WO2009005412A2 - Method for producing polycrystalline silicon - Google Patents
Method for producing polycrystalline silicon Download PDFInfo
- Publication number
- WO2009005412A2 WO2009005412A2 PCT/RU2008/000523 RU2008000523W WO2009005412A2 WO 2009005412 A2 WO2009005412 A2 WO 2009005412A2 RU 2008000523 W RU2008000523 W RU 2008000523W WO 2009005412 A2 WO2009005412 A2 WO 2009005412A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- silicon
- hydrofluoric acid
- tetrafluoride
- magnesium
- powder
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/10705—Tetrafluoride
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/033—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by reduction of silicon halides or halosilanes with a metal or a metallic alloy as the only reducing agents
Definitions
- the invention relates to the field of metallurgy and / or chemistry, and in particular, to methods and devices for producing polycrystalline silicon X ⁇ of solar quality “in the form of a spherical powder from phosphorus production wastes, namely from a solution of hydrofluoric acid.
- the cost of polycrystalline silicon is determined mainly by the cost of raw materials, consumable technological materials, energy costs and the cost of ensuring environmental and technological safety of production.
- Prerequisite for reducing the cost of silicon is the use as a source of raw materials for its production of environmentally harmful technological waste from chemical industries annually generated in the amount of tens of thousands of tons in the Russian Federation, USA, Canada, CIS countries, such as Belarus, Ukraine; Romania, Czech Republic and other countries.
- a known method of producing silicon tetrafluoride from a solution of hydrofluoric acid including the formation of salts of hydrofluoric acid, washing, drying and subsequent decomposition with the formation of gaseous silicon tetrafluoride and hydrogen fluoride, followed by separation of the final product [patent RU 2046095Cl IPC 6 C01BZZ / 10, publ. 10.20.1995].
- the disadvantage of this method is that after the stage of decomposition of the salt of hydrofluoric acid, the released gaseous products of silicon teratafluoride (SiF 4 gas ) and hydrogen fluoride [HF raz ) are separated by low-temperature condensation of HF at a temperature of 78 ° C.
- SiF 4 gas silicon teratafluoride
- HF raz hydrogen fluoride
- a known method of producing silicon tetrafluoride from hydrofluoric acid in which the decomposition of hydrofluoric acid into silicon tetrafluoride and hydrogen fluoride is carried out by heating the acid to a temperature of 112 ° C, after which the gas mixture is passed through silicon dioxide [GB patent 1009564 publ. 10.11.1965].
- the disadvantage of this method is that the decomposition of hydrofluoric acid is carried out by heating it, thereby increasing energy costs. Passing a gas mixture of silicon tetrafluoride and hydrogen fluoride through silicon dioxide leads not only to the formation of additional silicon as a result of the interaction of the dioxide with hydrogen fluoride, but also to the water that is needed. remove from the reaction zone, which requires the use of an additional operation.
- this method is used to obtain tetrafluoride, while in the inventive method there is an increase in the yield of tetrafluoride from hydrofluoric acid by passing an undivided mixture of hydrogen fluoride and tetrafluoride through silica in the presence of oleum.
- a known method of producing silicon including the interaction of a fluorine-containing compound with a reducing agent [patent RU 2035397C1 IPC 6 COlB 33/02 publ. 20.05.1995].
- the disadvantage of this method is that atomic hydrogen is used as a silicon reducing agent, which requires increased requirements for production safety.
- a known installation for producing polycrystalline silicon including a reaction chamber [patent RU 2224715 Cl, publ. 02/27/2004].
- the disadvantages of the installation are that it is designed to produce silicon from trichlorosilane, followed by reduction with hydrogen and not b is suitable for organizing the process of producing silicon from a solution of hydrofluoric acid.
- a known installation for producing polycrystalline silicon including a reaction chamber [patent RU 2066296 Cl, publ. September 10, 1996], which has a drawback inherent in the previous installation, namely, the inability to obtain polycrystalline silicon from a solution of hydrofluoric acid.
- the problem to which the invention is directed is to create a continuous process for producing polycrystalline silicon of solar quality from a solution of hydrofluoric acid in order to reduce the cost of the final product.
- the above advantages can significantly reduce the cost of producing polycrystalline silicon (up to $ 10 per kilogram) while maintaining its high purity (99, 99% -99, 999%) and an impurity content sufficient for its use in solar energy.
- the method of producing polycrystalline silicon from a solution of hydrofluoric acid is characterized in that: an organically soluble salt of hydrofluoric acid is obtained from a solution of hydrofluoric acid by reacting hydrofluoric acid with a solution of an organic base; the obtained salt of hydrofluoric acid is dried with a stream of air or an inert gas heated to a temperature of 55-bOC; silicon gas tetrafluoride is obtained from hydrofluoric acid salt; gaseous silicon tetrafluoride is obtained by decomposition of a salt of hydrofluoric acid into gaseous silicon tetrafluoride and hydrogen fluoride; the gaseous silicon tetrafluoride formed and hydrogen fluoride are passed without separation through silica placed in oleum; silicon is reduced from the obtained gaseous silicon tetrafluoride by magnesium vapor at a temperature of not more than 1000 0 C; separating the reaction products, which are a mixture of silicon powder and
- the set of technological operations in which the products obtained in the previous operation are the starting products for the next operation allows to obtain polycrystalline silicon of high purity.
- Obtaining an organosoluble salt of hydrofluoric acid provides highly pure silicon tetrafluoride. Drying the obtained salt of hydrofluoric acid provides an acceleration of technological processes.
- Silicon reduction at a temperature of no more than 1000C provides a reduction in energy consumption and increases production safety.
- reaction products which are a mixture of silicon powder and magnesium fluoride with the simultaneous production of polycrystalline silicon in the form of a spherical powder, eliminates the need for additional operations to convert amorphous silicon to crystalline, which reduces costs, process continuity, and also facilitates the separation of large spherical crystals from magnesium fluoride powder.
- the salt (extract) of hydrofluoric acid is washed before decomposition.
- a solution of trialkylamine or a solution of trialkylamine in triethylbenzene, or a solution of trialkylamine in a mixture of dodecane with octyl alcohol is used as the organic base.
- oleum containing 3-5% of May as a mineral acid. free sulfuric anhydride.
- silica sand is expediently used.
- the separation of the reaction mixture while obtaining silicon in the form of a powder of a spherical shape is carried out by centrifugal spraying.
- centrifugal spraying consists in the fact that the mixture of silicon powder and magnesium fluoride is sent to a rotating crucible placed in a melting furnace, and the mixture is affected by a plasma arc formed between the crucible and the non-consumable electrode.
- centrifugal separation is expediently carried out in an inert gas atmosphere.
- the reduction of silicon takes place in the presence of an inert gas, which ensures the transportation of silicon tetrafluoride to the reactor and extraction of the reaction mixture from the vortex reactor.
- the magnesium vapor is fed into the vortex reactor from a vacuum evaporator.
- polycrystalline silicon is obtained in the form of a spherical-shaped silicon powder with particle sizes mainly in the range from 0.3 to 0.6 mm.
- the spherical silicon powder is washed with distilled water and bidistilled water.
- a plant for the continuous production of polycrystalline silicon from a solution of hydrofluoric acid in the form of a spherical powder which includes pipelines connected means for extracting a solution of hydrofluoric acid in the presence of extractants, means for drying the extract obtained, means for acidizing the extract to form gaseous silicon tetrafluoride and hydrogen fluoride, means for neutralizing hydrogen fluoride with the formation of silicon tetrafluoride, means providing the possibility of the formation of magnesium vapor from a magnesium melt, a means for reducing silicon from gaseous silicon tetrafluoride by magnesium vapor, a means for separating the reaction mixture of silicon powder and magnesium fluoride while obtaining silicon in the form of a spherical powder, a means for separating silicon in the form of a spherical powder from magnesium fluor
- the means for extracting a solution of hydrofluoric acid includes at least one centrifugal extractor.
- the tool. providing drying of the extract includes at least one bubbler drying apparatus equipped with a heat exchanger.
- the means for acidizing the extract to form gaseous silicon tetrafluoride and hydrogen fluoride includes at least one centrifugal extractor.
- the tool providing the ability to neutralize hydrogen fluoride with the formation of silicon tetrafluoride, includes at least one bubbler reactor filled with silicon dioxide.
- the centrifugal extractor and the bubble dryer are made with a protective coating.
- the protective coating is based on fluoroplastic.
- At least one vacuum evaporator is used as a means to enable the formation of magnesium vapor from a magnesium melt.
- At least one vortex reactor is used as a reaction chamber for silicon reduction.
- the vacuum evaporator and the vortex reactor are made with a protective lining.
- the vortex reactor is equipped with a vacuum pump.
- the vortex rector is equipped with a means for heating it.
- the means for separating the final product includes at least one reservoir filled with a liquid whose density does not exceed the density of silicon.
- the means for producing silicon in the form of a powder of a spherical shape includes a melting furnace with a crucible installed in it, made for rotation and an electrode between which a plasma arc is supported.
- the electrode is non-consumable.
- the means for separating the final product is made in the form of a vibrating table.
- the installation for producing polycrystalline silicon further comprises melting furnace, providing silicon ingots.
- the installation further comprises a line for packing silicon.
- FIG. l- Schematic diagram of a plant for producing polycrystalline silicon in the form of a spherical powder
- Figure 2 Schematic diagram of the production of polycrystalline silicon in the form of a powder of a spherical shape
- the preparation of polycrystalline silicon in the form of a spherical powder from a solution of hydrofluoric acid in the form of a spherical powder is preferably carried out in two main technological stages.
- gaseous silicon tetrafluoride is obtained from a solution of hydrofluoric acid (H 2 SiF 6 ) using an apparatus for producing silicon tetrafluoride from a solution of hydrofluoric acid, which includes means for extracting an aqueous solution of hydrofluoric hydride connected by a pipeline system with shutoff valves acid [H 2 SiF 6), which includes at least one centrifugal extractor with a PTFE protective coating, cf.
- dstvo 2 providing the possibility of drying the obtained extract, which comprises at least one drying unit with bubbling.
- a protective fluoroplastic coating equipped with a heat exchanger, means 3, providing the possibility of acid treatment of the extract with the formation of gaseous silicon tetrafluoride and hydrogen fluoride, including at least one centrifugal extractor with a protective fluoroplastic coating, means 4, providing the ability to neutralize hydrogen fluoride with the formation additional silicon tetrafluoride, including at least one bubbler reactor with a protective fluoroplastic coating, fill enny, e.g., silica, for which it is advisable to use silica sand.
- silica for which it is advisable to use silica sand.
- An aqueous solution of hydrofluoric acid [H 2 SiFe) g is predominantly 20 percent, treated in tool 1 to obtain an extract with a solution of an organic base (extractant), for example, a solution of trialkylamine (TAA) or a solution of trialkylamine in triethylbenzene (TAA + TEB), or a solution trialkylamine in a mixture of dodecane with octyl alcohol (GAD + DDK + OKC) to form an organosoluble salt (extract), for example, (TAAH) 2 SiF 6 .
- an organic base for example, a solution of trialkylamine (TAA) or a solution of trialkylamine in triethylbenzene (TAA + TEB), or a solution trialkylamine in a mixture of dodecane with octyl alcohol (GAD + DDK + OKC) to form an organosoluble salt (extract), for example, (TAAH) 2 SiF 6 .
- the obtained hydrofluoric acid extract is separated from the aqueous phase, washed with an aqueous HF solution, dried using means 2, which includes a bubbler drying apparatus with a protective fluoroplastic coating, equipped with a heat exchanger, a stream of air or inert gas, heated to a temperature of 55 -60 0 C, and treated with concentrated mineral acid, mainly oleum containing 3-5% sulfuric anhydride, in the means 3 for acid treatment of the extract with images aniem gaseous silicon tetrafluoride SiF 4gaz and hydrogen fluoride NFga h - water phase from this operation is returned to the extraction stage.
- Isolation of gaseous decomposition products of an organic salt of hydrofluoric acid, namely SiF 4 gas and HF gas in agent 2 occurs as a result of the following reaction:
- Hydrochloric acid salts gaseous products of silicon tetrafluoride (SiF 4 gas ) and hydrogen fluoride (HF gas ), released as a result of decomposition, are sent without separation to a means 4, which neutralizes hydrogen fluoride with the formation of additional silicon tetrafluoride, which includes at least one silicon tetrafluoride a bubbler reactor with a protective fluoroplastic coating filled with a composition that neutralizes hydrogen fluoride, for example, silicon dioxide, for which make good use of quartz sand.
- SiF 4 gas silicon tetrafluoride
- HF gas hydrogen fluoride
- SiF 4 gas Gaseous silicon tetrafluoride (SiF 4 gas ), sparging through silicon dioxide (SiO 2 ), does not enter into a chemical reaction with it, and as a result of the reaction 4HF gas + SiO 2 ⁇ SiF 4 ⁇ + 2H 2 O, additional gaseous silicon tetrafluoride is formed (SiF 4gas ) that provides an increase in the total yield of silicon tetrafluoride. Simultaneously with an increase in the yield of gaseous silicon tetrafluoride, neutralization of such a dangerous product as hydrogen fluoride (hydrofluoric acid) is provided directly in the process.
- an organic salt of hydrofluoric acid extract
- a countercurrent extractor composed of at least six stages, five of which carry out the extraction of H 2 SiF 6 , and the sixth stage provides the washing of the extract as the means 1.
- the hydrofluoric acid extract emerging from the last stage is dried with a stream of air or an inert gas heated to a temperature of 55-60 0 C, and treated with concentrated mineral acid, mainly oleum, containing 3-5% sulfuric anhydride.
- the next process step is carried out, which consists in the reduction of silicon from gaseous silicon tetrafluoride obtained in the previous step.
- polycrystalline silicon corresponding to the declared characteristics of the impurity composition and price indicators, it is preferable to use the installation for producing polycrystalline silicon, shown in figure 1, and the method for producing polycrystalline silicon, presented in figure 2, implemented using this installation.
- Installation for the continuous production of polycrystalline silicon from a solution of hydrofluoric acid includes interconnected using a piping system with shutoff valves means 1 extraction of an aqueous solution of hydrofluoric acid (H 2 SiF 6 ), which includes at least one centrifugal extractor with a protective fluoroplastic coating, means 2, providing the possibility of drying the obtained extract, which includes at least one bubble sushi a laminar apparatus with a protective fluoroplastic coating, equipped with a heat exchanger, means 3, providing the possibility of acid treatment of the extract with the formation of gaseous silicon tetrafluoride and hydrogen fluoride, including at least one centrifugal extractor with a protective fluoroplastic coating, means 4, providing the ability to neutralize fluoride hydrogen to form additional silicon tetrafluoride, comprising at least one bubbler reactor with a protective fluoroplastic coating, filled, for example, with silicon dioxide (silica sand), means 5, providing the formation of magnesium vapor from a magnesium melt, including at least one vacuum e
- the installation may contain means that are not directly related to the process of obtaining silicon, but provide auxiliary operations, for example, a line for packing silicon, a line for packing magnesium fluoride, a line for producing gypsum from solutions from extractant regeneration (not shown in the figure).
- auxiliary operations for example, a line for packing silicon, a line for packing magnesium fluoride, a line for producing gypsum from solutions from extractant regeneration (not shown in the figure).
- reaction products resulting from the reduction are cooled in a refrigeration unit 7, after which silicon [Si) powder is separated from magnesium fluoride (MgF 2 ).
- a “transporting” gas is used, namely argon, which is fed into the reaction chamber b simultaneously with gaseous silicon tetrafluoride.
- the preferred method for producing silicon in the form of a spherical powder is centrifugal atomization in an inert gas atmosphere.
- the means 8 includes a melting furnace in which a crucible rotatably located and a non-consumable electrode are located, between which a plasma arc is supported.
- a mixture of silicon powders and magnesium fluoride is sent to a rotating crucible and exposed to it by the heat of a plasma arc burning between the crucible and a non-consumable electrode.
- the implementation of the claimed invention allows to continuously obtain polycrystalline silicon from a solution of hydrofluoric acid, polycrystalline silicon in the form of a spherical powder with a high degree of purification from impurities (99.99%), increased yield of the final product and low cost compared to existing technologies.
Abstract
Description
Claims
Priority Applications (15)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BRPI0813442A BRPI0813442A8 (en) | 2007-06-19 | 2008-05-15 | METHOD FOR PRODUCTION OF POLYCRYSTALLINE SILICON FROM A SOLUTION OF HYDROSILICOFLUORIDIC ACID, AND INSTALLATION FOR PRODUCTION OF POLYCRYSTALLINE SILICON FROM A SOLUTION OF FLUOROSILICIC ACID IN THE FORM OF A POWDER WITH SPHERICAL-SHAPED PARTICLES |
CA002684973A CA2684973A1 (en) | 2007-06-19 | 2008-08-15 | Method for producing polycrystalline silicon |
EA201000036A EA015477B1 (en) | 2007-06-19 | 2008-08-15 | Method for producing polycrystalline silicon from a hydrosilicofluoric acid solution and a plant for producing polycrystalline silicon |
KR1020097026321A KR101140076B1 (en) | 2007-08-23 | 2008-08-15 | Method for producing polycrystalline silicon |
AU2008271340A AU2008271340B2 (en) | 2007-06-19 | 2008-08-15 | Method for producing polycrystalline silicon |
JP2010513144A JP5291098B2 (en) | 2007-08-23 | 2008-08-15 | Technology for the production of polycrystalline silicon from fluorosilicic acid solution and equipment for its production |
EP08826022.9A EP2172423A4 (en) | 2007-06-19 | 2008-08-15 | Method for producing polycrystalline silicon from a hydrosilicofluoric acid solution and a plant for producing silicon tetrafluoride and polycrystalline silicon |
UAA201000460A UA98148C2 (en) | 2007-06-19 | 2008-08-15 | Method for producing of polycrystalline silicon from solution of fluorosilicic acid and device for the preparation of polycrystalline silicon |
US12/665,689 US20100221171A1 (en) | 2007-06-19 | 2008-08-15 | Method for producing polycrystalline silicon |
CN2008801036179A CN101795964B (en) | 2007-08-23 | 2008-08-15 | Method for producing polycrystalline silicon |
TNP2009000523A TN2009000523A1 (en) | 2007-06-19 | 2009-12-11 | Method for producing polycrystalline silicon from hudrosiliconfluoric acid solution and a plant for the producing silicon tetrafluoride and polycrystalline silicon |
IL202815A IL202815A0 (en) | 2007-06-19 | 2009-12-17 | Method for producing polycrystalline silicon from hudrosiliconfluoric acid solution and a plant for the producing silicon tetrafluoride and polycrystalline silicon |
MA32492A MA31511B1 (en) | 2007-06-19 | 2010-01-07 | PROCESS FOR PRODUCING POLYCRYSTALLINE SILICON FROM FLUOROSILICIC ACID SOLUTION AND MANUFACTURING PLANT FOR SILICON TETRAFLUORIDE AND POLYCRYSTALLINE SILICON |
ZA2010/00388A ZA201000388B (en) | 2007-06-19 | 2010-01-19 | Method for producing polycrystalline silicon from a hydrosilicofluoric acid solution and a plant for producing silicon tetrafluoride and polyctystalline silicon |
PE2010000033A PE20121210A1 (en) | 2008-08-15 | 2010-01-19 | POLYCRYSTALLINE SILICON PRODUCTION TECHNOLOGY FROM FLUOROSILICICO ACID SOLUTION AND INSTALLATION FOR THE PRODUCTION OF THIS |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
RU2007122705 | 2007-06-19 | ||
RU2007122707 | 2007-06-19 | ||
RU2007122705/15A RU2007122705A (en) | 2007-06-19 | 2007-06-19 | METHOD FOR PRODUCING SILICON TETRAFLUORIDE |
RU2007122707/13A RU2340371C1 (en) | 2007-06-19 | 2007-06-19 | Substance for dermatological medical products on basis of collagenase of microbic parentage ultralysine |
RU2007131800 | 2007-08-23 | ||
RU2007131800 | 2007-08-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2009005412A2 true WO2009005412A2 (en) | 2009-01-08 |
WO2009005412A3 WO2009005412A3 (en) | 2009-05-28 |
Family
ID=40226700
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/RU2008/000523 WO2009005412A2 (en) | 2007-06-19 | 2008-08-15 | Method for producing polycrystalline silicon |
Country Status (8)
Country | Link |
---|---|
US (1) | US20100221171A1 (en) |
BR (1) | BRPI0813442A8 (en) |
CA (1) | CA2684973A1 (en) |
EA (1) | EA015477B1 (en) |
IL (1) | IL202815A0 (en) |
MA (1) | MA31511B1 (en) |
TN (1) | TN2009000523A1 (en) |
WO (1) | WO2009005412A2 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BRPI0904351A2 (en) * | 2009-10-09 | 2011-06-14 | Quirios Produtos Quimicos S A | PROCESS FOR THE PRODUCTION OF INORGANIC FLUORIDE AND AMORPHALIZED precipitated silica from Fluosilic Acid |
CN102180468B (en) * | 2011-04-18 | 2013-02-06 | 天津大学 | Polycrystalline silicon reduction furnace and operating method for mounting mirror planes on inner wall of polycrystalline silicon reduction furnace |
WO2017075108A1 (en) * | 2015-10-26 | 2017-05-04 | Sri International | Method and apparatus for solar grade silicon production |
CN114394597A (en) * | 2022-01-24 | 2022-04-26 | 贵州理工学院 | Method for preparing silicon film by using silicon tetrafluoride as raw material |
CN115124019A (en) * | 2022-06-15 | 2022-09-30 | 湖北大学 | Method for preparing silicon-carbon material by utilizing fluosilicic acid waste |
CN115611282A (en) * | 2022-11-07 | 2023-01-17 | 济南大学 | Nano silicon, method for preparing nano silicon by liquid phase method and application |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1009564A (en) | 1963-01-17 | 1965-11-10 | Columbian Carbon | Process for generating silicon tetrafluoride |
JPS57135711A (en) | 1981-02-16 | 1982-08-21 | Central Glass Co Ltd | Preparation of high purity silicon tetrafluoride |
RU2035397C1 (en) | 1990-12-13 | 1995-05-20 | Терешин Виктор Дмитриевич | Method of producing semiconductive silicon |
RU2036143C1 (en) | 1992-02-27 | 1995-05-27 | Акционерное общество открытого типа "Всероссийский алюминиево-магниевый институт" | Method for reducing silicon |
RU2046095C1 (en) | 1991-06-25 | 1995-10-20 | Всероссийский научно-исследовательский институт неорганических материалов им.акад. А.А.Бочвара | Method of silicon trifluoride producing |
RU2066296C1 (en) | 1994-02-22 | 1996-09-10 | Ангарский электролизный химический комбинат | Method for production of silicon from gaseous silicon tetrafluoride and device for its embodiment |
WO2003059814A1 (en) | 2002-01-18 | 2003-07-24 | Wacker-Chemie Gmbh | Method for producing silicon |
RU2224715C1 (en) | 2002-08-02 | 2004-02-27 | Федеральное государственное унитарное предприятие "Красноярский машиностроительный завод" | Installation for polycrystalline silicon production |
WO2005021431A1 (en) | 2003-09-02 | 2005-03-10 | S.T.B. Advanced Technology Ltd. | Method for producing high-purity silicon tetrafluoride |
RU2272755C1 (en) | 2004-09-02 | 2006-03-27 | Открытое акционерное общество Таганрогский авиационный научно-технический комплекс им. Г.М. Бериева | Cowl turnbuckle |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4781565A (en) * | 1982-12-27 | 1988-11-01 | Sri International | Apparatus for obtaining silicon from fluosilicic acid |
JP4632292B2 (en) * | 2004-05-07 | 2011-02-16 | 有限会社ナプラ | Spherical silicon fine particles and production method thereof |
-
2008
- 2008-05-15 BR BRPI0813442A patent/BRPI0813442A8/en not_active IP Right Cessation
- 2008-08-15 US US12/665,689 patent/US20100221171A1/en not_active Abandoned
- 2008-08-15 CA CA002684973A patent/CA2684973A1/en not_active Abandoned
- 2008-08-15 EA EA201000036A patent/EA015477B1/en not_active IP Right Cessation
- 2008-08-15 WO PCT/RU2008/000523 patent/WO2009005412A2/en active Application Filing
-
2009
- 2009-12-11 TN TNP2009000523A patent/TN2009000523A1/en unknown
- 2009-12-17 IL IL202815A patent/IL202815A0/en unknown
-
2010
- 2010-01-07 MA MA32492A patent/MA31511B1/en unknown
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1009564A (en) | 1963-01-17 | 1965-11-10 | Columbian Carbon | Process for generating silicon tetrafluoride |
JPS57135711A (en) | 1981-02-16 | 1982-08-21 | Central Glass Co Ltd | Preparation of high purity silicon tetrafluoride |
RU2035397C1 (en) | 1990-12-13 | 1995-05-20 | Терешин Виктор Дмитриевич | Method of producing semiconductive silicon |
RU2046095C1 (en) | 1991-06-25 | 1995-10-20 | Всероссийский научно-исследовательский институт неорганических материалов им.акад. А.А.Бочвара | Method of silicon trifluoride producing |
RU2036143C1 (en) | 1992-02-27 | 1995-05-27 | Акционерное общество открытого типа "Всероссийский алюминиево-магниевый институт" | Method for reducing silicon |
RU2066296C1 (en) | 1994-02-22 | 1996-09-10 | Ангарский электролизный химический комбинат | Method for production of silicon from gaseous silicon tetrafluoride and device for its embodiment |
WO2003059814A1 (en) | 2002-01-18 | 2003-07-24 | Wacker-Chemie Gmbh | Method for producing silicon |
RU2224715C1 (en) | 2002-08-02 | 2004-02-27 | Федеральное государственное унитарное предприятие "Красноярский машиностроительный завод" | Installation for polycrystalline silicon production |
WO2005021431A1 (en) | 2003-09-02 | 2005-03-10 | S.T.B. Advanced Technology Ltd. | Method for producing high-purity silicon tetrafluoride |
RU2272755C1 (en) | 2004-09-02 | 2006-03-27 | Открытое акционерное общество Таганрогский авиационный научно-технический комплекс им. Г.М. Бериева | Cowl turnbuckle |
Also Published As
Publication number | Publication date |
---|---|
US20100221171A1 (en) | 2010-09-02 |
EA201000036A1 (en) | 2011-06-30 |
CA2684973A1 (en) | 2009-01-08 |
IL202815A0 (en) | 2010-06-30 |
EA015477B1 (en) | 2011-08-30 |
BRPI0813442A2 (en) | 2015-04-07 |
BRPI0813442A8 (en) | 2015-12-01 |
MA31511B1 (en) | 2010-07-01 |
WO2009005412A3 (en) | 2009-05-28 |
TN2009000523A1 (en) | 2011-03-31 |
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