WO2008117395A1 - 有機半導体素子及びその製造方法 - Google Patents

有機半導体素子及びその製造方法 Download PDF

Info

Publication number
WO2008117395A1
WO2008117395A1 PCT/JP2007/056212 JP2007056212W WO2008117395A1 WO 2008117395 A1 WO2008117395 A1 WO 2008117395A1 JP 2007056212 W JP2007056212 W JP 2007056212W WO 2008117395 A1 WO2008117395 A1 WO 2008117395A1
Authority
WO
WIPO (PCT)
Prior art keywords
organic semiconductor
source
electrode
semiconductor element
channel region
Prior art date
Application number
PCT/JP2007/056212
Other languages
English (en)
French (fr)
Inventor
Takashi Chuman
Chihiro Harada
Original Assignee
Pioneer Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Corporation filed Critical Pioneer Corporation
Priority to US12/450,315 priority Critical patent/US20100090204A1/en
Priority to JP2009506109A priority patent/JP5039126B2/ja
Priority to PCT/JP2007/056212 priority patent/WO2008117395A1/ja
Priority to KR1020097021768A priority patent/KR101062108B1/ko
Publication of WO2008117395A1 publication Critical patent/WO2008117395A1/ja

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/466Lateral bottom-gate IGFETs comprising only a single gate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/484Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/80Constructional details
    • H10K10/82Electrodes
    • H10K10/84Ohmic electrodes, e.g. source or drain electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Film Transistor (AREA)

Abstract

【課題】有機半導体素子において、より高精細なパターン形成を可能とし、チャネル領域に有機半導体層をより均一に形成する。 【解決手段】基板1上にゲート電極2が形成され、ゲート電極2上にゲート絶縁層3が形成され、ゲート絶縁層3上にソース電極4とドレイン電極5が形成され、ソース・ドレイン電極4、5間でゲート絶縁層3を介してゲート電極2に対向する有機半導体層6を有し、ソース・ドレイン電極4、5面には、ソース・ドレイン電極4、5間に形成されるチャネル領域を除いて、表面エネルギーがチャネル領域より低い隔壁7が形成される。
PCT/JP2007/056212 2007-03-26 2007-03-26 有機半導体素子及びその製造方法 WO2008117395A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US12/450,315 US20100090204A1 (en) 2007-03-26 2007-03-26 Organic semiconductor element and manufacture method thereof
JP2009506109A JP5039126B2 (ja) 2007-03-26 2007-03-26 有機半導体素子及びその製造方法
PCT/JP2007/056212 WO2008117395A1 (ja) 2007-03-26 2007-03-26 有機半導体素子及びその製造方法
KR1020097021768A KR101062108B1 (ko) 2007-03-26 2007-03-26 유기 반도체 소자 및 그 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/056212 WO2008117395A1 (ja) 2007-03-26 2007-03-26 有機半導体素子及びその製造方法

Publications (1)

Publication Number Publication Date
WO2008117395A1 true WO2008117395A1 (ja) 2008-10-02

Family

ID=39788138

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/056212 WO2008117395A1 (ja) 2007-03-26 2007-03-26 有機半導体素子及びその製造方法

Country Status (4)

Country Link
US (1) US20100090204A1 (ja)
JP (1) JP5039126B2 (ja)
KR (1) KR101062108B1 (ja)
WO (1) WO2008117395A1 (ja)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009295670A (ja) * 2008-06-03 2009-12-17 Hitachi Ltd 薄膜トランジスタおよびそれを用いた装置
JP2011054877A (ja) * 2009-09-04 2011-03-17 Konica Minolta Holdings Inc 薄膜トランジスタの製造方法
WO2013159881A2 (en) 2012-04-25 2013-10-31 Merck Patent Gmbh Bank structures for organic electronic devices
WO2014072016A1 (en) 2012-11-08 2014-05-15 Merck Patent Gmbh Method for producing organic electronic devices with bank structures, bank structures and electronic devices produced therewith
US8916863B2 (en) 2011-09-26 2014-12-23 Panasonic Corporation Organic thin-film transistor and method of manufacturing organic thin-film transistor
US9425417B2 (en) 2012-09-21 2016-08-23 Merck Patent Gmbh Polycycloolefinic polymer formulation for an organic semiconductor
WO2016198142A1 (en) 2015-06-12 2016-12-15 Merck Patent Gmbh Organic electronic devices with fluoropolymer bank structures
US9647213B2 (en) 2010-09-02 2017-05-09 Merck Patent Gmbh Interlayer for electronic devices
WO2018033510A2 (en) 2016-08-17 2018-02-22 Merck Patent Gmbh Electronic device with bank structures
CN111640800A (zh) * 2020-04-30 2020-09-08 中国科学院微电子研究所 一种半导体器件及其制备方法
US11901431B2 (en) 2018-07-23 2024-02-13 Ricoh Company, Ltd. Coating liquid for forming metal oxide film, oxide insulator film, field-effect transistor, display element, image display device, and system

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI469224B (zh) * 2008-10-20 2015-01-11 Ind Tech Res Inst 有機薄膜電晶體及其製造方法
JPWO2011013600A1 (ja) * 2009-07-31 2013-01-07 国立大学法人東北大学 半導体装置、半導体装置の製造方法、及び表示装置
JP5656049B2 (ja) * 2010-05-26 2015-01-21 ソニー株式会社 薄膜トランジスタの製造方法
JPWO2018186377A1 (ja) * 2017-04-04 2020-02-20 パイオニア株式会社 発光装置の製造方法及び発光装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005354051A (ja) * 2004-06-08 2005-12-22 Palo Alto Research Center Inc 印刷トランジスタ製造方法
JP2006269599A (ja) * 2005-03-23 2006-10-05 Sony Corp パターン形成方法、有機電界効果型トランジスタの製造方法、及び、フレキシブルプリント回路板の製造方法
JP2007036259A (ja) * 2005-07-27 2007-02-08 Samsung Electronics Co Ltd 薄膜トランジスタ基板及びその製造方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000269504A (ja) * 1999-03-16 2000-09-29 Hitachi Ltd 半導体装置、その製造方法及び液晶表示装置
US6335539B1 (en) * 1999-11-05 2002-01-01 International Business Machines Corporation Method for improving performance of organic semiconductors in bottom electrode structure
DE10228772A1 (de) * 2002-06-27 2004-01-15 Infineon Technologies Ag Verringerung des Kontaktwiderstandes in organischen Feldeffekttransistoren mit Palladiumkontakten durch Verwendung von Nitrilen und Isonitrilen
US6821811B2 (en) * 2002-08-02 2004-11-23 Semiconductor Energy Laboratory Co., Ltd. Organic thin film transistor and method of manufacturing the same, and semiconductor device having the organic thin film transistor
CN100504553C (zh) * 2004-02-06 2009-06-24 三星电子株式会社 薄膜晶体管阵列面板及包括该薄膜晶体管阵列面板的液晶显示器
JP5109223B2 (ja) * 2004-08-04 2012-12-26 ソニー株式会社 電界効果型トランジスタ
TWI237899B (en) * 2004-08-06 2005-08-11 Ind Tech Res Inst Method for manufacturing OTFT by high precision printing
KR101090250B1 (ko) * 2004-10-15 2011-12-06 삼성전자주식회사 유기 반도체를 이용한 박막 트랜지스터 표시판 및 그 제조방법
KR101078360B1 (ko) * 2004-11-12 2011-10-31 엘지디스플레이 주식회사 폴리형 액정 표시 패널 및 그 제조 방법
US7985677B2 (en) * 2004-11-30 2011-07-26 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
KR101133767B1 (ko) * 2005-03-09 2012-04-09 삼성전자주식회사 유기 박막 트랜지스터 표시판 및 그 제조 방법
KR100668838B1 (ko) * 2005-03-15 2007-01-16 주식회사 하이닉스반도체 반도체 소자의 게이트 형성방법
KR101197053B1 (ko) * 2005-09-30 2012-11-06 삼성디스플레이 주식회사 유기 박막 트랜지스터 표시판 및 그 제조 방법
KR100647710B1 (ko) * 2005-10-21 2006-11-23 삼성에스디아이 주식회사 박막 트랜지스터, 이의 제조 방법 및 이를 구비한 평판표시 장치
KR101157270B1 (ko) * 2006-02-17 2012-06-15 삼성전자주식회사 유기박막 트랜지스터의 제조방법 및 그에 의해 제조된유기박막 트랜지스터
US8017940B2 (en) * 2007-05-25 2011-09-13 Panasonic Corporation Organic transistor, method of forming organic transistor and organic EL display with organic transistor
JP5111949B2 (ja) * 2007-06-18 2013-01-09 株式会社日立製作所 薄膜トランジスタの製造方法及び薄膜トランジスタ装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005354051A (ja) * 2004-06-08 2005-12-22 Palo Alto Research Center Inc 印刷トランジスタ製造方法
JP2006269599A (ja) * 2005-03-23 2006-10-05 Sony Corp パターン形成方法、有機電界効果型トランジスタの製造方法、及び、フレキシブルプリント回路板の製造方法
JP2007036259A (ja) * 2005-07-27 2007-02-08 Samsung Electronics Co Ltd 薄膜トランジスタ基板及びその製造方法

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009295670A (ja) * 2008-06-03 2009-12-17 Hitachi Ltd 薄膜トランジスタおよびそれを用いた装置
JP2011054877A (ja) * 2009-09-04 2011-03-17 Konica Minolta Holdings Inc 薄膜トランジスタの製造方法
US9647213B2 (en) 2010-09-02 2017-05-09 Merck Patent Gmbh Interlayer for electronic devices
US8916863B2 (en) 2011-09-26 2014-12-23 Panasonic Corporation Organic thin-film transistor and method of manufacturing organic thin-film transistor
WO2013159881A2 (en) 2012-04-25 2013-10-31 Merck Patent Gmbh Bank structures for organic electronic devices
US9331281B2 (en) 2012-04-25 2016-05-03 Merck Patent Gmbh Bank structures for organic electronic devices
US9425417B2 (en) 2012-09-21 2016-08-23 Merck Patent Gmbh Polycycloolefinic polymer formulation for an organic semiconductor
WO2014072016A1 (en) 2012-11-08 2014-05-15 Merck Patent Gmbh Method for producing organic electronic devices with bank structures, bank structures and electronic devices produced therewith
WO2016198142A1 (en) 2015-06-12 2016-12-15 Merck Patent Gmbh Organic electronic devices with fluoropolymer bank structures
WO2018033510A2 (en) 2016-08-17 2018-02-22 Merck Patent Gmbh Electronic device with bank structures
US11282906B2 (en) 2016-08-17 2022-03-22 Merck Patent Gmbh Electronic device with bank structures
US11901431B2 (en) 2018-07-23 2024-02-13 Ricoh Company, Ltd. Coating liquid for forming metal oxide film, oxide insulator film, field-effect transistor, display element, image display device, and system
CN111640800A (zh) * 2020-04-30 2020-09-08 中国科学院微电子研究所 一种半导体器件及其制备方法
CN111640800B (zh) * 2020-04-30 2023-04-11 中国科学院微电子研究所 一种半导体器件及其制备方法

Also Published As

Publication number Publication date
KR101062108B1 (ko) 2011-09-02
US20100090204A1 (en) 2010-04-15
JPWO2008117395A1 (ja) 2010-07-08
KR20100005086A (ko) 2010-01-13
JP5039126B2 (ja) 2012-10-03

Similar Documents

Publication Publication Date Title
WO2008117395A1 (ja) 有機半導体素子及びその製造方法
TW200715566A (en) Display device and method of manufacturing the same
WO2008105077A1 (ja) 化合物半導体装置とその製造方法
TWI373142B (en) Manufacturing method of thin film transistor using oxide semiconductor
TW200731530A (en) Semiconductor devices and methods for fabricating the same
TW200711054A (en) A method of manufacturing a transistor and a method of forming a memory device
TW200709415A (en) Gate pattern of semiconductor device and method for fabricating the same
WO2007095061A3 (en) Device including semiconductor nanocrystals and a layer including a doped organic material and methods
WO2009019837A1 (ja) 炭化珪素半導体素子およびその製造方法
TW200707750A (en) Flat panel display and manufacturing method of flat panel display
TW200629422A (en) Method of manufacturing a capaciotr and a metal gate on a semiconductor device
TW200631065A (en) Strained transistor with hybrid-strain inducing layer
TW200625529A (en) Contact hole structures and contact structures and fabrication methods thereof
TW200639919A (en) Method of fabricating a transistor having a triple channel in a memory device
TW200727492A (en) Organic thin film transistor array panel
WO2008147433A3 (en) Methods and devices employing metal layers in gates to introduce channel strain
TW200744125A (en) Metal oxide semiconductor transistor and method of manufacturing thereof
TW200703437A (en) Semiconductor device and manufacturing method thereof
WO2008099528A1 (ja) 表示装置、表示装置の製造方法
TW200742141A (en) Organic transistor and method for manufacturing the same
TW200705668A (en) Thin film transistor substrate and manufacturing method thereof
JP2009278072A5 (ja)
TW200727487A (en) Structure of thin film transistor array and method for making the same
TW200709430A (en) Method for forming a thin-film transistor
TW200725882A (en) Five channel fin transistor and method for fabricating the same

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 07739650

Country of ref document: EP

Kind code of ref document: A1

DPE1 Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101)
ENP Entry into the national phase

Ref document number: 2009506109

Country of ref document: JP

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 12450315

Country of ref document: US

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 20097021768

Country of ref document: KR

Kind code of ref document: A

122 Ep: pct application non-entry in european phase

Ref document number: 07739650

Country of ref document: EP

Kind code of ref document: A1

DPE1 Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101)