TWI766535B

TWI766535B - Automated apparatus for detachable powder atomic layer deposition device

Info

Publication number: TWI766535B
Application number: TW110100569A
Authority: TW
Inventors: 林俊成; 張容華
Original assignee: 天虹科技股份有限公司
Priority date: 2021-01-07
Filing date: 2021-01-07
Publication date: 2022-06-01
Also published as: TW202230560A

Abstract

The invention provides an automated apparatus for a detachable powder atomic layer deposition device, which includes an ALD deposition operation area, a detachable powder atomic layer deposition device, a vacuum chamber placement area and a conveying device. The vacuum chamber of the powder atomic layer deposition device can be detached or connected to a shaft sealing device. The conveying device can convey the vacuum chamber from the vacuum chamber placement area to the ALD operation area, and fix the vacuum chamber on the shaft seal device to perform ALD on the powders in the vacuum chamber. The deposited vacuum chamber can be removed from the shaft sealing device, and then be transported to the vacuum chamber placement area through the conveying device to perform the automated powder atomic layer deposition process.

Description

可拆式粉末原子層沉積裝置的自動化機台 Automated machine of detachable powder atomic layer deposition device

本發明有關於一種可拆式粉末原子層沉積裝置的自動化機台，主要透過輸送裝置在原子層沉積作業區及真空腔體放置區之間移動真空腔體，並可以自動化的方式進行粉末的原子層沉積製程。 The invention relates to an automatic machine of a detachable powder atomic layer deposition device. The vacuum chamber is mainly moved between the atomic layer deposition operation area and the vacuum chamber placement area through a conveying device, and the atomization of the powder can be carried out in an automated manner. layer deposition process.

奈米顆粒(nanoparticle)一般被定義為在至少一個維度上小於100奈米的顆粒，奈米顆粒與宏觀物質在物理及化學上的特性截然不同。一般而言，宏觀物質的物理特性與本身的尺寸無關，但奈米顆粒則非如此，奈米顆粒在生物醫學、光學和電子等領域都具有潛在的應用。 Nanoparticles are generally defined as particles smaller than 100 nanometers in at least one dimension that are physically and chemically distinct from macroscopic substances. In general, the physical properties of macroscopic substances are independent of their size, but this is not the case for nanoparticles, which have potential applications in fields such as biomedicine, optics, and electronics.

量子點(Quantum Dot)是半導體的奈米顆粒，目前研究的半導體材料為II-VI材料，如ZnS、CdS、CdSe等，其中又以CdSe最受到矚目。量子點的尺寸通常在2至50奈米之間，量子點被紫外線照射後，量子點中的電子會吸收能量，並從價帶躍遷到傳導帶。被激發的電子從傳導帶回到價帶時，會通過發光釋放出能量。 Quantum Dot (Quantum Dot) is a semiconductor nanoparticle. The currently studied semiconductor materials are II-VI materials, such as ZnS, CdS, CdSe, etc., among which CdSe is the most attention. The size of quantum dots is usually between 2 and 50 nanometers. When the quantum dots are irradiated with ultraviolet light, the electrons in the quantum dots absorb energy and transition from the valence band to the conduction band. Excited electrons release energy by emitting light as they travel from the conduction band back to the valence band.

量子點的能隙與尺寸大小相關，量子點的尺寸越大能隙越小，經照射後會發出波長較長的光，量子點的尺寸越小則能隙越大，經照射後會發出波長較短的光。例如5到6奈米的量子點會發出橘光或紅光，而2到3奈米的量子點則會發出藍光或綠光，當然光色取決於量子點的材料組成。 The energy gap of quantum dots is related to the size. The larger the size of the quantum dots, the smaller the energy gap. After irradiation, it will emit light with a longer wavelength. The smaller the size of the quantum dots, the larger the energy gap. Emits light with shorter wavelengths. For example, quantum dots of 5 to 6 nanometers will emit orange or red light, while quantum dots of 2 to 3 nanometers will emit blue or green light, of course, the light color depends on the material composition of the quantum dots.

應用量子點的發光二極體(LED)產生的光可接近連續光譜，同時具有高演色性，並有利於提高發光二極體的發光品質。此外亦可透過改變量子點的尺寸調整發射光的波長，使得量子點成為新一代發光裝置及顯示器的發展重點。 Light emitting diodes (LEDs) using quantum dots can produce light close to a continuous spectrum, and at the same time have high color rendering properties, which is beneficial to improve the luminous quality of light emitting diodes. In addition, the wavelength of the emitted light can be adjusted by changing the size of the quantum dots, making the quantum dots become the focus of the development of the new generation of light-emitting devices and displays.

量子點雖然具有上述的優點及特性，但在應用或製造的過程中容易產生團聚現象。此外量子點具有較高的表面活性，並容易與空氣及水氣發生反應，進而縮短量子點的壽命。 Although quantum dots have the above-mentioned advantages and characteristics, they are prone to agglomeration in the process of application or manufacture. In addition, quantum dots have high surface activity and easily react with air and water vapor, thereby shortening the life of quantum dots.

具體來說，將量子點製作成為發光二極體的密封膠時，可能會產生團聚效應，而降低了量子點的光學性能。此外，量子點在製作成發光二極體的密封膠後，外界的氧或水氣仍可能會穿過密封膠而接觸量子點的表面，導致量子點氧化，並影響量子點及發光二極體的效能或使用壽命。量子點的表面缺陷及懸空鍵(dangling bonds)亦可能造成非輻射復合(nonradiative recombination)，同樣會影響量子點的發光效率。 Specifically, when quantum dots are used as sealants for light-emitting diodes, agglomeration effects may occur, which reduce the optical properties of quantum dots. In addition, after the quantum dots are made into the sealant of the light-emitting diodes, the external oxygen or moisture may still pass through the sealant and contact the surface of the quantum dots, resulting in oxidation of the quantum dots and affecting the quantum dots and light-emitting diodes. performance or service life. Surface defects and dangling bonds of quantum dots may also cause nonradiative recombination, which also affects the luminous efficiency of quantum dots.

目前業界主要透過原子層沉積(atomic layer deposition，ALD)在量子點的表面形成一層奈米厚度的薄膜，或者是在量子點的表面形成多層薄膜，以形成量子井結構。 At present, the industry mainly uses atomic layer deposition (ALD) to form a nanometer-thick film on the surface of the quantum dot, or to form a multi-layer film on the surface of the quantum dot to form a quantum well structure.

原子層沉積可以在基板上形成厚度均勻的薄膜，並可有效控制薄膜的厚度，理論上亦適用於三維的量子點。量子點靜置在承載盤時，相鄰的量子點之間會存在接觸點，使得原子層沉積的前驅物氣體無法接觸這些接觸點，並導致無法在所有的奈米顆粒的表面皆形成厚度均勻的薄膜。 Atomic layer deposition can form a thin film with uniform thickness on the substrate, and can effectively control the thickness of the thin film. It is also suitable for three-dimensional quantum dots in theory. When the quantum dots are placed on the carrier plate, there will be contact points between adjacent quantum dots, so that the precursor gas of atomic layer deposition cannot contact these contact points, and it is impossible to form uniform thickness on the surface of all nanoparticles. film.

為了解決上述先前技術面臨的問題，本發明提出一種可拆式粉末原子層沉積裝置的自動化機台，可透過輸送裝置在原子層沉積作業區及真空腔體放置區之間移動真空腔體，並可以自動化的方式進行粉末的原子層沉積製程。 In order to solve the above-mentioned problems faced by the prior art, the present invention provides an automatic machine of a detachable powder atomic layer deposition device, which can move the vacuum chamber between the atomic layer deposition operation area and the vacuum chamber placement area through the conveying device, and The powder atomic layer deposition process can be performed in an automated manner.

本發明的一目的，在於提供一種可拆式粉末原子層沉積裝置的自動化機台，主要包括至少一原子層沉積作業區、至少一真空腔體放置區、一可拆式粉末原子層沉積裝置及至少一輸送裝置。可拆式粉末原子層沉積裝置包括一驅動單元、一軸封裝置及一真空腔體，其中驅動單元連接軸封裝置，並位於原子層沉積作業區。 An object of the present invention is to provide an automated machine for a detachable powder atomic layer deposition device, which mainly includes at least one atomic layer deposition operation area, at least one vacuum chamber placement area, a detachable powder atomic layer deposition device, and at least one conveying device. The detachable powder atomic layer deposition device includes a driving unit, a shaft sealing device and a vacuum chamber, wherein the driving unit is connected to the shaft sealing device and is located in the atomic layer deposition working area.

真空腔體可固定在軸封裝置上或由軸封裝置上卸下，並透過輸送裝置在原子層沉積作業區及真空腔體放置區之間輸送卸下的真空腔體。輸送裝置可將真空腔體輸送到原子層沉積作業區，並將真空腔體固定在軸封裝置。而後驅動單元可經由軸封裝置帶動真空腔體轉動，並對真空腔體內的粉末進行原子層沉積。此外完成原子層沉積製程的真空腔體可由軸封裝置上卸下，並透過輸送裝置將卸下的真空腔體輸送至真空腔體放置區。 The vacuum chamber can be fixed on the shaft seal device or removed from the shaft seal device, and the removed vacuum chamber can be conveyed between the atomic layer deposition operation area and the vacuum chamber placement area through the conveying device. The conveying device can convey the vacuum chamber to the atomic layer deposition working area, and fix the vacuum chamber on the shaft sealing device. Then, the driving unit can drive the vacuum chamber to rotate through the shaft sealing device, and perform atomic layer deposition on the powder in the vacuum chamber. In addition, the vacuum chamber after the atomic layer deposition process can be removed from the shaft sealing device, and the removed vacuum chamber is transported to the vacuum chamber placement area through the conveying device.

本發明的一目的，在於提供一種可拆式粉末原子層沉積裝置的自動化機台，主要透過機械手臂在至少一原子層沉積作業區及至少一真空腔體放置區之間輸送真空腔體，以提高粉末原子層沉積製程的效率及便利性。 An object of the present invention is to provide an automatic machine of a detachable powder atomic layer deposition device, which mainly conveys a vacuum chamber between at least one atomic layer deposition operation area and at least one vacuum chamber placement area through a robotic arm, so as to Improve the efficiency and convenience of the powder atomic layer deposition process.

本發明的一目的，在於提供一種可拆式粉末原子層沉積裝置的自動化機台，主要將複數個作業區環繞設置一輸送區的周圍，其中作業區包括至少一原子層沉積作業區及至少一真空腔體放置區，而機械手臂則設置在輸送區內。位於輸送區的機械手臂可相對於各個作業區轉動，以對準其中一個作業區，並用以在各個作業區的原子層沉積作業區及真空腔體放置區之間輸送真空腔體，有利於減小可拆式粉末原子層沉積裝置的自動化機台的體積及提高工作效率。 One object of the present invention is to provide an automatic machine of a detachable powder atomic layer deposition device, which mainly surrounds a plurality of operation areas around a conveying area, wherein the operation area includes It includes at least one atomic layer deposition operation area and at least one vacuum chamber placement area, and the robot arm is arranged in the conveying area. The robotic arm located in the conveying area can be rotated relative to each operation area to align with one of the operation areas, and used to convey the vacuum chamber between the atomic layer deposition operation area and the vacuum chamber placement area of each operation area, which is conducive to reducing The volume of the automatic machine of the small detachable powder atomic layer deposition device is improved and the work efficiency is improved.

為了達到上述的目的，本發明提出一種可拆式粉末原子層沉積裝置的自動化機台，包括：至少一原子層沉積作業區；至少一可拆式粉末原子層沉積裝置，包括：一軸封裝置；一驅動單元，連接軸封裝置，其中軸封裝置及驅動單元位於原子層沉積作業區；一真空腔體，透過至少一連接單元固定在軸封裝置上，並包括一反應空間用以容置複數個粉末，其中驅動單元透過軸封裝置帶動真空腔體轉動，連接單元解除鎖固後，真空腔體由軸封裝置卸下；至少一抽氣管線，流體連接真空腔體的反應空間，並用以抽出反應空間內的一氣體；至少一進氣管線，流體連接真空腔體的反應空間，並用以將一前驅物氣體或一非反應氣體輸送至反應空間；及至少一真空腔體放置區，用以放置真空腔體；及至少一輸送裝置，用以在真空腔體放置區及原子層沉積作業區之間輸送真空腔體。 In order to achieve the above-mentioned purpose, the present invention provides an automatic machine of a detachable powder atomic layer deposition device, comprising: at least one atomic layer deposition operation area; at least one detachable powder atomic layer deposition device, including: a shaft sealing device; A driving unit connected to the shaft sealing device, wherein the shaft sealing device and the driving unit are located in the atomic layer deposition operation area; a vacuum chamber, fixed on the shaft sealing device through at least one connecting unit, and includes a reaction space for accommodating a plurality of A powder, wherein the drive unit drives the vacuum chamber to rotate through the shaft sealing device, and after the connection unit is unlocked, the vacuum chamber is removed from the shaft sealing device; at least one exhaust line is fluidly connected to the reaction space of the vacuum chamber and used for A gas in the reaction space is drawn out; at least one inlet line is fluidly connected to the reaction space of the vacuum chamber, and is used for transporting a precursor gas or a non-reaction gas to the reaction space; and at least one vacuum chamber placement area, with a vacuum chamber is placed; and at least one conveying device is used for conveying the vacuum chamber between the vacuum chamber placement area and the atomic layer deposition operation area.

所述的可拆式粉末原子層沉積裝置的自動化機台，其中真空腔體放置區包括一真空腔體進料放置區及一真空腔體出料放置區，而傳輸裝置用以在真空腔體進料放置區、真空腔體出料放置區及原子層沉積作業區之間輸送真空腔體。 The automatic machine of the detachable powder atomic layer deposition device, wherein the vacuum chamber placement area includes a vacuum chamber feed placement area and a vacuum chamber discharge placement area, and the transmission device is used for the vacuum chamber body. The vacuum chamber is transported between the feeding placement area, the vacuum chamber discharging placement area and the atomic layer deposition operation area.

所述的可拆式粉末原子層沉積裝置的自動化機台，包括一拆卸裝置用以解除連接單元的鎖固，使得真空腔體與軸封裝置分離，或是用以緊固連接單元，使得真空腔體固定在軸封裝置上。 The automatic machine of the detachable powder atomic layer deposition device includes a disassembly device for releasing the locking of the connecting unit, so that the vacuum chamber is separated from the shaft sealing device, or for tightening the connecting unit, so that the vacuum The cavity is fixed on the shaft sealing device.

所述的可拆式粉末原子層沉積裝置的自動化機台，其中拆卸裝置設置在輸送裝置上。 In the automatic machine of the detachable powder atomic layer deposition device, the detachment device is arranged on the conveying device.

所述的可拆式粉末原子層沉積裝置的自動化機台，其中軸封裝置包括一外管體及一內管體，外管體包括一容置空間用以容置內管體，而內管體則包括至少一連接空間用以容置抽氣管線及進氣管線，驅動單元透過外管體連接真空腔體，並帶動真空腔體轉動。 The automatic machine of the detachable powder atomic layer deposition device, wherein the shaft sealing device includes an outer tube body and an inner tube body, the outer tube body includes an accommodating space for accommodating the inner tube body, and the inner tube body The body includes at least one connecting space for accommodating the air suction line and the air intake line. The driving unit is connected to the vacuum chamber through the outer pipe body, and drives the vacuum chamber to rotate.

所述的可拆式粉末原子層沉積裝置的自動化機台，其中真空腔體的一底部包括一凹部，凹部由真空腔體的底部延伸至反應空間，用以容置凸出軸封裝置的內管體，並在反應空間內形成一凸出管部。 The automatic machine of the detachable powder atomic layer deposition device, wherein a bottom of the vacuum chamber includes a concave portion, and the concave portion extends from the bottom of the vacuum chamber to the reaction space for accommodating the inner portion of the protruding shaft seal device. A tube body is formed, and a protruding tube portion is formed in the reaction space.

所述的可拆式粉末原子層沉積裝置的自動化機台，包括一過濾單元位於真空腔體的凹部內，而抽氣管線及進氣管線經由過濾單元流體連接真空腔體的反應空間。 The automatic machine of the detachable powder atomic layer deposition device includes a filter unit located in the concave portion of the vacuum chamber, and the suction line and the intake line are fluidly connected to the reaction space of the vacuum chamber through the filter unit.

所述的可拆式粉末原子層沉積裝置的自動化機台，包括一輸送區及複數個作業區，複數個作業區設置在輸送區的周圍，其中作業區包括原子層沉積作業區及真空腔體放置區，而輸送裝置則設置在輸送區內。 The automatic machine of the detachable powder atomic layer deposition device includes a conveying area and a plurality of working areas, and the multiple working areas are arranged around the conveying area, wherein the working area includes an atomic layer deposition working area and a vacuum cavity. The placement area, and the conveying device is arranged in the conveying area.

所述的可拆式粉末原子層沉積裝置的自動化機台，包括至少一進出料區與輸送區相鄰，輸送區內的輸送裝置用以在進出料區及作業區之間輸送真空腔體。 The automatic machine of the detachable powder atomic layer deposition device includes at least one feeding and discharging area adjacent to the conveying area, and the conveying device in the conveying area is used for conveying the vacuum cavity between the feeding and discharging area and the working area.

所述的可拆式粉末原子層沉積裝置的自動化機台，包括複數個作業區、一載台及至少一滑軌，其中作業區包括原子層沉積作業區及真空腔體放置區，複數個作業區沿著導軌設置，而輸送裝置則透過載台連接導軌，並沿著導軌位移以在複數個作業區之間輸送真空腔體。 The automatic machine table of the detachable powder atomic layer deposition device includes a plurality of operation areas, a stage and at least one slide rail, wherein the operation area includes an atomic layer deposition operation area and a vacuum chamber placement area, and a plurality of operations The zones are arranged along the guide rails, and the conveying device is connected to the guide rails through the carrier platform, and is displaced along the guide rails to transport the vacuum chamber between the plurality of working zones.

1:可拆式粉末原子層沉積裝置的自動化機台 1: Automatic machine of detachable powder atomic layer deposition device

10:可拆式粉末原子層沉積裝置 10: Detachable powder atomic layer deposition device

100:可拆式粉末原子層沉積裝置的自動化機台 100: Automated machine for detachable powder atomic layer deposition equipment

101:原子層沉積作業區 101: Atomic Layer Deposition Operation Area

102:作業區 102: Work area

103:真空腔體放置區 103: Vacuum chamber placement area

1031:真空腔體進料放置區 1031: Vacuum chamber feed placement area

1033:真空腔體出料放置區 1033: Vacuum chamber discharge placement area

105:輸送裝置 105: Conveyor device

107:輸送區 107: Conveying area

109:進出料區 109: In and out of the material area

11:真空腔體 11: Vacuum chamber

111:蓋板 111: Cover

1111:內表面 1111: inner surface

112:連接單元 112: Connection unit

113:腔體 113: Cavity

115:監控晶圓 115: Monitor Wafers

117:底部 117: Bottom

119:凹部 119: Recess

12:反應空間 12: Reaction Space

121:粉末 121: Powder

13:軸封裝置 13: Shaft seal device

130:凸出管部 130: protruding pipe

131:外管體 131: outer tube body

132:容置空間 132: accommodating space

133:內管體 133: inner tube body

134:連接空間 134: Connect Space

14:齒輪 14: Gear

15:驅動單元 15: Drive unit

16:拆卸裝置 16: Removal device

171:抽氣管線 171: Exhaust line

173:進氣管線 173: Intake line

175:攪動氣體輸送管線 175: Agitation gas delivery line

177:加熱器 177: Heater

179:溫度感測單元 179: Temperature Sensing Unit

181:載台 181: Stage

183:導軌 183: Rails

[圖1]為本發明可拆式粉末原子層沉積裝置的自動化機台一實施例的側面示意圖。 1 is a schematic side view of an embodiment of an automated machine of a detachable powder atomic layer deposition apparatus of the present invention.

[圖2]為本發明可拆式粉末原子層沉積裝置一實施例的立體示意圖。 2 is a schematic perspective view of an embodiment of the detachable powder atomic layer deposition apparatus of the present invention.

[圖3]為本發明可拆式粉末原子層沉積裝置一實施例的剖面示意圖。 3 is a schematic cross-sectional view of an embodiment of the detachable powder atomic layer deposition apparatus of the present invention.

[圖4]為本發明可拆式粉末原子層沉積裝置一實施例的剖面分解示意圖。 4 is a schematic exploded cross-sectional view of an embodiment of the detachable powder atomic layer deposition apparatus of the present invention.

[圖5]為本發明可拆式粉末原子層沉積裝置的軸封裝置一實施例的剖面示意圖。 5 is a schematic cross-sectional view of an embodiment of the shaft sealing device of the detachable powder atomic layer deposition apparatus of the present invention.

[圖6]為本發明可拆式粉末原子層沉積裝置的自動化機台一實施例的動作示意圖。 6 is a schematic diagram of the operation of an embodiment of an automated machine of the detachable powder atomic layer deposition apparatus of the present invention.

[圖7]為本發明可拆式粉末原子層沉積裝置的自動化機台又一實施例的動作示意圖。 FIG. 7 is a schematic view of the operation of another embodiment of the automatic machine of the detachable powder atomic layer deposition apparatus of the present invention.

[圖8]為本發明可拆式粉末原子層沉積裝置的自動化機台又一實施例的動作示意圖。 FIG. 8 is a schematic view of the operation of another embodiment of the automatic machine of the detachable powder atomic layer deposition apparatus of the present invention.

[圖9]為本發明可拆式粉末原子層沉積裝置又一實施例的剖面分解示意圖。 9 is a schematic exploded cross-sectional view of another embodiment of the detachable powder atomic layer deposition apparatus of the present invention.

[圖10]為本發明可拆式粉末原子層沉積裝置的自動化機台又一實施例的俯視圖。 [ Fig. 10 ] is a top view of another embodiment of the automatic machine of the detachable powder atomic layer deposition apparatus of the present invention.

[圖11]為本發明可拆式粉末原子層沉積裝置的自動化機台又一實施例的俯視圖。 [ Fig. 11 ] is a top view of another embodiment of the automatic machine of the detachable powder atomic layer deposition apparatus of the present invention.

請參閱圖1，為本發明可拆式粉末原子層沉積裝置的自動化機台一實施例的側面示意圖，圖2、圖3、圖4及圖5分別為本發明可拆式粉末原子層沉積裝置的立體示意圖、剖面示意圖、剖面分解示意圖及可拆式粉末原子層沉積裝置的軸封裝置的剖面示意圖。 Please refer to FIG. 1 , which is a schematic side view of an embodiment of an automated machine of a detachable powder atomic layer deposition apparatus of the present invention, and FIGS. 2 , 3 , 4 and 5 are respectively a detachable powder atomic layer deposition apparatus of the present invention. The three-dimensional schematic diagram, the cross-sectional schematic diagram, the cross-sectional exploded schematic diagram and the cross-sectional schematic diagram of the shaft sealing device of the detachable powder atomic layer deposition device.

可拆式粉末原子層沉積裝置的自動化機台100主要包括至少一原子層沉積作業區101、至少一可拆式粉末原子層沉積裝置10、至少一真空腔體放置區103及至少一輸送裝置105，其中輸送裝置105可為一機械手臂，並用以在原子層沉積作業區101及真空腔體放置區103之間位移，例如原子層沉積作業區101及真空腔體放置區103可為左右或上下相鄰，當然此處的相鄰並非緊鄰，其中原子層沉積作業區101與真空腔體放置區103之間可存在間隙或其他構件。 The automated machine 100 of the detachable powder atomic layer deposition apparatus mainly includes at least one atomic layer deposition operation area 101 , at least one detachable powder atomic layer deposition apparatus 10 , at least one vacuum chamber placement area 103 and at least one conveying device 105 , wherein the conveying device 105 can be a robotic arm, and is used to move between the atomic layer deposition operation area 101 and the vacuum chamber placement area 103, for example, the atomic layer deposition operation area 101 and the vacuum chamber placement area 103 can be left and right or up and down Adjacent, of course, the adjacent here is not immediately adjacent, wherein there may be a gap or other components between the atomic layer deposition operation area 101 and the vacuum chamber placement area 103 .

請配合參閱圖2至圖5，可拆式粉末原子層沉積裝置10主要包括一真空腔體11、一軸封裝置13及一驅動單元15，其中驅動單元15透過軸封裝置13連接真空腔體11，並帶動真空腔體11轉動。 Please refer to FIGS. 2 to 5 , the detachable powder atomic layer deposition apparatus 10 mainly includes a vacuum chamber 11 , a shaft sealing device 13 and a driving unit 15 , wherein the driving unit 15 is connected to the vacuum chamber 11 through the shaft sealing device 13 . , and drive the vacuum chamber 11 to rotate.

真空腔體11內具有一反應空間12，用以容置複數個粉末121，其中粉末121可以是量子點(Quantum Dot)，例如ZnS、CdS、CdSe等II-VI半導體材料，而形成在量子點上的薄膜可以是三氧化二鋁(Al2O3)。在本發明一實施例中，真空腔體11可包括一蓋板111及一腔體113，其中蓋板111的一內表面1111用以覆蓋腔體113，並在兩者之間形成反應空間12。當然真空腔體11包括蓋板111及腔體113僅為本發明一實施方式，並非本發明權利範圍的限制。 The vacuum chamber 11 has a reaction space 12 for accommodating a plurality of powders 121, wherein the powders 121 can be quantum dots (Quantum Dot), such as ZnS, CdS, CdSe and other II-VI semiconductor materials, and formed in the quantum dots The film on the top can be aluminum oxide (Al2O3). In an embodiment of the present invention, the vacuum chamber 11 may include a cover plate 111 and a cavity 113 , wherein an inner surface 1111 of the cover plate 111 is used to cover the cavity 113 and form the reaction space 12 therebetween. . Of course, the vacuum chamber 11 including the cover plate 111 and the chamber 113 is only an embodiment of the present invention, and is not intended to limit the scope of the present invention.

在本發明一實施例中，可於蓋板111的內表面1111設置一監控晶圓115，當蓋板111覆蓋腔體113時，監控晶圓115會位於反應空間12內。在反應空間12內進行原子層沉積時，監控晶圓115的表面會形成薄膜。在實際應用時可進一步量測監控晶圓115表面的薄膜厚度與粉末121表面的薄膜厚度，並計算出兩者之間的關係。而後便可透過量測監控晶圓115表面的薄膜厚度，換算出粉末121表面的薄膜厚度。 In an embodiment of the present invention, a monitoring wafer 115 may be disposed on the inner surface 1111 of the cover plate 111 . When the cover plate 111 covers the cavity 113 , the monitoring wafer 115 will be located in the reaction space 12 . During the atomic layer deposition in the reaction space 12 , a thin film is formed on the surface of the monitoring wafer 115 . In practical application, the film thickness on the surface of the monitoring wafer 115 and the film thickness on the surface of the powder 121 can be further measured, and the relationship between the two can be calculated. Then, the film thickness on the surface of the wafer 115 can be monitored and measured, and the film thickness on the surface of the powder 121 can be converted.

在本發明一實施例中，軸封裝置13包括一外管體131及一內管體133，其中外管體131具有一容置空間132，而內管體133則具有一連接空間134，例如外管體131及內管體133可為空心柱狀體。外管體131的容置空間132用以容置內管體133，其中外管體131及內管體133同軸設置。 In an embodiment of the present invention, the shaft sealing device 13 includes an outer tube body 131 and an inner tube body 133, wherein the outer tube body 131 has an accommodating space 132, and the inner tube body 133 has a connecting space 134, for example The outer tube body 131 and the inner tube body 133 may be hollow cylindrical bodies. The accommodating space 132 of the outer tube body 131 is used for accommodating the inner tube body 133 , wherein the outer tube body 131 and the inner tube body 133 are coaxially arranged.

軸封裝置13可以是一般常見的軸封或磁流體軸封，主要用以隔離真空腔體11的反應空間12與外部的空間，以維持反應空間12的真空。 The shaft seal device 13 may be a common shaft seal or a magnetic fluid shaft seal, and is mainly used to isolate the reaction space 12 of the vacuum chamber 11 from the external space, so as to maintain the vacuum of the reaction space 12 .

驅動單元15透過外管體131動力連接真空腔體11，並透過外管體131帶動真空腔體11轉動。此外驅動單元15並未連接內管體133，因此驅動單元15帶動外管體131及真空腔體11轉動時，內管體133不會隨著轉動。 The driving unit 15 is connected to the vacuum chamber 11 through the outer tube body 131 , and drives the vacuum chamber body 11 to rotate through the outer tube body 131 . In addition, the driving unit 15 is not connected to the inner tube body 133 , so when the driving unit 15 drives the outer tube body 131 and the vacuum chamber 11 to rotate, the inner tube body 133 will not rotate along with it.

驅動單元15可帶動外管體131及真空腔體11以同一方向持續轉動，例如順時針或逆時針方向持續轉動。在不同實施例中，驅動單元15可帶動外管體131及真空腔體11以順時針的方向旋轉一特定角度後，再以逆時針的方向旋轉特定角度，例如特定角度可為360度。真空腔體11轉動時，會攪拌反應空間12內的粉末121，以利於粉末121與前驅物氣體接觸。 The driving unit 15 can drive the outer tube body 131 and the vacuum chamber 11 to continuously rotate in the same direction, for example, clockwise or counterclockwise. In different embodiments, the driving unit 15 can drive the outer tube 131 and the vacuum chamber 11 to rotate clockwise by a specific angle, and then rotate counterclockwise by a specific angle, for example, the specific angle can be 360 degrees. When the vacuum chamber 11 rotates, the powder 121 in the reaction space 12 will be stirred to facilitate the contact between the powder 121 and the precursor gas.

在本發明一實施例中，驅動單元15可為馬達，透過至少一齒輪14連接外管體131，並經由齒輪14帶動外管體131及真空腔體11相對於內管體133轉動。 In an embodiment of the present invention, the driving unit 15 can be a motor, connected to the outer tube body 131 through at least one gear 14 , and drives the outer tube body 131 and the vacuum chamber 11 to rotate relative to the inner tube body 133 through the gear 14 .

至少一抽氣管線171、至少一進氣管線173、至少一攪動氣體輸送管線175、一加熱器177及/或一溫度感測單元179流體連接真空腔體11的反應空間12，如圖3至圖5所示。在本發明一實施例中，抽氣管線171、進氣管線173、攪動氣體輸送管線175、加熱器177及/或溫度感測單元179可設置在軸封裝置13內，例如設置在軸封裝置13的內管體133的連接空間134內。 At least one suction line 171 , at least one intake line 173 , at least one stirring gas delivery line 175 , a heater 177 and/or a temperature sensing unit 179 are fluidly connected to the reaction space 12 of the vacuum chamber 11 , as shown in FIG. 3 to shown in Figure 5. In an embodiment of the present invention, the air extraction line 171 , the air intake line 173 , the stirring gas delivery line 175 , the heater 177 and/or the temperature sensing unit 179 may be arranged in the shaft sealing device 13 , for example, in the shaft sealing device 13 in the connecting space 134 of the inner tube body 133 of the 13 .

抽氣管線171流體連接真空腔體11的反應空間12，並用以抽出反應空間12內的氣體，使得反應空間12為真空狀態，以進行後續的原子層沉積製程。具體而言抽氣管線171可連接一幫浦，並透過幫浦抽出反應空間12內的氣體。 The pumping line 171 is fluidly connected to the reaction space 12 of the vacuum chamber 11 , and is used for pumping out the gas in the reaction space 12 , so that the reaction space 12 is in a vacuum state, so that the subsequent atomic layer deposition process can be performed. Specifically, the pumping line 171 can be connected to a pump, and the gas in the reaction space 12 can be pumped out through the pump.

進氣管線173流體連接真空腔體11的反應空間12，並用以將一前驅物或一非反應氣體輸送至反應空間12，其中非反應氣體可以是氮氣或氬氣等惰性氣體。例如進氣管線173可透過閥件組連接一前驅物儲存槽及一非反應氣體儲存槽，並透過閥件組將前驅物氣體輸送至反應空間12內，使得前驅物氣體沉積在粉末121表面。在實際應用時，進氣管線173可能會將一載送氣體(carrier gas)及前驅物氣體一起輸送到反應空間12內。而後透過閥件組將非反應氣體輸送至反應空間12內，以去除反應空間12內的前驅物氣體。在本發明一實施例中，進氣管線173可連接複數個分枝管線，並分別透過各個分枝管線將不同的前驅物氣體依序輸送至反應空間12內。 The gas inlet line 173 is fluidly connected to the reaction space 12 of the vacuum chamber 11, and is used for delivering a precursor or a non-reactive gas to the reaction space 12, wherein the non-reactive gas can be an inert gas such as nitrogen or argon. For example, the inlet line 173 can be connected to a precursor storage tank and a non-reactive gas storage tank through the valve assembly, and the precursor gas is delivered into the reaction space 12 through the valve assembly, so that the precursor gas is deposited on the surface of the powder 121 . In practical applications, the intake line 173 may The carrier gas and the precursor gas are transported into the reaction space 12 together. Then, the non-reactive gas is sent into the reaction space 12 through the valve assembly to remove the precursor gas in the reaction space 12 . In an embodiment of the present invention, the inlet line 173 can be connected to a plurality of branch lines, and different precursor gases are sequentially transported into the reaction space 12 through each branch line.

此外可增大進氣管線173輸送至反應空間12的非反應氣體的流量，並透過非反應氣體吹動反應空間12內的粉末121，使得粉末121受到非反應氣體的帶動，而擴散到反應空間12的各個區域。 In addition, the flow rate of the non-reactive gas delivered to the reaction space 12 by the inlet line 173 can be increased, and the powder 121 in the reaction space 12 can be blown through the non-reactive gas, so that the powder 121 is driven by the non-reactive gas and diffused into the reaction space 12 of the various areas.

在本發明一實施例中，進氣管線173可包括至少一攪動氣體輸送管線175流體連接真空腔體11的反應空間12，並用以將非反應氣體輸送至反應空間12，例如攪動氣體輸送管線175可透過閥件組連接一氮氣儲存槽，並透過閥件組將氮氣輸送至反應空間12。非反應氣體用以吹動反應空間12內的粉末121，配合驅動單元15驅動真空腔體11轉動，將可有效且均勻的翻攪反應空間12內的粉末121，並有利於在各個粉末121的表面沉積厚度均勻的薄膜。 In an embodiment of the present invention, the gas inlet line 173 may include at least one stirring gas delivery line 175 that is fluidly connected to the reaction space 12 of the vacuum chamber 11 and used to deliver non-reactive gas to the reaction space 12 , such as the stirring gas delivery line 175 A nitrogen storage tank can be connected through the valve assembly, and nitrogen gas is delivered to the reaction space 12 through the valve assembly. The non-reactive gas is used to blow the powder 121 in the reaction space 12, and cooperates with the driving unit 15 to drive the vacuum cavity 11 to rotate, which can effectively and uniformly stir the powder 121 in the reaction space 12, and is beneficial to the powder 121 in each powder 121. A thin film of uniform thickness is deposited on the surface.

可拆式粉末原子層沉積裝置10的進氣管線173及攪動氣體輸送管線175都是用以將非反應氣體輸送至反應空間12，其中進氣管線173輸送的非反應氣體的流量較小，主要用以去除反應空間12內的前驅物氣體，而攪動氣體輸送管線175輸送的非反應氣體的流量較大，主要用以吹動反應空間12內的粉末121。 The inlet line 173 and the stirring gas delivery line 175 of the detachable powder atomic layer deposition apparatus 10 are both used to deliver the non-reactive gas to the reaction space 12, wherein the flow rate of the non-reactive gas delivered by the inlet line 173 is small, mainly It is used to remove the precursor gas in the reaction space 12 , and the flow rate of the non-reactive gas conveyed by the stirring gas transmission line 175 is relatively large, and is mainly used for blowing the powder 121 in the reaction space 12 .

具體而言，進氣管線173及攪動氣體輸送管線175將非反應氣體輸送至反應空間12的時間點不同，因此在實際應用時可不設置攪動氣體輸送管線175，並調整進氣管線173在不同時間點輸送的非反應氣體的流量。在去除反應空間12內的前驅物氣體時，可降低進氣管線173輸送至反應空間12的非反應氣體的流量，而要吹動反應空間12內的粉末121時，則增加進氣管線173輸送至反應空間12的非反應氣體的流量。 Specifically, the time points at which the gas inlet line 173 and the stirring gas delivery line 175 deliver the non-reactive gas to the reaction space 12 are different. Therefore, in practical applications, the stirring gas delivery line 175 may not be provided, and the gas inlet line 173 may be adjusted at different times. The flow rate of the non-reactive gas delivered at the point. exist When removing the precursor gas in the reaction space 12, the flow rate of the non-reactive gas delivered by the inlet line 173 to the reaction space 12 can be reduced, and when the powder 121 in the reaction space 12 is to be blown, the inlet line 173 can be increased to deliver to the reaction space 12. The flow rate of the non-reactive gas in the reaction space 12 .

在本發明一實施例中，內管體133連接反應空間12的一端可設置一過濾單元139，其中抽氣管線171、進氣管線173及/或攪動氣體輸送管線175經由過濾單元139流體連接反應空間12，並經由過濾單元139抽出反應空間12內的氣體。過濾單元139主要用以過濾反應空間12內的粉末121，以避免粉末121在抽氣的過程中進入抽氣管線171內，而造成粉末121的損耗。 In an embodiment of the present invention, a filter unit 139 may be provided at one end of the inner tube body 133 connected to the reaction space 12 , wherein the suction line 171 , the intake line 173 and/or the stirring gas delivery line 175 are fluidly connected to the reaction via the filter unit 139 space 12 , and the gas in the reaction space 12 is extracted through the filter unit 139 . The filtering unit 139 is mainly used to filter the powder 121 in the reaction space 12, so as to prevent the powder 121 from entering the gas extraction line 171 during the gas extraction process, thereby causing the loss of the powder 121.

加熱器177用以加熱連接空間134及內管體133，並透過加熱器177加熱內管體133內的抽氣管線171、進氣管線173及/或攪動氣體輸送管線175，以提高抽氣管線171、進氣管線173及/或攪動氣體輸送管線175內的氣體的溫度。例如可提高進氣管線173輸送至反應空間12的非反應氣體及/或前驅物氣體的溫度，並可提高攪動氣體輸送管線175輸送至反應空間12的非反應氣體的溫度。使得非反應氣體及/或前驅物氣體進入反應空間12時，不會造成反應空間12的溫度大幅下降或改變。此外可透過溫度感測單元179量測加熱器177或連接空間134的溫度，以得知加熱器177的工作狀態。當然在真空腔體11的內部、外部或周圍通常會設置另一個加熱裝置，其中加熱裝置鄰近或接觸真空腔體11，並用以加熱真空腔體11及反應空間12。 The heater 177 is used to heat the connection space 134 and the inner pipe body 133, and through the heater 177, the air extraction line 171, the air intake line 173 and/or the stirring gas transmission line 175 in the inner pipe body 133 are heated, so as to improve the air extraction line 171 . The temperature of the gas in the inlet line 173 and/or the agitation gas delivery line 175 . For example, the temperature of the unreacted gas and/or precursor gas delivered to the reaction space 12 by the gas inlet line 173 can be increased, and the temperature of the unreacted gas delivered to the reaction space 12 by the agitation gas delivery line 175 can be increased. When the non-reactive gas and/or the precursor gas is allowed to enter the reaction space 12 , the temperature of the reaction space 12 will not be greatly decreased or changed. In addition, the temperature of the heater 177 or the connection space 134 can be measured through the temperature sensing unit 179 to know the working state of the heater 177 . Of course, another heating device is usually disposed inside, outside or around the vacuum chamber 11 , wherein the heating device is adjacent to or in contact with the vacuum chamber 11 and used to heat the vacuum chamber 11 and the reaction space 12 .

驅動單元15帶動外管體131及真空腔體11轉動時，內管體133及內部的抽氣管線171、進氣管線173及/或攪動氣體輸送管線175並不會隨著轉動，並有利於穩定傳送至反應空間12的非反應氣體及前驅物氣體。 When the driving unit 15 drives the outer tube body 131 and the vacuum chamber 11 to rotate, the inner tube body 133 and the inner air extraction line 171 , the air intake line 173 and/or the stirring gas delivery line 175 will not rotate along with it, which is beneficial to Stable delivery of non-reactive gas and precursor gas to the reaction space 12 .

本發明所述的可拆式粉末原子層沉積裝置10的真空腔體11及軸封裝置13為兩個獨立的構件，其中真空腔體11透過至少一連接單元112連接並固定在軸封裝置13的一端，例如連接單元112可為螺絲、氣缸接頭、卡扣機構、卡榫、快拆裝置、螺紋等具有可拆卸及固定功能的構件，並可用以連接真空腔體11及軸封裝置13。在解除連接單元112的鎖固後，則可將真空腔體11由軸封裝置13上卸下。 The vacuum chamber 11 and the shaft sealing device 13 of the detachable powder atomic layer deposition apparatus 10 according to the present invention are two independent components, wherein the vacuum chamber 11 is connected and fixed to the shaft sealing device 13 through at least one connecting unit 112 . One end, for example, the connecting unit 112 can be a screw, a cylinder joint, a snap mechanism, a tenon, a quick release device, a thread, etc. with detachable and fixed functions, and can be used to connect the vacuum chamber 11 and the shaft sealing device 13 . After the locking of the connecting unit 112 is released, the vacuum chamber 11 can be removed from the shaft sealing device 13 .

在本發明一實施例中，可透過一拆卸裝置16解除連接單元112的鎖固，使得真空腔體11與軸封裝置13分離，或者是緊固連接單元112，使得真空腔體11鎖固在軸封裝置13上。例如當連接單元112為螺絲時，拆卸裝置16可為自動拆卸的螺絲起子，其中螺絲起子連接一馬達，並透過馬達驅動螺絲起子卸下或鎖固螺絲。在實際應用時可將拆卸裝置13設置在輸送裝置105上，例如輸送裝置105可為機械手臂，並將螺絲起子設置在機械手臂上，其中機械手臂在傳輸真空腔體11時，可透過螺絲起子卸下或鎖固螺絲。 In an embodiment of the present invention, a dismounting device 16 can be used to release the locking of the connecting unit 112, so that the vacuum chamber 11 is separated from the shaft sealing device 13, or the connecting unit 112 can be fastened, so that the vacuum chamber 11 is locked in on the shaft seal device 13. For example, when the connecting unit 112 is a screw, the dismounting device 16 can be an automatic dismounting screwdriver, wherein the screwdriver is connected to a motor, and the screw is driven by the motor to remove or lock the screw. In practical application, the dismantling device 13 can be arranged on the conveying device 105. For example, the conveying device 105 can be a robot arm, and a screwdriver can be arranged on the robot arm, wherein the robot arm can transmit the vacuum chamber 11 through the screwdriver. Remove or tighten the screws.

在本發明實施例中，軸封裝置13及/或驅動單元15固定於原子層沉積作業區101，而輸送裝置105則可帶動卸下的真空腔體11在原子層沉積作業區101及真空腔體放置區103之間位移。在本發明一實施例中，原子層沉積作業區101及真空腔體放置區103不相鄰，例如可將複數個沉積作業區101放置在同一個區域，並將複數個真空腔體放置區103集中放置在另一個區域。上述兩個區域可為上下設置，並透過輸送裝置105在兩個區域的沉積作業區101及真空腔體放置區103之間輸送真空腔體11，以縮小機台的占地面積。 In the embodiment of the present invention, the shaft sealing device 13 and/or the driving unit 15 are fixed in the atomic layer deposition operation area 101 , and the conveying device 105 can drive the unloaded vacuum chamber 11 in the atomic layer deposition operation area 101 and the vacuum chamber displacement between the body placement areas 103 . In an embodiment of the present invention, the atomic layer deposition operation area 101 and the vacuum chamber placement area 103 are not adjacent. For example, a plurality of deposition operation areas 101 can be placed in the same area, and a plurality of vacuum chamber placement areas 103 can be placed in the same area. concentrated in another area. The above two areas can be arranged up and down, and the vacuum chamber 11 is conveyed between the deposition operation area 101 and the vacuum chamber placement area 103 of the two areas through the conveying device 105 to reduce the footprint of the machine.

請配合參閱圖1、圖6至圖8所示，其中圖1、圖6至圖8的動作並沒有一定的先後順序。在本發明一實施例中，輸送裝置105用以夾持位於真空腔體放置區103的真空腔體11，其中真空腔體11並未進行原子層沉積製程，如圖6所示。 Please refer to FIG. 1 , FIG. 6 to FIG. 8 , wherein the actions of FIG. 1 , FIG. 6 to FIG. 8 do not have a certain sequence. In an embodiment of the present invention, the conveying device 105 is used to clamp the vacuum chamber 11 located in the vacuum chamber placement area 103 , wherein the vacuum chamber 11 is not subjected to an atomic layer deposition process, as shown in FIG. 6 .

輸送裝置105將真空腔體11由真空腔體放置區103輸送至原子層沉積作業區101，並透過連接單元112連接真空腔體11及位於原子層沉積作業區101的軸封裝置13。驅動單元15可經由軸封裝置13帶動真空腔體11轉動，以對真空腔體11內的粉末進行原子層沉積，如圖7所示。 The conveying device 105 conveys the vacuum chamber 11 from the vacuum chamber placement area 103 to the ALD operation area 101 , and connects the vacuum chamber 11 and the shaft sealing device 13 located in the ALD operation area 101 through the connecting unit 112 . The driving unit 15 can drive the vacuum chamber 11 to rotate through the shaft sealing device 13 to perform atomic layer deposition on the powder in the vacuum chamber 11 , as shown in FIG. 7 .

在完成粉末的原子層沉積後，可將真空腔體11由軸封裝置13上卸下，例如解除連接單元112的鎖固，並透過輸送裝置105將完成原子層沉積的真空腔體11由原子層沉積作業區101輸送至真空腔體放置區103，如圖8所示。 After the atomic layer deposition of the powder is completed, the vacuum chamber 11 can be removed from the shaft sealing device 13 , for example, the locking of the connecting unit 112 is released, and the vacuum chamber 11 after the atomic layer deposition is completed through the conveying device 105 The layer deposition operation area 101 is transported to the vacuum chamber placement area 103, as shown in FIG. 8 .

在本發明一實施例中，真空腔體放置區103的數量可為複數個，例如真空腔體放置區103可包括至少一真空腔體進料放置區1031及至少一真空腔體出料放置區1033，而輸送裝置105用以在真空腔體進料放置區1031、真空腔體出料放置區1033及原子層沉積作業區101之間輸送真空腔體11，如圖1及圖7所示。輸送裝置105可將完成原子層沉積的真空腔體11由原子層沉積作業區101輸送至其中一個真空腔體放置區103，例如真空腔體出料放置區1033，而後將另一個真空腔體放置區103(例如真空腔體進料放置區1031)內未進行原子層沉積作業的真空腔體11移動至原子層沉積作業區101。 In an embodiment of the present invention, the number of vacuum chamber placement areas 103 may be plural. For example, the vacuum chamber placement area 103 may include at least one vacuum chamber feeding placement area 1031 and at least one vacuum chamber discharging placement area 1033 , and the conveying device 105 is used for conveying the vacuum chamber 11 between the vacuum chamber feeding placement area 1031 , the vacuum chamber discharging placement area 1033 and the atomic layer deposition operation area 101 , as shown in FIG. 1 and FIG. 7 . The conveying device 105 can transport the vacuum chamber 11 that has completed the atomic layer deposition from the atomic layer deposition operation area 101 to one of the vacuum chamber placement areas 103, such as the vacuum chamber discharge placement area 1033, and then place the other vacuum chamber The vacuum chambers 11 in the zone 103 (eg, the vacuum chamber feeding and placing zone 1031 ) where the ALD operation is not performed are moved to the ALD operation zone 101 .

在實際應用時，真空腔體11內的粉末121需要一段製程時間進行原子層沉積，輸送裝置105可於此一製程時間內將另一個未經過原子層沉積的真空腔體11輸送至真空腔體放置區103，例如真空腔體進料放置區1031。當輸送裝置105將完成原子層沉積的真空腔體11由原子層沉積作業區101取出後，可將真空腔體放置區103或真空腔體進料放置區1031內的真空腔體11輸送至原子層沉積作業區101，並將真空腔體11連接軸封裝置13。 In practical application, the powder 121 in the vacuum chamber 11 needs a certain process time for ALD, and the conveying device 105 can transfer another powder 121 without ALD within this process time The vacuum chamber 11 is transported to the vacuum chamber placement area 103 , for example, the vacuum chamber feed placement area 1031 . After the conveying device 105 takes out the vacuum chamber 11 that has completed the atomic layer deposition from the atomic layer deposition operation area 101 , the vacuum chamber 11 in the vacuum chamber placement area 103 or the vacuum chamber feed placement area 1031 can be transported to the atomic layer deposition area 101 . The layer deposition operation area 101 is connected, and the vacuum chamber 11 is connected to the shaft sealing device 13 .

在本發明另一實施例中，如圖9所示，真空腔體11的底部117可設置一凹部119，其中凹部119由真空腔體11的底部117延伸至反應空間12內，而軸封裝置13的內管體133則由外管體131的容置空間132延伸至外部，並凸出軸封裝置13及外管體131。連接真空腔體11及軸封裝置13時，凸出軸封裝置13的內管體133可***凹部119，並透過連接單元112連接真空腔體11及軸封裝置13，使得內管體133及凹部119在反應空間12內形成一凸出管部130。此外可將過濾單元139設置在真空腔體11的凹部119內。 In another embodiment of the present invention, as shown in FIG. 9 , the bottom 117 of the vacuum chamber 11 may be provided with a recess 119 , wherein the recess 119 extends from the bottom 117 of the vacuum chamber 11 into the reaction space 12 , and the shaft sealing device The inner tube body 133 of 13 extends to the outside from the accommodating space 132 of the outer tube body 131 , and protrudes from the shaft sealing device 13 and the outer tube body 131 . When connecting the vacuum chamber 11 and the shaft sealing device 13, the inner tube body 133 protruding from the shaft sealing device 13 can be inserted into the concave portion 119, and the vacuum chamber 11 and the shaft sealing device 13 are connected through the connecting unit 112, so that the inner tube body 133 and the shaft sealing device 13 are connected. The concave portion 119 forms a protruding pipe portion 130 in the reaction space 12 . Furthermore, the filter unit 139 can be arranged in the recess 119 of the vacuum chamber 11 .

透過凸出管部130的設置可縮短或調整進氣管線173及/或攪動氣體輸送管線175與蓋板111之間的距離，使得進氣管線173及/或攪動氣體輸送管線175輸送至反應空間12的非反應氣體可傳遞至蓋板111的內表面1111，並經由蓋板111的內表面1111擴散到反應空間12的各個區域，以利於吹動反應空間12內的粉末121。 The distance between the gas inlet line 173 and/or the stirring gas delivery line 175 and the cover plate 111 can be shortened or adjusted through the arrangement of the protruding pipe portion 130, so that the gas inlet line 173 and/or the stirring gas delivery line 175 can be delivered to the reaction space The non-reactive gas of 12 can be transmitted to the inner surface 1111 of the cover plate 111 and diffused to various regions of the reaction space 12 through the inner surface 1111 of the cover plate 111 to facilitate blowing the powder 121 in the reaction space 12 .

在本發明一實施例中，如圖10所示，可拆式粉末原子層沉積裝置的自動化機台1可包括一輸送區107、複數個原子層沉積作業區101及複數個真空腔體放置區103，其中輸送裝置105設置在輸送區107內，而複數個原子層沉積作業區101及複數個真空腔體放置區103則環繞設置在輸送區107的周圍，以透過單一個輸送裝置105在多個原子層沉積作業區101及多個真空腔體放置區103之間輸送真空腔體11。 In an embodiment of the present invention, as shown in FIG. 10 , the automated machine 1 of the detachable powder atomic layer deposition apparatus may include a conveying area 107 , a plurality of atomic layer deposition operation areas 101 and a plurality of vacuum chamber placement areas 103, wherein the conveying device 105 is arranged in the conveying area 107, and a plurality of atomic layer deposition operation areas 101 and a plurality of vacuum chamber placement areas 103 are arranged around the conveying area 107, so as to pass through a single conveying device 105 in multiple areas. The vacuum chambers 11 are transported between the atomic layer deposition operation areas 101 and the plurality of vacuum chamber body placement areas 103 .

具體而言可將相鄰的原子層沉積作業區101及真空腔體放置區103定義為作業區102，並於輸送區107周圍環繞設置複數個作業區102。輸送裝置105可在輸送區107內轉動，並朝向各個作業區102，以在各個作業區102的原子層沉積作業區101及真空腔體放置區103之間輸送真空腔體11，或者是在各個作業區102之間輸送真空腔體11。 Specifically, the adjacent atomic layer deposition operation area 101 and the vacuum chamber placement area 103 can be defined as the operation area 102 , and a plurality of operation areas 102 are arranged around the conveying area 107 . The conveying device 105 can rotate in the conveying area 107 and face each working area 102, so as to convey the vacuum chamber 11 between the atomic layer deposition working area 101 and the vacuum chamber placing area 103 of each working area 102, or between each working area 102. The vacuum chamber 11 is transported between the working areas 102 .

在本發明另一實施例中，如圖10所示，可拆式粉末原子層沉積裝置的自動化機台1可包括至少一進出料區109，其中進出料區109與輸送區107相鄰。輸送裝置105可將進出料區109的真空腔體11輸送至其中一個作業區102內的原子層沉積作業區101或真空腔體放置區103，或者是將任一個作業區102內的原子層沉積作業區101或真空腔體放置區103的真空腔體11輸送至進出料區109。 In another embodiment of the present invention, as shown in FIG. 10 , the automated machine 1 of the detachable powder atomic layer deposition apparatus may include at least one feeding and discharging zone 109 , wherein the feeding and discharging zone 109 is adjacent to the conveying zone 107 . The conveying device 105 can convey the vacuum chamber 11 of the feeding and discharging area 109 to the ALD operation area 101 or the vacuum chamber placement area 103 in one of the operation areas 102 , or the ALD in any operation area 102 The vacuum chamber 11 in the working area 101 or the vacuum chamber placement area 103 is transported to the feeding and discharging area 109 .

在本發明另一實施例中，如圖11所示，可將複數個作業區102串聯，而輸送裝置105則經由一載台181設置在至少一導軌183上。具體而言，複數個作業區102可沿著導軌183設置，其中輸送裝置105可沿著導軌183位移，並用以夾取及輸送各個作業區102內的真空腔體11，例如在各個作業區102的原子層沉積作業區101及真空腔體放置區103之間輸送真空腔體11，或者是在各個作業區102之間輸送真空腔體11。在不同實施例中，可於導軌183的兩側分別設置串聯的作業區102，而輸送裝置105透過轉軸連接載台181，並可相對於載台181轉動，以拿取位於導軌183兩側的作業區102內的真空腔體11。 In another embodiment of the present invention, as shown in FIG. 11 , a plurality of operation areas 102 can be connected in series, and the conveying device 105 is disposed on at least one guide rail 183 via a carrier 181 . Specifically, a plurality of working areas 102 can be arranged along the guide rails 183 , wherein the conveying device 105 can be displaced along the guide rails 183 and used to clamp and transport the vacuum chambers 11 in each working area 102 , for example, in each working area 102 The vacuum chamber 11 is transported between the atomic layer deposition operation area 101 and the vacuum chamber placement area 103 , or the vacuum chamber 11 is transported between the respective operation areas 102 . In different embodiments, the working areas 102 in series can be respectively provided on both sides of the guide rail 183 , and the conveying device 105 is connected to the carrier 181 through a rotating shaft, and can be rotated relative to the carrier 181 to pick up the workpieces located on both sides of the guide rail 183 . The vacuum chamber 11 in the working area 102 .

以上所述者，僅為本發明之一較佳實施例而已，並非用來限定本發明實施之範圍，即凡依本發明申請專利範圍所述之形狀、構造、特徵及精神所為之均等變化與修飾，均應包括於本發明之申請專利範圍內。 The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Modifications should be included within the scope of the patent application of the present invention.

101:原子層沉積作業區 101: Atomic Layer Deposition Operation Area

103:真空腔體放置區 103: Vacuum chamber placement area

105:輸送裝置 105: Conveyor device

11:真空腔體 11: Vacuum chamber

13:軸封裝置 13: Shaft seal device

Claims

一種可拆式粉末原子層沉積裝置的自動化機台，包括：至少一原子層沉積作業區；至少一可拆式粉末原子層沉積裝置，包括：一軸封裝置；一驅動單元，連接該軸封裝置，其中該軸封裝置及該驅動單元位於該原子層沉積作業區；一真空腔體，透過至少一連接單元固定在該軸封裝置上，並包括一反應空間用以容置複數個粉末，其中該驅動單元透過該軸封裝置帶動該真空腔體轉動，該連接單元解除鎖固後，該真空腔體由該軸封裝置卸下；至少一抽氣管線，流體連接該真空腔體的該反應空間，並用以抽出該反應空間內的一氣體；至少一進氣管線，流體連接該真空腔體的該反應空間，並用以將一前驅物氣體或一非反應氣體輸送至該反應空間；及至少一真空腔體放置區，用以放置該真空腔體；及至少一輸送裝置，用以在該真空腔體放置區及該原子層沉積作業區之間輸送該真空腔體，其中該軸封裝置包括一外管體及一內管體，該外管體包括一容置空間用以容置該內管體，而該內管體則包括至少一連接空間用以容置該抽氣管線及該進氣管線，該驅動單元透過該外管體連接該真空腔體，並帶動該真空腔體轉動。 An automatic machine of a detachable powder atomic layer deposition device, comprising: at least one atomic layer deposition operation area; at least one detachable powder atomic layer deposition device, including: a shaft sealing device; a driving unit, connected to the shaft sealing device , wherein the shaft sealing device and the driving unit are located in the atomic layer deposition operation area; a vacuum chamber is fixed on the shaft sealing device through at least one connecting unit, and includes a reaction space for accommodating a plurality of powders, wherein The driving unit drives the vacuum chamber to rotate through the shaft sealing device, and after the connection unit is unlocked, the vacuum chamber is removed from the shaft sealing device; at least one suction line is fluidly connected to the reaction of the vacuum chamber space, and used to extract a gas in the reaction space; at least one inlet line, fluidly connected to the reaction space of the vacuum chamber, and used to deliver a precursor gas or a non-reaction gas to the reaction space; and at least one a vacuum chamber placement area for placing the vacuum chamber; and at least one conveying device for conveying the vacuum chamber between the vacuum chamber placement area and the atomic layer deposition operation area, wherein the shaft sealing device It includes an outer tube body and an inner tube body, the outer tube body includes an accommodating space for accommodating the inner tube body, and the inner tube body includes at least one connecting space for accommodating the air extraction line and the an intake line, the driving unit is connected to the vacuum chamber through the outer pipe body, and drives the vacuum chamber to rotate.

如請求項1所述的可拆式粉末原子層沉積裝置的自動化機台，其中該真空腔體放置區包括一真空腔體進料放置區及一真空腔體出料放置區，而該傳輸裝置用以在該真空腔體進料放置區、該真空腔體出料放置區及該原子層沉積作業區之間輸送該真空腔體。 The automatic machine of a detachable powder atomic layer deposition apparatus according to claim 1, wherein the vacuum chamber placement area includes a vacuum chamber feed placement area and a vacuum chamber discharge placement area, and The conveying device is used for conveying the vacuum chamber between the vacuum chamber feeding and placing area, the vacuum chamber discharging placing area and the atomic layer deposition operation area.

如請求項1所述的可拆式粉末原子層沉積裝置的自動化機台，包括一拆卸裝置用以解除該連接單元的鎖固，使得該真空腔體與該軸封裝置分離，或是用以緊固該連接單元，使得該真空腔體固定在該軸封裝置上。 The automatic machine of a detachable powder atomic layer deposition device as claimed in claim 1, comprising a detaching device for releasing the locking of the connecting unit, so that the vacuum chamber is separated from the shaft sealing device, or used for Fasten the connecting unit so that the vacuum chamber is fixed on the shaft sealing device.

如請求項3所述的可拆式粉末原子層沉積裝置的自動化機台，其中該拆卸裝置設置在該輸送裝置上。 The automatic machine of a detachable powder atomic layer deposition device according to claim 3, wherein the detachment device is arranged on the conveying device.

如請求項1所述的可拆式粉末原子層沉積裝置的自動化機台，其中該真空腔體的一底部包括一凹部，該凹部由該真空腔體的該底部延伸至該反應空間，用以容置凸出該軸封裝置的該內管體，並在該反應空間內形成一凸出管部。 The automatic machine of a detachable powder atomic layer deposition apparatus as claimed in claim 1, wherein a bottom of the vacuum chamber includes a concave portion, and the concave portion extends from the bottom of the vacuum chamber to the reaction space for the purpose of The inner tube body protruding from the shaft sealing device is accommodated, and a protruding tube portion is formed in the reaction space.

如請求項5所述的可拆式粉末原子層沉積裝置的自動化機台，包括一過濾單元位於該真空腔體的該凹部內，而該抽氣管線及該進氣管線經由該過濾單元流體連接該真空腔體的該反應空間。 The automatic machine of a detachable powder atomic layer deposition apparatus as claimed in claim 5, comprising a filter unit located in the concave portion of the vacuum chamber, and the suction line and the intake line are fluidly connected through the filter unit the reaction space of the vacuum chamber.

一種可拆式粉末原子層沉積裝置的自動化機台，包括：至少一原子層沉積作業區；至少一可拆式粉末原子層沉積裝置，包括：一軸封裝置；一驅動單元，連接該軸封裝置，其中該軸封裝置及該驅動單元位於該原子層沉積作業區；一真空腔體，透過至少一連接單元固定在該軸封裝置上，並包括一反應空間用以容置複數個粉末，其中該驅動單元透過該軸封裝置帶動該真空腔體轉動，該連接單元解除鎖固後，該真空腔體由該軸封裝置卸下；至少一抽氣管線，流體連接該真空腔體的該反應空間，並用以抽出該反應空間內的一氣體；至少一進氣管線，流體連接該真空腔體的該反應空間，並用以將一前驅物氣體或一非反應氣體輸送至該反應空間；至少一真空腔體放置區，用以放置該真空腔體；至少一輸送裝置，用以在該真空腔體放置區及該原子層沉積作業區之間輸送該真空腔體；及一輸送區及複數個作業區，該複數個作業區設置在該輸送區的周圍，其中該作業區包括該原子層沉積作業區及該真空腔體放置區，而該輸送裝置則設置在該輸送區內。 An automatic machine of a detachable powder atomic layer deposition device, comprising: at least one atomic layer deposition operation area; at least one detachable powder atomic layer deposition device, including: a shaft sealing device; a driving unit, connected to the shaft sealing device , wherein the shaft sealing device and the drive unit are located in the atomic layer deposition operation area; A vacuum chamber is fixed on the shaft sealing device through at least one connecting unit, and includes a reaction space for accommodating a plurality of powders, wherein the driving unit drives the vacuum chamber to rotate through the shaft sealing device, and the connecting unit After unlocking, the vacuum chamber is detached from the shaft sealing device; at least one suction line is fluidly connected to the reaction space of the vacuum chamber and used to extract a gas in the reaction space; at least one air inlet line , which is fluidly connected to the reaction space of the vacuum chamber and used to transport a precursor gas or a non-reactive gas to the reaction space; at least one vacuum chamber placement area for placing the vacuum chamber; at least one conveying device , for conveying the vacuum chamber between the vacuum chamber placement area and the atomic layer deposition operation area; and a conveying area and a plurality of operation areas, the plurality of operation areas are arranged around the conveying area, wherein the The working area includes the atomic layer deposition working area and the vacuum chamber placement area, and the conveying device is arranged in the conveying area.

如請求項7所述的可拆式粉末原子層沉積裝置的自動化機台，包括至少一進出料區與該輸送區相鄰，該輸送區內的該輸送裝置用以在該進出料區及該作業區之間輸送該真空腔體。 The automatic machine of a detachable powder atomic layer deposition device as claimed in claim 7, comprising at least one feeding and discharging area adjacent to the conveying area, and the conveying device in the conveying area is used for the feeding and discharging area and the The vacuum chamber is transported between work areas.

一種可拆式粉末原子層沉積裝置的自動化機台，包括：至少一原子層沉積作業區；至少一可拆式粉末原子層沉積裝置，包括：一軸封裝置；一驅動單元，連接該軸封裝置，其中該軸封裝置及該驅動單元位於該原子層沉積作業區；一真空腔體，透過至少一連接單元固定在該軸封裝置上，並包括一反應空間用以容置複數個粉末，其中該驅動單元透過該軸封裝置帶動該真空腔體轉動，該連接單元解除鎖固後，該真空腔體由該軸封裝置卸下；至少一抽氣管線，流體連接該真空腔體的該反應空間，並用以抽出該反應空間內的一氣體；至少一進氣管線，流體連接該真空腔體的該反應空間，並用以將一前驅物氣體或一非反應氣體輸送至該反應空間；至少一真空腔體放置區，用以放置該真空腔體；至少一輸送裝置，用以在該真空腔體放置區及該原子層沉積作業區之間輸送該真空腔體；及複數個作業區、一載台及至少一滑軌，其中該作業區包括該原子層沉積作業區及該真空腔體放置區，該複數個作業區沿著該導軌設置，而該輸送裝置則透過該載台連接該導軌，並沿著該導軌位移以在該複數個作業區之間輸送該真空腔體。 An automatic machine of a detachable powder atomic layer deposition device, comprising: at least one atomic layer deposition operation area; at least one detachable powder atomic layer deposition device, including: a shaft sealing device; a driving unit, connected to the shaft sealing device , wherein the shaft sealing device and the drive unit are located in the atomic layer deposition operation area; A vacuum chamber is fixed on the shaft sealing device through at least one connecting unit, and includes a reaction space for accommodating a plurality of powders, wherein the driving unit drives the vacuum chamber to rotate through the shaft sealing device, and the connecting unit After unlocking, the vacuum chamber is detached from the shaft sealing device; at least one suction line is fluidly connected to the reaction space of the vacuum chamber and used to extract a gas in the reaction space; at least one air inlet line , which is fluidly connected to the reaction space of the vacuum chamber and used to transport a precursor gas or a non-reactive gas to the reaction space; at least one vacuum chamber placement area for placing the vacuum chamber; at least one conveying device , for transporting the vacuum chamber between the vacuum chamber placement area and the atomic layer deposition operation area; and a plurality of operation areas, a stage and at least one slide rail, wherein the operation area includes the atomic layer deposition operation area and the vacuum chamber placement area, the plurality of operation areas are arranged along the guide rail, and the conveying device is connected to the guide rail through the carrier platform, and is displaced along the guide rail to convey the plurality of operation areas between the plurality of operation areas. vacuum chamber.