TWM610420U - Material modification system - Google Patents

Material modification system Download PDF

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TWM610420U
TWM610420U TW109216200U TW109216200U TWM610420U TW M610420 U TWM610420 U TW M610420U TW 109216200 U TW109216200 U TW 109216200U TW 109216200 U TW109216200 U TW 109216200U TW M610420 U TWM610420 U TW M610420U
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focusing
unit
objective lens
laser
focus
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TW109216200U
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陳贊仁
郭中一
許巍耀
鄭晨泰
劉浩銓
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東捷科技股份有限公司
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Abstract

本創作的材料改質系統包括脈衝產生裝置及視覺對準裝置。脈衝產生裝置包括物鏡，且用以透過物鏡投射雷射光，以對物件的改質層進行改質作業。視覺對準裝置連接脈衝產生裝置，且包括照明單元、影像感測單元及對焦單元。照明單元用以對物件投射可見光束。影像感測單元包括視覺範圍，用以感測物件反射的可見光束，以產生視覺資訊，視覺資訊包括觀察距離，用以調整物鏡相對物件的高度。對焦單元包括雷射偵測範圍。雷射偵測範圍在視覺範圍內，對焦單元偵測雷射偵測範圍內物件的改質層的缺陷範圍的對焦資訊，對焦資訊包括聚焦距離。聚焦距離是物鏡被推動的距離，以讓雷射光聚焦在改質層。The material modification system of this creation includes a pulse generating device and a visual alignment device. The pulse generating device includes an objective lens, and is used for projecting laser light through the objective lens to modify the modified layer of the object. The vision alignment device is connected to the pulse generating device, and includes an illumination unit, an image sensing unit, and a focusing unit. The lighting unit is used for projecting visible light beams to the object. The image sensing unit includes a visual range for sensing the visible light beam reflected by the object to generate visual information, and the visual information includes an observation distance for adjusting the height of the objective lens relative to the object. The focusing unit includes the laser detection range. The laser detection range is within the visual range, and the focusing unit detects the focus information of the defect range of the modified layer of the object within the laser detection range, and the focus information includes the focus distance. The focus distance is the distance that the objective lens is pushed to focus the laser light on the modified layer.

Description

材料改質系統Material modification system

本創作與液晶面板缺陷維修設備有關，特別是指一種材料改質系統。This creation is related to LCD panel defect repair equipment, especially a material modification system.

液晶面板是經由一系列已知製程製造而成，為了確保液晶面板的品質及良率，通常製造完成後需經進行檢查，以確定液晶面板沒有存在缺陷，例如亮點或漏光，這類缺陷導致液晶面板無法呈現全部黑色，也就是光線可穿透液晶面板的彩色濾光片而向外顯現。Liquid crystal panels are manufactured through a series of known manufacturing processes. In order to ensure the quality and yield of the liquid crystal panels, inspections are usually carried out after the manufacturing is completed to ensure that the liquid crystal panels have no defects, such as bright spots or light leakage. Such defects cause liquid crystals. The panel cannot appear all black, that is, light can penetrate through the color filter of the liquid crystal panel and appear outward.

目前雷射對焦的方式通常是透過視覺影像方式對焦，也就是透過影像感測元件來感測亮點位置，並在確定亮點位置後以雷射進行改質作業，以讓彩色濾光片的其中一像素黑化。但在液晶面板的結構已知彩色濾光片是液晶面板內部的其中一層結構，而視覺影像僅是觀察液晶面板的表面影像，因此，透過影像感測元件雖然能知道亮點位置，且影像感測器的焦點並不是針對彩色濾光片，所以雷射不是直接針對彩色濾光片進行改質，而無法實現準確作業。The current laser focusing method is usually through visual image focusing, that is, the position of the bright spot is sensed through the image sensor, and after the position of the bright spot is determined, the laser is used for modification to make one of the color filters Pixel blackened. However, it is known in the structure of the liquid crystal panel that the color filter is one of the internal layers of the liquid crystal panel, and the visual image is only to observe the surface image of the liquid crystal panel. Therefore, although the position of the bright spot can be known through the image sensor element, and the image sensor The focus of the filter is not for the color filter, so the laser does not directly modify the color filter, and accurate operation cannot be achieved.

有鑑於上述缺失，本創作的材料改質系統用以透過視覺觀察方式找出亮點位置後透過雷射對焦來讓調變後雷射光能準確對焦在改質層的缺陷範圍，進而讓缺陷範圍黑化。In view of the above-mentioned deficiencies, the material modification system created by this invention is used to find the position of the bright spot through visual observation and use the laser focus to make the modulated laser light accurately focus on the defect area of the modified layer, thereby making the defect area black化.

為了達成上述目的，本創作的材料改質系統包括脈衝產生裝置及視覺對準裝置。脈衝產生裝置包括物鏡，且用以透過物鏡投射雷射光，以對物件的改質層進行改質作業。視覺對準裝置連接脈衝產生裝置，且包括照明單元、影像感測單元及對焦單元。照明單元用以對物件投射可見光束。影像感測單元包括視覺範圍，用以感測物件反射的可見光束，以產生視覺資訊，視覺資訊包括觀察距離，用以調整物鏡相對物件的高度。對焦單元包括雷射偵測範圍。雷射偵測範圍在視覺範圍內，對焦單元偵測雷射偵測範圍內物件的改質層的缺陷範圍的對焦資訊，對焦資訊包括聚焦距離。聚焦距離是物鏡被推動的距離，以讓雷射光聚焦在改質層。In order to achieve the above-mentioned purpose, the material modification system of this creation includes a pulse generating device and a visual alignment device. The pulse generating device includes an objective lens, and is used for projecting laser light through the objective lens to modify the modified layer of the object. The vision alignment device is connected to the pulse generating device, and includes an illumination unit, an image sensing unit, and a focusing unit. The lighting unit is used for projecting visible light beams to the object. The image sensing unit includes a visual range for sensing the visible light beam reflected by the object to generate visual information, and the visual information includes an observation distance for adjusting the height of the objective lens relative to the object. The focusing unit includes the laser detection range. The laser detection range is within the visual range, and the focusing unit detects the focus information of the defect range of the modified layer of the object within the laser detection range, and the focus information includes the focus distance. The focus distance is the distance that the objective lens is pushed to focus the laser light on the modified layer.

如此，本創作的材料改質系統能透過對焦單元準確的對焦缺陷範圍，以使雷射光能準確地聚焦在缺陷範圍內，來達成均勻且有效率地改質缺陷範圍。In this way, the material modification system of the present invention can accurately focus the defect area through the focusing unit, so that the laser light can be accurately focused in the defect area, so as to achieve a uniform and efficient modification of the defect area.

有關本創作所提供的材料改質系統的詳細組成、步驟、構造、特點、運作或使用方式，將於後續的實施方式詳細說明中予以描述。然而，在本創作領域中具有通常知識者應能瞭解，該等詳細說明以及實施本創作所列舉的特定實施例，僅係用於說明本創作，並非用以限制本創作之專利申請範圍。The detailed composition, steps, structure, characteristics, operation or use of the material modification system provided by this creation will be described in the detailed description of the subsequent implementation. However, those with ordinary knowledge in the field of creation should be able to understand that these detailed descriptions and specific embodiments listed in the implementation of this creation are only used to illustrate the creation, and are not intended to limit the scope of patent applications for this creation.

以下，茲配合各圖式列舉對應之較佳實施例來對本創作的材料改質系統的組成構件、步驟、光路、連接及達成功效來作說明。然各圖式中材料改質系統的組成、光學元件、數量、構件、尺寸、外觀及步驟僅用來說明本創作的技術特徵，而非對本創作構成限制。Hereinafter, the corresponding preferred embodiments are listed in conjunction with the drawings to illustrate the constituent components, steps, optical paths, connections, and effects of the material modification system of the present invention. However, the composition, optical elements, quantity, components, dimensions, appearance and steps of the material modification system in the various drawings are only used to illustrate the technical characteristics of this creation, not to limit the creation.

如圖1所示，本創作的材料改質系統100包括脈衝產生裝置10及視覺對準裝置30。上述的改質是透過脈衝產生裝置10輸出的脈衝特性將原材料的特性改變的行為，本實施例中，物件以液晶面板50為例，改質對象是液晶面板50的彩色濾光片或其他光膜，以使部分材料黑化來遮蔽光線。As shown in FIG. 1, the material modification system 100 of the present creation includes a pulse generating device 10 and a visual alignment device 30. The above-mentioned modification is the act of changing the characteristics of the raw material through the pulse characteristics output by the pulse generator 10. In this embodiment, the object is the liquid crystal panel 50, and the object of modification is the color filter of the liquid crystal panel 50 or other light. Film to blacken part of the material to block light.

其中，上述裝置可以包括較實施例有更多或較少透鏡、反射鏡等光學元件，以改變光的傳遞，因此，隨後實施例是便於描述本創作，而非明示或暗示本創作光學元件的使用數量限制，故不能被理解成對本創作的限制。Among them, the above-mentioned device may include more or fewer optical elements such as lenses, mirrors, etc. than the embodiment to change the transmission of light. Therefore, the subsequent embodiments are convenient for describing the present creation, but do not express or imply the optical elements of the present creation. The number of uses is limited, so it cannot be construed as a restriction on this creation.

脈衝產生裝置10包括雷射源11、脈衝強度調整單元13、脈衝調變單元15、掃描單元17、中繼透鏡(relay lens)18及脈衝輸出單元19。雷射源11用以輻射出近紅外線波長之雷射光，雷射光包括多個短脈衝(如圖4所示)。脈衝強度調整單元13用以調整多個短脈衝強度。脈衝調變單元15用以透過光柵調變訊號來調變雷射光，以調控雷射光的多個短脈衝輸出頻率及峰值功率。掃描單元17用以改變雷射光的反射角度。脈衝輸出單元19用以對液晶面板50的改質層的缺陷範圍投射調變後雷射光。其中，雷射源11輸出的雷射光依序通過脈衝強度調整單元13、脈衝調變單元15、掃描單元17、中繼透鏡18及脈衝輸出單元19。The pulse generator 10 includes a laser source 11, a pulse intensity adjustment unit 13, a pulse modulation unit 15, a scanning unit 17, a relay lens 18 and a pulse output unit 19. The laser source 11 is used to radiate laser light of near-infrared wavelength, and the laser light includes a plurality of short pulses (as shown in FIG. 4). The pulse intensity adjusting unit 13 is used to adjust the intensity of a plurality of short pulses. The pulse modulation unit 15 is used to modulate the laser light through the grating modulation signal to adjust the output frequency and peak power of multiple short pulses of the laser light. The scanning unit 17 is used to change the reflection angle of the laser light. The pulse output unit 19 is used for projecting the modulated laser light to the defect area of the modified layer of the liquid crystal panel 50. The laser light output by the laser source 11 passes through the pulse intensity adjustment unit 13, the pulse modulation unit 15, the scanning unit 17, the relay lens 18 and the pulse output unit 19 in sequence.

短脈衝的時域脈衝寬度是飛秒量級，飛秒量級是以千億分之一秒的時間輸出大致相同的功率，以產生多光子吸收使液晶面板的彩色濾光片的缺陷像素瞬間改質成黑化，來阻斷背光源的光線透出，達到亮點暗化效果。The time-domain pulse width of short pulses is on the order of femtoseconds, and the order of femtoseconds is to output approximately the same power in one-hundred-billionths of a second to generate multi-photon absorption and make the liquid crystal panel's color filter defective pixels instantaneously It is changed to blackening to block the light from the backlight source and achieve the darkening effect of bright spots.

脈衝強度調整單元13包括偏極片，透過調整偏極片角度來改變雷射光偏極方向來達成調整雷射強度。偏極片的偏振方向與雷射光偏極方向平行時輸出功率最強，偏極片的偏振方向與雷射偏極傳遞方向垂直時輸出功率最弱。The pulse intensity adjusting unit 13 includes a polarizer, and the laser intensity is adjusted by adjusting the angle of the polarizer to change the polarization direction of the laser light. The output power is the strongest when the polarization direction of the polarizer is parallel to the polarization direction of the laser light, and the output power is the weakest when the polarization direction of the polarizer is perpendicular to the transmission direction of the laser polarizer.

脈衝調變單元15包括第一反射鏡151、脈衝柵控器153及第二反射鏡155。第一反射鏡151用以反射脈衝強度調整單元13輸出的雷射光。脈衝柵控器153位在第一反射鏡151及第二反射鏡153之間，以接收第一反射鏡151反射的雷射光。第二反射鏡155用以反射脈衝柵控器153調變後雷射光至掃描單元17。The pulse modulation unit 15 includes a first mirror 151, a pulse grid controller 153 and a second mirror 155. The first reflecting mirror 151 is used for reflecting the laser light output by the pulse intensity adjusting unit 13. The pulse grid controller 153 is located between the first mirror 151 and the second mirror 153 to receive the laser light reflected by the first mirror 151. The second mirror 155 is used to reflect the laser light modulated by the pulse grid controller 153 to the scanning unit 17.

掃描單元17具有X-Y雷射振鏡，以改變雷射光偏轉角度。掃描單元17用以掃描液晶面板50的彩色濾光片的缺陷(像素)範圍，並規劃掃描路徑，以符合缺陷(像素)範圍。The scanning unit 17 has an X-Y laser galvanometer to change the deflection angle of the laser light. The scanning unit 17 is used for scanning the defect (pixel) range of the color filter of the liquid crystal panel 50 and planning a scanning path to meet the defect (pixel) range.

中繼透鏡18接收掃描單元17輸出的雷射光，並傳遞雷射光至脈衝輸出單元19。中繼透鏡18用以收束掃描單元17輸出的雷射光，以使調變後雷射光能確實傳遞至脈衝輸出單元19。The relay lens 18 receives the laser light output by the scanning unit 17 and transmits the laser light to the pulse output unit 19. The relay lens 18 is used to converge the laser light output by the scanning unit 17 so that the laser light energy after modulation can be reliably transmitted to the pulse output unit 19.

脈衝輸出單元19接收中繼透鏡18輸出的調變後雷射光，且包括耦合鏡191、物鏡193及Z軸調整模組195。調變後雷射光依序通過耦合鏡191及物鏡193。耦合鏡191及物鏡193耦接Z軸調整模組195。Z軸調整模組195用以往上或往下移動耦合鏡191及物鏡193。The pulse output unit 19 receives the modulated laser light output by the relay lens 18 and includes a coupling lens 191, an objective lens 193 and a Z-axis adjustment module 195. After modulation, the laser light passes through the coupling lens 191 and the objective lens 193 in sequence. The coupling lens 191 and the objective lens 193 are coupled to the Z-axis adjustment module 195. The Z-axis adjustment module 195 uses the conventional coupling lens 191 and the objective lens 193 to move up or down.

本實施例中，耦合鏡191及物鏡193之間的距離是固定不變，且，視覺對準裝置30設置在Z軸調整模組195上，因此，移動過程中，耦合鏡191、物鏡193及視覺對準裝置30都同步移動，其他實施例中，Z軸調整模組195也可以只移動物鏡193或耦合鏡191。In this embodiment, the distance between the coupling lens 191 and the objective lens 193 is fixed, and the vision alignment device 30 is arranged on the Z-axis adjustment module 195. Therefore, during the movement, the coupling lens 191, the objective lens 193, and the The visual alignment device 30 all move synchronously. In other embodiments, the Z-axis adjustment module 195 can also move only the objective lens 193 or the coupling lens 191.

視覺對準裝置30用以產生視覺影像及對焦，以讓雷射加工作業準確及可透過肉眼觀察改質過程。視覺對準裝置30包括傳遞單元31、照明單元33、影像感測單元35及對焦單元37。傳遞單元31用以傳遞光束，例如可見光或雷射光，以讓光束傳遞至目的地，例如耦合鏡191、影像感測單元35及對焦單元37。照明單元31用以產生可見光束，可見光束透過傳遞單元31及脈衝輸出單元19的耦合鏡191投射至液晶面板50。The visual alignment device 30 is used to generate visual images and focus, so that the laser processing operation is accurate and the modification process can be observed by naked eyes. The visual alignment device 30 includes a transmission unit 31, an illumination unit 33, an image sensing unit 35 and a focusing unit 37. The transmission unit 31 is used to transmit a light beam, such as visible light or laser light, so that the light beam can be transmitted to the destination, such as the coupling mirror 191, the image sensing unit 35 and the focusing unit 37. The illumination unit 31 is used to generate a visible light beam, and the visible light beam is projected to the liquid crystal panel 50 through the transmission unit 31 and the coupling mirror 191 of the pulse output unit 19.

影像感測單元33包括視覺範圍，用以感測液晶面板50反射的可見光束，以產生視覺資訊。視覺資訊包括觀察距離，觀察距離用以調整物鏡193相對液晶面板50的高度，可見光束的反射光透過脈衝輸出單元19的耦合鏡191及傳遞單元31傳給影像感測單元33。The image sensing unit 33 includes a visual range for sensing the visible light beam reflected by the liquid crystal panel 50 to generate visual information. The visual information includes the observation distance. The observation distance is used to adjust the height of the objective lens 193 relative to the liquid crystal panel 50. The reflected light of the visible light beam passes through the coupling mirror 191 and the transmission unit 31 of the pulse output unit 19 to the image sensing unit 33.

對焦單元35包括雷射偵測範圍，雷射偵測範圍在視覺範圍內，對焦單元35在雷射偵測範圍內偵測液晶面板50的改質層的缺陷範圍的對焦資訊，對焦資訊包括聚焦距離，聚焦距離是物鏡193被推動的距離。The focusing unit 35 includes a laser detection range, the laser detection range is within the visual range, and the focusing unit 35 detects the focus information of the defect range of the modified layer of the liquid crystal panel 50 within the laser detection range, and the focus information includes focus Distance, the focus distance is the distance that the objective lens 193 is pushed.

如圖2所示，對焦單元37包括發射模組371、感測模組373及處理模組375。發射模組371用以產生對焦雷射。感測模組373用以感測由改質層的缺陷範圍反射的對焦雷射。本實施例中，感測模組373感測反射的對焦雷射的一半光束，另一半光束會被遮住，而不被感測，透過一半光束來識別是否完成聚(對)焦。處理模組375耦接發射模組371、感測模組373及Z軸調整模組195。處理模組375依據對焦雷射往返的時間計算聚焦距離，來控制Z軸調整模組195，以推動物鏡193上升或下降來讓雷射更為準確。As shown in FIG. 2, the focusing unit 37 includes a transmitting module 371, a sensing module 373 and a processing module 375. The transmitting module 371 is used to generate a focusing laser. The sensing module 373 is used for sensing the focusing laser reflected by the defect area of the modified layer. In this embodiment, the sensing module 373 senses half of the beam of the reflected focusing laser, and the other half of the beam will be blocked and not sensed. Half of the beam is used to identify whether the focusing (focusing) is completed. The processing module 375 is coupled to the transmitting module 371, the sensing module 373, and the Z-axis adjustment module 195. The processing module 375 calculates the focusing distance according to the round-trip time of the focusing laser, and controls the Z-axis adjustment module 195 to push the objective lens 193 up or down to make the laser more accurate.

如圖3及圖4所示，脈衝柵控器153例如聲光調變器(Acousto-Optic Mmodulator, AOM)，且用以調變雷射光的工作週期T D。工作週期T D包括導通時間Tn及關閉時間To，在導通時間Tn內脈衝柵控器153允許雷射光對應時域的短脈衝輸出至第二反射鏡155，在關閉時間To內脈衝柵控器153不允許雷射光對應時域的短脈衝輸出至第二反射鏡155。本實施例中，雷射光對應時域是指時域訊號的雷射光與工作週期T D的時間重疊。 As shown in FIGS. 3 and 4, the pulse grid controller 153 is, for example, an Acousto-Optic Mmodulator (AOM), and is used to modulate the duty cycle T D of the laser light. The duty cycle T D includes a turn-on time Tn and a turn-off time To. During the turn-on time Tn, the pulse grid controller 153 allows a short pulse corresponding to the time domain of the laser light to be output to the second mirror 155, and the pulse grid controller 153 within the turn-off time To The short pulse corresponding to the time domain of the laser light is not allowed to be output to the second mirror 155. Embodiment, the laser beam is the time corresponding to the time domain with the laser beam duty cycle T D time-domain signals according to the present embodiment overlapping.

脈衝柵控器153包括訊號產生模組157、射頻驅動模組158及調變輸出模組159。訊號產生模組157耦接射頻驅動模組158，且用以輸出光柵調變訊號，如圖4的符號S157，調變是指週期或振幅可被改變。射頻驅動模組158接收及傳遞光柵調變訊號S157。調變輸出模組159接收光柵調變訊號S157及自第一反射鏡151輸入的雷射光Si，並依據光柵調變訊號S157的工作週期輸出調變後雷射光S O。如此，雷射改質的過程中可透過工作週期T D的關閉時間To來進行散熱，而減少熱累積，此外，工作週期T D的導通時間Tn內會間歇輸出多個短脈衝以均勻地修補彩色濾光片的像素範圍，以使其黑化來阻擋光線。 The pulse grid controller 153 includes a signal generation module 157, a radio frequency drive module 158, and a modulation output module 159. The signal generating module 157 is coupled to the radio frequency driving module 158 and is used to output a raster modulation signal, as shown in the symbol S157 in FIG. 4. Modulation means that the period or amplitude can be changed. The RF driving module 158 receives and transmits the raster modulation signal S157. The modulation output module 159 receives the grating modulation signal S157 and the laser light Si input from the first mirror 151, and outputs the modulated laser light S O according to the duty cycle of the grating modulation signal S157. Thus, the modified laser process may be performed through cooling off time T D is the duty cycle To, reduce heat accumulation, in addition, a plurality of short pulses intermittently outputs the on-time period T D of the patch to uniformly Tn The pixel range of the color filter to blacken it to block light.

如圖5所示，本創作的材料改質系統的對焦流程700包括步驟701：偵測液晶面板的亮點，接著，步驟703：調整物鏡193與液晶面板的相對高度，透過Z軸調整模組195調整脈衝輸出單元19的物鏡193與液晶面板50相對的觀察距離，以清楚識別亮點位置的影像，再來，步驟705：對焦液晶面板50的改質層，對焦單元35偵測並對焦液晶面板50的改質層，以取得改質層與物鏡193相對的聚焦距離，然後，步驟707：調整物鏡193與液晶面板的改質層的相對高度，以使雷射光聚焦在改質層，依據聚焦距離透過Z軸調整模組195調整物鏡193與液晶面板50的改質層相對高度，最後，步驟709：輸出雷射光以對改質層進行改質。其中，步驟705-709中更精確地說是對焦或改質改質層的缺陷範圍，即特定像素範圍。As shown in FIG. 5, the focusing process 700 of the material modification system of the present creation includes step 701: detecting the bright spots of the liquid crystal panel, and then, step 703: adjusting the relative height of the objective lens 193 and the liquid crystal panel through the Z-axis adjustment module 195 Adjust the relative observation distance between the objective lens 193 of the pulse output unit 19 and the liquid crystal panel 50 to clearly identify the image of the bright spot position. Next, step 705: focus the modified layer of the liquid crystal panel 50, and the focusing unit 35 detects and focuses the liquid crystal panel 50 To obtain the relative focus distance between the modified layer and the objective lens 193, step 707: adjust the relative height of the objective lens 193 and the modified layer of the liquid crystal panel to focus the laser light on the modified layer, according to the focus distance Adjust the relative height of the objective lens 193 and the modified layer of the liquid crystal panel 50 through the Z-axis adjustment module 195, and finally, step 709: output laser light to modify the modified layer. Among them, the steps 705-709 are more precisely the focus or modification of the defect range of the modified layer, that is, the specific pixel range.

液晶面板的背光源點亮後，在全黑的畫面中可以透過步驟701清楚識別液晶面板的表面是否存在亮點。步驟701中，偵測是透過影像感測單元偵測液晶面板反射回來的可見光束，反射的可見光束透過影像感測單元產生視覺資訊91，如圖6所示。矩形虛線框代表缺陷(像素)範圍95，亮點93在缺陷範圍95內。影像感測單元33具有視覺範圍90，視覺範圍90是可透過顯示器呈現的畫面，例如液晶面板的局部表面外觀。視覺資訊91與視覺範圍90有關。After the backlight source of the liquid crystal panel is lit, it can be clearly identified through step 701 in a completely black screen whether there are bright spots on the surface of the liquid crystal panel. In step 701, the detection is to detect the visible light beam reflected from the liquid crystal panel through the image sensor unit, and the reflected visible light beam passes through the image sensor unit to generate visual information 91, as shown in FIG. 6. The rectangular dashed frame represents the defect (pixel) range 95, and the bright point 93 is within the defect range 95. The image sensing unit 33 has a visual range 90, which is a picture that can be presented through a display, such as a partial surface appearance of a liquid crystal panel. The visual information 91 is related to the visual range 90.

步驟703中，調整是透過Z軸調整模組195來調整。如圖7所示，為了清楚識別亮點93，可透過手動或自動調整Z軸調整模組195，以改變物鏡191與液晶面板50的表面51相對的觀察距離，進而找出清晰影像，如圖6所示，如此，顯示器能清晰地顯示亮點93及範圍。透過清晰影像以確認亮點93對應液晶面板50的彩色濾光片(改質層)的對應像素。In step 703, the adjustment is performed through the Z-axis adjustment module 195. As shown in FIG. 7, in order to clearly identify the bright spot 93, the Z-axis adjustment module 195 can be manually or automatically adjusted to change the viewing distance between the objective lens 191 and the surface 51 of the liquid crystal panel 50 to find a clear image, as shown in FIG. 6 As shown, in this way, the display can clearly display the bright spot 93 and the range. Through the clear image, it is confirmed that the bright spot 93 corresponds to the corresponding pixel of the color filter (modified layer) of the liquid crystal panel 50.

步驟705中，對焦是透過對焦單元37來進行，且對焦單元37以液晶面板50的改質層(即彩色濾光片)53的缺陷範圍進行對焦，這個步驟也是找出雷射光對焦在改質層53的缺陷範圍的相對高度，也就是物鏡193與缺陷範圍之間相對的聚焦距離。In step 705, focusing is performed through the focusing unit 37, and the focusing unit 37 performs focusing on the defect area of the modified layer (ie, color filter) 53 of the liquid crystal panel 50. This step is also to find out that the laser light is focused on the modified layer. The relative height of the defect area of the layer 53 is the relative focusing distance between the objective lens 193 and the defect area.

本實施例中，對焦單元37用以透過對焦雷射偵測液晶面板50的改質層的對焦資訊，對焦資訊包括聚焦形狀及失焦形狀。對焦資訊位在視覺範圍內，可見光、雷射光及對焦雷射投射至物件50的加工位置是重疊的。聚焦形狀及失焦形狀與反射的對焦雷射的光束輪廓有關，光束輪廓構成的形狀例如圓形時，由於感測模組是感測一半光束，因此，失焦時，失焦形狀是不完整的圖案，例如半圓形，且光束輪廓是不清晰。聚焦時，聚焦形狀是完整的圖案，例如點，且光束輪廓大致是清晰的。其他實施例中，光束輪廓的形狀若是其他形狀，例如，正方形或其他形狀時，聚焦形狀可以是線、或點及線的組合。對焦單元37的處理模組375依據聚焦形狀決定聚焦距離。In this embodiment, the focusing unit 37 is used to detect the focusing information of the modified layer of the liquid crystal panel 50 through the focusing laser, and the focusing information includes the focusing shape and the out-of-focus shape. The focus information is within the visual range, and the processing positions of the visible light, laser light, and focus laser projected on the object 50 are overlapped. The focus shape and out-of-focus shape are related to the beam profile of the reflected focusing laser. When the beam profile is formed into a shape such as a circle, since the sensor module senses half of the beam, the out-of-focus shape is incomplete when out of focus The pattern, such as a semicircle, and the beam profile is not clear. When focusing, the focus shape is a complete pattern, such as dots, and the beam profile is roughly clear. In other embodiments, if the shape of the beam profile is another shape, for example, a square or other shapes, the focus shape may be a line or a combination of points and lines. The processing module 375 of the focusing unit 37 determines the focusing distance according to the focusing shape.

步驟707中調整是透過Z軸調整模組195來調整。依據聚焦距離微調物鏡193與液晶面板50的改質層相對高度，以讓調變後雷射光大致聚焦在改質層，最後，步驟709輸出的雷射光就能正確地在改質層的缺陷範圍95(即對應像素範圍)上進行改質，以讓對應的像素黑化來達成遮蔽光線的效果，如圖8所示，缺陷範圍95已被改質成黑化，以遮蔽光背光源光線。In step 707, the adjustment is performed through the Z-axis adjustment module 195. Adjust the relative height of the objective lens 193 and the modified layer of the liquid crystal panel 50 according to the focusing distance, so that the laser light after modulation is roughly focused on the modified layer. Finally, the laser light output in step 709 can be correctly located in the defect area of the modified layer 95 (ie the corresponding pixel range) is modified to blacken the corresponding pixels to achieve the effect of shielding light. As shown in FIG. 8, the defect range 95 has been modified to black to shield the light of the backlight.

如圖7所示，液晶面板50的彩色濾光片53是在表面51的下方，因此，透過步驟705及707可以更為準確地將雷射光對焦在改質層上，以更均勻地改質材料，並可避免相鄰材料剝落。As shown in FIG. 7, the color filter 53 of the liquid crystal panel 50 is under the surface 51. Therefore, through steps 705 and 707, the laser light can be more accurately focused on the reforming layer for more uniform reformation. Material, and can prevent adjacent materials from peeling off.

最後，再次強調，本創作於前揭實施例中所揭露的構成元件，僅為舉例說明，並非用來限制本案之範圍，其他等效元件的替代或變化，亦應為本案之申請專利範圍所涵蓋。Finally, it is emphasized again that the constituent elements disclosed in the previously disclosed embodiments of this creation are only examples and are not intended to limit the scope of this case. The substitution or changes of other equivalent elements shall also be subject to the scope of the patent application of this case. Covered.

100:材料改質系統 10:脈衝產生裝置 11:雷射源 13:脈衝強度調整單元 15:脈衝調變單元 151:第一反射鏡 153:脈衝柵控器 155:第二反射鏡 157:訊號產生模組 158:射頻驅動模組 159:調變輸出模組 17:掃描單元 18:中繼透鏡 19:脈衝輸出單元 191:耦合鏡 193:物鏡 195:Z軸調整模組 30:視覺對準裝置 31:傳遞單元 33:照明單元 35:影像感測單元 37:對焦單元 371:發射模組 373:感測模組 375:處理模組 50:液晶面板 51:表面 53:改質層 700:對焦流程 701-709:步驟 91:視覺資訊 93:亮點 95:缺陷範圍 TD:工作週期 Tn:導通時間 To:關閉時間 S157:光柵調變訊號 Si:雷射光 100: Material modification system 10: Pulse generator 11: Laser source 13: Pulse intensity adjustment unit 15: Pulse modulation unit 151: First mirror 153: Pulse grid controller 155: Second mirror 157: Signal generation Module 158: RF drive module 159: Modulation output module 17: Scanning unit 18: Relay lens 19: Pulse output unit 191: Coupling lens 193: Objective lens 195: Z-axis adjustment module 30: Vision alignment device 31 : Transmission unit 33: Illumination unit 35: Image sensing unit 37: Focusing unit 371: Transmitting module 373: Sensing module 375: Processing module 50: Liquid crystal panel 51: Surface 53: Modified layer 700: Focusing process 701 -709: Step 91: Visual Information 93: Highlight 95: Defect Range T D : Duty Cycle Tn: On Time To: Off Time S157: Grating Modulation Signal Si: Laser Light

圖1是本創作的材料改質系統的組成示意圖。 圖2是圖1中對焦單元的組成示意圖。 圖3是圖1中脈衝調變單元的脈衝柵控器的組成示意圖。 圖4是圖1中雷射光、光柵調變訊號及調變後雷射光的時域訊號圖。 圖5是圖1中對焦流程的步驟流程圖。 圖6是圖5中步驟701-703找到液晶面板亮點位置的視覺範圍的示意圖。 圖7是圖1中脈衝輸出單元、視覺對準裝置及液晶面板的示意圖。 圖8是圖5中步驟709改質後的視覺範圍的示意圖。 Figure 1 is a schematic diagram of the composition of the material modification system created by this author. Fig. 2 is a schematic diagram of the composition of the focusing unit in Fig. 1. FIG. 3 is a schematic diagram of the composition of the pulse grid controller of the pulse modulation unit in FIG. 1. FIG. 4 is a time-domain signal diagram of the laser light, the grating modulation signal, and the laser light after modulation in FIG. 1. Fig. 5 is a flow chart of the steps of the focusing process in Fig. 1. FIG. 6 is a schematic diagram of the visual range of the bright spot position of the liquid crystal panel found in steps 701-703 in FIG. 5. FIG. 7 is a schematic diagram of the pulse output unit, the visual alignment device, and the liquid crystal panel in FIG. 1. FIG. 8 is a schematic diagram of the visual range after modification in step 709 in FIG. 5.

100:材料改質系統 100: Material modification system

10:脈衝產生裝置 10: Pulse generator

11:雷射源 11: Laser source

13:脈衝強度調整單元 13: Pulse intensity adjustment unit

15:脈衝調變單元 15: Pulse modulation unit

151:第一反射鏡 151: first mirror

153:脈衝柵控器 153: Pulse grid controller

155:第二反射鏡 155: second mirror

17:掃描單元 17: Scanning unit

18:中繼透鏡 18: Relay lens

19:脈衝輸出單元 19: Pulse output unit

191:耦合鏡 191: Coupling Mirror

193:物鏡 193: Objective

195:Z軸調整模組 195: Z-axis adjustment module

30:視覺對準裝置 30: Vision alignment device

31:傳遞單元 31: Delivery unit

33:照明單元 33: lighting unit

35:影像感測單元 35: Image sensor unit

37:對焦單元 37: Focus unit

50:液晶面板 50: LCD panel

Claims (7)

一種材料改質系統，包括：一脈衝產生裝置，包括一物鏡，且用以透過該物鏡投射一雷射光，以對一物件的一改質層進行一改質作業；一視覺對準裝置，連接該脈衝產生裝置，且包括一照明單元、一影像感測單元及一對焦單元，該照明單元用以對一物件投射一可見光束，該影像感測單元包括一視覺範圍，用以感測該物件反射的該可見光束，以產生一視覺資訊，該視覺資訊包括一觀察距離，用以調整該物鏡相對該物件的高度，該對焦單元包括一雷射偵測範圍，該雷射偵測範圍在該視覺範圍內，該對焦單元偵測該雷射偵測範圍內該物件的改質層的一缺陷範圍的一對焦資訊，該對焦資訊包括一聚焦距離，該聚焦距離是該物鏡被推動的距離，以讓該雷射光聚焦在該改質層。 A material modification system includes: a pulse generating device, including an objective lens, and used for projecting a laser light through the objective lens to perform a modification operation on a modification layer of an object; a vision alignment device, connected The pulse generating device includes an illumination unit, an image sensing unit, and a focusing unit. The illumination unit is used to project a visible light beam on an object. The image sensing unit includes a visual range for sensing the object The visible light beam is reflected to generate a visual information, the visual information includes an observation distance for adjusting the height of the objective lens relative to the object, the focusing unit includes a laser detection range, the laser detection range is in the In the visual range, the focusing unit detects focusing information of a defect range of the modified layer of the object within the laser detection range, the focusing information includes a focusing distance, and the focusing distance is the distance by which the objective lens is pushed, So that the laser light is focused on the modified layer. 如請求項1所述的材料改質系統，其中，該對焦單元包括一發射模組、一感測模組及一處理模組，該發射模組用以產生一對焦雷射，該感測模組用以感測由該改質層的缺陷範圍反射的該對焦雷射，該處理模組耦接該發射模組及該感測模組，該處理模組依據反射的該對焦雷射的該對焦資訊計算該聚焦距離。 The material modification system according to claim 1, wherein the focusing unit includes a transmitting module, a sensing module, and a processing module, the transmitting module is used to generate a focusing laser, and the sensing module The group is used for sensing the focusing laser reflected by the defect area of the modified layer, the processing module is coupled to the transmitting module and the sensing module, and the processing module is based on the reflected focusing laser The focus information calculates the focus distance. 如請求項2所述的材料改質系統，其中，該對焦資訊包括一聚焦形狀，該聚焦形狀包括點或線。 The material modification system according to claim 2, wherein the focus information includes a focus shape, and the focus shape includes a point or a line. 如請求項2所述的材料改質系統，其中，該可見光束及該對焦雷射是通過該物鏡。 The material modification system according to claim 2, wherein the visible light beam and the focusing laser pass through the objective lens. 如請求項2所述的材料改質系統，其中，該視覺對準裝置包括一傳遞單元，用以傳遞該可見光束及該對焦雷射至該物鏡，及自該物鏡反射的該可見光束及該對焦雷射傳遞至該影像感測單元及該對焦單元。 The material modification system according to claim 2, wherein the vision alignment device includes a transmission unit for transmitting the visible light beam and the focusing laser to the objective lens, and the visible light beam and the visible light beam reflected from the objective lens The focusing laser is transmitted to the image sensing unit and the focusing unit. 如請求項1所述的材料改質系統，其中，該脈衝產生裝置包括一Z軸調整模組，連接該物鏡，且用以調整及依據該聚焦距離推動該物鏡相對該物件的高度。 The material modification system according to claim 1, wherein the pulse generating device includes a Z-axis adjustment module connected to the objective lens and used for adjusting and pushing the height of the objective lens relative to the object according to the focusing distance. 如請求項6所述的材料改質系統，其中，該Z軸調整模組連接該視覺對準裝置，且同步調整及推動該視覺對準裝置。 The material modification system according to claim 6, wherein the Z-axis adjustment module is connected to the visual alignment device, and synchronously adjusts and pushes the visual alignment device.
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Publication number Priority date Publication date Assignee Title
TWI773003B (en) * 2020-12-08 2022-08-01 東捷科技股份有限公司 Material modification system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI773003B (en) * 2020-12-08 2022-08-01 東捷科技股份有限公司 Material modification system

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