TWI632595B - 壓印裝置、壓印方法及物品製造方法 - Google Patents
壓印裝置、壓印方法及物品製造方法 Download PDFInfo
- Publication number
- TWI632595B TWI632595B TW106104125A TW106104125A TWI632595B TW I632595 B TWI632595 B TW I632595B TW 106104125 A TW106104125 A TW 106104125A TW 106104125 A TW106104125 A TW 106104125A TW I632595 B TWI632595 B TW I632595B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- mold
- voltage
- peripheral structure
- imprint
- Prior art date
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016037999 | 2016-02-29 | ||
JP2016-037999 | 2016-02-29 | ||
JP2016-223348 | 2016-11-16 | ||
JP2016223348A JP6789772B2 (ja) | 2016-02-29 | 2016-11-16 | インプリント装置、インプリント方法および物品製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201732881A TW201732881A (zh) | 2017-09-16 |
TWI632595B true TWI632595B (zh) | 2018-08-11 |
Family
ID=59810121
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW106104125A TWI632595B (zh) | 2016-02-29 | 2017-02-08 | 壓印裝置、壓印方法及物品製造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6789772B2 (ko) |
KR (1) | KR102134212B1 (ko) |
TW (1) | TWI632595B (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6802691B2 (ja) * | 2016-11-18 | 2020-12-16 | キヤノン株式会社 | インプリント装置および物品製造方法 |
JP7495814B2 (ja) * | 2020-05-13 | 2024-06-05 | キヤノン株式会社 | インプリント装置、および物品の製造方法 |
KR102542639B1 (ko) * | 2021-02-10 | 2023-06-12 | 성균관대학교산학협력단 | 미세 패턴 형성 장치 및 방법 |
KR102528880B1 (ko) * | 2021-02-16 | 2023-05-03 | 성균관대학교산학협력단 | 전기수력학 불안정성을 이용한 패턴제작기술의 미세 구조체 사이의 2차 간섭효과에 의한 초미세구조체 제작 및 초소수성표면 형성방법 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI224149B (en) * | 2000-08-29 | 2004-11-21 | Canon Kk | Thin-film formation system and thin-film formation process |
TW200905727A (en) * | 2007-04-06 | 2009-02-01 | Canon Kk | Exposure apparatus and original |
TW201604934A (zh) * | 2014-07-15 | 2016-02-01 | 佳能股份有限公司 | 壓印設備及製造物品的方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4758406B2 (ja) * | 2007-10-02 | 2011-08-31 | 日本電信電話株式会社 | インプリント方法 |
JP2011040464A (ja) * | 2009-08-07 | 2011-02-24 | Canon Inc | 異物除去装置、露光装置及びデバイス製造方法 |
JP6171412B2 (ja) * | 2013-03-06 | 2017-08-02 | 大日本印刷株式会社 | インプリント方法、インプリント用のモールドおよびインプリント装置 |
JP6139434B2 (ja) * | 2013-12-13 | 2017-05-31 | 株式会社東芝 | インプリント方法 |
JP6313591B2 (ja) * | 2013-12-20 | 2018-04-18 | キヤノン株式会社 | インプリント装置、異物除去方法及び物品の製造方法 |
JP2015149390A (ja) * | 2014-02-06 | 2015-08-20 | キヤノン株式会社 | インプリント装置、型、および物品の製造方法 |
-
2016
- 2016-11-16 JP JP2016223348A patent/JP6789772B2/ja active Active
-
2017
- 2017-01-23 KR KR1020187026955A patent/KR102134212B1/ko active IP Right Grant
- 2017-02-08 TW TW106104125A patent/TWI632595B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI224149B (en) * | 2000-08-29 | 2004-11-21 | Canon Kk | Thin-film formation system and thin-film formation process |
TW200905727A (en) * | 2007-04-06 | 2009-02-01 | Canon Kk | Exposure apparatus and original |
TW201604934A (zh) * | 2014-07-15 | 2016-02-01 | 佳能股份有限公司 | 壓印設備及製造物品的方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2017157821A (ja) | 2017-09-07 |
KR102134212B1 (ko) | 2020-07-15 |
TW201732881A (zh) | 2017-09-16 |
KR20180118684A (ko) | 2018-10-31 |
JP6789772B2 (ja) | 2020-11-25 |
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