WO2013027936A3 - 흑색 감광성 수지 조성물 및 이를 구비한 화상표시장치 - Google Patents
흑색 감광성 수지 조성물 및 이를 구비한 화상표시장치 Download PDFInfo
- Publication number
- WO2013027936A3 WO2013027936A3 PCT/KR2012/006083 KR2012006083W WO2013027936A3 WO 2013027936 A3 WO2013027936 A3 WO 2013027936A3 KR 2012006083 W KR2012006083 W KR 2012006083W WO 2013027936 A3 WO2013027936 A3 WO 2013027936A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- resin composition
- photosensitive resin
- display device
- same
- image display
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
흑색 유기 안료, 절연성 금속산화물 입자, 알칼리 가용성 결합제 수지, 광중합성 화합물, 광중합 개시제 및 용제를 포함하는 흑색 감광성 수지 조성물이 제공된다. 상기 흑색 유기 재료는 페릴렌계 흑색 안료를 함유하는 차광층 형성용 감광성 수지 조성물이다.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110083475A KR20130021128A (ko) | 2011-08-22 | 2011-08-22 | 흑색 감광성 수지 조성물 및 이를 구비한 화상표시장치 |
KR10-2011-0083475 | 2011-08-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2013027936A2 WO2013027936A2 (ko) | 2013-02-28 |
WO2013027936A3 true WO2013027936A3 (ko) | 2013-05-10 |
Family
ID=47746955
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2012/006083 WO2013027936A2 (ko) | 2011-08-22 | 2012-07-31 | 흑색 감광성 수지 조성물 및 이를 구비한 화상표시장치 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR20130021128A (ko) |
WO (1) | WO2013027936A2 (ko) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108137443B (zh) * | 2015-07-31 | 2021-06-08 | 克美 | 芴衍生物、包含其的光聚合引发剂及光致抗蚀剂组合物 |
KR101832097B1 (ko) | 2016-10-31 | 2018-02-23 | 롬엔드하스전자재료코리아유한회사 | 착색 감광성 수지 조성물 및 이로부터 제조된 차광성 스페이서 |
WO2018194262A1 (ko) * | 2017-04-17 | 2018-10-25 | 삼성에스디아이 주식회사 | 명암비 개선 광학 필름, 이를 포함하는 편광판 및 이를 포함하는 액정표시장치 |
KR102063203B1 (ko) * | 2017-07-11 | 2020-01-07 | 삼성에스디아이 주식회사 | 명암비 개선 광학필름, 이를 포함하는 편광판 및 이를 포함하는 액정표시장치 |
KR102184231B1 (ko) * | 2017-04-17 | 2020-11-27 | 삼성에스디아이 주식회사 | 명암비 개선 광학 필름, 이를 포함하는 편광판 및 이를 포함하는 액정표시장치 |
KR102383518B1 (ko) * | 2018-02-06 | 2022-04-06 | 동우 화인켐 주식회사 | 흑색 감광성 수지 조성물, 이를 이용하여 제조된 화소정의막, 유기발광소자 및 화상 표시 장치 |
WO2021106221A1 (ja) * | 2019-11-29 | 2021-06-03 | 昭和電工マテリアルズ株式会社 | 遮光用紫外線硬化性組成物、遮光膜、及び、遮光膜を有する物品を製造する方法 |
KR20210106824A (ko) * | 2020-02-21 | 2021-08-31 | 동우 화인켐 주식회사 | 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10268121A (ja) * | 1997-03-21 | 1998-10-09 | Sumitomo Rubber Ind Ltd | ブラックマトリックス用インキとこれを用いたブラックマトリックス |
JP2001115043A (ja) * | 1998-10-08 | 2001-04-24 | Toppan Printing Co Ltd | 着色組成物とその製法およびそれを用いたカラーフィルタ、電極基板および液晶表示装置 |
KR20070026004A (ko) * | 2005-09-05 | 2007-03-08 | 도오꾜오까고오교 가부시끼가이샤 | 흑색 감광성 수지 조성물 |
KR20100066197A (ko) * | 2008-12-09 | 2010-06-17 | 제일모직주식회사 | 흑색 감광성 수지 조성물, 및 이를 이용한 차광층 및 칼럼 스페이서 |
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2011
- 2011-08-22 KR KR1020110083475A patent/KR20130021128A/ko not_active Application Discontinuation
-
2012
- 2012-07-31 WO PCT/KR2012/006083 patent/WO2013027936A2/ko active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10268121A (ja) * | 1997-03-21 | 1998-10-09 | Sumitomo Rubber Ind Ltd | ブラックマトリックス用インキとこれを用いたブラックマトリックス |
JP2001115043A (ja) * | 1998-10-08 | 2001-04-24 | Toppan Printing Co Ltd | 着色組成物とその製法およびそれを用いたカラーフィルタ、電極基板および液晶表示装置 |
KR20070026004A (ko) * | 2005-09-05 | 2007-03-08 | 도오꾜오까고오교 가부시끼가이샤 | 흑색 감광성 수지 조성물 |
KR20100066197A (ko) * | 2008-12-09 | 2010-06-17 | 제일모직주식회사 | 흑색 감광성 수지 조성물, 및 이를 이용한 차광층 및 칼럼 스페이서 |
Also Published As
Publication number | Publication date |
---|---|
KR20130021128A (ko) | 2013-03-05 |
WO2013027936A2 (ko) | 2013-02-28 |
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