CN108196427A - Photosensitive resin composition, and color photoresist structure and display using same - Google Patents
Photosensitive resin composition, and color photoresist structure and display using same Download PDFInfo
- Publication number
- CN108196427A CN108196427A CN201810047769.7A CN201810047769A CN108196427A CN 108196427 A CN108196427 A CN 108196427A CN 201810047769 A CN201810047769 A CN 201810047769A CN 108196427 A CN108196427 A CN 108196427A
- Authority
- CN
- China
- Prior art keywords
- methyl
- acrylic acid
- resin composition
- photosensitive resin
- esters
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 239000011342 resin composition Substances 0.000 title claims abstract description 43
- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 24
- 239000000975 dye Substances 0.000 claims abstract description 72
- 239000011347 resin Substances 0.000 claims abstract description 61
- 229920005989 resin Polymers 0.000 claims abstract description 61
- 239000002904 solvent Substances 0.000 claims abstract description 42
- 239000000178 monomer Substances 0.000 claims abstract description 37
- 239000000049 pigment Substances 0.000 claims abstract description 26
- 239000003086 colorant Substances 0.000 claims abstract description 16
- -1 amine salt Chemical class 0.000 claims description 70
- 150000001875 compounds Chemical class 0.000 claims description 35
- CERQOIWHTDAKMF-UHFFFAOYSA-N alpha-methacrylic acid Natural products CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 32
- 239000005977 Ethylene Substances 0.000 claims description 18
- 238000006116 polymerization reaction Methods 0.000 claims description 18
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 17
- 239000000126 substance Substances 0.000 claims description 16
- 239000003795 chemical substances by application Substances 0.000 claims description 14
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 13
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 12
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 12
- 150000002148 esters Chemical class 0.000 claims description 11
- 150000002576 ketones Chemical class 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 9
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical group O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 claims description 8
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 claims description 8
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 claims description 8
- 239000000980 acid dye Substances 0.000 claims description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 7
- QIDAPCPSDKKZEA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;2-methylprop-2-enoic acid Chemical class CC(=C)C(O)=O.OCC(CO)(CO)COCC(CO)(CO)CO QIDAPCPSDKKZEA-UHFFFAOYSA-N 0.000 claims description 6
- 235000002732 Allium cepa var. cepa Nutrition 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- WZMMCHBWPXKVQR-UHFFFAOYSA-N OCC(CO)(CO)CO.OCC(CO)(CO)CO.OCC(CO)(CO)CO.OCC(CO)(CO)CO.CC(C(=O)O)=C Chemical class OCC(CO)(CO)CO.OCC(CO)(CO)CO.OCC(CO)(CO)CO.OCC(CO)(CO)CO.CC(C(=O)O)=C WZMMCHBWPXKVQR-UHFFFAOYSA-N 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 6
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical class OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 claims description 6
- SJEYSFABYSGQBG-UHFFFAOYSA-M Patent blue Chemical compound [Na+].C1=CC(N(CC)CC)=CC=C1C(C=1C(=CC(=CC=1)S([O-])(=O)=O)S([O-])(=O)=O)=C1C=CC(=[N+](CC)CC)C=C1 SJEYSFABYSGQBG-UHFFFAOYSA-M 0.000 claims description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 5
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 claims description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 5
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 claims description 4
- 229930192627 Naphthoquinone Natural products 0.000 claims description 4
- 239000000999 acridine dye Substances 0.000 claims description 4
- 125000005037 alkyl phenyl group Chemical group 0.000 claims description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 4
- IAQRGUVFOMOMEM-UHFFFAOYSA-N but-2-ene Chemical group CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 150000002791 naphthoquinones Chemical class 0.000 claims description 4
- 239000001007 phthalocyanine dye Substances 0.000 claims description 4
- 239000001008 quinone-imine dye Substances 0.000 claims description 4
- 125000005504 styryl group Chemical group 0.000 claims description 4
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical class C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 claims description 3
- PTJWCLYPVFJWMP-UHFFFAOYSA-N 2-[[3-hydroxy-2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)COCC(CO)(CO)CO PTJWCLYPVFJWMP-UHFFFAOYSA-N 0.000 claims description 3
- CCKGVXMFQIUNNK-UHFFFAOYSA-N 2-[[3-hydroxy-2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol 2-methylprop-2-enoic acid Chemical class OCC(CO)(COCC(CO)(COCC(CO)(CO)CO)CO)CO.CC(C(=O)O)=C CCKGVXMFQIUNNK-UHFFFAOYSA-N 0.000 claims description 3
- 230000001476 alcoholic effect Effects 0.000 claims description 3
- 150000001408 amides Chemical class 0.000 claims description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 3
- 239000004210 ether based solvent Substances 0.000 claims description 3
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 claims description 3
- 239000012948 isocyanate Substances 0.000 claims description 3
- 150000002513 isocyanates Chemical class 0.000 claims description 3
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical class COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 claims description 3
- 239000000983 mordant dye Substances 0.000 claims description 3
- 150000002923 oximes Chemical class 0.000 claims description 3
- RVYBHNVKBNBMLE-UHFFFAOYSA-N 2-methylprop-2-enoic acid;propane-1,2-diol Chemical compound CC(O)CO.CC(=C)C(O)=O RVYBHNVKBNBMLE-UHFFFAOYSA-N 0.000 claims description 2
- IHXWECHPYNPJRR-UHFFFAOYSA-N 3-hydroxycyclobut-2-en-1-one Chemical compound OC1=CC(=O)C1 IHXWECHPYNPJRR-UHFFFAOYSA-N 0.000 claims description 2
- QKQSDLXVVTUQOB-UHFFFAOYSA-N OC(O)(O)CCC(=O)OC(C(=C)C)=O Chemical class OC(O)(O)CCC(=O)OC(C(=C)C)=O QKQSDLXVVTUQOB-UHFFFAOYSA-N 0.000 claims description 2
- 244000028419 Styrax benzoin Species 0.000 claims description 2
- 235000000126 Styrax benzoin Nutrition 0.000 claims description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 claims description 2
- 229960002130 benzoin Drugs 0.000 claims description 2
- 239000000470 constituent Substances 0.000 claims description 2
- MCJUWBUSIQXMPY-UHFFFAOYSA-N cyclopenta-1,3-diene titanium Chemical compound [Ti].C1C=CC=C1 MCJUWBUSIQXMPY-UHFFFAOYSA-N 0.000 claims description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 claims description 2
- 239000000982 direct dye Substances 0.000 claims description 2
- 235000019382 gum benzoic Nutrition 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 claims description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims 1
- ZEMDDYVNPGRQJD-UHFFFAOYSA-N 3-methylpentane-1,1-diol 2-methylprop-2-enoic acid Chemical class C(C(=C)C)(=O)O.CC(CC(O)O)CC ZEMDDYVNPGRQJD-UHFFFAOYSA-N 0.000 claims 1
- 244000291564 Allium cepa Species 0.000 claims 1
- 229930185605 Bisphenol Natural products 0.000 claims 1
- 206010020466 Hunger Diseases 0.000 claims 1
- NIAGYCBEQNBQPI-UHFFFAOYSA-N hexane-1,6-diol;2-methylprop-2-enoic acid Chemical class CC(=C)C(O)=O.OCCCCCCO NIAGYCBEQNBQPI-UHFFFAOYSA-N 0.000 claims 1
- 235000003642 hunger Nutrition 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract description 8
- 125000004185 ester group Chemical group 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 19
- 239000002585 base Substances 0.000 description 15
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 8
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 6
- 241000234282 Allium Species 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000004132 cross linking Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 230000018109 developmental process Effects 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerol Natural products OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 3
- 239000001005 nitro dye Substances 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-methyl-pyrrolidinone Natural products CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 239000000987 azo dye Substances 0.000 description 2
- 150000007514 bases Chemical class 0.000 description 2
- 229940106691 bisphenol a Drugs 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000004702 methyl esters Chemical class 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- PJAKWOZHTFWTNF-UHFFFAOYSA-N (2-nonylphenyl) prop-2-enoate Chemical compound CCCCCCCCCC1=CC=CC=C1OC(=O)C=C PJAKWOZHTFWTNF-UHFFFAOYSA-N 0.000 description 1
- WNJSKZBEWNVKGU-UHFFFAOYSA-N 2,2-dimethoxyethylbenzene Chemical compound COC(OC)CC1=CC=CC=C1 WNJSKZBEWNVKGU-UHFFFAOYSA-N 0.000 description 1
- ZUAURMBNZUCEAF-UHFFFAOYSA-N 2-(2-phenoxyethoxy)ethanol Chemical compound OCCOCCOC1=CC=CC=C1 ZUAURMBNZUCEAF-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical group CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- VTEJJNYLODYOSG-UHFFFAOYSA-N C(CCC)N1C=2C=CC(=CC2CC2=CC=CC=C12)Cl Chemical class C(CCC)N1C=2C=CC(=CC2CC2=CC=CC=C12)Cl VTEJJNYLODYOSG-UHFFFAOYSA-N 0.000 description 1
- SNEYJZBZIICCIN-UHFFFAOYSA-N C1(=CC=CC2=CC=CC=C12)S(=O)(=O)O.C(CCCCCCCCCCC)[Na] Chemical compound C1(=CC=CC2=CC=CC=C12)S(=O)(=O)O.C(CCCCCCCCCCC)[Na] SNEYJZBZIICCIN-UHFFFAOYSA-N 0.000 description 1
- HEICFOJEDNPKKN-UHFFFAOYSA-N CC(CC)CC.CC(C(=O)O)=C Chemical class CC(CC)CC.CC(C(=O)O)=C HEICFOJEDNPKKN-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical compound [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical class CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 1
- 235000019082 Osmanthus Nutrition 0.000 description 1
- 241000333181 Osmanthus Species 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- 241000220324 Pyrus Species 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 1
- SEEVRZDUPHZSOX-WPWMEQJKSA-N [(e)-1-[9-ethyl-6-(2-methylbenzoyl)carbazol-3-yl]ethylideneamino] acetate Chemical compound C=1C=C2N(CC)C3=CC=C(C(\C)=N\OC(C)=O)C=C3C2=CC=1C(=O)C1=CC=CC=C1C SEEVRZDUPHZSOX-WPWMEQJKSA-N 0.000 description 1
- ZUBJEHHGZYTRPH-KTKRTIGZSA-N [(z)-octadec-9-enyl] hydrogen sulfate Chemical compound CCCCCCCC\C=C/CCCCCCCCOS(O)(=O)=O ZUBJEHHGZYTRPH-KTKRTIGZSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 description 1
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 150000008378 aryl ethers Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 239000001055 blue pigment Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229960000956 coumarin Drugs 0.000 description 1
- 235000001671 coumarin Nutrition 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical group CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- 229910000388 diammonium phosphate Inorganic materials 0.000 description 1
- 235000019838 diammonium phosphate Nutrition 0.000 description 1
- UZBQIPPOMKBLAS-UHFFFAOYSA-N diethylazanide Chemical compound CC[N-]CC UZBQIPPOMKBLAS-UHFFFAOYSA-N 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N dimethylmethane Natural products CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 1
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229940031098 ethanolamine Drugs 0.000 description 1
- 125000005670 ethenylalkyl group Chemical group 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000001802 infusion Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 235000019837 monoammonium phosphate Nutrition 0.000 description 1
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 1
- 235000019796 monopotassium phosphate Nutrition 0.000 description 1
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 1
- 235000019799 monosodium phosphate Nutrition 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000001053 orange pigment Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 235000021017 pears Nutrition 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 description 1
- 208000007578 phototoxic dermatitis Diseases 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 150000003239 pyrrolones Chemical class 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- HFQQZARZPUDIFP-UHFFFAOYSA-M sodium;2-dodecylbenzenesulfonate Chemical compound [Na+].CCCCCCCCCCCCC1=CC=CC=C1S([O-])(=O)=O HFQQZARZPUDIFP-UHFFFAOYSA-M 0.000 description 1
- RRLOOYQHUHGIRJ-UHFFFAOYSA-M sodium;ethyl sulfate Chemical compound [Na+].CCOS([O-])(=O)=O RRLOOYQHUHGIRJ-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- BJAARRARQJZURR-UHFFFAOYSA-N trimethylazanium;hydroxide Chemical compound O.CN(C)C BJAARRARQJZURR-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- WUUHFRRPHJEEKV-UHFFFAOYSA-N tripotassium borate Chemical compound [K+].[K+].[K+].[O-]B([O-])[O-] WUUHFRRPHJEEKV-UHFFFAOYSA-N 0.000 description 1
- YEIGUXGHHKAURB-UHFFFAOYSA-N viridine Natural products O=C1C2=C3CCC(=O)C3=CC=C2C2(C)C(O)C(OC)C(=O)C3=COC1=C23 YEIGUXGHHKAURB-UHFFFAOYSA-N 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
Abstract
A photosensitive resin composition, and a color photoresist structure and a display using the same. The photosensitive resin composition comprises a colorant, a resin, a photopolymerization monomer, a photopolymerization initiator and a solvent. Colorants include pigments and dyes. The resin comprises a first monomer unit with a hydroxyl group and a second monomer unit with an ester functional group, and the sum of the first monomer unit and the second monomer unit accounts for more than 30 mol% of the resin. The photosensitive resin composition has good heat resistance and solvent resistance.
Description
Technical field
The present invention relates to a kind of photosensitive resin compositions.The present invention is also made of about one kind the photoresist
The chromatic photoresist structure that object is formed.The present invention is also about a kind of display for including the chromatic photoresist structure.
Background technology
In the display, the color of each picture element is generally controlled using color filter structures such as colored filters.For example,
In the liquid crystal display of relatively early stage, colored filter is formed on the substrate relative to thin film transistor base plate, usually
It is referred to as colored filter substrate.Colored filter may include the chromatic photoresist structure of multiple color, such as be but not limited to red
The light resistance structure of color, green and blue.These light resistance structures can use resin combination, particularly photoresist to form
Object is formed.In general, in order to coordinate various types of display applications, the ingredient of photosensitive resin composition can be adjusted
Whole and optimization.
Invention content
The present invention is about a kind of photosensitive resin composition and applies its chromatic photoresist structure and display.Implement
The photosensitive resin composition of example has good heat resistance and solvent resistance.
An embodiment according to the present invention, proposes a kind of photosensitive resin composition.This sense rotation optical activity resin combination
Including colorant, resin, photo polymerization monomer, Photoepolymerizationinitiater initiater and solvent.The colorant includes pigment and dyestuff.It is described
Resin includes the first monomeric unit and second comonomer unit, and the summation of first monomeric unit and the second comonomer unit accounts for
More than the 30mol% of the resin, first monomeric unit have structure as described in chemical formula 1：
[chemical formula 1]
And
The second comonomer unit has the structure as shown in chemical formula 2：
[chemical formula 2]
Wherein R1And R2It is separately the alkyl of carbon number 1 to 10, n and m are separately positive integer, R3Represent hydrogen
The alkyl of atom or carbon number 1 to 2.
The summation of an embodiment according to the present invention, first monomeric unit and the second comonomer unit accounts for the tree
30mol%~90mol% of fat.
An embodiment according to the present invention, first monomeric unit account for 25~60mol% of the resin, and described second
Monomeric unit accounts for more than the 5mol% of the resin.
An embodiment according to the present invention, the resin further include Third monomer unit, and the Third monomer unit has
N-phenylmaleimide functional group.
An embodiment according to the present invention, the Third monomer unit account for 10mol%~30mol% of the resin.
An embodiment according to the present invention, the resin further include the 4th monomeric unit, and the 4th monomeric unit has
Methyl methacrylate.
An embodiment according to the present invention, the 4th monomeric unit account for 0mol%~50mol% of the resin.
An embodiment according to the present invention, relative to the resin of 100 parts by weight, the colorant for 1 parts by weight~
50 parts by weight, the photo polymerization monomer are the parts by weight of 1 parts by weight~5, and the Photoepolymerizationinitiater initiater is the parts by weight of 1 parts by weight~3,
The solvent is the parts by weight of 1 parts by weight~41.
An embodiment according to the present invention, the dyestuff be selected from oil-soluble dyes, acid dyes, base dyestuff, directly
Dyestuff, mordant dye, the amine salt of acid dyes or acid dyes sulfamide derivative, azo dyes, cyanine dye, triphen
Methylmethane dyestuff, oxa- green onion ketone dyes, phthalocyanine dye, naphthoquinone dyestuff, quinoneimine dye, methine dyes, azomethine dyes,
The group that squaraine dye, acridine dye, styryl color, coumarine dye, quinoline dye and nitro dye are formed.
An embodiment according to the present invention, the dyestuff account for 0.1~50wt% of the photosensitive resin composition.
An embodiment according to the present invention, the photo polymerization monomer are selected from polymerism of the tool there are one ethylene unsaturated bond
There are three the polymerizations of ethylene unsaturated bond for compound, the polymerizable compound with two ethylene unsaturated bonds and tool
The group that property compound is formed；And/or
The Photoepolymerizationinitiater initiater is selected from O- acyl groups oxime compound, alkyl phenyl ketone compound, double imidazole compound, triazine
Compound, acylphosphine oxide, benzoin compound, diphenylketone compound, oxime-based compound, 10- butyl -2- chloro-acridines
The group of ketone, benzyl or phenyl formic acid methyl esters and cyclopentadiene titanium compound composition；And/or
It is molten that the solvent is selected from ester solvent, ether solvents, ether-ether solvent, ketone solvent, alcoholic solvent, aromatic hydrocarbon solvents, amide
The group that agent and dimethyl sulfoxide (DMSO) are formed.
Wherein, the polymerizable compound of ethylene unsaturated bond is selected from nonylphenol acrylate phenyl carbitol there are one the tools
Ester, acrylic acid 2- hydroxyl -3- phenoxy-propyls, acrylic acid 2- ethylhexyls carbitol ester, acrylic acid 2- hydroxy methacrylates, N- ethylene
The group that base pyrrolones is formed；The polymerizable compound for having two ethylene unsaturated bonds is selected from two (methyl) propylene
Sour 1,6- hexane diols ester, two (methyl) acrylic acid glycol esters, two (methyl) acrylic acid neopentyl glycol ester, two (methyl) propylene
Triethylenetetraminehexaacetic acid diol ester, bis- (acryloyl-oxyethyl) ethers of bisphenol-A, two (methyl) acrylic acid -3- methylpentanes diol ester institute groups
Into group；And the polymerizable compound of ethylene unsaturated bond is selected from three (methyl) acrylic acid, three hydroxyl first there are three the tools
Base propane ester, three (methyl) acrylate, pentaerythritols, four (methyl) acrylate, pentaerythritols, two season of five (methyl) acrylic acid
Doutrate, six (methyl) acrylic acid dipentaerythritol esters, eight (methyl) acrylic acid tripentaerythritol esters, tripentaerythritol seven
(methyl) acrylate, ten (methyl) acrylic acid tetrapentaerythritol esters, nine (methyl) acrylic acid tetrapentaerythritol esters, three (2- (first
Base) acryloyl-oxyethyl) isocyanates, the glycol-modified pentaerythritol ester of four (methyl) acrylic acid, six (methyl) acrylic acid
Glycol-modified dipentaerythritol ester, the propylene glycol modified pentaerythritol ester of four (methyl) acrylic acid, six (methyl) acrylic acid the third two
Alcohol is modified dipentaerythritol ester, four (methyl) caprolactones are modified pentaerythritol ester and six (methyl) acrylic acid in oneself
The group that ester modified dipentaerythritol ester is formed.
According to another embodiment of the present invention, a kind of chromatic photoresist structure is proposed.Before this chromatic photoresist structure is by being, for example,
The photosensitive resin composition stated is formed.
A more embodiment according to the present invention, proposes a kind of display.This display includes being, for example, aforementioned colourama
Hinder structure.
Beneficial effects of the present invention：
The photosensitive resin composition of the present invention has good heat resistance and solvent resistance.
Specific embodiment
Various embodiments set forth below are described in detail, and embodiment can't limit this only to illustrate as example
The range to be protected is invented, other features, element, method and parameter still can be used to be implemented in the present invention.Embodiment carries
Go out, only to illustrate the technical characteristic of the present invention, be not limited to the claim of the present invention.In the technical field
Those of ordinary skill, by can book according to the following instructions description, in the scope for not departing from the present invention, make impartial modification
With variation.
Some embodiments of the present invention are about a kind of photosensitive resin composition.Such photosensitive resin composition includes
Colorant (A), resin (B), photo polymerization monomer (C), Photoepolymerizationinitiater initiater (D) and solvent (E).Wherein, colorant (A) includes
Pigment (A-1) and dyestuff (A-2).Resin (B) is including the first monomeric unit (B-1) with hydroxyl and with esters functional group's
The summation of second comonomer unit (B-2), the first monomeric unit (B-1) and second comonomer unit (B-2) accounts for resin (B)
More than 30mol%.
Here, the colorant (A), pigment (A-1), dyestuff (A-2), resin (B), the first monomeric unit (B-1), second
The ingredients words such as monomeric unit (B-2), photo polymerization monomer (C), Photoepolymerizationinitiater initiater (D) and solvent (E), independently may include list
One or more colorants (A), pigment (A-1), dyestuff (A-2), resin (B), the first monomeric unit (B-1), second comonomer list
The situation of the ingredients such as member (B-2), photo polymerization monomer (C), Photoepolymerizationinitiater initiater (D) and solvent (E).
Photosensitive resin composition according to an embodiment of the invention, via the composition of adjustment resin (B), the first monomer list
First hydroxyl of (B-1) and the esters functional group of second comonomer unit (B-2) can occur to be condensed (condensation) reaction so that
Further cross-linked polymeric between first monomeric unit (B-1) and second comonomer unit (B-2), and it is higher and harder to form the degree of cross linking
Solid resin structure, and enable to resin structure have higher heat resistance, and then can to avoid subsequent technique (such as
TFT-LCD techniques) in high-temperature heat treatment (such as high-temperature baking) photosensitive resin composition is damaged.
In addition, in general, dye molecule has higher dissolubility in the solution, when dye molecule is from photoresist
The phenomenon that causing to fade when being dissolved to external solution in the resin structure of constituent, and according to an embodiment of the invention, the
Further cross-linked polymeric between one monomeric unit (B-1) and second comonomer unit (B-2), and it is higher and wrap to form 3 D cross-linked degree
The preferable resin structure of the property covered, therefore dye molecule can be enabled to be crosslinked structure cladding wherein, and can be preferably
It is fixed in this cross-linked structure, so that the photosensitive resin composition of the present invention has preferable solvent resistance and is not easy to send out
Raw the phenomenon that fading, thus, can be to avoid the technique bath treatment (example in subsequent technique (such as TFT-LCD techniques)
As chemical agent cleans processing) photosensitive resin composition is damaged.
Further, the hydroxyl of the first monomeric unit (B-1) can improve the dissolubility of resin structure, and cause photonasty
Resin combination is remained to good heat resistance and when solvent resistance with good developability.
According to some embodiments, the first monomeric unit (B-1) has structure as described in chemical formula 1：
[chemical formula 1]
And
Second comonomer unit (B-2) has the structure as shown in chemical formula 2：
[chemical formula 2]
Wherein R1And R2It is separately the alkyl of carbon number 1 to 10, n and m are separately positive integer, R3Represent hydrogen
The alkyl of atom or carbon number 1 to 2.
According to some embodiments, the summation of the first monomeric unit (B-1) and second comonomer unit (B-2) can account for resin (B)
More than 30mol%, such as 30mol%~90mol%.
According to some embodiments, the first monomeric unit (B-1) can account for more than the 25mol% of resin (B), second comonomer unit
(B-2) more than the 5mol% of resin (B) can be accounted for.When the first monomeric unit (B-1) and second comonomer unit (B-2) respectively account for tree
When the 25mol% and more than 5mol% of fat (B), the condensation reaction of the hydroxyl and esters functional group of both this monomeric unit is provided
Crosslinking degree can sufficiently achieve expected heat resistance and solvent resistance.When the first monomeric unit (B-1) and second comonomer
When unit (B-2) accounts for resin (B) less than 30mol% respectively, then it can not make resin structure that there is enough crosslinking degrees, and can not
Reach expected heat resistance and solvent resistance.
According to some embodiments, the first monomeric unit (B-1) account for the molar ratio of resin (B) such as may be greater than or
The molar ratio of resin (B) is accounted in second comonomer unit (B-2)；Preferably, the first monomeric unit (B-1) accounts for rubbing for resin (B)
You for example may be greater than the molar ratio that second comonomer unit (B-2) accounts for resin (B) at ratio.Thus, the first monomer list
The esters functional group in part of hydroxyl and second comonomer unit (B-2) in first (B-1) carries out condensation reaction and improves resin knot
The degree of cross linking of structure, while remaining in the first monomeric unit (B-1) does not carry out the hydroxyl of cross-linking reaction can improve resin structure
Dissolubility, and then improve photosensitive resin composition developability.
For example, according to some embodiments, the first monomeric unit (B-1) can account for the 25mol% of resin (B)~
60mol%, second comonomer unit (B-2) can account for more than the 5mol% of resin (B), such as 5~65mol%.
According to some embodiments, resin (B) can further include Third monomer unit (B-3), and Third monomer unit (B-3) has
N-phenylmaleimide functional group.For example, Third monomer unit (B-3) can account for the 10mol% of resin (B)~
30mol% is preferably about 10mol%.
According to some embodiments, resin (B) can further include the 4th monomeric unit (B-4), and the 4th monomeric unit (B-4) has
Methyl methacrylate.For example, the 4th monomeric unit (B-4) can account for 0mol%~50mol% of resin (B), preferably
About 10mol%~20mol%.
According in some embodiments, there is no particular limitation for the pigment (A-1) of colorant (A), and well known pigment can be used,
For example, it can illustrate as being classified into pigment in colour index (The Society of Dyers and Colourists publication)
(pigment) compound.
For example, pigment (A-1) can be that C.I. pigment yellows 1 (hereinafter, omitting the record of C.I. pigment yellows, are only listed
Number), 3,12,13,14,15,16,17,20,24,31,53,83,86,93,94,109,110,117,125,128,137,
138th, 139,147,148,150,153,154,166,173,194,214 etc. yellow uitramarine；C.I. pigment orange 13,31,36,
38th, 40,42,43,51,55,59,61,64,65,71,73 etc. orange pigment；C.I. Pigment Red 9,97,105,122,123,
144th, 149,166,168,175,176,177,180,192,209,215,216,224,242,254,255,264,265 etc. it is red
Color pigment；C.I. pigment blue 15,15：3、15：4、15：6th, 60,80 etc. blue pigment；C.I. pigment violet 1,19,23,29,32,
36th, 38 etc. violet pigment；C.I. the viridine green of pigment Green 7,36,58 etc.；C.I. the brown of pigment brown 23,25 etc.；
C.I. black pigment of pigment black 1,7 etc. etc..Aforesaid pigments can be used alone or can mix two or more and use.
According in some embodiments, the dyestuff (A-2) of colorant (A) can illustrate such as oil-soluble dyes, acid dyes, base
Property dyestuff, direct dyes, mordant dye, the amine salt of acid dyes or acid dyes sulfamide derivative etc. dyestuff, can lift
Such as the compound or dye of dyestuff are categorized into colour index (The Society of Dyers and Colourists publication)
Well known dyestuff recorded in color notebook (Se Ran societies).Also, according to chemical constitution, can illustrate such as azo dyes, cyanine uniformly dyeing
Expect (cyanine dye), triphenhlmethane dye (triphenylmethane dye), oxa- green onion ketone dyes (xanthene
Dye), phthalocyanine dye (phthalocyanine dye), naphthoquinone dyestuff (naphthoquinone dye), quinoneimine dye
(quinoneimine dye), methine dyes (methine dye), azomethine dyes (azomethine dye), side's acid
Dyestuff (squarylium dye), acridine dye (acridine dye), styryl color (styryl dye), coumarine dye
(coumarin dye), quinoline dye (quinoline dye) and nitro dye (nitro dye) etc..In abovementioned dyes, to have
Solvent soluble dye is preferred.As long as abovementioned dyes may conform to the spectrophotometric spectra of desirable colored filter and suitable for selecting
, abovementioned dyes can be used alone or be used together by two or more types.
According to some embodiments, dyestuff (A-2) accounts for 0.1~50wt% of photosensitive resin composition, and dyestuff (A-2) is preferable
Ground can be oxa- green onion ketone dyes.
According to some embodiments, photo polymerization monomer (C) is can pass through the living radical of Photoepolymerizationinitiater initiater (D) generation
And/or monomer that is sour and polymerizeing, such as the ethylene unsaturated bond with polymerizability is but not limited to, seem (methyl) propylene
Ester compound.Here, the compound described using bracket, it is meant that including word in bracket exist with there is no feelings
Condition, example (methyl) acrylate compounds as the aforementioned, includes the feelings of acrylate compounds and methacrylate compound
Shape.For example, photo polymerization monomer (C) may include but be not only restricted in the group being made of the following option at least
One：Nonylphenol acrylate phenyl carbitol ester, acrylic acid 2- hydroxyl -3- phenoxy-propyls, acrylic acid 2- ethylhexyl carbitols
There are one the polymerizable compounds of ethylene unsaturated bond for the tool such as ester, acrylic acid 2- hydroxy methacrylates, N- vinyl pyrrole ketone；Two
(methyl) acrylic acid 1,6- hexane diols ester, two (methyl) acrylic acid glycol esters, two (methyl) acrylic acid neopentyl glycol ester, two
(methyl) acrylic acid triglycol ester, bis- (acryloyl-oxyethyl) ethers of bisphenol-A, two (methyl) acrylic acid 3- methylpentanes two
Alcohol ester etc. has the polymerizable compound of two ethylene unsaturated bonds；And three (methyl) acrylic acid trihydroxymethylpropanyl esters,
Three (methyl) acrylate, pentaerythritols, four (methyl) acrylate, pentaerythritols, five (methyl) acrylic acid dipentaerythritol esters,
Six (methyl) acrylic acid dipentaerythritol esters, eight (methyl) acrylic acid tripentaerythritol esters, tripentaerythritol seven (methyl) propylene
Acid esters, ten (methyl) acrylic acid tetrapentaerythritol esters, nine (methyl) acrylic acid tetrapentaerythritol esters, three (2- (methyl) acryloyls
Oxygroup ethyl) isocyanates, the glycol-modified pentaerythritol ester of four (methyl) acrylic acid, six (methyl) acrylic acid are glycol-modified
Dipentaerythritol ester, the propylene glycol modified pentaerythritol ester of four (methyl) acrylic acid, six (methyl) acrylic acid propylene glycol modified two seasons
Doutrate, four (methyl) caprolactones are modified pentaerythritol ester, six (methyl) caprolactones were modified for two seasons penta 4
There are three the polymerizable compounds of ethylene unsaturated bond for the tool such as alcohol ester.In some embodiments, photo polymerization monomer (C) is preferable
Ground is polymerizable compound of the tool there are three ethylene unsaturated bond.
According to some embodiments, Photoepolymerizationinitiater initiater (D) can generate activity to be any by the effect of light or heat
Free radical, acid etc., so that the compound that polymerization starts.For example, Photoepolymerizationinitiater initiater (D) may include but be not only restricted to
Selected from least one of group being made of the following option：O- acyl groups oxime (O-acyloxime) compound, alkyl phenyl
Ketone compound, double imidazole compound, triaizine compounds, acylphosphine oxide (acyl phosphine oxide), sweetening treatment of resting in peace
Close object, diphenylketone compound, oxime-based compound, 10- butyl -2- chloro-acridines ketone, benzyl or phenyl formic acid methyl esters and ring
Pentadiene titanium (titanocene) compound.In some embodiments, Photoepolymerizationinitiater initiater (D) be preferably comprised selected from by
At least one of group that the following option is formed：O- acyl groups oxime compound, alkyl phenyl ketone compound, double imidazoles chemical combination
Object, triaizine compounds and acylphosphine oxide.For example, using O- acyl groups oxime compound as Photoepolymerizationinitiater initiater (D)
Situation can be usedOXE-01 (BASF AG),OXE-02 (BASF AG), N-1919 (ADEKA
Company) etc. commercial goods.
According to some embodiments, solvent (E) may include but be not only restricted in the group being made of the following option
At least one：Ester solvent (referring to the solvent containing-COO- but without-O- in molecule at this), ether solvents (refer to herein
Solvent in molecule containing-O- but without-COO-), ether-ether solvent (refers to molten containing-COO- and-O- in molecule at this
Agent), ketone solvent (referring to the solvent containing-CO- but without-COO- in molecule at this), alcoholic solvent (refers at this in molecule
Solvent containing OH but without-O- ,-CO- and-COO-), aromatic hydrocarbon solvents, amide solvent, dimethyl sulfoxide (DMSO) etc..
In some embodiments, relative to the resin of 100 parts by weight, the colorant is the parts by weight of 1 parts by weight~50,
The photo polymerization monomer is the parts by weight of 1 parts by weight~5, and the Photoepolymerizationinitiater initiater is the parts by weight of 1 parts by weight~3, the solvent
For the parts by weight of 1 parts by weight~41.
According to some embodiments, photosensitive resin composition may also include leveling agent, polymerization starting auxiliary agent, filler, close
Other additives such as accelerating agent, antioxidant, light stabilizer, chain movement agent, but are not only restricted to this.
Another embodiment of the present invention be about a kind of chromatic photoresist structure, can be by the sense according to aforementioned any embodiment
Photosensitiveness resin combination is formed.Specifically, light resistance structure of this chromatic photoresist structure for blue.For example, according to preceding
The coloured silk can be formed by the methods of photolithography, ink-jet method or print process by stating the photosensitive resin composition of any embodiment
Color light resistance structure, but it is not only restricted to this.
Example described below using photolithography.First, it will be formed according to the photoresist of aforementioned any embodiment
Object is coated on substrate.According to some embodiments, the substrate can be the plate or film of the materials such as glass, metal or plastics
Shape substrate, and it can be formed on other light resistance structures, various insulation or the elements such as conductive film, and/or driving circuit in advance.
According to some embodiments, photosensitive resin composition can by spin coater, slit spin coater, slit coater (
Referred to as compression mod coating machine (die coater), curtain leaching coating machine (curtain flow coater) or non-rotating coating machine
(spinless coater)) or the apparatus for coating such as ink jet printer be coated with.
Then, photosensitive resin composition is dry on substrate.Specifically, this step can be spontaneously dried, is logical
Air-dry it is dry, be dried under reduced pressure, any one of drying modes such as heat drying (also referred to as prebake conditions) or various ways coordinate into
Row.Dry temperature can be fallen in the range of 10 DEG C~120 DEG C, preferably fallen in the range of 25 DEG C~100 DEG C.If into
Row heating, the time of heating can fall in the range of 10 seconds~60 minutes, preferably fall in the range of 30 seconds~30 minutes.
If be dried under reduced pressure, the pressure and 20 DEG C~25 DEG C of temperature range of 50 pas (Pa)~150 pa can be used.At some
In embodiment, dried photosensitive resin composition has 0.1 micron (μm)~20 micron, preferably 1 micron~6 microns
Film thickness, and can be adjusted according to used material and purposes.
And then figure is obtained with exposed and developed, the chromatic photoresist structure can be used as.In some embodiments,
It is to obtain figure by developing the unexposed part of removal after light shield is used to be exposed.In further embodiments, exist
It is that figure is obtained by the part for removal exposure of developing after being exposed using light shield.
In the step of exposure, the light sources such as mercury vapor lamp, light emitting diode, metal halid lamp, halogen lamp can be used, and utilize
E.g. wavelength falls the light in the range of 250 nanometers~450 nanometers.In some embodiments, it is sheared with wave filter and removes wave
The long light less than 350 nanometers.In some embodiments, selectively taken out with bandpass filter wavelength 436 nanometers nearby,
Light near 408 nanometers or near 365 nanometers.In some embodiments, the dresses such as light shield alignment exposure machine, stepper can be used
It puts, equably to irradiate parallel rays to entire plane of exposure and/or be accurately aligned with shielding and base material.The pattern of light shield can be according to
It is designed according to demand.
In the step of development, the developer solutions such as the aqueous solution of organic solvent, alkali compounds can be used so that scheduled portion
Divide (such as unexposed part) dissolving, remove, thus obtain figure.In some embodiments, using the water of alkali compounds
Solution is particularly helpful to obtain the good figure of shape as imaging liquid.According to some embodiments, developer solution can be inorganic alkaline
The aqueous solution of compound or the aqueous solution of organic basic compound, concentration are, for example, the model fallen in 0.01wt%~10wt%
In enclosing, preferably fall in the range of 0.03wt%~5wt%.The aqueous solution of the inorganic alkaline compound include but not by
It is limited to the aqueous solution selected from least one of the group being made of the following option：Sodium hydroxide, potassium hydroxide, phosphoric acid hydrogen
Disodium, sodium dihydrogen phosphate, diammonium hydrogen phosphate, ammonium dihydrogen phosphate, potassium dihydrogen phosphate, sodium metasilicate, potassium silicate, sodium carbonate, potassium carbonate,
Sodium bicarbonate, saleratus, Boratex, potassium borate and ammonia.The aqueous solution of the organic basic compound includes but is not limited to
Aqueous solution selected from least one of the group being made of the following option：Tetramethyl-ammonium hydroxide, 2- hydroxyethyls
Trimethyl ammonium hydroxide, monomethyl amine, dimethyl amine, Trimethylamine, monoethylamine, diethylamide, triethylamine, single isopropyl
Base amine, diisopropylamine, ethanol amine.In some embodiments, developer solution be preferably potassium hydroxide, sodium bicarbonate, and/or
The aqueous solution of tetramethyl-ammonium hydroxide.In some embodiments, the aqueous solution of the alkali compounds may also include interface work
Property agent, concentration be, for example, fall in the range of 0.01wt%~10wt%, preferably fall the model in 0.05wt%~8wt%
In enclosing, fallen in the range of 0.1wt%~5wt%.The interfacial agent including but not limited to be selected from by
At least one of group that the following option is formed：Polyoxyethylene alkyl ether, polyoxyethylene aryl ether, polyxyethylated virtue
Base ether, other polyoxyethylene derivs, ethylene oxide/oxygroup propylene-based block copolymer, sorbitan carboxylic esters, polyoxyethylene mountain
Pears alcohol acid anhydride aliphatic ester, polyoxyethylene sorbitol aliphatic ester, glycerol fatty acid ester, polyoxyethylene fatty acid ester, polyoxy
The alcohol nonionic surfactants such as vinyl alkyl amine；Lauryl alcohol sodium sulfovinate, oleyl sulfate sodium, NaLS, the moon
The anionic systems interfacial agents such as osmanthus base ammonium sulfate, dodecyl benzene sulfonic acid sodium salt, dodecyl sodium naphthalene sulfonate；And stearyl amine salt
The cationic systems interfacial agents such as hydrochlorate, lauryl trimethyl ammonium chloride.Developer solution can by paddle paddling process, infusion process,
The methods of spray-on process, is provided onto base material.It also, in some embodiments, can be by base material skewed at any angle during development.Root
According to some embodiments, the step of can be washed after development.
One more embodiment of the present invention is about a kind of display, may include aforementioned chromatic photoresist structure.Citing comes
It says, the display may include the colored filter being made of aforementioned chromatic photoresist structure, but be not only restricted to this.According to some
Embodiment, the display can be the displays such as liquid crystal display, electroluminescent display or plasma display panel.
Hereinafter, the present invention will provide several embodiments and comparative example, it is according to embodiments of the present invention to further illustrate
The attainable effect of photosensitive resin composition.
[embodiment 1]
Account for 40mol% using aforementioned first monomeric unit (B-1), aforementioned second comonomer unit (B-2) accounts for 50mol%, with
And the aforementioned Third monomer unit (BZMI) with N-phenylmaleimide functional group accounts for 10mol%.Use C.I. pigment blues
15：6 and aforementioned oxa- green onion ketone dyes as colorant (C.I. pigment blue 15s：6 and oxa- green onion ketone dyes weight ratio be 90：
10).Using six (methyl) acrylic acid dipentaerythritol esters (DPHA) as photo polymerization monomer.It usesOXE-01
(BASF AG) is as Photoepolymerizationinitiater initiater.Using propylene glycol methyl ether acetate (PGMEA) as solvent.It is accounted for colorant
50wt%, resin account for 1wt%, photo polymerization monomer accounts for 5wt%, Photoepolymerizationinitiater initiater accounts for 3wt%, solvent accounts for the ratio of 41wt% and matches
Photosensitive resin composition is made.The photosensitive resin composition for preparing completion is coated on 5 centimeters * 5 centimeters with spin-coating method
On glass substrate (Eagle2000, Corning company).In 100 DEG C of prebake conditions 3 minutes.After placing cooling, make substrate and quartz
100 microns of glass system light shield interval, using exposure machine (TME-150RSK, TOPCON (stock) make) under atmospheric environment atmosphere with
150mJ/cm2Light exposure (365nm benchmark) carry out light irradiation, wherein on the light shield have 100 microns of line widths and line-spacing
The figure of (line and space).After light irradiation, containing alcohol nonionic surfactant 0.12% and potassium hydroxide
In 24 DEG C of immersion developments 60 seconds in 0.04% water system developer solution, then wash.Then 30 points are toasted after 230 DEG C in an oven
Clock obtains the sample of chromatic photoresist structure.By it is aforementioned prepare complete amount of glass colour examining degree after, be then dipped to 65 DEG C, 100%
N- N-methyl 2-pyrrolidone Ns (NMP) solution in after five minutes, then measure with chroma plane the coloration of glass, and calculate impregnate it is front and rear
The Δ Eab of coloration.(Δ Eab=((L*-L*) ^2+ (a*-a*) ^2+ (b*-b*) ^2) ^ (1/2))
[embodiment 3]
35mol% is accounted for using aforementioned first monomeric unit (B-1), aforementioned second comonomer unit (B-2) accounts for 35mol%, preceding
It states the Third monomer unit (BZMI) with N-phenylmaleimide functional group and accounts for 10mol% and aforementioned with methyl-prop
4th monomeric unit (MAA) of e pioic acid methyl ester accounts for the resin of 20mol%.Other conditions are such as embodiment 1, as described according to embodiment 1
Method sample is made and is observed.
[embodiment 2], [embodiment 4]~[embodiment 10]
Use aforementioned first monomeric unit (B-1) of the molar ratio according to table 1, aforementioned second comonomer unit (B-2), preceding
State Third monomer unit (BZMI) with N-phenylmaleimide functional group and/or aforementioned with methyl methacrylate
The 4th monomeric unit (MAA) resin.Other conditions such as embodiment 1 is made sample according to method described in embodiment 1 and goes forward side by side
Row observation.
[comparative example 1]
10mol% is accounted for using the monomeric unit (BZMI) with N-phenylmaleimide functional group, with acrylic acid official
The monomeric unit (AA) of energy base accounts for 10mol%, has third (from acrylic acid (AA)/methylglycidyl esters (GMA) copolymer)
The monomeric unit (AA+GMA) of olefin(e) acid functional group/methylglycidyl esters functional group accounts for 50mol% and with vinyltoluene
The monomeric unit (VT) of functional group accounts for the resin of 30mol%.Other conditions such as embodiment 1.According to method system described in embodiment 1
Into sample and observed.
[comparative example 2]
10mol% is accounted for using the monomeric unit (BZMI) with N-phenylmaleimide functional group, (from metering system
Sour hexamethylene ester monomer) monomeric unit (CHMA) with cyclohexyl methacrylate functional group accounts for 55mol%, (from methyl-prop
E pioic acid methyl ester (MAA)/methylglycidyl esters (GMA) copolymer) there is methyl methacrylate/methylglycidyl esters function
The monomeric unit (MAA+GMA) of base accounts for 20mol% and the monomeric unit (MAA) with methyl methacrylate accounts for 15mol%
Resin.Other conditions such as embodiment 1.Sample is made according to method described in embodiment 1 and is observed.
[comparative example 3]
10mol% is accounted for using the monomeric unit (TCDMA) with methacrylic acid tricyclic functional group, with methacrylic acid
The monomeric unit (BZMA) of benzyl ester functional group accounts for 45mol% and with methyl methacrylate/methylglycidyl esters function
The monomeric unit (MAA+GMA) of base accounts for the resin of 50mol%.Other conditions such as embodiment 1.According to method described in embodiment 1
Sample is made and is observed.
[result and evaluation]
Each embodiment and the component ratio and coloration of comparative example observe result as listed in table 1, " Δ Eab<3.5 " represent resistance to molten
Agent is good, " Δ Eab>3.5 " represent that solvent resistance is bad.As shown in table 1, each photosensitive resin composition by embodiment
The sample of chromatic photoresist structure formed, all with good solvent resistance.
Table 1
1 (Continued) of table
Certainly, the present invention can also have other various embodiments, without deviating from the spirit and substance of the present invention, ripe
Various corresponding changes and deformation, but these corresponding changes and deformation can be made according to the present invention by knowing those skilled in the art
The protection domain of the claims in the present invention should all be belonged to.
Claims (14)
1. a kind of photosensitive resin composition, which is characterized in that the photosensitive resin composition includes：
Colorant, including pigment and dyestuff；
Resin, including：
The summation of first monomeric unit and second comonomer unit, first monomeric unit and the second comonomer unit accounts for described
More than the 30mol% of resin, first monomeric unit have structure as described in chemical formula 1：
Chemical formula 1
And
The second comonomer unit has the structure as shown in chemical formula 2：
Chemical formula 2
Wherein R1And R2It is separately the alkyl of carbon number 1 to 10, n and m are separately positive integer, R3Represent hydrogen atom
Or the alkyl of carbon number 1 to 2；
Photo polymerization monomer；
Photoepolymerizationinitiater initiater；And
Solvent.
2. photosensitive resin composition as described in claim 1, which is characterized in that first monomeric unit and described second
The summation of monomeric unit accounts for 30mol%~90mol% of the resin.
3. photosensitive resin composition as described in claim 1, which is characterized in that first monomeric unit accounts for the resin
25~60mol%, the second comonomer unit accounts for more than the 5mol% of the resin.
4. photosensitive resin composition as described in claim 1, which is characterized in that the resin further includes Third monomer list
Member, the Third monomer unit have N-phenylmaleimide functional group.
5. photosensitive resin composition as claimed in claim 4, which is characterized in that the Third monomer unit accounts for the tree
10mol%~30mol% of fat.
6. photosensitive resin composition as described in claim 1, which is characterized in that the resin further includes the 4th monomer list
Member, the 4th monomeric unit have methyl methacrylate.
7. photosensitive resin composition as claimed in claim 6, which is characterized in that the 4th monomeric unit accounts for the tree
0mol%~50mol% of fat.
8. photosensitive resin composition as described in claim 1, which is characterized in that relative to the resin of 100 parts by weight,
The colorant is the parts by weight of 1 parts by weight~50, and the photo polymerization monomer is the parts by weight of 1 parts by weight~5, and the photopolymerization causes
Agent is the parts by weight of 1 parts by weight~3, and the solvent is the parts by weight of 1 parts by weight~41.
9. photosensitive resin composition as described in claim 1, which is characterized in that the dyestuff is selected from oil-soluble dyes, acid
Property dyestuff, base dyestuff, direct dyes, mordant dye, the amine salt of acid dyes or acid dyes sulfamide derivative, idol
It is nitrogen dyestuff, cyanine dye, triphenhlmethane dye, oxa- green onion ketone dyes, phthalocyanine dye, naphthoquinone dyestuff, quinoneimine dye, secondary
Methyl dyestuff, azomethine dyes, squaraine dye, acridine dye, styryl color, coumarine dye, quinoline dye and nitro
The group that dyestuff is formed.
10. photosensitive resin composition as claimed in claim 9, which is characterized in that the dyestuff accounts for the photoresist
0.1~50wt% of constituent.
11. photosensitive resin composition as described in claim 1, which is characterized in that the photo polymerization monomer, which is selected from, has one
The polymerizable compound of a ethylene unsaturated bond, the polymerizable compound with two ethylene unsaturated bonds and with
The group that the polymerizable compound of three ethylene unsaturated bonds is formed；And/or
The Photoepolymerizationinitiater initiater is selected from O- acyl groups oxime compound, alkyl phenyl ketone compound, double imidazole compound, triazine chemical combination
Object, acylphosphine oxide, benzoin compound, diphenylketone compound, oxime-based compound, 10- butyl -2- chloro-acridines ketone, benzyl
The group of base or phenyl formic acid methyl esters and cyclopentadiene titanium compound composition；And/or
The solvent be selected from ester solvent, ether solvents, ether-ether solvent, ketone solvent, alcoholic solvent, aromatic hydrocarbon solvents, amide solvent and
The group that dimethyl sulfoxide (DMSO) is formed.
12. sensing optical activity resin combination as claimed in claim 11, which is characterized in that there are one ethylene insatiable hungers for the tool
Nonylphenol acrylate phenyl carbitol ester, acrylic acid 2- hydroxyl -3- phenoxy-propyls, acrylic acid are selected from the polymerizable compound of key
The group that 2- ethylhexyls carbitol ester, acrylic acid 2- hydroxy methacrylates, N- vinyl pyrrole ketone are formed；
The polymerizable compound that there is two ethylene unsaturated bonds be selected from two (methyl) acrylic acid 1,6- hexane diols esters,
Two (methyl) acrylic acid glycol esters, two (methyl) acrylic acid neopentyl glycol ester, two (methyl) acrylic acid triglycol esters, bis-phenol
The group that bis- (acryloyl-oxyethyl) ethers of A, two (methyl) acrylic acid -3- methylpentane diol esters are formed；And
The tool there are three ethylene unsaturated bond polymerizable compound be selected from three (methyl) acrylic acid trihydroxymethylpropanyl esters,
Three (methyl) acrylate, pentaerythritols, four (methyl) acrylate, pentaerythritols, five (methyl) acrylic acid dipentaerythritol esters,
Six (methyl) acrylic acid dipentaerythritol esters, eight (methyl) acrylic acid tripentaerythritol esters, tripentaerythritol seven (methyl) propylene
Acid esters, ten (methyl) acrylic acid tetrapentaerythritol esters, nine (methyl) acrylic acid tetrapentaerythritol esters, three (2- (methyl) acryloyls
Oxygroup ethyl) isocyanates, the glycol-modified pentaerythritol ester of four (methyl) acrylic acid, six (methyl) acrylic acid are glycol-modified
Dipentaerythritol ester, the propylene glycol modified pentaerythritol ester of four (methyl) acrylic acid, six (methyl) acrylic acid propylene glycol modified two seasons
Doutrate, four (methyl) caprolactones are modified pentaerythritol ester and six (methyl) caprolactones were modified for two seasons
The group that Doutrate is formed.
13. a kind of chromatic photoresist structure, which is characterized in that the chromatic photoresist structure is by claim 1~12 any one of them
Photosensitive resin composition is formed.
14. a kind of display, which is characterized in that the display includes the chromatic photoresist structure described in claim 13.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW106146428A TWI657311B (en) | 2017-12-29 | 2017-12-29 | Photosensitive resin composition, and color resistor structure and display using the same |
| TW106146428 | 2017-12-29 |
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| CN108196427A true CN108196427A (en) | 2018-06-22 |
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Cited By (2)
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|---|---|---|---|---|
| US20200031151A1 (en) * | 2016-09-30 | 2020-01-30 | Agfa Nv | Inkjet printing methods for decorative surfaces |
| CN111308859A (en) * | 2018-12-12 | 2020-06-19 | 三星Sdi株式会社 | Photosensitive resin composition, photosensitive resin layer using same, and color filter |
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| CN101646977A (en) * | 2007-11-08 | 2010-02-10 | 株式会社Lg化学 | Colored dispersion, photoresist composition and black matrix |
| CN102077144A (en) * | 2008-07-14 | 2011-05-25 | Jsr株式会社 | Resin composition for making insoluble resist pattern, and method for formation of resist pattern by using the same |
| US20140255833A1 (en) * | 2011-11-17 | 2014-09-11 | Shin-Etsu Chemical Co., Ltd. | Chemically amplified positive resist composition and pattern forming process |
| CN104914669A (en) * | 2014-03-11 | 2015-09-16 | 东友精细化工有限公司 | Blue photosensitive resin composition, blue color filter and display device comprising the same |
| CN106896642A (en) * | 2017-01-17 | 2017-06-27 | 住华科技股份有限公司 | Photosensitive resin composition, and color photoresist structure and display using the same |
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| KR101895911B1 (en) * | 2016-01-11 | 2018-09-07 | 삼성에스디아이 주식회사 | Photosensitive resin composition, photosensitive resin layer and color fliter |
| KR101979980B1 (en) * | 2016-03-23 | 2019-05-17 | 동우 화인켐 주식회사 | Photosensitive Resin Composition |
| TWI736595B (en) * | 2016-03-25 | 2021-08-21 | 日商富士軟片股份有限公司 | Photosensitive composition, color filter, pattern forming method, solid-state imaging element, and image display device |
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- 2017-12-29 TW TW106146428A patent/TWI657311B/en not_active IP Right Cessation
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| CN101646977A (en) * | 2007-11-08 | 2010-02-10 | 株式会社Lg化学 | Colored dispersion, photoresist composition and black matrix |
| CN102077144A (en) * | 2008-07-14 | 2011-05-25 | Jsr株式会社 | Resin composition for making insoluble resist pattern, and method for formation of resist pattern by using the same |
| US20140255833A1 (en) * | 2011-11-17 | 2014-09-11 | Shin-Etsu Chemical Co., Ltd. | Chemically amplified positive resist composition and pattern forming process |
| CN104914669A (en) * | 2014-03-11 | 2015-09-16 | 东友精细化工有限公司 | Blue photosensitive resin composition, blue color filter and display device comprising the same |
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| US20200031151A1 (en) * | 2016-09-30 | 2020-01-30 | Agfa Nv | Inkjet printing methods for decorative surfaces |
| US10807397B2 (en) * | 2016-09-30 | 2020-10-20 | Agfa Nv | Inkjet printing methods for decorative surfaces |
| CN111308859A (en) * | 2018-12-12 | 2020-06-19 | 三星Sdi株式会社 | Photosensitive resin composition, photosensitive resin layer using same, and color filter |
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| TW201931009A (en) | 2019-08-01 |
| TWI657311B (en) | 2019-04-21 |
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