TWI818011B - 耐指紋性的評估方法、光學構件的生產方法及光學構件 - Google Patents

耐指紋性的評估方法、光學構件的生產方法及光學構件 Download PDF

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Publication number: TWI818011B
Authority: TW; Taiwan
Prior art keywords: coating; brightness; oleic acid; fingerprint resistance; evaluated
Prior art date: 2018-08-30

Application number

TW108112638A

Other languages

English (en)

Chinese (zh)

Other versions

TW202009474A (zh

Inventor

星野弘気

戶高昌也

大類知生

Original Assignee

日商琳得科股份有限公司

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2018-08-30

Filing date

2019-04-11

Publication date

2023-10-11

2019-04-11 Application filed by 日商琳得科股份有限公司 filed Critical 日商琳得科股份有限公司

2020-03-01 Publication of TW202009474A publication Critical patent/TW202009474A/zh

2023-10-11 Application granted granted Critical

2023-10-11 Publication of TWI818011B publication Critical patent/TWI818011B/zh

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Classifications

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- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/4738—Diffuse reflection, e.g. also for testing fluids, fibrous materials
- G—PHYSICS
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- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/26—Oils; Viscous liquids; Paints; Inks
- G01N33/32—Paints; Inks
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- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N2021/9511—Optical elements other than lenses, e.g. mirrors
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
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- G01N21/84—Systems specially adapted for particular applications
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TW108112638A 2018-08-30 2019-04-11 耐指紋性的評估方法、光學構件的生產方法及光學構件 TWI818011B (zh)

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JP7367246B2 (ja) *	2022-02-09	2023-10-23	日本航空電子工業株式会社	耐指紋性の評価方法
WO2023153456A1 (ja) *	2022-02-09	2023-08-17	日本航空電子工業株式会社	耐指紋性の評価方法、積層体、その製造方法および表示装置
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KR20200026008A (ko)	2020-03-10
CN110873702A (zh)	2020-03-10
TW202009474A (zh)	2020-03-01
JP7347922B2 (ja)	2023-09-20
JP2023171767A (ja)	2023-12-05
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Publication	Publication Date	Title
TWI818011B (zh)	2023-10-11	耐指紋性的評估方法、光學構件的生產方法及光學構件
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TW202221362A (zh)	2022-06-01	抗反射膜
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