WO2008126921A1 - 架橋ポリビニルアセタール樹脂の製造方法及び架橋ポリビニルアセタール樹脂 - Google Patents

架橋ポリビニルアセタール樹脂の製造方法及び架橋ポリビニルアセタール樹脂 Download PDF

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Publication number
WO2008126921A1
WO2008126921A1 PCT/JP2008/057186 JP2008057186W WO2008126921A1 WO 2008126921 A1 WO2008126921 A1 WO 2008126921A1 JP 2008057186 W JP2008057186 W JP 2008057186W WO 2008126921 A1 WO2008126921 A1 WO 2008126921A1
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WO
WIPO (PCT)
Prior art keywords
polyvinyl acetal
acetal resin
crosslinked polyvinyl
functional group
general formula
Prior art date
Application number
PCT/JP2008/057186
Other languages
English (en)
French (fr)
Inventor
Yuki Hirose
Hiroaki Takehara
Motokuni Ichitani
Takayuki Maeda
Original Assignee
Sekisui Chemical Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co., Ltd. filed Critical Sekisui Chemical Co., Ltd.
Priority to KR1020097021538A priority Critical patent/KR101515650B1/ko
Priority to EP08740283.0A priority patent/EP2138531B1/en
Priority to US12/450,673 priority patent/US8420298B2/en
Priority to JP2008520165A priority patent/JP5336846B2/ja
Priority to CN2008800116072A priority patent/CN101652408B/zh
Publication of WO2008126921A1 publication Critical patent/WO2008126921A1/ja

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382—Contact thermal transfer or sublimation processes
    • B41M5/392—Additives, other than colour forming substances, dyes or pigments, e.g. sensitisers, transfer promoting agents
    • B41M5/395—Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F216/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F216/38—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an acetal or ketal radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/28—Treatment by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D129/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Coating compositions based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Coating compositions based on derivatives of such polymers
    • C09D129/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
    • B41M2205/40—Cover layers; Layers separated from substrate by imaging layer; Protective layers; Layers applied before imaging
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • B41N1/14—Lithographic printing foils
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2329/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Derivatives of such polymer
    • C08J2329/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)

Abstract

架橋剤を使用せず簡便な方法で、機械的強度が高く、耐溶剤性に優れる架橋ポリビニルアセタール樹脂を製造できることから、シートアタック、強度不足、粘度の経時安定性等の問題を解決することが可能な架橋ポリビニルアセタール樹脂の製造方法及び該架橋ポリビニルアセタール樹脂の製造方法を用いてなる架橋ポリビニルアセタール樹脂を提供する。 少なくとも下記一般式（１）、（２）、（３）及び（４）で表される構造単位を有するポリビニルアセタール樹脂に波長が２００～３６５ｎｍの範囲内にある紫外線を照射する工程を有することを特徴とする架橋ポリビニルアセタール樹脂の製造方法。式（１）～（４）中、Ｒ１は水素原子又は炭素数１～２０の炭化水素基を表し、Ｒ２は下記一般式（５）で表される官能基、下記一般式（６）で表される官能基、及び、下記一般式（７）で表される官能基からなる群より選択される少なくとも１種の官能基を合計２個以上有する基を表す。
PCT/JP2008/057186 2007-04-11 2008-04-11 架橋ポリビニルアセタール樹脂の製造方法及び架橋ポリビニルアセタール樹脂 WO2008126921A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020097021538A KR101515650B1 (ko) 2007-04-11 2008-04-11 가교 폴리비닐아세탈 수지의 제조 방법 및 가교 폴리비닐아세탈 수지
EP08740283.0A EP2138531B1 (en) 2007-04-11 2008-04-11 Method for production of crosslinked polyvinyl acetal resin, and crosslinked polyvinyl acetal resin
US12/450,673 US8420298B2 (en) 2007-04-11 2008-04-11 Method for production of crosslinked polyvinyl acetal resin, and crosslinked polyvinyl acetal resin
JP2008520165A JP5336846B2 (ja) 2007-04-11 2008-04-11 架橋ポリビニルアセタール樹脂の製造方法及び架橋ポリビニルアセタール樹脂
CN2008800116072A CN101652408B (zh) 2007-04-11 2008-04-11 交联聚乙烯醇缩醛树脂的制造方法和交联聚乙烯醇缩醛树脂

Applications Claiming Priority (14)

Application Number Priority Date Filing Date Title
JP2007-103775 2007-04-11
JP2007103775 2007-04-11
JP2007137214 2007-05-23
JP2007137216 2007-05-23
JP2007137215 2007-05-23
JP2007-137214 2007-05-23
JP2007-137215 2007-05-23
JP2007-137216 2007-05-23
JP2007258083 2007-10-01
JP2007-258080 2007-10-01
JP2007258080 2007-10-01
JP2007258082 2007-10-01
JP2007-258083 2007-10-01
JP2007-258082 2007-10-01

Publications (1)

Publication Number Publication Date
WO2008126921A1 true WO2008126921A1 (ja) 2008-10-23

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Application Number Title Priority Date Filing Date
PCT/JP2008/057186 WO2008126921A1 (ja) 2007-04-11 2008-04-11 架橋ポリビニルアセタール樹脂の製造方法及び架橋ポリビニルアセタール樹脂

Country Status (6)

Country Link
US (1) US8420298B2 (ja)
EP (1) EP2138531B1 (ja)
JP (1) JP5336846B2 (ja)
KR (1) KR101515650B1 (ja)
TW (1) TWI432490B (ja)
WO (1) WO2008126921A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010168444A (ja) * 2009-01-21 2010-08-05 Sekisui Chem Co Ltd ポリビニルアセタール樹脂多孔質体の製造方法
WO2015146747A1 (ja) * 2014-03-27 2015-10-01 積水化学工業株式会社 蓄電デバイス電極用バインダー
WO2017033980A1 (ja) * 2015-08-24 2017-03-02 セメダイン株式会社 樹脂成型体又はゴム成形体の表面処理方法
JP2019065251A (ja) * 2017-09-29 2019-04-25 積水化学工業株式会社 水性ポリビニルアセタール樹脂組成物
US10784513B2 (en) 2015-09-17 2020-09-22 Sekisui Chemical Co., Ltd. Binder for electrical storage device electrode

Families Citing this family (5)

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Publication number Priority date Publication date Assignee Title
WO2012023517A1 (ja) 2010-08-19 2012-02-23 株式会社クラレ ポリビニルアセタール樹脂、そのスラリー組成物、セラミックグリーンシート及び積層セラミックコンデンサ
EP3472316A4 (en) 2016-06-17 2020-01-08 Chugai Seiyaku Kabushiki Kaisha ANTI-C5 ANTIBODIES AND METHODS OF USE THEREOF
US10438575B2 (en) 2017-11-20 2019-10-08 Chang Chun Petrochemical Co., Ltd. Multilayer film, interlayer film comprising the multilayer film and laminated glass and sound-insulating glass laminate comprising the interlayer film
US10212828B1 (en) 2017-11-27 2019-02-19 International Business Machines Corporation Via stub elimination by disrupting plating
MX2022013032A (es) * 2020-04-21 2022-11-09 Sekisui Chemical Co Ltd Pelicula de intercalacion para vidrio laminado y vidrio laminado.

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010168444A (ja) * 2009-01-21 2010-08-05 Sekisui Chem Co Ltd ポリビニルアセタール樹脂多孔質体の製造方法
WO2015146747A1 (ja) * 2014-03-27 2015-10-01 積水化学工業株式会社 蓄電デバイス電極用バインダー
JPWO2015146747A1 (ja) * 2014-03-27 2017-04-13 積水化学工業株式会社 蓄電デバイス電極用バインダー
US10008724B2 (en) 2014-03-27 2018-06-26 Sekisui Chemical Co., Ltd. Binder for power storage device electrode
WO2017033980A1 (ja) * 2015-08-24 2017-03-02 セメダイン株式会社 樹脂成型体又はゴム成形体の表面処理方法
JPWO2017033980A1 (ja) * 2015-08-24 2017-08-24 セメダイン株式会社 樹脂成型体又はゴム成形体の表面処理方法
US10784513B2 (en) 2015-09-17 2020-09-22 Sekisui Chemical Co., Ltd. Binder for electrical storage device electrode
JP2019065251A (ja) * 2017-09-29 2019-04-25 積水化学工業株式会社 水性ポリビニルアセタール樹脂組成物
JP7120789B2 (ja) 2017-09-29 2022-08-17 積水化学工業株式会社 水性ポリビニルアセタール樹脂組成物

Also Published As

Publication number Publication date
EP2138531A4 (en) 2011-03-30
KR20100015608A (ko) 2010-02-12
JPWO2008126921A1 (ja) 2010-07-22
TW200906924A (en) 2009-02-16
EP2138531B1 (en) 2014-10-29
US8420298B2 (en) 2013-04-16
TWI432490B (zh) 2014-04-01
US20100112480A1 (en) 2010-05-06
EP2138531A1 (en) 2009-12-30
KR101515650B1 (ko) 2015-04-27
JP5336846B2 (ja) 2013-11-06

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