WO2012019531A1 - Method for manufacturing grid-pattern type touch panel - Google Patents

Method for manufacturing grid-pattern type touch panel Download PDF

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Publication number
WO2012019531A1
WO2012019531A1 PCT/CN2011/078117 CN2011078117W WO2012019531A1 WO 2012019531 A1 WO2012019531 A1 WO 2012019531A1 CN 2011078117 W CN2011078117 W CN 2011078117W WO 2012019531 A1 WO2012019531 A1 WO 2012019531A1
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conductive material
etching
grid pattern
touch panel
transparent conductive
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PCT/CN2011/078117
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French (fr)
Chinese (zh)
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陈栋南
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牧东光电（苏州）有限公司
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Publication of WO2012019531A1 publication Critical patent/WO2012019531A1/en

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

Definitions

  • the invention relates to a method for manufacturing a grid pattern type touch panel, and belongs to the technical field of touch panel process.
  • the processing method of the touch panel is to adopt a layer-by-layer bonding process, the bonding position is inaccurate, and the thickness and weight of the touch panel are increased, and the transmittance and touch sensitivity of the touch product are reduced. Quality is hard to get much improved.
  • a large amount of etching waste liquid is required to be etched due to the formation of a corresponding sensing line pattern, resulting in a large amount of etching waste liquid, and the environmental pollution is serious; and the color difference of the touch panel is large, and the etching trace is obvious.
  • the invention can perform photoresist etching on different depth layers of the touch panel by using a photoresist process to obtain a corresponding pattern; then plating a metal conductive material, attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace, and operating Simple can reduce manufacturing costs. Therefore, the organic combination of the electroplating process and the photoresist process can eliminate the complicated bonding process to process the touch panel, thereby effectively reducing the thickness and weight of the touch panel, and improving the transmittance and touch sensitivity.
  • the invention uses a photoresist technology to etch a transparent conductive material to form a grid pattern non-conductive region to reduce etching traces, reduce etching waste liquid to facilitate environmental protection; and then electroplating a metal conductive material, attaching a photoresist film on the metal conductive material, exposing and developing etching Metal routing, simple operation can reduce manufacturing costs.
  • the invention discloses a method for manufacturing a grid pattern type touch panel, comprising the following steps: performing under dust-free drying conditions;
  • Step 1 aging and crystallizing the transparent conductive material
  • Step 2 exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
  • Step 3 plating the metal conductive material on the surface of the transparent conductive material in the second step
  • Step 4 attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
  • Step 5 Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  • the molar concentration range of hydrochloric acid in the above step 2 is between 4.1 MOL/L and 4.5 MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1 MOL/L.
  • the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 ⁇ m; and in step 4, the thickness of the photoresist film ranges from 15 ⁇ m to 20 ⁇ m.
  • the etching reaction time is from 30 seconds to 60 seconds.
  • the metal conductive material is copper; the transparent conductive material is indium tin oxide.
  • the transparent optical adhesive has a thickness ranging from 50 micrometers to 100 micrometers.
  • the invention discloses a method for manufacturing a grid pattern type touch panel, which can perform photoresist etching on different depth layers of the touch panel by using a photoresist process to obtain a corresponding pattern, and etch a transparent conductive material into a grid by using a photoresist technology.
  • the pattern non-conducting area is used to reduce the etching trace, and the etching waste liquid is reduced to be environmentally friendly;
  • the metal conductive material is electroplated, the photoresist film is adhered on the metal conductive material, and the metal trace is formed by exposure and development etching, and the operation cost is simple to reduce the manufacturing cost.
  • the organic combination of the electroplating process and the photoresist process can eliminate the complicated bonding process to process the touch panel, thereby effectively reducing the thickness and weight of the touch product, and improving the transmittance and touch sensitivity.
  • Figure 1 is a schematic block diagram of a partial structure pattern of the present invention.
  • FIG. 2 is a schematic block diagram of a non-conductive region of a partial grid pattern of the present invention.
  • Figure 3 is a schematic block diagram of the production flow of the present invention.
  • the present invention discloses a method for manufacturing a grid pattern type touch panel, which comprises the following steps under dust-free drying conditions;
  • Step 1 aging and crystallizing the transparent conductive material
  • Step 2 exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
  • Step 3 plating the metal conductive material on the surface of the transparent conductive material in the second step
  • Step 4 attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
  • Step 5 Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  • the molar concentration range of hydrochloric acid in the above step 2 is between 4.1 MOL/L and 4.5 MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1 MOL/L.
  • the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 ⁇ m; and in step 4, the thickness of the photoresist film ranges from 15 ⁇ m to 20 ⁇ m.
  • the etching reaction time is from 30 seconds to 60 seconds.
  • the metal conductive material is copper; the transparent conductive material is indium tin oxide.
  • the transparent optical adhesive has a thickness ranging from 50 micrometers to 100 micrometers.
  • the thickness of the nameplate layer is 0.7 mm; the thickness of the metallic conductive material is 0.04 ⁇ m; the thickness of the transparent conductive material is 0.045 mm; the thickness of the substrate layer is 50 ⁇ m, and the substrate layer is polycarbonate.
  • a method for manufacturing a grid pattern type touch panel comprising the following steps: performing under dust-free drying conditions;
  • Step 1 aging and crystallizing the transparent conductive material
  • Step 2 exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
  • Step 3 plating the metal conductive material on the surface of the transparent conductive material in the second step
  • Step 4 attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
  • Step 5 Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  • the molar concentration of hydrochloric acid in the above step 2 is 4.1. MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1.0 MOL/L.
  • the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 ⁇ m; and the thickness of the photoresist film in step 4 is 15 ⁇ m. Among them, the etching reaction time was 30 seconds.
  • the thickness of the transparent optical adhesive in step 5 is 50 microns.
  • the thickness of the nameplate layer is 1.8 mm; the thickness of the metallic conductive material is 0.1 micrometer; the thickness of the transparent conductive material is 0.1 micrometer; the thickness of the substrate layer is 180 micrometers, and the substrate layer is hardened glass.
  • a method for manufacturing a grid pattern type touch panel comprising the following steps: performing under dust-free drying conditions;
  • Step 1 aging and crystallizing the transparent conductive material
  • Step 2 exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
  • Step 3 plating the metal conductive material on the surface of the transparent conductive material in the second step
  • Step 4 attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
  • Step 5 Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  • the molar concentration of hydrochloric acid in the above step 2 is 4.5. MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1.0 MOL/L.
  • the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 ⁇ m; and the thickness of the photoresist film in step 4 is 20 ⁇ m. Among them, the etching reaction time was 60 seconds.
  • the thickness of the transparent optical adhesive in step 5 is 100 micrometers.
  • the thickness of the nameplate layer is 1.1 mm; the thickness of the metal conductive material is 0.08 ⁇ m; the thickness of the transparent conductive material is 0.07 ⁇ m; the thickness of the substrate layer is 125 ⁇ m, and the substrate layer is polycarbonate resin.
  • a method for manufacturing a grid pattern type touch panel comprising the following steps: performing under dust-free drying conditions;
  • Step 1 aging and crystallizing the transparent conductive material
  • Step 2 exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
  • Step 3 plating the metal conductive material on the surface of the transparent conductive material in the second step
  • Step 4 attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
  • Step 5 Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  • the molar concentration of hydrochloric acid in the above step 2 is 4.3 MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1.0 MOL/L.
  • the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 ⁇ m; and the thickness of the photoresist film in step 4 is 18 ⁇ m. Among them, the etching reaction time was 45 seconds.
  • the thickness of the transparent optical adhesive in step 5 is 75 microns.

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Abstract

Disclosed is a method for manufacturing a touch panel of the grid-pattern type, comprising the steps of: etching a transparent conductive material to form nonconductive regions in a grid pattern by using photoresist technology, then electroplating a metallic conductive material thereon, affixing a photoresist film onto the metallic conductive material, and forming metal wiring by exposing, developing and etching thereon. The method can reduce the etching traces, and decrease the etching waste liquid so that it is beneficial for environmental protection, and it is simple to operate, which can reduce manufacturing costs.

Description

制造网格图案型触控面板的方法 Method for manufacturing grid pattern type touch panel 技术领域Technical field
本发明涉及一种制造网格图案型触控面板的方法，属于触控面板制程技术领域。 The invention relates to a method for manufacturing a grid pattern type touch panel, and belongs to the technical field of touch panel process.
背景技术Background technique
若是触控面板的加工方式是采取逐层贴合的工序，容易造成贴合对位不精确，而且增加触控面板的厚度和重量，降低触控产品的透光度及触控敏感度，产品品质很难得到很大提升。加工透明导电材料时，因为成形相应的感应线图案需要蚀刻掉大量透明导电材料，造成大量的蚀刻废液，环境污染严重；而且触控面板的色差大，蚀刻痕迹明显。If the processing method of the touch panel is to adopt a layer-by-layer bonding process, the bonding position is inaccurate, and the thickness and weight of the touch panel are increased, and the transmittance and touch sensitivity of the touch product are reduced. Quality is hard to get much improved. When processing a transparent conductive material, a large amount of etching waste liquid is required to be etched due to the formation of a corresponding sensing line pattern, resulting in a large amount of etching waste liquid, and the environmental pollution is serious; and the color difference of the touch panel is large, and the etching trace is obvious.
本发明通过采用光阻工艺可以对触控面板的不同深度层面进行光阻蚀刻得到相应的图案；再来电镀金属导电材料，在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线，操作简单可以降低制造成本。因此，电镀工艺与光阻工艺的有机结合可以省去复杂的贴合工序来加工触控面板，从而有效降低触控面板的厚度和重量，提高透光度和触控敏感度。The invention can perform photoresist etching on different depth layers of the touch panel by using a photoresist process to obtain a corresponding pattern; then plating a metal conductive material, attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace, and operating Simple can reduce manufacturing costs. Therefore, the organic combination of the electroplating process and the photoresist process can eliminate the complicated bonding process to process the touch panel, thereby effectively reducing the thickness and weight of the touch panel, and improving the transmittance and touch sensitivity.
技术问题technical problem
本发明使用光阻技术对透明导电材料蚀刻形成网格图案非导电区域来降低蚀刻痕迹，减少蚀刻废液利于环保；再来电镀金属导电材料，在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线，操作简单可以降低制造成本。The invention uses a photoresist technology to etch a transparent conductive material to form a grid pattern non-conductive region to reduce etching traces, reduce etching waste liquid to facilitate environmental protection; and then electroplating a metal conductive material, attaching a photoresist film on the metal conductive material, exposing and developing etching Metal routing, simple operation can reduce manufacturing costs.
技术解决方案Technical solution
本发明公开一种制造网格图案型触控面板的方法，包括如下步骤在无尘干燥条件下进行；The invention discloses a method for manufacturing a grid pattern type touch panel, comprising the following steps: performing under dust-free drying conditions;
步骤一：对透明导电材料老化结晶；Step 1: aging and crystallizing the transparent conductive material;
步骤二：曝光蚀刻老化结晶透明导电材料，在温度40摄氏度状态下，用盐酸对透明导电材料蚀刻，形成感应线和网格图案非导电区域；Step 2: exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
步骤三：在步骤二中透明导电材料表面电镀金属导电材料；Step 3: plating the metal conductive material on the surface of the transparent conductive material in the second step;
步骤四：在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线；其中，在室温状态下，用硫酸双氧水混合溶液蚀刻金属导电材料得到金属走线；Step 4: attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
步骤五：用透明光学胶将铭板层贴合在金属走线和透明导电材料上。Step 5: Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
上述步骤二中盐酸的摩尔浓度范围值在4.1MOL/L到4.5MOL/L之间；步骤四中硫酸双氧水混合液的摩尔浓度值是1MOL/L。步骤二中网格图案为方块矩阵；其中，单个方块蚀刻边长0.35毫米，蚀刻线宽60微米；步骤四中光阻膜的厚度范围值在15微米到20微米之间。蚀刻反应时间为30秒钟到60秒钟。金属导电材料是铜；透明导电材料是氧化铟锡。步骤五中透明光学胶的厚度范围值在50微米到100微米之间。最后各线路图案成形后用光阻剂清除残余光阻膜，提高产品外观品质。The molar concentration range of hydrochloric acid in the above step 2 is between 4.1 MOL/L and 4.5 MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1 MOL/L. In the second step, the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 μm; and in step 4, the thickness of the photoresist film ranges from 15 μm to 20 μm. The etching reaction time is from 30 seconds to 60 seconds. The metal conductive material is copper; the transparent conductive material is indium tin oxide. In step 5, the transparent optical adhesive has a thickness ranging from 50 micrometers to 100 micrometers. Finally, after the pattern of each line is formed, the photoresist is used to remove the residual photoresist film to improve the appearance quality of the product.
有益效果Beneficial effect
本发明公开了制造网格图案型触控面板的方法，通过采用光阻工艺可以对触控面板的不同深度层面进行光阻蚀刻得到相应的图案，使用光阻技术对透明导电材料蚀刻形成网格图案非导电区域来降低蚀刻痕迹，减少蚀刻废液利于环保；再来电镀金属导电材料，在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线，操作简单可以降低制造成本。电镀工艺与光阻工艺的有机结合可以省去复杂的贴合工序来加工触控面板，从而有效降低触控产品的厚度重量，提高透光度和触控敏感度。 The invention discloses a method for manufacturing a grid pattern type touch panel, which can perform photoresist etching on different depth layers of the touch panel by using a photoresist process to obtain a corresponding pattern, and etch a transparent conductive material into a grid by using a photoresist technology. The pattern non-conducting area is used to reduce the etching trace, and the etching waste liquid is reduced to be environmentally friendly; the metal conductive material is electroplated, the photoresist film is adhered on the metal conductive material, and the metal trace is formed by exposure and development etching, and the operation cost is simple to reduce the manufacturing cost. The organic combination of the electroplating process and the photoresist process can eliminate the complicated bonding process to process the touch panel, thereby effectively reducing the thickness and weight of the touch product, and improving the transmittance and touch sensitivity.
附图说明DRAWINGS
图1是本发明的局部结构图案示意框图。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic block diagram of a partial structure pattern of the present invention.
图2是本发明的局部网格图案非导电区域示意框图。2 is a schematic block diagram of a non-conductive region of a partial grid pattern of the present invention.
图3是本发明的制作流程示意框图。Figure 3 is a schematic block diagram of the production flow of the present invention.
本发明的实施方式Embodiments of the invention
下面是本发明的具体实施例来进一步描述：The following is a specific embodiment of the invention to further describe:
图3所示，本发明公开一种制造网格图案型触控面板的方法，包括如下步骤在无尘干燥条件下进行；As shown in FIG. 3, the present invention discloses a method for manufacturing a grid pattern type touch panel, which comprises the following steps under dust-free drying conditions;
步骤一：对透明导电材料老化结晶；Step 1: aging and crystallizing the transparent conductive material;
步骤二：曝光蚀刻老化结晶透明导电材料，在温度40摄氏度状态下，用盐酸对透明导电材料蚀刻，形成感应线和网格图案非导电区域；Step 2: exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
步骤三：在步骤二中透明导电材料表面电镀金属导电材料；Step 3: plating the metal conductive material on the surface of the transparent conductive material in the second step;
步骤四：在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线；其中，在室温状态下，用硫酸双氧水混合溶液蚀刻金属导电材料得到金属走线；Step 4: attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
步骤五：用透明光学胶将铭板层贴合在金属走线和透明导电材料上。Step 5: Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
上述步骤二中盐酸的摩尔浓度范围值在4.1MOL/L到4.5MOL/L之间；步骤四中硫酸双氧水混合液的摩尔浓度值是1MOL/L。步骤二中网格图案为方块矩阵；其中，单个方块蚀刻边长0.35毫米，蚀刻线宽60微米；步骤四中光阻膜的厚度范围值在15微米到20微米之间。蚀刻反应时间为30秒钟到60秒钟。金属导电材料是铜；透明导电材料是氧化铟锡。步骤五中透明光学胶的厚度范围值在50微米到100微米之间。The molar concentration range of hydrochloric acid in the above step 2 is between 4.1 MOL/L and 4.5 MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1 MOL/L. In the second step, the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 μm; and in step 4, the thickness of the photoresist film ranges from 15 μm to 20 μm. The etching reaction time is from 30 seconds to 60 seconds. The metal conductive material is copper; the transparent conductive material is indium tin oxide. In step 5, the transparent optical adhesive has a thickness ranging from 50 micrometers to 100 micrometers.
实施例1：Example 1:
铭板层的厚度是0.7毫米；金属导电材料的厚度是0.04微米；透明导电材料的厚度是0.045毫米；基板层的厚度是50微米，基板层是聚碳酸树脂。The thickness of the nameplate layer is 0.7 mm; the thickness of the metallic conductive material is 0.04 μm; the thickness of the transparent conductive material is 0.045 mm; the thickness of the substrate layer is 50 μm, and the substrate layer is polycarbonate.
制造网格图案型触控面板的方法，包括如下步骤在无尘干燥条件下进行；A method for manufacturing a grid pattern type touch panel, comprising the following steps: performing under dust-free drying conditions;
步骤一：对透明导电材料老化结晶；Step 1: aging and crystallizing the transparent conductive material;
步骤二：曝光蚀刻老化结晶透明导电材料，在温度40摄氏度状态下，用盐酸对透明导电材料蚀刻，形成感应线和网格图案非导电区域；Step 2: exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
步骤三：在步骤二中透明导电材料表面电镀金属导电材料；Step 3: plating the metal conductive material on the surface of the transparent conductive material in the second step;
步骤四：在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线；其中，在室温状态下，用硫酸双氧水混合溶液蚀刻金属导电材料得到金属走线；Step 4: attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
步骤五：用透明光学胶将铭板层贴合在金属走线和透明导电材料上。Step 5: Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
上述步骤二中盐酸的摩尔浓度是4.1 MOL/L；步骤四中硫酸双氧水混合液的摩尔浓度是1.0MOL/L。步骤二中网格图案为方块矩阵；其中，单个方块蚀刻边长0.35毫米，蚀刻线宽60微米；步骤四中光阻膜的厚度是15微米。其中，蚀刻反应时间为30秒钟。步骤五中透明光学胶的厚度是50微米。The molar concentration of hydrochloric acid in the above step 2 is 4.1. MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1.0 MOL/L. In the second step, the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 μm; and the thickness of the photoresist film in step 4 is 15 μm. Among them, the etching reaction time was 30 seconds. The thickness of the transparent optical adhesive in step 5 is 50 microns.
实施例2：Example 2:
铭板层的厚度是1.8毫米；金属导电材料的厚度是0.1微米；透明导电材料的厚度是0.1微米；基板层的厚度是180微米，基板层是硬化玻璃。The thickness of the nameplate layer is 1.8 mm; the thickness of the metallic conductive material is 0.1 micrometer; the thickness of the transparent conductive material is 0.1 micrometer; the thickness of the substrate layer is 180 micrometers, and the substrate layer is hardened glass.
制造网格图案型触控面板的方法，包括如下步骤在无尘干燥条件下进行；A method for manufacturing a grid pattern type touch panel, comprising the following steps: performing under dust-free drying conditions;
步骤一：对透明导电材料老化结晶；Step 1: aging and crystallizing the transparent conductive material;
步骤二：曝光蚀刻老化结晶透明导电材料，在温度40摄氏度状态下，用盐酸对透明导电材料蚀刻，形成感应线和网格图案非导电区域；Step 2: exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
步骤三：在步骤二中透明导电材料表面电镀金属导电材料；Step 3: plating the metal conductive material on the surface of the transparent conductive material in the second step;
步骤四：在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线；其中，在室温状态下，用硫酸双氧水混合溶液蚀刻金属导电材料得到金属走线；Step 4: attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
步骤五：用透明光学胶将铭板层贴合在金属走线和透明导电材料上。Step 5: Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
上述步骤二中盐酸的摩尔浓度是4.5 MOL/L；步骤四中硫酸双氧水混合液的摩尔浓度是1.0MOL/L。步骤二中网格图案为方块矩阵；其中，单个方块蚀刻边长0.35毫米，蚀刻线宽60微米；步骤四中光阻膜的厚度是20微米。其中，蚀刻反应时间为60秒钟。步骤五中透明光学胶的厚度是100微米。The molar concentration of hydrochloric acid in the above step 2 is 4.5. MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1.0 MOL/L. In the second step, the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 μm; and the thickness of the photoresist film in step 4 is 20 μm. Among them, the etching reaction time was 60 seconds. The thickness of the transparent optical adhesive in step 5 is 100 micrometers.
实施例3：Example 3:
铭板层的厚度是1.1毫米；金属导电材料的厚度是0.08微米；透明导电材料的厚度是0.07微米；基板层的厚度是125微米，基板层是聚碳酸树脂。The thickness of the nameplate layer is 1.1 mm; the thickness of the metal conductive material is 0.08 μm; the thickness of the transparent conductive material is 0.07 μm; the thickness of the substrate layer is 125 μm, and the substrate layer is polycarbonate resin.
制造网格图案型触控面板的方法，包括如下步骤在无尘干燥条件下进行；A method for manufacturing a grid pattern type touch panel, comprising the following steps: performing under dust-free drying conditions;
步骤一：对透明导电材料老化结晶；Step 1: aging and crystallizing the transparent conductive material;
步骤二：曝光蚀刻老化结晶透明导电材料，在温度40摄氏度状态下，用盐酸对透明导电材料蚀刻，形成感应线和网格图案非导电区域；Step 2: exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
步骤三：在步骤二中透明导电材料表面电镀金属导电材料；Step 3: plating the metal conductive material on the surface of the transparent conductive material in the second step;
步骤四：在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线；其中，在室温状态下，用硫酸双氧水混合溶液蚀刻金属导电材料得到金属走线；Step 4: attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
步骤五：用透明光学胶将铭板层贴合在金属走线和透明导电材料上。Step 5: Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
上述步骤二中盐酸的摩尔浓度是4.3MOL/L；步骤四中硫酸双氧水混合液的摩尔浓度是1.0MOL/L。步骤二中网格图案为方块矩阵；其中，单个方块蚀刻边长0.35毫米，蚀刻线宽60微米；步骤四中光阻膜的厚度是18微米。其中，蚀刻反应时间为45秒钟。步骤五中透明光学胶的厚度是75微米。The molar concentration of hydrochloric acid in the above step 2 is 4.3 MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1.0 MOL/L. In the second step, the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 μm; and the thickness of the photoresist film in step 4 is 18 μm. Among them, the etching reaction time was 45 seconds. The thickness of the transparent optical adhesive in step 5 is 75 microns.

Claims (6)

  1. 一种制造网格图案型触控面板的方法，包括如下步骤，其特征在于：所述步骤在无尘干燥条件下进行；A method for manufacturing a grid pattern type touch panel, comprising the steps of: performing the step under dust-free drying conditions;
    步骤一：对透明导电材料老化结晶；Step 1: aging and crystallizing the transparent conductive material;
    步骤二：曝光蚀刻老化结晶透明导电材料，在温度40摄氏度状态下，用盐酸对透明导电材料蚀刻，形成感应线和网格图案非导电区域；Step 2: exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
    步骤三：在步骤二中透明导电材料表面电镀金属导电材料；Step 3: plating the metal conductive material on the surface of the transparent conductive material in the second step;
    步骤四：在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线；其中，在室温状态下，用硫酸双氧水混合溶液蚀刻金属导电材料得到金属走线；Step 4: attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
    步骤五：用透明光学胶将铭板层贴合在金属走线和透明导电材料上。Step 5: Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  2. 如权利要求1所述制造网格图案型触控面板的方法，其特征在于：所述步骤二中盐酸的摩尔浓度范围值在4.1MOL/L到4.5MOL/L之间；步骤四中硫酸双氧水混合液的摩尔浓度值是1MOL/L。The method for manufacturing a grid pattern type touch panel according to claim 1, wherein the molar concentration range of hydrochloric acid in the second step is between 4.1 MOL/L and 4.5 MOL/L; and the sulfuric acid hydrogen peroxide in the fourth step The molar concentration of the mixed solution was 1 MOL/L.
  3. 如权利要求1所述制造网格图案型触控面板的方法，其特征在于：所述步骤二中网格图案为方块矩阵；其中，单个方块蚀刻边长0.35毫米，蚀刻线宽60微米；步骤四中光阻膜的厚度范围值在15微米到20微米之间。The method for fabricating a grid pattern type touch panel according to claim 1, wherein the grid pattern in the second step is a matrix of squares; wherein a single square has a side length of 0.35 mm and an etch line width of 60 μm; The thickness of the four-thin photoresist film ranges from 15 microns to 20 microns.
  4. 如权利要求1所述制造网格图案型触控面板的方法，其特征在于：所述蚀刻反应时间为30秒钟到60秒钟。A method of manufacturing a grid pattern type touch panel according to claim 1, wherein said etching reaction time is from 30 seconds to 60 seconds.
  5. 如权利要求1所述制造网格图案型触控面板的方法，其特征在于：所述金属导电材料是铜；透明导电材料是氧化铟锡。The method of manufacturing a grid pattern type touch panel according to claim 1, wherein the metal conductive material is copper; and the transparent conductive material is indium tin oxide.
  6. 如权利要求1所述制造网格图案型触控面板的方法，其特征在于：所述步骤五中透明光学胶的厚度范围值在50微米到100微米之间。The method of fabricating a grid pattern type touch panel according to claim 1, wherein the thickness of the transparent optical glue in the step 5 is between 50 micrometers and 100 micrometers.
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