TWI710411B - Cleaning system, cleaning method of transparent substrate, and manufacturing method of electronic device - Google Patents
Cleaning system, cleaning method of transparent substrate, and manufacturing method of electronic device Download PDFInfo
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- TWI710411B TWI710411B TW107124112A TW107124112A TWI710411B TW I710411 B TWI710411 B TW I710411B TW 107124112 A TW107124112 A TW 107124112A TW 107124112 A TW107124112 A TW 107124112A TW I710411 B TWI710411 B TW I710411B
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- conveying device
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- 238000004140 cleaning Methods 0.000 title claims abstract description 334
- 239000000758 substrate Substances 0.000 title claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 238000000034 method Methods 0.000 title claims abstract description 9
- 230000033001 locomotion Effects 0.000 claims abstract description 52
- 230000003068 static effect Effects 0.000 claims abstract description 16
- 239000004744 fabric Substances 0.000 claims description 48
- 238000003825 pressing Methods 0.000 claims description 18
- 239000007788 liquid Substances 0.000 claims description 15
- 239000011521 glass Substances 0.000 description 16
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000006059 cover glass Substances 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 241000251468 Actinopterygii Species 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000012217 deletion Methods 0.000 description 1
- 230000037430 deletion Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/14—Wipes; Absorbent members, e.g. swabs or sponges
- B08B1/143—Wipes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
Landscapes
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
本發明提供一種清掃系統、透明基板的清掃方法及電子設備的製造方法。清掃系統去除附著於薄板表面的異物,包括:輸送薄板的輸送裝置;以及清掃裝置,具有與藉由輸送裝置輸送的薄板表面對置地配置的清掃部,清掃裝置包括相對移動機構,該相對移動機構在為了清掃而使清掃部直接或間接地接觸於薄板表面的狀態下使清掃部反復進行與薄板表面相對的相對性的靜止動作和移動動作。本發明具有能高效可靠地清掃薄板表面的優點。 The invention provides a cleaning system, a cleaning method of a transparent substrate, and a manufacturing method of electronic equipment. The cleaning system removes foreign matter attached to the surface of the thin plate, and includes: a conveying device for conveying the thin plate; and a cleaning device having a cleaning section disposed opposite to the surface of the thin plate conveyed by the conveying device. The cleaning device includes a relative movement mechanism, the relative movement mechanism In a state where the cleaning section is directly or indirectly in contact with the surface of the thin plate for cleaning, the cleaning section is made to repeatedly perform relative static and moving operations with respect to the surface of the thin plate. The invention has the advantage of being able to clean the surface of the thin plate efficiently and reliably.
Description
本發明關於清掃系統、透明基板的清掃方法及電子設備的製造方法。 The present invention relates to a cleaning system, a cleaning method of a transparent substrate, and a manufacturing method of an electronic device.
在可攜式電話、智慧型電話等電子設備中,使用玻璃基板。在電子設備的生產線中,作為對玻璃基板的表面進行清掃的清掃系統,已知有例如日本特開2006-272223號公報所記載的清掃系統。該公報所記載的系統為,在刮板上覆蓋織物,一邊藉由刮板將織物(cloth)按壓到玻璃基板上一邊使玻璃基板移動,由此對玻璃基板的表面進行清掃。在該公報所記載的系統中,反復進行3次使刮板從玻璃基板的一端向另一端相對移動的動作。 In electronic devices such as portable phones and smart phones, glass substrates are used. In the production line of electronic equipment, as a cleaning system that cleans the surface of a glass substrate, for example, a cleaning system described in JP 2006-272223 A is known. The system described in this publication cleans the surface of the glass substrate by covering the fabric on a squeegee and moving the glass substrate while pressing the cloth on the glass substrate by the squeegee. In the system described in this publication, the operation of relatively moving the squeegee from one end to the other end of the glass substrate is repeated three times.
[先前技術文獻] [Prior Technical Literature]
[專利文獻] [Patent Literature]
專利文獻1:日本特開2006-272223號公報。 Patent Document 1: Japanese Patent Application Publication No. 2006-272223.
但是,當在玻璃基板的表面上附著有黏接劑等那樣黏性較高的異物的情況、油等附著於玻璃基板的中央的情況下,存在如上述公報所記載的系統那樣僅藉由3次擦除也不能擦除的情況。 However, when foreign matter with high viscosity such as an adhesive or the like adheres to the surface of the glass substrate, or when oil or the like adheres to the center of the glass substrate, there is a system described in the above-mentioned gazette. The situation that cannot be erased even after erasing.
另外,在上述公報所記載的系統中,在將刮板從玻璃基板的一端向另一端相對移動後,為了下一擦除動作,再次 將刮板返回到玻璃基板的一端後進行擦除動作,所以作業效率較差,為了對大量的玻璃基板進行擦除作業,需要非常長的時間。 In addition, in the system described in the above publication, after the squeegee is relatively moved from one end of the glass substrate to the other end, for the next erasing operation, the squeegee is returned to one end of the glass substrate again and then the erasing operation is performed. Therefore, the work efficiency is poor, and it takes a very long time to erase a large number of glass substrates.
因此,本發明的技術問題在於提供一種能夠高效可靠地清掃薄板表面的清掃系統及清掃方法以及電子設備的製造方法。 Therefore, the technical problem of the present invention is to provide a cleaning system and a cleaning method that can efficiently and reliably clean the surface of a thin plate, and a manufacturing method of an electronic device.
為了解決上述技術問題而完成的發明是一種清掃系統,用於將附著於薄板表面的異物去除,該清掃系統包括:輸送裝置,用於輸送所述薄板;以及清掃裝置,具有與藉由所述輸送裝置輸送的所述薄板表面對置地配置的清掃部;所述清掃裝置包括相對移動機構,所述相對移動機構在為了清掃而使所述清掃部直接或間接地接觸於所述薄板表面的狀態下使所述清掃部反復進行相對於所述薄板表面的相對性的靜止動作和移動動作。 The invention completed in order to solve the above technical problems is a cleaning system for removing foreign objects attached to the surface of a thin plate. The cleaning system includes: a conveying device for conveying the thin plate; and a cleaning device having and A cleaning part arranged opposite to the surface of the thin plate conveyed by the conveying device; the cleaning device includes a relative movement mechanism that directly or indirectly makes the cleaning part directly or indirectly contact the surface of the thin plate for cleaning Next, the cleaning part is made to repeatedly perform a relative static motion and a moving motion with respect to the surface of the thin plate.
在該清掃系統中,藉由所述相對移動機構,在所述清掃部直接或間接地接觸於所述薄板表面的狀態下反復進行所述清掃部相對於所述薄板表面的相對性的靜止動作和移動動作,所以能夠藉由清掃部高效且可靠地去除薄板表面的異物。即,在該清掃系統中,相對於薄板表面,清掃部不僅進行相對性的移動動作還進行靜止動作,所以不僅能夠藉由動摩擦進行異物的去除還能夠藉由靜摩擦進行異物的去除,能夠可靠地去除薄板表面的異物。在這裡,所謂直接,意味著接觸面直接接觸於薄板而進行擦除,在清掃部為適於擦除薄板的構成的情況 下,清掃部直接地接觸於薄板而進行擦除。所謂間接,意味著在接觸面與薄板之間配置有織物構件等1或多個另外的構件那樣的情況,在接觸面不是適於擦除薄板的構成的情況下等,清掃部間接地接觸於薄板而擦除。 In this cleaning system, by the relative movement mechanism, the relative static motion of the cleaning portion with respect to the surface of the thin plate is repeated in a state where the cleaning portion is directly or indirectly in contact with the surface of the thin plate And moving action, so the cleaning part can efficiently and reliably remove foreign matter on the surface of the sheet. That is, in this cleaning system, with respect to the surface of the thin plate, the cleaning part performs not only a relative movement action but also a static action. Therefore, not only the removal of foreign matter by dynamic friction but also the removal of foreign matter by static friction can be performed reliably Remove foreign objects on the surface of the sheet. Here, the term “direct” means that the contact surface directly contacts the thin plate for erasing. When the cleaning portion has a structure suitable for erasing the thin plate, the cleaning portion directly contacts the thin plate for erasing. The so-called indirect means that one or more other members such as a fabric member are arranged between the contact surface and the thin plate. When the contact surface is not a structure suitable for erasing the thin plate, etc., the cleaning part is indirectly contacted with Wipe thinly.
較佳所述輸送裝置向一方向輸送由所述清掃裝置清掃的清掃狀態的所述薄板表面。由此,能夠一邊藉由輸送裝置向一方向輸送薄板一邊藉由清掃裝置對薄板的表面進行清掃。 Preferably, the conveying device conveys the surface of the thin plate in the cleaned state cleaned by the cleaning device in one direction. Thereby, the surface of the thin plate can be cleaned by the cleaning device while conveying the thin plate in one direction by the conveying device.
在該情況下,較佳所述相對移動機構在所述移動動作時使所述清掃部相對於所述薄板表面向所述一方向或者向所述一方向以及所述一方向的相反方向移動。藉由使清掃部向所述一方向以與薄板相同速度移動,能夠得到所述清掃部的靜止動作,能夠藉由靜摩擦進行異物的去除。另外,藉由使清掃部向所述一方向的相反方向移動,清掃部與薄板的相對速度變快,能夠有效且可靠地去除薄板表面的異物。 In this case, it is preferable that the relative movement mechanism moves the cleaning part in the one direction or in the direction opposite to the one direction with respect to the surface of the thin plate during the movement operation. By moving the cleaning part in the one direction at the same speed as the thin plate, a stationary operation of the cleaning part can be obtained, and the removal of foreign matter can be performed by static friction. In addition, by moving the cleaning part in the opposite direction to the one direction, the relative speed of the cleaning part and the thin plate becomes faster, and the foreign matter on the surface of the thin plate can be effectively and reliably removed.
在該情況下,較佳所述相對移動機構交替地反復進行所述一方向的移動動作以及所述相反方向的移動動作,在所述移動動作中,由所述相對移動機構移動的所述清掃部的最大移動速度比由所述輸送裝置輸送的所述薄板表面的移動速度快。由此,能夠藉由相對移動機構使清掃部在所述一方向以及所述相反方向上振動,能夠多次清掃薄板表面的相同部位。 In this case, it is preferable that the relative movement mechanism alternately repeats the movement in one direction and the movement in the opposite direction, and in the movement, the cleaning moved by the relative movement mechanism The maximum moving speed of the part is faster than the moving speed of the surface of the thin plate conveyed by the conveying device. Thereby, the cleaning part can be vibrated in the one direction and the opposite direction by the relative movement mechanism, and the same location on the surface of the thin plate can be cleaned multiple times.
較佳所述清掃裝置還包括切換機構,所述切換機構使所述清掃部在與所述薄板表面直接或間接地接觸的狀態和與所述薄板表面分離的狀態間切換。由此,藉由切換機構,能夠在使清掃部直接或間接地接觸於薄板表面的狀態下進行清掃作業,在不進行清掃作業的情況下能夠使清掃部移動到分離位置。 Preferably, the cleaning device further includes a switching mechanism that switches the cleaning portion between a state in which the cleaning portion is in direct or indirect contact with the surface of the thin plate and a state in which it is separated from the surface of the thin plate. Thus, by the switching mechanism, the cleaning operation can be performed with the cleaning unit directly or indirectly in contact with the surface of the thin plate, and the cleaning unit can be moved to the separation position without performing the cleaning operation.
較佳所述清掃部經由織物構件而間接地接觸於所述薄板表面。由此,織物構件直接地接觸於薄板表面,能夠藉由清掃作業使薄板表面的異物轉移到織物構件。 Preferably, the cleaning portion indirectly contacts the surface of the thin plate via a fabric member. Thereby, the fabric member directly contacts the surface of the thin plate, and the foreign matter on the surface of the thin plate can be transferred to the fabric member by the cleaning operation.
較佳所述清掃裝置還包括向所述清掃部供給織物構件的供給機構。由此,薄板表面的異物轉移到了織物構件時,藉由供給機構向清掃部供給新的織物構件(的部分),能夠藉由新的織物構件(的部分)進行清掃作業。 Preferably, the cleaning device further includes a supply mechanism that supplies a fabric member to the cleaning part. Thus, when foreign matter on the surface of the thin plate is transferred to the fabric member, (the part of) the new fabric member is supplied to the cleaning section by the supply mechanism, and the cleaning operation can be performed by (the part of) the new fabric member.
較佳所述清掃裝置還包括:柱狀構件,其在前端面上具有所述清掃部;以及按壓構件,其將織物構件按壓到所述柱狀構件,從而防止從所述供給機構向所述清掃部供給的長條狀的織物構件相對於所述清掃部偏移。由此,能夠藉由上述按壓構件向柱狀構件的側壁面側按壓長條狀的織物構件,在清掃作業時難以產生織物構件相對於清掃部的偏移(清掃部上的織物構件的滑動),進行精確的清掃作業。 Preferably, the cleaning device further includes: a columnar member having the cleaning portion on the front end surface; and a pressing member that presses the fabric member to the columnar member, thereby preventing from the supply mechanism to the The elongated fabric member supplied by the cleaning part is offset with respect to the cleaning part. As a result, it is possible to press the long fabric member toward the side wall surface of the columnar member by the pressing member, and it is difficult to cause the fabric member to deviate from the cleaning part during the cleaning operation (sliding of the fabric member on the cleaning part). , Carry out precise cleaning operations.
在該情況下,較佳所述柱狀構件在所述柱狀構件的前端面與側壁面之間具有邊緣。由此,能夠藉由位於邊緣的織物構件精確地去除薄板表面的異物。另外,所謂“具有邊緣”,意味著在與前端面以及側壁面交叉的方向的截面形狀上,不僅包含前端面以及側壁面經由不連續點而連續的情況,還包含前端面以及側端面經由曲率半徑3mm以下的角而連續的情況。另外,上述曲率半徑較佳為2mm以下,更佳為1mm以下。 In this case, it is preferable that the columnar member has an edge between the front end surface and the side wall surface of the columnar member. Thereby, the foreign matter on the surface of the thin plate can be accurately removed by the fabric member located at the edge. In addition, the term "having an edge" means that the cross-sectional shape in the direction intersecting the front end surface and the side wall surface includes not only the case where the front end surface and the side wall surface are continuous through discontinuities, but also the front end surface and the side end surface through the curvature. When the corners with a radius of 3mm or less are continuous. In addition, the aforementioned radius of curvature is preferably 2 mm or less, and more preferably 1 mm or less.
較佳所述輸送裝置還具有向所述清掃部供給清洗液的供給噴嘴。由此,藉由利用供給噴嘴向清掃部供給清洗液,能夠進行利用清洗液的清掃。 Preferably, the conveying device further has a supply nozzle for supplying cleaning liquid to the cleaning part. Thus, by supplying the cleaning liquid to the cleaning section by the supply nozzle, cleaning with the cleaning liquid can be performed.
較佳所述輸送裝置還具有保持所述薄板的保持部和使該保持部向所述一方向行走的軌道。由此,能夠在藉由沿 著軌道行走的保持部保持薄板的狀態下藉由清掃裝置對薄板表面進行清掃。 Preferably, the conveying device further has a holding portion that holds the thin plate, and a rail that allows the holding portion to travel in the one direction. As a result, the surface of the thin plate can be cleaned by the cleaning device in a state where the thin plate is held by the holding portion running along the rail.
較佳在該清掃系統中,包括:第一所述輸送裝置,其從薄板表面中的一面保持所述薄板;第一所述清掃裝置,其對藉由第一所述輸送裝置輸送的所述薄板的另一面進行清掃;第二所述輸送裝置,其從另一面保持藉由第一所述清掃裝置清掃了一面的所述薄板;以及第二所述清掃裝置,其對藉由第二所述輸送裝置輸送的所述薄板的一面進行清掃。由此,能夠藉由第一清掃裝置對薄板的另一面進行清掃,能夠藉由第二清掃裝置對薄板的一面進行清掃,能夠藉由該清掃系統對薄板的兩面進行清掃。 Preferably, the cleaning system includes: the first conveying device that holds the thin plate from one of the surfaces of the thin plate; the first cleaning device that faces the conveyed by the first conveying device The other side of the thin plate is cleaned; the second conveying device holds the thin plate cleaned on one side by the first cleaning device from the other side; and the second cleaning device is used for the second cleaning device The side of the thin plate conveyed by the conveying device is cleaned. Thereby, the other side of the thin plate can be cleaned by the first cleaning device, one side of the thin plate can be cleaned by the second cleaning device, and both sides of the thin plate can be cleaned by the cleaning system.
為了解決上述技術問題而完成的另外的發明,是對清掃透明基板的表面進行清掃的透明基板的清掃方法,其中,藉由由上述構成所構成的該清掃系統對所述透明基板的表面進行清掃。由此,能夠藉由該清掃系統容易且可靠地清掃透明基板的表面。 Another invention completed in order to solve the above-mentioned technical problems is a cleaning method of a transparent substrate for cleaning the surface of a transparent substrate, wherein the surface of the transparent substrate is cleaned by the cleaning system constituted by the above configuration . Thus, the surface of the transparent substrate can be easily and reliably cleaned by the cleaning system.
另外,為了解決上述技術問題而完成的另外的發明,是製造包含透明基板的電子設備的電子設備的製造方法,其中,具有利用該透明基板的清掃方法的清掃步驟。由此,能夠容易且可靠地製造使用了被清掃後的透明基板的電子設備。 In addition, another invention completed in order to solve the above-mentioned technical problems is a manufacturing method of an electronic device that manufactures an electronic device including a transparent substrate, which includes a cleaning step using the cleaning method of the transparent substrate. Thereby, the electronic device using the cleaned transparent substrate can be easily and reliably manufactured.
1A‧‧‧(第一)輸送裝置 1A‧‧‧(First) Conveying Device
1B‧‧‧(第二)輸送裝置 1B‧‧‧(Second) Conveying Device
3A‧‧‧(第一)清掃裝置 3A‧‧‧(First) Cleaning Device
3B‧‧‧(第二)清掃裝置 3B‧‧‧(Second) Cleaning Device
5‧‧‧供給機構 5‧‧‧Supply Organization
7‧‧‧主動輥 7‧‧‧Drive roller
9‧‧‧從動輥 9‧‧‧Driven roller
11‧‧‧清掃構件 11‧‧‧Cleaning components
13‧‧‧柱狀構件 13‧‧‧Columnar member
13a‧‧‧清掃面(清掃部) 13a‧‧‧cleaning surface (cleaning department)
13b‧‧‧側壁面 13b‧‧‧Side wall surface
15‧‧‧按壓構件 15‧‧‧Pressing member
17‧‧‧切換機構 17‧‧‧Switching mechanism
19‧‧‧相對移動機構 19‧‧‧Relative movement mechanism
21‧‧‧凸輪 21‧‧‧Cam
23‧‧‧傳遞構件 23‧‧‧Transfer member
25‧‧‧保持部 25‧‧‧Retention Department
27‧‧‧軌道 27‧‧‧Orbit
29‧‧‧供給噴嘴 29‧‧‧Supply nozzle
100‧‧‧清掃系統 100‧‧‧Cleaning System
C‧‧‧織物構件 C‧‧‧Fabric component
P1~P3‧‧‧位置 P1~P3‧‧‧Position
R‧‧‧邊緣 R‧‧‧Edge
T‧‧‧箭頭 T‧‧‧Arrow
W‧‧‧薄板 W‧‧‧sheet
圖1是表示本發明的一個實施方式的清掃系統的示意性主視圖。 Fig. 1 is a schematic front view showing a cleaning system according to an embodiment of the present invention.
圖2是清掃系統的第一清掃裝置的示意性主視圖。 Fig. 2 is a schematic front view of a first cleaning device of the cleaning system.
圖3是清掃系統的第二清掃裝置的示意性主視圖。 Fig. 3 is a schematic front view of a second cleaning device of the cleaning system.
圖4A是將清掃裝置的主要部分放大的示意性立體圖。 Fig. 4A is an enlarged schematic perspective view of the main part of the cleaning device.
圖4B是將清掃裝置的柱狀構件的主要部分放大的示意性主視圖。 Fig. 4B is an enlarged schematic front view of the main part of the columnar member of the cleaning device.
圖5是將清掃裝置的主要部分放大的示意性立體圖。 Fig. 5 is an enlarged schematic perspective view of the main part of the cleaning device.
圖6的(A)至(D)是用於對清掃裝置的動作進行說明的說明圖,圖6的(A)表示織物構件的供給狀態,圖6的(B)表示藉由按壓構件按壓織物構件的狀態,圖6的(C)表示供給清洗液的狀態,圖6的(D)表示清掃狀態。 6(A) to (D) are explanatory diagrams for explaining the operation of the cleaning device, FIG. 6(A) shows the supply state of the fabric member, and FIG. 6(B) shows the pressing of the fabric by the pressing member In the state of the members, FIG. 6(C) shows the state of supplying the cleaning liquid, and FIG. 6(D) shows the cleaning state.
圖7是用於對進行清掃作業時的薄板的移動速度以及清掃面的移動速度與時間的關係進行說明的概略說明圖。 FIG. 7 is a schematic explanatory diagram for explaining the relationship between the moving speed of the thin plate and the moving speed of the cleaning surface and time when the cleaning operation is performed.
圖8是用於對利用清掃裝置的清掃狀態進行說明的說明圖。 Fig. 8 is an explanatory diagram for explaining the cleaning state by the cleaning device.
[第一實施方式] [First Embodiment]
以下,適當參照圖式對本發明的一個實施方式所涉及的清掃系統進行詳細說明。 Hereinafter, the cleaning system according to an embodiment of the present invention will be described in detail with reference to the drawings as appropriate.
<清掃系統> <Cleaning System>
圖1所示的清掃系統100是用於在生產線中對異物進行清掃的系統,該異物附著於在智慧型電話、可攜式電話等電子設備中使用的覆蓋玻璃等玻璃板(薄板W)的表面。另外,作為清掃物件的薄板W並不限定於覆蓋玻璃,能夠將其他各種基板設為物件,該清掃系統100可合適地使用於俯視方形狀的透明的薄板W的清掃。 The
清掃系統100包括:輸送薄板W的輸送裝置1A、1B;以及清掃裝置3A、3B,具有與藉由輸送裝置1A、1B輸送的薄板W的表面對置地配置的作為清掃部的清掃面13a(參照圖2)。清掃系統100分別包括2個輸送裝置1A、1B以及清掃裝置3A、3B。具體地說,清掃系統100包括:第一輸送裝置1A,其吸附保持薄板W的表面中的一面而進行輸送;第一清掃裝置3A,其對藉由第一輸送裝置1A輸送的薄板W的另一面進行清掃;第二輸送裝置1B,其吸附保持藉由第一清掃裝置3A清掃了一面的薄板W的另一面而進行輸送;以及第二清掃裝置3B,其對藉由第二輸送裝置1B輸送的薄板W的一面進行清掃。另外,在必要的情況下,也能夠設置下述構件等:去除裝置,其將藉由清掃裝置3A、3B清掃後的薄板W的面上的清掃產生的灰塵等去除;層疊裝置,其在藉由清掃裝置3A、3B清掃後的薄板W的面上黏貼保護膜等。另外,該清掃系統100還包括控制輸送裝置1A、1B以及清掃裝置3A、3B等各種裝置的動作的控制裝置(圖示省略)。 The
第一輸送裝置1A將薄板W從送入裝置(未圖示)接受薄板W的位置P1輸送到向第二輸送裝置1B傳遞薄板W的位置P2。在接受薄板W的位置P1與傳遞的位置P2之間配設有第一清掃裝置3A。第一清掃裝置3A對藉由第一輸送裝置1A輸送的薄板W的一面(下表面)進行清掃。第一輸送裝置1A向一方向(從接受薄板W的位置P1朝向傳遞的位置P2的方向(X方向))輸送利用第一清掃裝置3A的清掃狀態的薄板W的表面。在這裡,所謂清掃狀態,意味著正在藉由清掃裝置3A、3B清掃薄板W的表面的狀態。另外,第一輸送裝置1A以一定的速度向一方向(以下,有時候稱為輸送方向)輸送薄板W。 The first conveying
第二輸送裝置1B將薄板W從由第一輸送裝置1A傳遞薄板W的位置P2輸送到向送出裝置(未圖示)傳遞薄板W的位置P3。在傳遞薄板W的位置P2與傳遞的位置P3之間配設有第二清掃裝置3B。第二清掃裝置3B對藉由第二輸送裝置1B輸送的薄板W的另一面(上表面)進行清掃。第二輸送裝置1B向一方向(從接受薄板W的位置P2朝向傳遞的位置P3的方向(X方向))輸送利用第二清掃裝置3B的清掃狀態的薄板W的表面。另外,第二輸送裝置1B以一定的速度向一方向輸送薄板W。 The second conveying
(第一清掃裝置) (First cleaning device)
參照圖2,第一清掃裝置3A包括相對移動機構19,所述相對移動機構19為了清掃而在使清掃面13a直接或間接地接觸於薄板W的表面的狀態下使清掃面13a反復進行與薄板W的表面相對的相對性的靜止動作和移動動作。清掃面13a經由長條狀的織物構件C而間接地接觸於薄板W的表面。織物構件C根據薄板W的種類、與薄板W的摩擦力、清洗液的吸收程度等而選擇。 2, the
如圖2所示,第一清掃裝置3A還包括向清掃面13a供給織物構件C的供給機構5。供給機構5具有架設有織物構件C的主動輥7以及從動輥9,藉由主動輥7的旋轉在薄板W的清掃後將織物構件C捲繞到主動輥7側,伴隨於此從從動輥9排出未使用的織物構件C。另外,供給機構5還具有調整張力同時供給長條狀的織物構件C的多種輥。 As shown in Fig. 2, the
供給機構5如後述那樣向兩個柱狀構件13的清掃面13a供給長條狀的織物構件C。長條狀的織物構件C首先被供給到之後接觸於薄板W的清掃面13a,然後被供給到最先接觸於薄板W的清掃面13a。換而言之,長條狀的織物構件C被向圖2的箭頭 T的方向輸送。即,主動輥7被設置得比從動輥9靠薄板W的輸送方向的相反方向(-X方向)。 The
如圖2以及圖4A和圖4B至圖6所示,第一清掃裝置3A包括分別具有清掃面13a的一對清掃構件11。具體地說,藉由輸送方向的上游側(-X方向側)的清掃構件11使用藉由後述的供給噴嘴29供給的清洗液而對薄板W進行清掃,藉由輸送方向的下游側(X方向側)的清掃構件11將附著於薄板W的表面的擦拭痕跡和/或擦拭剩餘物擦除。 As shown in FIGS. 2 and 4A, and FIGS. 4B to 6, the
各清掃構件11具有:柱狀構件13,其在前端(圖2中的柱狀構件13的上表面)具有清掃面13a;以及按壓構件15,其向柱狀構件13的側壁面13b側按壓從供給機構5向清掃面13a供給的長條狀的織物構件C(參照圖4A和圖4B至圖6)。在各清掃構件11,使一個柱狀構件13從兩側藉由一對按壓構件15夾持織物構件C。 Each cleaning
如圖4B所示,相對於柱狀構件13的前端面(清掃面13a)大致垂直地設有一對側壁面13b,柱狀構件13在前端面(清掃面13a)與側壁面13b之間具有邊緣R。具體地說,在與前端面以及側壁面13b交叉的方向的截面形狀上,前端面(清掃面13a)以及側壁面13b經由曲率半徑1mm以下的角而連續。 As shown in FIG. 4B, a pair of side wall surfaces 13b are provided substantially perpendicular to the front end surface (cleaning
柱狀構件13如圖4A和圖4B以及圖5所示,在與薄板W的輸送方向(X方向)以及薄板W的厚度方向(Z方向)雙方正交的方向(Y方向)上延伸,該正交的方向的長度被設置成與薄板W的寬度(與輸送方向正交的方向的長度)大致相同長度。柱狀構件13的材料沒有特別限定,能夠使用硬質的樹脂製的刮板。另外,柱狀構件13的前端面(清掃面13a)的形狀在與薄板W的輸送方向(X方向)以及薄板W的厚度方向(Z方向)雙方正交的方向(Y方向) 上,被設為與薄板W相對應的形狀。具體地說,在薄板W的表面形狀為平面的情況下(薄板W的表面形狀為Y方向的直線在X方向上連續的形狀的情況下),柱狀構件13的前端面被設為平面,另外,在薄板W的表面形狀的一部分為隨著朝向Y方向而向Z方向彎曲的形狀的情況下(薄板W的表面形狀為Y方向的曲線在X方向上連續的形狀的情況下),柱狀構件13的前端面被設為Y方向的曲線連續的形狀(例如,魚板形狀)。 The
第一清掃裝置3A如圖2所示,還包括切換機構17,所述切換機構17使各清掃構件11在經由織物構件C而間接地接觸於薄板W的表面的狀態和分離的狀態間切換。具體地說,切換機構17由被連結於各清掃構件11(柱狀構件13以及一對按壓構件15)、使清掃構件11以及相對移動機構19上下運動的氣缸構成,清掃構件11藉由切換機構17而上升,由此清掃面13a經由織物構件C而間接地接觸於被輸送的薄板W的表面。 As shown in FIG. 2, the
另外,切換機構17被設置成,能夠使清掃面13a經由織物構件C而間接地接觸於後述的第一輸送裝置1A的保持部25的表面。即,在清掃系統100中,能夠藉由清掃構件11對沒有保持薄板W的保持部25(參照圖1)進行清掃。 In addition, the
相對移動機構19是使清掃構件11沿著輸送方向(X方向)往復運動的機構。在這裡,圖7表示清掃構件11的速度與時間的關係。圖7中的直線K表示薄板W的輸送速度。因此,在S1的部位,薄板W與清掃構件11以相同速度移動。相對移動機構19使清掃面13a交替地反復進行輸送方向(X方向)以及其相反方向(-X方向)的移動動作,在移動動作中,相對移動機構19產生的清掃面13a的移動速度比第一輸送裝置1A產生的薄板W的表面的移動速度快(參照圖7)。換而言之,相對移動機構19在使清 掃面13a間接地接觸於薄板W的表面的狀態下使清掃面13a反復進行與薄板W的表面相對的相對性的靜止動作(圖7的S1)和移動動作。因此,在相對移動機構19中,與織物構件C的靜摩擦力以及動摩擦力交替地作用於薄板W的表面。另外,相對移動機構19產生的清掃構件11的往復運動的振幅寬度為薄板W的10分之1到40分之1的長度,相對移動機構19驅動清掃構件11,使其在1分鐘的時間內往復1000到2500之間的預定數。 The
相對移動機構19具體地說,具有:馬達(圖示省略);藉由馬達的旋轉力而旋轉的凸輪21;和將該凸輪21的旋轉力轉換為使清掃構件11(柱狀構件13以及一對按壓構件15)往復運動的驅動力而向清掃構件11傳遞的傳遞構件23。因此,藉由馬達的旋轉力進行清掃構件11的往復運動。作為該相對移動機構19,具體地說能夠使用例如曲柄搖桿機構。 The
(第一輸送裝置) (The first conveying device)
第一輸送裝置1A如圖1所示,具有:藉由吸附而保持薄板W的保持部25;沿著輸送方向(X方向)設置保持部25行走的軌道27;和使保持部25行走的驅動部(圖示省略)。而且,保持部25沿著軌道27在輸送方向(X方向)上行走的同時一邊薄板W被輸送一邊藉由第一清掃裝置3A清掃表面(下表面)。 As shown in FIG. 1, the first conveying
另外,第一輸送裝置1A還具有向清掃面13a供給清洗液的供給噴嘴29。該供給噴嘴29在清掃面13a進行的薄板W的表面的清掃前向清掃面13a供給清洗液。具體地說,供給噴嘴29被設置於保持部25,與保持部25一起在輸送方向(X方向)上移動。該供給噴嘴29在薄板W的輸送時向清掃作業開始前的輸送方向的上游側(-X方向側)的清掃面13a供給清洗液。另外,供 給噴嘴29也可以向輸送方向的下游側(X方向側)的清掃面13a也供給微量的清洗液,另外也可以不供給。供給噴嘴29被設置於保持部25的輸送方向側(X方向側)。另外,供給噴嘴29在Y方向上延伸,該正交的方向的長度被設置為與清掃面13a的長度(Y方向的長度)大致相同長度。 In addition, the first conveying
第一輸送裝置1A在傳遞薄板W的位置P2具有為了傳遞薄板W而使保持部25下降的上下運動機構(圖示省略)。 The first conveying
(第二清掃裝置) (Second cleaning device)
第二清掃裝置3B包括與第一清掃裝置3A大致同樣的構成,對薄板W的清掃完畢的面的相反面(上表面)進行清掃。另外,第二清掃裝置3B如圖3所示,包括與第一清掃裝置3A上下顛倒地配置的構成,對於具有與第一清掃裝置3A相同構成或功能的構件在圖3中使用相同元件符號,詳細的說明省略。 The
(第二輸送裝置) (Second conveying device)
第二輸送裝置1B是包括與第一輸送裝置1A大致同樣的構成、對藉由第二清掃裝置3B清掃的薄板W進行輸送的裝置。另外,在第二輸送裝置1B中,對於具有與第一輸送裝置1A相同構成或功能的構件使用相同元件符號,詳細的說明省略。 The second conveying
第二輸送裝置1B具有載置有從第一輸送裝置1A接受的薄板W的保持部25。該保持部25從薄板W的下表面支承,具有吸附孔,藉由吸附而保持薄板W。 The second conveying
另外,第二輸送裝置1B也可以在接受薄板W的位置P2具有為了接受薄板W而使保持部25上升的上下運動機構(圖示省略)。 In addition, the second conveying
<動作> <action>
接下來,對清掃系統100進行的動作進行說明。 Next, the operation performed by the
首先,從送入裝置向第一輸送裝置1A的保持部25傳遞薄板W(圖1的位置P1)。然後,第一輸送裝置1A的保持部25向輸送方向(X方向)移動的同時,在供給噴嘴29位於清掃面13a時從供給噴嘴29向第一清掃裝置3A的清掃面13a(與其接觸的織物構件C的一部分)供給清洗液。 First, the sheet W is transferred from the feeding device to the holding
在清掃時,向清掃面13a供給織物構件C的新的部分。具體地說,如圖6的(A)所示,在一對按壓構件15分離的狀態(將按壓構件15進行的對織物構件C的向柱狀構件13的側壁面13b側的按壓解除的狀態)下,藉由供給機構5的主動輥7旋轉,從從動輥9排出未使用的織物構件C,向清掃面13a供給織物構件C的新的部分。然後,如圖6的(B)所示,藉由一對按壓構件15向柱狀構件13移動,由一對按壓構件15將織物構件C向柱狀構件13的側壁面13b側按壓。在該狀態下,織物構件C與柱狀構件13作為一體而移動。換而言之,織物構件C不會相對於柱狀構件13偏移。接下來,如上述那樣,供給噴嘴29向清掃面13a供給清洗液(參照圖6的(C))。然後,如圖6的(D)那樣,清掃構件11(柱狀構件13以及一對按壓構件15)藉由切換機構17而向被輸送的薄板W側移動(上升)。 At the time of cleaning, a new part of the fabric member C is supplied to the
此時如圖8的(A)那樣,清掃面13a位於薄板W的輸送方向端部。清掃構件11從該狀態向-X方向移動。在如圖8的(B)那樣清掃構件11向-X方向移動預定的距離時,清掃構件11向X方向移動(圖8的(C))。然後,清掃構件11向X方向移動預定距離後,再次向-X方向移動。在該動作之間薄板W被始終以預 定速度向X方向輸送。在該動作中,在薄板W與清掃構件11以相同方向以及速度移動的定時,藉由清掃構件11,靜止摩擦力作用於向薄板W以及薄板W上的異物。另一方面,在靜摩擦力作用的定時以外,動摩擦力作用於薄板以及薄板W上的異物。由此進行清掃構件11的相對的移動動作以及靜止動作進行的清掃,不僅進行利用動摩擦的異物的去除(擦除動作)還進行利用靜摩擦的異物的去除(擦除動作),對薄板W的下表面進行清掃。 At this time, as shown in FIG. 8(A), the
薄板W相對於清掃構件11向X方向不斷移動,在清掃構件11位於薄板W的-X方向側端部(圖8的(D))後,與此前同樣,清掃構件11向X方向移動預定距離(圖8的(E))。於是,之後清掃部向-X方向移動預定距離。在清掃構件11擦除幾次薄板W的-X方向端部後,清掃構件11從薄板W分離(圖8的(F)以及圖8的(G))。另外,圖8的(A)到圖8的(G)為了理解構成以及動作而藉由與實際的比例尺不同的比例尺表達。 The thin plate W is continuously moved in the X direction relative to the cleaning
藉由第一清掃裝置3A進行了上表面的清掃的薄板W被從第一輸送裝置1A向第二輸送裝置1B傳遞(圖1的位置P2)。具體地說,第一輸送裝置1A的保持部25藉由氣缸而向下方移動(圖1的W1),在由保持部25保持的薄板W接觸於第二輸送裝置1B的保持部25的時間點,第一輸送裝置1A的保持部25進行的吸附保持結束,同時開始第二輸送裝置1B的保持部25進行的吸附保持。 The sheet W on which the upper surface has been cleaned by the
這樣一來,在從第一輸送裝置1A向第二輸送裝置1B傳遞薄板W後,藉由第二輸送裝置1B以及第二清掃裝置3B,也進行與第一輸送裝置1A以及第一清掃裝置3A同樣的動作,進行薄板W的下表面的清掃。而且,藉由第二清掃裝置3B進行了下表面的清掃的薄板W被向送出裝置傳遞(圖1的位置P3)。 In this way, after the sheet W is transferred from the first conveying
另一方面,將薄板W傳遞到第二輸送裝置1B的第一輸送裝置1A的保持部25返回到圖1的位置P1。同樣,將薄板W傳遞到送出裝置的第二輸送裝置1B的保持部25返回到圖1的位置P2。在保持部25返回到各位置時也能夠藉由清掃構件11清掃保持部25。 On the other hand, the holding
<電子設備的製造方法> <Method of Manufacturing Electronic Equipment>
接下來,對使用上述的清掃系統100的電子設備的製造方法進行說明。該電子設備的製造方法具有使用清掃系統100對作為薄板W的透明基板進行清掃的步驟。在該清掃步驟中,使用清掃系統100,對透明基板的兩面進行清掃。 Next, a method of manufacturing an electronic device using the
<優點> <Advantages>
在利用清掃系統100的清掃時,如上述那樣清掃面13a不但相對於薄板W的表面進行相對性的移動動作還進行靜止動作,所以不但能夠進行動摩擦所引起的異物的去除還能夠進行靜摩擦所引起的異物的去除,能夠可靠地去除薄板W表面的異物。即,靜摩擦在異物上作用比動摩擦更強的力,所以能夠更有效地去除異物。 When cleaning with the
另外,清掃面13a相對於薄板W的表面沿著輸送方向往復運動,清掃面13a向輸送方向以及其相反方向的雙方移動,所以與僅使力向一方向作用的情況相比,向不同的多個方向的力作用於異物,能夠有效地去除異物。 In addition, the
即使在黏著力較強的異物附著於薄板W的情況下,也能夠藉由柱狀構件13的邊緣R多次向異物施加衝擊力,所以容易去除黏著力較強的異物。 Even when a foreign object with a strong adhesive force is attached to the thin plate W, the edge R of the
進而,清掃面13a在沿著輸送方向的方向上相對於薄板W的表面移動,所以藉由採用與薄板W的形狀對應的清掃面13a,能夠使用於各種薄板W的清掃。具體地說,例如,即使是液晶面板那樣在玻璃的周圍設有端子的清掃對象物(薄板W)、將玻璃基板嵌入到框中的清掃物件物(薄板W)、具有彎曲的曲面的3D玻璃(薄板W)等那樣、不是僅由簡單的平坦平面構成的清掃物件物,也能夠藉由設置沿著其形狀的清掃面13a而進行精確的清掃。特別是,清掃裝置3A、3B包括切換機構17,所以藉由使清掃面13a僅在清掃物件的部分接觸於薄板W、然後使其分離,對具有特殊形狀的薄板W也能夠精確地對清掃物件的部分進行清掃。 Furthermore, the
[其他的實施方式] [Other embodiments]
本次公開的實施方式應該被視為在所有的方面是例示而不是限制性的。本發明的範圍並不限定於上述實施方式的構成和數值,藉由申請專利範圍表示,其含義包含與申請專利範圍均等的意義以及範圍內的所有的變更(構成的置換、附加以及刪除)。 The embodiments disclosed this time should be regarded as illustrative in all aspects and not restrictive. The scope of the present invention is not limited to the configuration and numerical values of the above-mentioned embodiments, and is expressed by the scope of patent application, and its meaning includes the meaning equivalent to the scope of patent application and all changes (substitution, addition, and deletion of the configuration) within the scope.
即,在上述實施方式中,對供給清洗液的供給噴嘴被設置於輸送裝置的情況進行了說明,但本發明並不限定於此。例如,供給噴嘴可以設置於清掃裝置,具體地說,也能夠將供給噴嘴設置成向一對清掃部之間的織物構件供給清洗液。另外,在將供給噴嘴設置於輸送裝置的保持部的情況下,也並不限定於將供給噴嘴設置於保持部的輸送方向側,也能夠設置於輸送方向的相反方向側(-X方向側)。 That is, in the above-mentioned embodiment, the case where the supply nozzle for supplying the cleaning liquid is provided in the conveying device has been described, but the present invention is not limited to this. For example, the supply nozzle may be provided in the cleaning device. Specifically, the supply nozzle may be provided to supply the cleaning liquid to the fabric member between the pair of cleaning parts. In addition, when the supply nozzle is provided in the holding part of the conveying device, it is not limited to the provision of the supply nozzle on the conveying direction side of the holding part, and can also be provided on the opposite side of the conveying direction (-X direction side). .
另外,在上述實施方式中對作為柱狀構件使用樹脂 製的刮板進行了說明,但也能夠不使用樹脂而使用金屬等而藉由樹脂、橡膠等覆蓋於前端面那樣的構件,或作為柱狀構件採用墊板等。 In addition, in the above-mentioned embodiment, the use of a resin blade as the columnar member is described, but instead of resin, metal or the like can be used, and a member such as resin, rubber, etc. covering the tip surface, or as a column The shape member uses a backing plate or the like.
進而,也可以在柱狀構件的前端面(清掃面)上形成槽,而設為摩擦力等比前端面為平面的情況下更容易作用的構成。 Furthermore, a groove may be formed in the front end surface (cleaning surface) of the columnar member, and a structure such as frictional force may be easier to act than when the front end surface is a flat surface.
在上述實施方式中對清掃面往復運動的方案進行了說明,但也能夠使清掃面斷續地向一方向移動、即反復進行向一方向移動以及停止的構成進行作用。進而,清掃面的移動方向並不限定於薄板W的輸送方向(X方向)和/或其相反方向,也可以使其向其他的方向移動,換而言之,也可以為使其向3個方向以上的方向移動的構成。在該情況下,不同的方向的力作用於異物,所以更容易去除異物。 In the above-mentioned embodiment, the reciprocating motion of the cleaning surface has been described, but it is also possible to effect a configuration in which the cleaning surface is intermittently moved in one direction, that is, repeated in one direction and stopped. Furthermore, the moving direction of the cleaning surface is not limited to the conveying direction (X direction) of the sheet W and/or the opposite direction, and it may be moved in other directions. In other words, it may be moved in three directions. The structure moves in the direction above the direction. In this case, forces in different directions act on the foreign matter, so it is easier to remove the foreign matter.
在上述實施方式中對以一定速度輸送薄板W的同時清掃面往復運動而擦除薄板W的表面的構成進行了說明,但也可以為在清掃狀態下不輸送薄板W而柱狀構件13移動的構成。 In the above embodiment, the structure in which the cleaning surface reciprocates while the sheet W is conveyed at a constant speed to erase the surface of the sheet W has been described, but the
在上述實施方式中,使2個清掃構件11雙方向X方向以及-X方向移動(往復運動),但本發明並不限定於此。也可以是不使薄板W的輸送方向上的後方側的清掃構件11往復運動的構成。在使其往復運動的情況下,具有擦拭痕跡等在靜摩擦作用的部位殘留的可能性,但藉由該構成能夠防止擦拭痕跡殘留。 In the above-mentioned embodiment, the two
在上述實施方式中,說明了由相對移動機構19移動的清掃構件11的往復運動的振幅寬度為薄板W的10分之1到40分之1的長度、相對移動機構19以在1分鐘的時間內往復1000到 2500之間的預定數的方式驅動清掃構件11的構成,但本發明並不限定於此。振幅寬度也可以為薄板W的5分之1左右或50分之1左右,1分鐘的時間內的往復次數也可以為500左右或3000左右。使其快速移動時,作用於異物的力變大,所以有效,但靜摩擦力作用的次數較多一方容易去除異物。較佳藉由薄板的材質和/或清掃環境等確定最合適的條件。 In the above-mentioned embodiment, the amplitude width of the reciprocating motion of the cleaning
另外,在上述實施方式中,對對薄板的兩面進行清掃進行了說明,但也可以僅對薄板的一面進行清掃。在該情況下,可以採用第一清掃裝置以及第一輸送裝置、或第二清掃裝置以及第二輸送裝置。 In addition, in the above-mentioned embodiment, the cleaning of both sides of the thin plate was described, but only one side of the thin plate may be cleaned. In this case, the first cleaning device and the first conveying device, or the second cleaning device and the second conveying device may be used.
在上述實施方式中,輸送裝置一邊吸附保持一邊輸送薄板W,但本發明並不限定於此,也可以藉由其他的技術方案保持輸送,例如,也能夠採用機械的、物理地保持薄板W的構成。 In the above-mentioned embodiment, the conveying device conveys the sheet W while adsorbing and holding it. However, the present invention is not limited to this, and other technical solutions may also be used to maintain the conveyance. For example, it is also possible to use mechanical and physical holding of the sheet W. constitute.
在上述實施方式中,採用了藉由清掃面清掃薄板的構成,但本發明並不限定於此,也能夠採用線狀或點狀地接觸於薄板而清掃的構成。 In the above-mentioned embodiment, the structure in which the thin plate is cleaned by the cleaning surface is adopted, but the present invention is not limited to this, and a structure in which the thin plate is cleaned by contacting the thin plate in a linear or dotted manner can also be adopted.
在上述實施方式中,對清掃平板狀的薄板的情況進行了說明,但本發明並不限定於此,也能夠適用於對在作為清掃物件的部位的周邊配置有不需要清掃的構件的物件物進行清掃的情況、不是平板而設有突出部分的薄板。 In the above embodiment, the case of cleaning a flat sheet is described, but the present invention is not limited to this, and can also be applied to an object in which a member that does not need to be cleaned is arranged around the part as the cleaning object When cleaning, it is not a flat plate but a thin plate provided with protruding parts.
進而,在上述實施方式中,對柱狀構件具有與薄板的寬度大致相同長度的方案進行了說明,但本發明並不限定於此。例如,也能夠設為柱狀構件具有比薄板的寬度大的長度的方案,在該情況下,能夠相對於各種寬度的薄板進行清掃。進而,在清掃寬度方向兩端突出的形狀的薄板時,藉由採用長度 比薄板的寬度短的柱狀構件,能夠避開突出部分,或一邊擦除突出部分一邊對清掃面進行清掃。 Furthermore, in the above-described embodiment, the columnar member has been described having a length approximately the same as the width of the thin plate, but the present invention is not limited to this. For example, the columnar member may have a length larger than the width of the thin plate. In this case, cleaning can be performed with respect to thin plates of various widths. Furthermore, when cleaning a thin plate of a shape protruding at both ends in the width direction, by using a columnar member having a length shorter than the width of the thin plate, the protrusion can be avoided or the cleaning surface can be cleaned while erasing the protrusion.
本發明的清掃系統,本發明的透明板清掃系統能夠合適地利用於可攜式裝置的表示裝置所使用的玻璃基板等透明板的清掃。 The cleaning system of the present invention and the transparent plate cleaning system of the present invention can be suitably used for cleaning transparent plates such as glass substrates used in display devices of portable devices.
1A‧‧‧(第一)輸送裝置 1A‧‧‧(First) Conveying Device
1B‧‧‧(第二)輸送裝置 1B‧‧‧(Second) Conveying Device
3A‧‧‧(第一)清掃裝置 3A‧‧‧(First) Cleaning Device
3B‧‧‧(第二)清掃裝置 3B‧‧‧(Second) Cleaning Device
25‧‧‧保持部 25‧‧‧Retention Department
27‧‧‧軌道 27‧‧‧Orbit
29‧‧‧供給噴嘴 29‧‧‧Supply nozzle
100‧‧‧清掃系統 100‧‧‧Cleaning System
P1~P3‧‧‧位置 P1~P3‧‧‧Position
W‧‧‧薄板 W‧‧‧sheet
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JP2019018127A (en) | 2019-02-07 |
CN114669568A (en) | 2022-06-28 |
CN109248892B (en) | 2022-04-15 |
CN113172066A (en) | 2021-07-27 |
TW201908023A (en) | 2019-03-01 |
CN109248892A (en) | 2019-01-22 |
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