US11220604B2 - Method for manufacturing cured film, method for manufacturing electronic component, and electronic component - Google Patents

Method for manufacturing cured film, method for manufacturing electronic component, and electronic component Download PDF

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Publication number
US11220604B2
US11220604B2 US14/778,859 US201414778859A US11220604B2 US 11220604 B2 US11220604 B2 US 11220604B2 US 201414778859 A US201414778859 A US 201414778859A US 11220604 B2 US11220604 B2 US 11220604B2
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Prior art keywords
product film
cured product
curable composition
producing
compound
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US20160046813A1 (en
Inventor
Mitsuru Tanikawa
Takashi Watanabe
Michihisa Ueda
Shigeru Nakamura
Hiroshi Maenaka
Ryosuke Takahashi
Takanori Inoue
Yoshito FUJITA
Osamu Inui
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Sekisui Chemical Co Ltd
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Sekisui Chemical Co Ltd
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Priority claimed from JP2013230441A external-priority patent/JP5756841B2/ja
Priority claimed from JP2014028379A external-priority patent/JP2015110206A/ja
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority claimed from PCT/JP2014/079320 external-priority patent/WO2015068722A1/ja
Assigned to SEKISUI CHEMICAL CO., LTD. reassignment SEKISUI CHEMICAL CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: NAKAMURA, SHIGERU, INUI, OSAMU, MAENAKA, HIROSHI, INOUE, TAKANORI, TAKAHASHI, RYOSUKE, UEDA, MICHIHISA, FUJITA, YOSHITO, TANIKAWA, MITSURU, WATANABE, TAKASHI
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
    • B41J3/407—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065—After-treatment
    • B05D3/067—Curing or cross-linking the coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J11/00—Devices or arrangements  of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
    • B41J11/0015—Devices or arrangements  of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
    • B41J11/002—Curing or drying the ink on the copy materials, e.g. by heating or irradiating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J11/00—Devices or arrangements  of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
    • B41J11/0015—Devices or arrangements  of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
    • B41J11/002—Curing or drying the ink on the copy materials, e.g. by heating or irradiating
    • B41J11/0021—Curing or drying the ink on the copy materials, e.g. by heating or irradiating using irradiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J11/00—Devices or arrangements  of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
    • B41J11/0015—Devices or arrangements  of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
    • B41J11/002—Curing or drying the ink on the copy materials, e.g. by heating or irradiating
    • B41J11/0021—Curing or drying the ink on the copy materials, e.g. by heating or irradiating using irradiation
    • B41J11/00214—Curing or drying the ink on the copy materials, e.g. by heating or irradiating using irradiation using UV radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/28—Treatment by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/52—Electrically conductive inks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01—Tools for processing; Objects used during processing
    • H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
    • H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0577—Double layer of resist having the same pattern

Definitions

  • the present invention relates to a method for producing a cured product film, according to which a cured product film is formed using a curable composition that is photocurable and thermocurable.
  • the present invention also relates to a method for producing an electronic component and an electronic component applying the method for producing a cured product film.
  • an electronic device on an electronic component such as a substrate, other various electronic components are mounted, and the electronic components are electrically connected to each other via electrical wires.
  • a resist pattern or a partition is formed for the purpose of ensuring insulating properties or allowing for functioning as a protective film.
  • a resist pattern on a printed wiring board is generally formed using a resist material, which is called photoresist, by photolithography including an exposing step and a developing step.
  • a resist layer is formed on the entire surface of a printed wiring board having a copper circuit, then the resist layer is partially exposed to light through a mask, and the resist layer is partially removed by development. As a result of development, a resist pattern is formed, thereby giving a printed wiring board having a resist pattern and a copper circuit.
  • Patent Document 1 An example of such a printed wiring board production method is disclosed in the below-listed Patent Document 1.
  • Patent Document 1 an exposing step, a developing step, and the like in photolithography are performed.
  • Patent Document 2 a resist material, which is a photocurable and thermocurable ink-jet composition, is discharged from an ink jet device onto a substrate, and the resist material is cured.
  • Patent Document 1 JP 5-21941 A
  • Patent Document 2 WO 2004/099272 A1
  • a chemical liquid such as acid or alkali is used in the development process, resulting in an increased environmental impact.
  • a chemical liquid such as acid or alkali
  • the resist layer part removed by development turns into waste.
  • the copper layer removed by etching also turns into waste. Accordingly, the amount of waste is large, resulting in an increased environmental impact. Further, there also is the problem of the increased material cost for a printed wiring board.
  • a resist pattern may not be accurately formed.
  • the formation accuracy tends to be even lower.
  • the formation accuracy tends to be yet lower.
  • a method for producing a cured product film including: an application step in which a curable composition that is photocurable and thermocurable and also is in liquid form is applied using an ink jet device; a first light irradiation step in which, after the application step, the curable composition is irradiated with light from a first light irradiation part to allow the curing of the curable composition to proceed, thereby forming a precured product film; and a heating step in which, after the first light irradiation step, the precured product film irradiated with light is heated to cure the precured product film irradiated with light, thereby forming a cured product film
  • the inkjet device including: an ink tank to store the curable composition; a discharge part that is connected to the ink tank and discharges the curable composition; and a circulation flow path part that is connected to the discharge part at one end and connected to the ink tank part at the other end, through which
  • the method for producing a cured product film mentioned above further includes, after the first light irradiation step and before the heating step, a second light irradiation step in which the precured product film irradiated with light from the first light irradiation part is irradiated with light from a second light irradiation part that is different from the first light irradiation part to allow the curing of the precured product film to further proceed.
  • the method for producing a cured product film mentioned above further includes, after the first light irradiation step and before the heating step, a multilayering step in which the application step and the first light irradiation step are performed on the precured product film after the first light irradiation step to form an additional precured product film on the precured product film, thereby forming a multilayer precured product film.
  • the method for producing a cured product film mentioned above further includes, after the multilayering step and before the heating step, a second light irradiation step in which the multilayer precured product film is irradiated with light from a second light irradiation part that is different from the first light irradiation part to allow the curing of the multilayer precured product film to further proceed.
  • the circulation flow path part includes, in the circulation flow path part, a buffer tank to temporarily store the curable composition.
  • the application step and the first light irradiation step are performed on the precured product film or between the precured product films after the first light irradiation step.
  • the temperature of the curable composition during circulation is 40° C. or more and 100° C. or less.
  • the ink jet device is an inkjet device using a piezoelectric inkjet head, and, in the application step, the curable composition is applied by the action of a piezo element.
  • the viscosity of the curable composition during discharge is 3 mPa ⁇ s or more and 1500 mPa ⁇ s or less.
  • the curable composition contains a photocurable compound, a thermocurable compound, a photopolymerization initiator, and a thermal curing agent.
  • the curable composition contains the photocurable compound, a photo- and thermocurable compound, the thermocurable compound, the photopolymerization initiator, and the thermal curing agent.
  • the photocurable compound has a (meth)acryloyl group
  • the photo- and thermocurable compound has a (meth)acryloyl group and a cyclic ether group
  • the thermocurable compound has a cyclic ether group.
  • the curable composition contains, as the photocurable compounds, a monofunctional compound having one (meth)acryloyl group and a multifunctional compound having two or more (meth)acryloyl groups.
  • the total of the photocurable compound content and the photo- and thermocurable compound content is 40 wt % or more and 90 wt % or less based on 100 wt % of the curable composition.
  • a method for producing an electronic component including a step of forming a cured product film on an electronic component body by the method for producing a cured product film mentioned above, thereby producing an electronic component including an electronic component body and the cured product film on the electronic component body.
  • an electronic component including an electronic component body and, on the electronic component body, a cured product film obtained by the method for producing a cured product film mentioned above.
  • an application step in which a curable composition that is photocurable and thermocurable and also is in liquid form is applied using an ink jet device is performed, followed by the first light irradiation step and the heating step.
  • the ink jet device includes the ink tank, the discharge part, and the circulation flow path part.
  • the curable composition is moved from the ink tank to the discharge part, and then the curable composition that has not been discharged from the discharge part is moved through the circulation flow path part to the ink tank, whereby the curable composition is applied while being circulated.
  • the formation accuracy of a fine cured product film can be increased, and also the adhesion of the cured product film can be increased.
  • FIGS. 1( a ) to ( e ) are cross-sectional views for explaining each step of a method for producing a cured product film according to one embodiment of the present invention.
  • FIG. 2 is a front cross-sectional view schematically showing an electronic component provided with a cured product film obtained by a method for producing a cured product film according to one embodiment of the present invention.
  • FIG. 3 is a schematic block diagram showing an example of an ink jet device used in a method for producing a cured product film according to one embodiment of the present invention.
  • FIG. 4 is a schematic block diagram showing another example of an ink jet device used in a method for producing a cured product film according to one embodiment of the present invention.
  • FIG. 5 is a front cross-sectional view schematically showing an electronic component provided with a cured product film obtained by a method for producing a cured product film according to another embodiment of the present invention.
  • the method for producing a cured product film according to the present invention includes an application step in which a curable composition that is photocurable and thermocurable and also is in liquid form is applied using an ink jet device.
  • the method for producing a cured product film according to the present invention also includes a first light irradiation step in which, after the application step, the curable composition is irradiated with light from a first light irradiation part to allow the curing of the curable composition to proceed, thereby forming a precured product film.
  • the method for producing a cured product film according to the present invention further includes a heating step in which, after the first light irradiation step, the precured product film irradiated with light is heated to cure the precured product film irradiated with light, thereby forming a cured product film.
  • the ink jet device includes an ink tank to store the curable composition, a discharge part that is connected to the ink tank and discharges the curable composition, and a circulation flow path part that is connected to the discharge part at one end and connected to the ink tank part at the other end, through which the curable composition flows.
  • the curable composition in the application step, in the ink jet device, the curable composition is moved from the ink tank to the discharge part, and then the curable composition that has not been discharged from the discharge part is moved through the circulation flow path part to the ink tank, whereby the curable composition is applied while being circulated.
  • the above specific application step, the above specific first light irradiation step, and the above specific heating step are performed. Further, using the above specific ink jet device, in the ink jet device, the curable composition is moved from the ink tank to the discharge part, and then the curable composition that has not been discharged from the discharge part is moved through the circulation flow path part to the ink tank, whereby the curable composition is applied while being circulated. As a result, the formation accuracy of a fine cured product film can be increased, and also the adhesion of the cured product film can be increased. For obtaining the effect of the present invention, the application of the curable composition while being circulated is significantly meaningful.
  • the method for producing a cured product film according to the present invention preferably includes a multilayering step in which the application step and the first light irradiation step are performed on the precured product film after the first light irradiation step to form an additional precured product film on the precured product film, thereby forming a multilayer precured product film.
  • a thick cured product film can be formed with high accuracy.
  • even a multilayered cured product film can also be formed finely with high accuracy.
  • the above specific application step, the above specific first light irradiation step, the above specific multilayering step, and the above specific heating step are performed.
  • the curable composition is moved from the ink tank to the discharge part, and then the curable composition that has not been discharged from the discharge part is moved through the circulation flow path part to the ink tank, whereby the curable composition is applied while being circulated.
  • the formation accuracy of a thick cured product film can be increased, and also the adhesion of the cured product film can be increased.
  • the application of the curable composition while being circulated is significantly meaningful.
  • a cured product film having an excellent predetermined shape can be formed without performing a large number of steps, such as an exposing step and a developing step in photolithography. Accordingly, the amount of waste can be reduced, the environmental impact can be reduced, and further the material cost for forming an electronic component can also be reduced.
  • FIG. 2 is a cross-sectional view showing an electronic component provided with a cured product film obtained by a method for producing a cured product film according to one embodiment of the present invention.
  • the electronic component 1 shown in FIG. 2 is provided with an electronic component body 2 (first electronic component body) and a multilayer cured product film 3 disposed on the surface of the electronic component body 2 .
  • the multilayer cured product film 3 has a plurality of cured product films 3 A, 3 B, and 3 C.
  • the plurality of cured product films 3 A, 3 B, and 3 C are laminated.
  • the multilayer cured product film 3 is a cured product film after heating. It is also possible that a second electronic component body is disposed on the surface opposite to the first electronic component body 2 side of the multilayer cured product film 3 .
  • the electronic component body may be, specifically, a semiconductor chip, a semiconductor wafer after dicing (divided semiconductor wafer), a condenser, a diode, a printed circuit board, a flexible printed circuit board, a glass epoxy substrate, a glass substrate, or the like.
  • the electronic component body may have a cured product film on the surface thereof. In the electronic component body having a cured product film, a cured product film may be formed on the cured product film.
  • a curable composition 12 that is photocurable and thermocurable and also is in liquid form is applied onto the electronic component body 2 using an ink jet device 11 (application step).
  • the curable composition 12 is applied onto the entire surface of the electronic component body 2 .
  • droplets of the curable composition 12 mix with each other into the state shown in FIG. 1( b ) .
  • the ink jet device 11 internally has an ink tank 21 , a discharge part 22 , and a circulation flow path part 23 .
  • the circulation flow path part 23 has a buffer tank 23 A and a pump 23 B in the circulation flow path part 23 .
  • the circulation flow path part 23 X may have no buffer tank or pump in the circulation flow path part 23 X.
  • the circulation flow path part preferably has the buffer tank and preferably has the pump in the circulation flow path part.
  • the circulation flow path part may also have a flowmeter, a thermometer, a filter, and the like in the circulation flow path part.
  • the ink tank 21 stores the curable composition.
  • the curable composition is discharged from the discharge part 22 (ink jet head).
  • the discharge part 22 includes a discharge nozzle.
  • the discharge part 22 is connected to the ink tank 21 .
  • the ink tank 21 and the discharge part 22 are connected to each other through a flow path.
  • One end of the circulation flow path part 23 is connected to the discharge part 22 , while the other end is connected to the ink tank 21 .
  • the curable composition flows through the circulation flow path part 23 .
  • the buffer tank 23 A and the pump 23 B are each disposed between the discharge part 22 and the ink tank 21 .
  • the buffer tank 23 A is disposed closer to the discharge part 22 than is the pump 23 B.
  • the pump 23 B is disposed closer to the ink tank 21 than is the buffer tank 23 A.
  • the buffer tank 23 A temporarily stores the curable composition.
  • the curable composition is moved from the ink tank 21 to the discharge part 22 , and then the curable composition that has not been discharged from the discharge part 22 is passed through the circulation flow path part 23 and moved to the ink tank 21 , whereby the curable composition is applied while being circulated in the application step.
  • the discharge part may be an ink jet head, for example, such as a thermal head, a bubble jet head, a solenoid valve head, or a piezoelectric head.
  • the circulation flow path part in the discharge part may be an end-shooter type, in which discharge nozzles are branched from a common circulation flow path (manifold), or a side-shooter type, in which an ink circulates through a discharge nozzle.
  • the ink jet device is an ink jet device using a piezoelectric ink jet head, and that, in the application step, the curable composition is applied by the action of a piezo element.
  • the circulation flow path part includes, in the circulation flow path part, a pump that transfers the curable composition.
  • a suitable pressure is maintained, and also that there is not much pressure fluctuation (pulsation) within the range.
  • pulsation pressure fluctuation
  • a damper between the pump and the discharge part.
  • Such a damper may be a buffer tank to temporarily store the curable composition, a membrane-type damper, or the like.
  • the circulation flow path part includes, in the circulation flow path part, a buffer tank to temporarily store the curable composition.
  • the curable composition is circulated with heating, it is possible to introduce a heating heater in the ink tank or use a heating heater in the circulation flow path part, thereby adjusting the temperature of the curable composition.
  • the applied curable composition 12 is irradiated with light from a first light irradiation part 13 to allow the curing of the curable composition 12 to proceed (first light irradiation step). This results in the formation of a precured product film 12 A irradiated with light from the first light irradiation part 13 .
  • the wavelength and irradiation intensity of the light from the first light irradiation part 13 may be the same as or different from the wavelength and irradiation intensity of the light from the below-described second light irradiation part 14 .
  • the irradiation intensity of the light from the second light irradiation part 14 is higher than the irradiation intensity of the light from the first light irradiation part 13 .
  • the description “the applied curable composition 12 is irradiated with light from a first light irradiation part 13 to allow the curing of the curable composition 12 to proceed” also includes that the reaction is allowed to proceed to create a thickened state.
  • the apparatus for light irradiation is not particularly limited, and may be an ultraviolet light-emitting diode (UV-LED) a metal halide lamp, a high-pressure mercury lamp, an extra-high pressure mercury lamp, or the like.
  • UV-LED ultraviolet light-emitting diode
  • metal halide lamp a high-pressure mercury lamp
  • extra-high pressure mercury lamp or the like.
  • UV-LED ultraviolet light-emitting diode
  • the application step and the first light irradiation step are performed on the precured product film 12 A after the first light irradiation step to form additional precured product films 12 B and 12 C on the precured product film 12 A, thereby forming a multilayer precured product film 12 X (multilayering step).
  • the multilayer precured product film 12 X includes the precured product films 12 A, 12 B, and 12 C.
  • the application step and the first light irradiation step may be performed a plurality of times to increase of the number of laminated layers. Incidentally, the multilayering step does not necessarily have to be performed.
  • the multilayer precured product film 12 X (precured product films 12 A, 12 B, and 12 C) is irradiated with light from a second light irradiation part 14 that is different from the first light irradiation part 13 to allow the curing of the multilayer precured product film 12 X to further proceed (second light irradiation step).
  • second light irradiation step This results in the formation of a precured product film 12 Y irradiated with light from the second light irradiation part 14 .
  • the precured product film 12 A is irradiated with light from the second light irradiation part 14 that is different from the first light irradiation part 13 to allow the curing of the precured product film 12 A to further proceed (second light irradiation step).
  • the second light irradiation step is performed before the below-described heating step. In terms of further increasing the formation accuracy of a thick cured product film, it is preferable that the second light irradiation step is performed.
  • the second light irradiation step does not necessarily have to be performed, and it is also possible that the below-described heating step is performed after the multilayering step without performing the second light irradiation step. Further, it is also possible that the below-described heating step is performed after the first light irradiation step without performing the second light irradiation step.
  • the precured product film 12 Y is heated to cure the precured product film 12 Y irradiated with light from the second light irradiation part 14 , thereby forming a cured product film 3 (heating step).
  • the second light irradiation step is not performed after the multilayering step, it is possible that the multilayer precured product film 12 X is heated after the multilayering step to cure the multilayer precured product film 12 X, thereby forming a cured product film (heating step).
  • the precured product film 12 A is heated after the first light irradiation step to cure the precured product film 12 A, thereby forming a cured product film (heating step). In this manner, the electronic component 1 shown in FIG. 2 can be obtained.
  • FIG. 5 is a cross-sectional view showing an electronic component provided with a cured product film obtained by a method for producing a cured product film according to another embodiment of the present invention.
  • the electronic component 31 shown in FIG. 5 is provided with an electronic component body 2 and a cured product film 32 disposed on the surface of the electronic component body 2 .
  • the cured product film 32 is monolayer. Like this, it is also possible to form a monolayer cured product film.
  • the application step and the first light irradiation step in the method for producing an electronic component mentioned above are performed on a precured product film to laminate precured product films, it is also possible that the application step and the first light irradiation step are performed between precured product films.
  • the temperature of the curable composition during circulation is 30° C. or more, more preferably 40° C. or more, and 120° C. or less, more preferably 100° C. or less.
  • the viscosity of the curable composition during discharge is 3 mPa ⁇ s or more, more preferably 5 mPa ⁇ s or more, and 1500 mPa ⁇ s or less, more preferably 1200 mPa ⁇ s or less.
  • the viscosity is measured in accordance with JIS K2283 using an E-type viscometer (“TVE22L” manufactured by Toki Sangyo Co., Ltd.) at the temperature during discharge.
  • E-type viscometer (“TVE22L” manufactured by Toki Sangyo Co., Ltd.) at the temperature during discharge.
  • the curable composition is photocurable and thermocurable.
  • the curable composition contains a photocurable component and a thermocurable component. It is preferable that the curable composition contains a photocurable compound (curable compound that can be cured by irradiation with light), a thermocurable compound (curable compound that can be cured by heating), a photopolymerization initiator, and a thermal curing agent. It is preferable that the curable composition contains a photocurable compound, a photo- and thermocurable compound (curable compound that can be cured by both irradiation with light and heating), a thermocurable compound, a photopolymerization initiator, and a thermal curing agent. It is preferable that the curable composition contains a curing accelerator.
  • the curable composition contains a photocurable compound and a thermocurable compound, but does not contain a curable compound that can be cured by both irradiation with light and heating.
  • the cured product film has increased adhesion, the improving effect on the adhesion of the cured product film tends to be slightly inferior.
  • photocurable compounds mentioned above include curable compounds having a (meth)acryloyl group, curable compounds having a vinyl group, and curable compounds having a maleimide group.
  • the photocurable compound has a (meth)acryloyl group (at least one).
  • the photocurable compounds may be used alone, and it is also possible to use a combination of two or more kinds.
  • the curable compound having a (meth)acryloyl group mentioned above means a compound having at least either a methacryloyl group or an acryloyl group.
  • the photocurable compound it is possible to use a multifunctional compound (A1) having two or more photoreactive groups or a monofunctional compound (A2) having one photoreactive group.
  • the curable composition contains, as the photocurable compounds, a monofunctional compound (A2) having one (meth)acryloyl group and a multifunctional compound (A1) having two or more (meth)acryloyl groups.
  • Examples of multifunctional compounds (A1) mentioned above include (meth)acrylic acid adducts of polyalcohols, (meth)acrylic acid adducts of alkylene-oxide-modified polyalcohols, urethane (meth)acrylates, and polyester (meth)acrylates.
  • Examples of polyalcohols mentioned above include diethylene glycol, triethylene glycol, polyethylene glycol, dipropylene glycol, tripropylene glycol, polypropylene glycol, trimethylolpropane, cyclohexane dimethanol, tricyclodecanedimethanol, alkylene oxide adducts of bisphenol A, and pentaerythritol.
  • multifunctional compounds (A1) mentioned above include tricyclodecanedimethanol di(meth)acrylate, isobornyl dimethanol di(meth)acrylate, and dicyclopentenyl dimethanol di(meth)acrylate. Among them, in terms of further increasing the wet-heat resistance of a cured product, it is preferable that the multifunctional compound (A1) is tricyclodecanedimethanol di(meth)acrylate.
  • (meth)acrylate means acrylate or methacrylate.
  • (meth)acryl means acryl or methacryl.
  • the multifunctional compound (A1) is a multifunctional compound (A1) that has a polycyclic skeleton and also has two or more (meth)acryloyl groups.
  • Use of a multifunctional compound (A1) makes it possible to increase the wet-heat resistance of a cured product of the curable composition. Accordingly, the reliability of an electronic component can be increased.
  • the multifunctional compound (A1) is not particularly limited as long as it has a polycyclic skeleton and also has two or more (meth)acryloyl groups.
  • As the multifunctional compound (A1) it is possible to use a known multifunctional compound that has a polycyclic skeleton and also has two or more (meth)acryloyl groups.
  • the multifunctional compound (A1) has two or more (meth)acryloyl groups, and thus is polymerized by irradiation with light and cured.
  • the multifunctional compounds (A1) may be used alone, and it is also possible to use a combination of two or more kinds.
  • multifunctional compounds (A1) mentioned above include tricyclodecanedimethanol di(meth)acrylate, isobornyl dimethanol di(meth)acrylate, and dicyclopentenyl dimethanol di(meth)acrylate. Among them, in terms of further increasing the wet-heat resistance of a cured product, it is preferable that the multifunctional compound (A1) is tricyclodecanedimethanol di(meth)acrylate.
  • the “polycyclic skeleton” in the multifunctional compound (A1) or the below-described monofunctional compound (A2) means a structure having a plurality of cyclic skeletons continuously.
  • a polycyclic alicyclic skeleton and a polycyclic aromatic skeleton can be mentioned, respectively.
  • polycyclic alicyclic skeletons mentioned above include a bicycloalkane skeleton, a tricycloalkane skeleton, a tetracycloalkane skeleton, and an isobornyl skeleton.
  • polycyclic aromatic skeletons mentioned above include a naphthalene ring skeleton, an anthracene ring skeleton, a phenanthrene ring skeleton, a tetracene ring skeleton, a chrysene ring skeleton, a triphenylene ring skeleton, a tetraphene ring skeleton, a pyrene ring skeleton, a pentacene ring skeleton, a picene ring skeleton, and a perylene ring skeleton.
  • monofunctional compounds (A2) mentioned above include isobornyl(meth)acrylate, dihydroxycyclopentadienyl(meth)acrylate, dicyclopentenyl(meth)acrylate, dicyclopentenyloxyethyl(meth)acrylate, dicyclopentanyl(meth)acrylate, and naphthyl(meth)acrylate.
  • the monofunctional compound (A2) is at least one member selected from the group consisting of isobornyl(meth)acrylate, dihydroxycyclopentadienyl(meth)acrylate, dicyclopentenyl(meth)acrylate, dicyclopentenyloxyethyl(meth)acrylate, and dicyclopentanyl(meth)acrylate.
  • Examples of compounds having a vinyl group mentioned above include vinyl ethers, ethylene derivatives, styrene, chloromethyl styrene, ⁇ -methylstyrene, maleic anhydride, dicyclopentadiene, N-vinylpyrrolidone, and N-vinylformamide.
  • the compound having a maleimide group is not particularly limited, and examples thereof include N-methylmaleimide, N-ethylmaleimide, N-hexylmaleimide, N-propylmaleimide, N-butylmaleimide, N-octylmaleimide, N-dodecylmaleimide, N-cyclohexylmaleimide, N-phenylmaleimide, N-p-carboxyphenylmaleimide, N-p-hydroxyphenylmaleimide, N-p-chlorophenylmaleimide, N-p-tolyimaleimide, N-p-xylylmaleimide, N-o-chlorophenylmaleimide, N-o-tolylmaleimide, N-benzylmaleimide, N-2,5-diethylphenylmaleimide, N-2,5-dimethylphenylmaleimide, N-m-tolylmaleimide, N- ⁇ -naph
  • the photocurable compound has a dicyclopentadiene skeleton.
  • the photocurable compound content based on 100 wt % of the curable composition is 40 wt % or more, more preferably 50 wt % or more, and 90 wt % or less, more preferably 85 wt % or less.
  • photo- and thermocurable compounds mentioned above include compounds having various kinds of photocurable functional groups and various kinds of thermocurable functional groups.
  • the photo- and thermocurable compound preferably has a (meth)acryloyl group and a cyclic ether group, and preferably has a (meth)acryloyl group and an epoxy group.
  • the photo- and thermocurable compounds may be used alone, and it is also possible to use a combination of two or more kinds.
  • the photo- and thermocurable compound is not particularly limited, and examples thereof include compounds having a (meth)acryloyl group and an epoxy group, partially (meth)acrylated epoxy compounds, and urethane-modified (meth)acrylic epoxy compounds.
  • Examples of compounds having a (meth)acryloyl group and an epoxy group mentioned above include glycidyl(meth)acrylate and 4-hydroxybutyl(meth)acrylate glycidyl ether.
  • the partially (meth)acrylated epoxy compound is obtained by the reaction between an epoxy compound and a (meth)acrylic acid in the presence of a catalyst in the usual manner.
  • epoxy compounds usable for the partially (meth)acrylated epoxy compound include novolac epoxy compounds and bisphenol epoxy compounds.
  • novolac epoxy compounds mentioned above include phenol novolac epoxy compounds, cresol novolac epoxy compounds, biphenyl novolac epoxy compounds, trisphenol novolac epoxy compounds, and dicyclopentadiene novolac epoxy compounds.
  • Examples of bisphenol epoxy compounds mentioned above include bisphenol A epoxy compounds, bisphenol F epoxy compounds, 2,2′-diallylbisphenol A epoxy compounds, hydrogenated bisphenol epoxy compounds, and polyoxypropylene bisphenol A epoxy compounds.
  • An epoxy compound with a desired acrylation proportion can be obtained by suitably changing the amounts of epoxy compound and (meth)acrylic acid to be blended. It is preferable that the amount of carboxylic acid to be blended per equivalent of epoxy group is 0.1 equivalents or more, more preferably 0.2 equivalents or more, and 0.7 equivalents or less, more preferably 0.5 equivalents or less.
  • the urethane-modified (meth)acrylic epoxy compound is obtained by the following method, for example.
  • a polyol is allowed to react with a bi- or higher functional isocyanate, and further the remaining isocyanate group is allowed to react with a (meth)acrylic monomer having an acid group and glycidol.
  • a bi- or higher functional isocyanate may be allowed to react with a (meth)acrylic monomer having a hydroxyl group and glycidol.
  • the urethane-modified (meth)acrylic epoxy compound may also be obtained by allowing a (meth)acrylate monomer having an isocyanate group to react with glycidol.
  • the polyol is not particularly limited, and examples thereof include ethylene glycol, glycerin, sorbitol, trimethylolpropane, and (poly)propylene glycol.
  • the isocyanate is not particularly limited as long as it is bi- or higher functional.
  • isocyanates mentioned above include isophorone diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, hexamethylene diisocyanate, trimethylhexamethylene diisocyanate, diphenylmethane-4,4′-diisocyanate (MDI), hydrogenated MDI, polymeric MDI, 1,5-naphthalene diisocyanate, norbornane diisocyanate, tolidine diisocyanate, xylylene diisocyanate (XDI), hydrogenated XDI, lysine diisocyanate, triphenylmethane triisocyanate, tris(isocyanatephenyl)thiophosphate, tetramethylxylene diisocyanate, and 1,6,10-undecane triisocyanate.
  • MDI diphenylmethane-4,4
  • the photo- and thermocurable compound content based on 100 wt % of the curable composition is 0.5 wt % or more, more preferably 1 wt % or more, and 60 wt % or less, more preferably 50 wt % or less.
  • the total of the photocurable compound content and the photo- and thermocurable compound content based on 100 wt % of the curable composition is 40 wt % or more, more preferably 50 wt % or more, and 90 wt % or less, more preferably 85 wt % or less.
  • thermocurable compounds mentioned above include thermocurable compounds having a cyclic ether group and thermocurable compounds having a thiirane group.
  • the thermocurable compound is preferably a thermocurable compound having a cyclic ether group, and more preferably a thermocurable compound having an epoxy group (epoxy compound).
  • the thermocurable compounds may be used alone, and it is also possible to use a combination of two or more kinds.
  • the epoxy compound is not particularly limited, and examples thereof include novolac epoxy compounds and bisphenol epoxy compounds.
  • novolac epoxy compounds mentioned above include phenol novolac epoxy compounds, cresol novolac epoxy compounds, biphenyl novolac epoxy compounds, trisphenol novolac epoxy compounds, and dicyclopentadiene novolac epoxy compounds.
  • bisphenol epoxy compounds mentioned above include bisphenol A epoxy compounds, bisphenol F epoxy compounds, 2,2′-diallylbisphenol A epoxy compounds, hydrogenated bisphenol epoxy compounds, and polyoxypropylene bisphenol A epoxy compounds.
  • epoxy compounds mentioned above further include cyclic aliphatic epoxy compounds and glycidylamine.
  • thermocurable compound content based on 100 wt % of the curable composition is 3 wt % or more, more preferably 5 wt % or more, and 60 wt % or less, more preferably 50 wt % or less.
  • photopolymerization initiators mentioned above include photo-radical polymerization initiators and photo-cationic polymerization initiators. It is preferable that the photopolymerization initiator is a photo-radical polymerization initiator.
  • the photopolymerization initiators may be used alone, and it is also possible to use a combination of two or more kinds.
  • the photo-radical polymerization initiator is not particularly limited.
  • the photo-radical polymerization initiator is a compound that generates radicals upon irradiation with light to initiate a radical polymerization reaction.
  • Specific examples of photo-radical polymerization initiators mentioned above include benzoin, benzoin alkylethers, acetophenones, aminoacetophenones, anthraquinones, thioxanthones, ketals, 2,4,5-triarylimidazole dimer, riboflavin tetrabutyrate, thiol compounds, 2,4,6-tris-s-triazine, organic halogen compounds, benzophenones, xanthones, and 2,4,6-trimethylbenzoyl diphenylphosphine oxide.
  • the photo-radical polymerization initiators may be used alone, and it is also possible to use a combination of two or more kinds.
  • photopolymerization initiation aid may also be used.
  • photopolymerization initiation aids mentioned above include N,N-dimethylaminobenzoic acid ethyl ester, N,N-dimethylaminobenzoic acid isoamyl ester, pentyl-4-dimethylamino benzoate, triethylamine, and triethanolamine.
  • Other photopolymerization initiation aids may also be used.
  • the photopolymerization initiation aids may be used alone, and it is also possible to use a combination of two or more kinds.
  • a titanocene compound having absorption in the visible light region such as CGI-784 (manufactured by Ciba Specialty Chemicals), may also be used to promote the photoreaction.
  • the photo-cationic polymerization initiator is not particularly limited, and examples thereof include sulfonium salts, iodonium salts, metallocene compounds, and benzoin tosylate.
  • the photo-cationic polymerization initiators may be used alone, and it is also possible to use a combination of two or more kinds.
  • the photopolymerization initiator content based on 100 wt % of the curable composition is 0.1 wt % or more, more preferably 0.2 wt % or more, and 10 wt % or less, more preferably 5 wt % or less.
  • thermal curing agents mentioned above include organic acids, amine compounds, amide compounds, hydrazide compounds, imidazole compounds, imidazoline compounds, phenolic compounds, urea compounds, polysulfide compounds, and acid anhydrides. It is also possible to use a modified polyamine compound, such as an amine-epoxy adduct, as the thermal curing agent. Other thermal curing agents may also be used. The thermal curing agents may be used alone, and it is also possible to use a combination of two or more kinds.
  • the amine compound means a compound having at least one primary to tertiary amino group.
  • amine compounds mentioned above include (1) aliphatic polyamines, (2) alicyclic polyamines, (3) aromatic polyamines, (4) hydrazides, and (5) guanidine derivatives.
  • adducts such as an epoxy-compound-added polyamine (reaction product between an epoxy compound and a polyamine), a Michael-added polyamine (reaction product between ⁇ , ⁇ -unsaturated ketone and a polyamine), a Mannich-added polyamine (condensate of a polyamine, formalin, and phenol), a thiourea-added polyamine (reaction product between thiourea and a polyamine), and a ketone-blocked polyamine (reaction product between a ketone compound and a polyamine [ketimine]).
  • an epoxy-compound-added polyamine reaction product between an epoxy compound and a polyamine
  • Michael-added polyamine reaction product between ⁇ , ⁇ -unsaturated ketone and a polyamine
  • Mannich-added polyamine condensate of a polyamine, formalin, and phenol
  • thiourea-added polyamine reaction product between thiourea and a polyamine
  • Examples of (1) aliphatic polyamines mentioned above include diethylenetriamine, triethylenetetramine, tetraethylenepentamine, and diethylamino propylamine.
  • Examples of (2) alicyclic polyamines mentioned above include menthanediamine, isophoronediamine, N-aminoethylpiperazine, 3,9-bis(3-aminopropyl)-2,4,8,10-tetraoxaspiro(5,5)undecane adduct, bis(4-amino-3-methylcyclohexyl)methane, and bis(4-aminocyclohexyl)methane.
  • aromatic polyamines mentioned above include m-phenylenediamine, p-phenylenediamine, o-xylenediamine, m-xylenediamine, p-xylenediamine, 4,4-diaminodiphenylmethane, 4,4-diaminodiphenylpropane, 4,4-diaminodiphenylsulfone, 4,4-diaminodicyclohexane, bis(4-aminophenyl)phenylmethane, 1,5-diaminonaphthalene, 1,1-bis(4-aminophenyl)cyclohexane, 2,2-bis[(4-aminophenoxy)phenyl]propane, bis[4-(4-aminophenoxy)phenyl]sulfone, 1,3-bis(4-aminophenoxy)benzene, 4,4-methylene-bis(2-chloroaniline), and 4,4-
  • Examples of (4) hydrazides mentioned above include carbodihydrazide, adipic acid dihydrazide, sebacic acid dihydrazide, dodecanedioic acid dihydrazide, and isophthalic acid dihydrazide.
  • guanidine derivatives mentioned above include dicyandiamide, 1-o-tolyldiguanide, ⁇ -2,5-dimethylguanide, ⁇ , ⁇ -diphenyldiguanide, ⁇ , ⁇ -bisguanyl guanidino diphenyl ether, p-chlorophenyldiguanide, ⁇ , ⁇ -hexamethylene bis[ ⁇ -(p-chlorophenol)]diguanide, phenyldiguanide oxalate, acetylguanidine, and diethylcyanoacetylguanidine.
  • phenolic compounds mentioned above include polyphenol compounds.
  • polyphenol compounds mentioned above include phenol, cresol, ethylphenol, butylphenol, octylphenol, bisphenol A, tetrabromobisphenol A, bisphenol F, bisphenol S, 4,4′-biphenylphenol, a phenol novolac resin having a naphthalene skeleton, a phenol novolac resin having a xylylene skeleton, a phenol novolac resin having a dicyclopentadiene skeleton, and a phenol novolac resin having a fluorene skeleton.
  • acid anhydrides mentioned above include phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylnadic anhydride, dodecylsuccinic anhydride, chlorendic anhydride, pyromellitic dianhydride, benzophenone tetracarboxylic anhydride, methylcyclohexene tetracarboxylic anhydride, trimellitic anhydride, and polyazelaic anhydride.
  • the thermal curing agent content based on 100 wt % of the curable composition is 1 wt % or more, more preferably 5 wt % or more, and 60 wt % or less, more preferably 50 wt % or less.
  • curing accelerators mentioned above include tertiary amine, imidazole, quaternary ammonium salts, quaternary phosphonium salts, organic metal salts, phosphorus compounds, and urea compounds.
  • the curing accelerator content based on 100 wt % of the curable composition is 0.01 wt % or more, more preferably 0.1 wt % or more, and 10 wt % or less, more preferably 5 wt % or less.
  • the curable composition may also contain other components.
  • other components include, but are not particularly limited to, adhesion aids such as coupling agents, pigments, dyes, leveling agents, defoaming agents, and polymerization inhibitors.
  • TMPTA trimethylolpropane triacrylate
  • 10 parts by weight of an acrylic acid adduct of a bisphenol A epoxy resin UVACURE1561, manufactured by Daicel-Allnex Ltd.
  • UCAT SA102 DBU-octylic acid salt
  • San-Apro Ltd. 2-benzyl-2-dimethylamino-4-morpholinobutyrophenone
  • IRUGACURE369 2-benzyl-2-dimethylamino-4-morpholinobutyrophenone
  • the viscosity of the obtained curable composition A at 10 rpm was measured using a viscometer (“TVE22L” manufactured by Toki Sangyo Co., Ltd.).
  • PETG Aliphatic epoxy compound Manufactured by Showa Denko K. K. Photopolymerization IRUGACURE369 2-Benzyl-2-dimethylamino-4- Manufactured by BASF initiator morpholinobutyrophenone Thermal curing YH309 Terpene-based acid anhydride compound Manufactured by agent Mitsubishi Chemical Corporation Curing UCAT SA102 DBU-octylic acid salt Manufactured by accelerator San-Apro Ltd.
  • a catalyst (“Catalyst 44” manufactured by Rohm and Haas) and a copper plating liquid (“CUPOSIT 253” manufactured by Rohm and Haas) were disposed on an FR-4 substrate (“R-1705” manufactured by Panasonic Corporation (0.8 mm thick)), and a copper plating layer to serve as copper wiring was partially formed to give a substrate (copper clad laminate).
  • the steps shown in FIGS. 1( a ) to ( e ) were performed (however, the conditions were set as shown below in Table 3) to form a cured product film.
  • the application step in which the curable composition A was applied while being circulated, and the first light irradiation step were performed once, and the heating step was performed to form a cured product film, thereby giving a printed wiring board, which is an electronic component.
  • the curable composition was applied while being circulated.
  • the application pattern was made to give a 5 cm ⁇ 5 cm flat film, and 20 films were formed.
  • a catalyst (“Catalyst 44” manufactured by Rohm and Haas) and a copper plating liquid (“CUPOSIT 253” manufactured by Rohm and Haas) were disposed on an FR-4 substrate (“R-1705” manufactured by Panasonic Corporation (0.8 mm thick)), and a copper plating layer to serve as copper wiring was partially formed to give a substrate (copper clad laminate).
  • the steps shown in FIGS. 1( a ) to ( e ) were performed (however, the conditions were set as shown below in Table 3) to form a cured product film.
  • the application step in which the curable composition A was applied while being circulated, and the first light irradiation step were performed once, and the heating step was performed to form a cured product film, thereby giving a printed wiring board, which is an electronic component.
  • the curable composition was applied while being circulated.
  • Application was performed in such an application pattern that the line width was 80 ⁇ m and the interval between lines was 80 ⁇ m.
  • the films were examined under a stereoscopic microscope (“SMZ-10” manufactured by Nikon Corporation) to examine the escape of liquid.
  • SZ-10 stereoscopic microscope
  • ⁇ 1 or more and 4 or less/20 patterns had failure.
  • Linewidth is 80 ⁇ 5 ⁇ m.
  • ⁇ Linewidth does not fall under ⁇ and is 80 ⁇ 10 ⁇ m.
  • ⁇ Linewidth does not fall under ⁇ or ⁇ and is 80 ⁇ 20 ⁇ m.
  • ⁇ There is no interval between lines, or linewidth is more than 80 ⁇ 30 ⁇ m.
  • TTB-51 liquid-bath-type thermal shock tester
  • the substrates after film formation were subjected to a hot-cold cycle test, in which one cycle includes holding at ⁇ 50° C. for 5 minutes, then heating to 125° C., holding at 125° C. for 5 minutes, and then cooling to ⁇ 50° C.
  • the substrates were taken out after 500 cycles.
  • the substrates were observed under a stereoscopic microscope (“SMZ-10” manufactured by Nikon Corporation) to examine separation.
  • SZ-10 stereoscopic microscope
  • TMPTA trimethylolpropane triacrylate
  • IRR-214K tricyclodecanedimethanol diacrylate
  • the viscosity of the obtained curable composition A at 10 rpm was measured using a viscometer (“TVE22L” manufactured by Toki Sangyo Co., Ltd.).
  • PETG Aliphatic epoxy compound Manufactured by Showa Denko K.K.
  • Photopolymerization IRUGACURE369 2-Benzyl-2-dimethylamino-4- Manufactured by BASF initiator morpholinobutyrophenone Thermal curing Thermal curing Thermal curing agent obtained in Manufactured by Sekisui agent agent A Synthesis Example 1 Chemical Co., Ltd. Curing UCAT SA102 DBU-octylic acid salt Manufactured by accelerator San-Apro Ltd.
  • a catalyst (“Catalyst 44” manufactured by Rohm and Haas) and a copper plating liquid (“CUPOSIT 253” manufactured by Rohm and Haas) were disposed on an FR-4 substrate (“R-1705” manufactured by Panasonic Corporation (0.8 mm thick)), and a copper plating layer to serve as copper wiring was partially formed to give a substrate (copper clad laminate).
  • the steps shown in FIGS. 1( a ) to ( e ) were performed (however, the conditions were set as shown below in Table 6) to form a cured product film.
  • the application step in which the curable composition A was applied while being circulated, and the first light irradiation step were performed 10 times, and then the heating step was performed to form a cured product film, thereby giving a printed wiring board, which is an electronic component.
  • the curable composition was applied while being circulated.
  • the application pattern was made to give a 5 cm ⁇ 5 cm flat film, and 20 films were formed.
  • a catalyst (“Catalyst 44” manufactured by Rohm and Haas) and a copper plating liquid (“CUPOSIT 253” manufactured by Rohm and Haas) were disposed on an FR-4 substrate (“R-1705” manufactured by Panasonic Electric Works Co., Ltd. (0.8 mm thick)), and a copper plating layer to serve as copper wiring was partially formed to give a substrate (copper clad laminate).
  • the steps shown in FIGS. 1( a ) to ( e ) were performed (however, the conditions were set as shown below in Table 6) to form a cured product film.
  • the application step in which the curable composition A was applied while being circulated, and the first light irradiation step were performed 10 times, and then the heating step was performed to form a cured product film, thereby giving a printed wiring board, which is an electronic component.
  • the curable composition was applied while being circulated.
  • Application was performed in such an application pattern that the line width was 150 ⁇ m and the interval between lines was 300 ⁇ m.
  • the films were examined under a stereoscopic microscope (“SMZ-10” manufactured by Nikon Corporation) to examine the escape of liquid.
  • SZ-10 stereoscopic microscope
  • ⁇ 1 or more and 4 or less/20 patterns had failure.
  • Linewidth is 150 ⁇ 3 ⁇ m.
  • ⁇ Linewidth does not fall under ⁇ and is 150 ⁇ 50 ⁇ m.
  • ⁇ Linewidth does not fall under ⁇ or ⁇ and is 150 ⁇ 80 ⁇ m.
  • X Linewidth does not fall under ⁇ , ⁇ , or ⁇ and is 150 ⁇ 120 ⁇ m.
  • TTB-51 liquid-bath-type thermal shock tester
  • the substrates after film formation were subjected to a hot-cold cycle test, in which one cycle includes holding at ⁇ 50° C. for 5 minutes, then heating to 125° C., holding at 125° C. for 5 minutes, and then cooling to ⁇ 50° C.
  • the substrates were taken out after 500 cycles.
  • the substrates were observed under a stereoscopic microscope (“SMZ-10” manufactured by Nikon Corporation) to examine separation.
  • SZ-10 stereoscopic microscope

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