an area lacking horizontal grid lines.
图 5中, IV为缺少横向的网格线的网格区域, 5a为缺少横向的网格线的区域; R1为金 属网布丝网线缺失区域的开口尺寸; 图 6中, rl为金属网布主体线径; r4为图形区域内部丝网线的两端线径; r5为图形区 域内部丝网线中间区域的线径; 金属网布主体线径 rl〉图形区域内部丝网线的两端线径 r4〉 图形区域内部丝网线中间区域的线径 r5。 In Fig. 5, IV is a mesh region lacking lateral grid lines, 5a is a region lacking lateral grid lines; R1 is an opening size of a metal mesh wire missing region; In Fig. 6, rl is the wire diameter of the metal mesh body; r4 is the wire diameter of the two ends of the wire mesh in the pattern area; r5 is the wire diameter of the middle portion of the wire mesh inside the pattern area; the wire diameter of the metal mesh body rl> the inner wire of the pattern area The wire diameter of both ends of the wire is r4> The wire diameter r5 of the middle of the wire mesh inside the graphics area.
图 7中, rl为金属网布主体线径; r6为图形区域内部丝网线的线径; 图形区域内部的 丝网线线径尺寸均匀, 且有金属网布主体线径 rl 图形区域内部丝网线的线径 r6。  In Fig. 7, rl is the wire diameter of the metal mesh body; r6 is the wire diameter of the wire mesh inside the pattern area; the wire diameter of the wire mesh inside the pattern area is uniform, and the wire diameter of the main body of the metal mesh is rl. Wire diameter r6.
图 8中, 8a为掩模板开口处的丝网桥连; R2为掩模板图形对应区域的开口尺寸; 金属 网布丝网线缺失区域的开口尺寸 Rl 掩模板图形对应区域的开口尺寸。 下面通过具体实施例对本发明作进一步的阐述。 具体实施方式  In Fig. 8, 8a is the screen bridge at the opening of the mask; R2 is the opening size of the corresponding area of the mask pattern; the opening size of the missing area of the metal mesh line is Rl The opening size of the corresponding area of the mask pattern. The invention is further illustrated by the following specific examples. detailed description
【实施例 1】  [Embodiment 1]
一种金属网布, 如图 1所示, 其上设置有网格区, 所述网格区由两组相互垂直的网格线 组构成, 所述金属网布的网格区中间区域设置有图案区域, 所述图案是由金属网布沿横向或 纵向上丝网线的缺失构成; 所述金属网布无编织型的经纬节点, 其结构为一体成型, 表面光 滑, 即构成所述金属网布丝网线为连贯无编织型。  A metal mesh, as shown in FIG. 1, is provided with a mesh area, wherein the mesh area is composed of two sets of mutually orthogonal grid lines, and the middle area of the mesh area of the metal mesh is provided a pattern region, wherein the pattern is composed of a metal mesh cloth having a missing line in a horizontal or vertical direction; the metal mesh cloth has a weft-free warp and weft node, and the structure is integrally formed, and the surface is smooth, that is, the metal mesh is formed. The wire mesh is continuous and non-woven.
图 2为所述金属丝网的局部放大示意图, 其由相互交错的丝网线 la构成, 本实施例中 所述金属网布的目数为 330目, 网布线径为 20um, 丝网布的厚度为 25um。  2 is a partially enlarged schematic view of the wire mesh, which is composed of mutually interlaced wire lines la, in which the mesh size of the metal mesh is 330 mesh, the mesh wire diameter is 20 um, and the thickness of the wire mesh is It is 25um.
图 3所示为所述金属网布受力缓冲带的局部放大示意图, 所述缓冲带的线径尺寸由按一 定变化规律变化, 本实施例所述规律如图 3所示, 由金属网布中间至边缘的线径尺寸逐步增 大, 即 rl〈r2〈r3, 如: rl=20面, r2=30um, r3=40面。 如图 1所示, 线径为 40um的外边与 网布的边孔区域相连。 如此设计可使得网布在绷紧受力时能更好的承受外界提供的拉力。  FIG. 3 is a partially enlarged schematic view showing the stress buffering strip of the metal mesh cloth. The diameter of the buffering strip varies according to a certain variation rule. The law described in this embodiment is shown in FIG. The middle-to-edge wire diameter gradually increases, that is, rl<r2<r3, such as: rl=20 faces, r2=30um, r3=40 faces. As shown in Figure 1, the outer edge of the wire diameter of 40um is connected to the edge area of the mesh. This design allows the mesh to withstand the tension provided by the outside when it is tight.
【实施例 2】 [Embodiment 2]
一种金属网布, 其基本架构和实施例 1相同, 其变换的部分如下: 网布的目数为 400 目, 网布线径为 25um, 丝网布的厚度为 20um。  A metal mesh has the same basic structure as that of Embodiment 1, and the transformed parts are as follows: The mesh has a mesh size of 400 mesh, the mesh wiring diameter is 25 μm, and the mesh cloth has a thickness of 20 μm.
在此基础上, 所述金属网布还有以下结构改动:  On this basis, the metal mesh has the following structural changes:
所述金属网布上设置有图案, 本实施例所述的图案为一组相互平行的线条 4a, 如图 4 所示。 图 5所示为图 4中 I I I部分的放大示意图, 图 5中的 5a即为图 4中所示线条 4a, 5a 处缺少横向的网格线。  The metal mesh is provided with a pattern, and the pattern described in this embodiment is a set of mutually parallel lines 4a, as shown in FIG. Fig. 5 is an enlarged view showing a portion I I I in Fig. 4, and 5a in Fig. 5 is a line 4a shown in Fig. 4, and a lateral grid line is absent at 5a.
图 6所示为图 5中 IV部分的放大示意图, 在缺失网格线的图形区域剩余的丝网线线径 有如下规律: 金属网布主体线径 rl〉图形区域内部丝网线的两端线径 r4〉图形区域内部丝网 线中间区域的线径 r5, 其为圆滑型结构; 所述缺失网格线的图形区域剩余的丝网线线径亦 可以是以下规律: 如图 7所示, 图形区域内部的丝网线线径尺寸均匀, 且有金属网布主体线 径 rl 图形区域内部丝网线的线径 r6。 图 8所示的是在本金属网布上涂布一层掩模物质后的掩模板局部示意图 (与图 5所示部 分相对应) , 如图所示所述掩模板的开口中仅存在一个方向的丝网线 8a, 其起到桥连的作 用, 比较图 5、 图 8有: 金属网布丝网线缺失区域的开口尺寸 Rl 掩模板图形对应区域的开 口尺寸 R2。 如此设计, 可以降低掩模板的掩模物质的涂覆难度系数, 且由于开口处丝网线 只有一个方向上, 相对较少的桥连减少了对印刷浆料的影响, 可以保证掩模板的下料效果 好。 Figure 6 is an enlarged schematic view of the portion IV of Figure 5, the remaining wire mesh diameter in the pattern area where the grid lines are missing There are the following rules: Metal mesh body diameter rl> Graphic area Internal wire line wire diameter r4> Graphic area Internal wire line intermediate area wire diameter r5, which is a rounded structure; The missing grid line graphic area The remaining wire diameter of the wire mesh may also be as follows: As shown in Fig. 7, the wire diameter of the wire mesh inside the pattern area is uniform, and the wire diameter r6 of the wire mesh inside the wire mesh main body RL pattern area is uniform. Figure 8 is a partial schematic view of a mask after coating a masking material on the metal mesh (corresponding to the portion shown in Figure 5), as shown in the figure, there is only one opening in the mask. The direction of the wire mesh 8a serves as a bridge. Comparing Figs. 5 and 8, there are: the opening size R1 of the missing area of the metal mesh wire and the opening size R2 of the corresponding area of the mask pattern. Such a design can reduce the coating difficulty factor of the mask material of the mask, and since the screen line has only one direction at the opening, relatively less bridging reduces the influence on the printing paste, and the blanking of the mask can be ensured. The effect is good.
【实施例 3】  [Embodiment 3]
一种金属网布, 其基本架构和实施例 1、 实施例 2相似, 其变换的部分如下: 所述金属 网布目数在 200〜450目之间, 线径尺寸在 15〜30um之间, 厚度 15〜30um之间。  A metal mesh, the basic structure of which is similar to that of the first embodiment and the second embodiment, and the transformed portion thereof is as follows: the mesh size of the metal mesh is between 200 and 450 mesh, and the wire diameter is between 15 and 30 um, and the thickness is Between 15~30um.
【实施例 4】  [Embodiment 4]
一种金属网布, 其基本架构和实施例 1、 实施例 2相似, 其变换的部分如下: 所述金属网布 目数、 线径尺寸、 厚度可以是实施例 3中所述数值区间数值的任意组合。 尽管已经示出和描述了本发明的实施例, 本领域的普通技术人员可以理解: 在不脱离本 发明的原理和宗旨的情况下可以对这些实施例进行多种变化、 修改、 替换和变型, 本发明的 范围由权利要求及其等同物限定。 A metal mesh, the basic structure of which is similar to that of the first embodiment and the second embodiment, and the transformed portion thereof is as follows: the metal mesh number, the wire diameter size, and the thickness may be any value of the numerical interval value described in the third embodiment. combination. While the embodiments of the present invention have been shown and described, the embodiments of the invention may The scope of the invention is defined by the claims and their equivalents.

Claims

权利要求书 Claim
1、 一种金属网布, 其上设置有网格区, 其特征在于所述网格区由两组相互垂直的网格 线组构成, 所述金属网布的网格区中间区域设置有图案区域, 所述图案是由金属网布沿横向 或纵向上丝网线的缺失构成; 所述金属网布目数为 100〜600 目, 线径尺寸为 10〜100um, 厚度为 10〜45um。 What is claimed is: 1. A metal mesh having a mesh area disposed thereon, wherein the mesh area is composed of two sets of mutually orthogonal grid lines, and a middle area of the mesh area of the metal mesh is provided with a pattern In the region, the pattern is formed by the absence of the wire mesh in the lateral or longitudinal direction of the metal mesh; the mesh has a mesh number of 100 to 600 mesh, a wire diameter of 10 to 100 um, and a thickness of 10 to 45 um.
2、 根据权利要求 1 所述的金属网布, 其特征在于构成所述金属网布网格区的网格线线 径均匀。  The metal mesh according to claim 1, wherein the grid lines constituting the mesh area of the metal mesh are uniform in diameter.
3、 根据权利要求 1 所述的金属网布, 其特征在于所述网格区的***设有受力缓冲带及 与缓冲带相连的边孔带。  3. The metal mesh according to claim 1, wherein the outer periphery of the mesh area is provided with a force buffering strip and a side hole strip connected to the buffer strip.
4、 根据权利要求 1 所述的金属网布, 其特征在于所述金属网布的结构为一体成型, 表 面光滑, 无编织型的节点; 所述金属网布网格线为连贯无编织型。  4. The metal mesh according to claim 1, wherein the metal mesh has a structure integrally formed with a smooth surface and a non-woven type node; and the metal mesh grid line is a continuous non-woven type.
5、 根据权利要求 1所述的金属网布, 其特征在于所述金属网布目数为 200〜450目, 线 径尺寸为 15〜30um, 厚度为 15〜30um。  The metal mesh according to claim 1, wherein the metal mesh has a mesh size of 200 to 450 mesh, a wire diameter of 15 to 30 um, and a thickness of 15 to 30 um.
6、 根据权利要求 1 所述的金属网布, 其特征在于金属网布上图形区域的丝网线线径不 大于非图形区域的丝网线线径。  6. The metal mesh according to claim 1, wherein the wire diameter of the pattern area on the metal mesh is not larger than the wire diameter of the non-graphic area.
7、 根据权利要求 1 所述的金属网布, 其特征在于所述金属网布上图形区域剩余的丝网 线线径均匀或两头粗中间细  7. The metal mesh according to claim 1, wherein the remaining wire mesh of the graphic area on the metal mesh is uniform in diameter or thin in both ends.
8、 根据权利要求 1 所述的金属网布, 其特征在于所述金属网布是通过电铸工艺制得, 其材质为纯镍材料或镍基合金材料。  8. The metal mesh according to claim 1, wherein the metal mesh is produced by an electroforming process and is made of a pure nickel material or a nickel-based alloy material.
9、 一种采用权利要求 1〜8中任意一种金属网布制得的掩模板, 其特征在于所述掩模板 图形区域的开口尺寸不大于所述金属网布上对应图形的丝网线缺失区域的尺寸。  9. A mask made of the metal mesh of any one of claims 1 to 8, characterized in that the opening size of the pattern area of the mask is not larger than the missing area of the screen line of the corresponding pattern on the metal mesh. size of.
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