WO2006091291A3 - Apparatus and process for carbon nanotube growth - Google Patents

Apparatus and process for carbon nanotube growth Download PDF

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Publication number
WO2006091291A3
WO2006091291A3 PCT/US2006/001456 US2006001456W WO2006091291A3 WO 2006091291 A3 WO2006091291 A3 WO 2006091291A3 US 2006001456 W US2006001456 W US 2006001456W WO 2006091291 A3 WO2006091291 A3 WO 2006091291A3
Authority
WO
WIPO (PCT)
Prior art keywords
chamber
substrate
aspect ratio
high aspect
carbon nanotube
Prior art date
Application number
PCT/US2006/001456
Other languages
French (fr)
Other versions
WO2006091291A2 (en
Inventor
Bernard F. Coll
Scott V. Johnson
Original Assignee
Motorola, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola, Inc. filed Critical Motorola, Inc.
Priority to JP2007549732A priority Critical patent/JP2008530724A/en
Priority to KR1020077019295A priority patent/KR100928409B1/en
Priority to EP06718518A priority patent/EP1851357A2/en
Priority to CN2006800048697A priority patent/CN102264943A/en
Publication of WO2006091291A2 publication Critical patent/WO2006091291A2/en
Publication of WO2006091291A3 publication Critical patent/WO2006091291A3/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82BNANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B3/0004Apparatus specially adapted for the manufacture or treatment of nanostructural devices or systems or methods for manufacturing the same
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/158Carbon nanotubes
    • C01B32/16Preparation
    • C01B32/162Preparation characterised by catalysts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82BNANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B3/0009Forming specific nanostructures
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/158Carbon nanotubes
    • C01B32/16Preparation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • DTEXTILES; PAPER
    • D01NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
    • D01FCHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
    • D01F9/00Artificial filaments or the like of other substances; Manufacture thereof; Apparatus specially adapted for the manufacture of carbon filaments
    • D01F9/08Artificial filaments or the like of other substances; Manufacture thereof; Apparatus specially adapted for the manufacture of carbon filaments of inorganic material
    • D01F9/12Carbon filaments; Apparatus specially adapted for the manufacture thereof
    • D01F9/127Carbon filaments; Apparatus specially adapted for the manufacture thereof by thermal decomposition of hydrocarbon gases or vapours or other carbon-containing compounds in the form of gas or vapour, e.g. carbon monoxide, alcohols
    • DTEXTILES; PAPER
    • D01NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
    • D01FCHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
    • D01F9/00Artificial filaments or the like of other substances; Manufacture thereof; Apparatus specially adapted for the manufacture of carbon filaments
    • D01F9/08Artificial filaments or the like of other substances; Manufacture thereof; Apparatus specially adapted for the manufacture of carbon filaments of inorganic material
    • D01F9/12Carbon filaments; Apparatus specially adapted for the manufacture thereof
    • D01F9/127Carbon filaments; Apparatus specially adapted for the manufacture thereof by thermal decomposition of hydrocarbon gases or vapours or other carbon-containing compounds in the form of gas or vapour, e.g. carbon monoxide, alcohols
    • D01F9/133Apparatus therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/022Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2329/00Electron emission display panels, e.g. field emission display panels

Abstract

An apparatus is provided for growing high aspect ratio emitters (26) on a substrate (13). The apparatus comprises a housing (10) defining a chamber and includes a substrate holder (12) attached to the housing and positioned within the chamber for holding a substrate having a surface for growing the high aspect ratio emitters (26) thereon. A heating element (17) is positioned near the substrate and being at least one material selected from the group consisting of carbon, conductive cermets, and conductive ceramics. The housing defines an opening (15) into the chamber for receiving a gas into the chamber for forming the high aspect ratio emitters (26).
PCT/US2006/001456 2005-02-23 2006-01-13 Apparatus and process for carbon nanotube growth WO2006091291A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007549732A JP2008530724A (en) 2005-02-23 2006-01-13 Apparatus and process for carbon nanotube growth
KR1020077019295A KR100928409B1 (en) 2005-02-23 2006-01-13 Devices and Processes for Carbon Nanotube Growth
EP06718518A EP1851357A2 (en) 2005-02-23 2006-01-13 Apparatus and process for carbon nanotube growth
CN2006800048697A CN102264943A (en) 2005-02-23 2006-01-13 Apparatus and process for carbon nanotube growth

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/064,653 US20060185595A1 (en) 2005-02-23 2005-02-23 Apparatus and process for carbon nanotube growth
US11/064,653 2005-02-23

Publications (2)

Publication Number Publication Date
WO2006091291A2 WO2006091291A2 (en) 2006-08-31
WO2006091291A3 true WO2006091291A3 (en) 2011-06-03

Family

ID=36911282

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/001456 WO2006091291A2 (en) 2005-02-23 2006-01-13 Apparatus and process for carbon nanotube growth

Country Status (6)

Country Link
US (2) US20060185595A1 (en)
EP (1) EP1851357A2 (en)
JP (1) JP2008530724A (en)
KR (1) KR100928409B1 (en)
CN (1) CN102264943A (en)
WO (1) WO2006091291A2 (en)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4807960B2 (en) * 2005-03-17 2011-11-02 株式会社アルバック Film forming apparatus and film forming method
WO2008030047A1 (en) * 2006-09-06 2008-03-13 Seoul National University Industry Foundation Apparatus and method of depositing films using bias and charging behavior of nanoparticles formed during chemical vapor deposition
US20080078325A1 (en) * 2006-09-29 2008-04-03 Tokyo Electron Limited Processing system containing a hot filament hydrogen radical source for integrated substrate processing
US20080081464A1 (en) * 2006-09-29 2008-04-03 Tokyo Electron Limited Method of integrated substrated processing using a hot filament hydrogen radical souce
JP5138212B2 (en) * 2006-12-25 2013-02-06 東京エレクトロン株式会社 Deposition equipment
US7794797B2 (en) * 2007-01-30 2010-09-14 Cfd Research Corporation Synthesis of carbon nanotubes by selectively heating catalyst
JP2008227033A (en) * 2007-03-12 2008-09-25 Tokyo Electron Ltd Substrate processing apparatus
JP5140296B2 (en) * 2007-03-20 2013-02-06 株式会社アルバック Remote plasma CVD apparatus and carbon nanotube production method using this apparatus
US8216364B1 (en) * 2008-04-14 2012-07-10 Raytheon Company System and method for low-power nanotube growth using direct resistive heating
KR101517020B1 (en) * 2008-05-15 2015-05-04 삼성디스플레이 주식회사 Apparatus and method for fabricating Organic Light Emitting Diode Display Device
KR20110025185A (en) * 2008-05-28 2011-03-09 아익스트론 아게 Thermal gradient enhanced chemical vapour deposition (tge-cvd)
CN101899288B (en) * 2009-05-27 2012-11-21 清华大学 Thermal interface material and preparation method thereof
US9376321B2 (en) * 2009-05-29 2016-06-28 Postech Academy-Industry Foundation Method and apparatus for manufacturing a nanowire
CN102459074A (en) * 2009-06-17 2012-05-16 独立行政法人产业技术综合研究所 Method for producing carbon nanotube assembly having high specific surface area
US8526167B2 (en) 2009-09-03 2013-09-03 Applied Materials, Inc. Porous amorphous silicon-carbon nanotube composite based electrodes for battery applications
CN102011101B (en) * 2009-09-04 2013-06-05 清华大学 Growing device for diamond film
WO2012057128A1 (en) * 2010-10-27 2012-05-03 三洋電機株式会社 Film forming device and film forming method employing same
JP5850236B2 (en) * 2012-01-20 2016-02-03 アイシン精機株式会社 Carbon nanotube manufacturing apparatus and carbon nanotube manufacturing method
US9064667B2 (en) * 2012-11-15 2015-06-23 California Institute Of Technology Systems and methods for implementing robust carbon nanotube-based field emitters
EP2923372A4 (en) 2012-11-21 2016-07-20 California Inst Of Techn Systems and methods for fabricating carbon nanotube-based vacuum electronic devices
CN103896243B (en) * 2012-12-29 2016-03-09 清华大学 The method of reactor and carbon nano-tube
US10269593B2 (en) * 2013-03-14 2019-04-23 Applied Materials, Inc. Apparatus for coupling a hot wire source to a process chamber
US10209136B2 (en) 2013-10-23 2019-02-19 Applied Materials, Inc. Filament temperature derivation in hotwire semiconductor process
DE102013112855A1 (en) * 2013-11-21 2015-05-21 Aixtron Se Apparatus and method for manufacturing carbon nanostructures
DE102013113045A1 (en) * 2013-11-26 2015-05-28 Aixtron Se heater
JP2015174797A (en) * 2014-03-14 2015-10-05 ヤマハ株式会社 Substrate for cnt growth, and production method of carbon nano-tube
US10745280B2 (en) 2015-05-26 2020-08-18 Department Of Electronics And Information Technology (Deity) Compact thermal reactor for rapid growth of high quality carbon nanotubes (CNTs) produced by chemical process with low power consumption
US20170040140A1 (en) * 2015-08-06 2017-02-09 Seagate Technology Llc Magnet array for plasma-enhanced chemical vapor deposition
EP3430636B1 (en) * 2016-03-16 2020-06-17 LightLab Sweden AB Method for controllably growing zno nanowires
US9812295B1 (en) 2016-11-15 2017-11-07 Lyten, Inc. Microwave chemical processing
US9767992B1 (en) 2017-02-09 2017-09-19 Lyten, Inc. Microwave chemical processing reactor
US9997334B1 (en) 2017-02-09 2018-06-12 Lyten, Inc. Seedless particles with carbon allotropes
US10920035B2 (en) 2017-03-16 2021-02-16 Lyten, Inc. Tuning deformation hysteresis in tires using graphene
KR102507791B1 (en) 2017-03-16 2023-03-08 라이텐, 인코포레이티드 Carbon and elastomer integration
US9862606B1 (en) 2017-03-27 2018-01-09 Lyten, Inc. Carbon allotropes
US9862602B1 (en) 2017-03-27 2018-01-09 Lyten, Inc. Cracking of a process gas
US20180308661A1 (en) * 2017-04-24 2018-10-25 Applied Materials, Inc. Plasma reactor with electrode filaments
US10465128B2 (en) 2017-09-20 2019-11-05 Lyten, Inc. Cracking of a process gas
WO2019126196A1 (en) 2017-12-22 2019-06-27 Lyten, Inc. Structured composite materials
SG11202006088XA (en) 2018-01-04 2020-07-29 Lyten Inc Resonant gas sensor
WO2019143559A1 (en) 2018-01-16 2019-07-25 Lyten, Inc. Microwave transparent pressure barrier
FR3086673B1 (en) 2018-10-01 2021-06-04 Commissariat Energie Atomique MULTI-LAYER STACKING FOR CVD GROWTH OF CARBON NANOTUBES
KR102195136B1 (en) * 2019-01-10 2020-12-24 서울과학기술대학교 산학협력단 Apparatus and method for processing plasma
KR102019009B1 (en) * 2019-02-26 2019-09-05 권순영 Plasma source
US11578405B2 (en) 2019-04-23 2023-02-14 King Fahd University Of Petroleum And Minerals Apparatus for monitoring carbon nanotube growth
US11680012B2 (en) 2020-08-04 2023-06-20 Lyten, Inc. Methods for manufacturing or strengthening carbon-containing glass materials

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5010842A (en) * 1988-10-25 1991-04-30 Mitsubishi Denki Kabushiki Kaisha Apparatus for forming thin film
US5366555A (en) * 1990-06-11 1994-11-22 Kelly Michael A Chemical vapor deposition under a single reactor vessel divided into separate reaction regions with its own depositing and exhausting means
US5554222A (en) * 1992-06-01 1996-09-10 Matsushita Electric Industrial Co., Ltd. Ionization deposition apparatus
US6037241A (en) * 1998-02-19 2000-03-14 First Solar, Llc Apparatus and method for depositing a semiconductor material
US6042900A (en) * 1996-03-12 2000-03-28 Alexander Rakhimov CVD method for forming diamond films
US20030029716A1 (en) * 2001-08-13 2003-02-13 Ga-Lane Chen DWDM filter system design
US6559442B1 (en) * 1999-04-22 2003-05-06 Alcatel High-pressure operation of a field-emission cold cathode
US20040149211A1 (en) * 2002-07-18 2004-08-05 Jae-Young Ahn Systems including heated shower heads for thin film deposition and related methods
US20040265211A1 (en) * 2001-12-14 2004-12-30 Dillon Anne C. Hot wire production of single-wall carbon nanotubes

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5833753A (en) * 1995-12-20 1998-11-10 Sp 3, Inc. Reactor having an array of heating filaments and a filament force regulator
KR100376198B1 (en) * 1999-11-05 2003-03-15 일진나노텍 주식회사 Field emission display device using vertically aligned carbon nanotube and manufacturing method thereof
AUPR421701A0 (en) * 2001-04-04 2001-05-17 Commonwealth Scientific And Industrial Research Organisation Process and apparatus for the production of carbon nanotubes
KR20030028296A (en) * 2001-09-28 2003-04-08 학교법인 한양학원 Plasma enhanced chemical vapor deposition apparatus and method of producing a cabon nanotube using the same
JP3840147B2 (en) * 2002-06-21 2006-11-01 キヤノン株式会社 Film forming apparatus, film forming method, and electron-emitting device, electron source, and image forming apparatus manufacturing method using the same
KR101190136B1 (en) * 2004-05-10 2012-10-12 가부시키가이샤 알박 A method for forming a carbon nanotube and a plasma cvd apparatus for carrying out the method

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5010842A (en) * 1988-10-25 1991-04-30 Mitsubishi Denki Kabushiki Kaisha Apparatus for forming thin film
US5366555A (en) * 1990-06-11 1994-11-22 Kelly Michael A Chemical vapor deposition under a single reactor vessel divided into separate reaction regions with its own depositing and exhausting means
US5554222A (en) * 1992-06-01 1996-09-10 Matsushita Electric Industrial Co., Ltd. Ionization deposition apparatus
US6042900A (en) * 1996-03-12 2000-03-28 Alexander Rakhimov CVD method for forming diamond films
US6037241A (en) * 1998-02-19 2000-03-14 First Solar, Llc Apparatus and method for depositing a semiconductor material
US6559442B1 (en) * 1999-04-22 2003-05-06 Alcatel High-pressure operation of a field-emission cold cathode
US20030029716A1 (en) * 2001-08-13 2003-02-13 Ga-Lane Chen DWDM filter system design
US20040265211A1 (en) * 2001-12-14 2004-12-30 Dillon Anne C. Hot wire production of single-wall carbon nanotubes
US20040149211A1 (en) * 2002-07-18 2004-08-05 Jae-Young Ahn Systems including heated shower heads for thin film deposition and related methods

Also Published As

Publication number Publication date
US20060185595A1 (en) 2006-08-24
CN102264943A (en) 2011-11-30
KR100928409B1 (en) 2009-11-26
WO2006091291A2 (en) 2006-08-31
US20110033639A1 (en) 2011-02-10
JP2008530724A (en) 2008-08-07
EP1851357A2 (en) 2007-11-07
KR20070096044A (en) 2007-10-01

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