WO2008108423A1 - 位置計測モジュール、位置計測装置、ステージ装置、露光装置及びデバイス製造方法 - Google Patents
位置計測モジュール、位置計測装置、ステージ装置、露光装置及びデバイス製造方法 Download PDFInfo
- Publication number
- WO2008108423A1 WO2008108423A1 PCT/JP2008/054021 JP2008054021W WO2008108423A1 WO 2008108423 A1 WO2008108423 A1 WO 2008108423A1 JP 2008054021 W JP2008054021 W JP 2008054021W WO 2008108423 A1 WO2008108423 A1 WO 2008108423A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- position measuring
- axis direction
- reference light
- mirror
- detecting
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/03—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring coordinates of points
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
- G01B9/02003—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using beat frequencies
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02027—Two or more interferometric channels or interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02027—Two or more interferometric channels or interferometers
- G01B9/02028—Two or more reference or object arms in one interferometer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/45—Multiple detectors for detecting interferometer signals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/70—Using polarization in the interferometer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08721441A EP2120097A1 (en) | 2007-03-08 | 2008-03-06 | Position measuring module, position measuring apparatus, stage apparatus, exposure apparatus and device manufacturing method |
JP2009502617A JP5327043B2 (ja) | 2007-03-08 | 2008-03-06 | 位置計測モジュール、位置計測装置、ステージ装置、露光装置及びデバイス製造方法 |
US12/555,794 US20100068655A1 (en) | 2007-03-08 | 2009-09-08 | Position measuring module, position measuring apparatus, stage apparatus, exposure apparatus and device manufacturing method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-057939 | 2007-03-08 | ||
JP2007057939 | 2007-03-08 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/555,794 Continuation US20100068655A1 (en) | 2007-03-08 | 2009-09-08 | Position measuring module, position measuring apparatus, stage apparatus, exposure apparatus and device manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008108423A1 true WO2008108423A1 (ja) | 2008-09-12 |
Family
ID=39738295
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/054021 WO2008108423A1 (ja) | 2007-03-08 | 2008-03-06 | 位置計測モジュール、位置計測装置、ステージ装置、露光装置及びデバイス製造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20100068655A1 (ja) |
EP (1) | EP2120097A1 (ja) |
JP (1) | JP5327043B2 (ja) |
KR (1) | KR20090128397A (ja) |
CN (1) | CN101627341A (ja) |
TW (1) | TW200846626A (ja) |
WO (1) | WO2008108423A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018200250A (ja) * | 2017-05-29 | 2018-12-20 | パナソニックIpマネジメント株式会社 | 干渉計測装置および干渉計測方法 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL2006773A (en) * | 2010-06-23 | 2011-12-27 | Asml Netherlands Bv | Lithographic apparatus. |
US8179534B2 (en) * | 2010-08-11 | 2012-05-15 | Mitutoyo Corporation | Fixed wavelength absolute distance interferometer |
DE102012201393A1 (de) * | 2012-02-01 | 2013-08-01 | Dr. Johannes Heidenhain Gmbh | Positionsmesseinrichtung und Anordnung mit mehreren Positionsmesseinrichtungen |
KR20150087949A (ko) * | 2014-01-23 | 2015-07-31 | 삼성디스플레이 주식회사 | 마스크리스 노광 장치 |
KR20180059814A (ko) * | 2015-09-30 | 2018-06-05 | 가부시키가이샤 니콘 | 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법 |
JP6553817B2 (ja) | 2016-01-19 | 2019-07-31 | エーエスエムエル ネザーランズ ビー.ブイ. | 位置センシング機構、そのような機構を含むリソグラフィ装置、位置センシング方法、及びデバイス製造方法 |
CN108700825B (zh) * | 2016-02-29 | 2021-07-23 | 株式会社尼康 | 曝光装置、平板显示器的制造方法、器件制造方法、遮光装置及曝光方法 |
JP6279013B2 (ja) * | 2016-05-26 | 2018-02-14 | Ckd株式会社 | 三次元計測装置 |
CN107179653B (zh) * | 2017-07-20 | 2018-10-19 | 武汉华星光电技术有限公司 | 一种曝光机及其发光装置 |
BR112020007953B1 (pt) * | 2017-10-25 | 2022-08-02 | Nikon Corporation | Aparelho de processamento |
CN111781800B (zh) * | 2020-06-22 | 2022-06-03 | 江苏影速集成电路装备股份有限公司 | 激光直写设备中多路光路校准***及方法 |
CN112129739B (zh) * | 2020-09-27 | 2024-03-19 | 山东省科学院激光研究所 | 一种基于光纤表面增强拉曼探针的传感装置及工作方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07253304A (ja) | 1994-03-15 | 1995-10-03 | Nikon Corp | 多軸位置決めユニットおよびこれにおける測長方法 |
JPH0875409A (ja) * | 1994-08-31 | 1996-03-22 | Advantest Corp | レーザー測長装置 |
JPH11183130A (ja) * | 1997-12-18 | 1999-07-09 | Nikon Corp | レーザ干渉測長方法および装置、およびそれを用いたステージ装置、およびそれを用いた露光装置 |
JP2001059704A (ja) * | 1999-08-24 | 2001-03-06 | Canon Inc | 位置決めステージ装置、半導体露光装置およびデバイス製造方法 |
JP2006349488A (ja) * | 2005-06-15 | 2006-12-28 | Nikon Corp | 干渉計システム、ステージ装置、露光装置、及びデバイス製造方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3019050B2 (ja) * | 1992-12-24 | 2000-03-13 | 株式会社ニコン | 干渉計装置 |
US5585922A (en) * | 1992-12-24 | 1996-12-17 | Nikon Corporation | Dual interferometer apparatus compensating for environmental turbulence or fluctuation and for quantization error |
JP3412212B2 (ja) * | 1993-10-01 | 2003-06-03 | 株式会社ニコン | 干渉計装置 |
US6897963B1 (en) * | 1997-12-18 | 2005-05-24 | Nikon Corporation | Stage device and exposure apparatus |
AU6122099A (en) * | 1998-10-14 | 2000-05-01 | Nikon Corporation | Shape measuring method and shape measuring device, position control method, stage device, exposure apparatus and method for producing exposure apparatus, and device and method for manufacturing device |
EP1014199B1 (en) * | 1998-12-24 | 2011-03-30 | Canon Kabushiki Kaisha | Stage control apparatus, exposure apparatus and method of manufacturing a semiconductor device |
-
2008
- 2008-03-06 EP EP08721441A patent/EP2120097A1/en not_active Withdrawn
- 2008-03-06 TW TW097107836A patent/TW200846626A/zh unknown
- 2008-03-06 CN CN200880007480A patent/CN101627341A/zh active Pending
- 2008-03-06 WO PCT/JP2008/054021 patent/WO2008108423A1/ja active Application Filing
- 2008-03-06 KR KR1020097017888A patent/KR20090128397A/ko not_active Application Discontinuation
- 2008-03-06 JP JP2009502617A patent/JP5327043B2/ja active Active
-
2009
- 2009-09-08 US US12/555,794 patent/US20100068655A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07253304A (ja) | 1994-03-15 | 1995-10-03 | Nikon Corp | 多軸位置決めユニットおよびこれにおける測長方法 |
JPH0875409A (ja) * | 1994-08-31 | 1996-03-22 | Advantest Corp | レーザー測長装置 |
JPH11183130A (ja) * | 1997-12-18 | 1999-07-09 | Nikon Corp | レーザ干渉測長方法および装置、およびそれを用いたステージ装置、およびそれを用いた露光装置 |
JP2001059704A (ja) * | 1999-08-24 | 2001-03-06 | Canon Inc | 位置決めステージ装置、半導体露光装置およびデバイス製造方法 |
JP2006349488A (ja) * | 2005-06-15 | 2006-12-28 | Nikon Corp | 干渉計システム、ステージ装置、露光装置、及びデバイス製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018200250A (ja) * | 2017-05-29 | 2018-12-20 | パナソニックIpマネジメント株式会社 | 干渉計測装置および干渉計測方法 |
Also Published As
Publication number | Publication date |
---|---|
CN101627341A (zh) | 2010-01-13 |
EP2120097A1 (en) | 2009-11-18 |
JP5327043B2 (ja) | 2013-10-30 |
KR20090128397A (ko) | 2009-12-15 |
US20100068655A1 (en) | 2010-03-18 |
TW200846626A (en) | 2008-12-01 |
JPWO2008108423A1 (ja) | 2010-06-17 |
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