WO2008143186A1 - 低屈折率被膜形成用塗布液、その製造方法及び反射防止材 - Google Patents
低屈折率被膜形成用塗布液、その製造方法及び反射防止材 Download PDFInfo
- Publication number
- WO2008143186A1 WO2008143186A1 PCT/JP2008/059070 JP2008059070W WO2008143186A1 WO 2008143186 A1 WO2008143186 A1 WO 2008143186A1 JP 2008059070 W JP2008059070 W JP 2008059070W WO 2008143186 A1 WO2008143186 A1 WO 2008143186A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coating film
- refractive index
- coating solution
- low refractive
- disclosed
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/17—Amines; Quaternary ammonium compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Paints Or Removers (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Silicon Polymers (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020097023903A KR101463641B1 (ko) | 2007-05-18 | 2008-05-16 | 저굴절률 피막 형성용 도포액, 그 제조 방법 및 반사 방지재 |
JP2009515214A JP5310549B2 (ja) | 2007-05-18 | 2008-05-16 | 低屈折率被膜形成用塗布液、その製造方法及び反射防止材 |
CN2008800161133A CN101679805B (zh) | 2007-05-18 | 2008-05-16 | 低折射率被膜形成用涂布液、其制造方法及防反射材料 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-132683 | 2007-05-18 | ||
JP2007132683 | 2007-05-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008143186A1 true WO2008143186A1 (ja) | 2008-11-27 |
Family
ID=40031887
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/059070 WO2008143186A1 (ja) | 2007-05-18 | 2008-05-16 | 低屈折率被膜形成用塗布液、その製造方法及び反射防止材 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5310549B2 (ja) |
KR (1) | KR101463641B1 (ja) |
CN (1) | CN101679805B (ja) |
TW (1) | TWI537349B (ja) |
WO (1) | WO2008143186A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5262722B2 (ja) * | 2006-11-14 | 2013-08-14 | 日産化学工業株式会社 | 低屈折率被膜形成用塗布液、その製造方法及び反射防止材 |
CN113946000A (zh) * | 2020-06-30 | 2022-01-18 | 日本电产株式会社 | 光学构件的制造方法及光学构件 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09208898A (ja) * | 1995-12-01 | 1997-08-12 | Nissan Chem Ind Ltd | 低屈折率及び撥水性を有する被膜 |
JPH11217540A (ja) * | 1998-02-03 | 1999-08-10 | Daikin Ind Ltd | 塗料用組成物 |
JP2003025510A (ja) * | 2001-07-16 | 2003-01-29 | Shin Etsu Chem Co Ltd | 反射防止性及び耐擦傷性を有する多層積層体 |
WO2005059051A1 (ja) * | 2003-12-19 | 2005-06-30 | Nissan Chemical Industries, Ltd. | 低屈折率及び大きい水接触角を有する被膜 |
WO2007102514A1 (ja) * | 2006-03-07 | 2007-09-13 | Nissan Chemical Industries, Ltd. | 被膜形成用塗布液、その製造方法、その被膜、及び反射防止材 |
WO2008044742A1 (fr) * | 2006-10-12 | 2008-04-17 | Nissan Chemical Industries, Ltd. | Solution de revêtement pour former un film de revêtement de faible réfraction, procédé de production de celle-ci, et matériau anti-réflexion |
WO2008059844A1 (fr) * | 2006-11-14 | 2008-05-22 | Nissan Chemical Industries, Ltd. | Liquide de revêtement destiné à former un film d'indice de réfraction faible, son procédé de fabrication et élément antiréfléchisseur |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW376408B (en) | 1995-12-01 | 1999-12-11 | Nissan Chemical Ind Ltd | Coating film having water repellency and low refractive index |
US7652115B2 (en) | 2003-09-08 | 2010-01-26 | 3M Innovative Properties Company | Fluorinated polyether isocyanate derived silane compositions |
TW200530350A (en) * | 2003-12-18 | 2005-09-16 | Nissan Chemical Ind Ltd | Water repellent coating film having low refractive index |
-
2008
- 2008-05-16 CN CN2008800161133A patent/CN101679805B/zh active Active
- 2008-05-16 WO PCT/JP2008/059070 patent/WO2008143186A1/ja active Application Filing
- 2008-05-16 KR KR1020097023903A patent/KR101463641B1/ko active IP Right Grant
- 2008-05-16 JP JP2009515214A patent/JP5310549B2/ja active Active
- 2008-05-16 TW TW097118323A patent/TWI537349B/zh active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09208898A (ja) * | 1995-12-01 | 1997-08-12 | Nissan Chem Ind Ltd | 低屈折率及び撥水性を有する被膜 |
JPH11217540A (ja) * | 1998-02-03 | 1999-08-10 | Daikin Ind Ltd | 塗料用組成物 |
JP2003025510A (ja) * | 2001-07-16 | 2003-01-29 | Shin Etsu Chem Co Ltd | 反射防止性及び耐擦傷性を有する多層積層体 |
WO2005059051A1 (ja) * | 2003-12-19 | 2005-06-30 | Nissan Chemical Industries, Ltd. | 低屈折率及び大きい水接触角を有する被膜 |
WO2007102514A1 (ja) * | 2006-03-07 | 2007-09-13 | Nissan Chemical Industries, Ltd. | 被膜形成用塗布液、その製造方法、その被膜、及び反射防止材 |
WO2008044742A1 (fr) * | 2006-10-12 | 2008-04-17 | Nissan Chemical Industries, Ltd. | Solution de revêtement pour former un film de revêtement de faible réfraction, procédé de production de celle-ci, et matériau anti-réflexion |
WO2008059844A1 (fr) * | 2006-11-14 | 2008-05-22 | Nissan Chemical Industries, Ltd. | Liquide de revêtement destiné à former un film d'indice de réfraction faible, son procédé de fabrication et élément antiréfléchisseur |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5262722B2 (ja) * | 2006-11-14 | 2013-08-14 | 日産化学工業株式会社 | 低屈折率被膜形成用塗布液、その製造方法及び反射防止材 |
CN113946000A (zh) * | 2020-06-30 | 2022-01-18 | 日本电产株式会社 | 光学构件的制造方法及光学构件 |
Also Published As
Publication number | Publication date |
---|---|
TW200916540A (en) | 2009-04-16 |
CN101679805B (zh) | 2013-02-27 |
JPWO2008143186A1 (ja) | 2010-08-05 |
CN101679805A (zh) | 2010-03-24 |
JP5310549B2 (ja) | 2013-10-09 |
KR101463641B1 (ko) | 2014-11-19 |
TWI537349B (zh) | 2016-06-11 |
KR20100016601A (ko) | 2010-02-12 |
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