TWI781371B - Adhesive sheet, method for producing adhesive sheet, method for producing intermediate laminate, and intermediate laminate - Google Patents
Adhesive sheet, method for producing adhesive sheet, method for producing intermediate laminate, and intermediate laminate Download PDFInfo
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- TWI781371B TWI781371B TW109103195A TW109103195A TWI781371B TW I781371 B TWI781371 B TW I781371B TW 109103195 A TW109103195 A TW 109103195A TW 109103195 A TW109103195 A TW 109103195A TW I781371 B TWI781371 B TW I781371B
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/06—Non-macromolecular additives organic
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J201/00—Adhesives based on unspecified macromolecular compounds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
- C09J7/24—Plastics; Metallised plastics based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
- C09J7/25—Plastics; Metallised plastics based on macromolecular compounds obtained otherwise than by reactions involving only carbon-to-carbon unsaturated bonds
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/416—Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Laminated Bodies (AREA)
- Adhesive Tapes (AREA)
Abstract
本發明之黏著片材1具備第1黏著層2、配置於第1黏著層2之一面之基材3、及配置於基材3之一面之第2黏著層4。第1黏著層2包含可藉由活性光線之照射而降低波長550 nm下之可見光透過率之黏著性組合物。基材3及/或第2黏著層4之活性光線之平均透過率為15%以下。The adhesive sheet 1 of the present invention includes a first adhesive layer 2 , a substrate 3 arranged on one side of the first adhesive layer 2 , and a second adhesive layer 4 arranged on one side of the substrate 3 . The first adhesive layer 2 includes an adhesive composition that can reduce the transmittance of visible light at a wavelength of 550 nm by irradiation of active light. The average transmittance of active light rays of the substrate 3 and/or the second adhesive layer 4 is 15% or less.
Description
本發明係關於一種黏著片材、黏著片材之製造方法、中間積層體之製造方法及中間積層體,詳細而言關於一種黏著片材、該黏著片材之製造方法、使用該黏著片材所獲得之中間積層體之製造方法、及藉由該中間積層體之製造方法所獲得之中間積層體。The present invention relates to an adhesive sheet, a method for manufacturing the adhesive sheet, a method for manufacturing an intermediate laminate, and an intermediate laminate. Specifically, it relates to an adhesive sheet, a method for manufacturing the adhesive sheet, and an adhesive sheet using the The manufacturing method of the obtained intermediate laminate, and the intermediate laminate obtained by the manufacturing method of the intermediate laminate.
近年來,已知搭載有有機EL(Electroluminescence,電致發光)面板之顯示器。有機EL面板具有反射性較高之電極層,因此容易產生外界光反射或背景之映入等。In recent years, displays equipped with organic EL (Electroluminescence, electroluminescence) panels have been known. The organic EL panel has a highly reflective electrode layer, so it is easy to produce external light reflection or background reflection.
並且,已知為了防止外界光反射或背景之映入而於電極層之反射面設置具有吸收光之功能之層。In addition, it is known to provide a layer having a function of absorbing light on the reflective surface of the electrode layer in order to prevent external light reflection or background reflection.
作為此種層,提出有包含碳黑顏料及染料之光吸收層(例如參照專利文獻1)。 [先前技術文獻] [專利文獻]As such a layer, a light-absorbing layer containing a carbon black pigment and a dye has been proposed (for example, refer to Patent Document 1). [Prior Art Literature] [Patent Document]
[專利文獻1]日本專利特開2017-203810公報[Patent Document 1] Japanese Patent Application Laid-Open No. 2017-203810
[發明所欲解決之問題][Problem to be solved by the invention]
另一方面,於具有吸收光之功能之層為黏著層之情形時,就檢查等之觀點而言,有時要求透明性。On the other hand, when the layer having the function of absorbing light is an adhesive layer, transparency may be required from the viewpoint of inspection or the like.
於此種情形時,對使黏著層中包含藉由酸著色之化合物、及光酸產生劑之方法進行了研究。In such a case, a method of including a compound colored by an acid and a photoacid generator in an adhesive layer has been studied.
若對此種黏著層照射活性光線,則自光酸產生劑產生酸,化合物藉由該酸著色。When such an adhesive layer is irradiated with active light, an acid is generated from the photoacid generator, and the compound is colored by the acid.
即,於該黏著層中,可藉由於任意時點照射活性光線而使黏著層著色,藉此可賦予吸收光之功能。That is, in this adhesive layer, the function of absorbing light can be given by coloring an adhesive layer by irradiating active light at arbitrary timing.
但是,於此種黏著層中,視目的及用途存在欲使著色部分以外透明地殘留之情形、或欲使其著色量少於著色部分之情形。However, in such an adhesive layer, depending on the purpose and use, there may be cases where it is desired to leave the colored part transparent, or the coloring amount may be less than that of the colored part.
於此種情形時,若著色部分以外暴露於外界光(活性光線)下,則有欲使之透明地殘留之部分著色,又,欲使著色量少於著色部分之部分之著色量增多之不良情況。In this case, if the colored part is exposed to external light (active light), the part to be left transparently will be colored, and the coloring amount of the part that is intended to be less than the colored part will be increased. Condition.
本發明提供一種可藉由於任意時點照射活性光線而使第1黏著層著色,且可抑制著色部分以外由外界光(活性光線)著色之黏著片材、該黏著片材之製造方法、使用該黏著片材所獲得之中間積層體之製造方法、及藉由該中間積層體之製造方法所獲得之中間積層體。 [解決問題之技術手段]The present invention provides an adhesive sheet capable of coloring a first adhesive layer by irradiating active light rays at any point of time and suppressing coloring by external light (active light rays) other than the colored portion, a method for producing the adhesive sheet, and an adhesive sheet using the adhesive sheet. A method for producing an intermediate laminate obtained from the sheet, and an intermediate laminate obtained by the method for producing the intermediate laminate. [Technical means to solve the problem]
本發明[1]係一種黏著片材,其具備第1黏著層、配置於上述第1黏著層之一面之基材、及配置於上述基材之一面之第2黏著層,上述第1黏著層包含可藉由活性光線之照射而降低波長550 nm下之可見光透過率之黏著性組合物,且上述基材及/或第2黏著層之活性光線之平均透過率為15%以下。The present invention [1] is an adhesive sheet comprising a first adhesive layer, a base material disposed on one side of the first adhesive layer, and a second adhesive layer disposed on one side of the base material, the first adhesive layer Contains an adhesive composition that can reduce the transmittance of visible light at a wavelength of 550 nm by irradiation of active light, and the average transmittance of active light on the substrate and/or the second adhesive layer is 15% or less.
本發明[2]包括如上述[1]記載之黏著片材,其中上述第1黏著層包含可藉由紫外線之照射而降低波長550 nm下之可見光透過率之黏著性組合物,且上述基材及/或第2黏著層之波長300 nm以上且400 nm以下之平均透過率為15%以下。The present invention [2] includes the adhesive sheet described in the above [1], wherein the first adhesive layer comprises an adhesive composition capable of reducing the transmittance of visible light at a wavelength of 550 nm by irradiation of ultraviolet rays, and the substrate And/or the second adhesive layer has an average transmittance of not more than 15% at a wavelength of not less than 300 nm and not more than 400 nm.
本發明[3]包括如技術方案2記載之黏著片材,其特徵在於:上述基材及/或第2黏著層之波長400 nm以上且700 nm以下之平均透過率為50%以上。The present invention [3] includes the adhesive sheet according to
本發明[4]包括如上述[2]或[3]記載之黏著片材,其中上述基材及/或第2黏著層包含紫外線吸收劑。The present invention [4] includes the adhesive sheet according to the above [2] or [3], wherein the base material and/or the second adhesive layer contain an ultraviolet absorber.
本發明[5]包括如上述[1]至[4]中任一項記載之黏著片材,其中上述黏著性組合物包含作為單體成分之聚合物之黏著性聚合物、藉由酸著色之化合物、及光酸產生劑。The present invention [5] includes the adhesive sheet described in any one of the above-mentioned [1] to [4], wherein the above-mentioned adhesive composition comprises an adhesive polymer as a polymer of a monomer component, an adhesive polymer colored by an acid compounds, and photoacid generators.
本發明[6]係一種黏著片材之製造方法,其包括如下步驟:第1黏著層準備步驟,其係準備包含可藉由活性光線之照射而降低波長550 nm下之可見光透過率之黏著性組合物的黏著層;基材配置步驟,其係於上述第1黏著層之一面配置基材;及第2黏著層配置步驟,其係於上述基材之一面配置第2黏著層;且上述基材及/或第2黏著層之活性光線之平均透過率為15%以下。The present invention [6] is a method of manufacturing an adhesive sheet, which includes the following steps: a first adhesive layer preparation step, which is to prepare an adhesive layer that can reduce the transmittance of visible light at a wavelength of 550 nm by irradiation of active light rays. The adhesive layer of the composition; the step of arranging the substrate, which is to arrange the substrate on one side of the first adhesive layer; and the step of arranging the second adhesive layer, which is to arrange the second adhesive layer on one side of the above-mentioned substrate; and the above-mentioned substrate The average transmittance of the active light rays of the material and/or the second adhesive layer is 15% or less.
本發明[7]包括如上述[6]記載之黏著片材之製造方法,其中於上述第1黏著層準備步驟後且上述基材配置步驟前對上述第1黏著層照射活性光線。The present invention [7] includes the method for producing an adhesive sheet according to the above [6], wherein the first adhesive layer is irradiated with active light after the step of preparing the first adhesive layer and before the step of arranging the substrate.
本發明[8]包括如上述[6]記載之黏著片材之製造方法,其中於上述第2黏著層配置步驟後對上述第1黏著層照射活性光線。The present invention [8] includes the method for producing an adhesive sheet according to the above [6], wherein the first adhesive layer is irradiated with active light rays after the step of arranging the second adhesive layer.
本發明[9]包括一種中間積層體之製造方法,其包括如下步驟:準備步驟,其係準備藉由如上述[8]記載之黏著片材之製造方法所製造之黏著片材;照射步驟,其係對上述第1黏著層照射活性光線而於上述第1黏著層形成活性光線之照射量相對較高之高照射部分、及活性光線之照射量相對較低或未照射到活性光線之未照射/低照射部分,藉此使上述高照射部分之波長550 nm下之可見光透過率小於上述未照射/低照射部分之波長550 nm下之可見光透過率;及貼合步驟,其係將上述黏著片材之另一面貼合於被黏著體。The present invention [9] includes a method of manufacturing an intermediate laminate, which includes the following steps: a preparation step of preparing an adhesive sheet manufactured by the method of manufacturing an adhesive sheet as described in the above [8]; an irradiation step, It is to irradiate the above-mentioned first adhesive layer with active light to form a high-irradiation portion with a relatively high amount of active light on the above-mentioned first adhesive layer, and a non-irradiated portion with a relatively low amount of active light or no active light. /Low irradiated part, so that the visible light transmittance at the wavelength of 550 nm of the above-mentioned high-irradiated part is smaller than the visible light transmittance of the above-mentioned unirradiated/low-irradiated part at a wavelength of 550 nm; and a bonding step, which is to attach the above-mentioned adhesive sheet The other side of the material is attached to the adherend.
本發明[10]包括如上述[9]記載之中間積層體之製造方法,其中於上述準備步驟後實施上述照射步驟,且於上述照射步驟後實施上述貼合步驟。The present invention [10] includes the manufacturing method of the intermediate laminate described in the above [9], wherein the irradiation step is carried out after the preparation step, and the bonding step is carried out after the irradiation step.
本發明[11]包括如上述[9]記載之中間積層體之製造方法,其中於上述準備步驟後實施上述貼合步驟,且於上述貼合步驟後實施上述照射步驟。The present invention [11] includes the manufacturing method of the intermediate laminate described in the above [9], wherein the bonding step is carried out after the preparation step, and the irradiation step is carried out after the bonding step.
本發明[12]係一種如上述[10]記載之中間積層體之製造方法,其中於上述照射步驟中,自上述第2黏著層之表面側對上述第1黏著層照射活性光線。The present invention [12] is a method for producing an intermediate laminate according to the above [10], wherein in the irradiating step, the first adhesive layer is irradiated with active light from the surface side of the second adhesive layer.
本發明[13]係一種如上述[11]記載之中間積層體之製造方法,其中於上述照射步驟中,自上述第2黏著層之表面側對上述第1黏著層照射活性光線、。The present invention [13] is a method for producing an intermediate laminate according to the above [11], wherein in the irradiating step, the first adhesive layer is irradiated with active light from the surface side of the second adhesive layer.
本發明[14]包括如技術方案[10]記載之中間積層體之製造方法,其中於上述照射步驟中,自上述第1黏著層之表面側對上述第1黏著層照射活性光線。The present invention [14] includes the manufacturing method of the intermediate laminate described in claim [10], wherein in the irradiation step, the first adhesive layer is irradiated with active light from the surface side of the first adhesive layer.
本發明[15]包括如上述[11]記載之中間積層體之製造方法,其中於上述照射步驟中,自上述被黏著體之表面側對上述第1黏著層照射活性光線。The present invention [15] includes the method for producing an intermediate laminate according to the above [11], wherein in the irradiation step, the first adhesive layer is irradiated with active light from the surface side of the adherend.
本發明[16]包括如上述[15]記載之中間積層體之製造方法,其中上述被黏著體之活性光線之平均透過率為60%以上,且於上述照射步驟中,於在上述被黏著體側之另一面之一部分配置遮斷活性光線之遮罩後,對上述第1黏著層照射活性光線。The present invention [16] includes the method for producing an intermediate laminate as described in the above [15], wherein the average transmittance of the active light rays of the above-mentioned adherend is 60% or more, and in the above-mentioned irradiation step, in the above-mentioned adherend A part of the other surface of the side is provided with a mask for blocking active light rays, and then the above-mentioned first adhesive layer is irradiated with active light rays.
本發明[17]包括如上述[15]記載之中間積層體之製造方法,其中上述被黏著體遮斷活性光線,且於上述貼合步驟中,將上述被黏著體配置於上述黏著片材之另一面之一部分。The present invention [17] includes the manufacturing method of the intermediate laminate described in the above [15], wherein the above-mentioned adherend blocks active light rays, and in the above-mentioned bonding step, the above-mentioned adherend is arranged on the above-mentioned adhesive sheet part of the other side.
本發明[18]包括如上述[9]至[17]中任一項記載之中間積層體之製造方法,其中上述未照射/低照射部分為未照射到活性光線之未照射部分,且上述未照射部分之波長550 nm下之可見光透過率為80%以上。The present invention [18] includes the method for producing an intermediate laminate as described in any one of the above [9] to [17], wherein the above-mentioned unirradiated/low-irradiated portion is an unirradiated portion that is not irradiated with active light, and the above-mentioned unirradiated The visible light transmittance of the irradiated part at a wavelength of 550 nm is above 80%.
本發明[19]包括如上述[9]至[16]中任一項記載之中間積層體之製造方法,其中上述未照射/低照射部分為活性光線之照射量低之低照射部分,上述照射步驟包括:第1照射步驟,其係藉由於配置遮斷活性光線之第1遮罩後對上述第1黏著層照射活性光線,而於上述第1黏著層形成照射到活性光線之第1照射部分、及未照射到活性光線之暫未照射部分;及第2照射步驟,其係藉由於在上述第1照射部分配置遮斷活性光線之第2遮罩後對上述第1黏著層中之上述暫未照射部分照射活性光線,而使上述暫未照射部分形成為第2照射部分;且上述第1照射部分及上述第2照射部分中之任一者為上述高照射部分,另一者為上述低照射部分。The present invention [19] includes the method for producing an intermediate laminate as described in any one of the above [9] to [16], wherein the above-mentioned unirradiated/low-irradiated portion is a low-irradiated portion with a low amount of active light rays, and the above-mentioned irradiated The steps include: a first irradiating step, which is to irradiate the first adhesive layer with active light after arranging a first mask that blocks the active light, so as to form a first irradiated portion on the first adhesive layer that is irradiated with active light , and the temporarily unirradiated part that has not been irradiated with the active light; and the second irradiation step, which is to treat the above-mentioned temporary mask in the above-mentioned first adhesive layer after the second mask that blocks the active light is arranged on the above-mentioned first irradiation part. The unirradiated part is irradiated with active light, so that the above-mentioned temporarily unirradiated part is formed into the second irradiated part; Irradiated part.
本發明[20]包括如上述[9]至[16]中任一項記載之中間積層體之製造方法,其中上述未照射/低照射部分為活性光線之照射量低之低照射部分,上述照射步驟包括:第3照射步驟,其係藉由對上述第1黏著層之全部照射活性光線,而使上述第1黏著層之全部形成為照射到活性光線之第3照射部分;及第4照射步驟,其係藉由於在上述第3照射部分之一部分配置遮斷活性光線之遮罩後對上述第3照射部分之其餘部分照射活性光線,而使上述第3照射部分之其餘部分形成為第4照射部分;且上述第3照射部分為上述低照射部分,上述第4照射部分為上述高照射部分。The present invention [20] includes the method for producing an intermediate laminate as described in any one of the above [9] to [16], wherein the above-mentioned non-irradiated/low-irradiated portion is a low-irradiated portion with a low irradiation amount of active light, and the above-mentioned irradiated The steps include: a third irradiating step of forming the entire first adhesive layer as a third irradiated portion irradiated with active light by irradiating the entire first adhesive layer with active light; and a fourth irradiating step , by irradiating the remaining part of the third irradiation part with active light rays after arranging a mask for blocking active light rays on a part of the third irradiation part, so that the remaining part of the third irradiation part is formed into a fourth irradiation part; and the third irradiated part is the low irradiated part, and the fourth irradiated part is the high irradiated part.
本發明[21]包括如上述[19]記載之中間積層體之製造方法,其中上述高照射部分之波長550 nm下之可見光透過率未達20%,且上述低照射部分之波長550 nm下之可見光透過率為20%以上且70%以下。The present invention [21] includes the manufacturing method of the intermediate laminate described in the above [19], wherein the visible light transmittance at the wavelength of 550 nm of the above-mentioned high-irradiation part is less than 20%, and the transmittance of visible light at the wavelength of 550 nm of the above-mentioned low-irradiation part is The visible light transmittance is not less than 20% and not more than 70%.
本發明[22]係一種中間積層體,其具備:黏著片材,其具備第1黏著層、配置於上述第1黏著層之一面之基材、及配置於上述基材之一面之第2黏著層;及被黏著體,其配置於上述黏著片材之另一面;上述第1黏著層具備波長550 nm下之可見光透過率相對較大之高光透過率部分、及波長550 nm下之可見光透過率相對較小之低光透過率部分,且上述基材及/或第2黏著層之活性光線之平均透過率為15%以下。The present invention [22] is an intermediate laminate comprising: an adhesive sheet comprising a first adhesive layer, a base material disposed on one side of the first adhesive layer, and a second adhesive disposed on one side of the base material. layer; and an adherend, which is arranged on the other side of the above-mentioned adhesive sheet; the above-mentioned first adhesive layer has a high light transmittance part with a relatively large visible light transmittance at a wavelength of 550 nm, and a visible light transmittance at a wavelength of 550 nm Relatively small parts with low light transmittance, and the average transmittance of the active light of the above-mentioned base material and/or the second adhesive layer is 15% or less.
本發明[23]包括如上述[22]記載之中間積層體,其中上述低光透過率部分具有圖案形狀。The present invention [23] includes the intermediate laminate described in the above [22], wherein the low light transmittance portion has a pattern shape.
本發明[24]包括如上述[22]或[23]記載之中間積層體,其中上述高光透過率部分之波長550 nm下之可見光透過率為80%以上。The present invention [24] includes the intermediate laminate described in the above [22] or [23], wherein the visible light transmittance at a wavelength of 550 nm of the above-mentioned high light transmittance portion is 80% or more.
本發明[25]包括如上述[22]或[23]記載之中間積層體,其中上述低光透過率部分之波長550 nm下之可見光透過率未達20%,且上述高光透過率部分之波長550 nm下之可見光透過率為20%以上且70%以下。 [發明之效果]The present invention [25] includes the intermediate laminate as described in the above [22] or [23], wherein the visible light transmittance at a wavelength of 550 nm of the above-mentioned low light transmittance part is less than 20%, and the wavelength of the above-mentioned high light transmittance part is Visible light transmittance at 550 nm is not less than 20% and not more than 70%. [Effect of Invention]
於本發明之黏著片材中,第1黏著層包含可藉由活性光線之照射而降低波長550 nm下之可見光透過率之黏著性組合物。In the adhesive sheet of the present invention, the first adhesive layer includes an adhesive composition capable of reducing the transmittance of visible light at a wavelength of 550 nm by irradiation with active light.
因此,可藉由於任意時點照射活性光線而使第1黏著層著色,藉此可賦予吸收光之功能。Therefore, the first adhesive layer can be colored by irradiating actinic light at an arbitrary point of time, thereby imparting a light-absorbing function.
又,於該黏著片材中,基材及/或第2黏著層之活性光線之平均透過率為15%以下。Moreover, in this adhesive sheet, the average transmittance of active light rays of a base material and/or a 2nd adhesive layer is 15% or less.
因此,於欲使第1黏著層中之著色部分以外透明地殘留之情形、或欲使其著色量少於著色部分之情形時,可抑制著色部分以外由外界光(活性光線)著色。Therefore, when it is desired to leave transparently other than the colored portion in the first adhesive layer, or to make the amount of coloring smaller than that of the colored portion, it is possible to suppress coloring of the colored portion by external light (active light).
本發明之黏著片材之製造方法包括如下步驟:基材配置步驟,其係於第1黏著層之一面配置基材;及第2黏著層配置步驟,其係於基材之一面配置第2黏著層。The manufacturing method of the adhesive sheet of the present invention comprises the following steps: a base material disposing step, which is to dispose the base material on one side of the first adhesive layer; and a second adhesive layer disposing step, which is to dispose the second adhesive layer on one side of the base material. Floor.
因此,於欲使第1黏著層中之著色部分以外透明地殘留之情形、或欲使其著色量少於著色部分之情形時,可抑制著色部分以外由外界光(活性光線)著色。Therefore, when it is desired to leave transparently other than the colored portion in the first adhesive layer, or to make the amount of coloring smaller than that of the colored portion, it is possible to suppress coloring of the colored portion by external light (active light).
本發明之中間積層體之製造方法包括準備本發明之黏著片材之準備步驟。The manufacturing method of the intermediate laminate of the present invention includes a preparatory step of preparing the adhesive sheet of the present invention.
因此,藉由該中間積層體之製造方法所獲得之中間積層體可抑制著色部分以外(未照射/低照射部分)由外界光(活性光線)著色。Therefore, the intermediate laminate obtained by the method for producing the intermediate laminate can suppress coloring by external light (acting light) other than the colored portion (non-irradiated/low-irradiated portion).
於本發明之中間積層體中,基材及/或第2黏著層之活性光線之平均透過率為15%以下。In the intermediate laminate of the present invention, the average transmittance of active light rays of the substrate and/or the second adhesive layer is 15% or less.
因此,可抑制著色部分以外(低光透過率部分)由外界光(活性光線)著色。Therefore, coloring by external light (active light rays) other than the colored portion (low light transmittance portion) can be suppressed.
1.黏著片材
如圖1A所示,黏著片材1具有具特定厚度之膜形狀(包括片材形狀),於與厚度方向正交之方向(面方向)上延伸,且具有平坦之上表面及平坦之下表面。1. Adhesive sheet
As shown in FIG. 1A, the
具體而言,黏著片材1具備第1黏著層2、配置於第1黏著層2之一面之基材3、及配置於基材之一面之第2黏著層4。Specifically, the
又,基材3及/或第2黏著層4之波長300 nm以上且400 nm以下之平均透過率為特定範圍。In addition, the average transmittance of the
即,基材3及/或第2黏著層4具備活性光線吸收性。That is, the
作為活性光線,可列舉紫外線、可見光、紅外線、X射線、α射線、β射線、γ射線,就使用設備之多樣性及操作容易性之觀點而言,較佳可例舉紫外線。Examples of the active light rays include ultraviolet rays, visible light, infrared rays, X-rays, α rays, β rays, and γ rays, and preferred examples include ultraviolet rays from the viewpoint of diversity of equipment used and ease of handling.
又,紫外線意指1 nm以上且400 nm以下之波長範圍之電磁波。In addition, ultraviolet rays mean electromagnetic waves in a wavelength range of not less than 1 nm and not more than 400 nm.
即,基材3及/或第2黏著層4較佳為具備紫外線吸收性。That is, the
若基材3及/或第2黏著層4具備活性光線吸收性,則於欲使第1黏著層2中之著色部分以外透明地殘留之情形、或欲使其著色量少於著色部分之情形時,可抑制著色部分以外由外界光(紫外線)著色。If the
詳細而言,如圖1B所示,僅基材3具備活性光線吸收性,或者,如圖1C所示,僅第2黏著層4具備活性光線吸收性,或者,如圖1D所示,基材3及第2黏著層4兩者具備活性光線吸收性。In detail, as shown in FIG. 1B, only the
就確實地抑制由外界光(活性光線)所引起之著色之觀點而言,較佳為基材3及第2黏著層4兩者具備活性光線吸收性。It is preferable that both the
以下對構成黏著片材1之各層進行說明。Each layer constituting the
1-1.黏著層
第1黏著層2係黏著片材1之上層。1-1. Adhesive layer
The first
第1黏著層2係用以使黏著片材1與被黏著體15(下述)接著之感壓接著層。The first
第1黏著層2具有於面方向上延伸之膜形狀,且具有平坦之平面及平坦之下表面。The first
第1黏著層2包含可藉由活性光線之照射而降低波長550 nm下之可見光透過率之黏著性組合物(以下設為第1黏著性組合物)。The first
因此,可藉由於任意時點對第1黏著層2照射活性光線而使第1黏著層2著色,藉此可賦予吸收光之功能。Therefore, the first
又,第1黏著層2較佳為包含可藉由紫外線之照射而降低波長550 nm下之可見光透過率之黏著性組合物。Also, the first
再者,可使第1黏著性組合物之波長550 nm下之可見光透過率降低之活性光線之種類係由下述光酸產生劑之種類(具體而言為光酸產生劑產生酸之活性光線之波長)決定。Furthermore, the type of active light that can reduce the visible light transmittance of the first adhesive composition at a wavelength of 550 nm is the following type of photoacid generator (specifically, the active light that generates acid from the photoacid generator) wavelength) is determined.
第1黏著性組合物包含黏著性聚合物、藉由酸著色之化合物、及光酸產生劑。The first adhesive composition contains an adhesive polymer, a compound colored by an acid, and a photoacid generator.
若第1黏著性組合物包含黏著性聚合物、藉由酸著色之化合物、及光酸產生劑,則可藉由活性光線(較佳為紫外線)之照射確實地使第1黏著層2之波長550 nm下之可見光透過率降低。If the first adhesive composition includes an adhesive polymer, a compound colored by an acid, and a photoacid generator, the wavelength of the first
黏著性聚合物係為了賦予黏著性所調配。Adhesive polymers are formulated to impart adhesive properties.
黏著性聚合物係單體成分(下述)之聚合物,例如可列舉丙烯酸系聚合物、聚矽氧系聚合物、胺基甲酸酯系聚合物、橡膠系聚合物等,就光學透明性、接著性、及儲存模數之控制之觀點而言,較佳可例舉丙烯酸系聚合物。Adhesive polymer-based monomer components (described below) polymers, such as acrylic polymers, polysiloxane-based polymers, urethane-based polymers, rubber-based polymers, etc., optical transparency , adhesiveness, and control of storage modulus, preferably acrylic polymers may be mentioned.
丙烯酸系聚合物係藉由包含(甲基)丙烯酸烷基酯作為主成分之單體成分之聚合所獲得。The acrylic polymer is obtained by polymerization of a monomer component containing an alkyl (meth)acrylate as a main component.
(甲基)丙烯酸烷基酯係丙烯酸酯及/或甲基丙烯酸酯,例如可列舉(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸新戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸異三-十二烷基酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸異十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸十六烷基酯、(甲基)丙烯酸十七烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸異十八烷基酯、(甲基)丙烯酸十九烷基酯、(甲基)丙烯酸二十烷基酯等直鏈狀或支鏈狀之(甲基)丙烯酸C1-20烷基酯等,較佳可例舉(甲基)丙烯酸C4-12烷基酯,更佳可例舉丙烯酸丁酯。Alkyl (meth)acrylate acrylates and/or methacrylates, for example, methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, (meth)acrylate Butyl acrylate, isopropyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate, third butyl (meth)acrylate, Amyl (meth)acrylate, Isoamyl (meth)acrylate, Neopentyl (meth)acrylate, Hexyl (meth)acrylate, Heptyl (meth)acrylate, 2-ethyl (meth)acrylate Hexyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, nonyl (meth)acrylate, isononyl (meth)acrylate, decyl (meth)acrylate, (meth) Isodecyl Acrylate, Undecyl (Meth)acrylate, Lauryl (Meth)acrylate, Isotridodecyl (Meth)acrylate, Tetradecyl (Meth)acrylate ester, isotetradecyl (meth)acrylate, pentadecyl (meth)acrylate, cetyl (meth)acrylate, heptadecyl (meth)acrylate, (meth)acrylate ) octadecyl acrylate, isostearyl (meth)acrylate, nonadecyl (meth)acrylate, eicosyl (meth)acrylate and other linear or branched C1-20 alkyl (meth)acrylate, etc., Preferably, C4-12 alkyl (meth)acrylate is mentioned, More preferably, butyl acrylate is mentioned.
(甲基)丙烯酸烷基酯可單獨使用或將2種以上併用。Alkyl (meth)acrylate can be used individually or in combination of 2 or more types.
關於(甲基)丙烯酸烷基酯之調配比率,相對於單體成分,例如為50質量%以上,較佳為60質量%以上,又,例如為99質量%以下。The blending ratio of the alkyl (meth)acrylate is, for example, 50 mass % or more, preferably 60 mass % or more, and, for example, 99 mass % or less with respect to the monomer component.
又,單體成分較佳為包含具有陰離子性基之酸性乙烯基單體。Moreover, it is preferable that a monomer component contains the acidic vinyl monomer which has an anionic group.
若單體成分包含具有陰離子性基之酸性乙烯基單體,則藉由自光酸產生劑(下述)產生之強酸促進背離,色調變強,著色穩定性優異。When the monomer component contains an acidic vinyl monomer having an anionic group, strong acid generated from a photoacid generator (described below) promotes departure, the color tone becomes stronger, and the coloring stability is excellent.
作為具有陰離子性基之酸性乙烯基單體,例如可列舉:含羧基乙烯基單體、含磺基乙烯基單體、含磷酸基乙烯基單體等。As an acidic vinyl monomer which has an anionic group, a carboxyl group-containing vinyl monomer, a sulfo group-containing vinyl monomer, a phosphoric acid group-containing vinyl monomer, etc. are mentioned, for example.
作為含羧基乙烯基單體,例如可列舉:(甲基)丙烯酸、(甲基)丙烯酸2-羧基乙酯、羧基戊基(甲基)丙烯酸羧基戊酯、伊康酸、馬來酸、富馬酸、丁烯酸等。Examples of carboxyl group-containing vinyl monomers include (meth)acrylic acid, 2-carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate carboxypentyl, itaconic acid, maleic acid, Malic acid, crotonic acid, etc.
又,作為含羧基乙烯基單體,例如亦可列舉馬來酸酐、伊康酸酐等含酸酐基單體。Moreover, as a carboxyl group containing vinyl monomer, acid anhydride group containing monomers, such as maleic anhydride and itaconic anhydride, are also mentioned, for example.
作為含磺基乙烯基單體,例如可列舉苯乙烯磺酸、烯丙基磺酸等。Examples of the sulfovinyl group-containing monomer include styrenesulfonic acid, allylsulfonic acid, and the like.
作為含磷酸基乙烯基單體,例如可列舉丙烯醯基磷酸2-羥基乙酯等。As a phosphoric acid group-containing vinyl monomer, 2-hydroxyethyl acryloyl phosphate etc. are mentioned, for example.
作為具有陰離子性基之酸性乙烯基單體,較佳可例舉含羧基乙烯基單體,更佳可例舉(甲基)丙烯酸,進而較佳可例舉丙烯酸。As an acidic vinyl monomer which has an anionic group, Preferably, a carboxyl group-containing vinyl monomer is mentioned, More preferably, (meth)acrylic acid is mentioned, Still more preferably, acrylic acid is mentioned.
具有陰離子性基之酸性乙烯基單體可單獨使用或將2種以上併用。The acidic vinyl monomers having an anionic group can be used alone or in combination of two or more.
關於具有陰離子性基之酸性乙烯基單體之調配比率,相對於(甲基)丙烯酸烷基酯100質量份,例如為3質量份以上,且例如為10質量份以下,又,相對於單體成分,例如為1質量%以上,又,例如為8質量%以下。The blending ratio of the acidic vinyl monomer having an anionic group is, for example, 3 parts by mass or more and, for example, 10 parts by mass or less with respect to 100 parts by mass of the alkyl (meth)acrylate, and, with respect to the monomer The component is, for example, 1 mass % or more, and, for example, 8 mass % or less.
又,單體成分較佳為實質上不包含能夠與(甲基)丙烯酸烷基酯共聚之具有孤電子對之鹼性乙烯基單體。Also, the monomer component preferably does not substantially contain a basic vinyl monomer having a lone electron pair that can be copolymerized with an alkyl (meth)acrylate.
具體而言,關於具有孤電子對之鹼性乙烯基單體之調配比率,相對於單體成分,例如為3質量%以下,較佳為1質量%以下,進而較佳為0.5質量%以下,尤佳為0質量%以下。換言之,尤佳為單體成分不包含具有孤電子對之鹼性乙烯基單體。Specifically, the compounding ratio of the basic vinyl monomer having a lone electron pair is, for example, 3% by mass or less, preferably 1% by mass or less, and more preferably 0.5% by mass or less, based on the monomer component. More preferably, it is 0 mass % or less. In other words, it is especially preferable that the monomer component does not contain a basic vinyl monomer having a lone electron pair.
若單體成分實質上不包含具有孤電子對之鹼性乙烯基單體,則可抑制各單體成分之溶出,可提高著色穩定性。If the monomer components do not substantially contain a basic vinyl monomer having a lone electron pair, the dissolution of each monomer component can be suppressed, and the coloring stability can be improved.
作為具有孤電子對之鹼性乙烯基單體,為於雜環具有氮之含雜環鹼性乙烯基單體,例如可列舉:N-乙烯基吡咯啶酮、甲基乙烯基吡咯啶酮、乙烯基吡啶、乙烯基哌啶酮、乙烯基嘧啶、乙烯基哌𠯤、乙烯基吡𠯤、乙烯基吡咯、乙烯基咪唑、乙烯基㗁唑、乙烯基𠰌啉、N-丙烯醯基𠰌啉、N-乙烯基己內醯胺等。As the basic vinyl monomer having a lone pair of electrons, it is a heterocycle-containing basic vinyl monomer having nitrogen in the heterocycle, for example, N-vinylpyrrolidone, methylvinylpyrrolidone, Vinylpyridine, vinylpiperidone, vinylpyrimidine, vinylpiperone, vinylpyrrole, vinylpyrrole, vinylimidazole, vinylpyrazole, vinylpyridine, N-acrylylpyrroline, N-vinylcaprolactam, etc.
又,單體成分視需要包含能夠與(甲基)丙烯酸烷基酯共聚之含官能基乙烯基單體(上述具有陰離子性基之酸性乙烯基單體及具有孤電子對之鹼性乙烯基單體除外)。In addition, the monomer component optionally includes a functional group-containing vinyl monomer (the above-mentioned acidic vinyl monomer having an anionic group and a basic vinyl monomer having a lone electron pair) capable of copolymerizing with an alkyl (meth)acrylate. body except).
作為含官能基乙烯基單體,可列舉:含羥基乙烯基單體、含氰基乙烯基單體、含縮水甘油基乙烯基單體、芳香族乙烯基單體、乙烯酯單體、乙烯醚單體等。Examples of functional group-containing vinyl monomers include hydroxyl-containing vinyl monomers, cyano-containing vinyl monomers, glycidyl-containing vinyl monomers, aromatic vinyl monomers, vinyl ester monomers, and vinyl ethers. Monomer etc.
作為含羥基乙烯基單體,例如可列舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸10-羥基癸酯、(甲基)丙烯酸12-羥基月桂酯、(甲基)丙烯酸4-(羥甲基)環己基甲酯等,較佳可例舉(甲基)丙烯酸2-羥基乙酯,更佳可例舉丙烯酸2-羥基乙酯。Examples of hydroxyl-containing vinyl monomers include: 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, (meth)acrylic acid 6-Hydroxyhexyl, 8-Hydroxyoctyl (meth)acrylate, 10-Hydroxydecyl (meth)acrylate, 12-Hydroxylauryl (meth)acrylate, 4-(Hydroxymethyl)acrylate ) cyclohexyl methyl ester, etc., Preferably, 2-hydroxyethyl (meth)acrylate is mentioned, More preferably, 2-hydroxyethyl acrylate is mentioned.
作為含氰基乙烯基單體,例如可列舉(甲基)丙烯腈等。As a cyano vinyl group containing monomer, (meth)acrylonitrile etc. are mentioned, for example.
作為含縮水甘油基乙烯基單體,例如可列舉(甲基)丙烯酸縮水甘油酯等。As a glycidyl group containing vinyl monomer, glycidyl (meth)acrylate etc. are mentioned, for example.
作為芳香族乙烯基單體,例如可列舉苯乙烯、對甲基苯乙烯、鄰甲基苯乙烯、α-甲基苯乙烯等。As an aromatic vinyl monomer, styrene, p-methylstyrene, o-methylstyrene, (alpha)-methylstyrene, etc. are mentioned, for example.
作為乙烯酯單體,例如可列舉乙酸乙酯、丙酸乙烯酯等。As a vinyl ester monomer, ethyl acetate, vinyl propionate, etc. are mentioned, for example.
作為乙烯醚單體,例如可列舉甲基乙烯基醚等。As a vinyl ether monomer, methyl vinyl ether etc. are mentioned, for example.
含官能基乙烯基單體可單獨使用或將2種以上併用。於調配交聯劑(下述)之情形時,就向聚合物中導入交聯結構之觀點而言,較佳可例舉含羥基乙烯基單體。A functional group-containing vinyl monomer can be used individually or in combination of 2 or more types. When preparing a crosslinking agent (described below), preferably a hydroxyl group-containing vinyl monomer is used from the viewpoint of introducing a crosslinked structure into a polymer.
關於含官能基乙烯基單體之調配比率,相對於(甲基)丙烯酸烷基酯100質量份,例如為3質量份以上,較佳為5質量份以上,更佳為15質量份以上,又,例如為20質量份以下,又,相對於單體成分,例如為4質量%以上,較佳為10質量%以上,又,例如為30質量%以下,較佳為20質量%以下。The blending ratio of the functional group-containing vinyl monomer is, for example, 3 parts by mass or more, preferably 5 parts by mass or more, more preferably 15 parts by mass or more, with respect to 100 parts by mass of the alkyl (meth)acrylate. , For example, it is 20 mass parts or less, and, relative to the monomer component, For example, it is 4 mass % or more, Preferably it is 10 mass % or more, Also, for example, it is 30 mass % or less, Preferably it is 20 mass % or less.
並且,丙烯酸系聚合物係使上述單體成分聚合而成之聚合物。In addition, the acrylic polymer is a polymer obtained by polymerizing the above-mentioned monomer components.
於使單體成分聚合時,例如調配(甲基)丙烯酸烷基酯、以及視需要之具有陰離子性基之酸性乙烯基單體及含官能基乙烯基單體而製備單體成分,例如藉由溶液聚合、塊狀聚合、乳化聚合等公知之聚合方法製備丙烯酸系聚合物。When polymerizing the monomer components, for example, formulating an alkyl (meth)acrylate, and optionally an anionic group-containing acidic vinyl monomer and a functional group-containing vinyl monomer to prepare the monomer component, for example, by Acrylic polymers can be prepared by known polymerization methods such as solution polymerization, block polymerization, and emulsion polymerization.
作為聚合方法,較佳可例舉溶液聚合。As a polymerization method, preferably, solution polymerization is mentioned.
於溶液聚合中,例如向公知之有機溶劑中調配單體成分、及聚合起始劑而製備單體溶液,其後對單體溶液進行加熱。In solution polymerization, for example, a monomer component and a polymerization initiator are prepared in a known organic solvent to prepare a monomer solution, and then the monomer solution is heated.
作為聚合起始劑,例如可列舉過氧化物系聚合起始劑、偶氮系聚合起始劑等。As a polymerization initiator, a peroxide-type polymerization initiator, an azo-type polymerization initiator, etc. are mentioned, for example.
作為過氧化物系聚合起始劑,例如可列舉過氧化碳酸酯、過氧化酮、過氧縮酮、氫過氧化物、二烷基過氧化物、二醯基過氧化物、過氧酯等有機過氧化物。Examples of peroxide-based polymerization initiators include peroxycarbonates, ketone peroxides, peroxyketals, hydroperoxides, dialkyl peroxides, diacyl peroxides, peroxyesters, etc. Organic peroxides.
作為偶氮系聚合起始劑,例如可列舉2,2'-偶氮二異丁腈、2,2'-偶氮雙(2-甲基丁腈)、2,2'-偶氮雙(2,4-二甲基戊腈)、2,2'-偶氮二異丁酸二甲酯等偶氮化合物。Examples of the azo polymerization initiator include 2,2'-azobisisobutyronitrile, 2,2'-azobis(2-methylbutyronitrile), 2,2'-azobis( 2,4-dimethylvaleronitrile), 2,2'-dimethyl azobisisobutyrate and other azo compounds.
作為聚合起始劑,較佳可例舉偶氮系聚合起始劑,更佳可例舉2,2'-偶氮二異丁腈。As a polymerization initiator, an azo-type polymerization initiator is preferable, and 2,2'- azobisisobutyronitrile is more preferable.
聚合起始劑可單獨使用或將2種以上併用。A polymerization initiator can be used individually or in combination of 2 or more types.
關於聚合起始劑之調配比率,相對於單體成分100質量份,例如為0.05質量份以上,較佳為0.1質量份以上,又,例如為1質量份以下,較佳為0.5質量份以下。The compounding ratio of a polymerization initiator is, for example, 0.05 mass part or more, Preferably it is 0.1 mass part or more, For example, it is 1 mass part or less, Preferably it is 0.5 mass part or less with respect to 100 mass parts of monomer components.
加熱溫度例如為50℃以上且80℃以下,加熱時間例如為1小時以上且8小時以下。The heating temperature is, for example, 50° C. to 80° C., and the heating time is, for example, 1 hour to 8 hours.
藉此,使單體成分聚合而獲得包含丙烯酸系聚合物之丙烯酸系聚合物溶液。Thereby, monomer components are polymerized to obtain an acrylic polymer solution containing an acrylic polymer.
丙烯酸系聚合物溶液之固形物成分濃度例如為20質量%以上,又,例如為80質量%以下。The solid content concentration of the acrylic polymer solution is, for example, 20 mass % or more, and, for example, 80 mass % or less.
丙烯酸系聚合物之重量平均分子量例如為100000以上,較佳為300000以上,更佳為500000以上,又,例如為5000000以下,較佳為3000000以下,更佳為2000000以下。The weight average molecular weight of the acrylic polymer is, for example, 100,000 or more, preferably 300,000 or more, more preferably 500,000 or more, and for example, 5,000,000 or less, preferably 3,000,000 or less, more preferably 2,000,000 or less.
再者,上述之重量平均分子量係藉由GPC(凝膠滲透層析法)進行測定並藉由聚苯乙烯換算所算出之值。In addition, the said weight average molecular weight is the value calculated by polystyrene conversion measured by GPC (gel permeation chromatography).
黏著性聚合物之玻璃轉移溫度例如為0℃以下,較佳為-20℃以下,又,通常為-70℃以上。The glass transition temperature of the adhesive polymer is, for example, 0°C or lower, preferably -20°C or lower, and usually -70°C or higher.
若黏著性聚合物之玻璃轉移溫度為上述上限以下,則階差追隨性優異。When the glass transition temperature of an adhesive polymer is below the said upper limit, it will be excellent in step followability.
再者,玻璃轉移溫度係藉由根據FOX之式之計算所獲得。Furthermore, the glass transition temperature is obtained by calculation according to the formula of FOX.
藉由酸著色之化合物係藉由酸自無色(透明)變為有色之化合物,例如可列舉隱色系色素、例如p,p',p''-三-二甲胺基三苯基甲烷等三芳基甲烷系色素、例如4,4-雙-二甲胺基苯基二苯甲基苄醚等二苯甲烷系色素、例如3-二乙胺基-6-甲基-7-氯螢光黃母體等螢光黃母體系色素、例如3-甲基螺二萘并吡喃等螺吡喃系色素、例如玫瑰紅-B-苯胺基內醯胺等玫瑰紅系色素等,較佳可例舉隱色系色素。The compound colored by acid is a compound that changes from colorless (transparent) to colored by acid, for example, leuco pigments, such as p,p',p''-tri-dimethylaminotriphenylmethane, etc. Triarylmethane dyes, such as diphenylmethane dyes such as 4,4-bis-dimethylaminophenylbenzhydryl benzyl ether, such as 3-diethylamino-6-methyl-7-chlorofluorescent Fluorescent yellow matrix pigments such as yellow matrix, spiropyran pigments such as 3-methylspirobinaphthopyran, rose bengal pigments such as rose bengal-B-anilinolactam, etc., preferably for example For example, leucochromatic pigments.
藉由酸著色之化合物可單獨使用或將2種以上併用。The compounds colored by acid may be used alone or in combination of two or more.
關於藉由酸著色之化合物之調配比率,相對於黏著性聚合物100質量份,例如為0.5質量份以上,又,例如為5質量份以下,較佳為2質量份以下。The compounding ratio of the compound colored by an acid is 0.5 mass parts or more, for example, 5 mass parts or less, preferably 2 mass parts or less with respect to 100 mass parts of adhesive polymers.
光酸產生劑係藉由活性光線之照射產生酸之化合物。A photoacid generator is a compound that generates acid upon irradiation with active light.
作為此種光酸產生劑中之藉由紫外線之照射產生酸之化合物(紫外線酸產生劑),例如可列舉鎓化合物等。Among such photoacid generators, an onium compound etc. are mentioned as a compound (ultraviolet acid generator) which generate|occur|produces an acid by irradiation of an ultraviolet-ray.
作為鎓化合物,例如可列舉包含錪及鋶等鎓陽離子、及Cl- 、Br- 、I- 、ZnCl3 - 、HSO3 - 、BF4 - 、PF6 - 、AsF6 - 、SbF6 - 、CH3 SO3 - 、CF3 SO3 - 、(C6 F5 )4 B- 、(C4 H9 )4 B- 等陰離子之鹽等。Examples of onium compounds include onium cations such as iodonium and permedium, and Cl - , Br - , I - , ZnCl 3 - , HSO 3 - , BF 4 - , PF 6 - , AsF 6 - , SbF 6 - , CH 3 SO 3 - , CF 3 SO 3 - , (C 6 F 5 ) 4 B - , (C 4 H 9 ) 4 B - and other anion salts, etc.
作為此種鎓化合物,較佳可例舉包含鋶(鎓陽離子)、及(C6 F5 )4 B- (陰離子)之鹽。As such an onium compound, a salt containing caldium (onium cation) and (C 6 F 5 ) 4 B − (anion) is preferably mentioned.
又,作為紫外線酸產生劑,亦可使用市售品,例如可列舉CPI-310B(包含鋶、及(C6 F5 )4 B- 之鹽,San-Apro公司製造)等。Moreover, a commercial item can also be used as an ultraviolet acid generator, For example, CPI - 310B (salt containing calcite and ( C6F5 ) 4B-, manufactured by San - Apro Corporation) etc. are mentioned.
光酸產生劑可單獨使用或將2種以上併用。A photoacid generator can be used individually or in combination of 2 or more types.
關於光酸產生劑之調配比率,相對於黏著性聚合物100質量份,例如為1質量份以上,又,例如為20質量份以下,較佳為15質量份以下。The compounding ratio of a photoacid generator is, for example, 1 mass part or more with respect to 100 mass parts of adhesive polymers, For example, it is 20 mass parts or less, Preferably it is 15 mass parts or less.
並且,第1黏著性組合物係藉由將黏著性聚合物(於藉由溶液聚合製備黏著性聚合物之情形時為聚合物溶液)、藉由酸著色之化合物、及光酸產生劑以上述比率調配並混合所製備(於使用聚合物溶液作為黏著性聚合物之情形時,製備成第1黏著性組合物之溶液)。Also, the first adhesive composition is obtained by mixing an adhesive polymer (a polymer solution in the case of preparing an adhesive polymer by solution polymerization), a compound colored by an acid, and a photoacid generator as described above. Ratio preparation and mixing are prepared (in the case of using a polymer solution as an adhesive polymer, a solution of the first adhesive composition is prepared).
就向黏著性聚合物中導入交聯結構之觀點而言,較佳為向第1黏著性組合物中調配交聯劑。From the viewpoint of introducing a crosslinked structure into the adhesive polymer, it is preferable to mix a crosslinking agent in the first adhesive composition.
作為交聯劑,例如可列舉:異氰酸酯系交聯劑、環氧系交聯劑、㗁唑啉系交聯劑、氮丙啶系交聯劑、碳二醯亞胺系交聯劑、金屬螯合物系交聯劑等。Examples of the crosslinking agent include isocyanate crosslinking agents, epoxy crosslinking agents, azoline crosslinking agents, aziridine crosslinking agents, carbodiimide crosslinking agents, metal chelate Compound cross-linking agent, etc.
作為異氰酸酯系交聯劑,可列舉:例如伸丁基二異氰酸酯、六亞甲基二異氰酸酯等脂肪族二異氰酸酯;例如伸環戊基二異氰酸酯、伸環己基二異氰酸酯、異佛酮二異氰酸酯等脂環族二異氰酸酯;例如2,4-甲伸苯基二異氰酸酯、4,4'-二苯甲烷二異氰酸酯、苯二甲基二異氰酸酯等芳香族二異氰酸酯。Examples of isocyanate-based crosslinking agents include aliphatic diisocyanates such as butylene diisocyanate and hexamethylene diisocyanate; esters such as cyclopentyl diisocyanate, cyclohexylene diisocyanate, and isophorone diisocyanate; Cyclic diisocyanates; for example, aromatic diisocyanates such as 2,4-methylene diisocyanate, 4,4'-diphenylmethane diisocyanate, and xylylene diisocyanate.
又,作為異氰酸酯系交聯劑,亦可列舉上述異氰酸酯之衍生物(例如異氰尿酸酯改性體、多元醇改性體等)。Moreover, as an isocyanate type crosslinking agent, the derivative|guide_body of the said isocyanate (for example, an isocyanurate modified body, a polyol modified body, etc.) is mentioned.
作為異氰酸酯系交聯劑,亦可使用市售品,例如可列舉:Coronate L(甲伸苯基二異氰酸酯之三羥甲基丙烷加成物,Tosoh製造)、Coronate HL(六亞甲基二異氰酸酯之三羥甲基丙烷加成物,Tosoh製造)、Coronate HX(六亞甲基二異氰酸酯之異氰尿酸酯體,Tosoh製造)、Takenate D110N(苯二甲基二異氰酸酯之三羥甲基丙烷加成物,三井化學製造)等。Commercially available products can also be used as the isocyanate-based crosslinking agent, for example, Coronate L (trimethylolpropane adduct of methylene diisocyanate, manufactured by Tosoh), Coronate HL (hexamethylene diisocyanate Trimethylolpropane adduct, manufactured by Tosoh), Coronate HX (isocyanurate body of hexamethylene diisocyanate, manufactured by Tosoh), Takenate D110N (trimethylolpropane of xylylene diisocyanate adducts, manufactured by Mitsui Chemicals), etc.
作為異氰酸酯系交聯劑,較佳可例舉六亞甲基二異氰酸酯之三羥甲基丙烷加成物、苯二甲基二異氰酸酯之三羥甲基丙烷加成物。As the isocyanate-based crosslinking agent, preferably, a trimethylolpropane adduct of hexamethylene diisocyanate and a trimethylolpropane adduct of xylylene diisocyanate are mentioned.
作為環氧系交聯劑,例如可列舉二縮水甘油基苯胺、1,3-雙(N,N-二縮水甘油基胺基甲基)環己烷等。Examples of the epoxy-based crosslinking agent include diglycidylaniline, 1,3-bis(N,N-diglycidylaminomethyl)cyclohexane, and the like.
作為環氧系交聯劑,亦可使用市售品,例如可列舉Tetrad C(三菱瓦斯化學製造)等。As an epoxy-type crosslinking agent, you may use a commercial item, For example, Tetrad C (made by Mitsubishi Gas Chemical) etc. are mentioned.
作為環氧系交聯劑,較佳可例舉1,3-雙(N,N-二縮水甘油基胺基甲基)環己烷。As an epoxy-type crosslinking agent, Preferably, 1, 3- bis (N, N- diglycidylaminomethyl) cyclohexane is mentioned.
作為交聯劑,較佳可例舉異氰酸酯系交聯劑、環氧系交聯劑,更佳可例舉環氧系交聯劑。As a crosslinking agent, Preferably, an isocyanate type crosslinking agent and an epoxy type crosslinking agent are mentioned, More preferably, an epoxy type crosslinking agent is mentioned.
交聯劑可單獨使用或將2種以上併用。A crosslinking agent can be used individually or in combination of 2 or more types.
若向第1黏著性組合物中調配交聯劑,則聚合物中之羥基等官能基與交聯劑發生反應而向聚合物中導入交聯結構。When a crosslinking agent is blended into the first adhesive composition, functional groups such as hydroxyl groups in the polymer react with the crosslinking agent to introduce a crosslinking structure into the polymer.
關於交聯劑之調配比率,相對於黏著性聚合物100質量份,例如為0.01質量份以上,較佳為0.1質量份以上,且例如為10質量份以下,較佳為5質量份以下,更佳為4質量份以下,進而較佳為3質量份以下,尤佳為1質量份以下。The blending ratio of the crosslinking agent is, for example, 0.01 mass parts or more, preferably 0.1 mass parts or more, and for example, 10 mass parts or less, preferably 5 mass parts or less, with respect to 100 mass parts of the adhesive polymer. It is preferably at most 4 parts by mass, more preferably at most 3 parts by mass, and particularly preferably at most 1 part by mass.
又,於向第1黏著性組合物中調配交聯劑之情形時,為了促進交聯反應,亦可調配交聯觸媒。Moreover, when compounding a crosslinking agent in the 1st adhesive composition, in order to accelerate a crosslinking reaction, you may prepare a crosslinking catalyst.
作為交聯觸媒,例如可列舉鈦酸四正丁酯、鈦酸四異丙酯、乙醯丙酮鐵、氧化丁基錫、二月桂酸二辛基錫等金屬系交聯觸媒等。Examples of the crosslinking catalyst include metal-based crosslinking catalysts such as tetra-n-butyl titanate, tetraisopropyl titanate, iron acetylacetonate, butyltin oxide, and dioctyltin dilaurate.
交聯觸媒可單獨使用或將2種以上併用。A crosslinking catalyst can be used individually or in combination of 2 or more types.
關於交聯觸媒之調配比率,相對於黏著性聚合物100質量份,例如為0.001質量份以上,較佳為0.01質量份以上,又,例如為0.05質量份以下。The compounding ratio of a crosslinking catalyst is 0.001 mass part or more with respect to 100 mass parts of adhesive polymers, Preferably it is 0.01 mass part or more, For example, it is 0.05 mass part or less.
又,可視需要於不損及本發明之效果之範圍內使第1黏著性組合物含有例如矽烷偶合劑、黏著性賦予劑、塑化劑、軟化劑、防劣化劑、填充劑、著色劑、界面活性劑、抗靜電劑、就螢光燈下或自然光下之穩定化之觀點而言之紫外線吸收劑、抗氧化劑等添加劑等各種添加劑。Also, the first adhesive composition may contain, for example, a silane coupling agent, an adhesiveness imparting agent, a plasticizer, a softener, an anti-deterioration agent, a filler, a colorant, Various additives such as surfactants, antistatic agents, ultraviolet absorbers, antioxidants, and other additives from the viewpoint of stabilization under fluorescent lamps or natural light.
藉此獲得第1黏著性組合物(於使用聚合物溶液作為黏著性聚合物之情形時為第1黏著性組合物之溶液)。Thereby, the 1st adhesive composition (the solution of the 1st adhesive composition when using a polymer solution as an adhesive polymer) was obtained.
該第1黏著性組合物(固形物成分)之20℃~50℃下之剪切儲存模數G'例如為1.0×104 Pa以上,較佳為2.0×104 Pa以上,更佳為4.0×104 Pa以上,又,例如為1.0×106 Pa以下,較佳為5.0×105 Pa以下。The shear storage modulus G' at 20°C to 50°C of the first adhesive composition (solid content) is, for example, 1.0×10 4 Pa or more, preferably 2.0×10 4 Pa or more, more preferably 4.0 ×10 4 Pa or more, and, for example, 1.0×10 6 Pa or less, preferably 5.0×10 5 Pa or less.
若上述剪切儲存模數G'為上述範圍內,則密接性優異,於剪切儲存模數G'更低之情形時,階差追隨性亦優異。When the said shear storage modulus G' is in the said range, it is excellent in adhesiveness, and when the shear storage modulus G' is lower, it is also excellent in step followability.
再者,上述剪切儲存模數G'係藉由頻率1 Hz、升溫速度5℃/分鐘、溫度範圍-70℃~250℃之條件下之動態黏彈性測定所測得。Furthermore, the above-mentioned shear storage modulus G' is measured by dynamic viscoelasticity measurement under the conditions of a frequency of 1 Hz, a heating rate of 5°C/min, and a temperature range of -70°C to 250°C.
並且,藉由下述方法由第1黏著性組合物形成第1黏著層2。And the 1st
由於第1黏著層2包含第1黏著性組合物,故而藉由活性光線(較佳為紫外線)照射自光酸產生劑產生酸,藉由酸著色之化合物藉由該酸著色,藉此,第1黏著層2自無色(透明)變為有色。即,於活性光線(較佳為紫外線)照射前,第1黏著層2為無色(透明)。Since the first
又,無色(透明)意指波長400 nm以上且700 nm以下之平均透過率例如為60%以上,較佳為70%以上,更佳為90%以上,又,例如為100%以下。Also, colorless (transparent) means that the average transmittance at a wavelength of 400 nm to 700 nm is, for example, 60% or more, preferably 70% or more, more preferably 90% or more, and, for example, 100% or less.
又,有色意指波長400 nm以上且700 nm以下之平均透過率例如為0%以上,又,例如未達60%,較佳為50%以下。Also, colored means that the average transmittance at a wavelength of 400 nm to 700 nm is, for example, 0% or more, and, for example, less than 60%, preferably 50% or less.
第1黏著層2之厚度例如為3 μm以上,較佳為10 μm以上,又,例如為50 μm以下,較佳為30 μm以下。The thickness of the first
1-2.基材
基材3配置於第1黏著層2之一整面,基材3係黏著片材1之中層。1-2. Substrate
The
基材3具有於面方向上延伸之膜形狀,且具有平坦之平面及平坦之下表面。The
如上所述,基材3及/或下述第2黏著層4具備活性光線吸收性(較佳為紫外線吸收性)。As described above, the
於基材3具備活性光線吸收性之情形時,基材3之活性光線之平均透過率為15%以下,較佳為10%以下,更佳為9%以下,進而較佳為8%以下,尤佳為7%以下,最佳為3%以下,進而為1%以下。When the
若上述平均透過率為上述上限以下,則於欲使該第1黏著層2中之著色部分以外透明地殘留之情形、或欲使其著色量少於著色部分之情形時,可抑制著色部分以外由外界光(紫外線)著色。If the above-mentioned average transmittance is not more than the above-mentioned upper limit, when it is desired to leave the colored portion in the first
另一方面,若上述平均透過率超過上述上限,則無法抑制著色部分以外由外界光(活性光線)著色。On the other hand, when the average transmittance exceeds the above upper limit, coloring by external light (active light rays) other than the colored portion cannot be suppressed.
再者,平均透過率之測定方法於下述實施例中進行詳述。Furthermore, the method for measuring the average transmittance is described in detail in the following examples.
又,於基材3具備活性光線吸收性之情形時,較佳為基材3具備紫外線吸收性。Moreover, when the
於基材3具備紫外線吸收性之情形時,作為基材3,例如可列舉調配有紫外線吸收劑之樹脂膜、調配有紫外線吸收劑之膠帶等。即,此種基材3包含紫外線吸收劑。若基材3包含紫外線吸收劑,則可確實地降低基材3之波長300 nm以上且400 nm以下之平均透過率。When the
構成樹脂膜之材料為若不調配紫外線吸收劑則不具有紫外線吸收性之材料,可列舉例如三乙酸纖維素(TAC)等纖維素樹脂、例如環烯烴聚合物等環狀聚烯烴樹脂、例如丙烯酸系樹脂、苯基馬來醯亞胺樹脂、聚碳酸酯樹脂、聚酯樹脂、聚醯胺樹脂、聚苯乙烯樹脂等,較佳可例舉纖維素樹脂,更佳可例舉三乙酸纖維素(TAC)。The material constituting the resin film is a material that does not have ultraviolet absorption unless an ultraviolet absorber is blended, and examples include cellulose resins such as cellulose triacetate (TAC), cyclic polyolefin resins such as cycloolefin polymers, and acrylic acid resins. Resins, phenylmaleimide resins, polycarbonate resins, polyester resins, polyamide resins, polystyrene resins, etc., preferably cellulose resins, more preferably cellulose triacetate (TAC).
該等材料可單獨使用或將2種以上併用。These materials can be used individually or in combination of 2 or more types.
作為紫外線吸收劑,例如可列舉:苯并***系化合物、羥基苯基三𠯤系化合物、二苯甲酮系化合物、水楊酸酯系化合物、氰基丙烯酸酯系化合物、鎳錯鹽系化合物等。Examples of the ultraviolet absorber include: benzotriazole-based compounds, hydroxyphenyltrizoline-based compounds, benzophenone-based compounds, salicylate-based compounds, cyanoacrylate-based compounds, nickel zirconium-based compounds Wait.
紫外線吸收劑可單獨使用或將2種以上併用。The ultraviolet absorber may be used alone or in combination of two or more.
作為調配有紫外線吸收劑之樹脂膜,亦可使用市售品,例如可列舉KC2UA(TAC膜,Konica Minolta公司製造)等。A commercial item can also be used as a resin film which mix|blended the ultraviolet absorber, For example, KC2UA (TAC film, the Konica Minolta company make) etc. are mentioned.
又,作為調配有紫外線吸收劑之膠帶,亦可使用市售品,例如可列舉CS9934U(日東電工公司製造)等。Moreover, a commercial item can also be used as the adhesive tape which mix|blended the ultraviolet absorber, For example, CS9934U (made by Nitto Denko Co., Ltd.) etc. are mentioned.
又,作為基材3,亦可列舉由即便不調配紫外線吸收劑亦具有紫外線吸收性之材料所形成之膜、例如聚醯亞胺膜等。Moreover, as the
作為聚醯亞胺膜,亦可使用市售品,例如可列舉Kapton 200H(TORAY-DUPONT公司製造)等。As a polyimide film, you may use a commercial item, For example, Kapton 200H (made by TORAY-DUPONT company) etc. are mentioned.
於基材3具備紫外線吸收性之情形時,基材3之波長300 nm以上且400 nm以下之平均透過率為15%以下,較佳為10%以下,更佳為9%以下,進而較佳為8%以下,尤佳為7%以下,最佳為3%以下,進而為1%以下。When the
若上述平均透過率為上述上限以下,則於欲使第1黏著層2中之著色部分以外透明地殘留之情形、或欲使其著色量少於著色部分之情形時,可抑制著色部分以外由外界光(紫外線)著色。If the above-mentioned average transmittance is not more than the above-mentioned upper limit, when it is desired to leave the colored portion in the first
於基材3不具備活性光線吸收性(較佳為紫外線吸收性)之情形時,作為基材3,例如可列舉包含上述構成樹脂膜之材料之膜等。When the
於基材3不具備活性光線吸收性(較佳為紫外線吸收性)之情形時,基材3之活性光線之平均透過率例如為50%以上,又,例如為80%以下,尤其,於基材3不具備紫外線吸收性之情形時,基材3之波長300 nm以上且400 nm以下之平均透過率例如為50%以上,又,例如為80%以下。When the
又,於基材3不具備紫外線吸收性之情形時,基材3之波長400 nm以上且700 nm以下之平均透過率例如為40%以上,較佳為50%以上,更佳為70%以上,進而較佳為80%以上,尤佳為85%以上,最佳為90%以上。Also, when the
若上述平均透過率為上述下限以上,則基材3之透明性優異。When the said average transmittance is more than the said minimum, the transparency of the
因此,可較佳地將該黏著片材1用於要求透明性之光器件及其構成零件。Therefore, the
基材3之厚度為可獲得上述平均透過率之厚度,例如為10 μm以上,較佳為20 μm以上,又,例如為200 μm以下,較佳為120 μm以下,更佳為50 μm以下。The thickness of the
基材3可為1層,亦可為複數層。The
於基材3為複數層之情形時,以上述平均透過率及上述厚度成為上述範圍之方式積層複數層同種或不同種之基材3。When the
又,可視需要對基材3實施表面處理(例如硬塗處理)。Moreover, surface treatment (for example, hard-coat treatment) may be given to the
1-4.第2黏著層
第2黏著層4係黏著片材1之下層。1-4. Second adhesive layer
The second
第2黏著層4係感壓接著層。The second
第2黏著層4具有於面方向上延伸之膜形狀,且具有平坦之平面及平坦之下表面。The second
如上所述,基材3及/或第2黏著層4具備活性光線吸收性(較佳為紫外線吸收性)。As mentioned above, the
於第2黏著層4具備紫外線吸收性之情形時,第2黏著層4包含第2黏著性組合物。When the 2nd
第2黏著性組合物包含上述黏著性聚合物、上述紫外線吸收劑、視需要之上述交聯劑、上述交聯觸媒、及上述添加劑。即,包含此種第2黏著性組合物之第2黏著層4包含紫外線吸收劑。若第2黏著層4包含紫外線吸收劑,則可確實地降低第2黏著層4之波長300 nm以上且400 nm以下之平均透過率。The 2nd adhesive composition contains the said adhesive polymer, the said ultraviolet absorber, the said crosslinking agent, the said crosslinking catalyst, and the said additive as needed. That is, the 2nd
第2黏著性組合物係藉由將黏著性聚合物(於藉由溶液聚合製備黏著性聚合物之情形時為聚合物溶液)、上述紫外線吸收劑、視需要之上述交聯劑、上述交聯觸媒、及上述添加劑以上述比率調配並混合所製備。The second adhesive composition is prepared by mixing an adhesive polymer (a polymer solution in the case of preparing an adhesive polymer by solution polymerization), the above-mentioned ultraviolet absorber, the above-mentioned cross-linking agent if necessary, the above-mentioned cross-linking agent, etc. The catalyst and the above-mentioned additives are formulated and mixed in the above-mentioned ratio.
又,於第2黏著層4具備紫外線吸收性之情形時,作為第2黏著層4,亦可使用調配有紫外線吸收劑之膠帶。Moreover, when the 2nd
作為調配有紫外線吸收劑之膠帶,亦可使用市售品,例如可列舉CS9934U(日東電工公司製造)等。A commercial item can also be used as an adhesive tape containing a ultraviolet absorber, for example, CS9934U (made by Nitto Denko Co., Ltd.) etc. are mentioned.
另一方面,於第2黏著層4不具備紫外線吸收性之情形時,第2黏著層4包含第3黏著性組合物。On the other hand, when the 2nd
第3黏著性組合物不包含上述紫外線吸收劑,包含上述黏著性聚合物、視需要之上述交聯劑、上述交聯觸媒、及上述添加劑。The third adhesive composition does not contain the above-mentioned ultraviolet absorber, but contains the above-mentioned adhesive polymer, the above-mentioned crosslinking agent, the above-mentioned crosslinking catalyst, and the above-mentioned additives if necessary.
第3黏著性組合物係藉由將黏著性聚合物(於藉由溶液聚合製備黏著性聚合物之情形時為聚合物溶液)、視需要之上述交聯劑、上述交聯觸媒、及上述添加劑以上述比率調配並混合所製備。The third adhesive composition is prepared by mixing an adhesive polymer (a polymer solution in the case of preparing an adhesive polymer by solution polymerization), the above-mentioned cross-linking agent, the above-mentioned cross-linking catalyst, and the above-mentioned Additives are formulated and mixed in the above ratios to prepare.
並且,藉由下述方法由第2黏著性組合物或第3黏著性組合物形成第2黏著層4。And the 2nd
於第2黏著層4具備紫外線吸收性之情形時,第2黏著層4之波長300 nm以上且400 nm以下之平均透過率為15%以下,較佳為10%以下,更佳為9%以下,進而較佳為8%以下,尤佳為7%以下,最佳為3%以下,進而為1%以下。When the second
若上述平均透過率為上述上限以下,則於欲使第1黏著層2中之著色部分以外透明地殘留之情形、或欲使其著色量少於著色部分之情形時,可抑制著色部分以外由外界光(紫外線)著色。If the above-mentioned average transmittance is not more than the above-mentioned upper limit, when it is desired to leave the colored portion in the first
另一方面,若上述平均透過率超過上述上限,則無法抑制著色部分以外由外界光(紫外線)著色。On the other hand, when the average transmittance exceeds the upper limit, coloring by external light (ultraviolet rays) other than the colored portion cannot be suppressed.
又,於第2黏著層4不具備活性光線吸收性(較佳為紫外線吸收性)之情形時,基材3之活性光線之平均透過率例如為50%以上,又,例如為80%以下,尤其,於基材3不具備紫外線吸收性之情形時,基材3之波長300 nm以上且400 nm以下之平均透過率例如為50%以上,又,例如為80%以下。Also, when the second
又,於第2黏著層4不具備紫外線吸收性之情形時,第2黏著層4之波長400 nm以上且700 nm以下之平均透過率例如為40%以上,較佳為50%以上,更佳為70%以上,進而較佳為80%以上,尤佳為85%以上,最佳為90%以上。Also, when the second
若上述平均透過率為上述下限以上,則第2黏著層4之透明性優異。The transparency of the 2nd
因此,可較佳地將該黏著片材1用於要求透明性之光器件及其構成零件。Therefore, the
第2黏著層4之厚度為可獲得上述平均透過率之厚度,例如為5 μm以上,又,例如為200 μm以下。The thickness of the second
第2黏著層4可為1層,亦可為複數層。The second
於第2黏著層4為複數層之情形時,以上述平均透過率及上述厚度成為上述範圍之方式積層複數層同種或不同種之第2黏著層4。When the second
1-5.黏著片材之製造方法
接下來,參照圖2對製造黏著片材1之方法進行說明。1-5. Manufacturing method of adhesive sheet
Next, a method of manufacturing the
黏著片材1之製造方法包括如下步驟:第1黏著層準備步驟,其係準備第1黏著層2;基材配置步驟,其係於第1黏著層2之一面配置基材3;及第2黏著層配置步驟,其係於基材3之一面配置第2黏著層4。The manufacturing method of the
於第1黏著層準備步驟中,如圖2A所示,準備第1黏著層2。In the step of preparing the first adhesive layer, as shown in FIG. 2A , the first
於準備第1黏著層2時,首先準備剝離膜5。When preparing the 1st
作為剝離膜5,例如可列舉聚乙烯、聚丙烯、聚對苯二甲酸乙二酯、聚酯膜等可撓性塑膠膜。Examples of the
剝離膜5之厚度例如為3 μm以上,較佳為10 μm以上,又,例如為200 μm以下,較佳為100 μm以下,更佳為50 μm以下。The thickness of the
較佳為對剝離膜5實施利用聚矽氧系、氟系、長鏈烷基系、脂肪醯胺系等之脫模劑之脫模處理、或利用二氧化矽粉末之脫模處理。Preferably, the
繼而,於剝離膜5之一面塗佈上述第1黏著性組合物(第1黏著性組合物之溶液),並視需要將溶劑乾燥去除。Next, the above-mentioned first adhesive composition (solution of the first adhesive composition) is applied to one surface of the
作為第1黏著性組合物之塗佈方法,例如可列舉輥式塗佈、接觸輥式塗佈、凹版塗佈、反向塗佈、輥刷、噴塗、浸漬輥式塗佈、棒式塗佈、刮塗、氣刀塗佈、淋幕式塗佈、模唇塗佈、模嘴塗佈等。Examples of coating methods for the first adhesive composition include roll coating, touch roll coating, gravure coating, reverse coating, roll brushing, spray coating, dip roll coating, and bar coating. , Blade coating, air knife coating, curtain coating, die lip coating, die mouth coating, etc.
作為乾燥條件,乾燥溫度例如為50℃以上,較佳為70℃以上,更佳為100℃以上,又,例如為200℃以下,較佳為180℃以下,更佳為150℃以下,乾燥時間例如為5秒以上,較佳為10秒以上,又,例如為20分鐘以下,較佳為15分鐘以下,更佳為10分鐘以下。As drying conditions, the drying temperature is, for example, 50°C or higher, preferably 70°C or higher, more preferably 100°C or higher, and for example, 200°C or lower, preferably 180°C or lower, more preferably 150°C or lower. For example, it is 5 seconds or more, preferably 10 seconds or more, and, for example, 20 minutes or less, preferably 15 minutes or less, more preferably 10 minutes or less.
藉此,於剝離膜5之一面配置(準備)第1黏著層2。Thereby, the 1st
再者,於第1黏著性組合物包含交聯劑之情形時,於乾燥去除之同時、或溶劑之乾燥後(視需要於第1黏著層2之一面積層剝離膜5後),較佳為藉由老化進行交聯。Furthermore, when the first adhesive composition contains a crosslinking agent, it is preferable to dry and remove it simultaneously or after the solvent is dried (if necessary, after the
老化條件根據交聯劑之種類適當地設定,老化溫度例如為20℃以上,又,例如為160℃以下,較佳為50℃以下,又,老化時間為1分鐘以上,較佳為12小時以上,更佳為1天以上,又,例如為7天以下。Aging conditions are appropriately set according to the type of cross-linking agent. The aging temperature is, for example, 20°C or higher, for example, 160°C or lower, preferably 50°C or lower, and the aging time is 1 minute or more, preferably 12 hours or more , more preferably 1 day or more, and, for example, 7 days or less.
於基材配置步驟中,如圖2B所示,於第1黏著層2之一面配置基材3。In the base material disposing step, as shown in FIG. 2B , the
於第2黏著層配置步驟中,如圖2C所示,於基材3之一面配置第2黏著層4。In the step of disposing the second adhesive layer, as shown in FIG. 2C , the second
藉此獲得黏著片材1,其具備剝離膜5、配置於剝離膜5之一面之第1黏著層2、配置於第1黏著層2之一面之基材3、及配置於基材3之一面之第2黏著層4。In this way, an
再者,視需要亦可將配置於第1黏著層2之另一面之剝離膜5剝離。Furthermore, the peeling
於此種情形時,黏著片材1具備第1黏著層2、配置於第1黏著層2之一面之基材3、配置於基材3之一面之第2黏著層4。In this case, the
又,視需要亦可於第2黏著層4之一面配置剝離膜5(參照圖2C虛線)。Moreover, you may arrange|position the peeling film 5 (refer FIG. 2C dotted line) on one surface of the 2nd
於此種情形時,黏著片材1具備剝離膜5、配置於剝離膜5之一面之第1黏著層2、配置於第1黏著層2之一面之基材3、配置於基材3之一面之第2黏著層4、及配置於第2黏著層之一面之剝離膜5。In this case, the
又,於上述說明中,將第1黏著層2配置於剝離膜5之一面,但就操作性之觀點而言,亦可將第1黏著層2配置於透明基材之一面。In addition, in the above description, the first
透明基材具有於面方向上延伸之膜形狀,且具有平坦之平面及平坦之下表面。The transparent substrate has a film shape extending in the plane direction, and has a flat plane and a flat lower surface.
透明基材包含可撓性之塑膠材料。The transparent substrate includes flexible plastic material.
作為此種塑膠材料,例如可列舉:聚對苯二甲酸乙二酯(PET)、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯等聚酯樹脂;例如聚甲基丙烯酸酯等(甲基)丙烯酸系樹脂(丙烯酸系樹脂及/或甲基丙烯酸系樹脂);例如聚乙烯、聚丙烯、環烯烴聚合物(COP)等聚烯烴樹脂;例如聚碳酸酯樹脂;例如聚醚碸樹脂;例如聚芳酯樹脂;例如三聚氰胺樹脂;例如聚醯胺樹脂;例如聚醯亞胺樹脂;例如纖維素樹脂;例如聚苯乙烯樹脂;例如降𦯉烯樹脂之合成樹脂等。Examples of such plastic materials include polyester resins such as polyethylene terephthalate (PET), polybutylene terephthalate, and polyethylene naphthalate; for example, polymethacrylate, etc. (Meth)acrylic resins (acrylic resins and/or methacrylic resins); polyolefin resins such as polyethylene, polypropylene, cycloolefin polymer (COP); such as polycarbonate resins; such as polyether resins Resins; such as polyarylate resins; such as melamine resins; such as polyamide resins; such as polyimide resins; such as cellulose resins; such as polystyrene resins;
於自透明基材側照射光而使第1黏著層2著色之情形時,較佳為基材5具有對光之透明性。具體而言,透明基材之全光線透過率(JIS K 7375-2008)例如為80%以上,較佳為85%以上。When the first
就兼具對光之透明性及機械強度之觀點而言,作為塑膠材料,較佳可例舉聚酯樹脂,更佳可例舉聚對苯二甲酸乙二酯(PET)。From the viewpoint of both transparency to light and mechanical strength, polyester resin is preferably used as the plastic material, and polyethylene terephthalate (PET) is more preferably used.
透明基材之厚度例如為4 μm以上,較佳為20 μm以上,更佳為30 μm以上,進而較佳為45 μm以上,又,例如為500 μm以下,就可撓性及操作性之觀點而言,較佳為300 μm以下,更佳為200 μm以下,進而較佳為100 μm以下。The thickness of the transparent substrate is, for example, 4 μm or more, preferably 20 μm or more, more preferably 30 μm or more, further preferably 45 μm or more, and, for example, 500 μm or less, from the viewpoint of flexibility and operability In terms of thickness, it is preferably 300 μm or less, more preferably 200 μm or less, and still more preferably 100 μm or less.
於將第1黏著層2配置於透明基材之一面時,與上述同樣地於透明基材之一面塗佈上述第1黏著性組合物(第1黏著性組合物之溶液),並視需要將溶劑乾燥去除。When disposing the first
並且,對於黏著片材1,可於製造下述中間積層體6時、或製造下述中間積層體6前對第1黏著層2照射活性光線(較佳為紫外線)。In addition, the
於在製造中間積層體6時對第1黏著層2照射活性光線(較佳為紫外線)之情形時,具體而言,於配置第2黏著層後照射活性光線(較佳為紫外線)。When the first
具體而言,於下述中間積層體6之製造方法中之照射步驟中照射活性光線(較佳為紫外線)。Specifically, active light rays (preferably ultraviolet rays) are irradiated in the irradiation step in the manufacturing method of the
又,於在製造下述中間積層體6前對第1黏著層2照射活性光線(較佳為紫外線)之情形時,具體而言,於第1黏著層準備步驟後且基材配置步驟前照射活性光線(較佳為紫外線)。Also, when irradiating the first
參照圖3對在黏著層準備步驟後且基材配置步驟前照射活性光線(較佳為紫外線)之情形進行說明。Referring to FIG. 3 , the case of irradiating active light rays (preferably ultraviolet rays) after the adhesive layer preparation step and before the base material placement step will be described.
於黏著層準備步驟中,如圖3A所示,與上述方法同樣地於剝離膜5之一面準備第1黏著層2。In the adhesive layer preparation step, as shown in FIG. 3A , the first
繼而,於黏著層準備步驟後,如圖3B所示,自剝離膜5之表面側對第1黏著層2之全部照射活性光線(較佳為紫外線)。Next, after the adhesive layer preparation step, as shown in FIG. 3B , the entire first
繼而,於基材配置步驟中,如圖3C所示,於第1黏著層2之一面配置基材3。Next, in the substrate arrangement step, as shown in FIG. 3C , the
繼而,如圖3D所示,於第2黏著層配置步驟中,於基材3之一面配置第2黏著層4。Next, as shown in FIG. 3D , in the step of arranging the second adhesive layer, the second
根據該方法,可預先使第1黏著層2之全部變色,又,可抑制該著色部分由外界光(活性光線)進一步著色。According to this method, the entire first
又,於上述說明中,於基材配置步驟中,於第1黏著層2之一面配置基材3,於第2黏著層配置步驟中,於基材3之一面配置第2黏著層4,但亦可如圖3E所示,將第1黏著層2之另一面之剝離膜5(於在透明基材之一面準備第1黏著層2之情形時為透明基材)更換貼附為基材3及第2黏著層4。In addition, in the above description, the
具體而言,將第1黏著層2之另一面之剝離膜5(於在透明基材之一面準備第1黏著層2之情形時為透明基材)剝離,於第1黏著層2之另一面配置基材3,於基材3之另一面配置第2黏著層4。Specifically, the
又,於上述說明中,使第1黏著層2之全部變色,但亦可使第1黏著層2之一部分變色。In addition, in the above description, the entire first
於此種情形時,如圖4A所示,於將照射活性光線(較佳為紫外線)之部分51(詳細而言為配置於將照射活性光線(較佳為紫外線)之部分51之另一面之剝離膜5的另一面)不配置遮斷活性光線(較佳為紫外線)之遮罩7,於不照射活性光線(較佳為紫外線)之部分52(詳細而言為配置於不照射活性光線(較佳為紫外線)之部分52之另一面之剝離膜5的另一面)配置遮斷活性光線(較佳為紫外線)之遮罩7,自剝離膜5之表面側照射活性光線(較佳為紫外線)。In this case, as shown in FIG. 4A , on the other side of the
並且,於基材配置步驟中,如圖4B所示,於第1黏著層2之一面配置基材3。And, in the base material disposing step, as shown in FIG. 4B , the
繼而,於第2黏著層配置步驟中,如圖4C所示,於基材3之一面配置第2黏著層4。Next, in the step of disposing the second adhesive layer, as shown in FIG. 4C , the second
藉此,可預先使第1黏著層2之一部分變色,又,可抑制該著色部分以外由外界光(活性光線)著色。Thereby, part of the first
又,於此種情形時,亦可將第1黏著層2之另一面之剝離膜5(於在透明基材之一面準備第1黏著層2之情形時為透明基材)更換貼附為基材3及第2黏著層4。Also, in this case, the peeling
具體而言,可如圖4D所示,將剝離膜5之全部更換貼附為基材3及第2黏著層4,又,亦可如圖4E所示,僅將配置於不照射活性光線(較佳為紫外線)之部分52之另一面之剝離膜5(於在透明基材之一面準備第1黏著層2之情形時為透明基材)更換貼附為基材3及第2黏著層4。Specifically, as shown in FIG. 4D, all of the
又,於上述說明中,黏著片材1包含第1黏著層2、基材3、及第2黏著層4,但亦可使上述透明基材等中間層介存於第1黏著層2與基材3之間及/或基材3與第2黏著層4之間。In addition, in the above description, the
2.中間積層體
如圖5所示,中間積層體6具有具特定厚度之膜形狀(包括片材形狀),於與厚度方向正交之方向(面方向)上延伸,且具有平坦之上表面及平坦之下表面。2. Intermediate laminate
As shown in FIG. 5 , the
具體而言,中間積層體6具備:黏著片材1,其具備:第1黏著層2、配置於第1黏著層2之一面之基材3、及配置於基材3之一面之第2黏著層4;及被黏著體15,其配置於黏著片材1之另一面(第1黏著層2之另一面)。Specifically, the
又,於在中間積層體6中剝離膜5配置於黏著片材1之一面(第2黏著層4之一面)之情形時,中間積層體6具備:黏著片材1,其具備第1黏著層2、配置於第1黏著層2之一面之基材3、配置於基材3之一面之第2黏著層4、及配置於第2黏著層4之一面之剝離膜5(參照圖5虛線);及被黏著體15,其配置於黏著片材1之另一面(第1黏著層2之另一面)。Also, when the
詳細內容將於下文進行敍述,中間積層體6係藉由將上述黏著片材1貼附於被黏著體15所獲得。Details will be described below, but the
由於中間積層體6具備基材3及第2黏著層4,故而可抑制第1黏著層2中之未照射/低照射部分21(下述)由外界光(活性光線)著色。Since the
2-1.黏著片材
如上所述,黏著片材1具備剝離膜5、配置於剝離膜5之一面之第1黏著層2、配置於第1黏著層2之一面之基材3、及配置於基材3之一面之第2黏著層4。2-1. Adhesive sheet
As described above, the
又,如上所述,黏著片材1視需要亦可於第2黏著層4之一面積層剝離膜5。Moreover, as mentioned above, the
於此種情形時,黏著片材1具備剝離膜5、配置於剝離膜5之一面之第1黏著層2、配置於第1黏著層2之一面之基材3、配置於基材3之一面之第2黏著層4、及配置於第2黏著層之一面之剝離膜5。In this case, the
於以下之說明中,對使用於第2黏著層4之一面具備剝離膜5之黏著片材1之情形進行詳述。In the following description, the case of using the
又,黏著片材1中之第1黏著層2具備波長550 nm下之可見光透過率相對較大之高光透過率部分10、及波長550 nm下之可見光透過率相對較小之低光透過率部分11。In addition, the first
再者,詳細內容將於下文進行敍述,高光透過率部分10及低光透過率部分11之波長550 nm下之可見光透過率係由下述中間積層體6之製造方法決定。Furthermore, the details will be described below, and the visible light transmittance at a wavelength of 550 nm of the high
2-2.被黏著體
被黏著體15係藉由黏著片材1被補強之被補強體,例如可列舉光學器件、電子器件及其構成零件等。2-2. Adhered body
The to-
再者,於圖4中被黏著體15具有平板形狀,但被黏著體15之形狀並無特別限定,根據光學器件、電子器件及其構造零件之種類選擇各種形狀。In addition, in FIG. 4, the
又,詳細內容將於下文進行敍述,於中間積層體6之製造方法中,於自被黏著體15之表面側對第1黏著層2照射活性光線(較佳為紫外線)之情形時(下述第2A實施形態),根據被黏著體15使活性光線(較佳為紫外線)透過、抑或將活性光線(較佳為紫外線)遮斷決定中間積層體6之製造方法。Further, the details will be described below. In the method of manufacturing the
作為此種被黏著體15中之使活性光線透過之被黏著體15(以下設為第1被黏著體30),較佳可例舉使紫外線透過之第1被黏著體30。As the adherend 15 (hereinafter referred to as the first adherend 30 ) that transmits active light rays among
作為使紫外線透過之第1被黏著體30,例如可列舉無鹼玻璃、PET膜等。As the 1st to-
使活性光線透過之第1被黏著體30之活性光線之平均透過率例如為60%以上,較佳為65%以上,尤其,於使活性光線透過之第1被黏著體30為使紫外線透過之第1被黏著體30之情形時,使紫外線透過之第1被黏著體30之波長300 nm以上且400 nm以下之平均透過率例如為60%以上,較佳為65%以上。The average transmittance of the active light rays of the
若上述平均透過率為上述下限以上,則活性光線(較佳為紫外線)透過第1被黏著體30,從而可對黏著層2照射活性光線(較佳為紫外線)。When the average transmittance is equal to or greater than the above lower limit, active light rays (preferably ultraviolet rays) can pass through the
又,作為此種被黏著體15中之將活性光線(較佳為紫外線)遮斷之被黏著體15(以下設為第2被黏著體31),可列舉吸收活性光線之第2被黏著體31、將活性光線反射(不使活性光線透過)之第2被黏著體31。In addition, as the adherend 15 (hereinafter referred to as the second adherend 31 ) that blocks active light rays (preferably ultraviolet rays) among
作為吸收活性光線之第2被黏著體31,較佳可例舉吸收紫外線之第2被黏著體31。As the 2nd to-
作為吸收紫外線之第2被黏著體31,例如可列舉聚醯亞胺膜、塗佈有上述紫外線吸收劑之玻璃板等。As the 2nd to-
吸收活性光線之第2被黏著體31之活性光線之平均透過率例如為15%以下,較佳為10%以下,尤其,於吸收活性光線之第2被黏著體31為吸收紫外線之第2被黏著體31之情形時,吸收紫外線之第2被黏著體31之波長300 nm以上且400 nm以下之平均透過率例如為15%以下,較佳為10%以下。The average transmittance of active light of the
若上述平均透過率為上述下限以上,則第2被黏著體31可吸收活性光線(較佳為紫外線)。When the said average transmittance is more than the said minimum, the 2nd to-
作為將活性光線反射之第2被黏著體31,較佳可例舉將紫外線反射之第2被黏著體31。As the 2nd to-
作為將紫外線反射之第2被黏著體31,例如可列舉銅板等金屬基板等。As the 2nd to-
2-3.中間積層體之製造方法
中間積層體6之製造方法包括如下步驟:準備步驟,其係準備上述黏著片材1;照射步驟,其係對第1黏著層2照射活性光線(較佳為紫外線)而於第1黏著層2形成活性光線(較佳為紫外線)之照射量相對較高之高照射部分20、及活性光線(較佳為紫外線)之照射量相對較低、或未照射到活性光線(較佳為紫外線)之未照射/低照射部分21,藉此使高照射部分20之波長550 nm下之可見光透過率小於未照射/低照射部分21之波長550 nm下之可見光透過率;及貼合步驟,其係將黏著片材1之另一面貼合於被黏著體15。2-3. Manufacturing method of intermediate laminate
The manufacturing method of the
即,由於該中間積層體6之製造方法中使用黏著片材1,故而藉由該中間積層體6之製造方法所獲得之中間積層體6可抑制著色部分以外(未照射/低照射部分21)由外界光(活性光線)著色。That is, since the
以下,根據各步驟之順序及活性光線(較佳為紫外線)之照射方向分別對中間積層體6之製造方法進行說明。Hereinafter, the manufacturing method of the
詳細而言,作為各步驟之順序,於準備步驟後實施照射步驟,且於照射步驟後實施貼合步驟(以下設為第1實施形態),或者,於準備步驟後實施貼合步驟,且於貼合步驟後實施照射步驟(以下設為第2實施形態)。Specifically, as the order of each step, the irradiation step is carried out after the preparation step, and the bonding step is carried out after the irradiation step (hereinafter referred to as the first embodiment), or the bonding step is carried out after the preparation step, and in After the bonding step, the irradiation step is implemented (hereinafter referred to as the second embodiment).
又,作為活性光線(較佳為紫外線)之照射方向,於第1實施形態中,自另一側之剝離膜5之表面側(第1黏著層2之表面側)對第1黏著層2照射活性光線(較佳為紫外線)(以下設為第1A實施形態),或者,自一側之剝離膜5之表面側(第2黏著層4之表面側)對第1黏著層2照射活性光線(較佳為紫外線)(以下設為第1B實施形態)。又,於第2實施形態中,自被黏著體15之表面側對第1黏著層2照射活性光線(較佳為紫外線)(以下設為第2A實施形態),或者,自一側之剝離膜5之表面側(第2黏著層4之表面側)對第1黏著層2照射活性光線(較佳為紫外線)(以下設為第2B實施形態)。In addition, as the irradiation direction of active light (preferably ultraviolet rays), in the first embodiment, the first
以下對各實施形態進行詳述。Each embodiment will be described in detail below.
再者,於該中間積層體6之製造方法中,根據活性光線(較佳為紫外線)之照射量決定未照射/低照射部分21成為未照射部分22抑或成為低照射部分23,但於以下之說明中,對未照射/低照射部分21為未照射部分22之情形進行詳述。Furthermore, in the manufacturing method of the
又,未照射部分22為未照射到活性光線(較佳為紫外線)之部分,未照射部分22之波長550 nm下之可見光透過率例如為80%以上,較佳為90%以上。In addition, the unirradiated portion 22 is a portion not irradiated with active light (preferably ultraviolet rays), and the visible light transmittance of the unirradiated portion 22 at a wavelength of 550 nm is, for example, 80% or more, preferably 90% or more.
若上述可見光透過率為上述下限以上,則未照射部分22具有透明性。The non-irradiated part 22 will have transparency if the said visible light transmittance is more than the said minimum.
2-3-1.第1A實施形態 於第1A實施形態中,於準備步驟後實施照射步驟,且於照射步驟後實施貼合步驟。2-3-1. Embodiment 1A In Embodiment 1A, the irradiation step is implemented after the preparation step, and the bonding step is implemented after the irradiation step.
又,於第1A實施形態中,於照射步驟中,自第1黏著層2之表面側對第1黏著層2照射活性光線(較佳為紫外線)。In addition, in the 1A embodiment, in the irradiation step, the first
參照圖6對第1A實施形態進行說明。Embodiment 1A will be described with reference to FIG. 6 .
於準備步驟中,如圖6A所示,準備黏著片材1。In the preparation step, as shown in FIG. 6A , an
於照射步驟中,如圖6B所示,對第1黏著層2照射活性光線(較佳為紫外線)而於第1黏著層2形成活性光線(較佳為紫外線)之照射量相對較高之高照射部分20、及未照射到活性光線(較佳為紫外線)之未照射部分22。In the irradiation step, as shown in FIG. 6B , the first
再者,於以下之說明中,對於對黏著片材1(第1黏著層2)之一部分照射活性光線(較佳為紫外線)之情形進行說明,具體而言,將黏著片材1於面方向上分割為3個部分,對其中之兩端部分2處照射活性光線(較佳為紫外線),將照射活性光線(較佳為紫外線)之黏著片材1(第1黏著層2)之一部分設為高照射部分20(換言之,將黏著片材1於面方向上分割為3個部分,僅其中之中央部分1處為未照射部分22)。Furthermore, in the following description, the case of irradiating a part of the adhesive sheet 1 (first adhesive layer 2) with active light rays (preferably ultraviolet rays) will be described. The upper part is divided into 3 parts, two ends of which are irradiated with active light rays (preferably ultraviolet rays), and a part of the adhesive sheet 1 (first adhesive layer 2) irradiated with active light rays (preferably ultraviolet rays) is set It is the highly irradiated part 20 (in other words, the
具體而言,於照射步驟中,於黏著片材1中,對於高照射部分20,自另一側之剝離膜5之表面側(第1黏著層2之表面側)照射活性光線(較佳為紫外線),對於未照射部分22,不照射活性光線(較佳為紫外線)。Specifically, in the irradiation step, in the
詳細而言,於高照射部分20(詳細而言為配置於高照射部分20之另一面之剝離膜5之另一面)不配置遮斷活性光線(較佳為紫外線)之遮罩7,於未照射部分22(詳細而言為配置於未照射部分22之另一面之剝離膜5之另一面)配置遮斷活性光線(較佳為紫外線)之遮罩7,自另一側之剝離膜5之表面側(第1黏著層2之表面側)照射活性光線(較佳為紫外線)。In detail, the
藉此,僅對高照射部分20照射活性光線(較佳為紫外線)。Thereby, active light rays (preferably ultraviolet rays) are irradiated only to the highly
並且,於高照射部分20中之第1黏著層2中,自光酸產生劑產生酸,藉由酸著色之化合物藉由該酸著色(具體而言為黑色)。其結果,高照射部分20中之第1黏著層2自無色(透明)變為有色(波長550 nm下之可見光透過率變低)。如此,高照射部分20之波長550 nm下之可見光透過率小於未照射部分22之波長550 nm下之可見光透過率(具體而言,高照射部分20與未照射部分22相比變黑)。And, in the first
即,形成波長550 nm下之可見光透過率相對較小之高照射部分20、及波長550 nm下之可見光透過率相對較大之未照射部分22。That is, highly
如此,高照射部分20成為低光透過率部分11,未照射部分22成為高光透過率部分10。In this way, the high irradiated
於貼合步驟中,如圖6C所示,將黏著片材1之另一面(第1黏著層2之另一面)貼附於被黏著體15。In the pasting step, as shown in FIG. 6C , the other side of the adhesive sheet 1 (the other side of the first adhesive layer 2 ) is pasted on the
具體而言,自黏著片材1之另一面將剝離膜5剝離,並於黏著片材1之另一面(第1黏著層2之另一面)配置被黏著體15。Specifically, the
藉此獲得中間積層體6,其具備被黏著體15、配置於被黏著體15之一面之第1黏著層2、配置於第1黏著層2之一面之基材3、配置於基材3之一面之第2黏著層4、及配置於第2黏著層之一面之剝離膜5。Thus, an
又,於中間積層體6中,第1黏著層2具備波長550 nm下之可見光透過率相對較大之高光透過率部分10、及波長550 nm下之可見光透過率相對較小之低光透過率部分11。In addition, in the
並且,於該中間積層體6中,低光透過率部分11之波長550 nm下之可見光透過率例如未達20%,較佳為10%以下,又,例如為0.01%以上,又,高光透過率部分10之波長550 nm下之可見光透過率例如為80%以上,較佳為90%以上。In addition, in the
若低光透過率部分11之上述可見光透過率未達上述上限,則可確實地賦予低光透過率部分11吸收光之功能。If the visible light transmittance of the low
又,若高光透過率部分10之上述可見光透過率為上述下限以上,則高光透過率部分10具有透明性。Moreover, if the said visible light transmittance of the high
根據第1A實施形態,發揮上述中間積層體6之製造方法之效果,並且,由於在準備步驟後實施照射步驟,並在照射步驟後實施貼合步驟,故而,照射步驟中所形成之透過率不同之區域之圖案形狀即便於暴露於外界光下之情形時,亦容易維持。According to Embodiment 1A, the effect of the above-mentioned manufacturing method of the
又,根據第1A實施形態,由於在照射步驟中自另一側之剝離膜5之表面側(第1黏著層2之表面側)對第1黏著層2照射活性光線(較佳為紫外線),故而可確實地使第1黏著層2著色。Furthermore, according to Embodiment 1A, since the first
又,尤其,若被黏著體15為第2被黏著體31,則可抑制未照射部分22由來自第2被黏著體31之表面側之外界光(活性光線)著色。Moreover, especially if the
2-3-2.第1B實施形態 於第1B實施形態中,於準備步驟後實施照射步驟,且於照射步驟後實施貼合步驟。2-3-2. Embodiment 1B In Embodiment 1B, the irradiation process is implemented after the preparation process, and the bonding process is implemented after the irradiation process.
又,於第1B實施形態中,於照射步驟中,自第2黏著層4之表面側對第1黏著層2照射活性光線(較佳為紫外線)。Also, in the 1B embodiment, in the irradiation step, the first
具體而言,於照射步驟中,藉由自第2黏著層4之表面側對第2黏著層4照射超過基材3及第2黏著層4之吸收量之光量之活性光線(較佳為紫外線)而使第1黏著層2變色。Specifically, in the step of irradiating, the second
參照圖7對第1B實施形態進行說明。Embodiment 1B will be described with reference to FIG. 7 .
於準備步驟中,如圖7A所示,與上述第1A實施形態同樣地準備黏著片材1。In the preparation step, as shown in FIG. 7A , the
於照射步驟中,如圖7B所示,對第1黏著層2照射活性光線(較佳為紫外線)而於第1黏著層2形成活性光線(較佳為紫外線)之照射量相對較高之高照射部分20、及未照射到活性光線(較佳為紫外線)之未照射部分22。In the irradiation step, as shown in FIG. 7B , the first
具體而言,於照射步驟中,於黏著片材1中,對於高照射部分20,自一側之剝離膜5之表面側(第2黏著層4之表面側)照射活性光線(較佳為紫外線)(超過基材3及第2黏著層4之吸收量之光量之活性光線(較佳為紫外線)),對於未照射部分22,不照射活性光線(較佳為紫外線)。Specifically, in the irradiation step, in the
詳細而言,於高照射部分20(詳細而言為配置於高照射部分20之一側之剝離膜5之一面)不配置遮斷活性光線(較佳為紫外線)之遮罩7,於未照射部分22(詳細而言為配置於未照射部分22之一側之剝離膜5之一面)配置遮斷活性光線(較佳為紫外線)之遮罩7,自一側之剝離膜5之表面側(第2黏著層4之表面側)照射活性光線(較佳為紫外線)(超過基材3及第2黏著層4之吸收量之光量之活性光線(較佳為紫外線))。In detail, the
藉此,僅對高照射部分20照射活性光線(較佳為紫外線),可與上述第1A實施形態同樣地形成高照射部分20(低光透過率部分11)及未照射部分22(高光透過率部分10)。Thereby, only the highly
於貼合步驟中,如圖7C所示,與上述第1A實施形態同樣地將黏著片材1之另一面(第1黏著層2之另一面)貼附於被黏著體15。In the attaching step, as shown in FIG. 7C , the other side of the adhesive sheet 1 (the other side of the first adhesive layer 2 ) is attached to the
藉此獲得中間積層體6,其具備被黏著體15、配置於被黏著體15之一面之第1黏著層2、配置於第1黏著層2之一面之基材3、配置於基材3之一面之第2黏著層4、及配置於第2黏著層之一面之剝離膜5。Thus, an
又,於中間積層體6中,第1黏著層2具備波長550 nm下之可見光透過率相對較大之高光透過率部分10、及波長550 nm下之可見光透過率相對較小之低光透過率部分11。In addition, in the
並且,於該中間積層體6中,低光透過率部分11之波長550 nm下之可見光透過率例如未達20%,較佳為10%以下,又,例如為0.01%以上,又,高光透過率部分10之波長550 nm下之可見光透過率例如為80%以上,較佳為90%以上。In addition, in the
若低光透過率部分11之上述可見光透過率未達上述上限,則可確實地賦予低光透過率部分11吸收光之功能。If the visible light transmittance of the low
又,若高光透過率部分10之上述可見光透過率為上述下限以上,則高光透過率部分10具有透明性。Moreover, if the said visible light transmittance of the high
根據第1B實施形態,發揮上述中間積層體6之製造方法之效果,並且,由於在準備步驟後實施照射步驟,並在照射步驟後實施貼合步驟,故而於在照射步驟(黏著層2與活性光線吸收層3之貼合)中產生不良情況之情形時,可事先停止下一步驟(照射步驟),其結果,效率性提高。According to Embodiment 1B, the effect of the manufacturing method of the above-mentioned
又,根據第1B實施形態,由於在照射步驟中自一側之剝離膜5之表面側(第2黏著層4之表面側)對第1黏著層2照射活性光線(較佳為紫外線),故而必須照射對於基材3及/或第2黏著層4而言光量較大之活性光線(較佳為紫外線),藉此容易控制高照射部分20之透過率。Moreover, according to Embodiment 1B, since the first
又,尤其,若被黏著體15為第2被黏著體31,則可抑制未照射部分22由來自第2被黏著體31之表面側之外界光(活性光線)著色。Moreover, especially if the
2-3-3.第2A實施形態 於第2A實施形態中,於準備步驟後實施貼合步驟,且於貼合步驟後實施照射步驟。2-3-3. Embodiment 2A In Embodiment 2A, the bonding step is implemented after the preparation step, and the irradiation step is implemented after the bonding step.
又,於第2A實施形態中,於照射步驟中,自被黏著體15之表面側對第1黏著層2照射活性光線(較佳為紫外線)。Also, in the 2A embodiment, in the irradiation step, the first
於第2A實施形態中,根據被黏著體15使活性光線(較佳為紫外線)透過抑或將活性光線(較佳為紫外線)遮斷(具體而言根據被黏著體15為第1被黏著體30抑或第2被黏著體31)決定中間積層體6之製造方法。In the 2A embodiment, according to the
以下,分為被黏著體15為第1被黏著體30之情形與被黏著體15為第2被黏著體31之情形進行說明。Hereinafter, the case where the
參照圖8對被黏著體15為第1被黏著體30之情形時之第2A實施形態進行說明。Embodiment 2A in the case where the
於準備步驟中,如圖8A所示,與上述第1A實施形態同樣地準備黏著片材1。In the preparation step, as shown in FIG. 8A , the
於貼合步驟中,如圖8B所示,與上述第1A實施形態同樣地將黏著片材1之另一面(第1黏著層2之另一面)貼附於第1被黏著體30。In the attaching step, as shown in FIG. 8B , the other side of the adhesive sheet 1 (the other side of the first adhesive layer 2 ) is attached to the
於照射步驟中,如圖8C所示,對第1黏著層2照射活性光線(較佳為紫外線)而於第1黏著層2形成活性光線(較佳為紫外線)之照射量相對較高之高照射部分20、及未照射到活性光線(較佳為紫外線)之未照射部分22。In the irradiation step, as shown in FIG. 8C, the first
具體而言,於照射步驟中,於黏著片材1中,對於高照射部分20,自第1被黏著體30側照射活性光線(較佳為紫外線),對於未照射部分22,不照射活性光線(較佳為紫外線)。Specifically, in the irradiation step, in the
詳細而言,於在第1被黏著體30之另一面之一部分配置遮斷活性光線(較佳為紫外線)之遮罩7後,對第1黏著層2照射活性光線(較佳為紫外線)。Specifically, after a
更詳細而言,於高照射部分20(詳細而言為配置於高照射部分20之另一面之第1被黏著體30之另一面)不配置遮斷活性光線(較佳為紫外線)之遮罩7,於未照射部分22(詳細而言為配置於未照射部分22之另一面之第1被黏著體30之另一面)配置遮斷活性光線(較佳為紫外線)之遮罩7,自第1被黏著體30之表面側照射活性光線(較佳為紫外線)。In more detail, no mask for blocking active light (preferably ultraviolet rays) is placed on the highly irradiated portion 20 (specifically, the other side of the
此時,由於第1被黏著體30使活性光線(較佳為紫外線)透過,故而可僅對高照射部分20照射活性光線(較佳為紫外線)。At this time, since the
藉此,可與上述第1A實施形態同樣地形成高照射部分20(低光透過率部分11)、及未照射部分22(高光透過率部分10)。Thereby, the highly irradiated part 20 (low light transmittance part 11) and the non-irradiated part 22 (high light transmittance part 10) can be formed similarly to the said 1A embodiment.
藉由以上,如圖8D所示,獲得中間積層體6,其具備被黏著體15(第1被黏著體30)、配置於被黏著體15(第1被黏著體30)之一面之第1黏著層2、配置於第1黏著層2之一面之基材3、配置於基材3之一面之第2黏著層4、及配置於第2黏著層之一面之剝離膜5。Through the above, as shown in FIG. 8D , an
又,於中間積層體6中,第1黏著層2具備波長550 nm下之可見光透過率相對較大之高光透過率部分10、及波長550 nm下之可見光透過率相對較小之低光透過率部分11。In addition, in the
並且,於該中間積層體6中,低光透過率部分11之波長550 nm下之可見光透過率例如未達20%,較佳為10%以下,又,例如為0.01%以上,又,高光透過率部分10之波長550 nm下之可見光透過率例如為80%以上,較佳為90%以上。In addition, in the
若低光透過率部分11之上述可見光透過率未達上述上限,則可確實地賦予低光透過率部分11吸收光之功能。If the visible light transmittance of the low
又,若高光透過率部分10之上述可見光透過率為上述下限以上,則高光透過率部分10具有透明性。Moreover, if the said visible light transmittance of the high
根據第2A實施形態(被黏著體15為第1被黏著體30之情形),發揮上述中間積層體6之製造方法之效果,並且由於在準備步驟後實施貼合步驟,並在貼合步驟後實施照射步驟,故而於貼合步驟時可對異物或氣泡進行確認。According to Embodiment 2A (the case where the
又,根據第2A實施形態(被黏著體15為第1被黏著體30之情形),由於在照射步驟中自被黏著體15(第1被黏著體30)之表面側對第1黏著層2照射活性光線(較佳為紫外線),故而欲著色之部位之位置對準精度提高。Also, according to Embodiment 2A (when the
又,根據第2A實施形態(被黏著體15為第1被黏著體30之情形),由於使用第1被黏著體15,故而可自被黏著體15(第1被黏著體30)之表面側確實地對第1黏著層2照射活性光線(較佳為紫外線)。Also, according to Embodiment 2A (when the
接下來,參照圖9對被黏著體15為第2被黏著體31之情形時之第2B實施形態進行說明。Next,
於準備步驟中,如圖9A所示,與上述第1A實施形態同樣地準備黏著片材1。In the preparation step, as shown in FIG. 9A , the
於貼合步驟中,如圖9B所示,於黏著片材1之另一面之一部分(第1黏著層2之另一面之一部分)配置第2被黏著體31。In the bonding step, as shown in FIG. 9B , the
具體而言,自黏著片材1將剝離膜5剝離,於黏著片材1之另一面之一部分(第1黏著層2之另一面之一部分)配置第2被黏著體31。Specifically, the
再者,於以下之說明中,對如下情形進行說明,即,如圖9B所示,將黏著片材1於面方向上分割為3個部分,於其中之中央部分1處配置第2被黏著體31。Furthermore, in the following description, the following case will be described, that is, as shown in FIG. 9B , the
於照射步驟中,如圖9C所示,對第1黏著層2照射活性光線(較佳為紫外線)而於第1黏著層2形成活性光線(較佳為紫外線)之照射量相對較高之高照射部分20、及未照射到活性光線(較佳為紫外線)之未照射部分22。In the irradiation step, as shown in FIG. 9C , the first
具體而言,於照射步驟中,於黏著片材1中,對於高照射部分20,自第2被黏著體31之表面側照射活性光線(較佳為紫外線),對於未照射部分22,不照射活性光線(較佳為紫外線)。Specifically, in the irradiation step, in the
詳細而言,與上述第1A實施形態、第1B實施形態及第2A實施形態(被黏著體15為第1被黏著體30之情形)不同,不使用遮斷活性光線(較佳為紫外線)之遮罩7而直接自第2被黏著體31之表面側照射活性光線(較佳為紫外線)。Specifically, unlike the above-mentioned 1A embodiment, 1B embodiment, and 2A embodiment (in the case where the
此時,由於第2被黏著體31將活性光線(較佳為紫外線)遮斷,故而第2被黏著體31可代替遮斷活性光線(較佳為紫外線)之遮罩7,可防止配置有第2被黏著體31之未照射部分22照射到活性光線(較佳為紫外線),另一方面,可僅對未配置第2被黏著體31之高照射部分20照射活性光線(較佳為紫外線)。At this time, since the
藉此,可與上述第1A實施形態同樣地形成高照射部分20(低光透過率部分11)、及未照射部分22(高光透過率部分10)。Thereby, the highly irradiated part 20 (low light transmittance part 11) and the non-irradiated part 22 (high light transmittance part 10) can be formed similarly to the said 1A embodiment.
藉由以上,如圖9D所示,獲得中間積層體6,其具備被黏著體15(第2被黏著體31)、配置於被黏著體15(第2被黏著體31)之一面之第1黏著層2、配置於第1黏著層2之一面之基材3、配置於基材3之一面之第2黏著層4、及配置於第2黏著層之一面之剝離膜5。Through the above, as shown in FIG. 9D , an
又,於中間積層體6中,第1黏著層2具備波長550 nm下之可見光透過率相對較大之高光透過率部分10、及波長550 nm下之可見光透過率相對較小之低光透過率部分11。In addition, in the
並且,於該中間積層體6中,低光透過率部分11之波長550 nm下之可見光透過率例如未達20%,較佳為10%以下,又,例如為0.01%以上,又,高光透過率部分10之波長550 nm下之可見光透過率例如為80%以上,較佳為90%以上。In addition, in the
若低光透過率部分11之上述可見光透過率未達上述上限,則可確實地賦予低光透過率部分11吸收光之功能。If the visible light transmittance of the low
又,若高光透過率部分10之上述可見光透過率為上述下限以上,則高光透過率部分10具有透明性。Moreover, if the said visible light transmittance of the high
根據第2A實施形態(被黏著體15為第2被黏著體31之情形),發揮上述中間積層體6之製造方法之效果,並且由於在準備步驟後實施貼合步驟,並在貼合步驟後實施照射步驟,故而於貼合步驟時可對異物或氣泡進行確認。According to Embodiment 2A (the case where the
又,根據第2A實施形態(被黏著體15為第2被黏著體31之情形),由於在照射步驟中自被黏著體15(第2被黏著體31)之表面側對第1黏著層2照射活性光線(較佳為紫外線),故而欲著色之部位之位置對準精度提高。Also, according to Embodiment 2A (when the
又,根據第2A實施形態(被黏著體15為第2被黏著體31之情形),可確實地使配置有第2被黏著體15之部分(未照射部分22)不照射到活性光線(較佳為紫外線)。Also, according to Embodiment 2A (the case where the
2-3-4.第2B實施形態
於第2B實施形態中,於準備步驟後實施貼合步驟,且於貼合步驟後實施照射步驟。2-3-4.
又,於第2B實施形態中,於照射步驟中,自第2黏著層4之表面側對第1黏著層2照射活性光線(較佳為紫外線)。In addition, in the 2B embodiment, in the irradiation step, the first
具體而言,與第1B實施形態同樣地,藉由於照射步驟中自一側之剝離膜5之表面側(第2黏著層4之表面側)對第1黏著層2照射超過基材3及第2黏著層4之吸收量之光量之活性光線(較佳為紫外線)而使第1黏著層2變色。Specifically, similarly to Embodiment 1B, by irradiating the first
參照圖10對第2B實施形態進行說明。
於準備步驟中,如圖10A所示,與上述第1A實施形態同樣地準備黏著片材1。In the preparation step, as shown in FIG. 10A , the
於貼合步驟中,如圖10B所示,與上述第1A實施形態同樣地將黏著片材1之另一面(第1黏著層2之另一面)貼附於被黏著體15。In the sticking step, as shown in FIG. 10B , the other side of the adhesive sheet 1 (the other side of the first adhesive layer 2 ) is stuck to the
於照射步驟中,如圖10C所示,對第1黏著層2照射活性光線(較佳為紫外線)而於第1黏著層2形成活性光線(較佳為紫外線)之照射量相對較高之高照射部分20、及未照射到活性光線(較佳為紫外線)之未照射部分22。In the irradiation step, as shown in FIG. 10C , the first
具體而言,於照射步驟中,於黏著片材1中,對於高照射部分20,自一側之剝離膜5之表面側(第2黏著層4之表面側)照射活性光線(較佳為紫外線)(超過基材3及第2黏著層4之吸收量之光量之活性光線(較佳為紫外線)),對於未照射部分22,不照射活性光線(較佳為紫外線)。Specifically, in the irradiation step, in the
詳細而言,於高照射部分20(詳細而言為配置於高照射部分20之一側之剝離膜5之一面)不配置遮斷活性光線(較佳為紫外線)之遮罩7,於未照射部分22(詳細而言為配置於未照射部分22之一側之剝離膜5之一面)配置遮斷活性光線(較佳為紫外線)之遮罩7,自一側之剝離膜5之表面側(第2黏著層4之表面側)照射活性光線(較佳為紫外線)。In detail, the
藉此,可僅對高照射部分20照射活性光線(較佳為紫外線),可與上述第1A實施形態同樣地形成高照射部分20(低光透過率部分11)、及未照射部分22(高光透過率部分10)。Thereby, only active light rays (preferably ultraviolet rays) can be irradiated to the highly
藉由以上,如圖10D所示,獲得中間積層體6,其具備被黏著體15、配置於被黏著體15之一面之第1黏著層2、配置於第1黏著層2之一面之基材3、配置於基材3之一面之第2黏著層4、及配置於第2黏著層之一面之剝離膜5。Through the above, as shown in FIG. 10D , an
又,於中間積層體6中,第1黏著層2具備波長550 nm下之可見光透過率相對較大之高光透過率部分10、及波長550 nm下之可見光透過率相對較小之低光透過率部分11。In addition, in the
並且,於該中間積層體6中,低光透過率部分11之波長550 nm下之可見光透過率例如未達20%,較佳為10%以下,又,例如為0.01%以上,又,高光透過率部分10之波長550 nm下之可見光透過率例如為80%以上,較佳為90%以上。In addition, in the
若低光透過率部分11之上述可見光透過率未達上述上限,則可確實地賦予低光透過率部分11吸收光之功能。If the visible light transmittance of the low
又,若高光透過率部分10之上述可見光透過率為上述下限以上,則高光透過率部分10具有透明性。Moreover, if the said visible light transmittance of the high
根據第2B實施形態,發揮上述中間積層體6之製造方法之效果,並且由於在準備步驟後實施貼合步驟,並在貼合步驟後實施照射步驟,故而於貼合步驟時可對異物或氣泡進行確認。According to the 2B embodiment, the effect of the above-mentioned manufacturing method of the
又,根據第2B實施形態,由於在照射步驟中自一側之剝離膜5之表面側(第2黏著層4之表面側)對第1黏著層2照射活性光線(較佳為紫外線),故而必須照射對於基材3及/或第2黏著層4而言光量較大之活性光線(較佳為紫外線),藉此容易控制高照射部分20之透過率。In addition, according to
又,尤其,若被黏著體15為第2被黏著體31,則可抑制未照射部分22由來自第2被黏著體31之表面側之外界光(活性光線)著色。Moreover, especially if the
2-3-5.變化例 於上述說明中,對未照射/低照射部分21為未照射部分22之情形進行了說明,於以下之說明中,亦可將未照射/低照射部分21設為低照射部分23。2-3-5. Variation example In the above description, the non-irradiated/low-irradiated portion 21 was described as the un-irradiated portion 22 , but in the following description, the un-irradiated/low-irradiated portion 21 may also be referred to as the low-irradiated portion 23 .
於未照射/低照射部分21為低照射部分23之情形時,照射步驟包括:第1照射步驟,其係藉由於配置遮斷活性光線(較佳為紫外線)之第1遮罩8後對第1黏著層2照射活性光線(較佳為紫外線),而於第1黏著層2形成照射到活性光線(較佳為紫外線)之第1照射部分40、及未照射到活性光線(較佳為紫外線)之暫未照射部分41;及第2照射步驟,其係藉由於在第1照射部分40配置遮斷活性光線(較佳為紫外線)之第2遮罩9後對第1黏著層2中之暫未照射部分41照射活性光線(較佳為紫外線),而使暫未照射部分41成為第2照射部分42。When the non-irradiated/low-irradiated portion 21 is the low-irradiated portion 23, the irradiation step includes: the first irradiation step, which is to dispose the first mask 8 that blocks the active light (preferably ultraviolet rays) to the first mask 8. 1
並且,詳細內容將於下文進行敍述,由於第1照射步驟中之活性光線(較佳為紫外線)之照射量與第2照射步驟中之活性光線(較佳為紫外線)之照射量不同,故而第1照射部分40及第2照射部分42中之任一者成為高照射部分20,另一者成為低照射部分23。And, the details will be described below, because the irradiation amount of active light (preferably ultraviolet) in the first irradiation step is different from the irradiation amount of active light (preferably ultraviolet) in the second irradiation step, so the second Either one of the first
於以下之說明中,參照圖11對在第1A實施形態中未照射/低照射部分21為低照射部分23之情形(以下設為第1A實施形態之第1變化例)進行說明。In the following description, a case where the non-irradiated/low-irradiated portion 21 is the low-irradiated portion 23 in Embodiment 1A will be described with reference to FIG. 11 (hereinafter referred to as a first modification of Embodiment 1A).
於準備步驟中,如圖11A所示,與上述第1A實施形態同樣地準備黏著片材1。In the preparation step, as shown in FIG. 11A , the
於照射步驟中,對第1黏著層2照射活性光線(較佳為紫外線)而於第1黏著層2形成活性光線(較佳為紫外線)之照射量相對較高之高照射部分20、及活性光線(較佳為紫外線)之照射量相對較低之低照射部分23。In the irradiation step, the first
具體而言,於照射步驟中之第1照射步驟中,形成第1照射部分40及暫未照射部分41,於照射步驟中之第2照射步驟中,使暫未照射部分41成為第2照射部分42。Specifically, in the first irradiation step among the irradiation steps, the first
於第1照射步驟中,如圖11B所示,對於第1照射部分40,自另一側之剝離膜5之表面側(第1黏著層2之表面側)照射活性光線(較佳為紫外線),對於暫未照射部分41,不照射活性光線(較佳為紫外線)。In the first irradiation step, as shown in FIG. 11B , the
再者,於以下之說明中,將黏著片材1於面方向上分割為3個部分,將其中之兩端部分2處設為第1照射部分40(換言之,將黏著片材1於面方向上分割為3個部分,僅其中之中央部分1處為暫未照射部分41)而進行說明。Furthermore, in the following description, the
更詳細而言,於第1照射部分40(詳細而言為配置於第1照射部分40之另一面之剝離膜5之另一面)不配置遮斷活性光線(較佳為紫外線)之第1遮罩8,於暫未照射部分41(詳細而言為配置於暫未照射部分41之另一面之剝離膜5之另一面)配置遮斷活性光線(較佳為紫外線)之第1遮罩8,自另一側之剝離膜5之表面側(第1黏著層2之表面側)照射活性光線(較佳為紫外線)。More specifically, the first shielding part for blocking active light rays (preferably ultraviolet rays) is not arranged on the first irradiation part 40 (specifically, the other side of the
藉此,可僅對第1照射部分40照射活性光線(較佳為紫外線)。Thereby, only the
並且,於第1照射部分40中之第1黏著層2中,自光酸產生劑產生酸,藉由酸著色之化合物藉由該酸著色(具體而言為黑色)。其結果,第1照射部分40中之第1黏著層2自無色(透明)變為有色(波長550 nm下之可見光透過率變低)。And in the 1st
繼而,如圖11C所示,於第2照射步驟中,使暫未照射部分41成為第2照射部分42。Next, as shown in FIG. 11C , in the second irradiation step, the
詳細而言,於第2照射步驟中,對於暫未照射部分41,自第1黏著層2之表面側照射與第1照射步驟不同之光量之活性光線(較佳為紫外線),另一方面,對於第1照射部分40,不照射活性光線(較佳為紫外線)。Specifically, in the second irradiation step, the
更詳細而言,於暫未照射部分41(詳細而言為配置於暫未照射部分41之另一面之剝離膜5之另一面)不配置遮斷活性光線(較佳為紫外線)之第2遮罩9,於第1照射部分40(詳細而言為配置於第1照射部分40之另一面之剝離膜5之另一面)配置遮斷活性光線(較佳為紫外線)之第2遮罩9,自第1黏著層2之表面側照射活性光線(較佳為紫外線)。More specifically, the second shielding that blocks active light rays (preferably ultraviolet rays) is not arranged on the
藉此,可僅對暫未照射部分41照射活性光線(較佳為紫外線),暫未照射部分41成為第2照射部分42。Thereby, active light rays (preferably ultraviolet rays) can be irradiated only to the
並且,於第2照射部分42中之第1黏著層2中,自光酸產生劑產生酸,藉由酸著色之化合物藉由該酸著色(具體而言為黑色)。其結果,第2照射部分42中之第1黏著層2自無色(透明)變為有色(波長550 nm下之可見光透過率變低)。And, in the first
藉此,於第1黏著層2形成第1照射部分40及第2照射部分42。Thereby, the 1st irradiated
並且,如上所述,於第2照射步驟中,照射與第1照射步驟不同之光量之活性光線(較佳為紫外線)。And as mentioned above, in the 2nd irradiation process, the actinic ray (preferably ultraviolet-ray) of light quantity different from the 1st irradiation process is irradiated.
即,第1照射部分40及第2照射部分42之活性光線(較佳為紫外線)之照射量互不相同。That is, the irradiation amounts of active light rays (preferably ultraviolet rays) of the
因此,第1照射部分40及第2照射部分42中之任一者成為活性光線(較佳為紫外線)之照射量相對較高之高照射部分20(換言之,為波長550 nm下之可見光透過率相對較低之低光透過率部分11),另一者成為活性光線(較佳為紫外線)之照射量相對較低之低照射部分23(換言之,為波長550 nm下之可見光透過率相對較高之高光透過率部分10)。Therefore, either one of the first irradiating
再者,於圖11中,設為第1照射部分40為高照射部分20(低光透過率部分11),第2照射部分42為低照射部分21(高光透過率部分10)者而進行說明。Furthermore, in FIG. 11 , it is assumed that the first
詳細而言,高照射部分20之波長550 nm下之可見光透過率例如未達20%,較佳為10%以下,又,例如為0.01%以上,又,低照射部分23之波長550 nm下之可見光透過率例如為20%以上,較佳為40%以上,又,例如為70%以下。Specifically, the visible light transmittance at the wavelength of 550 nm of the high-
並且,於貼合步驟中,如圖11D所示,與上述第1A實施形態同樣地將黏著片材1之另一面(第1黏著層2之另一面)貼附於被黏著體15。And, in the sticking step, as shown in FIG. 11D , the other side of the adhesive sheet 1 (the other side of the first adhesive layer 2 ) is stuck to the
藉此獲得中間積層體6,其具備被黏著體15、配置於被黏著體15之一面之第1黏著層2、配置於第1黏著層2之一面之基材3、配置於基材3之一面之第2黏著層4、及配置於第2黏著層之一面之剝離膜5。Thus, an
又,於中間積層體6中,第1黏著層2具備波長550 nm下之可見光透過率相對較大之高光透過率部分10、及波長550 nm下之可見光透過率相對較小之低光透過率部分11。In addition, in the
並且,於該中間積層體6中,低光透過率部分11之波長550 nm下之可見光透過率例如未達20%,較佳為10%以下,又,例如為0.01%以上,又,高光透過率部分10之波長550 nm下之可見光透過率例如為20%以上,較佳為40%以上,又,例如為70%以下。In addition, in the
若低光透過率部分11之上述可見光透過率為上述範圍內,且高光透過率部分10之上述可見光透過率為上述範圍內,則可確實地改變光透過率部分11及高光透過率部分10之色調。If the visible light transmittance of the low
根據第1A實施形態之第1變化例,發揮上述中間積層體6之製造方法之效果,並且由於藉由第1照射步驟及第2照射步驟形成高照射部分20(低光透過率部分11)及低照射部分23(高光透過率部分10),故而可製造具備具有色調不同之區域之第1黏著層2之中間積層體6。According to the first variation example of the first A embodiment, the effect of the above-mentioned manufacturing method of the
又,尤其,若被黏著體15為第2被黏著體31,則可抑制低照射部分23由來自第2被黏著體31之表面側之外界光(活性光線)著色。In addition, in particular, if the
又,於未照射/低照射部分21為低照射部分23之情形時,照射步驟包括:第3照射步驟,其係藉由對黏著層2之全部照射活性光線(較佳為紫外線),而使黏著層2之全部形成為照射到活性光線(較佳為紫外線)之第3照射部分43;及第4照射步驟,其係藉由於在第3照射部分43之一部分45配置遮斷活性光線(較佳為紫外線)之遮罩7後對第3照射部分之其餘部分46照射活性光線(較佳為紫外線),而使第3照射部分43之其餘部分46成為第4照射部分44。Also, when the non-irradiated/low-irradiated portion 21 is the low-irradiated portion 23, the irradiation step includes: a third irradiation step, which is to irradiate the entire
於以下之說明中,參照圖12對在第1A實施形態中未照射/低照射部分21為低照射部分23之情形(以下設為第1A實施形態之第2變化例)進行說明。In the following description, a case where the unirradiated/low-irradiated portion 21 is the low-irradiated portion 23 in the first A embodiment (hereinafter referred to as the second modification of the first A embodiment) will be described with reference to FIG. 12 .
於準備步驟中,如圖12A所示,與上述第1A實施形態同樣地準備黏著片材1。In the preparation step, as shown in FIG. 12A , the
於照射步驟中,對黏著層2照射活性光線(較佳為紫外線)而於黏著層2形成活性光線(較佳為紫外線)之照射量相對較高之高照射部分20、及活性光線(較佳為紫外線)之照射量相對較低之低照射部分23。In the step of irradiating, the
具體而言,於照射步驟中之第3照射步驟中,形成第3照射部分43,於照射步驟中之第4照射步驟中,使第3照射部分43之其餘部分46(下述)成為第4照射部分44。Specifically, in the third irradiation step among the irradiation steps, the
於第3照射步驟中,如圖12B所示,自剝離膜5之表面側(第1黏著層2之表面側)對黏著層2之全部照射活性光線(較佳為紫外線)。In the third irradiation step, as shown in FIG. 12B , the entire
藉此,第1黏著層2之全部形成為第3照射部分43。Thereby, the whole of the first
又,於第1黏著層2(第3照射部分43)中,自光酸產生劑產生酸,藉由酸著色之化合物藉由該酸著色(具體而言為黑色)。其結果,第1黏著層2之全部(第3照射部分43)自無色(透明)變為有色(波長550 nm下之可見光透過率變低)。Moreover, in the 1st adhesive layer 2 (3rd irradiation part 43), acid is generate|occur|produced from a photoacid generator, and the compound colored by an acid is colored (specifically, black) by this acid. As a result, the entire first adhesive layer 2 (the third irradiated portion 43 ) changes from colorless (transparent) to colored (visible light transmittance at a wavelength of 550 nm becomes low).
繼而,於第4照射步驟中,如圖12C所示,藉由於在第3照射部分43之一部分45配置遮斷活性光線(較佳為紫外線)之遮罩7後對第3照射部分之其餘部分46照射活性光線(較佳為紫外線),而使第3照射部分43之其餘部分46成為第4照射部分44。Then, in the fourth irradiation step, as shown in FIG. 12C , by disposing a
再者,於以下之說明中,將黏著片材1於面方向上分割為3個部分,將其中之兩端部分2處設為第3照射部分43之其餘部分46(換言之,將黏著片材1於面方向上分割為3個部分,僅其中之中央部分1處為第3照射部分43之一部分45)而進行說明。Furthermore, in the following description, the
詳細而言,於第4照射步驟中,對於第3照射部分43之其餘部分46,自第1黏著層2之表面側照射活性光線(較佳為紫外線),另一方面,對於第3照射部分43之其餘部分,不照射活性光線(較佳為紫外線)。Specifically, in the fourth irradiation step, the remaining part 46 of the
更詳細而言,於第3照射部分43之其餘部分46(詳細而言為配置於第3照射部分43之其餘部分46之另一面之剝離膜5之另一面)不配置遮斷活性光線(較佳為紫外線)之遮罩7,於第3照射部分43之一部分45(詳細而言為配置於第3照射部分43之一部分45之另一面之剝離膜5之另一面)配置遮斷活性光線(較佳為紫外線)之遮罩7,自第1黏著層2之表面側照射活性光線(較佳為紫外線)。More specifically, the remaining part 46 of the third irradiating part 43 (specifically, the other side of the
藉此,可僅對第3照射部分43之其餘部分46照射活性光線(較佳為紫外線),第3照射部分43之其餘部分46成為第4照射部分44。Thereby, only the remaining part 46 of the third irradiating
並且,於第4照射部分44中之第1黏著層2中,自光酸產生劑產生酸,藉由酸著色之化合物藉由該酸著色(具體而言為黑色)。其結果,第4照射部分44中之黏著層2自無色(透明)變為有色(波長550 nm下之可見光透過率變低)。And, in the first
藉此,第4照射部分44與第3照射部分43相比波長550 nm下之可見光透過率變低。Thereby, the visible light transmittance in the wavelength 550 nm of the
即,第3照射部分43成為活性光線(較佳為紫外線)之照射量相對較低之低照射部分23(換言之,為波長550 nm下之可見光透過率相對較高之高光透過率部分10),第4照射部分44成為活性光線(較佳為紫外線)之照射量相對較高之高照射部分20(換言之,為波長550 nm下之可見光透過率相對較低之低光透過率部分11)。That is, the
詳細而言,高照射部分20之波長550 nm下之可見光透過率例如未達20%,較佳為10%以下,又,例如為0.01%以上,又,低照射部分23之波長550 nm下之可見光透過率例如為20%以上,較佳為40%以上,又,例如為70%以下。Specifically, the visible light transmittance at the wavelength of 550 nm of the high-
並且,於貼合步驟中,如圖12D所示,與上述第1A實施形態同樣地將黏著片材1之另一面(黏著層2之另一面)貼附於被黏著體15。And, in the sticking step, as shown in FIG. 12D , the other side of the adhesive sheet 1 (the other side of the adhesive layer 2 ) is stuck to the
藉此獲得中間積層體6,其具備被黏著體15、配置於被黏著體15之一面之第1黏著層2、配置於第1黏著層2之一面之基材3、配置於基材3之一面之第2黏著層4、及配置於第2黏著層之一面之剝離膜5。Thus, an
又,於中間積層體6中,黏著層2具備波長550 nm下之可見光透過率相對較大之高光透過率部分10、及波長550 nm下之可見光透過率相對較小之低光透過率部分11。In addition, in the
並且,於該中間積層體6中,低光透過率部分11之波長550 nm下之可見光透過率例如未達20%,較佳為10%以下,又,例如為0.01%以上,又,高光透過率部分10之波長550 nm下之可見光透過率例如為20%以上,較佳為40%以上,又,例如為70%以下。In addition, in the
若低光透過率部分11之上述可見光透過率為上述範圍內,且高光透過率部分10之上述可見光透過率為上述範圍內,則可確實地改變光透過率部分11及高光透過率部分10之色調。If the visible light transmittance of the low
根據第1A實施形態之第2變化例,發揮上述中間積層體6之製造方法之效果,並且由於藉由第3照射步驟及第4照射步驟形成高照射部分20(低光透過率部分11)及低照射部分23(高光透過率部分10),故而可製造具備具有色調不同之區域之黏著層2之中間積層體6。According to the second modification of the first A embodiment, the effect of the above-mentioned manufacturing method of the
又,尤其,若被黏著體15為第2被黏著體31,則可抑制低照射部分23由來自第2被黏著體31之表面側之外界光(活性光線)著色。In addition, in particular, if the
於上述說明中,對在第1A實施形態中將未照射/低照射部分21設為低照射部分23之情形進行了說明,於第1B實施形態、第2A實施形態(使用第1被黏著體之情形)及第2B實施形態中,亦可基於與上述第1A實施形態之第1變化例或第2變化例中之照射步驟相同之程序將未照射/低照射部分21設為低照射部分23。In the above description, the case where the unirradiated/low-irradiated portion 21 is set as the low-irradiated portion 23 in the 1A embodiment has been described, and in the 1B embodiment and the 2A embodiment (using the first adherend) case) and the 2B embodiment, the non-irradiated/lowly irradiated portion 21 can also be set as the low-irradiated portion 23 based on the same procedure as the irradiation step in the first variation or the second variation of the above-mentioned 1A embodiment.
又,亦可藉由使用複數個遮斷活性光線(較佳為紫外線)之遮罩7,而獲得第1黏著層2中之低光透過率部分11具有圖案形狀之中間積層體6。In addition, the
具體而言,於第1A實施形態之照射步驟中,如圖13A所示,於另一側之剝離膜5之另一面配置複數個遮斷活性光線(較佳為紫外線)之遮罩7(詳細而言,相互隔開間隔地配置4個)。Specifically, in the irradiation step of Embodiment 1A, as shown in FIG. 13A , on the other side of the
並且,藉由與上述第1A實施形態同樣地實施準備步驟、照射步驟及貼合步驟,可如圖13B所示獲得第1黏著層2中之低光透過率部分11具有圖案形狀之中間積層體6。In addition, by carrying out the preparatory step, the irradiation step, and the lamination step in the same manner as in the above-mentioned 1A embodiment, an intermediate laminate in which the low
於中間積層體6中,若低光透過率部分11具有圖案形狀,則可自由地設計圖案形狀。
[實施例]In the
以下揭示實施例及比較例,更加具體地對本發明進行說明。再者,本發明不受實施例及比較例任何限定。又,以下記載中所使用之調配比率(含有比率)、物性值、參數等具體數值可替代為上述「實施方式」中所記載之與其等對應之調配比率(含有比率)、物性值、參數等相應記載之上限值(以「以下」、「未達」定義之數值)或下限值(以「以上」、「超過」定義之數值)。Examples and comparative examples are disclosed below, and the present invention will be described more specifically. In addition, this invention is not limited at all by an Example and a comparative example. In addition, specific numerical values such as blending ratios (content ratios), physical property values, and parameters used in the following descriptions may be replaced by corresponding blending ratios (content ratios), physical property values, parameters, etc. described in the above "embodiments" The upper limit value (the value defined by "below" and "less than") or the lower limit value (the value defined by "above" and "exceeding") of the corresponding record.
再者,「份」及「%」只要未特別言及,則為質量基準。Furthermore, "parts" and "%" are quality standards unless otherwise specified.
1.成分之詳細內容 以下記載各實施例及各比較例中所使用之各成分。 BA:丙烯酸丁酯 AA:丙烯酸 2EHA:丙烯酸2-乙基己酯 NVP:N-乙烯基吡咯啶酮 MMA:甲基丙烯酸甲酯 HEA:丙烯酸羥基乙酯 Tetrad C:商品名:1,3-雙(N,N-二縮水甘油基胺基甲基)環己烷(環氧系交聯劑),三菱瓦斯化學製造 BLACK ND1:隱色染料,山田化學工業製造 CPI-310B:包含鋶及(C6 F5 )4 B- 之鹽,光酸產生劑,San-Apro製造 KC2UA:TAC膜,厚度25 μm,Konica Minolta股份有限公司製造 UVA(ultraviolet-A,紫外線A)-TAC:依序具備KC2UA及硬塗層之膜(藉由利用硬塗處理於KC2UA(厚度:25 μm)之一面形成硬塗層(厚度:7 μm)所獲得),厚度32 μm UVA-OCA(Optically Clear Adhesive,光學透明黏著劑):具有紫外線吸收功能之膠帶,商品名「CS9934U」,厚度100 μm,日東電工公司製造 PET膜:厚度25 μm1. Details of components Each component used in each Example and each comparative example is described below. BA: Butyl acrylate AA: Acrylic acid 2EHA: 2-Ethylhexyl acrylate NVP: N-vinylpyrrolidone MMA: Methyl methacrylate HEA: Hydroxyethyl acrylate Tetrad C: Trade name: 1,3-bis (N,N-diglycidylaminomethyl)cyclohexane (epoxy-based crosslinking agent), manufactured by Mitsubishi Gas Chemical BLACK ND1: leuco dye, manufactured by Yamada Chemical Industry CPI-310B: contains calcite and (C 6 F 5 ) 4 B - salt, photoacid generator, manufactured by San-Apro KC2UA: TAC film, thickness 25 μm, manufactured by Konica Minolta Co., Ltd. UVA (ultraviolet-A, ultraviolet A)-TAC: KC2UA in sequence and a hard coat film (obtained by forming a hard coat layer (thickness: 7 μm) on one side of KC2UA (thickness: 25 μm) by hard coating treatment), a thickness of 32 μm UVA-OCA (Optically Clear Adhesive, optically transparent Adhesive): Adhesive tape with ultraviolet absorbing function, trade name "CS9934U", thickness 100 μm, PET film manufactured by Nitto Denko Co., Ltd.: thickness 25 μm
2.黏著片材之製備 實施例1 向具備溫度計、攪拌機、回流冷卻管及氮氣導入管之反應容器中投入作為單體成分之丙烯酸丁酯95質量份、丙烯酸5質量份、作為聚合起始劑之偶氮二異丁腈0.2質量份、作為溶劑之乙酸乙酯233質量份,通入氮氣,一面攪拌一面進行約1小時氮氣置換。其後,加熱至60℃,使之反應7小時,獲得重量平均分子量(Mw)為600000之黏著性聚合物之溶液。2. Preparation of adhesive sheet Example 1 95 parts by mass of butyl acrylate as a monomer component, 5 parts by mass of acrylic acid, and 0.2 parts by mass of azobisisobutyronitrile as a polymerization initiator were charged into a reaction vessel equipped with a thermometer, a stirrer, a reflux cooling pipe, and a nitrogen gas introduction pipe. 233 parts by mass of ethyl acetate as a solvent, nitrogen gas was passed through, and nitrogen replacement was performed for about 1 hour while stirring. Thereafter, it was heated to 60° C. and reacted for 7 hours to obtain a solution of an adhesive polymer having a weight average molecular weight (Mw) of 600,000.
向該黏著性聚合物之溶液中添加相對於黏著性聚合物之溶液中之黏著性聚合物100質量份為0.075質量份之作為交聯劑之Tetrad C、相對於黏著性聚合物之溶液中之黏著性聚合物100質量份為2質量份之作為藉由酸著色之化合物之BLACK ND1(隱色染料)、相對於黏著性聚合物之溶液中之黏著性聚合物100質量份為10質量份之作為酸產生劑之CP-310B(光酸產生劑),均一地混合而製備第1黏著性組合物。To the solution of the adhesive polymer, 0.075 parts by mass of Tetrad C as a crosslinking agent was added to 100 parts by mass of the adhesive polymer in the solution of the adhesive polymer, and Tetrad C was added to the solution of the adhesive polymer. 2 parts by mass of BLACK ND1 (leuco dye) as a compound colored by acid for 100 parts by mass of the adhesive polymer, 10 parts by mass of 100 parts by mass of the adhesive polymer in the solution of the adhesive polymer CP-310B (photoacid generator) which is an acid generator was mixed uniformly, and the 1st adhesive composition was prepared.
繼而,利用槽輥以乾燥後之厚度成為25 μm之方式於表面經脫模處理之厚度50 μm之聚對苯二甲酸乙二酯膜(以下設為剝離膜A)之一面塗佈合成例1之第1黏著性組合物,於130℃下乾燥1分鐘而將溶劑去除。藉此形成於另一面具備剝離膜A之黏著層。繼而,將剝離膜B(表面經聚矽氧脫模處理之厚度25 μm之聚對苯二甲酸乙二酯膜)之脫模處理面貼合於黏著層之一面。其後,於25℃之環境下進行4天老化處理,使之進行交聯反應。藉此製造(準備)第1黏著層。Next, Synthesis Example 1 was coated on one side of a polyethylene terephthalate film with a thickness of 50 μm (hereinafter referred to as release film A) with a release treatment on the surface using a grooved roll so that the thickness after drying became 25 μm. The first adhesive composition was dried at 130° C. for 1 minute to remove the solvent. Thereby, the adhesive layer provided with the peeling film A on the other side was formed. Then, the release-treated surface of the release film B (polyethylene terephthalate film with a thickness of 25 μm and a silicone release treatment on the surface) was attached to one side of the adhesive layer. Thereafter, an aging treatment was carried out for 4 days in an environment of 25° C. to allow a cross-linking reaction to proceed. In this way, the first adhesive layer is produced (prepared).
繼而,將配置於第1黏著層之一面之剝離膜B剝離,於第1黏著層之一面依序配置玻璃基板、包含公知之黏著劑之低黏著劑層、作為基材(基材A)之PET膜、包含公知之黏著劑之高黏著劑層、作為基材(基材B)之PET膜、作為第2黏著層之UVA-OCA、及剝離膜C(聚對苯二甲酸乙二酯膜)。Then, the release film B arranged on one side of the first adhesive layer is peeled off, and a glass substrate, a low-adhesive layer containing a known adhesive, and a base material (substrate A) are sequentially arranged on one side of the first adhesive layer. PET film, high adhesive layer containing known adhesive, PET film as substrate (substrate B), UVA-OCA as second adhesive layer, and release film C (polyethylene terephthalate film ).
再者,低黏著劑層具有可將玻璃基板與PET膜剝離之程度之黏著力。Furthermore, the low-adhesive layer has the adhesive force of the grade which can peel off a glass substrate and a PET film.
又,低黏著劑層及高黏著劑層之紫外線之平均透過率為50%以上。Also, the average transmittance of ultraviolet rays of the low adhesive layer and the high adhesive layer is 50% or more.
藉此獲得依序具備剝離膜A、第1黏著層、玻璃基板、低黏著劑層、PET膜(基材A)、高黏著劑層、PET膜(基材B)、第2黏著層、及剝離膜C之黏著片材。In this way, a release film A, a first adhesive layer, a glass substrate, a low adhesive layer, a PET film (substrate A), a high adhesive layer, a PET film (substrate B), a second adhesive layer, and Adhesive sheet of release film C.
實施例2 使用UVA-TAC作為基材B,使用第2黏著層A作為第2黏著層,除此以外,以與實施例1相同之方式製造黏著片材。Example 2 An adhesive sheet was produced in the same manner as in Example 1 except that UVA-TAC was used as the base material B and the second adhesive layer A was used as the second adhesive layer.
再者,第2黏著層A係藉由以下方法製備。In addition, the 2nd adhesive layer A was prepared by the following method.
(第2黏著層A之製備) 向具備溫度計、攪拌機、回流冷卻管及氮氣導入管之反應容器中投入作為單體成分之丙烯酸2-乙基己酯(2EHA)63質量份、N-乙烯基吡咯啶酮(NVP)15質量份、甲基丙烯酸甲酯(MMA)9質量份、及丙烯酸羥基乙酯(HEA)13質量份、作為聚合起始劑之偶氮二異丁腈0.2重量份、作為溶劑之乙酸乙酯233重量份,通入氮氣,一面攪拌一面進行約1小時氮氣置換。其後,加熱至60℃,使之反應7小時,獲得重量平均分子量(Mw)為1200000之第3黏著性組合物。(Preparation of the second adhesive layer A) Put 63 parts by mass of 2-ethylhexyl acrylate (2EHA) and 15 parts by mass of N-vinylpyrrolidone (NVP) as monomer components into a reaction vessel equipped with a thermometer, a stirrer, a reflux cooling pipe, and a nitrogen gas introduction pipe , 9 parts by mass of methyl methacrylate (MMA), 13 parts by mass of hydroxyethyl acrylate (HEA), 0.2 parts by weight of azobisisobutyronitrile as a polymerization initiator, 233 parts by weight of ethyl acetate as a solvent , nitrogen gas was blown in, and nitrogen replacement was performed for about 1 hour while stirring. Then, it heated to 60 degreeC, and it was made to react for 7 hours, and the 3rd adhesive composition whose weight average molecular weight (Mw) was 1,200,000 was obtained.
利用槽輥以乾燥後之厚度成為50 μm之方式於作為基材之表面設置有聚矽氧系脫模層之厚度75 μm之聚對苯二甲酸乙二酯(PET)膜(Mitsubishi Chemical製造之「DIAFOIL MRF75」)上塗佈該第3黏著性組合物,以乾燥溫度130℃、乾燥時間30秒之條件進行固化而乾燥。於該塗佈膜上貼合作為覆蓋片材(剝離膜)之單面經聚矽氧剝離處理之厚度75 μm之PET膜(Mitsubishi Chemical製造之「DIAFOIL MRE75」)而製造(準備)50 μm之第2黏著層A。A polyethylene terephthalate (PET) film (manufactured by Mitsubishi Chemical) having a thickness of 75 μm and a polysiloxane-based release layer on the surface of the substrate was provided with a grooved roll so that the thickness after drying became 50 μm. "DIAFOIL MRF75") was coated with this third adhesive composition, and was cured and dried at a drying temperature of 130° C. and a drying time of 30 seconds. A PET film ("DIAFOIL MRE75" manufactured by Mitsubishi Chemical) with a thickness of 75 μm ("DIAFOIL MRE75" manufactured by Mitsubishi Chemical) was bonded on the coating film as a cover sheet (release film) to produce (prepare) a 50 μm The second adhesive layer A.
實施例3 使用UVA-TAC作為基材B,使用UVA-OCA作為第2黏著層,除此以外,以與實施例1相同之方式製造黏著片材。Example 3 An adhesive sheet was produced in the same manner as in Example 1 except that UVA-TAC was used as the base material B and UVA-OCA was used as the second adhesive layer.
比較例1 使用PET膜作為基材B,使用第2黏著層A作為第2黏著層,除此以外,以與實施例1相同之方式製造黏著片材。Comparative example 1 An adhesive sheet was produced in the same manner as in Example 1 except that the PET film was used as the base material B and the second adhesive layer A was used as the second adhesive layer.
4.評價 (LED(Light Emitting Diode,發光二極體)照射前之第1黏著層之平均透過率) 將配置於實施例1之第1黏著層之一面之剝離膜B剝離,將第1黏著層之一面貼合於玻璃基板。4. Evaluation (The average transmittance of the first adhesive layer before LED (Light Emitting Diode) irradiation) The peeling film B arrange|positioned on the surface of the 1st adhesive layer of Example 1 was peeled off, and the surface of the 1st adhesive layer was bonded to the glass substrate.
其後,將配置於第1黏著層之另一面之剝離膜A剝離。藉此製備平均透過率測定用樣品。Thereafter, the release film A disposed on the other surface of the first adhesive layer is peeled off. In this way, a sample for measuring the average transmittance was prepared.
將該平均透過率測定用樣品以第1黏著層配置於光源側之方式設置於透過率測定裝置(U4100型分光光度計,日本High-Technologies公司製造)中,測定波長400 nm~700 nm下之平均透過率。The sample for measuring the average transmittance was set in a transmittance measuring device (U4100 spectrophotometer, manufactured by Japan High-Technologies Co., Ltd.) with the first adhesive layer arranged on the light source side, and measured at a wavelength of 400 nm to 700 nm. average transmittance.
再者,將僅以玻璃基板所測得之資料設為基準線。Furthermore, the data measured only on the glass substrate was set as the baseline.
將其結果示於表1。The results are shown in Table 1.
(LED照射後之第1黏著層之平均透過率) 對上述平均透過率測定用樣品中之第1黏著層照射LED(365 nm,8000 mJ/□)之光後,藉由與上述相同之方法測定波長400 nm~700 nm下之平均透過率。(Average transmittance of the first adhesive layer after LED irradiation) After irradiating the light of LED (365 nm, 8000 mJ/□) to the first adhesive layer in the above average transmittance measurement sample, the average transmittance at a wavelength of 400 nm to 700 nm was measured by the same method as above.
將其結果示於表1。The results are shown in Table 1.
(基材B及第2黏著層之平均透過率) 將各基材B、各第2黏著層、將基材B及第2黏著層貼合所獲得者設置於透過率測定裝置(U4100型分光光度計,日本High-Technologies公司製造)中,分別測定波長300 nm~400 nm下之平均透過率及波長400 nm~700 nm下之平均透過率。(Average transmittance of substrate B and the second adhesive layer) Each base material B, each second adhesive layer, and the result obtained by pasting the base material B and the second adhesive layer were set in a transmittance measuring device (U4100 spectrophotometer, manufactured by Japan High-Technologies Co., Ltd.), and measured respectively The average transmittance at a wavelength of 300 nm to 400 nm and the average transmittance at a wavelength of 400 nm to 700 nm.
再者,將於測定裝置內未設置任何東西之狀態下所測得之資料設為基準線。Furthermore, the data measured in the state where nothing is installed in the measuring device is set as the baseline.
將其結果示於表1。The results are shown in Table 1.
(外界光穩定性) 以自各實施例及各比較例之黏著片材中之第2黏著層側照射螢光燈之光之方式放置各實施例及各比較例之黏著片材。(outside light stability) The adhesive sheets of each Example and each Comparative Example were placed so that the light of the fluorescent lamp was irradiated from the second adhesive layer side of the adhesive sheets of each Example and each Comparative Example.
並且,測定放置開始時、及放置開始後經過一定時間後(24小時後、48小時後、120小時後、144小時後)之波長400 nm~700 nm下之平均透過率。Then, the average transmittance at a wavelength of 400 nm to 700 nm was measured at the start of leaving and after a certain period of time (after 24 hours, 48 hours, 120 hours, and 144 hours) after the start of leaving.
具體而言,自黏著片材將配置於玻璃基板之一面之低黏著劑層、PET膜、高黏著劑層、基材B、第2黏著層、及剝離膜C剝離,又,將配置於第1黏著層之另一面之剝離膜A剝離。Specifically, the self-adhesive sheet peels off the low-adhesive layer, PET film, high-adhesive layer, base material B, second adhesive layer, and release film C disposed on one side of the glass substrate, and then separates the self-adhesive sheet disposed on the second side. 1 Peel off the release film A on the other side of the adhesive layer.
藉此製備依序具備第1黏著層、及玻璃基板之外界光穩定性測定用樣品。In this manner, a sample for measuring the external light stability provided with the first adhesive layer and the glass substrate in this order was prepared.
並且,將該外界光穩定性測定用樣品以黏著層配置於光源側之方式設置於透過率測定裝置(U4100型分光光度計,日本High-Technologies公司製造)中,測定波長400 nm~700 nm下之平均透過率。In addition, the sample for external light stability measurement was set in a transmittance measurement device (U4100 spectrophotometer, manufactured by Japan High-Technologies Co., Ltd.) with the adhesive layer disposed on the light source side, and the measurement wavelength was 400 nm to 700 nm. the average transmittance.
再者,將僅以玻璃基板所測得之資料設為基準線。Furthermore, the data measured only on the glass substrate was set as the baseline.
又,藉由下述式(1)求出經過各時間後之變化率。 經過各時間後之變化率=(放置開始時之平均透過率-經過各時間後之平均透過率)/(放置開始時之平均透過率) (1)Moreover, the rate of change after each elapse of time was calculated|required by the following formula (1). Change rate after each time = (average transmittance at the beginning of placement - average transmittance after each time) / (average transmittance at the beginning of placement) (1)
將其結果示於表2。The results are shown in Table 2.
5.探討 於平均透過率之評價中,第1黏著層包含可藉由紫外線之照射而降低波長550 nm下之可見光透過率之第1黏著性組合物之實施例1的黏著片材於照射LED前後之波長400 nm~700 nm下之平均透過率降低。5. Explore In the evaluation of the average transmittance, the wavelength of the adhesive sheet of Example 1 in which the first adhesive layer contains the first adhesive composition that can reduce the visible light transmittance at a wavelength of 550 nm by irradiation of ultraviolet rays before and after irradiation with LED The average transmittance at 400 nm to 700 nm decreases.
由此可知:若使用具備上述第1黏著層之黏著片材,則可藉由於任意時點照射紫外線而使黏著層著色。From this, it turns out that if the adhesive sheet provided with the said 1st adhesive layer is used, the adhesive layer can be colored by irradiating an ultraviolet-ray at arbitrary timing.
於外界光穩定性之評價中,使用波長300 nm以上且400 nm以下之平均透過率為15%以下之基材及/或第2黏著層之實施例1~實施例3於放置開始後經過120小時後變化率為1.11~5.72%以下。In the evaluation of the external light stability, the substrate and/or the second adhesive layer with a wavelength of 300 nm to 400 nm and an average transmittance of 15% or less were used in Examples 1 to 3 after 120 The rate of change after hours is below 1.11% to 5.72%.
另一方面,使用波長300 nm以上且400 nm以下之平均透過率為69%之PET膜作為基材且使用上述平均透過率為65.17%之第2黏著層A作為第2黏著層之比較例1自放置開始後經過120小時後變化率為64.02%。On the other hand, comparative example 1 using a PET film with an average transmittance of 69% at a wavelength of 300 nm to 400 nm as a base material and using the above-mentioned second adhesive layer A with an average transmittance of 65.17% as a second adhesive layer The rate of change after 120 hours from the start of storage was 64.02%.
由此可知:若使用波長300 nm以上且400 nm以下之平均透過率為15%以下之基材及/或第2黏著層,則外界光穩定性優異。From this, it can be seen that if the base material and/or the second adhesive layer with a wavelength of 300 nm to 400 nm and an average transmittance of 15% or less are used, the external light stability is excellent.
並且可知:由於外界光穩定性優異,故而於欲使黏著層中之著色部分以外透明地殘留之情形、或欲使其著色量少於著色部分之情形時,可抑制著色部分以外由外界光(紫外線)著色。
[表1]
再者,上述發明係作為本發明之例示之實施形態所提供,但其僅為例示,不能限定性地進行解釋。對於該技術領域之業者而言明顯之本發明之變化例包含於下述申請專利範圍中。 [產業上之可利用性]In addition, the above-mentioned invention is provided as an exemplary embodiment of the present invention, but it is only an illustration and should not be construed in a limited manner. Modifications of the present invention that are obvious to those skilled in the art are included in the following claims. [Industrial availability]
本發明之黏著片材、黏著片材之製造方法、中間積層體之製造方法及中間積層體可較佳地於光學器件、電子器件及其構成零件中使用。The adhesive sheet, the method for producing the adhesive sheet, the method for producing the intermediate laminate, and the intermediate laminate of the present invention can be suitably used in optical devices, electronic devices, and components thereof.
1:黏著片材
2:第1黏著層
3:基材
4:第2黏著層
5:剝離膜
6:中間積層體
7:遮罩
8:第1遮罩
9:第2遮罩
10:高光透過率部分
11:低光透過率部分
15:被黏著體
20:高照射部分
21:未照射/低照射部分
22:未照射部分
23:低照射部分
30:第1被黏著體
31:第2被黏著體
40:第1照射部分
41:暫未照射部分
42:第2照射部分
43:第3照射部分
44:第4照射部分
45:一部分
46:其餘部分
51:將照射活性光線(較佳為紫外線)之部分
52:不照射活性光線(較佳為紫外線)之部分1: Adhesive sheet
2: The first adhesive layer
3: Substrate
4: The second adhesive layer
5: Peel off film
6: Intermediate laminate
7: mask
8: 1st mask
9: 2nd mask
10: High light transmittance part
11: Low light transmittance part
15: Adhered body
20: Highly irradiated part
21: Non-irradiated/low-irradiated part
22: Unirradiated part
23: Low exposure part
30: The first adherend
31: The second adherend
40: 1st irradiation part
41: The part that has not been irradiated yet
42: The second irradiation part
43:
圖1揭示表示本發明之黏著片材之一實施形態之概略圖,圖1A表示本發明之黏著片材之一實施形態,圖1B表示僅基材具備活性光線吸收性之黏著片材,圖1C表示僅第2黏著層具備活性光線吸收性之黏著片材,圖1D表示基材及第2黏著層兩者具備活性光線吸收性之黏著片材。
圖2係表示黏著片材之製造方法之一實施形態之概略圖,圖2A表示準備第1黏著層之第1黏著層準備步驟,圖2B表示於第1黏著層之一面配置基材之基材配置步驟,圖2C表示於基材之一面配置第2黏著層之第2黏著層配置步驟。
圖3係表示黏著片材之製造方法(對第1黏著層之全部照射活性光線之情形)之一實施形態之概略圖,圖3A表示準備第1黏著層之第1黏著層準備步驟,圖3B表示自剝離膜之表面側對第1黏著層之全部照射活性光線之步驟,圖3C表示於第1黏著層之一面配置基材之基材配置步驟,圖3D表示於基材之一面配置第2黏著層之第2黏著層配置步驟,圖3E表示將剝離膜更換貼附為基材及第2黏著層之步驟。
圖4係表示黏著片材之製造方法(對第1黏著層之一部分照射活性光線之情形)之一實施形態之概略圖,圖4A表示自剝離膜之表面側對第1黏著層之一部分照射活性光線之步驟,圖4B表示於第1黏著層之一面配置基材之基材配置步驟,圖4C表示於基材之一面配置第2黏著層之第2黏著層配置步驟,圖4D表示將剝離膜之全部更換貼附為基材及第2黏著層之步驟,圖4E表示將剝離膜之一部分更換貼附為基材及第2黏著層之步驟。
圖5係表示本發明之中間積層體之一實施形態之概略圖。
圖6係表示本發明之中間積層體之製造方法之第1A實施形態的概略圖,圖6A表示準備黏著片材之準備步驟,圖6B表示自另一側之剝離膜之表面側(第1黏著層之表面側)對第1黏著層照射活性光線之照射步驟,圖6C表示將黏著片材貼合於被黏著體之貼合步驟。
圖7係表示本發明之中間積層體之製造方法之第1B實施形態的概略圖,圖7A表示準備黏著片材之準備步驟,圖7B表示自一側之剝離膜之表面側(第2黏著層之表面側)對第1黏著層照射活性光線之照射步驟,圖7C表示將黏著片材貼合於被黏著體之貼合步驟。
圖8係表示本發明之中間積層體之製造方法之第2A實施形態(被黏著體為第1被黏著體之情形)的概略圖,圖8A表示準備黏著片材之準備步驟,圖8B表示將黏著片材貼合於第1被黏著體之貼合步驟,圖8C表示自第1被黏著體之表面側對第1黏著層照射活性光線之照射步驟,圖8D表示第2A實施形態(被黏著體為第1被黏著體之情形)中所製造之中間積層體。
圖9係表示本發明之中間積層體之製造方法之第2A實施形態(被黏著體為第2被黏著體之情形)的概略圖,圖9A表示準備黏著片材之準備步驟,圖9B表示將黏著片材貼合於第2被黏著體之貼合步驟,圖9C表示自第2被黏著體之表面側對第1黏著層照射活性光線之照射步驟,圖9D表示第2A實施形態(被黏著體為第2被黏著體之情形)中所製造之中間積層體。
圖10係表示本發明之中間積層體之製造方法之第2B實施形態的概略圖,圖10A表示準備黏著片材之準備步驟,圖10B表示將黏著片材貼合於被黏著體之貼合步驟,圖10C表示自一側之剝離膜之表面側(第2黏著層之表面側)對第1黏著層照射活性光線之照射步驟,圖10D表示第2B實施形態中所製造之中間積層體。
圖11係表示本發明之中間積層體之製造方法之第1A實施形態之第1變化例的概略圖,圖11A表示準備黏著片材之準備步驟,圖11B表示藉由照射活性光線而形成第1照射部分、及暫未照射部分之第1照射步驟,圖11C表示藉由對暫未照射部分照射活性光線而使暫未照射部分形成為第2照射部分之第2照射步驟,圖11D表示將黏著片材貼合於被黏著體之貼合步驟。
圖12係表示本發明之中間積層體之製造方法之第1A實施形態之第2變化例的概略圖,圖12A表示準備黏著片材之準備步驟,圖12B表示藉由對第1黏著層之全部照射活性光線而使第1黏著層之全部形成為第3照射部分之第3照射步驟,圖12C表示藉由於在第3照射部分之一部分配置遮斷活性光線之遮罩後對第3照射部分之其餘部分照射活性光線,而使第3照射部分之其餘部分形成為第4照射部分之第4照射步驟,圖12D表示將黏著片材貼合於被黏著體之貼合步驟。
圖13係表示第1黏著層中之低光透過率部分具有圖案形狀之中間積層體之製造方法的概略圖,圖13A表示配置複數個遮斷活性光線之遮罩之照射步驟,圖13B表示第1黏著層中之低光透過率部分具有圖案形狀之中間積層體。Fig. 1 discloses a schematic view showing an embodiment of the adhesive sheet of the present invention, Fig. 1A shows an embodiment of the adhesive sheet of the present invention, Fig. 1B shows an adhesive sheet in which only the substrate has active light absorption, and Fig. 1C 1D shows an adhesive sheet in which only the second adhesive layer has active ray absorptivity, and FIG. 1D shows an adhesive sheet in which both the base material and the second adhesive layer have active ray absorptivity.
Fig. 2 is a schematic diagram showing an embodiment of a method for producing an adhesive sheet, Fig. 2A shows a first adhesive layer preparation step for preparing a first adhesive layer, and Fig. 2B shows a base material with a base material disposed on one side of the first adhesive layer Arrangement step, Fig. 2C shows the second adhesive layer arrangement step of arranging the second adhesive layer on one side of the substrate.
Fig. 3 is a schematic view showing an embodiment of a method of manufacturing an adhesive sheet (the situation of irradiating the whole of the first adhesive layer with active light), and Fig. 3A shows the preparation steps of the first adhesive layer for preparing the first adhesive layer, and Fig. 3B It shows the step of irradiating the whole of the first adhesive layer with active light from the surface side of the release film. FIG. 3C shows the step of arranging the base material on one side of the first adhesive layer. FIG. 3D shows the step of arranging the second adhesive layer on one side of the base material. The step of disposing the second adhesive layer of the adhesive layer, Fig. 3E shows the step of replacing and attaching the release film as the base material and the second adhesive layer.
Fig. 4 is a schematic diagram showing an embodiment of a method for producing an adhesive sheet (a case of irradiating a part of the first adhesive layer with active light), and Fig. 4A shows a part of the first adhesive layer irradiated with active light from the surface side of the release film. The steps of light, Figure 4B shows the step of disposing the base material on one side of the first adhesive layer, Figure 4C shows the step of disposing the second adhesive layer on one side of the base material, Figure 4D shows the step of disposing the release film The steps of replacing and attaching all of the peeling film as the base material and the second adhesive layer are shown in Figure 4E.
Fig. 5 is a schematic view showing an embodiment of the intermediate laminate of the present invention.
Fig. 6 is a schematic view showing the 1A embodiment of the manufacturing method of the intermediate laminate of the present invention. Fig. 6A shows the preparation steps for preparing the adhesive sheet, and Fig. 6B shows the surface side of the release film from the other side (the first adhesive sheet). The surface side of the layer) is a step of irradiating the first adhesive layer with active light rays. FIG. 6C shows a step of bonding the adhesive sheet to the adherend.
Fig. 7 is a schematic diagram showing the 1B embodiment of the manufacturing method of the intermediate laminate of the present invention, Fig. 7A shows the preparation steps for preparing the adhesive sheet, and Fig. 7B shows the surface side of the release film from one side (the second adhesive layer surface side) of the irradiation step of irradiating the first adhesive layer with active light, and Fig. 7C shows the step of attaching the adhesive sheet to the adherend.
Fig. 8 is a schematic view showing Embodiment 2A of the method for producing an intermediate laminate of the present invention (the case where the adherend is the first adherend), and Fig. 8A shows the preparatory steps for preparing an adhesive sheet, and Fig. 8B shows the preparation of the adhesive sheet. The step of attaching the adhesive sheet to the first adherend, FIG. 8C shows the irradiation step of irradiating the first adhesive layer with active light from the surface side of the first adherend, and FIG. 8D shows the second A embodiment (adhered The intermediate laminate produced in the case where the body is the first adherend).
Fig. 9 is a schematic view showing Embodiment 2A of the method for producing the intermediate laminate of the present invention (the adherend is the second adherend), and Fig. 9A shows the preparation steps for preparing the adhesive sheet, and Fig. 9B shows the preparation of the adhesive sheet. The step of attaching the adhesive sheet to the second adherend, FIG. 9C shows the step of irradiating the first adhesive layer with active light from the surface side of the second adherend, and FIG. 9D shows the second A embodiment (adhered The intermediate laminate produced in the case where the body is the second adherend).
Fig. 10 is a schematic view showing the second embodiment of the method of manufacturing the intermediate laminate of the present invention, Fig. 10A shows the preparation step of preparing the adhesive sheet, and Fig. 10B shows the step of attaching the adhesive sheet to the
1:黏著片材 1: Adhesive sheet
2:第1黏著層 2: The first adhesive layer
3:基材 3: Substrate
4:第2黏著層 4: The second adhesive layer
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WO2019035411A1 (en) * | 2017-08-18 | 2019-02-21 | 積水化学工業株式会社 | Moisture curable resin composition, adhesive for electronic components, and adhesive for display elements |
TW202012546A (en) * | 2018-07-27 | 2020-04-01 | 日商艾迪科股份有限公司 | Composition, cured product, optical filter, and production method for cured product |
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CN113613894B (en) | 2022-12-30 |
TW202045673A (en) | 2020-12-16 |
TW202039748A (en) | 2020-11-01 |
KR102419776B1 (en) | 2022-07-11 |
CN113573894A (en) | 2021-10-29 |
CN113613894A (en) | 2021-11-05 |
TW202045652A (en) | 2020-12-16 |
CN113646167A (en) | 2021-11-12 |
KR20210120108A (en) | 2021-10-06 |
TWI790418B (en) | 2023-01-21 |
TWI832965B (en) | 2024-02-21 |
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