TWI795646B - 曝光設備、曝光方法、及製造物品的方法 - Google Patents
曝光設備、曝光方法、及製造物品的方法 Download PDFInfo
- Publication number
- TWI795646B TWI795646B TW109119830A TW109119830A TWI795646B TW I795646 B TWI795646 B TW I795646B TW 109119830 A TW109119830 A TW 109119830A TW 109119830 A TW109119830 A TW 109119830A TW I795646 B TWI795646 B TW I795646B
- Authority
- TW
- Taiwan
- Prior art keywords
- temperature
- temperature controller
- period
- exposure
- optical element
- Prior art date
Links
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
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- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Manufacturing & Machinery (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Public Health (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Toxicology (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lens Barrels (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Eyeglasses (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019117714 | 2019-06-25 | ||
JP2019-117714 | 2019-06-25 | ||
JP2020068731A JP6951498B2 (ja) | 2019-06-25 | 2020-04-07 | 露光装置、露光方法および物品製造方法 |
JP2020-068731 | 2020-04-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202109202A TW202109202A (zh) | 2021-03-01 |
TWI795646B true TWI795646B (zh) | 2023-03-11 |
Family
ID=74099408
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109119830A TWI795646B (zh) | 2019-06-25 | 2020-06-12 | 曝光設備、曝光方法、及製造物品的方法 |
Country Status (3)
Country | Link |
---|---|
JP (2) | JP6951498B2 (ko) |
KR (1) | KR20210000667A (ko) |
TW (1) | TWI795646B (ko) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5805273A (en) * | 1994-04-22 | 1998-09-08 | Canon Kabushiki Kaisha | Projection exposure apparatus and microdevice manufacturing method |
US20050140947A1 (en) * | 2003-12-12 | 2005-06-30 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method |
TW200923594A (en) * | 2007-10-09 | 2009-06-01 | Zeiss Carl Smt Ag | Device for controlling temperature of an optical element |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19807094A1 (de) * | 1998-02-20 | 1999-08-26 | Zeiss Carl Fa | Optische Anordnung und Projektionsbelichtungsanlage der Mikrolithographie mit passiver thermischer Kompensation |
JP2002373848A (ja) * | 2001-06-15 | 2002-12-26 | Canon Inc | 基板ホルダの表面状態測定方法及び測定装置 |
JP2003234276A (ja) | 2002-02-07 | 2003-08-22 | Nikon Corp | 露光装置及び光学装置、デバイス製造方法 |
JP2005051147A (ja) | 2003-07-31 | 2005-02-24 | Nikon Corp | 露光方法及び露光装置 |
EP1724816A4 (en) * | 2004-02-13 | 2007-10-24 | Nikon Corp | EXPOSURE METHOD AND SYSTEM, AND DEVICE MANUFACTURING METHOD |
JP2005311020A (ja) | 2004-04-21 | 2005-11-04 | Nikon Corp | 露光方法及びデバイス製造方法 |
JP5266641B2 (ja) * | 2004-08-31 | 2013-08-21 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
JP2006073584A (ja) * | 2004-08-31 | 2006-03-16 | Nikon Corp | 露光装置及び方法並びにデバイス製造方法 |
US20080204682A1 (en) * | 2005-06-28 | 2008-08-28 | Nikon Corporation | Exposure method and exposure apparatus, and device manufacturing method |
JP2007317847A (ja) * | 2006-05-25 | 2007-12-06 | Nikon Corp | 露光装置及びデバイス製造方法 |
US20080049202A1 (en) | 2006-08-22 | 2008-02-28 | Carl Zeiss Smt Ag | Projection exposure apparatus for semiconductor lithography |
JP2008130827A (ja) * | 2006-11-21 | 2008-06-05 | Matsushita Electric Ind Co Ltd | 露光装置及び露光方法 |
DE102008040218A1 (de) * | 2007-07-11 | 2009-01-15 | Carl Zeiss Smt Ag | Drehbares optisches Element |
NL2005449A (en) | 2009-11-16 | 2012-04-05 | Asml Netherlands Bv | Lithographic method and apparatus. |
KR101679136B1 (ko) | 2012-02-04 | 2016-11-23 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래픽 투영 노광 장치의 동작 방법 및 이러한 장치의 투영 오브젝티브 |
WO2016087388A1 (en) | 2014-12-02 | 2016-06-09 | Asml Netherlands B.V. | Lithographic method and apparatus |
-
2020
- 2020-04-07 JP JP2020068731A patent/JP6951498B2/ja active Active
- 2020-06-12 TW TW109119830A patent/TWI795646B/zh active
- 2020-06-16 KR KR1020200072821A patent/KR20210000667A/ko not_active Application Discontinuation
-
2021
- 2021-09-15 JP JP2021150414A patent/JP7457678B2/ja active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5805273A (en) * | 1994-04-22 | 1998-09-08 | Canon Kabushiki Kaisha | Projection exposure apparatus and microdevice manufacturing method |
US20050140947A1 (en) * | 2003-12-12 | 2005-06-30 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method |
TW200923594A (en) * | 2007-10-09 | 2009-06-01 | Zeiss Carl Smt Ag | Device for controlling temperature of an optical element |
Also Published As
Publication number | Publication date |
---|---|
JP2021185442A (ja) | 2021-12-09 |
TW202109202A (zh) | 2021-03-01 |
JP6951498B2 (ja) | 2021-10-20 |
JP7457678B2 (ja) | 2024-03-28 |
JP2021005073A (ja) | 2021-01-14 |
KR20210000667A (ko) | 2021-01-05 |
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