TWI657311B - Photosensitive resin composition, and color resistor structure and display using the same - Google Patents
Photosensitive resin composition, and color resistor structure and display using the same Download PDFInfo
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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Abstract
一種感光性樹脂組成物、及應用其之彩色光阻結構和顯示器。感光性樹脂組成物包括著色劑、樹脂、光聚合單體、光聚合引發劑以及溶劑。著色劑包括顏料及染料。樹脂包括具有羥基的第一單體單元和具有酯類官能基的第二單體單元，第一單體單元和第二單體單元的總和佔樹脂的30mol%以上。 A photosensitive resin composition, a color photoresist structure and a display using the same. The photosensitive resin composition includes a colorant, a resin, a photopolymerizable monomer, a photopolymerization initiator, and a solvent. Colorants include pigments and dyes. The resin includes a first monomer unit having a hydroxyl group and a second monomer unit having an ester functional group. The total of the first monomer unit and the second monomer unit accounts for more than 30 mol% of the resin.
Description
本揭露是關於一種感光性樹脂組成物。本揭露也關於一種由所述感光性樹脂組成物所形成的彩色光阻結構。本揭露還關於一種包括所述彩色光阻結構的顯示器。 This disclosure relates to a photosensitive resin composition. The present disclosure also relates to a color photoresist structure formed from the photosensitive resin composition. The disclosure also relates to a display including the color photoresist structure.
在顯示器中，普遍地使用彩色濾光片等濾色結構來控制各畫素的顏色。舉例來說，在較早期的液晶顯示器中，彩色濾光片被形成在相對於薄膜電晶體基板的基板上，其通常被稱為彩色濾光片基板。彩色濾光片可包括多種顏色的彩色光阻結構，例如是但不限於紅色、綠色、和藍色的光阻結構。這些光阻結構可以使用樹脂組成物，特別是感光性樹脂組成物來形成。一般來說，為了配合各種類型的顯示器應用，感光性樹脂組成物的成分的可加以調整和最佳化。 In a display, a color filter structure such as a color filter is commonly used to control the color of each pixel. For example, in earlier liquid crystal displays, a color filter was formed on a substrate opposite to a thin film transistor substrate, which is often referred to as a color filter substrate. The color filter may include color resist structures of multiple colors, such as, but not limited to, red, green, and blue resist structures. These photoresist structures can be formed using a resin composition, especially a photosensitive resin composition. Generally, the composition of the photosensitive resin composition can be adjusted and optimized to match various types of display applications.
本揭露係有關於一種感光性樹脂組成物、及應用其之彩色光阻結構和顯示器。實施例之感光性樹脂組成物具有良好的耐熱性與耐溶劑性。 This disclosure relates to a photosensitive resin composition, and a color photoresist structure and a display using the same. The photosensitive resin composition of the Example has good heat resistance and solvent resistance.
根據本揭露之一實施例，提出一種感光性樹脂組成物。
此感光性樹脂組成物包括著色劑、樹脂、光聚合單體、光聚合引發劑以及溶劑。所述著色劑包括顏料及染料。所述樹脂包括第一單體單元和第二單體單元，所述第一單體單元和所述第二單體單元的總和佔所述樹脂的30mol%以上，所述第一單體單元具有如化學式1所示的結構：
所述第二單體單元具有如化學式2所示的結構：[化學式2]
其中R1和R2分別獨立地為碳數1至10的烷基，n和m分別獨立地為正整數，R3表示氫原子或碳數1至2的烷基。 Wherein R 1 and R 2 are each independently an alkyl group having 1 to 10 carbon atoms, n and m are each independently a positive integer, and R 3 represents a hydrogen atom or an alkyl group having 1 to 2 carbon atoms.
根據本揭露之另一實施例，提出一種彩色光阻結構。此彩色光阻結構由例如是前述的感光性樹脂組成物所形成。 According to another embodiment of the present disclosure, a color photoresist structure is provided. This color photoresist structure is formed of, for example, the aforementioned photosensitive resin composition.
根據本揭露之更一實施例，提出一種顯示器。此顯示器包括例如是前述的彩色光阻結構。 According to a further embodiment of the present disclosure, a display is provided. This display includes, for example, the aforementioned color photoresist structure.
為了對本揭露之上述及其他方面有更佳的瞭解，下文特舉實施例，作詳細說明如下： In order to have a better understanding of the above and other aspects of this disclosure, the following specific examples are described in detail below:
以下係提出各種實施例進行詳細說明，實施例僅用以作為範例說明，並不會限縮本揭露欲保護之範圍，本揭露仍可採用其他特徵、元件、方法及參數來加以實施。實施例的提出，僅係用以例示 本揭露的技術特徵，並非用以限定本揭露的申請專利範圍。該技術領 域中具有通常知識者，將可根據以下說明書的描述，在不脫離本揭露的精神範圍內，作均等的修飾與變化。 The following is a detailed description of various embodiments. The embodiments are only used as examples, and do not limit the scope of the disclosure. The disclosure can still be implemented by using other features, components, methods and parameters. The examples are provided for illustration only The technical features of this disclosure are not intended to limit the scope of patent application of this disclosure. The technical collar Those with ordinary knowledge in the domain will be able to make equal modifications and changes in accordance with the description in the following description without departing from the spirit of this disclosure.
本揭露的一些實施例是關於一種感光性樹脂組成物。此種感光性樹脂組成物包括著色劑(A)、樹脂(B)、光聚合單體(C)、光聚合引發劑(D)、和溶劑(E)。其中，著色劑(A)包括顏料(A-1)及染料(A-2)。樹脂(B)包括具有羥基的第一單體單元(B-1)和具有酯類官能基的第二單體單元(B-2)，第一單體單元(B-1)和第二單體單元(B-2)的總和佔樹脂(B)的30mol%以上。 Some embodiments of the present disclosure relate to a photosensitive resin composition. Such a photosensitive resin composition includes a colorant (A), a resin (B), a photopolymerization monomer (C), a photopolymerization initiator (D), and a solvent (E). Among them, the colorant (A) includes a pigment (A-1) and a dye (A-2). The resin (B) includes a first monomer unit (B-1) having a hydroxyl group and a second monomer unit (B-2) having an ester functional group, the first monomer unit (B-1), and the second monomer The total of the body units (B-2) accounts for 30 mol% or more of the resin (B).
在此，所述著色劑(A)、顏料(A-1)、染料(A-2)、樹脂(B)、第一單體單元(B-1)、第二單體單元(B-2)、光聚合單體(C)、光聚合引發劑(D)和溶劑(E)等成分用詞，獨立地可包括單一種或多種著色劑(A)、顏料(A-1)、染料(A-2)、樹脂(B)、第一單體單元(B-1)、第二單體單元(B-2)、光聚合單體(C)、光聚合引發劑(D)和溶劑(E)等該成分的情況。 Here, the colorant (A), pigment (A-1), dye (A-2), resin (B), first monomer unit (B-1), and second monomer unit (B-2) ), Photopolymerization monomer (C), photopolymerization initiator (D), and solvent (E) and other component terms may independently include a single or multiple colorants (A), pigments (A-1), dyes ( A-2), resin (B), first monomer unit (B-1), second monomer unit (B-2), photopolymerization monomer (C), photopolymerization initiator (D), and solvent ( E) When waiting for this component.
根據本揭露的實施例的感光性樹脂組成物，經由調整樹脂(B)的組成，第一單體單元(B-1)的羥基和第二單體單元(B-2)的酯類官能基可發生縮合(condensation)反應，使得第一單體單元(B-1)和第二單體單元(B-2)之間進一步交聯聚合，而形成交聯度較高而較堅固的樹脂結構，而能夠使得樹脂結構具有較高的耐熱性，進而可以避免在後續製程(例如TFT-LCD製程)中的高溫熱處理(例如高溫烘烤)對於感光性樹脂組成物造成破壞。 According to the photosensitive resin composition according to the embodiment of the present disclosure, by adjusting the composition of the resin (B), the hydroxyl group of the first monomer unit (B-1) and the ester functional group of the second monomer unit (B-2) A condensation reaction can occur, which can further cross-link and polymerize the first monomer unit (B-1) and the second monomer unit (B-2) to form a resin structure with a higher degree of crosslinking and a stronger resin. , And can make the resin structure have higher heat resistance, and further avoid the high temperature heat treatment (such as high temperature baking) in the subsequent process (such as TFT-LCD process) from damaging the photosensitive resin composition.
此外，一般而言，染料分子在溶液中具有較高的溶解性，當染料分子從感光性樹脂組成物的樹脂結構中溶解至外部的溶液時會造成褪色的現象，而根據本揭露的實施例，第一單體單元(B-1)和第二單體單元(B-2)之間進一步交聯聚合，而形成立體交聯度較高而包覆性較佳的樹脂結構，因此可以使得染料分子能夠被交聯結構包覆在其中，而能夠較佳地固定於此交聯結構中，因而使得本揭露之感光性樹脂組成物具有較佳的耐溶劑性而不易發生褪色的現象，如此一來，可以避免在後續製程(例如TFT-LCD製程)中的製程浴槽處理(例如化學藥劑洗淨處理)對於感光性樹脂組成物造成破壞。 In addition, generally speaking, the dye molecules have a high solubility in the solution. When the dye molecules are dissolved from the resin structure of the photosensitive resin composition to an external solution, the phenomenon of discoloration will be caused. According to the embodiments of the present disclosure, , The first monomer unit (B-1) and the second monomer unit (B-2) are further cross-linked and polymerized to form a resin structure with a higher degree of three-dimensional cross-linking and better coating properties, so that The dye molecule can be covered by the cross-linked structure, and can be better fixed in the cross-linked structure, so that the photosensitive resin composition disclosed herein has better solvent resistance and is less prone to discoloration. In this way, it is possible to avoid damage to the photosensitive resin composition by a bath process (for example, a chemical cleaning process) in a subsequent process (for example, a TFT-LCD process).
更進一步，第一單體單元(B-1)的羥基能夠提高樹脂結構的溶解性，而使得感光性樹脂組成物具有良好的耐熱性及耐溶劑性時仍能具有良好的顯影性。 Furthermore, the hydroxyl group of the first monomer unit (B-1) can improve the solubility of the resin structure, so that the photosensitive resin composition can have good developability even when it has good heat resistance and solvent resistance.
根據一些實施例，第一單體單元(B-1)具有如化學式1所示的結構：
第二單體單元(B-2)具有如化學式2所示的結構：
其中R1和R2分別獨立地為碳數1至10的烷基，n和m分別獨立地為正整數，R3表示氫原子或碳數1至2的烷基。 Wherein R 1 and R 2 are each independently an alkyl group having 1 to 10 carbon atoms, n and m are each independently a positive integer, and R 3 represents a hydrogen atom or an alkyl group having 1 to 2 carbon atoms.
根據一些實施例，第一單體單元(B-1)和第二單體單元(B-2)的總和可佔樹脂(B)的30mol%以上，例如30mol%~90mol%。 According to some embodiments, the total of the first monomer unit (B-1) and the second monomer unit (B-2) may account for more than 30 mol% of the resin (B), for example, 30 mol% to 90 mol%.
根據一些實施例，第一單體單元(B-1)可佔樹脂(B)的25mol%以上，第二單體單元(B-2)可佔樹脂(B)的5mol%以上。當第一單體單元(B-1)和第二單體單元(B-2)均分別佔樹脂(B)的25mol%和5mol%以上時，此兩者單體單元的羥基和酯類官能基的縮合反應所提供的交聯程度才能夠足以達到預期的耐熱性及耐溶劑性。當第一單體單元(B-1)和第二單體單元(B-2)分別佔樹脂(B)不足30mol%時，則無法使樹脂結構具有足夠的交聯程度，而無法達到預期的耐熱性及耐溶劑性。 According to some embodiments, the first monomer unit (B-1) may account for more than 25 mol% of the resin (B), and the second monomer unit (B-2) may account for more than 5 mol% of the resin (B). When the first monomer unit (B-1) and the second monomer unit (B-2) each account for 25 mol% and 5 mol% of the resin (B), the hydroxyl and ester functions of the monomer units of the two The degree of crosslinking provided by the condensation reaction of the radical is sufficient to achieve the desired heat resistance and solvent resistance. When the first monomer unit (B-1) and the second monomer unit (B-2) account for less than 30 mol% of the resin (B), respectively, the resin structure cannot have a sufficient degree of crosslinking, and the expected Heat resistance and solvent resistance.
根據一些實施例，第一單體單元(B-1)佔樹脂(B)的莫耳比例例如可以是大於或等於第二單體單元(B-2)佔樹脂(B)的莫耳比例；較佳地，第一單體單元(B-1)佔樹脂(B)的莫耳比例例如可以是大於第二單體單元(B-2)佔樹脂(B)的莫耳比例。如此一來，第一單體單 元(B-1)中的部分羥基和第二單體單元(B-2)中的酯類官能基進行縮合反應而提高樹脂結構的交聯度，同時第一單體單元(B-1)中的其餘未進行交聯反應的羥基能夠提高樹脂結構的溶解性，進而提高感光性樹脂組成物的顯影性。 According to some embodiments, the molar ratio of the first monomer unit (B-1) to the resin (B) may be, for example, greater than or equal to the molar ratio of the second monomer unit (B-2) to the resin (B); Preferably, the molar ratio of the first monomer unit (B-1) to the resin (B) may be larger than the molar ratio of the second monomer unit (B-2) to the resin (B), for example. In this way, the first single unit The partial hydroxyl group in the element (B-1) and the ester functional group in the second monomer unit (B-2) undergo a condensation reaction to improve the degree of crosslinking of the resin structure, and at the same time, the first monomer unit (B-1) The remaining hydroxyl groups which are not subjected to the crosslinking reaction can improve the solubility of the resin structure and further improve the developability of the photosensitive resin composition.
舉例而言，根據一些實施例，第一單體單元(B-1)可佔樹脂(B)的25mol%~60mol%，第二單體單元(B-2)可佔樹脂(B)的5mol%以上，例如5~65mol%。 For example, according to some embodiments, the first monomer unit (B-1) may account for 25 mol% to 60 mol% of the resin (B), and the second monomer unit (B-2) may account for 5 mol of the resin (B) % Or more, for example, 5 to 65 mol%.
根據一些實施例，樹脂(B)可更包括第三單體單元(B-3)，第三單體單元(B-3)具有N-苯基馬來醯亞胺官能基。舉例而言，第三單體單元(B-3)可佔樹脂(B)的10mol%~30mol%，較佳地約為10mol%。 According to some embodiments, the resin (B) may further include a third monomer unit (B-3), and the third monomer unit (B-3) has an N-phenylmaleimide functional group. For example, the third monomer unit (B-3) may account for 10 mol% to 30 mol% of the resin (B), preferably about 10 mol%.
根據一些實施例，樹脂(B)可更包括第四單體單元(B-4)，第四單體單元(B-4)具有甲基丙烯酸甲酯。舉例而言，第四單體單元(B-4)可佔樹脂(B)的0mol%~50mol%，較佳地約為10mol%~20mol%。 According to some embodiments, the resin (B) may further include a fourth monomer unit (B-4), and the fourth monomer unit (B-4) has methyl methacrylate. For example, the fourth monomer unit (B-4) may account for 0 mol% to 50 mol% of the resin (B), preferably about 10 mol% to 20 mol%.
根據一些實施例中，著色劑(A)的顏料(A-1)沒有特別的限定，可使用公知的顏料，例如，可舉例如色指數(The Society of Dyers and Colourists出版)中被分類成顏料(pigment)的化合物。 According to some embodiments, the pigment (A-1) of the colorant (A) is not particularly limited, and a known pigment can be used. For example, it can be classified as a pigment in the color index (published by The Society of Dyers and Colourists). (pigment).
舉例而言，顏料(A-1)可以是C.I.顏料黃1(以下，省略C.I.顏料黃的記載，僅列出編號。)、3、12、13、14、15、16、17、20、24、31、53、83、86、93、94、109、110、117、125、128、137、138、139、147、148、150、153、154、166、173、194、214等的黃色顏料； C.I.顏料橙13、31、36、38、40、42、43、51、55、59、61、64、65、71、73等的橙色顏料；C.I.顏料紅9、97、105、122、123、144、149、166、168、175、176、177、180、192、209、215、216、224、242、254、255、264、265等的紅色顏料；C.I.顏料藍15、15：3、15：4、15：6、60、80等的藍色顏料；C.I.顏料紫1、19、23、29、32、36、38等的紫色顏料；C.I.顏料綠7、36、58等的綠色顏料；C.I.顏料棕23、25等的棕色顏料；C.I.顏料黑1、7等的黒色顏料等。前述顏料可單獨使用，或可混合2種以上而使用。 For example, the pigment (A-1) may be CI Pigment Yellow 1 (hereinafter, the description of CI Pigment Yellow is omitted, and only the number is listed.), 3, 12, 13, 14, 15, 16, 17, 20, 24 , 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128, 137, 138, 139, 147, 148, 150, 153, 154, 166, 173, 194, 214, etc. ; CI Pigment Orange 13, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, 73 and other orange pigments; CI Pigment Red 9, 97, 105, 122, 123, 144, 149, 166, 168, 175, 176, 177, 180, 192, 209, 215, 216, 224, 242, 254, 255, 264, 265, etc .; CI Pigment Blue 15, 15: 3, 15 : 4, 15: 6, 60, 80 and other blue pigments; CI Pigment Purple 1, 19, 23, 29, 32, 36, 38 and other purple pigments; CI Pigment Green 7, 36, 58 and other green pigments; Brown pigments such as CI Pigment Brown 23, 25; ocher pigments such as CI Pigment Black 1, 7, etc. These pigments can be used alone or in combination of two or more.
根據一些實施例中，著色劑(A)的染料(A-2)可舉例如油溶性染料、酸性染料、鹼基性染料、直接染料、媒染染料、酸性染料的胺鹽或酸性染料的磺醯胺衍生物等的染料，可舉例如以色指數(The Society of Dyers and Colourists出版)分類成染料的化合物，或染色筆記本(色染社)所記載的公知的染料。又，根據化學構造，可舉例如偶氮染料、花青素染料(cyanine dye)、三苯基甲烷染料(triphenylmethane dye)、氧雜蔥酮染料(xanthene dye)、酞菁染料(phthalocyanine dye)、萘醌染料(naphthoquinone dye)、醌亞胺染料(quinoneimine dye)、次甲基染料(methine dye)、偶氮甲堿染料(azomethine dye)、方酸染料(squarylium dye)、吖啶染料(acridine dye)、苯乙烯染料(styryl dye)、香豆素染料(coumarin dye)、喹啉染料(quinoline dye)及硝基染料(nitro dye)等。前述染料中，以有機溶劑可溶性染料為佳。前述染料只要可符合所希望的彩色濾光片的分光光譜而適宜選出即可，前述染料可單獨使用或併用2種以上。 According to some embodiments, the dye (A-2) of the colorant (A) may be, for example, an oil-soluble dye, an acid dye, a basic dye, a direct dye, a mordant dye, an amine salt of an acid dye, or a sulfonium sulfonium of an acid dye. Examples of the dyes such as amine derivatives include compounds classified into dyes based on the color index (published by The Society of Dyers and Colourists), and well-known dyes described in Dyeing Notebook (Dyeing Co., Ltd.). In addition, depending on the chemical structure, for example, azo dyes, cyanine dyes, triphenylmethane dyes, xanthene dyes, phthalocyanine dyes, Naphthoquinone dye, quinoneimine dye, methine dye, azomethine dye, square dye, and acrid dye ), Styryl dye, coumarin dye, quinoline dye, nitro dye, etc. Among the aforementioned dyes, organic solvent-soluble dyes are preferred. The dye may be appropriately selected as long as it conforms to the spectral spectrum of a desired color filter, and the dye may be used alone or in combination of two or more.
根據一些實施例，染料(A-2)佔感光性樹脂組成物的0.1~50wt%，染料(A-2)較佳地可以是氧雜蔥酮染料。 According to some embodiments, the dye (A-2) accounts for 0.1 to 50% by weight of the photosensitive resin composition, and the dye (A-2) may preferably be an xanthone dye.
根據一些實施例，光聚合單體(C)為可藉由光聚合引發劑(D)產生的活性自由基及/或酸而聚合的單體，例如是但不限於具有可聚合性的乙烯性不飽和鍵，像是(甲基)丙烯酸酯化合物。在此，使用括號來敘述的化合物，意味著包括括號內文字存在與不存在的情況，例如前述的(甲基)丙烯酸酯化合物，囊括丙烯酸酯化合物、和甲基丙烯酸酯化合物的情形。舉例來說，光聚合單體(C)可包括但不受限於選自於由下列選項所組成的群組中的至少一者：丙烯酸壬基苯基卡必醇酯、丙烯酸2-羥基-3-苯氧基丙酯、丙烯酸2-乙基己基卡必醇酯、丙烯酸2-羥基乙酯、N-乙烯基吡咯酮等具有一個乙烯性不飽和鍵的聚合性化合物；二(甲基)丙烯酸1,6-己烷二醇酯、二(甲基)丙烯酸乙二醇酯、二(甲基)丙烯酸新戊二醇酯、二(甲基)丙烯酸三乙二醇酯、雙酚A的雙(丙烯醯氧基乙基)醚、二(甲基)丙烯酸3-甲基戊烷二醇酯等具有二個乙烯性不飽和鍵的聚合性化合物；以及三(甲基)丙烯酸三羥甲基丙烷酯、三(甲基)丙烯酸季戊四醇酯、四(甲基)丙烯酸季戊四醇酯、五(甲基)丙烯酸二季戊四醇酯、六(甲基)丙烯酸二季戊四醇酯、八(甲基)丙烯酸三季戊四醇酯、三季戊四醇七(甲基)丙烯酸酯、十(甲基)丙烯酸四季戊四醇酯、九(甲基)丙烯酸四季戊四醇酯、三(2-(甲基)丙烯醯氧基乙基)異氰酸酯、四(甲基)丙烯酸乙二醇改性季戊四醇酯、六(甲基)丙烯酸乙二醇改性二季戊四醇酯、四(甲基)丙烯酸丙二醇改性季戊四醇酯、六(甲基)丙烯酸丙二醇改性二季戊四醇酯、四(甲基)丙烯酸己內酯 改性季戊四醇酯、六(甲基)丙烯酸己內酯改性二季戊四醇酯等具有三個乙烯性不飽和鍵的聚合性化合物。在一些實施方案中，光聚合單體(C)較佳地為具有三個乙烯性不飽和鍵的聚合性化合物。 According to some embodiments, the photopolymerizable monomer (C) is a monomer that can be polymerized by living radicals and / or acids generated by the photopolymerization initiator (D), such as, but not limited to, a polymerizable ethylenic Unsaturated bonds, like (meth) acrylate compounds. Here, the compounds described using parentheses are meant to include the presence or absence of the characters in the parentheses, for example, the aforementioned (meth) acrylate compounds include acrylate compounds and methacrylate compounds. For example, the photopolymerizable monomer (C) may include, but is not limited to, at least one selected from the group consisting of nonylphenyl carbitol acrylate, 2-hydroxy-acrylate Polymerizable compounds with one ethylenically unsaturated bond, such as 3-phenoxypropyl ester, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate, and N-vinylpyrrolidone; bis (methyl) 1,6-hexanediol acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, bisphenol A Polymerizable compounds having two ethylenically unsaturated bonds, such as bis (propenyloxyethyl) ether and 3-methylpentanediol di (meth) acrylate; and trimethylol tri (meth) acrylate Propane, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, tripentaerythritol octa (meth) acrylate Ester, tripentaerythritol hepta (meth) acrylate, tetrapentaerythritol deca (meth) acrylate, tetrapentaerythritol nine (meth) acrylate Ester, tris (2- (meth) acryloxyethyl) isocyanate, ethylene glycol tetra (meth) acrylate modified pentaerythritol, ethylene glycol hexa (meth) acrylate modified dipentaerythritol, tetra ( Propylene glycol (meth) acrylate modified pentaerythritol ester, propylene glycol hexa (meth) acrylate modified dipentaerythritol ester, caprolactone tetra (meth) acrylate Polymerizable compounds having three ethylenically unsaturated bonds, such as modified pentaerythritol ester and caprolactone hexa (meth) acrylate modified dipentaerythritol ester. In some embodiments, the photopolymerizable monomer (C) is preferably a polymerizable compound having three ethylenically unsaturated bonds.
根據一些實施例，光聚合引發劑(D)可為任何能夠藉由光或熱的作用而產生活性自由基、酸等，進而使得聚合開始的化合物。 舉例來說，光聚合引發劑(D)可包括但不受限於選自於由下列選項所組成的群組中的至少一者：O-醯基肟(O-acyloxime)化合物、烷基苯基酮化合物、雙咪唑化合物、三嗪化合物、醯基膦氧化物(acyl phosphine oxide)、安息香化合物、二苯基酮化合物、醌系化合物、10-丁基-2-氯吖啶酮、苄基、苯基甲醯甲酸甲酯、和環戊二烯鈦(titanocene)化合物。在一些實施方案中，光聚合引發劑(D)較佳地包括選自於由下列選項所組成的群組中的至少一者：O-醯基肟化合物、烷基苯基酮化合物、雙咪唑化合物、三嗪化合物、和醯基膦氧化物。舉例來說，在以O-醯基肟化合物作為光聚合引發劑(D)的情況，可使用Irgacure® OXE-01(BASF公司)、Irgacure® OXE-02(BASF公司)、N-1919(ADEKA公司)等市售商品。 According to some embodiments, the photopolymerization initiator (D) may be any compound capable of generating living radicals, acids, and the like through the action of light or heat, thereby starting the polymerization. For example, the photopolymerization initiator (D) may include, but is not limited to, at least one selected from the group consisting of an O-acyloxime compound, an alkylbenzene Ketone compound, bisimidazole compound, triazine compound, acyl phosphine oxide, benzoin compound, diphenyl ketone compound, quinone compound, 10-butyl-2-chloroacridone, benzyl , Methyl phenylformamate, and titanium cyclopentadiene (titanocene) compounds. In some embodiments, the photopolymerization initiator (D) preferably includes at least one selected from the group consisting of an O-fluorenyl oxime compound, an alkyl phenone compound, and bisimidazole Compounds, triazine compounds, and fluorenylphosphine oxides. For example, when an O-fluorenyl oxime compound is used as the photopolymerization initiator (D), Irgacure® OXE-01 (BASF), Irgacure® OXE-02 (BASF), N-1919 (ADEKA) can be used. Companies) and other commercially available products.
根據一些實施例，溶劑(E)可包括但不受限於選自於由下列選項所組成的群組中的至少一者：酯溶劑(在此意指於分子中含有-COO-但不含-O-的溶劑)、醚溶劑(在此意指於分子中含有-O-但不含-COO-的溶劑)、醚酯溶劑(在此意指於分子中含有-COO-及-O-的溶劑)、酮溶劑(在此意指於分子中含有-CO-但不含-COO-的溶劑)、醇溶 劑(在此意指於分子中含有OH但不含-O-、-CO-及-COO-的溶劑)、芳香族烴溶劑、醯胺溶劑、二甲基亞碸等。 According to some embodiments, the solvent (E) may include, but is not limited to, at least one selected from the group consisting of: an ester solvent (herein means that the molecule contains -COO- but does not contain -O-solvent), ether solvents (referred to herein as solvents containing -O- but not -COO-), ether ester solvents (referred to herein as containing -COO- and -O- Solvents), ketone solvents (meaning solvents containing -CO- but not -COO- in the molecule), alcohol-soluble Agents (referred to herein as solvents containing OH but not -O-, -CO-, and -COO- in the molecule), aromatic hydrocarbon solvents, amidine solvents, dimethylsulfinium, and the like.
一些實施例中，相對於100重量份的所述樹脂，所述著色劑為1重量份~50重量份，所述光聚合單體為1重量份~5重量份，所述光聚合引發劑為1重量份~3重量份，所述溶劑為1重量份~41重量份。 In some embodiments, with respect to 100 parts by weight of the resin, the colorant is 1 to 50 parts by weight, the photopolymerization monomer is 1 to 5 parts by weight, and the photopolymerization initiator is 1 to 3 parts by weight, and the solvent is 1 to 41 parts by weight.
根據一些實施例，感光性樹脂組成物還可包括調平劑、聚合起始助劑、填充劑、密著促進劑、抗氧化劑、光安定劑、鏈移動劑等其他添加劑，但不受限於此。 According to some embodiments, the photosensitive resin composition may further include other additives such as a leveling agent, a polymerization initiation aid, a filler, an adhesion promoter, an antioxidant, a light stabilizer, a chain shifting agent, and the like, but is not limited thereto. this.
本揭露的另一實施例是關於一種彩色光阻結構，其可由根據前述任一實施例的感光性樹脂組成物所形成。具體來說，此彩色光阻結構為藍色的光阻結構。舉例來說，根據前述任一實施例的感光性樹脂組成物可藉由光微影法、噴墨法、或印刷法等方法形成所述彩色光阻結構，但不受限於此。 Another embodiment of the present disclosure relates to a color photoresist structure, which may be formed of the photosensitive resin composition according to any one of the foregoing embodiments. Specifically, the color photoresist structure is a blue photoresist structure. For example, the photosensitive resin composition according to any one of the foregoing embodiments may form the color photoresist structure by a photolithography method, an inkjet method, or a printing method, but is not limited thereto.
以下敘述使用光微影法的例子。首先，將根據前述任一實施例的感光性樹脂組成物塗佈於基板上。根據一些實施例，所述基板可為玻璃、金屬、或塑膠等材質的板狀或薄膜狀基板，並且可預先在其上形成其他光阻結構、各種絕緣或導電膜、和/或驅動電路等元件。根據一些實施例，感光性樹脂組成物可藉由旋轉塗佈機、狹縫旋轉塗佈機、狹縫塗佈機(也稱為壓鑄模塗佈機(die coater)、簾淋塗佈機(curtain flow coater)、或非旋轉式塗佈機(spinless coater))、或噴墨機等塗佈裝置加以塗佈。 An example using the photolithography method is described below. First, the photosensitive resin composition according to any one of the foregoing embodiments is coated on a substrate. According to some embodiments, the substrate may be a plate-like or film-like substrate made of glass, metal, or plastic, and other photoresist structures, various insulating or conductive films, and / or driving circuits may be formed on the substrate in advance. element. According to some embodiments, the photosensitive resin composition may be formed by a spin coater, a slit spin coater, a slit coater (also referred to as a die coater, a curtain coater ( curtain flow coater), or a spinless coater), or a coating device such as an inkjet.
接著，感光性樹脂組成物在基板上乾燥。具體來說，此一步驟可以是自然乾燥、通風乾燥、減壓乾燥、加熱乾燥(也稱為預烘烤)等乾燥方式中的任一種、或者多種方式配合進行。乾燥的溫度可落在10℃~120℃的範圍內，較佳地是落在25℃~100℃的範圍內。如果進行加熱，加熱的時間可落在10秒~60分鐘的範圍內，較佳地是落在30秒~30分鐘的範圍內。如果進行減壓乾燥，可採用50帕(Pa)~150帕的壓力，以及20℃~25℃的溫度範圍。在一些實施例中，乾燥後的感光性樹脂組成物具有0.1微米(μm)~20微米、較佳地是1微米~6微米的膜厚，並可依照所使用的材料和用途加以調整。 Next, the photosensitive resin composition is dried on a substrate. Specifically, this step may be performed by any one of the drying methods such as natural drying, ventilation drying, reduced pressure drying, heat drying (also referred to as pre-baking), or a combination of multiple methods. The drying temperature may fall within a range of 10 ° C to 120 ° C, and preferably falls within a range of 25 ° C to 100 ° C. If heating is performed, the heating time may fall within a range of 10 seconds to 60 minutes, and preferably falls within a range of 30 seconds to 30 minutes. For reduced-pressure drying, a pressure of 50 Pa (Pa) to 150 Pa and a temperature range of 20 ° C to 25 ° C can be used. In some embodiments, the dried photosensitive resin composition has a film thickness of 0.1 micrometer (μm) to 20 micrometers, preferably 1 micrometer to 6 micrometers, and can be adjusted according to the materials and applications used.
之後，再以曝光和顯影得到圖形，其可作為所述彩色光阻結構。在一些實施例中，在使用光罩進行曝光後，是藉由顯影移除未曝光的部分而得到圖形。在另一些實施例中，在使用光罩進行曝光後，是藉由顯影移除曝光的部分而得到圖形。 After that, a pattern is obtained by exposure and development, which can be used as the color photoresist structure. In some embodiments, after the exposure is performed using a photomask, the unexposed portion is removed by development to obtain a pattern. In other embodiments, after the exposure is performed by using a photomask, the pattern is obtained by removing the exposed portion by development.
在曝光的步驟中，可使用水銀燈、發光二極體、金屬鹵素燈、鹵素燈等光源，並利用例如是波長落在250奈米~450奈米的範圍內的光。在一些實施例中，以濾波器剪切除去波長小於350奈米的光。在一些實施例中，以帶通濾波器選擇性地取出波長在436奈米附近、408奈米附近、或365奈米附近的光。在一些實施例中，可使用光罩對準曝光機、步進器等裝置，以均勻地對整個曝光面照射平行光線，和/或精確地對準遮罩和基材。光罩的圖案可依照需求加以設計。 In the step of exposing, a light source such as a mercury lamp, a light emitting diode, a metal halide lamp, or a halogen lamp may be used, and light having a wavelength in a range of 250 nm to 450 nm may be used, for example. In some embodiments, light with a wavelength less than 350 nanometers is removed by filter shearing. In some embodiments, a band-pass filter is used to selectively extract light having a wavelength near 436 nm, 408 nm, or 365 nm. In some embodiments, a mask can be used to align the exposure machine, stepper and other devices to uniformly illuminate the entire exposure surface with parallel light, and / or precisely align the mask and the substrate. The pattern of the photomask can be designed as required.
在顯影的步驟中，可使用有機溶劑、鹼性化合物的水溶液等顯影液，使得預定的部分(例如未曝光的部分)溶解、移除，藉此得到圖形。在一些實施例中，使用鹼性化合物的水溶液作為顯像液特別有助於得到形狀良好的圖形。根據一些實施例，顯影液可為無機鹼 性化合物的水溶液、或有機鹼性化合物的水溶液，其濃度例如是落在0.01wt%~10wt%的範圍內，較佳地是落在0.03wt%~5wt%的範圍內。 所述無機鹼性化合物的水溶液包括但不受限於選自於由下列選項所組成的群組中的至少一者的水溶液：氫氧化鈉、氫氧化鉀、燐酸氫二鈉、燐酸二氫鈉、燐酸氫二銨、燐酸二氫銨、燐酸二氫鉀、矽酸鈉、矽酸鉀、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀、硼酸鈉、硼酸鉀、和氨。 所述有機鹼性化合物的水溶液包括但不受限於選自於由下列選項所組成的群組中的至少一者的水溶液：四甲基銨氫氧化物、2-羥基乙基三甲基銨氫氧化物、單甲基胺、二甲基胺、三甲基胺、單乙基胺、二乙基胺、三乙基胺、單異丙基胺、二異丙基胺、乙醇胺。在一些實施方案中，顯影液較佳地為氫氧化鉀、碳酸氫鈉、和/或四甲基銨氫氧化物的水溶液。在一些實施例中，所述鹼性化合物的水溶液還可包括界面活性劑，其濃度例如是落在0.01wt%~10wt%的範圍內，較佳地是落在0.05wt%~8wt%的範圍內，更佳地是落在0.1wt%~5wt%。所述界面活性劑包括但不受限於選自於由下列選項所組成的群組中的至少一者：聚氧乙烯烷基醚、聚氧乙烯芳基醚、聚氧乙烯烷基芳基醚、其他聚氧乙烯衍生物、氧乙烯/氧基丙烯嵌段共聚物、山梨醇酐脂肪酸酯、聚氧乙烯山梨醇酐脂肪酸酯、聚氧乙烯山梨糖醇脂肪酸酯、丙三醇脂肪酸酯、聚氧乙烯脂肪酸酯、聚氧乙烯烷基胺等非離子系界面活性劑；月桂基醇硫酸酯鈉、油醇硫酸酯鈉、月桂基硫酸鈉、月桂基硫酸銨、十二基苯磺酸鈉、十二基萘磺酸鈉等陰離子系界面活性劑；以及硬脂醯基胺鹽酸鹽、月桂基三甲基銨氯化物等陽離子系界面活性劑。顯影液可藉由槳式攪拌法、浸漬法、噴霧法等方法提供到基材上。並且， 在一些實施方案中，顯影時可將基材傾斜任意角度。根據一些實施例，在顯影後可進行水洗的步驟。 In the developing step, a developing solution such as an organic solvent or an aqueous solution of a basic compound can be used to dissolve and remove a predetermined portion (for example, an unexposed portion), thereby obtaining a pattern. In some embodiments, using an aqueous solution of a basic compound as a developing solution is particularly helpful in obtaining a well-shaped pattern. According to some embodiments, the developing solution may be an inorganic base The concentration of the aqueous solution of the sexual compound or the aqueous solution of the organic basic compound is, for example, in the range of 0.01 wt% to 10 wt%, and preferably in the range of 0.03 wt% to 5 wt%. The aqueous solution of the inorganic basic compound includes, but is not limited to, an aqueous solution selected from at least one selected from the group consisting of sodium hydroxide, potassium hydroxide, disodium hydrogen gallate, and sodium dihydrogen gallate , Diammonium hydrogenate, ammonium dihydrogenate, potassium dihydrogenate, sodium silicate, potassium silicate, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium borate, potassium borate, and ammonia. The aqueous solution of the organic basic compound includes, but is not limited to, an aqueous solution of at least one selected from the group consisting of tetramethylammonium hydroxide, 2-hydroxyethyltrimethylammonium Hydroxide, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, ethanolamine. In some embodiments, the developing solution is preferably an aqueous solution of potassium hydroxide, sodium bicarbonate, and / or tetramethylammonium hydroxide. In some embodiments, the aqueous solution of the basic compound may further include a surfactant, and its concentration is, for example, in the range of 0.01% to 10% by weight, and preferably in the range of 0.05% to 8% by weight. Within, it is more preferably between 0.1 wt% and 5 wt%. The surfactant includes, but is not limited to, at least one selected from the group consisting of: polyoxyethylene alkyl ether, polyoxyethylene aryl ether, polyoxyethylene alkyl aryl ether , Other polyoxyethylene derivatives, oxyethylene / oxypropylene block copolymers, sorbitan fatty acid esters, polyoxyethylene sorbitan fatty acid esters, polyoxyethylene sorbitol fatty acid esters, glycerol fats Esters, polyoxyethylene fatty acid esters, polyoxyethylene alkylamines and other non-ionic surfactants; sodium lauryl sulfate, sodium oleyl sulfate, sodium lauryl sulfate, ammonium lauryl sulfate, dodecyl Anionic surfactants such as sodium besylate and sodium dodecylnaphthalenesulfonate; and cationic surfactants such as stearylamine hydrochloride and lauryltrimethylammonium chloride. The developing solution can be provided on the substrate by a paddle stirring method, a dipping method, a spray method, or the like. and, In some embodiments, the substrate can be tilted at any angle during development. According to some embodiments, a step of washing with water may be performed after development.
本揭露的再一實施例是關於一種顯示器，其可包括前述的彩色光阻結構。舉例來說，所述顯示器可包括由前述彩色光阻結構所構成的彩色濾光片，但不受限於此。根據一些實施例，所述顯示器可為液晶顯示器、電致發光顯示器、或電漿顯示器等顯示器。 Yet another embodiment of the present disclosure relates to a display, which may include the aforementioned color photoresist structure. For example, the display may include, but is not limited to, a color filter composed of the aforementioned color photoresist structure. According to some embodiments, the display may be a display such as a liquid crystal display, an electroluminescent display, or a plasma display.
以下，本揭露將提供數個實施例和比較例，以更具體地說明根據本揭露實施例的感光性樹脂組成物可達成的功效。 Hereinafter, the present disclosure will provide several examples and comparative examples to more specifically explain the effects that can be achieved by the photosensitive resin composition according to the examples of the present disclosure.
[實施例1] [Example 1]
使用前述第一單體單元(B-1)佔40mol%、前述第二單體單元(B-2)佔50mol%、以及前述具有N-苯基馬來醯亞胺官能基的第三單體單元(BZMI)佔10mol%。使用C.I.顏料藍15：6和前述氧雜蔥酮染料作為著色劑(C.I.顏料藍15：6和氧雜蔥酮染料的重量比例為90：10)。 使用六(甲基)丙烯酸二季戊四醇酯(DPHA)作為光聚合單體。使用Irgacure® OXE-01(BASF公司)作為光聚合引發劑。使用丙二醇甲醚醋酸酯(PGMEA)作為溶劑。以著色劑佔50wt%、樹脂佔1wt%、光聚合單體佔5wt%、光聚合引發劑佔3wt%、溶劑佔41wt%的比例配製成感光性樹脂組成物。將配製完成的感光性樹脂組成物以旋塗法塗佈於5公分*5公分的玻璃基板(Eagle2000，Corning公司)上。於100℃預烘烤3分鐘。放置冷卻後，使基板和石英玻璃製光罩間隔100微米，使用曝光機(TME-150RSK，TOPCON(股)製)於大氣環境氣氛下以150mJ/cm2的曝光量(365nm基準)進行光照射，其中所述光罩上具有100微米線寬與 線距(line and space)的圖形。在光照射後，在含有非離子系界面活性劑0.12%與氫氧化鉀0.04%的水系顯影液中於24℃浸漬顯影60秒，然後水洗。接著在烘箱中於230℃後烘烤30分鐘，得到彩色光阻結構的樣品。將前述製備完成之玻璃量測色度後，接著浸泡至65℃、100%的N-甲基吡咯酮(NMP)溶液內5分鐘後，再以色度機量測玻璃之色度，並且計算浸泡前後的色度之△Eab。(△Eab=((L*-L*)^2+(a*-a*)^2+(b*-b*)^2)^(1/2)) 40 mol% of the first monomer unit (B-1), 50 mol% of the second monomer unit (B-2), and the third monomer having the N-phenylmaleimide functional group were used The unit (BZMI) accounts for 10 mol%. As the colorant, CI Pigment Blue 15: 6 and the aforementioned xanthonone dye were used (the weight ratio of CI Pigment Blue 15: 6 and the xanthonone dye was 90:10). As the photopolymerizable monomer, dipentaerythritol hexa (meth) acrylate (DPHA) was used. Irgacure® OXE-01 (BASF) was used as a photopolymerization initiator. As the solvent, propylene glycol methyl ether acetate (PGMEA) was used. The photosensitive resin composition was formulated with a colorant at 50 wt%, a resin at 1 wt%, a photopolymerization monomer at 5 wt%, a photopolymerization initiator at 3 wt%, and a solvent at 41 wt%. The prepared photosensitive resin composition was applied to a glass substrate (Eagle2000, Corning) of 5 cm by 5 cm by a spin coating method. Pre-bake at 100 ° C for 3 minutes. After leaving to cool, the substrate and the mask made of quartz glass were spaced 100 μm apart, and exposed to light at an exposure amount of 150 mJ / cm 2 (365 nm standard) using an exposure machine (TME-150RSK, manufactured by TOPCON) in the atmospheric environment. , Wherein the photomask has a 100 micron line width and line and space pattern. After light irradiation, it was immersed and developed at 24 ° C. for 60 seconds in an aqueous developing solution containing 0.12% of nonionic surfactant and 0.04% of potassium hydroxide, and then washed with water. Then baked in an oven at 230 ° C for 30 minutes to obtain a sample of color photoresist structure. Measure the color of the glass prepared above, then immerse it in a 100% N-methylpyrrolidone (NMP) solution at 65 ° C for 5 minutes, then measure the color of the glass with a colorimeter and calculate △ Eab of chromaticity before and after soaking. (△ Eab = ((L * -L *) ^ 2+ (a * -a *) ^ 2+ (b * -b *) ^ 2) ^ (1/2))
[實施例3] [Example 3]
使用前述第一單體單元(B-1)佔35mol%、前述第二單體單元(B-2)佔35mol%、前述具有N-苯基馬來醯亞胺官能基的第三單體單元(BZMI)佔10mol%、以及前述具有甲基丙烯酸甲酯的第四單體單元(MAA)佔20mol%之樹脂。其他條件如實施例1、依照實施例1所述的方法製成樣品並進行觀察。 35 mol% of the first monomer unit (B-1), 35 mol% of the second monomer unit (B-2), and a third monomer unit having an N-phenylmaleimide functional group (BZMI) The resin which accounts for 10 mol% and the aforementioned fourth monomer unit (MAA) which has methyl methacrylate accounts for 20 mol%. Other conditions are as in Example 1 and a sample is made according to the method described in Example 1 and observed.
[實施例2]、[實施例4]~[實施例10] [Example 2], [Example 4] to [Example 10]
使用根據表1的莫耳比例的前述第一單體單元(B-1)、前述第二單體單元(B-2)、前述具有N-苯基馬來醯亞胺官能基的第三單體單元(BZMI)、及/或前述具有甲基丙烯酸甲酯的第四單體單元(MAA)之樹脂。其他條件如實施例1、依照實施例1所述的方法製成樣品並進行觀察。 The aforementioned first monomer unit (B-1), the aforementioned second monomer unit (B-2), and the aforementioned third monomer having an N-phenylmaleimide functional group were used according to the molar ratio of Table 1. A resin of a bulk unit (BZMI) and / or the aforementioned fourth monomer unit (MAA) having methyl methacrylate. Other conditions are as in Example 1 and a sample is made according to the method described in Example 1 and observed.
[比較例1] [Comparative Example 1]
使用具有N-苯基馬來醯亞胺官能基的單體單元(BZMI)佔10mol%、具有丙烯酸官能基的單體單元(AA)佔10mol%、(來自丙 烯酸(AA)/甲基縮水甘油酯(GMA)共聚物)具有丙烯酸官能基/甲基縮水甘油酯官能基的單體單元(AA+GMA)佔50mol%以及具有乙烯基甲苯官能基的單體單元(VT)佔30mol%之樹脂。其他條件如實施例1。依照實施例1所述的方法製成樣品並進行觀察。 10 mol% of monomer units (BZMI) with N-phenylmaleimide functional group, 10 mol% of monomer units (AA) with acrylic functional group, (from propylene Acrylic acid (AA) / methyl glycidyl ester (GMA) copolymer) Monomer units (AA + GMA) having acrylic functional groups / methyl glycidyl functional groups accounting for 50 mol% and monomers having vinyl toluene functional groups The resin has a body unit (VT) of 30 mol%. Other conditions are as in Example 1. Samples were made according to the method described in Example 1 and observed.
[比較例2] [Comparative Example 2]
使用具有N-苯基馬來醯亞胺官能基的單體單元(BZMI)佔10mol%、(來自甲基丙烯酸環己酯單體)具有甲基丙烯酸環己酯官能基的單體單元(CHMA)佔55mol%、(來自甲基丙烯酸甲酯(MAA)/甲基縮水甘油酯(GMA)共聚物)具有甲基丙烯酸甲酯/甲基縮水甘油酯官能基的單體單元(MAA+GMA)佔20mol%以及具有甲基丙烯酸甲酯的單體單元(MAA)佔15mol%之樹脂。其他條件如實施例1。依照實施例1所述的方法製成樣品並進行觀察。 10 mol% of monomer units (BZMI) having N-phenylmaleimide functional groups and (from cyclohexyl methacrylate monomer) monomer units having cyclohexyl methacrylate function (CHMA ) 55 mol% (from methyl methacrylate (MAA) / methyl glycidyl ester (GMA) copolymer) monomer units (MAA + GMA) with methyl methacrylate / methyl glycidyl functional groups Resin that accounts for 20 mol% and monomer units (MAA) with methyl methacrylate account for 15 mol%. Other conditions are as in Example 1. Samples were made according to the method described in Example 1 and observed.
[比較例3] [Comparative Example 3]
使用具有甲基丙烯酸三環官能基的單體單元(TCDMA)佔10mol%、具有甲基丙烯酸苄酯官能基的單體單元(BZMA)佔45mol%以及具有甲基丙烯酸甲酯/甲基縮水甘油酯官能基的單體單元(MAA+GMA)佔50mol%之樹脂。其他條件如實施例1。依照實施例1所述的方法製成樣品並進行觀察。 Use 10 mol% of monomer units (TCDMA) with tricyclic methacrylate group, 45 mol% of monomer units (BZMA) with benzyl methacrylate function and methyl methacrylate / methyl glycidol Ester functional monomer (MAA + GMA) accounts for 50 mol% of the resin. Other conditions are as in Example 1. Samples were made according to the method described in Example 1 and observed.
[結果和評價] [Results and evaluations]
各實施例和比較例的成分比例和色度觀察結果如表1所列，「△Eab<3.5」表示耐溶劑性良好，「△Eab>3.5」表示耐溶劑性不 佳。如表1所示，各個由實施例的感光性樹脂組成物所形成的彩色光阻結構的樣品，皆具有良好耐溶劑性。 The component ratios and chromaticity observation results of each example and comparative example are shown in Table 1. "△ Eab <3.5" indicates that the solvent resistance is good, and "△ Eab> 3.5" indicates that the solvent resistance is not good. good. As shown in Table 1, each of the samples of the color photoresist structure formed from the photosensitive resin composition of the examples had good solvent resistance.
綜上所述，雖然本揭露已以實施例揭露如上，然其並非用以限定本揭露。本揭露所屬技術領域中具有通常知識者，在不脫離本揭露之精神和範圍內，當可作各種之更動與潤飾。因此，本揭露之保護範圍當視後附之申請專利範圍所界定者為準。 In summary, although the present disclosure has been disclosed above by way of example, it is not intended to limit the present disclosure. Those with ordinary knowledge in the technical field to which this disclosure pertains can make various changes and modifications without departing from the spirit and scope of this disclosure. Therefore, the scope of protection of this disclosure shall be determined by the scope of the appended patent application.
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| TW201734642A (en) * | 2016-03-25 | 2017-10-01 | Fujifilm Corp | Photosensitive composition, color filter, method for forming pattern, solid state image sensor and image display device |
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