TWI753955B - 耐光性硬塗覆材料 - Google Patents
耐光性硬塗覆材料 Download PDFInfo
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- TWI753955B TWI753955B TW106134863A TW106134863A TWI753955B TW I753955 B TWI753955 B TW I753955B TW 106134863 A TW106134863 A TW 106134863A TW 106134863 A TW106134863 A TW 106134863A TW I753955 B TWI753955 B TW I753955B
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- 239000000463 material Substances 0.000 title claims abstract description 11
- 238000000576 coating method Methods 0.000 title claims description 54
- 239000011248 coating agent Substances 0.000 title claims description 49
- -1 poly(oxyalkylene) Polymers 0.000 claims abstract description 144
- 239000000203 mixture Substances 0.000 claims abstract description 60
- 239000010702 perfluoropolyether Substances 0.000 claims abstract description 25
- 239000004611 light stabiliser Substances 0.000 claims abstract description 24
- 239000006097 ultraviolet radiation absorber Substances 0.000 claims abstract description 22
- 239000000178 monomer Substances 0.000 claims abstract description 19
- 150000001412 amines Chemical class 0.000 claims abstract description 15
- VMRIVYANZGSGRV-UHFFFAOYSA-N 4-phenyl-2h-triazin-5-one Chemical compound OC1=CN=NN=C1C1=CC=CC=C1 VMRIVYANZGSGRV-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000003505 polymerization initiator Substances 0.000 claims abstract description 13
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 9
- 238000004519 manufacturing process Methods 0.000 claims abstract description 9
- 239000010410 layer Substances 0.000 claims description 34
- 239000011247 coating layer Substances 0.000 claims description 23
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 21
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 20
- 239000002904 solvent Substances 0.000 claims description 19
- 150000001875 compounds Chemical class 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 17
- 125000004432 carbon atom Chemical group C* 0.000 claims description 14
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 239000006096 absorbing agent Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 27
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 abstract description 10
- 239000010408 film Substances 0.000 description 79
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 35
- 230000003373 anti-fouling effect Effects 0.000 description 22
- 229920000728 polyester Polymers 0.000 description 14
- 150000003254 radicals Chemical class 0.000 description 12
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 10
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 8
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 239000003607 modifier Substances 0.000 description 7
- 239000003921 oil Substances 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- 125000005702 oxyalkylene group Chemical group 0.000 description 6
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 5
- 125000002947 alkylene group Chemical group 0.000 description 5
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 5
- 239000012948 isocyanate Substances 0.000 description 5
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 5
- 125000004430 oxygen atom Chemical group O* 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- 150000002513 isocyanates Chemical class 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000002985 plastic film Substances 0.000 description 4
- 229920006255 plastic film Polymers 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 229920002223 polystyrene Polymers 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- JLZIIHMTTRXXIN-UHFFFAOYSA-N 2-(2-hydroxy-4-methoxybenzoyl)benzoic acid Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1C(O)=O JLZIIHMTTRXXIN-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 3
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 3
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- RSOILICUEWXSLA-UHFFFAOYSA-N bis(1,2,2,6,6-pentamethylpiperidin-4-yl) decanedioate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(C)C(C)(C)C1 RSOILICUEWXSLA-UHFFFAOYSA-N 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- WUDNUHPRLBTKOJ-UHFFFAOYSA-N ethyl isocyanate Chemical compound CCN=C=O WUDNUHPRLBTKOJ-UHFFFAOYSA-N 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 125000005647 linker group Chemical group 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000002966 varnish Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 2
- DPNXHTDWGGVXID-UHFFFAOYSA-N 2-isocyanatoethyl prop-2-enoate Chemical compound C=CC(=O)OCCN=C=O DPNXHTDWGGVXID-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 2
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 238000007611 bar coating method Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- XITRBUPOXXBIJN-UHFFFAOYSA-N bis(2,2,6,6-tetramethylpiperidin-4-yl) decanedioate Chemical compound C1C(C)(C)NC(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)NC(C)(C)C1 XITRBUPOXXBIJN-UHFFFAOYSA-N 0.000 description 2
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 2
- GGAUUQHSCNMCAU-UHFFFAOYSA-N butane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)CC(C(O)=O)C(C(O)=O)CC(O)=O GGAUUQHSCNMCAU-UHFFFAOYSA-N 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 238000007033 dehydrochlorination reaction Methods 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 238000007756 gravure coating Methods 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000003550 marker Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 239000011112 polyethylene naphthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920000193 polymethacrylate Polymers 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000004445 quantitative analysis Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- NWPIOULNZLJZHU-UHFFFAOYSA-N (1,2,2,6,6-pentamethylpiperidin-4-yl) 2-methylprop-2-enoate Chemical compound CN1C(C)(C)CC(OC(=O)C(C)=C)CC1(C)C NWPIOULNZLJZHU-UHFFFAOYSA-N 0.000 description 1
- UFLXKQBCEYNCDU-UHFFFAOYSA-N (2,2,6,6-tetramethylpiperidin-4-yl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CC(C)(C)NC(C)(C)C1 UFLXKQBCEYNCDU-UHFFFAOYSA-N 0.000 description 1
- XHVSJCKGMZSWIN-UHFFFAOYSA-N (2-hydroxy-3-prop-1-enoxypropyl) 2-methylprop-2-enoate Chemical compound CC=COCC(O)COC(=O)C(C)=C XHVSJCKGMZSWIN-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 1
- BPXVHIRIPLPOPT-UHFFFAOYSA-N 1,3,5-tris(2-hydroxyethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound OCCN1C(=O)N(CCO)C(=O)N(CCO)C1=O BPXVHIRIPLPOPT-UHFFFAOYSA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- LFEXFIMXNKZYEX-UHFFFAOYSA-N 1,4-bis(1,2,2,6,6-pentamethylpiperidin-4-yl)-2,3-di(tridecyl)butane-1,2,3,4-tetracarboxylic acid Chemical compound CN1C(CC(CC1(C)C)C(C(C(C(C(=O)O)C1CC(N(C(C1)(C)C)C)(C)C)(C(=O)O)CCCCCCCCCCCCC)(C(=O)O)CCCCCCCCCCCCC)C(=O)O)(C)C LFEXFIMXNKZYEX-UHFFFAOYSA-N 0.000 description 1
- SVNVBMPPWVBFTL-UHFFFAOYSA-N 1,4-bis(2,2,6,6-tetramethylpiperidin-4-yl)-2,3-di(tridecyl)butane-1,2,3,4-tetracarboxylic acid Chemical compound CCCCCCCCCCCCCC(C(C1CC(NC(C1)(C)C)(C)C)C(=O)O)(C(=O)O)C(CCCCCCCCCCCCC)(C(C2CC(NC(C2)(C)C)(C)C)C(=O)O)C(=O)O SVNVBMPPWVBFTL-UHFFFAOYSA-N 0.000 description 1
- ALVZNPYWJMLXKV-UHFFFAOYSA-N 1,9-Nonanediol Chemical compound OCCCCCCCCCO ALVZNPYWJMLXKV-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- UZUNCLSDTUBVCN-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-6-(2-phenylpropan-2-yl)-4-(2,4,4-trimethylpentan-2-yl)phenol Chemical compound C=1C(C(C)(C)CC(C)(C)C)=CC(N2N=C3C=CC=CC3=N2)=C(O)C=1C(C)(C)C1=CC=CC=C1 UZUNCLSDTUBVCN-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- OIQMAMFJZNAXEU-UHFFFAOYSA-N 2-[1,4-dioxo-1,4-bis[(1,2,2,5,5-pentamethylpiperidin-4-yl)oxy]butan-2-yl]butanedioic acid Chemical compound CN1C(CC(C(C1)(C)C)OC(=O)CC(C(CC(=O)O)C(=O)O)C(=O)OC1CC(N(CC1(C)C)C)(C)C)(C)C OIQMAMFJZNAXEU-UHFFFAOYSA-N 0.000 description 1
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 1
- WYLMGXULBMHUDT-UHFFFAOYSA-N 2-[4,6-bis(2,4-dimethylphenyl)-1,3,5-triazin-2-yl]-5-[3-(2-ethylhexoxy)-2-hydroxypropoxy]phenol Chemical compound OC1=CC(OCC(O)COCC(CC)CCCC)=CC=C1C1=NC(C=2C(=CC(C)=CC=2)C)=NC(C=2C(=CC(C)=CC=2)C)=N1 WYLMGXULBMHUDT-UHFFFAOYSA-N 0.000 description 1
- WPMUMRCRKFBYIH-UHFFFAOYSA-N 2-[4,6-bis(2-hydroxy-4-octoxyphenyl)-1,3,5-triazin-2-yl]-5-octoxyphenol Chemical compound OC1=CC(OCCCCCCCC)=CC=C1C1=NC(C=2C(=CC(OCCCCCCCC)=CC=2)O)=NC(C=2C(=CC(OCCCCCCCC)=CC=2)O)=N1 WPMUMRCRKFBYIH-UHFFFAOYSA-N 0.000 description 1
- VZVJUAKSQZQKMH-UHFFFAOYSA-N 2-[4-(2,4-dimethylphenyl)-6-(2-hydroxy-4-octoxyphenyl)-1,3,5-triazin-2-yl]-5-octoxyphenol Chemical compound OC1=CC(OCCCCCCCC)=CC=C1C1=NC(C=2C(=CC(C)=CC=2)C)=NC(C=2C(=CC(OCCCCCCCC)=CC=2)O)=N1 VZVJUAKSQZQKMH-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- PTJWCLYPVFJWMP-UHFFFAOYSA-N 2-[[3-hydroxy-2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)COCC(CO)(CO)CO PTJWCLYPVFJWMP-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- PCKZAVNWRLEHIP-UHFFFAOYSA-N 2-hydroxy-1-[4-[[4-(2-hydroxy-2-methylpropanoyl)phenyl]methyl]phenyl]-2-methylpropan-1-one Chemical compound C1=CC(C(=O)C(C)(O)C)=CC=C1CC1=CC=C(C(=O)C(C)(C)O)C=C1 PCKZAVNWRLEHIP-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- SDQROPCSKIYYAV-UHFFFAOYSA-N 2-methyloctane-1,8-diol Chemical compound OCC(C)CCCCCCO SDQROPCSKIYYAV-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- GBSGXZBOFKJGMG-UHFFFAOYSA-N 3-propan-2-yloxypropan-1-ol Chemical compound CC(C)OCCCO GBSGXZBOFKJGMG-UHFFFAOYSA-N 0.000 description 1
- IXAUCVOJRVFRBJ-UHFFFAOYSA-N 4-(trichloromethyl)triazine Chemical class ClC(Cl)(Cl)C1=CC=NN=N1 IXAUCVOJRVFRBJ-UHFFFAOYSA-N 0.000 description 1
- DRXGKQPTFWTTJW-UHFFFAOYSA-N 5-butoxy-2-[4-(4-butoxy-2-hydroxyphenyl)-6-(2,4-dibutoxyphenyl)-1,3,5-triazin-2-yl]phenol Chemical compound OC1=CC(OCCCC)=CC=C1C1=NC(C=2C(=CC(OCCCC)=CC=2)O)=NC(C=2C(=CC(OCCCC)=CC=2)OCCCC)=N1 DRXGKQPTFWTTJW-UHFFFAOYSA-N 0.000 description 1
- DFANMEUHPMJFDO-UHFFFAOYSA-N 6-[4,6-bis(4-hexoxy-2-hydroxy-3-methylphenyl)-1,3,5-triazin-2-yl]-3-hexoxy-2-methylphenol Chemical compound OC1=C(C)C(OCCCCCC)=CC=C1C1=NC(C=2C(=C(C)C(OCCCCCC)=CC=2)O)=NC(C=2C(=C(C)C(OCCCCCC)=CC=2)O)=N1 DFANMEUHPMJFDO-UHFFFAOYSA-N 0.000 description 1
- PKMUFPSSPIYKPU-UHFFFAOYSA-N 6-methylheptyl 2-[4-[4,6-bis(4-phenylphenyl)-1,3,5-triazin-2-yl]-3-hydroxyphenoxy]propanoate Chemical compound CC(C)CCCCCOC(=O)C(C)Oc1ccc(c(O)c1)-c1nc(nc(n1)-c1ccc(cc1)-c1ccccc1)-c1ccc(cc1)-c1ccccc1 PKMUFPSSPIYKPU-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 241000283070 Equus zebra Species 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- RABVYVVNRHVXPJ-UHFFFAOYSA-N [3-(hydroxymethyl)-1-adamantyl]methanol Chemical compound C1C(C2)CC3CC1(CO)CC2(CO)C3 RABVYVVNRHVXPJ-UHFFFAOYSA-N 0.000 description 1
- IPTNXMGXEGQYSY-UHFFFAOYSA-N acetic acid;1-methoxybutan-1-ol Chemical compound CC(O)=O.CCCC(O)OC IPTNXMGXEGQYSY-UHFFFAOYSA-N 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- MOLCWHCSXCKHAP-UHFFFAOYSA-N adamantane-1,3-diol Chemical compound C1C(C2)CC3CC1(O)CC2(O)C3 MOLCWHCSXCKHAP-UHFFFAOYSA-N 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- FLPKSBDJMLUTEX-UHFFFAOYSA-N bis(1,2,2,6,6-pentamethylpiperidin-4-yl) 2-butyl-2-[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]propanedioate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)C(C(=O)OC1CC(C)(C)N(C)C(C)(C)C1)(CCCC)CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 FLPKSBDJMLUTEX-UHFFFAOYSA-N 0.000 description 1
- 230000036760 body temperature Effects 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- MGNCLNQXLYJVJD-UHFFFAOYSA-N cyanuric chloride Chemical compound ClC1=NC(Cl)=NC(Cl)=N1 MGNCLNQXLYJVJD-UHFFFAOYSA-N 0.000 description 1
- PJWNIOJGDLTZPK-UHFFFAOYSA-N cyclohexanone;methanol Chemical compound OC.O=C1CCCCC1 PJWNIOJGDLTZPK-UHFFFAOYSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- FOTKYAAJKYLFFN-UHFFFAOYSA-N decane-1,10-diol Chemical compound OCCCCCCCCCCO FOTKYAAJKYLFFN-UHFFFAOYSA-N 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000003203 everyday effect Effects 0.000 description 1
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 125000006838 isophorone group Chemical group 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229940102396 methyl bromide Drugs 0.000 description 1
- YLHXLHGIAMFFBU-UHFFFAOYSA-N methyl phenylglyoxalate Chemical compound COC(=O)C(=O)C1=CC=CC=C1 YLHXLHGIAMFFBU-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- FDAKZQLBIFPGSV-UHFFFAOYSA-N n-butyl-2,2,6,6-tetramethylpiperidin-4-amine Chemical compound CCCCNC1CC(C)(C)NC(C)(C)C1 FDAKZQLBIFPGSV-UHFFFAOYSA-N 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- WSGCRAOTEDLMFQ-UHFFFAOYSA-N nonan-5-one Chemical compound CCCCC(=O)CCCC WSGCRAOTEDLMFQ-UHFFFAOYSA-N 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- ZTQPXPYJIWPMDF-UHFFFAOYSA-N octyl 2-[4-[4,6-bis[2-hydroxy-4-(1-octoxy-1-oxopropan-2-yl)oxyphenyl]-1,3,5-triazin-2-yl]-3-hydroxyphenoxy]propanoate Chemical compound OC1=CC(OC(C)C(=O)OCCCCCCCC)=CC=C1C1=NC(C=2C(=CC(OC(C)C(=O)OCCCCCCCC)=CC=2)O)=NC(C=2C(=CC(OC(C)C(=O)OCCCCCCCC)=CC=2)O)=N1 ZTQPXPYJIWPMDF-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 125000005429 oxyalkyl group Chemical group 0.000 description 1
- 125000006353 oxyethylene group Chemical group 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 210000002374 sebum Anatomy 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000010454 slate Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 235000015096 spirit Nutrition 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 210000004243 sweat Anatomy 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical group FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- WUPCFMITFBVJMS-UHFFFAOYSA-N tetrakis(1,2,2,6,6-pentamethylpiperidin-4-yl) butane-1,2,3,4-tetracarboxylate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)CC(C(=O)OC1CC(C)(C)N(C)C(C)(C)C1)C(C(=O)OC1CC(C)(C)N(C)C(C)(C)C1)CC(=O)OC1CC(C)(C)N(C)C(C)(C)C1 WUPCFMITFBVJMS-UHFFFAOYSA-N 0.000 description 1
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 150000003626 triacylglycerols Chemical class 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000005691 triesters Chemical class 0.000 description 1
- UFTFJSFQGQCHQW-UHFFFAOYSA-N triformin Chemical compound O=COCC(OC=O)COC=O UFTFJSFQGQCHQW-UHFFFAOYSA-N 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/16—Layered products comprising a layer of synthetic resin specially treated, e.g. irradiated
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
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-
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- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
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- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
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-
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- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
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- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
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- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
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- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
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- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
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- C08K5/3492—Triazines
-
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- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
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Abstract
[課題] 本發明提供一種硬塗覆層形成材料,其為具有高抗擦傷性及耐光性之硬塗覆層形成材料。 [解決手段] 提供一種含有(a)活化能量射線硬化性多官能單體100質量份、(b)於含有聚(全氟伸氧烷)基之分子鏈的兩終端,介由聚(伸氧烷)基或依順序介由聚(伸氧烷)基及1個胺基甲酸酯鍵結基,鍵結活化能量射線聚合性基之全氟聚醚0.1~10質量份、(c)可由活化能量射線產生游離基之聚合引發劑1~20質量份、(d)羥苯基三嗪類紫外線吸收劑1~3質量份,及(e)受阻胺類光穩定劑1~2質量份之硬化性組成物,及具備由該組成物形成的硬塗覆層之硬塗覆膜及其製造方法。
Description
[0001] 本發明為關於一種耐光性硬塗覆材料(硬化組成物),其特徵為,適合作為用於觸控面板顯示器、液晶顯示器等各種顯示元件的表面之硬塗覆層之形成材料者。
[0002] 如個人電腦、行動電話、行動遊戲機、ATM等,為數非常多的搭載觸控面板之平板顯示器之產品已被商品化。尤其,因出現智慧型手機或平板電腦,具備多點觸控功能之靜電容式觸控面板的搭載數被大幅地提升。 [0003] 此些觸控面板顯示器表面使用了薄強化玻璃,並於顯示器表面貼上保護膜以防止此玻璃散射。保護膜,因使用塑膠膜故較玻璃易留下損傷,需於其表面鋪設抗擦傷性較佳之硬塗覆層。欲於塑膠膜表面賦予抗擦傷性,可舉例如,使用可形成高度交聯結構,即分子運動性較低之交聯結構使表面硬度提升,賦予對外力之抵抗性的方法。 此些硬塗覆層形成材料中,目前最常使用之多官能丙烯酸酯類材料,因其多數於常溫下為液狀單體,且會受到由光聚合引發劑產生之游離基形成3次元交聯。因丙烯酸酯類受紫外線(UV)會硬化,而因照射UV的時間非常短故可省能源,故以其產能高為特徵。於塑膠膜表面上形成硬塗覆層之方法,可舉例如,將多官能丙烯酸酯、光聚合引發劑及含有機溶劑之溶液使用凹版塗覆等塗覆於塑膠膜上,並於有機溶劑乾燥後,使用紫外線使其硬化,而形成硬塗覆層之方法。所形成之硬塗覆層中,欲使硬度、抗擦傷性等功能於實用上不產生問題之等級時,一般硬塗覆層之厚度為形成1~15μm。 [0004] 另外,靜電容式觸控面板為透過人的手指觸碰以進行操作。為此,進行操作時指紋會密著於觸控面板之表面,而會產生顯示器之影像能見度明顯的減少,且顯示器之外觀受損之問題。因指紋中含有汗水帶來之水份及皮脂帶來之油份,就使任何東西都難以密著之觀點,故高度期望對於顯示器表面之硬塗覆層,可賦予撥水性及撥油性。 由此觀點,觸控面板顯示器表面,極期望對指紋等具有防污性。但,靜電容式觸控面板中,因人會每天用手指觸碰,故即便初期之防污性達到相當高之等級,但伴隨使用過程其功能多有降低之情形。為此,使用過程的防污性之耐久性即成為發明之課題。 [0005] 過去,於硬塗覆層表面賦予防污性之方法,多使用於形成硬塗覆層之塗覆液中少量添加氟類表面改性劑之方法。所添加之氟類化合物,因其具有低表面能量而會偏存於硬塗覆層,而可賦予撥水性及撥油性。氟類化合物,就撥水性、撥油性之觀點,多使用具有聚(全氟伸氧烷基)鏈之被稱為全氟聚醚的具有1,000~5,000左右之數量平均分子量之寡聚物。但,因全氟聚醚具有高氟濃度,一般,較難溶解於形成硬塗覆層之塗覆液所使用之有機溶劑中。此外,於所形成之硬塗覆層中會產生凝聚現象。 欲對該些全氟聚醚中,賦予對於有機溶劑之溶解性及硬塗覆層中之分散性時,多會使用於全氟聚醚附加有機部位之方法。並且,為賦予抗擦傷性時,多會使用鍵結由(甲基)丙烯酸酯基代表之活化能量射線硬化部位之方法。 目前為止,具有抗擦傷性的防污性硬塗覆層中,對於硬塗覆層表面所賦予的防污性成份,已有揭示使用於聚(全氟伸氧烷基)鏈之兩終端,介由具有異佛酮架構之複數的胺基甲酸酯鍵結的具有(甲基)丙烯醯基之化合物作為表面改性劑之技術(專利文獻1)。 [0006] 另,欲於顯示器表面等基材表面使用防污性硬塗覆膜,需在與形成防污性硬塗覆層之面相反之面,使用光學透明黏著劑(OCA),貼附於基材表面。OCA可透過加熱及照射活化能量射線硬化,發揮其黏著功能。藉由活化能量射線硬化的OCA之情形,雖為由防污性硬塗覆側照射活化能量射線以進行硬化,但該期間,因活化能量射線之照射,會自殘留於防污性硬塗覆層中之未反應的聚合引發劑產生游離基。並且,產生之游離基成為起始種,會使未反應之活化能量射線多官能單體之過度進行聚合,導致防污性硬塗覆層脆化,並引發防污性硬塗覆層及薄膜間之密著性降低,產生防污性硬塗覆層剝離之問題。為防止密著性降低,一般使用之手段,例如,於形成防污性硬塗覆層之硬化性組成物中,預先添加紫外線吸收劑及光穩定劑之方法(專利文獻2)。 [先行技術文獻] [專利文獻] [0007] [專利文獻1] 特開2013-76029號公報 [專利文獻2] 特開2016-125049號公報
[發明欲解決之問題] [0008] 專利文獻1具體記載之方法,因形成防污性硬塗覆層之硬化性組成物中不含紫外線吸收劑及光穩定劑,故存在由防污性硬塗覆層之膜發生剝離之疑慮。 又,專利文獻2具體記載之方法中,紫外線吸收劑會抑制由聚合引發劑產生游離基,又,光穩定劑會補捉產生之游離基使其猝滅(quench)。因此,預先於形成防污性硬塗覆層之硬化性組成物中添加紫外線吸收劑及光穩定劑之情形,即使於形成防污性硬塗覆層中,也會抑制游離基之產生及產生猝滅,而阻礙防污性硬塗覆層之形成,因而引發抗擦傷性之惡化。又,紫外線吸收劑,亦具有吸收400nm附近之種類,添加過多之情形,仍會有存在損害防污性硬塗覆層的透明性之情形。 [解決問題之手段] [0009] 本發明者們,為解決上述課題進行了廣泛研究的成果,發現添加作為表面改性劑發揮機能之於含有聚(全氟伸氧烷)基之分子鏈的兩終端,介由聚(伸氧烷)基或介由聚(伸氧烷)基及1個胺基甲酸酯鍵結基,而結合活化能量射線聚合性基之全氟聚醚之同時,可使含有特定紫外線吸收劑與特定光穩定劑之硬化性組成物,可形成具有優良之抗擦傷性,且具有優良的耐光性之防污性硬塗覆層,進而完成本發明。 [0010] 即本發明,第1觀點為關於,一種硬化性組成物,其特徵為,含有 (a)活化能量射線硬化性多官能單體100質量份、 (b)於含有聚(全氟伸氧烷)基之分子鏈的兩終端,介由聚(伸氧烷)基或依順序介由聚(伸氧烷)基及1個胺基甲酸酯鍵結基,鍵結活化能量射線聚合性基之全氟聚醚0.1~10質量份、 (c)可由活化能量射線產生游離基之聚合引發劑1~20質量份、 (d)羥苯基三嗪類紫外線吸收劑1~3質量份,及 (e)受阻胺類光穩定劑1~2質量份 之硬化性組成物, 前述羥苯基三嗪類紫外線吸收劑為, 與三嗪環直接鍵結之3個苯基中,至少被2個以上之羥基所取代之化合物,或, 與三嗪環直接鍵結之3個苯基中,至少1個苯基之氫原子被苯基所取代,且,與三嗪環直接鍵結之3個苯基中,至少被總計1個以上之羥基所取代之化合物, 前述受阻胺類光穩定劑為,具有如式[1]表示的基之化合物者。(式中,Ra
表示氫原子,或碳原子數1至10之烷基,黑點表示鍵結處)。 第2觀點為關於,如第1觀點記載之硬化性組成物,其中,前述聚(全氟伸氧烷)基為,具有-[OCF2
]-及 -[OCF2
CF2
]-作為重複單位之基。 第3觀點為關於,如第1觀點或第2觀點記載之硬化性組成物,其中,前述聚(伸氧烷)基為,具有5~12次重複單位數之聚(伸氧烷)基。 第4觀點為關於,如第1觀點至第3觀點中任一記載之硬化性組成物,其中,前述聚(伸氧烷)基為聚(伸氧乙烷)基。 第5觀點為關於,如第1觀點至第4觀點中任一記載之硬化性組成物,其中,前述活化能量射線聚合性基為,具有至少2個以上活化能量射線聚合性部位之基。 第6觀點為關於,如第1觀點至第5觀點中任一記載之硬化性組成物,其中,前述成份(a)之多官能單體為,由多官能(甲基)丙烯酸酯化合物及多官能(甲基)丙烯酸胺基甲酸酯化合物所成之群中選出之至少1種者。 第7觀點為關於,如第1觀點至第6觀點任一記載之硬化性組成物,其另含有(f)溶媒。 第8觀點為關於,一種硬化膜,其特徵為,由第1觀點至第7觀點任一記載之硬化性組成物所製得者。 第9觀點為關於,一種硬塗覆膜,其特徵為,於膜基材之至少一面具備硬塗覆層,而該硬塗覆層為由第8觀點記載之硬化膜所形成者。 第10觀點為關於,如第9觀點記載之硬塗覆膜,其中,前述硬塗覆層具有1~15μm之膜厚。 第11觀點為關於,一種硬塗覆膜之製造方法,其為於膜基材之至少一面具備硬塗覆層之硬塗覆膜之製造方法,其特徵為,包含將第1觀點至第7觀點任一記載之硬化性組成物塗覆於膜基材上形成塗膜之步驟、照射活化能量射線於該塗膜使之硬化之步驟者。 [發明之效果] [0011] 本發明可提供一種硬化性組成物,其特徵為,適合形成即便厚度於1~15μm左右之薄膜中也具有優良抗擦傷性,且具有優良耐光性之硬化膜及硬塗覆層者。 又,根據本發明,可提供一種硬塗覆膜,其特徵為,於表面賦予由前述硬化性組成物產生之硬化膜或由其形成之硬塗覆層者,並可提供一種硬塗覆膜,其特徵為,具有優良抗擦傷性及耐光性較佳者。 特別是尤其,根據本發明之內容,於將硬塗覆膜適用於顯示器表面等之基材表面時,即使經過使用光學透明黏著劑之黏著步驟後,也可抑制硬塗覆層由該硬塗覆膜之基材(膜)之剝離,而提供一種具有耐光性較佳之硬塗覆膜。 [發明之實施形態] [0012] <硬化性組成物> 本發明之硬化性組成物,詳細而言為,關於含有 (a)活化能量射線硬化性多官能單體100質量份、 (b)於含有聚(全氟伸氧烷)基之分子鏈的兩終端,介由聚(伸氧烷)基或依順序介由聚(伸氧烷)基及1個胺基甲酸酯鍵結基,鍵結活化能量射線聚合性基之全氟聚醚0.1~10質量份、 (c)可由活化能量射線產生游離基之聚合引發劑1~20質量份、 (d)羥苯基三嗪類紫外線吸收劑1~3質量份,及 (e)受阻胺類光穩定劑1~2質量份 之硬化性組成物。 以下,首先就上述(a)~(e)之各成份進行說明。 [0013] [(a)活化能量射線硬化性多官能單體] 活化能量射線硬化性多官能單體係指,透過照射紫外線等活化能量射線進行聚合反應,並硬化之單體。 本發明之硬化性組成物中較喜好之(a)活化能量射線硬化性多官能單體為,由多官能(甲基)丙烯酸酯化合物及多官能(甲基)丙烯酸胺基甲酸酯所成之群中所選出之單體。 又,本發明中之(甲基)丙烯酸酯化合物為係指,丙烯酸酯化合物及甲基丙烯酸酯化合物兩者。例如(甲基)丙烯酸係指,丙烯酸及甲基丙烯酸之意。 [0014] 上述多官能(甲基)丙烯酸酯化合物,可舉例如,(甲基)丙烯酸三羥甲基丙烷三酯、(甲基)丙烯酸雙三羥甲基丙烷四酯、(甲基)丙烯酸季戊四醇二酯、(甲基)丙烯酸季戊四醇三酯、(甲基)丙烯酸季戊四醇四酯、(甲基)丙烯酸二季戊四醇五酯、(甲基)丙烯酸二季戊四醇六酯、(甲基)丙烯酸甘油三酯、(甲基)丙烯酸乙氧基化三羥甲基丙烷三酯、(甲基)丙烯酸乙氧基化季戊四醇四酯、(甲基)丙烯酸乙氧基化二季戊四醇六酯、(甲基)丙烯酸乙氧基化甘油三酯、(甲基)丙烯酸乙氧基化雙酚A二酯、1(甲基)丙烯酸1,3-丙二醇二酯、(甲基)丙烯酸1,3-丁二醇二酯、(甲基)丙烯酸1,4-丁二醇二酯、(甲基)丙烯酸1,6-己二醇二酯、(甲基)丙烯酸2-甲基-1,8-辛二醇二酯、(甲基)丙烯酸1,9-壬二醇二酯、(甲基)丙烯酸1,10-癸二醇二酯、(甲基)丙烯酸新戊二醇二酯、(甲基)丙烯酸乙二醇二酯、(甲基)丙烯酸二乙二醇二酯、(甲基)丙烯酸三乙二醇二酯、(甲基)丙烯酸四乙二醇二酯、(甲基)丙烯酸丙二醇二酯、(甲基)丙烯酸二丙二醇二酯、(甲基)丙烯酸雙(2-羥乙基)異氰脲酸酯二酯、(甲基)丙烯酸三(2-羥乙基)異氰脲酸酯三酯、(甲基)丙烯酸三環[5.2.1.02,6
]癸二甲醇二酯、(甲基)丙烯酸二噁烷乙二醇二酯、2-羥基-1-丙烯醯氧基-3-甲基丙烯醯氧基丙烷、2-羥基-1,3-二(甲基)丙烯醯氧基丙烷、9,9-雙[4-(2-(甲基)丙烯醯氧基乙氧基)苯基]芴、雙[4-(甲基)丙烯醯硫苯基]硫化物、雙[2-(甲基)丙烯醯硫乙基]硫化物、1,3-金剛烷二醇二(甲基)丙烯酸酯、1,3-金剛烷二甲醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯等。 其中較佳者,可舉例如,(甲基)丙烯酸季戊四醇三酯、(甲基)丙烯酸季戊四醇四酯、(甲基)丙烯酸二季戊四醇五酯、(甲基)丙烯酸二季戊四醇六酯等。 [0015] 上述多官能(甲基)丙烯酸胺基甲酸酯化合物係指,於1分子中具有複數丙烯醯基或甲基丙烯醯基,且具有一個以上胺基甲酸酯鍵結(-NHCOO-)之化合物。 上述多官能胺基甲酸酯(甲基)丙烯酸胺基甲酸酯化合物可舉例如,由多官能異氰酸酯與具有羥基之(甲基)丙烯酸酯反應產生者、由多官能異氰酸酯與具有羥基之(甲基)丙烯酸酯及多元醇反應產生者等,但本發明中可使用之多官能(甲基)丙烯酸胺基甲酸酯化合物並不受限於少數例舉者。 [0016] 又,上述多官能異氰酸酯為,可舉例如,甲苯二異氰酸酯、異佛爾酮二異氰酸酯、苯二伸甲基二異氰酸酯、伸六甲基二異氰酸酯等。 又,具有上述羥基之(甲基)丙烯酸酯,可舉例如,(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸2-羥丙酯、(甲基)丙烯酸季戊四醇三酯、(甲基)丙烯酸二季戊四醇五酯、(甲基)丙烯酸三季戊四醇七酯等。 並且,上述多元醇,可舉例如,乙二醇、丙二醇、新戊二醇、1,4-丁二醇、1,6-己二醇、二乙二醇、二丙二醇等二醇類;此些二醇類與琥珀酸、馬來酸、己二酸等脂肪族二羧酸類或二羧酸酐類的反應產物之聚酯多元醇;聚醚多元醇;聚碳酸酯二醇等。 [0017] 本發明中,上述(a)活化能量射線硬化性多官能單體,可由上述多官能(甲基)丙烯酸酯化合物及上述多官能(甲基)丙烯酸胺基甲酸酯化合物所成之群中單獨使用一種,或使用兩種以上之組合。就所得硬化物的抗擦傷性之觀點,以併用多官能(甲基)丙烯酸酯化合物及多官能(甲基)丙烯酸胺基甲酸酯化合物為佳。又,上述多官能(甲基)丙烯酸酯化合物,以併用5官能以上之多官能(甲基)丙烯酸酯化合物及4官能以下之多官能(甲基)丙烯酸酯化合物為佳。 又,將上述多官能(甲基)丙烯酸酯化合物及上述多官能(甲基)丙烯酸胺基甲酸酯化合物組合使用之情形,相對於多官能(甲基)丙烯酸酯化合物100質量份,多官能(甲基)丙烯酸胺基甲酸酯化合物以使用20~100質量份為佳,以使用30~70質量份為較佳。 此外,上述多官能(甲基)丙烯酸酯化合物中,將上述5官能以上之多官能(甲基)丙烯酸酯化合物及上述4官能以下之多官能(甲基)丙烯酸酯化合物組合使用之情形,相對於5官能以上之多官能(甲基)丙烯酸酯化合物100質量份,4官能以下之多官能(甲基)丙烯酸酯化合物以使用10~100質量份為佳,以使用20~60質量份為較佳。 又,以使用相對於多官能(甲基)丙烯酸酯化合物100質量份,多官能(甲基)丙烯酸胺基甲酸酯化合物為20~100質量份,及相對於5官能以上之多官能(甲基)丙烯酸酯化合物100質量份,4官能以下之多官能(甲基)丙烯酸酯化合物為10~100質量份、 使用相對於多官能(甲基)丙烯酸酯化合物100質量份,多官能(甲基)丙烯酸胺基甲酸酯化合物為20~100質量份,及相對於5官能以上之多官能(甲基)丙烯酸酯化合物100質量份,4官能以下之多官能(甲基)丙烯酸酯化合物為20~60質量份、 使用相對於多官能(甲基)丙烯酸酯化合物100質量份,多官能(甲基)丙烯酸胺基甲酸酯化合物為30~70質量份,及相對於5官能以上之多官能(甲基)丙烯酸酯化合物100質量份,4官能以下之多官能(甲基)丙烯酸酯化合物為10~100質量份、 使用相對於多官能(甲基)丙烯酸酯化合物100質量份,多官能(甲基)丙烯酸胺基甲酸酯化合物為30~70質量份,及相對於5官能以上之多官能(甲基)丙烯酸酯化合物100質量份,4官能以下之多官能(甲基)丙烯酸酯化合物為20~60質量份者為佳。 [0018] [(b)於聚(全氟伸氧烷)基之分子鏈的兩終端,介由聚(伸氧烷)基或依順序介由聚(伸氧烷)基及1個胺基甲酸酯鍵結基,鍵結活化能量射線聚合性基之全氟聚醚] 本發明中之(b)成份為,於聚(全氟伸氧烷)基之分子鏈的兩終端,介由聚(伸氧烷)基或依順序介由聚(伸氧烷)基及1個胺基甲酸酯鍵結基,鍵結活化能量射線聚合性基之全氟聚醚(以下,可簡稱「(b)於兩終端具有聚合性基之全氟聚醚」)。(b)成份,於使用於本發明之硬化性組成物的硬塗覆層中具有作為表面改性劑之機能。 [0019] 上述聚(全氟伸氧烷)基中伸烷基之碳原子數雖無特別限制,又以碳原子數1~4為佳。即,上述聚(全氟伸氧烷)基係指,具有碳原子數1~4之2價的氟化碳基與氧原子交互連結構造之基,全氟伸氧烷基係指具有碳原子數1~4之2價的氟化碳基與氧原子連結構造之基。具体而言,可舉例如,-[OCF2
]-(全氟伸氧甲基)、-[OCF2
CF2
]-(全氟伸氧乙基)、-[OCF2
CF2
CF2
]-(全氟伸氧丙烷-1,3-二基)、-[OCF2
C(CF3
)F]-(全氟氧伸丙烷-1,2-二基)等。 上述全氟伸氧烷基,可單獨使用一種,或將二種以上組合使用,於該情形,複數種之全氟伸氧烷基的鍵結可為嵌段鍵結及隨機鍵結的任意一種。 [0020] 此些之中,就可製得抗擦傷性良好之硬化膜的觀點,聚(全氟伸氧烷)基,以使用由-[OCF2
]-(全氟伸氧甲基)、-[OCF2
CF2
]-(全氟伸氧乙基)二者作為重複單位之基為佳。 其中上述聚(全氟伸氧烷)基,以含有重複單位 -[OCF2
]-及-[OCF2
CF2
]-,或含有[重複單位:-[OCF2
]-]:[重複單位:-[OCF2
CF2
]-]之莫耳比例=2:1~1:2的比例之基為佳,以含有約莫1:1的比例之基為較佳。此些重複單位之鍵結,可為嵌段鍵結及隨機鍵結的任意一種。 上述全氟伸氧烷基之重複單位數,以其重複單位數之總和介於5~30之範圍為佳,7~21之範圍為較佳。 又,聚(全氟伸氧烷)基之膠體滲透層析儀的聚苯乙烯換算量測出之重量平均分子量(Mw)為1,000~5,000,又以1,500~2,000為佳。 [0021] 上述聚(伸氧烷)基中之伸烷基之碳原子數雖無特別限制,又以碳原子數1~4為佳。即,上述聚(伸氧烷)基係指,具有碳原子數1~4之伸烷基與氧原子交互連結構造之基,係指伸氧烷基為具有碳原子數1~4的2價伸烷基與氧原子鍵結的構造之基之意。上述伸烷基,可舉例如,伸乙基、1-甲基伸乙基、伸三甲基、伸四甲基等。 上述伸氧烷基,可單獨使用一種,或將二種以上組合使用,於該情形,複數種之伸氧烷基的鍵結可為嵌段鍵結及隨機鍵結的任意一種。 其中,上述聚(伸氧烷)基,以聚(伸氧乙烷)基為佳。 上述聚(伸氧烷)基中伸氧烷基之重複單位數,例如1~15之範圍,例如5~12之範圍,又以7~12之範圍為更佳。 [0022] 介由上述聚(伸氧烷)基或依順序介由聚(伸氧烷)基及1個胺基甲酸酯鍵結基鍵結之活化能量射線聚合性基,可舉例如,(甲基)丙烯醯基、胺基甲酸酯(甲基)丙烯醯基,乙烯基等。 [0023] 上述活化能量射線聚合性基,不限於(甲基)丙烯醯基部份等具有1個活化能量射線聚合性部份者,也可為具有2個以上活化能量射線聚合性部份者,可舉例如,以下A1~A5所示之構造,及此些構造中之丙烯醯基取代為甲基丙烯醯基之構造等。 [0024][0025] 該些(b)於兩終端具有聚合性基之全氟聚醚,就工業上容易生產之觀點,以將以下所示之化合物及此些化合物中之丙烯醯基取代為甲基丙烯醯基之化合物為較佳之範例。又,構造式中,A表示前述式[A1]~式[A5]構造中之1種、PFPE表示前述聚(全氟伸氧烷)基,n表示分別獨立之伸氧乙烷基的重複單位數,以表示1~15之數為佳,表示5~12之數為較佳,以表示7~12之數為更佳。[0026] 其中,本發明之(b)於兩終端具有聚合性基之全氟聚醚,以於含有聚(全氟伸氧烷)基之分子鏈的兩終端,依順序介由聚(伸氧烷)基及1個胺基甲酸酯鍵結基,即,於含有聚(全氟伸氧烷)基之分子鏈的兩終端分別鍵結聚(伸氧烷)基,並於該兩端之各聚(伸氧烷)基分別鍵結1個胺基甲酸酯鍵結基,而後於該兩端之各胺基甲酸酯鍵結分別鍵結活化能量射線聚合性基之全氟聚醚為佳。此外,前述全氟聚醚,以活化能量射線聚合性基為至少具有2個以上之活化能量射線聚合性份位之基的全氟聚醚為佳。 [0027] 本發明中之(b)於兩終端具有聚合性基之全氟聚醚,相對於(a)活化能量射線硬化性多官能單體100質量份,以0.1~10質量份,又以使用0.2~5質量份之比例為佳。 [0028] 上述(b)於兩終端具有聚合性基之全氟聚醚,可由舉例如,於聚(全氟伸氧烷)基之兩終端介由聚(伸氧烷)基具有羥基之化合物中,對於兩端之羥基,以2-(甲基)丙烯醯氧乙基異氰酸酯或1,1-雙((甲基)丙烯醯氧基甲基)乙基異氰酸酯等具有聚合性基之異氰酸酯化合物進行胺基甲酸酯化反應之方法、以(甲基)丙烯醯氯或氯甲基苯乙烯進行脫鹽酸反應之方法、以(甲基)丙烯酸進行脫水反應之方法,以衣康酸酐進行酯化反應之方法等產生。 其中,以於聚(全氟伸氧烷)基之兩終端介由聚(伸氧烷)基具有羥基之化合物中,對於兩端之羥基,以2-(甲基)丙烯醯氧乙基異氰酸酯或1,1-雙((甲基)丙烯醯氧基甲基)乙基異氰酸酯等具有聚合性基之異氰酸酯化合物進行胺基甲酸酯化反應之方法,或,對於該羥基,以(甲基)丙烯醯氯或氯甲基苯乙烯進行脫鹽酸反應之方法,因其反應容易之觀點,為特佳之選擇。 [0029] 又,本發明之硬化性組成物,除了含有(b)於聚(全氟伸氧烷)基之分子鏈的兩終端,介由聚(伸氧烷)基或依順序介由聚(伸氧烷)基及1個胺基甲酸酯鍵結基,鍵結活化能量射線聚合性基鍵結之全氟聚醚以外,亦包含於含有聚(全氟伸氧烷)基之分子鏈之一端介由聚(伸氧烷)基或依順序介由聚(伸氧烷)基及1個胺基甲酸酯鍵結基,鍵結於活化能量射線聚合性基,且另一端為介由聚(伸氧烷)基具有羥基之全氟聚醚,或於含有聚(全氟伸氧烷)基之分子鏈的兩終端介由聚(伸氧烷)基具有羥基之全氟聚醚[未鍵結活化能量射線聚合性基之化合物]。 [0030] [(c)可由活化能量射線產生游離基之聚合引發劑] 本發明之硬化性組成物中較佳之可由活化能量射線產生游離基之聚合引發劑(以下,可簡稱「(c)聚合引發劑」),例如,由電子束、紫外線、X光等活化能量射線,特別是由紫外線照射產生游離基之聚合引發劑。 上述(c)聚合引發劑,可舉例如安息香類、烷酮類、噻噸酮類、偶氮類、疊氮類、重氮類、鄰醌二疊氮類、醯基氧化膦類、肟酯類、有機過氧化物類、二苯甲酮類、二香豆素類、雙咪唑類、二茂鈦類、巰基類、鹵化烴類、三氯甲基三嗪類,或錪鹽、鋶鹽等之鎓鹽類等。此些可單獨使用一種或將兩種以上混用。 其中,本發明之(c)聚合引發劑就透明性、表面硬化、薄膜硬化之觀點,以使用烷基酮類為佳。藉由使用烷酮類,可製得抗擦傷性較高之硬化膜。 [0031] 上述烷酮類,可舉例如1-羥基環己基=苯基=酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、2-羥基-1-(4-(2-羥基乙氧基)苯基)-2-甲基丙烷-1-酮、2-羥基-1-(4-(4-(2-羥基-2-甲基丙醯基)苄基)苯基)-2-甲基丙烷-1-酮等α-羥基烷酮類;2-甲基-1-(4-(甲硫基)苯基)-2-嗎啉代丙-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉代苯基)丁烷-1-酮等α-胺基烷酮類;2,2-二甲氧基-1,2-二苯基乙烷-1-酮;乙醛酸甲基苯酯等。 [0032] 本發明中之(c)聚合引發劑,相對於前述(a)活化能量射線硬化性多官能單體之100質量份,以1~20質量份,又以使用2~10質量份之比例為佳。 [0033] [(d)羥苯基三嗪類紫外線吸收劑] 本發明之硬化性組成物中,(d)成份以使用羥苯基三嗪類紫外線吸收劑為特徵。 尤其於本發明中,上述羥苯基三嗪類紫外線吸收劑中,一般採用與三嗪環直接鍵結之3個苯基中,至少被2個以上之羥基所取代之化合物,或,與三嗪環直接鍵結之3個苯基中,至少1個苯基之氫原子被苯基所取代,且,與三嗪環直接鍵結之3個苯基中,至少被總計1個以上羥基所取代之化合物。 如此,於本發明中,藉由併用特定之(d)羥苯基三嗪類紫外線吸收劑及後述之特定的(e)受阻胺類光穩定劑,使該光硬化性組成物製成之硬塗覆膜使用於顯示器表面等之基材表面時,於經使用光學透明黏著劑之黏著步驟中,可抑制硬塗覆層由該硬塗覆膜之剝離,且適當地維持薄膜與硬塗覆層之密著性,而可形成具有優良耐光性之硬塗覆膜。 [0034] 前述羥苯基三嗪類紫外線吸收劑,較佳可舉例如以下述式(U1)表示之羥苯基三嗪化合物。(式中,R1
、R2
、R3
、R4
、R5
、R6
、R7
及R8
分別獨立為,由含有氫原子、羥基、苯基,或,由醚鍵結、酯鍵結、醯胺鍵結所成之群中選擇之1種以上的鍵結之碳原子數1至18之烷基及碳原子數1至18之烷氧基所成之群中所選擇之基,前述苯基、烷基及烷氧基可被羥基所取代,惟,R1
至R8
中任一者皆非苯基之情形,R1
至R8
中至少1個表示羥基)。 [0035] 上述碳原子數1至18之烷基,可具有分支結構、環狀結構,舉例如,甲基、乙基、丙基、異丙基、丁基、叔丁基、戊基、己基、環己基、庚基、辛基、壬基、癸基、十一烷基、十二烷基(月桂基)、十三烷基、十四烷基(肉荳蔻基)、十五烷基、十六烷基(棕櫚基)、十七烷基、十八烷基(硬脂基)等。 又上述碳原子數1至18之烷氧基,具有上述碳原子數1至18之烷基鍵結於氧原子之結構,此些可具有分支結構,或環狀結構。 [0036] 上述紫外線吸收劑,可舉例如,2,4-雙(4-丁氧基-2-羥苯基)-6-(2,4-二丁氧基苯基)-1,3,5-三嗪[BASF公司製 TINUVIN 460]、2,4,6-三(2-羥基-4-己氧基-3-甲基苯基)-1,3,5-三嗪[(股)ADEKA製 ADEKASTAB(註冊商標)LA-F70]、2,4,6-三(2-羥基-4-(1-(辛氧基羰基)乙氧基)苯基)-1,3,5-三嗪[BASF公司製 TINUVIN 477]、2,4-雙([1,1’-聯苯]-4-基)-6-(2-羥基-4-(1-(異辛氧基羰基)乙氧基)苯基)-1,3,5-三嗪[BASF公司製 TINUVIN 479]、2,4-雙(2-羥基-4-辛氧基苯基)-6-(2,4-二甲基苯基)-1,3,5-三嗪、2,4,6-三(2-羥基-4-辛氧基苯基)-1,3,5-三嗪等。 [0037] 本發明中(d)羥苯基三嗪類紫外線吸收劑,相對於前述(a)活化能量射線硬化性多官能單體之100質量份,以1~3質量份,又以使用2~3質量份之比例為佳。 [0038] [(e)受阻胺類光穩定劑] 本發明之硬化性組成物以(e)成份使用受阻胺類光穩定劑,尤其,以採用由式[1]表示之基鍵結而成之化合物中選擇之受阻胺類光穩定劑為特徵。上述式[1]中,Ra
表示氫原子,或碳原子數1至10之烷基,黑點表示鍵結處。 [0039] Ra
表示之碳原子數1至10之烷基,可舉例如,甲基、乙基、正丙基、異丙基、正丁基、異丁基、仲丁基、叔丁基、正戊基、異戊基、新戊基、叔戊基、仲異戊基、環戊基、正己基、環己基、正庚基、正辛基、正壬基、正癸基等。 [0040] 該些之受阻胺類光穩定劑也可使用市售品,舉例如,雙(2,2,6,6-四甲基-4-哌啶基)癸二酸酯[BASF公司製 TINUVIN 770、(股)ADEKA製 ADEKASTAB(註冊商標)LA-77Y、同LA-77G]、雙(1,2,2,6,6-五甲基-4-哌啶基)癸二酸酯[BASF公司製 TINUVIN 292、(股)ADEKA製 ADEKASTAB(註冊商標)LA-72]、雙(1,2,2,6,6-五甲基-4-哌啶)=2-((4-羥基3,5-二-叔丁基苯基)甲基)-2-丁基丙二酸酯[BASF公司製 TINUVIN 144]、四(2,2,6,6-四甲基-4-哌啶基)1,2,3,4-丁烷四羧酸酯[(股)ADEKA製 ADEKASTAB(註冊商標)LA-57]、四(1,2,2,6,6-五甲基-4-哌啶基)1,2,3,4-丁烷四羧酸酯[(股)ADEKA製 ADEKASTAB(註冊商標)LA-52]、雙(2,2,6,6-四甲基-4-哌啶基)二(十三烷基)-1,2,3,4-丁烷四羧酸酯、雙(1,2,2,6,6-五甲基-4-哌啶基)二(十三烷基)-1,2,3,4-丁烷四羧酸酯、C12-20
及C16-18
不飽和脂肪酸2,2,6,6-四甲基-4-哌啶酯[Cytec Industries公司製 CYASORB(註冊商標)UV-3853]、聚[氧基(2,2,6,6-四甲基-4-哌啶-1,4-二基)伸乙基琥珀醯基丙烯醯基]及1,5,8,12-四(4,6-雙(N-丁基-N-(1,2,2,6,6-五甲基-4-哌啶基)胺基-1,3,5-三嗪-2-基)-1,5,8,12-四氮雜十二烷之混合物[BASF公司製 TINUVIN 111FDL]、聚[(6-叔辛基胺基-1,3,5-三嗪-2,4-二基)((2,2,6,6-四甲基-4-哌啶基)亞胺基)伸六甲基((2,2,6,6-四甲基-4-哌啶基)亞胺基)][BASF公司製 CHIMASSORB(註冊商標)944]、2,4,6-三氯-1,3,5-三嗪、N,N’-雙(2,2,6,6-四甲基-4-哌啶基)-1,6-伸六甲基二胺、N-丁基-N-(2,2,6,6-四甲基-4-哌啶基)胺、二丁胺之縮聚物[BASF公司製 CHIMASSORB(註冊商標)2020]、丁烷-1,2,3,4-四羧酸二(2,2,5,5-四甲基-4-哌啶)酯及β,β,β’,β’-四甲基-2,4,8,10-四氧雜螺[5.5]十一烷-3,9-二乙醇之縮聚物[(股)ADEKA製 ADEKASTAB(註冊商標)LA-68]、丁烷-1,2,3,4-四羧酸二(1,2,2,5,5-五甲基-4-哌啶基)酯及β,β,β’,β’-四甲基-2,4,8,10-四氧雜螺[5.5]十一烷-3,9-二乙醇之縮聚物[(股)ADEKA製 ADEKASTAB(註冊商標)LA-63P]、聚[(6-嗎啉代-1,3,5-三嗪-2,4-二基)((2,2,6,6-四甲基-4-哌啶基)亞胺基)伸六甲基((2,2,6,6-四甲基-4-哌啶基)亞胺基))[Cytec Industries公司製 CYASORB(註冊商標)UV-3346]、聚[(6-嗎啉代-1,3,5-三嗪-2,4-二基)((1,2,2,6,6-五甲基-4-哌啶基)亞胺基)伸六甲基((1,2,2,6,6-五甲基-4-哌啶基)亞胺基))[Cytec Industries公司製 CYASORB(註冊商標)UV-3529]、2,2,6,6-四甲基-4-哌啶基甲基丙烯酸酯[(股)ADEKA製 ADEKASTAB(註冊商標)LA-87]、1,2,2,6,6-五甲基-4-哌啶基甲基丙烯酸酯[(股)ADEKA製 ADEKASTAB(註冊商標)LA-82]等。 [0041] 本發明中之(e)受阻胺類光穩定劑,相對於前述(a)活化能量射線硬化性多官能單體之100質量份,以使用1~2質量份之比例為佳。 [0042] [(f)溶劑] 本發明之硬化性組成物,可另外含有(f)溶劑,即可為清漆(膜形成材料)之形態。 上述溶劑,可於考量可溶解前述(a)~(e)成份,且形成後述硬化膜(硬塗覆層)時所需要之塗佈時的操作性或硬化前後之乾燥性等進行適當地選擇即可,可舉例如,苯,甲苯、二甲苯、乙苯、四氫萘等芳香烴類;n-己烷、n-庚烷、礦油精、環己烷等的脂肪族或脂環式烴類;甲基氯、甲基溴、甲基碘、二氯甲烷、氯仿、四氯化碳、三氯乙烯、全氯乙烯、鄰二氯苯等鹵化烴類;乙酸乙酯、乙酸丁酯、乙酸甲氧基丁酯、甲基溶纖劑乙酸酯、乙基溶纖劑乙酸酯、丙二醇單甲醚乙酸酯等酯類或酯醚類;二***、四氫呋喃、1,4-二噁烷、甲基溶纖劑、乙基溶纖劑、丁基溶纖劑、丙二醇單甲醚、丙二醇單***、丙二醇單正丙醚、丙二醇單異丙醚、丙二醇單-n-丙醚、丁基醚等醚類;丙酮、甲乙酮、甲基異丁基酮、二正丁基酮、環己酮等酮類;甲醇、乙醇、正丙醇、異丙醇、正丁醇、異丁醇、叔丁醇、2-乙基己醇、苯甲醇、乙二醇等醇類;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺類;二甲基亞碸等亞碸類;N-甲基-2-吡咯烷酮等雜環類化合物,以及此些中之2種以上混合溶劑。 此些(f)溶劑之使用量雖無特別限制,但例如本發明之硬化性組成物中固體部份濃度為1~70質量%,又以使用5~50質量%之濃度為較佳。此固體部份濃度(又稱非揮發物濃度)係指,相對於本發明的硬化性組成物之前述(a)~(f)成份(及依需求之其他添加劑)之總質量(總合質量)的固體部份(由全部成份移除溶劑成份者)之含有量。 [0043] [其他添加物] 又,本發明之硬化性組成物,可於不損害本發明之效果下,依需求適當混合一般添加之添加劑,例如,聚合促進劑、阻聚劑、光敏劑、調平劑、表面活性劑、密著性賦予劑、增塑劑、上述以外之紫外線吸收劑、上述以外之光穩定劑、抗氧化劑、儲存穩定劑、抗電荷劑、無機填料、顏料、染料等。 [0044] <硬化膜> 本發明之硬化性組成物,可藉由於基材上塗佈(Coating)形成塗膜,並於該塗膜照射活化能量射線使其聚合(硬化),形成硬化膜。該硬化膜也為本發明之對象。又,可由該硬化膜產生後述之硬塗覆膜中之硬塗覆層。 此情形之前述基材,可舉例如,各種樹脂(聚碳酸酯、聚甲基丙烯酸酯、聚苯乙烯、聚對苯二甲酸乙二醇酯(PET)或聚萘二甲酸乙二醇酯(PEN)等之聚酯、聚烯烴、聚醯胺、聚醯亞胺、環氧樹脂、三聚氰胺樹脂、三乙醯纖維素、丙烯腈-丁二烯-苯乙烯共聚物(ABS)、丙烯腈-苯乙烯共聚物(AS)、降冰片烯樹脂等)、金屬、木材、紙、玻璃、石板等。此些基材之形狀為板狀、薄膜狀或可為3次元成型體。 [0045] 對前述基材之塗佈方法,可由鑄塗法、旋塗法、刮刀塗佈法、浸塗法、輥塗法、噴塗法、棒塗法、模塗法、噴墨法、印刷法(凸版、凹版、平版、絲網印刷等)等進行適當選擇,其中以可利用於卷對卷(roll-to-roll)法,又由薄膜塗佈性之觀點,以使用凸版印刷法,尤其以使用凹印塗佈法等為佳。又以事前利用孔徑0.2μm左右之濾網等過濾硬化性組成物後,供於塗佈為佳。又塗佈時,可依需求於硬化性組成物中添加溶劑使其成為清漆形態。此情形之溶劑可為前述[(f)溶劑]列舉之多種溶劑。 於基材上塗佈硬化性組成物並形成塗膜後,可依需求用熱板或烤箱等對塗膜做預乾燥並去除溶劑(溶劑去除步驟)。此時之加熱乾燥條件,例如,以40~120℃,持續30秒~10分鐘左右為佳。 乾燥後,用紫外線等活化能量射線進行照射,使塗膜硬化。活化能量射線可列舉,紫外線、電子束、X光等,特別以紫外線為佳。使用紫外線之光源,可使用太陽光、化學燈、低壓汞燈、高壓汞燈、金屬鹵化物燈、氙氣燈、UV-LED等。 另外其後,也可藉由進行後燒焙,具體而言使用熱板、烤箱等進行加熱以完成聚合。 又,形成之硬化膜厚度,於乾燥、硬化後,一般為0.01~50μm,以0.05~20μm為佳。 [0046] <硬塗覆膜> 使用本發明之硬化性組成物,可於薄膜基材之至少一面(表面)製造具備硬塗覆層之硬塗覆膜。該硬塗覆膜也為本發明之對象,該硬塗覆膜為,欲保護例如觸控面板或液晶顯示器等各種顯示元件等之表面時可適當地使用。 [0047] 本發明之硬塗覆膜中的硬塗覆層,包含將前述的本發明之硬化性組成物塗佈於薄膜基材上形成塗膜之步驟,及對該塗膜照射紫外線等活化能量射線使該塗膜硬化之步驟的方法形成。 [0048] 前述薄膜基材,可使用於前述<硬化膜>列舉之基材中,可用於光學用途之各種透明樹脂製薄膜。較佳者舉例如,由聚對苯二甲酸乙二醇酯(PET)、聚對苯二甲酸丁二醇酯(PBT)、聚萘二甲酸乙二醇酯(PEN)等之聚酯、聚碳酸酯、聚甲基丙烯酸酯、聚苯乙烯、聚烯烴、聚醯胺、聚醯亞胺、三乙醯纖維素等選擇之樹脂製薄膜。 又,對前述薄膜基材上之硬化性組成物的塗佈方法(塗膜形成步驟)及對塗膜之活化能量射線照射方法(硬化步驟),可使用前述<硬化膜>列舉之方法。又本發明之硬化性組成物中含有溶劑(清漆態)之情形,塗膜形成步驟後,可依需求再含有將該塗膜乾燥以去除溶劑之步驟。該情形,可使用前述<硬化膜>所列舉之塗膜的乾燥方法(溶劑去除步驟)。 如此產生之硬塗覆層的膜厚,以1~20μm為佳,1~10μm為較佳。
[實施例] [0049] 以下,將舉出實施例,對本發明進行具體的說明,但本發明並不受下述之實施例所限制。 又,實施例中,用於試料之調製及物理性質之分析的裝置及條件,如下述所示。 [0050] (1)棒塗佈法 裝置:(股)SMT製 PM-9050MC 塗佈棒:OSG SYSTEM PRODUCTS(股)製 A-Bar OSP-30、最大濕膜厚度30μm(相當於線棒# 12) 塗佈速度:4m/分鐘 (2)烤箱 裝置:ADVANTEC東洋(股)製 無塵乾燥機 DRC433FA (3)UV硬化 裝置:HERAEUS(股)製 CV-110QC-G 燈泡:HERAEUS(股)製 高壓水銀燈H-bulb (4)膠體滲透層析儀(GPC) 裝置:TOSOH(股)製 HLC-8220GPC 層析柱:昭和電工(股)製 SHODEX(註冊商標)GPC KF-804L、GPC KF-805L 柱體溫度:40℃ 洗脫液:四氫呋喃 探測器:RI (5)離子層析儀(F定量分析) 裝置:日本DIONEX(股)製 ICS-1500 溶劑:(2.7mmol Na2
CO3
+ 0.3mmol NaHCO3
)/L水溶液 探測器:電導率 (6)膜厚 裝置:FILMETRICS(股)製 桌上式膜厚量測系統F20 (7)耐光性測試 裝置:Q-Lab公司製 加速耐候性測試儀 QUV(註冊商標)/se 光源:UVA-340型燈泡 測試條件:0.76W/cm2
、60℃、冷凝下 測試時間:72小時 (8)黃色度 裝置:KONICA MINOLTA(股)製 分光光度儀 CM-700d 量測模式:去除正反射光(SCE)模式 (9)擦傷測試 裝置:新東科學(股)製 往返式磨耗測試機 TRIBOGEAR TYPE:30S 負重:250g/cm2
掃描速度:3m/分鐘 [0051] 又,縮寫表示以下之意義。 PFPE:於兩終端介由聚(伸氧烷)基(重複單位數8~9)具有羥基之全氟聚醚[SOLVAY SPECIALTY POLYMERS公司製 FLUOROLINK 5147X] BEI:1,1-雙(丙烯醯氧基甲基)乙基異氰酸酯[昭和電工(股)製 KARENZ(註冊商標)BEI] DBTDL:二月桂酸二丁基錫[東京化成工業(股)製] DPHA:丙烯酸二季戊四醇五酯/丙烯酸二季戊四醇六酯 混合物[日本化藥(股)製 KAYALAD DN-0075] PETA:丙烯酸季戊四醇三酯/丙烯酸季戊四醇四酯 混合物[新中村化學工業(股)製 NK Ester A-TMM-3LM-N] UA:6官能脂肪族丙烯酸胺基甲酸酯寡聚物[DAICEL-ALLNEX(股)製 EBECRYL(註冊商標)5129] I2959:2-羥基-1-(4-(2-羥基乙氧基)苯基)-2-甲基丙-1-酮[BASF JAPAN(股)製 IRGACURE(註冊商標)2959] UVA1:2,4,6-三(2-羥基-4-(1-(辛氧羰基)乙氧基)苯基)-1,3,5-三嗪[BASF JAPAN(股)製 TINUVIN 477] UVA2:2,4-雙(4-丁氧基-2-羥苯基)-6-(2,4-二丁氧基苯基)-1,3,5-三嗪[BASF JAPAN(股)製 TINUVIN 460] UVA3:2,4-二([1,1’-聯苯]-4-基)-6-(2-羥基-4-(1-(異辛氧基羰基)乙氧基)苯基)-1,3,5-三嗪[BASF JAPAN(股)製 TINUVIN 479] UVA4:2,4-雙(2,4-二甲基苯基)-6-(4-(3-(2-乙基己氧基)-2-羥基丙氧基)-2-羥苯基)-1,3,5-三嗪[BASF JAPAN(股)製 TINUVIN 405] UVA5:2-(2-羥基-3-(2-苯基丙-2-基)-5-(1,1,3,3-四甲基丁基)苯基)-2H-苯並***[BASF JAPAN(股)製 TINUVIN 928] HALS1:癸二酸二(1,2,2,6,6,-五甲基哌啶-4-基)[BASF JAPAN(股)製 TINUVIN 292] HALS2:癸二酸二(2,2,6,6,-四甲基-N-辛氧基哌啶-4-基)[BASF JAPAN(股)製 TINUVIN 123] MEK:甲基乙基酮 PGME:丙二醇單甲醚 [0052] [製造例1]於兩終端介由聚(伸氧烷)基及1個胺基甲酸酯鍵結基,鍵結於丙烯醯基之全氟聚醚SM1的製造 於螺旋管中,準備PFPE 1.05g(0.5mmol)、BEI 0.26g(1.0mmol)、DBTDL 10mg(0.016mmol),及MEK 1.31g。將此混合物,使用攪拌片於室溫(約莫23℃)攪拌24小時。並將此反應混合物使用MEK 3.92g稀釋後,製得目標化合物的SM1之20質量%MEK溶液。 將所得之SM1藉由GPC之聚苯乙烯換算量測得之重量平均分子量Mw為3,400,分散度:Mw(重量平均分子量)/Mn(數量平均分子量)為1.1。又、SM1藉由F定量分析計算出之氟含量為36質量%。 [0053] [實施例1~4、比較例1~7] 根據表1之記載混合以下各成份,並調製固體部份濃度40質量%之硬化性組成物。表中,[份]表示[質量份]。 (1)多官能單體:DPHA 1.0g(50質量份)、UA 0.6g(30質量份),及PETA 0.4g(20質量份) (2)表面改性劑:根據製造例1製造之SM1溶液 0.1g(SM1為1質量份) (3)聚合引發劑:I2959 0.1g(5質量份) (4)紫外線吸收劑:表1記載之成份作為有效成份的表1記載之量 (5)光穩定劑:根據表1記載之成份,如表1記載之量 (6)溶媒:PGME 如表1記載之量 [0054] 將此硬化性組成物,使用棒塗法塗佈於A4尺寸之雙面易黏合處理PET薄膜 [TORAY(股)製 LUMIRROR(註冊商標)U403、厚度100μm]上,產生塗膜。並且,將此塗膜用烤箱於120℃下乾燥3分鐘並去除溶劑。其後,將產生之膜,於氮氣氛圍下,用曝光量300mJ/cm2
之UV光照射曝光,製成具有約莫6μm膜厚之硬塗覆層(硬化膜)的硬塗覆膜。 [0055] 將各硬化性組成物取得的硬塗覆膜之耐光性、黃色度、抗擦傷性進行評估。各評估之順序係如以下所示。其結果合併記載於表2中。 [0056] [耐光性] 對使用加速耐候性測試儀進行測試前後之硬塗覆膜,與硬塗覆層對PET薄膜的密著性進行量測,並評估其耐光性。密著性為,依指南[COTEK(股)製 CROSSCUT GUIDE CCI-2],於硬塗覆層刻上25方格(5×5、間隔2mm)之直角格子圖案的切痕,並使用寬24mm之透明膠帶[NICHIBAN(股)製 CELLOTAPE(註冊商標)CT-24]進行之百格測試法(根據JIS K 5600-5-6),其後根據以下之標準進行評估。 A:25方格全部未剝離 C:存在剝離之方格 [0057] [黃色度] 於硬塗覆膜之背面(未形成硬塗覆層之面)放置白色蓋板[L*=86.6、a*=-1.0、b*=-0.4],並量測硬塗覆層表面之顏色(L*a*b*顯色系),其後根據以下之標準進行評估。 A:b*<1.0 C:b*≧1.0 [0058] [抗擦傷性] 將硬塗覆層表面,使用裝設於往返式磨耗測試機之鋼絲絨[BONSTAR販賣(股)製 BONSTAR(註冊商標)#0000(超極細)],能加250g/cm2
之負重往返摩擦3000次,並於摩擦之部份使用油性麥克筆[ZEBRA(股)製 MACKEE極細(藍)、使用細端]畫線。其後,使用不織布擦拭布[旭化成(股)製 BEMCOT(註冊商標)M-1]擦拭畫出之線,並以目視確認其損傷程度,根據以下之標準進行評估。 A:未受到損傷,油性麥克筆畫出之線被擦拭乾淨 C:油性筆之墨水深入損傷中而無法擦拭乾淨 [0059][0060][0061] 如表1及表2所示,將於兩終端介由聚(伸氧烷)基及1個胺基甲酸酯鍵結基,鍵結丙烯醯基之全氟聚醚SM1作為硬塗覆層中之表面改性劑使用,且分別使用特定量之特定紫外線吸收劑(UVA1~UVA3)及特定受阻胺類光穩定劑HALS1之實施例1至實施例4的硬化性組成物所製成之各硬塗覆膜,即便使用加速耐候性測試儀於進行72小時之光照射前後,其對硬塗覆層之PET薄膜具有優良密著性,即得知其具有優良耐光性之結果,又,得知其具有較低黃色度且具有優良的抗擦傷性之結果。 [0062] 另一方面,使用本發明規範以外之紫外線吸收劑(UVA4、UVA5)之情形,得到雖密著性(耐光性)良好,且黃色度低,但抗擦傷性低劣之結果(比較例1及比較例2),又,使用本發明規範以外之光穩定劑(HALS2)之情形,得到雖黃色度之結果及抗擦傷性良好,但光照射後之密著性較低,耐光性低劣之結果(比較例3)。 又,使用超過規範量之紫外線吸收劑之情形,其黃色度增高(比較例4)。 此外,使用低於規範量之光穩定劑之情形(比較例5),或僅使用紫外線吸收劑或光穩定劑其中一種之情形(比較例6及比較例7),得知其黃色度之結果或抗擦傷性良好,但光照射後之密著性較低,而為耐光性低劣之結果。 [0063] 以上,如實施例之結果所示,僅組合特定之羥苯基三嗪類紫外線吸收劑及受阻胺類光穩定劑,並添加作為表面改性劑之特定全氟聚醚的本發明的硬化性組成物,於該組成物製成之硬塗覆層中,可實現滿意之抗擦傷性及耐光性,且可製得滿足該些功能之硬塗覆膜。
Claims (10)
- 一種硬化性組成物,其特徵為,含有(a)活化能量射線硬化性多官能單體100質量份、(b)於含有聚(全氟伸氧烷)基之分子鏈的兩終端,介由聚(伸氧烷)基或依順序介由聚(伸氧烷)基及1個胺基甲酸酯鍵結基,鍵結活化能量射線聚合性基之全氟聚醚0.1~10質量份、(c)可由活化能量射線產生游離基之聚合引發劑1~20質量份、(d)羥苯基三嗪類紫外線吸收劑1~3質量份,及(e)受阻胺類光穩定劑1~2質量份之硬化性組成物,前述活化能量射線硬化性多官能單體為,由多官能(甲基)丙烯酸酯化合物及多官能(甲基)丙烯酸胺基甲酸酯化合物所成之群中選出之至少1種者,前述活化能量射線聚合性基為,以下的式〔A1〕~式〔A5〕任一所示之構造或此些構造中之丙烯醯基取代為甲基丙烯醯基之構造,
- 如請求項1之硬化性組成物,其中,前述聚(全氟伸氧烷)基為,具有-[OCF2]-及-[OCF2CF2]-作為重複單位之基。
- 如請求項1或請求項2之硬化性組成物,其中,前述聚(伸氧烷)基為,具有5~12次重複單位數之聚(伸氧烷)基。
- 如請求項1或請求項2之硬化性組成物,其中,前述聚(伸氧烷)基為聚(伸氧乙烷)基。
- 如請求項1或請求項2之硬化性組成物,其中,前述活化能量射線聚合性基為,具有至少2個以上活化能量射線聚合性部位之基。
- 如請求項1或請求項2之硬化性組成物,其另含有(f)溶媒。
- 一種硬化膜,其特徵為,由請求項1至請求項6中任一項之硬化性組成物所製得者。
- 一種硬塗覆膜,其特徵為,於膜基材之至少一面具備硬塗覆層,而該硬塗覆層為由請求項7之硬化膜所形成者。
- 如請求項8之硬塗覆膜,其中,前述硬塗覆層具有1~15μm之膜厚。
- 一種硬塗覆膜之製造方法,其為於膜基材之至少一面具備硬塗覆層之硬塗覆膜之製造方法,其特徵為,包含將請求項1至請求項6中任一項之硬化性組成物塗覆於膜基材上形成塗膜之步驟、照射活化能量射線於該塗膜使之硬化之步驟者。
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