WO2006025208A1 - 半導体装置及びワード線昇圧方法 - Google Patents
半導体装置及びワード線昇圧方法 Download PDFInfo
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- WO2006025208A1 WO2006025208A1 PCT/JP2005/014812 JP2005014812W WO2006025208A1 WO 2006025208 A1 WO2006025208 A1 WO 2006025208A1 JP 2005014812 W JP2005014812 W JP 2005014812W WO 2006025208 A1 WO2006025208 A1 WO 2006025208A1
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- voltage
- node
- semiconductor device
- charge pump
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Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M3/00—Conversion of dc power input into dc power output
- H02M3/02—Conversion of dc power input into dc power output without intermediate conversion into ac
- H02M3/04—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters
- H02M3/06—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using resistors or capacitors, e.g. potential divider
- H02M3/07—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using resistors or capacitors, e.g. potential divider using capacitors charged and discharged alternately by semiconductor devices with control electrode, e.g. charge pumps
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/08—Address circuits; Decoders; Word-line control circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/10—Programming or data input circuits
- G11C16/12—Programming voltage switching circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/26—Sensing or reading circuits; Data output circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/30—Power supply circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C5/00—Details of stores covered by group G11C11/00
- G11C5/14—Power supply arrangements, e.g. power down, chip selection or deselection, layout of wirings or power grids, or multiple supply levels
- G11C5/145—Applications of charge pumps; Boosted voltage circuits; Clamp circuits therefor
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C7/00—Arrangements for writing information into, or reading information out from, a digital store
- G11C7/06—Sense amplifiers; Associated circuits, e.g. timing or triggering circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C8/00—Arrangements for selecting an address in a digital store
- G11C8/08—Word line control circuits, e.g. drivers, boosters, pull-up circuits, pull-down circuits, precharging circuits, for word lines
Definitions
- the present invention relates to a semiconductor device and a word line boosting method. More specifically, the present invention relates to a method for boosting a selected node line.
- a voltage higher than a power supply voltage may be required.
- a boost circuit that boosts the power supply voltage to generate the gate voltage is required.
- booster circuits are mainly used as booster circuits for flash memories.
- the booster circuit is a circuit that rapidly boosts the voltage to a target voltage using a control signal different from the clock signal.
- FIG. 1 shows a voltage generation circuit 11 that supplies a voltage, and an X decoder 6 that selectively supplies a voltage from the voltage generation circuit 11 to a word line (WL).
- switch 25 shown in FIG. 1 is turned on, and power supply voltage Vcc (26) is connected to node A.
- Vcc power supply voltage
- the booster circuit 20 includes a pulse generating circuit 21 and a boosting capacitor 22, and the pulse generating circuit 21 is connected to the node A via the boosting capacitor 22.
- the pulse generating circuit 21 is connected to the node A via the boosting capacitor 22.
- switch 25 is opened, node A is also disconnected from power supply voltage Vcc (26), and a positive pulse is generated from pulse generation circuit 21 in booster circuit 20.
- FIG. 2 shows the voltage at node B connecting the pulse generation circuit 21 and the boosting capacitor 22.
- node A is raised to a level higher than Vcc due to the capacitive coupling of the boosting capacitor 22.
- the This boosted voltage for example 5V, is applied to the gate of the selected memory cell.
- Patent Document 1 discloses a semiconductor memory device having a booster circuit that compensates for power supply voltage fluctuations and temperature fluctuations of a boosted voltage.
- Patent Document 1 JP 2001-35174 A
- the noise generating circuit 21 While the noise generating circuit 21 generates a positive pulse, the word line (WL) boosted by the booster circuit 20 is capable of maintaining the boosted level. Since a very small leakage current is generated, the voltage level at node A gradually decreases as time passes, as shown in Figure 2.
- the present invention has been made in view of the above circumstances, and provides a semiconductor device and a word line boosting method capable of supplying a voltage higher than a power supply voltage to a selected word line during a read period.
- the purpose is to do.
- a semiconductor device of the present invention includes a booster circuit that boosts a selected line to a first predetermined voltage higher than a power supply voltage, and a boosted voltage of the line. And a charge pump circuit for holding the voltage at a predetermined voltage. Boosting with the booster circuit decreases the voltage level over time, but a charge pump is provided to hold the boosted line voltage, preventing the selected line from being lowered, and writing to and reading from memory cells. Can be done correctly.
- the selected line is a lead line.
- the charge pump circuit can be connected to a boosting node of the booster circuit via a first diode.
- a charge pump By connecting a charge pump to the booster circuit node via the first diode, The voltage at the node boosted by the Yard pump circuit is not lowered.
- the semiconductor device may include an address transition detection circuit that outputs a signal instructing start of operation to the booster circuit and the charge pump circuit when the address information is decoded. it can. With this configuration, it is possible to notify the booster circuit and the charge pump circuit of the timing to start boosting.
- the charge pump circuit may include a plurality of boost stages for boosting the power supply voltage, and internal nodes between the boost stages may be sequentially charged.
- the booster circuit may include a multistage booster circuit in which a plurality of booster circuits are connected in multiple stages.
- a desired boosted voltage can be obtained by boosting with the booster circuit even when the power supply voltage is low.
- the charge pump circuit holds the word line at the predetermined voltage during a continuous read period of data for continuously selecting a plurality of memory cells connected to the word line. It can be set as the structure to do. During a period in which a plurality of memory cells connected to the word line are continuously selected, a plurality of memory cell force data can be continuously read without causing the word line voltage to decrease.
- the booster circuit may generate the predetermined voltage by one pulse signal output from the address detection circuit. Since the booster circuit generates a predetermined voltage by one pulse signal output from the address detection circuit, it is possible to detect a change in address and hold the word line at a predetermined voltage.
- the charge pump circuit may be driven by a clock signal to hold the predetermined voltage.
- the drive of the charge pump circuit can be controlled by a clock signal.
- the booster circuit and the charge pump circuit each include a capacitor, and the capacitor of the booster circuit is preferably larger than the capacitor of the charge pump circuit. Therefore, the circuit area is not increased more than necessary.
- the word line boosting method of the present invention includes a step of boosting a selected word line to a predetermined voltage higher than a power supply voltage, and a step of holding the boosted voltage of the word line at the predetermined voltage. is doing. Voltage force boosted in the step of boosting The provision of a step that maintains the voltage even if the voltage level drops over time prevents the word line from going down and correctly writes to and reads from the memory cell Can do.
- a regulation circuit connected to a charge pump output node between the charge pump circuit and the first diode and holding the charge pump output node at a second predetermined voltage is provided. It can be set as the structure which has. With such a configuration, the charge pump output node can be held at a predetermined voltage.
- the regulation circuit may be connected to the charge pump output node via a second diode.
- the charge pump output node can be held at a voltage obtained by adding the threshold voltage of the second diode to the voltage of the regulation circuit.
- the forward threshold voltage of the second diode can be substantially the same as that of the first diode. With such a configuration, it is possible to suppress fluctuations in the voltage of the node that boosts the booster circuit due to fluctuations in the manufacturing process.
- the regulation circuit may be configured to hold a node between the second diode and the regulation circuit at substantially the same voltage as the first predetermined voltage. It can. With such a configuration, it is possible to further suppress fluctuations in the voltage of the boosted node of the booster circuit due to fluctuations in the manufacturing process.
- the invention's effect is possible to further suppress fluctuations in the voltage of the boosted node of the booster circuit due to fluctuations in the manufacturing process.
- a voltage higher than the power supply voltage can be supplied to the selected word line during the read period.
- FIG. 1 is a diagram showing a configuration of a conventional voltage generation circuit.
- FIG. 2 is a diagram showing voltage waveforms at nodes A and B in the voltage generation circuit.
- FIG. 3 is a block diagram showing an overall configuration of a semiconductor device.
- FIG. 4 is a diagram showing a configuration of a voltage generation circuit of the present invention.
- FIG. 5 is a diagram showing voltage waveforms at nodes in the voltage generation circuit.
- FIG. 6 is a diagram showing a configuration of a charge pump circuit.
- FIG. 7 is a diagram showing waveforms of pulses ⁇ 1 and ⁇ 2 input to the charge pump circuit 23.
- FIG. 8 is a diagram showing a configuration of a two-stage booster circuit.
- FIG. 9 is a diagram showing voltage waveforms at nodes in a two-stage booster circuit.
- FIG. 10 is a diagram showing a configuration of a level shifter in a two-stage booster circuit.
- FIG. 11 is a diagram illustrating a configuration of a regulation circuit according to the second embodiment.
- FIG. 12 (A) is a diagram showing the voltage waveform at each node when the threshold voltage of the diode of Example 2 is 0.7 V
- FIG. 12 (B) is the threshold voltage of the diode.
- FIG. 6 is a diagram showing voltage waveforms at each node when is 0.6V.
- FIG. 3 shows the overall configuration of the semiconductor device 1.
- the semiconductor device 1 includes a control circuit 2, an input / output buffer 3, a cell array unit 4, an address buffer 5, an X decoder 6, a Y decoder 7, a Y gate 8, a chip enable Z output enable circuit 9
- the semiconductor device 1 may be a semiconductor memory device such as a flash memory packaged alone, or may be incorporated as a part of a semiconductor device such as a system LSI.
- the control circuit 2 includes a command register, operates in synchronization with the chip enable signal CE and the write enable signal WE to which an external force is also supplied, and outputs a timing signal corresponding to the command supplied with the external force. Generate and output to each part.
- the input / output buffer 3 receives data from the outside, and supplies this data to the control circuit 2 and the data latch Z sense amplifier 10.
- the cell array unit 4 includes a control gate connected to the word line WL, a drain connected to the bit line BL, a source connected to the source line, and polycrystalline silicon as a charge storage layer.
- a non-volatile memory cell MC including a floating gate is provided, and a plurality of the memory cells MC are arranged in a matrix.
- the word line and the bit line are set to appropriate potentials according to the respective operations, thereby executing the charge injection or charge extraction operation for the memory cells.
- the address buffer 5 latches address information supplied from an external force and supplies it to the X decoder 6 and the ⁇ decoder 7.
- the X decoder 6 selectively drives the plurality of word lines WL based on respective addresses at the time of data writing, erasing and reading. A high voltage from the voltage generation circuit 11 is supplied to the word line.
- the Y decoder 7 identifies the address in the Y direction indicated by the address signal and turns on the corresponding transistor in the Y gate.
- the Y gate 8 selectively connects the bit line BL of the cell array unit 4 to the sense amplifier of the data latch / sense amplifier 10 at the time of reading based on the decode address signal.
- the bit line BL is selectively connected to the data latch of the data latch Z sense amplifier 10.
- a data read Z write path for the memory cell MC in the cell array unit 4 is established.
- the chip enable Z output enable circuit 9 activates the ⁇ decoder 7 in response to the chip enable signal CE, and activates the input / output buffer 3 in response to the output enable signal OE.
- Data latch Z sense amplifier 10 latches data from input / output buffer 3 at the time of writing. Data latched by the data latch Z sense amplifier 10 is output to the bit line selected by the Y gate 8. The data latch / sense amplifier 10 amplifies the data read to the bit line at the time of reading, and can handle it as a digital level. Amplifies to a level where it can function.
- the data latch Z sense amplifier 10 determines the data read out by the cell array unit 4 as well.
- the current of the data supplied from the cell array unit 4 is compared with the reference current to determine whether the data is 0 or a force 1.
- the reference current is a current to which a reference cell force (not shown) is also supplied.
- the determination result is supplied to the input / output buffer 3 as read data.
- the voltage generation circuit 11 includes a booster circuit 20, a charge pump circuit 23, and the like.
- the voltage generation circuit 11 will be described in detail later.
- the ATD circuit 12 Upon detecting a change in the address signal, the ATD circuit 12 outputs an ATD signal to the pulse generation circuit 21 and the charge pump circuit 23 in the voltage generation circuit 11.
- the configuration of the voltage generation circuit 11 will be described with reference to FIG.
- the node A connecting the X decoder 6 and the voltage generation circuit 11 includes a power supply Vcc (26) for charging the node A to the power supply voltage Vcc, a booster circuit 20 for boosting the node A, and a decrease in the boost level of the node A. This is connected to the charge pump circuit 23 that prevents this.
- the power supply Vcc (26) is connected to the node A through the switch 25, and the charge pump circuit 23 is connected to the node A through the diode 24 (first diode).
- the charge pump circuit 23 charges a node C connecting the charge pump circuit 23 and the diode 24 to a predetermined voltage.
- the threshold voltage of the diode is set to 0.7V, and it is charged to 5.7V, which is 0.7V higher than the node A.
- the diode 24 has an anode side connected to the charge pump circuit 23 and a force sword side connected to the node A.
- the booster circuit 20 includes a pulse generation circuit 21 and a boosting capacitor 22, and the pulse generation circuit 21 is connected to the node A via the boosting capacitor 22. From node A, the read voltage 5. OV is supplied to the word line.
- the ATD signal from the ATD circuit 12 is input to the charge pump circuit 23 and the pulse generation circuit 21.
- the boosting capacitor 22 in the booster circuit 20 is also charged to the power supply voltage Vcc by the power supply Vcc (26).
- Vcc the power supply voltage
- the node A is raised to a level higher than Vcc by the capacitive coupling of the boosting capacitor 22 ((c) shown in FIG. 5). ).
- the capacity of the boosting capacitor 22 and the pulse generation circuit 21 for driving the boosting capacitor 22 is sufficiently large so that this boosting time is sufficiently short to enable high-speed reading.
- the Vcc level is 3 V
- the voltage boosted by the booster circuit 20 (first predetermined voltage) is 5 V. The power is not limited to this.
- the charge pump circuit 23 which has started operation by inputting the ATD signal from the ATD circuit 12 requires about 1 microsecond until reaching a predetermined voltage level ((d) shown in FIG. 5). Therefore, there is a period when the voltage at node C is lower than that at node A boosted by booster circuit 20.Therefore, no current flows from node A to node C, and the voltage at node A fluctuates. Does not occur.
- node A is diode 24 Force S
- the node A is in the floating state because it is connected in the reverse direction from node A to node C, and the voltage at node A is held constant. As described above, the voltage level of node A is held at 5.0V.
- Boosting by the booster circuit 20 decreases the voltage level over time, but a charge pump circuit 23 is provided to hold the word line voltage to prevent the word line from being lowered and to the memory cell. Writing and reading can be performed correctly.
- the charge pump circuit 23 includes a transistor 35 and a plurality of boost stages 30 to 30.
- the power supply voltage Vcc is connected to the input side of the first boost stage 30 via the transistor 35, and the node C shown in FIG. 4 is connected to the output side of the nth boost stage 30.
- One boost stage consists of two diodes D31 and D32 and one capacitor C33.
- the diodes D31 and D32 are constituted by diode-connected transistors, for example.
- One end of the capacitor C33 is precharged to the power supply voltage Vcc-Vth (Vth is the forward voltage drop of the diode) via the diode D31.
- Clock signals ⁇ 1 and ⁇ 2 are applied to the other end of the capacitor C33.
- the clock signals ⁇ 1 and ⁇ 2 are complementary signals generated by the clock generation circuit 35 shown in FIG. Figure 7 shows the waveforms of the clock signals ⁇ 1 and ⁇ 2.
- a high level for example, 3V
- the capacitor C33 is boosted, and the charge charged here is charged to the capacitor C33 in the next stage via the diode D32.
- the capacitor C33 of the next stage is boosted, and the charge charged here is further passed through the diode D32.
- the capacitor C33 in the next stage is charged. Thereafter, by repeating this operation, the output voltage gradually increases, and finally the boosted voltage is output.
- the boost time by the charge pump circuit 23 is longer than the boost time by the booster circuit 20.
- the charge pump circuit 23 is not required to operate at high speed because it only needs to hold the potential previously boosted by the booster circuit 20. Therefore, the capacity of the capacitor C33 in the circuit and the clock generation circuit 35 that drives the capacitor C33 are set smaller than those of the booster circuit 20. This increases the circuit area more than necessary. I don't get angry.
- the regulation circuit 40 that keeps the voltage at the node C constant will be described.
- an nMOS transistor 41 and an nMOS transistor 42 are connected in series to a wiring connected to the node C.
- the gate of the nMOS transistor 41 is connected to the power supply voltage Vcc, and the output of the comparator 43 is input to the gate of the nMOS transistor 42.
- Capacitors 44 and 45 are connected in series to the wiring connected to node C.
- Capacitors 44 and 45 are connected in series, and the voltage at node C is divided by a predetermined ratio. Comparator 43 compares the divided value of capacitors 44 and 45 with the reference voltage.
- the comparator 43 When the divided value exceeds the reference voltage (that is, when the voltage at node C becomes higher than 5.7V), the comparator 43 Is output to the gate of the nMOS transistor 42. This reduces the voltage level on node C.
- the divided voltage value is lower than the reference voltage (that is, when the voltage at the node C becomes lower than 5.7 V)
- a low level signal is output to the gate of the nMOS transistor 42, and the nMOS transistor 42 is turned off.
- the regulation circuit 40 holds the voltage of the node C at a predetermined voltage (5.7 V) by such an operation.
- the slight vibration of node C shown in FIG. 5 is caused by the operation of the regulation circuit 40.
- a desired boosted voltage can be obtained by boosting by the charge pump circuit even when the power supply voltage is low.
- a booster circuit 20 shown in FIG. 8 includes a first booster circuit 50 and a second booster circuit 60.
- the first booster circuit 50 includes a p-channel MOS transistor (hereinafter referred to as a pMOS transistor) 52, an n-channel MOS transistor (hereinafter referred to as an nMOS transistor) 53, a powerful CMOS switch 51, The level shifter 54, the boosting capacitor C55, and the pMOS transistor 56 help.
- the second booster circuit 60 includes a CMOS switch 61 including a pMOS transistor 62 and an nMOS transistor 63, a leveler shifter 64, a pMOS transistor 66, and a boosting capacitor 65.
- a high level kickB signal is input to the first booster circuit 50 and the second booster circuit 60.
- This kickB signal is This is a signal output from the pulse generation circuit 21.
- the nMOS transistors 53 and 63 of the CMOS switches 51 and 61 are turned on. As a result, the nodes D and F become low level.
- the level shifters 54 and 64 apply a low level voltage to the gates of the pMOS transistors 56 and 66. Therefore, the pMOS transistors 56 and 66 are turned on to charge the nodes E and G to Vcc.
- the pMOS transistor 52 of the CMOS switch 51 is first turned on. This is because the signal obtained by delaying the KickB signal by the delay elements 67 and 68 is input to the second booster circuit 60. As a result, node F is charged to Vcc having the same potential as node E. Therefore, a positive pulse is applied to the capacitor C55, and the node G is boosted to a level higher than Vcc as shown in FIG. 9 due to the capacitive coupling of the capacitor C55. At the same time, the pMOS transistor 56 of the first booster circuit 50 is turned off in response to the output from the level shifter 54. In this embodiment, Vcc is 3V, higher than Vcc, and the level voltage is 5V.
- the second booster circuit 60 to which the KickB signal delayed by the delay elements 67 and 68 is input receives the low level of the KickB signal, and the pMOS transistor 62 is turned on.
- node D is charged to Vcc as shown in FIG. 9, and a positive pulse is applied to capacitor C65.
- the node E Due to the capacitive coupling of the capacitor C65, the node E is boosted to a potential higher than Vcc as shown in FIG.
- the boosted voltage force is supplied to the node F via the MOS transistor 52, and drives the capacitor 55 of the first booster circuit 50. That is, the node G is further boosted to 5 + o V (see FIG. 9) by the capacitive coupling of the capacitor 55 (see FIG. 9).
- the level shifters 54 and 64 of the first booster circuit 50 and the second booster circuit 60 will be described with reference to FIG.
- the level shifters 54 and 64 are circuits that convert the output from Vss to Vcc and the output from Vss to high voltage.
- the level shifters 54 and 64 have pMOS transistors 70 and 71, nMOS transistors 72, 73 and 74, and an inverter 75. Note that the voltage of the node G shown in FIG. 9 is applied to the sources of the pMOS transistors 70 and 71 of the level shifter 54, and the pMOS transistors of the level shifter 64 The voltage of the node E shown in FIG. 9 is applied to the sources of the transistors 70 and 71.
- the input terminal of the level shifter 54 is connected to the node F, and the output terminal is connected to the gate of the pMOS transistor 56 shown in FIG.
- the input terminal of the level shifter 64 is connected to the node D, and the output terminal is connected to the gate of the pMOS transistor 66 shown in FIG.
- the nMOS transistor 74 When the voltage applied to the input terminals of the level shifters 54 and 64 exceeds a high level (Vcc), the nMOS transistor 74 is turned off by the inverter 75. Since the power supply voltage Vcc is always applied to the gates of the nMOS transistors 72 and 73, they are always on. As a result, the pMOS transistor 71 is turned on and the pMOS transistor 70 is turned off. For this reason, a voltage equal to the voltage of the nodes ⁇ and G connected to the source of the pMOS transistor 71 is output to the output terminal. Therefore, the voltage of Vcc to Vcc + ⁇ is applied to the gates of the pMOS transistors 56 and 66 according to the voltage change of the nodes E and G.
- Vss voltage applied to the input terminals of the level shifters 54 and 64 becomes low level (Vss)
- the n MOS transistors 73 and 74 are turned on and the nMOS transistor 72 is turned off. Since a high level voltage is applied to the source of the nMOS transistor 72 by the inverter 75, almost no current flows through the nMOS transistor 72. As a result, the pMOS transistor 70 is turned on and the pMOS transistor 71 is turned off. For this reason, the output terminal is at a low level. Therefore, a low level voltage (Vss) is applied to the gates of the pMOS transistors 56 and 66.
- Vss low level voltage
- the booster circuit having such a configuration, the power supply voltage is low! In some cases, a desired boosted voltage can be obtained by boosting using the booster circuit.
- the second embodiment is an example in which a diode is added between the output node of the regulation circuit and the charge pump circuit.
- Other configurations are the same as those of the first embodiment, and the description is omitted.
- the Vth of a diode may vary from wafer to wafer due to fluctuations in the manufacturing process. Therefore, in Example 1, assuming that Vth of the diode 24 is 0.7 V and regulating the node C to 5.7 V, the desired potential (5.0 V) cannot be obtained at the node A. is there. For example, if the Vth of diode 24 is 0.6V after wafer manufacture, The position is 5. IV, which is slightly different from the desired potential. Thus, in the second embodiment, an accurate potential is generated by the node A.
- FIG. 11 is a circuit diagram showing the charge pump circuit 30 and the regulation circuit 40a.
- the configuration of the charge pump circuit 30 is the same as that of FIG.
- Regulation circuit 40a is connected to node C (charge pump output node) via diode 48 (second diode).
- the anode is connected to the node C side and the force sword is connected to the regulation circuit 40a side.
- the diode 48 has a structure in which transistors are diode-connected, that is, a structure in which one source Z drain terminal and a gate terminal are short-circuited, and has the same structure and dimensions as the diode 24 in FIG.
- the regulation circuit 40a is not connected to the nMOS transistor 41 with respect to the regulation circuit of FIG. Other configurations are the same as those in FIG.
- a node between the diode 48 and the regulation circuit 40a is a node C ′.
- FIG. Figures 12 (A) and 12 (B) show the voltages at nodes A, C, and C 'when the forward threshold voltage Vth of diode 24 and diode 48 is 0.7V and 0.6V, respectively. Is shown.
- FIG. 12 (A) when the ATD signal goes high ((a) in the figure), regulation circuit 40a sets the node to 5.0V (this is the same voltage that node A should hold) Control to hold on.
- threshold voltage Vth of diode 24 and diode 48 becomes 0.6V
- node C is held at 5.6V
- node A is kept at 5.0V. Retained.
- the node C (charge pump output node) is connected between the charge pump circuit 30 and the diode 24 (first diode), and the node C is connected to the predetermined voltage (second predetermined voltage). ) Holds a regulation circuit 40a. As a result, the node C can be held at a predetermined voltage (for example, 5.7 V).
- Regulation circuit 40a is connected to node C via diode 48 (second diode). It continues. As a result, the node C can be held at a voltage obtained by adding the threshold voltage of the diode 48 to the voltage of the node C ′.
- Regulation circuit 40a holds node C 'at substantially the same voltage (5. OV) as node A. As a result, even when the threshold voltage of the diode 24 changes due to fluctuations in the manufacturing process, the voltage at the node A can be maintained at substantially the same voltage as the voltage at the node. Therefore, the voltage fluctuation of the node A can be further suppressed.
- the description of the first and second embodiments relates to the boosting of word lines.
- the present invention can also be applied to boosting lines other than word lines.
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Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
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JP2006531754A JP4895815B2 (ja) | 2004-08-30 | 2005-08-12 | 半導体装置及びワード線昇圧方法 |
EP05780210A EP1801811A1 (en) | 2004-08-30 | 2005-08-12 | Semiconductor device and word line boosting method |
US11/214,633 US20060077745A1 (en) | 2004-08-30 | 2005-08-30 | Semiconductor device and method for boosting word line |
US11/502,957 US7525853B2 (en) | 2005-08-12 | 2006-08-11 | Semiconductor device and method for boosting word line |
US12/406,845 US7791961B2 (en) | 2005-08-12 | 2009-03-18 | Semiconductor device and method for boosting word line |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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PCT/JP2004/012473 WO2006025081A1 (ja) | 2004-08-30 | 2004-08-30 | 半導体装置及びワード線昇圧方法 |
JPPCT/JP2004/012473 | 2004-08-30 |
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PCT/JP2004/012473 Continuation-In-Part WO2006025081A1 (ja) | 2004-08-30 | 2004-08-30 | 半導体装置及びワード線昇圧方法 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
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US11/214,633 Continuation US20060077745A1 (en) | 2004-08-30 | 2005-08-30 | Semiconductor device and method for boosting word line |
US11/502,957 Continuation-In-Part US7525853B2 (en) | 2005-08-12 | 2006-08-11 | Semiconductor device and method for boosting word line |
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WO2006025208A1 true WO2006025208A1 (ja) | 2006-03-09 |
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PCT/JP2004/012473 WO2006025081A1 (ja) | 2004-08-30 | 2004-08-30 | 半導体装置及びワード線昇圧方法 |
PCT/JP2005/014812 WO2006025208A1 (ja) | 2004-08-30 | 2005-08-12 | 半導体装置及びワード線昇圧方法 |
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PCT/JP2004/012473 WO2006025081A1 (ja) | 2004-08-30 | 2004-08-30 | 半導体装置及びワード線昇圧方法 |
Country Status (4)
Country | Link |
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US (1) | US20060077745A1 (ja) |
EP (1) | EP1801811A1 (ja) |
KR (1) | KR20070089781A (ja) |
WO (2) | WO2006025081A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012226805A (ja) * | 2011-04-20 | 2012-11-15 | Lapis Semiconductor Co Ltd | 半導体メモリの内部電源電圧生成回路及び内部電源電圧生成方法 |
JP2014191846A (ja) * | 2013-03-27 | 2014-10-06 | Semiconductor Energy Lab Co Ltd | 半導体装置、電子機器、半導体装置の駆動方法 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
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US8392594B2 (en) | 2007-01-30 | 2013-03-05 | Sony Corporation | System and method for effectively providing content to client devices in an electronic network |
US20080012627A1 (en) * | 2006-07-13 | 2008-01-17 | Yosuke Kato | System and method for low voltage booster circuits |
US7447085B2 (en) * | 2006-08-15 | 2008-11-04 | Micron Technology, Inc. | Multilevel driver |
US7852699B2 (en) * | 2007-10-04 | 2010-12-14 | Macronix International Co., Ltd. | Power saving method and circuit thereof for a semiconductor memory |
US8164964B2 (en) * | 2009-09-16 | 2012-04-24 | Arm Limited | Boosting voltage levels applied to an access control line when accessing storage cells in a memory |
JP5702175B2 (ja) * | 2011-02-02 | 2015-04-15 | ラピスセミコンダクタ株式会社 | メモリ装置 |
KR101169354B1 (ko) | 2011-08-17 | 2012-07-30 | 테세라, 인코포레이티드 | 반도체 패키징을 위한 전력 증폭 회로 |
CN104051015B (zh) * | 2013-03-14 | 2017-10-03 | 旺宏电子股份有限公司 | 具有存储器的集成电路及其操作方法 |
US11509214B2 (en) * | 2018-04-26 | 2022-11-22 | Micron Technology, Inc. | Apparatuses and methods for controlling charge pump circuits |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0581859A (ja) * | 1991-09-25 | 1993-04-02 | Mitsubishi Electric Corp | 半導体集積回路装置 |
JPH0628876A (ja) * | 1992-07-10 | 1994-02-04 | Fujitsu Ltd | 不揮発性半導体記憶装置 |
JPH0714394A (ja) * | 1993-04-30 | 1995-01-17 | Toshiba Corp | 半導体装置の内部電源回路 |
JPH0974738A (ja) * | 1995-09-01 | 1997-03-18 | Hitachi Ltd | 半導体装置 |
JPH11306778A (ja) * | 1998-04-16 | 1999-11-05 | Lg Semicon Co Ltd | 電圧調整回路 |
JP2004079036A (ja) * | 2002-08-12 | 2004-03-11 | Fujitsu Ltd | 電圧制御回路及び半導体記憶装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3753898B2 (ja) * | 1999-07-19 | 2006-03-08 | 富士通株式会社 | 半導体記憶装置の昇圧回路 |
JP2003233996A (ja) * | 2002-02-08 | 2003-08-22 | Mitsubishi Electric Corp | 半導体記憶装置 |
JP3566950B2 (ja) * | 2002-02-20 | 2004-09-15 | ローム株式会社 | 昇圧回路を備えた半導体装置 |
-
2004
- 2004-08-30 WO PCT/JP2004/012473 patent/WO2006025081A1/ja active Application Filing
-
2005
- 2005-08-12 WO PCT/JP2005/014812 patent/WO2006025208A1/ja active Application Filing
- 2005-08-12 KR KR1020077005055A patent/KR20070089781A/ko not_active Application Discontinuation
- 2005-08-12 EP EP05780210A patent/EP1801811A1/en not_active Withdrawn
- 2005-08-30 US US11/214,633 patent/US20060077745A1/en not_active Abandoned
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0581859A (ja) * | 1991-09-25 | 1993-04-02 | Mitsubishi Electric Corp | 半導体集積回路装置 |
JPH0628876A (ja) * | 1992-07-10 | 1994-02-04 | Fujitsu Ltd | 不揮発性半導体記憶装置 |
JPH0714394A (ja) * | 1993-04-30 | 1995-01-17 | Toshiba Corp | 半導体装置の内部電源回路 |
JPH0974738A (ja) * | 1995-09-01 | 1997-03-18 | Hitachi Ltd | 半導体装置 |
JPH11306778A (ja) * | 1998-04-16 | 1999-11-05 | Lg Semicon Co Ltd | 電圧調整回路 |
JP2004079036A (ja) * | 2002-08-12 | 2004-03-11 | Fujitsu Ltd | 電圧制御回路及び半導体記憶装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012226805A (ja) * | 2011-04-20 | 2012-11-15 | Lapis Semiconductor Co Ltd | 半導体メモリの内部電源電圧生成回路及び内部電源電圧生成方法 |
JP2014191846A (ja) * | 2013-03-27 | 2014-10-06 | Semiconductor Energy Lab Co Ltd | 半導体装置、電子機器、半導体装置の駆動方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20070089781A (ko) | 2007-09-03 |
WO2006025081A1 (ja) | 2006-03-09 |
US20060077745A1 (en) | 2006-04-13 |
EP1801811A1 (en) | 2007-06-27 |
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