WO2008136404A1 - 光学部材、干渉計システム、ステージ装置、露光装置、及びデバイス製造方法 - Google Patents
光学部材、干渉計システム、ステージ装置、露光装置、及びデバイス製造方法 Download PDFInfo
- Publication number
- WO2008136404A1 WO2008136404A1 PCT/JP2008/058058 JP2008058058W WO2008136404A1 WO 2008136404 A1 WO2008136404 A1 WO 2008136404A1 JP 2008058058 W JP2008058058 W JP 2008058058W WO 2008136404 A1 WO2008136404 A1 WO 2008136404A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- reflection surface
- optical member
- device manufacturing
- interferometer system
- exposure apparatus
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
- G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
- G01B9/02018—Multipass interferometers, e.g. double-pass
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02027—Two or more interferometric channels or interferometers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/12—Reflex reflectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/15—Cat eye, i.e. reflection always parallel to incoming beam
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/70—Using polarization in the interferometer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
光学部材は、第1方向に関する位置情報を計測するために光が照射される。光学部材は、第1方向と交差する第2方向に進行する光が入射する第1反射面と、第2方向に進行する光が入射する第2反射面とを備える。第1反射面と第2反射面とは光学的に接続され、第1反射面及び第2反射面の一方で反射した光は他方に入射する。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009512976A JPWO2008136404A1 (ja) | 2007-04-27 | 2008-04-25 | 光学部材、干渉計システム、ステージ装置、露光装置、及びデバイス製造方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007120335 | 2007-04-27 | ||
JP2007-120335 | 2007-04-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008136404A1 true WO2008136404A1 (ja) | 2008-11-13 |
Family
ID=39943511
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/058058 WO2008136404A1 (ja) | 2007-04-27 | 2008-04-25 | 光学部材、干渉計システム、ステージ装置、露光装置、及びデバイス製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20090310105A1 (ja) |
JP (1) | JPWO2008136404A1 (ja) |
TW (1) | TW200900878A (ja) |
WO (1) | WO2008136404A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011119303A (ja) * | 2009-11-30 | 2011-06-16 | Nikon Corp | 干渉計システム、ステージ装置及び露光装置 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5905729B2 (ja) * | 2011-10-26 | 2016-04-20 | Dmg森精機株式会社 | 変位検出装置 |
US9568652B1 (en) * | 2015-07-21 | 2017-02-14 | Lockheed Martin Corporation | Reflecting prism, and related components, systems, and methods |
NL2030825B1 (en) * | 2022-02-04 | 2023-08-15 | Vdl Enabling Tech Group B V | Position detection system using laser light interferometry. |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10170217A (ja) * | 1996-12-12 | 1998-06-26 | Mitsubishi Electric Corp | 測長装置 |
WO2007001017A1 (ja) * | 2005-06-28 | 2007-01-04 | Nikon Corporation | 反射部材、光学部材、干渉計システム、ステージ装置、露光装置、及びデバイス製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7193726B2 (en) * | 2001-08-23 | 2007-03-20 | Zygo Corporation | Optical interferometry |
US7130056B2 (en) * | 2004-02-20 | 2006-10-31 | Agilent Technologies, Inc. | System and method of using a side-mounted interferometer to acquire position information |
-
2008
- 2008-04-25 TW TW097115204A patent/TW200900878A/zh unknown
- 2008-04-25 US US12/149,080 patent/US20090310105A1/en not_active Abandoned
- 2008-04-25 JP JP2009512976A patent/JPWO2008136404A1/ja active Pending
- 2008-04-25 WO PCT/JP2008/058058 patent/WO2008136404A1/ja active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10170217A (ja) * | 1996-12-12 | 1998-06-26 | Mitsubishi Electric Corp | 測長装置 |
WO2007001017A1 (ja) * | 2005-06-28 | 2007-01-04 | Nikon Corporation | 反射部材、光学部材、干渉計システム、ステージ装置、露光装置、及びデバイス製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011119303A (ja) * | 2009-11-30 | 2011-06-16 | Nikon Corp | 干渉計システム、ステージ装置及び露光装置 |
Also Published As
Publication number | Publication date |
---|---|
JPWO2008136404A1 (ja) | 2010-07-29 |
US20090310105A1 (en) | 2009-12-17 |
TW200900878A (en) | 2009-01-01 |
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