TWM285165U - Plasma generating device - Google Patents

Plasma generating device Download PDF

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Publication number
TWM285165U
TWM285165U TW94209188U TW94209188U TWM285165U TW M285165 U TWM285165 U TW M285165U TW 94209188 U TW94209188 U TW 94209188U TW 94209188 U TW94209188 U TW 94209188U TW M285165 U TWM285165 U TW M285165U
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Taiwan
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plasma generating
plasma
electrodes
generating device
patent application
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TW94209188U
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Chinese (zh)
Inventor
Chia-Yuan Hsu
Chin-Hua Lin
Yong-Hau Foo
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Nano Electronics And Micro Sys
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Priority to TW94209188U priority Critical patent/TWM285165U/en
Publication of TWM285165U publication Critical patent/TWM285165U/en

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M285165 四、創作說明(1) -【新型所屬之技術領域】 本創作是提供一種電漿產生裝置(一),主要針對工件 物在必需藉由電漿來進行表面清潔或改質處理,能直接在 大氣壓力下進行電漿清潔或改質之設計者。 【先前技術】 業界應用電漿來對工件物進行表面清潔或改質,通常 是在一容納工件物之密閉腔室,將工件物以支持架架設後 置入腔室内,藉由氣體(如氬、氦、氧、壓縮空氣、靜態 環境空氣)在電極間產生電漿以進行表面處理程序。 ψ【新型内容】 本創作即是依上揭具同一性質之作為清潔或改質工件 物之電漿產生裝置,來作為另一種電漿清潔或改質實施裝 置,以期在加工作業期間能產生均勻且濃密之電漿,使得 .工件物在簡便步驟下完成預期表層面之處理,具體降低工 件物處理之加工成本,減少異常放電,以有效延長電極之 。使用壽命。 本創作之主要目的是在提供一種用以產生電漿之裝置 ,其包含至少一對電極、腔室、氣體供應裝置、電源供應 _器,其中,該對電極之至少一部包含一金屬電極及一介電 _障礙層,係以一高介電系數物質(如,陶瓷、石英等)組 成之管狀物内鍍附以金屬層電極形成;兩電極間隔空間為 該腔室,其間容納氣體供應裝置;氣體供應裝置,用以提 供電漿反應氣體(如氬、氦、氧、壓縮空氣、靜態環境空 氣)至定義於該電極間之電場形成區;以及一電源供應器M285165 IV. Creation Description (1) - [New Technical Field] This creation is to provide a plasma generating device (1), which is mainly for the workpiece to be cleaned or modified by plasma. Designer of plasma cleaning or upgrading under atmospheric pressure. [Prior Art] The industry applies plasma to clean or modify the surface of the workpiece, usually in a closed chamber containing the workpiece, and the workpiece is placed in the chamber after being supported by the support frame, by gas (such as argon). , helium, oxygen, compressed air, static ambient air) produces plasma between the electrodes for surface treatment procedures. ψ【New content】 This creation is based on the same plasma cleaning device as a clean or modified workpiece, as another plasma cleaning or upgrading device, in order to produce uniformity during processing operations. And the dense plasma makes the workpiece complete the expected surface level processing in a simple step, specifically reducing the processing cost of the workpiece processing, reducing the abnormal discharge, so as to effectively extend the electrode. Service life. The main object of the present invention is to provide a device for generating plasma, comprising at least one pair of electrodes, a chamber, a gas supply device, and a power supply device, wherein at least one of the pair of electrodes comprises a metal electrode and a dielectric _ barrier layer formed by plating a metal layer electrode in a tubular body composed of a high dielectric constant material (eg, ceramic, quartz, etc.); the two electrode spacing spaces are the chambers, and the gas supply device is accommodated therebetween a gas supply device for supplying a plasma reaction gas (such as argon, helium, oxygen, compressed air, static ambient air) to an electric field forming region defined between the electrodes; and a power supply

UTILITY20050601PU683.ptd 第 5 頁 M285165 9、創作說明(2) 藉以於該電場形成區 ,施以該電極間之電壓差產生電場 内產生放電電漿。 【實施方式】 本 ,主要 作清潔 之處理 其 該 間,其 第 ,在此 則以鍍 於石英 成金屬 第 材質組 接至接 > 氣 氧、壓 場形成 電 藉以在 對 圖 創作設計之電漿產生裝置(一),參第一、一 是以非密閉之腔室(3)作為電衆產生空間、,—、三丨 之工件物(6)能擺設其間在大氧 乂(、預 。 J牧人巩壓下進行電漿清潔 中, 電極(1、2 )間隔形成空 腔室(3),是介於第一、 間容納氣體供應器(4 ); :電極(1) ’是以一高介電系數物質組成之管狀物 為以石央官作實施,其外層是以石英管(11),内層 ,方式將yf導電金屬材質(如銘、銅、鐵…)鑛附 官(11)内壁’或將石英管⑴)内注滿液態金屬以形 電極(12),其一端連接至電源供應器(5); 一電極(2 )’可為一般常壓下在非密閉空間以金屬 成之容納工件物(6 )擺置入電場形成區,其一端連 地端; 體供應器(4)/用以提供電漿反應氣體(如氬、氦、 縮空氣、靜態環境空氣)至定義於該兩電極間之電 區, 源供應器(5 ),係提供該兩電極間電壓產生電場, 該電場形成區内產生放電電裝; 上述預作清潔或改質之工件^(6)平穩架設在第二UTILITY20050601PU683.ptd Page 5 M285165 9. Creation Description (2) By the electric field forming region, the voltage difference between the electrodes is applied to generate a discharge plasma in the electric field. [Embodiment] This is mainly used for the cleaning process. The first part is here, which is plated with quartz to form a metal material, which is connected to the gas, oxygen, and pressure field to form electricity. The slurry generating device (1), the first and the first, is a non-closed chamber (3) as a space for generating electricity, and the workpiece (6) of the three-inch can be placed in a large oxygen chamber (pre. In the plasma cleaning under the pressure of J, the electrodes (1, 2) are separated to form a cavity (3), which is between the first and the middle to accommodate the gas supply (4); the electrode (1) is a The tubular material composed of high dielectric constant material is implemented by Shiyangguan, and the outer layer is made of quartz tube (11), inner layer, and yf conductive metal material (such as Ming, copper, iron...) is attached to the official (11) The inner wall' or the quartz tube (1) is filled with liquid metal to form an electrode (12), one end of which is connected to the power supply (5); one electrode (2)' can be made of metal in a non-closed space under normal atmospheric pressure. The workpiece (6) is placed in the electric field forming region, one end of which is connected to the ground end; the body supply device (4)/use Providing a plasma reactive gas (such as argon, helium, condensed air, static ambient air) to an electrical zone defined between the two electrodes, the source supply (5) providing an electric field between the electrodes to generate an electric field, the electric field forming region Discharge electrical equipment is generated internally; the above-mentioned pre-cleaned or modified workpiece ^(6) is erected in the second

UTILITY20050601PU683.ptd M285165 、創作說明(3) 電極(2)上,藉由啟動電源供應器(5),輸出設定電壓於兩 電極以產生電場,使腔室(3 )内產生電漿以對工件物(6 )進 灯表層面之清潔或改質,在預設時間後即可完成要求範圍 之清潔或改質,藉此得以在簡便之設置下提升工件物(6) 之清涕或改質效率,並降低工件物(6 )之處理成本。 另,本創作設計之電^生裝置,亦可使 一電極d、r 、厂)並聯或串聯之形式,參第四 弟 供更大的電漿產生空間以容納大面積或口以如 (6)進行電漿清潔加工。 長之工件物UTILITY20050601PU683.ptd M285165, Creation Instructions (3) On the electrode (2), by starting the power supply (5), the set voltage is output to the two electrodes to generate an electric field, and plasma is generated in the chamber (3) to the workpiece. (6) Cleaning or upgrading of the level of the lamp table, the cleaning or modification of the required range can be completed after the preset time, thereby improving the cleaning or upgrading efficiency of the workpiece (6) in a simple setting. And reduce the processing cost of the workpiece (6). In addition, the electro-generated device designed by the present invention can also make an electrode d, r, factory) in parallel or in series, and the fourth brother can provide a larger plasma generating space to accommodate a large area or a mouth such as (6) ) Perform plasma cleaning processing. Long workpiece

UTILITY20050601PU683.ptd 第7頁 M285165 圖式簡單說明 【圖式簡單說明】 第一圖:本創作電漿產生裝置實施示意圖 第二圖:本創作電漿產生裝置第一電極細部組成示意 圖 第三圖:本創作電漿產生裝置第一電極另一細部組成 不意圖 第四圖··本創作電漿產生裝置第一電極另一細部組成 不意圖 【主要元件符號說明】 〔本創作〕 (11)石英管 (2 )第二電極 (4 )氣體供應器 (6)工件物 (1、1 ’ 、厂)第一電極 (1 2 )金屬電極 (3)腔室 (5 )電源供應器UTILITY20050601PU683.ptd Page 7 M285165 Simple description of the drawing [Simple description of the drawing] The first picture: The schematic diagram of the implementation of the creation of the plasma generating device The second picture: The schematic diagram of the composition of the first electrode of the created plasma generating device The composition of the first electrode of the plasma generating device is not intended to be the fourth figure. The first electrode of the plasma generating device is composed of another detail. [Main component symbol description] [This creation] (11) Quartz tube ( 2) second electrode (4) gas supply (6) workpiece (1, 1 ', factory) first electrode (1 2) metal electrode (3) chamber (5) power supply

UTILITY20050601PU683.ptd 第8頁UTILITY20050601PU683.ptd Page 8

Claims (1)

M285165 五、申請專利範圍 * 1 · 一種電漿產生裝置(一),是以非密閉之腔室作為電漿 產生空間,以供預作清潔或改質之工件物能擺設其間在大 氣壓下進行電漿清潔或改質之處理,其包含至少一對電極 、腔室、氣體供應裝置、電源供應器,其中,兩電極間隔 空間為該腔室,其間容納氣體供應裝置;氣體供應裝置, 用以提供電漿反應氣體至定義於該電極間之電場形成區; 以及一電源供應^施以該電極間之電壓差產生電場’猎 以於該電場形成區内產生放電電浆’其特徵在於,該對電 極之至少一部,係為一高介電系數物質之管狀物内鍍附以 f金屬層電極。 2.如申請專利第圍第1項所述之「電漿產生裝置(一)」 ,採複數個電極並聯方式,提供較大電漿產生空間以容納 大面積之工件物進行電漿清潔或改質加工。 . 3.如申請專利第圍第1項所述之「電漿產生裝置(一)」 ,採複數個電極串聯方式,提供較長電漿產生空間以容納 _較長之工件物進行電漿清潔或改質加工。 4.如申請專利第圍第1項所述之「電漿產生裝置(一)」 ,前述之高介電系數物質係可選自陶瓷、石英。 ^ 5.如申請專利第圍第1項所述之「電漿產生裝置(一)」 ,前述之電漿反應氣體係可選自氫、氦、氧。 6. 如申請專利第圍第1項所述之「電漿產生裝置(一)」 ,前述之電漿反應氣體係可選自壓縮空氣或環境空氣。 7. 如申請專利第圍第1項所述之「電漿產生裝置(一)」 ,該對電極之至少一部,係為一高介電系數物質之管狀物M285165 V. Application scope* 1 · A plasma generating device (1) uses a non-closed chamber as a plasma generating space for pre-cleaning or upgrading of the workpiece to be electrically operated at atmospheric pressure. a slurry cleaning or upgrading process comprising at least one pair of electrodes, a chamber, a gas supply device, and a power supply, wherein the two electrode spacing spaces are the chambers, and the gas supply device is accommodated therebetween; the gas supply device is configured to provide a plasma reaction gas to an electric field forming region defined between the electrodes; and a power supply to apply a voltage difference between the electrodes to generate an electric field to hunter to generate a discharge plasma in the electric field forming region, wherein the pair At least one of the electrodes is a metal plate electrode coated with a ferroelectric layer. 2. For the "plasma generating device (1)" mentioned in the first paragraph of the patent application, a plurality of electrodes are connected in parallel to provide a large plasma generating space to accommodate a large area of the workpiece for plasma cleaning or modification. Quality processing. 3. For the "plasma generating device (1)" mentioned in the first paragraph of the patent application, several electrodes are connected in series to provide a long plasma generating space to accommodate the longer workpiece for plasma cleaning. Or upgraded processing. 4. The "plasma generating device (1)" described in the first paragraph of the patent application, wherein the high dielectric constant material may be selected from the group consisting of ceramics and quartz. ^ 5. The "plasma generating device (1)" described in the first paragraph of the patent application, wherein the plasma reactive gas system may be selected from the group consisting of hydrogen, helium and oxygen. 6. The "plasma generating device (1)" as described in the first paragraph of the patent application may be selected from the group consisting of compressed air or ambient air. 7. In the "plasma generating device (1)" mentioned in the first paragraph of the patent application, at least one of the pair of electrodes is a tube of a high dielectric constant substance. UTILITY20050601PU683.ptd 第 9 頁 M285165 五、申請專利範圍 -內注滿以液態金屬。 Ο « inn UTILITY20050601PU683.ptd 第 10 頁UTILITY20050601PU683.ptd Page 9 M285165 V. Patent Application Scope - Filled with liquid metal. Ο « inn UTILITY20050601PU683.ptd Page 10
TW94209188U 2005-06-01 2005-06-01 Plasma generating device TWM285165U (en)

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