US20130119407A1 - Method for manufacturing semiconductor device, and semiconductor device - Google Patents
Method for manufacturing semiconductor device, and semiconductor device Download PDFInfo
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- US20130119407A1 US20130119407A1 US13/676,931 US201213676931A US2013119407A1 US 20130119407 A1 US20130119407 A1 US 20130119407A1 US 201213676931 A US201213676931 A US 201213676931A US 2013119407 A1 US2013119407 A1 US 2013119407A1
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 71
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 56
- 238000000034 method Methods 0.000 title claims abstract description 50
- 239000000758 substrate Substances 0.000 claims abstract description 82
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 47
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 47
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000001301 oxygen Substances 0.000 claims abstract description 7
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 7
- 238000010438 heat treatment Methods 0.000 claims description 24
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 7
- 239000010408 film Substances 0.000 description 142
- 210000000746 body region Anatomy 0.000 description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 18
- 239000012535 impurity Substances 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 15
- 239000010410 layer Substances 0.000 description 12
- 239000000377 silicon dioxide Substances 0.000 description 9
- 239000011229 interlayer Substances 0.000 description 8
- 230000005684 electric field Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 230000003647 oxidation Effects 0.000 description 7
- 238000007254 oxidation reaction Methods 0.000 description 7
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 6
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- JCXJVPUVTGWSNB-UHFFFAOYSA-N Nitrogen dioxide Chemical compound O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 5
- 230000001747 exhibiting effect Effects 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 5
- 239000004020 conductor Substances 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 239000001272 nitrous oxide Substances 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- 229910019213 POCl3 Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910006130 SO4 Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 description 1
- LKTZODAHLMBGLG-UHFFFAOYSA-N alumanylidynesilicon;$l^{2}-alumanylidenesilylidenealuminum Chemical compound [Si]#[Al].[Si]#[Al].[Al]=[Si]=[Al] LKTZODAHLMBGLG-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910021334 nickel silicide Inorganic materials 0.000 description 1
- RUFLMLWJRZAWLJ-UHFFFAOYSA-N nickel silicide Chemical compound [Ni]=[Si]=[Ni] RUFLMLWJRZAWLJ-UHFFFAOYSA-N 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910021341 titanium silicide Inorganic materials 0.000 description 1
Images
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
- H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02318—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
- H01L21/02321—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment introduction of substances into an already existing insulating layer
- H01L21/02329—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment introduction of substances into an already existing insulating layer introduction of nitrogen
- H01L21/02332—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment introduction of substances into an already existing insulating layer introduction of nitrogen into an oxide layer, e.g. changing SiO to SiON
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/0445—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising crystalline silicon carbide
- H01L21/048—Making electrodes
- H01L21/049—Conductor-insulator-semiconductor electrodes, e.g. MIS contacts
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
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- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
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- H01L29/045—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes
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- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/1608—Silicon carbide
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- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42356—Disposition, e.g. buried gate electrode
- H01L29/4236—Disposition, e.g. buried gate electrode within a trench, e.g. trench gate electrode, groove gate electrode
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66053—Multistep manufacturing processes of devices having a semiconductor body comprising crystalline silicon carbide
- H01L29/66068—Multistep manufacturing processes of devices having a semiconductor body comprising crystalline silicon carbide the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66674—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/66712—Vertical DMOS transistors, i.e. VDMOS transistors
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
- H01L29/7395—Vertical transistors, e.g. vertical IGBT
- H01L29/7396—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions
- H01L29/7397—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions and a gate structure lying on a slanted or vertical surface or formed in a groove, e.g. trench gate IGBT
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- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/7813—Vertical DMOS transistors, i.e. VDMOS transistors with trench gate electrode, e.g. UMOS transistors
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- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
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- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/51—Insulating materials associated therewith
- H01L29/518—Insulating materials associated therewith the insulating material containing nitrogen, e.g. nitride, oxynitride, nitrogen-doped material
Definitions
- the present invention relates to a method for manufacturing a semiconductor device, and a semiconductor device. More particularly, the present invention relates to a method for manufacturing a semiconductor device capable of stably manufacturing a semiconductor device having desired characteristics, and a semiconductor device capable of stably exhibiting a desired withstanding voltage by alleviating electric field concentration on an oxide film.
- silicon carbide is a wide band gap semiconductor having a band gap larger than that of silicon, which has been conventionally widely used as a material for semiconductor devices.
- silicon carbide is a wide band gap semiconductor having a band gap larger than that of silicon, which has been conventionally widely used as a material for semiconductor devices.
- the semiconductor device can have a high breakdown voltage, a reduced on-resistance, and the like.
- Patent Literature 1 proposes a method for manufacturing a trench gate-type MOSFET having a low threshold voltage and a high withstanding voltage by forming an oxide film with a thin film thickness on a trench side wall surface and forming an oxide film with a thick film thickness on a trench bottom surface.
- the MOSFET having a low threshold voltage and a high withstanding voltage can be manufactured by adopting a crystal plane with a slow oxidation rate as the trench side wall surface and adopting a crystal plane with a fast oxidation rate as the trench bottom surface, and utilizing dependency of the oxidation rate on plane orientation.
- the formed oxide film also has variations in its film thickness due to the dependency of the oxidation rate on the plane orientation.
- the variations in the film thickness of the oxide film also affects characteristics of the manufactured MOSFET. As a result, it becomes difficult to stably manufacture a MOSFET having desired characteristics.
- the present invention has been made in view of the aforementioned problem, and one object of the present invention is to provide a method for manufacturing a semiconductor device capable of stably manufacturing a semiconductor device having desired characteristics, and a semiconductor device capable of stably exhibiting a desired withstanding voltage by alleviating electric field concentration on an oxide film.
- a method for manufacturing a semiconductor device in accordance with the present invention includes the steps of: preparing a substrate made of silicon carbide; forming, in the substrate, a trench opened on one main surface side of the substrate; and forming an oxide film in a region including a surface of the trench.
- the substrate is heated at a temperature of not less than 1250° C. in an atmosphere containing oxygen.
- the inventor of the present invention conducted detailed studies on a measure for stably manufacturing a semiconductor device having desired characteristics. As a result, the inventor has found that dependency of an oxidation rate on plane orientation in a substrate can be reduced by setting a heating temperature for the substrate in the formation of an oxide film serving as a gate insulating film to be higher than a typical heating temperature, specifically, to not less than 1250° C., and has arrived at the present invention.
- the oxide film is formed in the region including the surface of the trench foamed in the substrate, by heating the substrate at an appropriate temperature of not less than 1250° C. Thereby, dependency of a film thickness of the formed oxide film on plane orientation of the surface of the trench is reduced.
- the oxide film having a film thickness close to a desired film thickness can be formed.
- a semiconductor device having desired characteristics such as a threshold voltage can be stably manufactured by stably foaming the oxide film having a desired film thickness in the region including the surface of the trench.
- the substrate in the step of forming the oxide film, may be heated at a temperature of not less than 1300° C. Thereby, the dependency of the film thickness of the formed oxide film on the plane orientation of the surface of the trench can be reduced further effectively.
- the substrate in the step of forming the oxide film, the substrate may be heated at a temperature of not more than 1400° C.
- the method for manufacturing a semiconductor device can be performed at an appropriate temperature of not more than 1400° C. which considers durability of manufacturing equipment and the like.
- the method for manufacturing a semiconductor device may further include the step of introducing nitrogen atoms into a region including an interface between the oxide film and the silicon carbide constituting the substrate, by heating the substrate in an atmosphere including a gas containing nitrogen atoms.
- the main surface of the substrate may be a ⁇ 0001 ⁇ plane.
- Silicon carbide can be readily grown in a ⁇ 0001> direction. Therefore, the substrate can be readily prepared by using the ⁇ 0001 ⁇ plane as the main surface of the substrate made of silicon carbide. It is noted that the state where the main surface is the ⁇ 0001 ⁇ plane refers to a state where the main surface has an off angle of not more than 8° with respect to the ⁇ 0001 ⁇ plane.
- the trench including a wall surface having an angle of 40° to 70° with respect to a ⁇ 0001 ⁇ plane may be formed.
- a semiconductor device having high channel mobility can be manufactured by forming the trench including the wall surface having an angle within the above range with respect to the ⁇ 0001 ⁇ plane and forming a channel region along the wall surface.
- a semiconductor device in accordance with the present invention includes a substrate made of silicon carbide and having a trench opened on one main surface side formed therein; and an oxide film formed to cover a surface of the trench.
- a maximum value of a film thickness of the oxide film is not more than twice a minimum value of the film thickness of the oxide film. It is noted that the film thickness of the oxide film refers to a film thickness thereof in a direction perpendicular to the surface of the trench.
- a semiconductor device capable of stably exhibiting a desired withstanding voltage by alleviating electric field concentration on an oxide film can be provided.
- a semiconductor device having desired characteristics can be stably manufactured.
- a semiconductor device capable of stably exhibiting a desired withstanding voltage by alleviating electric field concentration on an oxide film can be provided.
- FIG. 1 is a schematic cross sectional view showing a configuration of a MOSFET.
- FIG. 2 is a flowchart schematically showing a method for manufacturing the MOSFET.
- FIG. 3 is a schematic cross sectional view for illustrating the method for manufacturing the MOSFET.
- FIG. 4 is a schematic cross sectional view for illustrating the method for manufacturing the MOSFET.
- FIG. 5 is a schematic cross sectional view for illustrating the method for manufacturing the MOSFET.
- FIG. 6 is a schematic cross sectional view for illustrating the method for manufacturing the MOSFET.
- FIG. 7 is a schematic cross sectional view for illustrating the method for manufacturing the MOSFET.
- FIG. 8 is a schematic cross sectional view for illustrating the method for manufacturing the MOSFET.
- FIG. 9 is a schematic cross sectional view for illustrating the method for manufacturing the MOSFET.
- FIG. 10 is an electron microscope photograph showing a film thickness of an oxide film.
- FIG. 11 is a view showing influence of a heating temperature for a substrate on the film thickness of the oxide film.
- FIG. 12 is a view showing influence of the heating temperature for the substrate on a film thickness ratio of the oxide film.
- an individual orientation is represented by [ ]
- a group orientation is represented by ⁇ >
- an individual plane is represented by ( )
- a group plane is represented by ⁇ ⁇ .
- a negative index is supposed to be crystallographically indicated by putting “-” (bar) above a numeral, but is indicated by putting the negative sign before the numeral in the present specification.
- a MOSFET 1 as the semiconductor device in accordance with the present embodiment includes a silicon carbide substrate 10 , a silicon carbide layer 20 , an oxide film 40 , a gate electrode 41 , an interlayer insulating film 50 , a source electrode 60 , a drain electrode 70 , a source wire 61 , and a backside surface protecting electrode 71 .
- Silicon carbide layer 20 includes a drift region 21 , a body region 22 , a source region 23 , and a contact region 24 .
- Silicon carbide substrate 10 and silicon carbide layer 20 constitute a substrate 30 made of silicon carbide.
- MOSFET 1 as the semiconductor device in accordance with the present embodiment is a silicon carbide semiconductor device including substrate 30 made of silicon carbide.
- Trench 15 In substrate 30 , a trench 15 opened on one main surface 30 A side is formed.
- Trench 15 includes side wall surfaces 15 A and a bottom surface 15 B, and is formed such that each side wall surface 15 A penetrates source region 23 and body region 22 to extend over source region 23 , body region 22 , and drift region 21 , and bottom surface 15 B is positioned in drift region 21 .
- Silicon carbide substrate 10 has n type conductivity because it contains an n type impurity.
- Drift region 21 is formed on a main surface 10 A of silicon carbide substrate 10 .
- Drift region 21 has n type conductivity because it contains an n type impurity.
- the n type impurity contained in drift region 21 has a concentration value lower than that of the n type impurity contained in silicon carbide substrate 10 .
- Body region 22 is formed on a side of drift region 21 opposite to its side facing silicon carbide substrate 10 .
- Body region 22 is formed to include side wall surface 15 A, and to extend in a direction away from side wall surface 15 A while being in contact with drift region 21 .
- Body region 22 has p type conductivity because it contains a p type impurity.
- the p type impurity contained in body region 22 is, for example, Al (aluminum), B (boron), or the like.
- Source region 23 is formed on a side of body region 22 opposite to its side facing drift region 21 .
- Source region 23 is formed to include side wall surface 15 A, and to extend in the direction away from side wall surface 15 A while being in contact with body region 22 .
- Source region 23 has n type conductivity because it contains an n type impurity.
- the n type impurity contained in source region 23 has a concentration value higher than that of the n type impurity contained in drift region 21 .
- the n type impurity contained in source region 23 is, for example, P (phosphorus) or the like.
- Contact region 24 is formed to be adjacent to source region 23 while being in contact with body region 22 .
- Contact region 24 has p type conductivity because it contains a p type impurity.
- the p type impurity contained in contact region 24 has a concentration value higher than that of the p type impurity contained in body region 22 .
- the p type impurity contained in contact region 24 is, for example, Al, B, or the like, as with the p type impurity contained in body region 22 .
- Oxide film 40 is formed to cover a surface of trench 15 , that is, side wall surfaces 15 A and bottom surface 15 B, and main surface 30 A of substrate 30 .
- a maximum value of a film thickness of oxide film 40 is not more than twice a minimum value of the film thickness of oxide film 40 .
- Oxide film 40 is made of, for example, silicon dioxide (SiO 2 ).
- Gate electrode 41 is formed within trench 15 to be in contact with oxide film 40 formed to cover side wall surfaces 15 A and bottom surface 15 B.
- Gate electrode 41 is made of, for example, a conductor such as polysilicon doped with an impurity, or Al.
- Source electrode 60 is formed to be in contact with source region 23 and contact region 24 .
- Source electrode 60 is made of a material that can make ohmic contact with source region 23 , for example, Ni x Si y (nickel silicide), Ti x Si y (titanium silicide), Al x Si y (aluminum silicide), Ti x Al y Si z (titanium aluminum silicide), or the like, and is electrically connected to source region 23 .
- Interlayer insulating film 50 is formed to surround gate electrode 41 together with oxide film 40 , and electrically isolates gate electrode 41 from source electrode 60 and source wire 61 .
- Interlayer insulating film 50 is made of, for example, silicon dioxide (SiO 2 ).
- Source wire 61 is formed to cover interlayer insulating film 50 and source electrode 60 .
- Source wire 61 is made of, for example, a conductor such as Al, and is electrically connected with source region 23 via source electrode 60 .
- Drain electrode 70 is formed on a main surface 10 B of silicon carbide substrate 10 opposite to its surface facing drift region 21 .
- Drain electrode 70 is made of a material that can make ohmic contact with silicon carbide substrate 10 , for example, the same material as that for source electrode 60 , and is electrically connected with silicon carbide substrate 10 .
- Backside surface protecting electrode 71 is formed to cover drain electrode 70 .
- Backside surface protecting electrode 71 is made of, for example, a conductor such as Al.
- MOSFET 1 In a state where a voltage applied to gate electrode 41 is less than a threshold voltage, that is, in an OFF state, even if a voltage is applied to between source electrode 60 and drain electrode 70 , pn junction formed between body region 22 and drift region 21 is reverse-biased, and thus a non-conductive state is obtained.
- a voltage equal to or higher than the threshold voltage is applied to gate electrode 41 , an inversion layer is formed in a channel region as a region of body region 22 in contact with side wall surface 15 A.
- source region 23 and drift region 21 are electrically connected to each other, and a current flows between source electrode 60 and drain electrode 70 .
- MOSFET 1 is thus operated.
- the maximum value of the film thickness of oxide film 40 is not more than twice the minimum value of the film thickness of oxide film 40 .
- This can alleviate electric field concentration on oxide film 40 formed to cover the surface of trench 15 , more specifically, oxide film 40 formed to cover the vicinity of a boundary between each side wall surface 15 A and bottom surface 15 B where electric field concentration is likely to occur. Therefore, according to MOSFET 1 as the semiconductor device in accordance with the present embodiment, a semiconductor device capable of stably exhibiting a desired withstanding voltage can be provided.
- MOSFET 1 (see FIG. 1 ) as the semiconductor device in accordance with the present embodiment is manufactured.
- step (S 10 ) includes steps (S 11 ) and (S 12 ) described below.
- a silicon carbide substrate preparation step is performed as a step (S 11 ).
- silicon carbide substrate 10 is prepared.
- Silicon carbide substrate 10 is made of for example, 4H hexagonal silicon carbide.
- an epitaxial growth layer formation step is performed as a step (S 12 ).
- silicon carbide layer 20 is formed on main surface 10 A of silicon carbide substrate 10 by epitaxial growth.
- substrate 30 constituted by silicon carbide substrate 10 and silicon carbide layer 20 is prepared.
- Main surface 30 A of substrate 30 may be a ⁇ 0001 ⁇ plane. Silicon carbide can be readily grown in a ⁇ 0001> direction. Therefore, substrate 30 can be readily prepared by using the ⁇ 0001 ⁇ plane as main surface 30 A of substrate 30 made of silicon carbide.
- an ion implantation step is performed as a step (S 20 ).
- this step (S 20 ) referring to FIG. 4 , for example, Al ions are implanted into a surface layer portion of silicon carbide layer 20 .
- P ions are implanted into the surface layer portion of silicon carbide layer 20 with an implantation depth shallower than that of the Al ions.
- source region 23 having the P ions implanted therein and body region 22 having the Al ions implanted therein are formed in the surface layer portion of silicon carbide layer 20 .
- a region of silicon carbide layer 20 where source region 23 and body region 22 are not formed serves as drift region 21 .
- a trench formation step is performed as a step (S 30 ).
- this step (S 30 ) referring to FIG. 5 , trench 15 opened on one main surface 30 A side of substrate 30 is formed in substrate 30 .
- trench 15 is formed such that each side wall surface 15 A penetrates source region 23 and body region 22 to extend over source region 23 , body region 22 , and drift region 21 , and bottom surface 15 B is positioned in drift region 21 .
- trench 15 may be formed in substrate 30 by an etching method including dry etching such as RIE (Reactive Ion Etching), thermal etching using a halogen-based gas such as chlorine gas, or a combination thereof.
- trench 15 may be formed in substrate 30 by, for example, forming a mask layer (not shown) made of silicon dioxide (SiO 2 ) on main surface 30 A of substrate 30 , performing preliminary etching by RIE, and further performing thermal etching.
- variations in plane orientations of side wall surfaces 15 A facing each other can be reduced by forming trench 15 in substrate 30 using the etching method including thermal etching. As a result, variations in the film thickness of the oxide film formed in a region including side wall surfaces 15 A in a gate oxide film formation step (S 60 ) described later can be reduced.
- trench 15 may be formed such that an angle formed between side wall surface 15 A and the ⁇ 0001 ⁇ plane is not less than 40° and not more than 70°.
- MOSFET 1 (see FIG. 1 ) having high channel mobility can be manufactured by forming trench 15 including side wall surface 15 A having an angle within the above range with respect to the ⁇ 0001 ⁇ plane and forming the channel region along side wall surface 15 A.
- trench 15 may be formed as a U-type trench including side wall surfaces 15 A and bottom surface 15 B, trench 15 is not limited thereto.
- trench 15 may be formed as a V-type trench not including bottom surface 15 B and including side wall surfaces 15 A only.
- a contact region formation step is performed as a step (S 40 ).
- step (S 40 ) referring to FIG. 6 , contact region 24 that is adjacent to source region 23 while being in contact with body region 22 is formed by implanting, for example, Al ions into source region 23 .
- an activation annealing step is performed as a step (S 50 ).
- the impurities introduced in the steps (S 20 ) and (S 40 ) are activated by heating substrate 30 . Thereby, desired carriers are generated in the regions having the impurities introduced therein.
- oxide film 40 is formed to extend over a region including the surface of trench 15 , that is, side wall surfaces 15 A and bottom surface 15 B, and main surface 30 A of substrate 30 , by heating substrate 30 in an atmosphere containing oxygen.
- oxide film 40 for example, an oxide film made of silicon dioxide (SiO 2 ) is formed.
- the atmosphere containing oxygen may be an atmosphere containing oxygen gas only, or may be an atmosphere containing a mixed gas of a noble gas such as argon and oxygen gas, or containing an oxidized gas such as N 2 O, NO, NO 2 , POCl 3 , SO 2 , and SO 4 .
- substrate 30 is heated at a temperature of not less than 1250° C.
- substrate 30 is heated at a temperature of not less than 1300° C.
- dependency of the film thickness of oxide film 40 on plane orientation of the surface of trench 15 can be reduced further effectively.
- substrate 30 may be heated at a temperature of not more than 1400° C.
- the step (S 60 ) can be performed at an appropriate temperature of not less than 1250° C. and not more than 1400° C. which considers durability of manufacturing equipment and the like.
- a nitrogen atoms introduction step is performed as a step (S 70 ).
- nitrogen atoms are introduced into a region including an interface between oxide film 40 and silicon carbide constituting substrate 30 , by heating substrate 30 in an atmosphere including a gas containing nitrogen atoms.
- this step (S 70 ) is not mandatory, by performing this step, an interface state existing in the region including the interface between oxide film 40 and silicon carbide constituting substrate 30 can be reduced. Accordingly, a reduction in channel mobility due to the existence of the interface state can be suppressed.
- the gas containing nitrogen atoms for example, NO (nitric oxide), NO 2 (nitrogen dioxide), N 2 O (nitrous oxide), or the like may be used.
- a gate electrode formation step is performed as a step (S 80 ).
- a polysilicon film is formed within trench 15 , for example, by a LPCVD (Low Pressure Chemical Vapor Deposition) method.
- gate electrode 41 is formed to be in contact with oxide film 40 formed in the region including the surface of trench 15 .
- interlayer insulating film formation step is performed as a step (S 90 ).
- step (S 90 ) referring to FIG. 9 , interlayer insulating film 50 made of SiO 2 serving as an insulator is formed, for example, by a P (Plasma)-CVD method, to surround gate electrode 41 together with oxide film 40 .
- an ohmic electrode formation step is performed as a step (S 100 ).
- this step (S 100 ) referring to FIG. 9 , firstly, in a region where source electrode 60 is to be formed, interlayer insulating film 50 and oxide film 40 are removed to expose source region 23 and contact region 24 . Then, for example, a film made of Ni is formed in the region. On the other hand, for example, a film made of Ni is formed on main surface 10 B of silicon carbide substrate 10 opposite to its surface where drift region 21 is formed. Thereafter, alloy heating treatment is performed to silicidize at least portions of the films made of Ni, and thereby source electrode 60 and drain electrode 70 are each formed.
- a wire formation step is performed as a step (S 110 ).
- this step (S 110 ) referring to FIGS. 9 and 1 , for example, source wire 61 made of Al serving as a conductor is formed by an evaporation method to cover interlayer insulating film 50 and source electrode 60 .
- backside surface protecting electrode 71 made of, for example, Al is formed to cover drain electrode 70 .
- oxide film 40 is formed in the region including the surface of trench 15 formed in substrate 30 , by heating substrate 30 at an appropriate temperature of not less than 1250° C. Thereby, the dependency of the film thickness of formed oxide film 40 on the plane orientation of the surface of trench 15 is reduced. As a result, even if there are variations in the plane orientation of the surface of trench 15 , oxide film 40 having a film thickness close to a desired film thickness can be formed.
- MOSFET 1 having desired characteristics such as a threshold voltage can be stably manufactured by stably forming oxide film 40 having a desired film thickness in the region including the surface of trench 15 .
- the method for manufacturing a semiconductor device in accordance with the present invention is not limited thereto.
- the method for manufacturing a semiconductor device in accordance with the present invention can be widely used in a method for manufacturing a semiconductor device including the step of forming a thermally-oxidized film in a region including a surface of a trench, such as a method for manufacturing a trench gate-type IGBT (Insulated Gate Bipolar Transistor).
- IGBT Insulated Gate Bipolar Transistor
- a trench gate-type MOSFET was manufactured using the method for manufacturing a semiconductor device in accordance with the present embodiment described above.
- the oxide film was formed in a region including a surface of a trench, by performing heating at 1350° C. for 20 minutes in an oxygen atmosphere.
- a cross sectional structure of the manufactured MOSFET was observed with a BF-STEM (Blight Field-Scanning Transmission Electron Microscope) to investigate a film thickness of the oxide film formed in the region including the surface of the trench in the MOSFET based on an obtained BF-STEM photograph.
- BF-STEM Light Field-Scanning Transmission Electron Microscope
- FIG. 10 is a BF-STEM photograph showing a cross sectional structure of the region including the surface of the trench in the MOSFET manufactured in the above experiment (magnification: 50000 times).
- oxide film 40 was formed with a film thickness of about 0.05 ⁇ m on each of side wall surface 15 A and bottom surface 15 B.
- dependency of an oxidation rate on the plane orientation in the formation of the oxide film is reduced, and an oxide film having a desired film thickness can be stably formed.
- a trench gate-type MOSFET was manufactured using the method for manufacturing a semiconductor device in accordance with the present embodiment described above.
- the trench was formed in a substrate such that its bottom surface corresponded to a (000-1) plane and its side wall surface corresponded to a (0-33-8) plane.
- the oxide film was formed in a region including the side wall surfaces and the bottom surface of the trench, by performing heating at 1200° C., 1250° C., 1300° C., 1350° C., and 1400° C.
- the film thickness ratio refers to a ratio of the film thickness of the oxide film formed in a region including the bottom surface to the film thickness of the oxide film formed in a region including the side wall surface.
- FIG. 11 shows the influence of the heating temperature for the substrate on the film thickness of the oxide film formed in the region including the side wall surfaces and the bottom surface.
- FIG. 12 shows the influence of the heating temperature for the substrate on the film thickness ratio of the oxide film formed in the region including the side wall surfaces and the bottom surface.
- the heating temperature for the substrate in the formation of the oxide film to not less than 1250° C., preferably not less than 1300° C., the dependency of the oxidation rate on the plane orientation in the formation of the oxide film is reduced, and an oxide film having a desired film thickness can be stably formed.
- the method for manufacturing a semiconductor device and the semiconductor device in accordance with the present invention are particularly advantageously applicable to a method for manufacturing a semiconductor device which is required to stably manufacture a semiconductor device having desired characteristics, and a semiconductor device which is required to stably exhibit a desired withstanding voltage by alleviating electric field concentration on an oxide film.
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JP (1) | JP5834801B2 (ja) |
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Cited By (4)
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US20130126904A1 (en) * | 2011-11-21 | 2013-05-23 | National University Corporation NARA Institute of Science and Technology | Silicon carbide semiconductor device and method for manufacturing the same |
US20130134442A1 (en) * | 2011-11-24 | 2013-05-30 | Sumitomo Electric Industries, Ltd. | Semiconductor device and method for manufacturing same |
WO2015050615A3 (en) * | 2013-07-17 | 2015-05-28 | Cree, Inc. | Enhanced gate dielectric for a field effect device with a trenched gate |
US9704743B2 (en) | 2013-07-04 | 2017-07-11 | Sumitomo Electric Industries, Ltd. | Method for manufacturing silicon carbide semiconductor device |
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JP6357869B2 (ja) * | 2014-05-20 | 2018-07-18 | 住友電気工業株式会社 | 炭化珪素半導体装置の製造方法 |
CN104465440A (zh) * | 2014-11-26 | 2015-03-25 | 上海华力微电子有限公司 | 一种监测原位水汽生长栅氧化膜的生长缺陷的方法 |
CN109037060A (zh) * | 2018-07-19 | 2018-12-18 | 厦门芯代集成电路有限公司 | 一种能抑制沟道迁移率低下的igbt新结构的制备方法 |
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US20090230404A1 (en) * | 2006-04-28 | 2009-09-17 | Sumitomo Electric Industries, Ltd. | Semiconductor device and manufacturing method therefor |
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US20060214268A1 (en) * | 2005-03-25 | 2006-09-28 | Shindengen Electric Manufacturing Co., Ltd. | SiC semiconductor device |
JP5017823B2 (ja) * | 2005-09-12 | 2012-09-05 | 富士電機株式会社 | 半導体素子の製造方法 |
US20070096107A1 (en) * | 2005-11-03 | 2007-05-03 | Brown Dale M | Semiconductor devices with dielectric layers and methods of fabricating same |
JP4923543B2 (ja) * | 2005-11-30 | 2012-04-25 | トヨタ自動車株式会社 | 炭化珪素半導体装置及びその製造方法 |
JP2008226997A (ja) * | 2007-03-09 | 2008-09-25 | Sumitomo Electric Ind Ltd | 半導体装置およびその製造方法 |
JP5588670B2 (ja) * | 2008-12-25 | 2014-09-10 | ローム株式会社 | 半導体装置 |
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- 2012-09-26 WO PCT/JP2012/074661 patent/WO2013073293A1/ja active Application Filing
- 2012-09-26 KR KR1020147004423A patent/KR20140041863A/ko not_active Application Discontinuation
- 2012-09-26 EP EP12849942.3A patent/EP2782137A4/en not_active Withdrawn
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US20130126904A1 (en) * | 2011-11-21 | 2013-05-23 | National University Corporation NARA Institute of Science and Technology | Silicon carbide semiconductor device and method for manufacturing the same |
US9293549B2 (en) * | 2011-11-21 | 2016-03-22 | Sumitomo Electric Industries, Ltd. | Silicon carbide semiconductor device and method for manufacturing the same |
US20130134442A1 (en) * | 2011-11-24 | 2013-05-30 | Sumitomo Electric Industries, Ltd. | Semiconductor device and method for manufacturing same |
US8809945B2 (en) * | 2011-11-24 | 2014-08-19 | Sumitomo Electric Industries, Ltd. | Semiconductor device having angled trench walls |
US9704743B2 (en) | 2013-07-04 | 2017-07-11 | Sumitomo Electric Industries, Ltd. | Method for manufacturing silicon carbide semiconductor device |
WO2015050615A3 (en) * | 2013-07-17 | 2015-05-28 | Cree, Inc. | Enhanced gate dielectric for a field effect device with a trenched gate |
US9570570B2 (en) | 2013-07-17 | 2017-02-14 | Cree, Inc. | Enhanced gate dielectric for a field effect device with a trenched gate |
EP3826073A1 (en) * | 2013-07-17 | 2021-05-26 | Cree, Inc. | Enhanced gate dielectric for a field effect device with a trenched gate |
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JP2013105966A (ja) | 2013-05-30 |
KR20140041863A (ko) | 2014-04-04 |
CN103890951A (zh) | 2014-06-25 |
EP2782137A4 (en) | 2015-08-12 |
CN103890951B (zh) | 2017-07-21 |
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WO2013073293A1 (ja) | 2013-05-23 |
JP5834801B2 (ja) | 2015-12-24 |
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