WO2008096594A1 - インプリント用モールドおよびその製造方法 - Google Patents

インプリント用モールドおよびその製造方法 Download PDF

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Publication number
WO2008096594A1
WO2008096594A1 PCT/JP2008/050826 JP2008050826W WO2008096594A1 WO 2008096594 A1 WO2008096594 A1 WO 2008096594A1 JP 2008050826 W JP2008050826 W JP 2008050826W WO 2008096594 A1 WO2008096594 A1 WO 2008096594A1
Authority
WO
WIPO (PCT)
Prior art keywords
mold
group
imprint mold
imprint
main body
Prior art date
Application number
PCT/JP2008/050826
Other languages
English (en)
French (fr)
Inventor
Katsuya Ueno
Yasuhide Kawaguchi
Original Assignee
Asahi Glass Company, Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Company, Limited filed Critical Asahi Glass Company, Limited
Priority to EP08703670A priority Critical patent/EP2116350A4/en
Priority to JP2008557054A priority patent/JP4930517B2/ja
Priority to CN2008800038834A priority patent/CN101610888B/zh
Publication of WO2008096594A1 publication Critical patent/WO2008096594A1/ja
Priority to US12/511,215 priority patent/US7767309B2/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B29C33/60—Releasing, lubricating or separating agents
    • B29C33/62—Releasing, lubricating or separating agents based on polymers or oligomers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2023/00—Use of polyalkenes or derivatives thereof as moulding material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

　表面に設けられた被覆層が剥離しにくいインプリント用モールドおよびその製造方法を提供する。 　モールド本体と、該モールド本体の表面に設けられた、離型剤からなる被覆層とを有し、前記離型剤が、下式（１）で表される化合物を含むことを特徴とするインプリント用モールド、およびその製造方法。 　ただし、Ｒ＝Ｒｆ－Ｘ－、左右のＲは同一の基、Ｒｆ＝パーフルオロアルキル基、Ｘ＝－（ＯＣ３Ｆ６）－、－（ＯＣ２Ｆ４）－、－（ＯＣＦ２）－のうちの１種以上かつ該単位の合計が１以上の基、Ｙ＝有機基、ｎの平均＝２～１０、Ｚ＝－Ｓｉ（Ｒ１）ｍ（Ｒ２）３－ｍ、Ｒ１＝水酸基または加水分解可能な基、Ｒ２＝水素原子または炭化水素基、ｍ＝１～３。
PCT/JP2008/050826 2007-02-07 2008-01-22 インプリント用モールドおよびその製造方法 WO2008096594A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP08703670A EP2116350A4 (en) 2007-02-07 2008-01-22 IMPRESSION MOLD AND METHOD FOR PRODUCING THE SAME
JP2008557054A JP4930517B2 (ja) 2007-02-07 2008-01-22 インプリント用モールドおよびその製造方法
CN2008800038834A CN101610888B (zh) 2007-02-07 2008-01-22 压印用模及其制造方法
US12/511,215 US7767309B2 (en) 2007-02-07 2009-07-29 Imprinting mold and process for its production

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-028268 2007-02-07
JP2007028268 2007-02-07

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/511,215 Continuation US7767309B2 (en) 2007-02-07 2009-07-29 Imprinting mold and process for its production

Publications (1)

Publication Number Publication Date
WO2008096594A1 true WO2008096594A1 (ja) 2008-08-14

Family

ID=39681505

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/050826 WO2008096594A1 (ja) 2007-02-07 2008-01-22 インプリント用モールドおよびその製造方法

Country Status (7)

Country Link
US (1) US7767309B2 (ja)
EP (1) EP2116350A4 (ja)
JP (1) JP4930517B2 (ja)
KR (1) KR20090117699A (ja)
CN (1) CN101610888B (ja)
TW (1) TW200904616A (ja)
WO (1) WO2008096594A1 (ja)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010131569A (ja) * 2008-12-08 2010-06-17 Asahi Glass Co Ltd 含フッ素重合体薄膜を有する基材及びその製造方法
JP2010234575A (ja) * 2009-03-30 2010-10-21 Fujifilm Corp インプリント用モールド構造体、インプリント用モールド構造体の製造方法、インプリント方法、及び磁気記録媒体の製造方法
JP2011005695A (ja) * 2009-06-24 2011-01-13 Tokyo Electron Ltd テンプレート処理装置、インプリントシステム、離型剤処理方法、プログラム及びコンピュータ記憶媒体
JP2011005696A (ja) * 2009-06-24 2011-01-13 Tokyo Electron Ltd テンプレート処理装置、インプリントシステム、離型剤処理方法、プログラム及びコンピュータ記憶媒体
WO2011122605A1 (ja) * 2010-03-30 2011-10-06 Hoya株式会社 インプリント用離型層付きモールド及びインプリント用離型層付きモールドの製造方法、コピーモールドの製造方法
JP2011224982A (ja) * 2010-03-30 2011-11-10 Hoya Corp 離型層付きモールドおよびその製造方法ならびにモールドの製造方法
WO2012018043A1 (ja) * 2010-08-06 2012-02-09 綜研化学株式会社 ナノインプリント用樹脂製モールド
JP2012048772A (ja) * 2010-08-24 2012-03-08 Hoya Corp インプリント用離型層、インプリント用離型層付きモールド及びインプリント用離型層付きモールドの製造方法
JP2013239535A (ja) * 2012-05-14 2013-11-28 Toyo Gosei Kogyo Kk 光インプリント方法

Families Citing this family (14)

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KR101652680B1 (ko) * 2008-05-29 2016-08-31 아사히 가라스 가부시키가이샤 광경화성 조성물 및 표면에 미세 패턴을 갖는 성형체의 제조 방법
KR101473069B1 (ko) * 2010-03-25 2014-12-15 미쓰비시 레이온 컴퍼니, 리미티드 몰드의 제조 방법 및 미세 요철 구조를 표면에 갖는 물품의 제조 방법
KR20130071426A (ko) * 2010-03-30 2013-06-28 호야 가부시키가이샤 임프린트용 이형층 부착 몰드 및 임프린트용 이형층 부착 몰드의 제조 방법, 카피 몰드의 제조 방법
CN101807628B (zh) * 2010-04-02 2012-05-23 日强光伏科技有限公司 一种制作太阳能电池正面栅线电极的方法
CN101872081B (zh) * 2010-06-10 2012-02-08 复旦大学 光致形变液晶高分子三维可调谐光子晶体及其制备方法
US9513409B2 (en) 2010-12-09 2016-12-06 Asahi Kasei Kabushiki Kaisha Fine-structure layered product, preparation method of the fine-structure layered product and manufacturing method of a fine-structure product
JP5653769B2 (ja) * 2011-01-19 2015-01-14 富士フイルム株式会社 ナノインプリント方法
EP2680048A4 (en) * 2011-02-22 2016-01-06 Asahi Glass Co Ltd FINE STRUCTURE SHAPE AND LIQUID CRYSTAL DISPLAY DEVICE COMPRISING A FINE STRUCTURE FORM
DE112012001024B4 (de) * 2011-02-28 2022-03-17 Tanazawa Hakkosha Co., Ltd. Gussform und Verfahren zum Herstellen derselben und Verfahren zum Angleichen von Glanzniveaus von Formteilen.
US20120261849A1 (en) * 2011-04-14 2012-10-18 Canon Kabushiki Kaisha Imprint apparatus, and article manufacturing method using same
CN103199268B (zh) * 2013-03-11 2016-02-03 中国科学院上海高等研究院 基于纳米压印技术的有序纳米结构膜、有序纳米结构膜电极的制备及应用
KR102453211B1 (ko) * 2015-07-30 2022-10-07 가부시끼가이샤 다나자와 핫꼬오샤 수지 성형용 금형
KR20190083215A (ko) 2018-01-03 2019-07-11 정장수 삽입 및 중심 고정형 드릴팁이 결합 된 드릴 공구
CN112571687A (zh) * 2020-12-28 2021-03-30 上海建工四建集团有限公司 一种高开孔率复合硅胶模具

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JPH05339007A (ja) * 1992-06-08 1993-12-21 Shin Etsu Chem Co Ltd 含フッ素有機けい素化合物およびその製造方法
JPH10113936A (ja) * 1996-10-15 1998-05-06 Sumitomo Chem Co Ltd キャストシートの製造方法
JP2002283354A (ja) 2001-03-27 2002-10-03 Daikin Ind Ltd インプリント加工用金型およびその製造方法
JP2007028268A (ja) 2005-07-19 2007-02-01 Kddi Corp 不正パケットを送信する端末の帯域割当を制限する基地局、システム及び方法

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Publication number Priority date Publication date Assignee Title
JPH05339007A (ja) * 1992-06-08 1993-12-21 Shin Etsu Chem Co Ltd 含フッ素有機けい素化合物およびその製造方法
JPH10113936A (ja) * 1996-10-15 1998-05-06 Sumitomo Chem Co Ltd キャストシートの製造方法
JP2002283354A (ja) 2001-03-27 2002-10-03 Daikin Ind Ltd インプリント加工用金型およびその製造方法
JP2007028268A (ja) 2005-07-19 2007-02-01 Kddi Corp 不正パケットを送信する端末の帯域割当を制限する基地局、システム及び方法

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Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010131569A (ja) * 2008-12-08 2010-06-17 Asahi Glass Co Ltd 含フッ素重合体薄膜を有する基材及びその製造方法
JP2010234575A (ja) * 2009-03-30 2010-10-21 Fujifilm Corp インプリント用モールド構造体、インプリント用モールド構造体の製造方法、インプリント方法、及び磁気記録媒体の製造方法
JP2011005695A (ja) * 2009-06-24 2011-01-13 Tokyo Electron Ltd テンプレート処理装置、インプリントシステム、離型剤処理方法、プログラム及びコンピュータ記憶媒体
JP2011005696A (ja) * 2009-06-24 2011-01-13 Tokyo Electron Ltd テンプレート処理装置、インプリントシステム、離型剤処理方法、プログラム及びコンピュータ記憶媒体
WO2011122605A1 (ja) * 2010-03-30 2011-10-06 Hoya株式会社 インプリント用離型層付きモールド及びインプリント用離型層付きモールドの製造方法、コピーモールドの製造方法
JP2011224982A (ja) * 2010-03-30 2011-11-10 Hoya Corp 離型層付きモールドおよびその製造方法ならびにモールドの製造方法
WO2012018043A1 (ja) * 2010-08-06 2012-02-09 綜研化学株式会社 ナノインプリント用樹脂製モールド
JP5292621B2 (ja) * 2010-08-06 2013-09-18 綜研化学株式会社 ナノインプリント用樹脂製モールド
US9393737B2 (en) 2010-08-06 2016-07-19 Soken Chemical & Engineering Co., Ltd. Resin mold for nanoimprinting
JP2012048772A (ja) * 2010-08-24 2012-03-08 Hoya Corp インプリント用離型層、インプリント用離型層付きモールド及びインプリント用離型層付きモールドの製造方法
JP2013239535A (ja) * 2012-05-14 2013-11-28 Toyo Gosei Kogyo Kk 光インプリント方法

Also Published As

Publication number Publication date
JPWO2008096594A1 (ja) 2010-05-20
EP2116350A4 (en) 2011-06-22
CN101610888A (zh) 2009-12-23
US7767309B2 (en) 2010-08-03
EP2116350A1 (en) 2009-11-11
CN101610888B (zh) 2012-10-17
JP4930517B2 (ja) 2012-05-16
TW200904616A (en) 2009-02-01
US20090285927A1 (en) 2009-11-19
KR20090117699A (ko) 2009-11-12

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