US20140374779A1 - Light-emitting device and light-emitting array - Google Patents
Light-emitting device and light-emitting array Download PDFInfo
- Publication number
- US20140374779A1 US20140374779A1 US14/301,492 US201414301492A US2014374779A1 US 20140374779 A1 US20140374779 A1 US 20140374779A1 US 201414301492 A US201414301492 A US 201414301492A US 2014374779 A1 US2014374779 A1 US 2014374779A1
- Authority
- US
- United States
- Prior art keywords
- light
- electrode
- layer
- emitting device
- conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 76
- 230000000149 penetrating effect Effects 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims description 75
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 14
- 230000004888 barrier function Effects 0.000 claims description 14
- 239000010936 titanium Substances 0.000 claims description 10
- 239000011651 chromium Substances 0.000 claims description 8
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 229910052697 platinum Inorganic materials 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 238000002310 reflectometry Methods 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- MAKDTFFYCIMFQP-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti].[W] MAKDTFFYCIMFQP-UHFFFAOYSA-N 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 128
- 239000000463 material Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 239000002356 single layer Substances 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 238000005304 joining Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910002601 GaN Inorganic materials 0.000 description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 229910052682 stishovite Inorganic materials 0.000 description 3
- 229910052905 tridymite Inorganic materials 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- -1 such as Substances 0.000 description 2
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
- H01L33/387—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape with a plurality of electrode regions in direct contact with the semiconductor body and being electrically interconnected by another electrode layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/075—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
- H01L25/0753—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00 the devices being arranged next to each other
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
- H01L33/382—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape the electrode extending partially in or entirely through the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
- H01L33/60—Reflective elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
Definitions
- the disclosure is related to a light-emitting device, and more particularly, a light-emitting device and a light-emitting array with a connecting layer between a substrate and a light-emitting stack.
- LEDs light-emitting diodes
- An LED has the advantages of good environment tolerance, a long service life, portability, and low power consumption and is regarded as another option for the lighting application. LEDs are widely adopted in different fields, for example, traffic lights, backlight modules, street lights, and medical devices and replaces conventional light sources gradually.
- An LED has a light-emitting stack which is epitaxially grown on a conductive substrate or an insulting substrate.
- the so-called “vertical LED” has a conductive substrate and includes an electrode formed on the top of a light emitting layer; the so-called “lateral LED” has an insulative substrate and includes electrodes formed on two semiconductor layers which have different polarities and exposed by an etching process.
- the vertical LED has the advantages of small light-shading area for electrodes, good heat dissipating efficiency, and no additional etching epitaxial process, but has a shortage that the conductive substrate served as an epitaxial substrate absorbs light easily and is adverse to the light efficiency of the LED.
- the lateral LED has the advantage of radiating light in all directions due to a transparent substrate used as the insulator substrate, but has shortages of poor heat dissipation, larger light-shading area for electrodes, and smaller light-emitting area caused by epitaxial etching process.
- the abovementioned LED can further connects to/with other device for forming a light-emitting device.
- the LED can connect to a carrier by a side of a substrate or by soldering material/adhesive material between a sub-carrier and the LED.
- a light-emitting device includes a light-emitting stack including a first semiconductor layer, a second semiconductor layer, and an active layer between the first semiconductor layer and the second semiconductor layer, wherein the first semiconductor layer includes a first surface, a second surface opposite to the first surface, a first portion connecting to the first surface, and a second portion connecting to the first portion; an opening penetrating the first portion and having a first width; a depression connecting to the opening and penetrating the second semiconductor layer, the active layer, and the second portion of the first semiconductor layer, wherein the depression includes a second width wider than the first width, and the depression includes a bottom to expose the second surface; and an electrode located in the depression and corresponding to the opening.
- a light-emitting array includes a substrate having an upper surface, light-emitting units on the upper surface of the substrate, wherein each of the light-emitting units includes a first surface and a second surface opposite to the first surface and toward to the upper surface; an insulative layer, between the substrate and the light-emitting unit, covering the second surface of each of the light-emitting units; and at least one of wires embedded in the insulative layer, wherein each of the at least one of wires includes a conductive channel, penetrating the insulative layer and electrically connecting with the second surface, and a bridge electrically connecting with the conductive channel, and at least one of the bridges electrically connects two of the light-emitting units via a plurality the conductive channels.
- FIGS. 1A to 1H illustrate a light-emitting device in accordance with a manufacturing method of a first embodiment of the application.
- FIG. 2 illustrates a light-emitting device in accordance with a second embodiment of the application.
- FIG. 3 illustrates a light-emitting device in accordance with a third embodiment of the application.
- FIG. 4 illustrates an electrode layout of the light-emitting device in accordance with the first embodiment of the application.
- FIG. 5 illustrates an electrode layout of the light-emitting device in accordance with the forth embodiment of the application.
- FIG. 6 illustrates an electrode layout of the light-emitting device in accordance with a fifth embodiment of the application.
- FIG. 7 illustrates an electrode layout of the light-emitting device in accordance with a sixth embodiment of the application.
- FIG. 8 illustrates an electrode layout of the light-emitting device in accordance with a seventh embodiment of the application.
- FIG. 9 illustrates an electrode layout of the light-emitting device in accordance with an eighth embodiment of the application.
- FIG. 10 illustrates an electrode layout of the light-emitting device in accordance with a ninth embodiment of the application.
- FIG. 11 illustrates a light-emitting array in accordance with a tenth embodiment of the application.
- FIG. 12 illustrates a light-emitting array in accordance with an eleventh embodiment of the present application.
- FIG. 13 illustrates a light-emitting array in accordance with a twelfth embodiment of the application.
- FIG. 14 illustrates a light-emitting array in accordance with a thirteenth embodiment of the application.
- a light-emitting stack 108 which is epitaxially grown on a growth substrate 101 includes a first semiconductor layer 102 , a second semiconductor layer 106 , and an active layer 104 between the first semiconductor layer 102 and the second semiconductor layer 106 .
- the light-emitting stack 108 can be a nitride light-emitting stack and a material of the light-emitting stack 108 containing elements like aluminum (Al), indium (In), gallium (Ga), or nickel (N).
- the growth substrate 101 can be made of a transparent insulative substrate, such as sapphire, or a conductive substrate, such as silicon (Si) substrate or silicon carbide (SiC) substrate.
- a buffer layer 103 can be formed on the growth substrate 101 before forming the light-emitting stack 108 .
- a material of the light-emitting stack 108 can contain elements like aluminum (Al), gallium (Ga), indium (In), phosphorus (P), or arsenic (As), and a material of the growth substrate 101 can be gallium arsenide (GaAs).
- the first semiconductor layer 102 , the active layer 104 , the second semiconductor layer 106 are epitaxially grown on the growth substrate 101 .
- the first semiconductor layer 102 can be an n-type semiconductor
- the second semiconductor layer 106 can be a p-type semiconductor
- a structure of the light-emitting stack 108 includes a single heterostructure (SH), a double-side double heterostructure (DDH), or multi-quantum well (MQW) structure.
- SH single heterostructure
- DDH double-side double heterostructure
- MQW multi-quantum well
- a depression 105 is formed, penetrates the second semiconductor layer 106 and the active layer 104 , and exposes the first semiconductor layer 102 .
- the depression 105 has a pattern and an electrode 110 which is corresponding to the pattern is formed in the depression 105 .
- a conductive layer 112 is formed on the second semiconductor layer 106 .
- the electrode 110 electrically connects with only the first semiconductor layer 102 , and in a cross-sectional view, there is a gap between two sides of the electrode 110 and the depression 105 so the electrode 110 is insulated from the active layer 104 and the second semiconductor layer 106 .
- the conductive layer 112 has ohmic contact with the second semiconductor layer 106 and can be a transparent conductive layer, such as indium tin oxide (ITO), indium zinc oxide (IZO) or aluminum-doped zinc oxide (A ZO), or metal material, such as, nickel (Ni), platinum (Pt), palladium (Pd), silver (Ag), or chromium (Cr).
- the electrode 110 can be aluminum (Al), titanium (Ti), chromium (Cr), platinum (Pt), gold (Au), or combinations thereof.
- a barrier 116 covering the conductive layer 112 and an insulative structure 114 covering the electrode 110 are formed.
- the barrier 116 covers all surface of the conductive layer 112 except the region contacting the second semiconductor layer 106 .
- the pattern of the insulative structure 114 is substantially corresponding to the pattern of the electrode 110 while the insulative structure 114 fills a space between the electrode 110 and the depression 105 .
- the upper surface 114 a of the insulative structure 114 and the upper surface 116 a of the barrier 116 are coplanar and the barrier 116 horizontally surrounds the insulative structure 114 , except the portion in the depression 105 .
- the insulative structure 114 includes transparent material and is formed by evaporating, sputtering, or spin-on glass (SOG) to form single-layer of SiO 2 , single-layer of TiO 2 , or single-layer of Si 3 N 4 and then solidifying.
- the barrier 116 can be single-layer or multi-layer structure and includes titanium (Ti), tungsten (W), platinum (Pt), titanium tungsten (TiW) or combinations thereof.
- a reflective layer 118 is formed on a plane on which the upper surface 114 a of the insulated layer 114 and the upper surface 116 a of the barrier 116 lie.
- the reflective layer 118 can include aluminum (Al).
- a conductive substrate 122 is provided and connects to a metal layer 118 via a joining structure 120 .
- the joining structure 120 includes gold (Au), indium (In), nickel (Ni), titanium (Ti), or combinations thereof. Consequentially, a process of removing the growth substrate 101 is performed.
- the conductive substrate 122 includes a semiconductor material, such as silicon (Si), or a metal material, such as, cobalt (Cu), tungsten (W), or aluminum (Al). Moreover, a surface of the conductive substrate 122 can be graphene.
- a laser ray (not shown in FIG. 1F ) is provided to a back surface of the growth substrate 101 to dissolve a buffer layer 103 by energy from the laser ray.
- the energy from the laser ray can evaporate nitrogen in gallium nitride (GaN), so as to dissolve the buffer layer 103 and remove the growth substrate 101 so the first semiconductor 102 is exposed.
- GaN gallium nitride
- the remaining buffer layer 103 on the first semiconductor layer 102 is further removed.
- a cleaning step is performed to mainly remove the remaining gallium in the step by inductively coupled plasma (ICP), and the surface of the first semiconductor layer can be further cleaned by HCl or H 2 O 2 .
- a roughed structure 126 is formed on the first surface 102 a of the first semiconductor layer 102 by etching.
- the roughed structure 126 can have a regular or irregular rough surface with a roughness of 0.5 ⁇ 1 ⁇ m, and an opening 124 is formed by removing a portion of the first semiconductor layer 102 which is on the electrode 110 .
- the depression 105 has width W 1 greater than a width W 2 of the opening 124 , and therefore, after the depression 105 and the opening are formed in sequence, a second surface 102 d opposite to the first surface 102 a is formed at the bottom of the first semiconductor layer 102 connecting to the depression 105 , and the electrode 110 connects to the second surface 102 d and is formed in the depression 105 corresponding to the opening 124 wherein the electrode has a width W 3 greater than the width W 2 .
- the upper surface 110 a of the electrode 110 has a contact area 110 b connecting to the second surface 102 d of the first semiconductor layer 102 and an exposed area 110 c exposed by the opening 124 .
- a thickness of the first semiconductor 102 can be 3 ⁇ 4 ⁇ m while the first semiconductor 102 has a first portion 102 b and a second portion 102 c.
- the thickness of the first portion 102 b is about equal to the depth of the opening 124 , which is about 1.5 ⁇ 3 ⁇ m.
- the thickness of the second portion 102 c corresponding to the depression 105 is about 1 ⁇ 1.5 ⁇ m. Because the electrode 110 electrically connects to the first semiconductor layer 102 while is not formed on the first surface 102 a, the electrode 110 does not shield the light from the light-emitting device 100 .
- the light-emitting device 100 disclosed in the embodiment includes the conductive substrate 122 ; the joining structure 120 formed on the conductive substrate 122 ; the reflective layer 118 formed on the joining structure 120 ; the conductive structure 117 including the barrier 116 formed on a portion of the reflective layer 118 , and the conductive layer 112 covered by the barrier 116 ; the light-emitting stack 108 including the first semiconducting layer 102 , the active layer 104 , and the second semiconducting layer 106 electrically connecting with the conductive layer 112 ; the insulative structure 114 formed on a portion of the reflective layer 118 and penetrating the second semiconducting layer 106 , the active layer 104 , and the second part 102 c of the first semiconducting layer 102 ; the electrode 110 covered by the insulative structure 124 wherein the upper surface 110 a of the electrode 110 connects to the first semiconducting layer 102 ; and the opening 124 penetrating the
- the insulative structure 114 insulates the electrode 110 from the second semiconductor 106 and the active layer 104 , and the electrode 110 and the active layer 104 are on different regions along the horizontal direction of the light-emitting device 100 while the whole active layer 104 is located above the conductive structure 117 . Therefore, the light from the active layer 104 is not shielded by the electrode 110 of the light-emitting device 100 and the conductive structure 117 .
- the upper surface 110 a of the electrode 110 can be connected with an external power source.
- FIG. 2 illustrates a light-emitting device in accordance with a second embodiment of the application.
- the second embodiment and the first embodiment are similar, but the difference between them is that a wiring electrode 211 is formed on an electrode 210 and the wiring electrode 211 is in an opening 204 for a soldering ball for wiring (not shown in FIG. 2 ).
- FIG. 3 illustrates a light-emitting device in accordance with a third embodiment of the application.
- the third embodiment is similar to the aforementioned embodiments, but the differences between them are mentioned as follows.
- a conductive layer 308 which electrically connects with a second semiconductor layer 306 is a transparent conductive layer without reflectivity, such as indium tin oxide (ITO), indium zinc oxide (IZO), or aluminum-doped zinc oxide (Al ZO), and there is no barrier as shown in the first embodiment.
- An insulative structure 314 can include an insulative layer 314 a between a light-emitting stack 310 and a reflective layer 318 , and an insulative portion 314 b covers the electrode 311 .
- a plurality of conductive channels 316 penetrates the insulative layer 314 a and connects the conductive layer 308 and the reflective layer 318 by its two ends respectively.
- a joining structure 320 and a conductive substrate 322 same as those described in the first embodiment are below the reflective layer 318 .
- the conductive channel 316 can be a metal well to fill pores like titanium (Ti), aluminum (Al), nickel (Ni), chromium (Cr), or copper (Cu).
- the insulative structure 314 can be a transparent insulative material and is formed by evaporating, sputtering, or spin-on glass (SOG) to form single-layer of SiO 2 , single-layer of TiO 2 , or single-layer of Si 3 N 4 , and then solidifying or alternatively stacking two different films with different index of refraction to form a distributed Bragg reflector (DBR).
- SOG spin-on glass
- FIG. 4 illustrates an electrode layout of the light-emitting device in accordance with the first embodiment of the application.
- the electrode layout can also be utilized in the second embodiment and the third embodiment. In the embodiment, it shows only patterns of the electrode 110 and the conductive structure 117 for clearly showing the pattern of the electrode. From top view, the conductive substrate 122 of the light-emitting device 100 is a rectangle with a size of 1 mil to 70 mils.
- the electrode disclosed in the embodiment includes a wiring electrode 110 and an extensive electrode 111 extending from the wiring electrode 110 .
- the wiring electrode 110 is located near a corner of the rectangle of the light-emitting device 100 , and the extensive electrode 111 includes a first extensive electrode 111 b along outer edges of the light-emitting device 100 and a second extensive electrode 111 a surrounding by and connecting to the first extensive electrode 111 b.
- the first extensive electrode 111 b and the second electrode 111 a form another rectangle.
- the wiring electrode 110 , and/or the extensive electrode 111 , and the conductive structure 117 are formed on different regions of the conductive substrate 122 and do not overlap with one another. Therefore, the conductive structure 117 as shown in the region with slash lines substantially complements the patterns of the wiring electrode 110 and the extensive electrode 111 .
- FIG. 5 shows an electrode layout of a light-emitting device in accordance with a fourth embodiment of the application.
- the electrode layout can be utilized in the first embodiment to the third embodiment.
- FIG. 5 illustrates only the electrodes and the conductive structure of the above-mentioned embodiment for clearly showing patterns on the electrodes.
- a conductive substrate 522 of a light-emitting device 500 is a rectangle.
- the electrodes shown in the embodiment include a wiring electrode 510 and an extensive electrode 511 extending from the wiring electrode 510 .
- the wiring electrode 510 is substantially located at a geometric center of the light-emitting device 500 and the extensive electrode 511 optionally includes a plurality of radial branches extending from the wiring electrode 510 .
- the wiring electrode 510 , and/or the extensive electrode 511 , and a conductive structure 517 are formed on different regions of the conductive substrate 522 and do not overlap with one another. Therefore, the conductive structure 517 as shown in the region with slash lines substantially complements the pattern formed by the wiring electrode 510 and the extensive electrode 511 .
- FIG. 6 shows an electrode layout of a light-emitting device in accordance with a fifth embodiment of the application.
- the electrode layout can be utilized in the first embodiment to the third embodiment.
- a conductive substrate 622 of a light-emitting device 600 is a rectangle.
- the electrodes disclosed in the embodiment include a wiring electrode 610 and an extensive electrode 611 extending from the wiring electrode 610 .
- the wiring electrode 610 is substantially located at a geometric center of the light-emitting device 600 and the extensive electrode 611 includes a plurality of radial branches extending from the wiring electrode 610 .
- a length of the radial branch of the extensive electrode 611 along a diagonal of the rectangle of the light-emitting device 600 is longer than a length of the radial branch along a side of the rectangle.
- the wiring electrode 610 , and/or the extensive electrode 611 , and a conductive structure 617 are formed on different regions of the conductive substrate 622 and do not overlap with one another. Therefore, the conductive structure 617 as shown in the region with slash lines complements the pattern formed by the wiring electrode 610 and extensive electrode 611 .
- FIG. 7 illustrates an electrode layout of a light-emitting device in accordance with a sixth embodiment of the application.
- the electrode layout can be utilized in the first embodiment to the third embodiment.
- a conductive substrate 722 of a light-emitting device 700 is a rectangle.
- the electrodes disclosed in the embodiment include a wiring electrode 710 and an extensive electrode 711 extending from the wiring electrode 710 .
- the wiring electrode 710 is substantially located at a corner of the rectangle of the light-emitting device 700
- the extensive electrode 711 includes a plurality of radial branches extending from the wiring electrode 710 with lengths that vary with their extensive angles respectively.
- the wiring electrode 710 , and/or the extensive electrode 711 , and a conductive structure 717 are formed on different regions of the conductive substrate 722 and do not overlap with one another. Therefore, the conductive structure 717 as shown in the region with slash lines substantially complements the pattern formed by the wiring electrode 710 and extensive electrode 711 .
- FIG. 8 illustrates an electrode layout of a light-emitting device in accordance with a seventh embodiment of the application.
- the electrode layout can be utilized in the first embodiment to the third embodiment. From top view, a conductive substrate 822 of a light-emitting device 800 is a rectangle.
- the electrodes disclosed in the embodiment include wiring electrodes 810 a and 810 b near a side of the rectangle of the light-emitting device 800 , an extensive electrode 811 including radial branches 811 a and 811 b extending from the wiring electrode 810 a and 810 b to another side of the rectangle, a radial branch 811 c connecting to the wiring electrodes 810 a and 810 b by its two ends and parallel to a side of the rectangle, and a radial branch 811 d extending from the radial branch 811 c and parallel to the radial branches 811 a and 811 b.
- the wiring electrode 810 a and 810 b, and/or the extensive electrode 811 , and the conductive structure 817 are formed on different regions of the conductive substrate 822 and do not overlap with one another, and therefore the conductive structure 817 as shown in the region with slash lines substantially complements the patterns of the wiring electrode 810 a and 810 b and extensive electrode 811 .
- FIG. 9 it illustrates an electrode layout of a light-emitting device in accordance with an eighth embodiment of the application.
- the electrode layout can be utilized in the first embodiment to the third embodiment.
- a conductive substrate 922 of a light-emitting device 900 is a rectangle.
- the electrodes disclosed in the embodiment include wiring electrodes 910 a and 910 b near a side of the rectangle of the light-emitting device 900 and an extensive electrode 911 including radial branches 911 a and 911 b extending from the wiring electrodes 910 a and 910 b to another side of the rectangle.
- the embodiment is similar to the seventh embodiment, but the differences include that the radial branches 911 a and 911 b are sinuous and extending from the wiring electrodes 910 a and 910 b, and there are multiple radial branches 911 a and 911 b extended from the wiring electrodes 910 a and 910 b respectively.
- the wiring electrode 910 , and/or the extensive electrode 911 , and the conductive structure 917 are formed on different regions of the conductive substrate 922 and do not overlap with one another. Therefore, the conductive structure 917 as shown in the region with slash lines substantially complements the patterns of the wiring electrode 910 and extensive electrode 911 .
- FIG. 10 illustrates an electrode layout of a light-emitting device in accordance with a ninth embodiment of the application.
- the electrode layout can be utilized in the first embodiment to the third embodiment. From top view, a conductive substrate 1022 of the light-emitting device is a rectangle.
- the electrodes disclosed in the embodiment include two wiring electrodes 1010 a and 1010 b near two corners of the rectangle of the conductive substrate 1022 , and an extensive electrode 1011 including a first radial branch 1011 a along the rectangle of the conductive substrate 1002 and connecting to the wiring electrodes 1010 a and 1010 b, and a second radial branch 1011 b connecting to two opposite sides of the rectangle of the first radial branch 1011 a and forming a net pattern with the first radial branch 1011 a.
- the wiring electrode 1010 , and/or the extensive electrode 1011 , and the conductive structure 1017 are formed on different regions of the conductive substrate 1022 and do not overlap with one another. Therefore, the conductive structure 1017 as shown in the region with slash lines substantially complements the patterns of the wiring electrode 1010 and extensive electrode 1011 .
- FIG.11 illustrates a light-emitting array in accordance with a tenth embodiment of the application.
- the light-emitting array 1100 includes an insulative substrate 1110 including an upper surface 1110 a, a joining layer 1124 formed on the upper surface 1110 a and being insulative, an insulative layer 1114 formed on the joining layer 1124 , a plurality of light-emitting units 112 formed on the insulative layer 1114 , wherein each of the light-emitting units 112 includes a first surface 1113 and a second surface 1115 .
- the first surface 1113 has a first polarity
- the second surface 115 is toward to the insulative substrate 1110 opposite to the first surface 1113 and includes a first region 1115 a with the first polarity and a second region 1115 b with a second polarity.
- a plurality of wires 1116 is embedded in the insulative layer 1114 and electrically connecting with two of the light-emitting units 1112 , for example, connecting to the second region 1115 b of at least one of the light-emitting units 1112 and the first region 1115 a of another one of the light-emitting units 1112 .
- a first electrode 1118 is formed on the insulative layer 1114 , electrically connecting with the first region 1115 a of one of the light-emitting units 1112 , and located in different region than that of the light-emitting units 1112 on the insulative layer 1114 .
- a second electrode 1120 is formed on the insulative layer 1114 , electrically connecting with the second region 1115 b of one of the light-emitting units 1112 , and located in different region than that of the light-emitting units 1112 on the insulative layer 1114 .
- the light-emitting units 1112 are epitaxially grown on the same wafer (not shown in figures). After epitaxially growth, the first surface 1113 connects to the wafer and the second surface 1115 faces up. The first region 1115 a and the second region 1115 b of the second surface 1115 can be defined by an etching process as the light-emitting units 1112 are not defined yet. After carrying the light-emitting unit 1112 on the insulative substrate 1110 via the joining layer 1124 , the wafer can be removed and the first surface 1113 is exposed. In sequence, a plurality of the light-emitting units 1112 electrically insulated from one another can be formed from the first surface 1113 by an etching process. Additionally, the first surface 1113 similar to the one in the first embodiment is a rough surface.
- the insulative layer 1114 can include a first insulative layer 1114 a and a second insulative layer 1114 b and is made of silicon oxide SiO 2 , for example.
- the first insulative layer 1114 a can cover the first region 1115 a and the second region 1115 b of the second surface 1115 to form a surface substantially parallel to the upper surface 1110 a of the insulative substrate 1110 .
- the wire 1116 includes a conductive channel 1116 a penetrating the first insulative layer 1114 a for electrically connecting with the first region 1115 a or the second region 1115 b, and a bridge 1116 b laterally extending along a surface of the first insulative layer 1114 a and connecting to the conductive channels 1116 a of the neighboring light-emitting units 1112 .
- the bridge 1116 b can connect to identical/different polarities of two different light-emitting units 1112 for forming a serial/parallel/in inverse-parallel connection.
- the second insulative layer 1114 b can cover the insulative layer 1114 a and the bridge 1116 b.
- the light-emitting unit 1112 includes a first semiconductor layer 1101 having the first surface 1113 and the first region 1115 a of the second surface 1115 , a second semiconductor layer 1102 having the second region 1115 b of the second surface 1115 , and an active layer 1103 between the first semiconductor layer 1101 and the second semiconductor layer 1102 .
- the first semiconductor layer 1101 has the first polarity and the second semiconductor layer 1102 has the second polarity different from the first polarity.
- the first polarity of the first semiconductor layer 1101 is n-type; the second polarity of the semiconductor layer 1102 is p-type.
- the first region 1115 a of the second surface 1115 is farther from the insulative substrate 1110 than the second region 1115 b to expose the first semiconductor layer 1101 .
- the insulative layer 1114 covers the second surface 1115 and fills a convex-concave structure formed by the first region 1115 a and the second region 1115 b.
- first regions 1115 a of the light-emitting unit 1112 which connect to a plurality of the conductive channels 1116 a, and lateral sides of the conductive channels 1116 a which connect to the first regions 1115 a are covered by the first insulative layer 1114 a so as to be electrically insulated from the second region 1115 b of the second semiconductor 1102 of the individual light-emitting unit 1112 .
- a conductive layer 1104 with reflectivity and a barrier 1105 covering the conductive layer 1104 can be formed on the second region 1115 b.
- the first electrode 1118 can electrically connect with the first region 1115 a of the light-emitting unit 1112 via the bridge 1116 b; the second electrode 1120 can electrically connect with the second region 1115 b of the light-emitting unit 1112 via the barrier 1105 .
- the bridge 1116 b connecting to the first electrode 1118 is co-planar with a first exposing surface 1114 c of the second insulative layer 1114 b;
- the barrier 1105 connecting to the second electrode 1120 is co-planar with a second exposing surface 1114 d of the first insulative layer 1114 a wherein the first exposing surface 1114 c is closer to the insulative substrate 1110 than the second exposing surface 1114 d.
- a light-emitting array 1100 including a circuit in series/in parallel/in inversed-parallel can be formed between the first electrode 1118 and the second electrode 1120 .
- the wires 1116 are located below all of the light-emitting units 1112 , and the first electrode 1118 and the second electrode 1120 are side by side with all of the light-emitting units 1112 . Accordingly, the light is not shaded by the wires 1116 , the first electrode 1118 , and the second electrode 1120 disclosed in the embodiment.
- FIG. 12 illustrates a light-emitting array in accordance with an eleventh embodiment of the application.
- the embodiment is similar to the tenth embodiment but the differences are as follows.
- Each of light-emitting units 1222 disclosed in the embodiment is similar to those in the first embodiment, a first region 1215 a and a second region 1215 b can have patterns as shown in FIG. 4 to FIG. 10 .
- the first region 1215 a of each of the light-emitting units 1222 has only a conductive channel 1216 a connecting to a bridge 1216 b, and a cross section of the conductive channel 1216 a is bigger than that of the tenth embodiment, wherein two of the conductive channels 1216 respectively electrically connect with the first region 1215 a of one of the light-emitting unit 1212 and the second region 1215 b of another one of the light-emitting unit 1212 and extend to a surface of a second insulative layer 1214 b devoid of the light-emitting units 1212 .
- a first electrode 1218 and a second electrode 1220 can be formed on two of the conductive channels 1216 .
- a light-emitting array 1200 including a circuit in series/in parallel/in inversed-parallel can be formed between the first electrode 1218 and the second electrode 1220 .
- FIG. 13 illustrates a light-emitting array in accordance with a twelfth embodiment of the application.
- the embodiment is similar to the tenth embodiment but the differences are as follows.
- a conductive substrate 1310 disclosed in the embodiment replaces the insulative substrate disclosed in the tenth embodiment;
- a conductive joining layer 1324 replaces the insulative joining layer disclosed the tenth embodiment.
- conductive channels 1316 a are connected to a first region 1315 a of a light-emitting unit 1312 , penetrate a first insulative layer 1314 a and a second insulative layer 1314 b, and electrically connect with a conductive joining layer 1324 .
- An electrode 1320 electrically connects with a second region 1315 b of the light-emitting unit 1312 , and a light-emitting array 1300 including a circuit in series/in parallel/in inverse-parallel can be formed between the electrode 1320 and the conductive substrate 1310 .
- the first region 1315 a has the n-type polarity and the second region 1315 b has the p-type polarity.
- the n-type polarity is conducted to the conductive substrate 1310 .
- the p-type polarity can be conducted to the conductive substrate 1310 .
- the material of the conductive substrate 1310 can be referred those disclosed in the first embodiment.
- FIG. 14 illustrates a light-emitting array in accordance with a thirteenth embodiment of the application.
- the embodiment is similar to the eleventh embodiment but the differences are as follows.
- a conductive substrate 1410 disclosed in the embodiment replaces the insulative substrate of the eleventh embodiment, and a conductive joining layer 142 disclosed in the embodiment replaces the joining layer of the eleventh embodiment.
- a conductive channel 1416 b connects to a second region 1415 b of a light-emitting unit 1412 , penetrates a first insulative layer 1414 a and a second insulative layer 1414 b, and electrically connects with a conductive joining layer 1424 .
- An electrode 1418 electrically connects with a first region 1415 a of the light-emitting unit 1412 and a light-emitting array 1400 including a circuit in series/in parallel/in inverse-parallel can be formed between the electrode 1418 and the conductive substrate 1410 .
- the first region 1415 a has the n-type polarity and the second region 1415 b has the p-type polarity.
- the p-type polarity is conducted to the conductive substrate 1410 ; in other embodiments, the n-type polarity can be conducted to the conductive substrate 1410 .
- the material of the conductive substrate 1410 can be referred to those disclosed in the first embodiment.
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Led Devices (AREA)
Abstract
A light-emitting device includes a light-emitting stack including a first semiconductor layer, a second semiconductor layer, and an active layer between the first semiconductor layer and the second semiconductor layer, wherein the first semiconductor layer includes a first surface, a second surface opposite to the first surface, a first portion connecting to the first surface, and a second portion connecting to the first portion; an opening penetrating the first portion from the first surface and having a first width; a depression connecting to the opening and penetrating the second semiconductor layer, the active layer, and the second portion of the first semiconductor layer, wherein the depression includes a second width greater than the first width, and the depression includes a bottom to expose the second surface, and an electrode located in the depression and corresponding to the opening.
Description
- This application claims the right of priority based on TW application Serial No. 102122124, filed on Jun. 20, 2013 and Serial No. 103115304, filed on, Apr., 28, 2014, and the content of which is hereby incorporated by reference in its entirety.
- The disclosure is related to a light-emitting device, and more particularly, a light-emitting device and a light-emitting array with a connecting layer between a substrate and a light-emitting stack.
- The lighting theory of light-emitting diodes (LEDs) is that electrons move between an n-type semiconductor and a p-type semiconductor to release energy. Due to the difference of lighting theories between LEDs and incandescent lamps, the LED is called “cold light source”. An LED has the advantages of good environment tolerance, a long service life, portability, and low power consumption and is regarded as another option for the lighting application. LEDs are widely adopted in different fields, for example, traffic lights, backlight modules, street lights, and medical devices and replaces conventional light sources gradually.
- An LED has a light-emitting stack which is epitaxially grown on a conductive substrate or an insulting substrate. The so-called “vertical LED” has a conductive substrate and includes an electrode formed on the top of a light emitting layer; the so-called “lateral LED” has an insulative substrate and includes electrodes formed on two semiconductor layers which have different polarities and exposed by an etching process. The vertical LED has the advantages of small light-shading area for electrodes, good heat dissipating efficiency, and no additional etching epitaxial process, but has a shortage that the conductive substrate served as an epitaxial substrate absorbs light easily and is adverse to the light efficiency of the LED. The lateral LED has the advantage of radiating light in all directions due to a transparent substrate used as the insulator substrate, but has shortages of poor heat dissipation, larger light-shading area for electrodes, and smaller light-emitting area caused by epitaxial etching process.
- The abovementioned LED can further connects to/with other device for forming a light-emitting device. For a light-emitting device, the LED can connect to a carrier by a side of a substrate or by soldering material/adhesive material between a sub-carrier and the LED.
- A light-emitting device includes a light-emitting stack including a first semiconductor layer, a second semiconductor layer, and an active layer between the first semiconductor layer and the second semiconductor layer, wherein the first semiconductor layer includes a first surface, a second surface opposite to the first surface, a first portion connecting to the first surface, and a second portion connecting to the first portion; an opening penetrating the first portion and having a first width; a depression connecting to the opening and penetrating the second semiconductor layer, the active layer, and the second portion of the first semiconductor layer, wherein the depression includes a second width wider than the first width, and the depression includes a bottom to expose the second surface; and an electrode located in the depression and corresponding to the opening.
- A light-emitting array includes a substrate having an upper surface, light-emitting units on the upper surface of the substrate, wherein each of the light-emitting units includes a first surface and a second surface opposite to the first surface and toward to the upper surface; an insulative layer, between the substrate and the light-emitting unit, covering the second surface of each of the light-emitting units; and at least one of wires embedded in the insulative layer, wherein each of the at least one of wires includes a conductive channel, penetrating the insulative layer and electrically connecting with the second surface, and a bridge electrically connecting with the conductive channel, and at least one of the bridges electrically connects two of the light-emitting units via a plurality the conductive channels.
- The accompanying drawing is included to provide easy understanding of the application, and is incorporated herein and constitutes a part of this specification. The drawing illustrates the embodiment of the application and, together with the description, serves to illustrate the principles of the application.
-
FIGS. 1A to 1H illustrate a light-emitting device in accordance with a manufacturing method of a first embodiment of the application. -
FIG. 2 illustrates a light-emitting device in accordance with a second embodiment of the application. -
FIG. 3 illustrates a light-emitting device in accordance with a third embodiment of the application. -
FIG. 4 illustrates an electrode layout of the light-emitting device in accordance with the first embodiment of the application. -
FIG. 5 illustrates an electrode layout of the light-emitting device in accordance with the forth embodiment of the application. -
FIG. 6 illustrates an electrode layout of the light-emitting device in accordance with a fifth embodiment of the application. -
FIG. 7 illustrates an electrode layout of the light-emitting device in accordance with a sixth embodiment of the application. -
FIG. 8 illustrates an electrode layout of the light-emitting device in accordance with a seventh embodiment of the application. -
FIG. 9 illustrates an electrode layout of the light-emitting device in accordance with an eighth embodiment of the application. -
FIG. 10 illustrates an electrode layout of the light-emitting device in accordance with a ninth embodiment of the application. -
FIG. 11 illustrates a light-emitting array in accordance with a tenth embodiment of the application. -
FIG. 12 illustrates a light-emitting array in accordance with an eleventh embodiment of the present application. -
FIG. 13 illustrates a light-emitting array in accordance with a twelfth embodiment of the application. -
FIG. 14 illustrates a light-emitting array in accordance with a thirteenth embodiment of the application. - To better and concisely explain the disclosure, the same name or the same reference number given or appeared in different paragraphs or figures along the specification should has the same or equivalent meanings while it is once defined anywhere of the disclosure.
- The following shows the description of embodiments of the present disclosure in accordance with the drawing.
- Referring to
FIGS. 1A to 1H , the figures illustrate a light-emitting device in accordance with a manufacturing method of a first embodiment of the application. As shown inFIG. 1A , a light-emitting stack 108 which is epitaxially grown on agrowth substrate 101 includes afirst semiconductor layer 102, asecond semiconductor layer 106, and anactive layer 104 between thefirst semiconductor layer 102 and thesecond semiconductor layer 106. The light-emittingstack 108 can be a nitride light-emitting stack and a material of the light-emittingstack 108 containing elements like aluminum (Al), indium (In), gallium (Ga), or nickel (N). Thegrowth substrate 101 can be made of a transparent insulative substrate, such as sapphire, or a conductive substrate, such as silicon (Si) substrate or silicon carbide (SiC) substrate. For reducing lattice mismatch between thegrowth substrate 101 and the light-emitting stack 108, abuffer layer 103 can be formed on thegrowth substrate 101 before forming the light-emitting stack 108. A material of the light-emittingstack 108 can contain elements like aluminum (Al), gallium (Ga), indium (In), phosphorus (P), or arsenic (As), and a material of thegrowth substrate 101 can be gallium arsenide (GaAs). Thefirst semiconductor layer 102, theactive layer 104, thesecond semiconductor layer 106 are epitaxially grown on thegrowth substrate 101. Herein, thefirst semiconductor layer 102 can be an n-type semiconductor, thesecond semiconductor layer 106 can be a p-type semiconductor, and a structure of the light-emitting stack 108 includes a single heterostructure (SH), a double-side double heterostructure (DDH), or multi-quantum well (MQW) structure. - Referring to
FIG. 1B , adepression 105 is formed, penetrates thesecond semiconductor layer 106 and theactive layer 104, and exposes thefirst semiconductor layer 102. Thedepression 105 has a pattern and anelectrode 110 which is corresponding to the pattern is formed in thedepression 105. Afterwards, aconductive layer 112 is formed on thesecond semiconductor layer 106. Herein, theelectrode 110 electrically connects with only thefirst semiconductor layer 102, and in a cross-sectional view, there is a gap between two sides of theelectrode 110 and thedepression 105 so theelectrode 110 is insulated from theactive layer 104 and thesecond semiconductor layer 106. Theconductive layer 112 has ohmic contact with thesecond semiconductor layer 106 and can be a transparent conductive layer, such as indium tin oxide (ITO), indium zinc oxide (IZO) or aluminum-doped zinc oxide (A ZO), or metal material, such as, nickel (Ni), platinum (Pt), palladium (Pd), silver (Ag), or chromium (Cr). Theelectrode 110 can be aluminum (Al), titanium (Ti), chromium (Cr), platinum (Pt), gold (Au), or combinations thereof. - Referring to
FIG. 1C , abarrier 116 covering theconductive layer 112 and aninsulative structure 114 covering theelectrode 110 are formed. Thebarrier 116 covers all surface of theconductive layer 112 except the region contacting thesecond semiconductor layer 106. The pattern of theinsulative structure 114 is substantially corresponding to the pattern of theelectrode 110 while theinsulative structure 114 fills a space between theelectrode 110 and thedepression 105. Theupper surface 114 a of theinsulative structure 114 and theupper surface 116 a of thebarrier 116 are coplanar and thebarrier 116 horizontally surrounds theinsulative structure 114, except the portion in thedepression 105. Theinsulative structure 114 includes transparent material and is formed by evaporating, sputtering, or spin-on glass (SOG) to form single-layer of SiO2, single-layer of TiO2, or single-layer of Si3N4 and then solidifying. Thebarrier 116 can be single-layer or multi-layer structure and includes titanium (Ti), tungsten (W), platinum (Pt), titanium tungsten (TiW) or combinations thereof. - Referring to
FIG. 1D , areflective layer 118 is formed on a plane on which theupper surface 114 a of theinsulated layer 114 and theupper surface 116 a of thebarrier 116 lie. Thereflective layer 118 can include aluminum (Al). - Referring to
FIG. 1E , aconductive substrate 122 is provided and connects to ametal layer 118 via a joiningstructure 120. The joiningstructure 120 includes gold (Au), indium (In), nickel (Ni), titanium (Ti), or combinations thereof. Consequentially, a process of removing thegrowth substrate 101 is performed. Theconductive substrate 122 includes a semiconductor material, such as silicon (Si), or a metal material, such as, cobalt (Cu), tungsten (W), or aluminum (Al). Moreover, a surface of theconductive substrate 122 can be graphene. - Referring to
FIG. 1F , a laser ray (not shown inFIG. 1F ) is provided to a back surface of thegrowth substrate 101 to dissolve abuffer layer 103 by energy from the laser ray. For example, when thebuffer layer 103 is non-doped or unintentional-doped GaN, the energy from the laser ray can evaporate nitrogen in gallium nitride (GaN), so as to dissolve thebuffer layer 103 and remove thegrowth substrate 101 so thefirst semiconductor 102 is exposed. - Referring to
FIG. 1G , the remainingbuffer layer 103 on thefirst semiconductor layer 102 is further removed. When thebuffer layer 103 is non-doped or unintentional-doped gallium nitride, because the nitrogen in gallium nitride has been evaporated in the abovementioned process by the laser ray, a cleaning step is performed to mainly remove the remaining gallium in the step by inductively coupled plasma (ICP), and the surface of the first semiconductor layer can be further cleaned by HCl or H2O2. - Referring to
FIG. 1H , a roughed structure 126 is formed on the first surface 102 a of thefirst semiconductor layer 102 by etching. The roughed structure 126 can have a regular or irregular rough surface with a roughness of 0.5˜1 μm, and anopening 124 is formed by removing a portion of thefirst semiconductor layer 102 which is on theelectrode 110. Thedepression 105 has width W1 greater than a width W2 of theopening 124, and therefore, after thedepression 105 and the opening are formed in sequence, asecond surface 102 d opposite to the first surface 102 a is formed at the bottom of thefirst semiconductor layer 102 connecting to thedepression 105, and theelectrode 110 connects to thesecond surface 102 d and is formed in thedepression 105 corresponding to theopening 124 wherein the electrode has a width W3 greater than the width W2. Theupper surface 110 a of theelectrode 110 has acontact area 110 b connecting to thesecond surface 102 d of thefirst semiconductor layer 102 and an exposedarea 110 c exposed by theopening 124. A thickness of thefirst semiconductor 102 can be 3˜4 μm while thefirst semiconductor 102 has afirst portion 102 b and asecond portion 102 c. The thickness of thefirst portion 102 b is about equal to the depth of theopening 124, which is about 1.5˜3 μm. The thickness of thesecond portion 102 c corresponding to thedepression 105 is about 1˜1.5 μm. Because theelectrode 110 electrically connects to thefirst semiconductor layer 102 while is not formed on the first surface 102 a, theelectrode 110 does not shield the light from the light-emittingdevice 100. - With the abovementioned processes, the light-emitting
device 100 disclosed in the embodiment includes theconductive substrate 122; the joiningstructure 120 formed on theconductive substrate 122; thereflective layer 118 formed on the joiningstructure 120; theconductive structure 117 including thebarrier 116 formed on a portion of thereflective layer 118, and theconductive layer 112 covered by thebarrier 116; the light-emittingstack 108 including the firstsemiconducting layer 102, theactive layer 104, and the secondsemiconducting layer 106 electrically connecting with theconductive layer 112; theinsulative structure 114 formed on a portion of thereflective layer 118 and penetrating the secondsemiconducting layer 106, theactive layer 104, and thesecond part 102 c of the firstsemiconducting layer 102; theelectrode 110 covered by theinsulative structure 124 wherein theupper surface 110 a of theelectrode 110 connects to the firstsemiconducting layer 102; and theopening 124 penetrating thefirst portion 102 b of the firstsemiconducting layer 102. Herein, theinsulative structure 114 insulates theelectrode 110 from thesecond semiconductor 106 and theactive layer 104, and theelectrode 110 and theactive layer 104 are on different regions along the horizontal direction of the light-emittingdevice 100 while the wholeactive layer 104 is located above theconductive structure 117. Therefore, the light from theactive layer 104 is not shielded by theelectrode 110 of the light-emittingdevice 100 and theconductive structure 117. Theupper surface 110 a of theelectrode 110 can be connected with an external power source. -
FIG. 2 illustrates a light-emitting device in accordance with a second embodiment of the application. The second embodiment and the first embodiment are similar, but the difference between them is that awiring electrode 211 is formed on anelectrode 210 and thewiring electrode 211 is in anopening 204 for a soldering ball for wiring (not shown inFIG. 2 ). -
FIG. 3 illustrates a light-emitting device in accordance with a third embodiment of the application. The third embodiment is similar to the aforementioned embodiments, but the differences between them are mentioned as follows. Aconductive layer 308 which electrically connects with asecond semiconductor layer 306 is a transparent conductive layer without reflectivity, such as indium tin oxide (ITO), indium zinc oxide (IZO), or aluminum-doped zinc oxide (Al ZO), and there is no barrier as shown in the first embodiment. An insulative structure 314 can include an insulative layer 314 a between a light-emitting stack 310 and areflective layer 318, and an insulative portion 314 b covers the electrode 311. A plurality ofconductive channels 316 penetrates the insulative layer 314 a and connects theconductive layer 308 and thereflective layer 318 by its two ends respectively. A joiningstructure 320 and aconductive substrate 322 same as those described in the first embodiment are below thereflective layer 318. Theconductive channel 316 can be a metal well to fill pores like titanium (Ti), aluminum (Al), nickel (Ni), chromium (Cr), or copper (Cu). The insulative structure 314 can be a transparent insulative material and is formed by evaporating, sputtering, or spin-on glass (SOG) to form single-layer of SiO2, single-layer of TiO2, or single-layer of Si3N4, and then solidifying or alternatively stacking two different films with different index of refraction to form a distributed Bragg reflector (DBR). -
FIG. 4 illustrates an electrode layout of the light-emitting device in accordance with the first embodiment of the application. The electrode layout can also be utilized in the second embodiment and the third embodiment. In the embodiment, it shows only patterns of theelectrode 110 and theconductive structure 117 for clearly showing the pattern of the electrode. From top view, theconductive substrate 122 of the light-emittingdevice 100 is a rectangle with a size of 1 mil to 70 mils. The electrode disclosed in the embodiment includes awiring electrode 110 and anextensive electrode 111 extending from thewiring electrode 110. Thewiring electrode 110 is located near a corner of the rectangle of the light-emittingdevice 100, and theextensive electrode 111 includes a firstextensive electrode 111 b along outer edges of the light-emittingdevice 100 and a secondextensive electrode 111 a surrounding by and connecting to the firstextensive electrode 111 b. The firstextensive electrode 111 b and thesecond electrode 111 a form another rectangle. Thewiring electrode 110, and/or theextensive electrode 111, and theconductive structure 117 are formed on different regions of theconductive substrate 122 and do not overlap with one another. Therefore, theconductive structure 117 as shown in the region with slash lines substantially complements the patterns of thewiring electrode 110 and theextensive electrode 111. -
FIG. 5 shows an electrode layout of a light-emitting device in accordance with a fourth embodiment of the application. The electrode layout can be utilized in the first embodiment to the third embodiment.FIG. 5 illustrates only the electrodes and the conductive structure of the above-mentioned embodiment for clearly showing patterns on the electrodes. From top view, aconductive substrate 522 of a light-emittingdevice 500 is a rectangle. The electrodes shown in the embodiment include awiring electrode 510 and anextensive electrode 511 extending from thewiring electrode 510. Thewiring electrode 510 is substantially located at a geometric center of the light-emittingdevice 500 and theextensive electrode 511 optionally includes a plurality of radial branches extending from thewiring electrode 510. Thewiring electrode 510, and/or theextensive electrode 511, and aconductive structure 517 are formed on different regions of theconductive substrate 522 and do not overlap with one another. Therefore, theconductive structure 517 as shown in the region with slash lines substantially complements the pattern formed by thewiring electrode 510 and theextensive electrode 511. -
FIG. 6 shows an electrode layout of a light-emitting device in accordance with a fifth embodiment of the application. The electrode layout can be utilized in the first embodiment to the third embodiment. From top view, aconductive substrate 622 of a light-emittingdevice 600 is a rectangle. The electrodes disclosed in the embodiment include awiring electrode 610 and anextensive electrode 611 extending from thewiring electrode 610. Thewiring electrode 610 is substantially located at a geometric center of the light-emittingdevice 600 and theextensive electrode 611 includes a plurality of radial branches extending from thewiring electrode 610. In comparison with the fifth embodiment, there are more radial branches in the embodiment and lengths of the radial branches vary with their extended directions. For example, a length of the radial branch of theextensive electrode 611 along a diagonal of the rectangle of the light-emittingdevice 600 is longer than a length of the radial branch along a side of the rectangle. Thewiring electrode 610, and/or theextensive electrode 611, and aconductive structure 617 are formed on different regions of theconductive substrate 622 and do not overlap with one another. Therefore, theconductive structure 617 as shown in the region with slash lines complements the pattern formed by thewiring electrode 610 andextensive electrode 611. -
FIG. 7 illustrates an electrode layout of a light-emitting device in accordance with a sixth embodiment of the application. The electrode layout can be utilized in the first embodiment to the third embodiment. From top view, aconductive substrate 722 of a light-emittingdevice 700 is a rectangle. The electrodes disclosed in the embodiment include awiring electrode 710 and anextensive electrode 711 extending from thewiring electrode 710. Thewiring electrode 710 is substantially located at a corner of the rectangle of the light-emittingdevice 700, and theextensive electrode 711 includes a plurality of radial branches extending from thewiring electrode 710 with lengths that vary with their extensive angles respectively. Thewiring electrode 710, and/or theextensive electrode 711, and aconductive structure 717 are formed on different regions of theconductive substrate 722 and do not overlap with one another. Therefore, theconductive structure 717 as shown in the region with slash lines substantially complements the pattern formed by thewiring electrode 710 andextensive electrode 711. -
FIG. 8 illustrates an electrode layout of a light-emitting device in accordance with a seventh embodiment of the application. The electrode layout can be utilized in the first embodiment to the third embodiment. From top view, aconductive substrate 822 of a light-emittingdevice 800 is a rectangle. The electrodes disclosed in the embodiment includewiring electrodes device 800, anextensive electrode 811 includingradial branches wiring electrode radial branch 811 c connecting to thewiring electrodes radial branch 811 d extending from theradial branch 811 c and parallel to theradial branches wiring electrode extensive electrode 811, and theconductive structure 817 are formed on different regions of theconductive substrate 822 and do not overlap with one another, and therefore theconductive structure 817 as shown in the region with slash lines substantially complements the patterns of thewiring electrode extensive electrode 811. -
FIG. 9 it illustrates an electrode layout of a light-emitting device in accordance with an eighth embodiment of the application. The electrode layout can be utilized in the first embodiment to the third embodiment. From top view, aconductive substrate 922 of a light-emittingdevice 900 is a rectangle. The electrodes disclosed in the embodiment includewiring electrodes device 900 and anextensive electrode 911 includingradial branches wiring electrodes radial branches wiring electrodes radial branches wiring electrodes extensive electrode 911, and theconductive structure 917 are formed on different regions of theconductive substrate 922 and do not overlap with one another. Therefore, theconductive structure 917 as shown in the region with slash lines substantially complements the patterns of the wiring electrode 910 andextensive electrode 911. -
FIG. 10 illustrates an electrode layout of a light-emitting device in accordance with a ninth embodiment of the application. The electrode layout can be utilized in the first embodiment to the third embodiment. From top view, aconductive substrate 1022 of the light-emitting device is a rectangle. The electrodes disclosed in the embodiment include twowiring electrodes conductive substrate 1022, and anextensive electrode 1011 including a firstradial branch 1011 a along the rectangle of the conductive substrate 1002 and connecting to thewiring electrodes radial branch 1011 b connecting to two opposite sides of the rectangle of the firstradial branch 1011 a and forming a net pattern with the firstradial branch 1011 a. The wiring electrode 1010, and/or theextensive electrode 1011, and theconductive structure 1017 are formed on different regions of theconductive substrate 1022 and do not overlap with one another. Therefore, theconductive structure 1017 as shown in the region with slash lines substantially complements the patterns of the wiring electrode 1010 andextensive electrode 1011. -
FIG.11 illustrates a light-emitting array in accordance with a tenth embodiment of the application. The light-emittingarray 1100 includes aninsulative substrate 1110 including anupper surface 1110 a, a joininglayer 1124 formed on theupper surface 1110 a and being insulative, aninsulative layer 1114 formed on the joininglayer 1124, a plurality of light-emittingunits 112 formed on theinsulative layer 1114, wherein each of the light-emittingunits 112 includes afirst surface 1113 and asecond surface 1115. Thefirst surface 1113 has a first polarity, and the second surface 115 is toward to theinsulative substrate 1110 opposite to thefirst surface 1113 and includes afirst region 1115 a with the first polarity and asecond region 1115 b with a second polarity. A plurality ofwires 1116 is embedded in theinsulative layer 1114 and electrically connecting with two of the light-emittingunits 1112, for example, connecting to thesecond region 1115 b of at least one of the light-emittingunits 1112 and thefirst region 1115 a of another one of the light-emittingunits 1112. Afirst electrode 1118 is formed on theinsulative layer 1114, electrically connecting with thefirst region 1115 a of one of the light-emittingunits 1112, and located in different region than that of the light-emittingunits 1112 on theinsulative layer 1114. Asecond electrode 1120 is formed on theinsulative layer 1114, electrically connecting with thesecond region 1115 b of one of the light-emittingunits 1112, and located in different region than that of the light-emittingunits 1112 on theinsulative layer 1114. - The light-emitting
units 1112 are epitaxially grown on the same wafer (not shown in figures). After epitaxially growth, thefirst surface 1113 connects to the wafer and thesecond surface 1115 faces up. Thefirst region 1115 a and thesecond region 1115 b of thesecond surface 1115 can be defined by an etching process as the light-emittingunits 1112 are not defined yet. After carrying the light-emittingunit 1112 on theinsulative substrate 1110 via the joininglayer 1124, the wafer can be removed and thefirst surface 1113 is exposed. In sequence, a plurality of the light-emittingunits 1112 electrically insulated from one another can be formed from thefirst surface 1113 by an etching process. Additionally, thefirst surface 1113 similar to the one in the first embodiment is a rough surface. - The
insulative layer 1114 can include afirst insulative layer 1114 a and asecond insulative layer 1114 b and is made of silicon oxide SiO2, for example. Thefirst insulative layer 1114 a can cover thefirst region 1115 a and thesecond region 1115 b of thesecond surface 1115 to form a surface substantially parallel to theupper surface 1110 a of theinsulative substrate 1110. Thewire 1116 includes aconductive channel 1116 a penetrating thefirst insulative layer 1114 a for electrically connecting with thefirst region 1115 a or thesecond region 1115 b, and abridge 1116 b laterally extending along a surface of thefirst insulative layer 1114 a and connecting to theconductive channels 1116 a of the neighboring light-emittingunits 1112. Thebridge 1116 b can connect to identical/different polarities of two different light-emittingunits 1112 for forming a serial/parallel/in inverse-parallel connection. Thesecond insulative layer 1114 b can cover theinsulative layer 1114 a and thebridge 1116 b. - The light-emitting
unit 1112 includes afirst semiconductor layer 1101 having thefirst surface 1113 and thefirst region 1115 a of thesecond surface 1115, asecond semiconductor layer 1102 having thesecond region 1115 b of thesecond surface 1115, and anactive layer 1103 between thefirst semiconductor layer 1101 and thesecond semiconductor layer 1102. Thefirst semiconductor layer 1101 has the first polarity and thesecond semiconductor layer 1102 has the second polarity different from the first polarity. In the embodiment, the first polarity of thefirst semiconductor layer 1101 is n-type; the second polarity of thesemiconductor layer 1102 is p-type. Thefirst region 1115 a of thesecond surface 1115 is farther from theinsulative substrate 1110 than thesecond region 1115 b to expose thefirst semiconductor layer 1101. Theinsulative layer 1114 covers thesecond surface 1115 and fills a convex-concave structure formed by thefirst region 1115 a and thesecond region 1115 b. There can be multiplefirst regions 1115 a of the light-emittingunit 1112 which connect to a plurality of theconductive channels 1116 a, and lateral sides of theconductive channels 1116 a which connect to thefirst regions 1115 a are covered by thefirst insulative layer 1114 a so as to be electrically insulated from thesecond region 1115 b of thesecond semiconductor 1102 of the individual light-emittingunit 1112. Similar to the first embodiment, aconductive layer 1104 with reflectivity and abarrier 1105 covering theconductive layer 1104 can be formed on thesecond region 1115 b. Thefirst electrode 1118 can electrically connect with thefirst region 1115 a of the light-emittingunit 1112 via thebridge 1116 b; thesecond electrode 1120 can electrically connect with thesecond region 1115 b of the light-emittingunit 1112 via thebarrier 1105. Thebridge 1116 b connecting to thefirst electrode 1118 is co-planar with a first exposingsurface 1114 c of thesecond insulative layer 1114 b; thebarrier 1105 connecting to thesecond electrode 1120 is co-planar with a second exposingsurface 1114 d of thefirst insulative layer 1114 a wherein the first exposingsurface 1114 c is closer to theinsulative substrate 1110 than the second exposingsurface 1114 d. A light-emittingarray 1100 including a circuit in series/in parallel/in inversed-parallel can be formed between thefirst electrode 1118 and thesecond electrode 1120. - Light from each of the light-emitting
unit 1112 emits out of thefirst surface 1113, thewires 1116 are located below all of the light-emittingunits 1112, and thefirst electrode 1118 and thesecond electrode 1120 are side by side with all of the light-emittingunits 1112. Accordingly, the light is not shaded by thewires 1116, thefirst electrode 1118, and thesecond electrode 1120 disclosed in the embodiment. -
FIG. 12 illustrates a light-emitting array in accordance with an eleventh embodiment of the application. The embodiment is similar to the tenth embodiment but the differences are as follows. Each of light-emitting units 1222 disclosed in the embodiment is similar to those in the first embodiment, afirst region 1215 a and asecond region 1215 b can have patterns as shown inFIG. 4 toFIG. 10 . Thefirst region 1215 a of each of the light-emitting units 1222 has only aconductive channel 1216 a connecting to abridge 1216 b, and a cross section of theconductive channel 1216 a is bigger than that of the tenth embodiment, wherein two of the conductive channels 1216 respectively electrically connect with thefirst region 1215 a of one of the light-emittingunit 1212 and thesecond region 1215 b of another one of the light-emittingunit 1212 and extend to a surface of asecond insulative layer 1214 b devoid of the light-emittingunits 1212. Afirst electrode 1218 and asecond electrode 1220 can be formed on two of the conductive channels 1216. A light-emittingarray 1200 including a circuit in series/in parallel/in inversed-parallel can be formed between thefirst electrode 1218 and thesecond electrode 1220. -
FIG. 13 illustrates a light-emitting array in accordance with a twelfth embodiment of the application. The embodiment is similar to the tenth embodiment but the differences are as follows. Aconductive substrate 1310 disclosed in the embodiment replaces the insulative substrate disclosed in the tenth embodiment; a conductive joininglayer 1324 replaces the insulative joining layer disclosed the tenth embodiment. Additionally,conductive channels 1316 a are connected to afirst region 1315 a of a light-emittingunit 1312, penetrate afirst insulative layer 1314 a and asecond insulative layer 1314 b, and electrically connect with a conductive joininglayer 1324. Anelectrode 1320 electrically connects with asecond region 1315 b of the light-emittingunit 1312, and a light-emittingarray 1300 including a circuit in series/in parallel/in inverse-parallel can be formed between theelectrode 1320 and theconductive substrate 1310. As the tenth embodiment recited, thefirst region 1315 a has the n-type polarity and thesecond region 1315 b has the p-type polarity. Accordingly, for the embodiment, the n-type polarity is conducted to theconductive substrate 1310. In other embodiments, the p-type polarity can be conducted to theconductive substrate 1310. The material of theconductive substrate 1310 can be referred those disclosed in the first embodiment. -
FIG. 14 illustrates a light-emitting array in accordance with a thirteenth embodiment of the application. The embodiment is similar to the eleventh embodiment but the differences are as follows. Aconductive substrate 1410 disclosed in the embodiment replaces the insulative substrate of the eleventh embodiment, and a conductive joining layer 142 disclosed in the embodiment replaces the joining layer of the eleventh embodiment. Aconductive channel 1416 b connects to asecond region 1415 b of a light-emittingunit 1412, penetrates afirst insulative layer 1414 a and asecond insulative layer 1414 b, and electrically connects with a conductive joininglayer 1424. Anelectrode 1418 electrically connects with afirst region 1415 a of the light-emittingunit 1412 and a light-emittingarray 1400 including a circuit in series/in parallel/in inverse-parallel can be formed between theelectrode 1418 and theconductive substrate 1410. As the tenth embodiment recited, thefirst region 1415 a has the n-type polarity and thesecond region 1415 b has the p-type polarity. Accordingly, in the embodiment, the p-type polarity is conducted to theconductive substrate 1410; in other embodiments, the n-type polarity can be conducted to theconductive substrate 1410. The material of theconductive substrate 1410 can be referred to those disclosed in the first embodiment. - The principle and the efficiency of the present application illustrated by the embodiments above are not the limitation of the application. Any person having ordinary skill in the art can modify or change the aforementioned embodiments. Therefore, the protection range of the rights in the application will be listed as the following claims.
Claims (20)
1. A light-emitting device, comprising:
a light-emitting stack comprising a first semiconductor layer, a second semiconductor layer, and an active layer between the first semiconductor layer and the second semiconductor layer, wherein the first semiconductor layer comprises a first surface, a second surface opposite to the first surface, a first portion connecting to the first surface, and a second portion connecting to the first portion;
an opening penetrating the first portion of the first semiconductor from the first surface and having a first width;
a depression connecting to the opening and penetrating the second semiconductor layer, the active layer, and the second portion of the first semiconductor layer, wherein the depression has a second width greater than the first width and comprises a bottom to expose the second surface; and
an electrode located in the depression and corresponding to the opening.
2. The light-emitting device of claim 1 , further comprising an insulative structure filling the depression and covering the electrode.
3. The light-emitting device of claim 2 , wherein the electrode is connected to the second surface.
4. The light-emitting device of claim 3 , further comprising a wiring electrode formed in the depression and connecting to the electrode.
5. The light-emitting device of claim 3 , wherein the insulative structure separates the electrode, the active layer, and the second semiconductor layer.
6. The light-emitting device of claim 2 , further comprising a conductive structure connecting to the second semiconductor layer wherein the conductive structure comprises a conductive layer electrically connecting with the second semiconductor layer and a barrier covering the second semiconductor layer.
7. The light-emitting device of claim 6 , wherein the conductive layer is a metal having reflectivity and comprising nickel (Ni), platinum (Pt), palladium (Pd), silver (Ag), chromium (Cr), or combinations thereof, and the barrier comprises titanium (Ti), tungsten (W), platinum (Pt), titanium tungsten (TiW), or combinations thereof.
8. The light-emitting device of claim 6 , wherein the insulative structure is below the second semiconductor and the conductive structure comprises conductive channels penetrating the insulative layer and connecting to the second semiconductor layer.
9. The light-emitting device of claim 6 , further comprising a metal reflective layer below the conductive structure and the insulative structure, a conductive joining layer below the metal reflective layer, and a conductive substrate below the conductive joining layer.
10. The light-emitting device of claim 1 , wherein the electrode comprises at least one of wiring electrodes and an extensive electrode extending from the wiring electrode.
11. The light-emitting device of claim 10 , wherein the wiring electrode is located at a corner of the light-emitting device, and the extensive electrode extends in a direction far away from the wiring electrode, or the wiring electrode is located at a corner of the light-emitting device, and the extensive electrode extends along surroundings of the light-emitting device, or the wiring electrode is located at a geometric center of the light-emitting device and the extensive electrode comprises a plurality of radial branches extending from the wiring electrode, or the wiring electrode comprises a first electrode and a second electrode on a side of the light-emitting device, and the extensive electrode comprises a plurality of radial branches extending from the first electrode and the second electrode to an opposite side, opposite to the side, and a connective electrode connecting with the first electrode and the second electrode.
12. The light-emitting device of claim 1 , wherein the first surface of the first semiconductor layer is devoid of a structure shielding light emitted from the active layer
13. The light-emitting device of claim 1 , wherein the first semiconductor layer comprises an n-type semiconductor layer and the second semiconductor layer comprises a p-type semiconductor layer.
14. The light-emitting device of claim 1 , wherein a size of the light-emitting device is 1 mil to 70 mils.
15. A light-emitting array, comprising:
a substrate comprising an upper surface;
a plurality of light-emitting units on the upper surface of the substrate wherein each of the light-emitting units comprises a first surface and a second surface opposite to the first surface toward to the upper surface;
an insulative layer between the substrate and the light-emitting units and covering the second surface of each of the light-emitting units; and
a wire embedded in the insulative layer, wherein the wire comprises a conductive channel, penetrating the insulative layer and electrically connecting with the second surface and a bridge connecting with the conductive channel, and the bridge electrically connects with two of the light-emitting units via the conductive channel.
16. The light-emitting array of claim 15 , wherein the first surface has a first polarity, the second surface comprises a first region with the first polarity and a second region nearer the upper surface than the first region with a second polarity, and the conductive channel electrically connects with the first region or the second region.
17. The light-emitting array of claim 16 , wherein the substrate is a conductive substrate, and one of the light-emitting units comprises the conductive channel electrically connecting the second region with the conductive substrate or electrically connecting the first region with the conductive substrate.
18. The light-emitting array of claim 16 , further comprising a conductive joining layer between the conductive substrate and the insulative layer.
19. The light-emitting array of claim 16 , wherein each of the light emitting units comprises a plurality of the first regions and each of the first regions connects to a plurality of conductive channels.
20. The light-emitting array of claim 16 , further comprising an electrode on a surface of the insulative layer opposite to the upper surface, located outside each of the light-emitting units, and electrically connecting with the bridge which electrically connects with the first region or the second region of one of the light-emitting units.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/294,256 US10297718B2 (en) | 2013-06-20 | 2016-10-14 | Light-emitting device |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW102122124 | 2013-06-20 | ||
TW102122124 | 2013-06-20 | ||
TW103115304 | 2014-04-28 | ||
TW103115304A TWI661578B (en) | 2013-06-20 | 2014-04-28 | Light-emitting device and light-emitting array |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US15/294,256 Continuation US10297718B2 (en) | 2013-06-20 | 2016-10-14 | Light-emitting device |
Publications (1)
Publication Number | Publication Date |
---|---|
US20140374779A1 true US20140374779A1 (en) | 2014-12-25 |
Family
ID=52010585
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US14/301,492 Abandoned US20140374779A1 (en) | 2013-06-20 | 2014-06-11 | Light-emitting device and light-emitting array |
US15/294,256 Active US10297718B2 (en) | 2013-06-20 | 2016-10-14 | Light-emitting device |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US15/294,256 Active US10297718B2 (en) | 2013-06-20 | 2016-10-14 | Light-emitting device |
Country Status (3)
Country | Link |
---|---|
US (2) | US20140374779A1 (en) |
DE (1) | DE102014108570A1 (en) |
TW (1) | TWI661578B (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016198686A1 (en) * | 2014-06-14 | 2016-12-15 | Hiphoton Co., Ltd. | Light engine array |
US20170288102A1 (en) * | 2016-04-04 | 2017-10-05 | Glo Ab | Through backplane laser irradiation for die transfer |
US10177123B2 (en) | 2014-12-19 | 2019-01-08 | Glo Ab | Light emitting diode array on a backplane and method of making thereof |
US10312408B2 (en) | 2016-10-06 | 2019-06-04 | Lextar Electronics Corporation | Light emitting diode chip scale packaging structure and direct type backlight module |
US10903406B2 (en) | 2015-07-28 | 2021-01-26 | Osram Oled Gmbh | Housing comprising a semiconductor body and a method for producing a housing with a semiconductor body |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI699906B (en) * | 2015-01-16 | 2020-07-21 | 晶元光電股份有限公司 | Semiconductor light-emitting device |
TWI587543B (en) * | 2015-12-15 | 2017-06-11 | 李乃義 | Light emitting diode packaging structure and method for manufacturing the same |
CN110176525B (en) * | 2019-06-10 | 2021-08-27 | 苏州亮芯光电科技有限公司 | Sub-wavelength vertical structure light emitting diode and preparation method thereof |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090029031A1 (en) * | 2007-07-23 | 2009-01-29 | Tyler Lowrey | Methods for forming electrodes in phase change memory devices |
US20100308347A1 (en) * | 2009-06-08 | 2010-12-09 | Industrial Technology Research Corporation | Light Emitting Device |
US20110169040A1 (en) * | 2008-09-30 | 2011-07-14 | Seoul Opto Device Co., Ltd. | Light emitting device and method of fabricating the same |
US20110233587A1 (en) * | 2010-03-24 | 2011-09-29 | Hitachi Cable, Ltd. | Light emitting diode |
US20120074441A1 (en) * | 2010-09-24 | 2012-03-29 | Seoul Semiconductor Co., Ltd. | Wafer-level light emitting diode package and method of fabricating the same |
US20120126259A1 (en) * | 2010-11-24 | 2012-05-24 | Hitachi Cable, Ltd. | Light emitting diode |
US20120168715A1 (en) * | 2010-12-29 | 2012-07-05 | National Cheng Kung University | Semiconductor light emitting device and method for manufacturing the same |
US20120199861A1 (en) * | 2011-02-09 | 2012-08-09 | Showa Denko K.K. | Semiconductor light emitting element |
US20130113007A1 (en) * | 2011-11-07 | 2013-05-09 | Woon Kyung Choi | Light emitting device |
US20130119424A1 (en) * | 2011-11-16 | 2013-05-16 | Pil Geun Kang | Light emitting device and light emitting apparatus having the same |
US8476663B2 (en) * | 2010-09-01 | 2013-07-02 | Phostek, Inc. | Semiconductor light emitting component and method for manufacturing the same |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1460694A1 (en) | 2001-11-19 | 2004-09-22 | Sanyo Electric Co., Ltd. | Compound semiconductor light emitting device and its manufacturing method |
US6828596B2 (en) | 2002-06-13 | 2004-12-07 | Lumileds Lighting U.S., Llc | Contacting scheme for large and small area semiconductor light emitting flip chip devices |
JP2004281581A (en) | 2003-03-13 | 2004-10-07 | Rohm Co Ltd | Semiconductor light emitting element |
JP4353167B2 (en) | 2004-10-21 | 2009-10-28 | 日亜化学工業株式会社 | Semiconductor light emitting device and manufacturing method thereof |
JP4911347B2 (en) | 2006-08-03 | 2012-04-04 | 日立電線株式会社 | Semiconductor light emitting device |
WO2009152062A2 (en) * | 2008-06-09 | 2009-12-17 | Nitek, Inc. | Ultraviolet light emitting diode with ac voltage operation |
KR100818466B1 (en) | 2007-02-13 | 2008-04-02 | 삼성전기주식회사 | Light emitting devices |
DE102007022947B4 (en) | 2007-04-26 | 2022-05-05 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelectronic semiconductor body and method for producing such |
TWI416754B (en) | 2007-07-19 | 2013-11-21 | Epistar Corp | Light emitting device |
KR100891761B1 (en) | 2007-10-19 | 2009-04-07 | 삼성전기주식회사 | Semiconductor light emitting device, manufacturing method thereof and semiconductor light emitting device package using the same |
JP2009260316A (en) | 2008-03-26 | 2009-11-05 | Panasonic Electric Works Co Ltd | Semiconductor light-emitting element and illuminating apparatus using the same |
DE102008034560B4 (en) | 2008-07-24 | 2022-10-27 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Radiation-emitting semiconductor chip and method for producing a radiation-emitting semiconductor chip |
US8008683B2 (en) | 2008-10-22 | 2011-08-30 | Samsung Led Co., Ltd. | Semiconductor light emitting device |
US8809893B2 (en) * | 2008-11-14 | 2014-08-19 | Samsung Electronics Co., Ltd. | Semiconductor light emitting device |
DE102009006177A1 (en) | 2008-11-28 | 2010-06-02 | Osram Opto Semiconductors Gmbh | Radiation-emitting semiconductor chip |
KR100986570B1 (en) * | 2009-08-31 | 2010-10-07 | 엘지이노텍 주식회사 | Semiconductor light emitting device and fabrication method thereof |
TWI414088B (en) * | 2009-12-16 | 2013-11-01 | Epistar Corp | Light-emitting device and the manufacturing method thereof |
DE102010034665A1 (en) * | 2010-08-18 | 2012-02-23 | Osram Opto Semiconductors Gmbh | Optoelectronic semiconductor chip and method for producing optoelectronic semiconductor chips |
JP2012084779A (en) | 2010-10-14 | 2012-04-26 | Hitachi Cable Ltd | Semiconductor light-emitting element |
JP2012218753A (en) | 2011-04-06 | 2012-11-12 | Lintec Corp | Sheet application apparatus and adjustment method thereof |
JP2013098516A (en) | 2011-11-07 | 2013-05-20 | Stanley Electric Co Ltd | Semiconductor light emitting device and manufacturing method of the same |
DE102011056888A1 (en) | 2011-12-22 | 2013-06-27 | Osram Opto Semiconductors Gmbh | Display device and method for producing a display device |
JP5953155B2 (en) | 2012-02-24 | 2016-07-20 | スタンレー電気株式会社 | Semiconductor light emitting device |
KR102098110B1 (en) * | 2013-04-11 | 2020-04-08 | 엘지이노텍 주식회사 | Light emitting device, light emitting device package, and light unit |
-
2014
- 2014-04-28 TW TW103115304A patent/TWI661578B/en active
- 2014-06-11 US US14/301,492 patent/US20140374779A1/en not_active Abandoned
- 2014-06-18 DE DE102014108570.1A patent/DE102014108570A1/en active Pending
-
2016
- 2016-10-14 US US15/294,256 patent/US10297718B2/en active Active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090029031A1 (en) * | 2007-07-23 | 2009-01-29 | Tyler Lowrey | Methods for forming electrodes in phase change memory devices |
US20110169040A1 (en) * | 2008-09-30 | 2011-07-14 | Seoul Opto Device Co., Ltd. | Light emitting device and method of fabricating the same |
US20100308347A1 (en) * | 2009-06-08 | 2010-12-09 | Industrial Technology Research Corporation | Light Emitting Device |
US20110233587A1 (en) * | 2010-03-24 | 2011-09-29 | Hitachi Cable, Ltd. | Light emitting diode |
US8476663B2 (en) * | 2010-09-01 | 2013-07-02 | Phostek, Inc. | Semiconductor light emitting component and method for manufacturing the same |
US20120074441A1 (en) * | 2010-09-24 | 2012-03-29 | Seoul Semiconductor Co., Ltd. | Wafer-level light emitting diode package and method of fabricating the same |
US20120126259A1 (en) * | 2010-11-24 | 2012-05-24 | Hitachi Cable, Ltd. | Light emitting diode |
US20120168715A1 (en) * | 2010-12-29 | 2012-07-05 | National Cheng Kung University | Semiconductor light emitting device and method for manufacturing the same |
US20120199861A1 (en) * | 2011-02-09 | 2012-08-09 | Showa Denko K.K. | Semiconductor light emitting element |
US20130113007A1 (en) * | 2011-11-07 | 2013-05-09 | Woon Kyung Choi | Light emitting device |
US20130119424A1 (en) * | 2011-11-16 | 2013-05-16 | Pil Geun Kang | Light emitting device and light emitting apparatus having the same |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016198686A1 (en) * | 2014-06-14 | 2016-12-15 | Hiphoton Co., Ltd. | Light engine array |
US10177123B2 (en) | 2014-12-19 | 2019-01-08 | Glo Ab | Light emitting diode array on a backplane and method of making thereof |
US10304810B2 (en) | 2014-12-19 | 2019-05-28 | Glo Ab | Method of making a light emitting diode array on a backplane |
US10903406B2 (en) | 2015-07-28 | 2021-01-26 | Osram Oled Gmbh | Housing comprising a semiconductor body and a method for producing a housing with a semiconductor body |
US20170288102A1 (en) * | 2016-04-04 | 2017-10-05 | Glo Ab | Through backplane laser irradiation for die transfer |
US10193038B2 (en) * | 2016-04-04 | 2019-01-29 | Glo Ab | Through backplane laser irradiation for die transfer |
US10693051B2 (en) | 2016-04-04 | 2020-06-23 | Glo Ab | Through backplane laser irradiation for die transfer |
US10312408B2 (en) | 2016-10-06 | 2019-06-04 | Lextar Electronics Corporation | Light emitting diode chip scale packaging structure and direct type backlight module |
Also Published As
Publication number | Publication date |
---|---|
TWI661578B (en) | 2019-06-01 |
DE102014108570A1 (en) | 2014-12-24 |
TW201501360A (en) | 2015-01-01 |
US20170033265A1 (en) | 2017-02-02 |
US10297718B2 (en) | 2019-05-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10297718B2 (en) | Light-emitting device | |
US10886438B2 (en) | Manufacturing method of light-emitting device | |
US10749075B2 (en) | Semiconductor light-emitting device | |
US9391239B2 (en) | Light emitting diode | |
US9425359B2 (en) | Light emitting diode | |
US20180240793A1 (en) | Led chip having esd protection | |
KR20150139194A (en) | Light emitting diode and method of fabricating the same | |
KR20160016361A (en) | Light emitting diode and method of fabricating the same | |
KR20160025456A (en) | Light emitting diode and method of fabricating the same | |
US9466775B2 (en) | Light-emitting element and the light-emitting array having the same | |
US9548424B2 (en) | Light emitting diode | |
TW201407760A (en) | Light-emitting diode array | |
US20220231196A1 (en) | Semiconductor light-emitting device | |
KR20140117791A (en) | Light emitting diode and method of fabricating the same | |
KR101826979B1 (en) | Light emitting device and light emitting device package | |
CN109638130B (en) | Light emitting device | |
TW201817049A (en) | Semiconductor light-emitting device | |
CN110071203B (en) | Light emitting device | |
TWI657596B (en) | Manufacturing method of light-emitting device | |
KR101874508B1 (en) | Light-emitting device | |
KR101833395B1 (en) | Light-emitting device | |
TWI650881B (en) | Light-emitting device | |
JP2015015326A (en) | Light emitting device | |
KR20160054330A (en) | Light emitting device and light emitting device package thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: EPISTAR CORPORATION, TAIWAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:CHUNG, WEI-JUNG;FU, JENNHWA;LI, CHENG-HSIEN;AND OTHERS;SIGNING DATES FROM 20140522 TO 20140608;REEL/FRAME:033074/0987 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |