WO2012111963A3 - 기재 필름 및 그의 제조방법 - Google Patents
기재 필름 및 그의 제조방법 Download PDFInfo
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- WO2012111963A3 WO2012111963A3 PCT/KR2012/001111 KR2012001111W WO2012111963A3 WO 2012111963 A3 WO2012111963 A3 WO 2012111963A3 KR 2012001111 W KR2012001111 W KR 2012001111W WO 2012111963 A3 WO2012111963 A3 WO 2012111963A3
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
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- C—CHEMISTRY; METALLURGY
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/10—Acylation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C39/00—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
- B29C39/003—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor characterised by the choice of material
- B29C39/006—Monomers or prepolymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
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- C—CHEMISTRY; METALLURGY
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/12—Esters of monohydric alcohols or phenols
- C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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- C—CHEMISTRY; METALLURGY
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
- C08G18/6216—Polymers of alpha-beta ethylenically unsaturated carboxylic acids or of derivatives thereof
- C08G18/622—Polymers of esters of alpha-beta ethylenically unsaturated carboxylic acids
- C08G18/6225—Polymers of esters of acrylic or methacrylic acid
- C08G18/6229—Polymers of hydroxy groups containing esters of acrylic or methacrylic acid with aliphatic polyalcohols
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- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8108—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
- C08G18/8116—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group esters of acrylic or alkylacrylic acid having only one isocyanate or isothiocyanate group
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/062—Copolymers with monomers not covered by C09J133/06
- C09J133/066—Copolymers with monomers not covered by C09J133/06 containing -OH groups
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- C09J175/00—Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
- C09J175/04—Polyurethanes
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- C09J175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
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- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
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- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
- C09J7/24—Plastics; Metallised plastics based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
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- C—CHEMISTRY; METALLURGY
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- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1808—C8-(meth)acrylate, e.g. isooctyl (meth)acrylate or 2-ethylhexyl (meth)acrylate
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- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/302—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive being pressure-sensitive, i.e. tacky at temperatures inferior to 30°C
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- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
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- C09J2433/00—Presence of (meth)acrylic polymer
- C09J2433/006—Presence of (meth)acrylic polymer in the substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
- Y10T428/2809—Web or sheet containing structurally defined element or component and having an adhesive outermost layer including irradiated or wave energy treated component
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Adhesive Tapes (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Laminated Bodies (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
본 발명은, 기재 필름 및 그의 제조방법에 관한 것이다. 본 발명에서는, 우수한 내열성 및 치수 안정성을 나타내는 기재 필름을 제공할 수 있으며, 상기 기재 필름은 응력 완화성이 탁월하여 잔류 응력에 의한 웨이퍼의 파손을 방지할 수 있고, 웨이퍼 가공 과정에서의 불균일한 압력의 인가에 의한 웨이퍼의 손상이나 비산 등을 억제할 수 있으며, 탁월한 절단성을 나타낸다. 이에 따라 본 발명의 기재 필름은, 다이싱, 백그라인딩 또는 픽업 등을 포함한 각종 웨이퍼 가공 공정에서의 가공용 시트로서 효과적으로 사용될 수 있다.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201280018385.3A CN103492466B (zh) | 2011-02-14 | 2012-02-14 | 衬底膜及其制备方法 |
EP12747060.7A EP2676991B1 (en) | 2011-02-14 | 2012-02-14 | Substrate film and method for manufacturing same |
US13/967,060 US9236303B2 (en) | 2011-02-14 | 2013-08-14 | Substrate film and method of manufacturing the same |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20110012989 | 2011-02-14 | ||
KR10-2011-0012989 | 2011-02-14 | ||
KR10-2012-0014775 | 2012-02-14 | ||
KR1020120014775A KR101548784B1 (ko) | 2011-02-14 | 2012-02-14 | 기재 필름 및 그의 제조방법 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/967,060 Continuation US9236303B2 (en) | 2011-02-14 | 2013-08-14 | Substrate film and method of manufacturing the same |
Publications (2)
Publication Number | Publication Date |
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WO2012111963A2 WO2012111963A2 (ko) | 2012-08-23 |
WO2012111963A3 true WO2012111963A3 (ko) | 2012-12-20 |
Family
ID=46884811
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2012/001111 WO2012111963A2 (ko) | 2011-02-14 | 2012-02-14 | 기재 필름 및 그의 제조방법 |
Country Status (5)
Country | Link |
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US (1) | US9236303B2 (ko) |
EP (1) | EP2676991B1 (ko) |
KR (1) | KR101548784B1 (ko) |
CN (1) | CN103492466B (ko) |
WO (1) | WO2012111963A2 (ko) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105378899B (zh) * | 2013-07-05 | 2018-05-11 | 琳得科株式会社 | 切割片 |
KR101874867B1 (ko) * | 2013-12-25 | 2018-07-05 | 디아이씨 가부시끼가이샤 | 자외선 경화형 점착제 조성물, 점착 필름, 및, 점착 필름의 제조 방법 |
JP2015193706A (ja) * | 2014-03-31 | 2015-11-05 | リンテック株式会社 | 導電性基板用表面保護フィルムの製造方法 |
TWI545996B (zh) * | 2014-04-23 | 2016-08-11 | 財團法人工業技術研究院 | 基板結構、其製造方法、及電子裝置之製造方法 |
US10676651B2 (en) * | 2016-03-09 | 2020-06-09 | Mitsubishi Chemical Corporation | Adhesive film and process for producing the same |
KR102090041B1 (ko) * | 2016-03-25 | 2020-03-18 | 주식회사 엘지화학 | 점착제 조성물 및 점착 테이프 |
KR102487395B1 (ko) * | 2016-09-20 | 2023-01-11 | 동우 화인켐 주식회사 | 점착제 조성물 및 그를 이용한 점착 시트 |
JP6298226B1 (ja) * | 2017-03-30 | 2018-03-20 | リンテック株式会社 | 保護膜形成用複合シート |
KR20180136712A (ko) * | 2017-06-15 | 2018-12-26 | 동우 화인켐 주식회사 | 점착제 조성물 및 그를 이용한 점착 시트 |
JP6467548B1 (ja) * | 2017-09-28 | 2019-02-13 | 日東電工株式会社 | 補強フィルム |
KR102031799B1 (ko) * | 2017-12-22 | 2019-10-14 | 동우 화인켐 주식회사 | 점착제 조성물, 이를 이용하여 제조된 점착시트, 광학부재 및 표시장치 |
KR102239210B1 (ko) * | 2018-06-04 | 2021-04-09 | 주식회사 엘지화학 | 백 그라인딩 테이프 |
WO2019245246A1 (ko) * | 2018-06-20 | 2019-12-26 | 주식회사 엘지화학 | 점착제 조성물 |
KR102220313B1 (ko) | 2018-06-20 | 2021-02-25 | 주식회사 엘지화학 | 점착제 조성물 |
JP7295774B2 (ja) | 2018-10-31 | 2023-06-21 | 三洋化成工業株式会社 | 粘着剤組成物 |
Citations (4)
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KR860002735A (ko) * | 1984-09-26 | 1986-04-28 | 윌리엄 이. 램버트 3세 | 감광성 중합체 조성물 및 그의 전해석출 공정 |
EP0590573A2 (en) * | 1992-10-01 | 1994-04-06 | Hitachi Chemical Company, Ltd. | Resin for plastic lens |
US20030059547A1 (en) * | 2001-09-27 | 2003-03-27 | Ali Rihan | Fast drying clearcoat refinish composition |
KR100629923B1 (ko) * | 1998-09-30 | 2006-09-29 | 돗빤호무즈가부시기가이샤 | 도전성페이스트와 도전성페이스트의 경화방법, 및 도전성페이스트를 이용한 비접촉형 데이터송수신체용 안테나의 형성방법과, 비접촉형 데이터송수신체 |
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US4877818A (en) | 1984-09-26 | 1989-10-31 | Rohm And Haas Company | Electrophoretically depositable photosensitive polymer composition |
DE3671577D1 (de) * | 1985-02-14 | 1990-06-28 | Bando Chemical Ind | Verfahren zum schneiden einer halbleiterscheibe in wuerfel. |
JP4493296B2 (ja) | 2002-07-26 | 2010-06-30 | 日東電工株式会社 | 加工用粘着シートとその製造方法 |
US7910206B2 (en) * | 2006-11-10 | 2011-03-22 | Nitto Denko Corporation | Self-rolling laminated sheet and self-rolling pressure-sensitive adhesive sheet |
KR100922226B1 (ko) * | 2007-12-10 | 2009-10-20 | 주식회사 엘지화학 | 접착 필름, 다이싱 다이본딩 필름 및 반도체 장치 |
US20110018127A1 (en) * | 2008-03-31 | 2011-01-27 | Byoungchul Lee | Multilayer UV-Curable Adhesive Film |
TWI507501B (zh) * | 2009-06-15 | 2015-11-11 | Lg Chemical Ltd | 用於處理晶圓的薄片 |
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2012
- 2012-02-14 KR KR1020120014775A patent/KR101548784B1/ko active IP Right Grant
- 2012-02-14 WO PCT/KR2012/001111 patent/WO2012111963A2/ko active Application Filing
- 2012-02-14 CN CN201280018385.3A patent/CN103492466B/zh active Active
- 2012-02-14 EP EP12747060.7A patent/EP2676991B1/en active Active
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Patent Citations (4)
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KR860002735A (ko) * | 1984-09-26 | 1986-04-28 | 윌리엄 이. 램버트 3세 | 감광성 중합체 조성물 및 그의 전해석출 공정 |
EP0590573A2 (en) * | 1992-10-01 | 1994-04-06 | Hitachi Chemical Company, Ltd. | Resin for plastic lens |
KR100629923B1 (ko) * | 1998-09-30 | 2006-09-29 | 돗빤호무즈가부시기가이샤 | 도전성페이스트와 도전성페이스트의 경화방법, 및 도전성페이스트를 이용한 비접촉형 데이터송수신체용 안테나의 형성방법과, 비접촉형 데이터송수신체 |
US20030059547A1 (en) * | 2001-09-27 | 2003-03-27 | Ali Rihan | Fast drying clearcoat refinish composition |
Also Published As
Publication number | Publication date |
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CN103492466A (zh) | 2014-01-01 |
EP2676991A4 (en) | 2014-11-05 |
US9236303B2 (en) | 2016-01-12 |
CN103492466B (zh) | 2017-02-15 |
US20140045319A1 (en) | 2014-02-13 |
KR101548784B1 (ko) | 2015-08-31 |
WO2012111963A2 (ko) | 2012-08-23 |
EP2676991A2 (en) | 2013-12-25 |
EP2676991B1 (en) | 2020-07-15 |
KR20120093102A (ko) | 2012-08-22 |
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