TWI671796B - 曝光裝置 - Google Patents

曝光裝置 Download PDF

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Publication number
TWI671796B
TWI671796B TW104137474A TW104137474A TWI671796B TW I671796 B TWI671796 B TW I671796B TW 104137474 A TW104137474 A TW 104137474A TW 104137474 A TW104137474 A TW 104137474A TW I671796 B TWI671796 B TW I671796B
Authority
TW
Taiwan
Prior art keywords
light
pattern
unit
exposure
amplitude
Prior art date
Application number
TW104137474A
Other languages
English (en)
Chinese (zh)
Other versions
TW201633370A (zh
Inventor
奧山隆志
菊地信司
Original Assignee
日商奧克製作所股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2014247283A external-priority patent/JP6425521B2/ja
Priority claimed from JP2014247305A external-priority patent/JP6425522B2/ja
Priority claimed from JP2015069067A external-priority patent/JP6486167B2/ja
Application filed by 日商奧克製作所股份有限公司 filed Critical 日商奧克製作所股份有限公司
Publication of TW201633370A publication Critical patent/TW201633370A/zh
Application granted granted Critical
Publication of TWI671796B publication Critical patent/TWI671796B/zh

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Automatic Focus Adjustment (AREA)
TW104137474A 2014-12-05 2015-11-13 曝光裝置 TWI671796B (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2014247283A JP6425521B2 (ja) 2014-12-05 2014-12-05 露光装置
JP2014-247305 2014-12-05
JP2014-247283 2014-12-05
JP2014247305A JP6425522B2 (ja) 2014-12-05 2014-12-05 露光装置
JP2015-069067 2015-03-30
JP2015069067A JP6486167B2 (ja) 2015-03-30 2015-03-30 露光装置、露光装置用測光装置、および露光方法

Publications (2)

Publication Number Publication Date
TW201633370A TW201633370A (zh) 2016-09-16
TWI671796B true TWI671796B (zh) 2019-09-11

Family

ID=56135279

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104137474A TWI671796B (zh) 2014-12-05 2015-11-13 曝光裝置

Country Status (3)

Country Link
KR (1) KR102413894B1 (ko)
CN (1) CN105676596B (ko)
TW (1) TWI671796B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7320986B2 (ja) * 2019-05-22 2023-08-04 キヤノン株式会社 露光装置及び物品の製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002203762A (ja) * 2000-12-27 2002-07-19 Nikon Corp 露光量設定方法、露光装置、及びデバイス製造方法
JP2004233749A (ja) * 2003-01-31 2004-08-19 Pentax Corp パターン描画装置用照明システムおよびパターン描画装置
JP2007003861A (ja) * 2005-06-24 2007-01-11 Fujifilm Holdings Corp 露光方法および装置
JP2009246165A (ja) * 2008-03-31 2009-10-22 Dainippon Screen Mfg Co Ltd 露光装置
JP2009262161A (ja) * 2008-04-22 2009-11-12 Olympus Corp 修正装置、修正方法、制御装置、およびプログラム
JP2013077677A (ja) * 2011-09-30 2013-04-25 Dainippon Screen Mfg Co Ltd 描画装置およびその焦点調整方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10326734A (ja) * 1997-05-26 1998-12-08 Nikon Corp 合焦位置検出方法及び該方法を使用する投影露光装置
JP2007017897A (ja) * 2005-07-11 2007-01-25 Fujifilm Holdings Corp 露光装置及び洗浄方法
JP4885029B2 (ja) 2007-03-28 2012-02-29 株式会社オーク製作所 露光描画装置
KR20100093696A (ko) * 2009-02-17 2010-08-26 삼성전자주식회사 노광 장치와 이를 이용한 빔 위치 측정 및 주소 지정 방법
JP2013178445A (ja) * 2012-02-29 2013-09-09 Hitachi High-Technologies Corp 露光装置、露光方法、及び表示用パネル基板の製造方法
JP5801737B2 (ja) * 2012-03-16 2015-10-28 株式会社Ｓｃｒｅｅｎホールディングス 検査装置、露光装置及び検査方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002203762A (ja) * 2000-12-27 2002-07-19 Nikon Corp 露光量設定方法、露光装置、及びデバイス製造方法
JP2004233749A (ja) * 2003-01-31 2004-08-19 Pentax Corp パターン描画装置用照明システムおよびパターン描画装置
JP2007003861A (ja) * 2005-06-24 2007-01-11 Fujifilm Holdings Corp 露光方法および装置
JP2009246165A (ja) * 2008-03-31 2009-10-22 Dainippon Screen Mfg Co Ltd 露光装置
JP2009262161A (ja) * 2008-04-22 2009-11-12 Olympus Corp 修正装置、修正方法、制御装置、およびプログラム
JP2013077677A (ja) * 2011-09-30 2013-04-25 Dainippon Screen Mfg Co Ltd 描画装置およびその焦点調整方法

Also Published As

Publication number Publication date
TW201633370A (zh) 2016-09-16
CN105676596B (zh) 2018-12-07
CN105676596A (zh) 2016-06-15
KR102413894B1 (ko) 2022-06-28
KR20160068654A (ko) 2016-06-15

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