M354844 八、新型說明： 【新型所屬之技術領域】 的治具，且 本創作是有關於一種光阻塗佈製程中所使用 特別是有關於一種用來清洗光阻噴嘴的治具。 【先前技術】 一 2阻塗佈與㈣化是半導料光製財的主要步驟之 :係先將級液喷塗於基材上，再藉由旋轉或塗抹的方 ^字先阻液均料分布在基材上。後續再經過•、光罩對 >，光 '曝錢烘烤、顯影以及硬烤的步驟，藉以在基材 上形成預設的圖案化光阻層。 :前所習知的光阻塗佈與圖案化步驟係以個別的基材 古二個作單元’因此在不同的基材在進行替換時，通常 一段時間落差’致使光阻液在機台待機時產生凝結（固）現 ，因而在縁时嘴表面產生硬塊纽塞㈣，下一 片基材的光阻塗佈製程及品質。 為了解決此一問題，目前較新型的機台已加裝了一套光 =液嘴嘴清洗系統，在每一片基材進行光阻液喷塗步驟之 月^’進行—次喷嘴的清洗或括除步驟。然而，採取此一設計， ::在原型機台上添加更多的硬體設施’例如洗劑容器、供 二路、光阻到除治具和清洗槽體，且必須移動喷嘴以進行 浸洗、抽料排液㈣，另外在每—次清洗步驟之後，嗔嘴 ,'、、需再進行一次座標較準方能進行後續製程，對於使用原 的機台來說’除了A幅增加了硬體投資成本之外也徒 5 M354844 增製程步驟並不符合經濟效益。 因此有需要提供-種製程治具，可在無需增加大型硬體 投資的前提下，使原型機台達到清洗噴嘴的目的。 【新型内容】 本創㈣目的是在提供—種光崎噴嘴的清洗治具，係 可動地靠近光阻塗佈裝置，藉以清洗光阻塗佈裝置的光阻液 喷嘴，其中光阻液喷嘴的清洗治具包括：容器以及注液管。 容器具有用來盛裝洗劑的凹槽，並可容納光阻㈣嘴浸潤於 洗劑之中。注液管與容器連接並連通凹槽，用來將洗劑注入 該凹槽之中。 根據以上所述之實施例，本創作的技術特徵在於提供光 阻塗佈與圖案化機台—種外加的清洗治具，藉㈣洗光阻塗 佈與圖案化機台中的光阻液噴嘴。由於此—光阻液喷嘴的清 洗治具係可藉由操作人員手動地接近光阻液喷嘴，採用洗劑 原地浸潤並清洗光阻液喷嘴，因此並不需要在光阻塗佈盘圖 案化機台上額外㈣其他硬體設備，也不會增 步驟即可達料㈣嘴的目的。 ㈣仏 【實施方式】 本創作的實施方式是在供—種光⑽㈣”洗治 具。係可動地料清洗光阻塗佈裝置，例如光阻塗佈與圖案 光:f噴嘴。為讓本創作之目的、特徵與優點能更 月顯易Μ ’特提-種光阻时嘴之清洗治具作為較佳實施例 M354844 來進-步說明。其中值得注意的是，下述實施例僅為了說明 本創作的技術特徵，並非用以限制本創作的申請專利範圍。 本創作實施例所提供的創作概念與技術手段，也適用於 光阻塗佈與圖案化製程中。 、、 請參照第1圖，帛1圖係根據本創作的較佳實施例所繪 示的一種光阻液喷嘴107之清洗治具100的結構示意圖。 在本創作的較佳實施例之中，用來清洗光阻液噴嘴1〇7 的清洗治具100包括：容器1〇1以及注液管1〇2。 容器101具有一個凹槽104可用來盛裝洗劑1〇3。其中 容器101可以使一種由剛性或軟性材質所構成的殼體結構。 例如在本創作的一些實施例之中，容器101可以是一種由金 屬材質所鑄造的金屬槽，且此一金屬槽具有一個開口 105， 呈碗狀可用來盛裝洗劑103。在本創作的另外一些實施例之 中，容器101也可以是一種由塑化材質所鑄造的軟性塑膠槽。 注液管102與容器101連接並且連通槽凹104,用來將 洗劑103注入凹槽1〇4之中。注液管1〇2的一端具有第一開 口 l〇2a與凹槽1〇4連通，另一端具有第二開口 1〇沘用來承 接外部液體供應裝置106,藉以將洗劑1〇3由外部液體供應 裝置106導入凹槽1〇4之中。 其中外部液體供應裝置106較佳可以使一種手持式的洗 瓶（Wash Bottle)，因此操作時可自由且彈性地依照製程中所 使用之光阻液的物理或化學特性，改變注入凹槽1〇4中之洗 劑103的種類。其中洗劑103較佳包括丙酮（Acet〇ne)溶劑或 N-甲基·2-口 比咯酮（N-Methyl-2-Pyrrolidinone)溶劑。 M354844 在本創作的較佳實施例之中，注液管102可以是一種剛 性管材，除了可以將洗劑103導入凹槽104外，還可以作為 該容器101的提把，當進行光阻液噴嘴清洗步驟時，操作人 員可藉由徒手或使用夾具來把持注液管102，可動地使容器 101靠近光阻塗佈機台108的光阻液噴嘴1〇7，使光阻液喷 嘴107經由容器101的開口 105穿設進入凹槽1〇4内，並浸 潤在洗劑103之中。 又 另外，在本創作的較佳實施例之中，光阻液噴嘴1〇7之 清洗治具還包括一個位於凹槽1〇4底部的排液孔ι〇9，以及 連通排液孔1G9的-條排液管no，縣將完成清洗步驟之 後的洗劑103由排液孔1〇9經排液管11〇排出容器1〇1之外。 根據本創作的較佳實施例，第丨圖之光阻液噴嘴清洗治 具100的使用方法可如下所述： 首先提供如第1圖所繪示的光阻液噴嘴清洗治具1〇〇。 接著以注液管102將洗劑1〇3注入容器1〇1之凹槽1〇4中。 再移動容器ιοί靠近光阻液喷嘴107，並使光阻液噴嘴1〇7 浸潤於洗劑103之中。 ' 另外除了浸潤清洗步驟之外，光阻液喷嘴1〇7的清洗步 驟還包括一個沖洗步驟，以光阻液噴嘴1〇7抽吸洗劑1〇3 , 隨後再排除（Purge)洗劑。 値得注意的是，在另-些實施例之中，上述的清洗步驟 S22和步驟S23可以相互對調。也就是說可以先移動容器ι〇ι 靠近光阻液喷嘴107,並使光阻液喷嘴1〇7延伸進入凹槽 之中。再以注液管102將洗劑1〇3注入容器1〇1之凹槽 8 M354844 中，並使光阻液喷嘴107浸潤於洗劑103之中。最後再進行 沖洗步驟’以光阻液喷嘴107抽吸洗劑103，隨後再排除洗 劑。 因此’根據以上所述之實施例，本創作的技術特徵在於 提供光阻塗佈與圖案化機台一種外加的清洗治具，藉以清洗 光阻塗佈與圖案化機台中的光阻液喷嘴。由於此一光阻液喷 嘴的清洗治具係可藉由操作人員手動地接近光阻液噴嘴，採 用洗劑原地浸潤並清洗光阻液喷嘴，因此並不需要在光阻塗 佈與圖案化機台上額外添附其他硬體設備，也不會增加多餘 的製程步驟即可達到清洗噴嘴的目的。 雖然本創作已以較佳實施例揭露如上，然其並非用以限 疋本創作，任何相關技術領域具有通常知識者，在不脫離本 創作之精神和範圍内，當可作各種之更動與潤飾。因此本創 作之保護範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 為讓本創作之上述和其他目的、特徵、優點與實施例食f 明顯易懂，所附圖式之詳細說明如下： 第1圖係根據本創作的較佳實施例所繪示的-種光阻萍 、嘴清洗治具的結構示意圖。M354844 VIII. New description: The fixture of [New Technology Field], and this creation is related to a photoresist coating process, especially for a fixture for cleaning photoresist nozzles. [Prior Art] A 2-resistance coating and (4) is the main step in the production of semi-conducting light: the first step is to spray the grade liquid on the substrate, and then the liquid is firstly blocked by rotating or smearing. The material is distributed on the substrate. Subsequent to the •, reticle pair >, light exposure, baking, and hard baking steps to form a predetermined patterned photoresist layer on the substrate. : The conventional photoresist coating and patterning steps are based on individual substrates. Therefore, when different substrates are being replaced, usually a period of time difference causes the photoresist to stand by in the machine. At the time of coagulation (solid), a hard block new plug (4) is generated on the surface of the mouth, and the photoresist coating process and quality of the next substrate are obtained. In order to solve this problem, a new type of light=liquid nozzle cleaning system has been installed on the newer machine, and the nozzle is cleaned or covered in each step of the photoresist spraying step. In addition to the steps. However, with this design, :: Add more hardware facilities on the prototype machine, such as lotion containers, two-way, photoresist to the fixture and cleaning tank, and the nozzle must be moved for dip Drainage (4), in addition to after each cleaning step, pouting, ',, need to perform another coordinate to be able to carry out the subsequent process, for the use of the original machine, in addition to the A frame increased hard In addition to the cost of physical investment, the 5 M354844 process steps are not economically viable. Therefore, there is a need to provide a process fixture that allows the prototype machine to achieve the purpose of cleaning the nozzle without increasing the investment in large hardware. [New content] The purpose of this (4) is to provide a cleaning fixture for the Kawasaki nozzle, which is movably close to the photoresist coating device, thereby cleaning the photoresist liquid nozzle of the photoresist coating device, wherein the photoresist liquid nozzle is cleaned. The fixture includes: a container and a liquid injection tube. The container has a recess for containing the lotion and can accommodate the photoresist (iv) mouth to be infiltrated in the lotion. The injection tube is connected to the container and communicates with the recess for injecting the lotion into the recess. According to the embodiments described above, the technical feature of the present invention is to provide a photoresist coating and patterning machine-additional cleaning jig by (4) a photoresist coating and a photoresist liquid nozzle in the patterning machine. Since the cleaning fixture of the photoresist liquid nozzle can manually infiltrate and seal the photoresist liquid nozzle by the operator by manually approaching the photoresist liquid nozzle, it is not necessary to pattern the photoresist coating disk. Additional (four) other hardware devices on the machine, and will not increase the steps to achieve the purpose of the (four) mouth. (4) 实施 [Embodiment] The embodiment of the present invention is to provide a light (10) (four) "cleaning tool". It is a movable material cleaning photoresist coating device, such as photoresist coating and pattern light: f nozzle. The purpose, features and advantages of the present invention can be further improved. The cleaning of the mouth of the photoresist is described as a preferred embodiment of M354844. It is noted that the following examples are merely illustrative. The technical features of the present invention are not intended to limit the scope of the patent application of the present invention. The creative concepts and technical means provided by the present creative embodiment are also applicable to the photoresist coating and patterning process. Figure 1 is a schematic view showing the structure of a cleaning jig 100 of a photoresist liquid nozzle 107 according to a preferred embodiment of the present invention. In a preferred embodiment of the present invention, a photoresist liquid nozzle is used for cleaning. The cleaning jig 100 of 1〇7 includes: a container 1〇1 and a liquid filling tube 1〇2. The container 101 has a recess 104 for containing a lotion 1〇3, wherein the container 101 can be made of a rigid or soft material. The structure of the housing. For example In some embodiments of the present invention, the container 101 may be a metal groove cast from a metal material, and the metal groove has an opening 105 in the shape of a bowl for containing the lotion 103. Other implementations of the present invention For example, the container 101 may also be a soft plastic tank cast from a plasticized material. The liquid injection tube 102 is connected to the container 101 and communicates with the groove 104 for injecting the lotion 103 into the groove 1〇4. One end of the liquid injection tube 1〇2 has a first opening l〇2a communicating with the groove 1〇4, and the other end has a second opening 1〇沘 for receiving the external liquid supply device 106, whereby the lotion 1〇3 is externally The liquid supply device 106 is introduced into the groove 1〇4. The external liquid supply device 106 preferably can be a hand-held Wash Bottle, so that it can be freely and elastically operated according to the photoresist used in the process. The physical or chemical characteristics of the liquid change the kind of the lotion 103 injected into the groove 1〇4. The lotion 103 preferably includes an acetone (Acet〇ne) solvent or N-methyl·2-port pyrone (N -Methyl-2-Pyrrolidinone) Solvent. M354844 in this In the preferred embodiment, the liquid injection tube 102 can be a rigid tube, except that the lotion 103 can be introduced into the recess 104, and can also serve as a handle for the container 101 when the photoresist nozzle cleaning step is performed. The operator can hold the liquid injection tube 102 by hand or using a jig, and move the container 101 close to the photoresist liquid nozzle 1〇7 of the photoresist coater 108 to make the photoresist liquid nozzle 107 pass through the opening of the container 101. 105 is inserted into the recess 1 〇 4 and immersed in the lotion 103. In addition, in the preferred embodiment of the present invention, the cleaning jig of the photoresist liquid nozzle 1 〇 7 further includes a recessed The drain hole ι〇9 at the bottom of the tank 1〇4, and the strip discharge tube no of the drain hole 1G9, the detergent 103 after the completion of the washing step in the county is discharged from the drain hole 1〇9 through the drain tube 11〇 The container is discharged outside the container 1〇1. According to a preferred embodiment of the present invention, the method of using the photoresist liquid nozzle cleaning tool 100 of the first embodiment can be as follows: First, a photoresist liquid nozzle cleaning jig as shown in Fig. 1 is provided. Next, the lotion 1〇3 is injected into the groove 1〇4 of the container 1〇1 by the liquid filling tube 102. The container ιοί is moved closer to the photoresist nozzle 107, and the photoresist nozzle 1〇7 is immersed in the lotion 103. In addition to the immersion cleaning step, the cleaning step of the photoresist liquid nozzle 1 〇 7 further includes a rinsing step of pumping the rinsing agent 1 〇 3 with the photoresist liquid nozzle 1 , 7 and then removing the Purge detergent. It is to be noted that in still other embodiments, the cleaning step S22 and the step S23 described above may be reversed each other. That is to say, the container ι〇ι can be moved close to the photoresist liquid nozzle 107, and the photoresist liquid nozzle 1〇7 can be extended into the groove. The lotion 1102 is then injected into the recess 8 M354844 of the container 1〇1 by the liquid filling tube 102, and the photoresist liquid nozzle 107 is immersed in the lotion 103. Finally, a rinsing step is performed to suck the lotion 103 with the photoresist liquid nozzle 107, and then the detergent is removed. Thus, in accordance with the above-described embodiments, the present invention is characterized in that an photoresist coating and patterning machine is provided with an additional cleaning jig for cleaning the photoresist coating in the photoresist coating and patterning machine. Since the cleaning fixture of the photoresist liquid nozzle can manually infiltrate and seal the photoresist liquid nozzle by the operator by manually approaching the photoresist liquid nozzle, the photoresist coating and patterning are not required. Additional hardware equipment is added to the machine, and no additional process steps are added to achieve the purpose of cleaning the nozzle. Although the present invention has been disclosed in the above preferred embodiments, it is not intended to limit the scope of the present invention, and any person skilled in the relevant art will be able to make various changes and refinements without departing from the spirit and scope of the present invention. . Therefore, the scope of protection of this creation is subject to the definition of the scope of the patent application. BRIEF DESCRIPTION OF THE DRAWINGS In order to make the above and other objects, features, advantages and embodiments of the present invention obvious, the detailed description of the drawings is as follows: FIG. 1 is a preferred embodiment according to the present invention. The schematic diagram of the structure of the photoresist and the mouth cleaning fixture is shown.
綠示為了清楚'♦示起見，圖示中的元件並未按照比例尺加C f °在不同圖示之中’元件參照號碼可能會有重複，用》 相對應或相似的元件。 M354844 【主要元件符號說明】 100 :清洗治具 101 :容器 102 :注液管 102a :第一開口 102b ··第二開口 103 :洗劑 104 :凹槽 105 :開口 106 :外部液體供應裝置 107 :光阻液喷嘴 108 :光阻塗佈機台 109 :排液孔 110 :排液管 10Green indicates that, for clarity, the components in the illustration are not in accordance with the scale plus C f ° in the different illustrations. 'The component reference number may be repeated, using the corresponding or similar components. M354844 [Description of main component symbols] 100: cleaning jig 101: container 102: liquid injection pipe 102a: first opening 102b · second opening 103: lotion 104: groove 105: opening 106: external liquid supply device 107: Photoresist nozzle 108: photoresist coating machine 109: drain hole 110: drain tube 10