WO2003014833A8 - Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen - Google Patents

Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen

Info

Publication number
WO2003014833A8
WO2003014833A8 PCT/EP2002/008193 EP0208193W WO03014833A8 WO 2003014833 A8 WO2003014833 A8 WO 2003014833A8 EP 0208193 W EP0208193 W EP 0208193W WO 03014833 A8 WO03014833 A8 WO 03014833A8
Authority
WO
WIPO (PCT)
Prior art keywords
collector
fastening
mirror shells
coordinates
rotationally symmetrical
Prior art date
Application number
PCT/EP2002/008193
Other languages
English (en)
French (fr)
Other versions
WO2003014833A3 (de
WO2003014833A2 (de
Inventor
Wolfgang Singer
Wilhelm Egle
Markus Weiss
Joachim Hainz
Joachim Wietzorrek
Johannes Wangler
Frank Melzer
Original Assignee
Zeiss Carl Semiconductor Mfg
Wolfgang Singer
Wilhelm Egle
Markus Weiss
Joachim Hainz
Joachim Wietzorrek
Johannes Wangler
Frank Melzer
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10138313A external-priority patent/DE10138313A1/de
Application filed by Zeiss Carl Semiconductor Mfg, Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Joachim Wietzorrek, Johannes Wangler, Frank Melzer filed Critical Zeiss Carl Semiconductor Mfg
Priority to EP02758381A priority Critical patent/EP1415199A2/de
Priority to AU2002325359A priority patent/AU2002325359A1/en
Publication of WO2003014833A2 publication Critical patent/WO2003014833A2/de
Publication of WO2003014833A8 publication Critical patent/WO2003014833A8/de
Publication of WO2003014833A3 publication Critical patent/WO2003014833A3/de
Priority to US10/775,037 priority patent/US7091505B2/en
Priority to US11/416,447 priority patent/US7321126B2/en
Priority to US11/974,718 priority patent/US20080042079A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/006—Systems in which light light is reflected on a plurality of parallel surfaces, e.g. louvre mirrors, total internal reflection [TIR] lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G02B19/0023—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors) at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)

Abstract

Die Erfindung betrifft einen Kollektor für eine Projektionsbelichtungsanlage, die in einem Scan-Modus entlang einer Scanrichtung mit einer Wellenlänge ≤ 193 nm, bevorzugt ≤ 126 nm, besonders bevorzugt EUV-Wellenlängen betrieben wird, wobei der Kollektor Licht einer Lichtquelle objektseitig aufnimmt und einen Bereich in einer bildseitigen Ebene, die von einem lokalen Koordinatensystem aufgespannt wird, wobei die y-Richtung des lokalen Koordinatensystems parallel zur Scanrichtung und die x-Richtung senkrecht zur Scanrichtung ist, ausleuchtet, wobei der Kollektor aufweist: eine Vielzahl von rotationssymmetrischen Spiegelschalen, umfassend jeweils wenigstens ein erstes Spiegelsegment, umfassend eine erste optische Fläche, wobei die Spiegelschalen um eine gemeinsame Rotationsachse ineinander angeordnet sind; Befestigungseinrichtungen zum Befestigen der Vielzahl von rotationssymmetrischen Spiegelschalen, und die Befestigungseinrichtungen Stützspeichen aufweisen, die sich in radialer Richtung der rotationssymmetrischen Spiegelschalen erstrecken. Die Erfindung ist dadurch gekennzeichnet, dass die Stützspeichen derart angeordnet sind, dass, wenn sie in die bildseitige auszuleuchtende Ebene projiziert werden, gegenüber der y-Richtung des lokalen Koordinatensystems in der bildseitigen Ebene geneigt sind.
PCT/EP2002/008193 2001-08-10 2002-07-23 Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen WO2003014833A2 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP02758381A EP1415199A2 (de) 2001-08-10 2002-07-23 Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen
AU2002325359A AU2002325359A1 (en) 2001-08-10 2002-07-23 Collector with fastening devices for fastening mirror shells
US10/775,037 US7091505B2 (en) 2001-08-10 2004-02-09 Collector with fastening devices for fastening mirror shells
US11/416,447 US7321126B2 (en) 2001-08-10 2006-05-02 Collector with fastening devices for fastening mirror shells
US11/974,718 US20080042079A1 (en) 2001-08-10 2007-10-16 Collector with fastening devices for fastening mirror shells

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE10138313A DE10138313A1 (de) 2001-01-23 2001-08-10 Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
DE10138313.4 2001-08-10
PCT/EP2002/000608 WO2002065482A2 (de) 2001-01-23 2002-01-23 KOLLEKTOR MIT UNGENUTZTEM BEREICH FÜR BELEUCHTUNGSSYSTEME MIT EINER WELLENLÄNGE ≤ 193 nm
EPPCT/EP02/00608 2002-01-23

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/775,037 Continuation-In-Part US7091505B2 (en) 2001-08-10 2004-02-09 Collector with fastening devices for fastening mirror shells

Publications (3)

Publication Number Publication Date
WO2003014833A2 WO2003014833A2 (de) 2003-02-20
WO2003014833A8 true WO2003014833A8 (de) 2003-09-04
WO2003014833A3 WO2003014833A3 (de) 2003-11-13

Family

ID=33393732

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/008193 WO2003014833A2 (de) 2001-08-10 2002-07-23 Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen

Country Status (3)

Country Link
US (3) US7091505B2 (de)
AU (1) AU2002325359A1 (de)
WO (1) WO2003014833A2 (de)

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Also Published As

Publication number Publication date
US20080042079A1 (en) 2008-02-21
WO2003014833A3 (de) 2003-11-13
US7091505B2 (en) 2006-08-15
US20040227103A1 (en) 2004-11-18
US7321126B2 (en) 2008-01-22
WO2003014833A2 (de) 2003-02-20
AU2002325359A1 (en) 2003-02-24
US20060291062A1 (en) 2006-12-28

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