WO2011031089A3 - 세정액 조성물 - Google Patents

세정액 조성물 Download PDF

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Publication number
WO2011031089A3
WO2011031089A3 PCT/KR2010/006174 KR2010006174W WO2011031089A3 WO 2011031089 A3 WO2011031089 A3 WO 2011031089A3 KR 2010006174 W KR2010006174 W KR 2010006174W WO 2011031089 A3 WO2011031089 A3 WO 2011031089A3
Authority
WO
WIPO (PCT)
Prior art keywords
solution composition
cleaning solution
present
metal
aqueous cleaning
Prior art date
Application number
PCT/KR2010/006174
Other languages
English (en)
French (fr)
Other versions
WO2011031089A2 (ko
Inventor
윤효중
방순홍
김성식
이승용
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to CN2010800381376A priority Critical patent/CN102498197A/zh
Publication of WO2011031089A2 publication Critical patent/WO2011031089A2/ko
Publication of WO2011031089A3 publication Critical patent/WO2011031089A3/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/08—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/28—Organic compounds containing halogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5022—Organic solvents containing oxygen
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/263—Ethers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Emergency Medicine (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

본 발명은 평판표시장치(FPD)를 제조하는 공정에 있어서, 박막트랜지스터의 채널부에 형성되는 오염물을 제거하기 위한 수계 세정액 조성물 및 이를 이용한 세정방법에 관한 것이다. 본 발명의 수계 세정액 조성물은 박막트랜지스터의 채널부에 형성되는 유기오염물 및 금속-레지스트 침착물, 금속산화물, 금속 착화물에 대한 세정력이 우수할 뿐만 아니라, 기판상에 형성되어 있는 금속배선 특히, 구리 및 구리합금 배선, 및 절연막의 부식방지 효과도 우수하다. 또한, 다량의 탈이온수를 포함하고 있어 취급이 용이하며 환경적으로 유리하다.
PCT/KR2010/006174 2009-09-11 2010-09-10 세정액 조성물 WO2011031089A2 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2010800381376A CN102498197A (zh) 2009-09-11 2010-09-10 清洗组成物

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2009-0086046 2009-09-11
KR1020090086046A KR20110028109A (ko) 2009-09-11 2009-09-11 세정액 조성물

Publications (2)

Publication Number Publication Date
WO2011031089A2 WO2011031089A2 (ko) 2011-03-17
WO2011031089A3 true WO2011031089A3 (ko) 2011-08-04

Family

ID=43732966

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/006174 WO2011031089A2 (ko) 2009-09-11 2010-09-10 세정액 조성물

Country Status (4)

Country Link
KR (1) KR20110028109A (ko)
CN (1) CN102498197A (ko)
TW (1) TW201127952A (ko)
WO (1) WO2011031089A2 (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101101378B1 (ko) * 2009-12-31 2012-01-02 주식회사 엘지화학 Ｔｆｔ-ｌｃｄ용 세정액 조성물
KR101275659B1 (ko) * 2011-12-26 2013-06-17 원광대학교산학협력단 편물기를 이용한 3차원 세포지지체 제조 방법 및 그 세포지지체
KR101895621B1 (ko) * 2012-07-19 2018-09-05 동우 화인켐 주식회사 유-무기 하이브리드형 배향막 제거 조성물
TWI561615B (en) 2012-07-24 2016-12-11 Ltc Co Ltd Composition for removal and prevention of formation of oxide on surface of metal wiring
KR101932774B1 (ko) * 2013-03-15 2018-12-26 동우 화인켐 주식회사 평판표시장치용 세정제 조성물 및 이를 이용한 세정방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010030323A (ko) * 1999-09-10 2001-04-16 나까네 히사시 포토레지스트용 박리액 및 이것을 사용한 포토레지스트박리방법
KR20050006191A (ko) * 2002-04-26 2005-01-15 도오꾜오까고오교 가부시끼가이샤 포토레지스트 박리 방법
KR20050076756A (ko) * 2004-01-23 2005-07-27 도오꾜오까고오교 가부시끼가이샤 박리 세정액, 그 박리 세정액을 사용한 반도체기판세정방법 및 금속배선 형성방법
KR20060049205A (ko) * 2004-06-15 2006-05-18 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 기판으로부터 잔사를 제거하기 위한 조성물 및 그의 사용방법
KR20060048757A (ko) * 2004-07-01 2006-05-18 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 탈거 및 세정용 조성물 및 이의 용도

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010030323A (ko) * 1999-09-10 2001-04-16 나까네 히사시 포토레지스트용 박리액 및 이것을 사용한 포토레지스트박리방법
KR20050006191A (ko) * 2002-04-26 2005-01-15 도오꾜오까고오교 가부시끼가이샤 포토레지스트 박리 방법
KR20050076756A (ko) * 2004-01-23 2005-07-27 도오꾜오까고오교 가부시끼가이샤 박리 세정액, 그 박리 세정액을 사용한 반도체기판세정방법 및 금속배선 형성방법
KR20060049205A (ko) * 2004-06-15 2006-05-18 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 기판으로부터 잔사를 제거하기 위한 조성물 및 그의 사용방법
KR20060048757A (ko) * 2004-07-01 2006-05-18 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 탈거 및 세정용 조성물 및 이의 용도

Also Published As

Publication number Publication date
TW201127952A (en) 2011-08-16
KR20110028109A (ko) 2011-03-17
WO2011031089A2 (ko) 2011-03-17
CN102498197A (zh) 2012-06-13

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