WO2013073084A1 - 表示パネルの製造方法および表示パネル - Google Patents
表示パネルの製造方法および表示パネル Download PDFInfo
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- WO2013073084A1 WO2013073084A1 PCT/JP2012/005468 JP2012005468W WO2013073084A1 WO 2013073084 A1 WO2013073084 A1 WO 2013073084A1 JP 2012005468 W JP2012005468 W JP 2012005468W WO 2013073084 A1 WO2013073084 A1 WO 2013073084A1
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1248—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1292—Multistep manufacturing methods using liquid deposition, e.g. printing
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/123—Connection of the pixel electrodes to the thin film transistors [TFT]
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/124—Insulating layers formed between TFT elements and OLED elements
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
Definitions
- the present invention relates to a method for manufacturing a display panel such as an organic EL (Electro Luminescence) panel, and more particularly to a technique for forming a contact hole.
- a display panel such as an organic EL (Electro Luminescence) panel
- FIG. 22 is a cross-sectional view showing the structure of the organic EL panel described in Patent Document 1. In the figure, two pixels are shown.
- the organic EL panel includes a substrate 51, a gate electrode 52, a gate insulating film 53, a source / drain electrode 54, a semiconductor layer 56, a passivation film 57, a planarizing film 58, a pixel electrode 59, a partition wall 60, an organic EL layer 61, and a common electrode 62.
- a transistor that constitutes each drive circuit includes a gate electrode 52, a gate insulating film 53, a source / drain electrode 54, and a semiconductor layer 56, and is covered with a passivation film 57 and a planarizing film 58.
- the light emitting element includes a pixel electrode 59, an organic EL layer 61, and a common electrode 62, and is formed on the planarizing film 58.
- a contact hole is formed in the passivation film 57 and the planarization film 58, and the pixel electrode 59 of the light emitting element and the source / drain electrode 54 of the drive circuit are electrically connected via a contact metal 65 formed in the contact hole. Connected.
- Patent Document 1 a passivation film 57 made of silicon nitride is formed, and then a planarization film 58 made of an organic material is formed, and then the planarization film 58 and the passivation film 57 are etched. The procedure is described (paragraph 0048).
- a first layer is formed, then a second layer is formed thereon, and then the first and second layers are etched together to form an opening serving as a contact hole.
- This is a technique for forming a part. Therefore, both the first and second layers are exposed on the inner peripheral surface of the contact hole when the contact hole is formed. Therefore, if the material constituting the first layer is weak in resistance to a chemical solution or gas used in a process after the process of forming the second layer, there is a problem that the first layer is deteriorated. is there. For example, the above-mentioned problem occurs when the material constituting the first layer is weakly resistant to the chemical solution or gas used in the step of forming the contact metal.
- an object of the present invention is to provide a technique capable of suppressing the degradation of the first layer as much as possible even when the openings for the contact holes are formed in the first and second layers.
- a method for manufacturing a display panel includes a step of preparing a base substrate having an electrode formed on an upper surface, and a first opening on the base substrate at a position overlapping the electrode in plan view. Forming a first layer having a second opening having a smaller area than the first opening on the first layer at a position overlapping the first opening in plan view. Forming a second layer having, and forming a wiring layer in contact with the electrode inside the first and second openings, wherein the second layer includes the first layer A portion present on the first layer and a portion present in the first opening, and a portion present in the first opening of the second layer is an inner periphery of the first opening. The surface is covered.
- the inner peripheral surface of the first opening in the first layer is covered with the portion existing in the first opening of the second layer. Therefore, the first layer is not directly exposed to a chemical solution or a gas used in a step after the step of forming the second layer. Therefore, when openings for contact holes are formed in the first and second layers, even if the material constituting the first layer is weak in resistance to such chemicals and gases, the first layer Degradation can be suppressed as much as possible.
- Sectional drawing which shows the structure of the display panel which concerns on Embodiment 1 of this invention.
- Sectional drawing for demonstrating the manufacturing process of the display panel of FIG. Sectional drawing for demonstrating the manufacturing process of the display panel of FIG.
- Sectional drawing for demonstrating the manufacturing process of the display panel of FIG. Sectional drawing for demonstrating the manufacturing process of the display panel of FIG.
- Sectional drawing for demonstrating the manufacturing process of the display panel of FIG. Sectional drawing for demonstrating the manufacturing process of the display panel of FIG.
- Sectional drawing for demonstrating the manufacturing process of the display panel of FIG.
- Sectional drawing for demonstrating the manufacturing process of the display panel of FIG. Sectional drawing for demonstrating the manufacturing process of the display panel of FIG.
- a method for manufacturing a display panel includes a step of preparing a base substrate having an electrode formed on an upper surface, and a first opening on the base substrate at a position overlapping the electrode in plan view. Forming a first layer having a second opening having a smaller area than the first opening on the first layer at a position overlapping the first opening in plan view. Forming a second layer having, and forming a wiring layer in contact with the electrode inside the first and second openings, wherein the second layer includes the first layer A portion present on the first layer and a portion present in the first opening, and a portion present in the first opening of the second layer is an inner periphery of the first opening. The surface is covered.
- the inner peripheral surface of the first opening in the first layer is covered with the portion existing in the first opening of the second layer. Therefore, the first layer is not directly exposed to a chemical solution or a gas used in a step after the step of forming the second layer. Therefore, when openings for contact holes are formed in the first and second layers, even if the material constituting the first layer is weak in resistance to such chemicals and gases, the first layer Degradation can be suppressed as much as possible.
- the area of the first opening is smaller than the area of the electrode, and the lower surface of the portion of the second layer existing in the first opening is in contact with the upper surface of the electrode over the entire circumference. It is good to be.
- the first layer is a partition layer having a third opening for forming a functional material layer at a position different from the first opening
- the second layer is It is good also as being an overcoat layer which coat
- the base substrate may be one in which the electrode is formed on a gate insulating film, and the functional material layer may be a semiconductor layer formed on the gate insulating film.
- the first layer is a gate insulating film
- the second layer has a third opening for forming a functional material layer at a position different from the second opening. It may be a partition layer.
- the display panel includes a base substrate having an electrode formed on an upper surface thereof, and a first opening formed on the base substrate and having a first opening at a position overlapping the electrode in plan view. And a second layer formed on the first layer and having a second opening having a smaller area than the first opening at a position overlapping the first opening in plan view And a wiring layer formed in the first and second openings and in contact with the light emitting element and the electrode, wherein the second layer is a portion existing on the first layer. And a portion existing in the first opening, and a portion existing in the first opening of the second layer covers an inner peripheral surface of the first opening.
- FIG. 1 is a cross-sectional view showing the structure of a display panel according to Embodiment 1 of the present invention. In the figure, one pixel is shown.
- the display panel includes a substrate 1, a gate electrode 2, a gate insulating film 3, a source / drain electrode 4, a partition layer 5, a semiconductor layer 6, an overcoat layer 7, a planarization layer 8, a pixel electrode 9, a partition layer 10, and an organic EL layer. 11, a common electrode 12, and a sealing layer 13.
- the transistor constituting the drive circuit is composed of a gate electrode 2, a gate insulating film 3, a source / drain electrode 4, and a semiconductor layer 6.
- the transistors are inorganic TFTs (Thin Film Transistors) or organic TFTs. In this embodiment, two transistors are used per pixel.
- the light emitting element includes a pixel electrode 9, an organic EL layer 11, and a common electrode 12.
- the insulating layer interposed between the drive circuit and the light emitting element includes a partition layer 5, an overcoat layer 7 and a planarizing layer 8. In the portion A in the figure, the partition wall layer 5, the overcoat layer 7 and the planarizing layer 8 each have an opening at a position overlapping the source / drain electrode 4 in plan view, and a contact hole is formed thereby.
- a part of the pixel electrode 9 is recessed along the inner peripheral surface of the contact hole, and is in contact with the source / drain electrode 4 exposed at the bottom of the contact hole.
- a portion existing in the contact hole of the pixel electrode 9 functions as a wiring layer in contact with the source / drain electrode 4.
- the overcoat layer 7 includes a portion 71 existing on the partition wall layer 5 and a portion 72 existing inside the opening of the partition wall layer 5.
- a portion 72 existing inside the opening of the partition wall layer 5 covers the inner peripheral surface 51 of the opening of the partition wall layer 5.
- the area of the opening of the overcoat layer 7 is smaller than the area of the opening of the partition wall layer 5.
- the partition wall layer 5 is not directly exposed to a chemical solution or gas used in a process subsequent to the process of forming the overcoat layer 7. Therefore, even if the material constituting the partition wall 5 has such a low resistance to chemicals and gases, the deterioration of the partition layer 5 can be suppressed as much as possible.
- the substrate 1 can be formed using a known insulating material such as resin or glass.
- the gate electrode 2, the gate insulating film 3, the source / drain electrode 4, and the semiconductor layer 6 can all be formed using known materials used for inorganic TFTs or organic TFTs.
- the material used for the semiconductor layer 6 is a material that can be formed by a coating method such as an inkjet method.
- the partition layer 5 is made of a material having insulating properties and photosensitivity, and mainly prevents the ink containing the material of the semiconductor layer 6 from flowing out of a target position when the semiconductor layer 6 is formed by a coating method. It is provided for the purpose.
- an opening for forming the semiconductor layer 6 by a coating method and an opening for forming a contact hole are formed.
- the overcoat layer 7 is made of a material having insulating properties and photosensitivity, and is mainly provided for the purpose of covering the semiconductor layer 6. In the overcoat layer 7, an opening for forming a contact hole is formed.
- the planarization layer 8 is made of a material having insulating properties and photosensitivity, and is mainly provided for the purpose of planarizing the upper surface. An opening for forming a contact hole is formed in the planarizing layer 8.
- the pixel electrode 9, the organic EL layer 11, and the common electrode 12 can all be formed using known materials used for organic EL elements.
- the organic EL layer 11 includes a light emitting layer, and includes a hole injection layer, a hole transport layer, an electron injection layer, and an electron transport layer as necessary.
- the partition layer 10 is made of a material having insulating properties and photosensitivity. Mainly, when the organic EL layer 11 is formed by a coating method, the ink containing the material of the organic EL layer 11 flows out of the target position. It is provided for the purpose of preventing.
- the sealing layer 13 is made of a material having insulating properties and translucency, and is mainly provided for the purpose of preventing moisture and gas from entering the light emitting element and the driving circuit.
- ⁇ Manufacturing method> 2 to 7 are cross-sectional views for explaining a manufacturing process of the display panel of FIG.
- the substrate 1 is prepared, and the gate electrode 2 and the gate insulating film 3 are formed on the substrate 1 (FIG. 2A).
- the gate electrode 2 for example, a conductive material for forming a gate electrode is stacked on the substrate 1, a resist pattern is formed thereon, the conductive material is etched through the resist pattern, and the resist pattern is peeled off. Can be formed.
- the gate insulating film 3 has a contact hole for contacting the gate electrode 2 and the source / drain electrode 4.
- a gate insulating material layer for forming a gate insulating film is formed on the substrate 1 on which the gate electrode 2 is formed. Then, a photomask can be arranged, the gate insulating material layer is exposed through the photomask, and then the gate insulating material layer is developed.
- an SD material layer 4a for forming the source / drain electrode 4 is stacked on the gate insulating film 3 (FIG. 2B), and a resist pattern 4b having an opening 4c is formed thereon (FIG. 2C). )), The SD material layer 4a is etched through the resist pattern 4b (FIG. 2D), and the resist pattern 4b is peeled off (FIG. 2E). Thereby, a base substrate having the source / drain electrodes 4 formed on the upper surface can be formed.
- the source / drain electrode 4 may have a single layer structure or a multilayer structure. In the case of a single-layer structure, a film can be formed in a single process, so that the manufacturing process can be simplified.
- an appropriate material can be selected according to the required functions, such as a material having a high adhesion to the base and a material having a high electrical conductivity for the upper layer.
- the material of the lower layer is titanium (Ti) and the thickness is several nm
- the material of the upper layer is gold (Au) and the thickness is 50 nm to 100 nm.
- a partition material layer 5a for forming the partition layer 5 is formed on the base substrate on which the source / drain electrodes 4 are formed (FIG. 3A), a photomask 5d is disposed on the partition material layer 5a, and photo The partition wall material layer 5a is exposed through the mask 5d (FIG. 3B), and then the partition wall material layer 5a is developed.
- the partition wall layer 5 having the opening 5e for forming the semiconductor layer 6 and the opening 5f for forming the contact hole can be formed (FIG. 3C).
- the photomask 5d has a light shielding region 5b having a very small light transmission and an opening region 5c having a very large light transmission.
- the photomask 5d is formed so that the light shielding region 5b overlaps with the planned opening portion of the partition wall material layer 5a in plan view, and the opening region 5c overlaps with other regions.
- the semiconductor layer 6 is formed in the opening 5e of the partition wall layer 5 (FIG. 4A).
- the semiconductor layer 6 can be formed by, for example, a process in which an ink containing a semiconductor material for forming the semiconductor layer 6 and a solvent is applied to the opening 5e and the solvent is evaporated to leave the semiconductor material.
- an overcoat material layer 7a for forming the overcoat layer 7 is formed on the partition wall layer 5 on which the semiconductor layer 6 is formed (FIG. 4B), and a photomask 7d is disposed on the overcoat material layer 7a. Then, the overcoat material layer 7a is exposed through the photomask 7d (FIG. 5A), and then the overcoat material layer 7a is developed. As a result, an overcoat layer 7 having an opening 7e for forming a contact hole can be formed (FIG. 5B). Note that the photomask 7d has a light-shielding region 7b having a very small light transmittance and an opening region 7c having a very large light transmittance.
- the material for the overcoat layer 7 a photosensitive material of a type in which an unexposed portion is removed during development and an exposed portion remains as in the partition layer 5.
- the photomask 7d is formed so that the light shielding region 7b overlaps the planned opening portion of the overcoat material layer 7a in plan view and the opening region 7c overlaps the other region.
- the area of the opening 7 e of the overcoat layer 7 is smaller than the area of the opening 5 f of the partition wall layer 5 in plan view. That is, as shown in FIG. 5B, the diameter D2 of the opening 7e of the overcoat layer 7 is smaller than the diameter D1 of the opening 5f of the partition wall layer 5.
- the overcoat layer 7 can be provided with a portion 71 existing on the partition wall layer 5 and a portion 72 existing inside the opening 5 f of the partition wall layer 5.
- a portion 72 existing inside the opening 5 f of the partition wall layer 5 of the overcoat layer 7 covers the inner peripheral surface of the opening 5 f of the partition wall 5.
- a planarizing material layer 8a for forming the planarizing layer 8 is formed on the overcoat layer 7 in which the opening is formed (FIG. 6A), and a photomask 8d is disposed on the planarizing material layer 8a. Then, the planarizing material layer 8a is exposed through the photomask 8d (FIG. 6B), and then the planarizing material layer 8a is developed. As a result, the planarization layer 8 having the contact hole 8e can be formed (FIG. 6C). Note that the photomask 8d has a light shielding region 8b having a very small light transmittance and an opening region 8c having a very large light transmittance.
- the photomask 8d is formed such that the opening region 8c overlaps the planned opening portion of the planarizing material layer 8a in plan view and the light shielding region 8b overlaps the other region.
- the display panel can be formed by sequentially forming the pixel electrode 9, the partition layer 10, the organic EL layer 11, the common electrode 12, and the sealing layer 13 (FIG. 7).
- the first layer is described as the partition layer 5 and the second layer existing on the first layer is described as the overcoat layer 7.
- the present invention is not limited to this, and any combination of layers is applicable as long as the opening of the first layer and the opening of the second layer are formed in separate steps.
- the first layer is the gate insulating film 3 and the second layer is the partition layer 5 as a layer for providing an opening for forming a contact hole will be described. Note that the description of the same configuration as that of Embodiment 1 is omitted.
- FIG. 8 is a cross-sectional view showing the structure of the display panel according to Embodiment 2 of the present invention.
- the display panel includes a substrate 1, a gate electrode 2, a gate insulating film 3, a source / drain electrode 4, a partition layer 5, a semiconductor layer 6, an overcoat layer 7, a planarization layer 8, a pixel electrode 9, a partition layer 10, and an organic EL layer. 11, a common electrode 12, and a sealing layer 13.
- the structure of the transistor is a bottom gate-bottom contact type, and therefore the source / drain electrode 4 is located below the semiconductor layer 6.
- the structure of the transistor is a bottom gate-top contact type. Therefore, the source / drain electrode 4 is located above the semiconductor layer 6.
- the gate insulating film 3 and the partition wall layer 5 have openings at positions overlapping the gate electrode 2 in plan view, thereby forming contact holes.
- a part of the source / drain electrode 4 is recessed along the inner peripheral surface of the contact hole and is in contact with the gate electrode 2 exposed at the bottom of the contact hole.
- a portion existing in the contact hole of the source / drain electrode 4 functions as a wiring layer in contact with the gate electrode 2.
- the partition wall layer 5 includes a portion 51 existing on the gate insulating film 3 and a portion 52 existing inside the opening of the gate insulating film 3.
- a portion 52 existing inside the opening of the gate insulating film 3 covers the inner peripheral surface 31 of the opening of the gate insulating film 3.
- the area of the opening of the partition wall layer 5 is smaller than the area of the opening of the gate insulating film 3.
- the gate insulating film 3 is not directly exposed to a chemical solution or gas used in a process subsequent to the process of forming the partition wall layer 5. Therefore, even if the material constituting the gate insulating film 3 has such a low resistance to chemicals and gases, the deterioration of the gate insulating film 3 can be suppressed as much as possible.
- ⁇ Manufacturing method> 9 to 14 are cross-sectional views for explaining a manufacturing process of the display panel of FIG.
- the substrate 1 is prepared, and the gate electrode 2 is formed on the substrate 1.
- the base substrate having the gate electrode 2 formed on the upper surface can be formed.
- a gate insulating material layer 3a for forming the gate insulating film 3 is formed on the base substrate on which the gate electrode 2 is formed (FIG. 9A), and a photomask 3d is disposed on the gate insulating material layer 3a. Then, the gate insulating material layer 3a is exposed through the photomask 3d (FIG. 9B), and then the gate insulating material layer 3a is developed. As a result, the gate insulating film 3 having the opening 3e for forming the contact hole can be formed (FIG. 9C). Note that the photomask 3d has a light shielding region 3b having a very small light transmittance and an opening region 3c having a very large light transmittance.
- a photosensitive material of a type in which an unexposed portion is removed during development and an exposed portion remains as a material of the gate insulating film 3 is used.
- the photomask 3d is formed so that the light shielding region 3b overlaps with the planned opening portion of the gate insulating material layer 3a in plan view, and the opening region 3c overlaps with the other regions.
- a partition wall material layer 5a for forming the partition wall layer 5 is formed on the gate insulating film 3 (FIG. 10A), a photomask 5d is disposed on the partition wall material layer 5a, and the partition wall is interposed via the photomask 5d.
- the material layer 5a is exposed (FIG. 10B), and then the partition wall material layer 5a is developed.
- the partition layer 5 having the opening 5e for forming the semiconductor layer 6 and the opening 5f for forming the contact hole can be formed (FIG. 10C).
- the photomask 5d has a light shielding region 5b having a very small light transmission and an opening region 5c having a very large light transmission.
- the photomask 5d is formed so that the light shielding region 5b overlaps with the planned opening portion of the partition wall material layer 5a in plan view, and the opening region 5c overlaps with other regions.
- the area of the opening 5 f of the partition wall layer 5 is smaller than the area of the opening 3 e of the gate insulating film 3 in plan view. That is, as shown in FIG. 10C, the diameter D2 of the opening 5f of the partition wall layer 5 is smaller than the diameter D1 of the opening 3e of the gate insulating film 3.
- the partition layer 5 can be provided with a portion 51 existing on the gate insulating film 3 and a portion 52 existing inside the opening 3 e of the gate insulating film 3.
- a portion 52 of the partition wall layer 5 existing inside the opening 3 e of the gate insulating film 3 covers the inner peripheral surface of the opening 3 e of the gate insulating film 3.
- the gate insulating film 3 is not directly exposed to a chemical solution or a gas used in a process subsequent to the process of forming the partition wall layer 5. Therefore, even if the material constituting the gate insulating film 3 has low resistance to such chemicals and gases, the deterioration of the gate insulating film 3 can be suppressed as much as possible.
- the semiconductor layer 6 is formed in the opening 5e of the partition wall layer 5 (FIG. 11A).
- an SD material layer 4a for forming the source / drain electrode 4 is formed on the partition layer 5 on which the semiconductor layer 6 is formed (FIG. 11B), and the source / drain electrode 4 is formed through an etching process (FIG. 11B).
- the source / drain electrode 4 may have a single layer structure or a multilayer structure. In the case of a single-layer structure, a film can be formed in a single process, so that the manufacturing process can be simplified. In the case of a multilayer structure, the lower layer is made of a material with good charge injection properties in consideration of the interlayer resistance with the semiconductor, and the upper layer is made of a material that hardly breaks in consideration of the thermal expansion coefficient of the substrate.
- the lower layer material may be copper (Cu) and the thickness may be several nm
- the upper layer material may be molybdenum (Mo) and the thickness may be 50 nm to 100 nm.
- an overcoat material layer 7a for forming the overcoat layer 7 is formed on the partition wall layer 5 on which the source / drain electrodes 4 are formed (FIG. 12A), and the overcoat material layer 7a is formed through a photomask. By exposing and developing, an overcoat layer 7 having an opening 7e for forming a contact hole is formed (FIG. 12B).
- a planarizing material layer 8a for forming the planarizing layer 8 is formed on the overcoat layer 7 in which the opening is formed (FIG. 13A), and the planarizing material layer 8a is exposed through a photomask. Then, the flattening layer 8 having the contact hole 8e is formed by developing (FIG. 13B).
- the display panel can be formed by sequentially forming the pixel electrode 9, the partition layer 10, the organic EL layer 11, the common electrode 12, and the sealing layer 13 (FIG. 14).
- the opening is formed in each layer of a two-layer structure, but the present invention is not limited to this, and a three-layer structure or more is also applicable. In this case, it is only necessary that the area of the opening of the Nth layer is smaller than the area of the opening of the (N ⁇ 1) th layer (N is an integer of 2 or more).
- FIG. 15 is a cross-sectional view showing the structure of a display panel according to a modification of the first embodiment of the present invention.
- another overcoat layer 14 is formed on the overcoat layer 7.
- the overcoat layer 14 is made of a material having insulating properties and photosensitivity, and is mainly provided for the purpose of covering the overcoat layer 7.
- an opening for forming a contact hole is formed in the overcoat layer 14.
- 16 and 17 are cross-sectional views for explaining the manufacturing process of the display panel of FIG.
- An opening is formed in the overcoat layer 7 (FIG. 16 (a)), and an overcoat material layer 14a for forming the overcoat layer 14 is formed thereon (FIG. 16 (b)), and over the overcoat material layer 14a.
- the overcoat material layer 14a is exposed through the photomask 14d (FIG. 17A), and then the overcoat material layer 14a is developed.
- an overcoat layer 14 having an opening 14e for forming a contact hole can be formed (FIG. 17B).
- the photomask 14d has a light shielding region 14b having a very small light transmission and an opening region 14c having a very large light transmission.
- the material of the overcoat layer 14 a photosensitive material of a type in which an unexposed portion is removed during development and an exposed portion remains is used.
- the photomask 14d is formed so that the light shielding region 14b overlaps with the planned opening portion of the overcoat material layer 14a in plan view, and the opening region 14c overlaps with the other regions.
- the area of the opening 14 e of the overcoat layer 14 is smaller than the area of the opening 7 e of the overcoat layer 7 in plan view. That is, as shown in FIG. 17B, the diameter D3 of the opening 14e of the overcoat layer 14 is smaller than the diameter D2 of the opening 7e of the overcoat layer 7.
- the inner peripheral surface of the overcoat layer 7 is covered with the overcoat layer 14.
- the partition wall layer 5 and the overcoat layer 7 are not directly exposed to the chemical solution or gas used in the process after the process of forming the overcoat layer 14. Therefore, even if the material constituting the partition wall layer 5 and the overcoat layer 7 has low resistance to such chemicals and gases, the deterioration of the partition wall layer 5 and the overcoat layer 7 can be suppressed as much as possible.
- the planar shape of the opening of the partition wall layer 5 and the planar shape of the opening of the overcoat layer 7 are assumed to be the same, but the present invention is not limited to this. If the condition that the area of the opening of the overcoat layer 7 is smaller than the area of the opening of the partition layer 5 is satisfied, the planar shape of the opening of the partition layer 5 and the plane of the opening of the overcoat layer 7 are satisfied. The shape may be different. Examples of the planar shape of the opening of the partition wall layer 5 and the opening of the overcoat layer 7 include a quadrangle, a circle, an ellipse, and a polygon.
- Type of photosensitive material As a material for the second layer (overcoat layer 7 in the first embodiment, partition wall 5 in the second embodiment), an unexposed portion is removed during development and exposed.
- the photosensitive material of the type with which a part remains is used, it is not restricted to this, You may use the opposite type photosensitive material.
- the opening region 7t overlaps the planned opening portion of the overcoat material layer 7r in plan view, and the light shielding region 7s is formed. It is formed so as to overlap other regions. The same applies when the opposite type is used in the second embodiment.
- the area of the source / drain electrode 4 formed on the upper surface of the base substrate is larger than the area of the opening of the partition wall layer 5.
- the lower surface 73 of the portion 72 existing inside the opening of the partition wall layer 5 of the overcoat layer 7 is in contact with the upper surface of the source / drain electrode 4 over the entire circumference.
- the area of the source / drain electrode 4 may be smaller than the area of the opening of the partition wall layer 5 (see A part in the figure).
- the lower surface 73 of the portion 72 existing inside the opening of the partition wall layer 5 of the overcoat layer 7 is in contact with the upper surface of the gate insulating film 3.
- the area of the source / drain electrode 4 is smaller than that of the structure of FIG. 1, so that the parasitic capacitance formed by the source / drain electrode 4, the pixel electrode 9, and the insulating layer sandwiched therebetween is reduced. be able to. Therefore, the driving responsiveness of the light emitting element can be improved.
- the display panel can be manufactured with simple manufacturing equipment.
- a material having high water repellency may be adopted as the material of the gate insulating film 3.
- the adhesion between the overcoat layer 7 and the gate insulating film 3 is deteriorated, and a chemical solution or gas intrusion path may be formed at the interface between them.
- the overcoat layer 7 is in contact with the source / drain electrode 4 in the structure shown in FIG. It is difficult to form and the deterioration of the partition wall layer 5 can be suppressed.
- FIG. 20 is a diagram showing functional blocks when the display panel of FIG. 1 is applied to a display device.
- FIG. 21 is a diagram illustrating the appearance of the display device of FIG.
- the display device 20 includes a display panel 21 and a drive control unit 22 electrically connected thereto.
- the drive control unit 22 includes a drive circuit 23 and a control circuit 24 that controls the operation of the drive circuit 23.
- the present invention can be used for an organic EL display or the like.
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Abstract
Description
本発明の一態様に係る表示パネルの製造方法は、電極が上面に形成された下地基板を用意する工程と、前記下地基板上に、平面視で前記電極に重なる位置に第1の開口部を有する第1の層を形成する工程と、前記第1の層上に、平面視で前記第1の開口部に重なる位置に、前記第1の開口部よりも面積の小さな第2の開口部を有する第2の層を形成する工程と、前記第1および第2の開口部の内部に、前記電極と接触する配線層を形成する工程と、を含み、前記第2の層は、前記第1の層上に存在する部分と、前記第1の開口部内に存在する部分とを含み、前記第2の層の前記第1の開口部内に存在する部分が、前記第1の開口部の内周面を被覆している。
<全体構成>
図1は、本発明の実施の形態1に係る表示パネルの構造を示す断面図である。同図には1画素分が示されている。表示パネルは、基板1、ゲート電極2、ゲート絶縁膜3、ソースドレイン電極4、隔壁層5、半導体層6、オーバーコート層7、平坦化層8、画素電極9、隔壁層10、有機EL層11、共通電極12、および、封止層13を備える。駆動回路を構成するトランジスタは、ゲート電極2、ゲート絶縁膜3、ソースドレイン電極4および半導体層6から構成されている。トランジスタは、無機TFT(Thin Film Transistor)または有機TFTであり、本実施形態では、1画素当たり2個のトランジスタが用いられている。発光素子は、画素電極9、有機EL層11および共通電極12から構成されている。駆動回路と発光素子との間に介在する絶縁層は、隔壁層5、オーバーコート層7および平坦化層8からなる。図中A部において、隔壁層5、オーバーコート層7および平坦化層8は、平面視でソースドレイン電極4に重なる位置にそれぞれ開口部を有し、これらによりコンタクトホールが形成されている。そして、画素電極9の一部がコンタクトホールの内周面に沿って凹入し、コンタクトホールの底部に露出したソースドレイン電極4に接触している。画素電極9のコンタクトホール内に存在する部分がソースドレイン電極4に接触する配線層として機能する。
基板1は、樹脂またはガラスなどの公知の絶縁性の材料を用いて形成することができる。
図2乃至図7は、図1の表示パネルの製造工程を説明するための断面図である。
実施の形態1では、コンタクトホールを形成するための開口部を設ける層として、第1の層を隔壁層5とし、第1の層の上に存在する第2の層をオーバーコート層7として説明しているが、これに限られず、第1の層の開口部と第2の層の開口部とを別の工程で形成する場合であれば、如何なる層の組み合わせでも適用可能である。
図8は、本発明の実施の形態2に係る表示パネルの構造を示す断面図である。表示パネルは、基板1、ゲート電極2、ゲート絶縁膜3、ソースドレイン電極4、隔壁層5、半導体層6、オーバーコート層7、平坦化層8、画素電極9、隔壁層10、有機EL層11、共通電極12、および、封止層13を備える。
図9乃至図14は、図8の表示パネルの製造工程を説明するための断面図である。
以上、実施の形態を説明したが、これらの実施の形態に限られるものではない。例えば、以下のような変形例が考えられる。
実施の形態では、2層構造の各層で開口部を形成しているが、これに限られず、3層構造以上でも適用可能である。この場合、N番目の層の開口部の面積が、N-1番目の層の開口部の面積よりも小さければよい(Nは2以上の整数)。
実施の形態では、隔壁層5の開口部の平面形状とオーバーコート層7の開口部の平面形状とが同じであることを前提として説明しているが、これに限られず、オーバーコート層7の開口部の面積が隔壁層5の開口部の面積よりも小さいという条件さえ満たしていれば、隔壁層5の開口部の平面形状とオーバーコート層7の開口部の平面形状が異なることとしてもよい。隔壁層5の開口部およびオーバーコート層7の開口部の平面形状は、例えば、四角形、円形、楕円形、多角形などがある。
実施の形態では、第2の層(実施の形態1ではオーバーコート層7、実施の形態2では隔壁層5)の材料として、現像時に未露光部分が除去され露光部分が残留するタイプの感光性材料を用いているが、これに限られず、逆のタイプの感光性材料を用いてもよい。例えば、実施の形態1で逆のタイプを用いた場合、図18に示すように、フォトマスク7uは、開口領域7tが平面視でオーバーコート材料層7rの開口予定部に重なり、遮光領域7sがそれ以外の領域に重なるように形成される。実施の形態2で逆のタイプを用いた場合も同様である。
図1に示すように、実施の形態1では、下地基板の上面に形成されたソースドレイン電極4の面積は、隔壁層5の開口部の面積よりも大きい。そして、オーバーコート層7の隔壁層5の開口部の内部に存在する部分72の下面73は、全周にわたりソースドレイン電極4の上面に接触している。これに対し、例えば、図19に示すように、ソースドレイン電極4の面積が隔壁層5の開口部の面積よりも小さくてもよい(図中A部参照)。この場合、オーバーコート層7の隔壁層5の開口部の内部に存在する部分72の下面73はゲート絶縁膜3の上面に接触することになる。図1の構造と図19の構造とを比べると、それぞれ以下の特徴がある。どちらの構造を採用するかは、これらの特徴を勘案して決定すればよい。
図20は、図1の表示パネルを表示装置に適用した場合の機能ブロックを示す図である。図21は、図20の表示装置の外観を例示する図である。表示装置20は、表示パネル21と、これに電気的に接続された駆動制御部22とを備える。駆動制御部22は、駆動回路23と、駆動回路23の動作を制御する制御回路24とからなる。
2 ゲート電極
3 ゲート絶縁膜
3a ゲート絶縁材料層
3b 遮光領域
3c 開口領域
4 ソースドレイン電極
4a SD材料層
4b レジストパターン
5 隔壁層
5a 隔壁材料層
5b 遮光領域
5c 開口領域
5d フォトマスク
6 半導体層
7 オーバーコート層
7a オーバーコート材料層
7b 遮光領域
7c 開口領域
7d フォトマスク
7r オーバーコート材料層
7s 遮光領域
7t 開口領域
7u フォトマスク
8 平坦化層
8a 平坦化材料層
8b 遮光領域
8c 開口領域
8d フォトマスク
8e コンタクトホール
9 画素電極
10 隔壁層
11 有機EL層
12 共通電極
13 封止層
14 オーバーコート層
14a オーバーコート材料層
14b 遮光領域
14c 開口領域
14d フォトマスク
20 表示装置
21 表示パネル
22 駆動制御部
23 駆動回路
24 制御回路
51 基板
51 内周面
52 ゲート電極
53 ゲート絶縁膜
54 ソースドレイン電極
56 半導体層
57 パッシベーション膜
58 平坦化膜
59 画素電極
60 隔壁
61 有機EL層
62 共通電極
63 封止樹脂層
64 封止基板
65 コンタクトメタル
Claims (6)
- 電極が上面に形成された下地基板を用意する工程と、
前記下地基板上に、平面視で前記電極に重なる位置に第1の開口部を有する第1の層を形成する工程と、
前記第1の層上に、平面視で前記第1の開口部に重なる位置に、前記第1の開口部よりも面積の小さな第2の開口部を有する第2の層を形成する工程と、
前記第1および第2の開口部の内部に、前記電極と接触する配線層を形成する工程と、を含み、
前記第2の層は、前記第1の層上に存在する部分と、前記第1の開口部内に存在する部分とを含み、前記第2の層の前記第1の開口部内に存在する部分が、前記第1の開口部の内周面を被覆している、
表示パネルの製造方法。 - 前記第1の開口部の面積が、前記電極の面積よりも小さく、
前記第2の層の前記第1の開口部内に存在する部分の下面が、全周にわたり前記電極の上面に接触している、
請求項1に記載の表示パネルの製造方法。 - 前記第1の層は、前記第1の開口部とは異なる位置に、機能性材料層を形成するための第3の開口部を有する隔壁層であり、
前記第2の層は、前記第3の開口部に形成された機能性材料層を被覆するオーバーコート層である、
請求項1または2に記載の表示パネルの製造方法。 - 前記下地基板は、ゲート絶縁膜上に前記電極が形成されたものであり、
前記機能性材料層は、前記ゲート絶縁膜上に形成される半導体層である、
請求項3に記載の表示パネルの製造方法。 - 前記第1の層は、ゲート絶縁膜であり、
前記第2の層は、前記第2の開口部とは異なる位置に、機能性材料層を形成するための第3の開口部を有する隔壁層である、
請求項1に記載の表示パネルの製造方法。 - 電極が上面に形成された下地基板と、
前記下地基板上に形成され、平面視で前記電極に重なる位置に第1の開口部を有する第1の層と、
前記第1の層上に形成され、平面視で前記第1の開口部に重なる位置に、前記第1の開口部よりも面積の小さな第2の開口部を有する第2の層と、
前記第1および第2の開口部の内部に形成され、前記電極に接触する配線層と、を備え、
前記第2の層は、前記第1の層上に存在する部分と、前記第1の開口部内に存在する部分とを含み、前記第2の層の前記第1の開口部内に存在する部分が、前記第1の開口部の内周面を被覆している、
表示パネル。
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JP6457879B2 (ja) * | 2015-04-22 | 2019-01-23 | 株式会社ジャパンディスプレイ | 表示装置及びその製造方法 |
JP6960710B2 (ja) * | 2016-02-23 | 2021-11-05 | Juki株式会社 | ミシン |
JP6753959B2 (ja) * | 2017-01-25 | 2020-09-09 | シャープ株式会社 | Oledパネル |
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US9312283B2 (en) | 2016-04-12 |
JP6142359B2 (ja) | 2017-06-07 |
US20140197417A1 (en) | 2014-07-17 |
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