US6760095B2 - EUV condenser with non-imaging optics - Google Patents
EUV condenser with non-imaging optics Download PDFInfo
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- US6760095B2 US6760095B2 US10/359,722 US35972203A US6760095B2 US 6760095 B2 US6760095 B2 US 6760095B2 US 35972203 A US35972203 A US 35972203A US 6760095 B2 US6760095 B2 US 6760095B2
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
Definitions
- the preset invention relates generally to a condenser and illumination systems for projecting the image of a reticle onto a photosensitive substrate as used in photolithography in semiconductor manufacturing, and more particularly to a condense suitable for use in the extreme ultraviolet or soft X-ray wavelengths having non-imaging optics forming a desired radiance and desired angular distribution.
- Photolithography is often used in the manufacture of many devices and in particular, electronic or semiconductor devices.
- the image of a reticle or mask is projected onto a photosensitive substrate.
- the element or feature size desired to be imaged on the photosensitive substrate becomes ever smaller, technical problems often arise.
- One of these problems is illuminating the reticle or mask so that its image can be projected onto the photosensitive substrate.
- the element or feature size of semiconductor devices become ever smaller, there is a need for photolithographic systems providing a resolution of less than 0.13 micrometers. In order to achieve the imaging of these relatively small element or feature sizes, shorter wavelengths of electromagnetic radiation must be used to project the image of a reticle or mask onto the photosensitive substrate.
- an illumination system for illuminating an object in an actuate pattern having a reflecting mirror with a parabolic-toxic body of rotation in the reflection type optical integrator having a reflecting surface for effecting the critical illumination in the meridional direction and a reflecting surface for effecting the Kohler illumination in the sagittal direction.
- Another illuminating system is disclosed in U.S. Pat. No. 5,512,759 entitled “Condenser For Illuminating A Ring Field Camera With Synchrotron Emission Light” issuing to Sweatt on Apr. 30, 1996, which is herein incorporated by reference in its entirety.
- a condenser comprising concave and convex spherical mirrors that collect the light beams, flat mirrors that converge and direct the light beams into a real entrance pupil of a camera, and a spherical mirror for imaging the real entrance pupil through the resistive mask and into the virtual entrance pupil of the camera.
- the present invention is directed to an illumination system comprising a condenser having non-imaging optic elements.
- a first non-imaging optic element is used to collect light from a source and create a desired or predetermined radiance distribution.
- a second non imaging optic element receives electromagnetic radiation from the first non-imaging optic element and redirects the electromagnetic radiation into collimated nearly spherical or flat wavefronts. Facets placed at the pupil of the illumination system shapes the electromagnetic radiation and provides uniform illumination over a desired area. The facets may be provided on the second non-imaging optic element. Additional objective optics may be utilized to further process the electromagnetic radiation or to relay the electromagnetic radiation to the desired area at a reticle or mask, the image of which is projected onto a photosensitive substrate.
- FIG. 1 schematically illustrates the illumination system of the present invention.
- FIG. 2 schematically illustrates optical element 18 illustrated in FIG. 1 .
- FIG. 3 schematically illustrates the illumination system illustrated in FIG. 1 in combination with a projection optic.
- FIG. 4A schematically illustrates an embodiment of the non-imaging optic element used to form a desired radiance distribution.
- FIG. 4B is a plan view graphically illustrating the desired radiance distribution formed by the non-imaging optic element illustrated in FIG. 4 A.
- FIG. 5A schematically illustrates an embodiment of the non-imaging optic element in the shape of an axicon used to redirect the electromagnetic radiation into collimated nearly spherical or flat wave fronts and an illumination field or area having a desired shape.
- FIG. 5B is a plan view graphically illustrating the desired radiance and angular distribution having a desired arcuate illumination field or area formed by the non-imaging optic element illustrated in FIG. 5 A.
- FIG. 5C schematically illustrates an embodiment of the non-imaging optic element having a shape used to redirect the electromagnetic, radiation into collimated nearly spherical or flat wave fronts and an illumination field or area having a desired shape.
- FIG. 5D is an elevational view graphically illustrating a non-imaging optical element having an odd asphere shaped base surface and Fresnel facets.
- FIG. 5E is a perspective view graphically illustrating the desired radiance and angular distribution having a desired rectangular illumination field or area formed by a non-imaging optic element.
- FIG. 6 graphically illustrates parameters utilized in calculating reflective surfaces of the non-imaging optic elements.
- FIG. 7A is a plan view illustrating a desired radiance and angular distribution used in photolithography, and referred to as quadrupole.
- FIG. 7B is a plan view illustrating a desired radiance and angular distribution used in photolithography, and referred to as uniform.
- FIG. 1 schematically illustrates the illumination system 10 of the present invention utilizing non-imaging optics.
- An extreme ultrawide, radiation, EUV, source 12 which may be a laser plasma source, a capillary discharge tube or synchrotron, provides electromagnetic radiation in the extreme ultraviolet to a non-imaging optic element 14 .
- the collector or first non-imaging optic element 14 collects the electromagnetic radiation from the source and creates a desired or predetermined radiance distribution in the pupil of the illumination system 10 .
- the radiance distribution may be uniform, annular, quadruple or other known or desired radiance distribution.
- Various radiance distributions have known desirable properties for imaging different patterns onto a photosensitive substrate.
- Coatings having a graded thickness profile may be place on the first non-Imaging optic element 14 to improve reflectivity.
- the electromagnetic radiation reflected from the first non-imaging optic element 14 is collected by a shaper or second non-imaging optic element 18 .
- the pupil of the illumination system 10 is located near or adjacent the second non-imaging optic element 18 .
- Entering rays 16 are reflected from the second non-imaging optic element 18 and exit as emerging rays 20 .
- the non-imaging optic element 18 redirects and collimates the electromagnetic radiation, illustrated as rays 20 , into nearly spherical or flat wavefronts. This allows the use of conventional optical surfaces to be used in the remainder of the illumination system 10 .
- the second non-imaging optic element 18 may have a plurality of facets placed thereon providing uniform illumination over a desired area or illumination field. The facets are placed at the pupil, adjacent the second non-imaging optic element 18 , of the illumination system 10 . Electromagnetic radiation, illustrated by rays 20 , is reflected from the second non-imaging optic element 18 and received by a conventional optical element 22 .
- Electromagnetic radiation is reflected from optical element 22 , illustrated by rays 24 , and received by a second conventional optical element 26 , which in turn is reflected as rays 28 to illuminate a reticle 30 .
- the optical elements 22 and 26 may be conventional objective optical elements.
- optical element 22 may correct for coma and be relatively flat.
- Optical element 26 may be an oblate spheroid.
- the optical elements 22 and 26 are preferably anamorphic aspheres and are designed to image light reflected or scattered by the second non-imaging optical element 18 onto a reticle and into the entrance pupil of projection optics. The anamorphic departures are used to maintain a constant round pupil across a reticle.
- Optical elements 22 and 26 may relay or image illumination to the entrance pupil of the projection optics.
- This illumination fills the pupil with a predetermined radiance and angular distribution, which is referred to as pupil fill
- the present invention permits the pupil fill to be modified as desired to enhance the imaging of a pattern on a reticle.
- desirable pupil fills are well known, or can be determined relatively easily with a test reticle.
- Pupil fill or angular distribution may be more precisely identified by the radiometric term radiant intensity, which is commonly expressed in Watts per steradian. Lithographers often use pupil fill to describe this quantity. However, confusion can arise because the radiance distribution at the pupil is sometimes also called the pupil fill. It is important to realize that the radiant intensity looking back from the reticle or mask from each field point will not necessarily be the same as the radiance in the pupil. An example is if radiance distribution were uniform, but the right half of the reticle or mask had a radiant intensity which was the right half of a circle and the left half of the mask had a radiant intensity which was the left half of a circle.
- the present invention makes possible the illumination of a desired area on a reticle or mask, such as an arcuate, rectangle, or other shaped area.
- the present invention also provides a desired radiance distribution, with a uniform radiance distribution usually desired, but may provide for a different profile or radiance distribution if desired.
- the present invention also provides an illuminated region that is effectively self-luminous. Additionally, each point in the illumination region is illuminated by the same desired angular spectrum, whether it is uniform, annular, quadrupole, or other desired distribution.
- the present invention also provides that the exit pupil for each point in the illumination region is in the same location to prevent telecentricity errors.
- the first non-imaging optic element 14 collects electromagnetic radiation from the source 12 .
- the combination of the first and second non-imaging optic elements 14 and 18 forms the desired radiance distribution at the illumination system 10 or condenser pupil and forms an image of the source 12 .
- the second non-imaging optic element 18 functioning as a beam shaper.
- the beam shaper located at the pupil of the illumination system 10 or condenser scatters the incident radiation so that the image of the source fills the desired region of the reticle or mask 30 .
- Each point of the reticle or mask 30 receives light or electromagnetic radiation from a large number of discrete points in the pupil. The discrete points may number in the millions depending upon the size of the facets 34 on the second non-imaging optic element 18 .
- the pupil fill is more uniform than can be obtained using conventional segmented optics.
- Conventional optical elements limits the condenser to fill with only tens of points or lines in the pupil.
- the improved pupil fill, of the present invention is achieved by manufacturing the second non-imaging optic element 18 with many individual facets using lithography and a gray scale mask.
- the illumination system or condenser is effectively a critical condenser with a non-imaging optic element 18 or beam shaper at the stop to distribute the photons in a desired fashion across the reticle or mask 30 .
- the stop is at the second non-imaging optic element 18 , which serves simultaneously as a beam shaper and to re-image the source at infinity. Combining these two functions on the second non-imaging optic element 18 reduces the number of optics in the illumination system and improves system throughput.
- FIG. 2 more clearly illustrates the second non-imaging optic element 18
- facets 34 are formed on the base surface 32 of base 32 It should be appreciated that the facets 34 have been greatly exaggerated in size and tilt for illustrative purposes.
- the facets 34 are shaped and tilted such that the angular spectrum reflected from the non-imaging optic element 18 forms the predetermined or desired shape or illumination field at the reticle or mask when imaged by the optical elements 22 and 26 , illustrated in FIG. 1 .
- Facets 34 are chosen so that the angular spectrum produces an arcuate region when imaged. Diffraction from the facets will increase the étendue. Facets 34 should be small enough to provide reticle plane uniformity, and large enough to minimize edge scattering.
- a one hundred and twenty millimeter diameter or dimension non-imaging optical element may have ten micrometer dimension facets. This provides good uniform illumination and pupil fill.
- the facets may be reduced in size to at least four micrometers.
- the facets 34 may preferably form a Fresnel surface.
- the beam shaper or second non-imaging optical element 18 receives electromagnetic radiation or light from the collector or first non-imaging optical element 14 and redirects it over the desired illumination field.
- this can be divided into two separate tasks: reimaging of the source 12 which is accomplished by the base surface 32 and blurring the source image over the illumination field which is accomplished by engineering a scattering surface composed of many small facets 34 .
- the combination of the collector or first non-imaging optical element 14 and the beam shaper or second non-imaging optical element 18 surfaces reimages the source, at finite or infinite conjugates.
- the shaper base surface 32 is determined by 1) solving the differential equations that define the collector or first non-imaging optical element 14 , 2) calculating the angle of incidence of the rays ⁇ at the beam shaper surface, and 3) calculating the slope of the shaper surface necessary to redirect the incident radiation towards a finite or an infinite conjugate.
- the slopes of the shaper surface may be integrated to give the surface profile or the slopes may be directly integrated into the ray tracing software.
- the base beam shaper surface can be polished conventionally and the scattering function applied on the base surface. However, the preferred implementation is to manufacture a Fresnel surface using the same small, preferably four to ten micron square facets, that are required for the scattering.
- each base facet tilt redirects the chief ray for that facet (i.e. one that starts at the center of the source to and goes to the center of said facet) to the image of the source.
- the Fresnel facet tilt is added to that scattering tilt, as described below.
- the pupil i.e. the beam shaper surface
- the pupil is divided into many small facets.
- Each facet directs light to a different portion of the illumination field.
- This engineered scattering surface allows the illumination of arbitrarily shaped regions.
- each point in the illumination field can receive light from thousands or millions of points distributed randomly over the pupil.
- the random distribution in the pupil ensures the angular distribution of the radiation or radiant intensity at each point on the reticle is substantially the same.
- the deviation of each facet from the base surface is determined by focal length of the remaining conventional optical surfaces and the paraxial imaging equation.
- the illumination system 10 of the present invention illuminates a reticle with an image of a predetermined illumination field or area having desired radiance and a desired angular distribution. This illumination is desirable for photolithographic applications. Additionally, the illumination system 10 of the present invention increases the étendue of the electromagnetic radiation source by evenly distributing the available power across the illumination field or arcuate area.
- the étendue of an optical system is a geometrical quantity related to the cross sectional area of the source and the angular subtents collected by the aperture.
- Laser plasma and capillary discharge sources are generally small, less than approximately one millimeter. Synchrotrons have small angular extends, which must be taken into account in the design process.
- the present invention achieves a desired illumination pattern, a desired angular distribution, and high efficiency, all in a compact package.
- the present invention is preferably applicable to irradiate a portion of a ring field or arcuate region of a projection optic with extreme ultraviolet electromagnetic radiation.
- One such projection optic system is disclosed in U.S. Pat. No. 5,815,310 entitled “High Numerical Aperture Ring Field Optical Reduction System” issuing to Williamson on Sep. 29, 1998, which is herein incorporated by reference in its entirety.
- a relatively small source 12 such as a laser plasma source or a capillary discharge tube emits electromagnetic radiation with the desired wavelength in the extreme ultraviolet region.
- the collector or first non-imaging optic element collects the energy or electromagnetic radiation and forms a desired radiance distribution provided to the shaper or second non-imaging optic 18 .
- the non-imaging surfaces of the non-imaging optic elements are the solution to differential equations. These differential equations are well known to those skilled in the art and are disclosed in a book entitled “Computer Aided Optical Design of Illumination an Irradiating Devices” by Kusch, and published by Asian Publishing House, Moscow, 1993.
- non-imaging optic elements are readily designed for point sources with rotationally symmetric angular intensity and rotationally symmetric pupil fills.
- more general equations may be used.
- Such equations are well known to those skilled in the are and may be found in an article entitled “Formulation of a Reflector Design Problem for a Lighting Fixture” by J. S. Schruben published in the Journal of the Optical Society of America, Vol. 62, No. 12, December 1972 and in an article entitled “Tailored Reflectors for Illumination” by D. Jenkins and R. Winston published in Applied Optics, Vol. 35, No. 10, April 1996.
- the reflectivity of the coatings and the angular intensity distribution of the source are both taken into account when designing the non-imaging optic surfaces.
- the base surface of second non-imaging optic element 18 is non-imaging and collimates electromagnetic radiation from the first non-imaging optic element 14 so as to be reflected by the second non-imaging optic element 18 in a parallel bundle.
- On the surface 32 of the second non-imaging optic element 18 is formed an array of facets shaped and tilted such that the angular spectrum reflected from the second non imaging optic element 18 forms the desired shape at the reticle or mask when imaged by the remaining conventional optics 22 and 26 of the present invention.
- the second non-imaging optical element 18 may be fabricated using lithographic techniques.
- FIG. 3 illustrates the extreme ultraviolet illumination system 10 , as illustrated in FIGS. 1 and 2, in combination with an extreme ultraviolet projection optic 36 , such as that disclosed in U.S. Pat. No. 5,815,310.
- Illumination system 10 provides a desired radiance and a desired angular distribution in a predetermined illumination field, such as a portion of a ring field or arc, for illuminating the reticle 30 .
- Reticle 30 is a reflective reticle. As a result, the electromagnetic radiation strikes the reticle 30 slightly off axis with respect to a line normal to the reticle 30 .
- the electromagnetic radiation is collected and reflected by a first mirror 38 , which is collected and reflected by a second mirror 40 , which is collected and reflected by a third mirror 42 , which is collected and reflected by a fourth mirror 44 , which is collected and reflected by a fifth mirror 46 , which is collected and reflected by a sixth mirror 48 , which projects the image of the reticle onto a photosensitive substrate 50 .
- Sufficient clearance is provided between the EUV illumination system 10 and the projection optic 36 to permit the reticle 30 and the photosensitive substrate 50 to be scanned in a parallel direction such that- the illumination field projects the image of the reticle over a predetermined area of the photosensitive substrate.
- the reticle 30 and the photosensitive substrate 50 are positioned for parallel scanning.
- All of the optical elements are positioned to not interfere with any needed stages for the movement of the reticle 30 and photosensitive substrate 50 . Accordingly, the entire system, illumination system 10 and projection optic 50 , are preferably positioned entirely between the reticle 30 and the substrate 50 .
- FIG. 4A schematically illustrates the profile of a collector or first non-imaging optical element 214 .
- the collector or first non-imaging optical element 214 may be axially symmetrical.
- the collector or non-imaging optic element 214 has a curved reflective surface 215 .
- the curved reflective surface 215 is calculated or determined based upon the desired radiance distribution at the pupil.
- a relatively small EUV source 212 is positioned near the origin of the non-imaging optical element 214 .
- the electromagnetic radiation from the source 212 is collected and reflected by the first non-imaging optical element 214 .
- the reflected electromagnetic radiation forms a desired radiance distribution.
- FIG. 4B graphically illustrates one such radiance distribution.
- An annular radiance distribution 52 is illustrated.
- the annular radiance distribution 52 is characterized by a surrounding dark field 54 with a contained annular illumination 56 and dark center 58 . While an annular radiance distribution 52 has been illustrated, any desired radiance distribution may be obtained depending upon the calculated profile or shape of surface 215 of the non-imaging optical element 214 . For example, top hat, quadrupole, uniform or other known desired radiance distribution.
- FIG. 5A illustrates a shaper or second non-imaging optical element 218 .
- the second non-imaging optical element 218 is another embodiment of the second non-imaging optical element 18 illustrated in FIGS. 1 and 2.
- the second non-imaging optic element, 218 is formed on a substrate or base 231 .
- the base 231 has a surface 232 .
- the surface 232 may have a shape of a Fresnel axicon.
- FIG. 5A illustrates the second non-imaging optic element 218 as a conical section, the conical surface of an axicon may be placed on a conventional round lens for mounting. While FIG.
- the second non-imaging optical element 218 may have other shapes depending upon the source and desired radiance or angular distribution. For example, if angular distribution of the source arid the pupil fill is rotationally symmetric, the second non-imaging optic element has a shape of an odd-asphere. When there is no rotational symmetry, the second non-imaging optic element will have an unusual shape. The unusual shape is determined to provide the function of collimating the rays.
- the surface 232 has a plurality of reflective angled or tilted facets 234 thereon.
- the surface 232 in combination with the plurality of facets 234 shape or redirect the electromagnetic radiation collimating it and forming spherical or flat wavefronts having a uniform illumination over a desired illumination area or field.
- the second non-imaging optical element 218 may have a relatively large number of reflective facets 234 , with each facet 234 having a dimension of approximately ten to four micrometers. While ten to four micrometers is the most useful range of facet sizes, smaller and larger facets would also work.
- the angle or tilt of each facet 234 is calculated to provide an arcuate illumination area or field with uniform illumination and the desired radiance distribution.
- the facets 234 may be made by etching or other photolithographic techniques.
- the uniform illumination has a desired radiance distribution created by the collector or first non-imaging optical element 14 or 214 illustrated in FIGS. 1, 3 , and 4 A.
- FIG. 5B graphically illustrates a desired illumination area or field having an arcuate shape. Additionally, graphically illustrated is an annular angular distribution 152 .
- the annular angular distribution 152 has a dark field 154 surrounding an annular illumination 156 and dark center 158 . While the annular angular distribution has been graphically illustrated, it will be understood by those skilled in the art that the angular distribution appears annular from any point in the illumination area or field. Therefore, the illumination area or field is uniformly illuminated with annular radiance and angular distribution.
- FIG. 5C is a perspective view illustrating another embodiment of the second non-imaging optical element.
- the non-imaging optical element 318 has a base 331 with a base surface 332 formed thereon.
- the base surface 332 may have an unusual shape.
- the unusual shape is determined to provide the function of collimating the rays.
- Reflective facets 334 are formed on the base surface 332 . The position and tilt of the facets 334 are determined so as to provide a desired illumination over a desired illumination field.
- FIG. 5D is a side elevational view illustrating another embodiment of the second non-imaging optic element.
- the second non-imaging optic element 418 has a base 431 with a base surface 432 having the shape of an odd asphere.
- An axicon is a special case of an odd asphere.
- An odd asphere is non-imaging because it does not image points to points at any conjugates. For this reason, the first non-imaging optic element or collector may also be an odd asphere.
- On base surface 432 are placed facets 434 . The facets are positioned so as to provide a desired illumination over a desired area or illumination field.
- FIG. 5E is a perspective view schematically illustrating a rectangular illumination field 360 .
- the illumination field or area 360 has a desired radiance distribution and desired angular distribution or radiant intensity. Radiance distribution is commonly expressed in Watts per meter squared. It is important to realize that the radiant intensity looking back from the reticle or illumination field to the pupil from each field point, will not necessarily be the same as the radiance distribution in the pupil.
- the illumination field 360 is graphically illustrated with a uniform radiance distribution 352 .
- Several illumination cones 357 are illustrated, but it should be appreciated that the illumination cones 357 as well as the uniform radiance distribution 352 are across the entire illumination field 360 . Accordingly, a desired radiance distribution may be obtained with a desired pupil fill or radiant intensity in any desired shape of illumination field.
- FIG. 6 graphically illustrates the parameters utilized to determine or define the surface of a non-imaging optic element.
- Point 512 represents a source
- line 514 represents a reflector surface
- line 519 represents the illumination plane.
- the non-imaging optic element may be defined by differential equations which relate the angular distribution of the point source to an arbitrary output radiance distribution. By non-imaging it is meant an optical element that does not have a finite number of foci.
- a system of differential equations define the surface.
- the solution suitable for determining the surface of the non-imaging optic element such as that illustrated in FIG. 1 as elements 14 and 18 or 214 , 218 , 318 , and 418 in FIGS.
- E(x) is radiance
- ⁇ is the reflectance
- r is a radial distance between a source and the non-imaging optical element reflective surface
- ⁇ is an angle between the radial distance r and a perpendicular line from an illumination plane extending through the source
- ⁇ is an angle between a perpendicular line from an illumination plane and a ray reflected from the non-imaging optical element reflective surface
- x is the distance along an illumination plane from the intersection of the illumination plane and a perpendicular line extending through the source and a ray reflected from the non-imaging optical element reflective surface
- a reflective surface defined by the above differential equations.
- the reflective surface determined to produce the desired radiance distribution forms the first non-imaging optic element. Accordingly, the image of the source is not formed.
- non-imaging it is meant that the image of the source is not formed by the non-imaging optic element. Therefore, by solving the above differential equations, a reflector or collector can be described by an interpolating function, assuming a point source, which can accommodate any irradiation distribution as long as x( ⁇ ) increases with ⁇ . As can be appreciated from the above equations, the reflectance of the EUV coatings can be utilized to create the desired radiance distribution.
- the second non-imaging optic, element 18 in FIGS. 1 and 3 and elements 218 , 318 , and 418 in FIGS. 5A, 5 C, and 5 D, is used to redirect the incident radiation such that it fills the illumination area or field when imaged by the remaining conventional optical elements.
- FIGS. 7A-B illustrate various radiance distributions desirable for use in photolithography depending upon the dominant characteristics of the intended pattern being reproduced.
- FIG. 7A graphically illustrates a quadrupole radiance distribution 254 .
- the quadrupole radiance distribution has a dark field 254 and four illumination fields 256 .
- FIG. 7B graphically illustrates a uniform radiance distribution 352 .
- the present invention by using a first non-imaging optic element to provide the desired radiance distribution in combination with a second non-imaging optic element, to provide nearly spherical or flat wavefronts or collimated electromagnetic radiation permits the use of conventional optical surfaces in the remainder of the illumination system. This makes possible a desired radiance having desired angular distribution.
- the use of facets placed at the pupil or stop and preferably on the second non-imaging optic element provides uniform illumination over the desired illumination field. While the facets may be transmissive, they are preferably reflective and placed on the surface of the second non-imaging optic element. Refractive or transmissive elements may unduly attenuate or absorb the EUV electromagnetic radiation.
- the present invention also permits a change in numerical aperture by masking the pupil or changing the first and second non-imaging optical elements. This provides a desired sigma or coherence, ratio of numerical apertures, for the system.
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- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
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Abstract
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Claims (41)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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US10/359,722 US6760095B2 (en) | 1999-01-26 | 2003-02-07 | EUV condenser with non-imaging optics |
US10/877,992 US7046338B2 (en) | 1999-01-26 | 2004-06-29 | EUV condenser with non-imaging optics |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US09/236,888 US6573978B1 (en) | 1999-01-26 | 1999-01-26 | EUV condenser with non-imaging optics |
US10/359,722 US6760095B2 (en) | 1999-01-26 | 2003-02-07 | EUV condenser with non-imaging optics |
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US09/236,888 Continuation US6573978B1 (en) | 1999-01-26 | 1999-01-26 | EUV condenser with non-imaging optics |
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US10/877,992 Continuation US7046338B2 (en) | 1999-01-26 | 2004-06-29 | EUV condenser with non-imaging optics |
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US6760095B2 true US6760095B2 (en) | 2004-07-06 |
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US09/236,888 Expired - Fee Related US6573978B1 (en) | 1999-01-26 | 1999-01-26 | EUV condenser with non-imaging optics |
US10/359,722 Expired - Fee Related US6760095B2 (en) | 1999-01-26 | 2003-02-07 | EUV condenser with non-imaging optics |
US10/877,992 Expired - Fee Related US7046338B2 (en) | 1999-01-26 | 2004-06-29 | EUV condenser with non-imaging optics |
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US09/236,888 Expired - Fee Related US6573978B1 (en) | 1999-01-26 | 1999-01-26 | EUV condenser with non-imaging optics |
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US10/877,992 Expired - Fee Related US7046338B2 (en) | 1999-01-26 | 2004-06-29 | EUV condenser with non-imaging optics |
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US (3) | US6573978B1 (en) |
EP (1) | EP1024408A3 (en) |
JP (1) | JP2000221406A (en) |
KR (1) | KR100586288B1 (en) |
CA (1) | CA2296926A1 (en) |
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DE102022203438B4 (en) | 2022-04-06 | 2023-12-07 | Carl Zeiss Smt Gmbh | Optical arrangement, optical module, optical imaging device and method, method for supporting an optical element, with an actively tiltable optical element |
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DE102022203433A1 (en) | 2022-04-06 | 2023-10-12 | Carl Zeiss Smt Gmbh | CONNECTING COMPONENTS OF AN OPTICAL DEVICE |
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DE102022203745A1 (en) | 2022-04-13 | 2022-09-15 | Carl Zeiss Smt Gmbh | EUV collector for an EUV projection exposure system |
DE102022203758A1 (en) | 2022-04-13 | 2023-10-19 | Carl Zeiss Smt Gmbh | CONNECTING COMPONENTS OF AN OPTICAL DEVICE |
DE102022203881A1 (en) | 2022-04-20 | 2023-04-13 | Carl Zeiss Smt Gmbh | CIRCUIT BOARD FOR AN OPTICAL SYSTEM, OPTICAL SYSTEM, LITHOGRAPHY EQUIPMENT AND METHOD FOR MANUFACTURING A CIRCUIT BOARD FOR AN OPTICAL SYSTEM |
DE102022203999A1 (en) | 2022-04-26 | 2022-07-21 | Carl Zeiss Smt Gmbh | Method for calibrating a diffractive measurement structure, device for calibrating a diffractive measurement structure and lithography system |
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DE102022204580A1 (en) | 2022-05-11 | 2023-04-20 | Carl Zeiss Smt Gmbh | METHOD OF MAKING OR OPERATION OF A MIRROR IN A LITHOGRAPHY PLANT |
DE102022204643A1 (en) | 2022-05-12 | 2023-11-16 | Carl Zeiss Smt Gmbh | OPTICAL SYSTEM, LITHOGRAPHY SYSTEM WITH AN OPTICAL SYSTEM AND METHOD FOR PRODUCING AN OPTICAL SYSTEM |
DE102022205227A1 (en) | 2022-05-25 | 2023-04-27 | Carl Zeiss Smt Gmbh | Optical device, method for determining an actual deformation, method for setting a target deformation and lithography system |
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DE102022205815A1 (en) | 2022-06-08 | 2023-12-14 | Carl Zeiss Smt Gmbh | Component for a projection exposure system for semiconductor lithography and projection exposure system |
DE102022206038A1 (en) | 2022-06-15 | 2023-12-21 | Carl Zeiss Smt Gmbh | Method for compensating actuator effects of actuators |
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DE102022206124A1 (en) | 2022-06-20 | 2023-12-21 | Carl Zeiss Smt Gmbh | DEVICE AND METHOD FOR PROCESSING A SURFACE OF AN OPTICAL ELEMENT OF A LITHOGRAPHY SYSTEM |
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DE102022206198A1 (en) | 2022-06-21 | 2022-09-15 | Carl Zeiss Smt Gmbh | Method and device for qualifying a component of a projection exposure system for semiconductor lithography |
DE102023204960A1 (en) | 2022-06-30 | 2024-01-04 | Carl Zeiss Smt Gmbh | Method for operating a lithography system and lithography system |
DE102022206832A1 (en) | 2022-07-05 | 2024-01-11 | Carl Zeiss Smt Gmbh | METHOD FOR CONTROLLING A POSITION OF AN OPTICAL COMPONENT OF A LITHOGRAPHY SYSTEM |
DE102022116694A1 (en) | 2022-07-05 | 2024-01-11 | Carl Zeiss Smt Gmbh | Method for producing a base body of an optical element, base body and projection exposure system for semiconductor lithography |
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DE102022116693A1 (en) | 2022-07-05 | 2024-01-11 | Carl Zeiss Smt Gmbh | Optical element with vibration-reducing sections of fluid lines and method for producing a base body of an optical element and projection exposure system |
DE102022116699A1 (en) | 2022-07-05 | 2024-01-11 | Carl Zeiss Smt Gmbh | Optical element and projection exposure system for semiconductor lithography |
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DE102022116698B3 (en) | 2022-07-05 | 2023-09-21 | Carl Zeiss Smt Gmbh | Projection exposure system for semiconductor lithography |
DE102022116696A1 (en) | 2022-07-05 | 2024-01-11 | Carl Zeiss Smt Gmbh | Base body for an optical element with a connection geometry and method for producing a base body of an optical element and projection exposure system |
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DE102022207348A1 (en) | 2022-07-19 | 2022-09-15 | Carl Zeiss Smt Gmbh | PROCEDURE AND ADJUSTMENT KIT |
DE102023205175A1 (en) | 2022-07-22 | 2024-01-25 | Carl Zeiss Smt Gmbh | Method for determining an overall center of gravity of a distribution of light intensities |
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DE102022208231B3 (en) | 2022-08-08 | 2023-06-07 | Carl Zeiss Smt Gmbh | CONTROL DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY PLANT |
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DE102022209868A1 (en) | 2022-09-20 | 2024-03-21 | Carl Zeiss Smt Gmbh | OPTICAL ASSEMBLY, OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM |
DE102022209854A1 (en) | 2022-09-20 | 2022-11-17 | Carl Zeiss Smt Gmbh | CONNECTION ARRANGEMENT |
DE102023208854A1 (en) | 2022-09-20 | 2024-03-21 | Carl Zeiss Smt Gmbh | COOLING DEVICE FOR COOLING A POSITION-SENSITIVE COMPONENT OF A LITHOGRAPHY SYSTEM |
DE102022209922A1 (en) | 2022-09-21 | 2023-09-21 | Carl Zeiss Smt Gmbh | REFLECTOMETER DEVICE, MEASURING ARRANGEMENT, METHOD FOR PRODUCING AN OPTICAL REFERENCE ELEMENT AND METHOD FOR MEASURING A SAMPLE OF A LITHOGRAPHY SYSTEM |
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DE102022210037A1 (en) | 2022-09-23 | 2024-03-28 | Carl Zeiss Smt Gmbh | Arrangement for tempering at least a partial area of an optical element |
DE102022210035A1 (en) | 2022-09-23 | 2024-03-28 | Carl Zeiss Smt Gmbh | MANAGEMENT OF COMPONENTS OF AN OPTICAL DEVICE |
DE102022210158A1 (en) | 2022-09-26 | 2024-03-28 | Carl Zeiss Smt Gmbh | Arrangement, method and computer program product for calibrating facet mirrors |
DE102022210132A1 (en) | 2022-09-26 | 2022-12-01 | Carl Zeiss Smt Gmbh | Component for a projection exposure system for semiconductor lithography and method for producing the component |
DE102022210171A1 (en) | 2022-09-27 | 2024-03-28 | Carl Zeiss Smt Gmbh | OPTICAL ELEMENT, OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM |
DE102022210229A1 (en) | 2022-09-27 | 2022-11-24 | Carl Zeiss Smt Gmbh | Magnet system and method for low-friction mounting and/or influencing the position of an optical element |
DE102022210274A1 (en) | 2022-09-28 | 2024-03-28 | Carl Zeiss Smt Gmbh | MEASURING DEVICE AND MEASURING METHOD FOR MEASURING A VOLTAGE DROPPING IN AN OPTICAL SYSTEM, OPTICAL SYSTEM AND LITHOGRAPHY SYSTEM |
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DE102022210356A1 (en) | 2022-09-29 | 2022-11-24 | Carl Zeiss Smt Gmbh | OPTICAL SYSTEM, LITHOGRAPHY PLANT WITH AN OPTICAL SYSTEM AND METHOD FOR MANUFACTURING AN OPTICAL SYSTEM |
DE102022125354A1 (en) | 2022-09-30 | 2024-04-04 | Asml Netherlands B.V. | Cooling device for cooling a position-sensitive component of a lithography system |
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DE102022211334A1 (en) | 2022-10-26 | 2023-09-14 | Carl Zeiss Smt Gmbh | Method for controlling an actuator and actuator |
DE102023207047A1 (en) | 2022-10-27 | 2024-05-02 | Carl Zeiss Smt Gmbh | COOLING LINE DEVICE FOR A LITHOGRAPHY SYSTEM, LITHOGRAPHY SYSTEM AND METHOD FOR CONTROLLING A PRESSURE OF A COOLING LIQUID IN A COOLING LINE OF A LITHOGRAPHY SYSTEM |
DE102023208302A1 (en) | 2022-11-02 | 2024-05-02 | Carl Zeiss Smt Gmbh | SYSTEM FOR A LITHOGRAPHY SYSTEM AND LITHOGRAPHY SYSTEM |
DE102023208848A1 (en) | 2022-11-07 | 2024-05-08 | Carl Zeiss Smt Gmbh | LIGHTING SYSTEM FOR A LITHOGRAPHY SYSTEM, LITHOGRAPHY SYSTEM AND METHOD FOR OPERATING A LIGHTING SYSTEM OF A LITHOGRAPHY SYSTEM |
DE102022211696A1 (en) | 2022-11-07 | 2024-05-08 | Carl Zeiss Smt Gmbh | OPTICAL SYSTEM AND LITHOGRAPHY SYSTEM WITH AN OPTICAL SYSTEM |
DE102023208851A1 (en) | 2022-11-08 | 2024-05-08 | Carl Zeiss Smt Gmbh | OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM |
DE102022211799A1 (en) | 2022-11-08 | 2022-12-29 | Carl Zeiss Smt Gmbh | MANIPULATOR, OPTICAL SYSTEM, PROJECTION EXPOSURE EQUIPMENT AND PROCESS |
DE102022211875A1 (en) | 2022-11-09 | 2024-05-16 | Carl Zeiss Smt Gmbh | Method for correcting local surface elevations on reflective surfaces |
DE102022212120A1 (en) | 2022-11-15 | 2023-11-23 | Carl Zeiss Smt Gmbh | METHOD AND FIBER INJECTION DEVICE |
DE102022212136A1 (en) | 2022-11-15 | 2023-01-12 | Carl Zeiss Smt Gmbh | Process for determining image errors in high-resolution imaging systems using wavefront measurement |
DE102022212167A1 (en) | 2022-11-16 | 2023-09-14 | Carl Zeiss Smt Gmbh | EUV source module for an EUV projection exposure system |
DE102022212168A1 (en) | 2022-11-16 | 2024-05-16 | Carl Zeiss Smt Gmbh | EUV optics module for an EUV projection exposure system |
DE102022212257A1 (en) | 2022-11-17 | 2023-11-02 | Carl Zeiss Smt Gmbh | Method for producing a base body and base body with a lightweight structure and projection exposure system |
DE102022212377A1 (en) | 2022-11-21 | 2023-10-12 | Carl Zeiss Smt Gmbh | SEALING DEVICE, METHOD AND USE |
DE102022212463A1 (en) | 2022-11-22 | 2024-05-23 | Carl Zeiss Smt Gmbh | OPTICAL SYSTEM, LITHOGRAPHY SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM OF A LITHOGRAPHY SYSTEM |
DE102022212537A1 (en) | 2022-11-24 | 2024-05-29 | Carl Zeiss Smt Gmbh | OPTICAL SYSTEM, LITHOGRAPHY DEVICE WITH AN OPTICAL SYSTEM AND ARRANGEMENT WITH AN OPTICAL SYSTEM |
WO2024120941A1 (en) | 2022-12-09 | 2024-06-13 | Carl Zeiss Smt Gmbh | Mirror socket, optical system and projection exposure apparatus |
DE102023100393A1 (en) | 2023-01-10 | 2024-07-11 | Carl Zeiss Smt Gmbh | Mirror socket, optical system and projection exposure system |
US20240192605A1 (en) | 2022-12-13 | 2024-06-13 | Carl Zeiss Smt Gmbh | Method for producing a mirror of a microlithographic projection exposure apparatus |
DE102022213681A1 (en) | 2022-12-15 | 2024-06-20 | Carl Zeiss Smt Gmbh | COOLING DEVICE FOR A LITHOGRAPHY SYSTEM |
DE102022213810A1 (en) | 2022-12-16 | 2023-02-23 | Carl Zeiss Smt Gmbh | Method for monitoring a lens of a lithography system, optical device for a lithography system and lithography system |
DE102022213752A1 (en) | 2022-12-16 | 2023-02-09 | Carl Zeiss Smt Gmbh | Interferometer device for measuring a surface, method for interferometric measuring of a surface and lithography system |
DE102022213987A1 (en) | 2022-12-20 | 2023-12-14 | Carl Zeiss Smt Gmbh | Method for assembling an optical assembly, optical assembly and projection exposure system |
DE102022214184A1 (en) | 2022-12-21 | 2024-06-27 | Carl Zeiss Smt Gmbh | OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM |
DE102023200146A1 (en) | 2023-01-11 | 2023-03-09 | Carl Zeiss Smt Gmbh | METHOD AND ADJUSTMENT SYSTEM FOR ADJUSTING A POSITION OF A FACETED MIRROR OF A LITHOGRAPHY PLANT |
DE102023200235A1 (en) | 2023-01-12 | 2024-07-18 | Carl Zeiss Smt Gmbh | OPTICAL SYSTEM AND LITHOGRAPHY SYSTEM |
DE102023200234A1 (en) | 2023-01-12 | 2024-07-18 | Carl Zeiss Smt Gmbh | OPTICAL SYSTEM, LITHOGRAPHY DEVICE AND METHOD FOR PRODUCING AN OPTICAL SYSTEM |
DE102023200329B3 (en) | 2023-01-17 | 2024-05-02 | Carl Zeiss Smt Gmbh | Optical assembly, method for assembling the optical assembly and projection exposure system |
DE102023200423A1 (en) | 2023-01-20 | 2023-12-28 | Carl Zeiss Smt Gmbh | COOLING DEVICE FOR A LITHOGRAPHY SYSTEM, LITHOGRAPHY SYSTEM AND METHOD FOR DAMPENING A PRESSURE Fluctuation of a LIQUID IN A LIQUID LINE OF A COOLING DEVICE OF A LITHOGRAPHY SYSTEM |
DE102023201137A1 (en) | 2023-02-13 | 2024-01-11 | Carl Zeiss Smt Gmbh | Arrangement and method for protecting an adhesive connection |
DE102023201546B3 (en) | 2023-02-22 | 2024-01-25 | Carl Zeiss Smt Gmbh | Method for decoating an optical surface, device for decoating an optical surface and lithography system |
DE102023201860A1 (en) | 2023-03-01 | 2023-04-20 | Carl Zeiss Smt Gmbh | Assembly and method of connecting two components |
DE102023201840A1 (en) | 2023-03-01 | 2024-02-22 | Carl Zeiss Smt Gmbh | Assembly for semiconductor technology and projection exposure system |
DE102023203832A1 (en) | 2023-04-25 | 2024-04-04 | Carl Zeiss Smt Gmbh | OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM |
DE102023203830A1 (en) | 2023-04-25 | 2024-03-28 | Carl Zeiss Smt Gmbh | SPACING DEVICE, OPTICAL SYSTEM, LITHOGRAPHY SYSTEM AND METHOD |
DE102023203897A1 (en) | 2023-04-27 | 2024-04-04 | Carl Zeiss Smt Gmbh | METHOD FOR PRODUCING A COMPONENT OF A LITHOGRAPHY SYSTEM, COMPONENT AND LITHOGRAPHY SYSTEM |
DE102023204394A1 (en) | 2023-05-11 | 2024-05-23 | Carl Zeiss Smt Gmbh | Method for minimizing pressure fluctuations and projection exposure system |
DE102023205426A1 (en) | 2023-06-12 | 2024-05-29 | Carl Zeiss Smt Gmbh | Module with two joining partners for a projection exposure system for semiconductor lithography, projection exposure system and process |
DE102023205570A1 (en) | 2023-06-14 | 2024-06-27 | Carl Zeiss Smt Gmbh | OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM |
DE102023205587A1 (en) | 2023-06-15 | 2023-07-27 | Carl Zeiss Smt Gmbh | Device for semiconductor lithography, method for manufacturing a joint body for a sensor of a lithography system and lithography system |
DE102023116896A1 (en) | 2023-06-27 | 2024-07-04 | Carl Zeiss Smt Gmbh | Method for improving the imaging properties of an optical module, control, optical module and projection exposure system |
DE102023116893A1 (en) | 2023-06-27 | 2024-07-04 | Carl Zeiss Smt Gmbh | Device and method for compensating pendulum forces |
DE102023116898A1 (en) | 2023-06-27 | 2024-06-20 | Carl Zeiss Smt Gmbh | Optical module and projection exposure system |
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DE102023206344A1 (en) | 2023-07-04 | 2024-06-06 | Carl Zeiss Smt Gmbh | OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM |
DE102023206428A1 (en) | 2023-07-06 | 2024-07-11 | Carl Zeiss Smt Gmbh | Apparatus and method for producing an optical element and lithography system |
DE102023206565A1 (en) | 2023-07-11 | 2024-05-29 | Carl Zeiss Smt Gmbh | WATER-BEARING SYSTEM AND PROJECTION EXPOSURE SYSTEM |
DE102024200329A1 (en) | 2024-01-15 | 2024-05-08 | Carl Zeiss Smt Gmbh | Device and method for filtering a cooling lubricant, processing device and lithography system |
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- 2000-01-22 KR KR1020000003028A patent/KR100586288B1/en not_active IP Right Cessation
- 2000-01-25 CA CA002296926A patent/CA2296926A1/en not_active Abandoned
- 2000-01-26 JP JP2000017124A patent/JP2000221406A/en active Pending
-
2003
- 2003-02-07 US US10/359,722 patent/US6760095B2/en not_active Expired - Fee Related
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2004
- 2004-06-29 US US10/877,992 patent/US7046338B2/en not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
---|---|
US20050008870A1 (en) | 2005-01-13 |
US6573978B1 (en) | 2003-06-03 |
EP1024408A3 (en) | 2004-11-24 |
US7046338B2 (en) | 2006-05-16 |
EP1024408A2 (en) | 2000-08-02 |
KR100586288B1 (en) | 2006-06-02 |
JP2000221406A (en) | 2000-08-11 |
KR20000071280A (en) | 2000-11-25 |
CA2296926A1 (en) | 2000-07-26 |
US20030142283A1 (en) | 2003-07-31 |
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