USD827592S1 - Electrode cover for a plasma processing apparatus - Google Patents
Electrode cover for a plasma processing apparatus Download PDFInfo
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- USD827592S1 USD827592S1 US29/610,995 US201729610995F USD827592S US D827592 S1 USD827592 S1 US D827592S1 US 201729610995 F US201729610995 F US 201729610995F US D827592 S USD827592 S US D827592S
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- processing apparatus
- plasma processing
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This application contains subject matter related to the following co-pending U.S. design patent applications:
Application Ser. No. 29/610,996, filed herewith and entitled “Electrode Cover for a Plasma Processing Apparatus”;
Application Ser. No. 29/610,998, filed herewith and entitled “Ring for a Plasma Processing Apparatus”;
Application Ser. No. 29/610,999, filed herewith and entitled “Cover Ring for a Plasma Processing Apparatus”; and
Application Ser. No. 29/611,001, filed herewith and entitled “Discharge Chamber for a Plasma Processing Apparatus”.
The box labeled FIG. 10 in FIG. 9 is shown in broken lines and forms no part of the claimed design.
Claims (1)
- The ornamental design for an electrode cover for a plasma processing apparatus, as shown and described.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2017-001752 | 2017-01-31 | ||
JPD2017-1752F JP1584241S (en) | 2017-01-31 | 2017-01-31 |
Publications (1)
Publication Number | Publication Date |
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USD827592S1 true USD827592S1 (en) | 2018-09-04 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US29/610,995 Active USD827592S1 (en) | 2017-01-31 | 2017-07-18 | Electrode cover for a plasma processing apparatus |
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US (1) | USD827592S1 (en) |
JP (1) | JP1584241S (en) |
TW (1) | TWD186394S (en) |
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Also Published As
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JP1584241S (en) | 2017-08-21 |
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